Vacuum Arc Discharge Coating Patents (Class 204/192.38)
  • Patent number: 10704136
    Abstract: A stinger for a cathodic arc vapor deposition system includes a head with a reduced area contact interface.
    Type: Grant
    Filed: March 4, 2014
    Date of Patent: July 7, 2020
    Assignee: Raytheon Technologies Corporation
    Inventor: Albert Rabinovich
  • Patent number: 10679829
    Abstract: A reactor includes a plasma duct; a gas inlet, at a distal end of the plasma duct, for receiving a gas; a gas outlet at a proximal end of the plasma duct for removing a portion of the gas to generate a gas flow through the plasma duct; a separating baffle positioned between the plasma duct and the gas outlet for restricting gas flow to maintain high pressure in the plasma duct; a shielded cathodic arc source positioned in a cathode chamber at the proximal end; a remote anode, positioned in the plasma duct, for holding a substrate and cooperating with the cathodic arc source to generate an electron flow opposite the gas flow, to initiate a plasma discharge perpendicular to the remote anode at least in vicinity of the remote anode and deposit ions of the plasma discharge on the substrate to form a diamond coating.
    Type: Grant
    Filed: August 17, 2017
    Date of Patent: June 9, 2020
    Assignee: Nano-Product Engineering, LLC
    Inventor: Vladimir Gorokhovsky
  • Patent number: 10669622
    Abstract: A coated cutting tool includes a body and a hard and wear resistant coating on the body. The coating has at least one metal based nitride layer, wherein the layer is a nitrogen deficient (Ti1-xAlx)Ny layer with 0<x<0.7 and 0.4<y<1 and a layer thickness between 0.5 ?m and 15 ?m.
    Type: Grant
    Filed: April 19, 2016
    Date of Patent: June 2, 2020
    Assignee: SECO TOOLS AB
    Inventors: Magnus Oden, Mats Johansson Joesaar, Isabella Citlalli Schramm
  • Patent number: 10655225
    Abstract: A semiconductor substrate processing apparatus includes a vacuum chamber having a processing zone in which a semiconductor substrate may be processed, a process gas source in fluid communication with the vacuum chamber for supplying a process gas into the vacuum chamber, a showerhead module through which process gas from the process gas source is supplied to the processing zone of the vacuum chamber, and a substrate pedestal module. The substrate pedestal module includes a platen made of ceramic material having an upper surface configured to support a semiconductor substrate thereon during processing, a stem made of ceramic material having an upper stem flange that supports the platen, and a backside gas tube made of ceramic material that is located in an interior of the stem.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: May 19, 2020
    Assignee: Lam Research Corporation
    Inventors: Troy Alan Gomm, Nick Ray Linebarger, Jr.
  • Patent number: 10508036
    Abstract: A system and method for producing graphene includes a heating block, substrate, motor and collection device. The substrate is arranged about the heating block and is configured to receive heat from the heating block. A motor is connected to the substrate to rotate the substrate about the heating block. A cathode and anode are configured to direct a flux stream for deposit onto the rotating substrate. A collection device removes the deposited material from the rotating substrate. A heating element is embedded in the heating block and imparts heat to the heating block. The heating block is made of cement or other material that uniformly disperses the heat from the heating element throughout the heating block. The flux stream can be a carbon vapor, with the deposited flux being graphene.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: December 17, 2019
    Assignee: The George Washington University
    Inventors: Michael Keidar, Alexey Shashurin
  • Patent number: 10487391
    Abstract: A method for producing an oxidation barrier layer on a workpiece substrate in which the oxidation barrier layer is produced by means of physical deposition from the gas phase (PVD) and is an oxide that is materially related to the uncoated surface of the workpiece.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: November 26, 2019
    Assignee: Oerlikon Surface Solutions AG, Pfäffikon
    Inventors: Jürgen Ramm, Florian Seibert, Beno Widrig, Doris Fopp-Spori
  • Patent number: 10483465
    Abstract: A method of operating a deposition apparatus is provided. The method comprises: Deposition of an evaporated source material on a substrate by guiding the evaporated source material from one or more outlets of an evaporation source toward the substrate, wherein part of the evaporated source material is blocked by and attaches to a shielding device arranged between the one or more outlets and the substrate, followed by a cleaning of the shielding device by at least locally heating the shielding device for releasing at least part of the attached source material from the shielding device. According to a further aspect, a deposition apparatus is provided that can be operated according to the described methods.
