Electron Probe Type Patents (Class 250/310)
  • Patent number: 10777379
    Abstract: According to one embodiment, a holder includes a top member, a side member, and a bottom member. The top member has a hole for allowing transmission of a charged particle beam, and the sample is mountable in the hole. The bottom member is provided to overlap with the top member in a plan view. The side member is connected to a part of the top member and a part of the bottom member such that the top member and the bottom member are separated from each other in a cross-sectional view. An opening portion is a region surrounded by the top member, the side member, and the bottom member, and a scintillator is provided in the opening portion.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: September 15, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventor: Kotaro Hosoya
  • Patent number: 10777383
    Abstract: A method and system are disclosed for observing and aligning a beam of light in the sample chamber of a charged particle beam (CPB) system, such as an electron microscope or focused ion beam system. The method comprises providing an imaging aid inside the sample chamber with a calibration surface configured such that when illuminated by light, and simultaneously illuminated by a CPB, the intensity of the secondary radiation induced by the CPB is different in regions also illuminated by light relative to regions with lower light illumination levels, thereby providing an image of the light beam on the calibration surface. The image of the light beam may be used to align the light beam to the charged particle beam.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: September 15, 2020
    Assignee: FEI Company
    Inventors: Cameron James Zachreson, Dolf Timmerman, Milos Toth, Jorge Filevich, Steven Randolph, Aurelien Philippe Jean Maclou Botman
  • Patent number: 10770264
    Abstract: An interference optical system unit includes at least one electromagnetic lens that forms an image of a charged particle beam, at least one charged particle beam biprism, and a support member for the electromagnetic lens and the charged particle beam biprism. The electromagnetic lens, the charged particle beam biprism, the support member, and a space to an image plane of the electromagnetic lens are integrally configured as one unit. The interference optical system unit is disposed to have an optical axis coaxialized with an optical axis of an imaging optical system of an upstream stage that is disposed on an upstream side of the unit in a flow direction of the charged particle beam. A focal length of the electromagnetic lens and a deflection angle of the charged particle beam given by the charged particle beam biprism are controlled to generate an interference fringe of the charged particle beam on the image plane of the electromagnetic lens.
    Type: Grant
    Filed: March 21, 2019
    Date of Patent: September 8, 2020
    Assignee: RIKEN
    Inventors: Yoh Iwasaki, Ken Harada, Keiko Shimada
  • Patent number: 10763078
    Abstract: There is provided a charged particle beam device which includes a charged particle beam source, a charged particle beam optical system that irradiates a sample with a charged particle beam from the charged particle beam source, a detector that detects a secondary signal generated from the sample by irradiation with the charged particle beam, and an image processing unit that executes integration processing of image data obtained from the secondary signal and outputting an integrated image, and in which the image processing unit executes a normalization integration computation of outputting an integrated image in which a luminance value of the integrated image is always “1” in an integration process.
    Type: Grant
    Filed: November 4, 2019
    Date of Patent: September 1, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Masato Kamio, Masashi Watanabe, Katsunori Hirano, Yoshinobu Hoshino, Shigeru Kawamata, Yuichi Sakurai
  • Patent number: 10763074
    Abstract: A charged particle beam apparatus includes: an optical system that irradiates a sample mounted on a sample stage with a charged particle beam; at least one detector that detects a signal generated from the sample; an imaging device that acquires an observation image; a mechanism for changing observation positions in the sample which has at least one of a stage that moves the sample stage and a deflector that changes the charged particle beam's irradiation position; a display unit that displays an operation screen provided with an observation image displaying portion that displays the observation image and an observation position displaying portion that displays an observation position of the observation image; and a controller that controls display processing of the operation screen. The controller superimposes and displays on the observation position displaying portion a plurality of observation position images at different magnifications, based on the observation images' magnifications and coordinates.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: September 1, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Hiroyuki Chiba, Yoshinobu Hoshino, Shigeru Kawamata
  • Patent number: 10754138
    Abstract: Certain aspects pertain to multi-well systems, devices, and methods of Fourier ptychographic and fluorescence imaging.
