Abstract: Apparatus and methods for removing particles from a surface of a semiconductor wafer or optical component using a carbon dioxide snow spray directed at the wafer or component while simultaneously irradiating the surface with a laser beam. The apparatus comprises a carbon dioxide jet spray cleaning system disposed within an environmental cleaning station of a processing system that processes the wafer or component. The processing system is a conveyorized system wherein a conveyor belt or web transports wafers or components from processing station to processing station. The cleaning station includes a recirculating blower system, a laminar flow screen, a high efficiency particulate air filter, and a ducting system for recirculating purified air or inert gas. The cleaning station contains a jet spray nozzle that produces a carbon dioxide snow spray. The jet spray nozzle is coupled by way of a manifold to a liquid carbon dioxide tank that supplies liquid carbon dioxide to the jet spray nozzle.

Abstract: A wafer scrubbing system includes a upper and lower elongated scrubbers extending generally parallel with one another, the scrubbers being driven in rotation about their own axes. The wafer is disposed between the scrubbers so that the top and bottom surfaces of the wafer engage the scrubbers. The scrubbers are arranged to provide different frictional forces with the wafer at opposite ends of the scrubbers, and thereby provide a torque on the wafer about a central axis transverse to the top and bottom surfaces of the wafer and transverse to the scrubber axes.

Abstract: A method for rotating wafers in a double sided scrubber where a rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove in which the wafer edge is pinched. Treads or grooves extending from the groove channel liquids away from the groove to prevent wafer slippage when rotating and cleaning solutions are applied to the wafer.

Abstract: An apparatus for washing a substrate comprises a spin chuck for holding and rotating a substrate, washing brush mechanism for supplying a washing liquid onto a surface of the substrate held on the spin chuck, and applying a physical force to contaminants present on a surface of the substrate so as to remove contaminants, a supporting arm for supporting the washing brush mechanism, an arm driving mechanism for driving the supporting arm to move the washing means along the surface from a central portion toward a peripheral portion of the substrate, and a control device for controlling the operation of at least one of the washing means, the spin chuck and the arm driving mechanism so as to control the physical force acting on the contaminants present on the surface of the substrate depending on the state of the contaminants.

Abstract: An optical fiber and optical connector cleaning device which removes contaminants and particulants from fiber end face surfaces. The device consists of a surface treated with a high bonding adhesive. A template with a plurality of alignment holes is positioned upon the adhesive surface. A fiber connector with contaminants residing upon its fiber surface is guided by a template hole and makes contact with the adhesive surface. After connector disengagement, contaminants remain bonded to the adhesive surface resulting in a contaminant-free optical fiber and optical connector.

Abstract: A bar soap casing comprising a netted tulle fabric sheath for a bar of soap, the sheath having exactly two layers of tulle fabric substantially covering the bar of soap and free of stitching, the sheath having a resilient, self-closing aperture at one end to permit the introduction of a bar of soap and to inhibit the exit of an enclosed bar of soap, wherein the self-closing aperture includes an elastic band comprised of gum rubber and affixed to a medial point of a tulle fabric tube with a knot which is transferred from the band to two or more strands of the tulle netting by a knot transfer technique involving the stretching of the band in the manufacturing process, and a braided cotton hanging cord affording an implement for hanging and drying the casing and affording a tethering loop to go about the wrist to prevent dropping of the casing during the bathing process.

Abstract: A method for cleaning a hard surface using low levels of a cleaning solution includes (i) applying the cleaning solution to the hard surface to be cleaned at a level of not more than about 6 ml of cleaning solution per square foot of hard surface; and (ii) wiping the hard surface with a cleaning implement that includes a handle and a removable cleaning pad having a t.sub.1200 absorbent capacity of at least about 1 g of deionized water per g of the cleaning pad.