    Type: Grant
    Filed: May 10, 2016
    Date of Patent: November 19, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jose Manuel Dieguez-Campo, Stefan Bangert, Andreas Lopp, Harald Wurster, Dieter Haas
  • Patent number: 10449486
    Abstract: A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH4, H2O, H2, NF3, SF6, F2, HCl, HF, Cl2, and HBr. Representative condensing abating reagents include, for example, H2, H2O, O2, N2, O3, CO, CO2, NH3, N2O, CH4, and combinations thereof.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: October 22, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Michael S. Cox, Monique McIntosh, Colin John Dickinson, Paul E. Fisher, Yutaka Tanaka, Zheng Yuan
  • Patent number: 10418230
    Abstract: Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode (5) and an anode arrangement (7). The anode arrangement (7) comprises on one hand an anode electrode (9) and on the other hand and electrically isolated therefrom a confinement (11). The confinement (11) has an opening (13) directed towards an area (S) of a substrate (21) to be cleaned. The electron source cathode (5) and the anode electrode (9) are electrically supplied by a supply circuit with a supply source (19). The circuit is operated electrically floating.
    Type: Grant
    Filed: October 10, 2007
    Date of Patent: September 17, 2019
    Assignee: OERLIKON TRADING AG, TRUEBBACH
    Inventors: Siegfried Krassnitzer, Oliver Cstoehl, Daniel Lewis
  • Patent number: 10353262
    Abstract: The present invention discloses a method for fabricating an electrochromic device, which adopts the vacuum cathodic arc-plasma deposition to comprise five layers with an ionic conduction layer (electrolyte) in contact with an electrochromic (EC) layer and an ion storage (complementary) layer, all sandwiched between two transparent conducting layers sequentially on a substrate. The method owns superior deposition efficiency and the fabricated thin film structures have higher crystalline homogeneity. In addition, thanks to the nanometer pores in the thin film structures, the electric capacity as well as the ion mobility are greater. Consequently, the reaction efficiency for bleaching or coloring is enhanced.
    Type: Grant
    Filed: August 7, 2017
    Date of Patent: July 16, 2019
    Assignee: Institute of Nuclear Energy Research, Atomic Energy Council, Executive Yuan, R.O.C
    Inventors: Po-Wen Chen, Chen-Te Chang, Peng Yang, Jin-Yu Wu, Der-Jun Jan, Cheng-Chang Hsieh, Wen-Fa Tsai, Min-Chuan Wang
  • Patent number: 10253407
    Abstract: The invention relates to an arc deposition device, comprising a cathode, an anode, as well as a voltage source for putting the anode at positive potential relative to the cathode. The device also comprises magnetic elements, which cause a magnetic field over the cathode surface, wherein the anode is arranged in the vicinity of the cathode in such a way that the magnetic field lines exiting from the cathode surface hit the anode.
    Type: Grant
    Filed: June 3, 2011
    Date of Patent: April 9, 2019
    Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
    Inventors: Siegfried Krassnitzer, Juerg Hagmann
  • Patent number: 10231321
    Abstract: Systems and methods for state-based adjustment of power and frequency are described. A primary generator of a system includes a primary power supply for supplying a primary radio frequency (RF) signal to an electrode. The primary generator further includes an automatic frequency control (AFC) to provide a first frequency input to the primary power supply when a pulsed signal is in a first state. A secondary generator of the system includes a secondary power supply for supplying a secondary RF signal to the electrode. The secondary generator also includes an AFC to provide a second frequency input to the secondary power supply when the pulsed signal is in the first state. The secondary generator includes an AFC to provide a third frequency input to the secondary power supply when the pulsed signal is in a second state. The system includes a digital pulsing source for generating the pulsed signal.
