Electron Microscope Type Patents (Class 250/311)
  • Patent number: 10887580
    Abstract: Methods and systems for improved detection and classification of defects of interest (DOI) on semiconductor wafers based on three-dimensional images are described herein. Three dimensional imaging of volumes of thick, layered structures enables accurate defect detection and estimation of defect location in three dimensions at high throughput. A series of images are acquired at a number of different wafer depths. A three dimensional image of a thick semiconductor structure is generated from the series of images. Defects are identified and classified based on an analysis of the three dimensional image of the thick semiconductor structure. In some examples, the three-dimensional image stack is visualized by contour plots or cross-sectional plots to identify a characteristic defect response. In some examples, the three-dimensional image is processed algorithmically to identify and classify defects. In another aspect, the location of a defect is estimated in three dimensions based on the three dimensional image.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: January 5, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: Pavel Kolchin, Robert M. Danen, Philip Measor
  • Patent number: 10886099
    Abstract: There is provided a method of aberration measurement capable of reducing the effects of image drift. The novel method of aberration measurement is for use in an electron microscope. The method comprises the steps of: acquiring a first image that is a TEM (transmission electron microscope) image of a sample; scanning the illumination angle of an electron beam impinging on the sample and acquiring a second image by multiple exposure of a plurality of TEM images generated at different illumination angles; and calculating aberrations from the first and second images.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: January 5, 2021
    Assignee: JEOL Ltd.
    Inventors: Yuji Kohno, Akiho Nakamura
  • Patent number: 10884379
    Abstract: Method for acquisition of at least one hologram of a sample by off-axis holography using a transmission electron microscope, the microscope comprising an electron beam source, at least one objective lens, a sample holder, at electron biprism and means of displacing the electron beam in precession mode upstream from the sample holder and a compensator of the precession downstream from the sample holder, said method comprising the activation of means of displacing the electron beam in precession mode and the compensator and acquisition of a hologram of said sample in precession mode.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: January 5, 2021
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Victor Boureau, David Cooper
  • Patent number: 10879037
    Abstract: To provide a charged particle beam device which enables observation and evaluation of the surface and the inside of a sample with low damage to the sample, the charged particle beam device has: a charged particle beam source 2; a sample table 9 in which the sample 210 is placed; a charged particle beam optical system which pulsates a charged particle beam 100 and irradiates the charged particle beam to the sample at an acceleration voltage within a range of 0 kV to 5 kV; a split distance selector 125 for selecting a measurement object of the sample; and a split distance setting unit 124 for setting a split distance in one line scanning of the charged particle beam on the sample.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: December 29, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Natsuki Tsuno, Naomasa Suzuki, Atsushi Okita, Muneyuki Fukuda
  • Patent number: 10867771
    Abstract: An electron microscope includes: an irradiation lens system that irradiates a specimen with an electron beam; an irradiation system deflector that deflects an electron beam incident on the specimen; a specimen tilting mechanism that tilts the specimen; an imaging lens system that forms an electron diffraction pattern or an electron microscope image by using an electron having passed through the specimen; an imaging device that acquires the electron diffraction pattern or the electron microscope image formed by the imaging lens system; and a controller that controls the irradiation system deflector and the specimen tilting mechanism.
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: December 15, 2020
    Assignee: JEOL Ltd.
    Inventor: Shuji Kawai
  • Patent number: 10854419
    Abstract: According to one embodiment, a contour extraction method for extracting a contour of a target object from an image obtained using an electron beam includes: extracting the contour of the target object from a backscattered electron image; creating a dictionary for associating a secondary electron image obtained from a portion common to the backscattered electron image with the contour; calculating a likelihood of the contour of the target object in a plurality of positions of a newly obtained secondary electron image by referencing the dictionary regarding the newly obtained secondary electron image; and setting a route along which a total sum of the likelihood is maximized out of the plurality of positions as the contour of the target object.
