Abstract: Provided are systems and methods for processing the surface of substrates that scan a laser beam at one or more selected orientation angles. The orientation angle or angles may be selected to reduce substrate warpage. When the substrates are semiconductor wafers having microelectronic devices, the orientation angles may be selected to produce controlled strain and to improve electronic performance of the devices.

Abstract: An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. A novel sample structure and a novel use of a milling pattern allow the creation of S/TEM samples as thin as 50 nm without significant bowing or warping. Preferred embodiments of the present invention provide methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis.

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract: In a substrate stage device, a substrate is held by a substrate support member mounted on a Y step surface plate. The substrate support member moves in the scanning direction in long strokes on the Y step surface plate. The part corresponding to an exposure area of the substrate is held by suction in a non-contact manner from below by a fixed point stage, and other parts are supported by levitation by the plurality of air floating devices placed on the Y step surface plate. The part corresponding to the exposure area of the substrate is controlled so that surface position of the substrate is located in the depth of focus of the projection optical system by the fixed point stage.

Abstract: A modulator for radiation therapy provides modulation of an area beam to decrease treatment time. Separate channels passing modulated “beamlets” are possible by spacing the channels such that spreading of the beams and multiple angles of treatment eliminate cold spots. The space between the channels allows well-defined channel walls and space for modulator mechanisms.

Abstract: Mask carriers and mask alignment in vacuum deposition processes, mask handling modules, and methods for aligning a mask. A mask handling module can include a substrate carrier for carrying at least one substrate; a mask carrier for carrying at least two masks. The mask carrier can include at least two mask carrier sections each being adapted to carry a mask and a mask carrier positioning device for moving the mask carrier relative to the substrate carrier. The mask carrier sections are arranged so that the masks carried on the mask carrier sections can be positioned on the mask carrier in respective planes forming an angle with respect to each other so that only one of the at least two masks can be aligned to one of the at least one substrates.

Abstract: For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern definition means onto a target which moves (v) relative to the pattern definition means laterally to the axis, the location of the image is moved along with the target, for a pixel exposure period within which a distance of relative movement of the target is covered which is at least a multiple of the width (w) of the aperture images as measured on the target, and after said pixel exposure period the location of the beam image is changed, which change of location generally compensates the overall movement of the location of the beam image.

Abstract: A projector includes a light source, a light modulator that modulates the light flux emitted from the light source in accordance with an image signal to form image light, a projection optical apparatus that enlarges and projects the image light, a reflection section having a reflection surface disposed along the direction in which the projection optical apparatus outputs the image light, the reflection surface reflecting the image light, and an adjustment section that adjusts the inclination angle of the reflection section with respect to the direction in which the image light travels.

Abstract: A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.

Abstract: An in situ optical specimen holder is disclosed which may be utilized for imaging and analysis during dynamic experimentation. This holder assembly includes a set of focusing and reflection optics along with an environmental cell. Electromagnetic radiation can be used to optically excite the specimen in the presence or absence of fluid. A highly reflective mirror may be used to focus the radiation on to the specimen without the presence of any heating components within the cell. The spot size of the irradiation at the specimen surface can be varied, thus exciting only a specific region on the specimen. The window type cell provides a variable fluid path length ranging from the specimen thickness to 500 ?m. The holder has the provision to continuously circulate fluids over the specimen. The pressure within the cell can be regulated by controlling the flow rate of the fluids and the speed of the pumps.

Abstract: The present invention relates to a method of increasing the operation lifetime of an optical collector unit (33)) arranged in an irradiation device. The irradiation device at least comprises a radiation source (1) emitting optical radiation, in particular extreme ultraviolet radiation or soft X-rays, said radiation source (1) generating substances and/or particles colliding with optical surfaces of the optical collector unit (33), which forms a radiation beam of a portion of said radiation emitted by said radiation source (1), and a debris mitigation unit (37) arranged between the radiation source (1) and said optical collector unit (33). In the proposed method the optical collector unit (33) is moved during operation and/or in operation pauses of the device such that deposits or degradation effects caused by collision of said substances and/or particles with said optical surfaces of the collector unit (33) are distributed more homogeneously on said optical surfaces than without such a movement.

Abstract: An apparatus and a method for detecting particle beam characteristics are disclosed. In one embodiment, the apparatus may have a body including a first end and second end and at least one detector between the first and second ends. The apparatus may have a transparent state where a portion of the particles entering the apparatus may pass through the apparatus. The apparatus may also have a minimum transparency state where substantially all of the particles entering the apparatus may be prevented from passing through the apparatus and detected. Different transparency state may be achieved by rotating the apparatus or the detector contained therein. With the apparatus, it is possible to detect the beam properties such as the beam intensity, angle, parallelism, and a distribution of the particles in a particle beam.