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: August 25, 2020
    Assignee: California Institute of Technology
    Inventors: Jinho Kim, Changhuei Yang
  • Patent number: 10748741
    Abstract: An X-ray analyzer includes: an X-ray detector that detects an X-ray emitted from a specimen and outputs a signal having a step that has a height corresponding to energy of the X-ray; a pulse generation circuit that converts the signal output from the X-ray detector into a first pulse signal; a pulse-width setting circuit that sets a pulse width; a pulse-width conversion circuit that converts a pulse width of the first pulse signal into the pulse width set by the pulse-width setting circuit to form a second pulse signal; a pulse-height discriminator that discriminates the second pulse signal according to a pulse height of the second pulse signal; a counting circuit that calculates a counting rate of the discriminated second pulse signal; and a counting-loss correction processing unit that corrects the counting rate. The counting-loss correction processing unit corrects the counting rate based on the pulse width.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: August 18, 2020
    Assignee: JEOL Ltd.
    Inventor: Kazunori Tsukamoto
  • Patent number: 10746780
    Abstract: An apparatus comprises a signal generator circuit, a test probe, a signal sensor circuit, and a defect detection circuit. The signal generator circuit is configured to generate an impulse test signal having an impulse waveform and adjust a bandwidth of the impulse test signal. The test probe is electrically coupled to the signal generator circuit and configured to apply the impulse test signal to a device under test (DUT). The signal sensor circuit is configured to sense a conducted test signal produced by applying the impulse test signal to the DUT with the test probe. The defect detection circuit is configured to generate an indication of a defect in the DUT using the conducted test signal.
    Type: Grant
    Filed: November 18, 2015
    Date of Patent: August 18, 2020
    Assignee: Intel Corporation
    Inventors: Mayue Xie, Simranjit S. Khalsa, Hemachandar Tanukonda Devarajulu, Deepak Goyal, Zhiguo Qian
  • Patent number: 10741359
    Abstract: An electron microscope includes: a display control unit which sequentially acquires electron microscope images of a sample and causes a display unit to display the electron microscope images as a live image; an analysis area setting unit which sets an analysis area on the sample based on a designated position on the live image designated by pointing means; and an analysis control unit which performs control for executing elemental analysis of the set analysis area. The analysis area setting unit sets, as the analysis area, an area on the sample which corresponds to a continuous area including the designated position and having brightness comparable to brightness of the designated position.
    Type: Grant
    Filed: May 7, 2018
    Date of Patent: August 11, 2020
    Assignee: JEOL Ltd.
    Inventor: Akira Abe
  • Patent number: 10734191
    Abstract: This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.
    Type: Grant
    Filed: July 6, 2015
    Date of Patent: August 4, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Takanori Kishimoto, Ichiro Tachibana, Naomasa Suzuki
  • Patent number: 10726541
    Abstract: A defect inspecting apparatus includes a reference image generator configured to generate a first reference image and a second reference image from design layout data. An image inspector is configured to obtain a first inspection image of a first inspection region of a photomask and a second inspection image of a second inspection region of the photomask. An operation processor is configured to extract a first coordinate offset by comparing the first inspection image with the first reference image and to extract a second coordinate offset by comparing the second inspection image with the second reference image.
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: July 28, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Kang Won Lee, Cheol Ki Min, Jong Ju Park, Hyon Seok Song
  • Patent number: 10720304
    Abstract: A charged particle beam apparatus acquires a scanned image by scanning a sample with a charged particle beam and detecting charged particles emitted from the sample. The charged particle beam apparatus includes: a plurality of detection units that detect charged particles emitted from the sample, and an image processing unit that generates the scanned image based on a plurality of detection signals outputted from the plurality of the detection units.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: July 21, 2020
    Assignee: JEOL Ltd.
