Abstract: An object of the present invention is to provide a ceramic heater for a semiconductor producing/examining device having a resistance heating element superior in adhesion to a substrate, and the ceramic heater for a semiconductor producing/examining device of the present invention is a ceramic heater for a semiconductor producing/examining device including: a ceramic substrate; and a resistance heating element formed on the surface of the ceramic substrate, wherein irregularities are formed on the side face of the resistance heating element.

Abstract: An object of the present invention is to provide a ceramic heater for a semiconductor producing/examining device wherein resistance heating elements which do not cause a short circuit and the like, are relatively inexpensive and have a precise pattern can be formed. The present invention is a ceramic heater for a semiconductor-producing/examining device comprising a ceramic substrate and a resistance heating element formed on the ceramic substrate, wherein trimming is performed on said resistance heating element.

Abstract: Disclosed is a heating system, at least comprising a ceramic substrate and a resistive layer. The resistive layer comprises a thermally stable resin which is filled with a conductive material.

Abstract: A heating apparatus includes a heater 6 which includes a first heating conductor pattern 1, a second heating conductor patterns 2 and an elongated plate-shaped member 3 made of heat-resistive and insulated material. The first heating conductor pattern 1 is disposed in the central portion in a longitudinal direction of the plate-shaped member 3. The second heating conductor patterns are disposed in both end portions of the plate-shaped member in the longitudinal direction. The first heating conductor pattern 1 and the second heating conductor patterns 2 are independently controlled their temperature. Current is first fed to the first heating conductor pattern 1, and the current feeding is stopped, and current is then fed to the second heating conductor patterns 2. Accordingly, the protective member placed on and along the heater 6 is gradually heated from the center to both ends.

Abstract: A processing station adaptable to standard cluster tools has a vertically-translatable pedestal having an upper wafer-support surface including a heater plate adapted to be plugged into a unique feedthrough in the pedestal. At a lower position for the pedestal wafers may be transferred to and from the processing station, and at an upper position for the pedestal the pedestal forms an annular pumping passage with a lower circular opening in a processing chamber. A removable, replaceable ring at the lower opening of the processing chamber allows process pumping speed to be tailored for different processes by replacing the ring. In some embodiments the pedestal also has a surrounding shroud defining an annular pumping passage around the pedestal. A unique two-zone heater plate is adapted to the top of the pedestal, and connects to a unique feedthrough allowing heater plates to be quickly and simply replaced.

Abstract: A heating element assembly in the form of a heating shelf and a method of manufacturing heating shelf assemblies. The heating shelf may be used in display cabinets to heat ready made foods such as cookies, muffins, donuts, pizza, sandwiches and the like. The preferred heating shelf includes thermochromic materials, or an LED indicator, which provide a visual indica of shelf temperature. The preferred heating shelf provides intimate contact with the heated food products, thus optimizing heat transfer between the heating shelf and the food products. Optionally provided, varied surface watt density in the heating shelf allows for accurate heat placement such that the food products can be evenly warmed while avoiding over warming. In another embodiment, the heating shelf includes two resistance heating elements. The first heating element is a temperature booster used for defrosting and heating, while the second heating element is a maintenance heater to maintain heated food at a serving temperature.

Abstract: A thin film tin-oxide heater (10) including an annular inner heat region (12), an annular outer heat region (14), a first silver buss bar (16), and a second silver buss bar (18). The radius (r2) between the inner and outer heat regions is selected so that the resistance per unit square and power per unit area for the inner heat region approximates the resistance per unit square and power per unit area for the outer heat region.

Abstract: A range cook top is provided with circular heating zones having a layer of resistive thin film thereon. Slots in the cook top separate the heating zones from the surrounding areas of the cook top. The heating zone includes a resistive layer elements formed by a rectangular layer surrounded by annular arcuate segments. Power supply bus bars are disposed around edges of the resistive layer elements. A dual heater has separately controlled rectangular and annular resistive elements. Temperature sensors are also provided.

Abstract: A processing station adaptable to standard cluster tools has a vertically-translatable pedestal having an upper wafer-support surface including a heater plate adapted to be plugged into a unique feedthrough in the pedestal. At a lower position for the pedestal wafers may be transferred to and from the processing station, and at an upper position for the pedestal the pedestal forms an annular pumping passage with a lower circular opening in a processing chamber. A removable, replaceable ring at the lower opening of the processing chamber allows process pumping speed to be tailored for different processes by replacing the ring. In some embodiments the pedestal also has a surrounding shroud defining an annular pumping passage around the pedestal. A unique two-zone heater plate is adapted to the top of the pedestal, and connects to a unique feedthrough allowing heater plates to be quickly and simply replaced.