Abstract: A method of washing a glass surface, such as, for example, a windshield or other vehicle window includes adjusting emission of a washing liquid relative to a wiper stroke cycle. The washing liquid is emitted from a plurality of positions arranged on a swinging wiper in a direction towards a forward-wiping side thereof, along the longitudinal direction of a blade rubber of the wiper. During a wiper stroke cycle, the washing liquid is emitted at least over a range of wiper travel extending from a forward swing starting point to a predetermined intermediate point located before a turning point of the stroke cycle where the forward swing ends and a backward return swing is commenced. In a further embodiment, a rate at which the washing liquid is emitted at the various emission points along the length of the blade rubber increases with an increase in the distance of a particular emission point as measured from the center of swinging rotation of the wiper.

Abstract: A method for cleaning an inner wall of a mold part includes forming a chamber between displaced mold parts by introducing a casing between the mold parts. The casing enclosures a blasting device for introducing a blasting nozzle which directs a cleaning jet at the inner wall. The chamber encapsulates noise and particles which are produced during the cleaning process.

Abstract: A method is provided for cleaning an electronic circuit board having first and second opposing surfaces. The method includes directing a stream of carbon dioxide particles against the first surface. Steam is sprayed toward the first and second surfaces such that condensation of the steam caused by cooling from the CO.sub.2 particles forms a thin film of water on the first surface for conducting electrostatic charge away from the first surface. The CO.sub.2 particles substantially remove residue present on the first surface, thereby cleaning the circuit board.

Abstract: A device for cleaning a barbeque grill is described comprising a block of ice having a wedge-shaped cross-section at one end and handle of temperature insulating material at the other.

Abstract: Various embodiments of a rod for cleaning and/or polishing embodiments of a ferrule in a fiber optic connector are disclosed. In a first embodiment, the rod is formed of an ultra high molecular weight polyethylene hydrophobic material, preferably absorbent. Each end of the rod has a hole that is a tight fit to the diameter of a male-type ferrule and is at least as deep as the length of the ferrule. The rod material is strong and pliable, so that after it is slipped over the male-type ferrule the rod can be rotated for cleaning the sides of the ferrule while being withdrawn from its snug fit with the ferrule. The holes may have polishing inserts formed therein. Alternatively, the rod has a male protrusion on one end. The male end inserts into the recess formed by the connector adaptor when using a female-type ferrule. The rod is then rotated to effect cleaning and/or polishing of the end face of the optical fiber together with cleaning of the insides surfaces of the side walls of the connector adaptor.

Abstract: A self-wringing absorbent device includes a handle (10) with a pair of brackets (12) extending from opposite ends. Each bracket terminates in an archway (16). The brackets are connected on opposite sides by first and second bases (14). A retraction bar (22) is mounted between the brackets for slidable movement towards and away from the handle. The retraction bar is mounted to a hinged platen (28) against which the bases bear and in which the hinge (30) is aligned with and substantially centered under the two archways. When the retraction bar is drawn towards the handle by the action of the fingers of the hand grasping the handle, the hinge of the platen is drawn upwards, the bases bear against the sides of the platen forcing them to fold about the hinge and be drawn into the archways, compressing a pad mounted to the platen. In an alternative embodiment, the absorbent device includes flared ends (43) on the brackets (42) extending from the handle (40).

Abstract: A rake is used to clean nap from between teeth of a nap grip located on the underside of a carpet stretcher. The rake generally has an elongated handle connected to a rake head. Multiple prongs are connected to a leading edge of the rake head. Each prong has a shaft with an end connected to the leading edge of said head and a gradual bend forming a pointed tip substantially perpendicular to the shaft. The prongs are equally spaced to align with alternate spaces of the carpet stretcher gripping element so that the prongs can be drawn along the alternate spaces to remove material from said carpet stretcher gripping element.

