Electron Microscope Type Patents (Class 250/311)
  • Patent number: 11555992
    Abstract: The invention discloses a programmable annular LED illumination-based high efficiency quantitative phase microscopy imaging method, the proposed method comprising the following steps: the derivation of system optical transfer function in a partially coherent illumination imaging system; the derivation of phase transfer function with the weak object approximation under the illumination of tilted axially symmetric coherent point illumination source; the extension of illumination from an axially symmetric coherence point source to a discrete annular point source, and the optical transfer function can be treated as an incoherent superposition of each pair of tilted axially symmetric coherent point sources. The acquisition of raw intensity dataset; the implementation of deconvolution for quantitative phase reconstruction.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: January 17, 2023
    Assignee: NANJING UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: Qian Chen, Chao Zuo, Jiasong Sun, Shijie Feng, Yuzhen Zhang, Guohua Gu
  • Patent number: 11551907
    Abstract: An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample, and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded, and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.
    Type: Grant
    Filed: July 26, 2019
    Date of Patent: January 10, 2023
    Assignees: RIKEN, UNIVERSITY PUBLIC CORPORATION OSAKA
    Inventors: Ken Harada, Keiko Shimada, Shigeo Mori, Atsuhiro Kotani
  • Patent number: 11545337
    Abstract: A scanning transmission electron microscope that scans a specimen with an electron probe to acquire an image. The scanning transmission electron microscope includes: an optical system which includes a condenser lens and an objective lens; an imaging device which is arranged on a back focal plane or a plane conjugate to the back focal plane of the objective lens and which is capable of photographing a Ronchigram; and a control unit which performs adjustment of the optical system. The control unit is configured or programed to: acquire an image of a change in a Ronchigram that is attributable to a change in a relative positional relationship between the specimen and the electron probe; and determine a center of the Ronchigram based on the image of the change in the Ronchigram.
    Type: Grant
    Filed: April 21, 2021
    Date of Patent: January 3, 2023
    Assignee: JEOL Ltd.
    Inventor: Ryusuke Sagawa
  • Patent number: 11544171
    Abstract: A method for monitoring the free space of a stack of a microcontroller during the execution of a process using spaces of the stack from a start address to an end address of the stack, in which the method includes: in a prior step, writing N keys in the stack at N addresses of the stack, the memory space between two consecutive keys decreasing in a direction from the start address to the end address of the stack; and, in a step of executing the process, saving the address of the current key, corresponding to the address of the existing key, among the N keys, that is closest to the stack start address.
    Type: Grant
    Filed: June 26, 2018
    Date of Patent: January 3, 2023
    Inventor: Jacques Delaire
  • Patent number: 11538659
    Abstract: Provided are a charged particle beam device and a detector capable of non-invasively observing a biochemical sample without a staining treatment or an immobilization treatment, with a simple and high observation throughput. An electron optics system, a stage 64, a sample chamber 100 holding a sample and including a first insulating layer 110 that is in contact with the sample, and a conductive layer 120 that is formed on the first insulating layer, signal detection circuits 20 and 50 connected to the conductive layer and detecting a current flowing through the conductive layer, and a main control unit 14 for controlling the electron optics system and the stage, wherein the main control unit 14 irradiates the conductive layer of the sample chamber placed on the stage with an electron beam from the electron optics system and is input with a detection signal from the signal detection circuit.
    Type: Grant
    Filed: October 25, 2018
    Date of Patent: December 27, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Mitsuhiro Nakamura, Michio Hatano
  • Patent number: 11533003
    Abstract: The present disclosure relates to a piezoelectric device, and more particularly, to a piezoelectric device including: a piezoelectric actuator; a displacement transmission structure disposed on the piezoelectric actuator; and a displacement amplification structure disposed between the piezoelectric actuator and the displacement transmission structure. Here, the displacement amplification structure includes: a first displacement amplification structure and a second displacement amplification structure, which cross each other; and a fixing pin that passes through the first displacement amplification structure and the second displacement amplification structure to connect the first displacement amplification structure and the second displacement amplification structure. Also, each of one end of the first displacement amplification structure and one end of the second displacement amplification structure may be fixed on the piezoelectric actuator.
