Electron Microscope Type Patents (Class 250/311)
  • Patent number: 10319556
    Abstract: An ElectroMagnetic-Mechanical Pulser (“EMMP”) generates electron pulses at a continuously tunable rate between 100 MHz and 20-50 GHz, with energies up to 0.5 MeV, duty cycles up to 20%, and pulse widths between 100 fs and 10 ps. A dielectric-filled Traveling Wave Transmission Stripline (“TWTS”) that is terminated by an impedance-matching load such as a 50 ohm load imposes a transverse modulation on a continuous electron beam. The dielectric is configured such that the phase velocity of RF propagated through the TWTS matches a desired electron energy, which can be between 100 and 500 keV, thereby transferring electromagnetic energy to the electrons. The beam is then chopped into pulses by an adjustable aperture. Pulse dispersion arising from the modulation is minimized by a suppressing section that includes a mirror demodulating TWTS, so that the spatial and temporal coherence of the pulses is substantially identical to the input beam.
    Type: Grant
    Filed: December 2, 2016
    Date of Patent: June 11, 2019
    Assignee: Euclid Techlabs, LLC
    Inventors: Chunguang Jing, Jiaqi Qiu, Sergey V Baryshev, June W Lau, Yimei Zhu
  • Patent number: 10309878
    Abstract: The present invention provides a packaging unit for liquid sample loading devices applied in an electron microscope. The liquid sample loading devices may be easily, rapidly, precisely and stably aligned and packaged by an engagement of an upper jig and a bottom jig as well as a first fixing pillar supported in a slide track of the packaging unit. Accordingly, efficiency and a yield of packaging the liquid sample loading devices may be improved. In addition, the packaging unit for the liquid sample loading devices of the present invention may directly package a liquid sample, and thus the liquid sample may maintain its original state.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: June 4, 2019
    Assignee: NATIONAL CHENG KUNG UNIVERSITY
    Inventor: Shih-Wen Tseng
  • Patent number: 10304658
    Abstract: Beam-induced etching uses a work piece maintained at a temperature near the boiling point of a precursor material, but the temperature is sufficiently high to desorb reaction byproducts. In one embodiment, NF3 is used as a precursor gas for electron-beam induced etching of silicon at a temperature below room temperature.
    Type: Grant
    Filed: July 17, 2015
    Date of Patent: May 28, 2019
    Assignee: FEI Company
    Inventors: Aiden Martin, Milos Toth
  • Patent number: 10276345
    Abstract: A phase shifting device for a charged particle imaging system includes means for passing an electric current in a direction that has a nonzero component parallel to at least one section of the imaging beam. Preferably, the electric current is passed parallel along the section of the imaging beam. The amount of phase shift then centrosymmetrically depends on the distance between the electric current axis and the imaging beam axis. The magnetic field produced by the electric current exhibits the same effect on the phase of the beam as a localized charge according to the prior art.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: April 30, 2019
    Assignee: Forschunszentrum Juelich GmbH
    Inventors: Amir Hossein Tavabi, Aleksei Savenko, Giulio Pozzi, Rafal Edward Dunin-Borkowski, Vadim Migunov
  • Patent number: 10276347
    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: April 30, 2019
    Assignee: HERMES MICROVISION INC.
    Inventors: Weiming Ren, Shuai Li, Xuedong Liu, Zhongwei Chen
  • Patent number: 10267893
    Abstract: Systems and method of accuracy mapping in a location tracking system are provided. Methods include identifying a position of at least one location anchor on a site rendering, determining, for a plurality of positions on the site rendering, an estimated error value of location accuracy as a function of position on the site rendering, generating an overlay rendering of the estimated error values of location accuracy for the plurality of position on the site rendering, and the site rendering with the overlay rendering therewith.
    Type: Grant
    Filed: February 22, 2017
    Date of Patent: April 23, 2019
    Assignee: Honeywell International Inc.
