Gap Maintenance Or Defined Tool-workpiece Gap Patents (Class 205/652)
  • Patent number: 6652658
    Abstract: A method for clean processing wherein an object and a high pressure nozzle are disposed a specific distance apart from each other inside a washing tank containing only ultra-pure water, an ion exchange material or catalyst material that increases the amount of hydroxide ions is provided between the processing surface of said workpiece and the distal end of the high pressure nozzle facing said surface, a voltage is applied using the high pressure nozzle as the cathode and the object as the anode and the hydroxide ions produced from the ultra-pure water are supplied to the surface of the object.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: November 25, 2003
    Assignee: Japan Science and Technology Corporation
    Inventors: Yuzo Mori, Toshio Ishikawa
  • Publication number: 20030205483
    Abstract: The invention is an electrochemical method for producing trenches for trench capacitors in p-doped silicon with a very high diameter/depth aspect ratio for large scale integrated semiconductor memories. Trenches (macropores) having a diameter of less than about 100 nm and a depth of more than 10 &mgr;m can be produced on p-doped silicon having a very low resistivity at a high etching rate, and thus, trench capacitors can be fabricated in a cost-effective manner.
    Type: Application
    Filed: May 12, 2003
    Publication date: November 6, 2003
    Inventors: Albert Birner, Dirk Schumann, Matthias Goldbach
  • Publication number: 20030205477
    Abstract: An electrode assembly arrangement for improving an electrodeposition process and method for using the same the electrode assembly arrangement including a first electrode assembly and a second electrode assembly positioned to carry a metal containing electrolyte from the first electrode assembly to the second electrode assembly for deposition of the metal upon applying an electrical potential therebetween; at least one additional electrode assembly including a means for selectively applying an electrical potential thereto the at least one additional electrode assembly positioned to attract an electrolyte flow upon applying an electrical potential between the at least one additional electrode assembly and the second electrode assembly.
    Type: Application
    Filed: May 6, 2002
    Publication date: November 6, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Shih-Wei Chou, Ming-Hsing Tsai
  • Patent number: 6620307
    Abstract: A method for on-line removal of cathode depositions during electrochemical process. The process control unit (30) is arranged to alternate the unipolar machining voltage pulses U1 with the voltage pulses of opposite polarity U2 to the work piece (2) and the cathode (3). The process control unit comprises an arrangement to determine the amount of cathode depositions on-line based on the operational parameter. Only in case the operational parameter exceeds the allowable level, the process control unit (30) alternates the unipolar machining voltage pulses U1 with the voltage pulses of opposite polarity U2. In this case the cathode wear is minimized.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: September 16, 2003
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Alexandr Zaitsev, Nasich Zijatdinovich Gimaev, Voctor Kutsenko, Nailya A. Amirchanova, Aleksandr Leonidovich Belogorsky, Natalya Markelova, Rafail Ramzisovich Muchutdinov, Maarten Brussee
  • Patent number: 6602396
    Abstract: An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: August 5, 2003
    Assignees: Ebara Corporation
    Inventors: Yuzo Mori, Mitsuhiko Shirakashi, Takayuki Saito, Yasushi Toma, Akira Fukunaga, Itsuki Kobata
  • Publication number: 20030121797
    Abstract: An apparatus is provided for depositing and polishing a material layer on a substrate. In one embodiment, an apparatus is provided which includes a basin, a cover, a permeable disc, an anode and a polishing head. The permeable disc is disposed in the basin between the cover and the basin's bottom. The cover has an aperture disposed therein that includes a plurality of pins. The pins extend radially into the aperture and are adapted to support the substrate. The anode is disposed in the basin between the disc and the bottom of the basin. The polishing head is adapted to retain the substrate during processing and includes a retaining ring. The retaining ring has a plurality of grooves disposed therein that mate with the pins when the polishing head is disposed in the aperture. When the substrate is biased via the pins, the potential between the substrate and the anode causes material to be deposited on the substrate's surface.
    Type: Application
    Filed: January 26, 2001
    Publication date: July 3, 2003
    Applicant: Applied Materials, Inc.
    Inventors: Shijian Li, Stan D. Tsai, Lizhong Sun
  • Patent number: 6562226
    Abstract: An electrochemical machining process gives a workpiece such as a honeycomb panel a 3-dimensional profile form having a varying cross-section perpendicular to an axis of the profile form. In the process an electrode is maintained in a constant position relative to the axis and the surface of the profile form is exposed differentially to the action of the electrode in the axial direction to vary the amount of material removal and so vary the cross-section.
