Radiant Energy Generation And Sources Patents (Class 250/493.1)
  • Patent number: 11017911
    Abstract: The disclosure pertains to a radiation source, such as an active insert, typically containing porous or microporous iridium or compounds, alloys or composites thereof within an encapsulation, and methods of manufacture thereof. The porosity or microporosity or low-density alloying ingredient with iridium causes a reduced density of the iridium within the active insert to be achieved.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: May 25, 2021
    Assignee: QSA GLOBAL, INC.
    Inventors: Mark G. Shilton, Mark W. Vose
  • Patent number: 11009460
    Abstract: Imaging a sample that includes phototransformable optical labels (“PTOLs”) with an optical system having a diffraction-limited resolution volume (DLRV), includes providing activation radiation to the PTOLs to activate a statistical subset of the PTOLs. A density of the PTOLs of the activated subset is less than an inverse of the DLRV. Excitation radiation is provided to the activated subset to excite activated PTOLs. Radiation emitted from the activated and excited PTOLs located at different focal planes of the optical system within the sample is detected with the optical system. The preceding steps are repeated one or more times, each time activating a different statistical subset of the plurality of PTOLs. Three-dimensional locations within the sample are determined, with a sub-diffraction-limited accuracy, of the activated and excited PTOLs based on the radiation emitted from the activated and excited PTOLs that is detected from the different focal planes of the optical system.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: May 18, 2021
    Assignee: Hestzig LLC
    Inventors: Robert Eric Betzig, Harald F. Hess
  • Patent number: 11002976
    Abstract: A far-infrared (FIR) emitter includes at least one far-infrared source for generating a far-infrared beam, a filter unit for filtering a wavelength range of the far-infrared beam, and a beam-expanding unit for expanding the far-infrared beam. The FIR emitter can generate a FIR light of a specific wavelength range to cover an expanded projection area.
    Type: Grant
    Filed: November 7, 2018
    Date of Patent: May 11, 2021
    Assignee: NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
    Inventors: San-Liang Lee, Ling-Hsiu Hung
  • Patent number: 10969690
    Abstract: A method of controlling a droplet illumination module/droplet detection module system of an extreme ultraviolet (EUV) radiation source includes irradiating a target droplet with light from a droplet illumination module and detecting light reflected and/or scattered by the target droplet. The method includes determining whether an intensity of the detected light is within an acceptable range. In response to determining that the intensity of the detected light is not within the acceptable range, a parameter of the droplet illumination module is automatically adjusted to set the intensity of the detected light within the acceptable range.
    Type: Grant
    Filed: July 6, 2018
    Date of Patent: April 6, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Jen-Yang Chung, Chieh Hsieh, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10966501
    Abstract: A nail lamp for curing UV-curable nail gel uses light emitting diodes (LEDs) that emit ultraviolet light and are relatively lower power. The nail lamp is powered from an exterior power source, such as a wall socket, or by a rechargeable battery pack. A battery compartment of the nail lamp holds the battery pack, which is removable without disassembling the nail lamp. The nail lamp is easily transportable to different locations and can be used even when a wall socket is unavailable. A curing time of the nail lamp is user-selectable. The nail lamp can also include detection sensors to detect a person's hand or foot in a treatment chamber and automatically turn on or off the LEDs.
    Type: Grant
    Filed: November 19, 2019
    Date of Patent: April 6, 2021
    Assignee: LeChat
    Inventor: Newton Luu
  • Patent number: 10964853
    Abstract: Wavelength converters including coarse particles/grains of a red nitride phosphor are disclosed. In some embodiments the red nitride phosphor is a (Ca,Sr,Ba)2Si5N8:Eu phosphor with a D50 grain size or a D50 particle size that is ?5 microns. The red nitride phosphor may be encapsulated within an organic matrix or present in an inorganic matrix. In the latter case, the inorganic matrix may include fine grains with a D50 grain size <5 microns. Methods of making such wavelength converters and devices including such wavelength converters are also described.
