Electron Probe Type Patents (Class 250/310)
  • Patent number: 11152186
    Abstract: An object of the present disclosure is to propose a charged particle beam device capable of appropriately evaluating and setting a beam aperture angle. As one aspect for achieving the above-described object, provided is a charged particle beam device which includes a plurality of lenses and controls the plurality of lenses so as to set a focus at a predetermined height of a sample and to adjust the beam aperture angle. The charged particle beam device generates a first signal waveform based on a detection signal obtained by scanning with the beam in a state where the focus is set at a first height that is a bottom portion of a pattern formed on the sample, calculates a feature amount of a signal waveform on a bottom edge of the pattern based on the first signal waveform, and calculates the beam aperture angle based on the calculated feature amount.
    Type: Grant
    Filed: March 15, 2019
    Date of Patent: October 19, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Wataru Yamane, Minoru Yamazaki, Yuko Sasaki, Wataru Mori, Takashi Doi
  • Patent number: 11150552
    Abstract: The present invention relates to a method for analyzing at least one defective location of a photolithographic mask, having the following steps: (a) obtaining measurement data for the at least one defective location of the photolithographic mask; (b) determining reference data of the defective location from computer-aided design (CAD) data for the photolithographic mask; (c) correcting the reference data with at least one location-dependent correction value; and (d) analyzing the defective location by comparing the measurement data to the corrected reference data.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: October 19, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Michael Budach, Ralf Schönberger
  • Patent number: 11145487
    Abstract: A scanning electron microscope with a composite detection system and a specimen detection method. The scanning electron microscope includes a composite objective lens system including an immersion magnetic lens and an electro lens, configured to focus an initial electron beam to a specimen to form a convergent beam spot; a composite detection system located in the composite objective lens system; and a detection signal amplification and analysis system. A magnetic field of the immersion magnetic lens is immersed in the specimen; the electro lens is configured to decelerate the initial electron beam and focus the initial electron beam onto the specimen, and separate BSEs from a transmission path of an X-ray; the composite detection system is located below an inner pole piece of the immersion magnetic lens, is located above the control electrode, and includes an annular BSE detector and an annular X-ray detector that have a same axis center.
    Type: Grant
    Filed: September 20, 2019
    Date of Patent: October 12, 2021
    Assignee: FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD.
    Inventor: Shuai Li
  • Patent number: 11135294
    Abstract: A method and system for treating a subject with a disorder which provides within the subject at least one photoactivatable drug for treatment of the subject, applies initiation energy from at least one source to generate inside the subject a preferential x-ray flux for generation of Cherenkov radiation (CR) light capable of activating at least one photoactivatable drug, and from the CR light, activating inside the subject the at least one photoactivatable drug to thereby treat the disorder.
    Type: Grant
    Filed: October 26, 2016
    Date of Patent: October 5, 2021
    Assignees: IMMUNOLIGHT, LLC, DUKE UNIVERSITY
    Inventors: Mark Oldham, Justus Adamson, Mark W. Dewhirst, Paul Yoon, Harold Walder, Frederic A. Bourke, Jr., Zakaryae Fathi, Wayne F. Beyer, Jr.
  • Patent number: 11139144
    Abstract: The present invention provides a charged particle beam apparatus that covers a wide range of detection angles of charged particles emitted from a sample.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: October 5, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunsuke Mizutani, Shahedul Hoque, Uki Ikeda, Makoto Suzuki
  • Patent number: 11131617
    Abstract: A system for analyzing a fluid includes or uses a movable flow cell assembly being disposed in an analysis location on a wall of an analysis instrument and being configured to be retained by a locking assembly on a first surface of the wall. The system includes a probe head assembly located on an opposed second surface of the wall, the probe head assembly to direct an X-ray source to analyze the fluid in a static state in the movable flow cell assembly or in a flow mode through the movable flow cell assembly. The movable flow cell assembly and the probe head assembly are in electro-magnetic communication for elemental analysis of the fluid using the X-ray source when the movable flow cell assembly is retained by the locking assembly on the first surface of the wall.
    Type: Grant
    Filed: July 21, 2020
    Date of Patent: September 28, 2021
    Assignee: Olympus America Inc.
