Abstract: The invention relates to a process and an evaporator for coating a substrate by means of an arc in a vacuum chamber (10) in the case of low-pressure arc evaporation, wherein the vacuum chamber (10) has at least one evaporator, which comprises a target material (20), reactive gas supply lines (53, 54) for supplying reactive gas, and a vacuum pump, wherein the evaporator comprising the target material (20) serves as the cathode and the inner wall (36) of the vacuum chamber (10) serves as the anode between which the arc is generated. According to the invention, high-melting point metal is used as the target material (20) for catalysis, and the pressure in the vacuum chamber (20) during coating is at least 0.5 Pa, in particular at least 3 Pa, preferably 5 Pa. A layer of catalytically active metal having a high oxygen content is formed on the substrate.

Abstract: The present invention relates to a target for an ARC source having a first body (3) of a material to be vaporized, which essentially comprises in one plane a surface which is intended to be vaporized, wherein the surface surrounds in this plane a central area, characterized in that in the central area a second body (7) is provided, which is preferably in the form of a disk and is electrically isolated from the first body (3), in such a way that the second body (7) can essentially provide no electrons for maintaining a spark.

Abstract: A catalyst free process for manufacturing carbon nanotubes by inducing an arc discharge from a vein graphite anode and a vein graphite cathode in an inert gas atmosphere contained in a closed vessel. The process is carried out at atmospheric pressure in the absence of external cooling mechanism for the carbon cathode or the carbon anode.

Abstract: The invention relates to a method and an apparatus for applying metallic, ceramic or composite thin film coatings onto parts, components and tools (e.g. gas turbine engine compressor blades or cutting tools) by a cathodic arc deposition technique. The method and the apparatus allows for a continually changing structure of the applied film by nanoimplanting atoms, molecules, compounds or other chemical species and structures of different materials thus coating a substrate during a single process. Furthermore, during the same process it allows for creating a coating with specific parameters as required. For instance: hardness, smoothness, corrosion resistance, erosion resistance.

Abstract: An arc plasma source 101 for evaporating a cathode material of a cathode 22 by arc discharge controlled by a magnetic field, comprising a magnetic field forming mechanism 42 arranged outside the cathode for forming a magnetic field M in parallel to the center axis of the cathode near an evaporation surface 22a; a supporting mechanism 26 for supporting the cathode; a cooling mechanism 61 for cooling the cathode; and a tapered ring 64 being truncated cone shaped and having a through-hole into which the cathode penetrates along the axial direction of the through-hole, the tapered ring being arranged to be tapered toward the evaporation surface of the cathode; wherein the tapered ring is made of a ferromagnetic material and the front end of the tapered ring is positioned coplanar with the evaporation surface of the cathode or is positioned posterior to the evaporation surface in use.

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.

Abstract: Provided is a power supply apparatus which can effectively restrict the current rise at the time of occurrence of arc discharge that is directly related to the occurrence of splashes or particles, and which is also capable of preventing the discharge voltage from getting excessive at the time of finishing the arc processing. The power supply apparatus has: a DC power supply unit which applies a DC voltage to a target which comes into contact with a plasma; and an arc processing unit which can detect arc discharge generated in the electrode by positive and negative outputs from the DC power supply unit, and also which can perform arc discharge suppression processing. An output characteristics switching circuit switches the outputs such that the output to the electrode has constant-current characteristics and that the output to the electrode has constant-voltage characteristics by the time of completion of the arc suppressing processing.

Abstract: A method for applying a coating by a cathodic is provided. The method includes the steps of: a) providing a cathodic arc coater that includes a power source and utilizes a disk-shaped cathode, the cathode having an evaporative surface extending between a first end surface and a second end surface, wherein the evaporative surface has an area; b) determining a maximum acceptable power density for the evaporative surface; and c) applying a magnitude of electrical current from the power source to the cathode, wherein the electrical current magnitude divided by the area is equal to or less than the maximum acceptable power density for the evaporative surface.

Abstract: A method and apparatus for forming a thermal barrier coating system in communication with at least a portion of at least one substrate. The method includes: depositing a first bond coat on at least a portion of at least one substrate; depositing a first thermal barrier coat disposed on the bond coat; whereby the deposition occurs in one or more chambers to form the thermal barrier coating system; and wherein the deposition of the first bond coat (or subsequent bond coats) and the deposition of the first thermal barrier coat (or subsequent thermal barrier coats) is performed without out-of chamber handling of the thermal barrier coating system.

