Coating, Forming Or Etching By Sputtering Patents (Class 204/192.1)
  • Patent number: 11189472
    Abstract: Embodiments of a magnetron assembly and a processing system incorporating same are provided herein. In some embodiments, a magnetron assembly includes a body extending along a central axis of the magnetron assembly; a coolant feed structure extending through the body along the central axis to provide a coolant along the central axis to an area beneath the coolant feed structure; and a rotatable magnet assembly coupled to a bottom of the body and having a plurality of magnets.
    Type: Grant
    Filed: July 17, 2017
    Date of Patent: November 30, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Irena H. Wysok, Kirankumar Savandaiah, Anthony Chih-Tung Chan, Jiao Song, Prashant Prabhu
  • Patent number: 11156584
    Abstract: A process analytic system includes an analytic sensor configured to sense a characteristic of a fluid. The process analytic system also includes measurement circuitry coupled to the analytic sensor and configured to generate an indication of the characteristic of the fluid. The process analytic system includes a processor coupled to the measurement circuitry and configured to receive the indication of the characteristic of the fluid and calculate a sensor-related output based on the indication of the characteristic of the fluid. In addition, the process analytic system includes a diagnostics component configured to determine a rate of degradation of the analytic sensor based on the sensor-related output and a reference value, wherein the rate of degradation is compared to a pre-selected threshold.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: October 26, 2021
    Assignee: Rosemount Inc.
    Inventor: Joshua M. Duellman
  • Patent number: 11103036
    Abstract: A method for rendering a gemstone traceable, includes the steps: providing an invisible marker, wherein the marker is unambiguously identifiable, fastening the marker in a placement location of the gemstone, and acquiring marking information that includes that this unambiguously identifiable marker is fastened to this gemstone. The marker can be transported to the placement location in a manner in which it is suspended in a carrier fluid. An additive, for example a primer or a starting material for a surface coating of at least a part surface of the placement location, can be added to the carrier fluid.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: August 31, 2021
    Assignee: GÜBELIN GEM LAB LTD.
    Inventors: Daniel Nyfeler, Klemens Link
  • Patent number: 11100948
    Abstract: The magnetic recording medium disclosed in the present application includes a non-magnetic support, an undercoat layer, a magnetic layer containing magnetic particles, and a back coat layer. The coercive force Hc of the magnetic layer in the thickness direction at 25° C. is not 4100 oersteds (Oe) or more, and the coercive force Hc of the magnetic layer in the thickness direction at a temperature between 55° C. and 80° C. inclusive is not less than 1200 oersteds (Oe) and not more than 3700 oersteds (Oe).
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: August 24, 2021
    Assignee: Maxell Holdings, Ltd.
    Inventors: Shinji Kawakami, Masao Fujita, Toshio Hiroi
  • Patent number: 11074934
    Abstract: HAMR media with a magnetic recording layer having a reduced Curie temperature and methods of fabricating the HAMR media are provided. One such HAMR medium includes a substrate, a heat sink layer on the substrate, an interlayer on the heat sink layer, and a multi-layer magnetic recording layer on the interlayer. In such case, the multi-layer magnetic recording layer includes a first magnetic recording layer including an alloy selected from FePtX and CoPtX, where X is a material selected from the group consisting of Cu, Ni, and combinations thereof, a second magnetic recording layer on the first magnetic recording layer and having at least one material different from the materials of the first magnetic recording layer, and a third magnetic recording layer on the second magnetic recording layer and having at least one material different from the materials of the first magnetic recording layer.
    Type: Grant
    Filed: September 25, 2015
    Date of Patent: July 27, 2021
    Assignee: WESTERN DIGITAL TECHNOLOGIES, INC.
    Inventors: Hua Yuan, Antony Ajan, Oleg Krupin, B. Ramamurthy Acharya
  • Patent number: 11056355
    Abstract: A method of fabricating a semiconductor may include forming on a substrate a mold structure including a mold layer, a buffer layer, and a support layer, performing on the mold structure an anisotropic etching process to form a plurality of through holes in the mold structure, and forming a plurality of bottom electrodes in the through holes. The buffer layer has a nitrogen content amount that increases as approaching the support layer from the mold layer. The buffer layer has an oxygen content amount that increases as approaching the mold layer from the support layer.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: July 6, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Byoungdeog Choi, Jangseop Kim
  • Patent number: 10982320
    Abstract: Device and method for producing defined properties of gradient layers in a system of multilayered coatings in sputtering installations with the following features: a) a pair of cathodes arranged in a common process chamber and consisting of a first cathode body and a second cathode body is supplied with direct current by means of a common power supply, wherein, before entering the process chamber, the direct current is converted into a series of pulses comprising alternating positive and negative pulses with interpulse periods in between, b) an arrangement for controlling the length of the individual pulses and the duration of the respective interpulse periods.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: April 20, 2021
    Assignee: GRENZEBACH MASCHINENBAU GMBH
    Inventors: Joerg Fiukowski, Gerd Kleideiter
  • Patent number: 10978279
    Abstract: A tubular target for cathode atomization does not have a backing tube and it is made of molybdenum or a molybdenum alloy. The target has an inner surface which is in contact at least in certain regions with a cooling medium, wherein at least one region of the inner surface is separated from the cooling medium by at least one protective device. By way of example, the protective device may be in the form of a polymer layer. The tubular target exhibits outstanding long-term stability.
