Abstract: A substrate cleaning system incorporating an edge scrubbing roller is disclosed. The system includes a cleaning station having a first brush and a second brush. The second brush is oriented relative to the first brush so as to receive a flat circular substrate therebetween. The first brush and the second brush are configured to simultaneously scrub a first and second surface of the flat circular substrate. The cleaning station also includes a scrubbing roller that is configured to receive an edge of the flat circular substrate. The scrubbing roller has a scrubbing pad for scrubbing a first surface edge of the first surface, a second surface edge of the second surface, and an edge that is not part of either the first or second surface. The edge scrubbing provided by the scrubbing roller advantageously assists in removing edge beading, metal debris, and other particulates that form during fabrication operations, such as metal deposition.

Abstract: A paint pad holder has a pad holder plate with a housing for mounting a handle on the plate. The housing has a guide recess for receiving a head of the handle, and for pivotally mounting the handle for movement about an axis generally parallel to the plane of the pad holder plate. The handle can be pivoted a selected number of degrees relative to the plate, and includes a lock sleeve that can be used for locking the handle in selected angular positions relative to the plate.

Abstract: A sanding disc particularly useful for smoothing drywall. The sanding disc includes a circular abrasive disc having an abrasive surface, and a circular foam disc smaller in diameter than the abrasive disc which is co-axially adhered to the surface of the abrasive disc opposite its abrasive surface. The abrasive disc has a circular central portion along which the surface defined by the abrasive is generally planar, and has an annular peripheral portion extending from its central portion to its peripheral surface along which its surface defined by the abrasive is generally cylindrically convex to position the peripheral surface of the abrasive disc in a plane passing through the foam disc.

Abstract: The invention provides a double sided waffle-surfaced foam polishing pad and a polishing system with which it can be used. The double sided feature allows great versatility in the type of polishing that can be accomplished using the same pad.

Abstract: A rotary finishing tool, such as a buffing pad, utilizes a connector assembly for demountable attachment to a powered rotary backing plate. The finishing tool is attached to the front face of a backing disc and the rear face of the backing disc includes a first piece of the connector assembly, the second piece of which is carried by the backing plate. The first and second connector pieces include complementary driving surfaces and complementary locking surfaces which respectively interengage in response to linear movement bringing the two connector pieces together and relative radial movement between the locking surfaces which are preferably resiliently biased.

Abstract: A hub is disclosed for supporting and retaining at least one surface conditioning article relative to and spaced apart from a rotary shaft. The hub may be a hub of a brush assembly. The hub includes an arbor tube and a pair of plates. Shoulders are provided on the arbor tube and the plates are coupled to the arbor tube at a pre-determined distance set by shoulders. The surface conditioning article is provided between the plates. Since the distance between the plates is set by the shoulders, the density of the surface conditioning article between the face plates also is predetermined. The plates may include a key-shaped region with a circular portion and a keyseat. An adapter also may be provided. The adapter is configured and dimensioned to be engaged in the key-shaped region, permitting a shaft having a smaller diameter to be coupled to the hub.

Abstract: A vehicle washing brush assembly which includes a cylindrical holder configuration having plural cloth or foam pads secured thereto and configured to be centrifugally extended radially outwardly from the holder and into surface treating engagement with a vehicle surface. A first longitudinal length of the holder has a selected number of separate cloth or foams pads oriented around the perimeter of said holder so that the ratio of the number of cloth or foam pads per 360° of the holder to the outer diameter of the holder is in the range of 8 to 12. A second longitudinal length of said holder having a selected number of separate cloth or foam pads oriented around the perimeter of the holder so that the ratio of the number cloth or foam pads per 360° of the holder to the outer diameter of the holder is less than 4.0.

Abstract: A semiconductor cleaning device having a substantially cylindrical roller body made of polyvinyl acetal with a smooth outer surface and uniform material porosity having a mean flow pore pressure ranging from about 0.30 PSI to about 0.35 PSI with 95% of its pores ranging from 7 to 40 microns in size and a wet flow rate ranging from about 80.0 L/min to about 7.0 L/min.