    Inventors: Patrick Gonia, Soumitri Kolavennu
  • Patent number: 10229811
    Abstract: With conventional optical axis adjustment, a charged particle beam will not be perpendicularly incident to a sample, affecting the measurements of a pattern being observed. Highly precise measurement and correction of a microscopic inclination angle are difficult. Therefore, in the present invention, in a state where a charged particle beam is irradiated toward a sample, a correction of the inclination of the charged particle beam toward the sample is performed on the basis of secondary electron scanning image information from a reflector plate. From the secondary electron scanning image information, a deviation vector for charged particle beam deflectors is adjusted, causing the charged particle beam to be perpendicularly incident to the sample. At least two stages of charged particle beam deflectors are provided.
    Type: Grant
    Filed: October 2, 2014
    Date of Patent: March 12, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuzuru Mizuhara, Hideyuki Kazumi
  • Patent number: 10224173
    Abstract: There is provided an objective lens capable of reducing the effects of magnetic fields on a sample. The objective lens includes a first lens and a second lens. The lenses are arranged so that the component of the magnetic field of the first lens lying along the optical axis and the component of the magnetic field of the second lens lying along the optical axis cancel out each other at a sample placement surface. The first and second lenses each include an inner polepiece and an outer polepiece. The inner polepieces have front end portions, respectively. The outer polepieces have front end portions, respectively, which jut out toward the optical axis. The distances of the front end portions of the outer polepieces, respectively, from the sample placement surface are less than the distances of the front end portions of the inner polepieces, respectively, from the sample placement surface.
    Type: Grant
    Filed: September 20, 2017
    Date of Patent: March 5, 2019
    Assignee: JEOL Ltd.
    Inventors: Tatsuo Naruse, Yuji Kohno
  • Patent number: 10207296
    Abstract: A material sorting system sorts materials, such as scrap pieces composed of unknown metal alloys, as a function of their detected x-ray fluorescence. The x-ray fluorescence may be converted into an elemental composition signature that is then compared to an elemental composition signature of a reference material in order to identify and/or classify each of the materials, which are then sorted into separate groups based on such an identification/classification. The material sorting system may include an in-line x-ray tube having a plurality of separate x-ray sources, each of which can irradiate a separate stream of materials to be sorted.
    Type: Grant
    Filed: July 18, 2016
    Date of Patent: February 19, 2019
    Assignee: UHV Technologies, Inc.
    Inventors: Manuel Gerardo Garcia, Nalin Kumar, Subodh Das
  • Patent number: 10204761
    Abstract: Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample; a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector that detects secondary electrons emitted from the sample; transmitted electron detectors that detect transmitted electrons that have transmitted through the sample; and a control device that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means for cooling the sample.
    Type: Grant
    Filed: October 9, 2014
    Date of Patent: February 12, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Takeshi Sunaoshi, Yasuhira Nagakubo, Kazutaka Nimura
  • Patent number: 10204760
    Abstract: There is provided a charged particle beam apparatus which can quickly perform high accuracy positioning and defect detection. A process of acquiring a low magnification defect image for one defect candidate and a process of specifying a region appearing as a defect are performed by repeatedly performing a defect detection process maximum n-times and by using an integrated frame image of the low magnification defect image having at least one frame or the maximum n-number of frames for one defect candidate. As the low magnification defect image used in order to generate a difference image with a low magnification reference image for one defect candidate, the integrated frame image is used which is obtained by adding the frames of the low magnification defect image having at least one frame or the maximum n-number of frames.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: February 12, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventor: Tatsuichi Katou
  • Patent number: 10157727
    Abstract: A method of operating a charged particle microscope comprising the following steps: Providing a specimen on a specimen holder; Using a source to produce a beam of charged particles; Passing said beam through an illuminator comprising: A source lens, with an associated particle-optical axis; A condenser aperture, which is disposed between the source lens and specimen and is configured to define a footprint of said beam upon the specimen; Irradiating the specimen with the beam emerging from said illuminator; Using a detector to detect radiation emanating from the specimen in response to said irradiation, and producing an associated image, specifically comprising the following steps: Choosing a set of emission angles from said source; For each emission angle in said set, selecting a corresponding sub-beam that emits from the source at that emission angle, and storing a test image formed by that sub-beam, thereby compiling a set of test images corresponding to said set of emission angles; Analyzing said set
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: December 18, 2018
    Assignee: FEI Company
    Inventors: Alexander Henstra, Peter Christiaan Tiemeijer
  • Patent number: 10151706
    Abstract: Methods and systems for detecting defects on a specimen are provided. One method includes identifying first and second portions of dies on a specimen as edge dies and center dies, respectively. The method also includes determining first and second inspection methods for the first and second portions, respectively. Parameter(s) of comparisons performed in the first and second inspection methods are different. The method further includes detecting defects in at least one of the edge dies using the first inspection method and detecting defects in at least one of the center dies using the second inspection method.
