Controlling Web, Strand, Strip, Or Sheet Patents (Class 250/548)
  • Patent number: 11412650
    Abstract: A pick and place machine includes a feeder system configured to feed components to a picking location, a dispensing head configured to pick fed components from the picking location, a vision system configured to detect features of components picked by the dispensing head. The vision system includes an image capture device pointed in a direction. The pick and place machine further includes an illumination device that includes a plurality of light sources each configured to produce light having a controlled thickness and at a controlled angle relative to the direction. The controlled angle is configured to be non-normal with respect to the direction at which the image capture device is pointed.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: August 9, 2022
    Assignee: UNIVERSAL INSTRUMENTS CORPORATION
    Inventor: George D. Eck
  • Patent number: 11409205
    Abstract: A target for use in the measurement of misregistration between layers formed on a wafer in the manufacture of semiconductor devices, the target including a first pair of periodic structures (FPPS) and a second pair of periodic structures (SPPS), each of the FPPS and the SPPS including a first edge, a second edge, a plurality of first periodic structures formed in a first area as part of a first layer and having a first pitch along a first pitch axis, the first pitch axis not being parallel to either of the first edge or second edge, and a plurality of second periodic structures formed in a second area as part of a second layer and having the first pitch along a second pitch axis, the second pitch axis being generally parallel to the first pitch axis.
    Type: Grant
    Filed: June 25, 2020
    Date of Patent: August 9, 2022
    Assignee: KLA CORPORATION
    Inventors: Itay Gdor, Yuval Lubashevsky, Yuri Paskover, Yoram Uziel, Nadav Gutman
  • Patent number: 11397175
    Abstract: An apparatus adapted to examine a paper web includes a rotatable first bobbin, a rotatable second bobbin, and a first testing device. The first bobbin has a paper we wound thereabout that has transverse bands spaced apart along a length thereof. The second bobbin is arranged to receive the paper web from the first bobbin with a paper web path defined between the first and second bobbins. The first testing device is disposed along the paper web path and is arranged to nondestructively measure a diffusivity of one of the transverse bands of the paper web.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: July 26, 2022
    Assignee: RJ. Reynolds Tobacco Company
    Inventor: Balager Ademe
  • Patent number: 11385549
    Abstract: A management method of managing a processing apparatus that performs processing of a member, includes setting, in a case where adjustment of the processing apparatus is performed, an offset value to control the processing apparatus such that variance between results of processing by the processing apparatus before and after the adjustment is reduced.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: July 12, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tetsuya Taguchi
  • Patent number: 11366397
    Abstract: A method for simulation of lithography overlay is disclosed which comprises storing alignment parameters used to align a semiconductor wafer prior to a lithography step; storing process control parameters used during the lithography step on the semiconductor wafer, storing overlay parameters measured after the lithography step, calculating alternative alignment parameters and alternative process control parameters. The alternative alignment parameters and the alternative process control parameters are added to cleansed overlay parameters to obtain simulated lithography overlay data.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: June 21, 2022
    Assignee: Qoniac GmbH
    Inventors: Boris Habets, Stefan Buhl
  • Patent number: 11353796
    Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing a relative movement of the diffraction structure relative to the radiation beam from a first position, wherein the radiation beam does not irradiate the diffraction structure to a second position, wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from a diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining an intensity profile of the radiation beam based on the measured diffracted radiation signals.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: June 7, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Teis Johan Coenen, Han-Kwang Nienhuys, Sandy Claudia Scholz, Sander Bas Roobol
  • Patent number: 11308635
    Abstract: A method for aligning a wafer image with a reference image, comprising: searching for a targeted reference position on the wafer image for aligning the wafer image with the reference image; and in response to a determination that the targeted reference position does not exist: defining a current lock position and an area that encloses the current lock position on the wafer image; computing an alignment score of the current lock position; comparing the alignment score of the current lock position with stored alignment scores of positions previously selected in relation to aligning the wafer image with the reference image; and aligning the wafer image with the reference image based on the comparison.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: April 19, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Wei Fang, Lingling Pu
  • Patent number: 11275319
