Abstract: A substrate processing apparatus includes a liquid processing tank, and a hydrophobizing gas supply unit. The liquid processing tank stores a processing liquid and dips a plurality of substrates in the processing liquid to liquid-process the plurality of substrates. The hydrophobizing gas supply unit supplies a gas of a hydrophobizing agent to the plurality of substrates after liquid processing thereof.

Abstract: A cleaning system (110) is proposed for cleaning articles (112) to be cleaned. The cleaning system (110) comprises: a) at least one cleaning device (116), comprising at least one cleaning chamber (120) and at least one application device (122) for applying at least one cleaning fluid to the articles (112) to be cleaned in the cleaning chamber (120); and b) at least one transport system (118), comprising a plurality of transport segments (124) for receiving the articles (112) to be cleaned, wherein the transport segments (124) are guided such that they can be transported through the cleaning chamber (120) in circulation in a transport direction (114), wherein the transport system (118) also comprises at least one transport device (134) for driving the transport segments (124).

Abstract: According to an embodiment, a substrate cleaning device includes a processing tank, at least one spray tube, and a scanning mechanism. The processing tank can accommodate a plurality of substrates arranged in a thickness direction of the substrates. The spray tube extends in the thickness direction and is configured to emit a cleaning liquid to each substrate accommodated in the processing tank. The scanning mechanism is configured to move the spray tube along an outer periphery of the substrate to perform a scan.

Abstract: There is provided a drying apparatus for covering an upper surface of the substrate with an uneven pattern formed thereon with a liquid film and subsequently drying the substrate, including: a first heat transfer part whose temperature is adjusted to a first temperature, wherein a first heat is transferred between the first heat transfer part and the substrate by a first temperature difference; a second heat transfer part whose temperature is adjusted to a second temperature different from the first temperature, wherein a second heat is transferred between the second heat transfer part and the substrate by a second temperature difference; and a controller configured to control the first temperature and the second temperature and to control a surface tension distribution of the liquid film so as to control an agglomeration of the liquid film.

Abstract: Provided is sensor built-in filter structure arranged in a wafer accommodation container, comprising: a first filter; a second filter arranged closer to a wafer accommodation chamber of the wafer accommodation container than to the first filter; and a gas detection sensor arranged between the first filter and the second filter to detect a state of a gas.

Abstract: An automated can adjustment system for a can cleaning system and associated method is disclosed. The automated can adjustment system can store different stage height information corresponding to various cans with different heights in a controller. The stage height information corresponding to the different can heights is associated with and recallable by various preset buttons operatively coupled with the controller. The controller is configured to communicate with the one or more drive mechanisms to adjust one or more stage heights based on the stage height information recalled when a particular preset button is selected. Different stage heights may be changed by then selecting a different preset button associated with a can having a different height.

Abstract: A substrate cleaning method includes: sequentially loading each of a plurality of substrates, one substrate substantially immediately after a preceding substrate, into an input unit, in which adjacent substrates of the plurality of substrates are spaced apart from each other by a predetermined first interval; sequentially transferring each of the plurality of substrates in which adjacent substrates of the plurality of substrates are separated by a predetermined second interval that is greater than the predetermined first interval; cleaning each of the plurality of substrates in a cleaning unit; and aligning, in an output unit, adjacent substrates to be separated by the predetermined first interval.

Abstract: Provided are a cleaning device and a method for driving the cleaning device which cleans a wafer after chemical mechanical polishing. The cleaning device includes a cleaning modules and a running beam, the running beam including a first blade and a second blade to insert or remove the wafer with respect to one of the cleaning modules in a second direction, the first blade and the second blade being fixed to the running beam and movable in the second direction, and the cleaning modules including an input module, a megasonic module, a first brush module, a second brush module and a drying module. The driving method includes performing an operation of inserting or removing the wafer in the second direction using the first blade in a first area; and performing an operation of inserting or removing the wafer in the second direction using the second blade in a second area.

Abstract: A method for processing textile fibers is provided. The method comprises: adding a plurality of raw materials for processing textile fibers into a plurality of kettles; preparing supercritical carbon dioxide; obtaining one or more natural plant dyes and one or more natural plant extracts from the plurality of raw materials, and dissolving the one or more natural plant dyes and the one or more natural plant extracts in the supercritical carbon dioxide; dyeing and functionally modifying the textile fibers simultaneously by using the supercritical carbon dioxide carrying a mixture of the one or more natural plant dyes and the one or more natural plant extracts; performing a post-process to recycle the supercritical carbon dioxide; and performing a cleaning process to clean the one or more natural plant dyes and one or more natural plant extracts.