    Type: Grant
    Filed: April 6, 2017
    Date of Patent: December 11, 2018
    Assignee: KLA-Tencor Corp.
    Inventors: Santosh Bhattacharyya, Hucheng Lee, Bjorn Brauer
  • Patent number: 10132761
    Abstract: A method capable of constructing an accurate three-dimensional image is offered. The method comprises the step (S10) of obtaining a first series of tilted images which are constituted by electron microscope images or elemental mapping images of a sample (S) at different tilt angles and which have been obtained by tilting the sample in angular increments, the step (S14) of obtaining a second series of tilted images which are constituted by electron microscope images or elemental mapping images of the sample at different tilt angles and which have been obtained by rotating the sample about an axis (P) perpendicular to a surface (Sf) of the sample and then tilting the sample in angular increments, and the step (S16) of constructing the three-dimensional image on the basis of the first and second series of tilted images.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: November 20, 2018
    Assignee: JEOL Ltd.
    Inventor: Yoshitaka Aoyama
  • Patent number: 10109455
    Abstract: A system for performing diffraction analysis, includes a focused ion beam (FIB) device for preparing a sample, a mill for removing a surface portion of the prepared sample, and an analyzer for performing diffraction analysis on the milled sample.
    Type: Grant
    Filed: February 28, 2018
    Date of Patent: October 23, 2018
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Marc Adam Bergendahl, James John Demarest, Christopher J. Penny, Roger Allen Quon, Christopher Joseph Waskiewicz
  • Patent number: 10088415
    Abstract: A probe includes a transmission line support substrate, a probe tip and a probe tip support substrate. The transmission line support substrate supports a transmission line through which a terahertz wave is transmitted. The probe tip transmits the terahertz wave, and is contact with an object to be measured. The probe tip support substrate supports the probe tip. The probe tip support substrate is detachable from the transmission line support substrate.
    Type: Grant
    Filed: August 9, 2016
    Date of Patent: October 2, 2018
    Assignee: ADVANTEST CORPORATION
    Inventor: Tsuyoshi Ataka
  • Patent number: 10056226
    Abstract: There is proposed a column supporting structure that includes a viscoelastic sheet, a supporting plate which holds the viscoelastic sheet, and a fixation portion which connects the supporting plate to each lens barrel. The viscoelastic sheet is disposed to extend in a plane perpendicular to one lens barrel or the other lens barrel.
    Type: Grant
    Filed: February 23, 2017
    Date of Patent: August 21, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Motohiro Takahashi, Yoshimasa Fukushima, Katsunori Onuki, Tetsuya Niibori
  • Patent number: 10037866
    Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: July 31, 2018
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Momoyo Enyama, Muneyuki Fukuda, Hideyuki Kazumi, Koichi Hamada, Sayaka Tanimoto
  • Patent number: 10032599
    Abstract: A method of investigating a specimen using charged particle microscopy, comprising the following steps: Using a primary source to produce a pulsed beam of charged particles that propagate along a beam path; Providing a specimen at an irradiation position in said beam path; Using a secondary source to produce repetitive excitations of the specimen; Using a detector to register charged particles in said beam that traverse the specimen after each said excitation, wherein: Said primary source is configured to produce a train of multiple pulses per excitation by said secondary source; Said detector is configured to comprise an integrated array of pixels, each with an individual readout circuit, to register a time-of-arrival of individual particles in said train.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: July 24, 2018
    Assignee: FEI Cmnpany
    Inventor: Erik René Kieft
  • Patent number: 10018504
    Abstract: A method of normalizing FPA system gain for varying temperature includes determining an FPA temperature and calculating an FPA system gain as a function of the FPA temperature, system gain for the FPA at a reference temperature, and empirically derived coefficients. The method also includes applying the FPA system gain at the FPA temperature to condition output of the FPA to produce temperature independent image data. An imaging system includes a focal plane array (FPA). A temperature sensor is operatively connected to measure temperature of the FPA. A module is operatively connected to the FPA and temperature sensor to calculate FPA system gain for the FPA as described above, and to apply the FPA system gain to condition output of the FPA to produce temperature independent image data. There need be no temperature control device, such as a thermoelectric cooling device, connected for temperature control of the FPA.