    Inventors: Gerard Colclough, Steven W. Chin, Ronald Scott Collicutt, Alex Thurston, Michael Murray, Ernest Moseley, Jacob LaRocca, Joel W. Kenyon
  • Patent number: 11133149
    Abstract: A focused ion beam apparatus (100) includes: a focused ion beam lens column (20); a sample table (51); a sample stage (50); a memory (6M) configured to store in advance three-dimensional data on the sample table and an irradiation axis of the focused ion beam, the three-dimensional data being associated with stage coordinates of the sample stage; a display (7); and a display controller (6A) configured to cause the display to display a virtual positional relationship between the sample table (51v) and the irradiation axis (20Av) of the focused ion beam, which is exhibited when the sample stage is operated to move the sample table to a predetermined position, based on the three-dimensional data on the sample table and the irradiation axis of the focused ion beam.
    Type: Grant
    Filed: September 22, 2020
    Date of Patent: September 28, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Toshihiro Mochizuki, Haruyuki Ishii, Atsushi Uemoto
  • Patent number: 11133147
    Abstract: The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: September 28, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshiyuki Yokosuka, Hajime Kawano, Kouichi Kurosawa, Hideyuki Kazumi, Chahn Lee
  • Patent number: 11127564
    Abstract: An immersion objective lens is configured below a stage such that multiple detectors can be configured above sample for large beam current application, particularly for defect inspection. Central pole piece of the immersion objective lens thus can be provided that a magnetic monopole-like field can be provided for electron beam. Auger electron detector thus can be configured to analyze materials of sample in the defect inspection.
    Type: Grant
    Filed: January 15, 2020
    Date of Patent: September 21, 2021
    Assignee: KKT HOLDINGS SYNDICATE
    Inventors: Tzu-Yi Kuo, Yu-Kuang Tseng
  • Patent number: 11114274
    Abstract: A method for analyzing an integrated circuit includes: applying an electric test pattern to the IC; delivering a stream of primary electrons to a back side of the IC on an active region to a transistor of interest, the active region including active structures such as transistors of the IC; detecting light resulting from cathodoluminescence initiated by secondary electrons in the IC; and analyzing the detected light regarding a correlation with the electric test pattern applied to the IC. A system for analyzing an IC is provided.
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: September 7, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Theodore Lundquist, Baohua Niu
  • Patent number: 11114276
    Abstract: An apparatus for processing and observing a cross-section includes: a sample bed holding a sample; a focused ion beam column radiating a focused ion beam to the sample; an electron beam column radiating an electron beam to the sample, perpendicularly to the focused ion beam; an electron detector detecting secondary electrons or reflection electrons generated from the sample; a irradiation position controller controlling irradiation positions of the focused ion beam and the electron beam based on target irradiation position information showing target irradiation positions of beams on the sample; a process controller controlling a cross-section-exposing process that exposes a cross-section of the sample by radiating the focused ion beam to the sample and a cross-section image-obtaining process that obtains a cross-section image of the cross-section by radiating the electron beam to the cross-section; and an image quality corrector correcting image quality of the cross-section image obtained.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: September 7, 2021
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventors: Xin Man, Tatsuya Asahata, Makoto Sato
  • Patent number: 11107655
    Abstract: In order to optimize defect contrast in a charged particle beam device that inverts charged particles directly above a sample and observes the electrons, this charged particle beam device is provided with a charged particle source, an electron gun control device which applies a first voltage to the charged particle source, a substrate voltage control device which applies a second voltage to a sample, an image forming optical system which includes an imaging lens for imaging charged particles incident from the direction of the sample, a detector which includes a camera for detecting the charged particles, and an image processing device which processes the detected signal, wherein the imaging optical system is configured so as not to image secondary electrons emitted from the sample, but forms an image with mirror electrons bounced back by the electric field formed on the sample by means of the potential difference between the first and the second voltages.
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: August 31, 2021
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tomohiko Ogata, Masaki Hasegawa, Katsunori Onuki, Noriyuki Kaneoka, Hisaya Murakoshi
  • Patent number: 11107657
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: May 4, 2020
    Date of Patent: August 31, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Patent number: 11101100
    Abstract: The purpose of the present invention is to provide a charged particle ray device which is capable of simply estimating the cross-sectional shape of a pattern. The charged particle ray device according to the present invention acquires a detection signal for each different discrimination condition of an energy discriminator, and estimates the cross-sectional shape of a sample by comparing the detection signal for each discrimination condition with a reference pattern (see FIG. 5).