Abstract: An automated can adjustment system for a can cleaning system and associated method is disclosed. The automated can adjustment system can store different stage height information corresponding to various cans with different heights in a controller. The stage height information corresponding to the different can heights is associated with and recallable by various preset buttons operatively coupled with the controller. The controller is configured to communicate with the one or more drive mechanisms to adjust one or more stage heights based on the stage height information recalled when a particular preset button is selected. Different stage heights may be changed by then selecting a different preset button associated with a can having a different height.

Abstract: A cleaning device is configured to include a first cleaning tank that holds water to which a small amount of an additive is added as a first cleaning fluid, a second cleaning tank that holds water, a water-based cleaning agent, an alkaline cleaning fluid, or a hydrophilic organic solvent as a second cleaning fluid, a first microscopic air bubble generation device, a first circulating pump, an ultrasonic wave emitting device, and a carrier device. Hydrophobic oil is removed by a cleaning target being exposed to the first cleaning fluid including microscopic air bubbles sprayed from a nozzle in an interior of the first cleaning tank, after which hydrophilic oil is removed by ultrasonic cleaning in the second cleaning tank.

Abstract: Sterilization apparatus for sterilizing packaging containers, the sterilization apparatus comprising a first carousel for supporting a plurality of sterilization devices, the sterilization devices being adapted to sterilize an interior of the packaging containers by electron beam irradiation, and a transport system for transporting the packaging containers, the transport system comprising a second carousel coaxial with the first carousel, wherein the first carousel comprises a first rotatable shaft and the second carousel comprises a separate second rotatable shaft coaxial with the first rotatable shaft.

Abstract: A gas separation membrane module includes a seal between a higher pressure gas and a lower pressure gas. The seal includes a compressible sealing member in between sealing surfaces. At least one of the sealing surfaces has corrosion-resistant cladding provided over either low alloy steel or high alloy steel. The cladding reduce the possibility of a seal failure due to corrosion of low alloy or high alloy steel exposed to acid gases or condensed moisture containing acid gases dissolved therein while at the same not requiring that all surfaces of the membrane module exposed to acid gases be provided with cladding.

Abstract: A gas separation membrane module includes a seal between a higher pressure gas and a lower pressure gas. The seal includes a compressible sealing member in between sealing surfaces. At least one of the sealing surfaces has corrosion-resistant cladding provided over either low alloy steel or high alloy steel. The cladding reduce the possibility of a seal failure due to corrosion of low alloy or high alloy steel exposed to acid gases or condensed moisture containing acid gases dissolved therein while at the same not requiring that all surfaces of the membrane module exposed to acid gases be provided with cladding.

Abstract: An embodiment of the present invention provides a vacuum drying apparatus and a vacuum drying method. The vacuum drying apparatus includes a chamber in which a substrate table is arranged, the chamber being provided with a wind deflector therein, wherein the wind deflector comprises a top opening, a bottom opening and a body part connecting the top opening with the bottom opening. During the vacuum drying, the bottom opening is in tight contact with a surface of the substrate table, and there is a gap between the top opening and the top of the chamber and a material on the substrate table is covered by the wind deflector.

Abstract: Provided are a display apparatus and an apparatus and method of manufacturing the display apparatus. The apparatus for manufacturing a display apparatus includes: a dry cleansing unit configured to remove impurities from a surface of a mother substrate; an electrolyte treatment unit connected to the dry cleansing unit and configured to treat the surface of the mother substrate with electrolytes; and an exfoliated layer forming unit connected to the electrolyte treatment unit and configured to form an exfoliated layer on the mother substrate.

Abstract: Provided are an apparatus for treating a substrate and a method for discharge a supercritical fluid, and more particularly, an apparatus for treating a substrate using a supercritical fluid and a method for discharging the supercritical fluid using the same. The apparatus for treating the substrate includes a container for providing a supercritical fluid, a vent line through which the supercritical fluid is discharged from the container, and a freezing prevention unit disposed in the vent line to prevent the supercritical fluid from being frozen.

Abstract: Provided are an apparatus and method for treating a substrate, and more particularly, to an apparatus and method for treating a substrate using a supercritical fluid. The apparatus for treating a substrate includes a process chamber in which an organic solvent remaining on a substrate is dissolved using a fluid provided as a supercritical fluid to dry the substrate and a recycling unit in which the organic solvent is separated from the fluid discharged from the process chamber to recycle the fluid.