Abstract: The invention provides a double sided waffle-surfaced foam polishing pad and a polishing system with which it can be used. The double sided feature allows great versatility in the type of polishing that can be accomplished using the same pad.

Abstract: The present invention is directed to enhancing the aesthetic appearance of surfaces by the contact application of a nonwoven fabric having a three-dimensional image imparted therein. The three-dimensional image of the nonwoven fabric induces a topical modification in either the actual or perceived texture of a surface when the imaged nonwoven fabric is applied to, then removed from, the surface. The imaged nonwoven fabric disclosed herein exhibits low Tinting qualities thereby reducing the potential of fiber contamination of the treated surface and is sufficiently durable that the sample can be used and rinsed clean a plurality of times, markedly increasing the working life-span.

Abstract: A cleaning/polishing pad has a first surface with raised, substantially nubs, having a length greater than a width, arranged adjacent each other forming laterally alternating rows of nubs and having troughs interspersed therebetween, a second surface opposite the first surface, and a thickness. The troughs, which may contain polishing/cleaning chemicals, are divided into first and second groups of substantially parallel troughs. The groups of troughs are arranged at an angle to one another forming a hatch pattern. The pad can be formed to make roller brushes, circular brushes or manual wipes. For the circular brushes the nubs are arranged adjacent each other forming laterally alternating concentric circles of nubs. Micropores are interspersed within the pad having a gradient of pores with smaller pores towards the first surface and larger pores towards the second. There are no sharp edges or corners in/on the pad.

Abstract: A device for treating surfaces of substrates utilized in electronics manufacturing includes a resilient skin encasing a porous polymeric interior. The resilient skin overlies the exterior surface of the brush, and is typically characterized by a higher density, a smaller pore size, and a lower porosity than the interior material of the brush. The skin may serve to distribute physical stress over a larger area, protecting raised or recessed brush features from abrasion and wear. The porosity of the skin may also influence the movement of liquids through the brush, ensuring the homogenous dispensing of cleaning fluids. The resilient skin may be formed during or subsequent to a brush fabrication process such as molding, extrusion, or milling, and can be accomplished through the application of heat, chemicals, or radiation.

Abstract: A buffing pad assembly having a right pad, a left pad, a disk securing the two pads together, and an elongated member for releasably attaching the buffing pad to the drive shaft of a buffing motor is disclosed. Each pad has a central aperture. The disk has a connector located in the center thereof. The connector has an opening therethrough. The right and left pads are secured to first and second faces, respectively, of the disk so that the apertures and opening are aligned when the buffing pad is assembled. The elongated member has a body, a head, and an indented area separating the head and the body. The head fits through either of the apertures and through the opening of the connector. The elongated member also has an open end which may be secured to the spindle of a buffing motor.

Abstract: A cleaning device for use in a substrate cleaning apparatus is disclosed. The cleaning device includes a cleaning member brought into contact with a surface of a substrate to be cleaned, and a cleaning member holding mechanism for holding the cleaning member. The cleaning member holding mechanism includes a holding member (sleeve) having a lower portion split into a plurality of chuck jaws, and a ring member fitted onto the outer periphery of the holding member. An end portion of the cleaning member is inserted into an insertion hole formed by the chuck jaws, and the ring member is fitted onto the outer periphery of the holding member, thereby holding the cleaning member with the chuck jaws. That is, the cleaning member holding mechanism has a collet chuck structure.

Abstract: The present invention provides a semiconductor wafer cleaning brush assembly having an arbor with: (1) an expandable member configured to have a non-expanded position and an expanded position, and (2) a cleaning brush, locatable about the expandable member, having an inner diameter greater than an outer diameter of the expandable member in the non-expanded position and less than an outer diameter of the expandable member in the expanded position. The present invention further provides a method of replacing the cleaning brush of the assembly, and a method of cleaning a semiconductor wafer with such an assembly.