Abstract: The present invention relates to a method for applying hexagonal boron nitride to a rough surface, wherein it is intended for the boron nitride to be provided as a temperature-resistant lubricant of the surface. According to the invention, a pin composed of hexagonal boron nitride is rubbed with pressure over the rough surface, such that abraded boron nitride adheres to the surface.

Abstract: A method for producing a low-conductivity layer on at least one workpiece by vacuum coating is provided. The method includes operating an electrical arc discharge between an anode and a cathode of an arc source in an atmosphere containing a reactive gas. A small external magnetic field is generated to be essentially perpendicular to a target surface of a target, which is electrically connected to the cathode, to assist an evaporation process. A degree of recoating of the target surface by other coating sources in a vacuum coating installation is less than 10%, and the magnetic field is generated by a magnet system with an axially-polarized coil having a geometry similar in size to that of the target. Excitation current for the electrical arc discharge is supplied through the axially-polarized coil.

Abstract: A method for carbon deposition using a pulsed, plasma-supported vacuum arc discharge, having an anode, a target cathode made of carbon, a pulsed energy source and at least two ignition units. The at least two ignition units are positioned in the edge area of target cathode and each have two planar metallic electrodes and a planar ceramic insulator positioned between the electrodes. The planar shape of ignition units and their positioning on target cathode enables homogeneous utilization of the entire target surface and homogeneous coating of workpieces.

Abstract: Apparatus for cathodic vacuum-arc coating deposition. The apparatus includes a mixing chamber, at least one input duct projecting from a first end wall of the mixing chamber, and an output duct projecting from a second end wall of the mixing chamber. Coupled with each input duct is a plasma source adapted to discharge an ion flow of a coating material into the mixing chamber, which is subsequently directed to the output duct. A first solenoidal coil disposed about a side wall of the mixing chamber creates a first magnetic field inside the mixing chamber for steering the ion flow. A second solenoidal coil is disposed adjacent to the first end wall and aligned substantially coaxially with the output duct. The second solenoidal coil creates a second magnetic field inside the mixing chamber for steering the first ion flow. The electrical currents flow through the first and second solenoidal coils in opposite solenoidal directions.

Abstract: In an arc ion plating method, the target is divided into a central portion and longitudinal end portions at both longitudinal ends of the central portion. A constituent material of the target is evaporated and ionized by vacuum arc discharge using the target as a cathode, wherein the position of an arc spot on a surface of the target is controlled such that the consuming speed of the longitudinal end portions becomes higher than that of the central portion, whereby at least one of the longitudinal end portions will reach its consumption limit before the target central portion reaches its consumption limit. Only the respective longitudinal end portion that has reached its consumption limit is thereafter replaced, and the film forming step is continued.

Abstract: Provided is an arc evaporation source wherein film-forming speed is increased by inducing magnetic lines in the substrate direction. The arc evaporation source is provided with: at least one outer circumferential magnet (3), which is disposed such that the outer circumferential magnet surrounds the outer circumference of a target (2) and that the magnetization direction thereof is in the direction orthogonally intersecting the surface of the target (2); and a rear surface magnet (4) disposed on the rear surface side of the target (2). The rear surface magnet (4) has a non-ring-shaped first permanent magnet (4A) wherein the polarity thereof faces the same direction as the polarity of the outer circumferential magnet (3) and the magnetization direction of the rear surface magnet (4) is in the direction orthogonally intersecting the surface of the target (2).

Abstract: An object of the present invention is to provide a multiply divided anode wall type plasma generation apparatus, wherein a short circuit between the cathode and the anode is not caused even if deposited matter adhering and depositing on the inner wall of the anode by diffusion plasma detach and fall. Also, an object is to provide a plasma processing apparatus using the same. When the plasma (P) generated between the cathode (2) and the anode (3) is ejected forward from the cathode (2) and diffuses, the diffusing material (41) recrystalizes, adheres, and deposits on the inner wall of an electrode cylindrical body, and detaches and falls as a carbon flake (40). The inner wall of the electrode cylindrical body is multiply divided in the shape of a matrix by means of longitudinal and lateral grooves (37, 38).

