Using Solid Work Treating Agents Patents (Class 134/6)
-
Patent number: 6290780Abstract: A method and apparatus for processing wafer edges is disclosed. Pressure applied to the wafer at one end of A brush/pad assembly is greater than at the opposite end of the brush/pad assembly. The increased pressure causes wafer rotation to slow or to reverse direction as compared to less pressure applied by the brush/pad assembly. In one embodiment slowed rotation causes a difference in tangential velocity between the roller(s) and the wafer edge/bevel that causes pads in the roller(s) to process the edge/bevel of the wafer. In another embodiment, the opposite direction of rotation causes the wafer to rotate counter to rollers otherwise causing the wafer to rotate. Cleaning surfaces in the rollers clean the edges of the wafer whether rotation is slowed or reversed.Type: GrantFiled: March 19, 1999Date of Patent: September 18, 2001Assignee: Lam Research CorporationInventor: Michael Ravkin
-
Patent number: 6287388Abstract: An apparatus is disclosed for removing dust particles from top surfaces and first and second side surfaces of a vehicle body prior to spraying thereof.Type: GrantFiled: November 2, 1999Date of Patent: September 11, 2001Inventor: Richard E. Hahn
-
Publication number: 20010017144Abstract: A method for removing from at least single-layer webs of material, particles formed by slitting devices which are arranged along a web travel path in a slitting zone, includes generating a suction zone associated with the slitting devices in accordance with the position of a cutting location; a device for performing the method; a jobbing web-fed rotary printing machine including the device; and a newspaper rotary printing machine including the device.Type: ApplicationFiled: February 1, 2001Publication date: August 30, 2001Inventor: Daniel Flament
-
Patent number: 6280530Abstract: A self-contained apparatus for cleaning contact lenses comprising a deformable, non-abrasive material having an enzyme enriched layer for contact with the optical surfaces of the lenses. While in contact with the optical surfaces, the contaminants on the lens surfaces are enzymatically removed. Upon separation of the lenses and the deformable material, substantially all of the enzymes are retained on the deformable material, largely eliminating the need to perform additional operations to inactivate the enzymes or otherwise rid the lenses of residual enzymatic matter.Type: GrantFiled: January 28, 2000Date of Patent: August 28, 2001Assignee: IsoCLEAR, Inc.Inventor: Mark L. Pankow
-
Patent number: 6280531Abstract: The invention includes a method of cleaning a paint roller. The cleaning tool used in this method includes a flat, disc-shaped main body (10) having cleaning apertures (11a,b,c,&d) located thereon. Cleaning apertures (11a,b,c,&d) have diameters suitably smaller than the outside diameter, including the nap covering, of various popular roller sizes and nap thicknesses, such that a friction fit between the nap covering of such a roller and a cleaning aperture (11a,b,c, or d) is provided. Four access notches (12a,b,c,&d) extend from the circumference of cleaning apertures (11a,b,c,&d) respectively, to the circumference of main body (10). In this method, a cleaning tool is placed over the handle end of a roller, with the wire portion of the handle passing through one of the access notches (12a,b,c, or d) and into the center of one of the cleaning apertures (11a,b,c, or d).Type: GrantFiled: September 27, 2000Date of Patent: August 28, 2001Inventor: John Alexander Galbreath
-
Patent number: 6280529Abstract: A laminated pad of gauze (10), cellulose, sponge (18), abrasive tiles or other functional materials, can be attached to a glove (14) or an affixed adhesive layer (12). A protective sheet (13) may be provided over the adhesive layer to protect it prior to use. The pad is attached, using the adhesive, to the back (15) of a glove or to garments or body surfaces or work surfaces. The pad is arranged to cleanse, wet or shape tool nibs and to hold small parts for future usage The pad can also be attached with a strap (32.Type: GrantFiled: February 8, 1999Date of Patent: August 28, 2001Inventor: Alvin Meyer
-
Patent number: 6280528Abstract: An improved method and/or process for preparing and handling formulations useful in metal treatment baths which includes packaging formulations useful in preparing and/or replenishing aqueous-based baths in water soluble pouches or containers. The present invention includes the selection of components effective in treating metallic surfaces, which may be blended and effectively stored in containers or pouches consisting of polyvinylalcohol film. The present invention reduces the necessity or frequency of personal hand contact by workers with these blends.Type: GrantFiled: December 19, 2000Date of Patent: August 28, 2001Assignee: Cortec CorporationInventors: Margarita Kharshan, Boris A. Miksic, Clifford Cracauer III, Michael Hobday