Abstract: A system and method for controlling a dosage profile is disclosed. An embodiment comprises separating a wafer into components of a grid array and assigning each of the grid components a desired dosage profile based upon a test to compensate for topology differences between different regions of the wafer. The desired dosages are decomposed into directional dosage components and the directional dosage components are translated into scanning velocities of the ion beam for an ion implanter. The velocities may be fed into an ion implanter to control the wafer-to-beam velocities and, thereby, control the implantation.

Abstract: A method for correcting astigmatism of an electronic optical column of an electron emission spectromicroscope, comprising the steps of: forming a reference structure on a surface of a sample comprising a structure of interest to be imaged, imaging the reference structure by the spectromicroscope with secondary electrons and with core level photoelectrons, eliminating astigmatism defects appearing during the imaging of the reference structure with secondary electrons and with core level photoelectrons, a material of the reference structure being chosen such that, during core level photoelectron imaging, the contrast C between the average intensity Ia of the material of the reference structure and the average intensity Ib of the material of the sample is such that: C = I a - I b I a + I b ? 0.2 .

Abstract: An ion-cut machine and method for slicing silicon ingots into thin wafers for solar cell manufacturing is set forth, amongst other embodiments and applications. One embodiment comprises two carousels: first carousel (100) adapted for circulating workpieces (55) under ion beam (10) inside target vacuum chamber (30) while second carousel (80) is adapted for carrying implanted workpieces through a sequence of process stations that may include annealing (60), cleaving (70), slice output (42), ingot replacement (52), handle bonding, cleaning, etching and others. Workpieces are essentially swapped between carousels. In one embodiment, the swapping system comprises a high throughput load lock (200) disposed in the wall of the vacuum chamber (30), a vacuum swapper (110) swapping workpieces between first carousel (100) and load lock (200), and an atmospheric swapper (90) swapping workpieces between load lock (200) and second carousel (80).

Abstract: The invention is a method, triggering unit, and system for activating an oxygen scavenging composition at high speeds. The triggering unit includes a plurality of UV lamps that can operate at increased temperatures and have high output intensites from about 10 to 35 mW/cm2. The triggering unit can activate films at speeds from about 20 to 100 fps. Mercury amalgam lamps are useful in the practice of the invention. The invention also includes a UV dose management system and film tensioning system that facilitates triggering at high film speeds. The UV dose management system controls the amount of UV exposure that the film receives so that the oxygen scavenging rate of the activated composition can be controlled.

Abstract: A Z stage is placed on an XY stage in avoidance of an area to which a mark table is fixed. The mask M is placed on a holding mechanism provided on the Z stage. A middle value of the range adjustable by the focal adjustment mechanism is made coincident with the height of the mark table. The height of the mark table is measured and the heights of plural measurement points of the mask M are measured. The Z stage is moved in such a manner that the height of a middle value between highest and lowest values of the heights of these measurement points coincides with the height of the mark table.

Abstract: A method determines an error in aligning a patient with a radiation beam. A planning volume V is acquired during treatment planning, and a treatment volume I is acquired during treatment. For each point r in the planning volume and treatment volume to be aligned by a coordinate transformation T, a weighted error DWE is minimized using an objective function F(r, T) applied to the planning volume and the treatment volume weighted by a weighting function W(r) as WE ? ( T ) = ? r ? ? W ? ( r ) ? F ? ( r , T ) , where W(r) is a function of a target weight WT, a tissue at risk weight WR, and a delivered dose weight WD.

Abstract: Provided is an ion implantation apparatus including a disk which rotates about a first axis, a pad which is rotatable about a second axis on the disk, and on which a substrate is placed with a holder attached to a circumference of the substrate, the holder including a weight, fixing pins which are each fixedly provided on a portion on the disk around the pad, a sliding piece which slides, by its own centrifugal force, on the disk with a rotational movement of the disk and thereby clamps the holder in cooperation with the fixing pins, and an ion beam generator which irradiates the substrate with ion beams.

