Abstract: A dry-state non-contact method for patterning of nanostructured conducting materials is disclosed. Short self-generated electron-emission pulses in air at atmospheric pressure can enable an electron-emission-based (field enhancement) interaction between a sharp tungsten tip and elements of the nanostructured materials to cause largely non-oxidative sequential decomposition of the nanostructured elements. Embodiments can employ a substrate/tip gap of 10 to 20 nm, discharge voltages of 25-30 V, and patterning speeds as fast as 10 cm/s to provide precisely patterned nanostructures (<200 nm) that are largely free of foreign contaminants, thermal impact and sub-surface structural changes.

Abstract: A method for decorating the surface of a mechanical part including structuring, on the surface to be decorated, a masking layer having a thickness that is at least equal to the thickness of the decoration element to be produced; making, in the masking layer, at least one opening that coincides with the location on the surface to be decorated where the decoration element is to be produced, the opening having a contour that is identical to the contour of the decoration element and defining a volume with the mechanical part; filling the volume delimited by the masking layer and the surface to be decorated of with a filling material wherein the decoration elements are sought to be produced; and removing the masking layer.

Abstract: Representative implementations of techniques and methods include chemical mechanical polishing for hybrid bonding. The disclosed methods include depositing and patterning a dielectric layer on a substrate to form openings in the dielectric layer, depositing a barrier layer over the dielectric layer and within a first portion of the openings, and depositing a conductive structure over the barrier layer and within a second portion of the openings not occupied by the barrier layer, at least a portion of the conductive structure in the second portion of the openings coupled or contacting electrical circuitry within the substrate. Additionally, the conductive structure is polished to reveal portions of the barrier layer deposited over the dielectric layer and not in the second portion of the openings. Further, the barrier layer is polished with a selective polish to reveal a bonding surface on or at the dielectric layer.

Abstract: A method for manufacturing an interconnection structure includes forming a second dielectric layer on a wafer. The wafer includes a first dielectric layer and a conductive element embedded in the first dielectric layer. An opening is formed in the second dielectric layer to expose the conductive element. A dielectric spacer layer is selectively formed to be in contact with surfaces defining the opening of the second dielectric layer. The dielectric spacer layer exposes the conductive element. A bottom via is formed in the opening and in contact with the dielectric spacer layer and the conductive element. A portion of the dielectric spacer layer is removed to form a dielectric spacer in contact with the bottom via. A top via is formed in the opening and over the bottom via and the dielectric spacer.

Abstract: The present invention relates to a method for the production of drill holes in difficult to machine materials, in which a removal of material takes place in order to produce a drill hole by electrochemical erosion of material by an electrode that is moved in the longitudinal direction of the drill hole being produced in the direction onto the material to be processed at a feed rate, wherein the drilling has at least two steps, wherein, in the first step, the electrochemical processing takes place, and wherein, in a second step, the further processing of the drill hole to the final diameter takes place by machining processing or by erosion or by an electrochemical processing.

Abstract: A supercapacitor electrode comprises a mixture of graphene sheets and humic acid. The humic acid occupies 0.1% to 99% by weight of the mixture and the graphene sheets are selected from a pristine graphene material having essentially zero % of non-carbon elements, or a non-pristine graphene material having 0.001% to 5% by weight of non-carbon elements. The non-pristine graphene is selected from graphene oxide, reduced graphene oxide, graphene fluoride, graphene chloride, graphene bromide, graphene iodide, hydrogenated graphene, nitrogenated graphene, chemically functionalized graphene, or a combination thereof. The mixture has a specific surface area greater than 500 m2/g.

Abstract: Electrolytic Etching/Deposition System. A system for continuous circuit fabrication comprising means for storing and dispensing the substrate, means for laminating the substrate, means for printing the substrate, means for optical inspection of the substrate, means for photolithography of the substrate, means for drying the substrate, means for developing the substrate, means for washing the substrate and means for electroplating the substrate.

