Using Plasma Patents (Class 219/121.36)
  • Patent number: 11919071
    Abstract: Disclosed herein are embodiments of systems and method for processing feedstock materials using microwave plasma processing. Specifically, the feedstock materials disclosed herein pertain to metal powders. Microwave plasma processing can be used to spheroidize the metal powders and form metal nitride or metal carbide powders. The stoichiometry of the metal nitride or metal carbide powders can be controlled by changing the composition of the plasma gas and the residence time of the feedstock materials during plasma processing.
    Type: Grant
    Filed: October 21, 2021
    Date of Patent: March 5, 2024
    Assignee: 6K Inc.
    Inventors: Sunil Bhalchandra Badwe, Scott Joseph Turchetti, Sudip Bhattacharya, Makhlouf Redjdal
  • Patent number: 11883896
    Abstract: Recognizing interchangeable torch components, such as consumables, for welding and cutting torches includes determining that one or more interchangeable torch components installed in an operative end of a torch are genuine. Operational parameters for the one or more interchangeable torch components can also be determined. When the one or more interchangeable torch components are determined to be genuine, an indicator assembly can be activated to provide a first indication. When the operational parameters are implemented at a power supply connected to the torch, the indicator assembly can be activated to provide a second indication.
    Type: Grant
    Filed: February 28, 2022
    Date of Patent: January 30, 2024
    Assignee: THE ESAB GROUP, INC.
    Inventors: Michael Nadler, Maximilian Dougherty, Frederic Ewing, James Tantillo, Ryan T. Lynaugh, Kevin Horner-Richardson, Nicholas Courtney
  • Patent number: 11849992
    Abstract: Embodiments include a system comprising a non-thermal plasma (NTP) device and at least one container including supersaturated gas emulsion (SSGE). A method is described involving configuring a supersaturated gas emulsion (SSGE) for application to a treatment site and configuring a device to generate a non-thermal plasma (NTP) at the treatment site.
    Type: Grant
    Filed: January 14, 2021
    Date of Patent: December 26, 2023
    Inventor: Mark G. Fontenot
  • Patent number: 11776801
    Abstract: Inductively coupled plasma (ICP) analyzers use an ICP torch to generate a plasma in which a sample is atomized an ionized. Analysis of the atomic ions can be performed by atomic analysis, such as mass spectrometry (MS) or atomic emission spectrometry (AES). Particle based ICP analysis includes analysis of particles such as cells, beads, or laser ablation plumes, by atomizing and ionizing particles in an ICP torch followed by atomic analysis. In mass cytometry, mass tags of particles are analyzed by mass spectrometry, such as by ICP-MS. Systems and methods of the subject application include one or more of: a demountable ICP torch holder assembly, an external ignition device; an ICP load coil comprising an annular fin, particle suspension sample introduction fluidics, and ICP analyzers thereof.
    Type: Grant
    Filed: September 9, 2021
    Date of Patent: October 3, 2023
    Assignee: STANDARD BIOTOOLS CANADA INC.
    Inventors: Alexander Loboda, Raymond Jong, Michael Sullivan, Serguei Vorobiev, Robert Rotenberg, Emil D. Stratulativ, Maxim Voronov, Mark Armstrong
  • Patent number: 11731812
    Abstract: An easy-tear-open and tamper-evident container including: a container body having a first convex loop on a periphery of an opening thereof; a lid having a second convex loop for engaging with the first convex loop, where a loop of tear line is provided on a topmost surface of the second convex loop, and the loop of tear line is divided into a section of breakable line and a section of broken line; and a spacer part being disposed below a local area of the topmost surface of the second convex loop that bears the section of broken line to make the local area bent up to form an force application part.
    Type: Grant
    Filed: September 21, 2022
    Date of Patent: August 22, 2023
    Inventor: Meng-Yun Hsu
  • Patent number: 11721539
    Abstract: Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
    Type: Grant
    Filed: November 23, 2021
    Date of Patent: August 8, 2023
    Assignees: BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD., MATTSON TECHNOLOGY, INC
    Inventors: Michael X. Yang, Rolf Bremensdorfer, Dave Camm, Joseph Cibere, Dieter Hezler, Shawming Ma, Yun Yang
  • Patent number: 11712282
    Abstract: Cartilage and other tissues are treated by generating a plasma in an interior space of a probe and exposing the tissue to the plasma. The plasma is released through a gap in a working end of the probe.
