Vacuum Arc Discharge Coating Patents (Class 204/298.41)
  • Patent number: 9583304
    Abstract: A processing apparatus for processing a substrate in a vacuum processing space in a chamber includes a shield arranged in the chamber, and a holding portion configured to hold the shield by a magnetic force. The holding portion has a holding surface on which a first magnet is arranged. The shield includes a second magnet configured to generate an attraction force with respect to the first magnet, and a receiving portion configured to receive a tool configured to move the shield with respect to the holding portion.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: February 28, 2017
    Assignee: CANON ANELVA CORPORATION
    Inventor: Yasushi Yasumatsu
  • Patent number: 9412569
    Abstract: A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: August 9, 2016
    Assignee: VAPOR TECHNOLOGIES, INC.
    Inventors: Vladimir Gorokhovsky, William Grant, Edward W. Taylor, David Humenik, Klaus Brondum
  • Patent number: 9257263
    Abstract: The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors (62, 64, 66, 68) disposed along the short sides (32c, 32d) of a rectangular target (32) behind the target, and a magnetic focusing system disposed along the long sides (32a, 32b) of the target (32) in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides (32a, 32b) of the target (32). The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor (62, 64, 66, 68) can be controlled independently. In a further embodiment, electrically independent steering conductors (62, 64, 66, 68) are disposed along opposite long sides (32a, 32b) of the cathode plate (32), and by selectively varying a current through one conductor, the path of the arc spot shifts to widen the erosion corridor.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: February 9, 2016
    Assignee: Nano-Product Engineering, LLC
    Inventor: Vladimir Gorokhovsky
  • Patent number: 9153422
    Abstract: The invention relates to a method and an apparatus for applying metallic, ceramic or composite thin film coatings onto parts, components and tools (e.g. gas turbine engine compressor blades or cutting tools) by a cathodic arc deposition technique. The method and the apparatus allows for a continually changing structure of the applied film by nanoimplanting atoms, molecules, compounds or other chemical species and structures of different materials thus coating a substrate during a single process. Furthermore, during the same process it allows for creating a coating with specific parameters as required. For instance: hardness, smoothness, corrosion resistance, erosion resistance.
    Type: Grant
    Filed: August 1, 2012
    Date of Patent: October 6, 2015
    Assignee: EnvAeroSpace, Inc.
    Inventors: Mariusz Warzyszynski, Jonathan Webster
  • Patent number: 9127354
    Abstract: Vacuum deposition apparatus including cathodic arc source for application of coatings on the substrate. Cathodic arc source comprises focusing magnetic source for generating magnetic field, arc cathode containing film forming material and anode. The focusing magnetic source is placed between arc cathode and substrate. Arc spot generated on the cathode evaporation surface is kept by the magnetic field lines in the place where the magnetic field lines are perpendicular to the cathode surface.
    Type: Grant
    Filed: November 30, 2012
    Date of Patent: September 8, 2015
    Assignee: Platit A.S.
    Inventors: Mojmir Jilek, Sr., Mojmir Jilek, Jr., Olivier Coddet
  • Publication number: 20150114828
    Abstract: A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior cavity configured to receive the object, an anode positioned within the interior cavity of the vacuum chamber enclosure, and a cathode positioned within the interior cavity of said vacuum chamber enclosure such that a space between the anode and the cathode is at least partially defined by the interior surface of the object. At least a portion of the cathode vaporizes when current is supplied thereto such that vaporized cathode material coats the interior surface of the object.
    Type: Application
    Filed: October 31, 2013
    Publication date: April 30, 2015
    Applicant: General Electric Company
    Inventor: Scott Andrew Weaver
  • Publication number: 20150101925
    Abstract: A system for use in coating an interior surface of an object is provided. The system includes a vacuum chamber enclosure defining an interior configured to receive the object, and a cathode coupled to the vacuum chamber enclosure. The cathode is fabricated from a coating material and has an outer surface. The cathode is configured such that when a current is applied to the cathode, an arc is formed on the outer surface and the coating material is removed from the cathode to form a cloud of coating material. The system also includes a collimator configured to be positioned between the cathode and the object configured to focus the cloud into a beam of coating material and to direct the beam towards the object, and a magnet configured to alter a path of the beam such that the beam is directed towards the interior surface of the object.
