Predominantly Aluminum Nonelectrolytic Coating Patents (Class 205/190)
  • Patent number: 9850591
    Abstract: To manufacture a chamber component for a processing chamber, an aluminum coating is formed on an article comprising impurities, the aluminum coating being substantially free from impurities.
    Type: Grant
    Filed: March 3, 2014
    Date of Patent: December 26, 2017
    Assignee: Applied Materials, Inc.
    Inventors: Jennifer Y. Sun, Sumanth Banda
  • Publication number: 20150147588
    Abstract: The present invention concerns a plastic component with a coating system, wherein the coating system comprises a basecoat of paint which has been applied to the surface of the plastic and on which a coating applied by means of vapor phase deposition is provided, for its part covered by a top coat of paint, characterized in that the coating applied by vapor phase deposition comprises multiple layers.
    Type: Application
    Filed: May 30, 2013
    Publication date: May 28, 2015
    Applicant: Oerlikon Trading AG, Trubbach
    Inventors: Antal Keckes, Thomas Hermann, Peter Schuler, Ruediger Schaefer, Sascha Bauer
  • Patent number: 9028667
    Abstract: A metal material is contacted with a treatment solution containing zirconium and/or titanium compound, and a polyamine compound having a number average molecular weight from 150 to 500,000 and containing from 0.1 mmol to 17 mmol of primary and/or secondary amino group per 1 g of solid content and at least one siloxane unit. Concentration of zirconium and/or titanium compound in the metal surface treatment composition is from 10 ppm to 10,000 ppm with respect to the metal element, and mass ratio of the zirconium and/or titanium element is from 0.1 to 100 with respect to the polyamine compound. The metal material is washed with water after contacted by the treatment solution.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: May 12, 2015
    Assignees: Nippon Paint Co., Ltd., Chemetall GmbH
    Inventors: Toshio Inbe, Thomas Kolberg
  • Patent number: 8945364
    Abstract: A patterned magnetic recording medium, accessible by a magnetic recording head, including a plurality of tracks, a width direction of each track and that of the magnetic recording head being of a skew angle. The patterned magnetic recording medium includes a plurality of magnetic dots, each corresponding to a recording bit, formed on a non-magnetic material. The plurality of magnetic dots are arranged in a plurality of arrays, each array corresponding to one of the tracks. Every N adjacent magnetic dots of the array define a polygon, one side thereof being parallel to the corresponding track, and another side thereof being parallel to a direction corresponding to the skew angle of the corresponding track.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: February 3, 2015
    Assignee: Fuji Electric Co., Ltd.
    Inventor: Shinji Uchida
  • Patent number: 8888982
    Abstract: A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer.
    Type: Grant
    Filed: June 4, 2010
    Date of Patent: November 18, 2014
    Assignee: MKS Instruments Inc.
    Inventors: Xing Chen, Chengxiang Ji, Chiu-Ying Tai
  • Publication number: 20140295670
    Abstract: A method of forming a dense oxide coating on an aluminum component of semiconductor processing equipment comprises cold spraying a layer of pure aluminum on a surface of the aluminum component to a predetermined thickness. A dense oxide coating is then formed on the layer of pure aluminum using a plasma electrolytic oxidation process, wherein the plasma electrolytic oxidation process causes the layer of pure aluminum to undergo microplasmic discharges, thus forming the dense oxide coating on the layer of pure aluminum on the surface of the aluminum component.
    Type: Application
    Filed: March 27, 2013
    Publication date: October 2, 2014
    Applicant: Lam Research Corporation
    Inventors: Hong Shih, Lin Xu, John Michael Kerns, William Charles, John Daugherty, Sivakami Ramanathan, Russell Ormond, Robert G. O'Neill, Tom Stevenson
  • Publication number: 20140272459
    Abstract: Components of semiconductor material processing chambers are disclosed, which may include a substrate and at least one corrosion-resistant coating formed on a surface thereof. The at least one corrosion-resistant coating is a high purity metal coating formed by a cold-spray technique. An anodized layer can be formed on the high purity metal coating. The anodized layer comprises a process-exposed surface of the component. Semiconductor material processing apparatuses including one or more of the components are also disclosed, the components being selected from the group consisting of a chamber liner, an electrostatic chuck, a focus ring, a chamber wall, an edge ring, a plasma confinement ring, a substrate support, a baffle, a gas distribution plate, a gas distribution ring, a gas nozzle, a heating element, a plasma screen, a transport mechanism, a gas supply system, a lift mechanism, a load lock, a door mechanism, a robotic arm and a fastener.