    Type: Grant
    Filed: January 26, 2021
    Date of Patent: August 1, 2023
    Assignee: Relign Corporation
    Inventors: Aaron Germain, Balazs Lesko, Benedek Orczy-Timko
  • Patent number: 11696792
    Abstract: An electrosurgical apparatus for generating a plasma discharge beam is provided. In one aspect, the electrosurgical apparatus includes a first fluid flow housing, a second fluid flow housing, and an electrode. A first gas is provided to the distal end of the first fluid flow housing, where the electrode is energized to ionize the first gas and generate a plasma discharge beam. A second gas is provided to the distal end of the second fluid flow housing, where the distal end of the second fluid flow housing injects the second gas into the plasma discharge beam. In another aspect, the electrosurgical apparatus includes a single fluid flow housing having an external electrode and an internal electrode. In another aspect, the electrosurgical apparatus includes a transformer assembly having a plurality of serially-connected transformers.
    Type: Grant
    Filed: February 13, 2021
    Date of Patent: July 11, 2023
    Assignee: Apyx Medical Corporation
    Inventors: Gregory A. Konesky, Claes Fredrik Jonsson
  • Patent number: 11700682
    Abstract: A plasma torch that includes an electrode having an exterior surface and a tip having an interior surface spaced apart from and facing the exterior surface of the electrode. A process gas flow channel located being located between the exterior surface of the electrode and the interior surface of the tip. A thermoelectric cooler having a cold plate and a hot plate is disposed between the exterior surface of the electrode and the interior surface of the tip with the cold plate being thermally connected to the exterior surface of the electrode. According to some implementations, electrical power is deliverable to the thermoelectric cooler only up electrical power being supplied to the electrode.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: July 11, 2023
    Assignee: THE ESAB GROUP, INC.
    Inventor: Andrew Raymond
  • Patent number: 11692267
    Abstract: Methods for modifying a susceptor having a silicon carbide (SiC) surface comprising exposing the silicon carbide surface (SiC) to an atmospheric plasma are described. The method increases the atomic oxygen content of the silicon carbide (SiC) surface.
    Type: Grant
    Filed: December 31, 2020
    Date of Patent: July 4, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Francis Kanyiri Mungai, Vijayabhaskara Venkatagiriyappa, Yung-Cheng Hsu, Keiichi Tanaka, Mario D. Silvetti, Mihaela A. Balseanu
  • Patent number: 11654483
    Abstract: A powder treatment assembly and method for treating a feedstock powder of feedstock particles includes directing the feedstock powder into a plasma chamber within a reactor, exposing the feedstock powder to a plasma field generated by a plasma source to form a treated powder having treated particles with an increased average sphericity relative to the feedstock particles, and supplying a hot gas sheath flow downstream of the plasma chamber, the hot gas sheath flow substantially surrounding the treated powder.
    Type: Grant
    Filed: April 7, 2020
    Date of Patent: May 23, 2023
    Assignee: General Electric Company
    Inventors: Frederic Larouche, Matthieu Balmayer, Gabriel Dickson
  • Patent number: 11622425
    Abstract: A system (10) and method for transferring energy utilises an evacuated recirculation duct (11), with a pump (20) to circulate gas and a control nozzle (22) to form a jet of gas. Hydrogen gas is provided into the duct to be circulated, and an electrical device (30, 32) provides energy into the jet of gas so as to form hydrogen atoms. A heat exchanger (44) is arranged downstream of the electrical device (30, 32), onto which the flowing jet of gas impacts. Means (40) are also provided to generate an electric or magnetic field in the region of the jet of gas between the electrical device (30, 32) and the heat exchanger (44), and is connected to a source (42) of electricity. For example an electromagnet coil (40) and may generate a magnetic field (B) transverse to the direction of travel of the jet of gas, or an electromagnet coil (40A, 40B) may generate a magnetic field parallel to the jet of gas.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: April 4, 2023
    Assignee: HYDROGEN UNIVERSE LTD
    Inventor: Tanya Clarke
  • Patent number: 11583814
    Abstract: Devices and methods for reducing the specific energy required to reform or pyrolyze reactants in plasmas operating at high flow rates and high pressures are presented. These systems and methods include 1) introducing electrons and/or easily ionized materials to a plasma reactor, 2) increasing turbulence and swirl velocity of the flows of feed gases to have improved mixing in a plasma reactor, and 3) reducing slippage from a plasma reactor system. Such plasma systems may allow plasma reactors to operate at lower temperatures, higher pressure, with improved plasma ignition, increased throughput and improved energy efficiency. In preferred embodiments, the plasma reactors are used to produce hydrogen and carbon monoxide, hydrogen and carbon, or carbon monoxide through reforming and pyrolysis reactions. Preferred feedstocks include methane, carbon dioxide, and other hydrocarbons.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: February 21, 2023
    Assignee: MAAT Energy Company
    Inventors: Leslie Bromberg, Kim-Chinh Tran, Jorj Ian Owen, Jonathan Whitlow
  • Patent number: 11538667
    Abstract: A stage includes a stage body having a placement surface and a radio-frequency electrode embedded in the stage body. The stage body is made of ceramics, and the radio-frequency electrode extends in a thickness direction of the stage body in a region below an outer periphery of the placement surface.
