Ion Beam Sputter Deposition Patents (Class 204/192.11)
  • Patent number: 10504695
    Abstract: A charged particle beam device includes: a first charged particle source that generates first charged particles and irradiates a sample with the generated first charged particles; a phase plate that changes phases of the first charged particles in accordance with charged states of portions through which the first charged particles are transmitted; and a phase plate control system that controls the charging of the phase plate.
    Type: Grant
    Filed: December 25, 2015
    Date of Patent: December 10, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: Arthur Malcolm Blackburn
  • Patent number: 10497984
    Abstract: Elements of an electrochemical cell using an end to end process. The method includes depositing a planarization layer, which manufactures embedded conductors of said cell, allowing a deposited termination of optimized electrical performance and energy density. The present invention covers the technique of embedding the conductors and active layers in a planarized matrix of PML or other material, cutting them into discrete batteries, etching the planarization material to expose the current collectors and terminating them in a post vacuum deposition step.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: December 3, 2019
    Assignee: Sakti3, Inc.
    Inventors: Marc Langlois, Ann Marie Sastry, Myoungdo Chung, HyonCheol Kim, Stephen Buckingham
  • Patent number: 10442736
    Abstract: There is provided a platy Mg-containing zinc oxide sintered compact containing 1 to 10 wt % Mg as a first dopant element and 0.005 wt % or more at least one second dopant element selected from the group consisting of Al, Ga and In, the balance consisting essentially of ZnO and optionally at least one third dopant element selected from the group consisting of Br, Cl, F, Sn, Y, Pr, Ge, B, Sc, Si, Ti, Zr, Hf, Mn, Ta, W, Cu, Ni, Cr, La, Gd, Bi, Ce, Sr and Ba, wherein the (002)-plane or (100)-plane orientation in the plate surface is 60% or more. The Mg-containing zinc oxide sintered compact of the present invention has excellent properties such as high orientation despite solid dissolution of Mg.
    Type: Grant
    Filed: January 30, 2017
    Date of Patent: October 15, 2019
    Assignee: NGK Insulators, Ltd.
    Inventors: Sota Okochi, Jun Yoshikawa, Koichi Kondo
  • Patent number: 10428967
    Abstract: A shear valve for use in a high performance liquid chromatography system. The shear valve includes a first valve member having a plurality of first fluid-conveying features, and a second valve member having one or more second fluid-conveying features. The second valve member is movable, relative to the first valve member, between a plurality of discrete positions such that, in each of the discrete positions, at least one of the one or more second fluid-conveying features overlaps with multiple ones of the first fluid conveying features to provide for fluid communication therebetween. At least one of the first and second valve members is at least partially coated with a protective coating that includes an adhesion interlayer and a diamond-like carbon (DLC) layer. The DLC layer is deposited on the adhesion interlayer via filtered cathodic vacuum arc (FCVA) deposition.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: October 1, 2019
    Assignee: WATERS TECHNOLOGIES CORPORATION
    Inventors: Carl G. Chen, Robert A. Jencks, Wen Lu, Mark W. Moeller
  • Patent number: 10418253
    Abstract: A method of making nanostructures including: locating a photoresist mask layer on a substrate, the thickness of the photoresist mask layer is H; forming a patterned mask layer includes a plurality of stripe masks, a spacing distance between adjacent stripe masks equals L; depositing a first thin film layer along a first direction, the thickness of the first thin film layer is D, a first angle between the first direction and a direction along the thickness of stripe masks is ?1, ?1<tan?1(L/H); depositing a second thin film layer along a second direction, a second angle between the second direction and the direction along the thickness of stripe masks is ?2, ?2<tan?1[L/(H+D)], 0<L?H tan ?1?(H+D)tan?2<10 nm, the first thin film layer partly overlaps with the second thin film layer to form an overlapping structure; etching the first thin film layer and the second thin film layer to obtain a nanoscale microstructure.
    Type: Grant
    Filed: June 14, 2018
    Date of Patent: September 17, 2019
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Mo Chen, Li-Hui Zhang, Qun-Qing Li, Shou-Shan Fan
  • Patent number: 10408776
    Abstract: A sensor board includes: an insulating substrate having a principal surface; and a detecting electrode disposed on the principal surface of the insulating substrate, the detecting electrode being formed mainly of a first metallic material composed of a base-metal based material which is catalytically inactive with respect to a decomposition reaction of particulates, an exposed surface of the detecting electrode being covered by a passivation film of the first metallic material.
