Electron Microscope Type Patents (Class 250/311)
  • Patent number: 11205558
    Abstract: A sample exchange device includes a first transport mechanism that includes a grip portion that grips a sample holding member and transports a sample holding member to a sample exchange chamber, a cooling unit that cools the sample exchange chamber, fiber sensors that detect whether or not the grip portion of the first transport mechanism grips the sample holding member in the sample exchange chamber, and a control unit. The control unit turns on the fiber sensors when the grip portion of the first transport mechanism enters the sample exchange chamber and turns off the fiber sensors after it is detected whether or not the grip portion of the first transport mechanism grips the sample holding member.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: December 21, 2021
    Assignee: JEOL Ltd.
    Inventors: Naoki Fujimoto, Kimitaka Hiyama
  • Patent number: 11201033
    Abstract: To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: December 14, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yuta Kawamoto, Akira Ikegami, Masahiro Fukuta
  • Patent number: 11170970
    Abstract: A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: November 9, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Michael Budach, Michael Schnell, Bernd Schindler, Markus Boese
  • Patent number: 11170972
    Abstract: A scanning electron microscope includes a spin detector configured to measure spin polarization of a secondary electron emitted from a sample, and an analysis device configured to analyze measurement data of the spin detector. The analysis device determines a width of a region where the secondary electron spin polarization locally changes in the measurement data. The analysis device further evaluates a strain in the sample based on the width of the region. With a configuration of the scanning electron microscope, it is possible to perform analysis of a strain in a magnetic material with high accuracy.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: November 9, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Teruo Kohashi, Hideo Morishita, Junichi Katane
  • Patent number: 11168976
    Abstract: A method for determining a height map of a sample includes the following steps: receiving height measurement data of the sample; receiving an overview image of the sample; identifying certain image regions in the overview image; deriving context information in relation to identified image regions; and supplementing or altering the height measurement data with the aid of the context information. Moreover, a measuring apparatus configured to carry out the method is described.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: November 9, 2021
    Assignee: Carl Zeiss Microscopy GMBH
    Inventors: Manuel Amthor, Daniel Haase, Dominik Stehr
  • Patent number: 11164716
    Abstract: When using a charged particle beam aperture having a ring shape in a charged particle beam device, the charged particle beam with the highest current density immediately above the optical axis, among the charged particle beams is blocked, so that it is difficult to dispose the charged particle beam aperture at the optimal mounting position. Therefore, in addition to the ring-shaped charged particle beam aperture, a hole-shaped charged particle beam aperture is provided, and it is possible to switch between the case where the ring-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam and the case where the hole-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: November 2, 2021
    Assignees: Hitachi High-Tech Corporation, Japan Fine Ceramics Center
    Inventors: Shunichi Motomura, Tsunenori Nomaguchi, Tadahiro Kawasaki, Takeharu Kato, Ryuji Yoshida
  • Patent number: 11133151
    Abstract: A transmission electron microscope includes an electron beam source emitting an electron beam and an illumination optical system for directing the emitted electron beam at a sample. The illumination optical system has a first condenser lens, a second condenser lens, a third condenser lens, a fourth condenser lens, an objective lens, and a condenser aperture disposed at the position of the second condenser lens. The third condenser lens and the fourth condenser lens cooperate to make the position of the condenser aperture and a sample plane conjugate to each other. The first condenser lens and the second condenser lens cooperate to make the electron beam source and a front focal plane of the objective lens conjugate to each other while the conjugate relationship between the position of the condenser aperture and the sample plane is maintained by the third and fourth condenser lenses.
    Type: Grant
    Filed: November 12, 2020
    Date of Patent: September 28, 2021
    Assignee: JEOL Ltd.
    Inventor: Hirofumi Iijima
  • Patent number: 11081314
    Abstract: An integrated transmission electron microscope comprising multiple electron sources for tuned beams of ultrafast, scanning probe, and parallel illumination in varied beam energies can be alternated within sub-microseconds onto a sample with dynamic ‘transient state’ processes to acquire atomic-scale structural/chemical data with site specificity. The various electron sources and condenser optics enable high-resolution imaging, high-temporal resolution imaging, and chemical imaging, using fast-switching magnets to direct the different electron beams onto a single maneuverable objective pole piece where the sample resides. Such multimodal in situ characterization tools housed in a single microscope have the potential to revolutionize materials science.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: August 3, 2021
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: Katherine L. Jungjohann, Khalid M. Hattar
  • Patent number: 11054439
    Abstract: The present invention relates to a scanning probe microscope having: (a) a scan unit embodied to scan a measuring probe over a sample surface in a step-in scan mode; and (b) a self-oscillation circuit arrangement configured to excite the measuring probe to a natural oscillation during the step-in scan mode.
