Mask Resist Contains A Color Imparting Agent Patents (Class 216/50)
  • Patent number: 8951427
    Abstract: A method for manufacturing electrical and/or optical components, wherein a hot melt composition including an alkane based wax and an amorphous material as a masking material is used. The hot melt composition has a melting point of between 40° C. and 85° C. and a viscosity of between 5 and 20 mPa·s at not less than one temperature within the range of between 50° C. and 140° C. A hot melt composition includes between 40 weight % and 89.9 weight % of an alkane based wax; between 10 weight % and 50 weight % of an amorphous material; and between 0.1 weight % and 10 weight % of a phosphonium based ionic liquid. A system and a method for manufacturing electronic and/or optical components is provided, wherein after the etch processes and/or plating processes, the hot melt composition is removed from the substrate with the aid of hot water.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: February 10, 2015
    Assignee: Oce Technologies B.V.
    Inventors: Björn H. A. J. M. Ketelaars, Hylke Veenstra
  • Patent number: 8303832
    Abstract: A printed mask derived from a composition comprised of at least one compound including at least one alkaline-hydrolyzable group, at least one compound including at least one ethylene oxide group and at least one ultraviolet radiation blocking agent, wherein the printed mask is removable using an alkaline solution in about 30 seconds or less.
    Type: Grant
    Filed: August 17, 2009
    Date of Patent: November 6, 2012
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Francisco E. Torres, Norine E. Chang, Eric J. Shrader, C. Wayne Jaeger
  • Patent number: 7862859
    Abstract: A method of correcting for pattern run out in a desired pattern in directional deposition or etching comprising the steps of providing a test substrate; providing a stencil of known thickness on the test substrate; providing a stencil pattern extending through the stencil to the test substrate.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: January 4, 2011
    Assignee: RFMD (UK) Limited
    Inventor: Jason McMonagle
  • Patent number: 7832935
    Abstract: A bearing (100) has a contact surface (110) for mating with a rotatable member. The contact surface has a plurality of crystalline grains (120) distributed at random; a plurality of micro-grooves (130) are formed among the crystalline grains; the micro-grooves communicate with each other thereby forming a net. The micro-grooves accommodate lubricant therein so that when the rotatable member rotates, a sufficient lubrication can be obtained between the bearing and the rotatable member. The bearing is formed by machining and then thermally etching a preform which is formed by powder metallurgy.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: November 16, 2010
    Assignee: Foxconn Technology Co., Ltd.
    Inventor: Chuen-Shu Hou
  • Patent number: 7771563
    Abstract: A system and method for processing substrates that achieves isothermal and uniform fluid flow processing conditions for a plurality of substrates. In one aspect, the invention is a system and method that utilizes matching the emissivity value of the surfaces of a process chamber that oppose exposed surfaces of the substrates with the emissivity value of the exposed surfaces to achieve isothermal conditions throughout a substrate stack. In another aspect, the invention is system and method of processing substrates in a process chamber that exhibits excellent fluid flow uniformity by eliminating cavities or geometrical irregularities in the process chamber profile due to substrate loading openings. In yet anther aspect, the invention is a system and method of processing substrates wherein the process chamber comprises a liner and a shell, the liner constructed of a highly thermally conductive material, such as carbon, and the shell is constructed of a non-porous material, such as stainless steel.
    Type: Grant
    Filed: November 18, 2004
    Date of Patent: August 10, 2010
    Assignee: Sumitomo Precision Products Co., Ltd.
    Inventors: Robert W. Grant, Benjamin J. Petrone, Paul D. Mumbauer
  • Patent number: 7354519
    Abstract: A method for fabricating a tubular article having a wall structure defined by a selected pattern. The method includes the steps of providing a tube having an outer surface and an inner surface; coating the outer surface with first photosensitive resist; exposing the selected pattern portions of the coated outer surface; developing the first photosensitive resist coated on the outer surface; coating the inner surface with second photosensitive resist; and exposing the tube to an etchant to form a tubular article having the wall structure defined by the selected pattern. The second photosensitive resist is more brittle than the first photosensitive resist when the first and second photosensitive resist are dry. An apparatus for exposing a photosensitive resist-coated tube to laser. The device includes an elongated tubular member having an aperture extending through its wall.
    Type: Grant
    Filed: February 2, 2004
    Date of Patent: April 8, 2008
    Assignee: Hutchinson Technology Incorporated
    Inventors: Steven A. Fank, Kurt C. Swanson, Paul D. Borscheid, Kurt S. Kruckman
  • Publication number: 20070246441
    Abstract: A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin.
    Type: Application
    Filed: April 23, 2007
    Publication date: October 25, 2007
    Inventors: Jin Wuk Kim, Yeon Heui Nam
  • Patent number: 7181838
    Abstract: A method of fabricating identifiable flexible printed circuit board (PCB) disposed to an inkjet cartridge includes, providing a flexible substrate having a first surface. A conductive layer is formed on the first surface. A printing ink layer is coated over the first surface. The printing ink layer is exposed and developed to uncover parts of the conductive layer and form at least one identifiable area on the printing ink layer.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: February 27, 2007
    Assignee: Benq Corporation
    Inventors: Chih-Ching Chen, Yi-Jing Leu
  • Patent number: 6955726
    Abstract: A mask frame assembly includes a frame having an opening and a mask having at least two unit mask elements. Both ends of each unit mask element are fixed to the frame in a state of tension. The unit mask elements include a unit masking pattern, and overlap each other on a predetermined width to form a single mask pattern block. Each unit mask element has a recessed wall in an overlapping portion thereof so as to maintain the thickness of the mask constant at an overlap between the unit mask elements. Accordingly, the mask frame assembly reduces distortion in an evaporation pattern due to an increase in the size of a mask pattern, facilitates the adjustment of a total pitch of evaporation patterns, and prevents evaporation from occurring at undesired positions.