    Type: Grant
    Filed: August 22, 2015
    Date of Patent: September 10, 2019
    Assignee: Kyocera Corporation
    Inventors: Hidekazu Otomaru, Takashi Kimura
  • Patent number: 10392690
    Abstract: A method for synthesizing thin film stainless steel coating can include using an e-beam PVD technique for depositing elements of stainless steel, i.e., Fe, Cr, Ni, Mo, and Mn, on a target surface, e.g., a surface of metallic origin. The method can include thermal evaporation of a source stainless steel material at a given percentage of electron beam power and a given vacuum pressure to provide a stainless steel coating layer on the target surface. The stainless steel coating layer can have a uniform thickness of about 150 nm, for example. The method can provide uniform stainless steel elemental distribution on the target surface. The stainless steel of the coating layer on the target surface can be of a grade that is different from the source stainless steel.
    Type: Grant
    Filed: February 13, 2019
    Date of Patent: August 27, 2019
    Assignee: Kuwait Institute for Scientific Research
    Inventors: Naser M.A.E.H.M.A. Alsayegh, Maryam Adnan Saeed, Feras Ghazi Alzubi
  • Patent number: 10300167
    Abstract: The present invention provides a functionalized composition and resulting functionalized body or prosthesis for in vitro and in vivo use comprising at least one calcium phosphate containing phase that is functionalized with a linker group comprising at least one of an organic acid molecule, a phosphonic acid, an amine, N,N-dicyclohexylcarbodiimide, and 3-maleimidopropionic acid N-hydroxysuccinimide ester, and combinations thereof, and one or more of a chemical and/or a biologically active moieties, wherein the linker group provides for a reactive location for the attachment of the chemical or biologically active moiety, or both, to the calcium phosphate containing phase, and optionally including an unmodified and/or modified calcium aluminate containing phase. Methods of manufacturing a functionalized artificial prosthesis and methods of repairing a bone, vertebrae, or tissue structures are provided.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: May 28, 2019
    Assignees: CAberTech, Inc., Duquesne University of the Holy Spirit
    Inventors: Kenneth A. McGowan, Ellen S. Gawalt, Rachelle Palchesko
  • Patent number: 10283397
    Abstract: Implementations described herein provide a lift pin actuator. The lift pin actuator has a housing. The housing has an interior volume. A track is disposed in the interior volume and coupled to the housing. A center shaft is at least partially disposed in the interior volume of the housing. A guide is movably coupled to the track. At least one internal bellows is disposed in the interior volume, the internal bellows form a seal between the center shaft and the housing. An elastic member is disposed in the interior volume and configured to apply a force that retracts the center shaft into the housing. An inlet port is configured to introduce fluid into the interior volume between the internal bellows and the housing. The fluid generates a force opposing the elastic member to extend the center shaft relative to the housing.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: May 7, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Michael D. Willwerth, Roberto Cesar Cotlear
  • Patent number: 10285277
    Abstract: A method of manufacturing an electrical circuit from bulk materials includes the steps of machining a first bulk dielectric material, forming a conductive element, and placing the conductive element on a first side the first bulk dielectric material. The method further includes the step of machining a second bulk dielectric material and placing the second bulk dielectric material on the first side of the first bulk dielectric material and over the conductive element. The first bulk dielectric material and the second bulk dielectric material may be laminated together.
    Type: Grant
    Filed: December 31, 2015
    Date of Patent: May 7, 2019
    Assignee: Lockheed Martin Corporation
    Inventors: Marc T. Angelucci, Anthony R. Niemczyk
  • Patent number: 10233545
    Abstract: A method for producing particulate clusters comprises passing a core through an array of matrix-supported coating particles. Particulate clusters produced by the method may find application as catalytic particles, components of novel electronic and photonic materials and sensors, and as binding sites for protein molecules in biochips.
    Type: Grant
    Filed: July 31, 2012
    Date of Patent: March 19, 2019
    Assignee: The University of Birmingham
    Inventor: Richard Palmer
  • Patent number: 10166749
    Abstract: [Problem] To provide a substrate bonding technique having a wide range of application. [Solution] A silicon thin film is formed on a bonding surface, and the interface with the substrate is surface-treated using energetic particles/metal particles.
    Type: Grant
    Filed: January 30, 2012
    Date of Patent: January 1, 2019
    Assignees: LAN TECHNICAL SERVICE CO., LTD., TADATOMO SUGA
    Inventors: Tadatomo Suga, Akira Yamauchi, Ryuichi Kondou, Yoshiie Matsumoto
  • Patent number: 10112376
    Abstract: An inter-substrate material layer is formed between a first substrate and a second substrate to generate a bonding strength. A plurality of metal elements are present in the inter-substrate material layer. An interface element existence ratio of the plurality of metal elements is 0.07 or above. A device can be obtained in which substrates difficult to bond (for example, SiO2 substrates) are bonded at room-temperature to have practical bonding strength.
