Abstract: The present invention provides an apparatus of electron beam comprising an electron gun with a pinnacle limiting plate having at least one current-limiting aperture. The pinnacle limiting plate is located between a bottom (or lowest) anode and a top (or highest) condenser within the electron gun. A current (ampere) of the electron beam that has passed through the current-limiting aperture remains the same (unchanged) after the electron beam travels through the top condenser and an electron optical column and arrives at a sample space. Electron-electron interaction of the electron beam is thus reduced.

Abstract: In the system and method disclosed, an ultrahigh vacuum (UHV) scanning tunneling microscope (STM) tip is used to selectively desorb hydrogen atoms from the Si(100)-2X1:H surface by injecting electrons at a negative sample bias voltage. A new lithography method is disclosed that allows the STM to operate under imaging conditions and simultaneously desorb H atoms as required. A high frequency signal is added to the negative sample bias voltage to deliver the required energy for hydrogen removal. The resulted current at this frequency and its harmonics are filtered to minimize their effect on the operation of the STM's feedback loop. This approach offers a significant potential for controlled and precise removal of hydrogen atoms from a hydrogen-terminated silicon surface and thus may be used for the fabrication of practical silicon-based atomic-scale devices.

Abstract: A method for the patterning and control of single electrons on a surface is provided that includes implementing scanning tunneling microscopy hydrogen lithography with a scanning probe microscope to form charge structures with one or more confined charges; performing a series of field-free atomic force microscopy measurements on the charge structures with different tip heights, where interaction between the tip and the confined charge are elucidated; and adjusting tip heights to controllably position charges within the structures to write a given charge state. The present disclose also provides a Gibb's distribution machine formed with the method for the patterning and control of single electrons on a surface. A multi bit true random number generator and neural network learning hardware formed with the above described method are also provided.

Abstract: The disclosure relates to a dimension measurement apparatus that reduces time required for dimension measurement and eliminates errors caused by an operator. Therefore, the dimension measurement apparatus uses a first image recognition model that extracts a boundary line between a processed structure and a background over the entire cross-sectional image and/or a boundary line of an interface between different kinds of materials, and a second image recognition that output information for dividing the boundary line extending over the entire cross-sectional image obtained from the first image recognition model for each unit pattern constituting a repetitive pattern, obtains coordinates of a plurality of feature points defined in advance for each unit pattern, and measures a dimension defined as a distance between two predetermined points of the plurality of feature points.

Abstract: A method for creating a high-resolution image of an object from low-resolution images of the object is provided. Both the low-resolution images and the high-resolution image are composed of a pixel grid. An image recording device successively records low-resolution images, in which pitches of the grid points of the pixel grid are increased in one image dimension in comparison with the pitches of the grid points of the pixel grid in the high-resolution image to be created. A data processing system registers the low-resolution images with respect to one another to obtain registered images which are superimposed to obtain the high-resolution image. The grid points of the low-resolution images and the grid points of the high-resolution image have same dimensions and the data processing system uses image information obtained from different positions of the object relative to the grid points in the individual low-resolution images to create the high-resolution images.

Abstract: When a high-performance retarding voltage applying power supply cannot be employed in terms of costs or device miniaturization, it is difficult to sufficiently adjust focus in a high acceleration region within a range of changing an applied voltage, and identify a point at which a focus evaluation value is maximum. To address the above problems, a scanning electron microscope is provided including: an objective lens configured to converge an electron beam emitted from an electron source; a current source configured to supply an excitation current to the objective lens; a negative-voltage applying power supply configured to form a decelerating electric field of the electron beam on a sample; a detector configured to detect charged particles generated when the electron beam is emitted to the sample; and a control device configured to calculate a focus evaluation value from an image formed according to an output of the detector.

