Inspection Of Solids Or Liquids By Charged Particles Patents (Class 250/306)
  • Patent number: 10665419
    Abstract: A method of imaging a specimen in a Scanning Transmission Charged Particle Microscope, comprising the following steps: Providing the specimen on a specimen holder; Providing a beam of charged particles that is directed from a source through an illuminator so as to irradiate the specimen; Providing a segmented detector for detecting a flux of charged particles traversing the specimen; Causing said beam to scan across a surface of the specimen, and combining signals from different segments of the detector so as to produce a vector output from the detector at each scan position, said vector output having components Dx, Dy along respective X, Y coordinate axes, specifically comprising: Performing a relatively coarse pre-scan of the specimen, along a pre-scan trajectory; At selected positions pi on said pre-scan trajectory, analyzing said components Dx, Dy and also a scalar intensity sensor value Ds; Using said analysis of Dx, Dy and Ds to classify a specimen composition at each position pi into one of a grou
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: May 26, 2020
    Assignee: FEI Company
    Inventors: Erik Michiel Franken, Ivan Lazic, Bart Jozef Janssen
  • Patent number: 10665417
    Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise. The method also includes detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure.
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: May 26, 2020
    Assignee: FRACTILIA, LLC
    Inventor: Chris Mack
  • Patent number: 10664955
    Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method includes generating, using an imaging device, a set of one or more images, each including an instance of a feature within a respective pattern structure. The method also includes detecting edges of the features within the pattern structure of each image using an inverse linescan model, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure provided as part of a training data set to a machine learning model.
    Type: Grant
    Filed: May 17, 2019
    Date of Patent: May 26, 2020
    Assignee: FRACTILIA, LLC
    Inventor: Chris Mack
  • Patent number: 10663380
    Abstract: A multiple degree of freedom sample stage or testing assembly including a multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes a plurality of stages including linear, and one or more of rotation or tilt stages configured to position a sample in a plurality of orientations for access or observation by multiple instruments in a clustered volume that confines movement of the multiple degree of freedom sample stage. The multiple degree of freedom sample stage includes one or more clamping assemblies to statically hold the sample in place throughout observation and with the application of force to the sample, for instance by a mechanical testing instrument. Further, the multiple degree of freedom sample stage includes one or more cross roller bearing assemblies that substantially eliminate mechanical tolerance between elements of one or more stages in directions orthogonal to a moving axis of the respective stages.
    Type: Grant
    Filed: October 17, 2016
    Date of Patent: May 26, 2020
    Assignee: Bruker Nano, Inc.
    Inventors: Edward Cyrankowski, Syed Amanulla Syed Asif, Ryan Major, Derek Rasugu, Yuxin Feng
  • Patent number: 10651008
    Abstract: Techniques of using a Transmission Charged Particle Microscope for diffraction pattern detection are disclosed. An example method including irradiating at least a portion of a specimen with a charged particle beam, using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector configured to operate in a particle counting mode, using said detector to record a diffraction pattern of said irradiated portion of the specimen, recording said diffraction pattern iteratively in a series of successive detection frames, and during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.
    Type: Grant
    Filed: August 16, 2018
    Date of Patent: May 12, 2020
    Assignee: FEI Company
    Inventors: Bart Buijsse, Maarten Kuijper
  • Patent number: 10648802
    Abstract: Methods and systems for feed-forward of multi-layer and multi-process information using XPS and XRF technologies are disclosed. In an example, a method of thin film characterization includes measuring first XPS and XRF intensity signals for a sample having a first layer above a substrate. The first XPS and XRF intensity signals include information for the first layer and for the substrate. The method also involves determining a thickness of the first layer based on the first XPS and XRF intensity signals. The method also involves combining the information for the first layer and for the substrate to estimate an effective substrate. The method also involves measuring second XPS and XRF intensity signals for a sample having a second layer above the first layer above the substrate. The second XPS and XRF intensity signals include information for the second layer, for the first layer and for the substrate.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: May 12, 2020
    Assignee: NOVA MEASURING INSTRUMENTS, INC.