    Type: Application
    Filed: October 16, 2013
    Publication date: April 16, 2015
    Applicant: General Electric Company
    Inventors: Scott Andrew Weaver, Dennis Michael Gray
  • Patent number: 8999122
    Abstract: Electrically charged droplets and neutral droplets mixed with plasma are removed with better efficiency, and an improvement in the surface treatment precision of film formation by high purity plasma is sought. In a plasma processing apparatus including plasma generating portion A, plasma transport tube B and plasma processing portion C, an insulator interposed plasma processing apparatus is constituted in which plasma transport tube B is made electrically independent from plasma generating portion A and plasma processing portion C electrically by interposing insulator IS and insulator IF between the starting end side and the finishing end side of the plasma transport tube. Plasma transport tube B is divided into multiple small transport tubes B01, B23 through intermediate insulator II1, and each small transport tube is made independent electrically.
    Type: Grant
    Filed: February 10, 2010
    Date of Patent: April 7, 2015
    Assignee: Ferrotec Corporation
    Inventor: Yuichi Shiina
  • Publication number: 20150083586
    Abstract: A deposition apparatus comprises a source unit having a function of generating a plasma by an arc discharge; and a filter unit configured to transport the plasma generated by the source unit toward a material to be deposited, wherein the filter unit includes a duct configured to transport the plasma, a magnetic field formation unit configured to form, in the duct, a magnetic field for transporting the plasma, and a magnetic field bending unit configured to generate a magnetic force for bending the magnetic field formed by the magnetic field formation unit.
    Type: Application
    Filed: September 12, 2014
    Publication date: March 26, 2015
    Applicant: CANON ANELVA CORPORATION
    Inventors: Teruaki ONO, Masahiro SHIBAMOTO
  • Patent number: 8973526
    Abstract: A plasma deposition apparatus includes a cathode assembly including a cathode disk and a water-coolable cathode holder supporting the cathode disk, an anode assembly including a water-coolable anode holder, a substrate mounted on the anode holder to serve as an anode, and a substrate holder mounting and supporting the substrate, and a reactor for applying a potential difference between opposing surfaces of the cathode assembly and the anode assembly under a vacuum state to form plasma of a raw gas. The cathode disk comes into thermal contact with the cathode holder using at least one of a self weight and a vacuum absorption force so as to permit thermal expansion of the cathode disk.
    Type: Grant
    Filed: December 10, 2007
    Date of Patent: March 10, 2015
    Assignee: Korea Institute of Science and Technology
    Inventors: Wook Seong Lee, Young Joon BaiK, Jong-Keuk Park, Gyu Weon Hwang, Jeung-hyun Jeong
  • Patent number: 8968529
    Abstract: A production method combining cathode arc and magnetron sputtering methods to form an antibacterial film on the surface of an object. Inside the vacuum chamber, both a cathode arc target source and a magnetron sputtering target source are configured. On the cathode arc target source, at least one of a zirconium, titanium, or chromium target is installed. On the magnetron sputtering target source, a silver target is installed. Argon and nitrogen are filled into the vacuum chamber to respectively ionize the silver target and one of the zirconium target, titanium target, or chromium target. Remote control is used to adjust the ionization proportion between one of the zirconium, titanium, or chromium target and the silver target to be 90-99%:1-9%. The surface of the object is formed with one of the zirconium nitride-silver mixed antibacterial film, titanium nitride-silver mixed antibacterial film, or chromium nitride-silver mixed antibacterial film.
    Type: Grant
    Filed: March 29, 2012
    Date of Patent: March 3, 2015
    Assignee: Ever Brite Technology Products Inc.
    Inventor: Ming-Hsien Chao
  • Patent number: 8968528
    Abstract: A process for coating a part comprises the steps of providing a chamber which is electrically connected as an anode, placing the part to be coated in the chamber, providing a cathode formed from a coating material to be deposited and platinum, and applying a current to the anode and the cathode to deposit the coating material and the platinum on the part.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: March 3, 2015
    Assignee: United Technologies Corporation
    Inventors: Brian S. Tryon, Michael J. Maloney, David A. Litton
  • Publication number: 20140291149
    Abstract: An anode unit is connected with an arc power supply having a positive terminal. The unit includes—an anode with an inlet,—a focusing coil encircling the anode, generating a focusing magnetic field,—a deflection coil being a conductive cooled pipe within an electro-conductive shell mounted in the anode, generating a deflection field opposite to the focusing one, having a distal butt end distal to the inlet and a proximal butt end proximal thereto, and a beginning turn,—a deflection permanent magnet inside the deflection coil facing the proximal end, generating a permanent deflection field, and—an additional permanent magnet inside the deflection coil facing the distal end, generating an additional magnetic field opposite to the permanent deflection one. The positive terminal is connected to the anode through the focusing coil and to the shell through the deflection coil. The beginning turn has a thermal contact with the shell.
