Abstract: A cleaning apparatus and a cleaning method for cleaning an object are provided. In the cleaning apparatus, a drying chamber 42 and a cleaning bath 41 are separated from each other up and down, respectively. Thus, a space in the drying chamber 42 can be insulated from a space of the cleaning bath 41 through rotary doors 59a and a slide door 72. In the cleaning method, a cleaning process in the cleaning bath 41 is carried out while sealing it by the rotary doors 59a. On the other hand, a drying process in the drying chamber 42 is accomplished while sealing and closing it by the slide door 72. Consequently, there is no possibility that, during the drying process, the object is subjected to a bad influence from a chemical treatment.

Abstract: A method and apparatus for cleaning, rinsing and Marangoni drying substrates is provided. A line of fluid is sprayed along a substrate surface forming an air/fluid interface line, and a line of drying vapor is supplied to the interface line to achieve Marangoni drying. Thus, a large portion of the substrate is simultaneously dried. A preferred apparatus employs a tank of cleaning and/or rinsing fluid. Above the tank fluid a source of rinsing fluid directs rinsing fluid to the surface of a substrate forming a meniscus on the substrate surface as the substrate is lifted from the cleaning fluid, and a drying vapor source directs drying vapor to the meniscus. The drying vapor lowers the surface tension of the meniscus, inducing a Marangoni flow of rinsing fluid from the substrate's surface, and thereby drying the substrate. The cleaning fluid tank has a substrate receiving and cleaning portion and a substrate rinsing portion.

Abstract: A method for cleaning an object to be processed in which the atmosphere in a drying chamber is replaced by an inert gas prior to placing an object to be cleaned from an external environment into the chamber. The object is then transported by an elongated retaining member from the drying chamber through a lower opening in the chamber into a processing bath disposed below the chamber. The object is then cleaned in the processing bath. The object is then transported from the processing bath to the drying chamber where it is dried by filling the atmosphere of the drying chamber with organic solvent. The cleaning process in the cleaning bath is carried out while the bath is screened by a nitrogen-gas curtain. The method also includes opening a lid of the chamber prior to insertion of the object into the chamber and closing the lid after insertion of the object, as well as the opening and closing of the lower opening in the chamber.

Abstract: A process and device for treating sheet objects, especially fragile sheet objects, by rotation through a liquid bath. The objects are disposed in radial slots in a rotating disk, retained therein by a flexible element moving synchronously with the disk, and by a retaining element mounted adjacent the disk and spaced therefrom along its axis of rotation.

Abstract: An apparatus having a processing chamber for processing a semiconductor wafer under evacuated conditions that is capable of transfer of the wafer from the processing chamber under conditions that are substantially equal to the pressure of an adjacent environment. In a preferred embodiment, the processing chamber is pressurized and vented with a source of high purity dry gas that is diffused into the chamber through a diffuser to pressurize the processing chamber after processing of the wafer is completed. A chamber equalization port between the processing chamber and the adjacent environment is opened to maintain the pressure within the chamber at or slightly above the pressure of the adjacent environment, and the chamber valve is then opened. The wafer can then be removed from the processing chamber, and a new wafer can be inserted. The chamber is then sealed by closing the chamber valve and the equalization port, and the atmosphere within the processing chamber is evacuated to a desired level.

Abstract: A substrate holder 90 where a thin film has accumulated on the surface of the holding claws 91 is transferred in a state where no substrate 9 is being held into a film removal chamber 70 which is established branching off in such a way that the vacuum is connected from the square transfer path 80 along which a plurality of vacuum chambers including the film deposition chambers 51, 52, 53, 54 and 50 is established. A high frequency power supply 73 is connected via the movable electrode 74 to the holder body 92 and a high frequency electric field is established within the film removal chamber 70. A plasma is formed by generating a high frequency discharge in the gas which is being delivered by means of the gas delivery system 72 and the accumulated film on the surface of the holding claws 91 is removed in a vacuum by sputter etching due to ion impacts.