    Type: Grant
    Filed: April 5, 2012
    Date of Patent: April 13, 2021
    Assignee: Plansee SE
    Inventors: Christian Linke, Manfred Sulik, Martin Kathrein
  • Patent number: 10927452
    Abstract: Components suitable for chemically aggressive environments are disclosed, as well as methods for producing the components. One component may include a substrate having at least one surface having a layer system, which may include an amorphous carbon layer. The layer system may include at least one metallic intermediate layer which is arranged between the substrate and the amorphous carbon layer. The metallic intermediate layer may include titanium, a titanium alloy, nickel, or a nickel alloy. A two-layer bonding layer may be arranged between the at least one intermediate layer and the substrate and a first bonding layer composed of NiP. A second bonding layer composed of a nickel-chromium alloy or a nickel-vanadium alloy may also be present. The amorphous carbon layer may form an outer layer of the layer system facing away from the substrate and may comprise at least one amorphous hydrogen-containing carbon layer.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: February 23, 2021
    Assignee: Schaeffler Technologies AG & Co. KG
    Inventors: Yashar Musayev, Edgar Schulz, Joanna Procelewska
  • Patent number: 10886114
    Abstract: A magnetron sputtering device in one embodiment of the present disclosure includes a support table supporting thereon a base substrate, and a floating mask arranged at a first side of the support table and substantially parallel to the support table.
    Type: Grant
    Filed: August 10, 2017
    Date of Patent: January 5, 2021
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventor: Yingnan Kang
  • Patent number: 10882781
    Abstract: The invention relates to a process for obtaining a material comprising a substrate coated on at least one part of at least one of its faces with at least one functional layer, said process comprising: a step of depositing the or each functional layer, then a step of depositing a sacrificial layer on said at least one functional layer, then a step of heat treatment by means of radiation chosen from laser radiation or radiation from at least one flash lamp, said radiation having at least one treatment wavelength between 200 and 2500 nm, said sacrificial layer being in contact with the air during this heat treatment step, then a step of removing the sacrificial layer using a solvent, said sacrificial layer being a monolayer and being such that, before heat treatment, it absorbs at least one part of said radiation at said at least one treatment wavelength and that, after heat treatment, it is capable of being removed by dissolution and/or dispersion in said solvent.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: January 5, 2021
    Assignee: SAINT-GOBAIN GLASS FRANCE
    Inventors: Andriy Kharchenko, Bernard Nghiem, Nicolas Nadaud, Lorenzo Canova, Arnaud Huignard
  • Patent number: 10872749
    Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber has a base component body. The base component body has an exterior surface configured to face a processing environment of the processing chamber. A textured skin is conformable to the exterior surface. The textured skin has a first side configured to be disposed against the exterior surface and a second side facing away from the first side. The second side has a plurality of engineered features configured to enhance adhesion of material deposited on the textured skin during use of the processing chamber.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: December 22, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Gangadhar Sheelavant, Cariappa Achappa Baduvamanda, Kaushik Vaidya, Bopanna Ichettira Vasantha
  • Patent number: 10809630
    Abstract: A method for correcting a reflective optical element for the wavelength range between 5 nm and 20 nm, which includes a multilayer system on a substrate. The multilayer system has layers consisting of at least two alternately arranged different materials with a different real component of the refractive index for a wavelength in the extreme ultraviolet wavelength range. The method includes: measuring the reflectivity distribution over the surface of the multilayer system; comparing the measured reflectivity distribution to a nominal distribution of the reflectivity over the surface of the multilayer system, determining at least one partial surface having a measured reflectivity above the nominal reflectivity; and irradiating the at least one partial surface with ions or electrons.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: October 20, 2020
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Joachim Kalden
  • Patent number: 10806016
    Abstract: A system for generating broadband radiation is disclosed. The system includes a target material source configured to deliver one or more of a liquid or solid state target material to a plasma-forming region of a chamber. The system further includes a pump source configured to generate pump radiation to excite the target material in the plasma forming region of the chamber to generate broadband radiation. The system is further configured to transmit at least a portion of the broadband radiation generated in the plasma-forming region of the chamber out of the chamber through a windowless aperture.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: October 13, 2020
    Assignee: KLA Corporation
    Inventors: Oleg Khodykin, Ilya Bezel
  • Patent number: 10787385
    Abstract: A low-E coating has good color stability (a low ?E* value) upon heat treatment (HT). Thermal stability may be improved by the provision of an as-deposited crystalline or substantially crystalline layer of or including zinc oxide, doped with at least one dopant (e.g., Sn), immediately under an infrared (IR) reflecting layer of or including silver; and/or by the provision of at least one dielectric layer of or including an oxide of zirconium. These have the effect of significantly improving the coating's thermal stability (i.e., lowering the ?E* value). An absorber film may be designed to adjust visible transmission and provide desirable coloration, while maintaining durability and/or thermal stability. The dielectric layer (e.g., of or including an oxide of Zr) may be sputter-deposited so as to have a monoclinic phase in order to improve thermal stability.