    Type: Application
    Filed: April 11, 2012
    Publication date: October 2, 2014
    Inventors: Volodymyr Vasilievich Vasyliev, Volodymyr Evgenievich Strelnytskiy
  • Publication number: 20140251791
    Abstract: A stinger for a cathodic arc vapor deposition system includes a head with a reduced area contact interface.
    Type: Application
    Filed: March 4, 2014
    Publication date: September 11, 2014
    Applicant: United Technologies Corporation
    Inventor: Albert Rabinovich
  • Publication number: 20140251803
    Abstract: A mask assembly for a coating system includes a second mask that mounts to a first mask and is retained thereto by a pin. A method of masking a component for a cathodic arc vapor deposition system includes retaining a first mask to a second mask with a platter mount pin.
    Type: Application
    Filed: March 6, 2014
    Publication date: September 11, 2014
    Applicant: United Technologies Corporation
    Inventor: Ronald R. Soucy
  • Patent number: 8828499
    Abstract: The invention relates to a method for using a target for a coating process of metal oxide and/or metal nitride coatings by means of spark evaporation, wherein the target can be operated at a temperature that is higher than the melting point of the metal used in the target, and wherein the target is comprised of a metal whose oxides and/or nitrides are not electrically conducting. The invention further relates to the use of a target for producing metal oxide coatings and/or metal nitride coatings by means of spark evaporation, wherein the target has a matrix comprised of a metal, in which matrix non electrically conducting oxides and/or nitrides of the metal are embedded.
    Type: Grant
    Filed: August 10, 2009
    Date of Patent: September 9, 2014
    Assignee: Oerlikon Trading AG, Truebbach
    Inventors: Denis Kurapov, Markus Lechthaler
  • Publication number: 20140174920
    Abstract: Evaporation source, in particular for use in a sputtering process or in a vacuum arc evaporation process, preferably a cathode vacuum arc evaporation process. The evaporation source includes an inner base body which is arranged in an outer carrier body and which is arranged with respect to the outer carrier body such that a cooling space in flow communication with an inlet and an outlet is formed between the base body and the carrier body. In accordance with the invention, the cooling space includes an inflow space and an outflow space, and the inflow space is in flow communication with the outflow space via an overflow connection for the cooling of the evaporation source such that a cooling fluid can be conveyed from the inlet via the inflow space the overflow connection and the outflow space to the outlet.
    Type: Application
    Filed: January 24, 2014
    Publication date: June 26, 2014
    Applicant: SULZER METAPLAS GMBH
    Inventors: Joerg VETTER, Stefan ESSER, Juergen MUELLER, Georg ERKENS
  • Patent number: 8758580
    Abstract: A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least one substrate mounted to a surface of the drum. The surface alternately passes through the metallization zone and passes through the reaction zone. A target is sputtered in the metallization zone to create a film on the at least one substrate. The film on the at least one substrate is reacted in the reaction zone.
    Type: Grant
    Filed: August 17, 2011
    Date of Patent: June 24, 2014
    Assignee: Vaeco Inc.
    Inventor: Richard DeVito
  • Publication number: 20140147221
    Abstract: A target for the deposition of mixed crystal layers with at least two different metals on a substrate by means of arc vapor deposition (arc PVD), wherein the target includes at least two different metals. To produce mixed crystal layers which are as free as possible of macroparticles (droplets) according to the invention at least the metal with the lowest melting point is present in the target in a ceramic compound, namely as a metal oxide, metal carbide, metal nitride, metal carbonitride, metal oxynitride, metal oxycarbide, metal oxycarbonitride, metal boride, metal boronitride, metal borocarbide, metal borocarbonitride, metal borooxynitride, metal borooxocarbide, metal borooxocarbonitride, metal oxoboronitride, metal silicate or mixture thereof, and at least one metal different from the metal with the lowest melting point is present in the target in elemental (metallic) form.
    Type: Application
    Filed: October 18, 2011
    Publication date: May 29, 2014
    Applicant: WALTER AG
    Inventor: Veit Schier
  • Publication number: 20140076718
    Abstract: A coating system includes a vacuum chamber and a coating assembly positioned within the vacuum chamber. The coating assembly includes a vapor source that provides material to be coated onto a substrate, a substrate holder to hold substrates to be coated such that the substrates are positioned in front of the vapor source, a cathode chamber assembly, and a remote anode. The cathode chamber assembly includes a cathode, an optional primary anode and a shield which isolates the cathode from the vacuum chamber. The shield defines openings for transmitting an electron emission current from the cathode into the vacuum chamber. The vapor source is positioned between the cathode and the remote anode while the remote anode is coupled to the cathode.