Abstract: An inner electrode for barrier film formation is an inner electrode for barrier film formation that is inserted inside a plastic container having an opening, supplies a medium gas to the inside of the plastic container, and supplies high frequency power to an outer electrode arranged outside the plastic container, thereby generating discharge plasma on the inner surface of the plastic container to form a barrier film on the inner surface of the plastic container, and that is provided with a gas supply pipe having a gas flow path to supply a medium gas and an insulating member screwed into an end portion of the gas supply pipe to be flush therewith and having a gas outlet communicated with the gas flow path.

Abstract: A puck for providing a coating material in a cathodic arc coating system has a generally uniform depression formed at the outer periphery. The depression ensures that an arc from the coating apparatus will move uniformly about the outer periphery of the puck, such that a coating cloud will also be uniformly applied to parts to be coated.

Abstract: The invention relates to an arc evaporator which comprises at least one anode (4), a cathode (3) and a system for generating a magnetic field comprising a first subsystem consisting of a set of permanent magnets (8, 9) which produces a converging magnetic field component and a second subsystem comprising at least one coil (10) and configured to operate in at least a first operating mode in which it generates a second diverging magnetic field component.

Abstract: The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set.

Abstract: The invention is directed to efficient methods for depositing highly adherent anti-microbial materials onto a wide range of surfaces. A controlled cathodic arc process is described, which results in enhanced adhesion of silver oxide to polymers and other surfaces, such as surfaces of medical devices. Deposition of anti-microbial materials directly onto the substrates is possible in a cost-effective manner that maintains high anti-microbial activity over several weeks when the coated devices are employed in vivo.

Abstract: The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target.

Abstract: Electrically charged droplets and neutral droplets mixed with plasma are removed with better efficiency, and an improvement in the surface treatment precision of film formation by high purity plasma is sought. In a plasma processing apparatus including plasma generating portion A, plasma transport tube B and plasma processing portion C, an insulator interposed type plasma processing apparatus is constituted in which plasma transport tube B is made electrically independent from plasma generating portion A and plasma processing portion C electrically by interposing insulator IS and insulator IF between the starting end side and the finishing end side of the plasma transport tube. Plasma transport tube B is divided into multiple small transport tubes B01, B23 through intermediate insulator II1, and each small transport tube is made independent electrically.

Abstract: This invention relates to a method and apparatus for deposition of a diffused thin film, useful in the fabrication of semiconductors and for the surface DC-Bias coating of various tools. In order to coat the surface of a treatment object, such as semiconductors, various molded products, or various tools, with a thin film, one or more process factors selected from among a bias voltage, a gas quantity, an arc power, and a sputtering power are continuously and variably adjusted, whereby the composition ratio of the thin film which is formed on the surface of the treatment object not through a chemical reaction but through a physical method is continuously varied, thus manufacturing a thin film having high hardness. The composition ratio of the thin film to be deposited is selected depending on the end use thereof, thereby depositing the thin film having superior wear resistance, impact resistance, and heat resistance.

Abstract: A vacuum process system for surface-treating work pieces uses an arc evaporation source. The system has a first electrode connected to a DC power source and a second electrode, disposed separately from the arc evaporation source. The two electrodes are operated while being connected to a single pulsed power supply.

Abstract: A sputtering system aimed for sputtering workpieces that have non-planar surfaces, such as concaves, pillars, and steps of a case of a laptop. The sputtering system comprises a sputtering chamber including a carrier, a first sputtering source, and a second sputtering source. The first sputtering source is located over the carrier main to sputter planar portion of the workpiece. The second sputtering source is inclined at an angle so as to sputter the vertical portion of the workpiece.

Abstract: A method of integrating a fluorine-based dielectric with a metallization scheme is described. The method includes forming a fluorine-based dielectric layer on a substrate, forming a metal-containing layer on the substrate, and adding a buffer layer or modifying a composition of the fluorine-based dielectric layer proximate an interface between the fluorine-based dielectric layer and the metal-containing layer.

Abstract: Provided is a plasma generating apparatus by which droplets mixed in plasma can be efficiently removed and surface processing precision can be improved in film formation wherein high purity plasma is used. A plasma processing apparatus using such plasma generating apparatus is also provided. A droplet removing portion arranged in a plasma advancing path is composed of a straight plasma straightly advancing tube (P0) connected to a plasma generating portion (A); a first plasma advancing tube (P1) connected to the straight plasma straightly advancing tube (P0) in a bent manner; a second plasma advancing tube (P2) connected to a finishing end of the first plasma advancing tube (P1) by being inclinedly arranged at a predetermined inclination angle with respect to the tube axis of the first plasma advancing tube; and a third plasma advancing tube (P3), which is connected to the finishing end of the second plasma advancing tube (P2) in a bent manner and discharges plasma from a plasma outlet.