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: March 12, 2019
    Assignee: Lam Research Corporation
    Inventors: John C. Valcore, Jr., Bradford J. Lyndaker
  • Patent number: 10218096
    Abstract: A short bar for connecting terminal blocks of two motor driving units which drive a motor includes a strip-plate-like fixed portion which has a through hole into which a screw for fixing is inserted and which is fixed to the terminal block of the motor driving unit with the screw, a first connection portion which is provided on one end of the fixed portion, and a second connection portion which is provided on the other end of the fixed portion, wherein the first connection member has a configuration that the first connection portion and the second connection portion of another shot bar can be connected electrically and mechanically with each other through a relative movement in the thickness direction of the fixing member.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: February 26, 2019
    Assignee: Fanuc Corporation
    Inventors: Shouta Fujii, Kaname Matsumoto
  • Patent number: 10147610
    Abstract: A semiconductor substrate processing apparatus includes a vacuum chamber having a processing zone in which a semiconductor substrate may be processed, a process gas source in fluid communication with the vacuum chamber for supplying a process gas into the vacuum chamber, a showerhead module through which process gas from the process gas source is supplied to the processing zone of the vacuum chamber, and a substrate pedestal module. The substrate pedestal module includes a pedestal made of ceramic material having an upper surface configured to support a semiconductor substrate thereon during processing, a stem made of ceramic material, and a backside gas tube made of metallized ceramic material that is located in an interior of the stem. The metallized ceramic tube can be used to deliver backside gas to the substrate and supply RF power to an embedded electrode in the pedestal.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: December 4, 2018
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Ramkishan Rao Lingampalli, Joel Hollingsworth, Bradley Baker
  • Patent number: 10056237
    Abstract: A coating system includes a vacuum chamber and a coating assembly. The coating assembly includes a vapor source, a substrate holder, a remote anode electrically coupled to the cathode target, and a cathode chamber assembly. The cathode chamber assembly includes a cathode target, an optional primary anode and a shield which isolates the cathode target from the vacuum chamber. The shield defines an opening for transmitting an electron emission current of a remote arc discharge from the cathode target to the remote anode that streams along the target face long dimension. A primary power supply is connected between the cathode target and the primary anode while a secondary power supply is connected between the cathode target and the remote anode. Characteristically, a linear remote anode dimension and a vapor source short dimension are parallel to a dimension in which an arc spot is steered along the cathode target.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: August 21, 2018
    Assignee: VAPOR TECHNOLOGIES, INC.
    Inventors: Vladimir Gorokhovsky, William Grant, Edward Taylor, David Humenik
  • Patent number: 9999983
    Abstract: A chipping-proof nonmetal inorganic solid-state material is characterized in that the inorganic solid-state material has, in at least a part of a surface thereof, a surface structure in which a network of recesses and protuberances surrounded by the recesses are formed, the protuberances have an average width of 5 nm to 50 nm, a physical property of the surface structure differs from the physical property of an interior of the inorganic solid-state material lying below the surface structure, and there is no solid-solid interface between the surface structure and the interior of the inorganic solid-state material.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: June 19, 2018
    Assignee: JAPAN AVIATION ELECTRONICS INDUSTRY, LIMITED
    Inventors: Akiko Suzuki, Akinobu Sato
  • Patent number: 9859175
    Abstract: Provided are substrate processing systems and methods of managing the same. The method may include displaying a notification for a preventive maintenance operation on a chamber, performing a maintenance operation on the chamber, performing a first optical test, and evaluating the preventive maintenance operation. The first optical test may include generating a reference plasma reaction, measuring a variation of intensity by wavelength for plasma light emitted from the reference plasma reaction, and calculating an electron density and an electron temperature from a ratio in intensity of the plasma light.
    Type: Grant
    Filed: April 29, 2016
    Date of Patent: January 2, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kiwook Song, Bum-Soo Kim, Kye Hyun Baek, Masayuki Tomoyasu, Eunwoo Lee, Jong Seo Hong
  • Patent number: 9845527
    Abstract: The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: December 19, 2017
    Assignee: Oerlikon Surface Solutions AG, Pfäffikon
    Inventors: Helmut Rudigier, Jürgen Ramm, Beno Widrig, Troy Vom Braucke
  • Patent number: 9783883
    Abstract: The present invention provides a method for depositing aluminum on a permanent Nd—Fe—B magnet including a step of cooling the chamber and the arc source by feeding a fluid of water at a cooling temperature of between 0° C. and 5° C. through the chamber and the arc source. The method also includes a step of adjusting a target source and a control magnet of the arc source in the chamber of the multi-arc ion plating apparatus to define a predetermined distance of between 1 cm and 10 cm. The step of depositing the film of aluminum further including steps of applying a current of between 50 A and 70 A and an electrical potential of between 100V and 200V to the target source of aluminum and directing the ions of aluminum using the arc source to the purified permanent Nd—Fe—B magnet for a time period of between 0.5 hours and 5 hours.
    Type: Grant
    Filed: February 11, 2016
    Date of Patent: October 10, 2017
    Assignee: YANTAI SHOUGANG MAGNETIC MATERIALS INC.