Abstract: An apparatus (200) is provided in a floor scrubber (10) for automatically shutting off the motor (60) which rotates an agitator (64) and the motor (96) of a vacuum assembly under various operating conditions of the floor scrubber (10). The current to the motors (60, 96) is detected by devices (204, 206) and monitored by a control circuit (202) controlling devices (208, 210 which interrupt operation of the motors (60, 96). In the preferred form, operation of the agitator (64) is interrupted when the current to the brush motor (60) is less than or equal to a threshold level indicating that the agitator (64) has been raised from the floor surface as the current to the brush motor (60) would be above the threshold level when the agitator (64) engages the floor surface. Operation of the vacuum assembly is interrupted when the current to the vacuum motor (96) drops to a fixed percentage over a period of time from normal operating levels indicating the path of the air in the vacuum assembly has been blocked.

Abstract: A method of cleaning the outer surface of a cylinder by using a cleaning fabric intermittently fed from a supply, and engaged with and pressed against the outer surface of the cylinder. The method includes predetermining periods for each of which the cleaning fabric is engaged with the outer surface of the cylinder a time so that at least some of the periods are different in length from other periods in a cleaning cycle.

Abstract: Method in which the pickling solution is sprayed onto the metal part in a confined atmosphere with an oxygen supply by feeding into the spraying enclosure an oxygen-containing gas, the pickling solution being recycled in a closed pickling solution circuit. The device for pickling metal surfaces comprises a spraying enclosure (1) with a collecting tank (2), means for spraying (6) a pickling solution (S) in said enclosure, means (11) for recirculating said solution between said tank (2) and said spraying means (6) and means (8,9) for passing an oxygen-containing gas through said enclosure, and optionally means (13) for maintaining the temperature of said solution, and control means. The method of the invention is designed to improve the productivity of lines for pickling stainless or alloy steel components while economising on reagents.

Abstract: A method of cleaning a surface including the steps of providing a cationic sponge material containing cationic radicals. Exposing particles and charges carried by the surface to be cleaned to the cationic radicals. Attracting and retaining particles and charges on the surface to be cleaned to the cationic radicals.

Abstract: An extractor is provided for cleaning carpet or a like surface or material. The extractor includes a housing, a handle, a cleaning liquid delivery system and a cleaning liquid recovery system. The cleaning liquid delivery system includes a cleaning liquid supply tank, first and second aligned agitators preferably in the form of brushes and a gravity feed or pump for delivering cleaning liquid from the supply tank for cleaning. The cleaning liquid recovery system includes a recovery nozzle, a vacuum generator and a dirty cleaning liquid recovery tank. The extractor is further characterized by a manifold for receiving cleaning liquid from the pump and directing the cleaning liquid into a nip defined between the first and second agitators. A drive assembly counterrotates the agitators so that relative rotation of the agitators in the nip is generally away from the manifold and toward the carpet to be cleaned.

Abstract: A method for assaying fibrous material, such as carpet (or other fabric) condition, and treating the fibrous material such as carpet by physically separating contaminating particulate matter therefrom, thereafter releasing entrained matter, and absorbing the released formerly entrained matter.

Abstract: The apparatus is used to clean a stator portion facing a rotor with removable peripheral poles in a turbine-alternator group. The apparatus has an elongated frame, adapted to replace one of the poles of the rotor by means of attachments devised for this purpose. An elongated brushing element extends generally in parallel with respect to the stator portion to be cleaned. Positioning devices are mounted between the frame and the brushing element to position the brushing element so that it comes in contact with the stator portion to be cleaned during the operation of the apparatus. A driving motor is coupled to the brushing element, and injectors are mounted onto the frame to inject a solvent under pressure on the stator portion to be cleaned when the apparatus is in operation. The method consists to turn slowly the rotor equipped with the apparatus to clean the stator portion.

Abstract: This disclosure is directed to a thumbless snow removal and cleaning paddle of generally pentagonal configuration which encloses the user's entire hand, fits snugly around the wrist, is reversible during use, contains a moisture penetration resistant outer layer of greater size and extent elastically fastened on its inner side to the outer portion of a substantially symmetrical inner layer of lesser size and extent approximately one major surface of which (dorsal or plantar) is composed of natural or synthetic chamois material with the remaining major surfaces being composed of absorbent, soft cloth material.