Abstract: A vacuum treatment system (1) for treating workpieces has a treatment chamber (10) that can be evacuated and in which a low-volt arc-discharge device is placed, with at least one locking loading/unloading aperture and at least one coating source placed on one side wall of the treatment chamber. It also has a device for producing a magnetic field to create a remote magnetic field and at least one workpiece holder to hold workpieces. A target-shutter arrangement (8, 8?) is designed so that when uncovered, the distance between the shutter (8) and the target (12) is less than 35 mm, thus allowing ignition and operation of a magnetron or cathode spark discharge behind the target, but preventing ignition of auxiliary plasma when the target (8) is turned off.

Abstract: The invention relates to a coating comprising a getter metal alloy and to an arrangement and method for the production thereof. The coating therein consists of a non-vaporizing getter metal alloy (2) for an inner wall (3) of a high-vacuum vessel (4). The arrangement basically consists of a metal plasma generator (7), which in turn comprises an insulator member (8), which carries an ignition electrode (9) and a cathode wire (10) comprising a getter metal alloy (2). Those three components are surrounded by a cage-like anode member (13), which together with the insulation member (8) projects into the high vacuum vessel (5) to be coated and is supplied with cathode potential (12), high-voltage ignition pulse (19) and anode potential (14) by a voltage supply device (16), the anode member (13) together with the high-vacuum vessel (4) being held at ground potential.

Abstract: An arc deposition apparatus comprises an evacuatable chamber and means for positioning at least two targets in the chamber, wherein a first one of the at least two targets is positionable in an operative position and another of the at least two targets is positionable in a standby position. An electrical power supply is provided for supplying electrical power to the target held in the operative position to form an arc on an emission surface of the operative target. Means are provided for preparing an emission surface of the target positioned in the standby position to have a predetermined morphology. Alternatively, or in conjunction with the surface preparing means, means are provided for inspecting whether the emission surface of the target positioned in the standby position has a predetermined morphology. Preferably, the positioning means is configured to interchange the at least two targets at a predetermined time.

Abstract: An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.

Abstract: A composite coating device includes first to third processing chambers. The first processing chamber performs an ion beam etching as a pretreatment process in which an ion beam is irradiated on a surface of a magnetic head at a predetermined angle and the surface is removed for a predetermined depth. The second processing chamber performs a magnetron sputter deposition as a shock absorbing coating formation process in which a shock absorbing coating is formed on the pretreated surface. The third processing chamber performs an electron cyclotron resonance plasma chemical vapor epitaxy or a cathode arc discharge deposition as an overcoat formation process in which an overcoat is formed on the shock absorbing coating. A preparation chamber communicates with the first to third processing chambers through opening and closing devices for transferring the magnetic head.

Abstract: Method for producing poorly conductive and in particular nonconductive layers on at least one work piece by means of a vacuum-coating process in which an electric arc discharge is activated between at least one anode and the cathode of an arc source in a reactive-gas atmosphere, whereby on the surface of a target that is electrically connected to the cathode either none or only a small outer magnetic field is generated that extends essentially perpendicular to the target surface for assisting the evaporation process, the degree of recoating of the target surface by other coating sources is less than 10%, and the magnetic field is generated with a magnet system that encompasses at least one axially polarized coil with a geometry similar to the circumference of the target.

Abstract: Disclosure of an electrode arrangement (1) as high voltage electrode for continual plasma treatment or plasma coating of web material with several knife electrodes (3) arranged at a right angle to any transport direction of the web material and essentially located parallely to each other which is characterized by the fact that the distances (a?e) of adjacent knife electrodes (3) vary. In tests it has turned out that a more uniform coating result or, respectively, treatment result can be achieved with such an electrode arrangement than with comparable arrangements in which the knife electrodes are arranged equidistant. Preferably, the distances (a) between adjacent knife electrodes (3) are larger at the edges of the electrode arrangement (1) than the distances (e) between adjacent knife electrodes (3) in its center.