    Type: Application
    Filed: March 12, 2013
    Publication date: September 18, 2014
    Applicant: LAM RESEARCH CORPORATION
    Inventors: John Daugherty, Hong Shih, Lin Xu, Anthony Amadio, Robert G. O'Neill, Peter Holland, Sivakami Ramanathan, Tae Won Kim, Duane Outka, John Michael Kerns, Sonia Castillo
  • Publication number: 20140139304
    Abstract: A neodymium magnet (Nd—Fe—B) is protected by a self-healing, corrosion-resistant coating of (a) a sacrificial metal layer; (b) optionally, a metal pretreatment layer on the sacrificial metal layer; and (c) an electrocoat coating layer.
    Type: Application
    Filed: November 20, 2012
    Publication date: May 22, 2014
    Applicant: GM GLOBAL TECHNOLOGY OPERATIONS LLC
    Inventor: Yar-Ming WANG
  • Publication number: 20140116944
    Abstract: Superhydrophobic membrane structures having a beneficial combination of throughput and a selectivity. Methods of making and using the membrane structures.
    Type: Application
    Filed: November 1, 2012
    Publication date: May 1, 2014
    Applicant: UT-BATTELLE, LLC
    Inventors: Michael Z. HU, John T. SIMPSON, Tolga AYTUG, Mariappan Parans PARANTHAMAN, Matthew R. STURGEON
  • Publication number: 20140110145
    Abstract: An insulated electric conductor having a copper core, a layer of aluminum formed on the copper core, and a second layer of aluminum in the form of a high-purity aluminum is disclosed. The copper core may be a solid core or may be formed from a plurality of copper strands. The layer of aluminum formed over the copper core is at least partially anodized to form an aluminum oxide dielectric layer. The layer of high-purity aluminum may be formed by evaporation deposition, sputter deposition, or co-extrusion. Once the layer of high-purity aluminum is formed, it is anodized. More than two layers of aluminum may be formed over the copper core.
    Type: Application
    Filed: October 18, 2012
    Publication date: April 24, 2014
    Applicant: Ford Global Technologies, LLC
    Inventors: Larry Dean Elie, Allan Roy Gale, John Matthew Ginder, Clay Wesley Maranville
  • Publication number: 20140098460
    Abstract: The present invention provides an electrode material for an aluminum electrolytic capacitor, which does not require any etching treatment and which has improved bending strength. Specifically, the present invention provides an electrode material for an aluminum electrolytic capacitor, which comprises, as constituent elements, a sintered body of a powder of at least one member selected from the group consisting of aluminum and aluminum alloys and an aluminum foil substrate that supports the sintered body thereon, which is characterized in that (1) the powder has an average particle size D50 of 0.5 to 100 ?m, (2) the sintered body is formed on one surface or both surfaces of the aluminum foil substrate and has a total thickness of 20 to 1,000 ?m, and (3) the aluminum foil substrate has a thickness of 10 to 200 ?m and an Si content of 10 to 3,000 ppm.
    Type: Application
    Filed: May 21, 2012
    Publication date: April 10, 2014
    Applicant: TOYO ALUMINIUM KABUSHIKI KAISHA
    Inventors: Toshifumi Taira, Masashi Mehata
  • Patent number: 8679221
    Abstract: A method for producing an alumina template of nanorods, the alumina template, and the nanorods are provided for overcoming the problems of the conventional alumina template having anodic aluminum oxide that may be peeled off from a substrate or forming a non-conductive oxide easily, and the alumina template includes a conductive substrate composed of an active metal and an inert metal, so that the alumina template can be attached onto the active metal and inert metal at the same time, and the active metal can be used for securing the alumina template and supporting the alumina template on the inert metal, and the anodic aluminum oxide attached onto the inert metal can be used for providing a better conductivity, such that a stable and highly conductive alumina template can be produced.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: March 25, 2014
    Assignee: Southern Taiwan University
    Inventors: Hsyi-en Cheng, Bo-jiun Yeh
  • Patent number: 8652317
    Abstract: An alumina nanohole array and a method of fabricating the same includes the steps of forming an aluminum thin-film on a substrate at a substrate temperature of ?80° C. or below so that crystal grain growth is suppressed, even when a high-purity aluminum material is used, thus providing improved surface smoothness; and anodizing the aluminum thin-film. Preferably, the method additionally includes texturing by pressing a mold having an orderly array of projections against the aluminum thin-film to form pits on the aluminum thin-film which enables a larger array area to be formed. When the mold and the aluminum thin-film are held at a temperature of 150 to 200° C., the pressure used for pit formation is reduced. A magnetic recording medium manufactured by a method therefore includes forming a magnetic layer within the nanoholes so that the medium is suitable as a bit patterned media for a perpendicular recording system.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: February 18, 2014
    Assignee: Fuji Electric Co., Ltd.