Abstract: The invention provides a method for the recovery of a metal-containing product (MProd) comprising: providing a composite material comprising a matrix of oxidised reductant (RO), a product metal (MP) dispersed in the matrix of oxidised reductant (RO), and one or more metal compounds (MPCR) of the product metal (Mp) in one or more oxidation states dispersed in the matrix of oxidised reductant (RO); and treating the composite material to at least partially remove the one or more metal compounds (MPCR) from the matrix of oxidised reductant (RO) to form the metal-containing product (MProd).

Abstract: A method includes dispensing a chemical solution including charged ions onto a semiconductor substrate to chemically etch a target structure on the semiconductor substrate, and applying an electric field on the semiconductor substrate during dispensing the chemical solution on the semiconductor substrate, such that the charged ions in the chemical solution are moved in response to the electric field.

Abstract: The purpose of the present invention is to further level the amount of polishing during electrolytic polishing of the inside of a hollow pipe. A holding frame for vertically holding a hollow pipe is pivotally supported on a rack so as to be vertically invertible about the vertical center of the hollow pipe. An electrode is inserted through the hollow pipe and a liquid buffer is disposed on each end of the hollow pipe. A valve mechanism is capable of switching a liquid supply/discharge circuit so as to supply an electrolyte via the liquid buffer positioned at the bottom and discharge the electrolyte via the liquid buffer positioned at the top whether it is before or after the inversion of the holding frame (inversion of the hollow pipe). During an electrolyte supply period before and after the inversion, an electrolytic treatment is as a matter of course carried out for a predetermined length of time. Although said switching by the valve mechanism may be manually performed, a control means may also be used.

Abstract: An object is to provide a method for manufacturing an aluminum plate having a plurality of through-holes in a thickness direction in which the locations of the through-holes are controlled and a manufacturing apparatus that is used in the method for manufacturing the aluminum plate. A method for manufacturing an aluminum plate of the present invention is a method for manufacturing an aluminum plate having a plurality of through-holes in a thickness direction, the method including a coating-forming step of forming a coating of an aluminum compound on a surface of an aluminum substrate having a thickness of 5 to 1,000 ?m, a partial coating removal step of removing, out of the coating, the coating present on portions in which the through-holes need to be formed, and a through-hole-forming step of forming the through-holes in the aluminum substrate by carrying out an electrochemical melting treatment on the aluminum substrate after the partial coating removal step.

Abstract: Provided are a heat dissipation material, a method of manufacturing the same, and a battery module including the same. The heat dissipation material according to an embodiment of the present disclosure may include: a plurality of foam pad members provided to be capable of buffering; and a graphite member configured to surround the foam pad member for heat conduction, wherein the graphite member is provided to surround the plurality of foam pad members, respectively.

Abstract: The present invention relates to a graphene-based or other 2-D material membrane which allows the passage of protons and deuterons and to a method of facilitating proton or deuteron permeation through such a membrane. Monocrystalline membranes made from mono- and few-layers of graphene, hBN, molybdenum disulfide (MoS2), and tungsten disulfide (WS2) etc. are disclosed. In effect, the protons or deuterons are charge carriers that pass through the graphene or other 2-D material membrane. This process can be contrasted with the passage of gaseous hydrogen. Hydrogen is an uncharged gaseous species which is diatomic. In other words, the gas is in molecular form when considering the normal barrier properties whereas in the case of the present invention, the species which is being transported through the membrane is a charged ion comprising a single atom. Membranes of the invention find use in a number of applications such as fuel cells.

Abstract: A method of operating an electrochemical machining system includes selectively performing an electrochemical machining process by an electrochemical machine of the electrochemical machining system in a macromachining mode or a micromachining mode by controlling a purity level of a machining liquid supplied to the electrochemical machine.

Abstract: Disclosed is a system for manufacturing an electrode for a secondary battery, which includes an active material drying unit configured to dry an active material coated on an electrode current collector, and a tester unit configured to measure a dried state of the active material by performing a scratch test to the dried active material.

