Controlling Web, Strand, Strip, Or Sheet Patents (Class 250/548)
  • Patent number: 10684562
    Abstract: A measurement device is equipped with a surface plate, a slider which holds a substrate and which is movable relative to the surface plate, a drive system that moves the slider, a first position measurement system which measures the slider's first position information relative to the surface plate, a measurement unit having a mark detection system that detects a mark on a substrate, a second position measurement system which measures a relative second position information between the mark detection system and substrate, and a controller which obtains the first position information from the first position measurement system and second position information from the second position measurement system while controlling the slider's movement by the drive system, and obtains position information of a plurality of marks based on detection signals of the mark detection system having detected marks on the substrate, the first position information, and the second position information.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: June 16, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10670978
    Abstract: A spectrally broadened radiation apparatus, including a laser configured to emit, through an output of the laser, radiation substantially only in the visible region of the electromagnetic spectrum, the radiation having a nominal wavelength, and an optical fiber optically coupled to the output of the laser, the optical fiber having an input to receive the radiation from the laser and having an output to provide spectrally broadened output radiation, the optical fiber configured to spectrally broaden the radiation from the laser to a spectral width of at least 0.5 nm around the nominal wavelength.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: June 2, 2020
    Assignee: ASML Holding N.V.
    Inventors: King Pui Leung, Tao Chen, Kevin J. Violette
  • Patent number: 10642168
    Abstract: An auxiliary exposure apparatus is for performing auxiliary exposure of applying light of a predetermined wavelength from a laser light source to a resist film on a wafer, separately from exposure processing of transferring a pattern of a mask to the resist film applied on the wafer. The auxiliary exposure apparatus includes a first total reflection mirror that reflects the light from the laser light source toward the wafer; and an imaging device including a light receiving part that receives light after reflected by the wafer.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: May 5, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Hideaki Kashiwagi, Takafumi Niwa, Norihisa Koga
  • Patent number: 10636138
    Abstract: A polarized image acquisition apparatus includes a division type half-wave plate, located opposite to the mask substrate with respect to an objective lens and near an objective lens pupil position, to arrange P and S polarized waves of the transmitted light having passed through the objective lens to be mutually orthogonal, a Rochon prism to separate trajectories of P and S polarized waves, an imaging lens to form images of P and S polarized waves having passed through the Rochon prism at image formation positions different from each other, a mirror, in a case where one of P and S polarized waves is focused/formed at one of the different image formation positions, to reflect the other wave at the other position, a first sensor to capture an image of one of P and S polarized waves, and a second sensor to capture an image of the other wave.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: April 28, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Riki Ogawa
  • Patent number: 10630852
    Abstract: An image reading apparatus includes a roller that transports a document; a reading unit that reads an image of the document which is transported; a DC motor that drives the roller; and a control unit that controls the DC motor. The control unit is configured to stop driving of the DC motor in a case where a driving load value obtained when the DC motor is driven exceeds a threshold. A first threshold which is applied in a case of a first document and a second threshold which is applied in a case of a second document of which a basis weight is larger than a first basis weight are set, and the first threshold is less than the second threshold.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: April 21, 2020
    Assignee: Seiko Epson Corporation
    Inventors: Kazuhiko Arimori, Kazuya Yoshikaie, Kosuke Nomoto
  • Patent number: 10620548
    Abstract: A method comprising illuminating a patterning device (MA?) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by t
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Pieter Bart Aloïs De Buck, Nico Vanroose, Giovanni Imponente, Roland Johannes Wilhelmus Stas, Chanpreet Kaur, James Robert Downes
  • Patent number: 10613007
    Abstract: Apparatus and method for testing a sheet of brittle material comprising the steps of measuring one or more edge features of a sheet of brittle material, imparting a bend to the sheet of brittle material and producing relative motion between the sheet and the bend such that the bend traverses the sheet. A stress can be induced in the sheet as a function of the relative motion and imparted bend, wherein the induced stress corresponds to a predetermined strength value, and the measured one or more edge features can be correlated with the strength value.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: April 7, 2020
    Assignee: Corning Incorporated
    Inventors: Gabriel Pierce Agnello, Chong Pyung An, William Kenneth Denson, Peter Knowles, David Bruce Moorehouse, Denwood Falconer Ross, III, Correy Robert Ustanik, Siva Venkatachalam
  • Patent number: 10578976
    Abstract: A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.