    Type: Grant
    Filed: April 22, 2021
    Date of Patent: December 20, 2022
    Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
    Inventors: Hanbit Jin, Hye Jin Kim, Yun-Jeong Kim, YuLim Min, Wooseup Youm, JoonMin Lee, Chan-Hwa Hong
  • Patent number: 11532454
    Abstract: This invention pertains to an imaging method, the purpose of which is to reveal, over a wide range, information about a plurality of layers contained in a multilayer structure, or form an image of the revealed applicable layers. The method proposed includes: a step in which, while rotating the sample with the axis of the normal line of the sample surface as the axis of rotation, the sample is irradiated with an ion beam from a direction inclined with respect to the normal line direction, via a mask having an opening which selectively allows the passage of an ion beam and which is disposed at a position distant from the sample, thereby forming a hole with a band-shaped sloped surface that is inclined with respect to the sample surface; and a step in which a first image viewed from a direction intersecting with the sloped surface of the applicable layer is formed, on the basis of a signal obtained by irradiating, with a charged particle beam, the applicable layer contained in the band-shaped sloped surface.
    Type: Grant
    Filed: November 12, 2018
    Date of Patent: December 20, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventor: Hiroshi Fukuda
  • Patent number: 11527335
    Abstract: A electronic blackbody cavity is provided. The electronic blackbody cavity comprises an inner surface; a chamber surrounded by the inner surface; an opening configured to make an electron beam enter the chamber; and a porous carbon material layer located on the inner surface. The porous carbon material layer consists of a plurality of carbon material particles and a plurality of micro gaps. The plurality of micro gaps are defined by the plurality of carbon material particles. A secondary electron detection device using the electronic blackbody cavity is also provided.
    Type: Grant
    Filed: April 8, 2021
    Date of Patent: December 13, 2022
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Ke Zhang, Guo Chen, Peng Liu, Kai-Li Jiang, Shou-Shan Fan
  • Patent number: 11508550
    Abstract: There is provided an image processing method capable of generating an image representative of a magnetic field distribution. The method starts with acquiring phase images providing visualization of electromagnetic fields respectively in a plurality of columns. Then, each of the electromagnetic fields in the columns within the phase images is separated into magnetic field and electric field components. An image representative of a magnetic field distribution is created based on the separated magnetic field components. The step of separating each electromagnetic field includes separating the electromagnetic field in a first one of the columns into magnetic field and electric field components based on the electromagnetic field in a second one of the columns, the latter electromagnetic field having an electric field component oriented in the same direction as that in the first column.
    Type: Grant
    Filed: July 19, 2021
    Date of Patent: November 22, 2022
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 11499926
    Abstract: Methods and systems for conducting tomographic imaging microscopy of a sample with a high energy charged particle beam include irradiating a first region of the sample in a first angular position with a high energy charged particle beam and detecting emissions resultant from the charged particle beam irradiating the first region. The sample is repositioned into a second angular position such that the second region to be different than the first region, and a second region of the sample is irradiated. Example repositioning may include one or more of a translation of the sample, a helical rotation of the sample, the sample being positioned in a non-eucentric position, or a combination thereof. Emissions resultant from irradiation of the second region are then detected, and a 3D model of a portion of the sample is generated based at least in part on the detected first emissions and detected second emissions.
    Type: Grant
    Filed: June 30, 2020
    Date of Patent: November 15, 2022
    Assignee: FEI Company
    Inventors: Tomá{hacek over (s)} Vystav{hacek over (e)}l, Zuzana Hlavenková
  • Patent number: 11501949
    Abstract: A wafer inspection system is disclosed. According to certain embodiments, the system includes an electron detector that includes circuitry to detect secondary electrons or backscattered electrons (SE/BSE) emitted from a wafer. The electron beam system also includes a current detector that includes circuitry to detect an electron-beam-induced current (EBIC) from the wafer. The electron beam system further includes a controller having one or more processors and a memory, the controller including circuitry to: acquire data regarding the SE/BSE; acquire data regarding the EBIC; and determine structural information of the wafer based on an evaluation of the SE/BSE data and the EBIC data.
    Type: Grant
    Filed: May 23, 2019
    Date of Patent: November 15, 2022
    Assignee: ASML Netherlands B.V.
    Inventor: Long Ma
  • Patent number: 11491651
    Abstract: A robotic arm system comprising an artificial intelligence (AI) processor system, a transceiver electrically coupled to the AI processor system, and a robotic arm having an optical data communication network that communicates with the transceiver. The robotic arm further comprises a transmitter, a plurality of sensors electrically coupled to the transmitter, a receiver, and a plurality of motion actuators electrically coupled to the receiver. The optical data communication network comprises gigabit plastic optical fiber (GbPOF) having a graded-index core made of a transparent carbon-hydrogen bond-free perfluorinated polymer with dopant. In one embodiment, one GbPOF optically couples the transmitter to the transceiver and another GbPOF optically couples the transceiver to the receiver. The flexible high-data-rate GbPOF enables robotic arm control using artificial intelligence.