Abstract: A method for improving the performance and/or service life of pistons, wherein at least one PVD coating source includes a target. The coating source is arranged on a wall of the coating chamber and is periodically operated. The target surface to be evaporated is positioned parallel to the vertical axis and the surface sections to be coated are positioned in front of the target surface in the coating region using a holding device. The substrate receiving area is rotated periodically about the rotational axis of the substrate receiving area by a rotary system which is a coupling system, or is arranged on the coupling system, or is a part of the coupling system. The rotational axis and the vertical axis form an angle which is larger than 10° and smaller than 180° such that the coating material reaches each part of the individual surface sections at least once.

Abstract: A method and apparatus for electrochemical etching are disclosed. The method comprises immersing parts of objects (2) to be etched in an electrolyte (4), applying a voltage between the objects (2) and at least one electrode (6) to cause an electrochemical reaction between the objects (2) and the electrolyte (4), and positioning the objects (2) and electrodes (6) relative to each other such that a reaction product accumulates on the objects (2) during the reaction to reduce the rate of the reaction.

Abstract: The invention relates to a removable electro-mechanical device for burnishing and smoothing metal parts, said device comprising: a tank (2) containing an electrolytic solution and the cathode (c); a main body (3) which closes the tank (2), and in which the electrical contacts (6), the mechanical components and the drive systems (5) are incorporated, said drive systems being located in the lower portion of the main body (3) and being vertically and radially secured to a part (7) such that, in addition, when said body (3) is coupled to the tank (2), they remain immersed in the solution; and a detachable head (4) that can be coupled to the main body (3) and includes an electric motor (14) linked to a rotating body (15) and a removable, coupleable, rod-shaped supporting structure (41) or anode (a) having securing means (42) for the parts to be treated, and being disposed in such a way that, when said head (4) is coupled to the main body (3), the parts remain immersed in said solution.

Abstract: According to one embodiment of this disclosure a core includes a first end and a second end spaced generally opposite from the first end. The core further includes a stacking axis defined between the first end and second end and a first toroidal structure located between the first end and the second end. The first toroidal structure includes a first passage extending through the first toroidal structure in a first direction that is perpendicular to and passes through the stacking axis. The core also includes a second toroidal structure located between the first toroidal structure and the second end. The second toroidal structure includes a second passage extending through the second toroidal structure in a second direction. The first direction and the second direction are oriented along the stacking axis at a non-zero degree angle with respect to each other.

Abstract: A method of forming one or more protrusions on an outer surface of a polished face of a solid state material, said method including the step of applying focused inert gas ion beam local irradiation towards an outer surface of a polished facet of a solid state material in a way of protruding top surface material; wherein irradiated focused inert gas ions from said focused inert gas ion bean penetrate the outer surface of said polished facet of said solid state material; and wherein irradiated focused inert gas ions cause expansive strain within the solid state crystal lattice of the solid state material below said outer surface at a pressure so as to induce expansion of solid state crystal lattice, and form a protrusion on the outer surface of the polished face of said solid state material.

Abstract: In order to improve a method for decoating of ceramic hard material layers from steel and cemented carbide substrates having a ceramic hard material layer on part of the surface thereof and to make it amenable to further applications, it is proposed that the workpieces (10) to be decoated be inserted—preferably with a part thereof without a ceramic hard material layer—into guard elements, preferably protective plugs, which fit in diameter and height, and be pressed into a holder (50), the holder with the workpieces (10) to be decoated be contacted with the plus pole of the current pulse driver, an either acidic or basic electrolytic bath be selected, the contacted holder be placed into the selected electrolytic bath (30), at least one electrode (20) be positioned at a predetermined distance from the holder and the latter be contacted with the negative pole of the power pulse generator (40), the decoating is performed by means of the current pulse driver, with endpoint detection being performed continuously or

Abstract: A method is provided for fabricating a nanopore in a membrane. The method includes: applying an electric potential across the membrane, where value of the electric potential is selected to induce an electric field which causes a leakage current across the membrane; monitoring current flow across the membrane while the electric potential is being applied; detecting an abrupt increase in the leakage current across the membrane; and removing the electric potential across the membrane in response to detecting the abrupt increase in the leakage current.

Abstract: A method for electrochemically processing a workpiece surface using an electrode, which has at least one effective surface for processing the workpiece surface, and using an electrolyte, wherein the electrolyte is suctioned away from the effective surface. The invention further relates to an electrode, which has at least one electrolyte feed for supplying the electrolyte to the effective area and an electrolyte suctioning system for suctioning the electrolyte away from the effective area.

