Abstract: A cleaning apparatus includes a heating device, a freezing device, and a conveying belt. The heating device includes a hot water source and a hot water container. The hot water container includes an exit shutter and defines a water inlet and a water outlet. The hot water source being communicated to the hot water container via the water inlet. The freezing device includes an aerosol spray system and a freezing container. The spray system includes a spray head. The freezing container includes an entrance shutter. The spray head is received in the freezing container. The conveying belt extends into the hot water container via the exit shutter and into the freezing container via the entrance shutter and thereby bridges the hot water container and the freezing container.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: The invention relates to a cleaning method in which from a vacuum coating chamber (3) of a coating installation (1) for the coating of substrates (2) with alkali- or alkaline earth-metals, residues of alkali- or alkaline earth-metals are removed. For this purpose into the chamber (3) a gas from the group of N2, O2 or air is introduced, which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can additionally be introduced into the vacuum coating chamber (3). After the alkali- or alkaline earth-metals have reacted with the gas, the corresponding solid compound is removed from the vacuum coating chamber.

Abstract: Processes for enhancing solubility and the reaction rates in supercritical fluids are provided. In preferred embodiments, such processes provide for the uniform and precise deposition of metal-containing films on semiconductor substrates as well as the uniform and precise removal of materials from such substrates. In one embodiment, the process includes, providing a supercritical fluid containing at least one reactant, the supercritical fluid being maintained at above its critical point, exposing at least a portion of the surface of the semiconductor substrate to the supercritical fluid, applying acoustic energy, and reacting the at least one reactant to cause a change in at least a portion of the surface of the semiconductor substrate.

Abstract: A method for producing an organic light-emitting device is provided for an organic light-emitting device having a substrate provided with external connection terminals, organic light-emitting elements provided on the substrate, and a protective film that covers the organic light-emitting elements. The method includes, sequentially, providing a protective film removal layer on the external connection terminals, forming the protective film on the substrate, dividing the substrate on which the protective film has been formed, and cleaning the substrate with water, an aqueous solution, or a solvent. The protective film removal layer and the protective film are removed from the external connection terminals as a result of cleaning the substrate.

Abstract: Methods for removing residual particles from a substrate are presented including: receiving the substrate including the residual particles; and functionalizing the residual particles with functionalizing molecules, wherein the functionalizing molecules selectively attach with a surface the residual particles, where the functionalizing molecules impart a changed chemical characteristic to the residual particles, and where the changed chemical characteristic facilitates removal of the residual particles from the substrate. In some embodiments, methods further include: before functionalizing, cleaning the substrate, where the cleaning leaves residual particles adhered with a surface of the substrate, and where the residual particles are hydrophilic; and if the surface of the substrate is hydrophobic, performing the functionalizing.

Abstract: The present invention relates to a substrate cleaning method for cleaning a substrate whose static contact angle with respect to water is 85 degrees or more.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: The removing solution containing a cerium (IV) nitrate salt, periodic acid or a hypochlorite can be applied to metals containing copper, silver or palladium and also to metals containing other metals having a relatively large oxidation-reduction potential.

Abstract: The application of a gel-like material is disclosed for cleaning a surface having foreign matter thereon, such gel-like material produced by magnetically treating and mixing two solutions, the first solution being comprised of water and sodium bicarbonate and the second solution comprised of water and sodium silicate. The first solution is passed through a positively charged magnetic field, and the second solution is passed through a negatively charged magnetic field. The two solutions are then mixed together to form a gel.

Abstract: The present invention provides a cleaning substrate of a substrate processing equipment, which comprises a cleaning layer comprising a heat resistant resin with a storage modulus (1 Hz) at 20° C. up to 150° C. being 5×107 Pa to 1×109 Pa on at least one face of the substrate; and a polyimide resin suitable as the heat resistant resin for the cleaning layer and usable under circumstances possibly involving the generation of serious disadvantages due to silicone contamination, such as for HDD application and some semiconductor applications.

Abstract: A method of forming a highly doped layer of AlGaN, is practiced by first removing contaminants from a MBE machine. Wafers are then outgassed in the machine at very low pressures. A nitride is then formed on the wafer and an AlN layer is grown. The highly doped GaAlN layer is then formed having electron densities beyond 1×1020 cm?3 at Al mole fractions up to 65% are obtained. These levels of doping application of n-type bulk, and n/p tunnel injection to short wavelength UV emitters. Some applications include light emitting diodes having wavelengths between approximately 254 and 290 nm for use in fluorescent light bulbs, hazardous materials detection, water purification and other decontamination environments. Lasers formed using the highly doped layers are useful in high-density storage applications or telecommunications applications. In yet a further embodiment, a transistor is formed utilizing the highly doped layer as a channel.