    Type: Application
    Filed: September 14, 2012
    Publication date: March 20, 2014
    Applicant: VAPOR TECHNOLOGIES, INC.
    Inventors: Vladimir Gorokhovsky, William Grant, Edward W. Taylor, David Humenik, Klaus Brondum
  • Patent number: 8663441
    Abstract: A vacuum coating apparatus is disclosed. The apparatus includes a cathode target, a plurality of anodes, a transiting device, a pulsed arc discharge device, and a pulsed laser device. The plurality of anodes is placed on the transiting device and successively passes though a working position by the transiting device. The pulsed arc discharge device is electrically connected to the cathode target and the anode at the operable position to form plasma in a vacuum chamber for film coating. The pulsed laser device is located outside of the vacuum chamber and provides a pulsed laser beam onto the surface of the cathode surface to serve as a plasma trigger. A coating method for the vacuum coating apparatus is also disclosed.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: March 4, 2014
    Assignee: Industrial Technology Research Institute
    Inventors: Jin-Bao Wu, Chao-Ying Chen, Chin-Te Shih, Ming-Sheng Leu
  • Patent number: 8658010
    Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.
    Type: Grant
    Filed: January 28, 2010
    Date of Patent: February 25, 2014
    Assignee: G & H Technologies, LLC
    Inventor: Vladimir Gorokhovsky
  • Publication number: 20140048209
    Abstract: The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target.
    Type: Application
    Filed: August 9, 2013
    Publication date: February 20, 2014
    Applicant: OERLIKON TRADING AG, TRUBBACH
    Inventors: Siegfried Krassnitzer, Oliver Gstoehl, Juerg Hagmann
  • Publication number: 20140034484
    Abstract: A method and apparatus for depositing a metal onto a substrate using a cathodic arc plasma source as a source of metal ions. A plasma deposition apparatus has a vacuum chamber; and a conduit within the vacuum chamber having an input end and an output end. A substrate is within the vacuum chamber, positioned to receive a plasma at the output end of the conduit. A cathodic arc plasma source within the vacuum chamber is positioned to inject a composition comprising a mixture of a plasma and electrons into the input end of the conduit toward the output end of the conduit. A magnetic field generator establishes a magnetic field within the conduit a plurality of electrodes located within the magnetic field and an electric field generator establishes an electric field within the conduit. The apparatus reduces or eliminates liquid metal droplets emitted from such a plasma source.
    Type: Application
    Filed: July 31, 2012
    Publication date: February 6, 2014
    Inventors: Andrew E. Fisk, Vasyliy I. Maslov, Alexey A. Goncharov
  • Patent number: 8632848
    Abstract: A surface coating method for an orthodontic corrective bracket is provided, in which each orthodontic bracket formed of ceramic is covered with a titanium coating layer having a predetermined thickness so as to be able to minimize a frictional force and to increase surface hardness and durability while a wire fitted into slots of the brackets applies orthodontic tension to teeth. Accordingly, when the teeth are corrected using the ceramic orthodontic brackets on whose surfaces the titanium coating layer having a predetermined thickness is formed, the frictional force can be minimized while the wire fitted into the slots of the brackets is applying the orthodontic tension to the teeth, and thus it is possible to realize a tooth movement path desired by an orthodontist and to shorten a treatment period.
    Type: Grant
    Filed: July 19, 2010
    Date of Patent: January 21, 2014
    Assignee: Hubit Co., Ltd.
    Inventor: Woo Seok Shin
  • Patent number: 8628647
    Abstract: An arrangement for the separation of particles from plasma for the formation of a coating onto the surface of a substrate under vacuum conditions. The plasma is advantageously formed by electrical arc discharge. The plasma is formed from a target that can be connected as a cathode and positive charge carriers of the plasma are accelerated in the direction of a surface of a substrate to be coated by at least one absorber electrode connected to an electrical potential that is positive with respect to the plasma. The absorber electrode is arranged and orientated such that a direct incidence of plasma onto the absorber electrode is avoided and can be designed in plate form aligned at an obliquely inclined angle which takes account of the divergence of the plasma flow. In addition, at least one permanent magnet or electromagnet element is a component of the arrangement.
    Type: Grant
    Filed: February 22, 2007
    Date of Patent: January 14, 2014
    Assignee: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.