    Type: Grant
    Filed: September 19, 2016
    Date of Patent: March 30, 2021
    Assignee: Osram Oled GmbH
    Inventors: Yi Zheng, Sonja Tragl, Juliane Kechele, Johanna Strube-Knyrim, Madis Raukas, Stefan Lange, Daniel Bichler
  • Patent number: 10959318
    Abstract: Methods and systems for x-ray based semiconductor metrology utilizing a broadband, soft X-ray illumination source are described herein. A laser produced plasma (LPP) light source generates high brightness, broadband, soft x-ray illumination. The LPP light source directs a highly focused, short duration laser source to a non-metallic droplet target in a liquid or solid state. In one example, a droplet generator dispenses a sequence of nominally 50 micron droplets of feed material at a rate between 50 and 400 kilohertz. In one aspect, the duration of each pulse of excitation light is less than one nanosecond. In some embodiments, the duration of each pulse of excitation light is less than 0.5 nanoseconds. In some embodiments, the LPP light source includes a gas separation system that separates unspent feed material from other gases in the plasma chamber and provides the separated feed material back to the droplet generator.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: March 23, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: Oleg Khodykin, Alexander Bykanov
  • Patent number: 10955749
    Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: March 23, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Dzmitry Labetski, Christianus Wilhelmus Johannes Berendsen, Rui Miguel Duarte Rodriges Nunes, Alexander Igorevich Ershov, Kornelis Frits Feenstra, Igor Vladimirovich Fomenkov, Klaus Martin Hummler, Arun Johnkadaksham, Matthias Kraushaar, Andrew David Laforge, Marc Guy Langlois, Maksim Loginov, Yue Ma, Seyedmohammad Mojab, Kerim Nadir, Alexander Shatalov, John Tom Stewart, IV, Henricus Gerardus Tegenbosch, Chunguang Xia
  • Patent number: 10925143
    Abstract: A laser apparatus includes an optical element disposed on a laser beam axis, an actuator configured to displace the optical element to displace the laser beam axis, a driving amount monitor configured to monitor a driving amount of the actuator, an optical axis monitor disposed along the laser beam axis and configured to monitor the laser beam axis, and a control unit configured to control the actuator based on a monitoring result of the optical axis monitor and determine abnormality of the optical element based on a monitoring result of the driving amount monitor.
    Type: Grant
    Filed: November 5, 2019
    Date of Patent: February 16, 2021
    Assignee: Gigaphoton Inc.
    Inventor: Katsuhiko Wakana
  • Patent number: 10917959
    Abstract: A method and system for generating EUV light includes providing a laser beam having a Gaussian distribution. This laser beam can be then modified from a Gaussian distribution to a ring-like distribution. The modified laser beam is provided through an aperture in a collector and interfaces with a moving droplet target, which generates an extreme ultraviolet (EUV) wavelength light. The generated EUV wavelength light is provided to the collector away from the aperture. In some embodiments, a mask element may also be used to modify the laser beam to a shape.
    Type: Grant
    Filed: September 29, 2019
    Date of Patent: February 9, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chun-Lin Louis Chang, Jen-Hao Yeh, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10893737
    Abstract: A nail lamp for curing UV-curable nail gel uses light emitting diodes (LEDs) that emit ultraviolet light and are relatively lower power. The nail lamp is powered from an exterior power source, such as a wall socket, or by a rechargeable battery pack. A battery compartment of the nail lamp holds the battery pack, which is removable without disassembling the nail lamp. The nail lamp is easily transportable to different locations and can be used even when a wall socket is unavailable. A curing time of the nail lamp is user-selectable. The nail lamp can also include detection sensors to detect a person's hand or foot in a treatment chamber and automatically turn on or off the LEDs.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: January 19, 2021
    Assignee: LeChat
    Inventor: Newton Luu
  • Patent number: 10886187
    Abstract: An encapsulated integrated circuit is provided that includes an integrated circuit (IC) die. An encapsulation material encapsulates the IC die. A phononic bandgap structure is included within the encapsulation material that is configured to have a phononic bandgap with a frequency range approximately equal to a range of frequencies of thermal phonons produced by the IC die when the IC die is operating.
    Type: Grant
    Filed: October 24, 2017
    Date of Patent: January 5, 2021
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Benjamin Stassen Cook, Daniel Lee Revier
  • Patent number: 10879445
    Abstract: A quantum emitter device is composed of a hole milled in a layer of hexagonal boron nitride (hBN) on a substrate made of silicon dioxide. The hole preferably has a side wall angle 1.1°±0.28° from the horizontal, has an oval shape with minor axis 516 nm±20 nm and major axis 600 nm±20 nm, and/or has a depth 4 nm±1 nm. The hBN layer preferably has a total thickness of 5-10 nm. The holes may be fabricated using a gallium focused ion beam, a helium focused ion beam, electron beam directed etching, or photolithography and reactive ion etch (RIE) with sidewall tapering.