    Inventors: Daoning Jia, Zhongjie Peng, Kunkun Yang
  • Patent number: 9786474
    Abstract: A cathodic arc coating apparatus includes a vessel, a cathode disposed in the vessel, and a stinger assembly. The stinger assembly includes a first magnetic field generator disposed in a first stinger cup in selective contact with the cathode. The first stinger cup has at least a first electrically conductive cup portion spaced from a second electrically conductive cup portion by a thermally insulating layer therebetween.
    Type: Grant
    Filed: September 25, 2014
    Date of Patent: October 10, 2017
    Assignee: United Technologies Corporation
    Inventors: Thomas Balzano, Russell A. Beers
  • Patent number: 9683285
    Abstract: This disclosure provides systems, methods, and apparatus related to blocking macroparticles in deposition processes utilizing plasmas. In one aspect, an apparatus includes a cathode, a substrate holder, a first magnet, a second magnet, and a structure. The cathode is configured to generate a plasma. The substrate holder is configured to hold a substrate. The first magnet is disposed proximate a first side of the cathode. The second magnet is disposed proximate a second side of the substrate holder. A magnetic field exists between the first magnet and the second magnet and a flow of the plasma substantially follows the magnetic field. The structure is disposed between the second side of the cathode and the first side of the substrate holder and is positioned proximate a region where the magnetic field between the first magnet and the second magnet is weak.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: June 20, 2017
    Assignee: The Regents of the University of California
    Inventors: Andre Anders, Jonathan Kolbeck
  • Patent number: 9601316
    Abstract: The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target.
    Type: Grant
    Filed: August 9, 2013
    Date of Patent: March 21, 2017
    Assignee: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
    Inventors: Siegfried Krassnitzer, Oliver Gstoehl, Juerg Hagmann
  • Patent number: 9567674
    Abstract: A film deposition apparatus includes: a plasma generating section configured to generate plasma between a cathode target and an anode; a film deposition chamber in which a base material is placed; and a magnetic-field filter section configured to remove a particle from the plasma by a magnetic field and to transfer the plasma to the film deposition chamber. The magnetic-field filter section includes: a first housing area to which a first voltage is applied; and a second housing area, provided downstream of the first housing area in the moving direction of the plasma, to which a second voltage is applied.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: February 14, 2017
    Assignee: FUJITSU LIMITED
    Inventors: Norikazu Nakamura, Shoichi Miyahara, Hiroshi Chiba
  • Patent number: 9540722
    Abstract: A hard and wear resistant coating for a body includes at least one metal based nitride layer having improved high temperature performance. The layer is (Zr1-x-zSixMez)Ny with 0<x<0.30, 0.90<y<1.20, 0?z<0.25, and Me is one or more of the elements Y, Ti, Nb, Ta, Cr, Mo, W and Al, comprised of a single cubic phase, a single hexagonal phase or a mixture thereof, with a cubic phase of a sodium chloride structure and a thickness between 0.5 ?m and 15 ?m. The layer is deposited using cathodic arc evaporation and is useful for metal cutting applications generating high temperatures.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: January 10, 2017
    Assignee: SECO TOOLS AB
    Inventors: Jon Andersson, Rickard Forsen, Naureen Ghafoor, Mats Johansson Jöessar, Magnus Oden
  • Patent number: 9480137
    Abstract: An apparatus and method for generating a Contact Glow Plasma Discharge in an electrolyte such as 7% K2CO3. A Shrouded Toroidal Anode is partially submerged in the electrolyte directly above a Flat Torus Cathode (totally submerged in the electrolyte), spaced approximately 50 mm apart, and the two electrodes are arranged in a concentric manner. A potential difference is applied from the cathode to the anode causing gas to be formed on the cathode. This is followed by a contact glow plasma being formed on the surface of the cathode and electromagnetically confined by a Spheromark formed by the configuration of the electrodes. This confinement of the plasma prevents a plasma arc from consuming the anode, which in turn allows for the application of 12,000 Watts and the occurrence of “non-linear electron resonance heating”. The effects of nonlinear series resonance increase the total power dissipation by factors of 2-5 for low pressure capacitive plasmas.