Abstract: A system and method is provided for rapidly collecting high quality images of a specimen through controlling a re-focusable beam of an electron microscope. An intelligent acquisition system instructs the electron microscope to perform an initial low-resolution scan of a sample. A low-resolution image of the sample is received by the intelligent acquisition system as scanned image information from the electron microscope. The intelligent acquisition system then determines regions of interest within the low-resolution image and instructs the electron microscope to perform a high-resolution scan of the sample, only in areas of the sample corresponding to the determined regions of interest or portions of the determined regions of interest, so that other regions within the sample are not scanned at high-resolution, where the high-resolution scanning in the regions of interest is guided by a probability map using a deep neural network for segmentation.

Abstract: A superconducting quantum mechanical device includes first, second, third and fourth Josephson junctions connected in a bridge circuit having first, second and third resonance eigenmodes. The device also includes first and second capacitor pads. The first and second capacitor pads and the bridge circuit form a superconducting qubit having a resonance frequency corresponding to the first resonance eigenmode. The device further includes first and second resonator sections. The first and second resonator sections and the bridge circuit form a resonator having a resonance frequency corresponding to the second resonance eigenmode. The device also includes a source of magnetic flux arranged proximate the bridge circuit. The source of magnetic flux is configured to provide, during operation, a magnetic flux through the bridge circuit to cause coupling between the first, second and third resonance eigenmodes when the third resonance eigenmode is excited.

Abstract: A scanning electron microscopy system that includes a primary electron beam radiation unit configured to irradiate a first pattern of a substrate having a second pattern formed in a peripheral region of the first pattern, a detection unit configured to detect back scattered electrons emitted from the substrate, an image generation unit configured to generate an electron beam image corresponding to a strength of the back scattered electrons, a designating unit configured to designate a depth measurement region in which the first pattern exists on the electron beam image, and a processing unit configured to obtain an image signal of the depth measurement region and a pattern density in the peripheral region where the second pattern exists, and to estimate a depth of the first pattern based on the obtained image signal of the depth measurement region and the pattern density in the peripheral region.

Abstract: The present invention provides methods for controllably forming a layer of amorphous ice and other amorphous solids on a substrate, and also provides cryo-electron microscopy (cryo-EM) sample preparation methods and systems that utilize in vacuo formation of amorphous ice and other solids. Formation of the amorphous solid layer can be independent of the deposition of sample molecules to be analyzed using electron microscopy, and allows for the generation of a uniformly thick layer. Optionally, mass spectrometry instruments are used to generate and purify molecules deposited on the generated amorphous solid layer. The techniques and systems described herein can deliver near ideal cryo-EM sample preparation to greatly increase resolution, sensitivity, scope, and throughput of cryo-EM protein imaging, and therefore greatly impact the field of structural biology.

Abstract: A method for optically detecting biomarkers in a biosensor is disclosed, wherein the optical detection obtains spatially and spectrally resolved optical signals from a sample on a biosensor, and one or more of these spatially and spectrally resolved optical signals can be analyzed in parallel with image acquisition. The image analysis comprises reading data of the acquired images, correcting them to reduce inhomogeneities and noise, localizing particles in the images, characterizing each particle individually to obtain its position and characterization parameters, and classifying the particles based on their characterization parameters. Using the number of particles per class for all the acquired images of the sample, a statistical value is calculated per sample and each statistical value is correlated with an indication of the presence of a biomarker in the sample.

Abstract: A collation device includes a processor configured to: acquire plural captured images obtained by capturing an inspection image to be collated, while changing an irradiation direction of light to be emitted; and provide a notification of a collation result between the inspection image included in each of the captured images, and a collation image of which pattern changes depending on the irradiation direction of the light, according to a similarity between plural registered images obtained by capturing in advance the collation image while changing the irradiation direction of the light to be emitted to the collation image, and the inspection image, after adjusting a positional relationship between a camera, a light source, and an image to be identical to a positional relationship between a camera that captures the inspection image at a time of capturing the inspection image, a light source that irradiates the inspection image with light, and the inspection image.