    Inventor: Carl-Friedrich Meyer
  • Patent number: 8623182
    Abstract: A continuous vacuum sputtering method includes the steps of providing a substrate; providing a continuous vacuum sputtering machine comprising a depositing chamber. The depositing chamber comprising at least one vacuum chamber, each vacuum chamber having a cathodic arc emitting source located therein; the substrate being loaded in the continuous vacuum sputtering machine; depositing a coating on the substrate by cathodic arc deposition using the cathodic arc emitting source.
    Type: Grant
    Filed: April 29, 2011
    Date of Patent: January 7, 2014
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventors: Hsin-Pei Chang, Wen-Rong Chen, Huann-Wu Chiang, Lone-Wen Tai, Cheng-Shi Chen
  • Publication number: 20130327642
    Abstract: An arc evaporation source (101) according to one embodiment of the present invention comprises: a ring-shaped circumferential magnet (103) which is so arranged as to surround the outer circumference of a target (102) along a direction in which the direction of magnetization becomes parallel with the front surface of the target; and a rear surface magnet (104) which is arranged on the rear surface side of the target (102) along a direction in which the direction of magnetization becomes perpendicular to the front surface of the target. The magnetic pole of the circumferential magnet (103) on the inner side in the radial direction and the magnetic pole of the rear surface magnet (104) on the target (102) side have the same polarity as each other.
    Type: Application
    Filed: February 23, 2012
    Publication date: December 12, 2013
    Applicant: Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
    Inventors: Shinichi Tanifuji, Kenji Yamamoto
  • Publication number: 20130327637
    Abstract: A system and method for producing graphene includes a heating block, substrate, motor and collection device. The substrate is arranged about the heating block and is configured to receive heat from the heating block. A motor is connected to the substrate to rotate the substrate about the heating block. A cathode and anode are configured to direct a flux stream for deposit onto the rotating substrate. A collection device removes the deposited material from the rotating substrate. A heating element is embedded in the heating block and imparts heat to the heating block. The heating block is made of cement or other material that uniformly disperses the heat from the heating element throughout the heating block. The flux stream can be a carbon vapor, with the deposited flux being graphene.
    Type: Application
    Filed: June 5, 2013
    Publication date: December 12, 2013
    Applicant: The George Washington University
    Inventors: Michael KEIDAR, Alexey SHASHURIN
  • Patent number: 8568572
    Abstract: A method and apparatus are described for very low pressure high powered magnetron sputtering of a coating onto a substrate. By the method of this invention, both substrate and coating target material are placed into an evacuable chamber, and the chamber pumped to vacuum. Thereafter a series of high impulse voltage pulses are applied to the target. Nearly simultaneously with each pulse, in one embodiment, a small cathodic arc source of the same material as the target is pulsed, triggering a plasma plume proximate to the surface of the target to thereby initiate the magnetron sputtering process. In another embodiment the plasma plume is generated using a pulsed laser aimed to strike an ablation target material positioned near the magnetron target surface.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: October 29, 2013
    Assignee: The Regents of the University of California
    Inventors: Andre Anders, Joakim Andersson
  • Patent number: 8562800
    Abstract: A plasma processing apparatus using a plasma generating apparatus by which droplets mixed in plasma can be efficiently removed and surface processing precision can be improved in film formation wherein high purity plasma is used. A droplet removing portion arranged in a plasma advancing path is composed of a straight plasma advancing tube (P0) connected to a plasma generating portion (A); a first plasma advancing tube (P1) connected to the straight plasma advancing tube (P0) in a bent manner; a second plasma advancing tube (P2) connected to a finishing end of the first plasma advancing tube (P1) by being inclinedly arranged at a predetermined inclination angle with respect to the tube axis of the first plasma advancing tube; and a third plasma advancing tube (P3), which is connected to the finishing end of the second plasma advancing tube (P2) in a bent manner and discharges plasma from a plasma outlet.
    Type: Grant
    Filed: March 25, 2009
    Date of Patent: October 22, 2013
    Assignee: Ferrotec Corporation
    Inventor: Yuichi Shiina
  • Publication number: 20130220800
    Abstract: The present invention relates to an arc deposition source, comprising an electrically conductive ceramic target plate (1), on the back of which a cooling plate (10) is provided, wherein a shield (3) is provided in the central area on the surface to be coated so that the cathode spot of the arc does not reach the central area (6) of the surface during operation of the deposition source.
