Abstract: A transfer machine having a pair of holding members disposed opposite to each other to hold a plurality of objects arranged at their peripheral edges. A drive mechanism selectively moves the holding members toward and away from each other in order to selectively hold and release the objects by the holding members. A transfer mechanism transfers the objects and the holding members to a bath in order to process the objects in the bath. Each of the holding members has a plurality of holding notches for holding the peripheral edges of the objects, and the notches are disposed in upper and lower holders which are arranged parallel to each other. The holding notches of the upper holder have a first taper part positioned adjacent an opening of the notch and a second taper part positioned adjacent a notch bottom, and the first taper part has an opening angle larger than an opening angle of the second taper part.

Abstract: An apparatus for treating a workpiece, the apparatus including a carriage for holding the workpiece, a first station for transferring the workpiece into and out of the carriage, a first chamber for holding treating fluid, a second station for transferring the workpiece between the carriage and the first chamber, and a mechanism for staging the carriage, the mechanism capable of positioning the carriage at the first station and at the second station and the first chamber capable of being isolated from atmosphere when the carrier is located at the second station.

Abstract: A wafer processing equipment of a single wafer transfer type comprising a wafer cleaning apparatus, a pure water cooling system, a pure water circulatory system, and a wafer drying apparatus for drying the cleaned wafer one by one, is disclosed. The cleaning apparatus comprises a pure water jet device for cleaning a wafer by jetting pure water to which ultrasonic wave is applied, against the main surface of the wafer, and a pure water collection tank for collecting the used water. The cooling system comprises a heat exchanger provided in the collection tank, for cooling the pure water in the collection tank. The circulatory system is for circulating pure water stored in the collection tank, through a filter for catching pollution or particles contained in the stored pure water. The drying apparatus is for drying the cleaned wafer one by one.

Abstract: Oil quenched works are immersed in water at a temperature of 75.degree. C. while the works are maintained at a temperature of not lower than 100.degree. C. In the step of immersing the works in water, the water boils on the surfaces of the works to remove most quenching oil from the surface of the works. A part of oil removed from the works is caused to overflow from the upper portion of a water bath and exhausted therefrom. In the step of immersing the works in water, the works are retained at a temperature suited for an alkaline cleaner. After having been taken out of the water, the works are cleaned in a step of showering water. A step of immersing the works in the alkaline cleaner is performed before the temperature of the works becomes lower than 60.degree.C. The alkaline cleaner used in the step of immersing the works in the alkaline cleaner is maintained at a temperature of 70.degree. C..+-.5.degree. C. In this range of the temperature, quenching oil is continuously removed stably for a long time.

Abstract: An ultrasonic degreasing apparatus includes a cleaning section, a rinsing section, a hot water cleaning section, and a drying section. The cleaning section has an ultrasonic oscillator for oscillating ultrasonic waves in distilled water and a heater for heating the water, and performs a degreasing process including a cleaning process with respect to an object to be processed in the heated water by using ultrasonic waves. The cleaning section has a deaerating section for performing deaeration by circulating the distilled water. The rinsing section has an ultrasonic oscillator for oscillating ultrasonic waves in distilled water containing a rust preventive and a heater for heating the water, and performs a degreasing process including a rinsing process with respect to the object in the heated water by using the ultrasonic waves. The rinsing section has a deaerating section for performing deaeration by circulating the distilled water.

Abstract: The present invention provides a medical instrument cleaning method and apparatus suitable for thoroughly cleaning medical instruments, particularly instruments used in dental treatment and with strongly adhesive deposits such as cement and the like.The instrument cleaning process according to the present invention comprising a boiling step of boiling instruments with deposits thereon in a boiling vessel, allowing water to soak into the deposits, a drying step of drying the boiled instruments with hot air in a drying vessel to dry the water-soaked deposits, and a washing step of washing the dried instruments in a washing vessel to remove the dried deposits.

Abstract: Disclosed herein is a mixed solvent composition including perfluorohexane and isohexane or diisopropyl ether.