    Inventors: Heath A. Pois, Wei Ti Lee, Lawrence V. Bot, Michael C. Kwan, Mark Klare, Charles Thomas Larson
  • Patent number: 10651006
    Abstract: According to an embodiment of the present invention, an ion beam apparatus switches between an operation mode of performing irradiation with an ion beam most including H3+ ions and an operation mode of performing irradiation with an ion beam most including ions heavier than the H3+.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: May 12, 2020
    Assignee: Hitachi High-Tech Science Corporation
    Inventors: Shinichi Matsubara, Yoshimi Kawanami, Hiroyasu Shichi
  • Patent number: 10641607
    Abstract: A height detection apparatus is configured to project a pattern on a sample arranged at any of a plurality of reference positions and configured to detect a height of the sample. The apparatus includes: a projection optical system that generates a plurality of spatially separated light beams each having the pattern and projects the generated spatially separated light beams onto the sample; an imaging element that images the pattern reflected from the sample; a detection optical system that guides the pattern reflected from the sample to the imaging element; and at least one optical path length correction member disposed on an optical path different from an optical path having a shortest optical path length among a plurality of optical paths corresponding to the plurality of light beams at a position where the plurality of light beams is spatially separated.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: May 5, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshifumi Sekiguchi, Naoya Nakai, Koichi Taniguchi, Makoto Suzuki
  • Patent number: 10629546
    Abstract: A semiconductor device including a substrate including a central region and a peripheral region surrounding the central region, a semiconductor integrated circuit in the central region, and a three-dimensional crack detection structure in the peripheral region, the three-dimensional crack detection structure surrounding the central region, the three-dimensional crack detection structure including a first pattern, a second pattern, and a third pattern, the first and second patterns extending in a first direction and spaced apart from each other, the third pattern being parallel to an upper surface of the substrate and connecting the first and second patterns to each other, the third pattern including a first portion and a second portion, the first and second portions extending in a second direction and a third direction respectively, the second direction intersecting with the first direction, the third direction intersecting with the first and second directions may be provided.
    Type: Grant
    Filed: August 27, 2018
    Date of Patent: April 21, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jung Hyun Roh
  • Patent number: 10586679
    Abstract: An electron microscope sample holder that includes at least one capillary having a sufficient inner diameter to act as a catheter pathway that allows objects that can be accommodated within the at least one capillary to be replaced or swapped with other objects. The sample holder having at least one capillary allows the user to insert and remove temporary fluidic pathways, sensors or other tools without the need to dissemble the holder.
    Type: Grant
    Filed: July 2, 2018
    Date of Patent: March 10, 2020
    Assignee: PROTOCHIPS, INC.
    Inventors: Daniel Stephen Gardiner, Franklin Stampley Walden, II, John Damiano, Jr.
  • Patent number: 10573488
    Abstract: A method of performing sub-surface imaging of a specimen in a charged-particle microscope of a scanning transmission type, comprising the following steps: Providing a beam of charged particles that is directed from a source along a particle-optical axis through an illuminator so as to irradiate the specimen; Providing a detector for detecting a flux of charged particles traversing the specimen; Causing said beam to follow a scan path across a surface of said specimen, and recording an output of said detector as a function of scan position, thereby acquiring a scanned charged-particle image I of the specimen; Repeating this procedure for different members n of an integer sequence, by choosing a value Pn of a variable beam parameter P and acquiring an associated scanned image In, thereby compiling a measurement set M={(In, Pn)}; Using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set representing depth-resolved imagery of the specimen,
    Type: Grant
    Filed: July 23, 2019
    Date of Patent: February 25, 2020
    Assignee: FEI Company
    Inventors: Ivan Lazic, Eric Gerardus Theodoor Bosch
  • Patent number: 10573487
    Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.