Abstract: The present invention relates to a cleaning composition having utility in eaning aircraft exterior surfaces. The cleaning composition comprises from about 15% to about 40% of a mixture of linear alcohol ethoxylates having a HLB in the range of about 5.0 to about 15.0, from about 5% to about 25% capric diethanolamide, and the balance water. The mixture of linear alcohol ethoxylates comprises from about 5% to about 15% of a first linear alcohol ethoxylate having a HLB in the range of about 5.0 to 9.5 and from about 10% to about 25% of a second linear alcohol ethoxylate having a HLB in the range of about 10 to 15. The cleaning composition also includes from about 0.1% to about 5% of capryloamphopropionate, from about 0.1% to about 5.0% benzotriazole, from about 0.1% to about 5.0% of an inhibitor for reducing corrosion of magnesium parts, and from about 0.1% to about 5.0% of an inhibitor for reducing corrosion of cadmium plated steel parts.

Abstract: The invention includes a water driven brush mechanism which is pivotally attached to a rigid hose. The rigid hose acts as a handle to the user and a conduit to supply water to the brush mechanism. The pivotal attachment allows the user to change the angle of the brush mechanism to the rigid pipe to facilitate the cleaning process. The rigid hose is attached to a flexible hose on the opposite end of the brush mechanism. The flexible hose in turn attaches to the faucet or shower head for the necessary water supply. The flexible hose is necessary to provide easy movement of the brush mechanism to a variety of positions with respect to the faucet or shower head. The flexible hose is also of sufficient length as to easily reach the desired surface to be cleaned. The flexible hose has a male threaded end cap which can engage with the threaded male end of a shower head by use of a coupling device.

Abstract: A coating apparatus has a nozzle for delivering a photo-resist liquid onto a semiconductor wafer supported by a spin chuck. The nozzle is movable between a supply position and a wait position. At the wait position, there are a roller which is rotatable in one direction and has a circumferential surface with thinner thereon, and a wiper for wiping the circumferential surface of the roller. While the nozzle is located at the wait position, a waiting mode is first performed, and a preparing mode is then performed immediately before the nozzle is moved from the wait position to the supply position. In the waiting mode, delivery of the photo-resist liquid from the nozzle is stopped and the wiper is located at a retreat position, such that a tip port of the nozzle is wetted by the thinner present on the circumferential surface of the roller.

Abstract: A method and apparatus for cleaning a spray stream nozzle employed in dispensing upon a photoexposed blanket photoresist layer formed over a semiconductor substrate a photoresist developer solution. There is first provided a spray stream nozzle having a minimum of one aperture formed therein. There is then provided through the spray stream nozzle a volume of a photoresist developer solution sufficient to develop a photoexposed blanket photoresist layer formed over a semiconductor substrate placed beneath the spray stream nozzle. Finally, there is provided then through the spray stream nozzle a volume of a solvent which is not susceptible to clogging the spray stream nozzle.

Abstract: This specification discloses an invention directed to an ultrasonic cleaning apparatus for cleaning a cleaning target. The ultrasonic cleaning apparatus includes a liquid discharge nozzle having a discharge port to discharge a liquid therethrough, an ultrasonic vibrator for applying ultrasonic vibrations to the liquid which is to be supplied to the nozzle, and a cleaning member which is mounted on the discharge port of the nozzle, vibrates while holding therein the liquid discharged through the discharge port, and comes into contact with the cleaning target with a predetermined area, thereby scrub-cleaning the surface of the cleaning target.

Abstract: A fiber optic connector cleaning process that is both field deployable, and achieves optical reflectance levels of -60 dB and lower. Specifically, the cleaning process according to the instant invention uses electrostatic dissipative (ESD) cleaning wipes along with an acidic detergent and deionized water to remove metallic and metal oxide particles bound to the connector by an electrostatic charge. Advantageously, the acidic detergent is both biodegradable and phosphate free and is therefore environmentally safe. Inasmuch as the instant invention avoids the use of lasers or other machinery, the process can easily be applied in a field setting.