    Inventor: Takeshi Otsuka
  • Patent number: 10712384
    Abstract: An object of the present invention relates to detecting a signal caused by a faulty point part of which the identification has been difficult with conventional EBAC. In an embodiment of the present invention, at least one probe is brought into contact with a sample on which a circuit is formed, the sample is scanned with a charged particle beam while power is supplied via the probe to the circuit identified by a contact of the probe, and a change in resistance value of a faulty point heated locally is measured via the probe. According to the present invention, even a signal caused by a high-resistance faulty point or a faulty point embedded in the sample can be easily detected.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: July 14, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Akira Kageyama, Yasuhiko Nara
  • Patent number: 10699821
    Abstract: In accordance with an aspect of the invention, a collimator assembly for a X-ray spectrometer device is provided, the collimator assembly including a rotatable gear assembly including a collimator plate having a plurality of apertures of different size and/or shape arranged therein; a driving assembly for rotating the gear assembly to bring the gear assembly into a rotational position where a selected one of the plurality of apertures is spatially aligned with a predefined axis along which a collimated X-ray beam is to be provided from the X-ray spectrometer device; and a magnet arrangement for generating a magnetic force that is arranged to push or pull the gear assembly into a predefined direction of rotation to keep the selected one of the plurality of apertures spatially aligned with said predefined axis.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: June 30, 2020
    Assignee: Hitachi High-Tech Analytical Science Finland Oy
    Inventors: Reinhard Singer, Markus Pallasvirta
  • Patent number: 10699869
    Abstract: A method for operating a particle beam apparatus. An objective lens current may be swept, and a property of a deflection unit and/or of an aperture unit may be set while the objective lens current is swept. Setting the property may implemented in such a way that either an image of the object displayed on a display device does not move or any such movement of the displayed image has a minimal deflection. Moreover, the operating voltage of a beam generator may be swept and the object may be aligned by means of a specimen stage. While the operating voltage is swept, the specimen stage may be moved into an aligned position in such a way that either the image of the object displayed on the display device does not move or any such movement of the displayed image has a minimal deflection.
    Type: Grant
    Filed: February 19, 2019
    Date of Patent: June 30, 2020
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Dirk Preikszas, Gero Walter
  • Patent number: 10692694
    Abstract: Apparatus include a reflector positioned adjacent to a sample location that is situated to receive a charged particle beam (CPB) along a CPB axis from a CPB focusing assembly so that the reflector is situated to receive light emitted from a sample at the sample location based on a CPB-sample interaction or a photon-sample interaction and to direct the light to a photodetector, and a steering electrode situated adjacent to the reflector so as to direct secondary charged particles emitted from the sample based on the CPB-sample interaction away from the reflector and CPB axis. Methods and systems are also disclosed.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: June 23, 2020
    Assignee: FEI Company
    Inventors: Galen Gledhill, Mostafa Maazouz
  • Patent number: 10692690
    Abstract: Use of care areas in scanning electron microscopes or other review tools can provide improved sensitivity and throughput. A care area is received at a controller of a scanning electron microscope from, for example, an inspector tool. The inspector tool may be a broad band plasma tool. The care area is applied to a field of view of a scanning electron microscope image to identify at least one area of interest. Defects are detected only within the area of interest using the scanning electron microscope. The care areas can be design-based or some other type of care area. Use of care areas in SEM tools can provide improved sensitivity and throughput.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: June 23, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Vidyasagar Anantha, Arpit Yati, Saravanan Paramasivam, Martin Plihal, Jincheng Lin
  • Patent number: 10684309
    Abstract: A contact head (6) for an electrical test device (1) for electrically testing substrates, which have electrical contact points, with at least two guide plates (13, 14) that are arranged to each other by a spacer (15) and each have guide openings (16) essentially aligned with each other for receiving pin-shaped contact elements (8) and are oriented to each other by a centering device (20), wherein the centering device (20) has four centering pins (19), which are displaceably mounted in a slot (23), extending toward a center (Z) of the contact head (6), at least of one of the guide plates (13, 14), and wherein the centering pins (19) are each held in a centering opening (18) of the spacer (15). It is provided that the centering openings (18) each have only one guide surface (21) oriented at least essentially parallel to a radial axis (R)—in relation to the center (Z).