-
Publication number: 20010015214Abstract: A dispensing apparatus including a spray bottle dispenser including a bottle portion and a spray head portion and a frame portion connecting said dispenser to a surface contacting portion and configured such that when said dispensing apparatus is in an upright position, said surface contacting portion is located above and in front of a nozzle portion of said spray head portion.Type: ApplicationFiled: April 27, 2001Publication date: August 23, 2001Applicant: SUNEX L.L.C.Inventors: William L. Klima, Benjamin A. Pezzlo, Walter F. Klima
-
Patent number: 6273100Abstract: Apparatuses and methods are disclosed for submerged cleaning of substrates and the like. The apparatus includes a container holding a bath of cleaning fluid and, within the container, the combination of a submerged brush scrubber, submerged megasonic transducer and Marangoni drying devices. In operation, at least a portion of a substrate is submerged in the bath of cleaning fluid where its surfaces are contacted by one or more brush scrubbers while beams produced by megasonic transducers are directed parallel to the surface of the substrate along the surface of the substrate. The substrate is removed from the bath of cleaning fluid and rinsed with rinse water. A Marangoni flow is induced on the surface of the substrate and the substrate is allowed to dry through one or more means of drying, thereby rendering the substrate free from particulate contamination and dried of any residual fluid from the cleaning process.Type: GrantFiled: August 27, 1998Date of Patent: August 14, 2001Assignee: Micron Technology, Inc.Inventors: Michael T. Andreas, Michael A. Walker
-
Patent number: 6273961Abstract: A cleaning handle is used to clean semiconductor processing equipment to reduce particles. A relatively thin handle is formed for insertion into difficult to reach areas and, in one end, includes slots for affixing a cleaning wipe. A method for using the cleaning handle to clean semiconductor processing equipment includes affixing a cleaning wipe to the slots, wrapping the cleaning wipe around the end with the slots, and then wiping the semiconductor processing equipment with the cleaning handle. The cleaning wipe can be moistened with a cleaning agent, such as isopropyl alcohol, to improve its effectiveness.Type: GrantFiled: August 23, 2000Date of Patent: August 14, 2001Assignee: Advanced Micro Devices, Inc.Inventors: Cesar R. Fernando, Narendra Patel
-
Patent number: 6274059Abstract: A method to remove metal contaminants in a substrate cleaning process. The present invention may replace or be used in conjunction with other substrate cleaning systems. This method comprises adding a citric acid solution to the liquid medium of a semiconductor substrate cleaning system. This method is described in the manner it is used in conjunction with a scrubber wherein both sides of a wafer are scrubbed.Type: GrantFiled: March 11, 1996Date of Patent: August 14, 2001Assignee: Lam Research CorporationInventors: Wilbur C. Krusell, Igor J. Malik
-
Patent number: 6270832Abstract: Before forming resin layers and metal thin film layers on a rotating supporting base, a belt-shaped object is run over the supporting base to remove foreign particles adhering to the supporting base. After a resin layer and a metal thin film layer are formed on the belt-shaped object and their formation conditions are optimized, the belt-shaped object is removed, and subsequently a layered product is formed on the supporting base. Thus, foreign objects adhering to the supporting base can be removed, and resin layers and metal thin film layers can be formed as desired.Type: GrantFiled: February 25, 1999Date of Patent: August 7, 2001Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Kazuyoshi Honda, Noriyasu Echigo, Masaru Odagiri, Nobuki Sunagare
-
Patent number: 6264755Abstract: The Cleaner is a comb-like instrument designed to clean debris from VELCRO. Its prongs are sized and spaced to fit between the rows of hooks on different sizes of VELCRO. A handle, approximately perpendicular to the prongs, is used to slide the prongs between the VELCRO's rows and under debris. A vertical motion will lift up the debris and restore the VELCRO's effectiveness and appearance.Type: GrantFiled: March 9, 2000Date of Patent: July 24, 2001Inventor: Melissa Alden Georgiou
-