    Type: Application
    Filed: April 13, 2011
    Publication date: August 29, 2013
    Applicant: OERLIKON TRADING AG, TRUBBACH
    Inventor: Markus Lechthaler
  • Publication number: 20130206585
    Abstract: The present invention relates to a filtered cathodic-arc ion source that reduces, or even eliminates, macroparticles while minimally compromising the compact size, simplicity, and high flux ion production benefits of unfiltered cathodic-arc sources. Magnetic and electrostatic forces are implemented in a compact way to guide ions along curved trajectories between the cathode source and the workpiece area such that macroparticles, which are minimally affected by these forces and travel in straight lines, are inhibited from reaching the workpieces. The present invention implements this filtering technique in a device that is compact, symmetrical and easy to manufacture and operate and which does not substantially compromise coating deposition rate, area, or uniformity.
    Type: Application
    Filed: February 11, 2013
    Publication date: August 15, 2013
    Applicant: FLUXION INC.
    Inventor: FLUXION INC.
  • Publication number: 20130199929
    Abstract: A coating source for physical vapor deposition has at least one component, which has been produced from at least one pulverulent starting material in a powder metallurgy production process and at least one ferromagnetic region embedded in the component. The at least one ferromagnetic region, is introduced into the component and fixedly connected to the component during the powder metallurgy production process.
    Type: Application
    Filed: April 12, 2011
    Publication date: August 8, 2013
    Applicant: PLANSEE SE
    Inventors: Peter Polcik, Conrad Polzer, Matthias Perl, Stefan Schlichtherle, Georg Strauss
  • Patent number: 8500978
    Abstract: A composite coating apparatus includes a main body, two carrying boards, and two actuators. The main body defines a first chamber and a second chamber with a separating board intervening therebetween. The separating board defines a coating opening intercommunicating with the chambers. The carrying boards are received in the first chamber and rotatably connected to the separating board at two sides of the coating opening. Each carrying board defines a receiving groove for holding a substrate. The actuators are configured for driving the carrying boards to rotate between a first coating position, in which the substrate is exposed to the second chamber for a first coating process carried out in the second chamber via the coating opening, and a second coating position, in which the substrate faces away from the separating board for a second coating process carried out in the first chamber.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: August 6, 2013
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventor: Shao-Kai Pei
  • Patent number: 8500967
    Abstract: In a vacuum are evaporation apparatus, to stably maintain vacuum arc discharge at an arc source when depositing a cathode material on a substrate, namely a magnetic recording medium, an ungrounded anode of a coil-type tube is placed inside an are source discharge vacuum chamber. A DC are power supply is connected between the cathode and the anode to cause an are current to flow in the anode to generate a first magnetic field in one direction, from the cathode toward the anode. A second magnetic field is generated in the opposite direction, from the anode to the cathode by feeding a specified current to an external coil positioned around the discharge chamber. The external coil includes an around-cathode coil and an around-anode coil. The arc discharge can be started by operating a striker to carry out the deposition.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: August 6, 2013
    Assignee: Fuji Electric Co., Ltd.
    Inventor: Naruhisa Nagata
  • Patent number: 8500977
    Abstract: A coating apparatus includes a housing, a sputter mechanism, an evaporation mechanism, and a workpiece transport assembly. The housing defines a receiving space. The workpiece transport assembly includes a fixing plate, a first transport member, and a first shaft. The fixing plate is secured to the housing via the receiving space and divides the receiving space into a sputter chamber and an evaporation chamber. The sputter mechanism is mounted in the sputter chamber, and the evaporation mechanism is mounted in the evaporation chamber. The fixing plate defines a through hole. The sputter chamber communicates with the evaporation chamber via the through hole. The first transport member is configured to transport at least one workpiece. The first shaft is secured to the first transport member and rotatably mounted to the housing.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: August 6, 2013
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventor: Shao-Kai Pei
  • Publication number: 20130192759
    Abstract: A plasma processing device according to the present invention includes a plasma processing chamber, a plasma producing chamber communicating with the plasma processing chamber, a radio-frequency antenna for producing plasma, a plasma control plate for controlling the energy of electrons in the plasma, as well as an operation rod and a moving mechanism for regulating the position of the plasma control plate. In this plasma processing device, the energy distribution of the electrons of the plasma produced in the plasma producing chamber can be controlled by regulating the distance between the radio-frequency antenna 16 and the plasma control plate by simply moving the operation rod in its longitudinal direction by the moving mechanism. Therefore, a plasma process suitable for the kind of gas molecules to be dissociated and/or their dissociation energy can be easily performed.