    Type: Grant
    Filed: December 3, 2018
    Date of Patent: March 3, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Toralf Gruner, Christoph Zaczek, Ralf Mueller
  • Patent number: 10571816
    Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: February 25, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jasper Wesselingh, Michael Erath, Ansgar Holle, Stefan Troeger, Alexander Vogler
  • Patent number: 10560677
    Abstract: A three-dimensional image processing apparatus and a method of controlling power of same are provided. The three-dimensional image processing apparatus may include a display, a three-dimensional image filter disposed a prescribed distance from the display to adjust optical paths of the displayed view images, a camera configured to capture an image of a user, an ambient light sensor, and a controller configured to control the view images, the three-dimensional image filter, or the camera. The controller may determine a position of the user based on the captured image and adjust a perceived three-dimensional view of the view images based on the determined position of the user. Moreover, the controller may control an operational state of the camera and the at least one process based on the determined position of the user or a detected amount of ambient light.
    Type: Grant
    Filed: November 9, 2012
    Date of Patent: February 11, 2020
    Assignee: LG ELECTRONICS INC.
    Inventors: Hongrae Cha, Kwangyeol Choi, Taesoo Park, Jaekwang Lee, Wooyoung Kwak
  • Patent number: 10535610
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a substrate having a scribe line region. A material layer is formed on the scribe line region and has a rectangular region defined therein. The rectangular region has a pair of first edges parallel with a widthwise direction of the scribe line region and a pair of second edges parallel with a lengthwise direction of the scribe line region. A pair of first alignment features is formed in the material layer along the first edges, and a pair of second alignment features is formed in the material layer along the second edges. The space between the pair of first alignment features is larger than a space between the pair of the second alignment features.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: January 14, 2020
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Feng-Yi Chang, Fu-Che Lee, Yi-Wang Zhan, Chia-Liang Liao, Yu-Cheng Tung, Chien-Hao Chen, Chia-Hung Wang
  • Patent number: 10533848
    Abstract: An overlay metrology system may include a controller to generate optical tool error adjustments for a hybrid overlay target including optically-resolvable features and device-scale features by measuring a difference between an optical overlay measurement based on the optically-resolvable features and a device-scale overlay measurement based on the device-scale features, generate target-to-device adjustments for the hybrid overlay target based on positions of features within the device area, determine device-relevant overlay measurements for one or more locations in the device area based on at least one of the optical overlay measurement, the optical tool error adjustments, or the target-to-device adjustments, and provide overlay correctables for the device area to a lithography tool to modify exposure conditions for at least one subsequent exposure based on the device-relevant overlay measurements.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: January 14, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Andrei V. Shchegrov, Frank Laske, Nadav Gutman
  • Patent number: 10527957
    Abstract: A lithographic apparatus has a substrate table on which a substrate is positioned, and an alignment sensor used to measure the alignment of the substrate. In an exemplary processing method, the alignment sensor is used to perform one or more edge measurements in a first step. In a second step, one or more edge measurements are performed on the notch of the substrate. The edge measurements are then used to align the substrate in the lithographic apparatus. In a particular example, the substrate is arranged relative to the alignment sensor such that a portion of the edge surface is positioned at the focal length of the lens. When the alignment sensor detects radiation scattered by the edge surface at the focal length of the lens, the presence of the edge of the substrate is detected.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: January 7, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Cayetano Sanchez-Fabres Cobaleda, Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Arie Jeffrey Den Boef, Marcel Hendrikus Maria Beems, Piotr Michał Stolarz
  • Patent number: 10529055
    Abstract: A method and apparatus for identifying the orientation of an image in a spherical format. A spherical format is created of an image obtained by a camera, the spherical format comprising a notional sphere that has a centre corresponding to the position from which the image was obtained by the camera. A first surface represented in the image had a first orientation and was at a first distance from the camera when the image was obtained. A plurality of lines are obtained in the spherical format, each line defined by two endpoints in spherical coordinates, wherein each line intersects with at least one other line. For each of a plurality of rotational definitions of the sphere, the spherical coordinates of the endpoints are transformed into a Cartesian coordinate system relative to the rotational definition, thereby creating rotated lines, and a cumulative deviation, from a predetermined angle, is determined of angles between intersecting rotated lines.
