Arc Ignition Patents (Class 219/121.57)
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Patent number: 7919732Abstract: The invention relates to a method and a circuit for igniting a gas flow in a fully automatic manner. The aim of the invention is to maintain the necessary current consumption so low that an integratable voltage source can be used. To this end, once an electronic control unit has been activated, a thermoelectric safety pilot valve (2) is opened by an electromagnet which is temporarily excited by a rush of current, is maintained in the open position by a safety pilot magnet (6) by means of a holding current provided by a voltage source (10), and the escaping gas is ignited. Once a thermoelectric couple (4) is provided for the necessary holding current, the voltage source (10) is switched off. In the event of damage, the method is automatically interrupted.Type: GrantFiled: February 12, 2004Date of Patent: April 5, 2011Assignee: Mertik Maxitrol GmbH & Co., KGInventors: Jürgen Blank, Barbara Happe
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Patent number: 7915563Abstract: An arc detector is provided for a plasma processing system including a HF power source, a plasma processor, and a voltage/current signal detector. The arc detector includes a calculator for the phase difference between the AC voltage signal and the AC current signal, a calculator for an effective voltage based on the AC voltage signal, a calculator for an effective current based on the AC current signal, an FFT processor for the frequency spectrum of the AC voltage or current signal, and an arc analyzer connected to the phase difference calculator, effective voltage calculator, effective current calculator, and FFT processor. The arc analyzer calculates the plasma processor's impedance based on the calculated phase difference, effective voltage, and effective current. The arc analyzer monitors arcs in the plasma processor, based on the fluctuation rate of the calculated impedance and the output level of a frequency component in the spectrum.Type: GrantFiled: September 28, 2007Date of Patent: March 29, 2011Assignee: DAIHEN CorporationInventor: Ryohei Tanaka
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Patent number: 7807937Abstract: A system for conserving a consumable component of a plasma torch is disclosed. The system includes a controller of a plasma torch that is connected to a power source. The controller is configured to, during a single trigger actuation, delay generation of an arc after a prior arc collapses. Such a control allows the consumable components of the plasma torch to cool prior to subsequent operation.Type: GrantFiled: January 3, 2005Date of Patent: October 5, 2010Assignee: Illinois Tool Works Inc.Inventor: Joseph C Schneider
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Patent number: 7750265Abstract: A plasma apparatus is provided including a cathode module, an anode module, and at least one inter-electrode insert located between the cathode module and the anode module. The cathode module includes at least one cathode, and a pilot module may be provided adjacent to the cathode module. The pilot module may assist ignition of the plasma apparatus. The inter-electrode insert may have an upstream and a downstream transverse surface. Both the upstream transverse surface and the downstream transverse surface are angled in a downstream direction.Type: GrantFiled: November 24, 2004Date of Patent: July 6, 2010Inventor: Vladimir Belashchenko
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Patent number: 7679025Abstract: An apparatus for the formation of a dense plasma focus (DPF) has a center electrode formed about an axis, where the center electrode includes a cylindrical part and a tapered part. An outer electrode is formed about the center electrode, and may be either cylindrical, tapered, or formed from a plurality of individual conductors including a helical conductor arrangement surrounding the tapered region of the center conductor. The taper of the center electrode results in an enhanced azimuthal B field in the final region of the device, resulting in increased plasma velocity prior to the dense plasma focus. Using the outer electrode helical structure an auxiliary axial B field is generated during the final acceleration region of the plasma, which reduces axial modal tearing of the plasma in the final acceleration region.Type: GrantFiled: February 4, 2005Date of Patent: March 16, 2010Inventors: Mahadevan Krishnan, John R. Thompson
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Patent number: 7679026Abstract: Efficient static neutralization of an electrostatically charged object that has a varying distance from an ion generating source, a varying velocity, a large dimension or any these is achieved by using an ionizing cell or bar having a first electrode and a second electrode. The first electrode for receiving a multi-frequency voltage that has a waveform, and the second electrode separated from the first electrode by a first distance and for use as a reference electrode. The waveform is adjusted during neutralization of a moving object based on at least one attribute of the object.Type: GrantFiled: January 15, 2007Date of Patent: March 16, 2010Assignee: MKS Instruments, Inc.Inventors: Peter Gefter, Scott Gehlke