    Inventor: Kouichi Tsuda
  • Publication number: 20130327741
    Abstract: A method for producing an alumina template of nanorods, the alumina template, and the nanorods are provided for overcoming the problems of the conventional alumina template having anodic aluminum oxide that may be peeled off from a substrate or forming a non-conductive oxide easily, and the alumina template includes a conductive substrate composed of an active metal and an inert metal, so that the alumina template can be attached onto the active metal and inert metal at the same time, and the active metal can be used for securing the alumina template and supporting the alumina template on the inert metal, and the anodic aluminum oxide attached onto the inert metal can be used for providing a better conductivity, such that a stable and highly conductive alumina template can be produced.
    Type: Application
    Filed: August 9, 2013
    Publication date: December 12, 2013
    Applicant: SOUTHERN TAIWAN UNIVERSITY
    Inventors: Hsyi-En CHENG, Bo-Jiun YEH
  • Publication number: 20130176091
    Abstract: A method for plating magnets with metal is disclosed. In one embodiment, the metal is aluminum and the aluminum plating provides a number of aesthetic and structural advantages, over brittle magnetic materials, which are only plated with a thin, anti-corrosive metallic layer. More specifically, methods for creating multi-pole bar magnets and structural elements primarily with aluminum coated magnetic material are disclosed.
    Type: Application
    Filed: September 26, 2012
    Publication date: July 11, 2013
    Applicant: Apple Inc.
    Inventor: Apple Inc
  • Publication number: 20130145900
    Abstract: A method for producing an alumina template of nanorods, the alumina template, and the nanorods are provided for overcoming the problems of the conventional alumina template having anodic aluminum oxide that may be peeled off from a substrate or forming a non-conductive oxide easily, and the alumina template includes a conductive substrate composed of an active metal and an inert metal, so that the alumina template can be attached onto the active metal and inert metal at the same time, and the active metal can be used for securing the alumina template and supporting the alumina template on the inert metal, and the anodic aluminum oxide attached onto the inert metal can be used for providing a better conductivity, such that a stable and highly conductive alumina template can be produced.
    Type: Application
    Filed: December 13, 2011
    Publication date: June 13, 2013
    Inventors: Hsyi-en CHENG, Bo-jiun YEH
  • Publication number: 20130037311
    Abstract: A base material or composite material such as graphite, may be combined with another material, such as aluminum oxide or polyimide, to produce a new insulating thermal management material. The base material may be impregnated with another metal to create a composite base material.
    Type: Application
    Filed: August 9, 2012
    Publication date: February 14, 2013
    Applicant: APPLIED NANOTECH HOLDINGS, INC.
    Inventors: NAN JIANG, ZVI YANIV
  • Publication number: 20120103526
    Abstract: The disclosure relates to a chamber component or a method for fabricating a chamber component for use in a plasma processing chamber apparatus. The chamber component includes a polished high purity aluminum coating and a hard anodized coating that is resistive to the plasma processing environment.
    Type: Application
    Filed: October 19, 2011
    Publication date: May 3, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Alan Ouye, Renee Marguerite Koch
  • Publication number: 20120094016
    Abstract: The present invention provides an electrode material for aluminum electrolytic capacitors that has a high porosity and a high capacitance, and that does not require etching. Specifically, the invention provides an electrode material for aluminum electrolytic capacitors that contains a sintered body of at least one of aluminum and aluminum alloys, the sintered body having a porosity of 35 to 55%.