Abstract: Substrate transporting method comprising (a) inputting process data, (b) determining whether a number of units required for processing the wafer is an odd number or an even number, (c1) when a determination result of the step (b) is an odd number, transporting the wafer, (d1) taking out the wafer by the second arm from a cassette section, (e1) loading the W by the second arm to an odd-numbered unit, (f1) unloading the W by the third arm from an odd-numbered unit, except for a final unit, (g1) loading the W by the third arm to an even-numbered unit, (h1) unloading the W by the second arm from an even-numbered unit, and (i1) unloading the W from the final unit by the first arm and loading the W by the first arm into the cassette section, and (c2) when a determination result of the step (b) is an even number, transporting the W (d2) taking out the W by the third arm from the cassette section, (e2) loading the W by the third arm into an odd-numbered unit, (f2) loading the W by the second arm from an odd-numbered

Abstract: The present inventions provides a processing apparatus to enable a plurality of processing sections to be installed in a smaller space. The apparatus has a plurality of processing sections arranged at up-down two stages and supplies a material from a processing section situated at one end of either one of an upper or a lower stage. The material is processed at the processing section at one of the upper stage or lower stage and then processed at the other processing section. And it is processed at the processing section situated at one end of the other and collected.

Abstract: A holder (102) made from an HF-resistant material includes annular suction pads (105, 108). The suction pad (105) is used to hold a small silicon substrate by suction, and the suction pad (108) is used to hold a large silicon substrate by suction. This makes silicon substrates with various sizes processable. A silicon substrate is held by suction by reducing a pressure in a space in a groove of the suction pad by a pump (120). An opening (103) is formed in the holder (102) so that the both surfaces of the silicon substrate are brought into contact with an HF solution (115). The silicon substrate is anodized by applying a DC voltage by using a platinum electrode (109a) as a negative electrode and a platinum electrode (109b) as a positive electrode, and thereby a substrate having a porous layer is produced.

Abstract: A portable ground soil remediation apparatus and method utilizing a water and biodegradeable soap mixture to result in an safe solution to effectively remove crude or refined oil from the soil, as well as the toxins associated with this type of contamination. The present invention includes at least one elongated, rotatable chamber filled with the soap mixture and having internal lifting means to pick up soil and provide cleansing with the soap mixture. Additionally, a means for injecting fluid is placed within the chamber to provide additional cleansing capability and to replenish the soap mixture. The present invention is adapted to allow effective soil movement through at least one soil cleaning chambers, which minimizes wear due to the lack of internal blades and other moving components.

Abstract: A multiple stage wet processing platform includes a sealable enclosure, at least two processing modules positioned within the enclosure, at least one of them including a housing having an opening and a door moveable into position covering the opening, at least two processing vessels within the housing, and an intra-module robot within the housing and including a wafer support member, the intra-module robot moveable to a first position in which the support is disposed in a first one of the processing vessels and a second position in which the support is disposed in a second one of the processing vessels. An inter-module robot is positioned within the enclosure and is moveable between a first position adjacent to a first one of the modules and a second position adjacent to a second one of the modules.

Abstract: Cleaning apparatus provide for the cleaning of a workpiece by first immersing the workpiece in a cleaning tank having a cleaning liquid therein for a predetermined period of time, removing the workpiece from the cleaning tank, moving the workpiece through air for a pre-selected period of time, and supplying the workpiece to a drying device which then dries the workpiece. As the workpiece is moved through the air, the workpiece may be vibrated, moved at an incline then a decline, and/or have air blasted at it, so that any liquid, e.g. rinsing solution, remaining thereon is caused to fall off, such occurring prior to the drying of the workpiece by the drying device.

Abstract: An cleaning mechanism especially well suited for agricultural products in which the agricultural products are moved by a flow of water through a channel in which the water is agitated by vibration of the channel. The agitation of the water, together with contact with other products, dislodges dirt, rocks, and other debris from the products. The dislodged debris settles into troughs at the bottom of the channel. The washed agricultural products fall over a baffle at the end of the channel and are ready for packaging. In one embodiment of the invention, the cleaning system is conveyed through the agricultural field to clean the product immediately after harvest so that the agriculture product leaves the field in a wrapped or packaged state.

Abstract: A drying unit is disposed above a cleaning tank containing a cleaning liquid for cleaning semiconductor wafers W. A wafer boat holding semiconductor wafers moves between the cleaning tank and the drying unit. The drying unit has a fixed base surrounding an opening formed in the cleaning tank, a liftable top cover placed on the fixed base, and an O-ring interposed between the fixed base and the liftable top cover. The liftable top cover can be moved vertically by a first lifting means.

