Controlling Web, Strand, Strip, Or Sheet Patents (Class 250/548)
  • Patent number: 11899380
    Abstract: An apparatus for and method of sensing alignment marks in which a self-referencing interferometer based sensor outputs standing images of the alignment marks and camera device is used to capture the images as output by the sensor and a detector is used to obtain phase information about the alignment marks from the images as output by the sensor.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: February 13, 2024
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Igor Matheus Petronella Aarts, Junwon Lee
  • Patent number: 11901232
    Abstract: Embodiments of the present disclosure include methods of determining scribing offsets in a hybrid laser scribing and plasma dicing process. In an embodiment, the method comprises forming a mask above a semiconductor wafer. In an embodiment, the semiconductor wafer comprises a plurality of dies separated from each other by streets. In an embodiment, the method further comprises patterning the mask and the semiconductor wafer with a laser scribing process. In an embodiment, the patterning provides openings in the streets. In an embodiment, the method further comprises removing the mask, and measuring scribing offsets of the openings relative to the streets.
    Type: Grant
    Filed: June 22, 2020
    Date of Patent: February 13, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Karthik Balakrishnan, Jungrae Park, Zavier Zai Yeong Tan, Sai Abhinand, James S. Papanu
  • Patent number: 11892402
    Abstract: An apparatus for the high throughput measurement of optical properties of liquid samples placed into the wells of a multiwell plate is disclosed. An optical fiber within a fiber bundle containing no corrective optics between the fiber ends and the well plate bottom illuminates the sample in order to induce fluorescence, and multiple fibers collect emission radiation and transmit it to a fluorescence detector such as a spectrometer. Other embodiments involve a light scattering illumination source with detection fibers located in either the same bundle containing the fluorescence monitoring fibers or an independent light scattering detection bundle for the measurement of static and/or dynamic light scattering. Some embodiments of the invention permit the measurement of phase analysis light scattering. Thus the measurement of multiple optical properties of a liquid sample may be made simultaneously or in succession. A method for these measurements is also disclosed.
    Type: Grant
    Filed: March 9, 2021
    Date of Patent: February 6, 2024
    Assignee: Wyatt Technology, LLC
    Inventors: Vincent Hsieh, Mario Yasa, Jr., Steven C. Minne
  • Patent number: 11893744
    Abstract: The techniques described herein relate to methods, apparatus, and computer readable media configured to determining a two-dimensional (2D) profile of a portion of a three-dimensional (3D) point cloud. A 3D region of interest is determined that includes a width along a first axis, a height along a second axis, and a depth along a third axis. The 3D points within the 3D region of interest are represented as a set of 2D points based on coordinate values of the first and second axes. The 2D points are grouped into a plurality of 2D bins arranged along the first axis. For each 2D bin, a representative 2D position is determined based on the associated set of 2D points. Each of the representative 2D positions are connected to neighboring representative 2D positions to generate the 2D profile.
    Type: Grant
    Filed: May 10, 2021
    Date of Patent: February 6, 2024
    Inventors: Hongwei Zhu, Nathaniel Bogan, David J. Michael
  • Patent number: 11877400
    Abstract: A panel alignment device for a display device includes a stage supporting a panel and including a transmitting portion that includes a first region having a first thickness and a second region having a second thickness greater than the first thickness, a head disposed over the stage and supporting a driving chip, a vision camera which is disposed under the stage, captures a first alignment mark of the panel through the first region, and captures a second alignment mark of the driving chip through the second region, and a controller which controls at least one of a movement and a rotation of each of the stage and the head based on first image information related to a position of the first alignment mark and second image information related to a position of the second alignment mark.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: January 16, 2024
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Jungseon Park, Wunbong Tak, Jaeseong Lee
  • Patent number: 11835470
    Abstract: A detection apparatus that detects a mark formed on a substrate is provided. The detection apparatus comprises a detection optical system that irradiates light on the mark on the substrate held by a stage and detects an image of the mark, and a processor that performs a detection process of the mark based on the image of the mark. The processor finds a detection value indicating a position of the mark in an observation field of the detection optical system based on the image of the mark, finds a subregion in which the mark is located among a plurality of subregions in the observation field, and corrects the detection value based on a correction value corresponding to the found subregion among correction values predetermined for the plurality of subregions, respectively.