    Type: Grant
    Filed: April 26, 2019
    Date of Patent: July 6, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Christof Baur
  • Patent number: 10991543
    Abstract: The present disclosure is to provide a charged particle beam device capable of achieving both high resolution by setting of a short WD and improvement of detection efficiency when setting a long WD. According to an aspect for achieving the above-described object, there is suggested a charged particle beam device including: an objective lens for converging a charged particle beam emitted from a charged particle source; a sample stage having a first driving mechanism for moving a sample to be irradiated with the charged particle beam between a first position and a second position more separated from the objective lens than the first position; a detection surface for detecting charged particles emitted from the sample; and a second driving mechanism for moving the detection surface between within a movable range of the sample between the first position and the second position and out of the movable range of the sample.
    Type: Grant
    Filed: July 12, 2019
    Date of Patent: April 27, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunsuke Mizutani, Yuuji Kasai, Minoru Yamazaki, Makoto Suzuki
  • Patent number: 10984978
    Abstract: According to one aspect of the present invention, a multiple electron beam inspection apparatus includes a reference image generation circuit generating reference images corresponding to the secondary electron images, in accordance with an image generation characteristic of a secondary electron image by irradiation of one beam; and a correction circuit generating corrected reference images in which, on the basis of deviation information between a figure pattern of the secondary electron image by irradiation of the one beam of the multiple primary electron beams and a figure pattern of a secondary electron image by irradiation of another beam different from the one beam of the multiple primary electron beams, a shape of a figure pattern of a reference image corresponding to the figure pattern of the secondary electron image by the irradiation of the another beam in the reference images is corrected.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: April 20, 2021
    Assignee: NuFlare Technology, Inc.
    Inventors: Hiromu Inoue, Ryoichi Hirano, Masataka Shiratsuchi, Riki Ogawa
  • Patent number: 10937626
    Abstract: According to one embodiment, a holder includes a top member, a side member, and a bottom member. The top member has a hole for allowing transmission of a charged particle beam, and the sample is mountable in the hole. The bottom member is provided to overlap with the top member in a plan view. The side member is connected to a part of the top member and a part of the bottom member such that the top member and the bottom member are separated from each other in a cross-sectional view. An opening portion is a region surrounded by the top member, the side member, and the bottom member, and a scintillator is provided in the opening portion.
    Type: Grant
    Filed: August 13, 2020
    Date of Patent: March 2, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventor: Kotaro Hosoya
  • Patent number: 10926366
    Abstract: A two degree-of-freedom nano positioning stage with a parallel flexure hinge mechanism includes two driving systems respectively arranged along an X axis and a Y axis, a moving stage, a parallel flexure hinge mechanism and a base frame, wherein each of the driving systems includes a piezo actuator, a connecting block, a lever, a preloading spring, a push rod and a plurality of connecting hinges; the piezo actuator is fixed on the base frame at one end and connected with the connecting block at the other end; the lever is connected between the connecting block and the preloading spring, the connecting block is connected with the lever through one of the connecting hinges; the preloading spring is fixed on the base frame at one end and connected with the lever at the other end, and the lever is connected with the base frame through another one of the connecting hinges.