Abstract: Manufacturing an exterior décor panel for a home appliance includes laminating a photosensitive dry film on a front surface of a metal sheet, the photosensitive dry film having a higher etch resistance than the metal sheet against an electrolytic solution, photo-masking the photosensitive dry film attached to the metal sheet to create a pattern having a minimum width of 0.1 mm in the photosensitive dry film to thereby expose the front surface of the metal sheet corresponding to the pattern in the photosensitive film, electrolytic-polishing the photo-masked metal sheet by dipping the photo-masked metal sheet in an electrolytic bath to allow the electrolytic solution to contact the exposed front surface of the metal sheet and form the pattern in the front surface of the metal sheet, and performing post-treatment on the metal sheet, the post-treatment including washing and removing the photosensitive dry film.

Abstract: An electro discharge machining apparatus comprises an electrode configured to machine a desired feature in a workpiece, a pulse generator configured to energize the electrode and the workpiece to opposite electrical polarities, a machining solution source configured to pass a machining solution between the electrode and the workpiece, and a servomotor configured to drive the electrode to move relative to the workpiece. The electro discharge machining apparatus further comprises at least one detection element configured to detect machining signals, and a controller. The controller controls the pulse generator and the servomotor to machine the workpiece according to a plurality of first process parameters predetermined therein and analyzes the detected machining signals to generate a first response signal to activate a plurality of second process parameters predetermined therein and different from the first process parameters to machine the workpiece. An electro discharge machining method is also presented.

Abstract: A method for wetting a nanopore device includes filling a first cavity of the nanopore device with a first buffer solution having a first potential hydrogen (pH) value, filling a second cavity of the nanopore device with a second buffer solution having a second pH value, wherein the nanopore device includes a transistor portion having a first surface, an opposing second surface, and an orifice communicative with the first surface and the second surface, the first surface partially defining the first cavity, the second surface partially defining the second cavity, applying a voltage in the nanopore device, and measuring a current in the nanopore device, the current having a current path partially defined by the first cavity, the second cavity, and the orifice.

Abstract: A method for wetting a nanopore device includes filling a first cavity of the nanopore device with a first buffer solution having a first potential hydrogen (pH) value, filling a second cavity of the nanopore device with a second buffer solution having a second pH value, applying a voltage in the nanopore device, and measuring a current in the nanopore device, the current having a current path partially defined by the first cavity, the second cavity, and an orifice communicative with the first cavity and the second cavity.

Abstract: A method for etching Carbon Nanotube (CNT) sheet material for electrical circuit and thin film thermal structures. The method includes: forming an mask on a sheet of electrically conductive CNT material; and electrochemically removing unmasked portions of the CNT material.

Abstract: A method of transferring graphene includes depositing graphene on a side of at least one metal substrate to provide a metal substrate-graphene layer, stacking a target substrate on a side of the metal substrate-graphene layer to provide a stacked structure in which a side of the target substrate faces the graphene layer, and exposing the stacked structure to an electrolysis bath to remove the metal substrate and transfer the graphene onto the side of the target substrate.

Abstract: An example component finishing method includes immersing a surface of a component within a fluid during a finishing process. The method heats fluid near the surface during the finishing to create a convection current within the fluid that carries a byproduct of the finishing away from the surface.

Abstract: Provided are a heat-absorbing material having high heat resistance and high wavelength selectivity, and a process for producing the same. The heat-absorbing material includes: a heat-resistant metal having the substantially same periodic structure in the light incidence plane as the wavelength of sunlight having a specific wavelength in the wavelength regions of visible light and near-infrared rays; and a cermet formed on the light incidence plane of the heat-resistant metal. Thus, there can be achieved desirable absorption and radiation characteristics being such that absorption is performed in the visible light region meanwhile reflection is performed in the infrared region. Furthermore, the cermet does not need complicated film-formation control, and therefore, the high heat resistance can be maintained.