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: August 24, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Toshiyuki Yokosuka, Hajime Kawano, Kouichi Kurosawa, Hideyuki Kazumi, Chahn Lee
  • Patent number: 11092557
    Abstract: A method of generating a result image of an object using a particle beam system includes recording multiple primary images of a region of the object using the particle beam system. Recording of each of the primary images includes scanning the primary particle beam along a scan direction across the region and detecting secondary particles generated thereby. The scan directions used for recording at least one pair of two of the primary images differ at least by a first threshold value of at least 10°. The method also includes generating, based on the multiple primary images, the result image representing the region of the object.
    Type: Grant
    Filed: March 24, 2020
    Date of Patent: August 17, 2021
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Luyang Han
  • Patent number: 11087957
    Abstract: A method of operating a particle beam microscope includes repeating a sequence to move a particle beam across a surface of an object. The surface of the object has a region defined by a closed boundary line. The sequence includes moving the particle beam from an entry location of the present sequence to an exit location of the present sequence along a scan path. The entry location of the present sequence and the exit location of the present sequence are located on the boundary line. The scan path is located entirely inside the region of the surface of the object. The sequence also includes moving the particle beam from the exit location of the present sequence to an entry location of the next sequence along a return path. The entry location of the next sequence is located on the boundary line. The return path is located entirely outside the region of the surface of the object.
    Type: Grant
    Filed: January 16, 2020
    Date of Patent: August 10, 2021
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss Microscopy GmbH
    Inventors: Daniel Fischer, Josef Biberger, Pedro Besteiro
  • Patent number: 11080860
    Abstract: An image inspection method includes capturing a target object image, which the target object image comprises a plurality of graphical features; choosing a block image comprising a specific graphical feature of the plurality of graphical features from the target object image; capturing all the graphical features of the block image to obtain a region of interest (ROI); executing a filtering process or a recovering process on the ROI to obtain a pre-processed region; and inspecting, according to the pre-processed region, the target object image to determine whether the target object image has defects.
    Type: Grant
    Filed: November 24, 2019
    Date of Patent: August 3, 2021
    Assignee: CHROMA ATE INC.
    Inventors: Ting-Wei Chen, Yu-Hsin Liu, Ming-Kai Hsueh
  • Patent number: 11069548
    Abstract: A substrate processing method is provided. The substrate processing method includes placing a substrate storage container storing a substrate on a load port; automatically determining a type of the substrate stored in the placed substrate storage container; by referring to a storage unit that stores a parameter data set related to a transport condition for each substrate type, controlling transport of the substrate stored in the substrate storage container based on the parameter data set corresponding to the automatically determined type of the substrate to process the substrate, and, after automatically determining the type of the substrate, and before transporting the substrate stored in the substrate storage container, performing mapping based on conditions set in the parameter data set to detect an abnormality of the substrate stored in the substrate storage container.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: July 20, 2021
    Assignee: Tokyo Electron Limited
    Inventors: Toru Nishino, Kiyohito Iijima, Shigeru Ishizawa
  • Patent number: 11059872
    Abstract: The present disclosure relates, in some embodiments, to a composition comprising a biomaterial. A biomaterial may comprise, for example, one or more molecules capable of self-association and/or self-assembly. In some embodiments, a biomaterial may comprise one or more polypeptides and/or proteins. A biomaterial may comprise, for example, two or more self-assembled Ultrabithorax (Ubx) protein molecules. A Ubx protein, in some embodiments, may be any wild type Drosophila melanogaster Ultrabithorax protein, including any natural or non-natural isoforms (e.g., alternative splicing isoforms). The present disclosure relates, in some embodiments, to a method of making a biomaterial comprising contacting two or more Ubx protein molecules under conditions that permit self-assembly to form a first fibril and contacting the first fibril to a second fibril.