    Type: Grant
    Filed: June 3, 2003
    Date of Patent: October 18, 2005
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Chang Ho Kang, Tae Seung Kim
  • Patent number: 6613243
    Abstract: A method of producing surface features in a substrate includes steps of forming a film having a composition that varies in the direction of its thickness on the substrate, forming a mask on the heterogeneous film, etching the film to thereby pattern the film, and etching the structure that includes the patterned film to erode the film and correspondingly shape the substrate as the film is so being eroded. In this way, the pattern of the film is transferred to the substrate in a manner dependent on the selectivity of one or both of the etching processes as well as the thickness of the discrete mask layers, or in the case of a continuously graded film, the “slope” of the stoichiometric change with respect to position in the overall thickness of the film.
    Type: Grant
    Filed: July 25, 2001
    Date of Patent: September 2, 2003
    Assignee: Shipley Company, L.L.C.
    Inventor: Neal Ricks
  • Publication number: 20030080089
    Abstract: The present invention provides a method of patterning a substrate (30) according to a predetermined path, said method including forming a liquid film (134) on the substrate surface and directing laser energy from a laser (10) through the film (134) to etch the substrate surface, wherein etched material is carried away from the substrate surface via evaporation of the film during said etching.
    Type: Application
    Filed: February 21, 2002
    Publication date: May 1, 2003
    Inventors: Wen Dong Song, Minghui Hong, Yong Feng Lu
  • Patent number: 5895582
    Abstract: The present invention relates to a glass substrate for a thin film magnetic data storage disk and to a process for producing such a glass substrate. The process includes the steps of: (a) providing a glass substrate; (b) printing a regular masking pattern of printed dots onto at least a portion of the surface of the substrate; and (c) etching the unmasked surface of the substrate thereby to texture the substrate surface. The glass substrate for a thin film magnetic data storage disk has a roughened surface produced by preferential area etching, the roughened surface being composed of a regular pattern of peaks separated by valleys.
    Type: Grant
    Filed: July 8, 1993
    Date of Patent: April 20, 1999
    Assignee: Pilkington plc
    Inventors: Christopher John Wilson, Paul Andrew Marshall
  • Patent number: 5679460
    Abstract: The invention relates to a method for modifying at least a part of the surface of a fluorine-containing plastic, which comprises making the surface hydrophobic by 1) ion-etching the plastic surface; and 2) subsequently treating the plastic surface with flow discharging. The invention also relates to a fluorine-containing plastic having a surface which is at least partially hydrophobe-modified by ion-etching followed by glow discharging, and to materials, such as bio-materials, in which the plastic is incorporated.
    Type: Grant
    Filed: March 15, 1994
    Date of Patent: October 21, 1997
    Assignee: Rijksuniversiteit Groningen
    Inventors: Josephus Maria Schakenraad, Hendrik Jan Busscher
  • Patent number: 5593602
    Abstract: The present invention provides a process for producing a metal substrate for a thin film magnetic data storage disc, the process including the steps of: (a) providing a metal substrate; (b) printing a masking pattern onto at least a portion of the surface of the substrate; and (c) etching the unmasked surface of the substrate thereby to texture the substrate surface. The present invention also provides a metal substrate for a thin film magnetic data storage disc, the substrate having a roughened surface produced by preferential area etching, the roughened surface being composed of a regular pattern of peaks separated by valleys.
    Type: Grant
    Filed: March 1, 1994
    Date of Patent: January 14, 1997
    Assignee: Pilkington PLC
    Inventors: Richard Gelder, John M. Bradshaw
  • Patent number: 5580604
    Abstract: A method of manufacturing a hot-stamped decal includes step A: preparing a metalized polyester film including a metalized layer disposed on a top surface thereof, a clear polyester sheet disposed to an under side of the metalized layer, an adhesive layer disposed to an under side of the clear polyester sheet and a release sheet disposed to an under side of the adhesive layer, step B: applying a printing process on the metalized layer to form a mark thereon composed of a printed ink layer, step C: preparing an alkaline corrosive solution, step D: flushing the top surface of the metalized layer with the alkaline solution composed of water and NaOH to the top surface of the metalized layer to corrode the metalized layer not covered by the printing ink layer, step E: flushing the top surface of the metalized layer with water and step F: drying the hot-stamped decal.
    Type: Grant
    Filed: March 6, 1995
    Date of Patent: December 3, 1996
    Inventor: Chih C. Chang
  • Patent number: 5499731
    Abstract: The present invention relates to a process for producing a substrate for a thin film magnetic data storage disc, the process including the steps of:- (a) providing a substrate; (b) printing a masking pattern of ink dots onto at least a portion of the surface of the substrate by an offset printing process in which the ink to form the masking pattern is transferred from a printing plate to the substrate by an offset printing member and wherein on transfer from the printing plate to the offset member the ink fragments into the ink dots; and (c) etching the unmasked surface of the substrate thereby to texture the substrate surface. The present invention also relates to a substrate for a thin film magnetic data storage disc, the substrate having a roughened surface composed of peaks separated by valleys produced by preferential area etching, the peaks being grouped into a plurality of substantially circular sub-arrays with the sub-arrays forming a regular pattern.
    Type: Grant
    Filed: January 6, 1995
    Date of Patent: March 19, 1996
    Assignee: Pilkington plc
    Inventor: Paul A. Marshall