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Patent number: 7638734Abstract: The invention relates to a method for the contactless ignition of a welding arc, in addition to a circuit (28) for the contactless ignition of an electric arc, comprising a charging circuit (31), at least one pulse capacitor (30), a decharging circuit containing a circuit, and a high tension converter (32) which is used to inject the high frequency ignition pulses discharged by the pulse capacitor (30) via the circuit to the welding electrode (27). In order to create said type of ignition method and an ignition circuit (28) which enables the welding arc to be ignited in an exact and/or safe and rapid manner and/or to create an improved ignition quality, the charge circuit (31) is connected to a pulse compression circuit (40) comprising the pulse capacitor (30), the high tension converter (32) and the circuit, the circuit being formed by a magnetic throttle valve (41), such that a high frequency circuit of the ignition pulse can be obtained.Type: GrantFiled: November 10, 2004Date of Patent: December 29, 2009Assignee: Fronius International GmbHInventors: Andreas Prinz, Walter Pammer, Gerald Hieslmair, Uwe Kroiss
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Patent number: 7615720Abstract: A contact start plasma system is provided that includes a passive pilot arc circuit that decreases the size and cost of the system. The plasma arc system includes a torch body, an electrode having a longitudinally disposed axis and mounted in the body, a nozzle having a longitudinally disposed axis, the nozzle axis being disposed substantially collinearly with the electrode axis, a power supply coupled to the electrode, the nozzle and a workpiece, the power supply providing a current for operating the torch in a pilot arc mode and a transferred arc mode, a gas source coupled to the plasma chamber, the gas source providing gas for operating in a pilot arc mode and a transferred arc mode, and a passive pilot arc circuit coupled between the power supply and the nozzle, the passive pilot arc circuit controlling the operation of the torch in the pilot arc mode. Either the electrode or the nozzle can be translatable for blow-forward or blow-back mode of operation.Type: GrantFiled: September 11, 2006Date of Patent: November 10, 2009Assignee: Hypertherm, Inc.Inventor: Nicholas A. Sanders
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Patent number: 7592564Abstract: Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a radiation cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another radiation source.Type: GrantFiled: October 31, 2006Date of Patent: September 22, 2009Assignee: BTU International Inc.Inventors: Satyendra Kumar, Devendra Kumar
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Publication number: 20090218324Abstract: A method and apparatus for controlling power output of a capacitatively-coupled plasma are provided. A detector is disposed on the power delivery conduit carrying power to one electrode to detect fluctuations in power output to the electrode. The detector is coupled to a signal generator, which converts the RF input signal to a constant control signal. A controller adjusts power input to the RF generator by comparing the control signal to a reference.Type: ApplicationFiled: February 28, 2008Publication date: September 3, 2009Inventors: David T. Or, Yu Chang, William Kuang, Joel M. Huston, Chien-Teh Kao, Mei Chang
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Patent number: 7569791Abstract: An electromagnetic radiation source includes a toroidal chamber that contains an ionizable medium. The electromagnetic radiation source also includes a magnetic core that surrounds a portion of the toroidal chamber. The electromagnetic radiation source also includes a pulse power system for providing pulses of energy to the magnetic core for delivering power to a plasma formed in the toroidal chamber to produce electromagnetic radiation that radiates radially through walls of the toroidal chamber.Type: GrantFiled: September 27, 2006Date of Patent: August 4, 2009Assignee: Energetiq Technology, Inc.Inventors: Donald K. Smith, Matthew M. Besen, Raghuram L. V. Petluri
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Publication number: 20090134129Abstract: An ablative plasma gun subassembly is disclosed. The subassembly includes a body, a first pair and a second pair of gun electrodes having distal ends disposed within an interior of the body, and ablative material disposed proximate the distal ends of at least one of the first pair of gun electrodes and the second pair of gun electrodes.Type: ApplicationFiled: November 27, 2007Publication date: May 28, 2009Applicant: GENERAL ELECTRIC COMPANYInventors: Dean Arthur Robarge, Thangavelu Asokan, Adnan Kuttubudin Bohori, John James Dougherty, George William Roscoe
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Publication number: 20090078686Abstract: A starting circuit for use with a plasma torch is provided including circuitry for initiating a pilot arc using a unipolar voltage impulse. A transformer is selectively coupled to a DC source so that an impulse is introduced using the same DC source used to maintain an established pilot arc. A method is provided wherein an arc can be initiated while at the same time the DC source is pre-loaded so that surge injection circuitry is not needed to sustain the arc while ramping to the full pilot arc current level.Type: ApplicationFiled: September 25, 2007Publication date: March 26, 2009Inventor: JACKIE L WINN