    Type: Grant
    Filed: March 3, 2020
    Date of Patent: November 8, 2022
    Assignee: The Boeing Company
    Inventor: Eric Y. Chan
  • Patent number: 11495431
    Abstract: A transmission electron microscope includes a control unit for: acquiring an image of an objective aperture; obtaining a position of the objective aperture; obtaining an amount of deviation between an object position and the position of the objective aperture, based on the position of the objective aperture; and operating an aperture moving mechanism, based on the amount of deviation of the position of the objective aperture. The position of the objective aperture is obtained by: binarizing the image of the objective aperture by using a set threshold; obtaining an area of an aperture hole of the objective aperture from the binarized image; determining whether the area is within a predetermined range; changing the threshold when a determination is made that the area is outside the predetermined range; and obtaining a position of the objective aperture when a determination is made that the area is within the predetermined range.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: November 8, 2022
    Assignee: JEOL Ltd.
    Inventor: Hitoshi Sakurai
  • Patent number: 11495432
    Abstract: In a charged particle beam device, a control unit performs processing for: operating a deflector based on movement information to move a visual field of a deflector from a first visual field to a second visual field; capturing the sample image with the second visual field to obtain a reference image; operating the deflector to move the visual field from the second visual field to the first visual field; operating the sample stage based on the movement information to move the visual field from the first visual field to a third visual field; capturing the sample image with the third visual field to obtain a comparison image; calculating a positional deviation amount between the reference image and the comparison image; determining whether the positional deviation amount is equal to or less than a designated positional deviation amount; and operating the sample stage based on the positional deviation amount.
    Type: Grant
    Filed: July 21, 2021
    Date of Patent: November 8, 2022
    Assignee: JEOL Ltd.
    Inventors: Daichi Maekawa, Hitoshi Sakurai
  • Patent number: 11476082
    Abstract: A device may include an electron source, a detector, and a deflector. The electron source may be directed toward a sample area. The detector may receive an electron signal or an electron-induced signal. A deflector may be positioned between the electron source and the sample. The deflector may modulate an intensity of the electron source directed to the sample area according to an electron dose waveform having a continuously variable temporal profile.
    Type: Grant
    Filed: March 7, 2022
    Date of Patent: October 18, 2022
    Assignee: INTEGRATED DYNAMIC ELECTRON SOLUTIONS, INC.
    Inventors: Ruth Shewmon Bloom, Bryan Walter Reed, Daniel Joseph Masiel, Sang Tae Park
  • Patent number: 11468555
    Abstract: A method of generating a correction line indicating a relationship between an amount of deviation of an edge of a wafer pattern from an edge of a reference pattern and a width of a space adjacent to the edge of the reference pattern, includes: creating an appearance-frequency graph of widths of spaces adjacent to reference patterns located within a designated area; obtaining images of wafer patterns corresponding to a plurality of space widths shown in the appearance-frequency graph; calculating amounts of deviation between edges of the wafer patterns on the images and edges of corresponding reference patterns; plotting a plurality of data points on a coordinate system, the plurality of data points being specified by the plurality of space widths and the amounts of deviation; and generating a correction line from the plurality of data points on the coordinate system.
    Type: Grant
    Filed: March 12, 2019
    Date of Patent: October 11, 2022
    Assignee: TASMIT, INC.
    Inventor: Koji Kaneko
  • Patent number: 11460462
    Abstract: A method of analyzing a rock sample includes analyzing one or more large-area, low-resolution micrographs to identify areas requiring higher-resolution imaging, and selecting one or more analysis regions from the areas requiring higher-resolution imaging. Multi-spectral imaging is used on the one or more analysis regions to obtain one or more high-resolution, multi-spectral images, and one or more features of the rock sample are identified from the corresponding one or more high-resolution, multi-spectral images. The method further includes upscaling the one or more high-resolution, multi-spectral images and thereby geo-locating the features of the rock sample to key regions of the rock sample.
    Type: Grant
    Filed: August 27, 2019
    Date of Patent: October 4, 2022
    Assignee: ExxonMobil Upstream Research Company
    Inventors: Hubert E. King, Jr., Michael G. Myers, William A. Lamberti, Antonio S. Buono, James H. Macquaker
  • Patent number: 11461939
    Abstract: A tomographic method of determining a 3D map of a charge collection efficiency in a charge carrier-separating sample. The method includes positioning the sample in a beam path, scanning the sample to measure the beam induced current and/or voltage for a plurality of locations, assigning a coordinate location for each of the plurality of locations, and applying a tomographic image reconstruction algorithm to generate a 3D map of the charge collection efficiency based on the assigned coordinate locations.