Abstract: A raising and lowering mechanism is provided at a work station for vertically transferring articles or products delivered to the station by an overhead delivery conveyor. Discrimination between transfer of a load from the delivery conveyor and transfer back to the delivery conveyor is accomplished by a mechanical discriminator which appropriately conditions suspension hooks on the delivery conveyor for either releasing the load or reconnecting the load. The transfer mechanism employs a vertically reciprocating conveyor which is confined to a vertical transfer axis without the necessity to employ some degree of lateral movement to uncouple the load from the delivery conveyor, present the load at a working position within the work station, and return the load to the delivery conveyor. Drift compensation is provided to allow for some misalignment of a delivered load with the transfer axis.

Abstract: Semiconductor processing equipment includes an ID-card removing robot, an ID-card stocking device, and an ID-card attaching robot so that the management of ID cards is performed inside the equipment. Thus, the present invention makes it possible to reduce equipment size and achieve highly efficient factory automation. Furthermore, in a semiconductor processing equipment module according to the present invention, each item of semiconductor processing equipment has its own ID-card stocking device. As a result, the number of case carriers can be reduced and a space reduction with increased factory automation can be easily realized.

Abstract: An improved automated agitating immersion washer includes a wash and rinse station which operates by triple-action to agitate and rotate a basket of dirty parts with respect to fluid in a tank and further turbulates the fluid with respect to the basket to more effectively clean the parts. The washer has a two state blow-off drying station wherein one stage the basket is rotated in the presence of forced heated air while in the second stage, the basket sits stationary in the presence of forced heated air to complete the drying cycle. While the washer has an indexing mechanism which moves individual baskets through each successive stage, and each stage operates independently of the other stages so that baskets may be continually loaded and unloaded from the wash without waiting for one basket to complete all cycles of the washing sequence.

Abstract: A washing/drying method, comprising: dipping a material to be washed into an aqueous solution containing a surfactant having a water repellency so that at least one molecular layer of the water repellent surfactant is attached to the surface of the material to be washed; and then drying the material according to a known drying method such as vacuum drying, shaking off, blowing with gas and heating; or heating the material to be washed with steam at a temperature of less than 100.degree. C. in an atmosphere reduced to a pressure such that the boiling point of water becomes less than 100.degree. C.; and then drying the material according to a known drying method such as vacuum drying, shaking off, blowing with air, and heating.

Abstract: A method of cleaning metal articles comprises the steps of cleaning metal articles with alkaline washing water, rinsing the metal articles with deoxidized rinsing water, removing water from the metal articles by blowing dry vapor on the metal articles and drying the same in a heated atmosphere. Further, an apparatus for cleaning metal articles comprises a washing reservoir for containing alkaline washing water, a rinsing water deoxidizing device, a rinsing reservoir connected to the water-deoxidizing device, for containing deoxidized rinsing water supplied from the rinsing water deoxidizing device, a boiler, a water-removing reservoir connected to the boiler and supplied with dry vapor from the boiler, and a drying reservoir having an interior in which a heated atmosphere is created, which reservoirs are arranged in this order.

Abstract: A filter press plate shifter assembly provided with a shifting housing having a tunnel-like center part which passes over the filter plates and housing parts positioned adjacent opposite side rails. The housing parts are rollingly supported on rods which extend along the side rails. One housing part mounts a rotary pneumatic motor and a drive roller which drivingly engages the rod to control movement of the shifter assembly along the press. Each side housing part mounts a pneumatic plate shifter for permitting the endmost plate in the closed stack to be individually and sequentially shifted away from the stack into an open position when discharge of filtrate is desired. The shifter housing mounts a bumping device which cooperates with the endmost plate in the stack to effect vertical bumping thereof relative to the support rails to assist in loosening sticky cake which adheres to the plate.

Abstract: An immersion cleaning device is provided with concave portions housing respective chemical baths into which a workpiece is selectively immersed. Any gas and mist generated from the chemical baths is exhausted from the concave portions. A transportation element has a portion to hold a workpiece with takes the workpiece into or out from the chemical bath. A controller is included to control operation of transportation means. An enclosure body moves with the holding portion and is moved with the workpiece to substantially enclose any gases and chemical mist generated during the transportation. Corrosion of the device and pollution which might be caused by leaks of gases and mist to the outside are thus prevented.

Abstract: The present invention relates to a method and an apparatus for automatically binding a silicon wafer to a carrier plate. In the binding method of the present invention, the wafer is positioned underneath the carrier plate and then lifted and bonded to the carrier plate, at or below atmospheric pressure: once this is accomplished the process returns to the previous pressure. In addition, in the apparatus which performs this process, by means of a carrier means which supplies the carrier plate and wafer to the location where binding is to be carried out, the binding surface of the carrier plate and wafer are turned upward, transported and the carrier plate is flipped around in the interval between the carrier plate transportation apparatus and the binding unit.