    Type: Grant
    Filed: February 15, 2021
    Date of Patent: December 27, 2022
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Taro Ikeda, Satoru Kawakami, Sumi Tanaka
  • Patent number: 11517639
    Abstract: A cold plasma system and method for treating a region of a biological surface is presented. In one embodiment, the system includes: a housing; an air conduit within the housing; a first electrode configured proximately along the air conduit; a second electrode configured proximately along the air conduit and opposite from the first electrode; and a source of alternating current (AC) electrically connected with the first electrode. The source of alternating current is configured to generate cold plasma in the air conduit.
    Type: Grant
    Filed: July 30, 2019
    Date of Patent: December 6, 2022
    Assignee: L'Oreal
    Inventors: Ozgur Emek Yildirim, Thi Hong Lien Planard-Luong, Matthieu Jacob, Geoffrey Deane
  • Patent number: 11473199
    Abstract: A patterned backside stress compensation film having different stress in different sectors is formed on a backside of a substrate to reduce combination warpage of the substrate. The film can be formed by employing a radio frequency electrode assembly including plurality of conductive plates that are biased with different RF power and cause local variations in the plasma employed to deposit the backside film. Alternatively, the film may be deposited with uniform stress, and some of its sectors are irradiated with ultraviolet radiation to change the stress of these irradiated sectors. Yet alternatively, multiple backside deposition processes may be sequentially employed to deposit different backside films to provide a composite backside film having different stresses in different sectors.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: October 18, 2022
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Seiji Shimabukuro, Makoto Tsutsue
  • Patent number: 11430638
    Abstract: A plasma generating apparatus may include a cathode assembly including a cathode, an anode assembly including an anode having therein a plasma generation space, and one or more magnetic force generators configured to generate a magnetic force. The anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space. The gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and said one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: August 30, 2022
    Assignee: Edwards Limited
    Inventors: Yun Soo Choi, Chan Kyoo Ko, Simone Magni
  • Patent number: 11353008
    Abstract: An energy storage system includes a plasma battery and a reconverter to convert energy stored in the plasma battery to electricity. The plasma battery and the reconverter are coupled by a non-neutral plasma duct. The plasma battery includes a plasma battery supercell. The plasma battery supercell includes a plasma battery cell which includes a plasma containment fiber. The plasma containment fiber includes one or more concentric shells to store non-neutral plasma ions for energy storage. The plasma battery may include additional plasma battery supercells, which may be separated by a separator. The plasma battery includes an enclosure to provide electromagnetic shielding. The reconverter includes a power outlet to power an electric load.
    Type: Grant
    Filed: April 23, 2021
    Date of Patent: June 7, 2022
    Assignee: SPAR ENERGY LLC
    Inventor: Gaurav Bazaz
  • Patent number: 11209211
    Abstract: A DC plasma arc furnace, a method of co-processing waste and metal, a method of producing energy by processing material using the furnace, and the products produced by the furnace are provided. Metal may be efficiently processed by the furnace via an increased organic content in other feedstock fed into the furnace.
    Type: Grant
    Filed: July 23, 2020
    Date of Patent: December 28, 2021
    Inventor: Alain Palmieri
  • Patent number: 11155756
    Abstract: The invention relates weldments useful as heat transfer tubes in pyrolysis furnaces. The invention relates to tubes that are useful in pyrolysis furnaces. The weldments include a tubular member and at least one mixing element. The tubular member comprises an aluminum-containing alloy. The mixing element comprises an aluminum-containing alloy. The mixing element's aluminum-containing alloy can be the same as or different from the tubular member's aluminum-containing alloy. Other aspects of the invention relate to pyrolysis furnaces which include such weldments, and the use of such pyrolysis furnaces for hydrocarbon conversion processes such as steam cracking.
    Type: Grant
    Filed: April 10, 2020
    Date of Patent: October 26, 2021
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: David B. Spicer, Changmin Chun
  • Patent number: 11152476
    Abstract: Described herein is a technique capable of improving electrical characteristics of a polysilicon film while suppressing damage to an underlying silicon oxide film. According to the technique described herein, there is provided a there is provided a method of manufacturing a semiconductor device, including: (a) preparing a substrate including a silicon oxide film and a polysilicon film formed on the silicon oxide film, wherein the polysilicon film includes a contact surface contacting the silicon oxide film and an exposed surface facing the contact surface; and (b) supplying a reactive species generated by plasma excitation of a gas containing hydrogen and oxygen to the exposed surface of the polysilicon film.