    Type: Grant
    Filed: November 23, 2021
    Date of Patent: October 4, 2022
    Assignees: Arizona Board of Regents on behalf of Arizona State University, Deutsches Elektronen-Synchrotron DESY
    Inventors: Michael E. Stueckelberger, Xiaogang Yang, Mariana I. Bertoni
  • Patent number: 11456151
    Abstract: An image acquisition method is provided for use in an electron microscope for scanning a sample by an electron probe and acquiring a scanned image. The method includes the steps of: raster scanning a region of the sample under observation with the electron probe and obtaining a first scanned image; raster scanning the region under observation with the electron probe and obtaining a second scanned image; and superimposing the first and second scanned images over each other. In the step of obtaining the first scanned image, each one of scan lines is drawn with the electron probe in a first direction and then moved in a second direction perpendicular to the first direction. In the step of obtaining the second scanned image, each one of the scan lines is drawn with the electron probe in the first direction and then moved in a third direction opposite to the second direction.
    Type: Grant
    Filed: July 14, 2021
    Date of Patent: September 27, 2022
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 11450505
    Abstract: An adjustable magnetic field free objective lens for a charged particle microscope is disclosed herein. An example charged particle microscope at least includes first and second optical elements arranged on opposing sides of a sample plane, a third optical element arranged around the sample plane, and a controller coupled to control the first, second and third optical elements. The controller coupled to excite the first and second optical elements to generate first and second magnetic lenses, the first and second magnetic lenses formed on opposing sides of the sample plane and oriented in the same direction, and excite the third optical element to generate a third magnetic lens at the sample plane that is oriented in an opposite direction, where a ratio of the excitation of the third optical element to the excitation of the first and second optical elements adjusts a magnetic field at the sample plane.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: September 20, 2022
    Assignee: FEI Company
    Inventors: Alexander Henstra, Ali Mohammadi-Gheidari, Peter Christiaan Tiemeijer
  • Patent number: 11444213
    Abstract: Provided are a radiation detector and a radiation detection apparatus in which the efficiency of detecting radiation is enhanced by increasing a portion capable of detecting radiation. A radiation detector includes a semiconductor part having a plate-like shape, the semiconductor part being provided with a through hole penetrating the semiconductor part, one surface of the semiconductor part being an incident surface for radiation. The semiconductor part has a sensitive portion capable of detecting incident radiation, the sensitive portion including an inner edge of the incident surface.
    Type: Grant
    Filed: May 28, 2018
    Date of Patent: September 13, 2022
    Assignees: FONDAZIONE BRUNO KESSLER, HORIBA, LTD.
    Inventors: Antonino Picciotto, Francesco Ficorella, Nicola Zorzi, Daisuke Matsunaga, Kengo Yasui
  • Patent number: 11435302
    Abstract: Disclosed are a procedure and system for live monitoring of staining quality and heavy metal diffusion during electron microscopy preparation protocols for biological samples. The disclosed approach employs x-rays via, e.g., a commercially available micro-CT device, to observe and measure the diffusion and distribution of the heavy metals during conventional biological sample staining procedures for electron microscopy. This allows one to observe and check the quality and homogeneity of the staining without damaging or destroying the sample.
    Type: Grant
    Filed: November 12, 2019
    Date of Patent: September 6, 2022
    Assignee: THE TRUSTEES OF PRINCETON UNIVERSITY
    Inventors: Adrian A. Wanner, David Tank, Sebastian Seung
  • Patent number: 11430633
    Abstract: Apertures having references edges are situated to define a sample irradiation zone and a shielded zone. The sample irradiation zone includes a portion proximate the shielded zone that is conjugate to a detector. A sample is scanned into the sample irradiation zone from the shielded zone so that the sample can remain unexposed until situated properly with respect to the detector for imaging. Irradiation exposure of the sample is reduced, permitting superior imaging.
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: August 30, 2022
    Assignee: FEI Company
    Inventors: Ondrej L. Shanel, Trond Karsten Varslot, Martin Schneider, Maarten Kuijper, Ondrej R. Baco, Václav Batelka
  • Patent number: 11428653
    Abstract: Three ROIs, ROI-c, ROI-d, and ROI-e, are set for an L? peak and an L? peak reflecting an electron state of a valance band. Accumulated values in the ROI-c, ROI-d, and ROI-e are respectively normalized with reference to an accumulated value in an ROI-a, to determine a sample vector. The sample vector is compared to a plurality of compound vectors corresponding to a plurality of compounds, and a compound forming the sample is estimated based on a compound vector having the highest similarity.
    Type: Grant
    Filed: June 10, 2020
    Date of Patent: August 30, 2022
    Assignee: JEOL Ltd.