    Type: Grant
    Filed: May 30, 2018
    Date of Patent: June 16, 2020
    Assignee: FEINMETALL GMBH
    Inventors: Stefan Treuz, Denis Tabakow, Berislav Kopilas
  • Patent number: 10685442
    Abstract: Methods and systems in accordance with the present invention automatically subdivide an area having an arbitrary shape into multiple sub-regions that have approximately equal area under a threshold, with compact shapes having minimal perimeter length. These systems input an arbitrarily shaped zone and recursively bisect it until all of the new sub-zones are smaller than a particular threshold. A data processing system subdivides a two-dimensional region, such as a digital image of a landmass. The data processing system loads the region into memory, determines a minor axis of the region, and splits the region along the minor axis into a first sub-region and a second sub-region. The sub-regions are evaluated to determine if they are under the threshold area. The steps of the process are repeated until all resulting sub-regions are under the threshold area. Consistently compact sub-regions with minimal perimeter are achieved by splitting along the minor axis.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: June 16, 2020
    Assignee: Eagle Technology, LLC
    Inventor: Michael Deskevich
  • Patent number: 10679821
    Abstract: A charged particle beam device includes a scintillator and a light guide. The light guide has an incident surface configured to incident a light from the scintillator, an emission surface configured to emit a light incident from the incident surface, and a first surface configured to guide the light incident from the incident surface to a side of the emission surface. The light guide has a bent portion. The bent portion has a second surface configured to guide the light to the side of the emission surface in regions excluding a region between the incident surface and the emission surface.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: June 9, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yoshifumi Sekiguchi, Shin Imamura, Hajime Kawano, Shahedul Hoque
  • Patent number: 10643817
    Abstract: A microscope adapted to observe a sample is provided. The microscope includes a carrier, and the carrier includes a bottom base, an upper cover and a protruding structure. The upper cover is disposed on the bottom base and has an observing region, and the sample is adapted to be observed in the observing region. A first flow passage is formed between the bottom base and the upper cover, the observing region is located in the first flow passage, and a first fluid is adapted to flow through the observing region along the first flow passage. The protruding structure is connected to the bottom base or the upper cover and located in the first flow passage, and the protruding structure surrounds the observing region.
    Type: Grant
    Filed: March 22, 2019
    Date of Patent: May 5, 2020
    Assignee: FlowVIEW Tek
    Inventors: Hsin-Hung Lee, Cheng-Yu Lee
  • Patent number: 10641792
    Abstract: Some embodiments of the invention are directed to electrochemical fabrication methods for forming structures or devices (e.g. microprobes for use in die level testing of semiconductor devices) from a core material and a shell or coating material that partially coats the surface of the structure. Other embodiments are directed to electrochemical fabrication methods for producing structures or devices (e.g. microprobes) from a core material and a shell or coating material that completely coats the surface of each layer from which the probe is formed including interlayer regions. Additional embodiments of the invention are directed to electrochemical fabrication methods for forming structures or devices (e.g. microprobes) from a core material and a shell or coating material wherein the coating material is located around each layer of the structure without locating the coating material in inter-layer regions.
    Type: Grant
    Filed: December 28, 2018
    Date of Patent: May 5, 2020
    Assignee: University of Southern California
    Inventors: Ming Ting Wu, Rulon J. Larsen, III, Young Kim, Kieun Kim, Adam L. Cohen, Ananda H. Kumar, Michael S. Lockard, Dennis R. Smalley
  • Patent number: 10636140
    Abstract: A height of a pattern on a semiconductor wafer is determined by comparing a measured image of the pattern with a predicted image of the pattern, as produced by a shadow model. An estimated height of the pattern is provided as an input to the shadow model. The shadow model produces occluding contours that are used to generate predicted images. A set of predicted images are generated, each predicted image being associated with an estimated height. The estimated height corresponding to the predicted image most closely matching with the measured image is used as the height calculated by the shadow model.
    Type: Grant
    Filed: May 17, 2018
    Date of Patent: April 28, 2020
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Ishai Schwarzband, Sergey Khristo, Yan Avniel
  • Patent number: 10636616
    Abstract: An aperture array alignment method according to the present embodiment includes switching on and off of each of multiple beams using a blanking aperture array plate, and detecting beam current on a stage using a detector. At least one of the multiple beams is turned on to scan the blanking aperture array plate, and a current map is generated on the basis of a result of detection of the beam current made by the detector and a position of the blanking aperture array plate. An on-beam is switched from one to another to generate the current map for each of the on-beams. The position of the blanking aperture array plate is adjusted on the basis of the current maps for the on-beams.
