Abstract: There is provided a projection exposure system operable in a scanning mode along a scanning direction. The projection exposure system includes a collector that receives light having a wavelength ?193 nm and illuminates a region in a plane. The plane is defined by a local coordinate system having a y-direction parallel to the scanning direction and an x-direction perpendicular to the scanning direction. The collector includes (a) a first mirror shell, (b) a second mirror shell within the first mirror shell, and (c) a fastening device for fastening the first and second mirror shells. The mirror shells are substantially rotational symmetric about a common rotational axis. The fastening device has a support spoke that extends in a radial direction of the mirror shells, and the support spoke, when projected into the plane, yields a projection that is non-parallel to the y-direction.

Abstract: By using a large area cathode, an electron source can be made that can irradiate a large area more uniformly and more efficiently than currently available devices. The electron emitter can be a carbon film cold cathode, a microtip or some other emitter. It can be patterned. The cathode can be assembled with electrodes for scanning the electron source.

Abstract: There is provided an illumination system for EUV-wavelengths. The illumination system includes a plurality of EUV-light sources and an optical unit combining the plurality of EUV-light sources.

Abstract: In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost.

Abstract: There is provided a collector for illumination systems for light having a wavelength ?193 nm comprising. The collector includes (a) a first mirror shell adjacent to, and positioned inside of, a second mirror shell around a common axis of rotation, in which the first and second mirror shells are rotationally symmetric, and (b) a component in a region between the first and second mirror shells. The collector is for receiving the light from a light source via an object-side aperture and for illuminating an area in an image-side plane, and the region is not used by the light.

Abstract: A method of generating photons by sonoluminescence, from a gas bubble trapped in a liquid reservoir (2) by a standing ultrasound wave. An ultrasound impulse emitted by high-frequency transducers (T1–T8) is superposed on the standing wave, the high-frequency transducers being pre-focused onto the gas bubble and pre-synchronized with the light emissions from the gas bubble during an initial training stage in which said focusing and said synchronization are optimized.

Abstract: An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.

Abstract: A normalization apparatus and method for a PET scanner with panel detectors for obtaining an estimate of a normalization array, for correction for count rate effects on the normalization array, and for measurement of the relation between the normalization array and the count rate. The method of the present invention is based on two quasi-independent radial and axial components, which are count rate dependent due to sensitivity changes across the detector blocks. A scatter source is disposed at the center of the FOV and a scatter-free source is disposed at the outer edge of the FOV. The method computes the normalization array through several steps which evaluate the geometric profile, the axial profile, and the correction factor. A count rate correction is introduced to extend the normalization array to any count rate.

Abstract: Pre-cleaning or in situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating the optical component with microwave and/or infra-red radiation, preferably infra-red radiation having a wavelength or a range of wavelengths in the range of from 1000 cm?1 to 4600 cm?1. This technique may be suitable for cleaning a mask. By monitoring the absorption of microwave and/or infra-red radiation directed at a contaminated optical component, the degree of contamination of said component can be qualified. This method may also be suitable for reducing the partial pressure of water in EUV apparatus.

Abstract: A heat controlled ultraviolet light apparatus includes a source of ultraviolet light, a cover, and a heating or cooling element that heats/cools the space or gap between the ultraviolet light source and the cover. Accordingly, the ultraviolet light source may be maintained at an optimal temperature thereby maximizing the efficiency of the ultraviolet light source in producing ultraviolet radiation. The apparatus may further include a temperature sensor and a control circuit to automatically control production of heat/cooling by the element based upon the ambient temperatures experienced by the ultraviolet light source during use. Methods are also provided for sanitizing heating and cooling coils of various devices such as an HVAC system, and cooling systems such as a refrigeration unit and an evaporative cooler.

Abstract: A system including co-axial focused ion beam and an electron beam allows for accurate processing with the FIB using images formed by the electron beam. In one embodiment, a deflector deflects the electron beam onto the axis of the ion beam and deflects secondary particles collected through the final lens toward a detector. In one embodiment, a positively biased final electrostatic lens focuses both beams using the same voltage to allow simultaneous or alternating FIB and SEM operation. In one embodiment, the landing energy of the electrons can be varied without changing the working distance.