Abstract: This invention relates to a fixture for use in a physical vapor deposition coating operation which comprises a support structure 14 comprising a circular base member 10, a circular top member 11 opposite the circular base member 10, and a plurality of structural members 12 joining said top member 11 to said base member 10; a plurality of panel members 13 aligned in a vertical direction around the outer periphery of said support structure 14 forming a cylinder-like structure; said panel members 13 including a plurality of apertures for holding workpieces 19 and 35 to which a coating is to be applied; and said apertures positioned on said panel members 13 so that said workpieces 19 and 35 are aligned in a staggered vertical direction. This invention also relates to a method for simultaneously coating a plurality of workpieces 19 and 35, such as gas turbine compressor blades and vanes, with erosion resistant coatings using the fixture of this invention.

Abstract: A magnetic guide is presented that controls an electric arc between an anode and a cathode, which may be a target, over the whole cathode surface. The magnetic guide may be included in an arc evaporator and may include a first magnetic system having a group of permanent magnets located on the periphery of the evaporator or target, so that magnetization is perpendicular to the surface of the target. The magnetic guide may also include a second magnetic system that includes an electromagnet located at the rear of the target housed in an electrically insulating body at a distance from the target, with at least one of its magnetic poles parallel to the surface of the target, so that the combined action of the two magnetic systems provides uniform use or consumption of the target.

Abstract: The apparatus includes a coating chamber, two or more cathodes which are arranged peripherally within the coating chamber, substrate carriers for holding the substrate, vacuum pumps and voltage sources wherein an individual anode is arranged centrally between the cathodes in the coating chamber and the substrate is positioned between the anode and the cathode. In each case a gas discharge with a plasma is ignited between the individual anode and the cathodes. The substrates are held fixed in position or are rotated about one or more axes and in the process subjected to the plasma.

Abstract: The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.

Abstract: A vacuum-arc device including: a consumable cathode including a first material having a defined active surface, a refractory anode including a second material, an inter-electrode volume, bounded partially by at least a portion of an inner wall of the cathode and by at least a portion of an inner wall of the anode, wherein at least a portion of the inner walls form a first chamber surrounding the inter-electrode volume, the chamber having at least one opening fluidly communicating between the inter-electrode volume and an a volume outside the chamber; a vacuum chamber, disposed around and communicating with the first chamber; an evacuation mechanism for evacuating the vacuum chamber; wherein the cathode is adapted, and the cathode and the anode are disposed, such that upon evacuating the vacuum chamber using the evacuation mechanism, ignition of an arc discharge between the cathode and the anode, and activation of a high-current power supply, a portion of the first material is liberated from the cathode, trans

Abstract: A vacuum coating apparatus is disclosed. The apparatus includes a cathode target, a plurality of anodes, a transiting device, a pulsed arc discharge device, and a pulsed laser device. The plurality of anodes is placed on the transiting device and successively passes though a working position by the transiting device. The pulsed arc discharge device is electrically connected to the cathode target and the anode at the operable position to form plasma in a vacuum chamber for film coating. The pulsed laser device is located outside of the vacuum chamber and provides a pulsed laser beam onto the surface of the cathode surface to serve as a plasma trigger. A coating method for the vacuum coating apparatus is also disclosed.

Abstract: The invention relates to a vacuum arc vaporisation source (1), including ring-like magnetic field source (2) and a cathode body (3) with an vaporisation material (31) as a cathode (32) for the production of an arc discharge on an vaporisation surface (33) of the cathode (32). In this arrangement the cathode body (3) is bounded in an axial direction in a first axial direction by a cathode base (34) and in a second axial direction by the vaporisation surface (33) and the ring-like magnetic (2) is arranged polarised parallel or anti-parallel and concentric to a surface normal (300) of the vaporisation surface (33). In accordance with the invention a magnetic field enhancement ring (4) is arranged on a side remote from the vaporisation surface (33) at a pre-determinable second spacing (A2) in front of the cathode base (34). The invention further relates to an arc vaporisation chamber (10) with an arc vaporisation source (1).

Abstract: An apparatus for the application of coatings in a vacuum comprising a plasma duct surrounded by a magnetic deflecting system communicating with a first plasma source and a coating chamber in which a substrate holder is arranged off of an optical axis of the plasma source, has at least one deflecting electrode mounted on one or more walls of the plasma duct. In one embodiment an isolated repelling or repelling electrode is positioned in the plasma duct downstream of the deflecting electrode where the tangential component of a deflecting magnetic field is strongest, connected to the positive pole of a current source which allows the isolated electrode current to be varied independently and increased above the level of the anode current. The deflecting electrode may serve as a getter pump to improve pumping efficiency and divert metal ions from the plasma flow.