    Type: Grant
    Filed: February 12, 2020
    Date of Patent: December 29, 2020
    Assignee: University of Oregon
    Inventors: Benjamín J. Alemán, Joshua E. Ziegler
  • Patent number: 10859928
    Abstract: An extreme ultraviolet (EUV) radiation source apparatus includes a collector and a target droplet generator for generating a tin (Sn) droplet. A debris collection device is disposed over a reflection surface of the collector, and at least one drip hole is located between the debris collection device and the collector. A tin bucket for collecting debris from the debris collection device is located below the at least one drip hole, and a tube or guide rod extends from the drip hole to the tin bucket.
    Type: Grant
    Filed: May 17, 2019
    Date of Patent: December 8, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Chih Chen, Sheng-Kang Yu, Chi Yang, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10849214
    Abstract: A method of operating a semiconductor apparatus includes generating a target material droplet; exciting the target material droplet to generate radiation for exposing a wafer; receiving, by a catcher, the target material droplet after exciting the target material droplet, in which the catcher has a front section, a rear section, and a drain port at the rear section; heating the rear section of the catcher such that the target material droplet in the rear section is in a liquid phase; and maintaining a temperature of the front section of the catcher lower than a temperature of the rear section of the catcher.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: November 24, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Po-Ming Shih, Chi-Hung Liao
  • Patent number: 10842009
    Abstract: A method for extreme ultraviolet (EUV) lithography includes generating a target droplet, producing a target plume by heating the target droplet with a first laser pulse, directing first and second laser beams onto the target plume, and receiving the first and the second laser beams reflected by the target plume.
    Type: Grant
    Filed: June 3, 2019
    Date of Patent: November 17, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chun-Chia Hsu, Chieh Hsieh, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng, Tzung-Chi Fu, Bo-Tsun Liu
  • Patent number: 10814490
    Abstract: In one embodiment, the present disclosure provides a target or mold having one or more support arms coupled to a substrate. The support arm can be used in handling or positioning a target. In another embodiment, the present disclosure provides target molds, targets produced using such molds, and a method for producing the targets and molds. In various implementations, the targets are formed in a number of disclosed shapes, including a funnel cone, a funnel cone having an extended neck, those having Gaussian-profile, a cup, a target having embedded metal slugs, metal dotted foils, wedges, metal stacks, a Winston collector having a hemispherical apex, and a Winston collector having an apex aperture. In yet another embodiment, the present disclosure provides a target mounting and alignment system.
    Type: Grant
    Filed: January 12, 2018
    Date of Patent: October 27, 2020
    Assignee: Board of Regents of the Nevada System of Higher Education, on behalf of the University of Nevada, Reno
    Inventors: Steven Malekos, Grant Korgan, Jesse D. Adams
  • Patent number: 10782189
    Abstract: The present invention relates to a blackbody radiation source. The blackbody radiation source comprises a blackbody radiation cavity and a plurality of carbon nanotubes. The blackbody radiation cavity comprises an inner surface. A carbon nanotube array located on the inner surface of the blackbody radiation cavity. The carbon nanotube array comprises a plurality of carbon nanotubes, and an extending direction of each carbon nanotube is substantially perpendicular to the inner surface. The carbon nanotube array comprises a first surface and a second surface. The first surface is in contact with the inner surface and the second surface is far away from the inner surface. The plurality of carbon nanotubes extend from the first surface to the second surface. A plurality of microstructures are formed on the second surface of the carbon nanotube array.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: September 22, 2020
    Assignees: Tsinghua University, HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Yang Wei, Guang Wang, Shou-Shan Fan
  • Patent number: 10764986
    Abstract: An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction, unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: September 1, 2020
    Assignee: Gigaphoton Inc.
    Inventors: Shinji Nagai, Tamotsu Abe, Hitoshi Nagano, Osamu Wakabayashi
  • Patent number: 10730594
    Abstract: The invention provides an element comprising: an electrical component, an optical medium comprising medium material comprising a silicone transmissive for one or more of UV radiation and visible radiation, wherein the electrical component is embedded in the optical medium, an electrical connector for functionally coupling the electrical component external to the optical medium, wherein the electrical connector is embedded in the optical medium over at least part of its length; and a water barrier at least partly embedded in the optical medium and configured to enclose at least part of the electrical connector.
    Type: Grant
    Filed: April 17, 2019
    Date of Patent: August 4, 2020
    Assignee: Koninklijke Philips N.V.