    Inventor: Hideyuki Takahashi
  • Patent number: 11404242
    Abstract: To assist an operator in setting an observation conditions, so as to acquire an image with a desired image quality (such as contrast) in a charged particle beam device without falling into trial and error based on the experience of the operator. Therefore, the charged particle beam device includes a stage 115 on which a sample is placed, a charged particle optical system configured to irradiate the sample with a charged particle beam, detectors 121 and 122 configured to detect an electron generated by an interaction between the charged particle beam and the sample, a control unit 103 configured to control the stage and the charged particle optical system according to an observation condition set by the operator and configured to form an image based on a detection signal from the detectors, and a display 104 configured to display an observation assist screen for setting the observation condition.
    Type: Grant
    Filed: April 21, 2017
    Date of Patent: August 2, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yuki Numata, Hirofumi Sato, Shigeru Kawamata
  • Patent number: 11404241
    Abstract: Methods for using a single electron microscope system for investigating a sample with TEM and STEM techniques include the steps of emitting electrons toward the sample, forming the electrons into a two beams, and then modifying the focal properties of at least one of the two beams such that they have different focal planes. Once the two beams have different focal planes, the first electron beam is focused such that it acts as a STEM beam that is focused at the sample, and the second electron beam is focused so that it acts as a TEM beam that is parallel beam when incident on the sample. Emissions resultant from the STEM beam and the TEM beam being incident on the sample can then be detected by a single detector or detector array and used to generate a TEM image and a STEM image.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: August 2, 2022
    Assignee: FEI Company
    Inventors: Alexander Henstra, Yuchen Deng, Holger Kohr
  • Patent number: 11393655
    Abstract: The present disclosure relates to a liquid chip for an electron microscope including a lower chip, an upper chip, and a waterway space part for supplying a liquid sample, and may attach a transmissive thin film layer made of a graphene material having an excellent bulging resistance property to a plurality of holes formed in a waterway space part to increase the thickness of a support not operating as a transmissive window to be larger than the conventional one, thereby supplying the liquid sample more stably and minimizing the loss of a spatial resolution and also suppressing the bulging phenomenon of the transmissive window.
    Type: Grant
    Filed: August 11, 2020
    Date of Patent: July 19, 2022
    Assignee: Korea Advanced Institute of Science And Technology
    Inventors: Jongmin Yuk, Kunmo Koo, Jaesang Lee
  • Patent number: 11380518
    Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: July 5, 2022
    Assignee: Hitachi, Ltd.
    Inventors: Takafumi Miwa, Hirokazu Tamaki, Momoyo Enyama, Makoto Sakakibara, Sayaka Kurata, Atsuko Shintani, Takashi Dobashi, Kotoko Urano, Akiko Kagatsume, Minseok Park, Yasuhiro Shirasaki, Thantip Krasienapibal
  • Patent number: 11348221
    Abstract: A wafer testing method adapted to test a thin wafer. The thin wafer is combined with a vacuum-release substrate to form a wafer-assembly, and the wafer-assembly is placed in a wafer cassette. The vacuum-release substrate is attached to a front surface of the wafer with an attaching force which is sensitive to air pressure. The method includes the following steps. First, taking out the wafer-assembly from the wafer cassette, then transferring the wafer-assembly to a warpage-detection-device and placing the wafer-assembly on a first stage of the warpage-detection-device. Then, detecting warpage of the wafer. If the warpage of the wafer is less than a warpage threshold, the wafer-assembly is taken out from the first stage, and the wafer-assembly is turned over to place the wafer-assembly on a second stage. Then, applying negative pressure to the vacuum-release substrate to eliminate the attaching force. Then, removing the vacuum-release substrate.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: May 31, 2022
    Assignee: MPI CORPORATION
    Inventors: Chien-Yu Chen, Han-Yu Chuang, Po-Han Peng
  • Patent number: 11335533
    Abstract: The purpose of the present invention is to provide a charged particle beam device which suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: May 17, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Akito Tanokuchi, Seiichiro Kanno, Kei Shibayama
  • Patent number: 11319210
    Abstract: A method of making a stretchable film structure is provided. An elastic substrate is pre-stretched in a first direction and a second direction to obtain a pre-stretched elastic substrate. A carbon nanotube film structure is laid on a surface of the pre-stretched elastic substrate. The carbon nanotube film structure comprises a plurality of super-aligned carbon nanotube films stacked with each other. The pre-stretching the elastic substrate is removed and a plurality of wrinkles is formed on a surface of the carbon nanotube film structure to form the stretchable film structure. The present disclosure also relates to the stretchable film structure obtained by the above method.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: May 3, 2022
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Yang Yu, Jia-Ping Wang, Kai-Li Jiang, Shou-Shan Fan
  • Patent number: 11293747
    Abstract: An embodiment of the invention relates to a method for carrying out a time-resolved interferometric measurement comprising the steps of generating at least two coherent waves, overlapping said at least two coherent waves and producing an interference pattern, measuring the interference pattern for a given exposure time, thereby forming measured interference values, and analyzing the measured interference values and extracting amplitude and/or phase information from the measured interference values. In at least one time segment, hereinafter referred to as disturbed time segment, of the expo-sure time, the interference pattern is intentionally disturbed or destroyed such that the corresponding measured interference values describe a disturbed or destroyed interference pattern.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: April 5, 2022
    Assignee: TECHNISCHE UNIVERSITAET BERLIN
    Inventors: Michael Lehmann, Tore Niermann, Tolga Wagner
  • Patent number: 11276548
    Abstract: Provided are a charged particle beam device and a charged particle beam adjustment method capable of observing or inspecting a change in observation conditions in a more appropriate beam state while preventing an increase in a time required for each measurement point. The charged particle beam device includes a condenser lens 3 and an objective lens 14 configured to focus an electron beam 4 emitted from an electron source 2, a primary beam scanning deflector 5 or a secondary electron deflector 15, an adjusting element 13 configured to adjust an axis of the electron beam 4, and a control device 9 configured to supply a signal representing a control amount to the adjusting element 13 for control.