Abstract: A method for treating and maintaining floors cleans the floor and restores an optimum coefficient of friction. The method involves a restoring phase and a cleaning phase, in which the cleaning phase is performed using the same solution as in the restoring phase, but in a diluted form. The method is applicable to cleaning solid hard floors such as those made of unglazed quarry tiles, glazed ceramic tiles and cement.

Abstract: A cleaning device includes a barrier having (1) a central axis, (2) a first barrier segment extending from the central axis, (3) a second barrier segment extending from the central axis, and (4) a third barrier segment extending from the central axis. The cleaning device also includes a first cleaning layer having a first layer front side and a first layer back side, the first layer back side being attached directly to the first barrier segment and the second barrier segment. The cleaning device further includes a second cleaning layer having a second layer front side and a second layer back side, the second layer back side being attached directly to the second barrier segment and the third barrier segment. In addition, the cleaning device includes a third cleaning layer having a third layer front side and a third layer back side, the third layer back side being attached directly to the first barrier segment. The cleaning device also includes a cleaning agent impregnated within the first cleaning layer.

Abstract: A portable golf ball washer is characterized by a container having a top end and a bottom end. A plunger is connected to the top end and is opposed by a return assembly mounted on the bottom end. The ball washer also has a scrubbing material inside the container. The plunger pushes a golf ball through and against the scrubbing material and then the return assembly automatically pushes the golf ball back through and against the scrubbing material to produce a clean golf ball. The ball washer may also include an ejection mechanism to facilitate removal of the golf ball from the ball washer, and the bottom end may be detached to facilitate cleaning and repairing the golf ball washer.

Abstract: Disclosed is an artists' easel which has a pivotally adjustable frame which carries the artists' canvas. A bag retaining assembly attached to the easel frame is adapted for a bag, e.g., a plastic garbage bag, to fit thereover with a apertured splatter panel covering the mouth of the bag. A beater bar inside the bag frame permits the artist to beat the paintbrush on the beater bar while the bag traps the solvent inside. The easel also is adjustable in height, and has provision for a tray, a paper towel holder, and a container holder (e.g., for solvent). Provision for holding the bag in place is provided also.

Abstract: A lint removal device with an adhesive side has a pair of spaced apart apertures to receive the fingers of an operator for holding the device while it is brought into contact with a garment or other clothing article to remove particulate matter from the article. When the fingers are inserted through the apertures, the adhesive sticks to the fingers to hold the device securely to the hand. A release liner is provided to protect the adhesive surface during storage and transportation. The lint removal device is also provided in a bulk pad wherein each of the devices is separated by a release liner which has an adhesive strip to hold the devices together in the pad.

Abstract: Method for scrubbing flat disc-like work pieces in a running wash liquid, by the use of a wash liquid flow vessel 2 maintaining a continuous flow of a wash liquid in one direction, a work carrier 18 for holding a plural number of work pieces 4 in an immersed state and in parallel relation with the flow direction of the wash liquid, a slidable carriage 28 for transferring the work carrier 18 in a direction reverse to the flow direction of the wash liquid, and a scrubber means 20 having scrubbing brushes 38 for washing and scrubbing the work pieces 4 on the carrier 18 in an immersed state in the flow of the wash liquid.

Abstract: A self-contained single-use apparatus for cleaning and hydrating a pair of contact lenses comprises a housing including a pair of hollow snap-lock lens containers in which opposed layers of a deformable relatively hydrophobic reactive material having surfaces arranged for non-abrasive contiguous wetted contact with the optical surfaces of the lenses when the lenses are enclosed in the housings. While in contact with the optical surfaces contaminants in the lenses are attracted to the contacting surfaces of the reactive layers. Upon removal of the lenses the attracted contaminants remain on the contacting surfaces and are disposed of with the housing. The container contains sufficient absorbed liquid for maintaining the lens in a hydrated condition while being treated in the container during the treatment process.