    Type: Grant
    Filed: June 13, 2014
    Date of Patent: October 25, 2016
    Assignee: Corona Plasma Systems, Inc
    Inventors: David Michael Tierney, Richard A. Hoffman, Sr., John E. Hoffman, Jr., James J. Pagliaro, II
  • Patent number: 9416438
    Abstract: The invention pertains to a method for the production of coatings by physical vapor deposition (PVD), wherein a binary target or a target with more than two constituents is evaporated in a curvilinear cathodic arc discharge, causing the ions with different masses (elements) to be splitted and the ion splitting results in variations for the ratio of the different masses (elements) at different positions in the deposition chamber.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: August 16, 2016
    Assignee: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
    Inventors: Jürgen Ramm, Beno Wídrìg, Helmut Rudígìer
  • Patent number: 9384940
    Abstract: In order to provide a charged particle beam apparatus capable of high resolution measurement of a sample at any inclination angle, a charged particle beam apparatus for detecting secondary charged particles (115) generated by irradiating a sample (114) with a primary charged particle beam (110) is provided with a beam tilt lens (113) having: a yoke magnetic path member (132) and a lens coil (134) to focus the primary charged particle beam (110) on the sample (114); and a solenoid coil (133) configured to arrange the upper end on the side surface of the yoke magnetic path member (132) and arrange the bottom end between the tip end of the pole piece of the yoke magnetic path member (132) and the sample (114) in order to arbitrarily tilt the primary charged particle beam (110) on the sample (114).
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: July 5, 2016
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Muneyuki Fukuda, Naomasa Suzuki, Akira Ikegami, Hideto Dohi, Momoyo Enyama, Tomoyasu Shojo
  • Patent number: 9200360
    Abstract: Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (3), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target (2) and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (2); and a rear surface magnet (4) disposed on the rear surface side of the target (2). The rear surface magnet (4) has a non-ring-shaped first permanent magnet (4A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet (3) and the magnetization direction of the rear surface magnet (4) is in the direction orthogonally intersecting the surface of the target (2).
    Type: Grant
    Filed: April 14, 2010
    Date of Patent: December 1, 2015
    Assignee: Kobe Steel, Ltd.
    Inventors: Shinichi Tanifuji, Kenji Yamamoto, Hirofumi Fujii, Yoshinori Kurokawa
  • Patent number: 9165749
    Abstract: The invention relates to an arc source with a target (1) having a target front face (2) for the vacuum vaporization of the target material, a target backside with a cooling plate (4), a central target region (Z) as well as a target margin. The arc source further comprises a magnet configuration (8, 9) with an inner magnet system (8) and/or an outer magnet system (9) for the generation of a magnetic field in the proximity of the target front face. At least one of the magnet systems (8) is herein radially poled and effects alone or in connection with the particular other magnet system that the field lines of the magnetic field extend here substantially parallel to the target front face (2).
    Type: Grant
    Filed: May 14, 2007
    Date of Patent: October 20, 2015
    Assignee: OERLIKON TRADING AG, TRUEBBACH
    Inventors: Siegfried Krassnitzer, Jürg Hagmann, Juergen Gwehenberger
  • Patent number: 9034152
    Abstract: A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition shield plate which is provided in the chamber so as to form a sputtering space between the target holder and the substrate holder, and prevents a sputter particle from adhering to an inner wall of the chamber, a reactive gas introduction pipe configured to introduce a reactive gas into the sputtering space, an inert gas introduction port which introduces an inert gas into a space that falls outside the sputtering space and within the chamber, and a shielding member which prevents a sputter particle from the target mounted on the target holder from adhering to an introduction port of the reactive gas introduction pipe upon sputtering.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: May 19, 2015
    Assignee: CANON ANELVA CORPORATION
    Inventors: Nobuo Yamaguchi, Kazuaki Matsuo, Susumu Akiyama, Satoshi Uchino, Yoshimitsu Shimane
  • Publication number: 20150114828
    Abstract: A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior cavity configured to receive the object, an anode positioned within the interior cavity of the vacuum chamber enclosure, and a cathode positioned within the interior cavity of said vacuum chamber enclosure such that a space between the anode and the cathode is at least partially defined by the interior surface of the object. At least a portion of the cathode vaporizes when current is supplied thereto such that vaporized cathode material coats the interior surface of the object.
    Type: Application
    Filed: October 31, 2013
    Publication date: April 30, 2015
    Applicant: General Electric Company
    Inventor: Scott Andrew Weaver
  • Publication number: 20150101925
    Abstract: A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior configured to receive the object, and a cathode coupled to the vacuum chamber enclosure. The cathode is fabricated from a coating material and has an outer surface. The cathode is configured such that when a current is applied to the cathode, an arc is formed on the outer surface and the coating material is removed from the cathode to form a cloud of coating material. The system also includes a collimator configured to be positioned between the cathode and the object configured to focus the cloud into a beam of coating material and to direct the beam towards the object, and a magnet configured to alter a path of the beam such that the beam is directed towards the interior surface of the object.
