Cleaning, Recycling, Or Reusing Electrolyte Patents (Class 205/650)
  • Patent number: 7794573
    Abstract: Systems and methods for electrochemically processing microfeature workpieces are disclosed herein. In one embodiment, a system includes (a) a processing unit having a first flow system configured to convey a flow of a first processing fluid to a microfeature workpiece, (b) an electrode unit having an electrode and a second flow system configured to convey a flow of a second processing fluid at least proximate to the electrode, (c) a barrier between the processing unit and the electrode unit to separate the first and second processing fluids, and (d) a water balance unit for maintaining the concentration of water in the first processing fluid within a desired range.
    Type: Grant
    Filed: August 31, 2005
    Date of Patent: September 14, 2010
    Assignee: Semitool, Inc.
    Inventor: John L. Klocke
  • Patent number: 7107676
    Abstract: Manufacturing equipment and manufacturing process steps that improve upon prior art processes for the manufacturing of filament tube and arc tube light sources, their components and subassemblies, and lamps employing said light sources. A double ended, tipless filament tube or arc tube light source incorporates a drawn-down tubular body, and one piece foliated leads with spurs for process handling and for spudding into a filament with stretched-out legs. Bugled ends on the body provide a novel cutoff means, facilitate a flush-fill finishing process, and enhance mounting and support of the light sources in lamps. The foliated leads are made from a continuous length of wire in a process including foil hammering and two-bath AC electrochemical etching. Cost-reduced light source and lamp production enables affordable household consumer lamps, even when containing two series-connected halogen filament tubes.
    Type: Grant
    Filed: November 5, 2003
    Date of Patent: September 19, 2006
    Inventor: Elmer G. Fridrich
  • Patent number: 6899804
    Abstract: An electrolyte composition and method for planarizing a surface of a wafer using the electrolyte composition is provided. In one aspect, the electrolyte composition includes ammonium dihydrogen phosphate, diammonium hydrogen phosphate, or a mixture thereof. The composition has a pH between about 3 and about 10 which is environmentally friendly and does not present hazardous operation concerns. The composition may further comprise one or more additives selected from a group consisting of benzotriazole, ammonium citrate, ethlylenediamine, tetraethylenepentamine, triethylenetetramine, diethylenetriamine, amino acids, ammonium oxalate, ammonia, ammonium succinate, and citric acid.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: May 31, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Alain Duboust, Lizhong Sun, Feng Q. Liu, Yuchun Wang, Yan Wang, Siew Neo, Liang-Yuh Chen
  • Patent number: 6797141
    Abstract: The invention deals with the technical problem to devise a process for the extended use of electrolytes which economically ensures a high electrolyte quality without having to accept production interruptions for regeneration. Especially, it is envisaged to conduct the process for the precipitation of non-glaring metal coatings in such a manner that work can proceed in three shifts for five days per week, without encountering production interruptions due to coagulation of the fine dispersal phase, respectively, and without the additional operating cost of a heating/cooling circuit. The invention solves the problem in that during the extended use of an electrolyte a partial flow is split off which is filtered and, if applicable, regenerated by the addition of active substances and reintegrated in the operating cycle.
    Type: Grant
    Filed: October 3, 2002
    Date of Patent: September 28, 2004
    Assignee: Enthone Inc.
    Inventors: Ralf Wilhelm Ludwig, Gerd Schöngen, Elmar Tolls
  • Patent number: 6723224
    Abstract: Generally, a method and apparatus for electro-chemical polishing a metal layer disposed on a substrate is provided. In one embodiment, the electro-chemical polishing apparatus generally includes a substrate support having a plurality of contact members, a cathode and at least one nozzle. The nozzle is adapted to centrally dispose a polishing fluid on the substrate supported by the substrate support. The cathode is adapted to couple the polishing fluid to a negative terminal of a power source. A positive terminal of the power source is electrically coupled through the contact members to the conductive layer of the substrate. The nozzle creates a turbulent flow in the portion of the polishing fluid boundary layer proximate the center of the substrate which enhances the polishing rate at the center of the substrate.
    Type: Grant
    Filed: August 1, 2001
    Date of Patent: April 20, 2004
    Assignee: Applied Materials Inc.