    Type: Grant
    Filed: September 7, 2018
    Date of Patent: October 19, 2021
    Assignee: Kokusai Electric Corporation
    Inventors: Masanori Nakayama, Yuichiro Takeshima, Hiroto Igawa, Katsunori Funaki
  • Patent number: 11079669
    Abstract: An extreme ultraviolet (EUV) mask is received. The EUV mask has an EUV pellicle disposed thereover. The EUV pellicle is coupled to the EUV mask at least in part via glue that is disposed on the EUV mask. The EUV pellicle is removed, thereby exposing the glue. A localized glue-removal process is performed by targeting a region of the EUV mask on which the glue is disposed. The localized glue-removal process is performed without affecting other regions of the EUV mask that do not have the glue disposed thereon. The localized glue-removal process may include injecting a cleaning chemical onto the glue and removing a waste chemical produced by the cleaning chemical and the glue. The localized glue-removal process may also include a plasma process that applies plasma to the glue. The localized glue-removal process may further include a laser process that shoots a focused laser beam at the glue.
    Type: Grant
    Filed: December 27, 2019
    Date of Patent: August 3, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Tzu-Ting Chou, Chung-Hsuan Liu, Kuan-Wen Lin, Chi-Lun Lu, Ting-Hao Hsu, Sheng-Chi Chin
  • Patent number: 11006995
    Abstract: The disclosure relates to a device for treatment of skin, mucous membranes or body parts with a cold atmospheric pressure plasma by generating a dielectric barrier surface discharge, including a flexible insulating material, a flexible high-voltage electrode, a flexible dielectric, a flexible grounded electrode, a gas supply, wherein the flexible high-voltage electrode is embedded between the flexible insulating material and the flexible dielectric, wherein the grounded electrode is applied on a surface of the flexible dielectric that is configured to face a curved surface of a body part to be treated, wherein the flexible high-voltage electrode, the flexible dielectric and the flexible grounded electrode of the device form a flexible layered arrangement for providing the cold atmospheric pressure plasma, wherein the arrangement forms a hollow spherical body with a closed volume and wherein a plasma can be ignited for treating the curved surface with the cold atmospheric pressure plasma.
    Type: Grant
    Filed: February 26, 2019
    Date of Patent: May 18, 2021
    Assignee: LEIBNIZ-INSTITUT FUER PLASMAFORSCHUNG UND TECHNOLOGIE E.V.
    Inventors: Manfred Stieber, Klaus-Dieter Weltmann, Stefan Horn, Ronny Brandenburg, Thomas Von Woedtke
  • Patent number: 10998144
    Abstract: A power contact electrode plasma therapy circuit includes a pair of terminals adapted to be connected to a set of switchable contact electrodes of a power contact. A plasma ignition detector is configured to detect an electrical parameter over the switchable contact electrodes indicative of the formation of plasma between the switchable contact electrodes and output a plasma ignition signal based on the electrical parameter as detected. A plasma burn memory is configured to receive and store the plasma ignition signal. A controller circuit is configured to receive from the plasma burn memory the plasma ignition signal, start a time based on receipt of the plasma ignition signal, and upon the timer meeting a time requirement, output a plasma extinguish command. A plasma extinguishing circuit, configured to bypass the pair of terminals upon receiving the trigger signal to extinguish the plasma between the switchable contact electrodes.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: May 4, 2021
    Assignee: Arc Suppression Technologies
    Inventors: Reinhold Henke, Robert Thorbus
  • Patent number: 10960485
    Abstract: The invention features a replaceable cartridge for a plasma arc torch. The cartridge includes a cartridge body having a first section and a second section. The first and second sections are joined at an interface to form a substantially hollow chamber. The interface provides a coupling force that secures the first and second sections together. The cartridge also includes an arc constricting member located in the second section; an electrode included within the substantially hollow chamber; and a contact start spring element affixed to the electrode. The spring element imparts a separating force that biases the electrode toward at least one of the first section or the second section of the body. The separating force has a magnitude that is less than a magnitude of the coupling force.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: March 30, 2021
    Assignee: Hypertherm, Inc.
    Inventors: Nicholas A. Sanders, Peter J. Twarog, E. Michael Shipulski, Yu Zhang
  • Patent number: 10935620
    Abstract: A system may include a resistive-inductive-capacitive sensor, a driver configured to drive the resistive-inductive-capacitive sensor with a driving signal at a driving frequency, and a measurement circuit communicatively coupled to the resistive-inductive-capacitive sensor and configured to, during a calibration phase of the measurement circuit, measure phase and amplitude information associated with the resistive-inductive-capacitive sensor and based on the phase and amplitude information, determine at least one of a resonant frequency of the resistive-inductive-capacitive sensor and a transfer function of the resistive-inductive-capacitive sensor.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: March 2, 2021
    Assignee: Cirrus Logic, Inc.