    Type: Application
    Filed: May 25, 2010
    Publication date: April 19, 2012
    Applicant: TOYO ALUMINIUM KABUSHIKI KAISHA
    Inventors: Toshifumi Taira, Masashi Mehata
  • Publication number: 20120062355
    Abstract: A nanoflat resistor includes a first aluminum electrode (360), a second aluminum electrode (370); and nanoporous alumina (365) separating the first and second aluminum electrodes (360, 370). A substantially planar resistor layer (330) overlies the first and second aluminum electrodes (360, 370) and nanoporous alumina (365). Electrical current passes from the first aluminum electrode (360), through a portion of the planar resistor layer (350) overlying the nanoporous alumina (365) and into the second aluminum electrode (370). A method for constructing a nanoflat resistor (390) is also provided.
    Type: Application
    Filed: May 19, 2009
    Publication date: March 15, 2012
    Inventors: Arjang Fartash, Peter Mardilovich
  • Patent number: 8119243
    Abstract: The invention relates to a process for the coating of objects made of valve metals selected from aluminum, magnesium, titanium, niobium and/or zirconium and their alloys with an oxide ceramic layer formed from the metal which has a thin barrier layer as a boundary layer towards the metal whose surface has been coated with polymers, characterized in that said polymers are introduced into the capillary system of the oxide ceramic layer in the form of dimers or halogenated dimers of general formula I wherein R1 represents one or more hydrogen or halogen residues; each R2 represents hydrogen or halogen; and R3 commonly represent a corresponding xylylene residue for completing a dimeric structure; by vacuum coating, followed by polymerizing the dimers.
    Type: Grant
    Filed: August 17, 2006
    Date of Patent: February 21, 2012
    Assignee: Oerlikon Leybold Vacuum GmbH
    Inventors: Michael Froitzheim, Josef Heppekausen
  • Publication number: 20110267825
    Abstract: An insulated light-reflective substrate, comprising a substrate and an anodized film provided on the surface of the substrate, wherein: the substrate has at its surface an aluminum alloy layer of a thickness of not less than 10 ?m; the aluminum alloy layer has an aluminum purity of 99.9% by weight or higher, with the total content of Si and Fe in the layer being not more than 0.005% by weight, and the content of inevitable impurities in the layer as components other than Al, Si, Fe, Ga and Zn being not more than 0.01% by weight; the anodized film has micropores each extending from the surface of the film in the direction of thickness; and the ratio of center line length to depth of the micropores is 1.0 to 1.2.
    Type: Application
    Filed: April 27, 2011
    Publication date: November 3, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Yoshinori HOTTA, Yusuke HATANAKA
  • Publication number: 20110133854
    Abstract: The instant pulse filter according to the present invention, which may cause a malfunction or a short life span of a semiconductor device, is made using an aluminum anodic oxidation, comprising—a first step for forming an aluminum thin film layer on an upper side of an insulator substrate; a second step for forming an aluminum oxide thin film layer having a pore by oxidizing the aluminum thin film layer by means of an anodic oxidation; a third step for depositing a metallic material on an upper side of the aluminum thin film layer for filling the pore; a fourth step for forming a nano rod in the interior of the aluminum oxide thin film layer by eliminating the metallic material deposited except in the pore; a fifth step for forming an internal electrode on an upper side of the aluminum oxide thin film layer having the nano rod; a sixth step for forming a protective film layer on an upper side of the same in order to protect the aluminum oxide thin film layer and the internal electrode from the external enviro
    Type: Application
    Filed: April 3, 2009
    Publication date: June 9, 2011
    Inventors: Hak Beom Moon, Jin Hyung Cho, Suc Hyun Bang, Cheol Hwan Kim, Yoon Hyung Jang
  • Publication number: 20110042350
    Abstract: A method for fabricating a 3D (three-dimensional) structure is disclosed to provide hydrophobicity to a surface of a 3D structure by using a dipping method in which a predetermined-shaped structure is immersed in a molten metal solution. The method includes: immersing a predetermined-shaped structure in a molten metal solution to coat a molten metal material on the surface of the predetermined-shaped structure; anodizing a metal base coated with the molten metal material; coating a polymer material on an outer surface of the metal-coated base to form a negative replica structure; covering an outer surface of the negative replica structure with an outer formation material; and removing the metal-coated base from the negative replica structure and the outer formation material.