Abstract: A surface conditioning pad for rotation about an axis is disclosed, wherein the pad includes a resilient foam body having a rear surface and a working surface generally normal to the axis of rotation and a peripheral surface interconnecting the rear surface and the working surface. The peripheral surface includes a plurality of facets which may define an apex for selectively engaging portions of the work piece.

Abstract: A cleaning element (1) for use in the fuser section of electrostatographic reproduction or printing apparatus. The element includes projections projecting from an outer surface to form a pile (5). The cross section of each projection has a cross section having a peripheral dimension and an area. The ratio of the peripheral dimension and area is greater than the same ratio for a projection of circular or substantially circular and equal area of cross section. The projections may be formed by tri-lobal fibres.

Abstract: A rotary shaft having a predetermined diameter and a cylindrical cleaning element having an axial through-hole formed therein and being capable of being either in a wet state or a dry state are prepared. The through-hole has, in a wet state, a predetermined diameter smaller than the diameter of the rotary shaft. The cylindrical cleaning element is caused to be wet and the through-hole of the wet cylindrical cleaning element is enlarged so that it has a diameter larger than the diameter of the rotary shaft. The enlarged cylindrical cleaning element is dry-set, and the rotary shaft is inserted into the through-hole of the dry-set cylindrical cleaning element. The cylindrical cleaning element into which the rotary shaft has been inserted is wet, to thereby contract the diameter of the through-hole of the cylindrical cleaning element and provide a press-fit between the cylindrical cleaning element and the rotary shaft.

Abstract: A hub is disclosed for supporting and retaining at least one surface conditioning article relative to and spaced apart from a rotary shaft. The hub may be a hub of a brush assembly. The hub includes an arbor tube and a pair of plates. Shoulders are provided on the arbor tube and the plates are coupled to the arbor tube at a pre-determined distance set by shoulders. The surface conditioning article is provided between the plates. Since the distance between the plates is set by the shoulders, the density of the surface conditioning article between the face plates also is predetermined. The plates may include a key-shaped region with a circular portion and a keyseat. An adapter also may be provided. The adapter is configured and dimensioned to be engaged in the key-shaped region, permitting a shaft having a smaller diameter to be coupled to the hub.

Abstract: A buffing pad assembly having a right pad, a left pad, a disk securing the two pads together, and an elongated member for releasably attaching the buffing pad to the drive shaft of a buffing motor is disclosed. Each pad has a central aperture. The disk has a connector located in the center thereof. The connector has an opening therethrough. The right and left pads are secured to first and second faces, respectively, of the disk so that the apertures and opening are aligned when the buffing pad is assembled. The elongated member has a body, a head, and an indented area separating the head and the body. The head fits through either of the apertures and through the opening of the connector. The elongated member also has an open end which may be secured to the spindle of a buffing motor.

Abstract: A brush alignment apparatus and method of using the same for aligning a hollow cylindrical brush on a cylindrical roller member comprising first and second ends and an outer surface defining a internal cavity, provided with a plurality of orifices extending from the outer surface to the internal cavity, a first receptacle having a channel running therethrough in fluid communication with the first end of the roller member, a second receptacle, a spine member, a first support arm supporting the first end of the roller member and a second arm supporting the second end of the roller member.

Abstract: A brush alignment apparatus and method of using the same for aligning a hollow cylindrical brush on a cylindrical roller member comprising first and second ends and an outer surface defining a internal cavity, provided with a plurality of orifices extending from the outer surface to the internal cavity, a first receptacle having a channel running therethrough in fluid communication with the first end of the roller member, a second receptacle, a spine member, a first support arm supporting the first end of the roller member and a second arm supporting the second end of the roller member.

Abstract: The present invention relates to a cleaning pad mounted on a rotary pad base of a floor cleaning device when in use. The cleaning pad in accordance with the present invention comprises a base cloth and a fiber layer made by implanting threads made of 70 to 90 wt % cotton and 10 to 30 wt % nylon into the base cloth in a tufted manner.