Abstract: A chemical composition useful for carpet cleaning having a selected combination of alcohols, Borax, sodium tripolyphosphate, hydrogen peroxide, bicarbonates and other alkaline components. Additionally, a method of cleaning carpets with the proposed cleaning composition using a mechanically driven pad to buff a carpet wetted with the composition. The chemical composition is preferably sprayed onto the carpet, which is then buffed to ensure complete penetration of the cleaning compound and removal of soil or staining material.

Abstract: Blast media for removing coatings from sensitive metal and composite surfaces, and a process useful therewith, the blast media contains water-soluble potassium magnesium sulfate. The media may also contain flow/anti-caking agents and alkali metal salts.

Abstract: A detergent composition for cleaning the surface of a substrate prior to or after application of an organic or inorganic thin film thereon, comprises: (A) a compound selected from the compounds represented by the formula: R.sub.1 --O--(A.sub.1 O).sub.n --R.sub.2 (wherein R.sub.1 represents an alkyl or alkenyl group having 1 to 7 carbon atoms or a phenyl group; A.sub.1 represents an alkylene group having 2 to 4 carbon atoms; R.sub.2 represents an alkyl or alkenyl group having 1 to 6 carbon atoms or a hydrogen atom; and n is a numerical value ranging from 1 to 6); (B) a compound selected from at least one of those represented by the formulas: R.sub.3 --O--(A.sub.2 O).sub.m --H and R.sub.4 --O--(A.sub.3 O).sub.m --H (wherein R.sub.3 represents an alkylphenyl or alkenylphenyl group having 12 to 25 carbon atoms; A.sub.2 represents an alkylene group having 2 to 4 carbon atoms; R.sub.4 represents an alkyl or alkenyl group having 8 to 25 carbon atoms; A.sub.

Abstract: A method of cleaning a silicon material using a polyvinyl acetal sponge material. The sponge material is purified by an extracting process which includes alternating exposure of the sponge material to acid and oxidizing solutions. The extracting process permits residual amounts of calcium, zinc, sulfate, arsenic, barium, cadmium, chloride, chromium, copper, iron, lead, manganese, magnesium, mercury, nitrate, potassium, selenium, silica, silver and sodium to be 2 ppm or less. Following the extracting process, the silicon material is contacted with the sponge material to thereby clean the silicon material.

Abstract: A method for cleaning parts employed during the processing of semiconductor wafers includes a first cleaning step for removing super-micron particles and a second cleaning step for removing sub-micron particles. The second step utilizes frozen carbon dioxide pellets and removes contaminant particles have a size of less than one micron. The cleaning method consistently removes substantially all sub-micron particles from a work surface.

Abstract: A cleaning device and methodology therefor for cleaning a paper path surface upon which paper travels within a printing apparatus such as a computer printer, a photocopy machine, a fax machine, and the like. The cleaning device is a flexible substrate sheet having a first side and a second side, with the first side coated preferably in its entirety with an exposed adhesive having a tack strength between about 0.0002 and about 0.12 pound force-square inch. The second side of the substrate sheet can have laminated thereto a foam resin to provide a flexible thickness that assures pressured contact with all paper path surfaces to be cleaned. A lint-free cloth layer can be laminated to the foam resin if present, or the cloth layer can be laminated directly to the second surface of the sheet substrate. operability occurs as the substrate sheet is fed into the printing apparatus and travels there through along the paper-path surfaces upon which paper is conveyed.

Abstract: A cleaning kit for use in cleaning surfaces in clean rooms, semiconductor fabrication plants, pharmaceutical manufacturing facilities, etc. A stack of extremely clean wipers is packaged together with a container of cleaning fluid in a liquid-tight outer container. The kit is stored until just before it is to be used. Fluid is released from the inner container into the wipers. In one embodiment, the inner container is frangible and is broken by application of hand pressure to the outside of the outer container. The cleaning liquid is allowed to soak into the wipers, and the wipers are removed from the outer container for use. The container can be resealed to protect the wipers after the package has been opened. This device and method minimize deterioration of the wiper material due to prolonged contact with the cleaning fluid, and minimize the loss of effectiveness of substances such as biocides which might deteriorate due to prolonged contact with the wiper material.