    Inventors: Tejasvi Das, Siddharth Maru, Matthew Beardsworth, Bruce E. Duewer, Michael A. Kost
  • Patent number: 10919238
    Abstract: A method of controlling an inductive heating circuit, having a varying load, to seal a packaging material is provided. The method comprises generating AC power of at least two frequencies on at least one inductor in the inductive heating circuit; determining of the resulting phase shift in the inductive heating circuit from the current generated at the at least two frequencies; determining the impedance of the inductive heating circuit for each of the at least two frequencies; determining a load characteristics of the inductive heating circuit based on the relationship between the determined impedance and the determined phase shift; determining an impedance operating range; and selecting an AC output frequency for an induction power generator based on the load characteristics which results in the least amount of phase shift from a set ideal value and which is associated with an impedance that is within the impedance operating range.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: February 16, 2021
    Assignee: Tetra Laval Holdings & Finance S.A.
    Inventors: Mirco Lancellotti, Rossano Guerri, Alessandro Boschi
  • Patent number: 10917961
    Abstract: Embodiments of arc plasma cutting torches are disclosed. In one embodiment, a plasma cutting torch includes an insert component located substantially between a cathode body and an insulator body. The insert component is able to withstand high temperatures and can be made of a metal material or a non-metal material. The insert component can be permanent within the torch or can be replaceable, in accordance with various embodiments.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: February 9, 2021
    Assignee: LINCOLN GLOBAL, INC.
    Inventors: Praveen K. Namburu, Wayne S. Severance
  • Patent number: 10893600
    Abstract: An induction plasma torch comprises a tubular torch body, a plasma confinement tube disposed in the tubular torch body coaxial therewith, a gas distributor head disposed at one end of the plasma confinement tube and structured to supply at least one gaseous substance into the plasma confinement tube; an inductive coupling member embedded within the tubular torch body for applying energy to the gaseous substance to produce and sustain plasma in the plasma confinement tube, and an electrically conductive capacitive shield on an inner surface of the tubular torch body. The capacitive shield is segmented into axial strips interconnected at one end. Axial grooves are machined in the inner surface of the tubular torch body, the axial grooves being interposed between the axial strips.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: January 12, 2021
    Inventors: Maher I. Boulos, Nicolas Dignard, Alexandre Auger, Jerzy Jurewicz, Sebastien Thellend
  • Patent number: 10852265
    Abstract: A system for voltage measurement of dielectric material in plasma includes a vacuum chamber. The system also includes an electrostatic receiver located outside of the vacuum chamber. The system also includes a conductive probe having a first terminus in contact with the dielectric material in the vacuum chamber and a second terminus in electrical communication with the electrostatic receiver. The system also includes a non-contact electrostatic voltmeter configured to measure a floating potential of the electrostatic receiver that corresponds to a dielectric potential of the dielectric material at a location in contact with the first terminus of the conductive probe.
    Type: Grant
    Filed: June 21, 2018
    Date of Patent: December 1, 2020
    Assignee: UNIVERSITY OF SOUTHERN CALIFORNIA
    Inventors: Kevin Chou, Joseph Wang
  • Patent number: 10827600
    Abstract: In some aspects, electrodes can include a front portion shaped to matingly engage a nozzle of the plasma cutting system, the front portion having a first end comprising a plasma arc emitter disposed therein; and a rear portion thermally connected to a second end of the front portion, the rear portion shaped to slidingly engage with a complementary swirl ring of the plasma cutting system and including: an annular mating feature extending radially from a proximal end of the rear portion of the electrode to define a first annular width to interface with the swirl ring, the annular mating feature comprising a sealing member configured to form a dynamic seal with the swirl ring to inhibit a flow of a gas from a forward side of the annular mating feature to a rearward side of the annular mating feature.
    Type: Grant
    Filed: April 13, 2018
    Date of Patent: November 3, 2020
    Assignee: Hypertherm, Inc.