    Type: Grant
    Filed: May 3, 2019
    Date of Patent: February 23, 2021
    Inventors: Ying Xu, Jing Jia, Huifeng Wang
  • Patent number: 10923315
    Abstract: A purpose of the present invention is to provide a charged particle beam apparatus that performs apparatus adjustment based on a proper evaluation of a beam. To achieve the abovementioned purpose, with the present invention, proposed is a charged particle beam apparatus comprising: an irradiation optical system including a lens for converging charged particle beams emitted from a charged particle source; and an imaging optical system for imaging the charged particles obtained by irradiating the charged particle beams toward a sample on an imaging element, wherein the charged particle beam apparatus comprises a control apparatus for controlling the lens, and the control apparatus evaluates for each lens condition the size of a specific brightness area obtained by the charged particle beam being made to reach the sample, and selects the lens condition for which the size information fulfills a designated condition.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: February 16, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Masaki Hasegawa, Tomohiko Ogata, Noriyuki Kaneoka, Hisaya Murakoshi, Katsunori Onuki
  • Patent number: 10923314
    Abstract: There is provided a method of image acquisition capable of reducing the effects of diffraction contrast. This method of image acquisition is implemented in an electron microscope for generating electron microscope images with electrons transmitted through a sample. The method starts with obtaining the plural electron microscope images while causing relative variations in the direction of incidence of an electron beam with respect to the sample. An image is generated by accumulating the plural electron microscope images.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: February 16, 2021
    Assignee: JEOL Ltd.
    Inventor: Akiho Nakamura
  • Patent number: 10903042
    Abstract: Disclosed is an apparatus and method for inspecting a sample. The apparatus includes: a sample holder, a multi beam charged particle generator for generating an array of primary charged particle beams, an electro-magnetic lens system for directing the array of primary charged particle beams into an array of separate focused primary charged particle beams on the sample, a multi-pixel photon detector arranged for detecting photons created by the focused primary charged particle beams when the primary charged particle beams impinge on the sample or after transmission of the primary charged particle beams through the sample, and an optical assembly for conveying photons created by at least two adjacent focused primary charged particle beams of the array of separate focused primary charged particle beams to distinct and/or separate pixels or groups of pixels of the multi-pixel photon detector.
    Type: Grant
    Filed: October 3, 2019
    Date of Patent: January 26, 2021
    Inventors: Pieter Kruit, Aernout Zonnevylle, Yan Ren
  • Patent number: 10886099
    Abstract: There is provided a method of aberration measurement capable of reducing the effects of image drift. The novel method of aberration measurement is for use in an electron microscope. The method comprises the steps of: acquiring a first image that is a TEM (transmission electron microscope) image of a sample; scanning the illumination angle of an electron beam impinging on the sample and acquiring a second image by multiple exposure of a plurality of TEM images generated at different illumination angles; and calculating aberrations from the first and second images.
    Type: Grant
    Filed: February 22, 2019
    Date of Patent: January 5, 2021
    Assignee: JEOL Ltd.
    Inventors: Yuji Kohno, Akiho Nakamura
  • Patent number: 10887580
    Abstract: Methods and systems for improved detection and classification of defects of interest (DOI) on semiconductor wafers based on three-dimensional images are described herein. Three dimensional imaging of volumes of thick, layered structures enables accurate defect detection and estimation of defect location in three dimensions at high throughput. A series of images are acquired at a number of different wafer depths. A three dimensional image of a thick semiconductor structure is generated from the series of images. Defects are identified and classified based on an analysis of the three dimensional image of the thick semiconductor structure. In some examples, the three-dimensional image stack is visualized by contour plots or cross-sectional plots to identify a characteristic defect response. In some examples, the three-dimensional image is processed algorithmically to identify and classify defects. In another aspect, the location of a defect is estimated in three dimensions based on the three dimensional image.
    Type: Grant
    Filed: August 22, 2017
    Date of Patent: January 5, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: Pavel Kolchin, Robert M. Danen, Philip Measor
  • Patent number: 10884379
    Abstract: Method for acquisition of at least one hologram of a sample by off-axis holography using a transmission electron microscope, the microscope comprising an electron beam source, at least one objective lens, a sample holder, at electron biprism and means of displacing the electron beam in precession mode upstream from the sample holder and a compensator of the precession downstream from the sample holder, said method comprising the activation of means of displacing the electron beam in precession mode and the compensator and acquisition of a hologram of said sample in precession mode.
    Type: Grant
    Filed: November 20, 2018
    Date of Patent: January 5, 2021
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Victor Boureau, David Cooper
  • Patent number: 10879037
    Abstract: To provide a charged particle beam device which enables observation and evaluation of the surface and the inside of a sample with low damage to the sample, the charged particle beam device has: a charged particle beam source 2; a sample table 9 in which the sample 210 is placed; a charged particle beam optical system which pulsates a charged particle beam 100 and irradiates the charged particle beam to the sample at an acceleration voltage within a range of 0 kV to 5 kV; a split distance selector 125 for selecting a measurement object of the sample; and a split distance setting unit 124 for setting a split distance in one line scanning of the charged particle beam on the sample.
