Abstract: A beam transport system for a hadron therapy facility comprises: a main beam transport line; secondary beam transport lines branching off from the main beam transport line for delivering the hadron beam into the patient treatment stations; and switching electromagnets for deviating the hadron beam from the main beam transport line into the secondary beam transport line. A discharge circuit associated with each switching electromagnet comprises a discharge accelerating circuit capable of generating a voltage opposing the counter electromotive force induced in the electromagnet coil of the switching electromagnet when the energization of the electromagnet coil producing the hadron beam deviation is interrupted, wherein this voltage stays substantially constant or increases as the current induced in the electromagnet coil decreases.

Abstract: High throughput UV curing systems for mass curing of a plurality of articles without compromising product quality. The systems comprise a plurality of UV banks, each bank comprising a plurality of fluorescent UV lamps, thereby creating a consistent blanket of UV energy. A plurality of coated articles are positioned between pairs of banks such that the UV exposure or dosage is evenly distributed for each article. The fluorescent UV lamps use proportionally lower energy per unit and generate less heat than standard UV lamps, while sufficiently curing the coating on each article. Throughput is increased compared to currently available systems because the systems are easier to maintain requiring less downtime, can cure significantly more articles per cycle, and reduce the number of rejected products.

Abstract: Micro-channel-cooled UV curing systems and components thereof are provided. According to one embodiment, a lamp head module includes an optical macro-reflector, an array of LEDs and a micro-channel cooler assembly. The array is positioned within the reflector and has a high fill factor and a high aspect ratio. The array provides a high irradiance output beam pattern having a peak irradiance of greater than 25 W/cm2 at a work piece surface at least 1 mm away from an outer surface of a window of the reflector. The micro-channel cooler assembly maintains a substantially isothermal state among p-n junctions of the LEDs at less than or equal to 80° Celsius. The micro-channel cooler assembly also provides a common anode substrate for the array. A thermally efficient electrical connection is formed between the array and the common anode substrate by mounting the array to the micro-channel cooler assembly.

Abstract: The invention relates to a method for the temperature-dependent adjustment of the color properties or the photometric properties of an LED illuminating device having LEDs emitting light of different colors or wavelengths or LED color groups emitting light of the same color or wavelength within a color group, the luminous flux portions thereof determine the color of light, color temperature and/or the chromaticity coordinates of the light mixture emitted by the LED illuminating device.

Abstract: A light source is provided for use in a treatment device for treating a fluid, solid or surface. The light source includes a light emitting diode that emits a first component of ultraviolet (UV) light, and a UV laser light source that emits a second component of UV light having a peak wavelength different from a peak wavelength of the first component of UV light. The first component of UV light and the second component of UV light are applied to treat the fluid or surface. The UV laser light source may include a laser light source and a frequency doubling component that receives light from the laser light source and converts the light to the second component of UV light. A treatment device includes the described light source and a container containing the fluid, or a solid surface, to be treated.

Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

Abstract: The present invention relates to an examination apparatus and a corresponding method to realize a Spectral x-ray imaging device through inverse-geometry CT.

Abstract: A gamma radiation source comprises 75Selenium wherein the 75Selenium is provided in the form of compounds, alloys or mixtures with one or more nonmetals which upon irradiation do not produce products capable of sustained emission of radiation which would unacceptably interfere with the gamma radiation of 75Selenium. A further gamma radiation source comprises 75Selenium wherein the 75Selenium is provided in the form of compounds, alloys or mixtures with one or more metals or nonmetals, the neutron irradiation of which does produce products capable of sustained emission of radiation which would acceptably complement the gamma radiation of 75Selenium. Further, the gamma radiation source may have components that are separately irradiated before being combined and the components may be of natural isotopic composition or of isotopically modified composition so that the subsequent radiation peaks may also be adjusted in relative frequency.

Abstract: Polymerization apparatus for dental technology, having a housing; a partition wall disposed in the housing so as to form a polymerization space where polymerization is carried out; a rotating table, which is arranged on a lower side of the polymerization space and on which the dental prosthesis is disposed directly or via other members; and a plurality of LED light sources which irradiate a light for the curing to a polymerization region, which is formed on the upper side of the rotating table and where the dental prosthesis can be disposed, wherein at least one of the plurality of LED light sources is disposed such that a light axis thereof is inclined obliquely upward to be directed toward the polymerization region.