Abstract: According to the present invention, there is provided a substrate conveying apparatus for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate on an upper surface thereof, an arm drive mechanism for driving the arm such as to load/unload the substrate to/from the processing section, first and second suction members each having an opening communicating to a suction hole of the suction passage, for supporting the substrate by at least an edge portion of the opening, and a switching mechanism for selectively switching a mode between the support of the substrate by the first suction member and that by the second suction member.

Abstract: An improved and new apparatus and method for post chemical-mechanical planarization (CMP) cleaning has been developed. Use of a QDR (Quick Dump Rinse) DI water bath for receiving a cassette of semiconductor substrates from a previous CMP processing station, for keeping the semiconductor substrates submerged in DI water following CMP and before transmission to a next processing station and for performing at least one rinsing and dumping operation on the semiconductor substrates in flowing DI water greatly enhances the manufacturing throughput of the process, reduces the use of chemicals, and simplifies the tool requirements for the post-CMP cleaning process.

Abstract: A substrate treating apparatus for successively treating substrates includes a body having a carrying unit for carrying the substrate along a carrying surface. The carrying surface is inclined in a plane perpendicular to the carrying direction of the substrate. The body supplies a treating liquid to the substrate being carried for treating the substrate. A receiving station is disposed upstream of the body for changing the posture of the substrate from a horizontal posture to an inclined posture corresponding to the inclination of the carrying surface, and for forwarding the substrate onto the carrying unit. In addition, a delivering station is disposed downstream of the body for returning the substrate forwarded from the carrying unit in the inclined posture to the horizontal posture.

Abstract: An automated means for hydrating and packaging a molded hydrophilic contact lens in one of the mold parts used to mold the lens is provided in which a first robotic assembly removes a plurality of contact lens molds from a production line carrier, each of the lens molds having a contact lens adhered therein. The first robotic assembly transports the molds to a first staging area where the lens molds are sandwiched between a lens mold carrier and a top chamber plate to form a first hydration carrier. The hydration carrier is then transported through a plurality of flushing or extraction stations wherein fresh deionized water is introduced into the hydration chambers at each hydration station to flush leachable substances from the hydration chamber. At each flushing station, fresh deionized water is introduced into the hydration chamber to remove previously extracted impurities and the products of hydrolysis.

Abstract: An improved apparatus for washing fruit that includes supporting rollers, a nozzle for directing a spray of water at 100 psi at the surface of the whole fruit; and clean-out bars that reduce the movement of the fruit toward the nozzle being transported at a predetermined time.

Abstract: According to the present invention, there is provided a substrate conveying apparatus for loading/unloading a substrate to/from a processing section, including an arm for holding the substrate on an upper surface thereof, an arm drive mechanism for driving the arm such as to load/unload the substrate to/from the processing section, first and second suction members each having an opening communicating to a suction hole of the suction passage, for supporting the substrate by at least an edge portion of the opening, and a switching mechanism for selectively switching a mode between the support of the substrate by the first suction member and that by the second suction member.

Abstract: An automated means for hydrating a molded hydrophilic contact lens is provided in which a first robotic assembly removes a plurality of contact lens molds from a production line carrier, each of the lens molds having a contact lens adhered therein. The first robotic assembly transports the molds to a first staging area where the lens molds are sandwiched between a lens mold carrier and a top chamber plate to form a first hydration carrier. A first rotary transfer device then hands the first hydration carrier to a second robotic assembly which immerses the first hydration carrier in a hydration bath to hydrate the lens and to release the lens from the lens mold. While the lens is immersed in the hydration bath, each lens is transferred from its respective mold to a lens transfer means found within the top chamber plate.

Abstract: A method of washing substrates arranged at a substantially equal pitch internal in a cassette which includes steps of (a) transferring the substrates to a holder a pitch interval narrower than the arrangement pitch interval in said cassette; (b) supplying a washing solution into a processing bath; (c) conveying the holder holding the substrates into the processing bath; (d) dipping the substrates in the washing solution in the processing bath to wash the substrates; and (e) supplying a rinse solution into the processing bath to substitute the washing solution with the rinse solution to rinse the substrates in the processing bath.