    Type: Grant
    Filed: April 27, 2016
    Date of Patent: December 29, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Natsuki Tsuno, Naomasa Suzuki, Atsushi Okita, Muneyuki Fukuda
  • Patent number: 10867771
    Abstract: An electron microscope includes: an irradiation lens system that irradiates a specimen with an electron beam; an irradiation system deflector that deflects an electron beam incident on the specimen; a specimen tilting mechanism that tilts the specimen; an imaging lens system that forms an electron diffraction pattern or an electron microscope image by using an electron having passed through the specimen; an imaging device that acquires the electron diffraction pattern or the electron microscope image formed by the imaging lens system; and a controller that controls the irradiation system deflector and the specimen tilting mechanism.
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: December 15, 2020
    Assignee: JEOL Ltd.
    Inventor: Shuji Kawai
  • Patent number: 10854419
    Abstract: According to one embodiment, a contour extraction method for extracting a contour of a target object from an image obtained using an electron beam includes: extracting the contour of the target object from a backscattered electron image; creating a dictionary for associating a secondary electron image obtained from a portion common to the backscattered electron image with the contour; calculating a likelihood of the contour of the target object in a plurality of positions of a newly obtained secondary electron image by referencing the dictionary regarding the newly obtained secondary electron image; and setting a route along which a total sum of the likelihood is maximized out of the plurality of positions as the contour of the target object.
    Type: Grant
    Filed: February 27, 2019
    Date of Patent: December 1, 2020
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Chihiro Ida, Yukinobu Sakata
  • Patent number: 10855286
    Abstract: A resistive random-access memory device formed on a semiconductor substrate includes a first interlayer dielectric formed over the semiconductor substrate and includes a first via. A chemical-mechanical-polishing stop layer is formed over the interlayer dielectric. A lower metal layer formed in the first via has a top surface extending above a top surface of the chemical-mechanical-polishing stop layer. A dielectric layer is formed over the chemical-mechanical-polishing stop layer and is in electrical contact with the lower metal layer. A barrier metal layer is formed over the dielectric layer. Edges of the dielectric layer and the first barrier metal layer extend beyond outer edges of the first via. A second interlayer dielectric layer including a second via is formed over the dielectric layer. An upper metal layer formed in the second via in electrical contact with the barrier metal layer.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: December 1, 2020
    Assignee: Microsemi SoC Corp.
    Inventors: Jonathan Greene, Frank Hawley, John McCollum
  • Patent number: 10825648
    Abstract: Methods and systems for examining a dynamic specimen using a Transmission Charged Particle Microscope are disclosed. An example method includes sparsifying a beam of charged particles to produce at detector an image of a sample comprising a distribution of sub-images that are mutually isolated from one another at least along an elected scan path, and using a scanning assembly to cause relative motion of said image and said detector along said scan path during a time interval ?t so as to smear out each sub-image into a detection streak on said detector, each such streak capturing temporal evolution of its associated sub-image during said time interval ?t.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: November 3, 2020
    Assignee: FEI Company
    Inventors: Bastiaan Lambertus Martinus Hendriksen, Erik René Kieft
  • Patent number: 10825647
    Abstract: A method of using a Transmission Charged Particle Microscope, comprising: Providing a specimen on a specimen holder; Using an illumination system to direct a beam of charged particles from a source onto said specimen; Using an imaging system to direct charged particles that are transmitted through the specimen onto a detector, further comprising the following actions: In an acquisition step, lasting a time interval T, using said detector in particle counting mode to register spatiotemporal data relating to individual particle detection incidences, and to output said spatiotemporal data in raw form, without assembly into an image frame; In a subsequent rendering step, assembling a final image from said spatiotemporal data, while performing a mathematical correction operation.