Patent number: 6264756Abstract: A cleaning apparatus for computer pointer devices having a standard ball contacting input rollers has an abradant ball mounted to a rotary shaft in a manner that the abradant ball may be brought into contact with rollers of the pointer device with the standard ball removed, the position of the abradant ball such that rotating the shaft will rotate the abradant ball in a manner that the abradant ball will both abrade and turn the rollers. The cleaning apparatus may be a hand-held device, built into a free-standing housing, or into a housing as a part of another computer housing, such as a computer or display. In some cases there is a variable speed drive with user settable speed, and in some cases there is a vacuuming system for removing abraded matter from a pointer device while cleaning takes place.Type: GrantFiled: June 21, 2000Date of Patent: July 24, 2001Inventor: Mark A. Boys
-
Patent number: 6264754Abstract: A vehicle washing machine having a frame supporting member adapted to be located above the vehicle, and a conveyor moving the vehicle past the washing machine. A shuttle plate is mounted on the supporting member, and a shuttle plate motor is connected to the shuttle plate. A proximal end of an arm is pivotally mounted on the shuttle plate, and a cleaning element is mounted at the distal end of the arm. A sensor is used to detect the presence of the vehicle, and a controller connected to the sensor, the shuttle plate motor and the conveyor commands the shuttle plate motor to move the proximal end of the arm between outer and inner positions on the supporting member in response to different locations of the cleaning element with respect to the vehicle, thereby permitting the cleaning element to wash a greater portion of the vehicle.Type: GrantFiled: May 28, 1999Date of Patent: July 24, 2001Inventor: Bradford K. Bowman
-
Publication number: 20010008877Abstract: A cleaning medium for use in cleaning printing forms includes either an acid solution having a pH of from 1 to 4 or a basic solution having a pH of from 10 to 14. A dispersible abrasive agent in a concentration of from 1 to 15 grams per 100 grams of the cleaning composition, a surfactant in a concentration of from 1 to 50 grams per 100 grams of the cleaning composition, an organic solvent in a concentration of from 10 to 50 grams per 100 grams of the cleaning composition, and additional water if needed are added to the acid or basic solution to form the cleaning medium. A cleaning medium in concentrate form is also provided.Type: ApplicationFiled: December 21, 2000Publication date: July 19, 2001Applicant: MAN Roland Druckmaschinen AGInventors: Thomas Hartmann, Hans-Christoph Beltle, Andrea Fuchs, Roland Dietrich
-
Patent number: 6260230Abstract: A floor washing and drying method and apparatus is provided which includes a first reservoir and a second reservoir. The first reservoir is adapted to hold water or other cleaning liquid in it. The first reservoir also includes a wringer mechanism which may be fixably or removably attached to the first reservoir. The first reservoir is also adapted to be used with a mop having a wetting or washing mop head attached to it. The wringer and the first reservoir are dimensioned such that the washing or wetting mop head may be placed within either the wringer or the first reservoir. The second reservoir is adapted to be used with a mop having a drying mop head attached to it. The drying mop head of the drying mop is dimensioned such that it will fit within the second reservoir but not within the wringer or the first reservoir.Type: GrantFiled: October 23, 1999Date of Patent: July 17, 2001Assignee: K. D. Hunt, Inc.Inventor: Kevin D. Hunt
-
Patent number: 6261377Abstract: The present invention is related to a method of removing particles and a liquid from a surface of a substrate using at least one rotating cleaning pad. The approach, according to the present invention, is a technique wherein a sharp liquid-vapor boundary is created on the surface of the substrate adjacent to the last wetted rotating cleaning pad of a plurality of rotating cleaning pads and particularly between this last wetted rotating cleaning pad and a first edge of the substrate.Type: GrantFiled: September 24, 1998Date of Patent: July 17, 2001Assignee: Interuniversitair Microelektronica Centrum (IMEC)Inventors: Paul Mertens, Mark Meuris, Marc Heyns
-
Patent number: 6260386Abstract: Glass preforms are cleaned by contacting each preform (11) with supercritical carbon dioxide which dissolves residual index-matching oil on the preform. The liquefied carbon dioxide is then converted to gaseous carbon dioxide which conveniently separates the index-matching oil so that it can be recovered and reused. The gaseous carbon dioxide is likewise recycled for use in cleaning other preforms, and so there is substantially no waste.Type: GrantFiled: March 10, 1994Date of Patent: July 17, 2001Assignee: Lucent Technologies Inc.Inventors: Jeffrey Jonathan Evans, Siu-Ping Hong, Urmi Ray, Trudy Murrell Thiele
-