    Type: Grant
    Filed: October 29, 2018
    Date of Patent: February 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Xuedong Liu, Weiming Ren, Shuai Li, Zhongwei Chen
  • Patent number: 10571676
    Abstract: A device may capture, using a camera associated with the device, a first image of a first set of optical fibers associated with an optical connector within a field of view of the camera. The device may determine that an actual distance of a relative movement of the camera and the optical connector and an expected distance of the relative movement of the camera and the optical connector fail to match. The device may perform one or more actions after determining that the actual distance and the expected distance fail to match.
    Type: Grant
    Filed: August 9, 2018
    Date of Patent: February 25, 2020
    Assignee: VIAVI Solutions Inc.
    Inventors: Jay Brace, Porter McCain, Gordon Mackay, Andrew Parsons
  • Patent number: 10541103
    Abstract: The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.
    Type: Grant
    Filed: December 10, 2014
    Date of Patent: January 21, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuzuru Mizuhara, Toshiyuki Yokosuka, Hideyuki Kazumi, Kouichi Kurosawa, Kenichi Myochin
  • Patent number: 10541111
    Abstract: A distortion measurement method for an electron microscope image includes: loading a distortion measurement specimen having structures arranged in a lattice to a specimen plane of an electron microscope or a plane conjugate to the specimen plane in order to obtain an electron microscope image of the distortion measurement specimen; and measuring a distortion from the obtained electron microscope image of the distortion measurement specimen.
    Type: Grant
    Filed: May 25, 2018
    Date of Patent: January 21, 2020
    Assignee: JEOL Ltd.
    Inventors: Yuji Konyuba, Kazuya Omoto, Hidetaka Sawada
  • Patent number: 10541112
    Abstract: A charged particle beam system comprises a particle beam source having a particle emitter at a first voltage, a first electrode downstream of the particle beam source at a second voltage, a multi-aperture plate downstream of the first electrode, a second electrode downstream of the multi-aperture plate at a third voltage, a third electrode downstream of the second electrode at a fourth voltage, a deflector downstream of the third electrode, an objective lens downstream of the deflector, a fourth electrode downstream of the deflector at a fifth voltage; and an object mount at a sixth voltage. Voltage differences between the first, second, third, fourth and fifth voltages have same and opposite signs.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: January 21, 2020
    Assignees: Carl Zeiss Microscopy GmbH, Applied Materials Israel, Ltd.
    Inventors: Stefan Schubert, Thomas Kemen, Rainer Knippelmeyer
  • Patent number: 10535132
    Abstract: Provision is made of a method for determining a distance between a first structure element on a substrate and a second structure element, comprising the following steps: providing a first series of first images, wherein each of the first images comprises at least the first structure element, providing a second series of second images, wherein each of the second images comprises at least the second structure element. The method includes, for each image of the first and second series: determining a respective correlation function from a respective first image of the first series and a respective second image of the second series. The method includes determining an ensemble correlation function from the correlation functions, and determining the distance from the ensemble correlation function. Furthermore, a microscope for carrying out the method is provided.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: January 14, 2020
    Assignee: Carl Zeiss SMT SmbH
    Inventor: Joerg Frederik Blumrich
  • Patent number: 10535492
    Abstract: An electron energy loss spectrometer is described having a direct detection sensor, a high speed shutter and a sensor processor wherein the sensor processor combines images from individual sensor read-outs and converts a two dimensional image from said sensor into a one dimensional spectrum and wherein the one dimensional spectrum is output to a computer and operation of the high speed shutter is integrated with timing of imaging the sensor. The shutter is controlled to allow reduction in exposure of images corresponding to the individual sensor readouts. A plurality of images are exposed by imaging less than the full possible exposure and wherein the plurality of images are combined to form a composite image. The plurality of images can be comprised of images created by exposing the sensor for different exposure times.
    Type: Grant
    Filed: April 24, 2018
    Date of Patent: January 14, 2020
    Assignee: GATAN, INC.
    Inventors: Colin Trevor, Matthew Lent, Alexander Jozef Gubbens, Edward James, Ray Dudley Twesten, Roice Joseph, SanJay Parekh, Thomas Sha
  • Patent number: 10535496
    Abstract: A device with an ion column and a scanning electron microscope comprises at least one column detector of signal electrons placed inside or on the ion column. Signal generated on the sample is detected on the column detector during landing of a broad beam generated by the scanning electron microscope on the sample surface.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: January 14, 2020
    Assignee: TESCAN Brno, s.r.o.