    Type: Application
    Filed: March 12, 2009
    Publication date: February 24, 2011
    Inventors: Dong-Seob Kim, Kun-Hong Lee, Woon-Bong Hwang, Geun-Bae Lim, Hyun-Chul Park, Byeong-Joo Lee, Sang-Min Lee, Joon-Won Kim
  • Publication number: 20110038098
    Abstract: The present invention provides an electrode material for use in an aluminum electrolytic capacitor that does not necessitate an etching treatment. Specifically, the present invention provides an electrode material for use in an aluminum electrolytic capacitor, the electrode material comprising a sintered body of at least one of aluminum and an aluminum alloy.
    Type: Application
    Filed: April 22, 2008
    Publication date: February 17, 2011
    Applicant: TOYO ALUMINIUM KABUSHIKI KAISHA
    Inventors: Toshifumi Taira, Masashi Mehata
  • Publication number: 20110020665
    Abstract: A surface finishing and coating methodology that provides a superior looking aluminum product with acceptable corrosion performance for outdoor use. In one embodiment, a coating of high purity aluminum is applied first to an aluminum article or product via cold or thermal spray and the mechanical surface modification (e.g., polishing, buffing, brushing, etc.) is clone second. The resulting product has the desirable light weight and mechanical properties of aluminum with the chosen look and performance of the high purity aluminum coating. The aluminum product to be coated may be obtained by extrusion, forging, casting, or rolling.
    Type: Application
    Filed: June 13, 2008
    Publication date: January 27, 2011
    Applicant: ALCOA INC.
    Inventors: Daniel L. Serafin, Ian A. McCallum, Roger W. Kaufold, Robert E. Bombalski, Luis Fanor Vega, Donald Robert Smith
  • Publication number: 20100330390
    Abstract: A structural member for a manufacturing apparatus has a metal base member mainly composed of aluminum, a high-purity aluminum film formed on the surface of the metal base member, and a nonporous amorphous aluminum oxide passivation film which is formed by anodizing the high-purity aluminum film. A method for producing a structural member for a manufacturing apparatus, includes forming a high-purity aluminum film on the surface of a metal base member mainly composed of aluminum, and anodizing the high-purity aluminum film in a chemical conversion liquid having a pH of 4-10 and containing a nonaqueous solvent, which has a dielectric constant lower than that of water and dissolves water, thereby converting at least a surface portion of the high-purity aluminum film into a nonporous amorphous aluminum oxide passivation film.
    Type: Application
    Filed: December 21, 2007
    Publication date: December 30, 2010
    Applicants: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, MITSUBISHI CHEMICAL CORPORATION
    Inventors: Tadahiro Ohmi, Minoru Tahara, Yasuhiro Kawase
  • Publication number: 20100276001
    Abstract: A metal composite substrate includes a core made of a metal having higher strength than aluminum at elevated temperatures of at least 300° C. and an aluminum or aluminum alloy layer covering an entire surface of the core, and an anodized film is formed at a surface of the aluminum or aluminum alloy layer. The metal composite substrate having the anodized surface film can produce with high efficiency an insulating flexible support by a roll-to-roll process and has good flatness during the high-temperature heat treatment.
    Type: Application
    Filed: April 29, 2010
    Publication date: November 4, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Hirokazu SAWADA, Akio UESUGI
  • Publication number: 20100132546
    Abstract: Composite structures are described that have a porous anodic oxide layer such as, for example, a porous anodic aluminum oxide layer. In one aspect, the present invention includes a composite gas separation module having a porous metal substrate; a porous anodic aluminum oxide layer, wherein the porous anodic aluminum oxide layer overlies the porous metal substrate; and a dense gas-selective membrane, wherein the dense gas-selective membrane overlies the porous anodic aluminum oxide layer. A composite filter is described having a porous non-aluminum metal substrate; and a porous anodic aluminum oxide layer, wherein the porous anodic aluminum oxide layer defines pores extending through the porous anodic aluminum oxide layer. Methods for fabricating composite gas separation modules and composite filters and methods for selectively separating hydrogen gas from a hydrogen gas-containing gaseous stream are also described.