    Type: Grant
    Filed: May 9, 2016
    Date of Patent: October 30, 2018
    Assignees: MITSUBISHI HEAVY INDUSTRIES MACHINE TOOL, CO., LTD., NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
    Inventors: Jun Utsumi, Takayuki Goto, Kensuke Ide, Masahiro Funayama, Hideki Takagi
  • Patent number: 10053769
    Abstract: A method for coating workpieces includes the following steps: charging a coating chamber with the workpieces to be coated; closing and evacuating the coating chamber to a predetermined process pressure, starting a coating source, which comprises a target as a material source, whereby particles are accelerated from the surface of the target toward substrates, characterized in that until the target has been conditioned a shield is provided between the target surface and the substrate, wherein meanwhile the substrates to be coated are at least partially subjected to a pretreatment.
    Type: Grant
    Filed: June 30, 2014
    Date of Patent: August 21, 2018
    Assignee: Oerlikon Surface Solutions AG, Pfäffikon
    Inventors: Denis Kurapov, Siegfried Krassnitzer
  • Patent number: 10053771
    Abstract: A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.
    Type: Grant
    Filed: October 26, 2015
    Date of Patent: August 21, 2018
    Assignee: Tango Systems Inc.
    Inventors: Ravi Mullapudi, Manohar Korlapati
  • Patent number: 10008365
    Abstract: An ion milling device of the present invention is provided with a tilt stage (8) which is disposed in a vacuum chamber (15) and has a tilt axis parallel to a first axis orthogonal to an ion beam, a drive mechanism (9, 51) which has a rotation axis and a tilt axis parallel to a second axis orthogonal to the first axis and rotates or tilts a sample (3), and a switching unit which enables switching between a state in which the ion beam is applied while the sample is rotated or swung while the tilt stage is tilted, and a state in which the ion beams is applied while the tilt stage is brought into an untilted state and the sample is swung. Consequently, the ion milling device capable of performing cross-section processing and flat processing of the sample in the same vacuum chamber is implemented.
    Type: Grant
    Filed: February 1, 2016
    Date of Patent: June 26, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toru Iwaya, Hirobumi Muto, Hisayuki Takasu, Atsushi Kamino, Asako Kaneko
  • Patent number: 9951416
    Abstract: A vacuum coating apparatus includes at least a chamber, an arc discharge plasma source, a feeding-reeling unit, and a roller set. The first and second openings are connecting with the feeding or reeling unit so as to allow the substrate to enter and leave the chamber therethrough, respectively. The arc discharge plasma source located inside the chamber generates the plasma, which discharges radially from the arc discharge plasma source as its center. The roller set includes a plurality of the first rollers, which are located in the chamber and enclosing the arc discharge plasma source. A first surface of the substrate is facing the plurality of the first rollers and contacts tightly on the periphery of the first rollers so that the first rollers can rotate by the moving of the substrate. The material evaporated and emitted by the plasma is attached onto the first surface of the substrate.
    Type: Grant
    Filed: August 7, 2015
    Date of Patent: April 24, 2018
    Assignee: INSTITUTE OF NUCLEAR ENERGY RESEARCH ATOMIC ENERGY COUNCIL, EXECUTIVE YUAN
    Inventors: Cheng-Chang Hsieh, Deng-Lian Lin, En-Shih Chen, Wen-Fa Tsai, Chi-Fong Ai
  • Patent number: 9919931
    Abstract: Provided is a zinc oxide-based sputtering target capable of improving the film formation rate while suppressing arcing in the formation of a zinc oxide-based transparent conductive film by sputtering. This zinc oxide-based sputtering target includes a zinc oxide-based sintered body mainly including zinc oxide crystal grains, and has a degree of (002) orientation of 50% or greater at a sputtering surface and a density of 5.30 g/cm3 or greater.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: March 20, 2018
    Assignee: NGK Insulators, Ltd.
    Inventors: Jun Yoshikawa, Katsuhiro Imai, Koichi Kondo, Koki Kanno
  • Patent number: 9905895
    Abstract: A pulse mode apparatus comprises a mismatched battery electrically connected to a pulse mode device having a pulse duty cycle with a power-on time period and a power-off time period. The mismatched battery comprises a first battery cell having a first internal resistance and first charge capacity, and a second battery cell having a second internal resistance and second charge capacity, and the battery comprises at least one of the following: (1) the second internal resistance is less than the first internal resistance, and (2) the second charge capacity is less than the first charge capacity. The battery also has a pair of electrical connectors electrically coupling the first and second battery cells in parallel, a pair of terminals connected to the first or second battery cells, and a casing around the first and second battery cells with the terminals extending out of the casing.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: February 27, 2018
    Assignee: Front Edge Technology, Inc.