Abstract: A lighting assembly for liquid crystal alignment is disclosed. The lighting assembly includes a light guiding plate and a light source. The light guiding plate is made by quartz glass. The light guiding plate includes a light emitting surface, a light incident surface adjacent to the light emitting surface, and a bottom surface opposite to the light emitting surface. The light source faces toward the light incident surface of the light guiding plate. The light guiding plate contains a hydroxyl group in an amount less than or equal to 100 ppm. As the light source faces toward the light incident surface of the light guiding plate, the number of the light source may be reduced so that the light utilization rate is enhanced.

Abstract: The therapeutic treatment of a patient using intensity-modulated proton therapy is described. In one example, a method of creating a proton treatment plan is presented that divides volumes of interest into sub-volumes, applies dose constraints to the sub-volumes, finds one or more feasible configurations of a proton therapy system, and selects a proton beam configuration that improves or optimizes one or more aspects of proton therapy. In some implementations, the method of dividing volumes into sub-volumes includes creating fractional sub-volumes based at least in part on proximity to a target volume boundary. In some implementations, the method of finding an improved or optimal proton beam configuration from a set of feasible configurations includes finding a minimum of a cost function that utilizes weighting factors associated with treatment sites.

Abstract: A method and system for cleaving a film of material utilizing thermal flux. The method includes providing a substrate having a face and an underlying cleave region including a prepared initiation region. Additionally, the method includes subjecting the initiation region to a first thermal flux to form a cleave front separating the cleave region of the substrate to a film portion and a bulk portion. The method further includes subjecting an area of the bulk portion substantially in the vicinity of the cleave front to a second thermal flux to cause a temperature difference above and below the cleave region for inducing a propagation of the cleave front expanding the film portion to the area at the expense of the bulk portion. Furthermore, the method includes determining a scan path for the second thermal flux based on the cleave front. Moreover, the method includes scanning the second thermal flux to follow the scan path to further propagate the cleave front.

Abstract: An LED-UV lamp that is easily interchangeable within a UV-curing process and scalable in length with a fine resolution so that it is easily customizable to any UV-curing application. The LED-UV lamp may incorporate multiple rows of LEDs and contain corresponding optics that effectively deliver radiant power to a substrate at distances of several inches.

Abstract: A sleeve holder assembly for a radiation source is disclosed. The sleeve holder assembly comprises: an elongate radiation transparent sleeve element; a sleeve holder receptacle portion coupled to the elongate radiation transparent sleeve element; a sleeve bolt assembly portion coupled to the sleeve holder receptacle portion; a first sealing element disposed between the sleeve holder receptacle portion and the sleeve bolt assembly portion; and a locking element configured to prevent decoupling of the sleeve bolt assembly portion and the sleeve holder receptacle portion. The first sealing element is configured to provide a substantially fluid impermeable seal between the elongate radiation transparent sleeve element and the sleeve holder receptacle portion.

Abstract: The present invention is disclosed an array-type-transducer-based high-power ultrasound delivery system which includes a support bracket, an array-type ultrasound transducer, and a plurality of containers. The support bracket includes a plurality of grooves, and the array-type ultrasound transducer includes a clamp and N ultrasound transducers. The clamp includes a plurality of wedges configured for engaging in the grooves of the support bracket and thereby connecting the array-type ultrasound transducer to the support bracket. The containers are arranged in a two-dimensional matrix so that the ultrasound transducers of the array-type ultrasound transducer can dip into and leave the ultrasound-conducting medium in the containers vertically. The disclosed system features high operation speed and low labor requirement. Moreover, the depth by which and the time for which the ultrasound transducers dip into the ultrasound-conducting medium in the containers can be controlled and quantified.

Abstract: A portable sterilization device using direct UV-C radiation to sterilize the bottom of footwear from known, multiple sources of contamination including bacteria and viruses. This portable device will offer a safe sterilization method for the general public, both in-home and in commercial use.

