Abstract: The sterilizing toybox apparatus addresses illness risk, especially with children, by providing UV light sterilization within. UV lighting is offered both above and beyond toys within the apparatus. A time-release latch ensures exposure for a time determined to be optimal for UV exposure of contents. The apparatus provides UV lighting both in the bottom of the chest and in the lid. The clear shelf above the lower UV bulbs is in communication with the vibrator that jostles any toys so that full UV exposure is ensured. Reflective material distributed fully within the chest further guarantees full exposure of contents to sterilization. Additionally, the optional mesh basket is selectively suspended within the chest.

Abstract: The invention comprises intensity control of a charged particle beam acceleration, extraction, and/or targeting method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. Particularly, intensity of a charged particle stream of a synchrotron is described. Intensity control is described in combination with turning magnets, edge focusing magnets, concentrating magnetic field magnets, winding and control coils, and extraction elements of the synchrotron. The system reduces the overall size of the synchrotron, provides a tightly controlled proton beam, directly reduces the size of required magnetic fields, directly reduces required operating power, and allows continual acceleration of protons in a synchrotron even during a process of extracting protons from the synchrotron.

Abstract: A method for electron-beam writing to a medium includes positioning the medium within an e-beam writing machine so that the medium is supported by a stage and is exposed to an e-beam source. The method also includes writing a pattern to the medium using a plurality of independently-controllable beams of the e-beam source, in which the pattern comprises a plurality of parallel strips. Each of the parallel strips is written using multiple ones of the independently-controllable beams.

Abstract: A light-emitting element detection and classification device includes a rotation unit for transporting a plurality of light-emitting elements, a chip detection unit, and a chip classification unit. The rotation unit includes at least one rotary turntable, a plurality of receiving portions formed on the rotary turntable, and a plurality of suction-exhaust dual-purpose openings respectively disposed in the receiving portions, each receiving portion selectively receives at least one of the light-emitting elements. Each light-emitting element is an LED package chip having a positive electrode pad and a negative electrode pad disposed on the bottom side thereof. The chip detection unit includes at least one chip detection module adjacent to the rotation unit for detecting each light-emitting element. The chip classification unit includes at least one chip classification module adjacent to the rotation unit for classifying the LED package chips that have been detected by the at least one chip detection module.

Abstract: In a complex, multi-processor software controlled system, such as proton beam therapy system (PBTS), it may be important to provide treatment configurable parameters that are easily modified by an authorized user to prepare the software controlled systems for various modes of operation. This particular invention relates to a configuration management system for the PBTS that utilizes a database to maintain data and configuration parameters and also to generate and distribute system control files that can be used by the PBTS for treatment delivery. The use of system control files reduces the adverse effects of single point failures in the database by allowing the PBTS to function independently from the database. The PBTS accesses the data, parameters, and control settings from the database through the system control files, which insures that the data and configuration parameters are accessible when and if single point failures occur with respect to the database.

Abstract: Light from a light source is made to be reflected by a light source mirror and to pass through a variable collimator, an irradiation field shape shaped by the variable collimator is projected on a photographing screen by the light passed through the variable collimator, a projection portion of the photographing screen is photographed by a photographic device, and an image photographed by the photographic device is analyzed by an image processor.

Abstract: A system includes a patient support and an outer gantry on which an accelerator is mounted to enable the accelerator to move through a range of positions around a patient on the patient support. The accelerator is configured to produce a proton or ion beam having an energy level sufficient to reach a target in the patient. An inner gantry includes an aperture for directing the proton or ion beam towards the target.

Abstract: A system for illuminating an object with a wave or for imaging an object with a wave comprises a lens, a plurality of transducers and a control unit connected to the plurality of transducers. The lens comprises a plurality of resonator elements incorporated inside a medium and is able to convert a near field wave of the lens to a far field wave, or reciprocally. The resonator elements are at a sub wavelength distance from each others. The control unit provides signals to the transducers so that a plurality of points on the object are illuminated as desired, or obtains signals from the transducers to build an image of a plurality of points of the object. The points are at sub wavelength distance from each others.