    Type: Grant
    Filed: November 13, 2009
    Date of Patent: July 13, 2021
    Assignee: BONDWELL TECHNOLOGIES LP
    Inventors: Sarah E. Bondos, Alexandra M. Greer, Kathleen S. Matthews, Zhao Huang, Autumn Brawley, Jan Patterson
  • Patent number: 11062434
    Abstract: A method of generating an elemental map includes: acquiring a plurality of correction channel images by scanning a surface of a standard specimen having a uniform elemental concentration with a primary beam and generating a correction channel image for each channel; generating correction information for each pixel of each correction channel image among the plurality of correction channel images based on a brightness value of the pixel; acquiring a plurality of analysis channel images by scanning a surface of a specimen to be analyzed with the primary beam and generating an analysis channel image for each channel; correcting brightness values of pixels constituting an analysis channel image among the plurality of analysis channel images based on the correction information; and generating an elemental map of the specimen to be analyzed based on the plurality of analysis channel images having pixels with corrected brightness values.
    Type: Grant
    Filed: October 2, 2019
    Date of Patent: July 13, 2021
    Assignee: JEOL Ltd.
    Inventor: Tatsuya Uchida
  • Patent number: 11054460
    Abstract: A soft error inspection method for a semiconductor device includes: irradiating and scanning the semiconductor device with a laser beam or an electron beam; and measuring and storing a time of bit inversion for each of areas irradiated with the laser beam or the electron beam of the semiconductor device.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: July 6, 2021
    Assignee: FUJITSU LIMITED
    Inventor: Takeshi Soeda
  • Patent number: 11049686
    Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.
    Type: Grant
    Filed: November 25, 2019
    Date of Patent: June 29, 2021
    Assignee: Carl Zeiss MultiSEM GmbH
    Inventors: Dirk Zeidler, Stefan Schubert
  • Patent number: 11043359
    Abstract: Provided are a charged particle beam apparatus and a charged particle beam inspection system capable of estimating electrical characteristics of a sample including capacitance characteristics. The charged particle beam apparatus estimates electrical characteristics of the sample using the correspondence data representing the correspondence between the node of the netlist and the coordinate on the sample and the pulsing condition when the sample is irradiated with the charged particle beam in a pulsed manner. The charged particle beam optical system irradiates a predetermined coordinate on the sample with a charged particle beam based on a pulsing condition, and the detector actually measures an emission amount of electrons.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: June 22, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Takafumi Miwa, Muneyuki Fukuda, Junichi Tanaka
  • Patent number: 11043357
    Abstract: A supply unit for driving an electrode of a charged particle beam column, the supply unit includes a first amplifier and a second amplifier that are configured to receive an input signal, an output of the first amplifier is coupled, via the first resistor, to a signal line of the coaxial cable, an output of the second amplifier is coupled, via the second resistor, to a main shield of the coaxial cable, one port of the first amplifier and one port of the second amplifier are coupled to a power supply return port. The signal line is configured to provide a first driving signal to an that is coupled between the signal line and the power supply return port.
    Type: Grant
    Filed: January 23, 2020
    Date of Patent: June 22, 2021
    Assignee: Applied Materials Israel Ltd.
    Inventor: Pavel Margulis
  • Patent number: 11024481
    Abstract: A scanning electron microscope. The scanning electron microscope may include a sliding vacuum seal between the electron optical imaging system and the sample carrier with a first plate having a first aperture associated with the electron optical imaging system and resting against a second plate having a second aperture associated with the sample carrier. The first plate and/or the second plate includes a groove circumscribing the first and/or second aperture. The scanning electron microscope may include a detector movable relative to the electron beam. The scanning electron microscope may include a motion control unit for moving a sample carrier along a collision free path.
    Type: Grant
    Filed: August 31, 2020
    Date of Patent: June 1, 2021
    Assignee: FEI Company
    Inventors: Karel Diederick Van Der Mast, Adrianus Franciscus Johannes Hammen, Wilhelmus Henrica Cornelis Theuws, Sander Richard Marie Stoks
  • Patent number: 11011346
    Abstract: To acquire a correction image by performing a sub-pixel shift process for shifting an image using a pixel interpolation filter by a pixel shift amount between pixels and a frequency correction process for correcting a frequency characteristic of the image after shifted.