    Type: Application
    Filed: April 4, 2008
    Publication date: June 3, 2010
    Inventors: Yi Hua Ma, Ivan P. Mardilovich
  • Publication number: 20090311516
    Abstract: A method for making a Ti-based composite material, comprising steps of: providing a Ti-based block; forming an aluminum layer on the Ti-based block; anodizing the aluminum layer to form a transparent aluminum oxide film; and continuing the anodizing process to form a titanium oxide film between the aluminum oxide film and the Ti-based block. Thus the aluminum oxide film is located at an outmost side of the Ti-base composite material for protecting the composite material from contamination. The titanium oxide film is located between the Ti-based block and the aluminum oxide film for enhancing an aesthetic feeling of products made of the Ti-based composite materials.
    Type: Application
    Filed: March 26, 2009
    Publication date: December 17, 2009
    Applicant: Foxconn Technology Co., Ltd.
    Inventor: PAI-SHENG WEI
  • Patent number: 7479212
    Abstract: A high-density data storage medium, a method of manufacturing the data storage medium, a high-density data storage apparatus, and methods of writing data on, and reading and erasing data from the data storage medium by using the data storage apparatus are provided. The data storage medium includes a lower electrode, an insulation layer deposited on the lower electrode, a photoelectron emission layer deposited on the insulation layer and having a plurality of protrusions from which photoelectrons are emitted due to collisions between the protrusions and photons, and a dielectric layer deposited on the photoelectron emission layer and storing the photoelectrons emitted from the photoelectron emission layer.
    Type: Grant
    Filed: December 18, 2006
    Date of Patent: January 20, 2009
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seung-bum Hong, In-kyeong Yoo, Ju-hwan Jung
  • Patent number: 7455759
    Abstract: An anodized coating suitable for formation of highly regulated pores is provided. A method for production of a structure having pores characterized by including the steps of: forming starting points at predetermined intervals in an aluminum alloy formed on a substrate, and forming pores by anodization with the starting points as origins. In another embodiment, first and second aluminum alloy layers are anodized to form pores penetrating into the layers, wherein a diameter of a pore in the first alloy is different from a diameter of a pore in the second alloy. In an additional embodiment, a substrate is anodized to form pores, wherein the substrate contains an additive which changes the diameter within each pore, the amount of the additive continuously changing along the direction perpendicular to the substrate.
    Type: Grant
    Filed: August 10, 2004
    Date of Patent: November 25, 2008
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Saito, Aya Imada, Tohru Den
  • Patent number: 7452454
    Abstract: Using aqueous electrolytes containing complex fluorides or oxyfluorides such as fluorozirconates and fluorotitanates, ferrous metal articles and non-metallic articles having a first coating containing aluminum may be rapidly anodized to form a second protective surface coating. White coatings may be formed on articles using pulsed direct current or alternating current.
    Type: Grant
    Filed: October 25, 2004
    Date of Patent: November 18, 2008
    Assignee: Henkel KGaA
    Inventor: Shawn E. Dolan
  • Patent number: 7323221
    Abstract: The present invention relates to a process for the coating of objects made of valve metals or their alloys with a thin barrier layer consisting of the metal and an oxide ceramic layer provided thereon whose surface has been coated with fluoropolymers, characterized in that the fluoropolymers are introduced into the capillary system of the oxide ceramic layer in the form of a solution by vacuum impregnation, followed by removing the non-wetting portions of the solution and drying.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: January 29, 2008
    Assignee: Leybold Vakuum GmbH
    Inventors: Josef Heppekausen, Frank Schulte
  • Patent number: 7192510
    Abstract: A fluid control device has very fine pores with an average diameter not greater than 10 nm and provides a large flux. The fluid control device comprises an anodized alumina film having fine pores and a silicon based micro-porous film having very fine pores and made from an AlSi mixed film and the fine pores and the very fine pores are at least partly linked with each other. The fluid control device is prepared from a film including at least an aluminum layer and an AlSi mixed film by forming an anodized alumina film having fine pores by way of an anodization process for the aluminum layer part and also forming a silicon based micro-porous film having very fine pores containing silicon as principal ingredient by way of an anodization process or etching process for the AlSi mixed film. The fluid control device can be used as filter or ultrafilter film that allows fluid and gas to pass through it.