    Type: Grant
    Filed: February 27, 2019
    Date of Patent: December 1, 2020
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Chihiro Ida, Yukinobu Sakata
  • Patent number: 10855286
    Abstract: A resistive random-access memory device formed on a semiconductor substrate includes a first interlayer dielectric formed over the semiconductor substrate and includes a first via. A chemical-mechanical-polishing stop layer is formed over the interlayer dielectric. A lower metal layer formed in the first via has a top surface extending above a top surface of the chemical-mechanical-polishing stop layer. A dielectric layer is formed over the chemical-mechanical-polishing stop layer and is in electrical contact with the lower metal layer. A barrier metal layer is formed over the dielectric layer. Edges of the dielectric layer and the first barrier metal layer extend beyond outer edges of the first via. A second interlayer dielectric layer including a second via is formed over the dielectric layer. An upper metal layer formed in the second via in electrical contact with the barrier metal layer.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: December 1, 2020
    Assignee: Microsemi SoC Corp.
    Inventors: Jonathan Greene, Frank Hawley, John McCollum
  • Patent number: 10825648
    Abstract: Methods and systems for examining a dynamic specimen using a Transmission Charged Particle Microscope are disclosed. An example method includes sparsifying a beam of charged particles to produce at detector an image of a sample comprising a distribution of sub-images that are mutually isolated from one another at least along an elected scan path, and using a scanning assembly to cause relative motion of said image and said detector along said scan path during a time interval ?t so as to smear out each sub-image into a detection streak on said detector, each such streak capturing temporal evolution of its associated sub-image during said time interval ?t.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: November 3, 2020
    Assignee: FEI Company
    Inventors: Bastiaan Lambertus Martinus Hendriksen, Erik René Kieft
  • Patent number: 10825647
    Abstract: A method of using a Transmission Charged Particle Microscope, comprising: Providing a specimen on a specimen holder; Using an illumination system to direct a beam of charged particles from a source onto said specimen; Using an imaging system to direct charged particles that are transmitted through the specimen onto a detector, further comprising the following actions: In an acquisition step, lasting a time interval T, using said detector in particle counting mode to register spatiotemporal data relating to individual particle detection incidences, and to output said spatiotemporal data in raw form, without assembly into an image frame; In a subsequent rendering step, assembling a final image from said spatiotemporal data, while performing a mathematical correction operation.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: November 3, 2020
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Lingbo Yu, Erik Michiel Franken
  • Patent number: 10796882
    Abstract: According to one aspect of the present invention, a charged particle beam writing apparatus includes correction figure data generation circuitry configured to generate pattern data of a correction figure pattern for correcting a figure portion detected, where the pattern data includes dose information to identify a dose of the correction figure pattern; correction figure pattern data conversion circuitry configured to convert the pattern data of the correction figure pattern into correction figure pattern pixel data defining a value corresponding to a dose for the each pixel, based on pixel setting common to that of the writing pattern pixel data; and combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding the value defined in the writing pattern pixel data and the value defined in the correction figure pattern pixel data.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: October 6, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Ryoichi Yoshikawa, Hideo Inoue
  • Patent number: 10796877
    Abstract: According to one aspect of the present invention, a charged particle beam image acquisition apparatus includes a rectangular parallelepiped chamber where a target object is disposed; a primary electron optical column placed on an upper surface of the chamber so that a point of intersection between two diagonal lines on the upper surface of the chamber is located at a center of a horizontal section of the primary electron optical column, a primary charged particle beam optics irradiating the target object with a primary charged particle beam being disposed in the primary electron optical column; and a secondary electron optical column connected to a lower portion of the primary electron optical column, a secondary charged particle beam optics being disposed in the secondary electron optical column and a secondary charged particle beam passing through the secondary charged particle beam optics.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: October 6, 2020
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventors: Yoshihiro Izumi, Hideki Ito, Toshikatsu Akiba
  • Patent number: 10784080