Abstract: The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optimal system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

Abstract: When an ultraviolet pasteurizer is used in a room free of a person, left and right light shield doors are opened to expose ultraviolet lamps outwardly. When an operation switch on a control panel is then turned on, an operation start timer is actuated, and the ultraviolet lamps are then energized to sterilize surrounding surfaces after elapse of 5 minutes. When the ultraviolet pasteurizer is used in a room occupied by a person, the left and right light shield doors are closed to direct the ultraviolet lamps inwardly until all light shield doors are brought into a substantially triangular prism. When the operation switch on the control panel is then turned on, the ultraviolet lamps and a fan are energized to draw external air from an air inlet. The drawn air passes through an inner radiation chamber defined inwardly of the light shield doors that have been combined into the substantially triangular prism.

Abstract: A method and apparatus for combining the spectral outputs of multiple light sources to provide a high-efficiency broad-band illuminator for optical metrology is disclosed. The illuminator combines the output radiation from a plurality of broad-band lamps in a novel optical arrangement that creates a virtual source and avoids the use of beam-splitters. Consequently, the illuminator offers increased performance at reduced cost. The illuminator can be optimized and configured for application in a broad class of optical metrology instruments.

Abstract: The invention relates to a skin tanning chamber, the improvement comprising at least one light emitting diode emitting a UVA light, such as a UVA LED that emits essentially only UVA. Additionally, multiple LEDs of varying types with various characteristic wavelengths are controlled independently to produce an arbitrary light pattern in an arbitrary sequence over time. The chamber can be rigid or flexible. It can be a bed, booth or incorporated into a flexible form, such as a garment or cloth. In one embodiment, the chamber further comprises at least one LED emitting a UVC light, whereby the UVC light sanitizes the chamber surface. Preferably the LED emitting the UVA light is under dependent control from the LED emitting UVC light.

Abstract: A UV lamp system and a reflector and RF screen assembly are provided. The UV lamp system includes a power supply and an irradiator that is powered by the power supply through a cable. An RF screen is releasably attached to the irradiator by a snap-fit fit connection. The snap-fit connection between the RF screen and the irradiator is provided by a snap-fit fastener. The reflector and RF screen assembly includes a reflector with a curved reflecting surface and a pair of flanges. An RF screen that has a screen retained by a frame is provided, and is releasably attached to the reflector by a snap-fit connection between the frame and the pair of flanges. At least one snap-fit fastener is used to effect releasable attachment between the frame and one of the flanges, and at least one snap-fit fastener is used to effect releasable attachment between the frame and the other one of the flanges.

Abstract: A light emitting diode projection apparatus and method is provided for irradiating a subject with ultraviolet radiation, comprising a plurality of light emitting diodes configured to emit ultraviolet radiation and arranged in a matrix, and a power modulation control unit in communication with the diodes. The power modulation control unit is configured to energize and cause the diodes to emit light and thereby irradiate the subject with ultraviolet radiation sufficient to cause material physical change in the subject. In one embodiment of the invention, the material physical change is skin tanning. The amount, intensity, duration and type of UVR projected by the plurality of UV LED's may be varied by the power modulation control unit responsive to information input into the power modulation control unit.

Abstract: An electron projection lithography apparatus using secondary electrons includes a secondary electron emitter which is spaced apart from a substrate holder by a first predetermined interval and has a patterned mask formed on a surface thereof to face the substrate holder, a primary electron emitter which is spaced apart by a second predetermined interval from the secondary electron emitter in a direction opposite to the substrate holder and emits primary electrons to the secondary electron emitter, a second power supply which applies a second predetermined voltage between the substrate holder and the secondary electron emitter, a first power supply which applies a first predetermined voltage between the secondary electron emitter and the primary electron emitter, and a magnetic field generator which controls a path of secondary electrons emitted from the secondary electron emitter.

Abstract: The present disclosure provides a device and method for exposing a substrate to ultraviolet radiation emitted from a discharge lamp having regions of varying intensity along its length. The discharge lamp includes, inter alia, an elongated vitreous tube, first and second electrode assemblies and a coating on the interior the interior of the tube. The elongated vitreous tube has an outer periphery and axially opposed first and second ends which define an axial length for the tube therebetween. The outer periphery has a plurality of regions defined along said axial length, wherein a first region extends over a predetermined first portion of said axial length and has a helical groove path defining a series of axially spaced apart grooves formed therein. The first region emits ultraviolet radiation having an intensity greater than that emitted from a second region of the outer periphery.