Abstract: A washing system comprising a wafer washing section having plural chemical washing vessels, plural water washing vessels and a drier, a cassette washing section having a water washing device and a drier, a loader section for taking out the wafers from the cassettes and loading the wafers into the wafer washing section, an unloader section for returning the washed wafers in the washed cassette and unloading the wafers from the wafer washing section, a wafer transfer device the wafers in the wafer washing section, a cassette lifter for carrying the cassettes from the loader section to the cassette washing section, and a wire drive unit for carrying the cassettes in the cassette washing section.

Abstract: In order that higher demands on the purity of the separated liquid can be satisfied, a cleaning plant (12) having wash chambers (13a,b) for the cleaning of the filter plates (8) is arranged in longitudinal direction alongside of a filter press (1). By means of a transport device (30) having a displacement device (32) which is moveable along rails (31a) and is equipped with a raisable and lowerable gripper (37) which can be engaged via pawls with filter plates (8), the filter plates, after the opening of the filter press (1), are transported one after the other into the cleaning plant (12), sprayed in one of the wash chambers (13a, b) with simultaneous drawing off of the air or subjected to an immersion bath, possibly disinfected or impregnated, dried and transported back. By the development of the cleaning plant (12) with two wash chambers (13a, b), idle paths of the displacement device (32) are substantially avoided.

Abstract: A dipping type wafer treatment apparatus includes housing having first and second openings, a wafer treatment bath provided inside the housing, a clean air unit for producing a downflow, a flow rectifier for introducing the downflow into the housing, a communicating chamber provided below the housing being partitioned from a space inside the housing, a duct for guiding mist in the vicinity of the treatment bath in the housing into the communicating chamber together with the downflow, and a pump for forcing air out of the communicating chamber from an air outlet provided in the communicating chamber.

Abstract: The present invention concerns a plant for treating mechanical pieces in a washing tank, of the type comprising at least one stationary washing tank, a horizontal rail positioned above said tank, a conveying unit movable along said rail and above the tank, suspension means associated to said conveying unit and apt to be lowered into said tank and to be lifted out thereof, and a plurality of baskets to contain said pieces to be treated, apt to be hooked to said suspension means. According to the invention, said baskets have a structure allowing them to be stacked in piles and they are provided with means for stacking them into a pile, consisting of lead-in centering means; furthermore, to said suspension means there are associated height detection means cooperating with the top of the baskets, so as to allow storing the baskets in piles directly on the floor, without having to use motored belt or roller conveyors.

Abstract: A cleaning apparatus for cleaning delivery probes used for dispensing protein-containing reagents. The apparatus includes: a bath of a cleaning solution for a protein-containing reagent; a device for lowering the probe into the cleaning solution for aspirating cleaning solution into the probe and for coating the outside of the probe; a device for raising the probe from the cleaning solution; a device for forcing primer liquid through the probe for expelling aspirated cleaning solution followed by primer liquid from the probe for washing the inside of the probe; and a device for deflecting cleaning solution and primer liquid expelled from the probe onto the outside of the probe for washing the outside of the probe.

Abstract: A method for washing batteries includes washing batteries in water flowing at a low flat rate at a rinse station, collecting the water from the station, introducing fresh water, and repeating this at sequential stations, and causing water to flow between the stations at a given rate by creating a flow channel between them.

Abstract: In a cleaning system for cleaning venetian blinds, the blinds are stretched with their slats extending vertically on a carrier belt that is mounted to rotate about longitudinally separated drive and idler assemblies. One run of the carrier belt forms a station for loading and unloading of the blinds, and the other run of the carrier belt passes through successively arranged chambers in which both sides of the blinds to be cleaned are sprayed with washing liquid followed by various rinse solutions, whereafter the blind is passed through a drying chamber in which hot air is blown to effect drying. The vertical arrangement of the slats of the blind enable the washing and rinse liquids to drain rapidly and substantially completely so that the energy required for drying is reduced.