    Abstract: A multiple charged particle beam writing apparatus includes a defective pattern data generation circuitry configured to generate defective pattern data of a defective pattern having a shape of the defective region in the writing region; a reverse pattern data generation circuitry configured to generate reverse pattern data by reversing the defective pattern data; a combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding a value defined in a reverse pattern pixel data and a value defined in a writing pattern pixel data; and a writing mechanism configured to perform multiple writing, using multiple charged particle beams, on the target object such that the each pixel is irradiated with a beam of a dose corresponding to a value defined in the combined-value pixel data.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: September 22, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Ryoichi Yoshikawa, Hideo Inoue
  • Patent number: 10784081
    Abstract: A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: September 22, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Munehiro Ogasawara
  • Patent number: 10770260
    Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: September 8, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yuko Otani, Yohei Minekawa, Takashi Nobuhara, Nobuhiko Kanzaki, Takehiro Hirai, Miyuki Fukuda, Yuya Isomae, Kaori Yaeshima, Yuji Takagi
  • Patent number: 10768363
    Abstract: The plasmonic infrared optical antenna includes an upper layer of a metallic material (such as gold) capable of supporting a plasmonic electromagnetic field, a thin middle layer of an infrared absorption material, and a bottom supporting layer of a thick substrate. The upper layer has a 2-dimensional periodic array of micron-sized plasmonic antenna cells defined therein. Each antenna cell has the shape of a Bundt baking pan, including a conical antenna horn having an inverted frusto-conical upper portion and a cylindrical stem or lower portion depending from the upper portion. The upper layer includes a post concentrically disposed in the cylindrical lower portion, the post having a conical upper portion extending into the horn, a cylindrical middle portion defining an annular waveguide of 50 nm clearance between the post and the stem of the conical horn, and a conical wedge base embedded in the thin layer of infrared absorption material.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: September 8, 2020
    Assignee: King Saud University
    Inventor: Ehab Awad
  • Patent number: 10770266
    Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: September 8, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Tomohito Nakano, Toshiyuki Yokosuka, Yuko Sasaki, Minoru Yamazaki, Yuzuru Mochizuki
  • Patent number: 10755891
    Abstract: Methods and systems for correcting aberrations in atom probe tomography are described. A specimen function associated with a plurality of lattice positions of ions of a specimen in a holder is generated using a transmission electron microscope. An image function associated with x- and y-coordinates and time of flight information for a plurality of ions of the specimen in the holder is generated using a delay line detector mounted on the transmission electron microscope. A transfer function based on the specimen function and the image function is generated. The transfer function comprises information relating to ion trajectory aberrations. An Atom Probe Tomography (APT) image of the specimen is generated based on the specimen function, the image function, and the transfer function. The APT image is adjusted to correct for the ion trajectory aberrations.
    Type: Grant
    Filed: April 15, 2019
    Date of Patent: August 25, 2020
    Assignee: COLORADO SCHOOL OF MINES
    Inventor: Brian P. Gorman
  • Patent number: 10740888
    Abstract: Methods and systems for providing weak pattern (or hotspot) detection and quantification are disclosed. A weak pattern detection and quantification system may include a wafer inspection tool configured to inspect a wafer and detect defects present on the wafer. The system may also include at least one processor in communication with the wafer inspection tool. The at least one processor may be configured to: perform pattern grouping on the detected defects based on design of the wafer; identify regions of interest based on the pattern grouping; identify weak patterns contained in the identified regions of interest, the weak patterns being patterns deviating from the design by an amount greater than a threshold; validate the identified weak patterns; and report the validated weak patterns or facilitate revision of the design of the wafer based on the validated weak patterns.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: August 11, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Naoshin Haque, Allen Park, Ajay Gupta
  • Patent number: 10741358
    Abstract: An electron microscope comprises: an electron microscope main body including a phase plate that imparts a phase change to an electron wave, a moving mechanism that moves the phase plate, and a detector that acquires an image formed by an electron beam transmitted through a sample; and a control unit that controls the electron microscope main body. The control unit performs a phase plate image acquisition process of acquiring a phase plate image which is an image of the phase plate; an unevenness determination process of determining whether or not the phase plate has unevenness based on the phase plate image; and a moving mechanism control process of moving the phase plate by controlling the moving mechanism when the control unit has determined that the unevenness is present.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: August 11, 2020
    Assignee: JEOL Ltd.