Abstract: A method for the wet-chemical treatment of a semiconductor wafer involves: a) rotating a semiconductor wafer; b) applying a cleaning liquid comprising gas bubbles having a diameter of 100 ?m or less to the rotating wafer such that a liquid film forms on the wafer; c) exposing the rotating semiconductor wafer to a gas atmosphere containing a reactive gas; and d) removing the liquid film from the wafer.

Abstract: A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste material. A rinse solution is applied to the surfaces of the equipment to provide a residual film thereon. The rinse solution includes a first nonionic alkoxylated alcohol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic alkoxylated alcohol surfactant having an HLB value ranging from about 16 to 20, an aqueous solvent, and optionally, a bio-film permeation agent. A total of the first surfactant and the second surfactant in the composition ranges from about 2 to about 20 percent by weight of a total weight of the composition, and a ratio of the second surfactant to the first surfactant in the composition ranges from about 2:1 to about 4:1.

Abstract: A composition having a first nonionic alkoxylated alcohol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic alkoxylated alcohol surfactant having an HLB value ranging from about 16 to 20, an aqueous solvent, and optionally, a bio-film permeation agent. A total of the first surfactant and the second surfactant in the composition ranges from about 2 to about 20 percent by weight of a total weight of the composition, and a ratio of the second surfactant to the first surfactant in the composition ranges from about 2:1 to about 4:1.

Abstract: In a process chamber of a substrate processing apparatus, such as an RTP apparatus, a carrier is placed and configured to carry out a contaminant that has been attached to it. In this state, a cleaning gas containing N2 and O2 is introduced into the process chamber, and cleaning is performed under conditions including a pressure of 133.3 Pa or less and a temperature of 700° C. to 1,100° C. This cleaning is repeatedly performed by sequentially replacing a plurality of carriers.

Abstract: An apparatus and method are provided for removing contaminate particulate matter from substrate surfaces such as semiconductor wafers. The method and apparatus use a material, preferably a liquid curable polymer, which is applied as a sacrificial coating to the surface of a substrate containing contaminate particulate matter thereon. An energy source is used to dislodge the contaminate particulate matter from the surface of the wafer into the sacrificial coating so that the particles are partially or fully encapsulated and suspended in the sacrificial coating. The sacrificial coating is then removed. The coating is preferably formed into a film to facilitate removal of the coating by pulling (stripping) the film providing a cleaner substrate surface.

Abstract: Compositions, methods, apparatuses, kits, and combinations are described for neutralizing a stain on a surface. The compositions useful in the present disclosure include a composition that is formulated to be applied and affixed to a surface. If desired, the composition may be substantially removed from the surface to remove a portion or substantially all of the stain before being affixed to the surface. If a user desires to remove the composition from the surface, the composition is formulated to be removed by a number of methods including, for example, vacuuming, wet extraction, chemical application, and the like. If the user desires to affix the composition to the surface in a permanent or semi-permanent manner, the composition may be affixed to the surface by applying energy thereto in the form of, for example, heat, pressure, emitted waves, an emitted electrical field, a magnetic field, and/or a chemical.

Abstract: A method for cleaning cavities in workpieces, a cleaning device for this purpose and a device for the supply of media to a cleaning device of this type. Supercritical carbon dioxide is introduced into the cavity and the cavity is rinsed. The supercritical carbon dioxide located in the cavity is relieved of pressure after rinsing of the cavity, so that carbon dioxide gas and carbon dioxide snow are formed in the cavity and subsequently driven out of the cavity.

Abstract: The application of a gel-like material is disclosed for cleaning a surface having foreign matter thereon, such gel-like material produced by magnetically treating and mixing two solutions, the first solution being comprised of water and sodium bicarbonate and the second solution comprised of water and sodium silicate. The first solution is passed through a positively charged magnetic field, and the second solution is passed through a negatively charged magnetic field. The two solutions are then mixed together to form a gel.

Abstract: A method for containing at least a portion of radioisotopes, radionuclides, heavy metal or combination thereof contaminating a substrate wherein a containment composition is applied to the substrate. The ingredients within the containment composition interact with the contaminants on the surface of the substrate until the containment composition has polymerized to a water insoluble form containing at least a portion of the contaminates enmeshed therein. The dried composition is removed from the contaminated surface removing with the composition at least a portion of the contaminate.