    Abstract: Provided is a lithography apparatus capable of detecting the abnormal holding of an original in a shorter period of time. The lithography apparatus is configured to form a pattern on a substrate through use of the original, and includes: a holding unit configured to hold the original on which a first mark is formed; a measuring unit configured to pick up an image of the first mark; and a control unit configured to: cause the measuring unit to obtain the image of the first mark on the original held by the holding unit with a focus position of the measuring unit being adjusted to a reference position; and determine that the original is being abnormally held by the holding unit when a change in a first contrast, which is a contrast of the image of the first mark with respect to a reference contrast, falls out of an allowable range.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: March 15, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Koshiro Arahara, Kazumasa Tanaka
  • Patent number: 11246218
    Abstract: Embodiments may include inductors with embedded magnetic cores and methods of making such inductors. In an embodiment, an integrated circuit package may include an integrated circuit die with a multi-phase voltage regulator electrically coupled to the integrated circuit die. In such embodiments, the multi-phase voltage regulator may include a substrate core and a plurality of inductors. The inductors may include a conductive through-hole disposed through the substrate core and a plugging layer comprising a dielectric material surrounding the conductive through-hole. In an embodiment, a magnetic sheath is formed around the plugging layer. In an embodiment, the magnetic sheath is separated from the plated through hole by the plugging layer. Additionally, a first layer comprising a dielectric material may be disposed over a first surface of the magnetic sheath, and a second layer comprising a dielectric material may be disposed over a second surface of the magnetic sheath.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: February 8, 2022
    Assignee: Intel Corporation
    Inventors: Chong Zhang, Ying Wang, Junnan Zhao, Cheng Xu, Yikang Deng
  • Patent number: 11221562
    Abstract: In some embodiments, a reticle structure is provided. The reticle structure includes a reticle stage and a reticle mounted on the reticle stage. The reticle stage includes plural first burls and plural second burls, in which the second burls are disposed on a center of the reticle stage and the first burls disposed on an edge of the reticle stage such that the first burls surround the second burls. The reticle includes a base material and a pattern layer overlying the base material. The base material is secured on the first and second burls of the reticle stage. The pattern layer includes plural first gratings, and each of the first burls is vertically aligned with one of the first gratings.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: January 11, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Yu Lee, Tao-Hsin Chen, Ching-Juinn Huang, Po-Chung Cheng
  • Patent number: 11215931
    Abstract: According to one embodiment, there is provided a semiconductor device manufacturing system, including a storage unit, a specifying unit, a determination unit and an adjustment unit. The storage unit stores device information indicating a relationship between image formation performance of an exposure device used for manufacturing a semiconductor device and mechanical operation accuracy. The specifying unit specifies a constraint of the mechanical operation accuracy according to the device information and the required image formation performance. The determination unit determines whether or not a correction parameter of an exposure condition satisfies the constraint. The adjustment unit adjusts the correction parameter according to a determination result of the determination unit.
    Type: Grant
    Filed: September 9, 2020
    Date of Patent: January 4, 2022
    Assignee: Kioxia Corporation
    Inventor: Masakazu Hamasaki
  • Patent number: 11168977
    Abstract: A thickness measuring apparatus for measuring the thickness of a workpiece held on a chuck table includes the followings: a light source configured to emit white light; an optical branching unit configured to branch, to a second optical path, reflected light applied from the light source to the workpiece held on the chuck table via a first optical path and reflected from the workpiece; a diffraction grating disposed in the second optical path; an image sensor configured to detect an optical intensity signal of light separated into each wavelength by the diffraction grating; and a thickness output unit configured to generate a spectral interference waveform on the basis of the optical intensity signal detected by the image sensor, determine the thickness on the basis of the spectral interference waveform, and output the thickness.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: November 9, 2021
    Assignee: DISCO CORPORATION
    Inventors: Nobuyuki Kimura, Keiji Nomaru
  • Patent number: 11156929
    Abstract: A detection apparatus includes an image pickup unit and a processor which detects a position of a mark using a two-dimensional image of the mark. The processor generates a one-dimensional signal having a plurality of peaks by accumulating images included in a detection region, detects peaks in which differences between values of the peaks and a reference value are equal to or larger than a threshold value and peaks in which differences between values of the peaks and the reference value are smaller than the threshold value from among the plurality of generated peaks and obtains a failure region in the mark, resets the detection region such that the differences between the values of the detected peaks and the reference value become smaller than the threshold value, generates a one-dimensional signal by accumulating images included in the reset detection region, and detects a position of the mark.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: October 26, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tadaki Miyazaki