    Inventors: Tung-Hsiu Shih, Kai Wei Nieh, Victor Krasnov
  • Patent number: 9869014
    Abstract: A method for forming an alignment film for a liquid crystal on a substrate and an associated at least one structure. The substrate is moved in a first direction. A target is disposed on the first surface side of the substrate. The ion beam is propagated from an ion source toward the substrate and impinges on a sputtering surface of the target, which sputters a material of the target and results in sputtered particles of the material being emitted from the sputtering surface of the target and deposited on the first surface side of the substrate to form (i) a sputtering film on the first surface side of the substrate and (ii) an alignment film having an orientation and being disposed on the sputtering film and on the entire surface of the substrate. The alignment film aligns molecules of the liquid crystal in a predetermined direction.
    Type: Grant
    Filed: February 23, 2015
    Date of Patent: January 16, 2018
    Assignee: International Business Machines Corporation
    Inventors: Shoichi Doi, Tatsuya Nishiwaki
  • Patent number: 9833101
    Abstract: In an exemplary embodiment, an induction cooking pan can include: a pan; a handle coupled to the pan; wherein the pan can include: a ceramic inner coated portion; a first metallic outer portion; and a second metallic outer portion; wherein the second metallic outer portion is at least one of extruded or impact bonded to the first metallic outer portion; wherein the second metallic outer portion can include: a generally circular shape and can include a plurality of punched openings therethrough; and wherein the plurality of punched openings have been at least one of: impact bonded into a lower surface of the first metallic portion; or extruded into a lower surface of the first metallic portion; and wherein the first and second metallic outer portions have been machined substantially smooth.
    Type: Grant
    Filed: November 28, 2014
    Date of Patent: December 5, 2017
    Assignee: NuWave, LLC
    Inventors: Jung S. Moon, Byung G. Choi, Mikale K. Kwon
  • Patent number: 9837502
    Abstract: A conductive structure and a manufacturing method thereof, an array substrate and a display device. The conductive structure includes a plurality of first metal layers made of aluminum, and between every two first metal layers that are adjacent, there is also provided a second metal layer, which is made of a metal other than aluminum. With the conductive structure, the hillock phenomenon that happens to the conductive structure when it is heated can be decreased without reducing the overall thickness of the conductive structure.
    Type: Grant
    Filed: August 24, 2015
    Date of Patent: December 5, 2017
    Assignee: BOE Technology Group Co., Ltd.
    Inventors: Hongwei Tian, Kaihong Ma, Wenqing Xu, Yueping Zuo, Xiaowei Xu
  • Patent number: 9816316
    Abstract: A low-E coating supported by a glass substrate, the coating from the glass substrate outwardly including at least the following layers: a dielectric layer of or including silicon nitride; a high index layer having a refractive index of at least 2.1; another dielectric layer of or including silicon nitride; a layer comprising zinc oxide; an infrared (IR) reflecting layer, wherein the coating includes only one IR reflecting layer; and an overcoat including (i) a layer comprising tin oxide and (ii) a layer comprising silicon nitride located over and contacting the layer comprising tin oxide. An IG unit including the coating may have a visible transmission of at least 70%.
    Type: Grant
    Filed: July 19, 2016
    Date of Patent: November 14, 2017
    Assignees: Guardian Glass, LLC, Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V.C.)
    Inventors: Jingyu Lao, Philip J. Lingle, Brent Boyce, Bernd Disteldorf, Richard Blacker
  • Patent number: 9779978
    Abstract: A method of manufacturing a semiconductor device uses a semiconductor manufacturing apparatus including a turn table allowing placement of at least first and second semiconductor substrates and being capable of moving positions of the first and the second semiconductor substrates by turning, a first film forming chamber, and a second film forming chamber. The first and the second film forming chambers are provided with an opening capable of loading and unloading the first and the second semiconductor substrates by lifting and lowering the first and the second semiconductor substrates placed on the turn table. The method includes transferring the first and the second semiconductor substrates between the first and the second film forming chambers by turning the turn fable and lifting and lowering the first and the second semiconductor substrates placed on the turn table; and forming a stack of films above the first and the second semiconductor substrates.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: October 3, 2017
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Atsuko Sakata, Kei Watanabe, Junichi Wada, Masayuki Kitamura, Takeshi Ishizaki, Shinya Okuda, Hirotaka Ogihara, Satoshi Wakatsuki, Daisuke Ikeno
  • Patent number: 9748433
    Abstract: The present disclosure provides a method for recovering the efficacy of solar cell modules and a device thereof. The method includes providing a solar cell module and scanning the solar cell module with a light-beam. The light-beam has a power density between 20 W/cm2 and 200 W/cm2, a width between 1 mm and 156 mm. The light-beam scans a solar cell module with a scanning speed between 50 mm/sec and 200 mm/sec. Furthermore, the present disclosure also provides a portable device for recovering the efficacy of solar cell modules. The portable device includes two types such as placed type and hand-held type. The aforementioned devices can perform a hydrogenating process on solar cell modules to improve the degree of light-induced degradation (LID) so as to improve the photovoltaic conversion efficiency of solar cell modules.