Abstract: A machine has been developed for photoresist processing which has two filtered upward flowing baths, one for the develop fluid and one for the rinse fluid. In order to be able to develop photoresist patterns with submicron geometries, it is necessary to retreat from the current method of developing on a conventional spin developer. The batch immersion develop would suffice in certain applications, but contamination and automation obstacles cannot be overcome with the batch immersion process. Also, the develop process cannot be accomplished on very small geometries which developing pattern side up due to ununiform developing across the wafer causing critical dimension sizing problems. The described concept utilized an upside down immersion process with automated in line capabilities. It requires a filtered bubble free, temperature controlled, slow upward flowing develop chemical which the wafer is immersed into while spinning very slowly.

Abstract: Apparatus for conveying article carriers (11) through a series of processing stations (T) in the form of tanks into which articles supported by the carriers are to be dipped has a row of lifting devices (13A-13H), each including an article carrier support (17) which defines a section of a horizontal processing track along which the article carriers (11) are movable in succession. The article carrier supports (17) are individually displaceable vertically between an upper position and a lower position (dipping position). When adjacent article carrier supports (17) are simultaneously in the upper position, an article carrier on one of the article carrier supports can be fed over to the other. A sensor (K) triggers lowering of said other article carrier support to the lower position in response to the reception of the article carrier by that article carrier support.

Abstract: Parts to be cleaned, degreased, or having paint stripped therefrom, by a solvent such as a halogenated hydrocarbon are lowered into and lifted out of a tank via an enclosure disposed above the tank. A pair of doors at the top opening and a second pair of doors at the bottom opening of the enclosure allow isolation of the enclosure from the tank below and from the outside environment above. Parts are lowered into the enclosure with the top doors open and the bottom doors closed. They are then further lowered into the tank for cleaning, degreasing or paint stripping with the top doors closed and the bottom doors open. After cleaning, degreasing or paint stripping, the parts are lifted back into the enclosure and the bottom doors are closed.

Abstract: There is disclosed a cleaning device for cleaning a semiconductor wafer. According to the present invention, ech of the steps of the cleaning process used a separate carrier, so that none but the wafers need be washed, saving washing time. When drying, the surfaces of the wafers are kept from being contaminated by residual cleansers, thereby improving the yield rate.

Abstract: A wafer transporting device for transposing and transferring wafers charged in at least two first carriers to second carriers, including a wafer holding device provided with a holder for holding the wafers which are removed from the first carriers and a wafer transferring device for removing the wafers charged in the first carriers by one stroke, thereby improving the working efficiency in a semiconductor manufacturing system.

Abstract: An apparatus for conveying untreated materials includes a unit conveyor (25), and a collective conveyor (33). The unit conveyor (25) is constituted of a carriage (19) operated so as to move along a treatment line (1) composed of a plurality of treatment vessels arranged in a row, and carriers (16) provided so that they are moved vertically by the carriage (19) so as to lift and lower from and into the interior of a treatment vessel, while the collective conveyor (33) is constituted of elevator frames (26) provided along the treatment line (1) within the zone of movement of the carriage (19), lifting gears (27) adapted to move the elevator frames (26) in the vertical direction, and supports (28) which are provided on the elevator frames (26) respectively so as to be moved in the direction of the treatment line (1) and which are adapted to support the untreated materials (15).

Abstract: A method and apparatus for cleaning and drying semiconductor wafers wherein the wafers may be stored in a wet environment until the cleaning step and wherein, after drying, the wafers are substantially isolated from the remainder of the apparatus and the workplace environment to prevent or at least substantially eliminate the recontamination of the wafer surface. The wafers are removed one at a time from an incoming storage bath and are transported to a cleaning station where they are cleaned and are then transported to a drying station. After being dried the wafers are transported to an output station where they are loaded into a portable enclosure member which substantially isolates the wafers in the enclosure from further contamination. Further, means is provided for introducing clean air into the drying station and venting at least a portion of the air through the cleaning station while at the same time substantially precluding the escape of air into the output station enclosure member.

Abstract: A wafer washing and drying apparatus including a chemical cleaning bath for cleaning a wafer, such as a semiconductor wafer and a silicon wafer set in a carrier, with a liquid chemical reserved therein, a rinse bath for washing off the liquid chemical attached to the wafer with a washing liquid such as pure water or an organic solvent reserved therein, an organic vapor drier for drying the wafer in contact with a vapor flow of an organic solvent and a wafer holding device having a holder for holding the wafer only to be transferred from the carrier, which holder has a heat capacity smaller than that of the carrier, and which wafer holding device has a function of transporting the wafer from the rinse bath to the organic vapor drier and a wafer transferring device for transferring the wafer from the carrier to the holder in the rinse bath.