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Patent number: 7479615Abstract: Static neutralization of a charged object is provided by generating, in an ionizing cell or module, an ion cloud having a mix of positively and negatively charged ions, and reshaping the ion cloud by redistributing the ions into two regions of opposite polarity by using a second voltage. The second voltage creates an electrical field, which is preferably located in the vicinity of the ion cloud. The redistribution of the ions increases the effective range in which available ions may be displaced or directed towards the charged object. The electrical field redistributes ions that form the ion cloud. Ion redistribution within the ion cloud occurs because ions having a polarity corresponding to the polarity of the second voltage are repelled from the electrical field, and ions having a polarity opposite from that of the electrical field are attracted to electrical field.Type: GrantFiled: May 25, 2005Date of Patent: January 20, 2009Assignee: MKS Instruments, Inc.Inventors: Peter Gefter, Scott Gehlke, Alexandre Ignatenko
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Publication number: 20080203070Abstract: A system and method for over-voltage protection is described. In one embodiment of the invention, an apparatus includes an output port configured to deliver power to a plasma chamber to ignite a plasma. The apparatus also includes a shunt switch in parallel with the output port and a processor configured to receive an indicator of an arc in the plasma. The processor is configured to close the shunt switch for a period of time to divert current away from the arc. The processor is also configured to trigger a pulse of the shunt switch to limit a voltage of an increasing voltage condition associated with the arc.Type: ApplicationFiled: February 22, 2007Publication date: August 28, 2008Inventors: Milan Ilic, Vladislav V. Shilo, Robert Brian Huff
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Publication number: 20080169272Abstract: A method and apparatus for controlling a gas supply to a plasma arc torch uses a proportional control solenoid valve positioned adjacent the torch to manipulate the gas flow to the torch, thereby extending electrode life during arc transfer and shutdown. Swirl ring design can be simplified and gas supply and distribution systems become less complicated. The invention also allows manipulation of shield gas flow to reduce divot formation when making interior cuts. The system can be controlled with a digital signal processor utilizing a feedback loop from a sensor.Type: ApplicationFiled: February 29, 2008Publication date: July 17, 2008Applicant: Hypertherm, Inc.Inventors: Aaron D. Brandt, Christopher S. Passage, Shane M. Selmer, Girish R. Kamath, Guy T. Best, Stephen M. Liebold, Jon W. Lindsay, Zheng Duan
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Patent number: 7399944Abstract: The present invention is directed to a method and arrangement for controlling a glow discharge plasma in a gas or gas mixture under atmospheric conditions, in a plasma discharge space comprising at least two spaced electrodes in which at least one plasma pulse having an absolute pulse maximum is generated by applying an AC plasma energizing voltage to the electrodes causing a plasma current and a displacement current. The plasma is controlled by providing a relative decrease of the displacement current after the pulse maximum. In a preferred embodiment, the energizing voltage is applied through a series circuit including a choke coil and a non-saturable inductor.Type: GrantFiled: August 12, 2005Date of Patent: July 15, 2008Assignee: Fuji Photo Film B.V.Inventors: Hindrik Willem DeVries, Yoichiro Kamiyama, Jan Bastiaan Bouwstra, Mauritius Cornelius Maria Van de Sanden, Eugen Aldea, Paul Peeters
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Publication number: 20080083714Abstract: A system and method is featured for controlling a process parameter of a thermal processing system by estimating an arc voltage between a plasma arc torch tip and a metallic workpiece and controlling the process parameter based on the estimated arc voltage. Particular embodiments include adjusting the height of a plasma torch based on the estimated arc voltage. A system and method is also featured for estimating an arc voltage in a thermal processing system in which a switch mode power supply provides an arc current to generate a plasma arc between a plasma arc torch tip and a metallic workpiece.Type: ApplicationFiled: November 20, 2006Publication date: April 10, 2008Applicant: Hypertherm, Inc.Inventors: Girish R. Kamath, John Miramonti, Norman LeBlanc, Christopher S. Passage, Wayne Chin