  • Patent number: 11146715
    Abstract: A camera system includes an image sensor, a wavelength filter, and an imaging optical system. The image sensor has an image capturing plane. The imaging optical system is configured to have light coming from a subject passed through the wavelength filter and imaged on the image capturing plane. The wavelength filter has a perpendicularly incident region and an obliquely incident region. On the perpendicularly incident region, a principal ray, which has passed through the imaging optical system, is incident perpendicularly. On the obliquely incident region, a principal ray, which has passed through the imaging optical system, is incident obliquely. The image sensor has sensitivity to a light ray having a predetermined wavelength. The light ray having the predetermined wavelength is transmitted at a higher transmittance through at least a part of the obliquely incident region than through the perpendicularly incident region.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: October 12, 2021
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Michihiro Yamagata, Norihiro Imamura, Keiichi Matsuzaki
  • Patent number: 11137696
    Abstract: The present invention provides a lithography apparatus for performing a process of transferring a pattern of an original to each of shot regions two-dimensionally arrayed on a substrate, including a stage that moves while holding one of the substrate and the original, a measurement unit configured to measure, when performing the process, a positional shift amount between a mark provided on the original and a mark provided in each of the shot regions, and a control unit configured to control the process for the shot region so that after the process is performed successively for a plurality of first shot regions included in a first row, the process is performed successively for a plurality of second shot regions included in a second row adjacent to the first row.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: October 5, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Naosuke Nishimura
  • Patent number: 11087451
    Abstract: A method comprises obtaining a wafer comprising a plurality of components, wherein each of the plurality of components exposes a first surface of the component present in a first focal plane and a second surface of the component present in a second focal plane. The method comprises generating, by an optical tool, a first image of the first surface and a second image of the second surface of one of the plurality of components. The method comprises comparing, by a processor, the first image with a first reference image to produce a first value and the second image with a second reference image to produce a second value. The method comprises generating, by the processor, a wafer map indicating a quality state of the one of the plurality of components based on the first and second values.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: August 10, 2021
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Elizabeth C. Stewart, Young Sawk Oh, Zhiyi Yu, Jeffrey A. West, Thomas D. Bonifield
  • Patent number: 11073483
    Abstract: A display device and a detection method are provided. The display device includes a display panel including an effective area and a peripheral area located around the effective area; and a cover plate attached to the display panel, the cover plate including a visible region, and the boundary of the visible region of the cover plate is located outside the boundary of the effective region of the display panel in a direction parallel to the display panel; at least one pair of light sensitive luminescent marks disposed on the display panel and located near mutually opposite edges of the display panel. Each of the at least one pair of light sensitive luminescent marks is disposed inside or outside an effective area of the display panel in a direction parallel to the display panel.
    Type: Grant
    Filed: May 22, 2019
    Date of Patent: July 27, 2021
    Assignees: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Binfeng Feng, Xiaoxia Liu
  • Patent number: 11031277
    Abstract: A processing apparatus includes a holding table. The holding table includes a frustoconical portion and a wafer holding portion formed on the upper surface of the frustoconical portion for holding the wafer. Light is applied from a light emitting member to the side surface of the frustoconical portion and next reflected on the side surface of the frustoconical portion. The light reflected is applied to the outer circumference of the wafer held on the wafer holding portion of the holding table to thereby image the outer circumference of the wafer by an imaging unit.
    Type: Grant
    Filed: August 29, 2019
    Date of Patent: June 8, 2021
    Assignee: DISCO CORPORATION
    Inventors: Mayumi Kusakawa, Yukiyasu Masuda
  • Patent number: 11029254
    Abstract: There are provided a welding monitoring system which can multidimensionally monitor a welding portion with high accuracy and a monitoring method thereof, by using a relatively simple configuration.
    Type: Grant
    Filed: July 11, 2018
    Date of Patent: June 8, 2021
    Assignee: HITACHI, LTD.