Abstract: An apparatus for treating a workpiece by a pre-treatment process before painting or for a washing process in an electrodeposition treatment. The workpiece is transferred through a series of treating zones. The apparatus has a plurality of hanger disposed on the right and left sides relative to the advanceing direction of the workpiece, a pair of hanger travelling rails, a hanger carrying mechanism and a plurality of hanger lifting assemblies disposed on the right and left sides of the advancing direction. Each rail consists of fixed rail portions and movable rail portions. Right and left lifting assemblies are controlled in cooperation, simultaneously or alternately, to move the hangers up and down allowing the workpiece to tilt or oscillate within the treating zone.

Abstract: A cleaning apparatus which includes an ultrasonic cleaning tank, a rinse cleaning tank, a vapor cleaning tank and a distilling tank. The distilling tank has, at its inner lower portion, a heater. Means are provided for directing the flow of the cleaning liquid in each of the ultrasonic, vapor and rinse cleaning tanks into the distilling tank. Cooling means are disposed above the level of the cleaning liquid in each of the tanks to condense rinsing cleaning liquid vapors. Supply means supply a cleaning liquid cooled by the cooling means into the rinse cleaning tank and the vapor cleaning tank.

Abstract: The invention refers to a process and a device for the fully automatic cleaning of spray guns foulded with paint or varnish, wherein the spray guns are immersed with their paint or varnish reservoir open into a cleaning fluid free of solvents or thinners, during a first cleaning phase the fluid is circulated and a fluid jet is introduced into the open paint or varnish reservoir or into the paint or varnish inlet, during a second phase ultrasonic waves are introduced into the cleaning fluid while the spray guns are moved oscillating up and down in the fluid, the two cleaning phases are repeated at least once and the spray guns are subsequently repeatedly immersed in a rinsing fluid and, if applicable, are moved therein, while the rinsing fluid is circulated and a rinsing fluid stream is introduced into the open paint or varnish reservoir or into the paint or varnish inlet.

Abstract: An improved fixture is provided for use in supporting a plurality of components, particularly such as electrical or electronic components having elongated conductive terminals, during solder dip process steps or the like. The fixture comprises a generally U-shaped frame adapted to support a stacked group of channel members each having a generally U-shaped cross section to include opposed side walls with aligned slots therein. The channel members are assembled on the frame with a plurality of electrical components or the like supported between the channel member side walls and with the component terminals projecting outwardly through the side wall slots. When assembled, the fixture can be oriented as required to dip the terminals into a solder or other bath while maintaining the components in spaced relation against immersion into the bath.

Abstract: A work transfer system conveying a work basket in a programmed sequence to the processing tanks of an assembly thereof at various positions on a work bench. The system acts to transfer the basket to a selected tank and to properly orient the basket with respect to this tank before lowering the basket therein for processing for a given dwell period, at the conclusion of which the basket is hoisted from the tank and transferred to another tank where the procedure is repeated. Running parallel to the front side of the bench is a rail on which a robot rides, the robot supporting a hoist carriage which can be raised or lowered. Cantilevered from the carriage is a main arm articulated by an elbow shaft to a forearm that extends over the bench. The forearm is joined by a hand shaft depending therefrom to a hand that engages the handle of the work basket. A main arm motor acts to rotate the elbow shaft and thereby swing the forearm to a position generally aligning the basket with a selected tank therebelow.

Abstract: A workpiece carrier for holding workpieces through a plurality of liquid immersion stations including, a framework structure defining an interior space, a self-contained tiltable basket module having article compartments defined therein disposed within the interior space of the frame, a pivot member connecting the basket to the frame at a point offset from the central depth of the basket to cause the basket to normally tilt towards its front, a buoyant tank connected to the basket on the side remote from the a pivot member to tilt the basket towards its rear when the workpiece carrier is immersed in a liquid solution, effectively dissipating any air or gas pockets which might have formed in the hollow areas of the workpiece being treated.