Abstract: Reduced and low work function materials capable of optimizing electron emission performance in a range of vacuum and nanoscale electronic devices and processes and a method for reducing work function and producing reduced and low work function materials are described. The reduced and low work function materials advantageously may be made from single crystal materials, preferably metals, and from amorphous materials with optimal thicknesses for the materials. A surface geometry is created that may significantly reduce work function and produce a reduced or low work function for the material. It is anticipated that low and ultra-low work function materials may be produced by the present invention and that these materials will have particular utility in the optimization of electron emissions in a wide range of vacuum microelectronics and other nanoscale electronics and processes.

Abstract: Methods for using electron diffraction holography to investigate a sample, according to the present disclosure include the initial steps of emitting a plurality of electrons toward the sample, forming the plurality of electrons into a first electron beam and a second electron beam, and modifying the focal properties of at least one of the two beams such that the two beams have different focal planes. Once the two beams have different focal planes, the methods include focusing the first electron beam such that it has a focal plane at or near the sample, and focusing the second electron beam so that it is incident on the sample, and has a focal plane in the diffraction plane. An interference pattern of the first electron beam and the diffracted second electron beam is then detected in the diffraction plane, and then used to generate a diffraction holograph.

Abstract: A large radius probe for a surface analysis instrument such as an atomic force microscope (AFM). The probe is microfabricated to have a tip with a hemispherical distal end or apex. The radius of the apex is the range of about a micron making the probes particularly useful for nanoindentation analyses. The processes of the preferred embodiments allow such large radius probes to be batch fabricated to facilitate cost and robustness.

Abstract: In order to determine, in a cancer test using nematodes, whether or not the nematodes used in the cancer test are adequate, the present invention is characterized in that after a plate on which a urine from a subject and the nematode are set is placed, a cancer test apparatus performs imaging for quality assay of the nematode during the initial two minutes; an analysis apparatus determines a quality of the nematode using the imaging result; after taxis of the nematode is completed, the cancer test apparatus performs imaging for cancer test assay by the nematode; and the analysis apparatus determines the presence or absence of a cancer in the subject using the imaging result.

Abstract: The present invention provides an X-ray analysis device and a peak search method capable of realizing highly accurate peak searches without significantly increasing a processing time. Peak search processing includes: a step (S220) for acquiring a profile of a spectrum; a step (S240) for narrowing down a wavelength range where a true value of a peak wavelength (peak intensity) may be present, taking into account statistical fluctuation of a measured value; a step (S250) for measuring the intensity of the X-rays at the long wavelength end, the short wavelength end, and the intermediate wavelength in the narrowed wavelength range; a step (S255) for calculating a quadratic function passing through the respective measured values in the above-described three wavelengths; and a step (S260) for calculating the wavelength of the vertex of the calculated quadratic function as the peak wavelength.

Abstract: Reciprocal space map of specific sample locations is generated based on the sample images acquired by irradiating the sample with a charged particle beam at multiple incident angles. The incident angles are obtained by tilting the charged particle beam and/or the sample around two perpendicular axes within the sample plane. The reciprocal space map of a selected sample location is generated based on intensity of pixels corresponding to the location in the sample images.

Abstract: A light modulated electron source utilizes a photon-beam source to modulate the emission current of an electron beam emitted from a silicon-based field emitter. The field emitter's cathode includes a protrusion fabricated on a silicon substrate and having an emission tip covered by a coating layer. An extractor generates an electric field that attracts free electrons toward the emission tip for emission as part of the electron beam. The photon-beam source generates a photon beam including photons having an energy greater than the bandgap of silicon, and includes optics that direct the photon beam onto the emission tip, whereby each absorbed photon creates a photo-electron that combines with the free electrons to enhance the electron beam's emission current. A controller modulates the emission current by controlling the intensity of the photon beam applied to the emission tip. A monitor measures the electron beam and provides feedback to the controller.

Abstract: Methods, systems for preventing an APT attack and non-transitory machine-readable storage mediums are disclosed. In one aspect, communication data is obtained in a network, association analysis is performed for the communication data, threat data is obtained from the communication data based on an association analysis result, each piece of the obtained threat data is mapped to a corresponding APT attack phase based on a kill chain model; and for each piece of threat data, prevention is performed for a network entity associated with the piece of the threat data based on prevention strategies corresponding to the plurality of APT attack phases.