Abstract: A lithography method and system have means for determining a convergence value dc from a relation of beam current to beam position drift (or beam dimension drift) produced in the past; means for finding a beam current i(t) as a function of the convergence value dc of beam position drift (or beam dimension drift), a measured value dm of beam position drift (or beam dimension drift), a gain constant g, and a convergence value c of beam position drift (or beam dimension drift) per unit beam current and using an equation given by i(t)={(1+g)·dc?g·dm(t)}/c; means for making a check regarding dm and dc as to whether dm approaches dc and, thus, a relationship given by |dm?dc|<? holds, where ? is a positive number providing a decision criterion under the condition where the gain constant g of the beam current i(t) satisfies a relationship given by g>0.

Abstract: A transmission electron microscope micro-grid includes a support ring and a sheet-shaped carbon nanotube structure. The support ring has a through hole defined therein. The sheet-shaped carbon nanotube structure has a peripheral edge secured on the support ring and a central area suspended above the through hole. The sheet-shaped carbon nanotube structure includes at least one linear carbon nanotube structure or at least one carbon nanotube film.

Abstract: A TEM micro-grid is provided. The TEM micro-grid includes a carrier, a carbon nanotube structure, and a protector. The carrier defines a first through opening. The provided defines a second through opening. The carbon nanotube structure is located between a surface of the carrier and a surface of the protector. The carbon nanotube structure covers at least part of the first through opening.

Abstract: A charged particle beam apparatus facilitating adjusting a beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a first processing step for measuring the sensitivity of the aligner and a second processing step for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus determines the aligner set values, using the aligner sensitivity measured in the first processing step and the amount of deviation detected in the second processing step, such that the primary charged particle beam passes through the center of the objective aperture and controls the aligner using the aligner set values.

Abstract: Embodiments encompass a single-molecule detection system and methods of using the detection system to detect an object. Further, embodiments encompass a detection system comprising a movable light coupler, a waveguide, and a light detector. Embodiments further encompass methods of single-molecule detection, including methods of single-molecule nucleic acid sequencing.

Abstract: The objective is to obtain a driving type patient platform that can efficiently perform positioning work for making the position and the posture of a diseased site coincide with those established when a treatment plan is generated. There are provided translation units that translate a top board in the X direction, the Y direction, and the Z direction, respectively, in a fixed coordinate system; rotation units that rotate the top board in the ? direction around the X axis, the ? direction around the Y axis, and the ? direction around the Z axis, respectively; and a control device that controls the translation units and the rotation units, based on an inputted desired rotation center point and an inputted desired rotation angle.

Abstract: A charged particle beam column package includes an assembly (e.g., comprising a plurality of layers, which can have a component coupled to one of the layers), and at least one deflector between an extractor and aperture of the assembly. Further, at least one of the layers has interconnects thereon.

Abstract: Disclosed are methods and systems for guiding emissions to a target. The methods and systems utilize, in part, Markerless Tracking software to detect a beam of energy, such as a laser, toward a target such as a tissue that is the subject of a medical procedure.

Abstract: This invention relates to an apparatus for scanning substrates through an ion beam in the process chamber of an ion implanter. The apparatus comprises a substrate carriage and reaction mass carriage movably mounted to a fixed base. The substrate carriage is adapted to support a substrate holder. Movement of the substrate carriage results in movement of the substrate holder, and substrate mounted therein, through the ion beam. The reaction mass carriage moves in the opposite direction to the substrate carriage to counter any reaction forces exerted on the fixed base as a result of acceleration of the substrate carriage.

Abstract: A method for inspecting a settling time of a deflection amplifier includes setting a settling time, performing shooting a plurality of times alternately to project two patterns of different types which are shaped by making a charged particle beam pass through a first and a second apertures while deflecting the charged particle beam by a deflector controlled by an output of a deflection amplifier which is driven based on the settling time having been set, measuring beam currents of the shooting, calculating an integral current of the beam currents measured, and calculating a difference between the integral current calculated and a reference integral current to output the difference.

Abstract: An ion implanter system has a movable wafer support for holding a semiconductor wafer and a beam source that generates a beam for implanting ions in the semiconductor wafer while the wafer is moving. A plurality of path segments are identified, through which the wafer support is to move to expose the semiconductor wafer to the ion beam. A first position and a second position are identified for each respective one of the plurality of path segments, such that, when the wafer is in each first position and each second position, a perimeter of the beam projected in a plane of the wafer is tangent to a perimeter of the wafer. The ion implanter is configured to automatically move the wafer along each of the plurality of path segments, starting at the respective first position on each respective path segment and stopping at the respective second position on the same segment, so as to expose the wafer to the beam for implanting ions in the wafer.

Abstract: A system that can maintain and track the position of a single nanoparticle in three dimensions for a prolonged period has been disclosed. The system allows for continuously imaging the particle to observe any interactions it may have. The system also enables the acquisition of real-time sequential spectroscopic information from the particle. The apparatus holds great promise in performing single molecule spectroscopy and imaging on a non-stationary target.