Abstract: A cleaning methodology for cleaning a paper path surface upon which paper travels within a printing apparatus. The cleaning device is a flexible substrate sheet having a first side and a second side, with the first side coated preferably in its entirety with an exposed adhesive having a tack strength between about 0.0002 and about 0.12 pound force-square inch. The second side of the substrate sheet can have laminated thereto a foam resin to provide a flexible thickness that assures pressured contact with all paper path surfaces to be cleaned. A lint-free cloth layer can be laminated to the foam resin if present, or the cloth layer can be laminated directly to the second surface of the sheet substrate. Operability occurs as the substrate sheet is fed into the printing apparatus and travels there through along the paper-path surfaces upon which paper is conveyed.

Abstract: A system and method for cleaning a drive train of a bicycle, e.g., a mountain bike, that includes a novel stand, cleaning axle, tweezer brush, water nozzle, and gear cleaner used to clean the entire drive train of the bicycle or other cycle having a chain-driven drive train and a removable wheel that is driven by the chain. The stand has a base, an upright, and a pig tail hook having at least two surface portions that contact a seat post of the mountain bike, with the pig tail hook characterized in that gravity provides a retaining force for the pig tail hook to retain the seat post. The cleaning axle replaces the chain driven wheel and provides tension to the chain, allowing the chain to be cycled with the pedals and rapidly cleaned while the chain is cycled. The tweezer brush has two cleaning surfaces oppositely disposed to evenly grip the chain on opposite sides. The water nozzle has a wand to be inserted into cleaning ports in the cleaning axle to direct a cleaning fluid, e.g.

Abstract: A squeegee unit is driven to rotate about a rotation axis perpendicular to a glass substrate surface with a motor while a plurality of blades of the squeegee unit contact on the substrate surface. The rotating squeegee unit is moved in a predetermined path on the substrate surface by relatively moving an X-Y stage so that its blades remove foreign materials adhered to the glass substrate surface.

Abstract: The present invention provides a cleaning method in which an object to be cleaned is held such that a surface of the object to be cleaned faces a cleaning body and the object to be cleaned and the cleaning body are moved relative to each other in a state where the cleaning body is in contact with the surface to the object to be cleaned, thereby cleaning the surface of the object to be cleaned, wherein a contact pressure of the cleaning body to the surface of the object to be cleaned is set at most 20 gf/cm.sup.2, when the surface is cleaned.

Abstract: Method of separating the surface layer from the core of a piece of wood is escribed. In it, the surface of the piece of wood is initially pre-damaged or roughened and the piece of wood thus treated is thereafter soaked in water or an aqueous solution until the moisture of the wood in the surface layer is at least 30%. Thereafter, the piece of wood thus pre-treated is subjected to a steam process with steam at a temperature of 120 .degree. to 160 .degree. C. by which the surface layer to be removed is solubilized to an extent sufficient for removal from the piece of wood in a following step.

Abstract: A process for recovering quantities of carbonyl compound material from spent solvent-in-water emulsions derived from paint overspray treatment and capture systems in which the spent solvent-in-water emulsion is removed from the paint overspray treatment and capture system and fed into a reaction vessel. The reaction vessel employed includes an outer housing defining a reaction chamber and a plurality of mixing blades movably positioned in the reaction chamber. The surface area of the mixing blades are maintained at a temperature sufficient to generate volatilized carbonyl compound. The interior of the reaction vessel is maintained under a vacuum. The spent solvent-in-water emulsion is processed in the reaction vessel for an interval sufficient to generate volatilized carbonyl compound.

Abstract: A touchless car wash composition, that can be made from a concentrate and diluted to use concentration using commonly available service water can comprise an ether amine or diamine in particular a fatty ether amine or diamine. The novel compositions are typically free of hydrocarbon solvents and silicone materials that are common in prior art compositions. The compositions are used in touchless car wash processes in which the materials are sprayed in the form of an aqueous dilute solution to remove soil from the vehicle surface. The aqueous compositions are self removing and very small amounts of the aqueous solutions remain to create water spotting on cleaned vehicle surfaces. The novel compositions of the invention can also contain a variety of other ingredients in a fully formulated system. Such ingredients include rapid dewatering of painted surfaces, improved cleanliness of glass and painted surfaces. A substantial reduction of water spotting and concentrates stability.