    Inventors: Jaroslav Jiruse, Filip Lopour
  • Patent number: 10535494
    Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.
    Type: Grant
    Filed: December 11, 2018
    Date of Patent: January 14, 2020
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Dirk Zeidler, Stefan Schubert
  • Patent number: 10527563
    Abstract: A method and apparatus for analysis of a specimen in a microscope are provided. A first survey is performed that collects analytical data from a region of interest on the specimen surface using a first set of conditions. A second survey is performed that collects additional analytical data from selected parts of the region of interest on the specimen surface using a second set of conditions, different from the first set of conditions. The analytical data from the first survey is used to select the parts used for data collection in the second survey and to decide the order in which they are used.
    Type: Grant
    Filed: May 9, 2017
    Date of Patent: January 7, 2020
    Assignee: OXFORD INSTRUMENTS NANOTECHNOLOGY TOOLS LIMITED
    Inventors: Christian Lang, James Corrin
  • Patent number: 10522322
    Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise. The method also includes detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: December 31, 2019
    Assignee: Fractilia, LLC
    Inventor: Chris Mack
  • Patent number: 10510509
    Abstract: An edge detection system is provided that generates a scanning electron microscope (SEM) linescan image of a pattern structure including a feature with edges that require detection. The edge detection system includes an inverse linescan model tool that receives measured linescan information for the feature from the SEM. In response, the inverse linescan model tool provides feature geometry information that includes the position of the detected edges of the feature.
    Type: Grant
    Filed: December 17, 2018
    Date of Patent: December 17, 2019
    Assignee: Fractilia, LLC
    Inventor: Chris Mack
  • Patent number: 10497538
    Abstract: A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.
    Type: Grant
    Filed: April 23, 2018
    Date of Patent: December 3, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wei Fang, Kevin Liu, Fei Wang, Jack Jau, Zhaohui Guo
  • Patent number: 10495889
    Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: December 3, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Markus Franciscus Antonius Eurlings, Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov
  • Patent number: 10488188
    Abstract: Systems and methods are disclosed that remove noise from roughness measurements to determine roughness of a feature in a pattern structure. In one embodiment, a method for determining roughness of a feature in a pattern structure includes generating, using an imaging device, a set of one or more images, each including measured linescan information that includes noise. The method also includes detecting edges of the features within the pattern structure of each image without filtering the images, generating a biased power spectral density (PSD) dataset representing feature geometry information corresponding to the edge detection measurements, evaluating a high-frequency portion of the biased PSD dataset to determine a noise model for predicting noise over all frequencies of the biased PSD dataset, and subtracting the noise predicted by the determined noise model from a biased roughness measure to obtain an unbiased roughness measure.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: November 26, 2019
    Assignee: Fractilia, LLC
    Inventor: Chris Mack
  • Patent number: 10468229
    Abstract: The disclosure provides a method of generating a zoom sequence visualizing a portion of a sample. The method includes changing a zoom parameter representing a magnification of an image of a portion of a sample, and directing a charged particle beam to first locations of the portion based on the zoom parameter using a charged particle beam system. The method also includes detecting intensities representing amounts of particles incident onto a detection area, visualizing a representation of the portion based on the intensities, and directing an electron beam to second locations of the portion based on the zoom parameter using a scanning electron microscope. The method further includes detecting diffraction patterns, and determining crystallographic properties of a crystal structure of the portion based on the diffraction patterns.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: November 5, 2019
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Giuseppe Pavia
  • Patent number: 10469777
    Abstract: Devices, systems and methods relating to a distortion-correcting imaging for collecting image-related data of a substrate are disclosed, comprising: a beam emitter for directing an emission at an intended location on the substrate, and a signal detector for determining a signal intensity value associated with the emission; wherein the signal intensity value is associated with a corrected substrate location, said corrected substrate location determined from the intended substrate location and a correction factor, said correction factor being a function of said intended substrate location.