    Type: Grant
    Filed: March 5, 2020
    Date of Patent: May 18, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Koichi Hamada, Kei Sakai, Satoru Yamaguchi
  • Patent number: 11003942
    Abstract: A method for crystal analysis includes identifying a crystalline region on a device where an electronic channeling pattern is needed to be determined, acquiring a whole image for each of a plurality of different positions for the crystalline region using a scanning electron microscope (SEM) as the crystalline region is moved to different positions. Relevant regions are extracted from the whole images. The images of the relevant regions are stitched together to form a composite map of a full electron channeling pattern representative of the crystalline region wherein the electronic channeling pattern is provided due to an increase in effective angular range between a SEM beam and a surface of the crystal region.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: May 11, 2021
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Stephen W. Bedell, Kunal Mukherjee, John A. Ott, Devendra K. Sadana, Brent A. Wacaser
  • Patent number: 11000696
    Abstract: The invention comprises a method and apparatus for scanning charged particles in a cancer therapy system, comprising the steps of: (1) providing a first and second dipole magnet system and a gap, the gap comprising a common gap length, along a path of the charged particles, within both the first and second dipole magnet systems, the gap comprising a progressively increasing x/y-plane cross-section area from an entrance area of the charged particles into the double dipole magnet system to an exit area of the double dipole magnet system, the x/y-plane perpendicular to a z-axis from a center of the entrance area to a center of the exit area; (2) scanning the positively charged particles along a first axis of the x/y-plane using the first dipole magnet system; and (3) scanning the positively charged particles along a second axis of the x/y-plane using the second dipole magnet system.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: May 11, 2021
    Inventors: Faye Hendley Elgart, Nick Ruebel, Mark R. Amato, Nandish Desai, W. Davis Lee
  • Patent number: 10996238
    Abstract: A driving mechanism relatively displaces a measuring unit and a sample table such that a relative positional relationship between the measuring unit and the sample table is switched between a first positional relationship and a second positional relationship. In the second positional relationship, the sample table is exposed to the outside from within a lower housing. A controller includes a high voltage generation circuit that generates a high voltage to be supplied to a scanner. A first mechanical switch causes a power supply not to supply a voltage to the high voltage generation circuit in the second positional relationship.
    Type: Grant
    Filed: February 11, 2020
    Date of Patent: May 4, 2021
    Assignee: Shimadzu Corporation
    Inventor: Keita Fujino
  • Patent number: 10997465
    Abstract: An information processing device includes a first acquiring unit configured to acquire geometric information relating to a target object to be recognized, a decision unit configured to decide an imaging position and orientation at which the target object is imaged, based on the geometric information acquired by the first acquiring unit, a second acquiring unit configured to acquire an image of the target object which has been captured at the imaging position and orientation decided by the decision unit, and a generation unit configured to generate learning data, based on the geometric information acquired by the first acquiring unit and the image acquired by the second acquiring unit.
    Type: Grant
    Filed: January 17, 2018
    Date of Patent: May 4, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takayuki Yamada, Akihiro Katayama, Kazuhiko Kobayashi
  • Patent number: 10991541
    Abstract: A detector, comprising: a semiconductor substrate which detects an incident electron beam; a supporting substrate which is thicker than the semiconductor substrate and which supports the semiconductor substrate; and an insulating film layer which is provided between the semiconductor substrate and the supporting substrate, wherein at least one charge suppression film which is not electrically connected to the semiconductor substrate is formed inside the insulating film layer.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: April 27, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hajime Ikeda, Masahiro Kobayashi, Yukihiro Kuroda
  • Patent number: 10984977
    Abstract: A particle beam system for examining and processing an object includes an electron beam column and an ion beam column with a common work region, in which an object may be disposed and in which a principal axis of the electron beam column and a principal axis of the ion beam column meet at a coincidence point. The particle beam system further includes a shielding electrode that is disposable between an exit opening of the ion beam column and the coincidence point. The shielding electrode is able to be disposed closer to the coincidence point than the electron beam column.