    Type: Grant
    Filed: December 31, 2018
    Date of Patent: April 28, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Osamu Iizuka
  • Patent number: 10629407
    Abstract: A charged particle beam device includes: a detection chamber flange; a detector; a detector holding stand which holds the detector; a first shaft which is slidably inserted into a guide hole and connected to the detector holding stand, the guide hole being provided in the detection chamber flange; a first flange which is attached to the detection chamber flange and has a spherical bearing; a second flange which is supported by the spherical bearing of the first flange; and a second shaft which is slidably inserted into a guide hole provided in the second flange and passes through a through-hole in the detection chamber flange to be connected to the detector holding stand, each of the first shaft and the second shaft being provided with a flow channel of a heat transfer medium for cooling or heating the detector.
    Type: Grant
    Filed: November 8, 2018
    Date of Patent: April 21, 2020
    Assignee: JEOL Ltd.
    Inventor: Tomohisa Fukuda
  • Patent number: 10627213
    Abstract: A method including obtaining measurement results of a device manufacturing process or a product thereof, obtaining sets of one or more values of one or more parameters of a distribution by fitting the distribution against the measurement results, respectively, and obtaining, using a computer, a set of one or more values of one or more hyperparameters of a hyperdistribution by fitting the hyperdistribution against the sets of values of the parameters.
    Type: Grant
    Filed: November 30, 2016
    Date of Patent: April 21, 2020
    Assignee: ASML Netherlands B. V.
    Inventors: Seyed Iman Mossavat, Remco Dirks, Hugo Augustinus Joseph Cramer
  • Patent number: 10629408
    Abstract: The purpose of the present invention is to provide a charged particle beam device for detecting, with highly precise angular discrimination, charged particles emitted from a specimen. To achieve this purpose, proposed is a charged particle beam device provided with a scanning deflector for scanning on a specimen a charged particle beam emitted from a charged particle source, the charged particle beam device being provided with: a first detector for detecting charged particles obtained by scanning of the charged particle beam on a specimen, and a second detector placed between the first detector and the specimen, and supported so as to be able to move in the charged particle beam light axis direction.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: April 21, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshimasa Kameda, Hiroya Ohta, Kenji Tanimoto
  • Patent number: 10620421
    Abstract: An image forming device is provided that is capable of forming a proper integrated signal even when an image or a signal waveform is acquired from a pattern having the possibility of preventing proper matching, such as a repetition pattern, a shrinking pattern, and the like. In particular, the image forming device forms an integrated image by integrating a plurality of image signals and is provided with: a matching processing section that performs a matching process between the plurality of image signals; an image integration section that integrates the plurality of image signals for which positioning has been performed by the matching processing section; and a periodicity determination section that determines a periodicity of a pattern contained in the image signals. The matching processing section varies a size of an image signal area for the matching in accordance with a determination by the periodicity determination section.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: April 14, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasunori Takasugi, Kei Sakai, Satoru Yamaguchi, Kazuyuki Hirao
  • Patent number: 10622184
    Abstract: An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.
    Type: Grant
    Filed: June 26, 2017
    Date of Patent: April 14, 2020
    Assignees: CARL ZEISS MICROSCOPY GmbH, APPLIED MATERIALS ISRAEL LTD.
    Inventors: Rainer Knippelmeyer, Stefan Schubert
  • Patent number: 10620253
    Abstract: Functionality for estimating characteristics of an on-chip noise signal can be implemented on a processing module. An on-chip noise signal is determined at an on-chip determination point of a computer chip. The on-chip noise signal is converted to a frequency-varying signal using a voltage-controlled oscillator implemented on the computer chip. The frequency-varying signal is measured at an off-chip measurement point and frequency information is extracted from the frequency-varying signal. The frequency information is converted to a voltage level associated with the on-chip noise signal based on the relationship between an input voltage provided to the voltage-controlled oscillator and an output frequency generated by the voltage-controlled oscillator.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: April 14, 2020
    Assignee: International Business Machines Corporation
    Inventors: Jose A. Hejase, Nanju Na, Nam H. Pham, Lloyd A. Walls
  • Patent number: 10615000
    Abstract: An electron beam microscope includes an energy-sensitive detector to detect backscattered electrons and a signal processor for processing detection signals of the detector. The signal processor includes an analog amplifier. The signal processor also includes a window comparator having a signal input connected to an output of the analog amplifier. A signal generated at an output of the signal processor is generated based on a signal provided at an output the window comparator. The window comparator is configured to output a predetermined signal only if the amplified signal supplied to its signal input is less than or equal to an upper threshold and greater than or equal to a lower threshold.