Abstract: A pattern measurement apparatus includes a beam intensity distribution creation unit to scan a charged particle beam over a reference pattern having edge portions formed at a right angle to create a line profile of the reference pattern and thus create a reference-beam intensity distribution, an edge width detection unit to determine line profiles for pattern models including edges formed at various inclination angles by use of the reference-beam intensity distribution and calculate edge widths reflecting an influence of a width of a reference beam, and a correspondence table creation unit to calculate correction values for edge positions from the calculated edge widths and the pattern models and create a correspondence table in which the edge widths and the correction values are associated with one another.

Abstract: A light source manufacturing apparatus, which manufactures a light source device by adhering a laser device and a wavelength converting device that converts the laser light emitted by the laser device to laser light of a different wavelength, includes a first stage that holds the wavelength converting device, a second stage that holds the laser device, a power meter that measures the amount of laser light emitted by the wavelength converting device, a light receiving device that detects the drive waveform of the laser light, and a controlling unit that changes relative positions of the first stage and the second stage in such a manner that the amount of laser light measured by the power meter is a predetermined value or greater and the drive waveform detected by the light receiving device falls within a reference range.

Abstract: A UVLED apparatus and method provide efficient curing of an optical-fiber coating onto a drawn glass fiber. The apparatus and method employ one or more UVLEDs that emit electromagnetic radiation into a curing space. An incompletely cured optical-fiber coating, which is formed upon a glass fiber, absorbs emitted and reflected electromagnetic radiation to effect improved curing.

Abstract: An apparatus and method for aligning a mask that includes disposing and firstly aligning a mask over a first substrate, with a space interposed therebetween, bringing the mask into contact with the first substrate and then measuring the alignment state of the mask with respect to the first substrate to detect an alignment error, secondly aligning the mask with respect to the first substrate based on the alignment error, transferring the first substrate to the next process, disposing and thirdly aligning the mask over a second substrate with the space interposed therebetween, and bringing the mask into contact with the second substrate.

Abstract: A system and method for controlling a dosage profile is disclosed. An embodiment comprises separating a wafer into components of a grid array and assigning each of the grid components a desired dosage profile based upon a test to compensate for topology differences between different regions of the wafer. The desired dosages are decomposed into directional dosage components and the directional dosage components are translated into scanning velocities of the ion beam for an ion implanter. The velocities may be fed into an ion implanter to control the wafer-to-beam velocities and, thereby, control the implantation.

Abstract: The edges of the reticle are detected with respect to the microstructured patterns exposed by the stepper, and the shapes of the microstructured patterns at the surface and at the bottom of the photoresist are detected. The microstructured patterns are evaluated by calculating, and displaying on the screen, the dislocation vector that represents the relationship in position between the detected patterns on the surface and at the bottom of the photoresist. Furthermore, dislocation vectors between the microstructured patterns at multiple positions in a single-chip or single-shot area or on one wafer are likewise calculated, then the sizes and distribution status of the dislocation vectors at each such position are categorized as characteristic quantities, and the corresponding tendencies are analyzed. Thus, stepper or wafer abnormality is detected.

Abstract: Sub-field enhanced global alignment (SEGA) methods for aligning reconstituted wafers in a lithography process are disclosed. The SEGA methods provide the ability to accommodate chip placement errors for chips supported by a reconstituted wafer when performing a lithographic process having an overlay requirement. The SEGA methods include measuring chip locations to determine sub-fields of the reconstituted wafer over which enhanced global alignment (EGA) can be performed on the chips therein to within the overlay requirement. The SEGA methods further included individually performing EGA over the respective sub-fields. The SEGA methods take advantage of the benefits of both EGA and site-by-site alignment and are particularly applicable to wafer-level packing lithographic processes such as fan-out wafer-level packaging.