    Type: Grant
    Filed: February 7, 2020
    Date of Patent: September 29, 2020
    Assignee: GUARDIAN GLASS, LLC
    Inventors: Yongli Xu, Salah Boussaad, Jingyu Lao
  • Patent number: 10784088
    Abstract: A plasma processing method capable of reducing an amount of deposit adhering to an upper electrode or removing the deposit from the upper electrode is provided. In the plasma processing method, the upper electrode of a capacitively coupled plasma processing apparatus is cooled. A supporting table including a lower electrode is provided within a chamber of the plasma processing apparatus. The upper electrode is provided above the supporting table. During the cooling of the upper electrode, a film of a substrate is etched by plasma generated within the chamber. The substrate is placed on the supporting table during the etching of the film. A negative bias voltage is applied to the upper electrode while the etching is being performed.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: September 22, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Dai Igarashi, Muneyuki Omi, Rei Ibuka, Takahiro Murakami
  • Patent number: 10775609
    Abstract: Described examples include a micromechanical device including a substrate and a base formed on a surface of the substrate; and a first layer extending from the base to a plane separated from the base by a via. The first layer forms an outer layer of the via and has a portion lying in the plane and surrounding the via. A first fill is formed in a first portion of the via. A strut is in the via and on the first fill. A second fill is in a second portion of the via on the strut and extends from the strut to the plane. A second layer is over the second fill and at least a portion of the second layer is over the portion of the first layer lying in the plane.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: September 15, 2020
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Stephen Howard Looney, Jose Antonio Martinez
  • Patent number: 10763448
    Abstract: This application relates to an OLED device, a manufacturing method thereof, and a display device. The OLED device includes a light emitting unit between an anode and a cathode. The light-emitting unit includes: a first carrier function layer for migration of first carriers, the first carrier function layer including a first material layer; a second carrier function layer for migration of second carriers having a polarity different from that of the first carriers, the second carrier function layer including a second material layer; a light emitting layer between the first material layer and the second material layer, the light emitting layer including a luminescent material; a first buffer layer between the light emitting layer and the first material layer. The first buffer layer is a mixed layer containing the luminescent material and the first material.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: September 1, 2020
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventor: Zhiqiang Jiao
  • Patent number: 10698293
    Abstract: A frequency conversion device and method is disclosed. In one aspect, a frequency device includes an array of mutually spaced semiconductor islands composed of at least one III-V semiconductor compound. The semiconductor islands are configured so that electromagnetic radiation of a first wavelength incident upon the semiconductor islands causes them to emit electromagnetic radiation of a second wavelength shorter than the first wavelength by a nonlinear frequency conversion process. The frequency device further includes a transparent support supporting the semiconductor islands. The transparent support is substantially transparent to radiation of the second wavelength, so that at least the radiation of the second wavelength passes through the transparent support.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: June 30, 2020
    Assignee: The Australian National University
    Inventors: Mohsen Rahmani, Dragomir N. Neshev, Hark Hoe Tan, Chennupati Jagadish, Yuri Kivshar, Fouad Karouta
  • Patent number: 10692741
    Abstract: A radiation shield and an assembly and a reactor including the radiation shield are disclosed. The radiation shield can be used to control heat flux from a susceptor heater assembly and thereby enable better control of temperatures across a surface of a substrate placed on a surface of the susceptor heater assembly.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: June 23, 2020
    Assignee: ASM IP Holdings B.V.