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Publication number: 20080083713Abstract: A contact start plasma system is provided that includes a passive pilot arc circuit that decreases the size and cost of the system. The plasma arc system includes a torch body, an electrode having a longitudinally disposed axis and mounted in the body, a nozzle having a longitudinally disposed axis, the nozzle axis being disposed substantially collinearly with the electrode axis, a power supply coupled to the electrode, the nozzle and a workpiece, the power supply providing a current for operating the torch in a pilot arc mode and a transferred arc mode, a gas source coupled to the plasma chamber, the gas source providing gas for operating in a pilot arc mode and a transferred arc mode, and a passive pilot arc circuit coupled between the power supply and the nozzle, the passive pilot arc circuit controlling the operation of the torch in the pilot arc mode. Either the electrode or the nozzle can be translatable for blow-forward or blow-back mode of operation.Type: ApplicationFiled: September 11, 2006Publication date: April 10, 2008Applicant: Hypertherm, Inc.Inventor: Nicholas A. Sanders
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Patent number: 7342198Abstract: A method of generating an electrical arc includes steps of providing a first electrode and a second electrode, determining a dielectric strength of a gap region between the electrodes, determining a desired dielectric strength change based on the determined dielectric strength, injecting an amount of ions into the gap region, wherein the amount of ions is controlled based on the desired dielectric strength change, and providing a voltage to the first electrode, the voltage causing the electrical arc to be formed between the first electrode and the second electrode. Preferably, the amount of ions injected into the gap region causes the dielectric strength of the gap region to be changed by an amount substantially equal to the desired dieletric strength change. The method may be implemented in an apparatus employing an electrician arc, such as, without limitation, a fusion splicer or an apparatus for preparing an optical fiber.Type: GrantFiled: February 26, 2007Date of Patent: March 11, 2008Assignee: 3SAE Technologies, Inc.Inventor: Robert G. Wiley
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Patent number: 7317171Abstract: A method and apparatus for reducing the gap resistance between two electrodes, such as the electrodes used fusion splicing one optical fiber to another, by injecting negative ions into the gas or gasses that are located between the electrodes. As a result, the voltage that is required to cause dielectric breakdown and initiation of the electrical arc is drastically reduced.Type: GrantFiled: December 5, 2005Date of Patent: January 8, 2008Assignee: 3SAE Technologies, Inc.Inventor: Robert G. Wiley
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Patent number: 7232975Abstract: A plasma generator, reactor and associated systems and methods are provided in accordance with the present invention. A plasma reactor may include multiple sections or modules which are removably coupled together to form a chamber. Associated with each section is an electrode set including three electrodes with each electrode being coupled to a single phase of a three-phase alternating current (AC) power supply. The electrodes are disposed about a longitudinal centerline of the chamber and are arranged to provide and extended arc and generate an extended body of plasma. The electrodes are displaceable relative to the longitudinal centerline of the chamber. A control system may be utilized so as to automatically displace the electrodes and define an electrode gap responsive to measure voltage or current levels of the associated power supply.Type: GrantFiled: December 2, 2003Date of Patent: June 19, 2007Assignee: Battelle Energy Alliance, LLCInventors: Peter C. Kong, Robert J. Pink, James E. Lee
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Patent number: 7227097Abstract: Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another.Type: GrantFiled: May 7, 2003Date of Patent: June 5, 2007Assignee: BTU International, Inc.Inventors: Satyendra Kumar, Devendra Kumar
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Patent number: 7199328Abstract: A plasma processing system including a process chamber, a substrate holder provided within the process chamber, and a gas injection system configured to supply a first gas and a second gas to the process chamber. The system includes a controller that controls the gas injection system to continuously flow a first gas flow to the process chamber and to pulse a second gas flow to the process chamber at a first time. The controller pulses a RF power to the substrate holder at a second time. A method of operating a plasma processing system is provided that includes adjusting a background pressure in a process chamber, where the background pressure is established by flowing a first gas flow using a gas injection system, and igniting a processing plasma in the process chamber. The method includes pulsing a second gas flow using the gas injection system at a first time, and pulsing a RF power to a substrate holder at a second time.Type: GrantFiled: August 29, 2002Date of Patent: April 3, 2007Assignee: Tokyo Electron LimitedInventor: Eric J. Strang
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Patent number: 7199384Abstract: An apparatus for producing light includes a chamber that has a plasma discharge region and that contains an ionizable medium. The apparatus also includes a magnetic core that surrounds a portion of the plasma discharge region. The apparatus also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone.Type: GrantFiled: July 9, 2004Date of Patent: April 3, 2007Assignee: Energetiq Technology Inc.Inventors: Donald K. Smith, Stephen F. Horne, Matthew M. Besen, Paul A. Blackborow