Patent number: 6261378Abstract: A cleaning unit for cleaning a substrate is disclosed, that comprises a holding mechanism for rotatably and horizontally holding the substrate, a first traveling means for holding both sides of a cleaning mechanism having at least one cleaning member and for moving the cleaning mechanism in such a manner that the first traveling means is kept in parallel with the substrate held by the holding mechanism, and a second traveling means for holding both sides of a processing solution supplying mechanism having supplying mechanisms for supplying different types of processing solution and for moving the cleaning mechanism in such a manner that the second traveling means is kept in parallel with the substrate held by the holding mechanism. Thus, the strength of the cleaning unit according to the present invention is higher than the strength of a conventional cleaning unit that holds an arm on one side thereof.Type: GrantFiled: March 19, 1999Date of Patent: July 17, 2001Assignee: Tokyo Electron LimitedInventors: Hiroshi Hashimoto, Yoshitaka Matsuda, Norio Uchihira, Masaaki Yoshida, Fumio Satou
-
Patent number: 6258177Abstract: An apparatus and method for removing sedimentary waste from the grooves of a lapping machine is provided. A blade is inserted into a groove in a lapping plate, high pressure water is sprayed into the groove in the proximity of the blade, and the blade is drawn through the groove.Type: GrantFiled: March 29, 1999Date of Patent: July 10, 2001Assignee: SEH AmericaInventors: Arnold B. Eastman, Jr., Michael W. Shepherd
-
Patent number: 6254691Abstract: A feather duster and dusting method according to which the respective end portions of a plurality of curved feathers are attached to a handle and the feathers are oriented so that the other end portions of the feathers curve radially outwardly from the axis of the handle in one general direction.Type: GrantFiled: October 5, 1999Date of Patent: July 3, 2001Assignee: Harper CorporationInventor: Jeff Campbell
-
Patent number: 6254692Abstract: A method of using a disposable moist towelette to clean and sanitize a top surface and a tight circumferential groove on the top of a pop top beverage can wherein the towelette is moistened with a liquid which does not leave a residue with a perceptible odor or taste after using the moistened towelette to clean the top surface and circumferential groove on the beverage can. The method includes the steps of storing a moist towelette in a sealed disposable packet; removing the moist towelette from the packet; placing the moist towelette on the top of the pop top beverage can; forcing a portion of the moist towelette into the groove on the top of the beverage can; and applying pressure to the moist towelette while manipulating the moist towelette to clean the top surface and groove on the can.Type: GrantFiled: June 12, 2000Date of Patent: July 3, 2001Inventor: Byron W. Cooper
-
Patent number: 6254690Abstract: Disclosed herein is a semiconductor wafer cleaning method using a semiconductor wafer cleaning device. The method includes providing a semiconductor wafer cleaning device with a back brush, bringing the back brush into contact with the entire lower surface of the semiconductor wafer, and cleaning an upper surface of the semiconductor wafer with a surface brush so as to clean the entire surface of the semiconductor wafer in an ever-horizontal state.Type: GrantFiled: March 26, 1999Date of Patent: July 3, 2001Assignee: Oki Electric Industry Co., Ltd.Inventor: Koji Ueki
-
Patent number: 6254688Abstract: For cleaning a wafer by a cleaning apparatus, a cleaning liquid is contained in a cleaning bath. Leaving two brushes open, the wafer is inserted to the cleaning bath, placed on oscillation and rotation rollers and retained by the rollers. The brushes are closed and the wafer is held by the brushes. Next, the two brushes are rotated while the wafer is oscillated and rotated by the rollers and so on. Furthermore, ultrasonic vibrations are applied to the cleaning liquid in the cleaning bath by an ultrasonic generator. Scrub cleaning with the two brushes and ultrasonic cleaning by ultrasonic vibrations are thereby performed on the wafer.Type: GrantFiled: December 3, 1998Date of Patent: July 3, 2001Assignee: TDK CorporationInventors: Kanji Kobayashi, Jun Kudo, Masao Yamaguchi, Shinya Yoshihara
-
Patent number: 6254693Abstract: The invention relates to a golf equipment storage device for use in an automobile for convenient transport of various golfing equipment. The golf equipment storage device includes a compartment for holding golf shoes, and a removable liner normally disposed therein. The removable liner has an abrasive surface that can be used to clean grass and debris off of golf cleats and the bottoms of golf shoes. The removable liner may also have a non-abrasive surface that the user may stand on when changing shoes. In use, the removable liner is removed and the user wipes the bottoms of the golf shoes and the golf cleats on the abrasive surface for cleaning. The removable liner is then restored to the compartment, and the golf shoes may then be placed on top of the liner for transport and storage.Type: GrantFiled: August 9, 2000Date of Patent: July 3, 2001Inventors: Brian C. Dawson, Brendan K. Ozanne