Abstract: A conveyor belt washer/dryer that includes a housing, which encloses a washing station separated by one or more spray barriers from a drying station. The housing has a passage that is sized and configured to allow the conveyor belt to successively pass through the washing station and the drying station. The washing station includes one or more washing heads, a splash plate and a reservoir. The washing heads discharge a wash liquid onto the top surface of the conveyor belt and the splash plate redirects the wash liquid onto the bottom surface. The reservoir collects the spent wash liquid. The drying station includes one or more air knife/knives that discharge(s) pressurized air onto the conveyor belt to dry the belt.

Abstract: A method for processing a plurality of substrates after forming a photosensitive film on each substrate includes carrying each substrate into a placement buffer including a plurality of supporters by a first transport mechanism; taking out each substrate from the placement buffer to an interface by a second transport mechanism; carrying each substrate into the exposure device; carrying each substrate out of the exposure device into the placement buffer by the second transport mechanism; taking out each substrate from the placement buffer to the processing section by the first transport mechanism; performing development processing on each substrate; making each substrate stand by at the placement buffer based on timing at which the exposure device can accept each substrate; and making each substrate stand by at the placement buffer based on timing at which the developing device can accept each substrate.

Abstract: Damage to a substrate in a substrate processing apparatus is effectively suppressed. The substrate processing apparatus includes a polishing unit polishing a substrate, a cleaning unit cleaning and drying the substrate polished by the polishing unit, and a conveying unit conveying the substrate in the polishing unit and the cleaning unit. The substrate processing apparatus further includes a measuring section 5A measuring a standby time of each substrate for which the substrate stands by in each of the polishing unit, the cleaning unit and the conveying unit, and a determining section 5B comparing the standby time measured by the measuring section 5A and a set time set for each unit independently and determining that an error occurs if the standby time exceeds the set time.

Abstract: Provided is a substrate processing apparatus wherein, even if a trouble occurs, it is bound to continue a process for the substrate without stopping the substrate processing apparatus entirely. The substrate processing apparatus according to the present disclosure includes first and second substrate conveying devices configured to convey wafers, and first and second processing blocks provided on the right and left sides of the substrate conveying device and having processing unit arrays each configured to perform the same process. Processing unit arrays on one side and processing unit arrays on the other side are respectively connected to a processing liquid supply system commonly provided with them. And, when any one of substrate conveying devices, processing liquid supply systems has a problem, the process for the wafer can be performed in the processing unit array to which the substrate conveying device and the processing liquid supply system under normal operation belong.

Abstract: A process for treating a substrate comprised of sorptive material is provided herein. The sorptive material may be an absorbent synthetic material such as polyester. The material is designed to be used for cleaning surfaces in an ultraclean environment. The process first comprises unwinding a roll of sorptive material as a substrate into a cleaning system. The cleaning system utilizes several sections. These include a pre-washing section, an acoustic energy washing section, and a drying section. Preferably, the process of moving the substrate through the cleaning system is continuous. The acoustic energy washing section employs one or more acoustic energy generators. In one aspect, the process also includes cutting the substrate into sections to form wipers after moving the substrate through the drying section. Thereafter, the wipers are placed into a bag and the bag is sealed. An integrated treating system for a sorptive material is also provided herein.

Abstract: A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including: a first concave member that is provided above the susceptor and open toward the one surface, thereby defining a space of an inverted concave shape, a second concave member provided over the first concave member to define a gas passage between the first concave member and the second concave member, a cleaning gas supplying portion configured to supply a cleaning gas to the space, and an evacuation pipe configured to be in gaseous communication with the gas passage and extend out from the chamber; and an evacuation opening provided in the chamber in order to evacuate the chamber.

Abstract: Systems and methods for recovering particulate matter washed from piece of construction equipment with water. Waste materials washed from the construction equipment are collected in a bin. The liquid in the bin is allowed to drain into a receptacle having a sloped bottom for conveying the liquid to a sump. The liquid in the sump is pumped to a first baffle box extending into a first settlement tank to remove a portion of the particulate matter in the liquid. The liquid cascades from the first settlement tank to a second baffle box extending into a second settlement tank to remove another portion of the particulate matter. The liquid is stored after removal of the portions of the particulate matter for recycling in a tank.

Abstract: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.