    Type: Application
    Filed: October 16, 2013
    Publication date: April 16, 2015
    Applicant: General Electric Company
    Inventors: Scott Andrew Weaver, Dennis Michael Gray
  • Patent number: 8999122
    Abstract: Electrically charged droplets and neutral droplets mixed with plasma are removed with better efficiency, and an improvement in the surface treatment precision of film formation by high purity plasma is sought. In a plasma processing apparatus including plasma generating portion A, plasma transport tube B and plasma processing portion C, an insulator interposed plasma processing apparatus is constituted in which plasma transport tube B is made electrically independent from plasma generating portion A and plasma processing portion C electrically by interposing insulator IS and insulator IF between the starting end side and the finishing end side of the plasma transport tube. Plasma transport tube B is divided into multiple small transport tubes B01, B23 through intermediate insulator II1, and each small transport tube is made independent electrically.
    Type: Grant
    Filed: February 10, 2010
    Date of Patent: April 7, 2015
    Assignee: Ferrotec Corporation
    Inventor: Yuichi Shiina
  • Publication number: 20150075978
    Abstract: The present invention aims to provide a high-load durable anode for oxygen generation and a manufacturing method for the same used for industrial electrolyses including manufacturing of electrolytic metal foils such as electrolytic copper foil, aluminum liquid contact and continuously electrogalvanized steel plate, and metal extraction, having superior durability under high-load electrolysis conditions.
    Type: Application
    Filed: December 14, 2012
    Publication date: March 19, 2015
    Inventors: Yi Cao, Akihiro Kato, Kazuhiro Hitao, Takashi Furusawa
  • Patent number: 8968529
    Abstract: A production method combining cathode arc and magnetron sputtering methods to form an antibacterial film on the surface of an object. Inside the vacuum chamber, both a cathode arc target source and a magnetron sputtering target source are configured. On the cathode arc target source, at least one of a zirconium, titanium, or chromium target is installed. On the magnetron sputtering target source, a silver target is installed. Argon and nitrogen are filled into the vacuum chamber to respectively ionize the silver target and one of the zirconium target, titanium target, or chromium target. Remote control is used to adjust the ionization proportion between one of the zirconium, titanium, or chromium target and the silver target to be 90-99%:1-9%. The surface of the object is formed with one of the zirconium nitride-silver mixed antibacterial film, titanium nitride-silver mixed antibacterial film, or chromium nitride-silver mixed antibacterial film.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: March 3, 2015
    Assignee: Ever Brite Technology Products Inc.
    Inventor: Ming-Hsien Chao
  • Patent number: 8968528
    Abstract: A process for coating a part comprises the steps of providing a chamber which is electrically connected as an anode, placing the part to be coated in the chamber, providing a cathode formed from a coating material to be deposited and platinum, and applying a current to the anode and the cathode to deposit the coating material and the platinum on the part.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: March 3, 2015
    Assignee: United Technologies Corporation
    Inventors: Brian S. Tryon, Michael J. Maloney, David A. Litton
  • Publication number: 20150056431
    Abstract: The present invention relates to a coating system comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other characterized in that the A-nanolayers contain essentially aluminium chromium boron nitride and the B-nanolayers contain essentially aluminium chromium nitride.
    Type: Application
    Filed: April 15, 2013
    Publication date: February 26, 2015
    Inventors: Mirjam Arnd, Markus Lechthaler, Sebastian Stein, Anders Olof Eriksson
  • Publication number: 20150056387
    Abstract: In an example of a method for coating a lithium battery component, the lithium battery component is provided. The lithium battery component is selected from the group consisting of an uncoated or untreated porous polymer membrane or an uncoated or untreated electrode including a lithium and manganese based active material. A laser arc plasma deposition process, a cathodic arc deposition process, or a pulsed laser deposition process is used to deposit a carbon nanocomposite structure, a metal oxide nanocomposite structure, or a mixed carbon and metal oxide nanocomposite structure i) on a surface of the lithium battery component, or ii) in pores of the lithium battery component, or iii) combinations of i and ii.
    Type: Application
    Filed: August 19, 2014
    Publication date: February 26, 2015
    Inventors: Gayatri Vyas Dadheech, Mei Cai, Li Yang
  • Publication number: 20150050489
    Abstract: In one aspect, coated cutting tools are described herein. In some embodiments, a coated cutting tool comprises a substrate and a refractory layer deposited by PVD adhered to the substrate, the refractory layer comprising M1-xAlxN wherein x?0.4 and M is titanium, chromium or zirconium, the refractory layer having a thickness greater than 5 ?m, hardness of at least 25 GPa and residual compressive stress less than 2.5 GPa.