    Inventors: Ryoji Nakagawa, Hisashi Endou, Hiroshi Yoshikawa, Toshihiro Yamada, Nobuhiro Kakeno
  • Patent number: 11027657
    Abstract: A system for variable transmittance mirrors is disclosed wherein the variable transmittance mirrors may be controlled in response to images captured from a camera. The system may comprise a first imager, a first variable transmittance mirror, and a controller. The first imager comprises a pixel array. Further, the first imager is configured to capture image data. The first variable transmittance mirror has a first level of transmittance. Finally, the controller is configured to assign a first light intensity value to one or more pixels and change the first level of transmittance to a second level of transmittance based at least in part on the detected first light intensity. Such as system has the advantage of eliminating the need for a dedicated glare sensor, therefore reducing the number of devices, the costs, obstructions in a user's field of view, and a more aesthetically appealing appearance.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: June 8, 2021
    Assignee: GENTEX CORPORATION
    Inventors: Benjamin B. Hilldore, Barry K. Nelson
  • Patent number: 11003904
    Abstract: Apparatus for the detection of print marks with a sensor arrangement which has at least one contrast sensor, which for generation of a cyclical sensor signal is disposed above the area of printed material containing the print mark which is passed below the contrast sensor, said apparatus also having a signal conditioning unit. The signal conditioning unit has at least one filter unit with a first filter for determination of the first derivation of the sensor signal, and on the basis of an evaluation of at least the first derivation of the sensor signal the filter unit generates at least one output value which is representative of print marks.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: May 11, 2021
    Assignee: B&R INDUSTRIAL AUTOMATION GMBH
    Inventor: Thomas Enzinger
  • Patent number: 10983361
    Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: April 20, 2021
    Assignee: ASML Netherlands B.V
    Inventors: Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Stefan Michael Bruno Bäumer
  • Patent number: 10971386
    Abstract: A method for positioning a mobile device relative to a stationary device in a semiconductor manufacturing environment is disclosed. The method includes detecting a target affixed to the stationary device at a target location, wherein the target location corresponds to a location of the target relative to a reference point on the stationary device, determining a first position coordinate offset value based upon detecting the target, and moving the mobile device, using the first position coordinate offset value, relative to train the mobile device to move relative to the stationary device for the stationary device to performing a semiconductor manufacturing operation.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: April 6, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    Inventors: Yan-Han Chen, Cheng-Kang Hu, Ren-Hau Wu, Cheng-Hung Chen, Feng-Kuang Wu, Hsu-Shui Liu, Jiun-Rong Pai, Shou-Wen Kuo
  • Patent number: 10935500
    Abstract: There are provided a welding monitoring system which can multidimensionally monitor a welding portion with high accuracy and a monitoring method thereof, by using a relatively simple configuration.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: March 2, 2021
    Assignee: HITACHI, LTD.
    Inventors: Ryoji Nakagawa, Hisashi Endou, Hiroshi Yoshikawa, Toshihiro Yamada, Nobuhiro Kakeno
  • Patent number: 10915033
    Abstract: Combination of a stage and a level sensor configured to sense a height level at a target location on an object is described, the stage comprising an object table configured to hold the object and a positioning device for displacing the object table relative to the level sensor in a first direction, the level sensor comprising a projection system configured to project a measurement beam onto a measurement area of the object, the measurement area having a measurement area length in the first direction, a detector system configured to receive different portions of the measurement beam after being reflected off different sub-areas within the measurement area, the different sub-areas being arranged in the first direction, and to supply output signals representative of the different portions received, a signal processing system configured to process the output signals from the detector system.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: February 9, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Bram Van Hoof, Jeroen Cottaar
  • Patent number: 10907952
    Abstract: An optical measurement device and method are disclosed. A position measurement device is provided with a device for measuring inclinations of an optical detection module (5) and a substrate carrier (6) which are measured during movement of the optical detection unit and the substrate carrier. Calculation and correction can be made according to the inclination data and with reference to displacements of the optical detection module (5) and the substrate carrier (6) and coordinates of their positions. During measurement for a certain point on the substrate, measured data related to the point is corrected by using the device and the method, which improves measurement precision, thus eliminating a large error caused in measurement for a large-sized substrate (9).