Abstract: A foot/shoe sanitizing system includes a housing having at least one opening and a set of foot/shoe support bars coupled to the housing in proximity to the at least one opening. The foot/shoe support bars support a foot or shoe placed through the opening(s). At least one ultraviolet emitting device is supported within the housing beneath the set of foot/shoe support bars. The ultraviolet emitting devices direct ultraviolet light around and/or through the set of foot/shoe support bars towards the foot or shoe placed on the foot/shoe support bars. The ultraviolet emitting devices are controllably powered by a source of power to emit ultraviolet light. In a preferred embodiment, the ultraviolet emitting device emits light that includes short wavelength ultraviolet light, causing the formation of ozone in the area of the shoe, thereby killing pathogens that are not easily killed with ultraviolet light alone.

Abstract: Disclosed is a terahertz wave generator which includes a first light source outputting a first light having a first frequency; a second light source outputting a second light having a second frequency different from the first frequency; a second harmonic generation unit performing second harmonic conversion on the first and second lights to generate a third light and a fourth light; and a photomixer converting a mixing light of the third and fourth lights into a terahertz wave alternating signal and outputting a terahertz wave.

Abstract: A method for treating a plurality of magnetic recording media with ultraviolet radiation. Each of the magnetic recording media has a magnetic film, a protective film, and a lubricant film on a non-magnetic substrate. The method includes first irradiating all of the magnetic recording media with ultraviolet radiation and then irradiating a group of the magnetic recording media with ultraviolet radiation, which includes less than all of the magnetic recording media.

Abstract: There is provided a technology which allows SEM observation in real time without deteriorating the processing efficiency in FIB processing. In the present invention, a composite charged-particle-beam apparatus having a FIB column and a SEM column includes an SE3 detector which detects secondary electrons (referred to as tertiary electrons in this specification) discharged when back-scattered electrons generated by irradiating a sample with an electron beam collide with structures in a sample chamber. With use of the tertiary electrons, a SEM image is generated, and based on the SEM image, an ion beam processing state can be observed.

Abstract: An apparatus for testing photovoltaic cells wherein an array of light sources are provided. The light sources can have a collimating lens. In addition, one or more feedback circuits can be provided which monitor and maintain one or more of the light sources.

Abstract: Neutron optics based on the two-reflection geometries are capable of controlling beams of long wavelength neutrons with low angular divergence. The preferred mirror fabrication technique is a replication process with electroform nickel replication process being preferable. In the preliminary demonstration test an electroform nickel optics gave the neutron current density gain at the focal spot of the mirror at least 8 for neutron wavelengths in the range from 6 to 20 ?. The replication techniques can be also be used to fabricate neutron beam controlling guides.

Abstract: UV hard-surface disinfection system that is able to disinfect the hard surfaces in a room, while minimizing missed areas due to shadows by providing multiple UV light towers that can be placed in several areas of a room such that shadowed areas are eliminated and that can be transported by a cart that is low to the ground such that the towers may be loaded and unloaded easily by a single operator. The system is able to be controlled remotely, such that during activation of the system, no operator is present, and to automatically cut power to all towers in the event that a person enters the room.

Abstract: The invention concerns a passive terahertz radiation source configured to emit electromagnetic radiation having frequency in the range of 10 GHz to 50 THz and a method for generating a terahertz radiation. The passive terahertz radiation source comprises: a source of a pulsed excitation light; an emitter comprising one or more emitter elements, each emitter element comprising a semiconductor layer being arranged such that at least a portion of a first major surface of said semiconductor layer is exposed to the excitation light, wherein each emitter element is configured such that upon exposure to the excitation light, a gradient of the charge carrier density is generated in the semiconductor layer in the area of transition between a first area of the semiconductor layer and a second area of the semiconductor layer, the gradient being substantially parallel to the first major surface of the semiconductor layer.

Abstract: An LED-UV lamp that is easily interchangeable within a UV-curing process and scalable in length with a fine resolution so that it is easily customizable to any UV-curing application. The LED-UV lamp may incorporate multiple rows of LEDs and contain corresponding optics that effectively deliver radiant power to a substrate at distances of several inches.