    Type: Grant
    Filed: December 6, 2019
    Date of Patent: April 20, 2021
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Erik Essers
  • Patent number: 10984980
    Abstract: The objective of the present invention is to provide a charged particle beam device for setting, from an image of a trench-like groove or a pit, device conditions for finding a hole or the like provided in the trench or the pit, or measuring a hole or the like provided inside the trench or the like with high accuracy. In the present invention, a charged particle beam device comprises: a deflector for causing a charged particle beam emitted from a charged particle source to perform a scan; a detector for detecting a charged particle obtained on the basis of the scanning of the charged particle beam; and a computation processing device for generating an image on the basis of the output of the detector.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: April 20, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Kei Sakai, Satoru Yamaguchi, Hideki Itai, Yasunori Takasugi, Kumiko Shimizu
  • Patent number: 10984999
    Abstract: A device for detecting charged particles includes a substrate, a charge detection plate and an integrated circuit unit that are electrically connected together and respectively disposed on non-coplanar first and second sides of the substrate, and an interference shielding unit substantially enclosing the charge detection plate and the integrated circuit unit in such a manner as to permit impingement on the charge detection plate by the charged particles from outside of the interference shielding unit. The integrated circuit unit disposed on the second side is non-coplanar with the charge detection plate disposed on the first side so as to prevent interference on the integrated circuit unit by the charged particles.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: April 20, 2021
    Assignee: ACROMASS TECHNOLOGIES, INC
    Inventors: Hung-Liang Hsieh, Chun-Yen Cheng, Yi-Kun Lee, Chih-Hsiang Yang, Liang-Chun Fan, Yao-Hsin Tseng, Szu-Wei Chou
  • Patent number: 10984981
    Abstract: A charged particle beam device is provided which minimizes the beam irradiation amount while maintaining a high measurement success rate. The charged particle beam device includes a control device for controlling a scan deflector on the basis of selection of a predetermined number n of frames, wherein the control device controls the scan deflector so that a charged particle beam is selectively scanned on a portion on a sample corresponding to a pixel satisfying a predetermined condition or a region including the portion on the sample from an image obtained by scanning the charged particle beam for a number m of frames (m?1), the number m of frames being smaller than the number n of frames.
    Type: Grant
    Filed: August 31, 2018
    Date of Patent: April 20, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hideki Itai, Kumiko Shimizu, Wataru Mori, Hajime Kawano, Shahedul Hoque
  • Patent number: 10957510
    Abstract: A device for generating a source current of charge carriers and a method for stabilizing a source current of charge carriers are disclosed. In an embodiment the device includes at least one field emission element configured to emit charge carriers, which lead to an emission current in the field emission element, at least one extraction electrode configured to apply an extraction voltage in order to extract the charge carriers from the field emission element, wherein a first part of the extracted charge carriers contributes to the source current, and a second part of the extracted charge carriers impinges on the extraction electrode and leads to an extraction current in the extraction electrode and a control device configured to reduce fluctuations of a controlled variable Q which is a characteristic for the source current, wherein Q is a function of a difference between the emission current and the extraction current.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: March 23, 2021
    Assignee: KETEK GmbH
    Inventors: Felix Düsberg, Michael Bachmann
  • Patent number: 10950412
    Abstract: An observation method includes: preparing a specimen including, as a mark a plurality of metal particles in which localized surface plasmon resonance is excited by irradiation with light; acquiring an optical microscope image by photographing the specimen with an optical microscope; acquiring an electron microscope image by photographing the specimen with an electron microscope; acquiring information of the positions and the colors of the plurality of metal particles in the optical microscope image; acquiring information of the positions and the particle diameters of the plurality of metal particles in the electron microscope image; and determining information for associating the optical microscope image and the electron microscope image based on the information of the positions and the colors of the plurality of metal particles acquired from the optical microscope image, and the information of the positions and the particle diameters of the plurality of metal particles acquired from the electron microscope i
    Type: Grant
    Filed: February 12, 2020
    Date of Patent: March 16, 2021
    Assignee: JEOL Ltd.
    Inventors: Tomohiro Haruta, Yuta Ikeda
  • Patent number: 10950410
    Abstract: Provided is a multiple electron beam inspection apparatus including: an irradiation source irradiating a substrate with multiple electron beams; a stage on which is cable of mounting the substrate; an electromagnetic lens provided between the irradiation source and the stage, the electromagnetic lens generating a lens magnetic field, the multiple electron beams being capable of passing through the lens magnetic field; an electrostatic lens provided in the lens magnetic field, the electrostatic lens including a plurality of through-holes and a plurality of electrodes, the plurality of through-holes having wall surfaces respectively, each of the multiple electron beams being capable of passing through the corresponding each of the plurality of through-holes, each of the plurality of electrodes provided on each of the wall surfaces of the plurality of through-holes, at least one of the through-holes provided apart from a central axis of trajectory of the multiple electron beams having a spiral shape; and a power
    Type: Grant
    Filed: November 18, 2019
    Date of Patent: March 16, 2021
    Assignee: NuFlare Technology, Inc.