Abstract: An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.

Abstract: A method of and an apparatus for cleaning a thin disk-shaped workpiece that is required to have a high degree of cleanliness, e.g., a semiconductor wafer, a glass substrate, a liquid crystal display, or the like. The method of cleaning the workpiece includes a plurality of cleaning steps, and comprises the steps of holding a workpiece, and performing a liquid jet cleaning of a surface of the workpiece in a first portion of plural cleaning steps. The method further comprises the step of performing a liquid jet cleaning of the surface of the workpiece in a latter portion of the plural cleaning steps.

Abstract: A cleaning method and apparatus using very dilute hydrofluoric acid (HF) for cleaning silicon wafers and semiconductor substrates. The HF is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery system applies the chemical solutions uniformly to the semiconductor substrate and reduces the volumes of chemical solutions used in a scrubbing process. The process of the present invention uses very dilute HF and allows a thin oxide to be etched but not completely removed so as to maintain a hydrophilic surface state. Thus, this invention presents a chemical mechanical cleaning process with in-situ etching with the use of PVA brushes on a brush scrubber. Very accurate control of etch rate is obtained and, therefore, makes this process suitable to multiple cleaning applications of silicon wafers and semiconductor substrates.

Abstract: A method and abrasive blast medium for cleaning contaminants from electronic hardware. The abrasive blast medium is a pure, water soluble alkaline salt of bicarbonates and carbonates. The particle size of the alkaline salts range from about 20 to no larger than about 300 microns in diameter. The Mohs hardness of the alkaline salt particles is no greater than about 5.0. The blast cleaning conditions employed to clean the electronic hardware are mild. Blast air pressures range from about 10 to about 50 psi and the medium flow rate ranges from about 1 to about 10 lbs/min.

Abstract: A substrate cleaning assembly (10) and method for removing contaminant substances (11) from a surface (12) of a substrate (13) employed in microelectronics manufacturing. The cleaning assembly (10) includes a substance locator (15) adapted to locate and map at least one contaminant substance (11) on the surface (12) of the substrate (13) and a dispenser (16) formed and dimensioned to accurately dispense a substantially controlled, impinging stream (17) of cleaning agent along a path (18). A controller (20) is coupled to the map device (15) and the dispenser (16), and is adapted to control the impinging stream (17) such that the located contaminant substance (11) is positioned in the path (18) of the impinging stream (17) to enable substantially localized impingement and removal of the substance (11) from the substrate surface (12).

Abstract: A method and apparatus for cleaning edges of substrates is described. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.

Abstract: A substrate cleaning method in which the substrate is rotated and cleaned utilizing a brush which is brought into contact with the substrate. In accordance with one presently preferred aspect, the substrate is held between a stepped portion and a stopper portion at the fringe of the substrate, thereby preventing movement of the substrate as it is rotated and the brush is brought into contact with the substrate. In accordance with another aspect, a freely rotatable brush is brought into contact with the substrate so that the brush can rotate with the rotating substrate, and damage to the substrate can be minimized.

Abstract: A cleaning device, cleaning system and method relating thereto are provide. The cleaning device comprises (a) a handle unit having a (i) a handle section and (ii) a support section, (b) a body comprising (i) a deformable foundation supported by the support section (ii) a lofted fibrous material overlaying the foundation (iii) water proof plastic layer covering the fibrous material to prevent water contact of the fibrous material and foundation; (c) a cleaning skirt optionally having (i) a cloth cleaning section for enveloping the body and (ii) an elastic section for selectively retaining the skirt on the body. The cleaning system comprises (a) the cleaning device and (b) a plurality of cleaning skirts. The cleaning method comprises (a) providing a cleaning device as set out above, (b) cleaning a first household item with the device, (c) replacing the used skirt with a second skirt, and (d) cleaning a second household item with the device.