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: August 29, 2017
    Assignee: GINTECH ENERGY CORPORATION
    Inventors: Chung-Chi Liau, Chung-Chi Liu, Yan-Kai Chiou, Kang-Cheng Lin, Kuei-Wu Huang
  • Patent number: 9748569
    Abstract: A porous thin film battery is described herein. The battery includes a substrate, a porous thin film cathode formed on the substrate, an electrolyte layer formed on the porous thin film cathode and a porous thin film anode formed on the electrolyte layer. The porous thin film cathode includes a first set of pores initially filled with a quantity of a first polymer material and then the first polymer material is removed to form the first set of pores. The porous thin film anode includes a second set of pores initially filled with a third polymer material and then the third polymer material is removed to form the second set of pores. A method of forming the porous thin film battery is also described. A system for forming the porous thin film battery is also described.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: August 29, 2017
    Assignee: APPLEJACK 199 L.P.
    Inventors: Wenming Li, Byunghoon Yoon, Ann Koo
  • Patent number: 9719908
    Abstract: A device for electrofracturing a material sample and analyzing the material sample is disclosed. The device simulates an in situ electrofracturing environment so as to obtain electrofractured material characteristics representative of field applications while allowing permeability testing of the fractured sample under in situ conditions.
    Type: Grant
    Filed: February 18, 2015
    Date of Patent: August 1, 2017
    Assignee: Sandia Corporation
    Inventors: Stephen J. Bauer, Steven F. Glover, Tom Pfeifle, Jiann-Cherng Su, Kenneth Martin Williamson, Scott Thomas Broome, William Payton Gardner, Gary Pena
  • Patent number: 9593409
    Abstract: A dielectric film forming apparatus and a method for forming a dielectric film so as to form a dielectric film with a (100)/(001) orientation. A dielectric film forming apparatus includes a deposition preventive plate heating portion that heats a deposition preventive plate disposed in a position where particles discharged from a target adhere. Sputtering gas is introduced from a sputtering gas introduction unit into a vacuum chamber. The deposition preventive plate is heated to a temperature higher than a film forming temperature so as to emit vapor from a thin film adhered to the deposition preventive plate. After a seed layer is formed on a substrate, the substrate is heated to the film forming temperature, and AC voltage is applied to the target from a power supply and then, the target is sputtered so as to form a dielectric film on the substrate.
    Type: Grant
    Filed: April 5, 2013
    Date of Patent: March 14, 2017
    Assignee: ULVAC, INC.
    Inventors: Isao Kimura, Takehito Jinbo, Hiroki Kobayashi, Youhei Endou, Youhei Oonishi
  • Patent number: 9589769
    Abstract: A processing apparatus may include a plasma chamber to house a plasma; and an extraction assembly disposed along a side of the plasma chamber. The extraction assembly may be configured to direct ions from the plasma to a substrate, wherein the ions generate etched species comprising material that is etched from the substrate; and wherein the extraction assembly comprises at least one component having a recess that faces the substrate and is configured to intercept and retain the etched species.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: March 7, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Vijayakumar C. Venugopal, Richard J. Hertel, Vikram Singh, Ernest E. Allen
  • Patent number: 9534830
    Abstract: An exterior panel for a kitchen appliance includes a metallic substrate having a predetermined surface pattern on at least one side of the metallic substrate, wherein the metallic substrate is formed to include a predetermined contour. A coating layer is an organic paint coating composition on the at least one side of the metallic substrate, the coating layer including a predetermined color and a fingerprint resistive surface, wherein the coating layer is at least partially translucent such that the predetermined surface pattern is visible with the naked eye through the coating layer, and wherein the predetermined surface pattern is modified by the coating layer to reflect the combination of the predetermined surface pattern and the predetermined color of the coating layer.
    Type: Grant
    Filed: December 17, 2014
    Date of Patent: January 3, 2017
    Assignee: Whirlpool Corporation
    Inventors: Richard L. Hammond, Jessica R. McConnell
  • Patent number: 9478394
    Abstract: In a sputter deposition tool (100) of the type in which an ion source (101) generates a beam directed at a sputtering target, the sputtering target comprises an elongated exterior skirt (102) and a generally circular insert (103) positioned within the skirt, the surfaces of the skirt and insert being relatively coplanar and forming the surface of the target, with the elongated dimension of the skirt being axially oriented toward the ion source. The insert is rotated within the skirt to one of several positions during use of the target by the sputter deposition tool, to distribute wear of the target around the rotating insert and thus increase the utilization and useful life of the overall target assembly.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: October 25, 2016
    Assignee: Veeco Instruments, Inc.