    Type: Grant
    Filed: November 23, 2020
    Date of Patent: March 15, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Hitomi Sakai, Daisuke Sato, Keiichiro Hitomi, Hiroyuki Saito, Kazuma Tanii
  • Patent number: 11276551
    Abstract: An inspection device includes a charged particle optical system that includes a charged particle beam source emitting a charged particle beam and plural lenses focusing the charged particle beam on a sample, a detector that detects secondary charged particles emitted by an interaction of the charged particle beam and the sample, and a calculation unit that executes auto-focusing at a time a field of view of the charged particle optical system moves over plural inspection spots, the calculation unit irradiates the charged particle beam to the sample under an optical condition that is obtained by introducing astigmatism of a predetermined specification to an optical condition that is for observing a pattern by the charged particle optical system, and executes the auto-focusing using an image formed from a signal outputted by the detector in detecting the secondary charged particles.
    Type: Grant
    Filed: March 19, 2020
    Date of Patent: March 15, 2022
    Assignee: HITACHI, LTD.
    Inventors: Atsuko Shintani, Yasunari Sohda, Noritsugu Takahashi, Hikaru Koyama
  • Patent number: 11251016
    Abstract: A method of controlling a transmission electron microscope includes: causing a first magnetic field lens to generate a first magnetic field and causing a second magnetic field lens to generate a second magnetic field; causing the magnetic field applying unit to generate a magnetic field of a direction along an optical axis on a specimen mounting surface; and changing excitations of the first excitation coil and the second excitation coil to correct a deviation of a focal length of an objective lens due to the magnetic field generated by the magnetic field applying unit.
    Type: Grant
    Filed: March 24, 2020
    Date of Patent: February 15, 2022
    Assignee: JEOL Ltd.
    Inventor: Yuji Kohno
  • Patent number: 11251018
    Abstract: Provided is a scanning electron microscope which can perform high-speed focus correction even when an electron beam having high energy is used. The scanning electron microscope includes an electron optical system including an electron source 100 that emits an electron beam and an objective lens 113, a sample stage 1025 which is disposed on a stage 115 and on which a sample 114 is placed, a backscattered electron detector 1023 which is disposed between the objective lens and the sample stage and is configured to detect backscattered electrons 1017 emitted due to interaction between the electron beam and the sample, a backscattered electron detection system control unit 138 which is provided corresponding to the backscattered electron detector and is configured to apply a voltage to the backscattered electron detector, and a device control calculation device 146.
    Type: Grant
    Filed: July 2, 2018
    Date of Patent: February 15, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yasunari Sohda, Kaori Bizen, Yusuke Abe, Kenji Tanimoto
  • Patent number: 11239048
    Abstract: An electron beam inspection system is disclosed, in accordance with one or more embodiments of the present disclosure. The inspection system may include an electron beam source configured to generate one or more primary electron beams. The inspection system may also include an electron-optical column including a set of electron-optical elements configured to direct the one or more primary electron beams to a sample. The inspection system may further include a detection assembly comprising: a scintillator substrate configured to collect electrons emanating from the sample, the scintillator substrate configured to generate optical radiation in response to the collected electrons; one or more light guides; one or more reflective surfaces configured to receive the optical radiation and direct the optical radiation along the one or more light guides; and one or more detectors configured to receive the optical radiation from the light guide.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: February 1, 2022
    Assignee: KLA Corporation
    Inventors: Alan D. Brodie, Lawrence P. Muray, John Fielden
  • Patent number: 11205558
    Abstract: A sample exchange device includes a first transport mechanism that includes a grip portion that grips a sample holding member and transports a sample holding member to a sample exchange chamber, a cooling unit that cools the sample exchange chamber, fiber sensors that detect whether or not the grip portion of the first transport mechanism grips the sample holding member in the sample exchange chamber, and a control unit. The control unit turns on the fiber sensors when the grip portion of the first transport mechanism enters the sample exchange chamber and turns off the fiber sensors after it is detected whether or not the grip portion of the first transport mechanism grips the sample holding member.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: December 21, 2021
    Assignee: JEOL Ltd.