    Type: Grant
    Filed: July 30, 2001
    Date of Patent: May 13, 2003
    Assignee: Anglia Polytechnic University
    Inventor: Hassan Shirvani
  • Publication number: 20030010651
    Abstract: For an electromechanical machining of a work piece there is an optimal pulse duration for the machining pulses corresponding to the maximum copying accuracy. Such an optimal pulse duration corresponds to a certain value of the gap. By alternating the machining pulses with measurement pulses it is possible to obtain an accurate information about the gap dimensions on-line during the electrochemical machining process. The process control means (20) are used to automate the electromechanical machining, while keeping it in the optimal mode. For this purpose the process control means (20) comprise the pulse control unit (26) to establish the pulse duration of the voltage pulses to be applied across the gap (4).
    Type: Application
    Filed: May 7, 2002
    Publication date: January 16, 2003
    Inventors: Alexandr Zaitsev, Sergey Bezroukov, Igor Leonidovich Agafonov, Aleksandr Leonidovich Belogorsky, Maxim Smirnov, Vladimir Zhitnikov
  • Publication number: 20030010650
    Abstract: A method for on-line removal of cathode depositions during electrochemical process. The process control means (30) are arranged to alternate the unipolar machining voltage pulses U1 with the voltage pulses of opposite polarity U2 to the work piece (2) and the cathode (3). The process control means comprise an arrangement to determine the amount of cathode depositions on-line based on the operational parameter. Only in case the operational parameter exceeds the allowable level, the process control means (30) alternate the unipolar machining voltage pulses U1 with the voltage pulses of opposite polarity U2. In this case the cathode wear is minimized.
    Type: Application
    Filed: May 6, 2002
    Publication date: January 16, 2003
    Inventors: Alexandr Zaitsev, Nasich Zijatdinovich Gimaev, Voctor Kutsenko, Nailya A. Amirchanova, Aleksandr Leonidovich Belogorsky, Natalya Markelova, Rafail Ramzisovich Muchutdinov, Maarten Brussee
  • Patent number: 6488834
    Abstract: A razor blade sharpener utilising the principles of an electrochemical cell. The blade (10) forms an anode (−) and a cathodic plate (16) is provided in close proximity to the razor edge (12) to be sharpened. The present invention electrochemically sharpens the edge (12) of the blade tip (14) to provide a fresh, or “as new” razor blade. The blade sharpener has additional uses for sharpening, for example, kitchen knifes and surgical blades.
    Type: Grant
    Filed: August 9, 2000
    Date of Patent: December 3, 2002
    Inventor: Clive Alan Francis
  • Patent number: 6482307
    Abstract: Deposition of conductive material on or removal of conductive material from a wafer frontal side of a semiconductor wafer is performed by providing an anode having an anode area which is to face the wafer frontal side, and electrically connecting the wafer frontal side with at least one electrical contact, outside of the anode area, by pushing the electrical contact and the wafer frontal side into proximity with each other. A potential is applied between the anode and the electrical contact, and the wafer is moved with respect to the anode and the electrical contact. Full-face electroplating or electropolishing over the wafer frontal side surface, in its entirety, is thus permitted.
    Type: Grant
    Filed: December 14, 2000
    Date of Patent: November 19, 2002
    Assignee: NuTool, Inc.
    Inventors: Jalal Ashjaee, Boguslaw A. Nagorski, Bulent M. Basol, Homayoun Talieh, Cyprian Uzoh
  • Patent number: 6423206
    Abstract: To avoid or minimize the occurrence of cross streaks or current streaks on a substrate that is transported through an electrolytic bath and roughened electrochemically in it, the current density is regulated in the electrolyte between a first alternating or three-phase current electrode and the substrate in such a way that at the beginning of a roughening zone, the current density has a lesser value than within the roughening zone, in the transport direction of the substrate. Downstream of the first alternating or three-phase current electrode, either a further alternating current electrode or a further three-phase current electrode acts on the substrate. In a preferred embodiment, the first alternating or three-phase current electrode has a rounded outline, which is composed of a curved portion and adjoining it a straight portion.
    Type: Grant
    Filed: March 1, 2000
    Date of Patent: July 23, 2002
    Assignee: Agfa-Gevaert N.V.