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: February 2, 2021
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Yuzhi Li, Bing Xu, Zhiyong Yang, Chang Zhou
  • Patent number: 10895811
    Abstract: A lithographic apparatus prints a focus metrology pattern (T) on a substrate, the printed pattern including at least a first array of features (800). Features at any location within the array define a pattern that repeats at in at least a first direction of periodicity (X), while geometric parameters of the repeating pattern (w1, w3) vary over the array. A focus measurement is derived from measurements of the array at a selected subset of locations (ROI). As a result, the geometric parameters upon which the measurement of focus performance is based can be optimized by selection of locations within the array. The need to optimize geometric parameters of a target design on a reticle (MA) is reduced or eliminated. The measured property may be asymmetry, for example, and/or diffraction efficiency. The measured property for all locations may be captured by dark-field imaging, and a subset of locations selected after capture.
    Type: Grant
    Filed: October 11, 2019
    Date of Patent: January 19, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Miguel Garcia Granda, Elliott Gerard Mc Namara, Pierre-Yves Jerome Yvan Guittet, Eric Jos Anton Brouwer, Bart Peter Bert Segers
  • Patent number: 10859912
    Abstract: An imprint apparatus includes a mold holder for holding a mold, a substrate holder for holding a substrate, a dispenser for arranging imprint material on the substrate, and a scope for capturing an image of a mark. The substrate holder includes a reference plate having a reference mark whose image is captured by the scope, the dispenser is arranged in a first direction when viewed from the mold holder, and the reference plate is arranged between a virtual straight line which is parallel to a second direction perpendicular to the first direction when viewed from the mold holder and passes through a center of the substrate holder, and an edge of the substrate holder located in the first direction when viewed from the virtual straight line.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: December 8, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Ken-ichiro Shinoda, Masahiro Tamura
  • Patent number: 10831116
    Abstract: The present invention provides a pattern forming apparatus including a detection optical system configured to obtain optical information of a mark provided on a substrate by detecting the mark, and a processing unit configured to perform a process of obtaining a position of the mark by using a template for obtaining the position of the mark by being applied to the optical information of the mark and a window which indicates a region for extracting an amount of characteristic indicating the position of the mark from a waveform signal obtained from the optical information, wherein the processing unit decides, based on the optical information of the mark obtained by the detection optical system, a parameter indicating at least one of a shape of the template and a shape of the window for each of a plurality of substrates.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: November 10, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Shinichi Egashira
  • Patent number: 10830587
    Abstract: Provided is an inclination measuring device with excellent convenience. An inclination measuring device includes: an optical system (sensor head) configured to irradiate a measurement object with an irradiated light ray from a light source and receive a reflected light ray from a measurement surface; a light receiving unit including at least one spectroscope configured to separate the reflected light ray into wavelength components, and a detector in which a plurality of light receiving elements are disposed; a light guide including a plurality of cores; and a processor configured to calculate an inclination angle of the measurement surface based on reflected light rays with respect to a plurality of irradiated light rays with which a plurality of positions on the measurement surface are irradiated.
    Type: Grant
    Filed: October 27, 2017
    Date of Patent: November 10, 2020
    Assignee: OMRON CORPORATION
    Inventors: Kosuke Sugiyama, Norihiro Tomago, Takahiro Suga, Hiroaki Takimasa, Kenichi Matoba
  • Patent number: 10831110
    Abstract: A method includes receiving a wafer, defining a plurality of zones over the wafer, performing a multi-zone alignment compensation for each of the plurality of zones according to an equation along a first direction to obtain a plurality of compensation values for each of the plurality of zones, and performing a wafer alignment and a lithography exposure for each of the plurality of zones according to the plurality of compensation values. The wafer alignment and the lithography exposure are performed zone-by-zone.