    Inventors: Mario B. Roque, Victor L. Castro, Hector J. Castillo
  • Patent number: 9476117
    Abstract: A method of sputter coating a glass substrate includes providing a glass substrate and providing a sputtering assembly for sputtering a coating onto the glass substrate in a vacuum deposition chamber. The sputtering assembly includes a backing plate and a separating element disposed on the backing plate. At least one target element is provided and disposed at and in contact with a surface of the separating element. The target element is not bonded the separating element when disposed at and in contact with the surface of the separating element. An expansion gap is provided at or adjacent to the target element to allow for expansion of the target element during the sputtering process. Material from the target element is sputtered and the target element is heated to a substantially elevated temperature during the sputtering process. The sputtering process coats a surface of the glass substrate with the target element material.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: October 25, 2016
    Assignee: Magna Mirrors of America, Inc.
    Inventors: Ian A. McCabe, Jeffrey D. Harlow
  • Patent number: 9340854
    Abstract: A drilling motor and method of making a drill motor are disclosed. The drilling motor includes a stator having a bore therethrough and inner surface and a rotor having an outer surface configured to be disposed in the stator. The outer surface of the rotor comes in contact with the inner surface of the stator. At least one of the inner surface of the stator and the outer surface of the rotor includes a coating of a diamond-like carbon material.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: May 17, 2016
    Assignee: BAKER HUGHES INCORPORATED
    Inventors: Dan E. Scott, Chih Lin
  • Patent number: 9339099
    Abstract: A skin removal device includes a housing having a handle portion, a drum assembly coupled to the handle portion and including a drum, the drum having an abrasive outer surface configured to abrade skin of a user during rotation of the drum, and an electromechanical drive system disposed at least partially within the housing and configured to rotate the drum. The drum assembly is moveable in a lateral direction relative to the handle portion to enable insertion and removal of the drum assembly.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: May 17, 2016
    Assignee: SOFT LINES INTERNATIONAL, LTD.
    Inventor: Wai Wah Yiu
  • Publication number: 20150147525
    Abstract: Methods for enabling or enhancing growth of carbon nanotubes on unconventional substrates. The method includes selecting an inactive substrate, which has surface properties that are not favorable to carbon nanotube growth. A surface of the inactive substrate is treated so as to increase a porosity of the same. CNTs are then grown on the surface having the increased porosity.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: Government of the United States as Represented by the Secretary of the Air Force
    Inventors: Benji Maruyama, Gordon A. Sargent, Ahmad E. Islam
  • Patent number: 9034151
    Abstract: An alignment film forming apparatus and a method are provided to form an alignment film for a liquid crystal in a single process of simultaneously executing a film deposition process of ion beam sputtering and an alignment process. The method greatly restricts the size of a substrate. An alignment film forming apparatus includes a target disposed on a top surface side of a substrate and having a sputtering surface defining a sharp angle to the top surface of the substrate, a transfer table that transfers the substrate in a predetermined direction, and an ion source disposed on the top surface side of the substrate in such a way that an ion beam is irradiated on the sputtering surface of the target. An ion beam reflected at the sputtering surface is irradiated on a sputtering film formed on the substrate.
    Type: Grant
    Filed: July 17, 2008
    Date of Patent: May 19, 2015
    Assignee: International Business Machines Corporation
    Inventors: Shoichi Doi, Tatsuya Nishiwaki
  • Publication number: 20150129289
    Abstract: There are provided a printed circuit board and a method of manufacturing the same. The printed circuit board according to an exemplary embodiment of the present disclosure includes: a substrate; a metal root layer formed by injecting and depositing metal particles into and on the substrate; and a circuit layer formed on the metal root layer.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 14, 2015
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Gun Woo Kim, Eung Suek Lee, Yoong Oh, Sung Uk Lee
  • Publication number: 20150125622
    Abstract: Systems and methods for high and ultra-high vacuum physical vapor deposition with in-situ magnetic field are disclosed herein. An exemplary method for depositing a film in an evacuated vacuum chamber can include introducing a sample into the vacuum chamber. The sample can be rotated. A magnetic field can be applied that rotates synchronously with the rotating sample. Atoms can be deposited onto the sample while the sample is rotating with the magnetic field to deposit a film while the magnetic field induces magnetic anisotropy in the film.
    Type: Application
    Filed: October 1, 2014
    Publication date: May 7, 2015
    Applicant: The Trustees of Columbia University in HIe City of
    Inventors: KENNETH L. SHEPARD, William E. Bailey, Noah Andrew Sturcken, Cheng Cheng, Sioan Zohar
  • Patent number: 8992740
    Abstract: An IBAD apparatus includes, a target, a sputter ion source irradiating the target with sputter ions to sputter some of constituent particles of the target, a film formation region in which a base material for depositing thereon the particles sputtered from the target is disposed, and an assist ion beam irradiation device irradiating assist ion beams from a direction oblique to the direction of a normal of the film formation surface of the base material disposed in the film formation region, where the sputter ion source includes a plurality of ion guns arranged so as to be able to irradiate the target from an end portion on one side to an end portion on the other side with sputter ion beams, and current values for generating the sputter ion beams of the plurality of ion guns are set respectively.