    Type: Grant
    Filed: March 22, 2016
    Date of Patent: November 5, 2019
    Assignee: TECHINSIGHTS INC.
    Inventors: Christopher Pawlowicz, Alexander Sorkin, Vladimir Martincevic
  • Patent number: 10466271
    Abstract: A scanning probe microscope includes: a cantilever; a cantilever supporting portion; a movement mechanism that moves a position of the cantilever; a light source that emits detection light; a detector that receives the detection light reflected on a reflecting surface of the cantilever; an objective lens; and a controller that controls the movement mechanism to perform a process including: detecting a spot position of a spot light of the detection light; detecting a position of the cantilever from an image captured by the imaging device; and controlling the movement mechanism based on the spot position, the position of the cantilever, an incident angle of the detection light, and the attachment angle such that the detection light is reflected on the reflecting surface when the cantilever is attached to the cantilever supporting portion.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: November 5, 2019
    Assignee: Hitachi High-Tech Science Corporation
    Inventors: Masafumi Watanabe, Toshihiro Ueno, Susumu Ito, Shoichi Hasegawa
  • Patent number: 10466501
    Abstract: The present disclosure describes optoelectronic modules that include an optical system tilted with respect to a focal plane. For example, an optoelectronic module can includes an optical system including a vertical alignment feature. An optoelectronic sub-assembly includes an active optoelectronic device, wherein the vertical alignment rests on a surface of the optoelectronic sub-assembly and wherein an optical axis of the optical system is tilted with respect to a focal plane in the sub-assembly.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: November 5, 2019
    Assignee: AMS SENSORS SINGAPORE PTE. LTD.
    Inventors: Dmitry Bakin, Matthias Gloor
  • Patent number: 10459004
    Abstract: Disclosed embodiments provide an electrical contact alignment strategy for leveling an array of probes, pens, tips, etc., in relationship to a substrate, for example, wherein a plurality of independent electrical circuits are formed by configuring regions of the array and substrate regions to be partially conductive and connected to opposite electrodes or vice versa.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: October 29, 2019
    Inventors: Andrey Ivankin, Jared A. Magoline
  • Patent number: 10453645
    Abstract: A method of inspecting a specimen with an array of primary charged particle beamlets in a charged particle beam device is described. The method includes generating a primary charged particle beam with a charged particle beam emitter; illuminating a multi-aperture lens plate with the primary charged particle beam to generate the array of primary charged particle beamlets; correcting a field curvature with at least two electrodes, wherein the at least two electrodes include aperture openings; directing the primary charged particle beamlets with a lens towards an objective lens; guiding the primary charged particle beamlets through a deflector array arranged within the lens; wherein the combined action of the lens and the deflector array directs the primary charged particle beamlets through a coma free point of the objective lens; and focusing the primary charged particle beamlets on separate locations on the specimen with the objective lens.
    Type: Grant
    Filed: December 1, 2016
    Date of Patent: October 22, 2019
    Assignees: APPLIED MATERIALS ISRAEL LTD., TECHNISCHE UNIVERSITEIT DELFT
    Inventors: Jürgen Frosien, Pieter Kruit
  • Patent number: 10446368
    Abstract: An imaging system that selectively alternates between a first, non-destructive imaging mode and a second, destructive imaging mode to analyze a specimen so as to determine an atomic structure and composition of the specimen is provided. The field ionization mode can be used to acquire first images of ionized atoms of an imaging gas present in a chamber having the specimen disposed therein, and the field evaporation mode can be used to acquire second images of ionized specimen atoms evaporated from a surface of the specimen with the imaging gas remaining in the chamber. The first and second image data can be analyzed in real time, during the specimen analysis, and results can be used to dynamically adjust operating parameters of the imaging system.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: October 15, 2019
    Assignee: Atomnaut Inc.