    Type: Grant
    Filed: November 12, 2015
    Date of Patent: July 10, 2018
    Assignee: Sensors Unlimited, Inc.
    Inventor: Jonathan Nazemi
  • Patent number: 10014153
    Abstract: There is provided an electron microscope capable of measuring aberration with high accuracy. The electron microscope (100) comprises: an electron beam source (10) for producing an electron beam (EB); an illumination lens system (101) for focusing the electron beam (EB) onto a sample (S); a scanner (12) for scanning the focused electron beam (EB) over the sample (S); an aperture stop (30) having a plurality of detection angle-limiting holes (32) for extracting rays of the electron beam (EB) having mutually different detection angles from the electron beam (EB) transmitted through the sample (S); and a detector (20) for detecting the rays of the electron beam (EB) passed through the aperture stop (30).
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: July 3, 2018
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 10014159
    Abstract: There is provided a detector apparatus capable of detecting the position or tilt angle of a sample stage with high resolution and high reliability. The detector apparatus (100) is operative to detect the position or tilt angle of the sample stage (2), and has a potentiometer (10) for detecting the position or tilt angle of the sample stage (2), an encoder (20) for detecting the position or tilt angle of the sample stage (2), and a computing unit (30) for calculating the position or tilt angle of the sample stage (2), based both on an output signal from the potentiometer (10) and on an output signal from the encoder (20).
    Type: Grant
    Filed: October 21, 2016
    Date of Patent: July 3, 2018
    Assignee: JEOL Ltd.
    Inventor: Takaki Ishikawa
  • Patent number: 10002742
    Abstract: The invention relates to a scanning-type charged particle microscope and a method for operation of such a microscope. Disclosed is a novel scanning strategy to the raster scan or serpentine scan. In some embodiment, the beam scanning motion is separated into short-stroke and long-stroke movements, to be assigned to associate short-stroke and long-stroke scanning devices, which may be beam deflectors or stage actuators. The scan strategy which is less susceptible to effects such as overshoot, settling/resynchronization, and “backlash” effects.
    Type: Grant
    Filed: October 28, 2015
    Date of Patent: June 19, 2018
    Assignee: FEI Company
    Inventors: Pavel Potocek, Cornelis Sander Kooijman, Hendrik Jan de Vos, Hendrik Nicolaas Slingerland
  • Patent number: 9997327
    Abstract: There is provided a liner tube capable of reducing the effects of magnetic field variations on an electron beam. The liner tube (10) is disposed inside the electron optical column (2) of an electron microscope (100). The interior of the tube (10) forms a path for the electron beam (EB). The liner tube (10) has a first cylindrical member (110) that is made of copper, gold, silver, or an alloy consisting principally of one of these metals.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: June 12, 2018
    Assignee: JEOL Ltd.
    Inventors: Hidetaka Sawada, Yu Jimbo, Masashi Shimizu
  • Patent number: 9997331
    Abstract: A charged-particle beam microscope includes a charged-particle beam source to generate a charged-particle beam. A stage is provided to hold a sample in the path of the charged-particle beam. Beam optics are provided to illuminate the sample with the charged-particle beam. One or more detectors are provided to detect radiation emanating from the sample as a result of the illumination. A controller may control one or more of the beam optics, stage, and detectors to generate an image of the sample based on the detected radiation.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: June 12, 2018
    Assignee: Mochii, Inc.
    Inventors: Christopher Su-Yan Own, Matthew Francis Murfitt
  • Patent number: 9991087
    Abstract: An imaging system for directing a flux of charged particles transmitted through a specimen onto a spectroscopic apparatus, wherein the flux is dispersed by a dispersing device into an energy-resolved array of spectral sub-beams propagating substantially parallel to a propagation axis. An adjustable aperture device defines an aperture in a path of the array so as to select a subset of the array to be admitted to a detector, which aperture is delimited in a dispersion direction perpendicular to the propagation axis to allow independent adjustment of both of: a width of the aperture parallel to the dispersion direction; and a position of a center of the aperture relative to the propagation axis.