    Inventors: Sung Je Kim, Jesse A. Roberts, Shreyansh Patel
  • Patent number: 10793447
    Abstract: A system for generating a plasma discharge in liquid utilizes first and second electrodes spaced apart in an interior space of a vessel holding the liquid. A channel can be defined in certain embodiments at least partially by at least one of the first and second electrodes, and an inlet in fluid communication with the interior space is configured to generate a vortical fluid flow in the vessel. A method for generating a plasma discharge in liquid is also provided.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: October 6, 2020
    Assignee: Energy Onvector, LLC
    Inventor: Jun Kang
  • Patent number: 10798809
    Abstract: A conductive rod body is embedded in an insulative torch adapter into which a plasma torch is fitted so that a leading end protrudes from its outer circumferential surface. Further, a metal plate member electrically connected to a cable line to which a voltage for plasma ignition is applied is attached to a lower holder, and a conductive leaf spring member having a V-shaped cross section is attached to an upper holder. When the torch adapter is placed on the lower holder so that the protruding part of the rod body faces upward and the upper holder is closed to tighten a draw latch, the rod body and the metal plate member are electrically connected via the leaf spring member, and a high voltage for ignition can be applied to the plasma torch.
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: October 6, 2020
    Assignee: Shimadzu Coporation
    Inventor: Hidemiki Hayashi
  • Patent number: 10798810
    Abstract: The invention concerns a plasma source including a quarter wave antenna (204) located in a cylindrical enclosure (202) provided with an opening (208) opposite the end of the antenna (204). The diameter (d) of the antenna (204) is in the range from one third to one quarter of the inner diameter (d1) of the enclosure (202). The distance (l) between the end of the antenna (204) and the opening (208) is in the range from ? to 5/3 of the diameter (d) of the antenna (204).
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: October 6, 2020
    Assignee: Polygon Physics
    Inventor: Pascal Sortais
  • Patent number: 10781512
    Abstract: A method for coating a body includes providing a plurality of granules in which each granule includes silicon (Si), carbon (C), chromium (Cr) and an iron group metal. The relative quantities of the Si, C and Cr are such that a molten phase will form at a melting temperature of less than 1,300 degrees Celsius when a threshold quantity of the iron group metal is accessible to the Si, C and Cr. A second source of the iron group metal is also provided. A combination of the granules and the second source is formed such that the threshold quantity of the iron group metal will be accessible to the Si, C and Cr. The granules and the second source are heated to the melting temperature to form the molten phase in contact with the body. The heat is then removed to allow the molten phase to solidify.
    Type: Grant
    Filed: May 22, 2015
    Date of Patent: September 22, 2020
    Assignee: Element Six GmbH
    Inventors: Igor Yurievich Konyashin, Daniel Hlawatschek, Bernd Heinrich Ries
  • Patent number: 10748745
    Abstract: Embodiments include a modular microwave source. In an embodiment, the modular microwave source comprises a voltage control circuit, a voltage controlled oscillator, where an output voltage from the voltage control circuit drives oscillation in the voltage controlled oscillator. The modular microwave source may also include a solid state microwave amplification module coupled to the voltage controlled oscillator. In an embodiment, the solid state microwave amplification module amplifies an output from the voltage controlled oscillator. The modular microwave source may also include an applicator coupled to the solid state microwave amplification module, where the applicator is a dielectric resonator.
    Type: Grant
    Filed: August 16, 2016
    Date of Patent: August 18, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Philip Allan Kraus, Thai Cheng Chua
  • Patent number: 10722971
    Abstract: In some aspects, methods of initiating a plasma arc of a plasma arc torch to pierce a workpiece and detecting plasma piercing through the workpiece to begin a cutting sequence can include calculating a pulse width modulation characteristic of an electrical signal associated with a plasma arc between an electrode of a plasma arc torch and a workpiece to be processed; monitoring the characteristic during operation of the torch over a time period of a workpiece piercing sequence; comparing the characteristic to a threshold value; and responsive to determining that a calculated characteristic meets and/or exceeds the threshold value, ending the workpiece piercing sequence and beginning the cutting sequence and causing the plasma arc torch to move relative to the workpiece to form a cut.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: July 28, 2020
    Assignee: Hypertherm, Inc.
    Inventors: Soumya Mitra, John Peters
  • Patent number: 10722970
    Abstract: In some aspects, methods for limiting damage to a plasma arc torch body resulting from a consumable failure within the torch can include determining a specified conductivity parameter set point of a current to be provided to the plasma arc torch for a material processing operation; measuring a detected conductivity parameter of plasma arc current being provided to the plasma torch to perform the material processing operation; comparing the specified conductivity parameter set point to the detected conductivity parameter of plasma arc current and calculating an error term signal; and based on a determination that the error term signal exceeds a threshold amount, initiating a plasma arc shut down sequence to extinguish the plasma arc to limit damage to the plasma arc torch body.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: July 28, 2020
    Assignee: Hypertherm, Inc.