Abstract: An apparatus and methods are provided for performing maintenance procedures such as washing, cleaning, deicing, and painting to an aircraft. The apparatus according to an embodiment of the present invention preferably has a horizontally-extending mounting track and a track follower connected to the mounting track for following the mounting track. A maintenance tool support base preferably is connected to the track follower for supporting a maintenance tool thereon. An extending and retracting assembly is connected to the support base and to the track follower for extending the support base outwardly from the track follower and toward a portion of an aircraft and for retracting the support base inwardly from a portion of an aircraft and toward the track follower. An aircraft contour following assembly preferably is rotatably mounted to the support base and adapted for positioning adjacent an aircraft for following the contour of an aircraft to perform a maintenance procedure thereto.

Abstract: A method of removing wall paper which includes the steps of dipping an absorbent fabric into water or a solution of aqueous wall paper remover. Allowing excess solution to drain from the fabric and then placing the fabric in direct contact with the wall paper. The fabric adheres to the wall merely through water cohesion. The fabric is allowed to remain on the wall paper for a period of time to allow the solution to soak into the paper. Once this occurs, the fabric is removed and the paper can be scraped off the wall.

Abstract: A cleaning method and apparatus using very dilute Standard Clean 1 (SC1) for cleaning semiconductor substrates, including silicon wafers. The SC1 is delivered to the core of a brush where the solution is absorbed by the brush and then applied by the brush onto the substrate. This delivery system applies the chemical solutions uniformly to the semiconductor substrate and reduces the volumes of chemical solutions used in a scrubbing process. The process of the present invention uses SC1 to convert substrate surfaces from a hydrophobic state to a hydrophilic surface state while cleaning the wafer with the brush. A hydrophilic surface state is necessary to successfully remove surface contaminants by chemical mechanical brush cleaning.

Abstract: A method for cleaning the wheels of a car used in a semiconductor manufacturing plant uses a pair of endless belts that carry a dust trapping material on their outer surfaces. The car is located with a wheel supported by two rollers that each carry one of the belts. One of the rollers is turned and as the wheel rides in a gap between the two belts it turns with the first belt and transfers a turning motion to the other belt. As the wheel turns with the belts, dust on the wheel is transferred to the belts.

Abstract: A dispenser for powdered, granular, pellet, briquette or tablet-like material is provided. The dispenser includes a dispenser head through which the material dissolved in water can be dispensed. A spray device is provided at the head to spray water onto the material provided in the dispenser head. A suspension device is provided to suspend a bag containing the material above the dispenser head. The bag in its suspended orientation has a fastener along the bottom end which closes the bottom end of the bag. The fastener is not, however, releasable until after the bag is mounted in the dispenser. Then the fastener is releasable to allow the contents thereof to fall by gravity onto the dispenser head. The dispenser provides a system, which normally avoids contact of the toxic contents of the bag with the user. At the same time, the only waste is in the form of a bag which may be made of recyclable plastic, hence minimizing waste associated with the system.

Abstract: An apparatus for processing a base such as brushing or rubbing a floor, with the aid of a rotating member, is described. The apparatus contains a frame or chassis, a coupling means which couples to the rotating member, a means for driving the rotating member and a means for varying the magnitude and position of the pressing force of the rotating member relative to the base.

Abstract: A semiconductor cleaning method includes scrubbing a semiconductor wafer using a cleaning member made primarily of polyurethane and having micropores in a surface contacting the semiconductor wafer. The micropores have an average diameter ranging from 10 to 200 .mu.m. The cleaning member may be made of either polyurethane foam or non-woven fabric composed of fibers bound together by urethane resin. By this scrubbing step, particles that are strongly attached to the surface of a substrate such as the semiconductor wafer can easily be removed. During cleaning of the substrate, surface irregularities and crystalline protrusions on the surface of a substrate such as a semiconductor wafer can be scraped off to adjust the surface roughness of the semiconductor wafer to a desired degree for making the semiconductor wafer surface flat.