    Type: Grant
    Filed: January 23, 2019
    Date of Patent: November 3, 2020
    Assignee: FEI Company
    Inventors: Bart Jozef Janssen, Lingbo Yu, Erik Michiel Franken
  • Patent number: 10796882
    Abstract: According to one aspect of the present invention, a charged particle beam writing apparatus includes correction figure data generation circuitry configured to generate pattern data of a correction figure pattern for correcting a figure portion detected, where the pattern data includes dose information to identify a dose of the correction figure pattern; correction figure pattern data conversion circuitry configured to convert the pattern data of the correction figure pattern into correction figure pattern pixel data defining a value corresponding to a dose for the each pixel, based on pixel setting common to that of the writing pattern pixel data; and combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding the value defined in the writing pattern pixel data and the value defined in the correction figure pattern pixel data.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: October 6, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Ryoichi Yoshikawa, Hideo Inoue
  • Patent number: 10796877
    Abstract: According to one aspect of the present invention, a charged particle beam image acquisition apparatus includes a rectangular parallelepiped chamber where a target object is disposed; a primary electron optical column placed on an upper surface of the chamber so that a point of intersection between two diagonal lines on the upper surface of the chamber is located at a center of a horizontal section of the primary electron optical column, a primary charged particle beam optics irradiating the target object with a primary charged particle beam being disposed in the primary electron optical column; and a secondary electron optical column connected to a lower portion of the primary electron optical column, a secondary charged particle beam optics being disposed in the secondary electron optical column and a secondary charged particle beam passing through the secondary charged particle beam optics.
    Type: Grant
    Filed: June 7, 2019
    Date of Patent: October 6, 2020
    Assignee: NUFLARE TECHNOLOGY, INC.
    Inventors: Yoshihiro Izumi, Hideki Ito, Toshikatsu Akiba
  • Patent number: 10784081
    Abstract: A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.
    Type: Grant
    Filed: April 21, 2020
    Date of Patent: September 22, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Munehiro Ogasawara
  • Patent number: 10784080
    Abstract: A multiple charged particle beam writing apparatus includes a defective pattern data generation circuitry configured to generate defective pattern data of a defective pattern having a shape of the defective region in the writing region; a reverse pattern data generation circuitry configured to generate reverse pattern data by reversing the defective pattern data; a combined-value pixel data generation circuitry configured to generate, for the each pixel, combined-value pixel data by adding a value defined in a reverse pattern pixel data and a value defined in a writing pattern pixel data; and a writing mechanism configured to perform multiple writing, using multiple charged particle beams, on the target object such that the each pixel is irradiated with a beam of a dose corresponding to a value defined in the combined-value pixel data.
    Type: Grant
    Filed: March 25, 2019
    Date of Patent: September 22, 2020
    Assignee: NuFlare Technology, Inc.
    Inventors: Ryoichi Yoshikawa, Hideo Inoue
  • Patent number: 10770266
    Abstract: A charged particle beam device includes an electron source which generates an electron beam, an objective lens which is applied with a coil current to converge the electron beam on a sample, a control unit which controls the current to be applied to the objective lens, a hysteresis characteristic storage unit which stores hysteresis characteristic information of the objective lens, a history information storage unit which stores history information related to the coil current, and an estimation unit which estimates a magnetic field generated by the objective lens on the basis of the coil current, the history information, and the hysteresis characteristic information.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: September 8, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventors: Tomohito Nakano, Toshiyuki Yokosuka, Yuko Sasaki, Minoru Yamazaki, Yuzuru Mochizuki
  • Patent number: 10768363
    Abstract: The plasmonic infrared optical antenna includes an upper layer of a metallic material (such as gold) capable of supporting a plasmonic electromagnetic field, a thin middle layer of an infrared absorption material, and a bottom supporting layer of a thick substrate. The upper layer has a 2-dimensional periodic array of micron-sized plasmonic antenna cells defined therein. Each antenna cell has the shape of a Bundt baking pan, including a conical antenna horn having an inverted frusto-conical upper portion and a cylindrical stem or lower portion depending from the upper portion. The upper layer includes a post concentrically disposed in the cylindrical lower portion, the post having a conical upper portion extending into the horn, a cylindrical middle portion defining an annular waveguide of 50 nm clearance between the post and the stem of the conical horn, and a conical wedge base embedded in the thin layer of infrared absorption material.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: September 8, 2020
    Assignee: King Saud University
    Inventor: Ehab Awad
  • Patent number: 10770260
    Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.