Abstract: A method and a system for detecting backscattered electrons in a multi-beam electron column.

Abstract: A charged particle beam inspection apparatus includes a movable stage, configured to hold a substrate placed on the movable stage; a stage control circuit, configured to continuously move the movable stage in a direction opposite to a first direction; a deflection control circuit, configured to control a deflector to collectively deflect multiple beams to an N×N? small region group including N small regions, the collective deflection includes performing tracking deflection of the multiple beams and collectively deflecting the multiple beams to a new group of N×N? small regions and sequentially perform a first and a second step, a detector configured to detect secondary electrons emitted from the substrate due to irradiation of the substrate with the multiple beams, and combinations of a value of N and a value of M are set such that the greatest common divisor of the value of N and the value of M is 1.

Abstract: An embodiment of electron microscope system is described that comprises an electron column pole piece and a light guide assembly operatively coupled together. The light guide assembly also includes one or more detectors, and a mirror with a pressure limiting aperture through which an electron beam from an electron source passes. The mirror is also configured to reflect light, as well as to collect back scattered electrons and secondary electrons.

Abstract: A grid sample production apparatus includes: a frame in which an internal space is formed; a grid unit which is vertically provided on an upper side of the frame, and grips a grid at a lower end; a filter unit which is provided to be movable inside the frame and selectively absorbs the protein liquid of the grid gripped at one end of the grid unit; a laser unit which is provided on one side of the filter unit; a screen unit which is disposed inside the frame and on which a diffraction image appears by the laser from the laser unit by being diffracted by the grid; and a liquid amount analysis unit which analyzes an illuminance of the diffraction image appeared on the screen unit and determines whether the protein liquid of the grid is disposed in an appropriate amount.

Abstract: The present invention relates to an apparatus and method for analyzing the energy of backscattered electrons generated from a specimen. The apparatus includes: an electron beam source (101) for generating a primary electron beam; an electron optical system (102, 105, 112) configured to direct the primary electron beam to a specimen while focusing and deflecting the primary electron beam; and an energy analyzing system configured to detect an energy spectrum of backscattered electrons emitted from the specimen.

Abstract: The present disclosure relates to the technical field of microwave test, and discloses a method and a system for analyzing the spatial resolution of a microwave near-field probe and a microwave microscope equipped with the system, wherein in the method for analyzing the spatial resolution of the microwave near-field probe, a three-dimensional equipotential surface in a sample is drawn by using an electric field formula calculated by a quasi-static theory; an equivalent model of a probe sample is established by using finite element analysis software, so as to change material characteristics in the area outside the three-dimensional equipotential surface; by observing the influence of changing materials on the potential distribution in the sample, a near-field action range of the probe is determined, and the spatial resolution of the microwave near-field scanning microscope is analyzed and calculated.

Abstract: A transmission circuit board includes a bendable area, a first transmission areas, and a second transmission areas. The first and second transmission areas are connected to the bendable area. The inner circuit substrate board further includes a substrate layer and an inner circuit layer formed on the substrate layer and including a first signal circuit. The transmission circuit board further includes a first dielectric layer formed on the inner circuit layer, a first outer circuit layer formed on the first dielectric layer, a first protecting layer formed on the first outer circuit layer, and a first shielding layer formed on the first protecting layer. The first dielectric layer lies the first and second transmission areas. Two ends of the first signal circuit are connected to the first outer circuit layer. The first shielding layer is connected to the first outer circuit layer and lies the bendable area.

Abstract: A cancer analysis system includes, so as to perform an efficient image analysis in a cancer screening test using nematodes: a light source unit that irradiates a plate on which nematodes and a urine sample are plotted, from below; a photographing unit that takes an image of the plate irradiated by the light source unit; and an analyzer that analyzes the image taken by the photographing unit. The analyzer: couples a prescribed number of pixels in the image into a larger number of pixels thereof; and performs a chemotaxis assay of the nematodes based on a time variation of information on a luminous center of gravity of the image.