    Type: Grant
    Filed: March 26, 2019
    Date of Patent: April 7, 2020
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Luyang Han, Joerg Fober, Stefan Meyer, Wolfgang Berger
  • Patent number: 10598739
    Abstract: A magnetic field sensor includes a plurality of magnetic field sensing elements configured to generate at least two measured magnetic field signals indicative of a magnetic field affected by an object and having a first predetermined phase difference with respect to each other and a controller responsive to the at least two measured magnetic field signals. The controller is configured to generate at least one virtual magnetic field signal having a second predetermined phase difference with respect to at least one of the measured magnetic field signals. In embodiments, the virtual magnetic field signal has the second predetermined phase difference with respect to each of the at least two measured magnetic field signals.
    Type: Grant
    Filed: March 1, 2019
    Date of Patent: March 24, 2020
    Assignee: Allegro MicroSystems, LLC
    Inventors: Eric G. Shoemaker, Zachary Richards, Andrea Foletto
  • Patent number: 10593512
    Abstract: The present invention provides a light guide capable of guiding light generated by a scintillator at high efficiency to a photoreceiving element, a detector, and a charged particle beam device. For attaining the purpose, the present invention proposes a light guide that guides light generated by a scintillator to a photoreceiving element, provided with a scintillator containment portion formed of a first surface facing a surface opposite to a charged particle incident surface of the scintillator and a second surface facing a surface different from the surface opposite to the charged particle incident surface of the scintillator, and a tilted surface reflecting light incident from the second surface to the inside of the light guide.
    Type: Grant
    Filed: February 3, 2017
    Date of Patent: March 17, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshifumi Sekiguchi, Shin Imamura, Hajime Kawano, Shahedul Hoque
  • Patent number: 10586681
    Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: March 10, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Zhongwei Chen, Jack Jau, Weiming Ren
  • Patent number: 10578679
    Abstract: A magnetic field sensor includes a plurality of magnetic field sensing elements configured to generate at least two measured magnetic field signals indicative of a magnetic field affected by an object and having a first predetermined phase difference with respect to each other and a controller responsive to the at least two measured magnetic field signals. The controller is configured to generate at least one virtual magnetic field signal having a second predetermined phase difference with respect to at least one of the measured magnetic field signals. In embodiments, the virtual magnetic field signal has the second predetermined phase difference with respect to each of the at least two measured magnetic field signals.
    Type: Grant
    Filed: June 18, 2018
    Date of Patent: March 3, 2020
    Assignee: Allegro MicroSystems, LLC
    Inventors: Timothy Sitorus, Eric G. Shoemaker
  • Patent number: 10573489
    Abstract: A charged particle beam device includes a charged particle source which emits a charged particle beam radiated on a sample; a condenser lens system which has at least one condenser lens focusing the charged particle beam at a predetermined demagnification; a deflector which is positioned between a condenser lens of a most downstream side and a charged particle source in the condenser lens system, and moves a virtual position of the charged particle source; and a control unit which controls the deflector and the condenser lens system. The control unit controls the deflector to move the virtual position of the charged particle source to a position of suppressing a deviation, which is caused by a change of the demagnification of the condenser lens system, of a center trajectory of the charged particle beam in the downstream of the condenser lens system.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: February 25, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventor: Shuhei Yabu
  • Patent number: 10546712
    Abstract: A device for generating a source current of charge carriers by a field emission and a method stabilizing a source current of charge carriers emitted by a field emission element are disclosed. In an embodiment the device includes at least one field emission element from which the charge carriers emerge during operation, which lead to an emission current in the field emission element, at least one extraction electrode in order to extract the charge carriers from the field emission element, wherein a first part of the extracted charge carriers contributes to the source current, and a second part of the extracted charge carriers impinges on the extraction electrode and leads to an extraction current in the extraction electrode, an additional electrode on which the source current of charge carriers impinges at least in part and which contributes to an electrode current in the additional electrode.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: January 28, 2020
    Assignee: KETEK GmbH
    Inventors: Felix Düsberg, Michael Bachmann
  • Patent number: 10546718