Abstract: Machine (10) and method for treating containers (12) of liquids comprising in succession at least a loading station (15), into which the containers (12) to be treated are loaded, and all disposed according to a determinate first orientation, and a washing station (17), in which the containers (12) are subjected at least to washing and are disposed in a second orientation able to promote the fall due to gravity of the dirt and/or washing liquid present in the containers (12). The machine (10) comprises, downstream of the washing station (17) and outside it, a manipulator device (41) which automatically rotates the containers (12) exiting form the washing station (17) so as to reposition the containers (12) according to the first determinate orientation.

Abstract: Disclosed is a polycrystalline silicon washing apparatus that sequentially immerses polycrystalline silicon into a plurality of acid baths each of which is filled with an acid to wash the polycrystalline silicon. The temperatures of the acids in the acid baths are set such that the temperature of the acid in a later acid bath of adjacent acid baths is equal to or lower than that of a former acid bath and the temperature of the acid in the last acid bath is lower than that of the acid in the first acid bath. Each of the acid baths is provided with a temperature adjusting unit that controls the temperature of the acid at a constant value.

Abstract: A disinfecting chemical bottle includes a bottle body including a storing section that stores a chemical used for cleaning/disinfecting an endoscope and a mouth portion including an opening portion from which the chemical freely flows out, a first conductive portion provided so as to be exposed in an inner portion and an outer portion of the bottle body, and a second conductive portion provided at a position different from that of the first conductive portion so as to be exposed in the inner portion and the outer portion of the bottle body, the second conductive portion being electrically connectable to the first conductive portion via the chemical in the bottle body.

Abstract: A tunnel washer that includes fluid exhaust paths that are optimized to minimize fluid transfer between chambers of the washer and minimize heat loss from each chamber of the washer. The fluid exhaust paths also facilitate uniform vapor evacuation from each chamber of the washer. The tunnel washer also includes spaced-apart double wall curtains for isolating chambers of the tunnel washer to prevent fluid and heat transfer therebetween, and to the exterior of the tunnel washer. The double wall curtains include surfaces that inhibit the curtains from sticking together during operation of the tunnel washer. The tunnel washer also includes an air manifold that provides uniform drying efficiency for articles of varying dimensions.

Abstract: A substrate processing device 100 includes a cleaning liquid supply unit 114 supplying a cleaning liquid to a surface of a substrate W, a solvent supply unit 115 supplying a volatile solvent to the surface of the substrate W supplied with the cleaning liquid to replace the cleaning liquid on the surface of the substrate W with the volatile solvent, a heating unit 117 heating the substrate W supplied with the volatile solvent, and a drying unit 118 drying the surface of the substrate W by removing a droplet of the volatile solvent produced on the surface of the substrate W by a heating operation of the heating unit 117, and the heating unit 117 and the drying unit 118 are arranged in a course of transportation of the substrate W transported from the solvent supply unit 115.

Abstract: A laser cleaning device, and a laser cleaning method using the same, for removing an electrolyte solution stuck to an electrolyte tab during a process of injecting the electrolyte solution are disclosed. The laser cleaning device for an electrode tab of a battery includes: a cleaning housing, in which a battery case for receiving an electrode group, an electrolyte solution and an electrode tab exposed to the outside are embedded; a laser generator which includes a laser source for generating a laser beam and an output controller for controlling output of the laser beam; a laser transmitter which transmits the laser beam generated by the laser generator; and a laser emitting unit which is installed inside the cleaning housing, and which irradiates the laser beam transmitted by the laser transmitter onto the electrode tab so as to remove liquid pollutants stuck to the electrode tab. The laser cleaning method comprises steps generally corresponding to the latter functions of the laser cleaning device.

Abstract: An apparatus for sterilizing cap-like container closures includes a transport system for moving closures through treatment zones. The first zone preheats the closures, the second exposes them to a sterilizing agent, and the third activates or dries them. The first and third zones each have a rotor that circulates about a rotor axis thereof, and closure holders formed on a periphery thereof for moving closures through the first zone from a closure pickup disposed therein to a first closure delivery position, and through the third zone from a second closure delivery position disposed therein to a closure discharge. The second treatment zone is between the first and second closure delivery positions such that closures delivered to the first position, after passing the second zone and after exposure to the sterilizing agent, are passed on to a closure holder ready at the second position of the rotor in the third zone.