    Inventors: Esther Anna Wilhelmina Gerarda Janssen, Bart Andre Salters, Roelant Boudewijn Hietbrink, Cornelis Gerardus Visser
  • Patent number: 10723637
    Abstract: A liquid treatment apparatus including: a tubular treatment tank whose end along a central axis is closed and sectional shape orthogonal to the central axis is a circular shape; a first electrode disposed on one end of the central axis of the treatment tank and having a bar shape; a second electrode disposed on the other end thereof; a power supply applying voltage between the first electrode and the second electrode; a rotation mechanism rotating the first electrode about a central axis of the first electrode; and an air introduction portion introducing the liquid to the one end of the central axis of the treatment tank from a tangential direction of the circular sectional shape of the treatment tank, and causing liquid to swirl about the central axis of the treatment tank therein to generate a gas phase in a swirling flow of the liquid.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: July 28, 2020
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Genichiro Matsuda, Takahiro Kitai, Gaku Miyake, Yoshio Yamada
  • Patent number: 10718881
    Abstract: Technologies for providing optical analysis systems using an integrated computational element with laterally-distributed spectral filters are described. A measurement tool contains an optical element including a substrate and a plurality of spectral filters supported by the substrate and arranged at different lateral positions with respect to a path of light to be received from a sample during operation of the measurement tool. Each spectral filter is formed to transmit or reflect a different subset of wavelengths in a wavelength range. Additionally, each spectral filter has a respective area exposed to the light from the sample, such that the respective areas are related to a property of the sample. The wavelength range can include wavelengths in a range from about 0.2 ?m to about 25 ?m. Additionally, the sample can include wellbore fluids and the property of the sample is a property of the well-bore fluids.
    Type: Grant
    Filed: July 9, 2013
    Date of Patent: July 21, 2020
    Assignee: Halliburton Energy Services, Inc.
    Inventors: David L. Perkins, Li Gao, Michael T. Pelletier
  • Patent number: 10712480
    Abstract: A diffusive layer including a laminate of a plurality of transparent films is provided. At least one of the plurality of transparent films includes a plurality of diffusive elements with a concentration that is less than a percolation threshold. The plurality of diffusive elements are optical elements that diffuse light that is impinging on such element. The plurality of diffusive elements can be diffusively reflective, diffusively transmitting or combination of both. The plurality of diffusive elements can include fibers, grains, domains, and/or the like. The at least one film can also include a powder material for improving the diffusive emission of radiation and a plurality of particles that are fluorescent when exposed to radiation.
    Type: Grant
    Filed: October 22, 2018
    Date of Patent: July 14, 2020
    Assignee: Sensor Electronic Technology, Inc.
    Inventors: Alexander Dobrinsky, Michael Shur
  • Patent number: 10697740
    Abstract: A label comprising some figures that can be recognized by infrared vision devices. The main object is to put a figure surface on or near a reference surface and cooling one of these surfaces, in order to achieve “cool” surface and “warm” surface, enabling infrared vision devices to discriminate between the surfaces. The cooling of the surface is achieved by a “Latent heat” effect due to a evaporation of a liquid absorbed on said surface.
    Type: Grant
    Filed: May 25, 2017
    Date of Patent: June 30, 2020
    Assignee: RESHET GRAF LTD.
    Inventor: Oron Ohayon
  • Patent number: 10680401
    Abstract: The present disclosure relates more particularly to active optical fibers, amplified spontaneous emission (ASE) sources using such active optical fibers, and imaging and detection systems and methods using such ASE sources. In one aspect, the disclosure provides an active optical fiber that includes a rare earth-doped gain core configured to emit radiation at at least a peak wavelength emitted wavelength when pumped with pump radiation having a pump wavelength; a pump core surrounding the gain core; and a cladding surrounding the pump core, wherein the value M=16R2(NA)2/?2 in which R is the gain core radius, NA is the active optical fiber numerical aperture, and ? is the peak emitted wavelength, is at least 50, or at least 100. The present disclosure also provides an optical source that includes the optical fiber coupled to a pump source.
    Type: Grant
    Filed: May 31, 2016
    Date of Patent: June 9, 2020
    Assignees: Nufern, Yale University
    Inventors: Brandon Redding, Peyman Ahmadi, Martin Seifert, Hui Cao
  • Patent number: 10674591
    Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: June 2, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jason Riggs, Robert Jay Rafac
  • Patent number: 10617886
    Abstract: To provide an accelerator that easily provides a space for placing equipment incorporated into an accelerator magnet, and that has a dense region with small turn separations of beams and a sparse region with large turn separations of the beams in different positions in the beam orbit direction. A pair of magnetic poles (8, 9) has a depression structure of a plurality of depression and projection structures, in a position intersecting with a vertical plane (3). A boundary surface (41, 44, 45, 48) between the depression structure (21, 23) placed in a position intersecting with the vertical plane (3) and a projection structure (31, 32, 33, 34) adjacent to the depression structure has unanimously either a projection shape or a depression shape with respect to the vertical plane (3).