    Abstract: Even in a case where a disturbance is applied from an adjacently disposed power supply circuit or the like, in order to realize a reduction in ripple, a high-voltage power supply device is configured to include a drive circuit, a transformer that boosts an output voltage of the drive circuit, a boost circuit that further boosts a voltage boosted by the transformer, a shield that covers the transformer and the boost circuit, a filter circuit that filters, smoothes, and outputs a high voltage output from the boost circuit, and an impedance loop circuit configured by connection of a plurality of impedance elements into a loop shape. A grounding point of the boost circuit, a grounding point of the shield, and a grounding point of the filter circuit are configured to be grounded via the impedance loop circuit, and this is applied to a high-voltage power supply unit that applies a high voltage to an electron gun of a charged particle beam apparatus.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: January 28, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takuma Nishimoto, Wen Li, Hiroyuki Takahashi, Hajime Kawano
  • Patent number: 10541106
    Abstract: A charged particle beam device includes: a charged particle source; an acceleration electric power source connected to the charged particle source for accelerating a charged particle beam emitted by the acceleration electric power source; and an objective lens for focusing the charged particle beam onto a sample, the objective lens including: a central magnetic pole having a central axis coinciding with an ideal optical axis of the charged particle beam; an upper magnetic pole; a cylindrical side-surface magnetic pole; and a disk-shaped lower magnetic pole, the central magnetic pole having an upper portion on a side of the sample and a column-shaped lower portion, the upper magnetic pole having a circular opening at a center thereof and being in a shape of a disk that is tapered to a center thereof and that is thinner at a position closer to a center of gravity of the central magnetic pole.
    Type: Grant
    Filed: June 25, 2019
    Date of Patent: January 21, 2020
    Assignee: Matsusada Precision, Inc.
    Inventors: Kazuya Kumamoto, Sadayoshi Matsuda
  • Patent number: 10529530
    Abstract: There is provided a charged particle beam system in which a detector can be placed in an appropriate analysis position. The charged particle beam system (100) includes: a charged particle source (11) for producing charged particles; a sample holder (20) for holding a sample (S); a detector (40) for detecting, in the analysis position, a signal produced from the sample (S) by impingement of the charged particles on the sample (S); a drive mechanism (42) for moving the detector (40) into the analysis position; and a controller (52) for controlling the drive mechanism (42). The controller (52) performs the steps of: obtaining information about the type of the sample holder (20); determining the analysis position on the basis of the obtained information about the type of the sample holder (20); and controlling the drive mechanism (42) to move the detector (40) into the determined analysis position.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: January 7, 2020
    Assignee: JEOL Ltd.
    Inventor: Shuji Kawai
  • Patent number: 10522321
    Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: December 31, 2019
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
  • Patent number: 10522327
    Abstract: A charged particle beam specimen inspection system is described. The system includes an emitter for emitting at least one charged particle beam, a specimen support table configured for supporting the specimen, an objective lens for focusing the at least one charged particle beam, a charge control electrode provided between the objective lens and the specimen support table, wherein the charge control electrode has at least one aperture opening for the at least one charged particle beam, and a flood gun configured to emit further charged particles for charging of the specimen, wherein the charge control electrode has a flood gun aperture opening.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: December 31, 2019
    Assignee: Applied Materials Israel Ltd.
    Inventors: Gilad Erel, Michal Avinun-Kalish, Stefan Lanio
  • Patent number: 10522325
    Abstract: There is provided a charged particle beam device which includes a charged particle beam source, a charged particle beam optical system that irradiates a sample with a charged particle beam from the charged particle beam source, a detector that detects a secondary signal generated from the sample by irradiation with the charged particle beam, and an image processing unit that executes integration processing of image data obtained from the secondary signal and outputting an integrated image, and in which the image processing unit executes a normalization integration computation of outputting an integrated image in which a luminance value of the integrated image is always “1” in an integration process.
    Type: Grant
    Filed: November 27, 2015
    Date of Patent: December 31, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Masato Kamio, Masashi Watanabe, Katsunori Hirano, Yoshinobu Hoshino, Shigeru Kawamata, Yuichi Sakurai
  • Patent number: 10504690
    Abstract: A sample holder capable of limiting X-rays accepted into an X-ray detector is provided. The sample holder is for use in an electron microscope equipped with a polepiece assembly and a semiconductor detector. The sample holder includes: a sample stage on which a sample is held; and a shield plate. When the sample stage has been introduced in the sample chamber of the electron microscope, the shield plate is located between the polepiece assembly and the semiconductor detector.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: December 10, 2019
    Assignee: JEOL Ltd.