    Inventor: Melvin Verbaas
  • Patent number: 10675665
    Abstract: Provided are extrusion tools such as extrusion dies or portions thereof having a surface with at least one coating thereon, and methods of forming the same are disclosed. The at least one coating is formed from a composition that is a metal aluminum nitride or carbonitride with particular characteristics such that the amount of aluminum varies within the coating between a coating outer surface and an intermediate thickness within the coating. The resulting coatings have tailored physical and performance characteristics that result in improved wear and extrusion performance.
    Type: Grant
    Filed: December 7, 2016
    Date of Patent: June 9, 2020
    Assignee: IHI Ionbond AG.
    Inventors: Michael Auger, Hristo Strakov, Vasileios Papageorgiou, Stylianos Vogiatzis, Val Lieberman
  • Patent number: 10665432
    Abstract: A temperature control method includes cooling an upper electrode and increasing a temperature of the upper electrode. A path having an inlet and an outlet is formed within the upper electrode. The upper electrode constitutes an evaporator. A compressor, a condenser and an expansion valve are connected in sequence between the outlet and the inlet of the path. A flow dividing valve is connected between an output of the compressor and the inlet to bypass the condenser and the expansion valve. In the cooling of the upper electrode, a coolant is supplied into the path via the compressor, the condenser and the expansion valve. In the increasing of the temperature of the upper electrode, the flow dividing valve is opened and the upper electrode is heated.
    Type: Grant
    Filed: April 22, 2019
    Date of Patent: May 26, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akiyoshi Mitsumori, Shin Yamaguchi
  • Patent number: 10658315
    Abstract: The present disclosure provides an integrated circuit (IC) structure. The IC structure includes a semiconductor substrate; an interconnection structure formed on the semiconductor substrate; and a redistribution layer (RDL) metallic feature formed on the interconnection structure. The RDL metallic feature further includes a barrier layer disposed on the interconnection structure; a diffusion layer disposed on the barrier layer, wherein the diffusion layer includes metal and oxygen; and a metallic layer disposed on the diffusion layer.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: May 19, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih Wei Bih, Sheng-Wei Yeh, Yen-Yu Chen, Wen-Hao Cheng, Chih-Wei Lin, Chun-Chih Lin
  • Patent number: 10658162
    Abstract: A semiconductor manufacturing apparatus includes a vacuum chamber, a rotary member, a first magnet, a second magnet, and a magnetic body. The vacuum chamber contains a substrate and a target located opposite to the substrate. The rotary member has a first surface located on a back side of the target outside the vacuum chamber. The first magnet is provided on the first surface. The second magnet has a magnetic pole opposite to a magnetic pole of the first magnet and is provided on an inner side of the first magnet on the first surface. The magnetic body is provided between the first magnet and the second magnet and is configured to be movable backward and forward in a vertical direction.
    Type: Grant
    Filed: September 5, 2017
    Date of Patent: May 19, 2020
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventor: Tatsumi Usami
  • Patent number: 10654749
    Abstract: A coated article includes a substrate, a first dielectric layer, a subcritical metallic layer having discontinuous metallic regions, a primer over the subcritical layer, and a second dielectric layer over the primer layer. The primer can be a nickel-chromium alloy. The primer can be a multilayer primer having a first layer of a nickel-chromium alloy and a second layer of titania.
    Type: Grant
    Filed: May 17, 2019
    Date of Patent: May 19, 2020
    Assignee: Vitro Flat Glass LLC
    Inventors: Adam D. Polcyn, Paul A. Medwick, Andrew V. Wagner, Paul R. Ohodnicki, James P. Thiel, Dennis J. O'Shaughnessy
  • Patent number: 10629419
    Abstract: A method of determining the presence of isotopes in a sample, comprising (i) providing a sample beam containing the sample; (ii) causing the sample beam to travel back and forth along a single longitudinal axis; (iii) ionising the sample beam with one or more lasers, wherein ionising the sample beam comprises operating the one or more lasers at a plurality of frequencies; (iv) determining time of flight data of a first part of the sample beam relative to a second part of the sample beam; (v) determining an ionisation time using the time of flight data; (vi) obtaining data relating to the frequency of the one or more lasers at the ionisation time; and (vii) determining the presence of isotopes in the sample using the data relating to the frequency of the one or more lasers at the ionisation time.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: April 21, 2020
    Assignee: THE UNIVERSITY OF MANCHESTER
    Inventor: Kieran Flanagan
  • Patent number: 10619228
    Abstract: The present invention relates to an aluminum-magnesium coated steel plate using vacuum coating, wherein an aluminum-magnesium coating layer is constituted by 1 to 45 wt % of magnesium, a balance of aluminum, and other inevitable impurities, and an Al3Mg2 alloy phase is formed in the aluminum-magnesium coating layer by performing heat treatment of the steel plate.