    Type: Grant
    Filed: November 1, 2017
    Date of Patent: April 14, 2020
    Assignee: Hitachi, Ltd.
    Inventor: Chishin Hori
  • Patent number: 10586887
    Abstract: Disclosed are a deterministic quantum emitter operating at room temperature in an optical communication wavelength using the intersubband transition of a nitride-based semiconductor quantum dot, a method of fabricating the same, and an operating method thereof. A method of fabricating a quantum emitter includes forming a three-dimensional (3-D) structure in a substrate, forming an n type-doped thin film at the upper part of the 3-D structure, forming a quantum dot over the n type-doped thin film, regrowing the 3-D structure in order to use the 3-D structure as an optical structure, depositing a metal thin film at a vertex of the 3-D structure, and connecting electrodes to an n type-doped area and the metal thin film, respectively. A carrier may be captured in the quantum dot by applying a voltage to the connected electrodes. The quantum emitter may be driven by optically exciting the quantum dot.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: March 10, 2020
    Assignee: Korea Advanced Institute of Science and Technology
    Inventors: Yong-Hoon Cho, Hwanseop Yeo, JongHoi Cho
  • Patent number: 10588210
    Abstract: High-brightness short-wavelength radiation source contains a vacuum chamber with a rotating target assembly having an annular groove, an energy beam focused on the target, a useful short-wavelength radiation beam coming out of the interaction zone, wherein the target is a layer of molten metal formed by a centrifugal force on a surface of the annular groove facing a rotation axis. A replaceable membrane made of carbon nanotubes may be installed on a pathway of the short-wavelength radiation beam for debris mitigation. In the embodiments of the invention the energy beam is a pulsed laser beam. The pulsed laser beam may consist of pre-pulse and main-pulse, with parameters such as laser pulse repetition rate chosen in order to suppress debris. In other embodiments the energy beam is the electron beam produced by an electron gun and the rotating target assembly is a rotating anode.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: March 10, 2020
    Assignees: Isteq B.V., RnD-ISAN, Ltd
    Inventors: Aleksandr Yurievich Vinokhodov, Vladimir Vitalievich Ivanov, Konstantin Nikolaevich Koshelev, Mikhail Sergeyevich Krivokorytov, Vladimir Mikhailovich Krivtsun, Aleksandr Andreevich Lash, Vyacheslav Valerievich Medvedev, Yury Viktorovich Sidelnikov, Oleg Feliksovich Yakushev, Oleg Borisovich Khristoforov, Denis Aleksandrovich Glushkov, Samir Ellwi
  • Patent number: 10568980
    Abstract: A nozzle-type electron beam irradiation device includes a vacuum chamber, an electron beam generator disposed in the vacuum chamber, and a vacuum nozzle that is connected to the vacuum chamber so as to guide an electron beam from the electron beam generator and emit the electron beam to the outside. The nozzle-type electron beam irradiation device includes a high-vacuum pump capable of sucking gas from the vicinity of the connecting part of the vacuum nozzle in the vacuum chamber.
    Type: Grant
    Filed: December 26, 2016
    Date of Patent: February 25, 2020
    Assignee: HITACHI ZOSEN CORPORATION
    Inventors: Takeshi Noda, Ichiro Sakai, Hiroyuki Daiku
  • Patent number: 10558028
    Abstract: A super-resolution microscope includes an illuminator and a detector. The illuminator irradiates illumination beams of different wavelengths through an objective lens onto a sample while causing at least a portion of the illumination beams to overlap spatially and temporally. The detector detects a signal beam generated by the sample as a result of irradiation of the sample with the illumination beams. The illumination beams include a first illumination beam that induces a first nonlinear optical process with respect to the sample and a second illumination beam that induces a second nonlinear optical process that suppresses the first nonlinear optical process. The nonlinear susceptibility of the second nonlinear optical process is greater than the nonlinear susceptibility of the first nonlinear optical process.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: February 11, 2020
    Assignees: OLYMPUS CORPORATION, UNIVERSITY OF TSUKUBA
    Inventors: Yoshinori Iketaki, Hideaki Kanou
  • Patent number: 10549125
    Abstract: A radiotherapy apparatus includes a rotatable drum on which is mounted a gantry arm carrying a radiation source. The arm extending from the drum to a location of the radiation source is offset from the axis of rotation of the drum and oriented towards the axis. The radiotherapy apparatus further includes a mechanism configured to apply a tilt to the arm at one or more rotational orientations of the drum. The rotatable drum is supported on wheels beneath the drum, and the mechanism is an eccentric mechanism within the wheels and is configured to apply the tilt to the arm via the wheels.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: February 4, 2020
    Assignee: Elekta AB (Publ)
    Inventors: Per Harald Bergfjord, Francesco Gnoato
  • Patent number: 10538448
    Abstract: Process for confinement of waste containing at least one chemical species to be confined, by in-can vitrification in a hot metal can into which waste and a vitrification additive are added, the waste and the vitrification additive are melted to obtain a glass melt which is then cooled, characterised in that at least one oxidising agent is also added into the metal can and in that the concentration of oxidising agent(s) expressed as oxide(s) in the glass melt is between 0.1 and 20% by mass, preferably 4 and 20% by mass, even more preferably 5 and 15% by mass, and even more preferably 10 and 13% by mass of the glass melt mass.