    Inventor: Peter V. Liddicoat
  • Patent number: 10431416
    Abstract: In order to observe a water-containing sample with excellent convenience under an air atmosphere or a gas atmosphere, or under a desired pressure, in the present invention, there is provided an observation support unit for observation by irradiating the sample disposed in a non-vacuum space separated by a diaphragm from an inner space of a charged particle optical lens barrel that generates a charged particle beam, with the charged particle beam. The observation support unit includes a main body portion for covering a hole portion that forms an observation region where the sample is observed, and the sample, and the observation support unit is directly mounted between the sample and the diaphragm, that is, on the sample.
    Type: Grant
    Filed: August 21, 2015
    Date of Patent: October 1, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yusuke Ominami, Akiko Hisada
  • Patent number: 10411182
    Abstract: A mirror device 200 disclosed herein includes a base 202, a mirror 205, an actuator 206, a fixed comb electrode 208, and a movable comb electrode 207. The movable comb electrode 207 includes: a beam portion 271; a hinge 273 configured to couple the beam portion 271 to the actuator 206 and having lower rigidity than the beam portion 271; a hinge 274 configured to couple the beam portion 271 to the base 202 and having lower rigidity than the beam portion 271; and electrode fingers 272, 272, . . . provided for the beam portion 271 and facing electrode fingers 281, 281, . . . of the fixed comb electrode 208. The movable comb electrode 207 is configured to tilt around a tilt axis B5 that passes through the hinge 274.
    Type: Grant
    Filed: September 14, 2016
    Date of Patent: September 10, 2019
    Assignee: SUMITOMO PRECISION PRODUCTS CO., LTD.
    Inventors: Ryohei Uchino, Osamu Torayashiki, Akio Mugishima
  • Patent number: 10403469
    Abstract: A method is presented for sub-surface imaging of a specimen in a charged particle microscope. A series of images, with individual members In is collected, with a value of a beam parameter P varied for each image, thereby compiling a measurement set M={(In, Pn)}, with P being the focus position along the charged particle axis. The data for the images are recorded using signals from a segmented detector. The signals from segments combined and compiled to yield a vector field. Mathematical processing then deconvolves the vector field, resulting in depth-resolved imagery of the specimen.
    Type: Grant
    Filed: April 14, 2016
    Date of Patent: September 3, 2019
    Assignee: FEI Company
    Inventors: Ivan Lazic, Eric Gerardus Theodoor Bosch
  • Patent number: 10401381
    Abstract: A scanning probe system with a probe comprising a cantilever extending from a base to a free end, and a probe tip carried by the free end of the cantilever. A first driver is provided with a first driver input, the first driver arranged to drive the probe in accordance with a first drive signal at the first driver input. A second driver is provided with a second driver input, the second driver arranged to drive the probe in accordance with a second drive signal at the second driver input. A control system is arranged to control the first drive signal so that the first driver drives the base of the cantilever repeatedly towards and away from a surface of a sample in a series of cycles. A surface detector arranged to generate a surface signal for each cycle when it detects an interaction of the probe tip with the surface of the sample.
    Type: Grant
    Filed: June 10, 2016
    Date of Patent: September 3, 2019
    Assignee: INFINITESIMA LIMITED
    Inventor: Andrew Humphris
  • Patent number: 10403470
    Abstract: A system for analyzing an analogue signal comprising randomly spaced events, the event having an event height, comprises: Converting the signal to a series of samples S(t), with t the moment of sampling, thereby forming a sampled, discrete time signal, Detecting the presence of an event, the event detected at t=T, Estimating the event height Using a model (412, FIG. 5) to estimate a noise contribution N(t) for t=(T??1) to t=(T+?2), the noise contribution derived from samples S(t) with t?(T??1) and/or samples S(t) with t?(T+?2), with ?1 and ?2 predetermined or preset time periods having a value such that the event has a negligible contribution to samples taken before (T??1) or after (T+?2), Estimating the event height E by integrating the series of samples from (T??1) to (T+?2) minus the noise contribution for said samples, E=?t=(T??1)t=(T+?2)S(t)??t=(T??1)t=(T+?2)N(t)=?t=(T??1)t=(T+?2)[S(t)?N(t)].