Abstract: A method for measuring a demagnification of a charged particle beam exposure apparatus includes measuring a first stage position of a mask stage in accordance with a mask stage coordinate system, irradiating a first charged particle beam to a first irradiation position on a specimen through the opening portion of the mask, measuring the first irradiation position in accordance with a specimen stage coordinate system, moving the mask stage to a second stage position, measuring the second stage position of the mask stage, irradiating a second charged particle beam to a second irradiation position on the specimen through the opening portion of the mask measuring the second irradiation position in accordance with the specimen stage coordinate system, and calculating a demagnification of the charged particle beam exposure apparatus from the first and second stage positions and the first and second irradiation positions.

Abstract: An approach is provided for patient positioning. A patient is arranged on a table having a positioning assembly coupled thereto, the positioning assembly including a plurality of spatially configurable members. A spatial configuration of at least one of the plurality of spatially configurable members is arranged to support the patient in a multipoint bending position during a medical procedure.

Abstract: A registration detection system realizes both substrate-by-substrate correction and highly accurate correction of an exposure process.

Abstract: In the embodiment a charged particle beam system includes a main chamber, an exchange chamber, an x-y positioning stage housed in the main chamber, a substrate-supporting structure supported by or provided by said stage and moveable in first and second perpendicular directions of travel between limits which define a field of travel and a substrate handling device housed inside the main chamber for loading and unloading a substrate into and out of the main chamber, the device comprising a bar and a side member for supporting the substance to one side of the bar. A method of loading a substrate in a charged particle beam system is also disclosed.

Abstract: Various embodiments disclose devices and methods for fabricating microporous particulate filters with regularly space pores wherein sheet membrane substrates are exposed to energetic particle radiation through a mask and the damaged regions removed in a suitable developer. The required depth of field is achieved by using energetic particles to minimize diffraction and an energetic particle source with suitably small diameter.

Abstract: The present invention provides a system and method for a system for accommodating a solid target in an accelerator. The system and method includes a target changer having at least one port for accommodating the solid target, an insert for receiving the solid target in the target changer, a piston for providing a vacuum and a cooling system for the solid target, a cylinder for displacing the piston in one of three positions; and a bracket for securing the insert, piston and cylinder to the target changer.

Abstract: A wafer holding assembly is provided that is capable of preventing the temperature difference generated between a wafer and a holding pin through beam irradiation. In one embodiment, the wafer holding assembly has a plurality of holding pins for holding a wafer in the ion implanting apparatus, the holding pin comprises a head contacting with an end face of the wafer to control motion of the wafer and a flange projecting from the head to place the wafer, and the head is provided with a canopy portion extending in a direction different from a side placing the wafer.

Abstract: A subject is imaged for treatment of the subject such as an eye to be inspected, while irradiating a charged particle beam on the eye, so that an aim position of a charged particle beam for treatment can be determined.

Abstract: A system that includes: (a) a mask manipulator, that is arranged to: receive an opaque EUV pod that encloses a EUV mask, extract, in a highly clean environment, the EUV mask from the outer pod and the inner pod of the EUV pod, and cover an upper face of the EUV mask with protective cover that is at least partially transparent to DUV radiation; (b) a scanner, arranged scan the EUV mask, using DUV illumination while maintaining in the scanner an environment that has a cleanliness level that is below a tolerable EUV mask cleanliness level; and a transport system arranged to transport the EUV mask and the protective cover between the scanner and the mask manipulator.

Abstract: A method and apparatus is described for aligning a first article relative to a second article, for example for aligning a nanoimprint template with a semiconductor wafer. The method comprises the steps of: providing said second article with at least one flexible structure fixed relative thereto at least one point, providing a first article having at least one surface relief marking thereon, providing a detector for measuring an interaction of the flexible structure with the surface relief marking and generating detector signals relating to said interaction, identifying with the help of the detector signals the position of the flexible structure and thus of the second article with respect to the surface relief marking and generating relative movement between the first and second articles to achieve a desired alignment between the first and second articles defined by the surface relief marking. In this method and apparatus the flexible structure is brought into contact with the surface relief marking.

Abstract: An electron beam lithography apparatus includes a beam current detector which detects, during drawing of the drawing data, fluctuation of an irradiation position of the electron beam at non-irradiation on the substrate; a beam position error detector which detects a beam position error of the electron beam based on the fluctuation of the irradiation position; a drive position error detector which detects a drive position error of the stage due to rotation and translation drive during drawing of the drawing data; and a corrector which corrects the irradiation position of the electron beam during the drawing based on the beam position error and the drive position error.