-
Patent number: 6251194Abstract: A method for cleaning or restoring a surface using a mop that is attached to a carrier block. A flowable pesticide or restorative material is applied and removed by passing the mop over and in contact with the material that is applied in closely timed relationship. The method further utilizes different mops attached to the carrier block for each phase, one of which has grommets for attaching the mops to the carrier block.Type: GrantFiled: November 18, 1999Date of Patent: June 26, 2001Assignee: S. C. Johnson Commercial Markets, Inc.Inventors: Todd A. Williams, Richard A. Williams
-
Patent number: 6251195Abstract: An apparatus having a processing chamber for processing a semiconductor wafer under evacuated conditions that is capable of transfer of the wafer from the processing chamber under conditions that are substantially equal to the pressure of an adjacent environment. In a preferred embodiment, the processing chamber is pressurized and vented with a source of high purity dry gas that is diffused into the chamber through a diffuser to pressurize the processing chamber after processing of the wafer is completed. A chamber equalization port between the processing chamber and the adjacent environment is opened to maintain the pressure within the chamber at or slightly above the pressure of the adjacent environment, and the chamber valve is then opened. The wafer can then be removed from the processing chamber, and a new wafer can be inserted. The chamber is then sealed by closing the chamber valve and the equalization port, and the atmosphere within the processing chamber is evacuated to a desired level.Type: GrantFiled: July 12, 1999Date of Patent: June 26, 2001Assignee: FSI International, Inc.Inventors: Thomas J. Wagener, John C. Patrin, William P. Inhofer, Kevin L. Siefering
-
Patent number: 6248180Abstract: A method of removing particles adhering to a surface of a semiconductor wafer including the steps of: providing a container having a drain valve; positioning the semiconductor wafer in the container; directing a jet stream consisting of water against the surface of the semiconductor wafer; removing particles adhering to the surface of the semiconductor wafer by scrubbing the surface of the semiconductor wafer with a brush while the jet stream of water is directed against the surface of the semiconductor wafer; closing the drain valve while the jet stream of water is directed against the semiconductor wafer, wherein the water accumulates in the container to thereby completely immerse the brush and the semiconductor wafer in the water in the container; and maintaining the brush and the semiconductor wafer completely immersed in the water from the jet stream for a predetermined period of time.Type: GrantFiled: September 9, 1998Date of Patent: June 19, 2001Assignee: LSI Logic CorporationInventors: Nobuyoshi Sato, Hideaki Seto, Koji Ohsawa, Haruhiko Yamamoto
-
Patent number: 6245157Abstract: The present invention relates to cleaning compositions which, as powder or as aqueous formulation, comprise sodium bicarbonate and, as dispersants, polyaspartic acids and/or salts thereof, to the use of these cleaning compositions for the abrasive cleaning of hard surfaces, and also to a method of cleaning surfaces contaminated with deposits using these cleaning compositions.Type: GrantFiled: September 14, 1999Date of Patent: June 12, 2001Assignee: Bayer AktiengesellschaftInventors: Manfred Gerlach, Bernhard Lehmann, Hartwig Wendt, Herbert Emde, Urban Recht
-
Patent number: 6245156Abstract: Substrate transporting method comprising (a) inputting process data, (b) determining whether a number of units required for processing the wafer is an odd number or an even number, (c1) when a determination result of the step (b) is an odd number, transporting the wafer, (d1) taking out the wafer by the second arm from a cassette section, (e1) loading the W by the second arm to an odd-numbered unit, (f1) unloading the W by the third arm from an odd-numbered unit, except for a final unit, (g1) loading the W by the third arm to an even-numbered unit, (h1) unloading the W by the second arm from an even-numbered unit, and (i1) unloading the W from the final unit by the first arm and loading the W by the first arm into the cassette section, and (c2) when a determination result of the step (b) is an even number, transporting the W (d2) taking out the W by the third arm from the cassette section, (e2) loading the W by the third arm into an odd-numbered unit, (f2) loading the W by the second arm from an odd-numberedType: GrantFiled: March 11, 1999Date of Patent: June 12, 2001Assignee: Tokyo Electron LimitedInventors: Hiroki Taniyama, Hiroyuki Ataka