    Type: Grant
    Filed: January 29, 2019
    Date of Patent: September 8, 2020
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yuko Otani, Yohei Minekawa, Takashi Nobuhara, Nobuhiko Kanzaki, Takehiro Hirai, Miyuki Fukuda, Yuya Isomae, Kaori Yaeshima, Yuji Takagi
  • Patent number: 10755891
    Abstract: Methods and systems for correcting aberrations in atom probe tomography are described. A specimen function associated with a plurality of lattice positions of ions of a specimen in a holder is generated using a transmission electron microscope. An image function associated with x- and y-coordinates and time of flight information for a plurality of ions of the specimen in the holder is generated using a delay line detector mounted on the transmission electron microscope. A transfer function based on the specimen function and the image function is generated. The transfer function comprises information relating to ion trajectory aberrations. An Atom Probe Tomography (APT) image of the specimen is generated based on the specimen function, the image function, and the transfer function. The APT image is adjusted to correct for the ion trajectory aberrations.
    Type: Grant
    Filed: April 15, 2019
    Date of Patent: August 25, 2020
    Assignee: COLORADO SCHOOL OF MINES
    Inventor: Brian P. Gorman
  • Patent number: 10740888
    Abstract: Methods and systems for providing weak pattern (or hotspot) detection and quantification are disclosed. A weak pattern detection and quantification system may include a wafer inspection tool configured to inspect a wafer and detect defects present on the wafer. The system may also include at least one processor in communication with the wafer inspection tool. The at least one processor may be configured to: perform pattern grouping on the detected defects based on design of the wafer; identify regions of interest based on the pattern grouping; identify weak patterns contained in the identified regions of interest, the weak patterns being patterns deviating from the design by an amount greater than a threshold; validate the identified weak patterns; and report the validated weak patterns or facilitate revision of the design of the wafer based on the validated weak patterns.
    Type: Grant
    Filed: September 26, 2016
    Date of Patent: August 11, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Naoshin Haque, Allen Park, Ajay Gupta
  • Patent number: 10741358
    Abstract: An electron microscope comprises: an electron microscope main body including a phase plate that imparts a phase change to an electron wave, a moving mechanism that moves the phase plate, and a detector that acquires an image formed by an electron beam transmitted through a sample; and a control unit that controls the electron microscope main body. The control unit performs a phase plate image acquisition process of acquiring a phase plate image which is an image of the phase plate; an unevenness determination process of determining whether or not the phase plate has unevenness based on the phase plate image; and a moving mechanism control process of moving the phase plate by controlling the moving mechanism when the control unit has determined that the unevenness is present.
    Type: Grant
    Filed: June 27, 2019
    Date of Patent: August 11, 2020
    Assignee: JEOL Ltd.
    Inventors: Yuko Shimizu, Hirofumi Iijima, Naoki Hosogi, Jun Yamashita
  • Patent number: 10727025
    Abstract: A system of analyzing a crystal defect includes an image processor, an image generator, and a comparator. The image processor processes a measured transmission electron microscope (TEM) image that is provided by capturing an image of a specimen having a crystal structure, to provide structural defect information of the specimen. The image generator provides a plurality of virtual TEM images corresponding to a plurality of three-dimensional structural defects of the crystal structure. The comparator compares the measured TEM image with the plurality of virtual TEM images using the structural defect information to determine a defect type of the measured TEM image.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: July 28, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sung-Bo Shim, Il-Gyou Shin, Seon-Young Lee, Alexander Schmidt, Shin-Wook Yi
  • Patent number: 10712152
    Abstract: The purpose of the present invention is to provide an overlay error measurement device that is capable of accurately recognizing patterns and executing overlay error measurement, even when one pattern overlaps with another pattern in some areas but not in others. In order to do so, the present invention provides an overlay error measurement device provided with a calculating device for calculating overlay error. The overlay error measurement device is provided with an image designation device for designating a plurality of regions demarcated by luminance borders on an image. The calculating device recognizes, as a first pattern, a region in an image to be measured, corresponding to the plurality of regions demarcated by luminance borders, and uses the recognized first pattern to measure overlay error.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: July 14, 2020
    Assignee: Hitachi High-Tech Corporation
    Inventor: Fumihiko Fukunaga
  • Patent number: 10712296
    Abstract: The present invention relates to a handheld material analyser comprising an air-tight chamber having an analysis aperture; an electron beam generation system adapted to direct a beam of electrons through the analysis aperture; an Energy-Dispersive X-ray (EDX) spectroscopy system having a detector located in the chamber; the chamber being adapted to operate at internal pressures between atmospheric pressure and a vacuum of the order of 1 Pa; and a gas inlet adapted to receive an inert gas for generating a plasma in the region of the photocathode. In this way, the plasma can clean the photocathode.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: July 14, 2020
    Assignee: ORION ENGINEERING LIMITED
    Inventors: Vladimir Vishnyakov, Paul Nicholas Gater
  • Patent number: 10714309
    Abstract: Methods and systems for generating labeled images from a microscope detector by leveraging detector data from a different microscope detector of a different modality include applying a focused charged beam to a sample, using a first microscope detector to detect emissions resultant from the focused charged beam being incident on the sample, and then using detector data from the first microscope detector to automatically generate a first labeled image. Automatically generating the first labeled image includes determining composition information about portions of the sample based on the detector data, and then automatically labeling regions of the first image associated with the portions of the sample with corresponding composition information. A second image of the sample is generated using detector data from a second microscope detector system of a different modality, and then the first labeled image is used to automatically label regions of the second image with corresponding composition information.