    Type: Application
    Filed: August 2, 2011
    Publication date: August 1, 2013
    Applicants: EMD CORPORATION, OSAKA UNIVERSITY
    Inventors: Yuichi Setsuhara, Akinori Ebe
  • Patent number: 8496793
    Abstract: Vacuum treatment installation or vacuum treatment method for carrying out a plasma method, wherein the treatment is carried out in a vacuum chamber, in which are disposed a device for generating an electric low voltage arc discharge (NVBE) comprised of a cathode and an anode electrically interconnectable with the cathode via an arc generator, and a workpiece carrier electrically interconnectable with a bias generator for receiving and moving workpieces, as well as at least one feed for inert and/or reactive gas. At least a portion of the surface of the anode is therein fabricated of graphite and is operated at high temperature.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: July 30, 2013
    Assignee: Oerlikon Trading AG, Trubbach
    Inventors: Jüergen Ramm, Beno Widrig, Stephan Kasemann, Marcelo Dornelles Pimenta, Orlaw Massler, Barbara Hanselmann
  • Publication number: 20130180845
    Abstract: A filter for filtering macro-particles from a plasma beam, having a bended duct for carriage of the plasma beam, the bended duct comprising an intermediate portion connected at one end to an inlet portion having a longitudinal axis disposed on an inlet plane and at another opposite end to an outlet portion having a longitudinal axis disposed on an outlet plane. The inlet portion allows the plasma beam containing macro-particles to travel toward the intermediate portion in an incident direction and the outlet portion allows the plasma beam to travel from the intermediate portion in an emergent direction. The intermediate portion is configured to deviate the incident direction to the emergent direction at an angle of more than 90° and thereby remove macro-particles from the plasma beam as it passes through the intermediate portion. The inlet plane and outlet plane are disposed at an offset angle from each other.
    Type: Application
    Filed: September 30, 2011
    Publication date: July 18, 2013
    Applicant: Nanofilm Technologies International Pte Ltd
    Inventors: Xu Shi, Hao Wei
  • Publication number: 20130146445
    Abstract: The invention relates to a process and an evaporator for coating a substrate by means of an arc in a vacuum chamber (10) in the case of low-pressure arc evaporation, wherein the vacuum chamber (10) has at least one evaporator, which comprises a target material (20), reactive gas supply lines (53, 54) for supplying reactive gas, and a vacuum pump, wherein the evaporator comprising the target material (20) serves as the cathode and the inner wall (36) of the vacuum chamber (10) serves as the anode between which the arc is generated. According to the invention, high-melting point metal is used as the target material (20) for catalysis, and the pressure in the vacuum chamber (20) during coating is at least 0.5 Pa, in particular at least 3 Pa, preferably 5 Pa. A layer of catalytically active metal having a high oxygen content is formed on the substrate.
    Type: Application
    Filed: July 12, 2011
    Publication date: June 13, 2013
    Applicants: HOEDTKE GMBH & CO. KG, DREISTEGEN GMBH
    Inventor: Oliver Kayser
  • Publication number: 20130146454
    Abstract: A method of forming targets for cathodic arc deposition of alloy bond coats for turbine engines components consists of melting a base alloy containing aluminum and other metals, adding grain boundary strengthening alloy additions, and casting the melt to form a cylindrical billet that is subsequently sectioned into puck shaped targets. The grain boundary strengthening additions minimize intergranular fracture of the targets during high current operation of the arc coating process.
    Type: Application
    Filed: December 9, 2011
    Publication date: June 13, 2013
    Applicant: UNITED TECHNOLOGIES CORPORATION
    Inventors: Reade R. Clemens, Neil B. Ridgeway
  • Publication number: 20130126348
    Abstract: The present invention relates to a target for an ARC source having a first body (3) of a material to be vaporized, which essentially comprises in one plane a surface which is intended to be vaporized, wherein the surface surrounds in this plane a central area, characterized in that in the central area a second body (7) is provided, which is preferably in the form of a disk and is electrically isolated from the first body (3), in such a way that the second body (7) can essentially provide no electrons for maintaining a spark.
    Type: Application
    Filed: January 10, 2011
    Publication date: May 23, 2013
    Applicant: OERLIKON TRADING AG, TRUBBACH
    Inventors: Siegfried Krassnitzer, Juerg Hagmann
  • Publication number: 20130062195
    Abstract: A catalyst free process for manufacturing carbon nanotubes by inducing an arc discharge from a vein graphite anode and a vein graphite cathode in an inert gas atmosphere contained in a closed vessel. The process is carried out at atmospheric pressure in the absence of external cooling mechanism for the carbon cathode or the carbon anode.
    Type: Application
    Filed: August 21, 2012
    Publication date: March 14, 2013
    Applicant: Sri Lanka Institute of Nanotechnology (PVT) Ltd.