Abstract: An apparatus (1) for sterilizing containers (10), comprising a treatment head (5) which has an exit window (8) through which charge carriers can pass, comprising a charge carrier generation source which generates charge carriers, and comprising an acceleration device (6) which accelerates the charge carriers in the direction of the exit window (8). According to the invention, the cross section of the treatment head (5) is dimensioned such that the treatment head (5) can be guided through the mouth of the container (10), and the acceleration device (6) accelerates the charge carriers in such a way that the charge carriers exiting from the exit window (8) can be aimed preferably directly onto an inner wall (15) of the container (10).

Abstract: The present invention relates to a laser processing method and the like having a structure for making it possible to process an object to be processed in various ways while accurately adjusting the installation state of the object. The method irradiates the object with plural adjustment laser light beams that are set in a specific positional relationship against a converging point of processing laser light beam, and adjusts the state of installation of the object while monitoring irradiation areas of the adjustment laser light beams on the surface of the object. Each irradiation directions of adjustment laser light beams is different from that of the processing laser light beam. By reflecting the irradiation condition of the adjustment laser light beam and monitored information of the irradiation areas in positional adjustment of the object, the installation state of the object can be adjusted in accordance with various kinds of processing.

Abstract: Optical beam modulation is accomplished with the aid of a semiconductive nanomembrane, such as a silicon nanomembrane. A photocathode modulates a beam of charged particles that flow between the carbon nanotube emitter and the anode. A light source, or other source of electromagnetic radiation, supplies electromagnetic radiation that modulates the beam of charged particles. The beam of charged particles may be electrons, ions, or other charged particles. The electromagnetic radiation penetrates a silicon dioxide layer to reach the nanomembrane and varies the amount of available charge carriers within the nanomembrane, thereby changing the resistance of the nanomembrane. As the resistance of the nanomembrane changes, the amount of current flowing through the beam may also change.

Abstract: An ion implanter system has a movable wafer support for holding a semiconductor wafer and a beam source that generates a beam for implanting ions in the semiconductor wafer while the wafer is moving. A plurality of path segments are identified, through which the wafer support is to move to expose the semiconductor wafer to the ion beam. A first position and a second position are identified for each respective one of the plurality of path segments, such that, when the wafer is in each first position and each second position, a perimeter of the beam projected in a plane of the wafer is tangent to a perimeter of the wafer. The ion implanter is configured to automatically move the wafer along each of the plurality of path segments, starting at the respective first position on each respective path segment and stopping at the respective second position on the same segment, so as to expose the wafer to the beam for implanting ions in the wafer.

Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.

Abstract: The invention comprises a patient positioning method and apparatus used in conjunction with multi-axis charged particle or proton beam radiation therapy of cancerous tumors. The patient positioning system is used to translate the patient and/or rotate the patient into a zone where the proton beam can scan the tumor using a targeting system. The patient positioning system is optionally used in conjunction with systems used to constrain movement of the patient, such as semi-vertical, sitting, or laying positioning systems.

Abstract: It is an object of the present invention to make it possible to stably and correctly measure a changing amount of a beam position when a beam displacement is measured prior to a recording operation performed by an electron beam recording apparatus. A measuring device for measuring a displacement of an electron beam prior to a recording operation, comprises: a knife edge disposed at an irradiating position of the beam spot; detecting means (Farady cup or the like) for detecting an electron beam irradiating through the knife edge; filter means (high frequency cut filter or the like) for removing a changing frequency component of measurement subject from an output of the detecting means; and control means for controlling a reference position of the electron beam in accordance with an output from the filter means, in a manner such that the center of the beam spot will be at the front end position of the knife edge.

Abstract: In an irradiation region A in which an electron beam irradiator emits an electron beam through an irradiating surface 12a of the electron beam irradiator, a resin bottle 8 is conveyed with a distance between the irradiating surface 12a and the resin bottle 8 being maintained constant. Grippers 6 are arranged to an outer peripheral portion of a rotary body 14 in a circumferential direction thereof at an equal interval, and the resin bottles 8 are conveyed with neck portions 8a thereof being held. Rotating means (52, 58, 62) for rotating the grippers 6 with respect to the rotary body 14 and forward/rearward moving means (18, 50) keeping constant a distance from the irradiating surface 12a of the electron beam irradiator are provided.