    Inventors: Yuko Shimizu, Hirofumi Iijima, Naoki Hosogi, Jun Yamashita
  • Patent number: 10727025
    Abstract: A system of analyzing a crystal defect includes an image processor, an image generator, and a comparator. The image processor processes a measured transmission electron microscope (TEM) image that is provided by capturing an image of a specimen having a crystal structure, to provide structural defect information of the specimen. The image generator provides a plurality of virtual TEM images corresponding to a plurality of three-dimensional structural defects of the crystal structure. The comparator compares the measured TEM image with the plurality of virtual TEM images using the structural defect information to determine a defect type of the measured TEM image.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: July 28, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung-Bo Shim, Il-Gyou Shin, Seon-Young Lee, Alexander Schmidt, Shin-Wook Yi
  • Patent number: 10714309
    Abstract: Methods and systems for generating labeled images from a microscope detector by leveraging detector data from a different microscope detector of a different modality include applying a focused charged beam to a sample, using a first microscope detector to detect emissions resultant from the focused charged beam being incident on the sample, and then using detector data from the first microscope detector to automatically generate a first labeled image. Automatically generating the first labeled image includes determining composition information about portions of the sample based on the detector data, and then automatically labeling regions of the first image associated with the portions of the sample with corresponding composition information. A second image of the sample is generated using detector data from a second microscope detector system of a different modality, and then the first labeled image is used to automatically label regions of the second image with corresponding composition information.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: July 14, 2020
    Assignee: FEI Company
    Inventor: Reinier Louis Warschauer
  • Patent number: 10712296
    Abstract: The present invention relates to a handheld material analyser comprising an air-tight chamber having an analysis aperture; an electron beam generation system adapted to direct a beam of electrons through the analysis aperture; an Energy-Dispersive X-ray (EDX) spectroscopy system having a detector located in the chamber; the chamber being adapted to operate at internal pressures between atmospheric pressure and a vacuum of the order of 1 Pa; and a gas inlet adapted to receive an inert gas for generating a plasma in the region of the photocathode. In this way, the plasma can clean the photocathode.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: July 14, 2020
    Assignee: ORION ENGINEERING LIMITED
    Inventors: Vladimir Vishnyakov, Paul Nicholas Gater
  • Patent number: 10712152
    Abstract: The purpose of the present invention is to provide an overlay error measurement device that is capable of accurately recognizing patterns and executing overlay error measurement, even when one pattern overlaps with another pattern in some areas but not in others. In order to do so, the present invention provides an overlay error measurement device provided with a calculating device for calculating overlay error. The overlay error measurement device is provided with an image designation device for designating a plurality of regions demarcated by luminance borders on an image. The calculating device recognizes, as a first pattern, a region in an image to be measured, corresponding to the plurality of regions demarcated by luminance borders, and uses the recognized first pattern to measure overlay error.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: July 14, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventor: Fumihiko Fukunaga
  • Patent number: 10672588
    Abstract: A heat map of probable defects in an image can be represented as a matrix of defect probability index corresponding to each pixel. The image may be generated from data received from a detector of a scanning electron microscope or other inspection tools. A number of pixels in the image that exceed a corresponding threshold in the matrix can be quantified.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: June 2, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Hari Pathangi, Sivaprrasath Meenakshisundaram, Tanay Bansal
  • Patent number: 10658154
    Abstract: A system for performing diffraction analysis, includes a mill for removing a surface portion of a sample, and an analyzer for performing diffraction analysis on the milled sample.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: May 19, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Marc Adam Bergendahl, James John Demarest, Christopher J. Penny, Roger Allen Quon, Christopher Joseph Waskiewicz
  • Patent number: 10636621
    Abstract: A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a diaphragm disposed in the image-capturing unit, a plurality of openings having different sizes for transmitting an electron beam from the sample being formed in the diaphragm; a movement unit for varying the position of the diaphragm; and a display unit for displaying the formed image, wherein when the operator selects, e.g., a diffraction spot (A) on the display unit, the movement unit moves the diaphragm from the positional relationship between the diaphragm and the image in accordance with the position of the diffraction spot (A).