    Type: Grant
    Filed: September 21, 2015
    Date of Patent: June 5, 2018
    Assignee: FEI Company
    Inventors: Erwin Fernand de Jong, Sorin Lazar, Peter Christiaan Tiemeijer, Rudolf Geurink
  • Patent number: 9981293
    Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged par
    Type: Grant
    Filed: April 21, 2016
    Date of Patent: May 29, 2018
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marc Smits, Johan Joost Koning, Chris Franciscus Jessica Lodewijk, Hindrik Willem Mook, Ludovic Lattard
  • Patent number: 9984852
    Abstract: An apparatus for performing charged particle spectroscopy, comprising: A source, for producing a pulsed beam of charged particles that propagate along a beam path; A specimen holder, for holding a specimen at an irradiation position in said beam path; A detector arrangement, for performing energy-differentiated detection of charged particles that traverse said specimen, wherein, between said source and said detector arrangement, said beam path successively traverses: An energizing cavity, for applying a time-dependent accelerating field to said beam; A primary drift space; Said irradiation position; A temporal focusing cavity, for converting an energy differential in said beam into a time-of-flight differential; A secondary drift space.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: May 29, 2018
    Assignee: FEI Company
    Inventors: Otger Jan Luiten, Petrus Henricus Antonius Mutsaers, Jasper Frans Mathijs van Rens, Wouter Verhoeven, Erik René Kieft
  • Patent number: 9984849
    Abstract: The invention relates to an electron beam splitter (1) comprising a multi-pole electrode arrangement with a high-frequency alternating current voltage (5), which extends along a specified path (6) from an inlet side (9) to an outlet side (10), wherein the electrode arrangement (5) generates on the inlet side (9) with a first number of electrodes (7) impacted by the voltage a first oscillating electric field (61), which forms on a transversal plane a single local confinement minimum (62) in a time-averaged manner, and wherein the electrode arrangement (5) generates at least on the outlet side (10) with a second number of voltage-impacted electrodes (7) a second oscillating electric field (65), which forms at least two local confinement minimums (66, 67) in a time averaged manner.
    Type: Grant
    Filed: June 30, 2014
    Date of Patent: May 29, 2018
    Assignee: Friedrich-Alexander-Universität Erlangen-Nürnberg
    Inventors: Jakob Hammer, Peter Hommelhoff
  • Patent number: 9947118
    Abstract: Techniques described herein are generally related to non-interferometric phase measurements of an optical signal. The various described techniques may be applied to methods, systems, devices or combinations thereof. Some methods for determining phase data of the optical signal may include transmitting the optical signal through a first optical element and obtaining first intensity data at a first focal plane of the first optical element by an optical sensor. Example methods may also include transmitting the optical signal through a second optical element. The second optical element may include a phase transformation mask. Example methods may further include obtaining a second intensity data at a second focal plane of the second optical element by the optical sensor and determining the phase data for the optical signal based on the first intensity data and the second intensity data.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: April 17, 2018
    Assignee: INDIAN INSTITUTE OF TECHNOLOGY DELHI
    Inventors: Kedar Bhalchandra Khare, Manoj Kumar Sharma, Paramasivam Senthilkumaran
  • Patent number: 9934939
    Abstract: A method of measuring an overlay offset using a scanning electron microscope system includes: scanning an in-cell region, which includes a lower structure and an upper structure stacked in a sample, using a primary electron beam with a landing energy of at least 10 kV; detecting electrons emitted from the scanned in-cell region; and measuring an overlay offset with respect to overlapping patterns included in the in-cell region using an image of the in-cell region that is generated based on the detected electrons emitted from the scanned in-cell region.
    Type: Grant
    Filed: August 20, 2014
    Date of Patent: April 3, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Min Kook Kim, Woo Seok Ko, Yu Sin Yang, Sang Kil Lee, Chung Sam Jun
  • Patent number: 9892812
    Abstract: Methods, systems, and devices of Fourier ptychographic X-ray imaging by capturing a plurality of variably-illuminated, low-resolution intensity X-ray images of a specimen and computationally reconstructing a high-resolution X-ray image of the specimen by iteratively updating overlapping regions in Fourier space with the variably-illuminated, low-resolution intensity X-ray images.