Abstract: Due to its lack of appreciable thickness, the reticle used in charged-particle-beam (CPB) microlithography is prone to bending and flexing, causing instability in reticle axial height position relative to the projection-lens system, with consequent errors in image focus, rotation and magnification. Apparatus and methods are disclosed for monitoring changes in axial height position of the reticle, to facilitate making compensatory changes. Representative apparatus include a device for detecting the axial height position of the reticle. The device produces one or more beams of light (IR to visible) to strike the reticle at an oblique angle of incidence, detects light reflected from the reticle surface, and detects lateral shifts of the reflected light as received by a height detector. Hence, reticle focus is detected easily and in real time. Multiple detection beams can be used, thereby allowing detection of both axial height position and inclination of the reticle with high accuracy.

Abstract: A thermal image identification system includes an infrared emitting element having a laminate, and a power source electrically communicable with the infrared emitting element. The laminate includes an infrared emitting layer having a first side and a second side, a cover layer associated with the first side, and a backing layer associated with the second side. The laminate may also include a first heat insulating layer between the infrared emitting layer and the cover layer, a second heat insulating layer between the infrared emitting layer and the backing layer, and an infrared reflective layer between the second heat insulating layer and the backing layer. A plurality of infrared emitting elements may be arranged contiguously for coordinated operation. The infrared emitting elements may be arranged in a one-dimensional or a two-dimensional array.

Abstract: By using a large area cathode, an electron source can be made that can irradiate a large area more uniformly and more efficiently than currently available devices. The electron emitter can be a carbon film cold cathode, a microtip or some other emitter. It can be patterned. The cathode can be assembled with electrodes for scanning the electron source.

Abstract: The invention is directed to a method and unit (3) for sterilizing sheet packaging material (2) for producing sealed packages of pourable food products. The method includes the step of directing on to opposite faces (2a, 2b) of the packaging material (2) respective low-voltage electron beams, each having an energy of at most 100 KeV.

Abstract: An apparatus for carrying a target object having a plurality of surfaces, within a pulsed light sterilization chamber including a treatment zone within which pulsed sterilizing light is emitted, comprises: a transmissive carrier within the treatment zone detachably coupled to the target object, the transmissive carrier having a transmissivity of at least about 10% to light within the 250 to 350 nm wavelength range; and moving means coupled to the transmissive carrier for moving the target object on the transmissive carrier through the treatment zone, the plurality of surfaces of the target object being sterilized by the pulsed sterilizing light in the treatment zone.

Abstract: A light emitting diode projection apparatus and method is provided for irradiating a subject with ultraviolet radiation, comprising a plurality of light emitting diodes configured to emit ultraviolet radiation and arranged in a matrix, and a power modulation control unit in communication with the diodes. The power modulation control unit is configured to energize and cause the diodes to emit light and thereby irradiate the subject with ultraviolet radiation sufficient to cause material physical change in the subject. In one embodiment of the invention, the material physical change is skin tanning. The amount, intensity, duration and type of UVR projected by the plurality of UV LED's may be varied by the power modulation control unit responsive to information input into the power modulation control unit.

Abstract: A structure and method for changing or controlling the thermal emissivity of the surface of an object in situ, and thus, changing or controlling the radiative heat transfer between the object and its environment in situ, is disclosed. Changing or controlling the degree of blackbody behavior of the object is accomplished by changing or controlling certain physical characteristics of a cavity structure on the surface of the object. The cavity structure, defining a plurality of cavities, may be formed by selectively removing material(s) from the surface, selectively adding a material(s) to the surface, or adding an engineered article(s) to the surface to form a new radiative surface. The physical characteristics of the cavity structure that are changed or controlled include cavity area aspect ratio, cavity longitudinal axis orientation, and combinations thereof.

Abstract: A multi-beam e-beam system employs a set of independently controllable (for blanking and deflection) subsystems placed in a solenoid field, each system having a demagnifying lens comprising at least one passive pole piece, so that the final image demagnifies imperfections in the upstream electron beam. Upper and lower sections of the system employ the focusing effect of the solenoid field to form an image at a shaping aperture and a demagnified image of the beam at the shaping aperture on the workpiece. Small focus corrections due to magnetic lens field non-uniformity and/or target height variations, are accomplished with an electrostatic unipotental lens built into the pole pieces and target voltage variations.