Abstract: Basic cleaning compositions using toxicologically-acceptable ingredients for cleaning fruits and vegetables are provided. Liquid formulations comprising detergent surfactant, such as oleate, alcohol ethoxylates, etc., and neutralized phosphoric acid are sprayed onto apples, lettuce and the like to remove soil and unwanted deposits, especially wax. Articles for applying the compositions to produce by spraying are disclosed. Use of the compositions for disinfectancy/sanitization of produce and cleaning/disinfectancy/sanitization of non-food inantimate surfaces are disclosed.

Abstract: A washing device is provided for cleaning generally flat panels. The washing device includes a base having a slot therein and a pair of sponge-like members disposed along opposing edges of the slot. The base is suspended within a vessel containing washer solvent. The panels are inserted in the slot and scrubbed against the sponge-like members.

Abstract: A post chemical-mechanical polishing clean-up process. Particles and ionic and metallic contaminants remaining on wafer 32 surface after CMP are removed and scratches are smoothed. The wafer 32 may be subjected to a high pressure/high rotational speed rinse at spindle rinse station 42 followed by buffing of the wafer 32 on a second polishing platen 38. If desired, a second high pressure/high speed rinse at spindle rinse station 42 may be performed after the buffing step. The wafer 32 may then be then transferred to a tank 50 for a megasonic bath and after the megasonic bath, the wafer 32 is transferred to a scrubber 44, which scrubs both surfaces of the wafer 32 with brushes and then spins the wafer 32 dry as spin station 84. All transfers are performed in a solution such as DI water to prevent drying of slurry on the wafer surface.

Abstract: Devices and compositions are provided for cleaning optical surfaces with carbon black. Carbon black may be impregnated on a soft pad, such as chamois leather, to provide a lens cleaning device. The soft pad may be supported on a handle. The soft pad may be mounted on the handle by a resilient member that is capable of adapting with the soft pad to conform the cleaning surface to concave or convex optical surfaces. A retractable brush may be mounted at the opposite end of the handle from the soft pad.

Abstract: An apparatus for removing snow accumulation from motor vehicle roofs. The snow scraping apparatus has a scraping assembly adapted to remove snow from a motor vehicle roof and including a scraping member being horizontally oriented. The snow scraping apparatus also has a supporting assembly for holding the scraping assembly in an elevated position so that the motor vehicle can pass beneath the scraping member without interference. The scraping member is elevated from the ground by a height that is substantially the same as or slightly greater than that of the motor vehicle roof. As a result, the scraping member can remove snow accumulation from the motor vehicle roof as the motor vehicle passes beneath the scraping assembly. If desired, the scraping assembly can be a rotatable brushing member for removal of snow accumulation by tossing or throwing the snow away from the vehicle roof.

Abstract: A method for cleaning and conditioning tape path surfaces and heads of video and audio equipment, recorders, and electrical contact surfaces of electronic equipment, improving the resolution of said heads comprising: providing a cleaning composition consisting essentially of white mineral oil, a compound selected from the group of mineral spirits, hydrotreated heavy petroleum naphtha, heavy alkylate naphtha and isoparaffinic hydrocarbons having 1-13 carbons; with application to said tape path surfaces and the heads of said video and audio equipment, said tape recorders, and the electrical contact surfaces of said electronic equipment, causing the deep cleaning and conditioning for an improved life and improved results of said recorders and said electronic equipment.

Abstract: Apparatus for cleaning, assembling, testing and inspecting contamination sensitive hardware. The apparatus includes an environmental process enclosure having an inner processing chamber, and a carbon dioxide jet spray cleaning system. The enclosure includes a loadlock pass-through having front and rear access doors for providing access to the inner processing chamber. A blower is disposed in the enclosure for circulating purified gas therethrough. A prefilter disposed prior to an inlet of the blower, and a high purity filter and laminar flow screen are disposed in the inner processing chamber. A heater is provided for heating the purified gas and a temperature controller is coupled to the heater for controlling the temperature of the purified gas. A table is disposed in the inner processing chamber upon which contamination sensitive hardware and testing and assembly apparatus may be placed.