Abstract: A patient alignment system for a radiation therapy system. The alignment system includes multiple external measurement devices which obtain position measurements of components of the radiation therapy system which are movable and/or are subject to flex or other positional variations. The alignment system employs the external measurements to provide corrective positioning feedback to more precisely register the patient and align them with a radiation beam. The alignment system can be provided as an integral part of a radiation therapy system or can be added as an upgrade to existing radiation therapy systems.

Abstract: The present invention relates to methods and systems for use of an electron beam system. The electron beam system may be used within a treatment center with very little radiation shielding. The electron beam system may be used in conjunction with low-z moderators that reduce the energy level of the electron beam without the need for complex or expensive energy control systems. The electron beam system may be used to treat skin cancer and dermatological patients in non-traditional treatment facilities, as well as invasive cancers, either in an unshielded operating room to deliver intraoperative radiation therapy (“IORT”) or in an unshielded room in the oncology department to deliver electron beam radiation treatment (“EB-RT”).

Abstract: A transmission electron microscope is capable of correcting, with high efficiency and high accuracy, an electron energy loss spectrum extracted from each of measured portions included in an electron energy loss spectral image with two axes representing the amount of an energy loss and positional information on a measured portion. The transmission electron microscope has an electron spectroscope and a spectrum correction system. The spectrum correction system corrects a spectrum extracted from each measured portion included in an electron energy loss spectral image acquired from a sample based on a difference between a spectrum extracted from a standard portion of a standard spectral image and a spectrum extracted from a portion different from the standard portion.

Abstract: A particle beam device includes a movable carrier element with at least one receiving element for receiving a specimen and in which the receiving element is situated on the carrier element. In various embodiments, the receiving element may be situated removably on the carrier element and/or multiple receiving elements may be situated on the carrier element in such a way that a movement of the carrier element causes a movement of the multiple receiving elements in the same spatial direction or around the same axis. The carrier element may be movable in three spatial directions situated perpendicular to one another and rotatable around a first axis which is parallel to an optical axis of the particle beam device and around a second axis which is situated perpendicular to the optical axis. A method for using the particle beam device in connection with specimen study and preparation is also disclosed.

Abstract: The objective is to obtain a driving type patient platform that can efficiently perform positioning work for making the position and the posture of a diseased site coincide with those established when a treatment plan is generated. There are provided translation units that translate a top board in the X direction, the Y direction, and the Z direction, respectively, in a fixed coordinate system; rotation units that rotate the top board in the ? direction around the X axis, the ? direction around the Y axis, and the ? direction around the Z axis, respectively; and a control device that controls the translation units and the rotation units, based on an inputted desired rotation center point and an inputted desired rotation angle.

Abstract: Systems and methods disclosed provide for guiding a tool using a source of radioactivity. The method includes implanting a source of radioactivity at a position having a geometric relationship to a target tissue, determining at least an indication of a location of the source using at least one radioactivity detecting position sensor, and positioning a tool at a desired relative location with respect to the target tissue based on the determined location.

Abstract: There is provided a particle beam irradiation system so as to provide the dose distribution having more accuracy.

Abstract: A radiation therapy treatment system and method of treating a patient with radiation. The system integrates positioning of the patient, treatment planning, and delivery of the plan. As a result of the integration of imaging capabilities into the treatment apparatus, and efficient processes for contouring and planning, a patient can be treated in approximately 20 minutes or less. The method includes acquiring image data from the patient, defining a target region with one or more predefined shapes, generating a treatment plan based on the defined target region, and delivering radiation to the target region.

Abstract: In various exemplary embodiments, a targeting device providing a visible indication of an invisible beam is disclosed. The invisible beam, such as an x-ray beam, is emitted by a radiation source on a medical imaging system. The targeting device includes, for example, an illumination source to produce a visible beam and operate at one or more wavelengths. The illumination source, which is opaque to the x-ray beam and would ordinarily cause shadows on the imaging system, is arranged to be mounted outside of a field-of-view of the invisible beam. A beam reflector is mounted next to the illumination source. The beam reflector is fabricated from a material invisible to x-rays and is arranged to be mounted within the field-of-view of the invisible beam. The beam reflector redirects the visible beam produced by the illumination source such that the visible beam is parallel to the field-of-view of the invisible beam.