Abstract: Numerous spin-dry mechanisms 45A, 45B, and 45C for drying workpieces W at individual drying positions by rotating them at high speed are disposed in a drying section 3 of a washing apparatus, and sequentially move forward and backward between the respective drying position and the workpiece delivery position 3A at which workpieces are delivered to a transfer mechanism 6.

Abstract: Apparatus for cleaning disks during processing. The apparatus is used with a disk processing system having a conveyor belt for transporting a disk carrier containing disks. The conveyor belt and the disk carrier have openings therein. A cleaning station is disposed above the conveyor belt and has an opening therein that isolates the cleaning station from the processing system. The cleaning station has a recirculating blower system, a laminar flow screen, a HEPA filter, and a ducting system for recirculating purified air or inert gas. A carbon dioxide jet spray cleaning system is provided that has a plurality of sets of jet spray nozzles disposed in the cleaning station that are coupled by way of manifolds to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the nozzles.

Abstract: A substrate washing apparatus includes a bath, a washing solution supply source, a first path for allowing the washing solution overflowing from the bath, a rinse solution supply source, a second path for passing the rinse solution, a common path communicating with the first and second paths and also with a bottom of the bath, a first valve, a second valve, a discharge path branched from the first path, and a control section, wherein the first valve includes a first body for opening/closing the first path, a third path arranged parallel to the first path and having a diameter smaller than a diameter of the first path, and a second body for opening/closing the third path, so that the first body is opened and the second body is closed, to allow the washing solution to flow into the bath, and on the other hand, the first body is closed, the second body is opened, to allow the rinse solution to flow into the bath, and the washing solution remaining in the first and third paths is discharged together with the rins

Abstract: A decontamination system for particulate matter is provided. The system has a fluid treatment chamber within which three screw-type augers operate to mix hydrocarbon laden soil with treating fluid for removing the hydrocarbon therefrom. The treating fluid is maintained in a fluid reservoir and is circulated into and out of the treatment chamber. The fluid is heated by a direct and an indirect heater. The hydrocarbons are released from the soil and allowed to float to the top where they collect and are removed for recycle or disposal. The decontaminated soil is removed from the treating fluid by a drag slat conveyor that permits excess treating fluid to drain therefrom and be collected for reuse in the decontamination system. A cyclone separator is included to spin off suspended fines within the recovered treating fluid. Optionally, a fluid press may be employed to compress additional amounts of treating fluid from the decontaminated matter.

Abstract: An automated means for hydrating a molded hydrophilic contact lens is provided in which a first robotic assembly removes a plurality of contact lens molds from a production line carrier, each of the lens molds having a contact lens adhered therein. The first robotic assembly transports the molds to a first staging area where the lens molds are sandwiched between a lens mold carrier and a top chamber plate to form a first hydration carrier. A first rotary transfer device then hands the first hydration carrier to a second robotic assembly which immerses the first hydration carrier in a hydration bath to hydrate the lens and to release the lens from the lens mold. While the lens is immersed in the hydration bath, each lens is transferred from its respective mold to a lens transfer means found within the top chamber plate.

Abstract: An apparatus and method for removing hydrocarbons from soil is disclosed. A gradient force machine pulverizes contaminated soils, which are then mixed with release agents in a mixing tank. A water-filled separation unit receives the mixed soil, the unit having a plurality of counter-rotating augers to aid in the breakdown of the mixed soil to solid, water and hydrocarbon components. A washing container receives the solid component from the separation unit, the container having a diagonally-disposed, enclosed auger for outputting a washed solid component. Hydrocarbons that have floated to the top of the separation unit and washing container are removed by a vacuum system.

Abstract: A steam drying apparatus in which a process chamber is fitted at a loading opening with a lid which is closed from above. The inner side wall surface of the process chamber has a first surface formed in the lower part thereof and is substantially in parallel with the inner wall surface of the lid, and a second surface extending from the upper end part of the first surface and bent outwards to face the inner wall surface of the lid. The second surface is provided with a steam supply port for supplying the processing solution vapor into the process chamber. To the steam supply port is connected a steam supply means for supplying the processing solution vapor into the process chamber.