Abstract: An electron gun, an electron source for an electron gun, an extractor for an electron gun, and a respective method for producing the electron gun, the electron source and the extractor are disclosed. Embodiments provide an electron source utilizing a carbon nanotube (CNT) bonded to a substrate for increased stability, reliability, and durability. An extractor with an aperture in a conductive material is used to extract electrons from the electron source, where the aperture may substantially align with the CNT of the electron source when the extractor and electron source are mated to form the electron gun. The electron source and extractor may have alignment features for aligning the electron source and the extractor, thereby bringing the aperture and CNT into substantial alignment when assembled. The alignment features may provide and maintain this alignment during operation to improve the field emission characteristics and overall system stability of the electron gun.

Abstract: A lighting module has an array of light-emitting elements that is electrically coupled to a heat sink and a housing having a heat exit. The array of light-emitting elements is positioned in the housing and the heat sink is positioned to dissipate heat generated within the housing so that the heat is expelled through the heat exit. A deflector is secured to the housing and is positioned to extend over some portion of the heat exit. The deflector guides heat away from the housing in a direction. In some configurations, the deflector guides heat away from the housing in a direction that is opposite the direction in which the array of light-emitting elements emit light. Also, some lighting modules have multiple heat exits and may have multiple deflectors extending over a portion of the respective heat exits.

Abstract: A laser-sustained light source having a first laser source for providing a first beam portion having a first characteristic, a second laser source for providing a second beam portion having a second characteristic, where the first characteristic is different from the first characteristic, first optics that are reflective to the first characteristic and transmissive of the second characteristic, for reflecting the first beam portion along a first path into a reflection optics and through a cell to sustain a plasma, second optics that are reflective to the second characteristic and transmissive of the first characteristic, for reflecting the second beam portion along a second path into the reflection optics and through the cell to sustain the plasma, the first path exiting to the second optics, where the first beam is transmitted through the second optics and into a beam dump, and the second path exiting to the first optics, where the second beam is transmitted through the first optics and into the beam dump.

Abstract: An optical system includes a first light source to radiate light in a first wavelength band, a reflector to reflect light from the first light source, a second light source to radiate light in a second wavelength band, and a reflector reflect the second light source. The fourth reflector is set at a first position to allow light from the first light source to each the condenser lens and set to a second position to allow light from the second light source to reach the condenser lens.

Abstract: A sanitizer for sanitizing a portable electronic device is provided, the sanitizer having a base including a cavity for receiving the electronic device, at least one ultraviolet radiation source for emitting ultraviolet radiation into the cavity, a cover cooperating with the base, the cover moving between an open position wherein the electronic device can be inserted into or removed from the cavity and a closed position wherein the cavity is enclosed so as to substantially maintain the ultraviolet radiation within the cavity, and a controller for enabling the ultraviolet radiation source to be activated only when the cover is closed.

Abstract: An extreme ultraviolet light source apparatus in which only particles having a high transmittance for EUV light adhere to an EUV collector mirror even if fast ions emitted from plasma collide with a structural member in a vacuum chamber, and thereby, the reflectance thereof is not easily degraded. The apparatus includes: a vacuum chamber; a target supply unit for supplying a target to a predetermined position in the vacuum chamber; a driver laser for applying a laser beam to the target to generate the plasma; a collector mirror for collecting and outputting extreme ultraviolet light emitted from the plasma; a collector mirror holder for supporting the collector mirror; and a shielding member formed of a material having a high transmittance for the extreme ultraviolet light, for shielding the structural member such as the collector mirror holder from the ions generated from the plasma.

Abstract: A light microscope for imaging a sample containing one or more fluorescent agents, comprising a source for generating acoustic waves that are focused at a focus in the sample, wherein the acoustic waves frequency shift a frequency of light passing through the focus, thereby creating a frequency shifted light beam; at least one spatial light modulator (SLM) positioned to illuminate the sample with an output beam that is an optical phase conjugate of the frequency shifted light beam, wherein the output beam is a reflection of a first reference beam off one or more pixels of the SLM, and the pixels are for modulating the first reference beam to create the output beam; and a detector positioned to detect fluorescence generated by the output beam exciting the fluorescent agents at the focus in the sample, thereby imaging the sample.