    Inventors: Kazuki Yagi, Takeo Sasaki, Ichiro Onishi, Shuichi Yuasa, Masashi Shimizu
  • Patent number: 10504694
    Abstract: A scanning electron microscope comprises three objective lenses, including a distant objective lens and a close objective lens, which are of conventional type, and an immersion objective lens of the immersion type below the distant objective lens and the close objective lens. These three objective lenses can be controlled independently, therefor different combinations of active objective lenses can be achieved. The scanning electron microscope therefore offers various imaging modes. There is a possibility to switch between these imaging modes and therefore, choose the most suitable way of imaging for given application.
    Type: Grant
    Filed: May 22, 2017
    Date of Patent: December 10, 2019
    Assignee: TESCAN Brno, s.r.o.
    Inventors: Jaroslav Jiruse, Filip Lopour, Milos Havelka, Jan Polster, Josef Rysavka, Martin Zadrazil
  • Patent number: 10490388
    Abstract: A multibeam-focus adjusting method in a charged-particle-beam lithography apparatus that draws a pattern by irradiating a sample with multibeams having a plurality of beam lines through a plurality of lines of opening portions provided on an aperture member, the method adjusting a focus of the multibeams and including: acquiring a rotation angle of the beam lines with respect to an end edge of a mark provided at a predetermined position; determining selection beams to be used for adjustment among the multibeams based on the acquired rotation angle; and adjusting a focus of the multibeams based on reflected electrons acquired by irradiating the mark with the selection beams and scanning the mark in a direction orthogonal to the end edge of the mark.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: November 26, 2019
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventor: Tsubasa Nanao
  • Patent number: 10470652
    Abstract: The present invention provides a solution for focusing on each imaging target of a subject eye in a robust and highly accurate way. An information processing apparatus includes, a confocal data acquisition unit configured to acquire a confocal signal based on return light from the subject eye, a nonconfocal data acquisition unit configured to acquire a nonconfocal signal based on the return light from the subject eye, and an identification unit configured to identify an in-focus position of measurement light based at least on the nonconfocal signal out of the confocal and the nonconfocal signals.
    Type: Grant
    Filed: April 19, 2016
    Date of Patent: November 12, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Imamura
  • Patent number: 10461209
    Abstract: An avalanche photodiode for detecting ultraviolet radiation, including: a silicon carbide body having a first type of conductivity, which is delimited by a front surface and forms a cathode region; an anode region having a second type of conductivity, which extends into the body starting from the front surface and contacts the cathode region; and a guard ring having the second type of conductivity, which extends into the body starting from the front surface and surrounds the anode region.
    Type: Grant
    Filed: April 28, 2016
    Date of Patent: October 29, 2019
    Assignee: STMICROELECTRONICS S.R.L.
    Inventors: Massimo Cataldo Mazzillo, Antonella Sciuto, Dario Sutera
  • Patent number: 10453650
    Abstract: A charged particle beam apparatus includes: an optical system that irradiates a sample mounted on a sample stage with a charged particle beam; at least one detector that detects a signal generated from the sample; an imaging device that acquires an observation image; a mechanism for changing observation positions in the sample which has at least one of a stage that moves the sample stage and a deflector that changes the charged particle beam's irradiation position; a display unit that displays an operation screen provided with an observation image displaying portion that displays the observation image and an observation position displaying portion that displays an observation position of the observation image; and a controller that controls display processing of the operation screen. The controller superimposes and displays on the observation position displaying portion a plurality of observation position images at different magnifications, based on the observation images' magnifications and coordinates.
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: October 22, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroyuki Chiba, Yoshinobu Hoshino, Shigeru Kawamata
  • Patent number: 10453646
    Abstract: Provided is a process for lamella thinning and endpointing that substitutes a series of automated small angle tilts for the motions in the conventional endpointing sequence. STEM images or through-surface BSE scans are acquired at each tilt. The results are analyzed automatically to determine feature depths, and an intervention request is made requesting a user decision based on marked-up images and summary information displayed.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: October 22, 2019
    Assignee: FEI Company
    Inventors: Roger Louis Alvis, Trevan R. Landin, Greg Clark