Abstract: Microelectronics wafer substrate surfaces are cleaned to remove metal contamination while maintaining wafer substrate surface smoothness by contacting the wafer substrate surfaces with an aqueous cleaning solution of an alkaline, metal ion-free base and a polyhydroxy compound containing from two to ten --OH groups and having the formula: ##STR1## wherein or in which --R--, --R.sup.1 --, --R.sup.2 -- and --R.sup.3 -- are alkylene radicals containing two to ten carbon atoms, x is a whole integer of from 1 to 4 and y is a whole integer of from 1 to 8, with the proviso that the number of carbon atoms in the polyhydroxy compound does not exceed ten, and wherein the water present in the aqueous cleaning solution is at least about 40% by weight of the cleaning composition.

Abstract: An apparatus and method for scrubbing both surfaces of a substrate which includes a process section having a first unit, a second unit, a main arm mechanism for transferring a substrate into/from the first and second units, a first cassette or a second cassette section for transferring plural cassettes, a first and second sub-arm for transferring a substrate into/from the cassette sections, and controllers, such that a first substrate taken out from the first cassette section is subjected to the first unit and then subjected to the second unit, while a second substrate taken out from the second cassette is subjected to the second unit and then subjected to the first unit.

Abstract: The invention is a cleaning assembly for a computer mouse comprised mainly of a sphere. The sphere contains a plurality of non-fibrous projections extending radially from the surface. These projections are of a length sufficient to touch the walls of the cavity of a computer mouse when the assembly is placed into a computer mouse. The cleaning assembly fits snugly into the cavity of the mouse. The external surfaces of projections and sphere surface form an uneven cleaning surface and size of the cleaning assembly that cleans the computer mouse.

Abstract: A megasonic liquid stream semiconductor wafer cleaning apparatus and method uniformly removes debris from all points on the surface of a semiconductor wafer. The wafer is rotated about a proscribed axis while the means for producing focused megasonic waves and a liquid stream of cleaning fluid is focused on the wafer so as to apply sufficient energy to clean the wafer yet not cause damage to the electronic circuity embedded in the wafer. A method is provided for moving the outlet port providing the stream of megasonic cleaning fluid across the wafer so that the amount of energy applied to any area of the wafer is relatively constant.

Abstract: The method of cleaning of spills of oil and oil products from different surfaces, including water surface and land, includes treatment by a composite adsorbent--aluminosilicate material exposed to water-repellent treatment. The absorbent (for example, an aluminosilicate material), which is a first waste product, is waste formed at burning dust coal in industrial furnaces with liquid slug removal. Water repellent is a second waste product of oil industry, wood chemistry, containing hydrocarbons, mass relationship of the first and second waste products is approximately between 1:0.001 to 1:0.25. The method for obtaining the absorbent includes a treatment of aluminosilicate material by water emulsion or water solution of water-repelling agent, at mass relationship of aluminosilicate material, water and water repellent 1:1-5:0.001-0.25 respectively, while stirring at temperature 80-85.degree. C. (40-96.degree. C.) for 30 minutes with further drying to constant wight at temperature between 105.degree. C. to 120.

Abstract: A method and apparatus for cleaning the edges of substrates. The present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based on friction at a point of contact between the wafer and a wafer edge brush. In one embodiment, the cleaning mechanism includes a side brush that cleans the top-side or bottom-side of a wafer. The side brush is rotated by a motor that is attached to a first end of the side brush. An edge brush is attached to a second end of the side brush and is rotated along with the side brush to clean the edge of the wafer.