    Type: Grant
    Filed: June 28, 2018
    Date of Patent: January 7, 2020
    Assignee: EYESPY360 LIMITED
    Inventor: Peter Vassilev Sedeffow
  • Patent number: 10520824
    Abstract: A light combiner (500) for use in a metrology tool includes a plurality of light sources (LED 1, LED 2, LED 3, LED 4, LED 5), a first filter (502), and a second filter (504). The first filter is designed to substantially reflect light generated from a first source of the plurality of light sources, and to substantially transmit light generated from a second source of the plurality of light sources. The second filter is designed to substantially reflect light generated from the first source and the second source of the plurality of light sources, and to substantially transmit light generated from a third source of the plurality of light sources. An angle of incidence of the light generated from the first source on a surface of the first filter is less than 30 degrees.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: December 31, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Ronald Franciscus Herman Hugers, Parag Vinayak Kelkar, Paulus Antonius Andreas Teunissen
  • Patent number: 10509264
    Abstract: This disclosure relates to a cell alignment device for aligning a first substrate and a second substrate of a display panel. The cell alignment device comprises: a first platform and a second platform disposed oppositely; a light emitting unit disposed on a surface of the first platform facing the second platform and configured to emit light toward the second platform; a light sensing unit disposed on a surface of the second platform facing the first platform and configured to sense a light intensity of light emitted by the light emitting unit; and a control unit configured to, when the sensed light intensity is greater than or equal to a preset light intensity, adjust a position of at least one of the first platform and the second platform until the sensed light intensity is smaller than the preset light intensity.
    Type: Grant
    Filed: November 4, 2016
    Date of Patent: December 17, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventor: Yang Wang
  • Patent number: 10509420
    Abstract: A reticle purging system includes an automated pod opener, a reticle holding device, a reticle transporting device and at least one purging device. The reticle holding device has a reticle occupiable zone thereon. The reticle transporting device is assigned with a transportation path from the automated pod opener to the reticle holding device. The reticle occupiable zone is exposed to the purging device.
    Type: Grant
    Filed: July 12, 2016
    Date of Patent: December 17, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chun-Jung Huang, Yu-Yao Huang, Shih-Ming Chin
  • Patent number: 10509325
    Abstract: A lithographic apparatus includes a projection system which includes a plurality of optical elements configured to project a beam of radiation onto a radiation sensitive substrate. The lithographic apparatus also includes a metrology frame structure which includes a part of one or more optical element measurement systems to measure the position and/or orientation of at least one of the optical elements. The plurality of optical elements, a patterning device stage, and a substrate stage are arranged such that, in a two dimensional view on the projection system, a rectangle is defined such that it envelops the plurality of optical elements, the patterning device stage, and the substrate stage. The rectangle is as small as possible. The metrology frame structure is positioned within the rectangle.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: December 17, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Erik Loopstra, Engelbertus Antonius Fransiscus Van Der Pasch, Sascha Bleidistel, Suzanne Cosijn
  • Patent number: 10502559
    Abstract: The present invention relates to a method and an apparatus for measuring errors of a movable platform in multiple degrees of freedom. A light-source module disposed on a fixed platform emits light to a lens module disposed on a movable platform. The light is reflected to one or more optoelectronic sensing module on the fixed platform via the lenses of the lens module. Then a processing unit calculates an alignment error or/and one or more straightness error or/and one or more angle error of the movable platform according to the signal generated by the optoelectronic sensing module.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: December 10, 2019
    Assignee: National Chung Cheng University
    Inventors: Chien-Sheng Liu, Yu-Ta Chen, Yu-Fan Pu, Yong-Tai Luo
  • Patent number: 10486419
    Abstract: A method for adjusting an inkjet printing apparatus, an inkjet printing method, an inkjet printing apparatus, and a system including the same. The inkjet printing apparatus includes a plurality of nozzles, and the method for adjusting the inkjet printing apparatus includes: obtaining images of liquid drops which are output respectively from the plurality of nozzles during an inkjet printing process after the liquid drops are dried; and adjusting a driving parameter of at least one nozzle of the plurality of nozzles based upon the images of the liquid drops which are output respectively from the plurality of nozzles after the liquid drops are dried, so that volumes of the liquid drops which are output respectively from the plurality of nozzles are substantially same.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: November 26, 2019
    Assignee: BOE Technology Group Co., Ltd.