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: September 3, 2019
    Assignee: FEI Company
    Inventors: Nikolaos Kontaras, Bart Jozef Janssen, Cornelis Sander Kooijman, Duarte Guerreiro Tome Antunes
  • Patent number: 10395886
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.
    Type: Grant
    Filed: July 21, 2016
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhongwei Chen
  • Patent number: 10381191
    Abstract: A sample holder unit includes a sample holding portion, a shielding plate, and a rotating mechanism. The rotating mechanism supports the sample and the shielding plate and allows the sample and the shielding plate to rotate. The rotating mechanism is oriented such that an axis of rotation thereof is parallel to both a processing surface of the sample and a direction orthogonal to a direction of projection of the sample from the shielding plate. A center of rotation of the rotating mechanism resides on the processing surface of the sample.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: August 13, 2019
    Assignee: JEOL Ltd.
    Inventors: Shogo Kataoka, Akio Isono
  • Patent number: 10373797
    Abstract: In order to improve visibility of a measurement/inspection image in an inspection measurement apparatus inspecting or measuring a fine pattern, a charged particle beam device is configured to include a charged particle optical system that irradiates a surface of a sample with a converged charged particle beam so as to perform scanning, a detection unit that detects secondary charged particles generated from the sample irradiated with the charged particle beam by the charged particle optical system, an image forming unit that receives a detection signal from the detection unit and forms an image of the sample, an image processing unit that processes the image formed in the image forming unit, and a display unit that displays a result processed by the image processing unit, in which the image forming unit includes an analog signal processing portion that processes an analog signal component of the detection signal in the detection unit so as to form an image, a pulse count method signal processing portion that
    Type: Grant
    Filed: February 16, 2016
    Date of Patent: August 6, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Wen Li, Kazuki Ikeda, Hajime Kawano, Hiroyuki Takahashi, Makoto Suzuki
  • Patent number: 10373881
    Abstract: A system for analyzing defects comprises determining coordinates of a defect using a wafer inspection tool; identifying a structure of interest near the defect coordinates; directing a focused ion beam toward the wafer to expose the structure of interest; and forming an image of the exposed structure of interest, wherein the focused ion beam is directed to the mill at a location corresponding to the identified structure of interest rather than at the coordinates of the defect.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: August 6, 2019
    Assignee: FEI Company
    Inventor: Thomas G. Miller
  • Patent number: 10373793
    Abstract: A conductive contact point pin includes a pin body, and a plurality of convex portions formed in a tip portion of the pin body, wherein the conductive contact point pin breaks, by pressing a substrate where a film to be broken is formed on a conductive film from above the film to be broken, the film to be broken in order to be electrically connected to the conductive film.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: August 6, 2019
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventors: Michihiro Kawaguchi, Kiminobu Akeno, Kenichi Kataoka, Tomoki Umetsu
  • Patent number: 10354833
    Abstract: A sample holder includes a sample container and a fixing member. The fixing member is inserted into the sample container in a state in which a sample is placed, and fixes the sample by sandwiching the sample between the fixing member and a bottom surface of the sample container. At this time, a peripheral edge portion of the fixing member is elastically deformed by being inserted into the sample container, and the fixing member sandwiches the sample by its elastic force. Therefore, even when the sample is placed in the sample container in the state of being immersed in a liquid, the sample can be held in a stable state by the fixing member.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: July 16, 2019
    Assignee: Shimadzu Corporation
    Inventors: Hiroshi Arai, Akinori Kogure
  • Patent number: 10347461
    Abstract: A method relates to the in situ preparation of a microscopic specimen is carried out using a particle beam device, which includes a particle beam column for producing a focused beam of charged particles, a specimen receptacle for receiving a specimen block, and a detector for detecting interaction products of the interaction between particle beam and specimen material. The method includes: providing a specimen block having an exposed structure that comprises a specimen region of interest; producing a bending edge in the exposed structure by the action of the particle beam such that at least some of the exposed structure is shaped in the direction of the incident particle beam; and moving the specimen receptacle, in which the specimen block is received, so that a specimen region, which is enclosed by the shaped structure, is observable and/or processable in the particle beam device.