Abstract: A mop is provided with a handle, mop strings and a plunger. The plunger is located between the handle and the mop strings. A sleeve having a top end and an open bottom end is provided, with the sleeve being perforated near the bottom end. The sleeve is tapered so that the bottom end is larger than the top end. The plunger and the mop strings are located inside of the sleeve with the plunger positioned near the top end of the sleeve and the mop strings depending from the plunger. The bottom end of the sleeve is located in a liquid so that the liquid enters a bottom portion of the sleeve through the perforations. The handle is moved down so as to compress the mop strings with the plunger, with the mop strings being immersed in the liquid, forcing dirt from the mop strings out of the sleeve perforations. The handle is moved up so as to raise the plunger inside of the sleeve and decompress the mop strings, thereby allowing the mop strings to absorb liquid from outside of the sleeve through the perforations.

Abstract: An odor-removal composition and a method and system for applying the odor-removal composition to a material for removing odors or reducing the emanation of odors from the material are provided. The odor-removal composition includes a magnesium salt mixed in water at a concentration less than the solubility limit of magnesium salt. The odor-removal composition is preferably sprayed on a material that exhibits unwanted odors and in particular on fabric or hair that exhibits tobacco-smoke odors. The odor-removal composition may interact with substances that cause such odors to form molecules that have less foul odors or no odors.

Abstract: An improved cleaning apparatus for cleaning semiconductor wafers, rigid memory disks, flat panel displays, and other workpieces employs vibrational mechanical energy in addition to contact mechanical cleaning. The cleaning apparatus includes a cleaning element configured to contact and scrub a workpiece during a cleaning process. The cleaning clement is coupled to a mechanical energy emitter that generates low frequency mechanical vibrations (or ultrasonic mechanical energy) at a predetermined frequency. The mechanical energy is conducted through the cleaning element and to the workpiece to facilitate removal of particulate and debris from the surface of the workpiece. Use of ultrasonic energy also causes the cleaning solution to cavitate, thus providing ultrasonic cleaning to the workpiece via the cleaning solution.

Abstract: A method for the removal of fluorine or chlorine residue from an etched precision surface such as a semiconductor sample is provided which comprises exposing said precision surface to liquid CO.sub.2 under appropriate conditions that are sufficient to remove the residue from the precision surface. Cryogenic aerosol may be used in conjunction with liquid CO.sub.2.

Abstract: The present invention provides a method for cleaning particles from a semiconductor topography that has been polished using a fixed-abrasive polishing process by applying a cleaning solution including either (a) an acid and a peroxide or (b) an acid oxidant to the topography. According to an embodiment, a semiconductor topography is polished by a fixed-abrasive process in which the topography is pressed face-down on a rotating polishing pad having particles embedded in the pad while a liquid absent of particulate matter is dispensed onto the pad. The particles may include, e.g., cerium oxide, cerium dioxide, .alpha. alumina, .gamma. alumina, silicon dioxide, titanium oxide, chromium oxide, or zirconium oxide. A cleaning solution including either (a) an acid and a peroxide, e.g., hydrogen peroxide, or (b) an acid oxidant is applied to the semiconductor topography after the polishing process is completed.

Abstract: A surface such as that of a semiconductor wafer is cleaned by contacting the surface with a cleaning composition containing a polyelectrolyte.

Abstract: A cleaning mechanism and method for cleaning the probe needles of a probe card used for the inspection of the electric characteristics of a wafer W. This mechanism is provided with a soft cleaner and a brush cleaner. The soft cleaner has a cleaner layer formed of rubber and inorganic filler. The brush cleaner has a number of brush sections, and each brush section is a bundle of fiber members. The fiber members are thinner than the probe needles and have a certain degree of elasticity. The cleaning method includes the steps of: a) cleaning the probe needles using the soft cleaner having a the cleaning layer made of rubber and inorganic filler and b) cleaning the probe needles using the brush cleaner having bristles.