Abstract: A method for micromachining a material, including configuring an optical system to provide illumination of an illumination wavelength to a site via a given element of the optical system, the illumination generating returning radiation from the site. The method further includes configuring the optical system to receive the returning radiation via the given element, and to form an image of the site therefrom, calculating an actual position of a location at the site from the image and outputting a signal indicative of the actual position of the location, generating a beam of micromachining radiation having a micromachining wavelength different from the illumination wavelength, positioning the beam to form an aligned beam with respect to the location in response to the signal, and conveying the aligned beam to the location via at least the given element of the optical system so as to perform a micromachining operation at the location.

Abstract: Fixtures according to the present invention include fixing surfaces in the same shape as end surfaces of a device under test which is to be measured while an electromagnetic wave to be measured at a frequency equal to more than 0.01 [THz] and equal to or less than 100 [THz] is irradiated on the device under test. The end surfaces are fixed to the fixing surfaces. When a refractive index of the fixtures is n0, and a refractive index of the device under test is n1, a relationship n1?0.1?n0?n1+0.1 holds. The fixtures do not cover a side surface of the device under test. The fixtures are rotated about a straight line orthogonal to the fixing surfaces as a rotational axis.

Abstract: A method and device for observing a specimen, in which a convergent electron beam is irradiated and scanned from a desired direction, on a surface of a calibration substrate on which a pattern with a known shape is formed, and a beam SEM image of the pattern formed on the calibration substrate is obtained. An actual direction of the electron beam irradiated on the surface of the calibration substrate is calculated by use of the information about an apparent geometric deformation of the known shape on the SEM image, and the actual direction of the electron beam to the desired is adjusted direction by using information of the calculated direction. The pattern with the known shape formed on the calibration substrate has a crystal plane formed by anisotropic chemical etching.

Abstract: A radiotherapy apparatus controller includes: a movement collection section; a sensor control section configured to change a first time interval in which a second sensor measures a position of an irradiation area in the subject, based on the movement information; and an irradiation control section. The movement collection section collects movement information indicating a movement of a subject from a first sensor. The sensor control section changes a first time interval in which a second sensor measures a position of an irradiation area in the subject, based on the movement information. The irradiation control section controls a radiotherapy apparatus such that therapeutic radiation irradiated to the irradiation area is changed based on the position.

Abstract: An optical beam pointing system for setting an irradiation position and which is capable of automatically performing positional adjustments of visible light beams with respect to an aiming center. The system uses opposed pointers disposed on opposite sides of an irradiation center, each pointer including a light-projecting portion for projecting a beam aimed at the irradiation center, a light-receiving portion for generating a detection signal, and a control portion.

Abstract: A method and apparatus for aligning, stabilizing and registering two or more structures in one or more dimensional space with picometer-scale precision. Low noise laser light is scattered by at least one or more structure or fiducial marks. One mark may be coupled to each structure to be positioned. The light which has been scattered off the fiducial marks is collected in a photo-sensitive device which enables real-time high-bandwidth position sensing of each structure. One or more of the structures should be mounted on a stage, and the stage can move in either one or more dimensions. The photo-sensitive device generates signals in response to the scattered light received, and the signals are used to modulate the position of the stage in a feedback loop.

Abstract: A lens assembly having a magnetic lens assembly for a charged particle beam system is provided. The lens assembly includes: a first pole piece having a connecting portion of the first pole piece and a gap portion of the first pole piece, a second pole piece having a connecting portion of the second pole piece and a gap portion of the second pole piece, wherein the first pole piece and the second pole piece provide a gap at the respective gap portions, a coil for exciting the magnetic lens assembly, a centering element comprising a material that has a smaller Young's modulus than the material of the first and the material of the second pole piece, wherein the pole pieces are connected with each other at the respective connecting portions and have a centering element receiving portion towards the respective gap portion ends of the pole pieces.

Abstract: A method for treating a structure is described. One embodiment includes forming a structure on a substrate, wherein the structure has a plurality of surfaces including one or more first surfaces lying substantially parallel to a first plane parallel with said substrate and one or more second surfaces lying substantially perpendicular to the first plane. Additionally, the method comprises directing a gas cluster ion beam (GCIB) formed from a material source toward the substrate with a direction of incidence, and orienting the substrate relative to the direction of incidence. The method further comprises treating the one or more second surfaces.