    Type: Application
    Filed: August 16, 2013
    Publication date: February 19, 2015
    Applicant: Kennametal Inc.
    Inventors: Vineet Kumar, Ronald Penich, Peter Leicht, Yixiong Liu
  • Publication number: 20150050490
    Abstract: In one aspect, coated cutting tools are described herein comprising a substrate and a coating comprising a refractory layer deposited by physical vapor deposition adhered to the substrate, the refractory layer comprising M1-xAlxN wherein x?0.68 and M is titanium, chromium or zirconium, the refractory layer including a cubic crystalline phase and having hardness of at least 25 GPa.
    Type: Application
    Filed: April 9, 2014
    Publication date: February 19, 2015
    Applicant: KENNAMETAL INC.
    Inventors: Vineet Kumar, Ronald Penich, Yixiong Liu
  • Publication number: 20150044510
    Abstract: A method of protecting a magnetic information storage medium is described. The method includes fabricating a film over a surface of the magnetic information storage medium. The film includes an amorphous, uniform, homogeneous solid solution of carbon, hydrogen, silicon, and oxygen. A magnetic storage medium with such a protective film is described.
    Type: Application
    Filed: September 15, 2014
    Publication date: February 12, 2015
    Inventors: Robert W. Carpick, Kumar Sridharan
  • Publication number: 20150034478
    Abstract: The present invention provides a method for depositing a wear resistant coating on a cutting tool substrate. Cathodic arc deposition is performed using one or more plate-shaped targets and a high arc current of at least 200 A, preferably at least 400 A, whereby a high total ion current of at least 5 A is provided in front of the substrates. A comparatively low bias voltage may be used in order to avoid negative effects of ions impinging on the substrates with high kinetic energy. Thanks to the method of the invention it is possible to deposit thick wear resistant coatings on cutting tool substrates in order to improve cutting performance and tool life.
    Type: Application
    Filed: June 28, 2012
    Publication date: February 5, 2015
    Inventors: Johan Bohlmark, Hermann Curtins, Axel Kinell
  • Publication number: 20150030401
    Abstract: A surface-coated cutting tool with a body and hard coating layer is provided. (a) The hard coating layer is made of a complex nitride layer of Al and Cr. (b) The hard coating layer deposited on a region from a cutting edge to a location 100 ?m from the cutting edge toward an opposite side thereof has a granular crystal structure. The average grain size of granular crystals on a surface of the hard coating layer on the region is 0.2-0.5 ?m. The average grain size of granular crystals at an interface between the cutting tool body and the hard coating layer on the region is smaller than the average grain size on the surface the hard coating layer in an extent of 0.02-0.1 ?m. The crystal grain size length ratio of crystal grains whose size is 0.15-20% or less.
    Type: Application
    Filed: March 5, 2013
    Publication date: January 29, 2015
    Applicant: MITSUBISHI MATERIALS CORPORATION
    Inventors: Kazuaki Senbokuya, Yusuke Tanaka
  • Publication number: 20150030406
    Abstract: A hard and wear resistant coating for a body includes at least one metal based nitride layer having improved high temperature performance. The layer is (Zr1-x-zSixMez)Ny with 0<x<0.30, 0.90<y<1.20, 0?z<0.25, and Me is one or more of the elements Y, Ti, Nb, Ta, Cr, Mo, W and Al, comprised of a single cubic phase, a single hexagonal phase or a mixture thereof, with a cubic phase of a sodium chloride structure and a thickness between 0.5 ?m and 15 ?m. The layer is deposited using cathodic arc evaporation and is useful for metal cutting applications generating high temperatures.
    Type: Application
    Filed: March 6, 2013
    Publication date: January 29, 2015
    Inventors: Jon Andersson, Rickard Forsen, Naureen Ghafoor, Mats Johansson Jöessar, Magnus Oden
  • Publication number: 20150024183
    Abstract: The present invention relates to a coated cutting tool comprising a substrate and a multilayered (Ti,Al)N coating. The coating comprises three zones: a first zone (A) closest to the substrate, a second zone (B) adjacent to the first zone and a third outermost zone (C). All three zones each comprises a multilayered aperiodic structure of (Ti,Al)N, where the average composition for each zone is different from each other and where the ratio between the thickness of the zone C and zone B is between 1.3 and 2.2 and where zzone C>Zzone B, where z is the average composition for each zone of the ratio z=Ti/AI. The coating has a low residual stress.