Abstract: The present disclosure aims at proposing a multi-beam irradiation device capable of correcting off-axis aberrations. In order to achieve the above object, a beam irradiation device is proposed, which includes a beam source which emits a plurality of beams; an objective lens (17) which focuses a beam on a sample; a first lens (16) which is arranged such that a lens main surface is positioned at an object point of the objective lens and deflects a plurality of incident beams toward an intersection point of a lens main surface of the objective lens and an optical axis; a second lens (15) which is arranged closer to a beam source side than the first lens and focuses the plurality of beams on a lens main surface of the first lens; and a third lens (14) which is arranged closer to the beam source side than the second lens and deflects the plurality of beams toward an intersection point of a lens main surface of the second lens and the optical axis.

Abstract: To stabilize automated MS, provided is a charged particle beam apparatus, which is configured to automatically fabricate a sample piece from a sample, the charged particle beam apparatus including: a charged particle beam irradiation optical system configured to radiate a charged particle beam; a sample stage configured to move the sample that is placed on the sample stage; a sample piece transportation unit configured to hold and convey the sample piece separated and extracted from the sample; a holder fixing base configured to hold a sample piece holder to which the sample piece is transported; and a computer configured to perform control of a position with respect to a target, based on: a result of second determination about the position, which is executed depending on a result of first determination about the position; and information including an image that is obtained by irradiation with the charged particle beam.

Abstract: The present disclosure provides a pattern cross-sectional shape estimation system which includes a charged particle ray device which includes a scanning deflector that scans a charged particle beam, a detector that detects charged particles, and an angle discriminator that is disposed in a front stage of the detector and discriminates charged particles to be detected, and an arithmetic device that generates a luminance of an image, and calculates a signal waveform of a designated region on the image using the luminance. The arithmetic device generates angle discrimination images using signal electrons at different detection angles, and estimates a side wall shape of a measurement target pattern.

Abstract: Provided is a charged particle beam control device having improved signal detection accuracy. The charged particle beam control device (detection block) includes: a detector provided in a charged particle beam device, and configured to detect secondary electrons emitted from a sample by irradiating the sample with a charged particle beam and output an electric signal based on the detected secondary electrons; a signal wiring configured to transmit the electric signal; a noise detection wiring configured to detect a noise signal generated in the charged particle beam device; and an arithmetic circuit configured to generate a signal obtained by subtracting the noise signal from the electric signal.

Abstract: A pattern inspection apparatus according to an aspect described herein includes: a stage on which an object to be inspected is capable to be mounted, a multibeam column that irradiates the object to be inspected with multi-primary electron beams, and a multi-detector including a first detection pixel that receives irradiation of a first secondary electron beam emitted after a first beam scanning region of the object to be inspected is irradiated with a first primary electron beam of the multi-primary electron beams and a second detection pixel that receives irradiation of a second secondary electron beam emitted after a second beam scanning region adjacent to the first beam scanning region of the object to be inspected and overlapping with the first beam scanning region is irradiated with a second primary electron beam adjacent to the first primary electron beam of the multi-primary electron beams; a comparison unit that obtains a difference in beam intensity between the first primary electron beam and the se

Abstract: An electron beam detection element according to an exemplary embodiment includes a plurality of unit cells. Each of the plurality of unit cells includes a diode of avalanche multiplication type and a plurality of memories. The diode of avalanche multiplication type is configured to detect an electron beam. The plurality of memories store signals of different frames respectively, each of the signals being output from the diode.

Abstract: A spin polarimeter includes: a particle beam source or a photon beam source that is a probe for a sample; a sample chamber in which the sample is accommodated; a spin detector that includes a target to be irradiated with an electron generated from the sample by a particle beam or a photon beam from the probe, and a target chamber in which the target is accommodated, and is configured to detect a spin of the sample by detecting an electron scattered on the target; a first exhaust system that is configured to exhaust the sample chamber; a second exhaust system that is configured to exhaust the target chamber; and an orifice that is disposed between the target chamber and the sample chamber.