Abstract: A wafer cleaning apparatus provides two opposed brushes for brushing a vertically disposed wafer in a tank which can contain a process liquid. A pressure controller adaptively controls the pressure exerted by the brushes on the wafer to compensate for brush wear. Rim driving wheels engage the wafer periphery with a porous jacket coupled to a fluid delivery system, thereby simultaneously rotating and cleaning the periphery of the wafer. The apparatus includes a fluid delivery system for separately and independently delivering a plurality of constituents of a cleaning solution to the brushes, thereby ensuring that a freshly mixed cleaning solution reaches the wafer. The tank can be filled with a process liquid through which megasonic waves provided by a transducer can propagate and impinge upon the wafer thereby enhancing the cleaning of the wafer or the brushes.

Abstract: A buffing pad assembly is provided for buffing, polishing or otherwise finishing a painted surface. The buffing pad assembly includes a rigid backing mount, a back-up pad affixed to the backing mount, and a buffing pad removably attached to the back-up pad by way of fastening material provided on the back-up pad and the buffing pad. The buffing pad has a number of channels extending completely through the pad to facilitate dissipation of heat generated by friction during use of the buffing pad. The back-up pad and the fastening material are designed to accommodate the heat dissipation channels in the buffing pad so that the channels are substantially unobstructed. Additionally, a centering system is provided on the buffing pad assembly to facilitate alignment of the buffing pad during use.

Abstract: An assembly of buff or brush wheels with or without spacers is stacked, compressed, and held together as an integrated unit to form an assembly of such wheels having a specified face width which then may be mounted as a unit on a machine arbor or drive shaft. The assembly is held together in such a manner that the ganged stack is yieldable and may be further compressed when assembled on the machine arbor. The assembly may also be slightly expanded to obtain a better fit on the machine. The wheel assembly in one form is held at the desired face width by adjustable ties extending through paired holes in core plates in the wheels. In another embodiment carriage bolts extending through the core plates form adjustable screw clamps.

Abstract: A pad for a rotary-type floor cleaning and/or polishing machine which comprises a generally disc-like member of hair or fiber mat, etc., which has a perimetral (i.e., circumferential) edge with a series of recesses extending generally inwardly and away from the nominal outer circumference of the disc-like member, toward the center part of the latter, to form a plurality of sequentially arranged, outwardly projecting portions between such recesses which are disposed adjacent one another around the circumference of the disc-like member. In various possible embodiments, these outwardly projecting portions define an undulating or scalloped outer periphery, and such portions are preferably of rounded configuration, formed by arcuate or at least partially circular edges which also define the aforementioned recesses. Further, in preferred embodiments, such projecting portions are disposed directly and closely adjacent one another around the entire outer periphery or perimeter of the disc-like pad.

Abstract: The present invention provides a novel porous polymeric device (101) (103) (105) (107) (109) (111) (113), e.g., an ultraclean brush. The device includes an elongated foam member (101, 103), which has an outer surface for removing residual particles from a surface of a substrate. Among other features, the elongated foam member includes a polyvinyl alcohol bearing compound, where the elongated foam member has a calcium ion impurity concentration of less than about 1 part per million. Accordingly, the present device is much cleaner than conventional devices.

Abstract: Novel slurries for the chemical mechanical polishing of thin films used in integrated circuit manufacturing. A tungsten slurry of the present invention comprises an oxidizing agent, such as potassium ferricyanide, an abrasive such as silica, and has a pH between two and four. The tungsten slurry of the present invention can be used in a chemical mechanical planarization process to polish back a blanket deposited tungsten film to form plugs or vias. The tungsten slurry can also be used to polish copper, tungsten silicide, and titanium nitride. A second slurry, which is a 9:1 dilution of the tungsten slurry is ideal for chemical mechanical polishing of titanium nitride films. A third slurry of the present invention comprises a fluoride salt, an abrasive such as silica and has a pH≦8. The third slurry can be used to polish titanium films.

Abstract: An automatic floor washing apparatus that washes and polishes the floor at one time with the provision of through holes or apertures for the nonwoven disc pad fixed to a pad base, which is driven by means of a motor at high speeds. With the structure thus arranged, it is possible to reduce the working steps significantly unlike the conventional cleaning operation where the floor washing and polishing is carried out by separate machines, a floor washing apparatus and a high-speed polisher, individually.