    Inventors: Georg Haby, Raimund Haas, Uwe Gartmann, Günter Hultzsch, Klaus Joerg, Jörg Kaden, Hermann Idstein
  • Patent number: 6398941
    Abstract: A method of shaping a tool comprises the steps of defining a shape of an article to be formed with the tool as a plurality of first elements; defining an initial shape of the tool as a plurality of second elements; determining an electric potential of each of the first and second elements; determining an equipotential line between the article and the initial shape of the tool based on the electric potential of the first and second elements; and forming the tool to have a shape coincident with the equipotential line.
    Type: Grant
    Filed: June 13, 1997
    Date of Patent: June 4, 2002
    Assignee: General Electric Company
    Inventor: Bin Wei
  • Patent number: 6368493
    Abstract: An anode as a workpiece, and a cathode opposed to the anode with a predetermined spacing are placed in ultrapure water. A catalytic material promoting dissociation of the ultrapure water and having water permeability is disposed between the workpiece and the cathode. A flow of the ultrapure water is formed inside the catalytic material, with a voltage being applied between the workpiece and the cathode, to decompose water molecules in the ultrapure water into hydrogen ions and hydroxide ions, and supply the resulting hydroxide ions to a surface of the workpiece, thereby performing removal processing of or oxide film formation on the workpiece through a chemical dissolution reaction or an oxidation reaction mediated by the hydroxide ions. Thus, clean processing can be performed by use of hydroxide ions in ultrapure water, with no impurities left behind on the processed surface of the workpiece.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: April 9, 2002
    Assignees: Ebara Corporation
    Inventors: Yuzo Mori, Mitsuhiko Shirakashi, Takayuki Saito, Yasushi Toma, Akira Fukunaga, Itsuki Kobata
  • Patent number: 6355156
    Abstract: An electrochemical machining process is monitored by embedding an ultrasonic sensor in an electrochemical machining tool to provide a tool assembly, placing the tool assembly in a spatial relationship with a workpiece, disposing an electrolytic fluid at least in a gap between the tool and the workpiece, connecting the tool and the workpiece to an electrical power source, generating an acoustic wave from the ultrasonic sensor to propagate through the electrolytic fluid to the workpiece and reflect back from the workpiece, and, based on the propagation and reception of the acoustic wave, calculating measurement of at least the size of the gap or the thickness of the workpiece.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: March 12, 2002
    Assignee: General Electric Company
    Inventors: Wei Li, Bin Wei, Michael Scott Lamphere
  • Patent number: 6355148
    Abstract: A workholder for an ECM process comprises a set of jaws which define an interior workpiece holding region are mounted on the surface of a diaphragm which is movable under air pressure from a flat to a more generally spheroid shape with the injection of pressurized air between the diaphragm and a backing plate. As the air is injected, and the diaphragm becomes more spheroid, the jaws are moved a substantially equal distance away from the center axis of the workholding region. The workpiece, which typically incorporates or is mounted on a circular shaft, is placed in the center of the workholding region, and the air pressure is removed, causing the diaphragm to return to its original flat shape and the jaws to snap back to their original positions resting against the shaft.
    Type: Grant
    Filed: October 26, 2000
    Date of Patent: March 12, 2002
    Assignee: Seagate Technology LLC
    Inventor: Dustin A. Cochran
  • Publication number: 20020020630
    Abstract: An electrochemical machining apparatus comprises a machining chamber for holding ultrapure water, a cathode/anode immersed in the ultrapure water held in the machining chamber, and a workpiece holding portion for holding a workpiece at a predetermined distance from the cathode/anode so that a surface, to be machined, of the workpiece is brought into contact with the ultrapure waters The electrochemical machining apparatus further comprises an anode/cathode contact brought into contact with the workpiece held by the workpiece holding portion so that the workpiece serves as an anode/cathode, a catalyst having a strongly basic anion exchange function or a strongly acidic cation exchange function, a power source for applying a voltage between the cathode/anode and the workpiece, and a moving mechanism for relatively moving the workpiece and the catalyst. The catalyst is disposed between the cathode/anode and the workpiece held by the workpiece holding portion.
    Type: Application
    Filed: July 5, 2001
    Publication date: February 21, 2002
    Inventors: Yuzo Mori, Mitsuhiko Shirakashi, Yasushi Toma, Itsuki Kobata, Takayuki Saito
  • Patent number: 6325912
    Abstract: This invention provides an apparatus and a method capable of electrolyzing a metal web at a high treating speed and high current density without a problem of uneven treatment, which a metal web is wound, arc-shaped electrodes allocated on the outside of the drum roller concentrically with a space, and an electrolytic solution put in the space, wherein the drum roller is made movable in the vertical direction, and a method using the apparatus.