Abstract: An exemplary cleaning apparatus includes a cleaning member, a connecting member, a drying member, and a workpiece holder. The connecting member includes a main housing defining two opposite surfaces and two blocks received in the main housing. The main housing defines a first chamber and two second chambers communicating with the first chamber, each of the second chambers extending through to one of the two opposite surfaces and near to the other opposite surface. The cleaning member and the drying member are connected to the two opposite surfaces and communicate with each other via the first chamber. The two blocks are movable between the first chamber the second chambers, respectively. Each block defines an engaging surface, facing the other engaging surface. When the blocks move into the first chamber and the engaging surfaces engage with each other, the blocks shut off communication between the cleaning member and the drying member.

Abstract: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units. Reversing units for reversing the substrate W are provided one above the other between the indexer block and the processing block. For example, one reversing unit is used for reversing the substrate before a back surface cleaning processing by the back surface cleaning unit or for other purposes, and the other reversing unit is used for placing the substrate W after a top surface cleaning processing by the top surface cleaning unit or for other purposes.

Abstract: A foreign matter removal device 10 preliminary cleans the work 50 in a bucket 12 housed in an input tank 15, then further cleans the work 50 in buckets 13, 14 housed in cleaning tanks 16, 17 by agitating cleaning liquid while inverting the buckets to transfer the work to a subsequent bucket. Particularly, the bottom of the cleaning tank is formed such that the nearer to a center of the bottom, the deeper the bottom becomes. The cleaning liquid overflowing from the cleaning tanks are stored in auxiliary tanks 22, 23. First and second ejection units 29a, 29b are arranged at different heights in the cleaning tank to generate a circulating flow in the cleaning liquid.

Abstract: A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor can include a reaction chamber having an interior and an entry port for insertion and removal of substrates, a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form a deposit on substrates held within the interior, a shutter mounted to the chamber, and one or more cleaning elements mounted within the chamber. The shutter can be movable between (i) a run position in which the cleaning elements are remote from the exhaust channel and (ii) a cleaning position in which the one or more cleaning elements engage with the shutter so that the cleaning elements remove deposited particles from the shutter upon movement of the shutter to the cleaning position.

Abstract: One processing block is arranged between an indexer block and another processing block. One substrate is transported to a main transport mechanism in the one processing block by a main transport mechanism in the indexer block, transported to a first processing section and a thermal processing section by the main transport mechanism in the one processing block and processing is performed on the substrate. The substrate after the processing is transported to the main transport mechanism in the indexer block by the main transport mechanism in the one processing block. Another substrate is transported to a sub-transport mechanism in a sub-transport chamber by the main transport mechanism in the indexer block, and is transported to a main transport mechanism in another processing block by the sub-transport mechanism in the sub-transport chamber.

Abstract: By a first transport robot, n substrates are unloaded from a first retaining portion, then simultaneously transported, and respectively loaded into n substrate holders consecutively arranged from one side defined with respect to an arrangement direction. Thereafter, a rotation mechanism rotates n+m substrate holders so as to perform a substrate inverting operation and so as to arrange the n+m substrate holders along the arrangement direction in an arrangement sequence reverse to a pre-rotation arrangement sequence. Thereafter, the n substrates loaded into the n substrate holders are unloaded in a group of m in a sequence from the one side, and loaded into a second retaining unit by a second transport robot. After the substrate inverting operation, n substrates are unloaded from the first retaining unit, and loaded again into n substrate holders consecutively arranged from the one side by the first transport robot.

Abstract: Embodiments of the invention generally relate to a method of cleaning a substrate and a substrate processing apparatus that is configured to perform the method of cleaning the substrate. More specifically, embodiments of the present invention relate to a method of cleaning a substrate in a manner that reduces or eliminates the negative effects of line stiction between semiconductor device features. Other embodiments of the present invention relate to a substrate processing apparatus that allows for cleaning of the substrate in a manner that reduces or eliminates line stiction between semiconductor device features formed on the substrate.

Abstract: In a substrate processing apparatus 1 which performs a process on a substrate W, each of multiple processing modules 2 includes at least a first processing member 21 and a second processing member 22, and substrate transfer devices 15 and 17 transfer substrates W into the multiple processing modules 2. Further, a controller 3 configured to control the substrate processing apparatus 1 stores member operating possibility information on whether it is possible to use the first processing member 21 and the second processing member 22 provided in each of the multiple processing modules 2, and the controller 3 creates, based on the member operating possibility information and process recipe information on processes to be performed on the substrates W, a transfer schedule in which the substrate transfer devices 15 and 17 transfer the substrates W into the multiple processing modules 2 in parallel.