Abstract: An ion implantation system configured to produce an ion beam is provided, wherein an end station has a robotic architecture having at least four degrees of freedom. An end effector operatively coupled to the robotic architecture selectively grips and translates a workpiece through the ion beam. The robotic architecture has a plurality of motors operatively coupled to the end station, each having a rotational shaft. At least a portion of each rotational shaft generally resides within the end station, and each of the plurality of motors has a linkage assembly respectively associated therewith, wherein each linkage assembly respectively has a crank arm and a strut. The crank arm of each linkage assembly is fixedly coupled to the respective rotational shaft, and the strut of each linkage assembly is pivotally coupled to the respective crank arm at a first joint, and pivotally coupled to the end effector at a second joint.

Abstract: A system and method of adapting a radiation therapy treatment plan for a patient by varying the fraction size delivered to the patient on any individual day, based at least partially on the use of daily patient registration (i.e., taking images of the patient before each fraction is delivered to see the position and size of the tumor on that day). The fraction size can be dynamically altered based upon the biology of the tumor.

Abstract: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.

Abstract: The invention provides a system for achieving detection and measurement of film thickness reduction of a resist pattern with high throughput which can be applied to part of in-line process management. By taking into consideration the fact that film thickness reduction of the resist pattern leads to some surface roughness of the upper surface of the resist, a film thickness reduction index value is calculated by quantifying the degree of roughness of the part corresponding to the upper surface of the resist on an electron microscope image of the resist pattern which has been used in the conventional line width measurement. The amount of film thickness reduction of the resist pattern is estimated by applying the calculated index value to a database previously made for relating a film thickness reduction index value to an amount of film thickness reduction of the resist pattern.

Abstract: An electrostatic clamp includes a heating block for heating a substrate, the heating block having a first surface disposed toward the substrate and a second surface opposite the first surface. A base is arranged to adjoin at least a portion of the second surface of the heating block. The adjoined base and heating block may mutually define an inner gap between a first portion of the heating block and the base. An outer gap is arranged concentric with the inner gap between a second portion of the heating block and the base, the inner and outer gaps being isolated from one another by a first sealing surface formed between the second surface of the heating block and the base.

Abstract: An electron beam apparatus equipped with a height detection system includes an electron beam unit emitting an electron beam to the specimen, and a height detection system for detecting height of the specimen which is set on a table. The height detection system includes an illumination system configured to direct first and second beams of light through a mask with a multi-slit pattern to a surface of the specimen at substantially opposite azimuth angles and at substantially equal angles of incidence, first and second detectors which respectively detect first and second multi-slit images of the first and second beams reflected from the specimen and generate output signals thereof, and a device which receives the output signals and generates a comparison signal which is responsive to the height of the specimen. An objective lens of the electron beam unit is controlled in accordance with the comparison signal.

Abstract: A testing device includes a testing platform, a testing light source, a cover plate, a control circuit board, a probe and an adapter circuit board. The testing platform defines a receiving portion. The testing light source is positioned on the testing platform and opposite to the receiving portion. The cover plate is rotatably connected to the testing platform. The control circuit board is positioned on the testing platform. The probe and the adapter circuit board are positioned on the cover plate. The adapter circuit board is electrically connecting the probe to the control circuit board.

Abstract: A sample preparing device has a sample stage that supports a sample and undergoes rotation about a first rotation axis to bring a preselected direction of the sample piece into coincidence with an intersection line between a first plane formed by a surface of the sample piece and a second plane. A manipulator holds sample piece of the sample and undergoes rotation about a second rotation axis independently of the sample stage to rotate the sample piece to a preselected position in the state in which the preselected direction of the sample piece coincides with the intersection line. The manipulator is disposed relative to the sample stage so that an angle between the second rotation axis and the surface of the sample is in the range of 0° to 45°.

Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

Abstract: A charged particle beam writing apparatus includes a charge amount distribution calculation unit configured to calculate a charge amount distribution which is charged by irradiation of a charged particle beam onto a writing region of a target workpiece, by using a charge decay amount and a charge decay time constant both of which depend on a pattern area density, a position displacement amount distribution calculation unit configured to calculate a position displacement amount of each writing position due to charge amounts of the charge amount distribution by performing convolution of each charge amount of the charge amount distribution with a response function, and a writing unit configured to write a pattern on the each writing position where the position displacement amount has been corrected, using a charged particle beam.

Abstract: A method for dynamic pixel mass spectrometric imaging, or dynamic pixel imaging is disclosed. The method includes striking a sample to be scanned with a laser beam so that the laser beam releases analytes from the sample. The laser beam and the sample are then displaced relative to one another so that the laser beam substantially continuously traces a predefined path on the sample to release analytes from the sample along the predefined path. A mass analysis of the released analytes is performed.

Abstract: In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The current of the ion beam directed through a plurality of apertures of the mask is measured using the ion current measurement device. In this manner, the position of the mask with respect to the ion beam as well as the condition of the mask may be determined based on the ion current profile measured by the ion current measurement device.

Abstract: A method of forming an integrated circuit includes providing a wafer, and a tape adhered to the wafer, wherein the tape has a main surface perpendicular to a first direction. The tape is exposed to a light to cause the tape to lose adhesion. In the step of exposing the tape, the wafer and the tape are rotated, and/or the light is tilt projected onto the tape, wherein a main projecting direction of the light and the first direction form a tilt angle greater than zero degrees and less than 90 degrees.

Abstract: The invention relates to position determining system (201) for determining a position of an object (2). A first position detection unit (205) detects a first position of the object (2) based on radiation transferred between the object (2) and transfer positions being known relative to a reference position by a sending and receiving unit (203, 214, 216, 217). A second position detection unit (35) detects a second position based on an acceleration of the object (2) and the determined first position, wherein an output unit (12) outputs at least one of the first position and the second position. If the transfer of radiation is interrupted, the second position can be output by the output unit. Moreover, the first position can be used as an initial value for determining the second position or to update the second position. This improves the quality of determining the position of the object.

Abstract: A laser atom probe situates a counter electrode between a specimen mount and a detector, and provides a laser having its beam aligned to illuminate the specimen through the aperture of the counter electrode. The detector, specimen mount, and/or the counter electrode may be charged to some boost voltage and then be pulsed to bring the specimen to ionization. The timing of the laser pulses may be used to determine ion departure and arrival times allowing determination of the mass-to-charge ratios of the ions, thus their identities. Automated alignment methods are described wherein the laser is automatically directed to areas of interest.

Abstract: A process for producing an interface unit and also a group of such interface units are specified. The interface unit exhibits a first reference surface for beaming in radiation, a second reference surface for emitting the radiation, and an axis extending in the direction from the first to the second reference surface. The production process comprises the steps of setting an optical path length of the interface unit between the first and second reference surfaces along the axis and the fixing of the set optical path length of the interface unit. The optical path length of the interface unit is set in such a way that radiation of a defined numerical aperture beamed in at the first reference surface exhibits a focus location that is predetermined with respect to the second reference surface in the direction of the axis. A precise and uniform focus location with respect to the second reference surface is obtained.

Abstract: An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.

Abstract: A deflector array includes a plurality of deflectors, which deflect charged particle beams, arrayed on a substrate. Each of the plurality of deflectors includes a single opening formed in the substrate, and each of the plurality of deflectors includes a pair of electrodes that oppose each other through the opening and are configured to deflect a single charged particle beam. The plurality of deflectors are arrayed such that a length of the pair of electrodes in a longitudinal direction thereof is not less than a distance between centers of two of the plurality of deflectors that are located nearest to each other. The plurality of deflectors is arrayed to form a checkerboard lattice, and two openings of the two of the plurality of deflectors overlap in the longitudinal direction.