    Type: Grant
    Filed: November 29, 2021
    Date of Patent: December 5, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Kazuya Kijima
  • Patent number: 11837431
    Abstract: The device includes a beam source for generating an electron beam, a beam guiding tube passed through an objective lens, an objective lens for generating a magnetic field in the vicinity of the specimen to focus the particles of the particle beam on the specimen, a control electrode having a potential for providing a retarding field to the particle beam near the specimen to reduce the energy of the particle beam when the beam collides with the specimen, a deflection system including a plurality of deflection units situated along the optical axis for deflecting the particle beam to allow scanning on the specimen with large area, at least one of the deflection units located in the retarding field of the beam, the remainder of the deflection units located within the central bore of the objective lens, and a detection unit to capture secondary electron (SE) and backscattered electrons (BSE).
    Type: Grant
    Filed: June 25, 2018
    Date of Patent: December 5, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Shuai Li, Zhongwei Chen
  • Patent number: 11822233
    Abstract: An image pickup apparatus includes a stage configured to support a sample at a plurality of support points, a bending data acquisition unit configured to acquire bending data corresponding to a bending of the sample supported on the stage, a height information detection unit configured to detect a height of the sample supported on the stage, a difference value calculation unit configured to calculate a difference value between a height indicated by height information and a height indicated by the bending data at each of a plurality of points on the sample, a correction data calculation unit configured to calculate correction data based on the difference value, and an estimation unit configured to calculate estimation data for estimating the height of the sample by correcting the bending data using the correction data.
    Type: Grant
    Filed: July 16, 2020
    Date of Patent: November 21, 2023
    Assignee: Lasertec Corporation
    Inventors: Hiroki Miyai, Yoshito Fujiwara, Yoshihiro Kato
  • Patent number: 11808560
    Abstract: A measuring equipment, applied to carry a workpiece to be measured, includes a main base and a positioning device. The main base includes a measuring center axis. The positioning device includes at least two positioning elements. Each of the at least two positioning elements is disposed movably on the main base, and each of the at least two positioning elements is moved with respect to the measuring center axis. An identical distance is there from each of the at least two positioning elements to the measuring center axis. Each of the at least two positioning elements is used for the workpiece to contact and to be positioned to the measuring center axis.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: November 7, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yi-Cheng Chen, Yi-Chia Hsu, Chia-Ching Lin, Chih-Chieh Chao
  • Patent number: 11796927
    Abstract: A method and device for enhancing alignment performance of a lithographic device can provide an optimal alignment light source type to perform alignment according to product features. Overlay performance of the product can be improved, wafer reject can be reduced, and production efficiency can be enhanced.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: October 24, 2023
    Assignee: CHANGXIN MEMORY TECHNOLOGIES, INC.
    Inventor: Zhao Cheng
  • Patent number: 11781996
    Abstract: There are provided an overlay measuring device and a method for controlling a focus and a program therefor. An overlay measuring device controlling a focus in one embodiment includes an objective lens; a memory; a lens focus actuator operating the objective lens to adjust a distance between the objective lens and a wafer; and a processor controlling operations of the memory and the lens focus actuator, wherein the processor is configured to obtain a first height value in relation to each site of the wafer, match the obtained first height value and a corresponding site and store the same, and as initial measurement in relation to each site of the wafer starts, control the lens focus actuator, based on the stored first height value of the site, to control a Z-axis movement of the objective lens.
    Type: Grant
    Filed: May 2, 2023
    Date of Patent: October 10, 2023
    Assignee: AUROS TECHNOLOGY, INC.