Abstract: A multiple electron beam irradiation apparatus includes a forming mechanism which forms multiple primary electron beams; a plurality of electrode substrates being stacked in each of which a plurality of openings of various diameter dimensions are formed, the plurality of openings being arranged at passage positions of the multiple primary electron beams, and through each of which a corresponding one of the multiple primary electron beams passes, the plurality of electrode substrates being able to adjust an image plane conjugate position of each of the multiple primary electron beams depending on a corresponding one of the various diameter dimensions; and a stage which is capable of mounting thereon a target object to be irradiated with the multiple primary electron beams having passed through the plurality of electrode substrates.

Abstract: An x-ray imaging apparatus includes an x-ray source and detector with multiple detector elements. The source and detector are on a support that rotates around a subject, enabling projections at different view angles. The apparatus operates the x-ray source in switched kVp mode for alternately applying different voltages, including lower and higher voltages, during rotation to enable lower-energy and higher-energy exposures over the projections, providing for lower-energy projections and higher-energy projections. The x-ray detector is a photon-counting multi-bin detector allocating photon counts to multiple energy bins, and the apparatus selects counts from at least a subset of the bins to provide corresponding photon count information for both lower- and higher-energy projections.

Abstract: Signal electrons with high energy that pass near an optical axis, for example, backscattered electrons or secondary electrons in a booster optical system, can be detected. Therefore, there is provided a charged particle beam device including: a charged particle beam source configured to generate a charged particle beam; an objective lens configured to focus the charged particle beam to a sample; and a first charged particle detecting element disposed between the charged particle beam source and the objective lens and configured to detect charged particles generated by an interaction between the charged particle beam and the sample, in which a detection surface of the first charged particle detecting element is disposed on a center axis of the objective lens.

Abstract: The methods and systems disclosed here detect edges of top-down images of respective cross-sections of an array of high-aspect-ratio (HAR) features. The respective cross sections are at various depths of a HAR feature along a longitudinal direction. The detected edges are re-sampled in a spatial domain at a target angular resolution. The re-sampled edges are represented as a corresponding set of harmonics in a frequency domain, each set of harmonics preserving characteristic information about a respective cross-section of the HAR feature at a certain depth. A plurality of cross-sections at the various depths of the HAR feature are reconstructed by analyzing the corresponding sets of harmonics in the frequency domain. A 3D profile of the HAR feature is generated by stitching the plurality of re-constructed cross-sections at the various depths of the HAR feature.

Abstract: A system combination includes a particle beam system and a light-optical system. The particle beam system can be an individual particle beam system or a multiple particle beam system. A light entry mechanism can provided at a branching site of a beam tube arrangement within a beam switch. A light beam of the light-optical system can enter into the beam tube arrangement through the light entry mechanism such that the light beam impinges, in substantially collinear fashion with particle radiation, on an object to be inspected. Parts of the light-optical beam path and parts of the particle-optical beam path can extend parallel to one another or overlap with one another. This arrangement can allow light of the light-optical system to be incident in perpendicular fashion on an object to be inspected, optionally without impairing the particle-optical resolution of the particle beam system.

Abstract: Methods, systems, and devices for leakage source detection are described. In some cases, a testing device may scan a first set of access lines of a memory die that have a first length and a second set of access lines of the memory die that have a second length different than the first length. The testing device may determine a first error rate associated with the first set of access lines and a second error rate associated with the second set of access lines. The testing device may categorize a performance of the memory die based on the first and second error rates. In some cases, the testing device may determine a third error rate associated with a type of error based on the first and second error rates and may categorize the performance of the memory die based on the third error rate.