    Type: Grant
    Filed: June 28, 2018
    Date of Patent: July 9, 2019
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Andreas Schmaunz, Holger Doemer
  • Patent number: 10345250
    Abstract: A method of inspecting a sample with a charged particle beam device is described. The method comprises arranging the sample on a stage, determining a first focusing strength of an objective lens adapted to focus a charged particle beam on a first surface region of the sample that is arranged at a first distance from the objective lens in a direction of an optical axis, calculating a difference between the first distance and a predetermined working distance based on the determined first focusing strength, adjusting a distance between the first surface region and the objective lens by the calculated difference, and inspecting the first surface region. According to a further aspect, a charged particle beam device configured to be operated according to the above method is described.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: July 9, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bernhard G. Mueller, Kulpreet Singh Virdi, Bernhard Schüler, Robert Trauner, Ludwig Ledl
  • Patent number: 10319562
    Abstract: To reduce the risk of measurement accuracy degradation and information lost due to adhesion of contamination that occurs by irradiation with charged particle beam. The charged particle beam device includes: a deflector for scanning a charged particle beam; a detector for detecting secondary charged particles generated by the interaction of the charged particle beam with a sample; and a system control unit including a calculation part, a measurement part, and a storage part. The measurement part measures a feature amount from an image formed based on a signal output from the detector after a charged particle beam is scanned on the sample by the deflector (S303). The calculation part calculates an amount of contamination adhering to a surface of the sample by irradiation of the sample with the charged particle beam, from a change in the feature amount measured by the measurement part (S304).
    Type: Grant
    Filed: March 9, 2018
    Date of Patent: June 11, 2019
    Assignee: HITACHI, LTD.
    Inventors: Megumi Kimura, Momoyo Enyama, Makoto Sakakibara
  • Patent number: 10309875
    Abstract: A sample collection component including a main body and a removable light shielding component is provided. The main body has a sample storing space which is sealable and allows light to pass through. The removable light shielding component is disposed on the main body and located outside the sample storing space for shielding at least a portion of the light passing through the sample storing space. In addition, a manufacturing method of the sample collection component is also provided.
    Type: Grant
    Filed: March 8, 2016
    Date of Patent: June 4, 2019
    Assignee: Materials Analysis Technology Inc.
    Inventors: Pin Chang, Ying-Chan Hung, Hung-Jen Chen
  • Patent number: 10309913
    Abstract: A pattern inspection method includes scanning a plurality of patterns on a substrate with N charged particle beams and detecting secondary electrons respectively generated from each of the plurality of patterns to acquire N SEM images, determining a distribution of gray level values for each of the acquired N SEM images, selecting M gray levels from the distributions of the N gray levels, selecting a first gray level value from a first one of the M distributions, and comparing it to the corresponding first gray level value of the of the other M?1 distributions, and determining that an abnormality has occurred in the charged particle beam corresponding to the first one of the M distributions when the difference between the first value of the first one of the M distributions and the other M?1 distributions is greater than a predetermined threshold value.
    Type: Grant
    Filed: March 1, 2018
    Date of Patent: June 4, 2019
    Assignee: Toshiba Memory Corporation
    Inventor: Osamu Nagano
  • Patent number: 10304654
    Abstract: A purpose of the present invention is to provide a charged particle beam device that suppresses an off-axis amount when a field of view moves, said move causing an aberration, and allows large field of view moves to be carried out. In order to achieve the above-mentioned purpose, this charged particle beam device is provided with an objective lens and deflectors for field of view moves, said deflectors deflecting a charged particle beam, and is further provided with an accelerating tube positioned between the objective lens and the deflectors for field of view moves, a power source that applies a voltage to the accelerating tube, and a control device that controls the voltage to be applied to the power source in response to the deflection conditions of the deflectors for field of view moves.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: May 28, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikegami, Yuta Kawamoto, Hideto Dohi, Manabu Yano, Yutaka Tandai, Hideyuki Kazumi