Abstract: A method for producing a multilayer component (21) is specified, which involves providing a body having dielectric layers (3) arranged one above another and first and second electrically conductive layers (4, 84, 5, 85) arranged therebetween. The first conductive layers (4, 84) are connected to a first auxiliary electrode (6) and the second conductive layers (5, 85) are connected to a second auxiliary electrode (7). The body (1, 81) is introduced into a medium and a voltage is applied between the first and second auxiliary electrodes (6, 7) for producing a material removal. Furthermore, a multilayer component is specified, which has depressions (20) formed by an electrochemically controlled material removal.

Abstract: Methods of forming a cutting element include disposing a volume of polycrystalline material adjacent a liquid electrolytic solution and applying an electrical between the polycrystalline material and a cathode in contact with the liquid electrolytic solution to increase an oxidation state of the metal catalyst material. The polycrystalline material includes interbonded grains of hard material and metal catalyst particles in the interstitial spaces between adjacent grains of hard material. Some methods include forming a barrier over a portion of a surface of a volume of polycrystalline material.

Abstract: Disclosed is a liquid processing jig for performing a predetermined processing on a workpiece using a processing liquid. The liquid processing jig includes: a liquid processing unit formed on a surface of the liquid processing jig and configured to perform a predetermined processing on the workpiece by the processing liquid; a liquid supplying unit configured to supply the processing liquid to the liquid processing unit; a liquid supplying channel configured to connect the liquid supplying unit and the liquid processing unit and supply the processing liquid from the liquid supplying unit to the liquid processing unit; and a liquid discharging channel configured to discharge the processing liquid from the liquid processing unit. The liquid supplying unit, the liquid supplying channel, the liquid processing unit, and the liquid discharging channel are provided to cause the processing liquid to flow by a capillary phenomenon.

Abstract: A method of manufacturing an article (such as a dental restoration) comprising taking an article, comprising at least one product (such as a dental restoration), in an initial state, formed from a powdered material, layer-by-layer and electrochemically processing at least a select region of the at least one product (such as a dental restoration) so as to smoothen at least said select region.

Abstract: For electrolytically etching the surfaces of integrally bladed rotors (blisks) (6) made of nickel-base material for aircraft gas turbines, auxiliary cathodes (10), in addition to the main cathodes (3) provided in the electrolyte (1), are arranged in the area of the blades (9) remote from the electric contact points at the rotor disk (7). The auxiliary cathodes are adaptable in shape, arrangement and size to the blade and disk geometry, so that a uniform current flow from all parts of the rotor connected as anode via the electrolyte to the main and auxiliary cathodes is produced and an intense and uniform etching effect is achieved. This ensures a reliable structural assessment in all rotor areas and in particular also in the area of the integral blading.

Abstract: Processes and systems for electrolytically processing a microfeature workpiece with a first processing fluid and an anode are described. Microfeature workpieces are electrolytically processed using a first processing fluid, an anode, a second processing fluid, and a cation permeable barrier layer. The cation permeable barrier layer separates the first processing fluid from the second processing fluid while allowing certain cationic species to transfer between the two fluids. The described processes produce deposits over repeated plating cycles that exhibit deposit properties (e.g., resistivity) within desired ranges.

Abstract: Disclosed are pre-wetting apparatus designs and methods. These apparatus designs and methods are used to pre-wet a wafer prior to plating a metal on the surface of the wafer. Disclosed compositions of the pre-wetting fluid prevent corrosion of a seed layer on the wafer and also improve the filling rates of features on the wafer.

Abstract: The invention relates to an aluminum alloy lithographic sheet product having an enhanced electrolytic graining response in which Zn between 0.5 and 2.5 wt % is added to an aluminum base alloy, in particular an alloy of the 1XXX, 3XXX or 5XXX series alloys. The invention also relates to a method of producing a lithographic sheet product.

Abstract: A method of removing a metal detail from a dielectric material of an article may include placing the article in an electrolyte bath such that at least a portion of the metal detail is submerged. The metal detail may be coupled to a dielectric material. The method may further include positioning at least one cathode in the electrolyte bath in spaced relation to the metal detail, and passing electrical current through the metal detail. The method may additionally include deplating the metal detail from the dielectric material in response to passing the electrical current through the metal detail.