Abstract: A roller assembly including a frame including first and second arms spaced apart from each other, each first and second arm having an inner and outer side and a mounting projection located on the inner side of each arm, each mounting projection having a proximal portion adjacent the arm on which it is located and a distal portion located away from the arm, the distal portion having a smaller diameter than the proximal portion, a first elongate shaped plate having an aperture rotatably mounted to the inner side of the first arm, the proximal portion of the mounting projection on the first arm extending through the aperture rotatably mounted to the inner side of the second arm, the proximal portion of the mounting projection on the second arm extending through the aperture in the second plate, each plate being adapted for connection to opposing ends of two or more rollers so as to permit rotatable mounting of the rollers to the plates and to hold the two or more rollers substantially in a single plane, the plat

Abstract: A rotary surface treatment tool is attached to a rotational driver with a kit. The surface treatment tool includes a base with a middle portion around a center hole, and one or more attachment knobs are placed on the front side of the middle portion. An attachment plate or retainer nut has a flange which extends radially over the middle portion of the base. The attachment knobs mate with holes in the flange of the retainer nut. The surface treatment tool is tightened onto the shaft by turning the surface treatment tool, with the attachment knob turning the retainer nut and thereby tightening the retainer nut to the threaded shaft. Assembly and tightening without any tools is thus facilitated. The base may be made of a flexible, shape-retaining material, and recesses are provided behind the attachment knobs to permit use with a retainer nut without a mating recess. The surface treatment tool may be a brush having bristles which extend at about 90.degree. to the plane of the base.

Abstract: A transfer roll cover has an inner surface made of conductive and elastic material to fit snugly around and make conductive contact with a transfer roll, and an outer surface made of looped yarns which are attached to the inner surface and have outer looped ends which make light rolling contact with a sheet transported over the transfer roll. The looped yarns are a composite of a cleaning yarn for cleaning particulate contaminants and an antistatic yarn for removing static charges from the transported sheet. In a preferred embodiment, the transfer roll cover has an inner surface made of nylon knitted yarn as a base yarn that holds the cover together and a LYCRA.TM. inlayed yarn which has an elasticity that allows the cover to stretch over and fit snugly onto the transfer roll. As an alternative, a heat-shrinkable polyvinyl acetate (PVA) yarn may be used as the elastic material. The preferred outer surface includes rayon knitted yarn with looped outer ends as the cleaning yarn, and BEKINTEX.TM.

Abstract: A buffing pad assembly is provided for buffing, polishing or otherwise finishing a painted surface. The buffing pad assembly includes a rigid backing mount, a back-up pad affixed to the backing mount, and a buffing pad removably attached to the back-up pad by way of fastening material provided on the back-up pad and the buffing pad. The buffing pad has a number of channels extending completely through the pad to facilitate dissipation of heat generated by friction during use of the buffing pad. The back-up pad and the fastening material are designed to accommodate the heat dissipation channels in the buffing pad so that the channels are substantially unobstructed. Additionally, a centering system is provided on the buffing pad assembly to facilitate alignment of the buffing pad during use.

Abstract: An axially securable roller paint applicator that includes a substantially cylindrical body having an inner core constructed from form retaining material and an outer paint absorbent covering substantially surrounding the inner core. The body has a first end for location proximate to a handle assembly of a rotary roller paint applicator holder when the body is slidingly engaged upon such a rotary roller paint applicator holder. A second end of the body is located distally away from the handle assembly of the rotary roller paint applicator holder when the body is engaged upon the holder. An end cap is configured for engagement with the second end of the body for preventing axial movement of the body on the rotary roller paint applicator holder when the body is installed for use. The end cap has an interior surface configured for face-to-face releasable interlocking engagement with an exterior end surface of the rotary roller paint applicator holder.