-
Publication number: 20010002594Abstract: The device for removing bond pad material deposits adhering to the ends of contacting needles for contacting the bond pads of a die is provided with a substrate having an adhesive upper side adapted to be contacted by the ends of the contacting needles and being configured such that the adhesive force between the deposits and the upper side of the substrate is larger than the adhesive force between the deposits and the ends of the contacting needles.Type: ApplicationFiled: December 6, 2000Publication date: June 7, 2001Inventor: Peter Binkhoff
-
Publication number: 20010002593Abstract: An inventive edge cleaning device is provided for cleaning the edge a thin disc such as a semiconductor wafer. The inventive edge cleaning device has a sonic nozzle positioned so as to direct a liquid jet at the edge surface of the thin disc. Preferably the sonic nozzle is radially spaced from the thin disc's edge so that scrubbing, spin rinsing or spin cleaning may be simultaneously performed on the major surfaces of the thin disc as the thin disc edge is cleaned by the sonic nozzle. The liquid jet may include deionized water, NH4OH, KOH, TMAH, HF, citric acid, a surfactant, or other similar cleaning solutions, and the nozzle may remain stationary as the thin disc rotates or the nozzle may scan the circumference of the thin disc to clean the entire edge of the thin disc.Type: ApplicationFiled: December 15, 2000Publication date: June 7, 2001Inventors: Boris Fishkin, Jianshe Tang, Brian J. Brown
-
Patent number: 6241828Abstract: A method is disclosed for removing impurities from an elastomer intended for medical or pharmaceutical use, which includes a step of performing a first solvent extraction process on the elastomer by contacting the elastomer with a first extracting solvent in a non-supercritical state to substantially remove impurities from the elastomer, thereby leaving a residue of said first extracting solvent in the elastomer. The elastomer is there after subjected to a second solvent extraction process, by contacting the elastomer with a second extracting solvent, which is a supercritical fluid or a mixture of super critical fluids, in order to remove substantially reduce the concentration of the residue of the first extracting solvent remaining in the elastomer after the first solvent extraction process.Type: GrantFiled: September 25, 1998Date of Patent: June 5, 2001Assignee: Bespak, PLCInventor: Paul Barnes
-
Patent number: 6240932Abstract: “The present invention is a process for cleaning a cathode tube and other subassemblies in a hollow cathode assembly. In the disclosed process, hand covering elastomer gloves are used for handling all cathode assembly parts. The cathode tube and other subassemblies are cleaned with a lint-free cloth damped with acetone, then wiped with alcohol, immersed in ethyl alcohol or acetone, and ultrasonic agitation is applied, heating to 60° C. for ethyl alcohol or 56° C. for acetone. The cathode tube and other sub assemblies are dried by blowing with nitrogen gas.Type: GrantFiled: February 14, 2000Date of Patent: June 5, 2001Assignee: The United States of America as represented by the Administrator of NASAInventors: Michael J. Patterson, Timothy R. R. Verhey, George C. Soulas
-
Patent number: 6235636Abstract: Chemical mechanical polishing for removing a hardened surface layer of photoresist in the manufacture of semiconductor devices. The use of chemical mechanical polishing allows for the removal of a hardened surface layer of photoresist that has been hardened through ion beam implantation or plasma etching. The chemical mechanical polishing process places a semiconductor wafer with a photoresist layer on a polishing pad. The photoresist layer is placed close to the polishing pad, so that the hardened surface layer of the photoresist layer is removed. A slurry is added to the polishing pad to aid in the removal of the hardened surface layer of the photoresist layer. Conventional chemical stripping is then used to remove the remaining photoresist layer.Type: GrantFiled: April 20, 1999Date of Patent: May 22, 2001Assignee: Advanced Micro Devices, Inc.Inventors: Che-Hoo Ng, Matthew S. Buynoski
-