    Type: Grant
    Filed: April 5, 2012
    Date of Patent: March 31, 2015
    Assignee: Fujikura Ltd.
    Inventors: Satoru Hanyu, Yasuhiro Iijima
  • Publication number: 20150077744
    Abstract: A nanostructured arrangement includes a substrate having a surface and comprising a metal and a nanostructured layer formed on the substrate surface by an ion beam. The nanostructured layer includes a plurality of hollow metal nanospheres. Each of the plurality of nanospheres includes a chemical compound formed from the metal of the substrate by the ion beam. An example of a nanostructured arrangement is a surface enhanced Raman scattering (SERS) sensor.
    Type: Application
    Filed: March 23, 2012
    Publication date: March 19, 2015
    Applicant: Wostec, Inc.
    Inventors: Valery K. Smirnov, Dmitry S. Kibalov
  • Publication number: 20150069667
    Abstract: Embodiments of present invention provide a method of forming nano-parts through vacuum coating technology. The method includes creating a set of openings in a substrate, the set of openings having a set of shapes that are complimentary to shapes of a set of nano-parts and the nano-parts having a size between 1 nm and 1000 nm; lining the set of openings with a thin layer of oleic acid of a single molecule thickness; depositing a metal-oxide material inside the set of openings to form the set of nano-parts; immersing the substrate together with the set of nano-parts in a solution; applying a supersonic vibration to the substrate via the solution causing the set of nano-parts to detach from the substrate; and separating the set of nano-parts from the substrate.
    Type: Application
    Filed: September 12, 2013
    Publication date: March 12, 2015
    Inventors: Yi Li, Jieran Li, Wen Lu
  • Publication number: 20150047970
    Abstract: In one embodiment, a method for forming an alkali resistant coating includes forming a first oxide material above a substrate and forming a second oxide material above the first oxide material to form a multilayer dielectric coating, wherein the second oxide material is on a side of the multilayer dielectric coating for contacting an alkali. In another embodiment, a method for forming an alkali resistant coating includes forming two or more alternating layers of high and low refractive index oxide materials above a substrate, wherein an innermost layer of the two or more alternating layers is on an alkali-contacting side of the alkali resistant coating, and wherein the innermost layer of the two or more alternating layers comprises at least one of: alumina, zirconia, and hafnia.
    Type: Application
    Filed: November 3, 2014
    Publication date: February 19, 2015
    Inventors: Thomas F. Soules, Raymond J. Beach, Scott C. Mitchell
  • Publication number: 20150037568
    Abstract: A film is formed under vacuum by a step of purifying and/or flattening the base material (13) by irradiating the base material (13) with a gas cluster ion beam (4a); by a step of forming an intermediate layer film by evaporating/vaporizing an intermediate layer film forming material, allowing the evaporated/vaporized material to adhere to the surface of the base material (13), and irradiating the intermediate layer film forming material with a gas cluster ion beam (4a); and by evaporating/vaporizing a carbon film forming material containing a carbonaceous material containing substantially no hydrogen, and a boron material, allowing the evaporated/vaporized material to adhere to the surface of the intermediate layer film, and irradiating the carbon film forming material with a gas cluster ion beam (4a).
    Type: Application
    Filed: November 28, 2011
    Publication date: February 5, 2015
    Applicant: NOMURA PLATING CO., LTD.
    Inventors: Teruyuki Kitagawa, Shuhei Nomura
  • Publication number: 20150037260
    Abstract: The invention provides a new apparatus (20) and method for producing entirely new types of nanoparticles exhibiting novel properties. The apparatus comprises a vacuum chamber (22) containing a gas and feed means (1) for feeding a liquid jet (26) into the chamber and through the gas. The invention extends to the new types of nanoparticles per se, and to uses of such nanoparticles in various biomedical applications, such as in therapy and diagnosis, as well as in opto-electronics.
    Type: Application
    Filed: February 28, 2013
    Publication date: February 5, 2015
    Inventors: Klaus Von Haeften, Gediminas Galinis
  • Patent number: 8921276
    Abstract: The phase transition temperature, at which the crystal lattice of LMO that constitutes an oxide layer as an intermediate layer or as a part of an intermediate layer becomes cubic, is lowered. A substrate for a superconducting wire rod includes an oxide layer (LMO layer (22)) which contains, as a principal material, a crystalline material represented by the compositional formula: Laz(Mn1?xMx)wO3+? (wherein M represents at least one of Cr, Al, Co or Ti, ? represents an oxygen non-stoichiometric amount, 0<w/z<2, and 0<x?1).