Abstract: Provided is a cleaning method which can efficiently remove a film, such as a high dielectric constant oxide film, which is difficult to be etched by a fluorine-containing gas alone. As a cleaning method of a substrate processing apparatus which forms a desired film on a wafer by supplying a source gas, there is provided a cleaning method for removing a film attached to the inside of a processing chamber. The cleaning method includes: a step of supplying a halogen-containing gas into the processing chamber; and a step of supplying a fluorine-containing gas into the processing chamber, after starting the supply of the halogen-containing gas, wherein, in the step of supplying the fluorine-containing gas, the fluorine-containing gas is supplied while supplying the halogen-containing gas into the processing chamber.

Abstract: An aqueous, concentrated neutral detergent composition for use in cleaning medical instruments and metal components (parts, tools, utensils, vessels, equipment, and surfaces) having scale control and corrosion inhibition properties when diluted to about 1/40 ounce per gallon to about 1/10 ounce per gallon in potable water. In addition, the concentrate may be applied directly to metal surfaces, such as stainless steel, to remove rust and other stains, without causing any additional corrosion or other damage to the metal surface.

Abstract: A single step rub-on, rub-off combination cleaning and waxing CD and DVD restoration method and composition particularly suited for repairing damaged and dirty reflective coatings.

Abstract: Methods for cleaning a stannane distributions system. A stannane distribution system connecting a stannane supply source and a semiconductor manufacturing tool is provided. Stannane is flown through the system, and a tin layer is formed on the components of the distribution system. This tin layer is then cleaned from the distribution system without the use of liquid cleaning chemicals.

Abstract: An improved process for removal of particulate matter having airborne potential. The process includes applying a foam to the particulate matter in a particulate matter area to prevent the particulate matter from becoming airborne. The particulate matter area may then be removed, prior to the foam draining, and encased in a storage device.

Abstract: The invention relates to the use of dispersions containing polyvinyl acetate for cleaning purposes, for example for cleaning plaster floors, ceramic wall and floor linings, steps, window sills, gravestones, sculptures, and jointing materials. According to the invention, the dispersion containing polyvinyl acetate is applied to part or all of the surface to be cleaned. Once said layer has dried through, it can be removed from the surface to be cleaned in the form of a film. The dispersion forms a solid composite with the impurities, such that the impurities can also be removed with the film.

Abstract: In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started, and substantially at the same, injection of a nitrogen gas from a gas nozzle to a center portion of the wafer W at a point at an adequate distance apart from the center of the wafer W is started. Next, while the pure-water nozzle is caused to scan toward the periphery of the wafer W, the gas nozzle is caused to scan toward the periphery of the wafer W in an area radially inward of the position of the pure-water nozzle after the gas nozzle passes the center of the wafer W.

Abstract: A packaged cleaning composition and process for cleaning a surface involves the simultaneous application of two liquids to the surface, such that a self-supporting gel is formed, acting on soil while delaying it from drying out. The gel and entrained soil are subsequently removed.

Abstract: An in-chamber member to use in the chamber of a plasma processing vessel has a coating film formed by a coating agent. The in-chamber member having deposits formed on the coating film is separated from the chamber and is immersed into a peeling solvent, e.g., acetone. Since the coating agent is made of a resist formed of a main component of, e.g., cyclized rubber-bisazide and a photosensitive component, the deposits can be separated from the in-chamber member together with the coating film being separated.

Abstract: A method for activating surface of electron emission source of a field emission display. After a cathode structure is fabricated and sintered with high temperature, the surface of electron emission source is activated by employing a spray coating technology. The spray coating technology includes a spraying device. The spraying device employs compressed air to homogeneously spray the solution onto the surface of the cathode structure. The solution will then cover the gate electrode layer and permeate into the hole and sagged area on the surface of electron emission source to form a covering layer. The covering layer is then dried and peeled off using a roller peeling device. The roller peeling device includes two rollers, one of which includes a heating unit to heat and soften the covering layer when rolled on the covering layer of the cathode structure. The other roller can thus peel off the covering layer easily.

Abstract: Concentrated hydrogen peroxide solution is utilized for biomass, biofilm and pathogen remediation and/or sterilization, disinfection, sanitizing, cleaning and/or removing soils from spaces or surfaces. Instead of utilizing diluted low concentration and pH slightly acidic to alkaline hydrogen peroxide, the applicant proposes the use of a formulated and concentrated hydrogen peroxide solution with preferably with an acidic pH such as about 3.5 along with low levels of inhibitors and/or the addition of activators such as ozone, iron, etc. Foaming occurs in many instances identifying treatment in progress and an anti-microbial solution can provide long term protection against re-growth.