    Type: Grant
    Filed: May 29, 2018
    Date of Patent: November 10, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Ai-Jen Hung, Yung-Yao Lee, Heng-Hsin Liu, Chin-Chen Wang, Ying Ying Wang
  • Patent number: 10810730
    Abstract: In some examples, a method for nondestructive testing of a component may include flashing the component using a flash lamp configured for flash thermography, collecting first image data regarding the component using an infrared camera, flowing a fluid through the component, and collecting second image data regarding the component using the infrared camera. A system for nondestructive testing of a component may include a single inspection station and a flash lamp configured for flash thermography, means for supplying a fluid to the component, and an infrared camera disposed at the inspection station.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: October 20, 2020
    Assignee: Rolls-Royce Corporation
    Inventors: Joseph Peter Henderkott, Pramod Khandelwal, Danny Ray Carr, Timothy Paul Fuesting, Jeffrey F. Rhodes
  • Patent number: 10797758
    Abstract: Provided is an electronic device having a control device, a driver circuit coupled to the control device. The driver circuit is configured to alter conductance. A partial power source is coupled to the control device and is configured to provide a voltage potential difference to the control device and the driver circuit as a result of the partial power source being in contact with a conductive fluid. The partial power source includes a first material electrically coupled to the control device and a second material electrically coupled to the control device and electrically isolated from the first material. An inductor is coupled to the driver circuit. The driver circuit is configured to develop a current through the inductor. The magnitude of the current developed through the inductor is varied to produce an encoded signal that is remotely detectable by a receiver. Receivers to receive and decode also are disclosed.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: October 6, 2020
    Inventors: Alireza Shirvani, Mark Zdeblick, Jonathan Withrington
  • Patent number: 10754264
    Abstract: The present invention provides a lithography apparatus that forms patterns on substrates including a first substrate and a second substrate following the first substrate, the apparatus including a decision unit configured to obtain a first layout of a plurality of shot regions on a first substrate from detection values of marks in sample shot regions included in each of a plurality of different combinations each constituted by at least two sample shot regions, of sample shot regions where a detection unit has detected the marks in fine alignment with respect to the first substrate and decide sample shot regions included in one of the plurality of combinations as sample shot regions where the detection unit detects the marks in pre-alignment with respect to a second substrate based on the first layout.
    Type: Grant
    Filed: November 6, 2018
    Date of Patent: August 25, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tomohiro Mase
  • Patent number: 10755016
    Abstract: Metrology overlay targets are provided, as well as method of monitoring process shortcomings. Targets comprise periodic structures, at least one of which comprising repeating asymmetric elements along a corresponding segmentation direction of the periodic structure. The asymmetry of the elements may be designed in different ways, for example as repeating asymmetric sub-elements along a direction perpendicular to the segmentation direction of the elements. The asymmetry of the sub-elements may be designed in different ways, according to the type of monitored process shortcomings, such as various types of hot spots, line edge shortening, process windows parameters and so forth. Results of the measurements may be used to improve the process and/or increase the accuracy of the metrology measurements.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: August 25, 2020
    Assignee: KLA-Tencor Corporation
    Inventor: Boris Golovanevsky
  • Patent number: 10684562
    Abstract: A measurement device is equipped with a surface plate, a slider which holds a substrate and which is movable relative to the surface plate, a drive system that moves the slider, a first position measurement system which measures the slider's first position information relative to the surface plate, a measurement unit having a mark detection system that detects a mark on a substrate, a second position measurement system which measures a relative second position information between the mark detection system and substrate, and a controller which obtains the first position information from the first position measurement system and second position information from the second position measurement system while controlling the slider's movement by the drive system, and obtains position information of a plurality of marks based on detection signals of the mark detection system having detected marks on the substrate, the first position information, and the second position information.
    Type: Grant
    Filed: August 9, 2017
    Date of Patent: June 16, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10670978
    Abstract: A spectrally broadened radiation apparatus, including a laser configured to emit, through an output of the laser, radiation substantially only in the visible region of the electromagnetic spectrum, the radiation having a nominal wavelength, and an optical fiber optically coupled to the output of the laser, the optical fiber having an input to receive the radiation from the laser and having an output to provide spectrally broadened output radiation, the optical fiber configured to spectrally broaden the radiation from the laser to a spectral width of at least 0.5 nm around the nominal wavelength.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: June 2, 2020
    Assignee: ASML Holding N.V.
    Inventors: King Pui Leung, Tao Chen, Kevin J. Violette
  • Patent number: 10642168
    Abstract: An auxiliary exposure apparatus is for performing auxiliary exposure of applying light of a predetermined wavelength from a laser light source to a resist film on a wafer, separately from exposure processing of transferring a pattern of a mask to the resist film applied on the wafer. The auxiliary exposure apparatus includes a first total reflection mirror that reflects the light from the laser light source toward the wafer; and an imaging device including a light receiving part that receives light after reflected by the wafer.