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: April 28, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akinari Hanawa, Hideki Kikuchi, Yoshifumi Taniguchi, Toshie Yaguchi, Takashi Dobashi, Keitaro Watanabe, Hirokazu Tamaki
  • Patent number: 10607811
    Abstract: Techniques for multi-beam scanning transmission charged particle microscopy are disclosed herein. An example apparatus at least includes a charged particle beam column to produce a plurality of charged particle beams and irradiate a specimen with each of the plurality of charged particle beams, and an imaging system to collect charged particles of each of the charged particle beams of the plurality of charged particle beams that traverse the specimen during said irradiation, and to direct each charged particle beam of the plurality of the charged particle beams after traversing the sample onto a detector, where each charged particle beam includes a barycenter, and where the detector is disposed in an intermediate location between a back focal plane and an imaging plane of the imaging system.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: March 31, 2020
    Assignee: FEI Company
    Inventors: Ali Mohammadi-Gheidari, Ivan Lazić, Eric Bosch, Gerard van Veen
  • Patent number: 10607805
    Abstract: Disclosed are a filament positioning system and a filament positioning method. The filament positioning system includes a bottom plate, a first positioning regulating mechanism and a second positioning regulating mechanism, wherein the first positioning regulating mechanism is configured to conduct positioning regulation of a position of a filament seat on the bottom plate, so that filament seats of different models can be fixed to the bottom plate, and the second positioning regulating mechanism is configured to conduct positioning regulation on the filament; and a detection module configured to collect and display position information of a filament tip and the filament seat, wherein the first positioning regulating mechanism and the second positioning regulating mechanism correspondingly regulate positions of the filament seat and the filament tip according to the position information.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: March 31, 2020
    Assignee: NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY, CHINA
    Inventors: Xixue Hu, Hongbo Guo, Dongliang Wang, Yaling Gan, Xiaohui Xu
  • Patent number: 10600615
    Abstract: A microscopy system for imaging a sample can include a scanning electron microscope system configured for imaging a surface layer of the sample and a focused ion beam system configured for generating an ion beam for milling the surface layer away from a sample after it has been imaged. A movable mechanical shutter can be configured to be moved automatically into a position between the sample and the scanning electron microscope system, so that when the electron beam is not imaging the sample the movable mechanical shutter is positioned between the sample and the scanning electron microscope system.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: March 24, 2020
    Assignee: Howard Hughes Medical Institute
    Inventors: C. Shan Xu, Kenneth J. Hayworth, Harald F. Hess
  • Patent number: 10598609
    Abstract: Liquid sample imaging devices and processes are disclosed for high resolution TEM imaging and multimodal analyses of liquid sample materials in situ under high vacuum that are compatible with standard type TEM chip membranes and TEM sample holders allowing TEM liquid sample imaging to be performed wherever a TEM instrument is accessible and at a substantially reduced cost compared to prior art systems and approaches.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: March 24, 2020
    Assignee: Battelle Memorial Institute
    Inventors: Xiao-Ying Yu, Libor Kovarik, Bruce W. Arey
  • Patent number: 10600612
    Abstract: A charged particle beam apparatus includes a sample chamber; a sample stage; an electron beam column irradiating a sample S using an electron beam; and a focused ion beam column irradiating the sample S using a focused ion beam. The apparatus includes an electrode member displaceable between an insertion position between a beam emitting end portion of the electron beam column and the sample stage and a withdrawal position distant from the insertion position, the electrode member being provided with an electrode penetrating hole passing the electron beam therethrough. The apparatus includes a driving unit displacing the electrode member; a power source applying a negative voltage to the electrode member; and an insulation member electrically insulating the sample chamber the driving unit from the electrode member.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: March 24, 2020
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Toshiyuki Iwahori
  • Patent number: 10594726
    Abstract: A device for monitoring the time during an interruption period is presented, wherein a continually decaying state is observed. In addition, a vehicle-to-X-communication module having such a device is also presented.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: March 17, 2020
    Assignee: Continental Teves AG & Co. OHG
    Inventors: Michael Bruechle, Marc Menzel, Ulrich Stählin
  • Patent number: 10586676