    Type: Grant
    Filed: October 28, 2013
    Date of Patent: February 13, 2018
    Assignee: California Institute of Technology
    Inventors: Guoan Zheng, Changhuei Yang, Roarke Horstmeyer
  • Patent number: 9869650
    Abstract: A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a stage to mount the substrate thereon and to be movable, a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams, and a drive mechanism to move the detector in order to follow movement of the stage.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: January 16, 2018
    Assignee: NuFlare Technology, Inc.
    Inventor: Nobutaka Kikuiri
  • Patent number: 9870518
    Abstract: Provided is a data processing system providing various user interfaces to users by analyzing and processing data collected via various routes, by using a parallel and distributive manner based on the assumption that generation, analysis, storage, and consumption of data is performed at various locations.
    Type: Grant
    Filed: March 25, 2014
    Date of Patent: January 16, 2018
    Assignee: Hanwha Techwin Co., Ltd.
    Inventors: Dong Jun Park, Hak Chul Shin, Yeon Geol Ryu
  • Patent number: 9862997
    Abstract: Various methods, systems and devices for optical detection and analysis of polymers, such as polynucleotides, using nanopores, e.g., for determining sequences of nucleic acids, are provided herein. In certain variations, methods and systems for determining a nucleotide sequence of a polynucleotide, which include measuring mixed FRET signals as a polynucleotide translocates through a nanopore and determining a nucleotide sequence of the polynucleotide from the mixed FRET signals, are provided.
    Type: Grant
    Filed: May 23, 2014
    Date of Patent: January 9, 2018
    Assignee: Quantapore, Inc.
    Inventors: Martin Huber, Bason E. Clancy, Paul Hardenbol
  • Patent number: 9859097
    Abstract: A permanently sealed vacuum tube is used to provide the electrons for an electron microscope. This advantageously allows use of low vacuum at the sample, which greatly simplifies the overall design of the system. There are two main variations. In the first variation, imaging is provided by mechanically scanning the sample. In the second variation, imaging is provided by point projection. In both cases, the electron beam is fixed and does not need to be scanned during operation of the microscope. This also greatly simplifies the overall system.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: January 2, 2018
    Assignees: The Board of Trustees of the Leland Stanford Junior University, The University of British Columbia
    Inventors: R. Fabian W. Pease, Manu Prakash, James Stanley Cybulski, Alireza Nojeh
  • Patent number: 9859096
    Abstract: An inspection apparatus according to an embodiment includes an irradiation part configured to irradiate an inspection target substrate with multiple beams including energy beams, a detector, on which a plurality of charged particle beams of charged particles released from the inspection target substrate are imaged, configured to detect each of the charged particle beams as an electrical signal, and a comparing unit configured to compare reference image data and image data that is reproduced based on the detected electrical signals and that represents patterns formed on the inspection target substrate to inspect the patterns. The detector includes a plurality of detecting elements corresponding one-to-one to the charged particle beams. The detecting elements each have a size greater than a size that covers a beam blur of each charged particle beam imaged on the detector.
    Type: Grant
    Filed: November 22, 2016
    Date of Patent: January 2, 2018
    Assignee: NuFlare Technology, Inc.
    Inventor: Munehiro Ogasawara
  • Patent number: 9851329
    Abstract: Substrates forming an overlapping portion of an analytical cell have through holes each having a shape tapered from an outer surface of the substrate facing to outside of the overlapping portion toward an inner surface thereof facing to inside thereof. An observation window is formed between the through holes facing each other. In the overlapping portion, at least one of negative and positive electrode active materials is provided between transmission membranes of the observation window, and at least one pillar is provided between first and second positions. At the first position, edge portions of the through holes of the outer surfaces are face-to-face with each other. At the second position, edge portions of the through holes of the inner surfaces are face-to-face with each other. At least one spacer is further provided at a position shifted from the first position toward a circumferential edge of the overlapping portion.
    Type: Grant
    Filed: August 24, 2016
    Date of Patent: December 26, 2017
    Assignee: Honda Motor Co., Ltd.