    Type: Grant
    Filed: May 22, 2017
    Date of Patent: April 14, 2020
    Assignees: POSCO, RESEARCH INSTITUTE OF INDUSTRIAL SCIENCE & TECHNOLOGY
    Inventors: Ji Hoon Yang, Jae In Jeong, Tae-Yeob Kim, Yonghwa Jung
  • Patent number: 10564506
    Abstract: A method for lithiating an electrochromic device comprise forming a first transparent conductive layer on a substrate, forming an electrochromic structure on the first transparent conductive layer, forming a second transparent conductive layer on the electrochromic structure, and lithiating the electrochromic structure through the second transparent conductive layer. In one exemplary embodiment lithiating the electrochromic structure comprises lithiating the electrochromic structure at a temperature range of between about room temperature and about 500 C for the duration of the lithiation process. In another exemplary embodiment, lithiating the electrochromic structure further comprises lithiating the electrochromic structure by using at least one of sputtering, evaporation, laser ablation and exposure to a lithium salt. The electrochromic device can be configured in either a “forward” or a “reverse” stack configuration.
    Type: Grant
    Filed: January 22, 2018
    Date of Patent: February 18, 2020
    Assignee: View, Inc.
    Inventors: Paul P. Nguyen, Shiwei Liu
  • Patent number: 10519562
    Abstract: In example implementations, a method for producing a thin film coating is provided. The method includes pre-treating a substrate, placing the substrate in a bath comprising at least phosphoric acid and sulphuric acid to produce a thin anodized layer, rinsing the thin anodized layer in a solution, plating a surface of the thin anodized layer in an electro deposition bath following a plating current profile for a predetermined period, and increasing the plating current to the recommended bath plating current to produce the thin film coating having a desired initial coating thickness.
    Type: Grant
    Filed: August 16, 2017
    Date of Patent: December 31, 2019
    Assignee: Auckland Uniservices Limited
    Inventors: Fengyan Hou, Yuxin Wang, Bo Hu, Christopher William Goode, Junzhe Dong
  • Patent number: 10522360
    Abstract: A method for forming a semiconductor device structure is provided. The method includes disposing a semiconductor substrate in a physical vapor deposition (PVD) chamber. The method also includes introducing a plasma-forming gas into the PVD chamber, and the plasma-forming gas contains an oxygen-containing gas. The method further includes applying a radio frequency (RF) power to a metal target in the PVD chamber to excite the plasma-forming gas to generate plasma. In addition, the method includes directing the plasma towards the metal target positioned in the PVD chamber such that an etch stop layer is formed over the semiconductor substrate.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: December 31, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ya-Ling Lee, Shing-Chyang Pan, Keng-Chu Lin, Wen-Cheng Yang, Chih-Tsung Lee, Victor Y. Lu
  • Patent number: 10480057
    Abstract: An apparatus for plating Nd—Fe—B magnet includes a cathode and a target source holder defining a predetermined distance of 5 mm to 200 mm therebetween. A pulse bias power supply having a first positive terminal connected to an anode and a first negative terminal connected to the cathode. A DC bias power supply having a second positive terminal connected to the anode and a second negative terminal connected to the target source holder. The anode is connected to the earth ground. A method for plating the Nd—Fe—B magnet includes steps of maintaining the predetermined distance of 5 mm to 200 mm between the cleaned Nd—Fe—B magnet and the target source material, increasing a first electric potential to the cathode and a second electric potential to the target source holder with the second electric potential greater than the first electric potential, and maintaining a potential differential of 0V to 500V therebetween.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: November 19, 2019
    Assignee: YANTAI SHOUGANG MAGNETIC MATERIALS INC.
    Inventors: Kunkun Yang, Zhongjie Peng
  • Patent number: 10473625
    Abstract: Methods for detecting and monitoring changes in mechanical structures and in walls of pipes, vessels and storage tanks, using muitimode acoustic signal propagation and detection, are described. Acoustic signals having chosen amplitude-time-frequency characteristics excite multiple modes in the structure under investigation, are generated and received at a small number of accessible locations, such as the ends of pipes and the tops and bottoms of vessels and storage tanks, with the inspection region between transmit and receive transducers. Small mechanical changes lead to acoustic scattering and attenuation among the various modes, which are detectable as changes in received signal intensity. Such changes may include material loss, material conversion and material addition. Once the structure is characterized in a known condition, the present method may be used to monitor the structure at a later time to determine whether changes have taken place.