Abstract: A site or vehicle which includes a plurality of electromagnetic radiators monitors the radiation by the use of a plurality of broadband sensors spaced about the potential radiation site or vehicle. Each of the sensors produces signals indicative of the sensed power, and process the signals for transmission over a data network. The system also includes a processing system which receives the signals indicative of the sensed power from all of the sensors, and processes the signals to determine whether radiation levels are within the established values. The signals may be processed either at the sensors or at the processing system to form average or peak power determinations. The power levels are continuously compared with threshold levels. When the threshold is exceeded, warnings may be given, or automatic shutdown of the radiator may be instituted (136).

Abstract: Discharge lamp includes a synthetic quartz glass tube having an inside diameter of 8 mm or over and a pair of filaments provided within and at opposite ends of the glass tube with an L (cm) filament-to-filament distance, and rare gas and metal including at least mercury are sealed in the interior of the glass tube. Lamp voltage V (V) and lamp current I (A) during illumination of the discharge lamp, filament-to-filament distance L (cm) and inside diameter D (cm) of the glass tube have relationship represented by the following mathematical expression. Namely, (V−Vf)/L=X/({square root over ( )}D·{square root over ( )}I) and 2.6≦X≦4.2, where Vf is a constant factor depending solely on a illuminating power source and where that if the discharge lamp is illuminated by a high-frequency power source of 1 kHz or over, Vf is 10, but if the discharge lamp is illuminated by a power source of 1 kHz or below, Vf is 50.

Abstract: An electron source provides electrons that are directed through the final lens of an ion optical column to neutralize at least a portion of the accumulated charge on a sample. The invention can optionally be combined with collection of secondary electrons through the final ion lens. A deflector directs the neutralizing electrons onto the ion beam optical axis and deflects the secondary electrons away from the optical axis for detection. For imaging, a high-pass energy filter separates secondary electrons generated from the neutralizing electron beam from secondary electrons generated by the ion beam.

Abstract: Irradiation lamps of an ultraviolet-light irradiation apparatus are uniformly cooled to achieve an appropriate temperature of the walls of the lamps and the ultraviolet light emitted from the lamps is efficiently reflected toward an object to be irradiated so that the ultraviolet light is efficiently irradiated onto the object to be irradiated. A plurality of low-pressure mercury lamps are arranged in parallel. A reflective mirror is arranged above the low-pressure mercury lamps so as to reflect the ultraviolet light emitted by the low-pressure mercury lamps. An exhaust passage defined by the reflective mirror suctions air around the low-pressure mercury lamps and exhausts the suctioned air to outside. The reflective mirror has a plurality of openings arranged along a longitudinal direction of the low-pressure mercury lamps, and a part of the openings has a size different from a size of other parts of the openings.

Abstract: An apparatus for expeditiously irradiating an object with ultraviolet radiation at a selected UV wavelength. The apparatus includes a plurality of ultraviolet sources, each emitting radiation at a first wave length. The UV sources are mounted within a housing that also supports one or more conversion plates that can be interposed between the UV sources and the specimen and function to convert the UV to a second wavelength.

Abstract: The thickness of the reticle used in charged-particle-beam (CPB) microlithography is a few microns at most. Hence, the reticle bends easily and flexes when subject to vibration, causing instability in reticle axial height position relative to the projection-lens system, and errors in image focus, rotation and magnification. Apparatus are disclosed that include a device for detecting the axial height position of the reticle. The device produces one or more beams of light (IR to visible) to strike the reticle at an oblique (not 0 degrees) angle of incidence, detects light reflected from the reticle surface, and detects lateral shifts of the reflected light as received by a height detector. Hence, reticle focus is detected easily and in real time. Multiple detection beams can be used, thereby allowing detection of both axial height position and inclination of the reticle with high accuracy. Reticle-position data can be used to regulate operation of, e.g., an exposure meter.

Abstract: An ultraviolet light source which includes an ultraviolet light bulb or lamp, a power source for providing power to the ultraviolet light bulb, and a non-glass or non-quartz protective sleeve which surrounds the ultraviolet light bulb. The ultraviolet light bulb preferably includes a casing for holding a starting gas and a vaporizable material, and at least one electrode electrically coupled to the power source for exciting the starting gas and the vaporizable material within the casing. The casing is made of soft glass or quartz material, and the protective sleeve is a fluoropolymer sleeve which surrounds the soft glass or quartz casing. The fluoropolymer sleeve may comprise any suitable fluoropolymer material, such as Teflon® products like PTFE, FEP, PFA, AF, Tefzel® ETFE, and the like. In addition, some silicon based materials or other UV transmissive non-glass materials can be used for the protective sleeve.