    Type: Grant
    Filed: November 2, 2011
    Date of Patent: December 30, 2014
    Assignee: Furukawa Electric Co., Ltd.
    Inventors: Masayasu Kasahara, Hiroyuki Fukushima, Yoshikazu Okuno, Yuko Hayase
  • Publication number: 20140377693
    Abstract: A mask, method of fabricating same, and method of using same are disclosed. In an example, a mask includes a substrate and a reflective multilayer coating deposited over the substrate. The reflective multilayer coating is formed by positioning the substrate such that an angle ? is formed between a normal line of the substrate and particles landing on the substrate and rotating the substrate about an axis that is parallel with a landing direction of the particles. In an example, reflective multilayer coating includes a first layer and a second layer deposited over the first layer. A phase defect region of the reflective multilayer coating includes a first deformation in the first layer at a first location, and a second deformation in the second layer at a second location, the second location laterally displaced from the first location.
    Type: Application
    Filed: September 8, 2014
    Publication date: December 25, 2014
    Inventors: Yen-Cheng Lu, SHINN-SHENG YU, Anthony Yen
  • Publication number: 20140342102
    Abstract: In a system and method of depositing material on a substrate, a shadow mask, including one or more apertures therethrough, in intimate contact with the substrate is provided inside of a chamber or reactor. Material ejected from a solid target material is deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask. Desirably, a target-to-substrate distance is within a mean free path length at a specified deposition pressure. Alternatively, an electric field acts on a process gas to create a plasma that includes ionized atoms or molecules of the material that are deposited on one or more portions of the substrate after passage through the one or more apertures of the shadow mask.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 20, 2014
    Applicant: ADVANTECH GLOBAL, LTD
    Inventors: Thomas F. Ambrose, Byron B. Brocato, Jong Guang Pan
  • Publication number: 20140327876
    Abstract: An optical element has a substrate body made from transparent plastic and a coating having multiple layers. The coating includes a hard lacquer layer adjoining the substrate. The coating has a diffusivity ensuring the absorption of water molecules passing through the coating in the substrate and the release of water molecules from the substrate through the coating from an air atmosphere on that side of the coating facing away from the substrate with a flow density which, proceeding from the equilibrium state of the quantity of water molecules absorbed in the substrate in an air atmosphere at 23° C. and 50% relative humidity, brings the setting of the equilibrium state of the quantity of water molecules absorbed in the substrate in an air atmosphere at 40° C. and 95% relative humidity within an interval not more than 10 h longer than for setting this equilibrium under corresponding conditions with an identical uncoated substrate.
    Type: Application
    Filed: May 6, 2014
    Publication date: November 6, 2014
    Applicant: Carl Zeiss Vision International GmbH
    Inventors: Norbert Hugenberg, Markus Haidl, Bernhard von Blanckenhagen, Lothar Holz, Stefan Kraus, Frank Macionczyk, Michael Krause, Erwin Green, Karl-Heinz Winter, Thomas Gloege, Silvia Faul, Anja Petereit, Bin Peng, Joerg Puetz, Patrick Kiefer, Adalbert Hanssen, Michael Krieger, Andreas Neuffer, Marc Stroisch
  • Publication number: 20140322502
    Abstract: There is provided an antireflection coating having a band ranging from visible light to infrared (wavelength range from 400 nm to 1600 nm). The antireflection coating includes twelve layers formed by depositing a high refractive index material and a low refractive index material having a refractive index lower than the high refractive index material alternately and depositing an ultra-low refractive index material having a refractive index lower than the low refractive index material as the outermost layer. The first, third, fifth, seventh, ninth, and eleventh layers are formed by depositing the high refractive index material, the second, fourth, sixth, eighth, and tenth layers are formed by depositing the low refractive index material, and the twelfth layer is formed by depositing the ultra-low refractive index material, where the layers are numbered in order from the substrate side.
    Type: Application
    Filed: July 3, 2014
    Publication date: October 30, 2014
    Inventors: MASANORI KOYAMA, Kazuyuki Hosokawa
  • Publication number: 20140311892
    Abstract: Reactive sputtering in which, by ion bombardment, material is ejected from the surface of a target and transitions to the gas phase. Negative voltage pulses are applied to the target to establish electric current having a current density greater than 0.5 A/cm2 at the target surface, such that the material transitioning to the gas phase is ionized. Reactive gas flow is established and reacts with the material of the target surface. Voltage pulse duration is such that, during the pulse, the target surface where the current flows is at least partly covered most of the time with a compound composed of reactive gas and target material and, consequently, the target surface is in a first intermediate state, and this covering is smaller at the end of the voltage pulse than at the start and, consequently, the target surface is in a second intermediate state at the end of the voltage pulse.
    Type: Application
    Filed: November 23, 2012
    Publication date: October 23, 2014
    Inventor: Siegfried Krassnitzer