    Inventors: Kazuhiko Inoue, Atsushi Ando, Munehiro Ogasawara
  • Patent number: 10937146
    Abstract: The image evaluation device includes a design data image generation unit that images design data; a machine learning unit that creates a model for generating a design data image from an inspection target image, using the design data image as a teacher and using the inspection target image corresponding to the design data image; a design data prediction image generation unit that predicts the design data image from the inspection target image, using the model created by the machine learning unit; a design data image generation unit that images the design data corresponding to the inspection target image; and a comparison unit that compares a design data prediction image generated by the design data prediction image generation unit and the design data image. As a result, it is possible to detect a systematic defect without using a defect image and generating misinformation frequently.
    Type: Grant
    Filed: January 18, 2019
    Date of Patent: March 2, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shinichi Shinoda, Masayoshi Ishikawa, Yasutaka Toyoda, Yuichi Abe, Hiroyuki Shindo
  • Patent number: 10937628
    Abstract: The purpose of the present invention is to provide a charged particle beam device with which it is possible to identify, to a high degree of accuracy, repeat patterns generated by a multiple exposure method such as SADP or SAQP.
    Type: Grant
    Filed: January 27, 2017
    Date of Patent: March 2, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Chikako Abe, Hitoshi Sugahara
  • Patent number: 10928417
    Abstract: An atomic force microscope includes a raster scan control mechanism configured to perform a raster scan between a cantilever having a probe at a free end and a sample relative to each other across an XY plane in a fluid, an interaction control mechanism configured to vibrate the cantilever and to control an interaction generated between the probe and the sample, and a sample information acquisition circuit configured to acquire sample information including inclination information of a sample surface with respect to the XY plane based on a control result of the interaction control mechanism. The interaction control mechanism is configured to control the interaction generated between the probe and the sample in accordance with inclination of the sample surface with respect to the XY plane.
    Type: Grant
    Filed: November 13, 2019
    Date of Patent: February 23, 2021
    Assignee: OLYMPUS CORPORATION
    Inventor: Nobuaki Sakai
  • Patent number: 10928335
    Abstract: Techniques for adapting an adaptive specimen image acquisition system using an artificial neural network (ANN) are disclosed. An adaptive specimen image acquisition system is configurable to scan a specimen to produce images of varying qualities. An adaptive specimen image acquisition system first scans a specimen to produce a low-quality image. An ANN identifies objects of interest within the specimen image. A scan mask indicates regions of the image corresponding to the objects of interest. The adaptive specimen image acquisition system scans only the regions of the image corresponding to the objects of interest, as indicated by the scan mask, to produce a high-quality image. The low-quality image and the high-quality image are merged in a final image. The final image shows the objects of interest at a higher quality, and the rest of the specimen at a lower quality.
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: February 23, 2021
    Assignee: FEI Company
    Inventor: Pavel Potocek
  • Patent number: 10921269
    Abstract: A method for implementing a scanning electron microscopy characterisation technique for the determination of at least one critical dimension of the structure of a sample in the field of dimensional metrology, known as CD-SEM technique, includes producing an experimental image; from a first theoretical model based on parametric mathematical functions, calculating a second theoretical model U(Pi,ti) describing the signal measured at the position Pi at the instant ti, the second model U(Pi,ti) being obtained by algebraic summation of a corrective term S(Pi,ti); determining the set of parameters present in the second theoretical model; wherein the corrective term S(Pi,ti) is calculated by summing the signal coming from the electric charges deposited by the primary electron beam at a plurality of instants t less than or equal to ti.
    Type: Grant
    Filed: December 12, 2017
    Date of Patent: February 16, 2021
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Patrick Quemere, Jérôme Hazart
  • Patent number: 10910193
    Abstract: An electron detector assembly configured for detecting electrons emitted from a sample irradiated by an electron beam, including a scintillator configured with a scintillator layer formed with a scintillating surface. The scintillator layer emits light signals corresponding to impingement of electrons upon the scintillating surface. A light guide plate is coupled to the scintillator layer and includes a peripheral surface. One or more silicon photomultiplier devices are positioned upon the peripheral surface, wherein one or more silicon photomultiplier devices are arranged perpendicularly or obliquely relative to the scintillating surface. The silicon photomultiplier device is configured to yield an electrical signal from an electron impinging upon the scintillator surface.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: February 2, 2021
    Assignee: EL-MUL TECHNOLOGIES LTD.