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Patent number: 7186943Abstract: A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor support, the electrode comprising a portion of the chamber wall, an RF power generator for supplying power at a frequency of the generator to the overhead electrode and capable of maintaining a plasma within the chamber at a desired plasma ion density level. The overhead electrode has a capacitance such that the overhead electrode and the plasma formed in the chamber at the desired plasma ion density resonate together at an electrode-plasma resonant frequency, the frequency of the generator being at least near the electrode-plasma resonant frequency. The reactor further includes a set of MERIE magnets surrounding the plasma process area overlying the wafer surface that produce a slowly circulating magnetic field which stirs the plasma to improve plasma ion density distribution uniformity.Type: GrantFiled: April 12, 2005Date of Patent: March 6, 2007Assignee: Applied Materials, Inc.Inventors: Daniel J. Hoffman, Yan Ye, Dan Katz, Douglas A. Buchberger, Jr., Xiaoye Zhao, Kang-Lie Chiang, Robert B. Hagen, Matthew L. Miller
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Patent number: 7186944Abstract: A method and apparatus for automatically determining a consumable type when a consumable is disposed within an electrode holder of a welding-type system is disclosed. The invention includes a detector assembly that measures a physical characteristic of a connected consumable and provides feedback regarding that which is measured. From the feedback, the operating parameters of a welding-type process may be automatically prescribed.Type: GrantFiled: September 18, 2003Date of Patent: March 6, 2007Assignee: Illinois Tool Works Inc.Inventors: Tim A. Matus, James F. Ulrich
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Patent number: 7161112Abstract: An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.Type: GrantFiled: October 20, 2003Date of Patent: January 9, 2007Assignee: MKS Instruments, Inc.Inventors: Donald K. Smith, Xing Chen, William M. Holber, Eric Georgelis
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Patent number: 7141756Abstract: A microwave plasma processing apparatus is disclosed that enables fast and easy plasma ignition at the pressure for plasma processing In the microwave plasma processing apparatus, a plasma ignition facilitating unit is provided to facilitate plasma ignition induced by a microwave. The plasma ignition facilitating unit includes a deuterium lamp that emits vacuum ultraviolet rays, and a transmission window that allows the vacuum ultraviolet rays to penetrate and irradiate a plasma excitation space. The transmission window is a convex lens, and focuses the vacuum ultraviolet rays to enhance ionization of the plasma excitation gas. With such a configuration, it is possible to induce plasma ignition easily and quickly.Type: GrantFiled: March 28, 2002Date of Patent: November 28, 2006Assignees: Tokyo Electron LimitedInventors: Tadahiro Ohmi, Masaki Hirayama, Shigetoshi Sugawa, Tetsuya Goto
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Patent number: 7141806Abstract: An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.Type: GrantFiled: September 27, 2005Date of Patent: November 28, 2006Assignee: Cymer, Inc.Inventors: William N. Partlo, Alexander I. Ershov, Igor V. Fomenkov, David W. Myers, William Oldham
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Patent number: 7132620Abstract: The invention relates to an inductive thermal plasma torch comprising a confinement tube that comprises, longitudinally in relation to the tube, metal fingers which are insulated from each other, an ignition device that comprises an igniter (4) and an igniter support (1, 3), the purpose of the igniter (4) being to initiate a discharge in the plasma of the torch, the support having an electrically conductive end (1) which is connected to the electrical earth (2) of the plant and another, electrically insulating, end (3) which carries the igniter, the ignition device also comprising an electrically conductive connection (5) connecting the igniter (4) to the electrically conductive end (1) of the support so that the igniter is able to initiate the discharge in the plasma, the electrically conductive connection (5) having a section that is sufficiently narrow to limit the intensity of the current capable of passing through the igniter (4) in order to avoid electrical arcing by capacitive discharge between the ignType: GrantFiled: September 20, 2004Date of Patent: November 7, 2006Assignee: AlcatelInventors: Daniel Coelho, Jean-Pascal Dumont-Monnet, Pierre Ripoche
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Patent number: 7132621Abstract: Methods and apparatus are provided for igniting, modulating, and sustaining a plasma for various plasma processes and treatments. In one embodiment, a plasma is ignited by subjecting a gas in a multi-mode processing cavity to electromagnetic radiation having a frequency between about 1 MHz and about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A passive plasma catalyst may include, for example, any object capable of inducing a plasma by deforming a local electric field. An active plasma catalyst can include any particle or high energy wave packet capable of transferring a sufficient amount of energy to a gaseous atom or molecule to remove at least one electron from the gaseous atom or molecule, in the presence of electromagnetic radiation.Type: GrantFiled: May 7, 2003Date of Patent: November 7, 2006Assignee: Dana CorporationInventors: Satyendra Kumar, Devendra Kumar
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Patent number: 7098420Abstract: A plasma emitter apparatus and method for using the same that includes a primary electrode and a secondary electrode. The secondary electrode is porous, that is, it is configured to permit the passage of plasma discharge therethrough. Accordingly, the plasma is received at one side of the secondary electrode and emitted from its opposing plasma exiting side. The secondary electrode may be a laminate of multiple insulating material layers with at least one conductive layer sandwiched therebetween. A plurality of apertures are defined through the laminate and a dielectric sleeve is inserted into and retained in the aperture. The generated plasma passes through one or more holes defined in each of the dielectric sleeves. Alternatively, the secondary electrode may be formed as a plurality of unidirectional high voltage wires strung substantially parallel across a frame or a plurality of bidirectional high voltage wires interwoven and secured by a perimeter frame.Type: GrantFiled: July 2, 2002Date of Patent: August 29, 2006Assignee: Plasmasol CorporationInventors: Richard Crowe, Sergei Babko-Malyi, Kurt Kovach, Seth Tropper
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Patent number: 7087856Abstract: A system and associated method for determining an operational condition of a gas torch are provided. The system includes a diode device that is electrically connected between the workpiece and the nozzle. A sensing circuit is configured to provide an electric potential across the diode device and sense a resulting voltage characteristic of the condition of continuity of the system. For example, the sensing circuit can determine whether the nozzle is otherwise electrically connected to the workpiece and/or whether the nozzle is electrically connected to the electrode. The sensing circuit can determine the condition of continuity throughout the operation of the system, e.g., to verify the proper assembly of the torch, to verify proper movement of the electrode or nozzle, to verify that the torch is separated from the workpiece at start-up, and the like.Type: GrantFiled: November 3, 2004Date of Patent: August 8, 2006Assignee: The ESAB Group, Inc.Inventor: Richard Allen Eldridge
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Patent number: 7057130Abstract: Method and apparatus for generating positive and negative ions include electrodes that are spaced apart by a gap and that are supplied alternating ionizing voltage at a frequency which causes the generated ions to move within the gap between electrodes and exhibit a resident time in transit that accumulates the ions substantially within the central region of the gap. An electrostatic field, or a flowing stream of air or other gas passing through the gap, transports the generated ions from within the gap. Self-balancing of generated positive and negative ions is accomplished using capacitive coupling of the ionizing voltage to at least one of the electrodes disposed about the gap.Type: GrantFiled: April 8, 2004Date of Patent: June 6, 2006Assignee: Ion Systems, Inc.Inventors: Peter Gefter, Scott Gehlke
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Patent number: 7034244Abstract: The present invention is directed to a system and method for improved operational feedback from a plasma torch to a plasma-cutting power source. A plasma cutter includes a plasma cutting power source, a plasma torch in communication with the plasma cutting power source, and a serialization circuit disposed within the plasma torch to control transmission of multiple feedback signals from the plasma torch to the plasma cutting power source. The serialization circuit receives the multiple feedback signals and places the feedback in a queue, such that the multiple feedback signals are sent from the queue to a processing unit in the power source via a single communications link.Type: GrantFiled: September 3, 2003Date of Patent: April 25, 2006Assignee: Illinois Tool Works Inc.Inventor: Tim A. Matus
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Patent number: 7034245Abstract: The systems and methods of the present invention provide a circuit for controlling the magnitude of the main and pilot arc current provided to an arc cutting or welding machine. In one embodiment, the circuit allows the user to set the pilot arc current such that it automatically tracks the main arc current setting. The pilot arc current is set to a value that is proportional to the main arc current, such that the pilot arc current value is tailored to the specific cutting operation to be performed and/or the specific nozzle and electrode being used. In an alternative embodiment, the circuit allows the user to select from different pilot arc current levels, such as low, medium, and high current levels. This allows the user to override the pilot arc control in instances where the plasma arc cutting or welding machine is operated under conditions not optimal for the selected nozzle and electrode.Type: GrantFiled: June 29, 2004Date of Patent: April 25, 2006Assignee: The ESAB Group, Inc.Inventor: Richard A. Eldridge