Abstract: A loader station of substrate treating apparatus receives a transport cassette from a preceding stage. This transport cassette stores a plurality of substrates to be treated, arranged with a predetermined spacing therein. An empty processing cassette stands by at the loader station when the transport cassette arrives. The processing cassette is constructed to store the plurality of substrates arranged with a storage spacing that is independent of the storage spacing in the transport cassette but is optimal for surface treatment in the apparatus. In the loader station, a loader substrate transport robot transfers the substrates to be treated from the transport cassette to the empty processing cassette while absorbing any difference that may exist between the storage spacings of the respective cassettes.

Abstract: An apparatus is provided for removing and transporting articles, such as contact lens sections from a manufacturing line to inspection and packaging stations. The lenses are deposited in a transparent plastic primary package which carries the lenses through the inspection station and becomes part of the primary package when a cover is sealed thereto. The invention includes various assemblies, including lens transfer assemblies, deionized water filling and removal assemblies, a water degassing assembly, a lens inspection assembly, and a lens package sealing assembly. The lenses are removed from pallets at a post hydration station, transported and spatially redistributed, and deposited in the primary packages disposed on a second set of pallets. The packages on the second set of pallets are filled with degassed deionized water. The contact lenses and packages are then transported to an inspection station.

Abstract: A single wafer processing apparatus includes a portable processing head that can be a portable module or a movable unit mounted to a supporting machine frame. The processing head has movable fingers adapted to grip a wafer. The fingers protrude from a protective wafer plate. Indexing and rotation monitoring assemblies are provided for automation of the wafer processing steps. A complementary processing base includes an upwardly-open bowl that receives a wafer held by the portable processing head. It has a full-diameter movable bottom wall for rapid draining purposes. Liquid and/or gas jets and nozzles supply fluids required within the bowl for processing of wafers.

Abstract: A carrying apparatus comprising an endless roller chain belt that moves on a circular track and includes a plurality of fixture plates. Each fixture plate has several interrupted slot lines each of which comprises vertically elongate lower, middle and upper slot sections, and a work holding device formed with a resilient coil section intermediate a fixing section at an upper end and a work holding section at a lower end. The work holding device being engaged with the slot line such that the coil section seats within the middle slot section and the fixing and work holding sections extend respectively through the upper and lower slot sections to hold a workpiece between the holding section and an edge of the fixture plate. The middle slot section being skewed at an inclined angle with the upper and lower slot section having vertical axes parallel to and spaced one from the other.

Abstract: The water is removed from food product pouches which have passed through a water bath by advancing the pouches in a continuous stream on a first tray which is vibrated with respect to a frame. The pouches are advanced beneath an air manifold which discharges air onto the pouch to blow moisture downwardly. An air outlet is formed in the tray beneath the air manifold, and air is drawn therethrough. The reduced pressure produced by the partial vacuum restrains the pouch from upstream motion, and serves to draw away the water which has been detached from the pouch. A second vibrating tray is positioned to receive pouches discharged from the first tray. An inclined ramp flips the pouches as they travel between the trays to present the underside of the pouch for drying. Once flipped the pouches progress along the second tray beneath a second air manifold and vacuum air outlet to complete the water removal prior to discharging the pouch from the apparatus.

Abstract: A cleaning and drying apparatus comprises a vessel having a closed bottom and a side wall extending upwardly from the circumference of the bottom. The vessel has an inlet for introducing the discrete parts on the bottom of the vessel and an outlet formed in an upper end of the side wall for removing the parts out of the vessel. A spiral track is formed on the interior surface of the side wall to ascend therealong in a spiral manner about a vertical center axis of the vessel from the bottom to the outlet. A liquid line is connected to supply a cleaning liquid into the vessel. An level controller is provided to keep a level of the cleaning liquid in the vessel well below the outlet in such a manner as to divide the length of the spiral track into a drying zone immersed in the cleaning liquid and a drying zone disposed above the level.

Abstract: A device and method for high speed production rates in the hydration of soft contact lenses. Such device and method includes the use robotic transfer equipment to transfer contact lens molds containing contact lenses to and from a hydration station and a flushing station.