    Type: Grant
    Filed: February 24, 2000
    Date of Patent: December 4, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tsuyoshi Hirokawa, Toru Yamazaki
  • Patent number: 6315885
    Abstract: The present invention relates to a method of electropolishing aided by ultrasonic means having the capability of rapidly discharging dregs. More specifically, the invention relates to a method of electrochemical polishing process aided by an auxiliary ultrasonic cleaning device which emits ultrasonic vibrating energy to effectively discharge dregs, shorten the polishing cycle time for each workpiece, and improve the surface roughness of the workpiece. The present invention further provides an electropolishing apparatus that can be easily retrofitted to almost every existing machine tool as an auxiliary unit. Alternately, the ultrasonic apparatus can be installed separately as an independent ultrasonic generating unit.
    Type: Grant
    Filed: October 27, 1999
    Date of Patent: November 13, 2001
    Assignee: National Science Council
    Inventor: Hong Hocheng
  • Patent number: 6312584
    Abstract: An apparatus for electrochemically machining of a workpiece by means of an electrode has an actuator for setting a gap between the electrode and the workpiece. The apparatus further has a channel for flushing the gap with an electrolyte and a container for containing the electrolyte. Power cords and are provided for feeding an electric current I supplied by a power supply through the electrolyte in the gap. Near the gap an antenna is provided to pick up electromagnetic waves radiated from the gap. The antenna is connected to a band-pass filter which passes signals in a frequency band of 40 to 100 MHz to a level detector. The level detector compares the amplitude of the filtered signal with a threshold value and supplies a stop signal to the control unit when the amplitude exceeds the threshold value. The control unit is programmed to open a switch in the power supply in response to the stop signal.
    Type: Grant
    Filed: January 12, 1999
    Date of Patent: November 6, 2001
    Assignee: U.S. Philips Corporation
    Inventors: Hermanus S. J. Altena, Anjali K. De Silva
  • Patent number: 6267868
    Abstract: An electrode for use in an electrochemical machining process comprising an outer metal skin of corrosion resistant material, an inner core of conductive material, and an insulating coating disposed on an external surface of the outer metal skin. The external surface is partially coated with the insulating coating so as to define a pattern of raised areas to be formed on an internal surface of a predrilled hole in a workpiece.
    Type: Grant
    Filed: November 22, 1999
    Date of Patent: July 31, 2001
    Assignee: General Electric Company
    Inventors: Bin Wei, Bruce Alan Knudsen, William Thomas Carter, Jr., Hsin-Pang Wang
  • Patent number: 6245212
    Abstract: An apparatus and method for electrochemically machining a texture on a metal bearing component. A ribbon is provided between an electrode and the metal bearing component. The ribbon is flexible, substantially non-conductive and provided with holes. While the ribbon is in direct contact with the metal bearing component, current is passed between the electrode and the metal bearing component. The pattern of the holes in the ribbon determines the pattern electrochemically machined on the surface of the metal bearing component. According to a preferred embodiment the ribbon is an endless belt.
    Type: Grant
    Filed: October 28, 1999
    Date of Patent: June 12, 2001
    Assignee: SKF Engineering and Research Centre B.V.
    Inventors: Hervé Girardin, Carole Michèle Humbert
  • Publication number: 20010001440
    Abstract: A method of shaping a tool comprises the steps of defining a shape of an article to be formed with the tool as a plurality of first elements; defining an initial shape of the tool as a plurality of second elements; determining an electric potential of each of the first and second elements; determining an equipotential line between the article and the initial shape of the tool based on the electric potential of the first and second elements; and forming the tool to have a shape coincident with the equipotential line.
    Type: Application
    Filed: June 13, 1997
    Publication date: May 24, 2001
    Applicant: Bin Wei
    Inventor: BIN WEI
  • Patent number: 6214200
    Abstract: In a method for electrochemical machining, the working distance is set by contacting the workpiece with the electrode, increasing the distance between the workpiece and the electrode by a first distance, detecting whether the contact between the electrode and the workpiece is broken, and further increasing the distance between the workpiece and the electrode by a second distance. Owing to this method, very small working distances can be set with a limited risk of short-circuiting and flash-over.