    Inventor: Ying Cui
  • Patent number: 10484593
    Abstract: A focus detection device includes: a plurality of micro-lenses at which light fluxes through an image forming optical system enter, disposed in a two-dimensional array pattern; a plurality of light receiving elements disposed in correspondence to each of the plurality of micro-lenses; a focus detection unit that executes a detection of a defocus quantity of the image forming optical system by detecting, based upon outputs from the plurality of light receiving elements, a phase difference of a plurality of light fluxes through different areas of the image forming optical system; and a recognition unit that recognizes, based upon the outputs from the plurality of light receiving elements, characteristics of a subject image formed onto the plurality of light receiving elements via the plurality of micro-lenses, wherein: the focus detection unit detects the defocus quantity through a method optimal for the characteristics of the subject image recognized by the recognition unit.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: November 19, 2019
    Assignee: NIKON CORPORATION
    Inventor: Naoyuki Ohnishi
  • Patent number: 10473525
    Abstract: Disclosed is a method, system, and apparatus for optical emission measurement. The apparatus includes a collection system for collecting a plasma optical emission spectra through an optical window disposed at a wall of a plasma processing chamber. The optical system includes a mirror configured to scan a plurality of non-coincident rays across the plasma processing chamber; and a telecentric coupler for collecting an optical signal from a plasma and directing the optical signal to a spectrometer for measuring the plasma optical emission spectra.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: November 12, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Ching-Ling Meng, Holger Tuitje, Yan Chen, Mihail Mihaylov
  • Patent number: 10477057
    Abstract: A scanner has a first mirror having a plurality of concavities configured to reflect light from a document; and a sensor configured to detect light reflected by the concavity; the concavity having an optical characteristic that differs according to position.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: November 12, 2019
    Assignee: Seiko Corporation
    Inventor: Takahiro Netsu
  • Patent number: 10459349
    Abstract: According to an aspect of the invention, an exposure method includes: moving a substrate during a period from a start to an end of exposure performed on any region among a plurality of exposure regions, wherein a timing at which the substrate is moved during the period is determined on the basis of a difference between a width of the pattern formed on the substrate in a first direction on a surface of the substrate and a width of the pattern formed on the substrate in a second direction on the surface of the substrate different from the first direction.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: October 29, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yoshio Goto
  • Patent number: 10459343
    Abstract: An object is to provide an illumination apparatus that achieves illumination with a uniform illuminance distribution, while reducing a light quantity loss. An illumination apparatus for illuminating an illumination target surface has: a deflection member configured to form an illuminance distribution with a periodic pattern along a predetermined direction on a predetermined face traversing an optical path; and an optical integrator system having a plurality of wavefront division facets arrayed on the predetermined face and configured to form secondary light sources with use of a beam from the deflection member; the deflection member forms the illuminance distribution with the periodic pattern of an integer times or a unit fraction times an array period of the plurality of wavefront division facets.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: October 29, 2019
    Assignee: NIKON CORPORATION
    Inventor: Hideki Komatsuda
  • Patent number: 10456984
    Abstract: A closed-loop adaptive material deposition apparatus and method uses a scanning system to monitor an additively manufactured object as it is being fabricated and adapting the geometric shape and material composition of the subsequent layers based on the scan data. The scanning system repeatedly captures geometric and/or material information of a partially manufactured object with optional auxiliary objects inserted during the manufacturing process. Based on this information, the actual surface geometry and/or actual material composition is computed. Surface geometry may be offset and used as a slicing surface for the next portion of the digital model. The shape of the slicing surface may then be recomputed each time the system scans the partially fabricated object.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: October 29, 2019
    Assignee: Massachusetts Institute of Technology
    Inventors: Wojciech Matusik, Allen S. Park, Javier E. Ramos, Kiril Vidimce
  • Patent number: 10444591
    Abstract: Ink jet printing can be used in the production of electro-optic displays for (a) forming a layer of a polymer-dispersed electrophoretic medium on a substrate; (b) forming a color electro-optic layer; (c) forming a color filter; and (d) printing electrodes and/or associated conductors on a layer of electro-optic material.