Abstract: An LED array with a plurality of easily replaceable LED assemblies. The LED assemblies are attached to a mounting substrate, e.g., by threaded, electrically insulative fasteners. The LED assemblies are electrically connected in a series by detachable power connect clamps and interconnect clamps. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims. 37 C.F.R. §1.72(b).

Abstract: A device for UV curing a coating or printed ink on an workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract: A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.

Abstract: A photoneutron-x ray source includes a photoneutron conversion target, which outputs both photoneutrons and x-rays simultaneously. The photoneutron-x ray source includes an x-ray generator for generating an x-ray main beam that is applied to the photoneutron conversion target. The photoneutron conversion target generates photoneutrons upon the application of the x-ray main beam to the photoneutron conversion target. The photoneutron conversion target has a body that defines a passageway extending through the body and that is structured such that a first x-ray beam of the x-ray main beam can pass through the passageway without any reaction with the body, while a second x-ray beam of the x-ray main beam can enter the body and react with the body to emit the photoneutrons.

Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

Abstract: A solar simulator which uses a honeycomb structure for providing highly collimated light for testing one or more photovoltaic cells.

Abstract: The sterilizing toybox apparatus addresses illness risk, especially with children, by providing UV light sterilization within. UV lighting is offered both above and beyond toys within the apparatus. A time-release latch ensures exposure for a time determined to be optimal for UV exposure of contents. The apparatus provides UV lighting both in the bottom of the chest and in the lid. The clear shelf above the lower UV bulbs is in communication with the vibrator that jostles any toys so that full UV exposure is ensured. Reflective material distributed fully within the chest further guarantees full exposure of contents to sterilization. Additionally, the optional mesh basket is selectively suspended within the chest.

Abstract: Micro-channel-cooled UV curing systems and components thereof are provided. According to one embodiment, a lamp head module includes an optical macro-reflector, an array of LEDs and a micro-channel cooler assembly. The array is positioned within the reflector and has a high fill factor and a high aspect ratio. The array provides a high irradiance output beam pattern having a peak irradiance of greater than 25 W/cm2 at a work piece surface at least 1 mm away from an outer surface of a window of the reflector. The micro-channel cooler assembly maintains a substantially isothermal state among p-n junctions of the LEDs at less than or equal to 80° Celsius. The micro-channel cooler assembly also provides a common anode substrate for the array. A thermally efficient electrical connection is formed between the array and the common anode substrate by mounting the array to the micro-channel cooler assembly.

Abstract: An EUV radiation source comprising a fuel supply (200) configured to deliver a droplet of fuel to a plasma generation location (201), a first laser beam source configured to provide a first beam of laser radiation (205) incident upon the fuel droplet at the plasma generation location and thereby vaporizes the fuel droplet, and a second laser beam source configured to subsequently provide a second beam of laser radiation (205) at the plasma generation location, the second beam of laser radiation being configured to vaporize debris particles (252) arising from incomplete vaporization of the fuel droplet.

Abstract: A sanitization apparatus having ultraviolet sanitization in an enclosed container to kill bacteria and other disease carrying organisms. A horizontal or vertical sanitization unit dimensioned to fit objects of varying sizes is provided. An ultraviolet source within the sanitization unit irradiates an object with UV light which, in one embodiment generates ozone gas, thereby killing any microorganisms that might reside on the object that is being sanitized. The ultraviolet light may be installed in either the base or the cover of the sanitization unit. The base and the cover may include reflective surfaces to allow ultraviolet light to reflect and reach different angles and sides of an object that is being sanitized.