    Type: Grant
    Filed: July 28, 2009
    Date of Patent: January 21, 2020
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Philippe Gruber, Olivier Pinet, Hélène Rabiller, Roger Boen, Nicolas Bousquet, Jean-Luc Dussossdy, Jacques Lacombe
  • Patent number: 10512149
    Abstract: An extreme UV light generation device may include: a chamber having a plasma generation region at an inside of the chamber, the chamber receiving a target substance externally supplied to the plasma generation region; an outlet port provided on the chamber; a magnetic field generating unit configured to generate a magnetic field to converge cations on the outlet port, the cations being generated from the target substance that has been turned into plasma in the plasma generation region; an electron emission unit configured to emit electrons neutralizing the cations; and an exhaust tube joined to the outlet port and through which a neutralized substance obtained by neutralizing the cations flows.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: December 17, 2019
    Assignee: Gigaphoton Inc.
    Inventors: Tsukasa Hori, Shinji Okazaki
  • Patent number: 10499485
    Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.
    Type: Grant
    Filed: April 25, 2018
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Gerhardus Winkels, Georgiy O. Vaschenko, Theodorus Wilhelmus Driessen, Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Wilhelmus Henricus Theodorus Maria Aangenent
  • Patent number: 10492284
    Abstract: An extreme ultraviolet (EUV) generating device is provided. The EUV generating device includes a gas cell housing extending in a first direction, a light guide passage extending through the gas cell housing in the first direction, and a gas supply passage to supply a plasma reaction gas. The light guide passage includes an incident portion to receive incident light, a plasma reaction portion, extending from the incident portion in the first direction to generate EUV light due to a reaction between the incident light and the plasma reaction gas, and an emission portion, extending from the plasma reaction portion in the first direction, to emit the EUV light in the first direction. The gas supply passage may be connected to the plasma reaction portion at a side of the gas cell housing and may be inclined at an acute angle with respect to the first direction.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: November 26, 2019
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Hyun Joo Lee, Kyung Sik Kang, Ji-Hyun Lim
  • Patent number: 10477935
    Abstract: A nail lamp for curing UV-curable nail gel uses light emitting diodes (LEDs) that emit ultraviolet light and are relatively lower power. The nail lamp is powered from an exterior power source, such as a wall socket, or by a rechargeable battery pack. A battery compartment of the nail lamp holds the battery pack, which is removable without disassembling the nail lamp. The nail lamp is easily transportable to different locations and can be used even when a wall socket is unavailable. A curing time of the nail lamp is user-selectable. The nail lamp can also include detection sensors to detect a person's hand or foot in a treatment chamber and automatically turn on or off the LEDs.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: November 19, 2019
    Assignee: LeChat
    Inventor: Newton Luu
  • Patent number: 10384076
    Abstract: A flexible light therapy device, a bandage and a plaster for providing a therapeutic effect to a treatment target area (226) of a living being are provided. The flexible light therapy device comprises a light source (214) for emitting light (220), a light transmitting element (212) and a heat management means (210). The light transmitting element (212) is of a flexible light transmitting material and is optically coupled to the light source (214). The light transmitting element (212) comprises a light exit window (222) to emit the light (220) towards the treatment target area (226). The heat management means (210) is thermally coupled to the treatment target area (226) and distributes heat and controls the distribution of heat across the treatment target area (226). Part of the distributed heat may originate from the light source (214).