    Inventors: Eli Cheifetz, Amit Weingarten, Semyon Shopman, Silviu Reinhorn, Dmitry Shur
  • Patent number: 10908075
    Abstract: A fluorescent spectrum correcting method includes comparing fluorescent spectrum obtained from micro-particles labeled with a plurality of fluorescent pigments with reference spectrum to separating the fluorescent spectrum into fluorescent spectrum for each pigment, and previously measured spectrum data is used as the reference spectrum.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: February 2, 2021
    Assignee: SONY CORPORATION
    Inventors: Masaya Kakuta, Koji Futamura, Yoshitsugu Sakai, Yasunobu Kato
  • Patent number: 10903037
    Abstract: An object of the invention is to stably supply an electron beam from an electron gun, that is, to prevent variation in intensity of the electron beam. The invention provides a charged particle beam device that includes an electron gun having an electron source, an extraction electrode to which a voltage used for extracting electrons from the electron source is applied, and an acceleration electrode to which a voltage used for accelerating the electrons extracted from the electron source is applied, a first heating unit that heats the extraction electrode, and a second heating unit that heats the acceleration electrode.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: January 26, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Keigo Kasuya, Shuhei Ishikawa, Kenji Tanimoto, Hajime Kawano, Hideo Todokoro, Souichi Katagiri, Takashi Doi, Soichiro Matsunaga
  • Patent number: 10896801
    Abstract: A multiple-electron-beam-image acquisition apparatus includes an electromagnetic lens to receive and refract multiple electron beams, an aberration corrector, disposed in a magnetic field of the electromagnetic lens, to correct aberration of the multiple electron beams, an aperture-substrate, disposed movably at the upstream of the aberration corrector with respect to an advancing direction of the multiple electron beams, to selectively make an individual beam of the multiple electron beams pass therethrough independently, a movable stage to dispose thereon the aberration corrector, a stage control circuit, using an image caused by the individual beam selectively made to pass, to move the stage to align the position of the aberration corrector to the multiple electron beams having been relatively aligned with the electromagnetic lens, and a detector to detect multiple secondary electron beams emitted because the target object surface is irradiated with multiple electron beams having passed through the aberrat
    Type: Grant
    Filed: May 22, 2019
    Date of Patent: January 19, 2021
    Assignee: NuFlare Technology, Inc.
    Inventors: Kazuhiko Inoue, Yoshihiro Izumi, Hidekazu Takekoshi
  • Patent number: 10890545
    Abstract: The disclosed technology relates to an apparatus for tomographic analysis of a specimen based on STEM images of the specimen, as well as for tomographic analysis of the chemical composition of the specimen based on X-ray detection by EDS detectors. In one aspect, the apparatus comprises an elongated specimen holder that is rotatable about a longitudinal axis and is configured to hold a pillar-shaped specimen at the end of the holder. The longitudinal axis is positioned in a sample plane which is perpendicular to the beam direction of an electron beam produced by an electron gun. The apparatus also comprises at least two EDS detectors, each EDS detector having a detecting surface oriented perpendicularly to the sample plane and intersecting with the sample plane, wherein the two EDS detectors are positioned on opposite lateral sides of the specimen.
    Type: Grant
    Filed: May 1, 2019
    Date of Patent: January 12, 2021
    Assignee: IMEC vzw
    Inventor: Hugo Bender
  • Patent number: 10886102
    Abstract: A multiple-electron-beam irradiation apparatus includes a first electrostatic lens, configured using the substrate used as a bias electrode by being applied with a negative potential, a control electrode to which a control potential is applied and a ground electrode to which a ground potential is applied, configured to provide dynamic focusing of the multiple electron beams onto the substrate, in accordance with change of the height position of the surface of the substrate, by generating an electrostatic field, wherein the control electrode is disposed on an upstream side of a maximum magnetic field of the lens magnetic field of the first electromagnetic lens with respect to a direction of a trajectory central axis of the multiple electron beams, and a ground electrode is disposed on an upstream side of the control electrode with respect to the direction of the trajectory central axis.
    Type: Grant
    Filed: July 3, 2019
    Date of Patent: January 5, 2021
    Assignees: NuFlare Technology, Inc., NuFlare Technology America, Inc.
    Inventors: Kazuhiko Inoue, Munehiro Ogasawara, Steven Golladay
  • Patent number: 10879031
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: December 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen