Abstract: Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (3), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target (2) and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (2); and a rear surface magnet (4) disposed on the rear surface side of the target (2). The rear surface magnet (4) has a non-ring-shaped first permanent magnet (4A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet (3) and the magnetization direction of the rear surface magnet (4) is in the direction orthogonally intersecting the surface of the target (2).

Abstract: The invention relates to an arc source with a target (1) having a target front face (2) for the vacuum vaporization of the target material, a target backside with a cooling plate (4), a central target region (Z) as well as a target margin. The arc source further comprises a magnet configuration (8, 9) with an inner magnet system (8) and/or an outer magnet system (9) for the generation of a magnetic field in the proximity of the target front face. At least one of the magnet systems (8) is herein radially poled and effects alone or in connection with the particular other magnet system that the field lines of the magnetic field extend here substantially parallel to the target front face (2).

Abstract: A reactive sputtering apparatus includes a chamber, a substrate holder provided in the chamber, a target holder which is provided in the chamber and configured to hold a target, a deposition shield plate which is provided in the chamber so as to form a sputtering space between the target holder and the substrate holder, and prevents a sputter particle from adhering to an inner wall of the chamber, a reactive gas introduction pipe configured to introduce a reactive gas into the sputtering space, an inert gas introduction port which introduces an inert gas into a space that falls outside the sputtering space and within the chamber, and a shielding member which prevents a sputter particle from the target mounted on the target holder from adhering to an introduction port of the reactive gas introduction pipe upon sputtering.

Abstract: A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior cavity configured to receive the object, an anode positioned within the interior cavity of the vacuum chamber enclosure, and a cathode positioned within the interior cavity of said vacuum chamber enclosure such that a space between the anode and the cathode is at least partially defined by the interior surface of the object. At least a portion of the cathode vaporizes when current is supplied thereto such that vaporized cathode material coats the interior surface of the object.

Abstract: A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior configured to receive the object, and a cathode coupled to the vacuum chamber enclosure. The cathode is fabricated from a coating material and has an outer surface. The cathode is configured such that when a current is applied to the cathode, an arc is formed on the outer surface and the coating material is removed from the cathode to form a cloud of coating material. The system also includes a collimator configured to be positioned between the cathode and the object configured to focus the cloud into a beam of coating material and to direct the beam towards the object, and a magnet configured to alter a path of the beam such that the beam is directed towards the interior surface of the object.

Abstract: Electrically charged droplets and neutral droplets mixed with plasma are removed with better efficiency, and an improvement in the surface treatment precision of film formation by high purity plasma is sought. In a plasma processing apparatus including plasma generating portion A, plasma transport tube B and plasma processing portion C, an insulator interposed plasma processing apparatus is constituted in which plasma transport tube B is made electrically independent from plasma generating portion A and plasma processing portion C electrically by interposing insulator IS and insulator IF between the starting end side and the finishing end side of the plasma transport tube. Plasma transport tube B is divided into multiple small transport tubes B01, B23 through intermediate insulator II1, and each small transport tube is made independent electrically.

Abstract: The present invention aims to provide a high-load durable anode for oxygen generation and a manufacturing method for the same used for industrial electrolyses including manufacturing of electrolytic metal foils such as electrolytic copper foil, aluminum liquid contact and continuously electrogalvanized steel plate, and metal extraction, having superior durability under high-load electrolysis conditions.

Abstract: A process for coating a part comprises the steps of providing a chamber which is electrically connected as an anode, placing the part to be coated in the chamber, providing a cathode formed from a coating material to be deposited and platinum, and applying a current to the anode and the cathode to deposit the coating material and the platinum on the part.

Abstract: A production method combining cathode arc and magnetron sputtering methods to form an antibacterial film on the surface of an object. Inside the vacuum chamber, both a cathode arc target source and a magnetron sputtering target source are configured. On the cathode arc target source, at least one of a zirconium, titanium, or chromium target is installed. On the magnetron sputtering target source, a silver target is installed. Argon and nitrogen are filled into the vacuum chamber to respectively ionize the silver target and one of the zirconium target, titanium target, or chromium target. Remote control is used to adjust the ionization proportion between one of the zirconium, titanium, or chromium target and the silver target to be 90-99%:1-9%. The surface of the object is formed with one of the zirconium nitride-silver mixed antibacterial film, titanium nitride-silver mixed antibacterial film, or chromium nitride-silver mixed antibacterial film.

Abstract: The present invention relates to a coating system comprising at least one multi-layered film formed of alternated A- and B-nanolayers deposited one on each other characterized in that the A-nanolayers contain essentially aluminium chromium boron nitride and the B-nanolayers contain essentially aluminium chromium nitride.

Abstract: In an example of a method for coating a lithium battery component, the lithium battery component is provided. The lithium battery component is selected from the group consisting of an uncoated or untreated porous polymer membrane or an uncoated or untreated electrode including a lithium and manganese based active material. A laser arc plasma deposition process, a cathodic arc deposition process, or a pulsed laser deposition process is used to deposit a carbon nanocomposite structure, a metal oxide nanocomposite structure, or a mixed carbon and metal oxide nanocomposite structure i) on a surface of the lithium battery component, or ii) in pores of the lithium battery component, or iii) combinations of i and ii.

Abstract: In one aspect, coated cutting tools are described herein comprising a substrate and a coating comprising a refractory layer deposited by physical vapor deposition adhered to the substrate, the refractory layer comprising M1-xAlxN wherein x?0.68 and M is titanium, chromium or zirconium, the refractory layer including a cubic crystalline phase and having hardness of at least 25 GPa.

Abstract: In one aspect, coated cutting tools are described herein. In some embodiments, a coated cutting tool comprises a substrate and a refractory layer deposited by PVD adhered to the substrate, the refractory layer comprising M1-xAlxN wherein x?0.4 and M is titanium, chromium or zirconium, the refractory layer having a thickness greater than 5 ?m, hardness of at least 25 GPa and residual compressive stress less than 2.5 GPa.

Abstract: A method of protecting a magnetic information storage medium is described. The method includes fabricating a film over a surface of the magnetic information storage medium. The film includes an amorphous, uniform, homogeneous solid solution of carbon, hydrogen, silicon, and oxygen. A magnetic storage medium with such a protective film is described.

Abstract: The present invention provides a method for depositing a wear resistant coating on a cutting tool substrate. Cathodic arc deposition is performed using one or more plate-shaped targets and a high arc current of at least 200 A, preferably at least 400 A, whereby a high total ion current of at least 5 A is provided in front of the substrates. A comparatively low bias voltage may be used in order to avoid negative effects of ions impinging on the substrates with high kinetic energy. Thanks to the method of the invention it is possible to deposit thick wear resistant coatings on cutting tool substrates in order to improve cutting performance and tool life.

Abstract: A hard and wear resistant coating for a body includes at least one metal based nitride layer having improved high temperature performance. The layer is (Zr1-x-zSixMez)Ny with 0<x<0.30, 0.90<y<1.20, 0?z<0.25, and Me is one or more of the elements Y, Ti, Nb, Ta, Cr, Mo, W and Al, comprised of a single cubic phase, a single hexagonal phase or a mixture thereof, with a cubic phase of a sodium chloride structure and a thickness between 0.5 ?m and 15 ?m. The layer is deposited using cathodic arc evaporation and is useful for metal cutting applications generating high temperatures.

Abstract: A surface-coated cutting tool with a body and hard coating layer is provided. (a) The hard coating layer is made of a complex nitride layer of Al and Cr. (b) The hard coating layer deposited on a region from a cutting edge to a location 100 ?m from the cutting edge toward an opposite side thereof has a granular crystal structure. The average grain size of granular crystals on a surface of the hard coating layer on the region is 0.2-0.5 ?m. The average grain size of granular crystals at an interface between the cutting tool body and the hard coating layer on the region is smaller than the average grain size on the surface the hard coating layer in an extent of 0.02-0.1 ?m. The crystal grain size length ratio of crystal grains whose size is 0.15-20% or less.

Abstract: A cutting tool insert for machining by chip removal includes a body of a hard alloy of cemented carbide, cermet, ceramics, cubic boron nitride based material or high speed steel, onto which a hard and wear resistant coating is deposited. The coating includes at least one polycrystalline nanolaminated structure having sequences of alternating A and B layers, wherein layer A is (Alx1Me11-x1)Ny1 with 0.3<x1<0.95, 0.9<y1<1.1 and Me1 is one or more of the elements Ti, Y, V, Nb, Mo, Si and W, or Me1 is Ti and one or more of the following elements Y, V, Nb, Mo, Si, Cr and W, and layer B is (Zr1-x2-z2Six2Me2z2)Ny2 with 0<x2<0.30, 0.90<y2 <1.20, 0<z2<0.25 and Me2 is one or more of the elements Y, Ti, Nb, Ta, Cr, Mo, W and Al.

Abstract: The present invention relates to a coated cutting tool comprising a substrate and a multilayered (Ti,Al)N coating. The coating comprises three zones: a first zone (A) closest to the substrate, a second zone (B) adjacent to the first zone and a third outermost zone (C). All three zones each comprises a multilayered aperiodic structure of (Ti,Al)N, where the average composition for each zone is different from each other and where the ratio between the thickness of the zone C and zone B is between 1.3 and 2.2 and where zzone C>Zzone B, where z is the average composition for each zone of the ratio z=Ti/AI. The coating has a low residual stress.

Abstract: An example of the coated tool disclosed herein includes a substrate, a metal layer established on the substrate, a continuous metal carbide layer established on the metal layer, and a smooth, continuous, terminated diamond like carbon (DLC) layer established on the metal carbide layer. The DLC layer is to prevent metal, from a workpiece upon which the tool is to act, from adhering to the tool.

Abstract: Method for the coating of a substrate (S) in a process chamber (3), in which a gas atmosphere is set up and maintained in the process chamber (3) and an anode (6, 61) and a cylindrical vaporization cathode (2, 21, 22) formed as a target (2, 21, 22) are provided in the process chamber (3). The cylindrical vaporization cathode (2, 21, 22) includes the target material (200, 201, 202) and the target material (200, 201, 202) of the cylindrical cathode (2, 21, 22) is transferred into a vapor phase by means of an electrical source of energy (7, 71, 72).

Abstract: The present invention aims to provide an anode for oxygen generation and a manufacturing method for the same used for industrial electrolyses including manufacturing of electrolytic metal foils such as electrolytic copper foil, aluminum liquid contact and continuously electrogalvanized steel plate, and metal extraction. The present invention features an anode for oxygen generation and a manufacturing method for the same comprising a conductive metal substrate and a catalyst layer containing iridium oxide formed on the conductive metal substrate wherein the coating is baked in a high temperature region of 410° C.-450° C. in an oxidation atmosphere to form the catalyst layer co-existing amorphous and crystalline iridium oxide and the catalyst layer co-existing the amorphous and crystalline iridium oxide is post-baked in a further high temperature region of 520° C.-560° C. in an oxidation atmosphere to crystallize almost all amount of iridium oxide in the catalyst layer.

Abstract: Disclosed is a piston ring (1) having a substrate (10) to which a wear resistant coating (20) is applied that includes at least one first element with a melting point Tm?700° C. The wear resistant coating (20) contains at least one second element with a melting point Tm>760° C. The wear resistant coating also includes droplets (30) which have a diameter (D) and which contain at least the first element, wherein at least 90% of the droplets (30) have a value 1 ?m?D?10 ?m. In the method for producing a wear resistant coating (20) using an arc evaporation technique, the target material includes at least one first element with a melting point Tm?700° C. and at least one second element with a melting point Tm>760° C., wherein the quantity of the second material contained in the target material is such that the melting point (Tm) of the target material ?1000° C.

Abstract: A protective film is disclosed that is mainly composed of a tetrahedral amorphous carbon (ta-C film) that is denser than a DLC film formed by a plasma CVD method and containing aggregate particles so reduced as to a necessary and sufficient level, to provide a method of manufacturing such a protective film, and to provide a magnetic recording medium comprising such a protective film. The film is mainly composed of a ta-C film formed by a filtered cathodic arc method using a cathode target of glass state carbon. A magnetic recording medium is disclosed which includes a substrate, a magnetic recording layer, and the protective film mainly composed of a ta-C film.

Abstract: The present invention provides a film with a transparent electroconductive membrane including a transparent base material and a transparent electroconductive membrane. The transparent electroconductive membrane has on its surface crystalline secondary particles having an average particle diameter of 0.1 to 1 ?m in an amount of 1 to 100 particles/?m2. A substrate for a display, a display, a liquid crystal display device, and an organic EL element using the film with a transparent electroconductive membrane are also provided.

Abstract: Provided are methods and systems for vacuum coating the outside surface of tubular devices for use in oil and gas exploration, drilling, completions, and production operations for friction reduction, erosion reduction and corrosion protection. These methods include embodiments for sealing tubular devices within a vacuum chamber such that the entire device is not contained within the chamber. These methods also include embodiments for surface treating of tubular devices prior to coating. In addition, these methods include embodiments for vacuum coating of tubular devices using a multitude of devices, a multitude of vacuum chambers and various coating source configurations.

Abstract: A stinger for a cathodic arc vapor deposition system includes a head with a reduced area contact interface.

Abstract: The invention relates to a method for using a target for a coating process of metal oxide and/or metal nitride coatings by means of spark evaporation, wherein the target can be operated at a temperature that is higher than the melting point of the metal used in the target, and wherein the target is comprised of a metal whose oxides and/or nitrides are not electrically conducting. The invention further relates to the use of a target for producing metal oxide coatings and/or metal nitride coatings by means of spark evaporation, wherein the target has a matrix comprised of a metal, in which matrix non electrically conducting oxides and/or nitrides of the metal are embedded.

Abstract: An aluminium alloy sheet product or extruded product for fluxless brazing, including an aluminium alloy core having on at least one face an aluminium filler clad layer containing 4% to 15% of Si, the filler clad layer having an inner-surface and an outer-surface, the inner-surface is facing the aluminium alloy core and the outer-surface is facing a coating layer of 2 to 45 mg/sq.m of Bi or of a Bi-based alloy. Furthermore, a method of brazing a brazed assembly incorporating at least one member made from the brazing sheet material.

Abstract: A process for treating the surface of magnesium alloy comprises providing a substrate made of magnesium alloy. The substrate is then treated with a chemical conversion treatment solution containing cerium nitrate and potassium permanganate as main film forming agents, to form a cerium conversion film on the substrate. A ceramic coating comprising refractory metal compound is next formed on the cerium conversion film by physical vapor deposition.

Abstract: Provided are low friction coatings with improved abrasion, wear resistance and methods of making such coatings. In one form, the coating includes: i) an under layer selected from the group consisting of CrN, TiN, TiAlN, TiAlVN, TiAlVCN, TiSiN, TiSiCN, TiAlSiN and combinations thereof, wherein the under layer ranges in thickness from 0.1 to 100 ?m, ii) an adhesion promoting layer selected from the group consisting of Cr, Ti, Si, W, CrC, TiC, SiC, WC, and combinations thereof, wherein the adhesion promoting layer ranges in thickness from 0.1 to 50 ?m and is contiguous with a surface of the under layer, and iii) a functional layer selected from the group consisting of a fullerene based composite, a diamond based material, diamond-like-carbon and combinations thereof, wherein the functional layer ranges from 0.1 to 50 ?m and is contiguous with a surface of the adhesion promoting layer.

Abstract: A target for the deposition of mixed crystal layers with at least two different metals on a substrate by means of arc vapor deposition (arc PVD), wherein the target includes at least two different metals. To produce mixed crystal layers which are as free as possible of macroparticles (droplets) according to the invention at least the metal with the lowest melting point is present in the target in a ceramic compound, namely as a metal oxide, metal carbide, metal nitride, metal carbonitride, metal oxynitride, metal oxycarbide, metal oxycarbonitride, metal boride, metal boronitride, metal borocarbide, metal borocarbonitride, metal borooxynitride, metal borooxocarbide, metal borooxocarbonitride, metal oxoboronitride, metal silicate or mixture thereof, and at least one metal different from the metal with the lowest melting point is present in the target in elemental (metallic) form.

Abstract: A shear valve for use in a high performance liquid chromatography system. The shear valve includes a first valve member having a plurality of first fluid-conveying features, and a second valve member having one or more second fluid-conveying features. The second valve member is movable, relative to the first valve member, between a plurality of discrete positions such that, in each of the discrete positions, at least one of the one or more second fluid-conveying features overlaps with multiple ones of the first fluid conveying features to provide for fluid communication therebetween. At least one of the first and second valve members is at least partially coated with a protective coating that includes an adhesion interlayer and a diamond-like carbon (DLC) layer. The DLC layer is deposited on the adhesion interlayer via filtered cathodic vacuum arc (FCVA) deposition.

Abstract: A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode.

Abstract: The invention relates to a method for coating work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source. Using the first electrode, an arc is operated with an arc current and vaporizes material. A bias voltage is applied to a bias electrode, which includes a second electrode that is embodied as a work piece holder, together with the work pieces. Metal ion bombardment is carried out either to pretreat the work pieces or in at least one transition from one layer to an adjacent layer of a multilayer system, so that neither a significant material removal nor a significant material buildup occurs, but instead, introduces metal ions into a substrate surface or into a layer of a multilayer system.

Abstract: A vacuum coating apparatus is disclosed. The apparatus includes a cathode target, a plurality of anodes, a transiting device, a pulsed arc discharge device, and a pulsed laser device. The plurality of anodes is placed on the transiting device and successively passes though a working position by the transiting device. The pulsed arc discharge device is electrically connected to the cathode target and the anode at the operable position to form plasma in a vacuum chamber for film coating. The pulsed laser device is located outside of the vacuum chamber and provides a pulsed laser beam onto the surface of the cathode surface to serve as a plasma trigger. A coating method for the vacuum coating apparatus is also disclosed.

Abstract: The invention relates to a method for operating a pulsed discontinuous spark discharge. The spark is fed via a capacitor. Between the pulses there are switched-off time intervals during which no spark current flows. Within the pulses, that is to say during the switched-on time intervals, the supply of charge is stopped upon a current threshold being reached and is restarted, with the result that subpulses occur within the pulses. The time intervals and subpulses are chosen according to the invention such that when the capacitor is switched on again, the spark discharge readily ignites again.

Abstract: An electrode for an electrical-discharge surface-treatment method is molded with a metallic powder or a metallic compound powder having an average grain diameter of 6 micrometers to 10 micrometers. A coat on a surface of a workpiece is formed with a material constituting the electrode or a substance that is generated by a reaction of the material due to a pulse-like electrical discharge. The coat is built up with a material containing metal as a main constituent under conditions of a width of a current pulse for the pulse-like electrical discharge in a range of 50 microseconds to 500 microseconds and a peak of the current pulse equal to or less than 30 amperes.

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.

Abstract: The method for manufacturing a hydrogen permeation barrier comprises the steps of a) depositing on a substrate (SUB) a layer system (LS) comprising at least one layer (L1,L2,L3); characterized in that step a) comprises the step of b) depositing at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide. The apparatus comprises a sealable volume and a wall forming at least a portion of a boundary limiting said volume, wherein said wall comprises a hydrogen permeation barrier comprising a layer system (LS) comprising at least one layer, wherein said layer system comprises at least one hydrogen barrier layer (HPBL) comprising an at least ternary oxide. Preferably, said at least ternary oxide is substantially composed of Al, Cr and O, and said depositing said at least one hydrogen barrier layer (HPBL) is carried out using a physical vapor deposition method, in particular a cathodic arc evaporation method.

Abstract: A method and apparatus for depositing a metal onto a substrate using a cathodic arc plasma source as a source of metal ions. A plasma deposition apparatus has a vacuum chamber; and a conduit within the vacuum chamber having an input end and an output end. A substrate is within the vacuum chamber, positioned to receive a plasma at the output end of the conduit. A cathodic arc plasma source within the vacuum chamber is positioned to inject a composition comprising a mixture of a plasma and electrons into the input end of the conduit toward the output end of the conduit. A magnetic field generator establishes a magnetic field within the conduit a plurality of electrodes located within the magnetic field and an electric field generator establishes an electric field within the conduit. The apparatus reduces or eliminates liquid metal droplets emitted from such a plasma source.

Abstract: A continuous vacuum sputtering method includes the steps of providing a substrate; providing a continuous vacuum sputtering machine comprising a depositing chamber. The depositing chamber comprising at least one vacuum chamber, each vacuum chamber having a cathodic arc emitting source located therein; the substrate being loaded in the continuous vacuum sputtering machine; depositing a coating on the substrate by cathodic arc deposition using the cathodic arc emitting source.

Abstract: The present invention provides hard coating film which excels conventional surface coating layer in wear resistance, has lower frictional coefficient and better slideability, a material coated with the hard coating film, a die for cold plastic working, and a method for forming the hard coating film. The hard coating film according to the present invention is a hard coating film comprising (NbxM1?x)y(BaCbN1?a?b)1?y, where 0.2?x?1.0 ??Equation (1) 0?a?0.3 ??Equation (2) 0?1?a?b?0.5 ??Equation (3) 0.5?b=1 ??Equation (4) 0.4?1?y?0.9 ??Equation (5) [however, M denotes at least one species of elements belonging to Groups 4a, 5a, and 6a and Si and Al; x, 1?x, a, b, and 1?a?b represent respectively the atomic ratio of Nb, M, B, C and N; and y and 1?y represent respectively the ratio of (NbxM1?x) and (BaCbN1?a?b).

Abstract: A system and method for producing graphene includes a heating block, substrate, motor and collection device. The substrate is arranged about the heating block and is configured to receive heat from the heating block. A motor is connected to the substrate to rotate the substrate about the heating block. A cathode and anode are configured to direct a flux stream for deposit onto the rotating substrate. A collection device removes the deposited material from the rotating substrate. A heating element is embedded in the heating block and imparts heat to the heating block. The heating block is made of cement or other material that uniformly disperses the heat from the heating element throughout the heating block. The flux stream can be a carbon vapor, with the deposited flux being graphene.

Abstract: A cutting tool insert for machining by chip removal includes a body of a hard alloy of cemented carbide, cermet, ceramics, polycrystalline diamond or cubic boron nitride based materials onto which a hard and wear resistant coating is deposited by physical vapour deposition (PVD). The coating includes at least one layer of a NaCl-structured (TicAlaCrbMed)(CzOyNx) where Me is one or more of the elements Zr, Hf, V, Nb, Ta, Mo, W and/or Si, 0.10<a<0.60, b+d>0.20, c>0.05, 0?d<0.25, 0.75<x<1.05, 0?y<0.25 and 0?z?0.25 with a thickness between 0.5 and 10 ?m. The layer has a columnar mictrostructure with an average columnar width of <1 ?m, a compressive stress level of ?6 GPa<?<?0.5 GPa and a nanohardness >25 GPa.

Abstract: A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.

Abstract: A plasma processing apparatus using a plasma generating apparatus by which droplets mixed in plasma can be efficiently removed and surface processing precision can be improved in film formation wherein high purity plasma is used. A droplet removing portion arranged in a plasma advancing path is composed of a straight plasma advancing tube (P0) connected to a plasma generating portion (A); a first plasma advancing tube (P1) connected to the straight plasma advancing tube (P0) in a bent manner; a second plasma advancing tube (P2) connected to a finishing end of the first plasma advancing tube (P1) by being inclinedly arranged at a predetermined inclination angle with respect to the tube axis of the first plasma advancing tube; and a third plasma advancing tube (P3), which is connected to the finishing end of the second plasma advancing tube (P2) in a bent manner and discharges plasma from a plasma outlet.

Abstract: The present invention provides a method of manufacturing a carbon film and a plasma CVD method capable of performing film formation while controlling the temperature of a substrate as well as film properties. A process chamber according to one embodiment of the present invention includes a holder configured to hold a substrate, magnetic-field producing means configured to produce magnetic fields inside the process chamber, shields configured to suppress film deposition on the magnetic-field producing means, heat dissipating sheets configured to suppress heating of the magnetic-field producing means, and moving means configured to move the magnetic-field producing means. The magnetic-field producing means is characterized in being moved in such a direction as to increase or decrease the volume of a space between the magnetic-field producing means and the holder.

Abstract: A protecting coating for a copper substrate is disclosed. The coating comprises seed layer comprising titanium ions that forms an “alloy-like” structure with the copper substrate. The coating further comprises a first layer of carbon disposed on the seed layer comprising titanium ions. A second layer comprising titanium is disposed on the first layer of carbon, and a second layer of carbon is disposed on the second layer comprising titanium.

Abstract: The present invention relates to an arc deposition source, comprising an electrically conductive ceramic target plate (1), on the back of which a cooling plate (10) is provided, wherein a shield (3) is provided in the central area on the surface to be coated so that the cathode spot of the arc does not reach the central area (6) of the surface during operation of the deposition source.