Abstract: A particle accelerator assembly with a liquid-target holding assembly usable to produce radioisotopes in liquid targets. A particle accelerator is configured to produce a particle beam along a beam axis, and the liquid-target holding assembly connected to the particle accelerator. The liquid-target retaining assembly has a mounting portion coupled to the particle accelerator, and the mounting portion is configured to receive the particle beam therethrough. A liquid-target holder is connected to the mounting portion and has a holder body with a target cavity that contains a liquid target therein. The target cavity has a longitudinal axis oriented at an acute angle relative to the particle beam axis. The target cavity has a first depth along an axis perpendicular to the longitudinal axis and has a projected depth along the beam axis greater than the first depth.

Abstract: A shower stall with integral tanning lights is provided. The shower stall has two tanning light units mounted on two adjacent walls of the shower, each containing tanning bulbs behind tempered glass panels. The panels are securely fastened with waterproof gasketing, and are flush mounted into the bath or shower unit stall wall. A waterproof control panel provides for control of the tanning lights and utilizes a timer to prevent over exposure. Other components necessary for proper operation, such as ballasts, reflectors, wiring and the like are mounted behind the shower or bath stall wall, in the wall stud cavity.

Abstract: The invention concerns an illumination system for wavelengths<193 nm, especially for EUV-lithography with a plurality of light sources a mirror device for creating secondary light sources comprising several mirrors, said mirrors are comprising raster elements. The invention is characterized in that the plurality of light sources are coupled together in order to illuminate the exit pupil of the illumination system up to a predetermined degree of filling.

Abstract: A neutron rem meter utilizing proton recoil and thermal neutron scintillators to provide neutron detection and dose measurement. In using both fast scintillators and a thermal neutron scintillator the meter provides a wide range of sensitivity, uniform directional response, and uniform dose response. The scintillators output light to a photomultiplier tube that produces an electrical signal to an external neutron counter.

Abstract: An apparatus and process integrates plural sources to irradiate a region and detect, as well as characterize, present chemical or biological agents based on returned signals. The apparatus and process integrate spectroscopy, spectroscopic acoustic interferometry, and swept frequency acoustic interferometry to instigate and detect changes in irradiated chemical and biological agents. A system integrates a tunable wavelength laser with a moderately fixed wavelength laser and an acoustic generator to simultaneously irradiate a region that is to be monitored for chemical or biological agents. Such a system is used to generate databases of response profiles for chemical and biological agents. Such a system is also used with an already obtained database of response profiles and optimization or artificial intelligence routines to identify targets of unknown nature.

Abstract: An observation optical system or a photographing optical system comprises, between a pupil surface and an image surface, a first prism 3 and a second prism. The first prism 3 includes a 1st-1st surface 31 which has both of actions of transmitting and reflecting light in the path, a 1st-2nd surface 32 which has both of actions of reflecting and transmitting the light in the path, and a 1st-3rd surface 33 which transmits the light in the path. The second prism 4 includes a 2nd-1st surface 41 which is disposed adjacent to the 1st-2nd surface 32 at an air space away and which transmits the light in the path at least twice and a 2nd-2nd surface 42 which reflects the light in the path. The 1st-1st surface 31 is constructed of a prism face to which a volume hologram 6 is applied.

Abstract: Analog signal voltages are updated sequentially in a first sample-and-hold circuit, while an emitter element displays a pixel of a first display frame in response to a stored analog signal voltage in an isolated parallel second sample-and-hold circuit. After all unit cells are updated, the switches are reversed for the two parallel sample-and-hold circuits, displaying a pixel of a second display frame in response to an updated stored analog signal voltage in the first sample-and-hold circuit. The operation of the two parallel circuits alternates for each sequential frame. A constant current source in the unit cell provides constant power dissipation and temperature, independent from variations in emitter element current, up to a predetermined constant current limit. For emitter element currents greater than the predetermined limit, an independent current source in the unit cell is automatically activated without involving external control logic.