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Patent number: 7030335Abstract: A plasma reactor for processing a semiconductor workpiece, includes a reactor chamber having a chamber wall and containing a workpiece support for holding the semiconductor workpiece, an overhead electrode overlying said workpiece support, the electrode comprising a portion of said chamber wall, an RF power generator for supplying power at a frequency of said generator to said overhead electrode and capable of maintaining a plasma within said chamber at a desired plasma ion density level. The overhead electrode has a capacitance such that said overhead electrode and the plasma formed in said chamber at said desired plasma ion density resonate together at an electrode-plasma resonant frequency, said frequency of said generator being at least near said electrode-plasma resonant frequency.Type: GrantFiled: December 19, 2001Date of Patent: April 18, 2006Assignee: Applied Materials, Inc.Inventors: Daniel J. Hoffman, Gerald Zheyao Yin, Yan Ye, Dan Katz, Douglas A. Buchberger, Jr., Xiaoye Zhao, Kang-Lie Chiang, Robert B. Hagen, Matthew L. Miller
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Patent number: 7022935Abstract: The present invention is directed to a system including a plasma cutting torch having an output electrode and a plasma cutter starting circuit configured to generate a pilot arc at the output electrode.Type: GrantFiled: December 8, 2003Date of Patent: April 4, 2006Assignee: Illinois Tool Works Inc.Inventors: Tim A. Matus, Troy A. Sommerfeld, Joseph C. Schneider, James F. Ulrich
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Patent number: 7015414Abstract: A plasma processing system, method, and computer readable medium for measuring plasma impedance. The system includes a chamber configured to contain a plasma and including a chuck within an interior area of the chamber, the chuck including a support surface and a bottom surface, and a first voltage-current probe positioned at a first position located exterior to the chamber and on a radio-frequency transmission line between the chamber and a power source. The system also includes a simulation module connected to the first voltage-current probe and arranged to solve, based on measurements transmitted from the first voltage-current probe, a radio-frequency model of the radio-frequency transmission line between the first position and a second position located within the chamber.Type: GrantFiled: September 30, 2003Date of Patent: March 21, 2006Assignee: Tokyo Electron LimitedInventor: Andrej S. Mitrovic
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Patent number: 7002097Abstract: The present invention obtains an automatic mode switching of DC plasma torches through, which easily switches DC plasma torches to be run between a transmitting mode and a non-transmitting mode and put the switching device under the monitor and the control of a current sensor and a current level controller; the heat generated by the current passing through can be transferred by a non-combustible liquid driven by a pump and be cooled down through a heat exchanger; and, electric arcs is prevented from happening between two electrodes by the non-combustible liquid.Type: GrantFiled: May 23, 2005Date of Patent: February 21, 2006Assignee: Atomic Energy Council-Institute of Nuclear EnergyInventor: Chin-Ching Tzeng
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Patent number: 6967305Abstract: Methods and apparatus for controlling a plasma used for materials processing feature cooperative action of a resonant circuit and a switch unit coupled to a plasma vessel and a power supply. A sensor for acquiring a signal associated with a state of a plasma in the plasma vessel supports closed-loop control of the switch unit. Undesirable plasma states detected by the sensor can be eliminated by closing the switch unit to shunt the resonant circuit.Type: GrantFiled: August 18, 2003Date of Patent: November 22, 2005Assignee: MKS Instruments, Inc.Inventor: Jeff C. Sellers
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Patent number: 6943317Abstract: There is provided by this invention a novel apparatus and method of operating a dc plasma process that diverts the power supply current from the plasma at the initiation of an arc, thereby inhibiting energy from flowing from the power supply to the plasma, and then to allow energy to flow again when the power supply re-enables energy flow to the plasma. The diverting means is connected to the output of the power supply to divert current away from the plasma at the initiation of an arc wherein the diverting means is actuated when the arc is detected on the output and diverts the current for a first pre-determined time. The diverting means is released at the end of the first pre-determined time before the current reaches zero wherein current is redirected to the plasma and the diverting means is reactivated at the end of a second pre-determined time in the event the arc is not extinguished.Type: GrantFiled: July 2, 2004Date of Patent: September 13, 2005Assignee: Advanced Energy Industries, Inc.Inventors: Milan Ilic, Kalyan N. C. Siddabattula, Andrey B. Malinin