    Type: Grant
    Filed: September 29, 2017
    Date of Patent: May 5, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Hideaki Kashiwagi, Takafumi Niwa, Norihisa Koga
  • Patent number: 10636138
    Abstract: A polarized image acquisition apparatus includes a division type half-wave plate, located opposite to the mask substrate with respect to an objective lens and near an objective lens pupil position, to arrange P and S polarized waves of the transmitted light having passed through the objective lens to be mutually orthogonal, a Rochon prism to separate trajectories of P and S polarized waves, an imaging lens to form images of P and S polarized waves having passed through the Rochon prism at image formation positions different from each other, a mirror, in a case where one of P and S polarized waves is focused/formed at one of the different image formation positions, to reflect the other wave at the other position, a first sensor to capture an image of one of P and S polarized waves, and a second sensor to capture an image of the other wave.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: April 28, 2020
    Assignee: NuFlare Technology, Inc.
    Inventor: Riki Ogawa
  • Patent number: 10630852
    Abstract: An image reading apparatus includes a roller that transports a document; a reading unit that reads an image of the document which is transported; a DC motor that drives the roller; and a control unit that controls the DC motor. The control unit is configured to stop driving of the DC motor in a case where a driving load value obtained when the DC motor is driven exceeds a threshold. A first threshold which is applied in a case of a first document and a second threshold which is applied in a case of a second document of which a basis weight is larger than a first basis weight are set, and the first threshold is less than the second threshold.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: April 21, 2020
    Assignee: Seiko Epson Corporation
    Inventors: Kazuhiko Arimori, Kazuya Yoshikaie, Kosuke Nomoto
  • Patent number: 10620548
    Abstract: A method comprising illuminating a patterning device (MA?) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by t
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Pieter Bart Aloïs De Buck, Nico Vanroose, Giovanni Imponente, Roland Johannes Wilhelmus Stas, Chanpreet Kaur, James Robert Downes
  • Patent number: 10613007
    Abstract: Apparatus and method for testing a sheet of brittle material comprising the steps of measuring one or more edge features of a sheet of brittle material, imparting a bend to the sheet of brittle material and producing relative motion between the sheet and the bend such that the bend traverses the sheet. A stress can be induced in the sheet as a function of the relative motion and imparted bend, wherein the induced stress corresponds to a predetermined strength value, and the measured one or more edge features can be correlated with the strength value.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: April 7, 2020
    Assignee: Corning Incorporated
    Inventors: Gabriel Pierce Agnello, Chong Pyung An, William Kenneth Denson, Peter Knowles, David Bruce Moorehouse, Denwood Falconer Ross, III, Correy Robert Ustanik, Siva Venkatachalam
  • Patent number: 10578976
    Abstract: A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.
    Type: Grant
    Filed: December 3, 2018
    Date of Patent: March 3, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Toralf Gruner, Christoph Zaczek, Ralf Mueller
  • Patent number: 10571816
    Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.
    Type: Grant
    Filed: May 20, 2019
    Date of Patent: February 25, 2020
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Jasper Wesselingh, Michael Erath, Ansgar Holle, Stefan Troeger, Alexander Vogler
  • Patent number: 10560677
    Abstract: A three-dimensional image processing apparatus and a method of controlling power of same are provided. The three-dimensional image processing apparatus may include a display, a three-dimensional image filter disposed a prescribed distance from the display to adjust optical paths of the displayed view images, a camera configured to capture an image of a user, an ambient light sensor, and a controller configured to control the view images, the three-dimensional image filter, or the camera. The controller may determine a position of the user based on the captured image and adjust a perceived three-dimensional view of the view images based on the determined position of the user. Moreover, the controller may control an operational state of the camera and the at least one process based on the determined position of the user or a detected amount of ambient light.
    Type: Grant
    Filed: November 9, 2012
    Date of Patent: February 11, 2020
    Assignee: LG ELECTRONICS INC.