    Type: Grant
    Filed: April 2, 1999
    Date of Patent: April 10, 2001
    Assignee: U.S. Philips Corporation
    Inventors: Hermanus S. J. Altena, Maarten Brussee, Anton M. Boorsma, Foppe Kramer
  • Patent number: 6203689
    Abstract: An electropolishing apparatus for polishing an inner face of a deep hole of an article comprises a support for holding an article so that the article is maintained to erect in an electrolytic bath, and an electrode to be inserted into a deep hole of the article. The electrode is a hollow member having a through hole formed longitudinally. Electrolyte is supplied into the through hole of the electrode from upside. The electrolyte flows through the through hole of the electrode, a gap between the lower end of the electrode and the bottom of the hole, and another gap to be between an outer face of the electrode and an inner face of the hole. A plurality of removers consisting of nonwoven fabric may be fixed around the electrode. The support and the article rotate, while the electrode moves up and down. Furthermore, a plurality of magnets may be arranged around the article so that a magnetic field is formed in a zone including the article.
    Type: Grant
    Filed: September 23, 1998
    Date of Patent: March 20, 2001
    Assignee: Korea Advanced Institute Science and Technology
    Inventors: Jeong Du Kim, Min Seog Choi
  • Patent number: 6176998
    Abstract: Method of manufacturing a bearing ring (1) for a bearing such as a ball bearing or cylindrical roller bearing, wherein the bearing ring (1) is rotated around an axis (6) and the amount of material removed is controlled by the choice of the cross section of an electrode (3) parallel to the surface of the raceway under the electrode (3). Thus the radius of the groove (2) is kept constant. An electrode with a suitably adapted convex cross section allows for the manufacture of bearing rings within a very narrow specification range. Thus the invention also relates to a bearing comprising an electrochemically machined bearing ring (1) according to the invention having excellent operational life and characteristics.
    Type: Grant
    Filed: July 6, 1999
    Date of Patent: January 23, 2001
    Assignee: SKF Engineering and Research Centre B.V.
    Inventors: Frank Peter Wardle, Herve Girardin
  • Patent number: 6139715
    Abstract: A method and apparatus for deburring or radiusing articles made of TZM alloys by electrochemical machining uses a pulsating current and a binary salt electrolyte solution simultaneously applied across a gap between a tool electrode and a TZM workpiece. The pulse duration is typically in the range between about 0.5 milliseconds to about 100 milliseconds and the pulse interval is between 5 milliseconds and 150 milliseconds. The pulse voltage amplitude is typically in the range between about 8 volts to about 30 volts. The binary salt electrolyte solution is an aqueous salt solution with a total concentration typically in the range between about 14% to about 20% by weight of sodium chloride and sodium nitrate. The ratio of sodium chloride to sodium nitrate is typically in the range of between about 1:1 to about 1.5:1. The standoff distance, or gap, between the tool electrode and the TZM workpiece is typically in the range between 0.015 mm to about 3.0 mm.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: October 31, 2000
    Assignee: General Electric Company
    Inventor: Bin Wei
  • Patent number: 6099715
    Abstract: During continuous electrochemical polishing of a metallic workpiece an electrolyte flows through a cathodic part of a tool into a working gap formed between the cathodic part and the workpiece and leaves it through a discharge channel between the cathodic part and a wall of the tool. Between the tool's wall and the workpiece a clearance is formed bordering the working gap. To avoid flow of the electrolyte from the working gap into the clearance and to discharge fluid from the gap, a chamber is provided which contains an external fluid held under a pre-adjusted pressure, which can be above or below atmospheric pressure in relation to the pressure of the electrolyte in the working gap. The fluid's pressure is adjusted so, that at the beginning of the clearance a barrier against the penetration of electrolyte liquid is formed. At this barrier the electrolyte is separated from the surface of the workpiece alongside a distinctive breakaway edge.
    Type: Grant
    Filed: October 5, 1998
    Date of Patent: August 8, 2000
    Inventor: Fritz-Herbert Frembgen
  • Patent number: 5993637
    Abstract: An electrode structure is constituted by a first electrode, and at least one second electrode providing a pair of opposite portions with a prescribed spacing therebetween at which the first electrode is disposed. The electrode structure is suitably used for electrolytic etching and is effective in providing an accurate etching pattern without damaging the surface of an etching object.