Abstract: A work processing system comprising: a plurality of work processing stations or tanks arranged in a predefined manner; superstructure means suspended above the process stations; a programmable controller situated remote from said processing stations for generating command signals; crane means suspended on and translatable relative to the superstructure and to the processing stations in response to said command signals; work carrier means carried by the crane means and adapted to be suspended and supported by a respective one of the processing stations; the work carrier unit comprising a work carrier member or platform adapted to support a workpiece and further including means for rotating the work carrier member or platform about a predetermined axis thereof in response to command signals.

Abstract: A basket for tumbling workpieces is positioned in a carrier. The carrier is rotatably mounted on a carrier rotation axis between two legs of a stage assembly and is rotated by a carrier rotation motor mounted on the stage assembly. A basket cover supported on the carrier is driven between open and closed position with respect to the carrier mounted basket by a container cover drive motor mounted on the stage assembly, a double-acting lead screw shaft rotatably supported in the carrier in parallel relation to the carrier rotation axis, a drive train between the lead screw shaft and the basket cover, and a drive train, including sprockets rotatable on the carrier rotation axis, between the cover drive motor and the lead screw shaft.

Abstract: A vapor drying apparatus for semiconductor wafers, which is capable of preventing dust particles from entering the interior of the vapor drying apparatus incorporating therein a water washing part and a vapor drying part for a semiconductor wafer and, at the same time, thoroughly removing from the surface of a vapor dried semiconductor wafer the vapor cleaner adhering in the form of film or in a molecular thickness to the surface of an organic substance contained in the cleaner thereby bring the surface of the semiconductor wafer to an ideally cleaned and dried state.

Abstract: An industrial exhaust ventilation system enabling access to exhaust generating processes while containing and controlling the resultant exhausted gases is provided. A cover assembly is attached to the structure generating the exhaust gases and is provided with a reciprocating cover having an open and closed position. The exhaust generating process is accessible only when the cover is open. A conventional exhaust system is also provided to maintain the low level of air circulation necessary to convey the generated exhaust to a treatment facility. The ventilation system is optionally provided with a workload enclosure that travels to selected process structures and forms a fume containment region by interengaging with the cover assembly located thereon.

Abstract: Apparatus and method are provided by this invention for cleaning of internal combustion engine components. The method consists of heating the components, removing of dry debris from the components by blasting the component with shot and then physically shaking the component to remove the shot from cavities in the article. The apparatus includes a heating unit for heating of the components to a temperature to burn combustible debris and leaving the components coated only with dry debris and debris removing apparatus operating on the heated components. The debris removing apparatus includes an airless shot blast device for throwing of shot against the article and mechanism for support of the article in the path of the shot and revolution of the article about a horizontal axis. A carrier is provided for a plurality of the components and the carrier is supported for revolution about a horizontal axis during blasting with shot and is revolved and oscillated about transverse axes for removing of shot.

Abstract: An automatic set-up system is provided for setting up on a pallet work to be machined by a flexible manufacturing system automatic machine tool. The pallet has a support plate and a jig plate which overlies the support plate on which the work is placed. The support plate, the jig plate and the work are sequentially conveyed by a convey unit on a setting table. The relative positions of the support plate and the jig plate, and of the jig plate and the work are usually held constant by the engagement of positioning recesses and positioning pins. Even if the position of the jig plate or the work conveyed by the convey unit deviates from a predetermined position, a float base and a support plate (the float base, the support plate, and the jig plate) are floated by means of air bearing pads. The horizontal movement of these components can be readily controlled, so that positioning pins can be easily fitted in the positioning recesses.

Abstract: An automatic set-up system is provided for setting up on a pallet work to be machined by a flexible manufacturing system automatic machine tool. The pallet has a support plate and a jig plate which overlies the support plate on which the work is placed. The support plate, the jig plate and the work are sequentially conveyed by a convey unit on a setting table. The relative positions of the support plate and the jig plate, and of the jig plate and the work are usually held constant by the engagement of positioning recesses and positioning pins. Even if the position of the jig plate or the work conveyed by the convey unit deviates from a predetermined position, a float base and a support plate (the float base, the support plate, and the jig plate) are floated by means of air bearing pads. The horizontal movement of these components can be readily controlled, so that positioning pins can be easily fitted in the positioning recesses.