Abstract: Cleaning equipment according to this invention comprises a pile layer provided on a mount base portion composed of a hard plate body with a handle, a blockish grip portion having flexibility and elasticity, an engaged layer for engagement with a polisher, or the like. The pile layer comprises a multiplicity of monofilaments which are planted one by one while kept upright. Also, according to another concept of the invention, an end face of a free end portion of the pile layer is in the form of a substantially isogonal trapezoid or the like. With such arrangement, it is possible to easily, positively and very cleanly clean a surface being cleaned irrespective of roughness and degree of soiling of the surface being cleaned. Further, according to another concept, the surface being cleaned can be similarly cleaned even when the surface has corner portions and, therefor, obstacles are constituted around the surface.

Abstract: The present invention involves a centering system for a polishing pad that is releasably attached to a backing mount. The pad has a generally flat polishing face and may employ a fabric shag pile or foam for buffing, polishing, or otherwise finishing a surface, such as painted sheet metal. The opposite face of the pad is a mounting surface and has an axially aligned centering post projecting therefrom toward the backing mount. The backing mount is a stiff structure that has a socket defined at its axial center. The size and cross section of the socket are configured to conform to the size and cross section of the centering post so that the centering post on the mounting surface of the pad fits snugly into the coaxially aligned socket on the facing side of the backing mount. Mutually engageable layers of flexible, hook and loop fastening material are respectively attached to the mounting surface of the pad and the surface of the backing mount that faces the pad.

Abstract: A vehicle washing strip is formed of a length of a semi-rigid core material such as a felt of polypropylene, polyester, or other synthetic fiber. The core is surrounded by a cover of a cotton containing pile fabric, such as a cotton terry cloth. The cover is stitched to the core.

Abstract: A rotary foam buffing pad is provided with a concave working face which allows the operator to provide true graduated surface contact in applying polish, buffing or glazing compounds, while containing the polishing compound against centrifugal force which would otherwise result in splattering of the compound. The manner in which the concave working face is formed and in which the edge face is formed and dressed results in dynamic balancing of the pad and reducing vibration and operator fatigue. The working surface forming and pad finishing operations further provide a velvetized texture to the pad working surfaces which further enhances the polishing or finishing process.

Abstract: A novel method and a novel article are disclosed for cleaning a metal, glass, or plastic surface without scratching or scoring the surface. The novel method comprises wiping the surface with the novel article, which is made from an open cell, hydrophilic, static-dissipative, polyurethane foam, and which is laundered so that the article in deionized water releases fewer than 36.0.times.10.sup.6 per square meter of apparent surface area of the article for particles of a size greater than about 0.5 .mu.m and fewer than about 2.5 parts per million of chloride, fluoride, sodium, sulfate, sulfite, or silicon ions. The novel article may be a wiper, a sponge, a roller, a swab mounted on a handle, or a plug having a generally cylindrical shape when unstressed and having particular utility where the surface is the interior surface of a metal, glass, or plastic tube. The plug is propelled through the tube, as by means of compressed air. The novel method also may comprise washing the surface with deionized water.

Abstract: A pair of paint rollers are respectively rotatably mounted to a pair of parallel, spaced apart axle members that form a part of a rigid frame. A rigid clip rod at the center of the frame is releasably engaged by a clip member that is pivotally secured to a handle-receiving socket member at the leading end of an elongate handle which is held by a painter when paint is applied to a preselected surface. The pivotal attachment allows pivotal movement between the clip member and hence the frame and the longitudinal axis of the elongate handle in a first plane. The clip rod is cylindrical and is captured by the clip member when the clip member is in a position of repose, but the cylindrical surface allows the frame member to pivot with respect to the clip member and hence the elongate handle in a second plane that is normal to the first plane. A lock member is slideably mounted on the leading end of the socket member.

Abstract: Devices and compositions are provided for cleaning optical surfaces with carbon black. Carbon black may be impregnated on a soft pad, such as chamois leather, to provide a lens cleaning device. The soft pad may be supported on a handle. The soft pad may be mounted on the handle by a resilient member that is capable of adapting with the soft pad to conform the cleaning surface to concave or convex optical surfaces. A retractable brush may be mounted at the opposite end of the handle from the soft pad.