Abstract: A device for treating a surface to give a cleaning benefit comprises a container (302) containing a cleaning liquid. The liquid can be delivered to an outlet zone (306). By virtue of the outlet zone and a separate defining means (322) which may be provided the cleaning liquid is accurately discharged onto the desired area of the surface. Suitably the cleaning liquid forms a gel patch, which can be peeled away, to remove a stain.

Abstract: A process for stripping photoresist from a substrate is provided. A processing system for implanting a dopant into a layer of a film stack, annealing the stripped film stack, and stripping the implanted film stack is also provided. When high dopant concentrations are implanted into a photoresist layer, a crust layer may form on the surface of the photoresist layer that may not be easily removed. The methods described herein are effective for removing a photoresist layer having such a crust on its surface.

Abstract: A rinsing liquid supplier includes a temperature adjuster. The temperature adjuster cools DIW to a temperature lower than room temperature. This temperature adjuster cools down DIW to a temperature not more than 10 degrees centigrade for instance, and cooling down to an even lower temperature of 5 degrees centigrade or below is more preferable. Meanwhile, the temperature adjuster maintains DIW at not less than 0 degrees centigrade, which prevents freezing of the DIW. The cooled DIW supplied to a rinsing liquid pipe is discharged from the rinsing liquid discharge nozzle toward the top surface of the substrate, to thereby form a liquid film. Further, the cooled DIW is discharged toward the rear surface of the substrate from the liquid discharge nozzle via the liquid supply pipe, to thereby form the liquid film on the rear surface. Since the liquid films are already cooled, they are frozen in a short time when the cooling gas is discharged toward the top surface and the rear surface of the substrate.

Abstract: DIW is supplied toward a surface of a substrate to form a lower layer liquid film, which is then frozen to form a lower layer frozen film. Further, DIW cooled down to a temperature at which the lower layer frozen film will not melt is supplied toward a surface of the lower layer frozen film to form an upper layer liquid film, which is then frozen to form an upper layer frozen film in a layered structure. DIW which is at room temperature is thereafter supplied, thereby melting the entirety of the lower layer frozen film and the upper layer frozen film to remove these films together with particles off from the surface of the substrate.

Abstract: The pulsed partial pressure hydrogen cleaning of cobalt-based alloys in turbine components is achieved by disposing the component within a vacuum furnace and heating the component. Upon heating to about 1400° F., a partial pressure hydrogen gas and a vacuum are repetitively cycled within the furnace by supplying in each cycle a fresh supply of hydrogen gas, followed by removal of reaction products between the hydrogen gas and surface contaminants and substantially all residual hydrogen gas from within the furnace. The repetitious cycling renders the surfaces clean, enabling refurbishment thereof by activated diffusion healing repair.

Abstract: A method of washing a vehicle with a gantry-type apparatus in only two passes uses the first pass to apply a pre-wash solution while subsequently brushing the top and sides of the vehicle and a second pass to initially brush the sides of the vehicle, then apply a spot-free rinse solution to the vehicle, then brush the top of the vehicle and subsequently apply a drying agent alone or mixed with a spot-free rinse. When the drying agent is applied alone, a spot-free rinse is applied separately and subsequent to the application of the drying agent.

Abstract: A method for cleaning and polishing a rusted iron-containing metal surface is disclosed. The metal surface is contacted with a composition containing fluorometallate anions of a Group IVB metal.

Abstract: Compositions, methods, apparatuses, kits, and combinations are described for neutralizing a stain on a surface. The compositions useful in the present disclosure include a composition that is formulated to be applied and affixed to a surface. If desired, the composition may be substantially removed from the surface to remove a portion or substantially all of the stain before being affixed to the surface. If a user desires to remove the composition from the surface, the composition is formulated to be removed by a number of methods including, for example, vacuuming, wet extraction, chemical application, and the like. If the user desires to affix the composition to the surface in a permanent or semi-permanent manner, the composition may be affixed to the surface by applying energy thereto in the form of, for example, heat, pressure, emitted waves, an emitted electrical field, a magnetic field, and/or a chemical.

Abstract: Compositions, methods, apparatuses, kits, and combinations are described for neutralizing a stain on a surface. The compositions useful in the present disclosure include a composition that is formulated to be applied and affixed to a surface. If desired, the composition may be substantially removed from the surface to remove a portion or substantially all of the stain before being affixed to the surface. If a user desires to remove the composition from the surface, the composition is formulated to be removed by a number of methods including, for example, vacuuming, wet extraction, chemical application, and the like. If the user desires to affix the composition to the surface in a permanent or semi-permanent manner, the composition may be affixed to the surface by applying energy thereto in the form of, for example, heat, pressure, emitted waves, an emitted electrical field, a magnetic field, and/or a chemical.