Abstract: An automatic set-up system is provided for setting up on a pallet work to be machined by a flexible manufacturing system automatic machine tool. The pallet has a support plate and a jig plate which overlies the support plate on which the work is placed. The support plate, the jig plate and the work are sequentially conveyed by a convey unit on a setting table. The relative positions of the support plate and the jig plate, and of the jig plate and the work are usually held constant by the engagement of positioning recesses and positioning pins. Even if the position of the jig plate or the work conveyed by the convey unit deviates from a predetermined position, a float base and a support plate (the float base, the support plate, and the jig plate) are floated by means of air bearing pads. The horizontal movement of these components can be readily controlled, so that positioning pins can be easily fitted in the positioning recesses.

Abstract: An automatic set-up system is provided for setting up on a pallet work to be machined by a flexible manufacturing system automatic machine tool. The pallet has a support plate and a jig plate which overlies the support plate on which the work is placed. The support plate, the jig plate and the work are sequentially conveyed by a convey unit on a setting table. The relative positions of the support plate and the jig plate, and of the jig plate and the work are usually held constant by the engagement of positioning recesses and positioning pins. Even if the position of the jig plate or the work conveyed by the convey unit deviates from a predetermined position, a float base and a support plate (the float base, the support plate, and the jig plate) are floated by means of air bearing pads. The horizontal movement of these components can be readily controlled, so that positioning pins can be easily fitted in the positioning recesses.

Abstract: Device for transferring the film holders in a film developer which was described by the Italian patent application No. 45731 A/82 of the same Applicant. Such a device is constituted by an arm (1) formed by two rods, a first fixed rod (2) which is applied in the same manner and is actuated by the same means provided to actuate the transferring arm of the above film developer, and a second movable rod (3) which is longitudinally slidable with respect to said fixed rod (2) and may assume two operating positions, a first position in which all the fork elements (21-31) which are arranged on both rods are equally spaced each other, so as to be able to catch a respective film holder (7) and to transfer it for each time in which said arm (1) is actuated.

Abstract: An automatic set-up system is provided for setting up on a pallet work to be machined by a flexible manufacturing system automatic machine tool. The pallet has a support plate and a jig plate which overlies the support plate on which the work is placed. The support plate, the jig plate and the work are sequentially conveyed by a convey unit on a setting table. The relative positions of the support plate and the jig plate, and of the jig plate and the work are usually held constant by the engagement of positioning recesses and positioning pins. Even if the position of the jig plate or the work conveyed by the convey unit deviates from a predetermined position, a float base and a support plate (the float base, the support plate, and the jig plate) are floated by means of air bearing pads. The horizontal movement of these components can be readily controlled, so that positioning pins can be easily fitted in the positioning recesses.

Abstract: A work transfer system conveying a work basket in a programmed sequence to the processing tanks of an assembly thereof placed at various positions on a work bench. The system acts to transfer the basket to a selected tank and to properly orient the basket with respect to this tank before lowering the basket therein for processing during a given dwell period, at the conclusion of which the basket is hoisted from the tank and transferred to another tank where the procedure is repeated. Running along the front of the bench is a rail on which a robot is driven to a position in the proximity of the selected tank, the robot supporting a hoist which can be raised or lowered. Cantilevered from the hoist and extending transversely across the bench is a hollow arm having a trolley therein provided with a turntable whose spindle projects upwardly to join the upper end of a loop which encircles the arm, the loop being provided at its lower end with a hand that engages the work basket.

Abstract: Computer controlled apparatus for processing exposed photographic film so as to develop, fix, wash and dry the film in a predetermined sequence and on a fully automatic basis. To operate the apparatus, exposed film is loaded onto racks, and the racks are transported by the apparatus so that the film may be successively immersed into a series of tanks which contain appropriate developing, rinsing and fixing solutions. The apparatus is controlled by a computer, or other appropriate control system or mechanism, so that it may process different types of film with the time of immersion for each film in the developing tank being established by the computer in correspondence with the film manufacturer's recommendations.

Abstract: A method for preparing plates primarily intended for use in a dry charge battery includes washing pasted and formed battery plates in water flowing at a low flow rate until most, but not all, of the forming acid has been removed, and thereafter washing said plates in additional water flowing at a higher flow rate to remove residual acid; treating the additional wash water using an ion exchange bed to remove the acid and reusing the deacidified water as wash water.