    Type: Grant
    Filed: August 9, 2011
    Date of Patent: August 20, 2019
    Assignee: KONINKLIJKE PHILIPS N.V.
    Inventors: Giovanna Wagenaar Cacciola, Elvira Johanna Maria Paulussen, Jorgen Meeusen, Gregorius Wilhelmus Maria Kok, Georges Marie Calon, Guofu Zhuo, Liesbeth Van Pieterson, Claudia Mutter
  • Patent number: 10381216
    Abstract: An optical system for generating broadband light via light-sustained plasma formation includes a chamber, an illumination source, a set of focusing optics, and a set of collection optics. The chamber is configured to contain a buffer material in a first phase and a plasma-forming material in a second phase. The illumination source generates continuous-wave pump illumination. The set of focusing optics focuses the continuous-wave pump illumination through the buffer material to an interface between the buffer material and the plasma-forming material in order to generate a plasma by excitation of at least the plasma-forming material. The set of collection optics receives broadband radiation emanated from the plasma.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: August 13, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Ilya Bezel, Anatoly Shchemelinin, Eugene Shifrin, Matthew Panzer
  • Patent number: 10357094
    Abstract: A compact portable LED nail curing lamp has surface-mounted light emitting diode (SMD LED) lights. The lamp provides fast and consistent results producing high gloss finish and even curing of nail polish (e.g., UV-curable gel polish). The nail lamp has a micro USB port, which can be used to power the lamp using a wall adapter, car charger, laptop USB port, or mobile power bank for ultimate portability. In an implementation, a system includes a compact LED nail curing lamp and a mobile power battery pack. The system also includes a cable to connect the nail lamp and the mobile power battery pack. The battery pack provides portable power to the nail lamp so that the nail lamp can be used portably, such as during travel or on an airplane when a wall outlet is unavailable.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: July 23, 2019
    Assignee: LeChat
    Inventor: Newton Luu
  • Patent number: 10347605
    Abstract: Embodiments of the present invention disclose a computer system having a plurality of quantum circuits arranged in a two-dimensional plane-like structure, the quantum circuits comprising qubits and busses (i.e., qubit-qubit interconnects), and a method of formation therefor. A quantum computer system comprises a plurality of quantum circuits arranged in a two-dimensional pattern. At least one interior quantum circuit, not along the perimeter of the two-dimensional plane of the plurality of quantum circuits, contains a bottom chip, a device layer, a top chip, and a routing layer. A signal wire connects the device layer to the routing layer, wherein the signal wire breaks the two dimensional plane, for example, the signal wire extends into a different plane.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: July 9, 2019
    Assignee: International Business Machines Corporation
    Inventors: Martin O. Sandberg, David C. McKay, Patryk M. Gumann, Hanhee Paik, Jay M. Gambetta
  • Patent number: 10345565
    Abstract: A microscopy system that includes a first laser emitting a first laser pulse along a first beam line, the first laser pulse being converted into an annular Bessel pump beam; and a second laser emitting a second laser pulse along a second beam line, the second laser pulse being a probe beam, the annular Bessel pump beam and the probe beam being delivered to a sample at right angles to each other allowing the annular Bessel pump beam to shrink a focal axial diameter of the second beam line thereby enabling dipole-like backscatter stimulated emission along the second beam line.
    Type: Grant
    Filed: March 22, 2017
    Date of Patent: July 9, 2019
    Inventor: Robert David Frankel
  • Patent number: 10342111
    Abstract: An electromagnetic pulse protecting method includes: searching a threat 2 that generates an electromagnetic pulse 2a; and generating plasma 6 in a light-condensed point 4 by condensing a laser beam 5 on a light-condensed point 4 in response to detection of the threat 2. Thus, various protection objects which contain a protection object having an electric opening indispensably can be protected from an attack by the electromagnetic pulse.
    Type: Grant
    Filed: April 14, 2016
    Date of Patent: July 2, 2019
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Shingo Nishikata, Yoshikatsu Kuroda, Hiroshi Ikebuchi, Koichi Hamamoto, Tomoya Morioka, Atsushi Ochiai
  • Patent number: 10331035
    Abstract: A method for generating a radiation light in a lithography exposure system. The method includes producing a predetermined gas pressure in a storage chamber to supply a first load of a target fuel in the storage chamber via a nozzle. The method further includes irradiating the target fuel from the nozzle with a laser to generate the radiation light. The method also includes increasing the gas pressure in a buffer chamber which receives a second load of target fuel to the predetermined gas pressure. In addition, the method includes actuating the flow of the target fuel from the buffer chamber to the storage chamber.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: June 25, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Cheng-Hao Lai, Han-Lung Chang, Li-Jui Chen
  • Patent number: 10328168
    Abstract: This invention employs a computer system or a programmable logic controller (computer) with a specific wireless communication protocol (BLE) to allow for remote connectivity of the germicidal UV device to display the status of the disinfection cycle and to operate the device and send and transfer data wirelessly to the Cloud via the BLE interface. A dose sensitive coupon, which can undergo color change in response to UV dosage, can also be used.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: June 25, 2019
    Assignee: ULTRAVIOLET DEVICES, INC.