Abstract: A pallet drying device promotes drying after washing of a pallet including a fork insertion hole into which a fork is inserted on a side surface and an opening communicating with the fork insertion hole on a lower surface. The pallet drying device includes: pallet placing means capable of placing the pallet to be dried so as to mechanically block the opening; and blowing means for blowing air into the inside of the fork insertion hole. The pallet is placed with the opening on the lower surface blocked while air is blown into the fork insertion hole, thus the air blown into the fork insertion hole is not discharged from the opening. This configuration promotes drying the inside of the fork insertion hole.

Abstract: Semiconductor processing equipment. At least some of the illustrative embodiments are systems including: a front end robot configured to pull individual wafers from at least one wafer carrier; a linear robot in operational relationship to the front end robot, the linear robot configured to move wafers along an extended length path; and a first processing cluster in operational relationship to the linear robot. The first processing cluster may include: a first processing chamber; a second processing chamber; and a first cluster robot disposed between the first and second processing chambers. The first cluster robot is configured to transfer wafers from the linear robot to the processing chambers, and configured to transfer wafers from the processing chambers to the linear robot.

Abstract: A pallet wiping device that promotes drying after washing of a pallet includes a pallet placement unit on which a pallet is placed, and a wiping unit including a water-absorbing portion formed of a water-absorbent material, an arm supporting the water-absorbing portion and connected to a cylinder, and a cylinder. The cylinder moves the arm reciprocally along a direction in which a fork insertion hole extends while bringing the water-absorbing portion into contact with the inner wall surface of the fork insertion hole. Accordingly, water left in the fork insertion hole of the pallet after washing can be removed. In addition, the pallet can be dried at low cost because removal of water in the interior of the fork insertion hole is implemented without using heat.

Abstract: An interface block is constituted by a cleaning/drying processing block and a carry-in/carry-out block. The cleaning/drying processing block includes cleaning/drying processing sections and a transport section. The transport section is provided with a transport mechanism. The carry-in/carry-out block is provided with a transport mechanism. The transport mechanism carries substrates in and out of an exposure device.

Abstract: A substrate processing apparatus is provided including: a liquid processing unit that processes a substrate with a processing liquid; a carry-in port formed in the liquid processing unit and configured to carry-in the substrate in a dry-state before the substrate is processed with the processing liquid; a carry-out port formed in the liquid processing unit and configured to carry-out the substrate in a wet-state after completing the liquid processing; a supercritical dry processing unit that performs a dry processing for the substrate using a supercritical fluid; a first substrate transport unit that transports the substrate in a dry-state before the substrate is processed with the processing liquid to the carry-out port of the liquid processing unit; and a second substrate transport unit that transports the substrate in a wet-state after completing the liquid processing from the carry-out port of the liquid processing unit to the supercritical dry processing unit.

Abstract: A conveyor warewasher (1) which having at least one washing zone (6, 7, 8, 9), at least one rinsing zone (10) and at least one drying zone (26) and also a control device (36). In order to achieve an effective cleaning and drying of the washware, along with as low a consumption as possible of resources in terms of water, chemicals and, in particular, energy, there is provision for the control device (36) to be designed for selecting a previously defined or definable program sequence at least in the at least one drying zone (26) and for setting the process parameters associated with the selected program sequence automatically as a function of the conveying speed at which the washware is conveyed through the treatment zones (6, 7, 8, 9, 10, 26) of the conveyor warewasher (1).

Abstract: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back

Abstract: A method for cleaning dinnerware includes the steps of aligning and/or registering items to be cleaned from a standby zone, moving the items continuously from the standby zone one by one into a wash zone in a way that the items each have a cleaning posture relative to a path along which the items march, washing the items processionally by using cleaning fluid, and sorting or collecting the items in order for reuse by diners directly. The dishwasher employing the aforesaid method has functions of auto-collecting and washing the to-be-cleaned dinnerware and sorting or collecting thus obtained dinnerware, and is compact in size such that the dishwasher can be directly installed at a location in proximity to a dining area for enabling the diners to conveniently take out the newly cleaned dinnerware at any time. The dishwasher has a good cleaning efficiency and a low operating cost.

Abstract: Disclosed is a method and a respective apparatus for ultrasonic wet treatment of a plate-like article, which comprises: bringing a solid element, which is connected to a transducer in close proximity to a surface of a plate-like article so that a gap is formed between the solid element and the plate-like article, the gap having a distance d2 between 0.1 mm and 5 mm, dispensing liquid for filling the gap between the solid element and the plate-like article, and detecting ultrasonic waves and/or controlling the distance d2, by measuring the distance d2, comparing the measured distance with a desired distance d0 and adjusting the distance accordingly.