    Inventors: Takanori Maebashi, Yoshiya Fujiwara, Mitsumoto Kawai, Nariaki Kuriyama
  • Patent number: 9837245
    Abstract: Disclosed herein is a micro stage using a piezoelectric element that can be reliably operated even in a vacuum environment. In a particle column requiring a high precision, for example, a microelectronic column, the micro stage can be used as a stage with micro or nano degree precision for alignment of parts of the column, or for moving a sample, and so on.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: December 5, 2017
    Assignee: CEBT CO., LTD.
    Inventors: Ho Seob Kim, Byeng Jin Kim, Do Jin Seong
  • Patent number: 9818578
    Abstract: An apparatus and a method for measuring and monitoring the properties of a fluid, for example, pressure, temperature, and chemical properties, within a sample holder for an electron microscope. The apparatus includes at least one fiber optic sensor used for measuring temperature and/or pressure and/or pH positioned in proximity of the sample.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: November 14, 2017
    Assignee: Protochips, Inc.
    Inventors: Daniel Stephen Gardiner, William Bradford Carpenter, John Damiano, Jr., Franklin Stampley Walden, II, David P. Nackashi
  • Patent number: 9810648
    Abstract: An X-ray fluorescence analyzer includes: a sample stage; an X-ray source; a detector; an X stage; a Y stage; a ? stage; and a shielding container, wherein the irradiation position with primary X-rays is set at an offset position from a movement center of the X stage and the Y stage, wherein an irradiation area that is irradiatable with the primary X-rays is set to a selected segmented area from among segmented areas that are defined by segmenting the surface of the sample into four parts with a virtual segment lines in the X direction and the Y direction passing through the movement center, and wherein the ? stage is configured to switch the selected segmented area into any one of the segmented areas by rotating the sample stage by every 90 degrees.
    Type: Grant
    Filed: November 21, 2015
    Date of Patent: November 7, 2017
    Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
    Inventor: Toshiyuki Takahara
  • Patent number: 9792832
    Abstract: An image display device displays operation items of an electron microscope on an operation screen, and a storage device stores information of assist buttons which display image state information acquired via a detector of the electron microscope. The information of the assist buttons corresponds to image quality of an acquired image via the detector as well as to observation conditions composed of a combination of parameter setting values of the electron microscope, an operation program which analyzes the image quality of the acquired image. The information of the assist buttons is acquired based on analytical results of the image quality as well as current observation conditions, and the assist buttons are displayed on a predetermined part of the operation screen. Accordingly, the skills of a novice user operating a charged particle beam apparatus can be improved.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: October 17, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yayoi Konishi, Hiroyuki Noda, Takahiro Inada, Kunji Shigeto, Tohru Ando, Noriko Iizumi, Ryuichiro Tamochi, Mitsugu Sato
  • Patent number: 9779911
    Abstract: An electron microscope capable of measuring aberrations accurately is provided. The microscope is adapted to obtain scanning transmission electron (STEM) images by detecting electrons transmitted through a sample (S). The microscope (100) includes a segmented detector (20) having a detection surface (23) for detecting the electrons transmitted through the sample (S). The detection surface (23) is divided into detector segments (D1-D16) for detecting the electrons transmitted through the sample (S). The microscope (100) further includes an aperture plate (30) for limiting the active areas of the detector segments (D1-D16) on which the electrons impinge.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: October 3, 2017
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 9779493
    Abstract: A method of setting an address point (AP) of a measuring apparatus includes generating an original image using design data, generating a first simplified image by extending sizes of patterns in the original image, searching for at least one vertex in the first simplified image, and setting a predetermined region including the at least one vertex as the AP upon locating the at least one vertex.