    Inventors: Peter Veloz, Ashish Mathur, Aleksandr Shostak, Richard Hayes, David Witham, Mitch Babkes, Filiberto Betancourt, Lev Rotkop, Stuart Tyrrell, Walt Maclay, Dan Brown
  • Patent number: 10324314
    Abstract: An optical device includes a nanostructured transparent dielectric film, which is a Huygens metasurface. The Huygens metasurface imparts a phase change to light propagating through or reflecting from the surface. The phase change can be achieved by means of a resonant interaction between light and the Huygens resonators, resulting in a controllable phase change of 0 to 2? with approximately 100% light transmission characterized by a below 0.1 dielectric loss tangent of delta and with the height of the resonators less than the wavelength of light. In one embodiment, the metasurface includes titanium dioxide, but many materials or stacks of different materials may be used. The optical device is functional throughout the visible spectrum between 380 and 700 nm. The nanostructured transparent dielectric film includes a plurality of Huygens resonators.
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: June 18, 2019
    Assignee: UChicago Argonne, LLC
    Inventors: David A. Czaplewski, Daniel Lopez, Tapashree Roy
  • Patent number: 10314153
    Abstract: A method includes providing a target material that comprises a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; measuring one or more characteristics associated with one or more of the target material and the modified target relative to the first beam of radiation; and controlling an amount of radiant exposure delivered to the target material from the first beam of radiation based on the one or more measured characteristics to within a predetermined range of energies.
    Type: Grant
    Filed: October 3, 2017
    Date of Patent: June 4, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jason Riggs, Robert Jay Rafac
  • Patent number: 10292252
    Abstract: An input coupler for an accelerating cavity includes a cylindrical external conductor; a cylindrical internal conductor arranged coaxially with the external conductor, inside of which a heating medium circulates; a plate provided between the inner surface of the external conductor and the outer surface of the internal conductor; a cooling part for cooling the plate from the external conductor side to the freezing point of water or lower; and a heat insulating part provided on the part at which the internal conductor and the plate are connected, the heat insulating part having lower thermal conductivity than that of the internal conductor. The plate is connected to the internal conductor via the heat insulating part.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: May 14, 2019
    Assignee: MITSUBISHI HEAVY INDUSTRIES MACHINERY SYSTEMS, LTD.
    Inventors: Kazunori Okihira, Katsuya Sennyu, Ryuichi Matsuda
  • Patent number: 10268118
    Abstract: An extreme ultraviolet light generating apparatus includes a light collecting mirror that reflects and focuses extreme ultraviolet light, and a magnet that generates a magnetic field. The light collecting mirror includes a first mirror portion that includes a first reflective surface formed by a portion of a spheroidal surface, and a second mirror portion that includes a second reflective surface having a focal point at substantially the same position as a focal point of the first reflective surface, formed by a portion of a spheroidal surface different from that of the first reflective surface. The second reflective surface is provided at a position at which a magnetic flux density caused by the magnetic field is lower than that of the first reflective surface.
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: April 23, 2019
    Assignee: Gigaphoton Inc.
    Inventor: Yoshifumi Ueno
  • Patent number: 10264866
    Abstract: A nail lamp for curing UV-curable nail gel uses light emitting diodes (LEDs) that emit ultraviolet light and are relatively lower power. The nail lamp is powered from an exterior power source, such as a wall socket, or by a rechargeable battery pack. A battery compartment of the nail lamp holds the battery pack, which is removable without disassembling the nail lamp. The nail lamp is easily transportable to different locations and can be used even when a wall socket is unavailable. A curing time of the nail lamp is user-selectable. The nail lamp can also include detection sensors to detect a person's hand or foot in a treatment chamber and automatically turn on or off the LEDs.
    Type: Grant
    Filed: November 6, 2018
    Date of Patent: April 23, 2019
    Assignee: LeChat
    Inventor: Newton Luu