    Inventors: Lilantha Samaranayake, Nilwala Kottegoda, Asurasinghe R. Kumarasinghe, Ajith De Alwis, Sunanda Gunasekara, Sameera Nanayakkara, Veranja Karunaratne
  • Publication number: 20130032469
    Abstract: The invention relates to a method and an apparatus for applying metallic, ceramic or composite thin film coatings onto parts, components and tools (e.g. gas turbine engine compressor blades or cutting tools) by a cathodic arc deposition technique. The method and the apparatus allows for a continually changing structure of the applied film by nanoimplanting atoms, molecules, compounds or other chemical species and structures of different materials thus coating a substrate during a single process. Furthermore, during the same process it allows for creating a coating with specific parameters as required. For instance: hardness, smoothness, corrosion resistance, erosion resistance.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 7, 2013
    Applicant: ENVAEROSPACE, INC.
    Inventor: Jonathan Webster
  • Patent number: 8337682
    Abstract: An arc plasma source 101 for evaporating a cathode material of a cathode 22 by arc discharge controlled by a magnetic field, comprising a magnetic field forming mechanism 42 arranged outside the cathode for forming a magnetic field M in parallel to the center axis of the cathode near an evaporation surface 22a; a supporting mechanism 26 for supporting the cathode; a cooling mechanism 61 for cooling the cathode; and a tapered ring 64 being truncated cone shaped and having a through-hole into which the cathode penetrates along the axial direction of the through-hole, the tapered ring being arranged to be tapered toward the evaporation surface of the cathode; wherein the tapered ring is made of a ferromagnetic material and the front end of the tapered ring is positioned coplanar with the evaporation surface of the cathode or is positioned posterior to the evaporation surface in use.
    Type: Grant
    Filed: February 15, 2008
    Date of Patent: December 25, 2012
    Assignees: Kabushiki Kaisha Riken, Nissin Electric Co., Ltd.
    Inventors: Kazuya Nishimura, Katsuhiro Tsuji
  • Patent number: 8282794
    Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.
    Type: Grant
    Filed: January 28, 2010
    Date of Patent: October 9, 2012
    Assignee: G & H Technologies, LLC
    Inventor: Vladimir Gorokhovsky
  • Publication number: 20120205243
    Abstract: Provided is a power supply apparatus which can effectively restrict the current rise at the time of occurrence of arc discharge that is directly related to the occurrence of splashes or particles, and which is also capable of preventing the discharge voltage from getting excessive at the time of finishing the arc processing. The power supply apparatus has: a DC power supply unit which applies a DC voltage to a target which comes into contact with a plasma; and an arc processing unit which can detect arc discharge generated in the electrode by positive and negative outputs from the DC power supply unit, and also which can perform arc discharge suppression processing. An output characteristics switching circuit switches the outputs such that the output to the electrode has constant-current characteristics and that the output to the electrode has constant-voltage characteristics by the time of completion of the arc suppressing processing.
    Type: Application
    Filed: November 12, 2010
    Publication date: August 16, 2012
    Inventors: Shinobu Matsubara, Yoshikuni Horishita, Atsushi Ono
  • Patent number: 8241468
    Abstract: A method for applying a coating by a cathodic is provided. The method includes the steps of: a) providing a cathodic arc coater that includes a power source and utilizes a disk-shaped cathode, the cathode having an evaporative surface extending between a first end surface and a second end surface, wherein the evaporative surface has an area; b) determining a maximum acceptable power density for the evaporative surface; and c) applying a magnitude of electrical current from the power source to the cathode, wherein the electrical current magnitude divided by the area is equal to or less than the maximum acceptable power density for the evaporative surface.
    Type: Grant
    Filed: December 13, 2004
    Date of Patent: August 14, 2012
    Assignee: United Technologies Corporation
    Inventors: Russell A. Beers, Asumini Kasule, Kevin Lee Collins
  • Publication number: 20120160166
    Abstract: A method and apparatus for forming a thermal barrier coating system in communication with at least a portion of at least one substrate. The method includes: depositing a first bond coat on at least a portion of at least one substrate; depositing a first thermal barrier coat disposed on the bond coat; whereby the deposition occurs in one or more chambers to form the thermal barrier coating system; and wherein the deposition of the first bond coat (or subsequent bond coats) and the deposition of the first thermal barrier coat (or subsequent thermal barrier coats) is performed without out-of chamber handling of the thermal barrier coating system.
    Type: Application
    Filed: December 25, 2011
    Publication date: June 28, 2012
    Applicant: University of Virginia Patent Foundation
    Inventors: Derek D. Hass, Haydn N.G. Wadley