    Inventors: Hongrae Cha, Kwangyeol Choi, Taesoo Park, Jaekwang Lee, Wooyoung Kwak
  • Patent number: 10535610
    Abstract: A semiconductor structure is disclosed. The semiconductor structure includes a substrate having a scribe line region. A material layer is formed on the scribe line region and has a rectangular region defined therein. The rectangular region has a pair of first edges parallel with a widthwise direction of the scribe line region and a pair of second edges parallel with a lengthwise direction of the scribe line region. A pair of first alignment features is formed in the material layer along the first edges, and a pair of second alignment features is formed in the material layer along the second edges. The space between the pair of first alignment features is larger than a space between the pair of the second alignment features.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: January 14, 2020
    Assignees: UNITED MICROELECTRONICS CORP., Fujian Jinhua Integrated Circuit Co., Ltd.
    Inventors: Feng-Yi Chang, Fu-Che Lee, Yi-Wang Zhan, Chia-Liang Liao, Yu-Cheng Tung, Chien-Hao Chen, Chia-Hung Wang
  • Patent number: 10533848
    Abstract: An overlay metrology system may include a controller to generate optical tool error adjustments for a hybrid overlay target including optically-resolvable features and device-scale features by measuring a difference between an optical overlay measurement based on the optically-resolvable features and a device-scale overlay measurement based on the device-scale features, generate target-to-device adjustments for the hybrid overlay target based on positions of features within the device area, determine device-relevant overlay measurements for one or more locations in the device area based on at least one of the optical overlay measurement, the optical tool error adjustments, or the target-to-device adjustments, and provide overlay correctables for the device area to a lithography tool to modify exposure conditions for at least one subsequent exposure based on the device-relevant overlay measurements.
    Type: Grant
    Filed: August 7, 2018
    Date of Patent: January 14, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Andrei V. Shchegrov, Frank Laske, Nadav Gutman
  • Patent number: 10529055
    Abstract: A method and apparatus for identifying the orientation of an image in a spherical format. A spherical format is created of an image obtained by a camera, the spherical format comprising a notional sphere that has a centre corresponding to the position from which the image was obtained by the camera. A first surface represented in the image had a first orientation and was at a first distance from the camera when the image was obtained. A plurality of lines are obtained in the spherical format, each line defined by two endpoints in spherical coordinates, wherein each line intersects with at least one other line. For each of a plurality of rotational definitions of the sphere, the spherical coordinates of the endpoints are transformed into a Cartesian coordinate system relative to the rotational definition, thereby creating rotated lines, and a cumulative deviation, from a predetermined angle, is determined of angles between intersecting rotated lines.
    Type: Grant
    Filed: June 28, 2018
    Date of Patent: January 7, 2020
    Assignee: EYESPY360 LIMITED
    Inventor: Peter Vassilev Sedeffow
  • Patent number: 10527957
    Abstract: A lithographic apparatus has a substrate table on which a substrate is positioned, and an alignment sensor used to measure the alignment of the substrate. In an exemplary processing method, the alignment sensor is used to perform one or more edge measurements in a first step. In a second step, one or more edge measurements are performed on the notch of the substrate. The edge measurements are then used to align the substrate in the lithographic apparatus. In a particular example, the substrate is arranged relative to the alignment sensor such that a portion of the edge surface is positioned at the focal length of the lens. When the alignment sensor detects radiation scattered by the edge surface at the focal length of the lens, the presence of the edge of the substrate is detected.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: January 7, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Cayetano Sanchez-Fabres Cobaleda, Franciscus Godefridus Casper Bijnen, Edo Maria Hulsebos, Arie Jeffrey Den Boef, Marcel Hendrikus Maria Beems, Piotr Michał Stolarz
  • Patent number: 10520824
    Abstract: A light combiner (500) for use in a metrology tool includes a plurality of light sources (LED 1, LED 2, LED 3, LED 4, LED 5), a first filter (502), and a second filter (504). The first filter is designed to substantially reflect light generated from a first source of the plurality of light sources, and to substantially transmit light generated from a second source of the plurality of light sources. The second filter is designed to substantially reflect light generated from the first source and the second source of the plurality of light sources, and to substantially transmit light generated from a third source of the plurality of light sources. An angle of incidence of the light generated from the first source on a surface of the first filter is less than 30 degrees.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: December 31, 2019
    Assignees: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Ronald Franciscus Herman Hugers, Parag Vinayak Kelkar, Paulus Antonius Andreas Teunissen