    Abstract: An object of the present invention is to provide a charged particle beam device capable of correcting an image drift caused by stage deformation or the like during imaging immediately after stage movement. In order to achieve the above object, proposed is a charged particle beam device including: a sample chamber; a sample stage arranged in the sample chamber; a charged particle beam source which releases a charged particle beam; a deflector which deflects the charged particle beam released from the charged particle beam source; a focusing lens which focuses the charged particle beam; and a control device that controls the sample stage and the deflector, in which the control device calculates a deflection signal to be supplied to the deflector based on a thrust information when driving of the sample stage and a coefficient assigned for each position of the sample stage.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: March 10, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takanori Kato, Motohiro Takahashi, Shuichi Nakagawa, Hironori Ogawa
  • Patent number: 10578669
    Abstract: An apparatus including a chamber is provided herein. The chamber includes: a radiation source; a load board slot configured for: (i) holding a load board; and (ii) connecting the load board to an automatic testing equipment. The chamber further includes at least one movable device for positioning the load board slot relative to the radiation source or positioning the radiation source relative to the load board slot; and a controller for receiving instructions and controlling the at least one movable device according to the received instructions. The chamber, including the automatic testing equipment, is configured for constructing and operating soft errors testing by positioning the load board slot, which holds a DUT (Device Under Test), relative to the radiation source or by positioning the radiation source relative to the load board slot, and counting the number of DUT datum errors, which are the soft errors.
    Type: Grant
    Filed: January 21, 2018
    Date of Patent: March 3, 2020
    Inventor: Deny Hanan
  • Patent number: 10553782
    Abstract: A passive magnetic device (PMD) has a base electrode, a multi-port signal structure (MPSS), and a substrate therebetween. The MPSS has a central plate residing in a second plane and at least two port tabs spaced apart from one another and extending from the central plate. The substrate has a central portion that defines a mesh structure between the base electrode and the central plate of the multi-port signal structure. A plurality of magnetic pillars are provided within the mesh structure, wherein each of the plurality of the magnetic pillars are spaced apart from one another and surrounded by a corresponding portion of the mesh structure. The PMD may provide a magnetically self-biased device that may be used as a radio frequency (RF) circulator, an RF isolator, and the like.
    Type: Grant
    Filed: February 21, 2018
    Date of Patent: February 4, 2020
    Assignee: Qorvo US, Inc.
    Inventors: Andrew Arthur Ketterson, Xing Gu, Yongjie Cui, Xing Chen
  • Patent number: 10546716
    Abstract: Operating a pressure system of a device for imaging, analyzing and/or processing an object, and a particle beam device for carrying out this method. In particular, the particle beam device is an electron beam device and/or an ion beam device. The method may include disconnecting a pump from a pressure reservoir, connecting the pressure reservoir to a vacuum chamber, measuring a reservoir pressure existing in the pressure reservoir, determining a first pressure value of the reservoir pressure at a first time and a second pressure value of the reservoir pressure at a second time, determining a functional relationship between the first pressure value of the reservoir pressure and the second pressure value of the reservoir pressure, extrapolating the functional relationship for times later than the second time, determining a threshold time using the extrapolated functional relationship, and determining a remaining time period until the reservoir pressure reaches the pressure threshold.
    Type: Grant
    Filed: February 27, 2019
    Date of Patent: January 28, 2020
    Assignee: Carl Zeiss Microscopy GmbH
    Inventor: Luyang Han
  • Patent number: 10541104
    Abstract: A method and a charged particle beam system that includes charged particle beam optics and a movable stage; wherein the movable stage is configured to introduce a movement between the object and charged particle beam optics; wherein the movement is of a constant velocity and along a first direction; wherein the charged particle beam optics is configured to scan, by the charged particle beam, multiple areas of the object so that each point of the multiple areas is scanned multiple times; wherein the multiple areas partially overlap; wherein the scanning is executed by the charged particle beam optics; wherein the scanning comprises performing counter-movement deflections of the charged particle beam for at least partially compensating for the movement; and wherein each area of the multiple areas is scanned by following an area scan scheme that defines multiple scan lines that differ from each other.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: January 21, 2020
    Assignee: Applied Materials Israel Ltd.