Abstract: The present invention relates to a method of using a suction cleaning device which provides liquid dispensing, scrubbing, squeegeeing, and suction drying in a single, compact, self contained device. The suction cleaning device includes a cleaning device housing, a handle connected to the housing, an absorbent cleaning member mounted on the housing and movable between an extended and a retracted position, and a pair of squeegee blades. The device includes a suction system which draws the water from the floor surface which has been cleaned into a tank mounted on the housing which collects the liquid from the floor surface. A clean water bottle is provided on the housing for delivering cleaning liquid to the floor and a rechargeable battery power source provides power to the suction motor. The cleaning device is compact and lightweight and leaves the floor in a substantially dry state.

Abstract: There is provided a double-sided substrate cleaning apparatus including a carrier station for loading/unloading a carrier in which objects to be processed are stored, a convey mechanism for conveying an object taken out from the carrier station, at least one cleaning mechanism, arranged along a convey path on which the convey mechanism conveys the object, for cleaning the object, and an object reversing mechanism, arranged along the convey path, for reversing the object.

Abstract: A substrate may be treated by impinging the substrate with a cryogenic aerosol spray wherein the cryogenic aerosol spray is formed by expanding a pressurized liquid or liquid/gaseous stream of one or more cryogens through a nozzle at a given distance from the substrate into a process chamber with a pressure of about 1.6.times.10.sup.4 Pascal or less so as to form at least substantially solid aerosol particles of said one or more cryogens downstream from the nozzle by the cooling resulting from the expansion and/or evaporation to form an at least substantially solid particle containing aerosol.

Abstract: A method and apparatus for cleaning a test probe of a semiconductor probe card. In one embodiment, the method of cleaning includes the steps of placing the test probes in contact with a textured cleaning surface and providing a vibrational movement to the cleaning surface.

Abstract: A method for removing a scuff mark from a shoe surface made from a synthetic material comprises the steps of: applying a fingernail polish remover composition to the shoe surface with a cotton ball; rubbing the composition into the surface; and removing the scuff mark and the composition from the surface. The composition may consist essentially of acetone; water; glycerin; diglycerol; and gelatin. The composition may alternately consist essentially of ethyl acetate; isopropyl alcohol; water; benzophenone 1; isopropyl myristate; butyl acetate; and mineral salts containing sodium, potassium, magnesium, calcium, chloride, bromide, iodide, sulfate, and carbonate. Still further, the composition may alternately consist essentially of other nail polish remover compositions.

Abstract: A method for cleaning jewelry includes dispensing a foamy substance onto an item of jewelry from an aerosol dispenser, using a scrubbing brush to scrub the jewelry item with the foamy substance thereon, in order to cause the foamy substance to become more foamy, thereby to enhance and complete the cleaning process. Thereafter, the item of jewelry is rinsed.

Abstract: Surface treatment apparatus having impact elements for impacting a surface to be treated, a brush element for brushing the surface, a drive device for operating the impact element and the brush elements, and a carriage device enabling the surface treatment apparatus to be moved across the surface to be treated. The brush elements include a composite rotary brush assembly having circumferentially spaced rows of bristles mounted on a rotatable shaft in alternate circumferential sequence with the impact elements and further rotary assembly mounted on a contra-rotation relative to the composite rotary brush assembly and/or the impact elements, each rotatable so their bristles move upwardly intermediate the respective shafts. The impact elements include a plurality of longitudinal spaced hammers each pivotable about an axis substantially parallel to the axis of the rotatable shaft.

Abstract: A paint removal device includes a post member having two ends, a lever member having two ends, a joint connecting an end of the post member to the lever member at a point therealong spaced from the ends of the lever member, and a scraper blade provided on the lever member at one end thereof. The joint permits pivoting of the second elongate member about at least two distinct axes. In using the scraper device for removing paint from a surface facing at least partially downwardly, a lower end of the post member is planted on a ground or floor surface below the painted surface. The user pivots the lever member at the joint to place the scraper blade in contact with the painted surface. Thereafter, the user pulls on the lever member to pivot the post member and the lever member about an axis passing through the lower end of the post member. While pulling on the lever member, the user maintains the scraper blade in forceful contact with the painted surface, to thereby scrape paint from the painted surface.