Abstract: A method includes rotating a first motor part around a first structure substantially similar to a second motor part. The method also includes applying a first current to the first structure to electro-chemically machine the first motor part.

Abstract: An apparatus and a method for selectively etching an encapsulant forming a package of resinous material around an electronic device includes an electronic device package mountable on the etch head; a conductive electrode in electrical contact with package leads of the electronic device package to apply a first voltage to the package leads of the electronic device; a first pump configured to pump a first quantity of the etchant solution from the source into the etch head where the etchant solution is electrically biased to a second voltage different from the first voltage. An etch cavity is formed on an exterior surface of the electronic device package. When the etchant solution has etched through an exterior surface of the electronic device package, the conductive bond wires of the electronic device is prevented from being etched by the applied first voltage.

Abstract: A tool holder with a main part, a deformable receiving portion for clamping a tool, and at least one blocking element which is designed to engage into a corresponding counter element on the tool in order to prevent the tool from moving axially out of the tool holder. The at least one blocking element is integrally formed with the receiving portion. A clamping system having such a tool holder and a method for producing a receiving portion for such a tool holder are also described.

Abstract: The present invention provides a continuous machining system and the machining method thereof. The machining system comprises a feeding module, an electrochemical machining module, and a separating module. The feeding module supplies a material strip continuously; the electrochemical machining module performs an electrochemical machining to the material strip. When the feeding module supplies the material strip to the electrochemical machining module continuously, the electrochemical machining module performs the electrochemical machining to the material strip continuously for forming continuously a plurality of components on the material strip. The separating module separates the plurality of components from the material strip. Thereby, the machining time is saved, and thus achieving the purposes of continuous machining and mass production.

Abstract: A method for manufacturing a microchannel cooling passage in a surface of a machine component that includes: forming an elongated open channel in the surface of the machine component, the open channel comprising a cross-sectional profile having a mouth and a floor, and, defined therebetween, a middle region; inserting a corresponding elongated electrode having a directional bias into the channel; and using the electrode as a tooling piece in an electrochemical machining process, widening the middle region of the open channel.

Abstract: A method of manufacturing a component comprises forming a component on a conductive build plate. The component defines at least one access port and includes an inner surface that defines at least one internal passage. The method further includes forming at least one electrode within the at least one internal passage, wherein the at least one electrode is electrically isolated from the component. An electromotive force is applied to the at least one electrode to facilitate smoothing the inner surface.

Abstract: Provided is a particle that includes a first porous region and a second porous region that differs from the first porous region. Also provided is a particle that has a wet etched porous region and that does have a nucleation layer associated with wet etching. Methods of making porous particles are also provided.

Abstract: A method for electropolishing a medical device includes moving a plunger mechanism towards a side of the medical device to establish electrical contact between the medical device and an anode, the plunger mechanism moving transversely to a longitudinal axis of the medical device. Electropolishing the medical device following positioning the plunger mechanism and medical device and then removing the medical device and the anode from the electrolytic bath and unloading the medical device from the anode following electropolishing.

Abstract: A process for creating porous anode foil for use in an electrolytic capacitor of an implantable cardioverter defibrillator is provided. The process includes electrochemical drilling a plurality of etched metal foils in sequence one after the other in a bath containing electrochemical drilling (ECD) solution initially having a pH of less than 5. Alternatively, an etched foil sheet may be passed through the bath in a substantially continuous manner such that a portion of said etched foil sheet is in contact with the ECD solution is electrochemically drilled to generate pores.

Abstract: The present invention provides a method for etching graphene using a DNA sample of a predetermined DNA shape. The DNA sample is preferably placed onto a reaction area of a piece of highly oriented pyrolytic graphite (HOPG), and both the DNA sample and HOPG are then preferably placed into a humidity-controlled chamber. Humidity is preferably applied to the HOPG to produce a film of water across the surface of the DNA sample. Electrical voltage is also applied to the HOPG to create potential energy for the etching process. After the etching is completed, the reaction area is typically rinsed with deionized water.