    Type: Grant
    Filed: August 12, 2016
    Date of Patent: November 12, 2019
    Assignees: Chevron U.S.A. Inc., Triad National Security, LLC
    Inventors: Alp T. Findikoglu, Dipen N. Sinha, Daniel R. Chapman
  • Patent number: 10451949
    Abstract: A window assembly includes an electro-optic element which has a first substantially transparent substrate defining first and second surfaces. The second surface includes a first electrically conductive layer. A second substantially transparent substrate defines third and fourth surfaces. The third surface includes a second electrically conductive layer. A primary seal is disposed between the first and second substrates. The seal and the first and second substrates define a cavity therebetween. An electro-optic medium is disposed in the cavity. The electro-optic medium is switchable such that the electro-optic element is operable between substantially clear and darkened states. An absorptive layer is positioned on the fourth surface of the electro-optic element and a reflective layer is positioned on the absorptive layer.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: October 22, 2019
    Assignee: GENTEX CORPORATION
    Inventor: William L. Tonar
  • Patent number: 10444588
    Abstract: Provided is an electrochromic element, including: a pair of electrodes; and an electrochromic layer disposed between the pair of electrodes and containing a plurality of kinds of organic electrochromic compounds, in which: at least one kind of the plurality of kinds of organic electrochromic compounds includes an organic electrochromic compound having an absorption peak in a wavelength region of 700 nm or more during coloring thereof; and when an optical density in a decolored state thereof is defined as 0, a fluctuation ratio of a transmittance in a wavelength region of from 650 nm or more to 700 nm or less with respect to a central transmittance is within ±15% at an optical density of 0.3.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 15, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kenji Yamada, Wataru Kubo, Satoshi Igawa, Kentaro Ito, Satoshi Ota
  • Patent number: 10420370
    Abstract: Provided herein is a tobacco packaging material, comprising a paper material coated with at least one polymer layer. The polymer layer comprises at least one repulpable polymer, and wherein the tobacco packaging material has a water vapor transmission rate (WVTR) that is at least 90% lower than the paper material. Further provided is a tobacco package comprising the tobacco packaging material, wherein the tobacco package is substantially free of any foil inner liner or polypropylene film. Further described is a method for making the tobacco packaging material, comprising extrusion coating at least one repulpable polymer onto a paper material to form a polymer layer, and optionally further depositing at least one atomic layer deposition (ALD) layer that comprises a metal oxide.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: September 24, 2019
    Assignee: R.J. REYNOLDS TOBACCO PRODUCTS
    Inventors: Andries Don Sebastian, Pankaj Patel, Bruce Bengtsson, Stephanie A. Whittington, Erkki Mikael Salo, Tero Tapani Malm
  • Patent number: 10415904
    Abstract: A lubricant free firing weapon is provided having amorphous, solid, diamond-like carbon coating (DLC) containing sp3, sp2 carbons and hydrogen bonded to the metallic operating parts. Such firing weapons may further include physical modifications to the bolt carrier rails to enhance the expulsion of sand/dust on the bolt carrier under extreme environments. Also provided herein are plasma enhanced chemical vapor deposition processes for producing such lubricant free weapons having coat thicknesses of 1 ?m-25 ?m which allows for reliable operation under all environmental conditions including extreme environments such as hot/cold and sand/dust without the need for lubrication.
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: September 17, 2019
    Assignee: The United States of America as Represented by the Secretary of the Army
    Inventors: Christopher Mulligan, Adam Foltz, Douglas Witkowski
  • Patent number: 10388520
    Abstract: A method of forming an oxide semiconductor includes a step of depositing an oxide semiconductor layer over a substrate by using a sputtering apparatus in which in a target containing indium, an element M (aluminum, gallium, yttrium, or tin), zinc, and oxygen, the substrate which faces a surface of the target, and a magnet unit comprising a first magnet and a second magnet on a rear surface side of the target are provided. In the method, deposition is performed under a condition that a maximum intensity of a horizontal magnetic field is greater than or equal to 350 G and less than or equal to 2000 G in a plane where a vertical distance toward the substrate from a surface of the magnet unit is 10 mm.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: August 20, 2019
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Akihisa Shimomura, Yuhei Sato, Yasumasa Yamane, Yoshinori Yamada, Tetsunori Maruyama
  • Patent number: 10388533
    Abstract: Methods for depositing a low resistivity nickel silicide layer used in forming an interconnect and electronic devices formed using the methods are described herein. In one embodiment, a method for depositing a layer includes positioning a substrate on a substrate support in a processing chamber, the processing chamber having a nickel target and a silicon target disposed therein, the substrate facing portions of the nickel target and the silicon target each having an angle of between about 10 degrees and about 50 degrees from the target facing surface of the substrate, flowing a gas into the processing chamber, applying an RF power to the nickel target and concurrently applying a DC power to the silicon target, concurrently sputtering silicon and nickel from the silicon and nickel targets, respectively, and depositing a NixSi1-x layer on the substrate, where x is between about 0.01 and about 0.99.