Abstract: A manifold and valve block assembly, particularly for a bottle washer designed for plastic returnable bottles. The manifold and valve block assembly provides for the successive supply of a plurality of different cleansing and sanitizing solutions, and also for residual fluid removal and drying, to an internal spray nozzle positioned within a bottle being cleaned, and also to spray nozzles positioned externally of the bottle. The internal spray nozzle is mounted on a lance which is driven by different fluids between a fully retracted position within the valve block assembly and a fully extended position in which it is positioned within a bottle being cleaned. The lance is longitudinally movably positioned within a drive cylinder, and has a central fluid flow passageway which communicates with the spray nozzle mounted on the upper end thereof.

Abstract: A process and apparatus for the remediation of soil is provided with a plug flow of soil and counter-current wash of water. The contaminant-containing soil with water is first treated to disengage the contaminant from the soil and form a liquid phase containing water and contaminant. The treated soil and liquid phase is continuously introduced into a wash zone at a first end of the wash zone, and the soil and the liquid phase are conveyed in successive and discrete portions through the wash zone between the first end of the wash zone and a second end of the wash zone to provide an essentially plug-flow of the soil through the wash zone.

Abstract: A handling mechanism for workpiece fastening pallets (1), comprising fastening means (4') for fixing a pallet (1) to the handling mechanism and a wash basin (8) as well as a wash liquid circulating system (9-12). The fastening means (4') is a part of a rotary table (4) which is journalled to a turntable 3, having its horizontal turning axis (6) positioned such that a rotation axis (B--B) of said rotary table (4) can be pivoted from a vertical position to a horizontal position. In the latter position, the pallet (1) together with its workpieces (2) is located above the wash basin (8) and is rotatable around horizontal axis (B--B). The wash basin (8) is provided with an openable and closeable cover (16). Adjacent the wash basin (8) is positioned a robot (24) having a workhead (25) which is pivotable to a position above pallet (1) lying over the wash basin for burring said workpieces (2 ) and/or for replacing finished and washed workpieces (2) with others to be worked on.

Abstract: A high-speed bottle washing machine provides concurrent rotational motion to a workpiece as it is conveyed through a washing treatment zone for internal and external spray treatments. The machine comprises a plurality of moving bottle receiving stations for sequentially receiving and rotating inverted bottles received from a bottle infeed conveyor, a plurality of reciprocating spray nozzles, with at least one spray nozzle moving with each bottle receiving station, wherein each of the spray nozzles reciprocates from a first position below the inverted bottles, to a second position within the bottles, and a manifold assembly for sequentially supplying a caustic wash fluid under pressure to each of the plurality of spray nozzles to clean the bottles by impingement of the wash fluid in a predetermined pattern within the bottles as the bottles are rotated. The washed bottles are finally discharged at a bottle outfeed conveyor.

Abstract: A cleaning apparatus for ultrasonically cleaning workpieces has an array of juxtaposed tanks including an ultrasonic cleaning tank, and a plurality of supports associated with the respective tanks for vertical movement between lower positions in the tanks and upper positions above the tanks. The tanks are separably joined so that they are selectively replaceable with other tanks. The supports support workpieces processed in the tanks, respectively, for sliding movement toward adjacent ones of the tanks. A lifting and lowering mechanism simultaneously lowers the supports into the tanks, respectively, to allow the workpieces to be processed in the tanks, and simultaneously lifts the supports from the lower positions in the tanks up to the upper positions above the tanks after the workpieces supported on the supports lowered in the tanks are processed in the tanks.

Abstract: A control system for a high-speed rotary washer spraying system designed particularly for plastic returnable bottles automatically regulates each process of the wash spraying system, namely, sequentially feeding bottles from an infeed conveyor means, inverting them by a worm/inverter means, receiving and simultaneously rotating each bottle in an inverted position through a plurality of washing, neutralizing and sanitizing treatment zones, and inverting each bottle to its original neck-up orientation for further processing. During the entire process, a programmable logic controller maintains, manages, and controls all pumps, valves, solenoids, and drive motor speeds as required by the process, and also provides for monitoring and adjusting fluid levels, alkalinity/acidity concentrations, and temperatures of the wash and neutralizing solutions.