Patent number: 6235660Abstract: Anti-static cleanroom products having a coating of conductive polymeric particulates which decreases the surface resistivity of the products. Preferably, the particulates are pyrrole polymers. The anti-static properties are achieved by depositing conductive polymer particles onto the non-conductive substrate surface. The anti-static products include cleanroom wipers, stationery products (notebooks and writing instruments), garments and swabs (polyurethane foam tipped). The cleanroom stationery products include notebooks comprising polyethylene impregnated with silica. The invention also includes anti-static plastic gloves.Type: GrantFiled: November 13, 1997Date of Patent: May 22, 2001Assignee: The Texwipe Company LLCInventors: Himansu R. Bhattacharjee, Edward Paley
-
Patent number: 6231430Abstract: The present invention is directed to improved apparatus' for dislodging and abrading cryolite encrustations from carbon anodes spent during aluminum smelting. Both the plow blade and flailing elements of the present invention are constructed and arranged to substantially conform to the shape of the spent carbon butts to facilitate rapid and efficient cleaning of the spent carbon anodes' surfaces. Systems and methods employing the substantially V-shaped plow blade extension and dual directional rotating flailing assemblies are also disclosed.Type: GrantFiled: September 29, 1999Date of Patent: May 15, 2001Assignee: Dill Engineering, Inc.Inventor: Raymond J. Dill
-
Patent number: 6230753Abstract: A method and apparatus for cleaning a wafer oriented vertically is provided. The apparatus includes a first brush and a second brush located horizontally from the first brush. During unloading of the wafer after cleaning, the wafer is located vertically between the first and second brushes and on a pair of rollers. A finger tip located vertically above the region between the first and second brushes contacts an edge of the wafer and thus hold the wafer in the precise unloading position at which a wafer transfer robotic arm has been programmed to engage/disengage the wafer. Accordingly, the wafer is reliably and repeatedly engaged by the robotic arm.Type: GrantFiled: July 9, 1998Date of Patent: May 15, 2001Assignee: Lam Research CorporationInventors: Oliver David Jones, Jim Vail
-
Patent number: 6231680Abstract: A method for cleaning a surface by flooding and thereby cleaning a surface contaminated with deposits with a mixture containing water, wood chippings, and optionally, polyaspartic acid or a derivative of a polyaspartic acid.Type: GrantFiled: February 16, 2000Date of Patent: May 15, 2001Assignee: Bayer AktiengesellschaftInventors: Manfred Gerlach, Bernhard Lehmann
-
Patent number: 6231679Abstract: A method and apparatus for removing dust from a base film effectively so that electrostatic charges of the base film are reduced while the cleaning effect is kept high. After a cleaning solvent is applied onto one surface of a base film by a precoater, a rod member is pressed against the base film while the cleaning solvent remains on the base film, so that deposits on the base film are separated and scraped together with the cleaning solvent from the base film by the rod member. Just after the deposits are scraped from the base member, a solvent, of the same kind as the cleaning solvent or a mixture of a solvent of the same kind as the cleaning solvent and an additive mixed thereto, is applied onto the base film while the surface of the base film coated with the cleaning solvent is not exposed to an atmospheric air space.Type: GrantFiled: July 16, 1998Date of Patent: May 15, 2001Assignee: Fuji Photo Film Co., Ltd.Inventors: Toshihiro Mandai, Hideaki Takekuma, Norio Shibata
-
Patent number: 6221170Abstract: A diving mask fog wiping device and method which allows fog on the inside of the viewing face plate to be wiped by a slave unit which is magnetically coupled to a master unit on the opposite side of said viewing face plate. Further, the slave unit is magnetically coupled to a resting unit which keeps it out of the line of sight and near the surface of the viewing face plate while it is not being used for wiping. A porous and nonabrasive surface on the slave unit may be soaked in an antifog agent, allowing the agent to be applied and re-applied every time fog is wiped.Type: GrantFiled: December 2, 1999Date of Patent: April 24, 2001Inventors: Caren Marzban, Haejung Paik
-
Publication number: 20010000199Abstract: A method and an apparatus for manufacturing a semiconductor integrated circuit in which semiconductor elements (2) and a wiring structure connecting the semiconductor elements (2) one another are located on a semiconductor substrate (1). In the method or apparatus, a series of wiring elements (4,6,7,9,10), each of which constructs the wiring structure is formed sequentially, then the semiconductor integrated circuit under manufacturing process is washed by neutral solution containing oxidant during the process of forming of the wiring elements (4,6,7,9,10).Type: ApplicationFiled: December 4, 2000Publication date: April 12, 2001Inventors: Shigeru Harada, Takashi Yamashita, Noriaki Fujiki, Tsutomu Tanaka