Abstract: A method and apparatus for cleaning a semiconductor wafer. The apparatus preferably includes a brush holder that may include a base and a connection stud extending from the base. The base preferably includes a first plurality of openings and a receiving lip for receiving a brush that is disposed on its lower surface. The openings preferably serve to pass a cleaning solution to the brush during cleaning of a semiconductor wafer. The brush preferably includes a substantially flexible material and a plurality of protrusions for contacting a semiconductor wafer. A backing plate preferably is attached to one side of the brush for connecting the brush to the brush holder. The backing plate preferably includes a plurality of openings arranged to match the first plurality of openings on the base of the brush holder.

Abstract: A rotary surface treatment tool is attached to a rotational driver with a kit. The surface treatment tool includes a base with a middle portion around a center hole, and one or more attachment knobs are placed on the front side of the middle portion. An attachment plate or retainer nut has a flange which extends radially over the middle portion of the base. The attachment knobs mate with holes in the flange of the retainer nut. The surface treatment tool is tightened onto the shaft by turning the surface treatment tool, with the attachment knob turning the retainer nut and thereby tightening the retainer nut to the threaded shaft. Assembly and tightening without any tools is thus facilitated. The base may be made of a flexible, shape-retaining material, and recesses are provided behind the attachment knobs to permit use with a retainer nut without a mating recess. The surface treatment tool may be a brush having bristles which extend at about 90.degree. to the plane of the base.

Abstract: A vehicle washing apparatus which includes a cleaning element having a plurality of cleaning strips attached to a base component and a plurality of deep pile, fur-like inserts mounted between at least some of the cleaning strips. The cleaning strips preferably are made of a foam plastic material having a closed cell structure. The cleaning element may be mounted on a movable support such as a rotatable shaft and a plurality of such cleaning elements mounted on a rotatable shaft constitute a brush.

Abstract: An applicator head comprises a pad and a hub element. The hub element has on one side a boss for coupling to a rotary drive unit and on the opposite side a surface releasably attached to the pad. The pad has a central axis and a recess centered about the axis and complementary with the attachment surface of the hub element such that the attachment surface engages the base of the recess, and the pad and the boss are in substantially coaxial alignment. The releasable attachment is preferably provided by a hook-and-loop type fastener.

Abstract: Grooves are cut into an under pad of a polishing pad assembly formed by an under pad and an over pad. The grooves cause channeling of the over pad so that slurry received on the polishing face of the pad assembly is delivered across the pad assembly's surface in a controlled fashion.

Abstract: A supporting base material for a tufted rotary finishing pad utilizes a three-layer laminate including an outer face layer of a crosslinked ionomer resin of ethylene and methacrylic acid copolymers reacted with a metal salt, an intermediate layer of an open polyester mesh, and an inner face layer of a non-woven polyester fiber. The tufted fiber finishing media is attached to the crosslinked ionomer resin face of the laminated base which is preferably heat formed to provide a curved pad edge. The base is extremely tough and durable, provides excellent shape retention, resistance to moisture, and resistance to fiber tear-out.

Abstract: A drive disk for the rotary tool of a machine for conditioning and/or maintaining floors includes a rigid circular plate and a circular diaphragm. In accordance with the invention, the drive disk includes a sealed axial passage passing through it and discharging at one end via a first central orifice in said rigid circular plate and at the other end via a second central orifice in said diaphragm.

Abstract: A tool for cleaning semiconductor wafers includes a cleaning head with a flat face bounded by an edge. A tubular drive shaft is connected to the cleaning head and provides a conduit through which a cleaning fluid can flow. An opening into the shaft is provided in the flat face which also has a plurality of channels to distribute the cleaning fluid across the flat face. A brush is formed as a single piece of porous, elastic material with a substrate portion that has a first major surface abutting the cleaning head face. A lip of the brush extends from the substrate portion around the edge of the flat face to removably secure the brush to the cleaning head. The brush has a plurality of cylindrical nubs on the second major surface forming projections for scrubbing surfaces of semiconductor wafers.