    Inventors: Naoki Fujimoto, Kimitaka Hiyama
  • Patent number: 11201033
    Abstract: To provide a charged particle beam device capable of preventing generation of geometric aberration by aligning axes of electrostatic lenses with high accuracy even when center holes of respective electrodes which constitute the electrostatic lens are not disposed coaxially. The charged particle beam device according to the invention includes an electrostatic lens disposed between an acceleration electrode and an objective lens, wherein at least one of the electrodes which constitutes the electrostatic lens is formed of a magnetic body, and two or more magnetic field generating elements are disposed along an outer periphery of the electrode.
    Type: Grant
    Filed: October 25, 2019
    Date of Patent: December 14, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Yuta Kawamoto, Akira Ikegami, Masahiro Fukuta
  • Patent number: 11170972
    Abstract: A scanning electron microscope includes a spin detector configured to measure spin polarization of a secondary electron emitted from a sample, and an analysis device configured to analyze measurement data of the spin detector. The analysis device determines a width of a region where the secondary electron spin polarization locally changes in the measurement data. The analysis device further evaluates a strain in the sample based on the width of the region. With a configuration of the scanning electron microscope, it is possible to perform analysis of a strain in a magnetic material with high accuracy.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: November 9, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Teruo Kohashi, Hideo Morishita, Junichi Katane
  • Patent number: 11168976
    Abstract: A method for determining a height map of a sample includes the following steps: receiving height measurement data of the sample; receiving an overview image of the sample; identifying certain image regions in the overview image; deriving context information in relation to identified image regions; and supplementing or altering the height measurement data with the aid of the context information. Moreover, a measuring apparatus configured to carry out the method is described.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: November 9, 2021
    Assignee: Carl Zeiss Microscopy GMBH
    Inventors: Manuel Amthor, Daniel Haase, Dominik Stehr
  • Patent number: 11170970
    Abstract: A method for examining a specimen surface with a probe of a scanning probe microscope, the specimen surface having an electrical potential distribution. The method includes (a) determining the electrical potential distribution of at least one first partial region of the specimen surface; and (b) modifying the electrical potential distribution in the at least one first partial region of the specimen surface and/or modifying an electrical potential of the probe of the scanning probe microscope before scanning at least one second partial region of the specimen surface.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: November 9, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Michael Budach, Michael Schnell, Bernd Schindler, Markus Boese
  • Patent number: 11164716
    Abstract: When using a charged particle beam aperture having a ring shape in a charged particle beam device, the charged particle beam with the highest current density immediately above the optical axis, among the charged particle beams is blocked, so that it is difficult to dispose the charged particle beam aperture at the optimal mounting position. Therefore, in addition to the ring-shaped charged particle beam aperture, a hole-shaped charged particle beam aperture is provided, and it is possible to switch between the case where the ring-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam and the case where the hole-shaped charged particle beam aperture is disposed on the optical axis of the charged particle beam.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: November 2, 2021
    Assignees: Hitachi High-Tech Corporation, Japan Fine Ceramics Center
    Inventors: Shunichi Motomura, Tsunenori Nomaguchi, Tadahiro Kawasaki, Takeharu Kato, Ryuji Yoshida
  • Patent number: 11133151
    Abstract: A transmission electron microscope includes an electron beam source emitting an electron beam and an illumination optical system for directing the emitted electron beam at a sample. The illumination optical system has a first condenser lens, a second condenser lens, a third condenser lens, a fourth condenser lens, an objective lens, and a condenser aperture disposed at the position of the second condenser lens. The third condenser lens and the fourth condenser lens cooperate to make the position of the condenser aperture and a sample plane conjugate to each other. The first condenser lens and the second condenser lens cooperate to make the electron beam source and a front focal plane of the objective lens conjugate to each other while the conjugate relationship between the position of the condenser aperture and the sample plane is maintained by the third and fourth condenser lenses.