Abstract: A lighting system for preventing a plant disease damage is provided with an ultraviolet light source which emits ultraviolet ray including UV-B in a wavelength region of 255 to 340 nm, a visible light source which emits visible light, and controllers which control a lighting of the ultraviolet light source and the visible light source. The controller controls the lighting of the ultraviolet light source so that a horizontal irradiance on a canopy surface of a plant is 50 ?W/cm2 or less during a predetermined daytime period. The controller controls the lighting of the visible light source so that a horizontal illuminance on a canopy surface of a plant is 10 lux or less during a predetermined nighttime period. The lighting system promotes a component change of the plant effectively by a stimulation by the UV-B irradiation and the prolonged irradiation time of the visible light which is associated with a vegetative growth, so that a nutritional component of the plant can stably be increased.

Abstract: In one embodiment, a system includes a first cold noise source, a first radiometer receiver, and a first detector. The first cold noise source generates a first thermal radiation signal having a first carrier frequency band. The first thermal radiation signal carries a first information signal. The first cold noise source also transmits the first thermal radiation signal through a first antenna. The first radiometer receiver receives the first thermal radiation signal through a second antenna, and the first detector extracts the first information signal from the first thermal radiation signal.

Abstract: An apparatus includes a chamber configured to support a number of quasi-orthogonal resonant modes, and at least one antenna assembly, where the antenna assembly includes an antenna having a radiating element, where (i) the antenna has predominantly linear polarization of radiation defined by a polarization plane, (ii) the radiating element is disposed within the chamber such that the polarization plane is not parallel and not perpendicular to the plane containing a primary axis of the chamber and a central point of the radiating element, and (iii) each antenna is coupled to the chamber through a designated surface of the chamber and coupled to a source of microwave or radio frequency energy external to the chamber having a nominal operating frequency.

Abstract: An extreme ultra violet light source apparatus by which EUV light can be efficiently obtained uses a driver laser which can realize a desired pulse width with substantially homogeneous intensity. The apparatus generates extreme ultra violet light by applying a laser beam to a target, and includes a chamber in which extreme ultra violet light is generated; a target supply unit which supplies a liquid or solid metal target to a predetermined position within the chamber; a laser beam generating unit which synthesizes pulse laser beams having delays different from one another to generate a single pulse laser beam or a pulse train laser beam having substantially homogeneous intensity, and applies the laser beam to the target supplied by the target supply unit to generate plasma; and a collector mirror which collects the extreme ultra violet light radiated from the plasma and outputs it.

Abstract: In at least one embodiment of the semiconductor light source (1), the latter comprises at least two planar elements (2). The planar elements (2) each contain a semiconductor material for producing ultraviolet or visible radiation (R) when the semiconductor light source (1) is in operation. The radiation (R) is in this case emitted at precisely one major face (3) of the planar elements (2). The reflectivity of the planar elements (2) for visible radiation, when the semiconductor light source (1) is not in operation, amounts to at least 80%. The planar elements (2) furthermore exhibit an average diameter (L) of at least 10 mm. Furthermore the major faces (3) of the planar elements (2) are arranged at an angle (?) to one another and facing one another. The angle (?) between the major faces (3) amounts in this case to between 30° and 120° inclusive.

Abstract: Irradiating assemblies can have a housing with a reflector extending linearly parallel to a lamp. Radiation can be emitted from one opening, for example in a bottom portion of the housing, as well as from another opening, for example a side opening in the housing. Irradiating assemblies can also have first and second reflector portions at angles with respect to each other wherein radiation is reflected out of a housing that does not have an end reflector. Irradiating assemblies can be configured to have cooling flow openings in side walls so that cooling fluid such as air can flow between the side walls and adjacent surfaces of a reflector. Irradiating assemblies can incorporate lamps having first and second electrodes wherein the first and second electrodes are oriented at an angle with respect to each other.

Abstract: Disclosed is a lighting device for use in the control of a plant disease, which has a light source capable of emitting light containing ultraviolet ray. The light source can emit both of UV-B having a wavelength component with a wavelength of about 280 to 340 um and UV-C in which a wavelength component with a wavelength of about 255 nm or less is cut off from wavelength components with wavelengths of about 100 to 280 nm to plant in a superimposed manner. The irradiation of a plant with the UV-C and the UV-B ensures to further inhibit the spore formation or the hypha growth of a filamentous fungus that causes a disease or the like, and to induce a resistance against a disease in the plant.

Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.