    Type: Grant
    Filed: May 24, 2018
    Date of Patent: August 20, 2019
    Assignee: Applied Materials, Inc.
    Inventors: He Ren, Minrui Yu, Mehul B. Naik
  • Patent number: 10378145
    Abstract: The present invention provides a textile metallized on at least one of its faces comprising a textile layer of inorganic fibers and a metallic layer, the textile being characterized in that the connection between the textile layer and the metallic layer is provided by a polymeric intermediate layer formed by a matrix having at least one coupling polymer in which at least one flame retardant agent is distributed, said coupling polymer being bonded by chemical bonds firstly to the textile layer and secondly to the metallic layer. The present invention also provides the method of fabricating this metallized textile.
    Type: Grant
    Filed: November 17, 2014
    Date of Patent: August 13, 2019
    Assignee: MERMET
    Inventors: Alain Crouzet, Francois-Xavier Damour
  • Patent number: 10373811
    Abstract: A system and method for single magnetron sputtering are described. One example includes a system having a power supply, a plasma chamber enclosing a substrate, an anode, and a target for depositing a thin film material on the substrate. This example also has a datastore with uncoated anode characterization data and an anode sputtering adjustment system including an anode analysis component to generate a first health value. The first health value is indicative of whether the anode is coated with a dielectric material. This example also has an anode power controller to receive the first health value and provide an anode-energy-control signal to the pulse controller of the pulsed DC power supply to adjust a second anode sputtering energy relative to a first anode sputtering energy to eject at least a portion of the dielectric material from the anode.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: August 6, 2019
    Assignee: AES GLOBAL HOLDINGS, PTE. LTD
    Inventors: David Christie, Skip B. Larson
  • Patent number: 10365530
    Abstract: A window assembly includes an electro-optic element which has a first substantially transparent substrate defining first and second surfaces. The second surface includes a first electrically conductive layer. A second substantially transparent substrate defines third and fourth surfaces. The third surface includes a second electrically conductive layer. A primary seal is disposed between the first and second substrates. The seal and the first and second substrates define a cavity therebetween. An electro-optic medium is disposed in the cavity. The electro-optic medium is switchable such that the electro-optic element is operable between substantially clear and darkened states. An absorptive layer is positioned on the fourth surface of the electro-optic element and a reflective layer is positioned on the absorptive layer.
    Type: Grant
    Filed: September 27, 2017
    Date of Patent: July 30, 2019
    Assignee: GENTEX CORPORATION
    Inventor: William L. Tonar
  • Patent number: 10359804
    Abstract: The described embodiments relate generally to methods to form magnetic assemblies. In particular, extreme cold work (aka cold spray) is used to enhance magnetic properties of a steel alloy (most notably 316L stainless steel and others) that can then be formed into useful shapes and embedded within a substrate without undue machining operations.
    Type: Grant
    Filed: December 16, 2014
    Date of Patent: July 23, 2019
    Assignee: Apple Inc.
    Inventors: Bradley J. Hamel, Simon Regis Louis Lancaster-Larocque, Steven J. Osborne, Adam T. Garelli
  • Patent number: 10332730
    Abstract: A sputtering system and method are disclosed. The system has at least one dual magnetron pair having a first magnetron and a second magnetron, each magnetron configured to support target material. The system also has a DMS component having a DC power source in connection with switching components and voltage sensors. The DMS component is configured to independently control an application of power to each of the magnetrons, and to provide measurements of voltages at each of the magnetrons. The system also has one or more actuators configured to control the voltages at each of the magnetrons using the measurements provided by the DMS component. The DMS component and the one or more actuators are configured to balance the consumption of the target material by controlling the power and the voltage applied to each of the magnetrons, in response to the measurements of voltages at each of the magnetrons.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: June 25, 2019
    Assignee: AES Global Holdings, PTE. LTD
    Inventor: David Christie
  • Patent number: 10319571
    Abstract: A ruthenium sputtering target, wherein a Si content is 10 to 100 wtppm, a total content of unavoidable impurities excluding gas components is 50 wtppm or less, and a remainder is Ru. By suppressing the crystal growth of ruthenium or a ruthenium alloy and reducing the generation of coarse crystal grains, arcing that occurs during sputtering is minimized, particle generation is reduced, and yield is improved.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: June 11, 2019
    Assignee: JX Nippon Mining & Metals Corporation
    Inventor: Kentaro Harada
  • Patent number: 10317088
    Abstract: A triple ring flame burner composed of a central burner and a toroidal burner that are coupled by a bridge, the central burner comprises a Venturi tube, a mixture chamber, a distribution channel with the toroidal burner composed of a second Venturi tube, a second mixture chamber, a second distribution channel, a stability and flame transfer chamber with a pair of radial walls which divide the distribution channel from the inner crenellated wall to the outer crenellated wall, said radial walls present a plurality of combustion ports that transfer the flame inserted within said radial walls, the inner of the radial walls is in connection with a peripheral crenel for inner stability and transfer and the outer end of the radial walls is in connection with at least one peripheral crenel for outer stability and transfer.