    Inventors: Stephen M. Liebold, Christopher S. Passage, Soumya Mitra, Steve Dunbar
  • Patent number: 10716610
    Abstract: Provided are a device whereby, during process of a process target such as a cell or the like, localized process of a process part is possible without inflicting damage due to heat, and rejoining and regeneration may proceed readily subsequent to process, and whereby an injection substance may be introduced efficiently; and a device for generating bubbles containing a plasma. Through the use of a localized ablation device employing a bubble jetting member having a core formed from a conductive material, a shell part formed from an insulating material, covering the core and including a section extending from the tip of the core, and a space formed between the extended section of the shell part and the tip of the core, a process target can be treated in localized fashion and without inflicting damage.
    Type: Grant
    Filed: March 1, 2013
    Date of Patent: July 21, 2020
    Assignee: Japan Science and Technology Agency
    Inventors: Yoko Yamanishi, Shinya Sakuma, Hiroki Kuriki, Fumihito Arai
  • Patent number: 10702847
    Abstract: Methods and devices are provided for the plasma-catalytic conversion of materials to produce chemical base materials. The methods and devices allow a plurality of chemical processes to be carried out in a plasma-catalytic manner to produce chemical base materials from simple raw materials (for example methane and biogas) with an improved selectivity and energy balance. A hydrocarbon-containing or other starting material is reacted under the action of a plasma to produce chemical base materials, or such a starting material is converted into an intermediate product in a first step under the action of a plasma, and the intermediate product is converted into the desired base material in a subsequent step. The devices for carrying out plasma-catalytic reactions are characterized by a jet pump arranged downstream of the plasma reactor, a tubular recipient (reaction chamber) having a diameter of at least 4 cm, or a catalyst-containing wall of the recipient.
    Type: Grant
    Filed: October 2, 2014
    Date of Patent: July 7, 2020
    Inventor: Ralf Spitzl
  • Patent number: 10590919
    Abstract: System (300, 400) and methods (500) for testing a reaction thruster (100) in a vacuum environment. The methods comprise: disposing the reaction thruster in a vacuum chamber which is at least partially connected to earth ground; removing at least one gas from the vacuum chamber to provide the vacuum environment; operating the reaction thruster so as to create a beam of electrons; and/or electrically isolating the electrons of the beam from at least one electrically conductive surface of the vacuum chamber. The electrical isolation can be achieved by applying an electrical bias voltage to the beam via an electrode. The electrode may comprise a conductive object disposed in the vacuum chamber and/or at least a portion of a vacuum chamber wall. In all cases, the electrode is electrically isolated from a portion of the vacuum chamber that is connected to ground.
    Type: Grant
    Filed: April 7, 2014
    Date of Patent: March 17, 2020
    Inventors: David Q. King, Peter Y. Peterson, Justin M. Pucci
  • Patent number: 10562145
    Abstract: In order to monitor replacement time for a consumable part of a machine tool, the present invention defines a time period after the power of the machine tool is turned off until the next turn-on thereof as a pause time for the consumable part, and provides a notification that the replacement time for the consumable part has come when the pause time is not less than a predetermined threshold.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: February 18, 2020
    Assignee: MAKINO MILLING MACHINE CO., LTD.
    Inventor: Kenichi Yada
  • Patent number: 10517165
    Abstract: The present invention is a plasma cutting apparatus (A) configured such that a starting gas is switched to plasma gas at the stage when current is applied to an electrode provided to a plasma torch, and a plasma arc is produced at a preset current value on a material (B) to be cut, so as to extend the life of the electrode, wherein the apparatus is configured to have: a starting gas supply unit (2) having a starting gas solenoid valve (2b) provided with a starting gas supply source (2a) and a starting gas pipeline (2c); a plasma gas supply unit (3) having a plasma gas solenoid valve (3b) provided with a plasma gas supply source (3a) and a plasma gas pipeline (3c); a plasma gas connection part (8) for connecting the downstream-side end part of the starting gas supply unit and the downstream-side end part of the plasma gas supply unit; a gas pipeline part (5) for connecting the plasma gas connection part (8) and a torch body (1a); a flow retention member (4) provided to the gas pipeline part; and a control devi
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: December 24, 2019
    Assignee: Koike Sanso Kogyo Co., Ltd.
    Inventors: Ryuji Kobayashi, Masahiro Mogi, Akira Hurujo
  • Patent number: 10500599
    Abstract: A thermal spraying torch configured to spray a molten material onto a thermal sprayed surface of a work object and form a thermal sprayed coating has a discharge port configured to discharge the molten material, a discharge port periphery located on a peripheral edge of the discharge port on a front side in a discharge direction of the molten material and extending in the discharge direction, and an external surface continuous with a front end of the discharge port periphery. The discharge port periphery includes first section to which the molten material adheres more easily than to the external surface. The external surface includes a second section to which the molten material adheres less easily than to the discharge port periphery.