-
Patent number: 6210062Abstract: A facial cleansing purpose foaming device can produce creamy soapsuds containing a lot of small bubbles with ease and also can squeeze out the produced soapsuds with ease. The facial cleansing purpose foaming device includes a tubular body which is formed of a flexible material being formed into a net-like form from synthetic resin material or synthetic resin fibers to have air permeability and water permeability. The body includes a gripping portion fitted to one end thereof and an opening formed at the other end thereof, and is so structured that it can contain therein solid cleansing material inserted from the opening.Type: GrantFiled: March 16, 2000Date of Patent: April 3, 2001Assignee: Kokubo Industrial & Co.Inventor: Yoshiaki Kokubo
-
Patent number: 6210748Abstract: An electrode substrate is brush cleaned with a hydrogen gas dissolved water, which has an oxidation-reduction potential of −860 mV to −400 mV and a pH of 8 to 12, before applying an alignment layer material on the electrode substrate. Thus, it is possible to decrease the manufacturing costs without decreasing the detergency.Type: GrantFiled: June 17, 1998Date of Patent: April 3, 2001Assignee: Kabushiki Kaisha ToshibaInventors: Yoshiyuki Nagahara, Naoya Hayamizu, Naoaki Sakurai, Noriko Okoshi, Toshitaka Nonaka, Hiroaki Furuya
-
Patent number: 6210490Abstract: A cleaning card for cleaning the magnetic heads of magnetic card readers is disclosed. As the card is pushed through the reader, the magnetic head protrudes through the card and then as the card continues to move the sides of the hole in the card scrub both sides of the head effectively removing dirt.Type: GrantFiled: March 2, 1999Date of Patent: April 3, 2001Assignee: elk TechnologiesInventors: David A. Michael, Larry W. Ditty
-
Patent number: 6206978Abstract: A process for using a magnetic aquarium tank wall cleaning tool for cleaning the inner surface of an aquarium having one or more curved interior vertical corners. Magnetic cleaners for aquariums eliminate the need for reaching into the tank or manipulating a cleaner with a long handle. The magnetic tank wall cleaning tool has at least one edge which is curved. The radius of curvature is no more than the radius of curvature of the inner surface of the tank to be cleaned. The cleaner can be manipulated from one flat surface around a curved interior corner by moving the handle horizontally around the corner.Type: GrantFiled: December 13, 1999Date of Patent: March 27, 2001Assignee: Roger Williams General HospitalInventor: Jeff Wen Chieh Tsui
-
Patent number: 6203623Abstract: An aerosol assisted chemical cleaning method to remove wall deposition from reaction chambers is provided. The method generates cleaning chemicals in an aerosol state, and then feeds them into the reaction chamber by a carrier gas. The cleaning chemicals interact quickly with unwanted deposits on all internal surfaces of the reaction chamber. By controlling the pressure in the closed reaction chamber, the deposits can be stripped off from the wall and fall into a waste acid collector. The acid collector can then process the waste to prevent contamination.Type: GrantFiled: December 28, 1999Date of Patent: March 20, 2001Assignee: Ball Semiconductor, Inc.Inventor: Chang Feng Xia
-
Patent number: 6203626Abstract: A method of mopping including the use of unique mop handle means which allows an offset gripping of the handle intermediate its ends and utilization of rotatable swivel grip on one end, which enables the user of a mop to mop more efficiently and with reduced risk of injury including repetitive motion injuries and the like.Type: GrantFiled: April 12, 1999Date of Patent: March 20, 2001Inventors: Blyth S. Biggs, Brenden Biggs
-
Patent number: 6193808Abstract: In this method for washing motor vehicles in a gantry-type washing installation with two movable gantries, washing is performed with a single pair of vertical brushes which wash between two horizontal brushes and are located on one of the two gantries. During a forward movement of the gantries, the washing process is commenced with the first horizontal brush in the front third of the vehicle, while the nose is washed with the two vertical brushes. Then the nose and the top of the vehicle approximately up to the rear third of the vehicle are washed with the second horizontal brush. The direction of travel of the gantries is reversed as soon as the tail wash has been executed with the two vertical brushes and before the second horizontal brush has reached the tail of the vehicle.Type: GrantFiled: November 9, 1998Date of Patent: February 27, 2001Assignee: Wesumat Fahrzeugwaschanlagen GmbHInventor: Wolfgang Decker