    Type: Grant
    Filed: December 11, 2003
    Date of Patent: March 20, 2007
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tohru Den, Kazuhiko Fukutani
  • Patent number: 6923897
    Abstract: The invention relates to a method for producing an electrolytically coated cold rolled strip, preferably for use in the production of battery sheaths. The cold rolled strip is provided with a cobalt or a cobalt alloy layer by an electrolytic method. The aim of the invention is to provide a battery sheath with low values for the electric contact resistance between the cathode substance of the battery and the inner surface of the battery sheath. To this end, organic substances m added to the electrolyte during coating that produce decomposition products, said decomposition produces and/or reaction products of said decomposition products with other components of the electrolytic bath being deposited on the strip material as a brittle layer along with the cobalt or the cobalt alloy.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: August 2, 2005
    Assignee: Hille & Mueller GmbH
    Inventors: Ferdinand Schmidt, Hans-Guenter Steinmann, Karlfried Pfeifenbring, Werner Olberding, Dagmar Petrick
  • Patent number: 6749081
    Abstract: A method of surface treating a cookware article formed of aluminum or aluminum alloy, comprises the steps of applying a first coating of porcelain enamel to the exterior of the article; subjecting the interior of the article to hard-anodizing; and applying a second coating of porcelain enamel over the first coating.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: June 15, 2004
    Assignee: Meyer Manufacturing Company Limited
    Inventor: Stanley Kin-Sui Cheng
  • Patent number: 6623614
    Abstract: A cover structure for an electronic device includes a plastic cover, an aluminum or aluminum alloy layer on the plastic cover, and an oxide layer of aluminum or aluminum alloy on the aluminum or aluminum alloy layer. A method of manufacturing the cover structure includes: (1) injection molding the plastic cover; (2) forming the aluminum or aluminum alloy layer on the plastic cover; and (3) anodizing the aluminum or aluminum alloy layer to form an oxide layer thereof. The method also can include a step of coloring the oxide layer of aluminum or aluminum alloy. The cover structure thus formed has a metallic appearance with decorative colors or patterns, and is resistant to corrosion. The cover structure is not only very aesthetically pleasing to users but also durable.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: September 23, 2003
    Assignee: Hon Hai Precision Ind. Co., Ltd.
    Inventor: Che-Yuan Hsu
  • Patent number: 6495021
    Abstract: A dendritic sponge which is directionally-grown on a substrate material has a high surface to volume ratio and is suitable for forming anodes for highly efficient capacitors. A dielectric film is formed on the sponge surface by oxidizing the surface. In a preferred embodiment, the dielectric is grown on titanium sponge and is doped with oxides of Ca, Mg, Sr, Be, or Ba to improve the film's dielectric constant or with higher valent cations, such as Cr6+, V5+, Ta5+, Mo6+, Nb5+, W6+, and P5+, to reduce the oxygen vacancy concentration and leakage current of the dielectric film. A capacitor formed from the sponge includes a cathode electrolyte which serves as an electrical conductor and to repair the dielectric film by re-oxidizing the anode surface at areas of local breakdown. Sponges of titanium, tantalum, and aluminum form efficient dielectric films.
    Type: Grant
    Filed: March 16, 2001
    Date of Patent: December 17, 2002
    Assignee: Case Western Reserve University
    Inventors: Gerhard Welsch, Donald McGervey
  • Patent number: 6471879
    Abstract: In devices such as flat panel displays, an aluminum oxide layer is provided between an aluminum layer and an ITO layer when such materials would otherwise be in contact to protect the ITO from optical and electrical defects sustained, for instance, during anodic bonding and other fabrication steps. This aluminum oxide barrier layer is preferably formed either by: (1) partially or completely anodizing an aluminum layer formed over the ITO layer, or (2) an in situ process forming aluminum oxide either over the ITO layer or over an aluminum layer formed on the ITO layer. After either of these processes, an aluminum layer is then formed over the aluminum oxide layer.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: October 29, 2002
    Assignee: Micron Technology, Inc.
    Inventors: Robert J. Hanson, Won-Joo Kim, Mike E. Pugh
  • Publication number: 20020125143
    Abstract: A method of anodizing an aluminum substrate comprising heating the substrate to a first temperature of 200° C. to about 380° C.; suspending the substrate into a first electrolyte and applying a first anodizing current to the first electrolyte; rinsing the substrate; heating the substrate to a second temperature of 200° C. to about 380° C.; and suspending the substrate into a second electrolyte and applying a second anodizing current to the second electrolyte, wherein the first electrolyte and second electrolyte each comprise an aqueous solution of at least one salt of alpha-hydroxy acid.