    Type: Grant
    Filed: March 14, 2016
    Date of Patent: October 3, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventor: Hyungjoon Cho
  • Patent number: 9761409
    Abstract: The present invention relates to modulating an irradiation condition of a charged particle beam at high speed and detecting a signal in synchronization with a modulation period for the purpose of extracting a signal arising from a certain charged particle beam when a sample is irradiated with a plurality of charged particle beams simultaneously or, for example, for the purpose of separating a secondary electron signal arising from ion beam irradiation and a secondary electron signal arising from electron beam irradiation in an FIB-SEM system. The present invention further relates to dispersing light emitted from two or more kinds of scintillators having different light emitting properties, detecting each signal strength, and processing a signal on the basis of a ratio of first signal strength when the sample is irradiated with a first charged particle beam alone to second signal strength when the sample is irradiated with a second charged particle beam alone, the ratio being set by a mechanism.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: September 12, 2017
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Tsunenori Nomaguchi, Toshihide Agemura
  • Patent number: 9761408
    Abstract: A method for automatically imaging in an electron microscope (SEM, TEM or STEM) features in a region of interest in a lamella without prior knowledge of the features to be imaged, thereby enabling multiple electron microscope images to be obtained by stepping from the first image location without requiring the use of image recognition of individual image features. By eliminating the need for image recognition, substantial increases in image acquisition rates may be obtained.
    Type: Grant
    Filed: February 24, 2015
    Date of Patent: September 12, 2017
    Assignee: FEI Company
    Inventors: Paul Plachinda, Liang Zhang, Justin Roller
  • Patent number: 9728374
    Abstract: An inspection apparatus includes beam generation means, a primary optical system, a secondary optical system and an image processing system. Irradiation energy of the beam is set in an energy region where mirror electrons are emitted from the inspection object as the secondary charged particles due to the beam irradiation. The secondary optical system includes a camera for detecting the secondary charged particles, a numerical aperture whose position is adjustable along an optical axis direction and a lens that forms an image of the secondary charged particles that have passed through the numerical aperture on an image surface of the camera. In the image processing system, the image is formed under an aperture imaging condition where the position of the numerical aperture is located on an object surface to acquire an image.
    Type: Grant
    Filed: May 5, 2016
    Date of Patent: August 8, 2017
    Assignee: EBARA CORPORATION
    Inventors: Takehide Hayashi, Masahiro Hatakeyama, Shinji Yamaguchi, Masato Naka
  • Patent number: 9728372
    Abstract: A measurement method capable of easily measuring the directions of detector segments of a segmented detector relative to a scanning transmission electron microscope (STEM) image is provided. The measurement method is for use in an electron microscope equipped with the segmented detector having a detection surface divided into the detector segments. The measurement method is used to measure the directions of the detector segments relative to the STEM image. The method involves defocusing the STEM image to thereby cause a deviation of the STEM image and measuring the directions of the detector segments relative to the STEM image from the direction of the deviation of the STEM image (step S11).
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: August 8, 2017
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 9711323
    Abstract: The method is for automatic astigmatism correction of a lens system. A first image is provided that is not in focus at a first stigmator setting of a set of lenses. A calculating device calculates a corresponding first Fourier spectrum image. A distribution and direction of pixels of the Fourier spectrum image are determined by calculating a first vector and a second vector. The first vector is compared with the second vector. The lens system is changed from a first stigmator setting to a second stigmator setting to provide a second image. A corresponding Fourier spectrum image is calculated. The distribution and direction of pixels of the second Fourier spectrum image is determined by calculating a third vector and a fourth vector. The third vector is compared to the fourth vector. The image that has the lowest vector ratio is selected.
    Type: Grant
    Filed: June 17, 2015
    Date of Patent: July 18, 2017
    Assignee: Intelligent Virus Imaging Inc.
    Inventors: Ida-Maria Sintorn, Rickard Nordstrom Nordstrom, Gustaf Kylberg
  • Patent number: RE47287
    Abstract: Charged particle beamlet lithography system for transferring a pattern to a surface of a target comprising a sensor for determining one or more characteristics of one or more charged particle beamlets. The sensor comprises a converter element for receiving charged particles and generating photons in response. The converter element comprises a surface for receiving one or more charged particle beamlets, the surface being provided with one or more cells for evaluating one or more individual beamlets. Each cell comprises a predetermined blocking pattern of one or more charged particle blocking structures forming multiple knife edges at transitions between blocking and non-blocking regions along a predetermined beamlet scan trajectory over the converter element surface. The converter element surface is covered with a coating layer substantially permeable for said charged particles and substantially impermeable for ambient light.
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: March 12, 2019
    Assignee: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Rabah Hanfoug