    Inventors: Joseph Yahalom, Srinivas Gandikota, Christopher R. McGuirk, Deenesh Padhi
  • Patent number: 6676826
    Abstract: A method for production of a rotor for centrifugal compressor, wherein the said rotor is produced from a monolithic disc, which is provided with a central hole. The method consists of use, within an isolating medium, of at least one first electrode which has polarity opposite the polarity of the rotor, wherein the said first electrode operates starting from the outer diameter of the monolithic disc, in order to produce the blades and the cavities of the said rotor, and wherein the processing takes place with a continuous path, consisting of a first step of roughing, followed by a second step of finishing with a tool which has a shape similar to that of the electrode used for the first roughing step, in order to produce an accurate geometry of the blades.
    Type: Grant
    Filed: November 21, 2001
    Date of Patent: January 13, 2004
    Assignee: Nuovo Pignone Holding S.p.A.
    Inventors: Verter Battistini, Umberto Mariotti
  • Patent number: 6652658
    Abstract: A method for clean processing wherein an object and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion exchange material or catalyst material that increases the amount of hydroxide ions is provided between the processing surface of said workpiece and the distal end of the high pressure nozzle facing said surface, a voltage is applied using the high pressure nozzle as the cathode and the object as the anode and the hydroxide ions produced from the ultra-pure water are supplied to the surface of the object.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: November 25, 2003
    Assignee: Japan Science and Technology Corporation
    Inventors: Yuzo Mori, Toshio Ishikawa
  • Publication number: 20030205484
    Abstract: An electrochemical/mechanical polishing apparatus and method to planarize surfaces of a semiconductor device without damaging relatively soft dielectric materials. The electrochemical/mechanical polishing apparatus comprises a substrate chuck, nozzle assembly, power supply, and sweep mechanism. The substrate chuck receives a substrate to be processed. The nozzle assembly includes a nozzle plate having a plurality of nozzles to dispense an electrolyte solution. A pad is secured to the nozzle plate. The power supply provides a positive electric potential to an electrically conductive layer of the substrate and a negative electric potential to the nozzle plate. The sweep mechanism scans the nozzle assembly along the surface of the substrate, and the pad is positioned sufficiently close to the surface of the substrate to disturb an electrolyte/wafer boundary layer.
    Type: Application
    Filed: May 2, 2002
    Publication date: November 6, 2003
    Inventor: Madhav Datta
  • Patent number: 6221235
    Abstract: A sacrificial cores in castings of metallic or non-metallic materials is made from a metal that can be electrolytically dissolved, and is removed from the casting by electrochemical machining. The sacrificial core may be a hollow shell incorporating an integral electrode within the shell and electrically insulated from the shell.
    Type: Grant
    Filed: November 30, 1998
    Date of Patent: April 24, 2001
    Assignee: Faraday Technology Marketing Group LLC
    Inventor: Lawrence E. Gebhart
  • Patent number: 5882500
    Abstract: The invention relates to a process for the demetallization of highly acidic baths based on phosphoric acid and sulphuric acid, and also to a process for the electropolishing of stainless-steel surfaces, in which a regeneration of, in particular, spent electrolyte compositions for electropolishing can be achieved by separate electrolytic reduction of Fe(III) to Fe(II) and subsequent removal of precipitates.
    Type: Grant
    Filed: March 4, 1998
    Date of Patent: March 16, 1999
    Assignee: Poligrat GmbH
    Inventors: Razmik Abedian, Olaf Bohme, Siegfried Piesslinger-Schweiger
  • Patent number: 5853561
    Abstract: The present invention teaches a method of producing a textured surface upon an arbitrarily configured titanium or titanium alloy object for the purpose of improving bonding between the object and other materials such as polymer matrix composites and/or human bone for the direct in-growth of orthopaedic implants. The titanium or titanium alloy object is placed in an electrolytic cell having an ultrasonically agitated solution of sodium chloride therein whereby a pattern of uniform "pock mark" like pores or cavities are produced upon the object's surface. The process is very cost effective compared to other methods of producing rough surfaces on titanium and titanium, alloy components. The surface textures produced by the present invention are etched directly into the parent metal at discrete sites separated by areas unaffected by the etching process. Bonding materials to such surface textures on titanium or titanium alloy can thus support a shear load even if adhesion of the bonding material is poor.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: December 29, 1998
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventor: Bruce A. Banks