Abstract: An apparatus for chemically conditioning a surface of a planarizing substrate while a semiconductor wafer is planarized on the substrate. The conditioning apparatus has a conditioning solution dispenser that deposits a conditioning solution onto the substrate, and a conditioning solution barrier that removes the conditioning solution from the substrate to prevent the conditioning solution from contacting the wafer or diluting the planarizing solution. The conditioning solution dispenser is positioned over the planarizing substrate down-stream from the wafer with respect to the path along which the substrate travels. The conditioning solution barrier is positioned down-stream from the conditioning solution dispenser and upstream from the wafer to remove the conditioning solution from the surface of the substrate. The conditioning solution barrier accordingly cleans the surface of the substrate so that planarizing solution may be dispensed onto a surface relatively free from other fluids or particles.

Abstract: Process for stainless steel pickling consisting in placing the material to be treated in a bath kept at a temperature ranging from 30.degree. C. to 70.degree. C. and containing:a) H.sub.2 SO.sub.4b) Fe.sup.3+c) HFd) emulsifiers, wetting agents, polishing agents, acid attack inhibitors;the bath being kept under agitation with:an air flow and continuously fed with a quantity of oxidizing agent adjusted to the bath redox potential to be kept at 250 mV min.

Abstract: A method and apparatus for rotating wafers in a double sided scrubber without slipping or hesitating. A rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove. The wafer edge is pinched inside the groove to create enough friction that when cleaning solutions are applied the wafer does not slip and continues to rotate. Also, the groove allows the roller to pinch the wafer just enough so that when the roller reaches the flat of the wafer, the roller may regain the radius of the wafer without hesitating.

Abstract: An apparatus and method that enhances removal of contaminating particles from surfaces of a static-sensitive components that are cleaned using a carbon dioxide cleaning spray produced by a jet spray gun. The apparatus has a programmable power supply that is connected to ground, to the static-sensitive component, and to the jet spray gun. The static-sensitive component is cleaned using the cleaning spray and the surface charge generated on the surface of the component or substrate is simultaneously monitored to determine the amount and polarity of the charge that is generated thereon. The programmable power supply then applies a reverse bias to the jet spray gun that is equal to and has the opposite polarity of the charge that is generated on the surface of the static-sensitive component or substrate, which neutralizes the charge generated on the surface of the component.

Abstract: The present invention involves the removal of catalyst particles adhering to catalyst tubes by means of automated ram rods. The rods are moved up and down in the catalyst tubes by means of rotating wheels having cams which cyclically raise and drop the rods.

Abstract: A method of providing a track-cleaning wand for use in a document handling machine having a track along which documents are transported past sensors separated by a distance d and recessed away from the side walls of the track, this wand including a rigid handle with, at one end, a rigid elongate spacer bar carrying a pair of like brushes spaced apart by the sensor separation-distance and having bristles long enough to reach the face of a sensor, when the spacer bar is swept along the track.

Abstract: A method for using a heretofore industrial waste material for the utilitarian purpose of controlling and containing a liquid on a hard surface. The method includes the steps of accumulating an industrial waste material in the form of paper dust in a bindery for use as a loose filler for a container, forming a container from a fabric having a porosity sufficient for passage of the liquid therethrough, substantially entirely filling the container with the paper dust as accumulated at the bindery, and thereafter closing the container after it has been substantially filled with the accumulated paper dust from the bindery. Additionally, the method includes placing the container on the surface after closing in order to control and contain the liquid on the hard surface thereby.

Abstract: The present invention involves a method of removing paint containing heavy metal from a surface without the production of hazardous wastes. Specifically, this method involves applying a coating preparation to the heavy metal containing paint prior to its removal from its surface. The preparation contains lead reactive chemicals such as phosphates, metal sulfides and organic sulfides. The preparation may also contain buffers such as magnesium oxide and magnesium hydroxide. These chemicals react with the heavy metals rendering them nonhazardous. The invention also involves the coating preparation itself.