Abstract: In an automatic bottle washing machine, a nozzle spray system for spraying an internal bottom surface of a bottle or container that is rotatable about its central vertical axis. The nozzle spray system includes a nozzle body having a centralized bore for receiving pressurized fluid, a plurality of discharge orifices located in a staggered, spaced apart pattern on the surface of the nozzle body, and a plurality of elongated microbores to connect a respective one of the plurality of discharge orifices to the centralized bore. When the nozzle body is positioned within an invertedly positioned bottle, cleaning fluid is discharged from the plurality of discharge orifices in well focused jets toward adjacent regions of the internal bottom surface of the bottle.

Abstract: A thermal processing station is provided with a first conveyor that conveys a wafer from a first conveyor access portion and a second conveyor that conveys another wafer from a second conveyor access opening portion. The wafer conveyed from the first conveyor is conveyed along a route consisting of the second conveyor, a washing portion, the second conveyor again, the first conveyor, and a thermal processing portion. On the other hand, the wafer conveyed from the second conveyor is conveyed along a route consisting of the washing portion, the second conveyor again, the first conveyor, and the thermal processing portion. An intermediate transfer portion that is free to rotate and rise and lower is provided between the first and second conveyor. A control section does not rotate the intermediate transfer portion while the wafer is being transferred along the former route, but it does rotate the intermediate transfer portion through 180.degree.

Abstract: Semiconductor processing equipment includes an ID-card removing robot, an ID-card stocking device, and an ID-card attaching robot so that the management of ID cards is performed inside the equipment. Thus, the present invention makes it possible to reduce equipment size and achieve highly efficient factory automation. Furthermore, in a semiconductor processing equipment module according to the present invention, each item of semiconductor processing equipment has its own ID-card stocking device. As a result, the number of case carriers can be reduced and a space reduction with increased factory automation can be easily realized.

Abstract: A transportable cleaning apparatus for cleaning a part at a location where the part to be cleaned is used. The cleaning apparatus includes an enclosure for containing a cleaning solution. The apparatus further includes devices for introducing the cleaning agent into the enclosure and for removing the spent cleaning agent from the enclosure. Precleaning and post-cleaning workstations may also be utilized.

Abstract: A washing apparatus includes plural washing vessels each containing a solution for cleaning or washing wafers, a boat housed in each washing vessel to support the wafers and immersed together with the wafers in the chemical solution, and a carrier for carrying the wafers into and out of its corresponding washing vessel. The carrier has a fork for supporting the wafers and loading and unloading them to and from the boat. It further has nozzles for washing and drying the fork.

Abstract: The present invention relates to a method and an apparatus for automatically binding a silicon wafer to a carrier plate. In the binding method of the present invention, the wafer is positioned underneath the carrier plate and then lifted and bonded to the carrier plate, at or below atmospheric pressure: once this is accomplished the process returns to the previous pressure. In addition, in the apparatus which performs this process, by means of a carrier means which supplies the carrier plate and wafer to the location where binding is to be carried out, the binding surface of the carrier plate and wafer are turned upward, transported and the carrier plate is flipped around in the interval between the carrier plate transportation apparatus and the binding unit.

Abstract: A washing apparatus comprises a loader, unloader, and three washing units (i.e., a carry-in side unit, a carry-out side unit, and an intermediate unit) arranged between the loader and unloader. Each unit has two washing sections for performing batch treatment of wafers, and a rotary transfer arm. An underwater loader is provided between each pair of adjacent washing units. Each of the washing sections and underwater loaders has a vessel and a case housing the vessel. The case is provided with a shutter and an air curtain at an opening thereof for isolating the atmosphere therein from the outside thereof. The loader, unloader, washing sections, and underwater loaders are located around the rotational axis of the rotary transfer arm such that each adjacent two are arranged substantially at right angles to each other, which enables the device to be made compact and to have high treatment efficiency.

Abstract: A cleaning device in the present invention comprises cleaning chambers each for cleaning subjects to be cleaned, transport units for transporting the subjects, transport chambers each having one of the transport units, first decompression means for decompressing each of the transport chambers to keep its internal atmospheric pressure lower than the external atmospheric pressure of the cleaning device by 0 through 0.02 mmH.sub.2 O, and second decompression means for decompressing each of the cleaning chambers to keep its internal atmospheric pressure lower than the internal atmospheric pressure of each of the transport chambers by 0 through 0.02 mmH.sub.2 O.