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Patent number: 6933463Abstract: A main arc ignition method capable of extending lives of a plasma electrode and a nozzle. For this purpose, before or immediately after starting arc, a plasma torch is supplied with a plasma gas at least either at a lower flow rate or at lower gas pressure; the plasma gas is switched to a gas flow rate and gas pressure of a time of cutting a work, after pilot arc is ignited between an electrode and a nozzle, or after main arc is ignited between the electrode and the work; and when generation of the main arc between the electrode and the work is detected, a pilot current is interrupted promptly by a semiconductor switch which is interposed in series with a resistance, in a pilot current circuit that is connected to the nozzle and supplies the pilot current to the pilot arc.Type: GrantFiled: January 22, 2003Date of Patent: August 23, 2005Assignee: Komatsu Industries Corp.Inventors: Yoshihiro Yamaguchi, Takahiro Iriyama, Tetsuya Kabata
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Patent number: 6933461Abstract: A tip for a plasma arc torch includes a ridge for improved electrical contact with a starting member.Type: GrantFiled: September 16, 2002Date of Patent: August 23, 2005Assignee: Thermal Dynamics CorporationInventors: Kevin Horner-Richardson, David A. Small, Joseph P. Jones, Roger W. Hewitt
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Patent number: 6903301Abstract: A contact start plasma arc torch is provided that comprises an electrode, a tip, and an initiator that is resiliently biased into contact with the tip, the initiator being movable against the resilient bias to separate from the tip and establish a pilot arc between the initiator and the tip. The initiator is disposed within a start cartridge, which preferably comprises a coil spring that biases the initiator into contact with the tip. The plasma arc torch further comprises a plurality of head vent holes to vent gas from within the start cartridge during operation of the torch. Additionally, the tip defines a plurality of swirl holes and secondary gas holes to generate and control a plasma stream that is subsequently blown from a central exit orifice in the tip.Type: GrantFiled: February 26, 2002Date of Patent: June 7, 2005Assignee: Thermal Dynamics CorporationInventors: Joseph P. Jones, Kevin D. Horner-Richardson, Shiyu Chen, Roger W. Hewett
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Patent number: 6867387Abstract: A device to place an incision into matter with a harmonious plasma cloud. A radiofrequency generator system produces pulsed or continuous electromagnetic waveform which is transmitted by an active transmitter incising electrode tip. This generated electromagnetic wave is utilized to initiate a plasma cloud with processes such as thermal ionization and a photoelectric effect which then trigger an Avalanche Effect for charged atomic particles at the surface of the active transmitter incising electrode tip. This electromagnetic wave is impedance matched, frequency matched, power matched and tuned to the plasma cloud in order to sustain and control a harmonious plasma cloud with reduced atomic particle turbulence and chaos. This harmonious plasma cloud forms a coating over the surface of the active transmitter electrode tip as well as acts to reduce the energy needed from the power amplifier of our plasma cutting device.Type: GrantFiled: June 10, 2003Date of Patent: March 15, 2005Inventors: Richard J. Fugo, Damian Coccio
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Publication number: 20040232118Abstract: A plasma arc torch has a threadless electrode-cathode locking assembly, a one-piece tip assembly, and a rotational contact starting mechanism. The cathode and electrode of the locking assembly are configured such that relative rotation of the electrode with respect to the cathode causes the electrode to move in an axial direction relative to the cathode for locking the electrode in fixed axial and rotational position with respect to the cathode. The inner wall of the one-piece tip assembly is configured to receive the forward end of the electrode in a non-contact position. Rotation of the electrode with respect to the tip causes an arcing formation on the electrode to contact an arcing chamber within the cavity. Rotation of the electrode away from the tip generates a pilot arc in the arcing chamber.Type: ApplicationFiled: May 22, 2003Publication date: November 25, 2004Inventors: Kevin D. Horner-Richardson, Pearl A. Grant, Roger W. Hewett, Gene V. Hewes, Howard H. Horn
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Patent number: 6815633Abstract: Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding.Type: GrantFiled: March 12, 2001Date of Patent: November 9, 2004Assignee: Applied Science & Technology, Inc.Inventors: Xing Chen, William M. Holber, Andrew Barnett Cowe, Eric Georgelis, Ilya M. Bystyak, Andrzej Bortkiewicz
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Publication number: 20040206730Abstract: Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.Type: ApplicationFiled: April 16, 2003Publication date: October 21, 2004Applicant: Applied Science & TechnologyInventors: William M. Holber, Xing Chen, Andrew B. Cowe, Matthew M. Besen, Ronald W. Collins, Susan C. Trulli, Shouqian Shao