    Type: Grant
    Filed: December 3, 1997
    Date of Patent: November 30, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masaya Hisamatsu, Akio Hasebe, Tsutomu Murakami, Hirofumi Ichinose, Satoshi Shinkura, Yukie Ueno
  • Patent number: 5904831
    Abstract: The invention relates to a method of forming one or more through-holes in a metal workpiece, such as shaving foils or shaving combs, by means of an electrochemical machining apparatus (ECM apparatus). To this end, the method is characterized in that, during machining, the workpiece is provided on a substrate of an electroconductive, electrochemically inert material, such as a noble metal (alloy), in particular a noble metal (alloy) which is predominantly composed of Pt. Preferably, the workpiece is clamped onto the substrate. By virtue of said measures, rounding of the edges between the holes formed and the surface of the workpiece, which is clamped down on the substrate during machining, is reduced substantially. This has a favorable effect on the formation of sharp cutting faces.
    Type: Grant
    Filed: September 4, 1997
    Date of Patent: May 18, 1999
    Assignee: U.S. Philips Corporation
    Inventors: Hermanus S. J. Altena, Maarten Brussee, Foppe Kramer
  • Patent number: 5863412
    Abstract: A method for etching an object having a portion to be etched on the surface thereof, comprising a step of immersing said object in an electrolyte solution such that said object serves as a negative electrode; a step of arranging a counter electrode having a pattern corresponding to a desired etching pattern to be formed at said portion to be etched of said object in said electrolyte solution so as to maintain a predetermined interval between said counter electrode and said object, and a step of applying a direct current or a pulse current between said object and said counter electrode to etch said portion to be etched of said object into a pattern corresponding to said pattern of said counter electrode.
    Type: Grant
    Filed: October 17, 1996
    Date of Patent: January 26, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hirofumi Ichinose, Ippei Sawayama, Akio Hasebe, Tsutomu Murakami, Masaya Hisamatsu, Satoshi Shinkura, Yukie Ueno
  • Patent number: 5833835
    Abstract: Method of electrochemically machining an electrically conductive workpiece (2) in an electrolyte by applying bipolar electric pulses between the workpiece (2) and an electrically conductive electrode (6), one or more current pulses of normal polarity alternating with voltage pulses of opposite polarity. The amplitude (Un) of the voltage pulses is adjusted between two predetermined values (Un1, Un2) derived from the occurrence of a given surface quality of the workpiece (2) and the occurrence of wear of the electrode (6). The derivation is effected by means of at least one test which precedes the machining of the workpiece (2). During the test the amplitude (Un) of the voltage pulses is increased gradually from an initial value to a final value. The two predetermined values (Un1, Un2) are determined upon the occurrence of a sign reversal in the difference between successive values of a parameter which is representative of a property of a gap (5) between the electrode (6) and the workpiece (2).
    Type: Grant
    Filed: July 12, 1996
    Date of Patent: November 10, 1998
    Assignee: U.S. Philips Corporation
    Inventors: Nasich Z. Gimaev, Aleksandr N. Zajcev, Aleksandr L. Belogorskij, Igor L. Agafonov, Naila A. Amirchanova, Viktor N. Kucenko, Rafail R. Muchutdinov
  • Patent number: 5820744
    Abstract: Electrochemical machining (ECM) techniques utilizing real-time parameter monitoring, alarms and feedback control for improved machining of a workpiece are disclosed. The ECM device utilizes one or more cathodes, an electrolyte and a positively charged workpiece to achieve electrolytic action. A number of controlling variables, such as cathode feed rate, electrolyte flow rate and voltage, are balanced in response to measured system parameters. The following parameters are preferably monitored in order to adjust the controlling variables: the drive parameters of feed rate and cathode depth; the pump parameters of flow rate and pressure; and the power components of voltage and current. The flow rate in each of the cathodes, or a corresponding Reynolds number, is preferably utilized to provide an alarm to the operator if a statistically significant change in flow is detected.
    Type: Grant
    Filed: September 30, 1996
    Date of Patent: October 13, 1998
    Assignee: Doncasters, Turbo Products Division
    Inventors: Clifton Vedantus Edwards, Frank P. Simkowski
  • Patent number: 5804052
    Abstract: The invention relates to a method for continuous uniform electrolytic metallizing or etching of metal surfaces, and to a device suitable for carrying out this method. The invention is particularly suitable for treating printed circuit boards and conductive films in installations through which the metal surface being treated passes horizontally. In order to avoid metal coatings of differing thicknesses being deposited on narrow and wide conductor strips in printed circuit boards, according to the present invention operation is with movable, preferably rotating roller-shaped intermediate electrodes, which roll without short circuit at a very close effective distance above the metal surface being treated, or which contact the surface in a wiping manner. These intermediate electrodes are not electrically connected to the source of bath current, thus serving as bipolar electrodes, and are located between the surface being treated and a suitable counter-electrode.