    Type: Grant
    Filed: July 1, 2016
    Date of Patent: June 11, 2019
    Assignee: MABE, S.A. DE C.V.
    Inventors: José Arturo Lona Santoyo, Noé Araujo Monsalvo
  • Patent number: 10319617
    Abstract: A process system includes a substrate, first wafers, second wafers, and a roller. The first wafers are arranged at predetermined intervals along a first column which is parallel to an edge of the substrate, wherein each of the first wafers includes first chips. The second wafers are arranged at the predetermined intervals and at an offset from the first wafers, along a second column which is parallel to the first column, wherein each of the second wafers includes second chips. The roller is configured to roll in a first direction to pick up the plurality of first chips, roll in a second direction opposite to the first direction while suspended from the first wafers, pick up the second chips included in the wafers by rolling in the first direction, and transport the first chips and the second chips to the substrate.
    Type: Grant
    Filed: September 7, 2016
    Date of Patent: June 11, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Sang-moo Park
  • Patent number: 10279082
    Abstract: The present invention relates to an implant having a surface comprising a coating on at least a portion of the surface of the implant, wherein the coating comprises at least two coating layers of bioactive compounds adjacent to each other, obtainable in a process comprising the following steps: providing an implant with a surface, providing a first suspension comprising at least one first bioactive compound in a first solvent, wherein the first bioactive compound is non-soluble or partially soluble in the first solvent, applying said first suspension comprising the at least one first bioactive compound onto at least a part of the implant surface forming a first coating layer; drying the first coating layer, providing a second solution comprising at least one second bioactive compound in a second solvent, wherein the second bioactive compound is soluble or readily soluble in the second solvent; applying said second solution comprising the at least one second bioactive compound onto the first coating layer form
    Type: Grant
    Filed: July 11, 2016
    Date of Patent: May 7, 2019
    Assignee: Biomet Deutschland GmbH
    Inventors: Régis Cartier, Henrich Mannel, Norbert Baranowski
  • Patent number: 10280517
    Abstract: The thermal barrier coating system comprises a matrix of a first chemistry with multiple embedded second phases of a second chemistry. The matrix comprises a stabilized zirconia. The second regions comprise at least 40 mole percent of oxides having the formula Ln2O3, where Ln is selected from the lanthanides La through Lu, Y, Sc, In, Ca, and Mg with the balance zirconia (ZrO2), hafnia (HfO2), titania (TiO2), or mixtures thereof. The second phases have a characteristic thickness (T6) of less than 2.0 micrometers (?m). The spacing between second phases has a characteristic thickness (T5) of less than 8.0 micrometers (?m).
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: May 7, 2019
    Assignee: United Technologies Corporation
    Inventors: David A. Litton, Brian S. Tryon
  • Patent number: 10261382
    Abstract: Provided is a light modulating device including a light modulating unit provided on a substrate, a driving unit electrically connected to the light modulating unit and configured to drive the light modulating unit, and a cover disposed on the light modulating unit and configured to seal the light modulating unit, wherein the light modulating unit comprises an electrochromic device.
    Type: Grant
    Filed: November 16, 2016
    Date of Patent: April 16, 2019
    Assignee: Electronics and Telecommunications Research Instit
    Inventors: Tae-Youb Kim, Yong Hae Kim, Seong-Mok Cho, Jong-Heon Yang, Jae-Eun Pi
  • Patent number: 10252468
    Abstract: Techniques and systems for 3D printing using mirrors that are oriented at about 45 degrees from an X-axis and Y-axis are described. A technique includes receiving an object model; rotating the object model about 45 degrees around the Z-axis; generating cross-sectional images of the rotated object model; mapping pixels of the cross-sectional images to corresponding mirrors of a digital micromirror device of an additive manufacturing apparatus to form additive-manufacturing images, wherein edges of the mirrors are oriented about 45 degrees from the X-axis of the digital micromirror device and about 45 degrees from the Y-axis of the digital micromirror; and providing the additive manufacturing images to generate a build piece corresponding to the object model. Other implementations can include corresponding systems, apparatus, and computer program products.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: April 9, 2019
    Assignee: HOLO, INC.
    Inventors: Richard M. Greene, Michael Daum