Abstract: Apparatus and method for patterned sequential lateral solidification of a substrate surface, avoiding the need for demagnification to avoid mask damage from fluence sufficient to overcome the threshold for sequential lateral solidification, while using the high throughput of a common stage presenting both 1:1 mask and substrate simultaneously for patterning. The radiation source provides imaging beam and non-imaging beam, each of fluence below the threshold of sequential lateral solidification, but with aggregate fluence above the threshold. The imaging beam path includes a relatively delicate 1:1 mask and 1:1 projection subsystem, with optical elements including a final fold mirror proximate to the substrate surface, put the below-threshold mask pattern on the substrate surface. The non-imaging beam bypasses the delicate elements of imaging beam path, passing through or around the final fold mirror, to impinge on the substrate surface at the same location.

Abstract: A method and apparatus for dynamic exposure to ultraviolet rays; a person is radiated by means of ultraviolet ray sources, at high and/or low UV pressure, emitted by radiation units peripherally arranged around a footboard on which the person to be radiated is standing upright on a rotary platform of the footboard which it is allowed to slowly rotate. Reflecting panels, opposite to the UV radiation units, allow the UV rays to be radiated directly and by reflection, to reduce energy consumption.

Abstract: An optical device for a system presenting collimated images using a spherical mirror. The optical device makes it possible to present the user with an image corrected of off-centring distortion of a second kind due to an off-axis spherical mirror. In order to do this the optical device includes a tubular mirror whose optical characteristics ensure a high-quality image and correction of the off-centering distortion. The tubular mirror has a surface generated by the translation of a plane curve (a circular arc) along another plane curve (also a circular arc). The optical device is especially applicable to helmet sights for an aircraft pilot.

Abstract: A dual sample-and-hold architecture in each unit cell of a read-in-integrated-circuit (RIIC) provides maximum frame rate without frame overlap. Analog pixel signals are updated sequentially in one sample-and-hold capacitor, while an emitter element displays a pixel of a display frame in response to a stored analog signal voltage on an isolated second sample-and-hold capacitor. After all unit cells are updated, the signals on the two capacitors are combined, updating all emitter elements for the next frame. A voltage mode amplifier as an emitter driver provides a more nearly linear dependence of infrared power output on signal voltage than do previous transconductance amplifiers. A digital to analog converter (DAC) on the RIIC substrate results in a simplified interface to the RIIC and in an increased immunity to noise.

Abstract: A rotatable charging apparatus includes a length extending between a first end and a second end, with the rotatable charging apparatus centered about an axis parallel to the length. The rotatable charging apparatus outer periphery forms N apparatus positions. One charging device is fixed to each of N−1 apparatus positions. The remaining (Nth) apparatus position is devoid of a charging device, thus forming an “empty” charging device position. A host printing machine selectively causes the rotatable charging apparatus to rotate about its axis thereby selectively position any of its N−1 charging devices to face a proximately-located photosensitive element. When a problem exists with the current charging device, or when the total number of operating hours of the current charging device exceeds a fixed threshold, the printing machine causes the rotatable charging apparatus to rotate from its current charging device to position a new charging device facing the photosensitive element.

Abstract: An infrared radiation emitter is provided that is capable of producing infrared radiation modulating at high frequency. The IR emitter includes a low-thermal-mass resistive membrane that is suspended by long thermal isolation arms over a substrate. The membrane is suspended over the substrate such that a resonant emitting cavity is formed between the membrane and the substrate. The low-mass, thermally isolated membrane design maximizes the temperature change induced by Joule heating of the resistive membrane and allows the emitted IR radiation to be modulated at high frequencies.

Abstract: A method and a device for repelling pit vipers (rattlesnakes, copperheads, water moccasins) and boids (pythons, anacondas, boa constrictors) are disclosed whereby the snakes are irradiated with IR radiation having an appropriate wavelength and intensity to stimulate the IR-receptors of the snakes, thereby “jamming” the IR-receptors and/or producing an inimical electromagnetic environment that the snakes cannot tolerate.

Abstract: An apparatus includes providing an article having an oxidizable organic compound and an organoleptic compound; advancing the article toward a means for treating the article, the means for treating the article including a treating medium, and a means for applying the treating medium to the article; and applying the treating medium to a surface of the article so as to lower the amount of the organoleptic compound in the article.

Abstract: The present invention relates to a thermal signaling device. The signaling device generally comprises a container including a thermal emitting surface and an interior space, and at least one heat source disposed within the interior space of the container. In operation, the heat source is activatable to heat the thermal emitting surface such that the thermal emitting surface can be detected by a thermal sensing system.