    Type: Grant
    Filed: November 26, 1996
    Date of Patent: September 8, 1998
    Assignee: Atotech Deutschland GmbH
    Inventor: Reinhard Schneider
  • Patent number: 5766446
    Abstract: An electrochemical technique is employed for removing certain material from a partially finished structure without significantly chemically attacking certain other material of the same chemical type as the removed material. The partially finished structure contains a first electrically non-insulating layer (52C) consisting at least partially of first material, typically excess emitter material that accumulates during the deposition of the emitter material to form electron-emissive elements (52A) in an electron emitter, that overlies an electrically insulating layer (44). An electrically non-insulating member, such as an electron-emissive element, consisting at least partially of the first material is situated at least partly in an opening (50) extending through the insulating layer.
    Type: Grant
    Filed: March 5, 1996
    Date of Patent: June 16, 1998
    Assignee: Candescent Technologies Corporation
    Inventors: Christopher J. Spindt, Gabriela S. Chakarova, Maria S. Nikolova, Peter C. Searson, Duane A. Haven, Nils Johan Knall, John M. Macaulay, Roger W. Barton
  • Patent number: 5672263
    Abstract: According to the present invention, a method and apparatus for electrochemically machining a workpiece is provided.
    Type: Grant
    Filed: May 29, 1996
    Date of Patent: September 30, 1997
    Assignee: United Technologies Corporation
    Inventors: David A. Raulerson, Brian J. Schwartz
  • Patent number: 5641391
    Abstract: Embodiments of the present invention provide a new method for producing a three dimensional object, particularly suited to microfabrication applications. The method includes the steps of providing a substrate with a conducting interface, an electrode having a feature or features that are small relative to the substrate, and a solution. The solution has a reactant that will either etch the substrate or deposit a selected material in an electrochemical reaction. The electrode feature is placed close to but spaced from the interface. A current is passed between the electrode and the interface, through the solution, inducing a localized electrochemical reaction at the interface, resulting in either the deposition of material or the etching of the substrate. Relatively moving the electrode and the substrate along a selected trajectory, including motion normal to the interface, enables the fabrication of a three dimensional object.
    Type: Grant
    Filed: May 15, 1995
    Date of Patent: June 24, 1997
    Inventors: Ian W. Hunter, Serge R. Lafontaine, John D. Madden
  • Patent number: 5639363
    Abstract: An apparatus and a method for mirror surface grinding which enables high quality, stable ELID grinding; and a grinding wheel for electrolytic dressing. The apparatus comprises a grinding wheel 3 having a contact surface 2 for contacting a workpiece 1, an electrode 4 facing the surface 2, nozzles 5 for supplying conductive fluid between the grinding wheel 3 and the electrode 4, and a power source 6 and feeder 7 for applying a voltage between the grinding wheel and the electrode 4. The bond material, which is selected from among iron, ferrous metal, cobalt, nickel and combinations of two or more thereof, along with grains and sintering aid are molded together and sintered to obtain the conductive grinding wheel. Next, a conductive water-soluble grinding fluid containing an alkanolamine and anions is supplied between the grinding wheel and the electrode, and a pulse wave voltage is applied between the grinding wheel and the electrode to dress the grinding wheel electrolytically during grinding.
    Type: Grant
    Filed: February 14, 1995
    Date of Patent: June 17, 1997
    Assignee: Rikagaku Kenkyusho
    Inventors: Hitoshi Ohmori, Takeo Nakagawa, Katsuhiko Karikomi
  • Patent number: 5567300
    Abstract: A high speed electrochemical metal removal technique provides for planarization of multilayer copper interconnection in thin film modules. The process uses a neutral salt solution, is compatible with the plating process and has minimum safety and waste disposal problems. The process offers tremendous cost advantages over previously employed micromilling techniques for planarization.
    Type: Grant
    Filed: September 2, 1994
    Date of Patent: October 22, 1996
    Assignee: IBM Corporation
    Inventors: Madhav Datta, Terrence R. O'Toole