    Type: Application
    Filed: March 7, 2001
    Publication date: September 12, 2002
    Inventors: Albert Kennedy Harrington, Brian John Melody, John Tony Kinard, Philip Michael Lessner, David Alexander Wheeler
  • Patent number: 6280597
    Abstract: The known flourinated layer has usually a thickness of from 1000 to 3000 angstroms. After the forced oxidation of metal, the forcibly oxidized surface is flourinated. As a result of the preceding forcing oxidation, a 1 &mgr;m or more thick fluorinated layer is formed on the surface of the metal.
    Type: Grant
    Filed: September 14, 1998
    Date of Patent: August 28, 2001
    Assignee: Showa Denko K.K.
    Inventors: Kunio Kashiwada, Takanori Kodama, Hiroyasu Taguchi, Satoshi Hirano
  • Patent number: 6110347
    Abstract: A method for forming an indium oxide film on an electrically conductive substrate by immersing the substrate and a counter electrode in an aqueous solution containing at least nitrate and indium ions and flowing an electric current between the substrate and the couter electrode, thereby causing indium oxide film formation on the substrate, is provided. A substrate for a semiconductor element and a photovoltaic element produced using the film forming method are also provided. An aqueous solution for the formation of an indium oxide film by an electroless deposition process, containing at least nitrate and indium ions and tartrate, is also disclosed. A film-forming method for the formation of an indium oxide film on a substrate by an electroless deposition process, using the aqueous solution, and a substrate for a semiconductor element and a photovoltaic element produced using the film-forming method are further provided.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: August 29, 2000
    Assignee: Canon Kabushiki Kashia
    Inventors: Kozo Arao, Katsumi Nakagawa, Yukiko Iwasaki
  • Patent number: 5956840
    Abstract: The invention relates to a method for producing low cost hermetic Integrated Module Assembly (IMA) packaging, where an aluminum coating (24) is deposited on a poly-tetrafluoral-ethaline substrate (20), the aluminum coating (24) is selectively etched to form a waveguide window (26) and the substrate (20) is selectively treated over the waveguide window (26) to produce a non-conductive hermetic seal. The substrate (20) is then joined to a metal carrier (28) containing the waveguide (30). As a result of using selectively treated low cost substrates to produce hermetic seals, more expensive substrates are not required to form hermetic seals over substrate to waveguide interconnections.
    Type: Grant
    Filed: November 14, 1997
    Date of Patent: September 28, 1999
    Assignee: TRW Inc.
    Inventors: Steven S. Chan, John E. Dowsing, III, Jason E. Snodgress
  • Patent number: 5236573
    Abstract: A MIM device is fabricated by depositing sequentially on a substrate (14) a first conductive layer (30), a thin layer of insulative material (32) of for example silicon oxynitride or silicon nitride. The first conductive layer is formed of anodisable material, e.g. tantalum, and following deposition of the insulative layer the structure is subjected to an anodisation process whereby anodic material (41,35), is grown at any pin holes (40) or weak regions in the insulative layer so as to repair such defects. A second conductive layer (34) is then formed. An array of MIM devices formed in this manner can be used in an active matrix addressed LCD panel.
    Type: Grant
    Filed: April 2, 1990
    Date of Patent: August 17, 1993
    Assignee: U.S. Philips Corporation
    Inventor: John M. Shannon
  • Patent number: 5178967
    Abstract: A bilayer oxide film which comprises a preferably porous layer containing aluminum oxide and a non-porous layer comprising an oxide of a valve metal, e.g. tantalum. The layers are integral. The film is produced by forming a coating of aluminium or an anodizable aluminum alloy on a valve metal (or alloy), anodizing the resulting structure in an electrolyte (preferably one capable of converting the aluminum (or alloy) to a porous oxide film) in the presence of an adhesion-reducing agent (e.g. fluoride ions) that makes the resulting anodized bilayer film easily detachable from the remaining valve metal. The bilayer film is then detached from the valve metal, e.g. by adhering a flexible plastic film to the bilayer and using the film to peel off the bilayer from the valve metal. The resulting bilayer can be used for a variety of purposes, e.g. as a vapor or oxygen barrier useful for packaging, or as a coating containing magnetic particles used to make a magnetic recording medium.
    Type: Grant
    Filed: February 8, 1990
    Date of Patent: January 12, 1993
    Assignee: Alcan International Limited
    Inventors: Aron M. Rosenfeld, Paul Smits