    Type: Application
    Filed: February 26, 2013
    Publication date: January 22, 2015
    Inventor: Bjorn Ericsson
  • Publication number: 20150023751
    Abstract: A cutting tool insert for machining by chip removal includes a body of a hard alloy of cemented carbide, cermet, ceramics, cubic boron nitride based material or high speed steel, onto which a hard and wear resistant coating is deposited. The coating includes at least one polycrystalline nanolaminated structure having sequences of alternating A and B layers, wherein layer A is (Alx1Me11-x1)Ny1 with 0.3<x1<0.95, 0.9<y1<1.1 and Me1 is one or more of the elements Ti, Y, V, Nb, Mo, Si and W, or Me1 is Ti and one or more of the following elements Y, V, Nb, Mo, Si, Cr and W, and layer B is (Zr1-x2-z2Six2Me2z2)Ny2 with 0<x2<0.30, 0.90<y2 <1.20, 0<z2<0.25 and Me2 is one or more of the elements Y, Ti, Nb, Ta, Cr, Mo, W and Al.
    Type: Application
    Filed: March 6, 2013
    Publication date: January 22, 2015
    Inventors: Jon Andersson, Mats Johansson
  • Publication number: 20150017468
    Abstract: An example of the coated tool disclosed herein includes a substrate, a metal layer established on the substrate, a continuous metal carbide layer established on the metal layer, and a smooth, continuous, terminated diamond like carbon (DLC) layer established on the metal carbide layer. The DLC layer is to prevent metal, from a workpiece upon which the tool is to act, from adhering to the tool.
    Type: Application
    Filed: July 15, 2014
    Publication date: January 15, 2015
    Inventor: Michael J. Lukitsch
  • Publication number: 20150008118
    Abstract: Method for the coating of a substrate (S) in a process chamber (3), in which a gas atmosphere is set up and maintained in the process chamber (3) and an anode (6, 61) and a cylindrical vaporization cathode (2, 21, 22) formed as a target (2, 21, 22) are provided in the process chamber (3). The cylindrical vaporization cathode (2, 21, 22) includes the target material (200, 201, 202) and the target material (200, 201, 202) of the cylindrical cathode (2, 21, 22) is transferred into a vapor phase by means of an electrical source of energy (7, 71, 72).
    Type: Application
    Filed: September 26, 2014
    Publication date: January 8, 2015
    Applicant: SULZER METAPLAS GMBH
    Inventors: Joerg VETTER, Georg ERKENS
  • Publication number: 20140374249
    Abstract: The present invention aims to provide an anode for oxygen generation and a manufacturing method for the same used for industrial electrolyses including manufacturing of electrolytic metal foils such as electrolytic copper foil, aluminum liquid contact and continuously electrogalvanized steel plate, and metal extraction. The present invention features an anode for oxygen generation and a manufacturing method for the same comprising a conductive metal substrate and a catalyst layer containing iridium oxide formed on the conductive metal substrate wherein the coating is baked in a high temperature region of 410° C.-450° C. in an oxidation atmosphere to form the catalyst layer co-existing amorphous and crystalline iridium oxide and the catalyst layer co-existing the amorphous and crystalline iridium oxide is post-baked in a further high temperature region of 520° C.-560° C. in an oxidation atmosphere to crystallize almost all amount of iridium oxide in the catalyst layer.
    Type: Application
    Filed: December 25, 2012
    Publication date: December 25, 2014
    Inventors: Yi Cao, Akihiro Kato, Kazuhiro Hirao, Takashi Furusawa
  • Publication number: 20140353923
    Abstract: Disclosed is a piston ring (1) having a substrate (10) to which a wear resistant coating (20) is applied that includes at least one first element with a melting point Tm?700° C. The wear resistant coating (20) contains at least one second element with a melting point Tm>760° C. The wear resistant coating also includes droplets (30) which have a diameter (D) and which contain at least the first element, wherein at least 90% of the droplets (30) have a value 1 ?m?D?10 ?m. In the method for producing a wear resistant coating (20) using an arc evaporation technique, the target material includes at least one first element with a melting point Tm?700° C. and at least one second element with a melting point Tm>760° C., wherein the quantity of the second material contained in the target material is such that the melting point (Tm) of the target material ?1000° C.
    Type: Application
    Filed: January 14, 2013
    Publication date: December 4, 2014
    Inventors: Ralf Lammers, Christiane Bauer, Manfred Fischer, Jorg Vetter