    Type: Grant
    Filed: March 23, 2016
    Date of Patent: December 10, 2019
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Yoshito Utsumi, Satoru Sakurai, Yoshitsugu Noshi
  • Patent number: 10434490
    Abstract: A non-thermal plasma is generated to selectively convert a precursor to a product. More specifically, plasma forming material and a precursor material are provided to a reaction zone of a vessel. The reaction zone is exposed to microwave radiation, including exposing the plasma forming material and the precursor material to the microwave radiation. The exposure of the plasma forming material to the microwave radiation selectively converts the plasma forming material to a non-thermal plasma including formation of one or more streamers. The precursor material is mixed with the plasma forming material and the precursor material is exposed to the non-thermal plasma including exposing the precursor material to the one or more streamers. The exposure of the precursor material to the streamers and the microwave radiation selectively converts the precursor material to a product.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: October 8, 2019
    Assignee: H Quest Vanguard, Inc.
    Inventors: James J. Strohm, George L. Skoptsov, Evan T. Musselman, Kurt W. Zeller
  • Patent number: 10394270
    Abstract: Systems and methods for multiplying the loop voltage of a coil having one or more turns using multiple coil sections to multiply the loop voltage by a factor equal to the number of coil arc sections. The systems and methods for producing fractional turn windings comprise splitting the initial feed line from the capacitor by as many times as the desired total multiple of the voltage in the capacitor, and applying the feeds to the respective fractional turns or arc sections of the coil.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: August 27, 2019
    Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Mark Morehouse, Eusebio Garate
  • Patent number: 10390417
    Abstract: Disclosed is a demountable tube for a plasma torch assembly, such as an ICP torch assembly. The tube includes an open tubular body for radially surrounding a plasma within the tubular body. The tubular body may comprise a wall; and a mounting feature projecting from the tubular body for at least one of: (i) controlling alignment of the tubular body with respect to a mounting portion of the torch assembly, and (ii) releasably securing the tubular body to a portion of the torch assembly. The tubular body may also have a transmission zone that is partially devoid of said wall and includes at least one hole through said wall. The tube may be opaque. A plasma torch and ICP spectroscopy system are also disclosed.
    Type: Grant
    Filed: December 8, 2017
    Date of Patent: August 20, 2019
    Assignee: Glass Expansion PTY. Limited
    Inventors: Danny Brezni, Jost E. Kaiser, David J. Sultana
  • Patent number: 10384482
    Abstract: An applicator assembly for treating a contoured surface including an attachment frame configured to secure and position an applicator head. In some embodiments, the applicator head is configured to apply a surface treatment to the contoured surface. The applicator assembly further includes, at least one sensor operatively coupled to the attachment frame and configured to scan the contoured surface and produce a contoured data set. Additionally, the applicator assembly includes an applicator actuator operatively coupled to the attachment frame and configured to manipulate the attachment frame such that the applicator assembly maintains an orientation of the applicator assembly relative to the contoured surface.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: August 20, 2019
    Assignee: The Boeing Company
    Inventors: Raymond C. Eng, Kyle S. Biondich, Bennett M. Moriarty, Matthew H. Mellin, Justin T. Hoehn, George P. Halamandaris, John E. Miller, Jeffrey H. Olberg, Shane E. Arthur
  • Patent number: 10375810
    Abstract: Certain embodiments described herein are directed to devices that can be used to sustain a capacitively coupled plasma. In some examples, a capacitive device can be used to sustain a capacitively coupled plasma in a torch in the absence of any substantial inductive coupling. In certain embodiments, a helium gas flow can be used with the capacitive device to sustain a capacitively coupled plasma.
    Type: Grant
    Filed: October 14, 2016
    Date of Patent: August 6, 2019
    Assignee: PerkinElmer Health Sciences, Inc.
    Inventor: Peter J Morrisroe
  • Patent number: 10375773
    Abstract: Provided is a microwave heating apparatus capable of effectively preventing the generation of sparks when an object containing a conductor (including a metal precursor such as a metal oxide) or a semiconductor is subjected to microwave heating. A microwave heating apparatus supplies a microwave so that the direction of the electrical flux line of the microwave is identical with the direction substantially parallel with a surface of a plate-like substrate and having thereon a pattern containing a conductor, a metal oxide, or a semiconductor, the substrate being arranged in the waveguide. The microwave heating apparatus also controls a pulse width of the microwave so that pulsed microwaves are supplied to the surface having the pattern thereon.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: August 6, 2019
    Assignee: SHOWA DENKO K.K.
    Inventors: Hiroshi Uchida, Kazuaki Senda, Mutsumi Yoshida