Abstract: A laser beam adjustment unit adjusts a laser beam applied to a cantilever. Assuming that a direction of displacement of a spot of the laser beam on a light receiving surface when the cantilever is displaced during measurement of properties of a sample is defined as a first direction, and a direction orthogonal to the first direction on the light receiving surface is defined as a second direction, the laser beam adjustment unit adjusts the laser beam such that a length of the spot of the laser beam in the second direction during adjustment of a position of a detection unit is longer than a length of the spot of the laser beam in the first direction during measurement of the properties of the sample.

Abstract: A method that includes performing multiple test iterations to provide multiple test results; and processing the multiple test results to provide estimates of a conductivity of each of the multiple bottoms segments. The multiple test iterations includes repeating, for each bottom segment of the multiple bottom segments, the steps of: (a) illuminating the bottom segment by a charging electron beam; wherein electrons emitted from the bottom segment due to the illuminating are prevented from exiting the hole; (b) irradiating, by a probing electron beam, an area of an upper surface of the dielectric medium; (c) collecting electrons emitted from the area of the upper surface as a result of the irradiation of the area by the probing electron beam to provide collected electrons; and (d) determining an energy of at least one of the collected electrons to provide a test result.

Abstract: A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.

Abstract: The present disclosure provides a method and a system for scanning wafer. The system captures a defect image of a wafer, and generates a reference image corresponding to the first defect image based on a reference image generation model. The system generates a defect marked image based on the defect image and the reference image.

Abstract: Disclosed is a composite charged particle beam apparatus including: an ion supply unit supplying an ion beam; an acceleration voltage application unit applying an acceleration voltage to the ion beam supplied by the ion supply unit to accelerate the ion beam; a first focusing unit focusing the ion beam; a beam booster voltage application unit applying a beam booster voltage to the ion beam; a second focusing unit focusing the ion beam to irradiate a sample; an electron beam emission unit emitting an electron beam to irradiate the sample; and a controller setting a value of the beam booster voltage that the beam booster voltage application unit applies to the ion beam, based on a value of the acceleration voltage applied to the ion beam by the acceleration voltage application unit and of a set value predetermined according to a focal distance of the focused ion beam.

Abstract: An interferometric electron microscope with increased irradiating electric current density which causes electron waves to interfere with each other and includes: an electron source; an irradiating lens system a focusing lens system an observational plane an artificial grating disposed between the electron source and the irradiating lens system and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; an electron beam biprism deflecting the first electron wave and the second electron wave to pass the first electron wave through the specimen for use as an object wave and to use the second electron wave as a reference wave; and an electron beam biprism in a focusing system deflecting the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane to produce an image.

Abstract: Provided is a scanning electron microscope. The scanning electron microscope is capable of removing a charge generated on a side wall of a deep hole or groove, and inspects and measures a bottom portion of the deep hole or groove with high accuracy.

Abstract: Techniques of using a Transmission Charged Particle Microscope for diffraction pattern detection are disclosed. An example method including irradiating at least a portion of a specimen with a charged particle beam, using an imaging system to collect charged particles that traverse the specimen during said irradiation, and to direct them onto a detector configured to operate in a particle counting mode, using said detector to record a diffraction pattern of said irradiated portion of the specimen, recording said diffraction pattern iteratively in a series of successive detection frames, and during recording of each frame, using a scanning assembly for causing relative motion of said diffraction pattern and said detector, so as to cause each local intensity maximum in said pattern to trace out a locus on said detector.

Abstract: The invention relates to a pulse shaper (18). The pulse shaper (18) comprises an integrator (19) for generating a pulse having a peak amplitude indicative of the energy of a detected photon, a feedback resistor (22), switchable discharge circuitry (23) for discharging the integrator (19), and a peak detector (24) for detecting the peak of the pulse. The pulse shaper is adapted to start the discharge of the integrator by the switchable discharge circuitry based on the detection of the peak and to connect the feedback resistor in parallel to the integrator during a period of the pulse generation and to disconnect the feedback resistor during another period of the pulse generation. The pulse shaper can be such that the generation of the pulse is substantially unhindered by any noticeable concurrent discharging mechanism while, at the same time, the occurrence of energy pedestals can be efficiently avoided.