    Type: Grant
    Filed: January 24, 2018
    Date of Patent: October 15, 2019
    Assignee: E Ink Corporation
    Inventors: Charles Howie Honeyman, Guy M. Danner
  • Patent number: 10431552
    Abstract: In a display panel, multiple first alignment patterns are disposed in a non-display area on a first substrate, and each first alignment pattern includes a first portion and a second portion connected to each other. Multiple second alignment patterns are disposed in the non-display area on a second substrate, and each of the second alignment patterns includes a third portion and a fourth portion. There is a first length difference between the length of each first portion along a first direction and the length of the corresponding third portion along the first direction, and the first length differences are different from each other. There is a second length difference between the length of each second portion along a second direction and the length of the corresponding fourth portion along the second direction, and the second length differences are different from each other.
    Type: Grant
    Filed: October 9, 2018
    Date of Patent: October 1, 2019
    Assignee: HannStar Display Corporation
    Inventors: Chung-Lin Chang, Hsuan-Chen Liu
  • Patent number: 10408764
    Abstract: Examination system, method and computer-readable medium, the method comprising: processing by a processor using a first recipe at least one image comprised in images and metadata generated by an inspection tool and stored, to detect a first location set of first potential defects and attributes thereof; selecting and imaging part of the first location set with a review tool to obtain an image set; obtaining classification results of said first potential defects and determining a further recipe based thereon; processing the image using the further recipe for detecting a further location set of further defects; selecting part of the further location set; imaging the part with the review tool to obtain a further image set, and obtaining further classification results; and repeating determining the further recipe, processing the image, selecting and imaging part of the further location set, and obtaining further classification results, until a stopping criteria is met.
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: September 10, 2019
    Assignee: APPLIED MATERIALS ISRAEL LTD.
    Inventors: Saar Shabtay, Moshe Amzaleg, Zvi Goren
  • Patent number: 10409172
    Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.
    Type: Grant
    Filed: January 23, 2017
    Date of Patent: September 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: David Markle, Thomas Laidig, Timothy N. Thomas
  • Patent number: 10401740
    Abstract: A lithography mask is disclosed. The lithography mask includes at least one asymmetric segmented pattern element. A particular asymmetric segmented pattern element includes at least two segments with a separation distance between consecutive segments smaller than a resolution of a set of projection optics for generating an image of the particular asymmetric segmented pattern element on a sample such that the image of the particular asymmetric segmented pattern element is an unsegmented pattern image. A position of the unsegmented pattern image on the sample is indicative of a location of the sample along an optical axis of the set of projection optics.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: September 3, 2019
    Assignee: KLA-Tencor Corporation
    Inventor: Walter Dean Mieher
  • Patent number: 10394132
    Abstract: A method including obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe; determining, by a hardware computer system, a parameter from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in the substrate measurement recipe and the determining the parameter includes determining dependence of the measurement result on a relative change of wavelength of the incident radiation; and if the parameter is not within a specified range, adjusting the substrate measurement recipe.
    Type: Grant
    Filed: April 24, 2017
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Miguel Garcia Granda, Christian Marinus Leewis, Frank Staals
  • Patent number: 10386821
    Abstract: A system including a controller, an interface, and a calibration controller. The controller is configured to (i) select a set of fields, and (ii) based on the set of fields, supply control effort to first actuators in zones of a chamber. The interface is configured to receive feedback signals from sensors. The feedback signals are indicative of fields respectively of the zones. The controller is configured to adjust an amount of control effort supplied to the actuators based on the fields. The calibration controller is configured to, based on the fields, generate calibration values for each of the sensors. The calibration values for each of the sensors are indicative of field contributions corresponding respectively to the actuators.
    Type: Grant
    Filed: September 21, 2015
    Date of Patent: August 20, 2019
    Assignee: LAM RESEARCH CORPORATION
    Inventors: Marcus Musselman, Andrew D. Bailey, III
  • Patent number: 10379061
    Abstract: Systems and methods for improving results of wafer higher order shape (HOS) characterization and wafer classification are disclosed. The systems and methods in accordance with the present disclosure are based on localized shapes. A wafer map is partitioned into a plurality of measurement sites to improve the completeness of wafer shape representation. Various site based HOS metric values may be calculated for wafer characterization and/or classification purposes, and may also be utilized as control input for a downstream application. In addition, polar grid partitioning schemes are provided. Such polar grid partitioning schemes may be utilized to partition a wafer surface into measurement sites having uniform site areas while providing good wafer edge region coverage.