    Type: Grant
    Filed: April 4, 2019
    Date of Patent: July 14, 2020
    Assignee: FEI Company
    Inventor: Reinier Louis Warschauer
  • Patent number: 10672588
    Abstract: A heat map of probable defects in an image can be represented as a matrix of defect probability index corresponding to each pixel. The image may be generated from data received from a detector of a scanning electron microscope or other inspection tools. A number of pixels in the image that exceed a corresponding threshold in the matrix can be quantified.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: June 2, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Hari Pathangi, Sivaprrasath Meenakshisundaram, Tanay Bansal
  • Patent number: 10658154
    Abstract: A system for performing diffraction analysis, includes a mill for removing a surface portion of a sample, and an analyzer for performing diffraction analysis on the milled sample.
    Type: Grant
    Filed: July 31, 2018
    Date of Patent: May 19, 2020
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Marc Adam Bergendahl, James John Demarest, Christopher J. Penny, Roger Allen Quon, Christopher Joseph Waskiewicz
  • Patent number: 10636621
    Abstract: A charged particle beam device wherein a transmission image corresponding to an arbitrary diffraction spot or a diffraction pattern corresponding to a partial range in the transmission image are easily and automatically captured. A charged particle beam device having: an image-capturing unit for forming an image of a sample; a diaphragm disposed in the image-capturing unit, a plurality of openings having different sizes for transmitting an electron beam from the sample being formed in the diaphragm; a movement unit for varying the position of the diaphragm; and a display unit for displaying the formed image, wherein when the operator selects, e.g., a diffraction spot (A) on the display unit, the movement unit moves the diaphragm from the positional relationship between the diaphragm and the image in accordance with the position of the diffraction spot (A).
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: April 28, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akinari Hanawa, Hideki Kikuchi, Yoshifumi Taniguchi, Toshie Yaguchi, Takashi Dobashi, Keitaro Watanabe, Hirokazu Tamaki
  • Patent number: 10607811
    Abstract: Techniques for multi-beam scanning transmission charged particle microscopy are disclosed herein. An example apparatus at least includes a charged particle beam column to produce a plurality of charged particle beams and irradiate a specimen with each of the plurality of charged particle beams, and an imaging system to collect charged particles of each of the charged particle beams of the plurality of charged particle beams that traverse the specimen during said irradiation, and to direct each charged particle beam of the plurality of the charged particle beams after traversing the sample onto a detector, where each charged particle beam includes a barycenter, and where the detector is disposed in an intermediate location between a back focal plane and an imaging plane of the imaging system.
    Type: Grant
    Filed: February 28, 2019
    Date of Patent: March 31, 2020
    Assignee: FEI Company
    Inventors: Ali Mohammadi-Gheidari, Ivan Lazić, Eric Bosch, Gerard van Veen
  • Patent number: 10607805
    Abstract: Disclosed are a filament positioning system and a filament positioning method. The filament positioning system includes a bottom plate, a first positioning regulating mechanism and a second positioning regulating mechanism, wherein the first positioning regulating mechanism is configured to conduct positioning regulation of a position of a filament seat on the bottom plate, so that filament seats of different models can be fixed to the bottom plate, and the second positioning regulating mechanism is configured to conduct positioning regulation on the filament; and a detection module configured to collect and display position information of a filament tip and the filament seat, wherein the first positioning regulating mechanism and the second positioning regulating mechanism correspondingly regulate positions of the filament seat and the filament tip according to the position information.