    Inventors: Uri Lev, Alon Litman, Zvi Nir, Arnon Mizrahy
  • Patent number: 10535497
    Abstract: An electron microscope for observation by illuminating an electron beam on a specimen, includes: an edge element disposed in a diffraction plane where a direct beam not diffracted by but transmitted through the specimen converges or a plane equivalent to the diffraction plane; and a control unit for controlling the electron beam or the edge element. The edge element includes a blocking portion for blocking the electron beam, and an aperture for allowing the passage of the electron beam. The aperture is defined by an edge of the blocking portion in a manner that the edge surrounds a convergence point of the direct beam in the diffraction plane. The control unit varies contrast of an observation image by shifting, relative to the edge, the convergence point of the direct beam along the edge while maintaining a predetermined distance between the convergence point of the direct beam and the edge.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: January 14, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hirokazu Tamaki, Ken Harada, Keiji Tamura, Yoshifumi Taniguchi, Hiroto Kasai, Toshie Yaguchi, Takafumi Yotsuji
  • Patent number: 10534115
    Abstract: A modulated beam moving stage device is used in electron-beam photolithography to create an optical device. The optical device can have varying pitch to increase angular selectivity to increase light entering an eyebox of a virtual-reality and/or an augmented-reality system.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: January 14, 2020
    Assignee: Facebook Technologies, LLC
    Inventors: Giuseppe Calafiore, Matthew E Colburn
  • Patent number: 10521675
    Abstract: A system and method for legible capture of vehicle identification data includes video cameras and a computer. Recording attributes such as gain, gain shutter speed, and white balance are adjusted throughout ranges to maximize the likelihood of capturing at least one frame in which characters, such as those on the license plate, are legible. Successful capture of a legible frame may trigger storage of the data, while unsuccessful capture may trigger additional scans.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: December 31, 2019
    Assignee: Digital Ally, Inc.
    Inventors: Peng Han, Jeremy A. Dick
  • Patent number: 10515779
    Abstract: An imaging system having a scanning electron microscope capable of rapidly obtaining clear images of inspection targets at different heights is disclosed. The imaging system includes a computer having a memory storing design data including two-dimensional design information of each of layers of a three-dimensional multilayer structure constituting a surface of the specimen, the design data further including height information of each of the layers. The computer is configured to: read the two-dimensional design information and the height information from the memory; calculate a height of an image acquisition position on the specimen from the two-dimensional design information and the height information; and instruct the scanning electron microscope to focus the electron beam on the image acquisition position based on the calculated height of the image acquisition position.
    Type: Grant
    Filed: June 18, 2018
    Date of Patent: December 24, 2019
    Assignee: NGR INC.
    Inventor: Kotaro Maruyama
  • Patent number: 10504686
    Abstract: A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: December 10, 2019
    Assignee: NuFlare Technology, Inc.
    Inventors: Munehiro Ogasawara, Takanao Touya
  • Patent number: 10502943
    Abstract: An imaging system, comprising a controller configured to control the imaging system to: capture a first image of a sample, the first image being one of a bright field image, a phase difference image, and a differential interference image; and capture, based at least in part on information obtained from the first image, a second image of the sample, the second image being a different type of image than the first image.
    Type: Grant
    Filed: October 29, 2014
    Date of Patent: December 10, 2019
    Assignee: SONY CORPORATION
    Inventors: Shinji Watanabe, Kazuki Aisaka
  • Patent number: 10504693
    Abstract: A method for evaluating an object, the method may include acquiring, by a charged particle beam system, an image of an area of a reference object, wherein the area includes multiple instances of a structure of interest, and the structure of interest is of a nanometric scale; determining multiple types of attributes from the image; reducing a number of the attributes to provide reduced attribute information; generating guidelines, based on the reduced attribute information and on reference data, for evaluating the reduced attribute information; and evaluating an actual object by implementing the guidelines.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: December 10, 2019
    Assignee: Applied Materials Israel Ltd.