    Type: Grant
    Filed: January 15, 2017
    Date of Patent: August 13, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Haiguang Chen, Jaydeep Sinha, Sergey Kamensky, Sathish Veeraraghavan, Pradeep Vukkadala
  • Patent number: 10369752
    Abstract: Disclosed are a method, computer program and associated apparatuses for metrology. The method includes acquiring inspection data comprising a plurality of inspection data elements, each inspection data element having been obtained by inspection of a corresponding target structure formed using a lithographic process; and performing an unsupervised cluster analysis on said inspection data, thereby partitioning said inspection data into a plurality of clusters in accordance with a metric. In an embodiment, a cluster representative can be identified for each cluster. The cluster representative may be reconstructed and the reconstruction used to approximate the other members of the cluster.
    Type: Grant
    Filed: April 26, 2016
    Date of Patent: August 6, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Seyed Iman Mossavat, Adriaan Johan Van Leest
  • Patent number: 10359712
    Abstract: An alignment system, a dual-wafer-stage system and a measurement system are disclosed, the alignment system including a main frame (201, 301), a first wafer stage (205, 305), an alignment sensor (202, 302), a position acquisition module (208, 308) and a signal processing device (203, 303). The position acquisition module (208, 308) collects positional data from the first wafer stage (205, 305) and the reflector (204, 304) simultaneously. The reflector (204, 304) is arranged on the alignment sensor (202, 302). In other words, positional data of the alignment sensor (202, 302) and positional data of the first wafer stage (205, 305) are collected simultaneously. In addition, the data can be processed to indicate the relative position of the first wafer stage (205, 305) relative to the alignment sensor (202, 302) whose vibration has been zeroed. That is, a position where an alignment mark is aligned can be obtained with the relative vibration amplitude of the alignment sensor (202, 302) being zeroed.
    Type: Grant
    Filed: August 26, 2016
    Date of Patent: July 23, 2019
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventor: Yunfeng Li
  • Patent number: 10354035
    Abstract: Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the sub-elements may be designed in different ways, according to the type of monitored process shortcomings, such as various types of hot spots, line edge shortening, process windows parameters and so forth. Results of the measurements may be used to improve the process and/or increase the accuracy of the metrology measurements.
    Type: Grant
    Filed: January 6, 2017
    Date of Patent: July 16, 2019
    Assignee: KLA-Tencor Corporation
    Inventor: Boris Golovanevsky
  • Patent number: 10340165
    Abstract: A semiconductor tool includes an illumination source to generate an illumination beam, one or more illumination optical elements to direct a portion of the illumination beam to a sample, a detector, one or more collection optical elements to direct radiation emanating from the sample to the detector, and a controller communicatively coupled to the detector. The controller is configured to measure alignment at a plurality of locations across the sample to generate alignment data, select an analysis area for alignment zone determination, divide the analysis area into two or more alignment zones having different alignment signatures; model the alignment data of at least a first alignment zone of the two or more alignment zones using a first alignment model, and model the alignment data of at least a second alignment zone of the two or more alignment zones using a second alignment model different than the first alignment model.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: July 2, 2019
    Assignee: KLA-Tencor Corporation
    Inventors: Jeremy Nabeth, Onur N. Demirer, Ramkumar Karur-Shanmugam, Choon (George) Hoong Hoo, Christian Sparka, Hoyoung Heo, Stuart Sherwin, Fatima Anis, Mark D. Smith, William Pierson
  • Patent number: 10289011
    Abstract: A position measurement system includes an interferometer to determine a position of an object. The interferometer is arranged to generate a first, second and third signals representative of the position by irradiating respective first, second and third areas of a reflective surface of the object. Along a line, the first and second areas are at a first distance relative to each other, the second and third areas are at a second distance relative to each other, and the first and third areas are at a third distance relative to each other. The interferometer is arranged to provide a rotation signal representative of a rotation of the object along an axis based on the first, second and third signals. The axis is parallel to the reflective surface and perpendicular to the line.
    Type: Grant
    Filed: July 29, 2016
    Date of Patent: May 14, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Engelbertus Antonius Fransiscus Van Der Pasch, Robbert Edgar Van Leeuwen
  • Patent number: 10282635
    Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes a first diaphragm that is positioned on an optical path of a reflection illumination optical system and has a first reference pattern of a line-and-space pattern formed thereon; a semi-transmission reflection plate configured to reflect a portion of a reference pattern image that has passed through the first reference pattern; a second diaphragm which is positioned on an optical path of the imaging optical system, on which the portion of the reference pattern image reflected by the semi-transmission reflection plate is projected, and which has a second reference pattern of a line-and-space pattern formed thereon; and a first time delay integration sensor (TDI sensor) configured to receive the portion of the reference pattern image that has passed through the second reference pattern.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: May 7, 2019
    Assignee: NuFlare Technology, Inc.
    Inventor: Riki Ogawa
  • Patent number: 10273597
    Abstract: In accordance with a method of manufacturing CZ silicon wafers, a parameter of at least two of the CZ silicon wafers is measured. A group of the CZ silicon wafers falling within a tolerance of a target specification is determined. The group of the CZ silicon wafers is divided into sub-groups taking into account the measured parameter. An average value of the parameter of the CZ silicon wafers of each sub-group differs among the sub-groups, and a tolerance of the parameter of the CZ silicon wafers of each sub-group is smaller than a tolerance of the parameter of the target specification. A labeling configured to distinguish between the CZ silicon wafers of different sub-groups is prepared. The CZ silicon wafers falling within the tolerance of the target specification are packaged.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: April 30, 2019
    Assignee: Infineon Technologies AG
    Inventors: Johannes Freund, Thomas Wuebben, Helmut Oefner, Hans-Joachim Schulze
  • Patent number: 10270944
    Abstract: An image capturing device (1) includes: a microlens array (33) including a plurality of micro condenser lenses (34) arranged at a focal position of an imaging optical system for forming a plurality of erect equal-magnification images; and an imaging unit (31) including light-sensitive pixels (32x) provided at positions corresponding to the micro condenser lenses 34. Micro condenser lenses (34) have refractive powers to condense, among light rays incident from the imaging optical system, light rays incident at an incident angle within a predetermined limited angle range, onto positions different from positions on which light rays incident at an incident angle outside the limited angle range are incident. Effective light-sensitive regions of the light-sensitive pixels (32x) receive only light rays incident at an incident angle within the limited angle range among light rays entered micro condenser lenses (32).
    Type: Grant
    Filed: February 28, 2017
    Date of Patent: April 23, 2019
    Assignee: Mitsubishi Electric Corporation
    Inventors: Hiroyuki Kawano, Kosaku Yamagata, Tadashi Minobe, Tatsuya Kunieda, Masatoshi Kodama
  • Patent number: 10259148
    Abstract: In one embodiment of an apparatus for manufacturing a rubber sheet, a continuous rubber material is supplied onto a supply conveyor in a meandering state by supplying the continuous rubber material onto the supply conveyor while moving rubber supply device in a reciprocating manner in a roll axial direction. The rubber supply device has a full width moving mode in which the rubber supply device moves in the roll axial direction such that the continuous rubber material has a meandering shape of a width corresponding to a width of a rubber sheet, and a partial width moving mode in which the rubber supply device moves in the roll axial direction such that the continuous rubber material has a meandering shape of a width obtained by excluding widths of both edge portions of the rubber sheet from the width of the rubber sheet.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: April 16, 2019
    Assignee: TOYO TIRE CORPORATION
    Inventors: Takuya Ishida, Junji Itakura
  • Patent number: 10222209
    Abstract: The measurement equipment includes a rack, a first image capturing device, a second image capturing device, a third image capturing device and a fourth image capturing device. Wherein, the first image capturing device and the second image capturing device capture an entire image of a to-be-measured object, the third image capturing device and the fourth image capturing device capture a plurality of local images of a plurality of local areas of the to-be-measured object, and the entire image and the local images and are simultaneously captured.
    Type: Grant
    Filed: January 4, 2018
    Date of Patent: March 5, 2019
    Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
    Inventors: Seungbae Park, Yu-Ho Hsu, Chin-Li Kao, Tai-Yuan Huang
  • Patent number: 10209636
    Abstract: Pattern-dependent random deviations in measurement of optimal focus distances can be minimized by separating scan paths into multiple types of scan paths that scan only a respective predetermined image region in semiconductor dies. A substrate including in-process semiconductor dies is coated with a photoresist layer, and is located onto a stage in a lithographic exposure tool. Maps of optimal focus distances are generated by performing optimal focus distance scans that cover a respective subset of image regions having distinct image patterns. The substrate can be leveled with respect to an optics system of the lithographic exposure tool employing a weighted average of multiple maps of optimal focus distances. Once the substrate is leveled on the stage, a lithographic exposure process can be performed with enhanced uniformity in the focus distances across the in-process semiconductor dies.