    Type: Grant
    Filed: December 7, 2017
    Date of Patent: March 31, 2020
    Assignee: NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY, CHINA
    Inventors: Xixue Hu, Hongbo Guo, Dongliang Wang, Yaling Gan, Xiaohui Xu
  • Patent number: 10600615
    Abstract: A microscopy system for imaging a sample can include a scanning electron microscope system configured for imaging a surface layer of the sample and a focused ion beam system configured for generating an ion beam for milling the surface layer away from a sample after it has been imaged. A movable mechanical shutter can be configured to be moved automatically into a position between the sample and the scanning electron microscope system, so that when the electron beam is not imaging the sample the movable mechanical shutter is positioned between the sample and the scanning electron microscope system.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: March 24, 2020
    Assignee: Howard Hughes Medical Institute
    Inventors: C. Shan Xu, Kenneth J. Hayworth, Harald F. Hess
  • Patent number: 10598609
    Abstract: Liquid sample imaging devices and processes are disclosed for high resolution TEM imaging and multimodal analyses of liquid sample materials in situ under high vacuum that are compatible with standard type TEM chip membranes and TEM sample holders allowing TEM liquid sample imaging to be performed wherever a TEM instrument is accessible and at a substantially reduced cost compared to prior art systems and approaches.
    Type: Grant
    Filed: April 10, 2017
    Date of Patent: March 24, 2020
    Assignee: Battelle Memorial Institute
    Inventors: Xiao-Ying Yu, Libor Kovarik, Bruce W. Arey
  • Patent number: 10600612
    Abstract: A charged particle beam apparatus includes a sample chamber; a sample stage; an electron beam column irradiating a sample S using an electron beam; and a focused ion beam column irradiating the sample S using a focused ion beam. The apparatus includes an electrode member displaceable between an insertion position between a beam emitting end portion of the electron beam column and the sample stage and a withdrawal position distant from the insertion position, the electrode member being provided with an electrode penetrating hole passing the electron beam therethrough. The apparatus includes a driving unit displacing the electrode member; a power source applying a negative voltage to the electrode member; and an insulation member electrically insulating the sample chamber the driving unit from the electrode member.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: March 24, 2020
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Toshiyuki Iwahori
  • Patent number: 10594726
    Abstract: A device for monitoring the time during an interruption period is presented, wherein a continually decaying state is observed. In addition, a vehicle-to-X-communication module having such a device is also presented.
    Type: Grant
    Filed: July 28, 2017
    Date of Patent: March 17, 2020
    Assignee: Continental Teves AG & Co. OHG
    Inventors: Michael Bruechle, Marc Menzel, Ulrich Stählin
  • Patent number: 10586676
    Abstract: An object of the present invention is to provide a charged particle beam device capable of correcting an image drift caused by stage deformation or the like during imaging immediately after stage movement. In order to achieve the above object, proposed is a charged particle beam device including: a sample chamber; a sample stage arranged in the sample chamber; a charged particle beam source which releases a charged particle beam; a deflector which deflects the charged particle beam released from the charged particle beam source; a focusing lens which focuses the charged particle beam; and a control device that controls the sample stage and the deflector, in which the control device calculates a deflection signal to be supplied to the deflector based on a thrust information when driving of the sample stage and a coefficient assigned for each position of the sample stage.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: March 10, 2020
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takanori Kato, Motohiro Takahashi, Shuichi Nakagawa, Hironori Ogawa
  • Patent number: 10578669
    Abstract: An apparatus including a chamber is provided herein. The chamber includes: a radiation source; a load board slot configured for: (i) holding a load board; and (ii) connecting the load board to an automatic testing equipment. The chamber further includes at least one movable device for positioning the load board slot relative to the radiation source or positioning the radiation source relative to the load board slot; and a controller for receiving instructions and controlling the at least one movable device according to the received instructions. The chamber, including the automatic testing equipment, is configured for constructing and operating soft errors testing by positioning the load board slot, which holds a DUT (Device Under Test), relative to the radiation source or by positioning the radiation source relative to the load board slot, and counting the number of DUT datum errors, which are the soft errors.
    Type: Grant
    Filed: January 21, 2018
    Date of Patent: March 3, 2020
    Inventor: Deny Hanan