Abstract: The present invention relates to a cutting tool for metal machining with improved wear properties, comprising a cutting tool substrate of cemented carbide, cermet, ceramics or a super hard material, and a wear resistant coating, wherein the wear resistant coating comprises a PVD Ti—Si—C—N layer, and a method of making thereof.

Abstract: A discharging power supply including a direct current power supply unit, a control unit for controlling an output of the direct current power supply unit, and a vibrating current generation unit having a capacitance connected in parallel with a pair of outputs from the direct current power supply unit and an inductance connected to at least one of the pair of outputs, wherein the control unit controls the direct current power supply unit so that current outputted from the direct current power supply unit does not exceed a limit current value in at least a portion of a range of voltage that can be outputted from the direct current power supply unit. Thus, regardless of whether the discharge power is set to be high or low, discharge current exceeding the limit characteristic line can be prevented from flowing.

Abstract: There is provided a plasma generating apparatus having a plasma gun which can remove droplets mixed with plasma efficiently without reducing the effective amount of plasma generated by vacuum arc discharge and in which a droplet removing portion can be constituted easily and inexpensively, and precision of surface treatment of films by high purity plasma can be enhanced. Periphery of a cathode (407) of said plasma gun is surrounded by an enclosure member (420) and a droplet removing device (406) constituted by laying a plurality of droplet collecting members (411) in multilayer is provided on the inside of the enclosure member (420). The enclosure member (420), the collecting member (411) and a plasma advancing path (402) have no relation connected with an arc power supply (409) and are held in an electrically neutral floating state.

Abstract: The invention relates to a physical vapour deposition coating device (1), comprising a process chamber (2) with an anode (3) and a consumable cathode (4) to be consumed by an electrical discharge for coating a substrate located within the process chamber (2). The coating device (1) further includes a first electrical energy source (5) being connected with its negative pole to said consumable cathode (4), and a second electrical energy source (6) being connected with its positive pole to said anode (3). According to the invention, a third electrical energy source (7) is provided being connected with its negative pole to a source cathode (8) which is different from the consumable cathode (4). In addition, the invention relates to a physical vapour deposition method for coating a substrate.

Abstract: Intended is to provide a plasma generating apparatus, which can remove such a droplet efficiently as might otherwise migrate into a plasma and which can constitute a droplet removing portion simply and inexpensively thereby to improve a, surface treating precision such as a filming with a highly pure plasma. In a plasma advancing path (5), there is arranged the droplet removing portion for removing the droplet, which is by-produced from a cathode (4) at the plasma generating time. This droplet removing portion includes a radially enlarged tube (3) forming the plasma advancing path (5), an introduction side radially reduced tube (34) connected to the plasma introducing side initial end of the radially enlarged tube (3), a discharge side radially reduced tube (39) connected to the plasma discharge side terminal end of the radially enlarged tube (3), and stepped portions (40) formed at the initial end and the terminal end of the radially enlarged tube (3).

Abstract: A plasma film forming apparatus having a plasma gun which emits a plasma beam and a magnet which applies a magnetic field to the plasma beam emitted from the plasma gun to deform the beam section of the plasma beam into an almost rectangular or elliptic shape includes a plurality of magnet units which deflect the plasma beam the beam section of which is deformed, to irradiate an irradiation target with the deflected plasma beam. A first magnet to be arranged on a lower backside to a surface of the irradiation target and a second magnet having magnetic poles which are the same as those of the first magnet are arranged in each magnet unit. The first magnet and the second magnet line up to be spaced apart from each other.

Abstract: A system for controlling cathodic arc discharge is provided. The system includes a vacuum chamber forming an anode. The system also includes a power supply connected to the vacuum chamber, wherein the power supply is configured to generate an electric field within the vacuum chamber. The system further includes a cathode disposed within the vacuum chamber. The system also includes at least one permanent magnet configured to actuate in a translational direction inwards and outwards of the cathode, wherein the magnet is further configured to apply a magnetic field in a direction perpendicular to a face of the cathode and to the electric field to bum the cathode at a predetermined radius on the face of the cathode.