    Inventors: Shay Attal, Shaul Cohen, Guy Maoz, Noam Zac, Mor Baram, Lee Moldovan, Ishai Schwarzband, Ron Katzir, Kfir Ben-Zikri, Doron Girmonsky
  • Patent number: 10504684
    Abstract: A charged particle beam arrangement is described. The charged particle beam arrangement includes a charged particle source including a cold field emitter, a beam limiting aperture between the charged particle source and a magnetic condenser lens; the magnetic condenser lens comprising a first inner pole piece and a first outer pole piece, wherein a first axial distance between the charged particle source and the first inner pole piece is equal or less than approximately 20 mm, an acceleration section for accelerating the charged particle beam to an energy of 10 keV or more, a magnetic objective lens comprising a second inner pole piece and a second outer pole piece, a third axial distance between the second inner pole piece and a surface of a specimen is equal to or less than approximately 20 mm, and a deceleration section.
    Type: Grant
    Filed: July 12, 2018
    Date of Patent: December 10, 2019
    Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
    Inventor: Pavel Adamec
  • Patent number: 10481378
    Abstract: Systems and methods for controlling an imaging device are disclosed. In one aspect, a method determines a set of control parameters for the imaging device, and acquires an image based on the set of control parameters. The method determines a plurality of image quality measurements of the first image. A polygon may be displayed on an electronic display based on a plurality of image quality measurements. For example, positions of polygon vertices may be determined relative to an origin point based on corresponding image quality measurements. In some aspects, input may be received from a user interface indicating a change in position of one or more of the vertices and the corresponding image quality measurements. In some aspects, a new set of control parameters may then be determined to achieve the changed image quality measurement(s). In some aspects a composite measure of the image quality measurements may also be displayed.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: November 19, 2019
    Assignee: FEI Company
    Inventors: Pavel Poto{hacek over (c)}ek, Remco Schoenmakers
  • Patent number: 10460903
    Abstract: A scanning electron microscopy system is disclosed. The system includes a sample stage configured to secure a sample having conducting structures disposed on an insulating substrate. The system includes an electron-optical column including an electron source configured to generate a primary electron beam and a set of electron-optical elements configured to direct at least a portion of the primary electron beam onto a portion of the sample. The system includes a detector assembly configured to detect electrons emanating from the surface of the sample. The system includes a controller communicatively coupled to the detector assembly. The controller is configured to direct the electron-optical column and stage to perform, with the primary electron beam, an alternating series of image scans and flood scans of the portion of the sample, wherein each of the flood scans are performed sequential to one or more of the imaging scans.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: October 29, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Arjun Hegde, Luca Grella, Christopher Sears
  • Patent number: 10453649
    Abstract: An apparatus for inspecting a sample includes a sample holder for holding the sample; a multi beam charged particle generator for generating an array of primary charged particle beams; an electro-magnetic lens system for directing the array of primary charged particle beams into an array of separate focused primary charged particle beams on the sample; a multi-pixel photon detector arranged for detecting photons created by the focused primary charged particle beams when the primary charged particle beams impinge on the sample or after transmission of said primary charged particle beams through the sample; and an optical assembly for conveying photons created by at least two adjacent focused primary charged particle beams of the array of separate focused primary charged particle beams to distinct and/or separate pixels or to distinct and/or separate groups of pixels of the multi-pixel photon detector.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: October 22, 2019
    Assignee: TECHNISCHE UNIVERSITEIT DELFT
    Inventors: Pieter Kruit, Aernout Christiaan Zonnevylle, Yan Ren
  • Patent number: 10446360
    Abstract: A particle source for producing a particle beam includes a particle emitter, a first plate, a first deflector and a second plate with an aperture. The first plate has a smaller aperture, downstream of which a first beam is formed, and a larger aperture, downstream of which a second beam is formed. A controller sets the deflection angle of the deflector so that in a first mode of operation that particles of the first beam pass through the aperture in the second plate and form the particle beam produced by the particle source. The controller sets the deflection angle so that in a second mode of operation that particles of the second beam pass through the aperture in the second plate and form the particle beam produced by the particle source.
    Type: Grant
    Filed: May 10, 2018
    Date of Patent: October 15, 2019
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Volker Drexel, Bernd Hafner
  • Patent number: 10446359
    Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: October 15, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Hideyuki Kazumi, Yuzuru Mizuhara, Hajime Kawano