    Type: Grant
    Filed: November 12, 2020
    Date of Patent: September 28, 2021
    Assignee: JEOL Ltd.
    Inventor: Hirofumi Iijima
  • Patent number: 11081314
    Abstract: An integrated transmission electron microscope comprising multiple electron sources for tuned beams of ultrafast, scanning probe, and parallel illumination in varied beam energies can be alternated within sub-microseconds onto a sample with dynamic ‘transient state’ processes to acquire atomic-scale structural/chemical data with site specificity. The various electron sources and condenser optics enable high-resolution imaging, high-temporal resolution imaging, and chemical imaging, using fast-switching magnets to direct the different electron beams onto a single maneuverable objective pole piece where the sample resides. Such multimodal in situ characterization tools housed in a single microscope have the potential to revolutionize materials science.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: August 3, 2021
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: Katherine L. Jungjohann, Khalid M. Hattar
  • Patent number: 11054439
    Abstract: The present invention relates to a scanning probe microscope having: (a) a scan unit embodied to scan a measuring probe over a sample surface in a step-in scan mode; and (b) a self-oscillation circuit arrangement configured to excite the measuring probe to a natural oscillation during the step-in scan mode.
    Type: Grant
    Filed: April 26, 2019
    Date of Patent: July 6, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Christof Baur
  • Patent number: 10991543
    Abstract: The present disclosure is to provide a charged particle beam device capable of achieving both high resolution by setting of a short WD and improvement of detection efficiency when setting a long WD. According to an aspect for achieving the above-described object, there is suggested a charged particle beam device including: an objective lens for converging a charged particle beam emitted from a charged particle source; a sample stage having a first driving mechanism for moving a sample to be irradiated with the charged particle beam between a first position and a second position more separated from the objective lens than the first position; a detection surface for detecting charged particles emitted from the sample; and a second driving mechanism for moving the detection surface between within a movable range of the sample between the first position and the second position and out of the movable range of the sample.
    Type: Grant
    Filed: July 12, 2019
    Date of Patent: April 27, 2021
    Assignee: Hitachi High-Tech Corporation
    Inventors: Shunsuke Mizutani, Yuuji Kasai, Minoru Yamazaki, Makoto Suzuki
  • Patent number: 10984978
    Abstract: According to one aspect of the present invention, a multiple electron beam inspection apparatus includes a reference image generation circuit generating reference images corresponding to the secondary electron images, in accordance with an image generation characteristic of a secondary electron image by irradiation of one beam; and a correction circuit generating corrected reference images in which, on the basis of deviation information between a figure pattern of the secondary electron image by irradiation of the one beam of the multiple primary electron beams and a figure pattern of a secondary electron image by irradiation of another beam different from the one beam of the multiple primary electron beams, a shape of a figure pattern of a reference image corresponding to the figure pattern of the secondary electron image by the irradiation of the another beam in the reference images is corrected.
    Type: Grant
    Filed: October 15, 2019
    Date of Patent: April 20, 2021
    Assignee: NuFlare Technology, Inc.
    Inventors: Hiromu Inoue, Ryoichi Hirano, Masataka Shiratsuchi, Riki Ogawa
  • Patent number: 10937626
    Abstract: According to one embodiment, a holder includes a top member, a side member, and a bottom member. The top member has a hole for allowing transmission of a charged particle beam, and the sample is mountable in the hole. The bottom member is provided to overlap with the top member in a plan view. The side member is connected to a part of the top member and a part of the bottom member such that the top member and the bottom member are separated from each other in a cross-sectional view. An opening portion is a region surrounded by the top member, the side member, and the bottom member, and a scintillator is provided in the opening portion.
    Type: Grant
    Filed: August 13, 2020
    Date of Patent: March 2, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventor: Kotaro Hosoya
  • Patent number: 10926366
    Abstract: A two degree-of-freedom nano positioning stage with a parallel flexure hinge mechanism includes two driving systems respectively arranged along an X axis and a Y axis, a moving stage, a parallel flexure hinge mechanism and a base frame, wherein each of the driving systems includes a piezo actuator, a connecting block, a lever, a preloading spring, a push rod and a plurality of connecting hinges; the piezo actuator is fixed on the base frame at one end and connected with the connecting block at the other end; the lever is connected between the connecting block and the preloading spring, the connecting block is connected with the lever through one of the connecting hinges; the preloading spring is fixed on the base frame at one end and connected with the lever at the other end, and the lever is connected with the base frame through another one of the connecting hinges.
    Type: Grant
    Filed: May 3, 2019
    Date of Patent: February 23, 2021
    Inventors: Ying Xu, Jing Jia, Huifeng Wang