    Type: Grant
    Filed: March 7, 2018
    Date of Patent: February 19, 2019
    Assignee: SANDISK TECHNOLOGIES LLC
    Inventors: Tohru Toda, Keisuke Izumi, Michiaki Sano
  • Patent number: 10191394
    Abstract: A distortion detection method includes obtaining a positional deviation amount expression formula that expresses positional deviation amounts in two directions at each position on a substrate held by a chuck, based on information about a warping shape of the substrate in a state where the substrate is not yet held by the chuck, calculating positional deviation amounts in two directions at a plurality of positions on the substrate based on the obtained positional deviation amount expression formula, and obtaining a plurality of types of distortion components relating to a shot region of the substrate based on the positional deviation amounts in two directions obtained at the plurality of positions.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: January 29, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yuhei Sumiyoshi
  • Patent number: 10186402
    Abstract: A measurement system for measuring a consumption amount of a focus ring in a plasma etching apparatus including a processing chamber, a lower electrode and the focus ring surrounding a periphery of the lower electrode, comprises a sensor substrate having a distance sensor and a measurement unit configured to measure a consumption amount of the focus ring. The measurement unit includes a transfer instruction unit, an acquisition unit and a measurement unit. The transfer instruction unit is configured to instruct a transfer unit to transfer the sensor substrate into the processing chamber. The acquisition unit is configured to acquire information on a physical amount corresponding to a distance from the distance sensor to the focus ring, which is measured by the distance sensor. The measurement unit is configured to measure a consumption amount of the focus ring based on the acquired information on the physical amount.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: January 22, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Koji Kamata, Hiroshi Ikari
  • Patent number: 10168148
    Abstract: The present disclosure provides a display substrate, a display device and a method for recognizing a positioning mark. The display substrate includes a substrate, and a first pattern and a second pattern formed on a first side of the substrate; the second pattern is disposed between the first pattern and the substrate, and the first pattern has a first through hole directly facing the second pattern; the first pattern and the second pattern are formed of materials having different reflectances, and the first through hole serves as a positioning mark on a first side of the substrate for positioning the first side of the substrate.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: January 1, 2019
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
    Inventors: Haibo Zhang, Zhangwei Dang, Qingliang Zhang, Heng Wang
  • Patent number: 10156720
    Abstract: An information display apparatus reflects light representing information off a projection target to display the information as a virtual image, and includes a projector, at least two image forming devices and a focus adjusting device. The projector projects the light representing information. The image forming devices, to which the light from the projector is projected, are on an optical path from the projector to the projection target. At least one of the image forming devices is at a distance from the projector different from that of other image forming devices. The focus adjusting device adjusts a focal length of one optical system on an optical path from the projector to each of the image forming devices such that the light from the projector is in focus at each of the image forming devices. An image of information on each of the image forming devices is reflected off the projection target.
    Type: Grant
    Filed: July 24, 2014
    Date of Patent: December 18, 2018
    Assignee: DENSO CORPORATION
    Inventors: Hiroshi Ando, Shinji Kashiwada
  • Patent number: 10152567
    Abstract: Various embodiments include computer-implemented methods, computer program products and systems for analyzing at least one feature in a layout representing an integrated circuit (IC) for an overlay effect. In some cases, approaches include a computer-implemented method including: modeling a topography of the IC by running at least one of a chemical mechanical polishing (CMP) model, a deposition model or an etch model on a data file representing the IC after formation of an uppermost layer; modeling the at least one feature in the IC for an overlay effect using the topography model of the IC; and modifying the data file representing the IC after formation of the uppermost layer in response to detecting the overlay effect in the at least one feature, the overlay effect occurring in a layer underlying the uppermost layer.
    Type: Grant
    Filed: January 5, 2018
    Date of Patent: December 11, 2018
    Assignee: International Business Machines Corporation
    Inventors: Stephen E. Greco, Rasit O. Topaloglu