Abstract: An improved process for removal of particulate matter having airborne potential. The process includes applying a foam to the particulate matter in a particulate matter area to prevent the particulate matter from becoming airborne. The particulate matter area may then be removed, prior to the foam draining, and encased in a storage device.

Abstract: A substrate on the surface of which the liquid film is formed in a cleaning unit is transported to a freezing unit by a substrate transporting mechanism. The liquid film is frozen in the freezing unit and the volume of the liquid film increases. Accordingly, adhesive forces between the substrate and the particles are reduced and the particles even come to separate from the substrate surface. Then the substrate which has been processed freezing is transported from the freezing unit to the cleaning unit again by the substrate transporting mechanism. In the cleaning unit, a physical and/or chemical cleaning is executed to the substrate, and the frozen film is removed from the substrate surface. Thus, the liquid film formation and the freezing of the liquid film is performed as a preprocessing of the physical and/or chemical cleaning in this way, whereby the particles are removed from the substrate surface efficiently.

Abstract: Use in the treatment of glass substrata of mono- and bi-functional (per)fluoropolyether compounds having the following structures: Rf—CFY-L-W??(I) W-L-YFC—O—Rf—CFY-L-W??(II) wherein: L is a linking organic group —CO—NR?—(CH2)q—, with R?=H or C1-C4 alkyl; q=1-8; Y=F, CF3; W is a —Si(R1)?(OR2)3?? group with ?=0, 1, 2; R1 and R2 equal to or different from each other are C1-C6 alkyl groups, optionally containing one or more ether O atoms, C6-C10 aryl groups, C7-C12 alkyl-aryl or aryl-alkyl groups; Rf has a number average molecular weight in the range 350-5,000, and comprises repeating units of the type: (CFXO),(CF2CF2O),(CF(CF3)CF2O),(CF2CF(CF3)O), wherein X=F, CF3.

Abstract: A composition having a first nonionic nonylphenol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic nonylphenol surfactant having an HLB value ranging from about 16 to 20, an aqueous solvent, and optionally, a bio-film permeation agent. A total of the first surfactant and the second surfactant in the composition ranges from about 2 to about 20 percent by weight of a total weight of the composition, and a ratio of the second surfactant to the first surfactant in the composition ranges from about 2:1 to about 4:1.

Abstract: A method for cleaning contaminated surfaces of surgical waste management equipment. The method includes rinsing surfaces of the equipment with water to remove water soluble contaminants and waste material. A rinse solution is applied to the surfaces of the equipment to provide a residual film thereon. The rinse solution includes a first nonionic nonylphenol surfactant having an HLB value ranging from about 10 to about 15, a second nonionic nonylphenol surfactant having an HLB value ranging from about 16 to 20, a bio-film permeation agent, and an aqueous solvent. A total of the first surfactant and the second surfactant in the solution ranges from about 2 to about 20 percent by weight of a total weight of the solution and a ratio of the second surfactant to the first surfactant in the solution ranges from about 2:1 to about 4:1.

Abstract: The present invention relates to methods of treating surfaces, to protect or clean said surfaces. The invention more particularly relates to the treatment of interior walls or surfaces, particularly indoor household walls or surfaces, to protect the same from soiling or stains. This invention also relates to compositions, kits and devices for use in the above methods, to protect or clean indoor surfaces. This invention can be applied to various indoor surfaces, such as soft and permeable surfaces, in particular painted walls, wall paper and wallcloth.

Abstract: A method of surface treating heat treated members to remove oxide scale. The heat treated members are subjected to a staged series of discrete chemical and physical cleaning steps yielding a substantially scale-free surface readily adaptable for subsequent application of protective coatings.

Abstract: A gel is produced by magnetically treating and mixing two solutions and in one embodiment subsequently introducing carbon dioxide gas. The first solution is comprised of water and sodium bicarbonate, and the second solution is comprised of water and sodium silicate. The first solution is passed through a positively charged magnetic field, and the second solution is passed through a negatively charged magnetic field. The two solutions are then mixed together to form a gel. The resulting gel has excellent fire-fighting capabilities because of its high heat absorption and emissive qualities. Also disclosed is a method for using the gel to aid in the removal of surface coatings.