    Inventors: Ji-Hoon Kang, Hyun-Tae Kim
  • Patent number: 11715660
    Abstract: According to one embodiment, a position measuring apparatus includes a substrate holding part, a projection part, a liquid supply part, an imaging part, a position measuring part, and a control unit. The substrate holding part is configured to hold a substrate including at least part of a circuit pattern. The projection part is configured to irradiate the substrate held on the substrate holding part with illumination light, and to transmit reflected light from the substrate, of the illumination light radiated on the substrate. The liquid supply part is configured to supply a liquid into a space between the substrate held on the substrate holding part and the projection part. The imaging part is configured to receive the reflected light transmitted through the projection part, and to generate an image signal based on the reflected light. The position measuring part is configured to obtain positional information on a position of the substrate holding part.
    Type: Grant
    Filed: June 15, 2021
    Date of Patent: August 1, 2023
    Assignee: Kioxia Corporation
    Inventor: Manabu Takakuwa
  • Patent number: 11692947
    Abstract: A die bonding apparatus includes a first illumination device for irradiating a die with light along an optical axis of a photographing device, and a second illumination device that is located above the first illumination device and irradiates the die with light having a predefined angle with respect to the optical axis. The second illumination device includes a second light emitting section, and a light path control member that limits a light path of second irradiation light emitted from the second light emitting section. The second illumination device is disposed in such a way that the second irradiation light, the light path of which is limited by the light path control member, passes through the cylinder of the first illumination device, and the top surface of the die is irradiated with the second irradiation light.
    Type: Grant
    Filed: July 16, 2021
    Date of Patent: July 4, 2023
    Assignee: Fasford Technology Co., Ltd.
    Inventors: Yuta Ono, Hideharu Kobashi, Koji Hosaka, Masaaki Yoshiyama
  • Patent number: 11662669
    Abstract: An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a second sensor for sensing a height of the substrate over a second area. The apparatus further comprises a processor adapted to normalize first data corresponding to a signal from the first sensor with a second sensor footprint to produce a first normalized height data, and to normalize second data corresponding to a signal from the second sensor with a first sensor footprint to produce a second normalized height data. The processor is adapted to determine a correction to a measured height of the substrate based on a difference between the first and second normalized height data.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: May 30, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Andrey Valerievich Rogachevskiy, Martin Jules Marie-Emile De Nivelle, Arjan Gijsbertsen, Willem Richard Pongers, Viktor Trogrlic
  • Patent number: 11651985
    Abstract: An alignment system includes a light source for emitting a light. An alignment mark is disposed on a substrate for receiving the light. The alignment mark includes a first pattern and a second pattern disposed on the substrate. The first pattern includes a first region and a second region. The second pattern includes a third region and a fourth region. The first region and the third region are symmetrical with respective to a symmetrical axis. The second region and the fourth region are symmetrical with respective to the symmetrical axis. The first region includes first mark lines parallel to each other. The second region includes second mark lines parallel to each other. A first pitch is disposed between the first mark lines adjacent to each other. A second pitch is disposed between the second mark lines adjacent to each other. The first pitch is different from the second pitch.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: May 16, 2023
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Yu-Wei Cheng, Chien-Hao Chen
  • Patent number: 11640118
    Abstract: A method of pattern alignment is provided. The method includes identifying a reference pattern positioned below a working surface of a wafer. The wafer is exposed to a first pattern of actinic radiation. The first pattern is a first component of a composite pattern. The first pattern of actinic radiation is aligned using the reference pattern. The wafer is exposed to a second pattern of actinic radiation. The second pattern is a second component of the composite pattern and exposed adjacent to the first pattern. The second pattern of actinic radiation is aligned with the first pattern of actinic radiation using the reference pattern.
    Type: Grant
    Filed: August 17, 2021
    Date of Patent: May 2, 2023
    Assignee: Tokyo Electron Limited
    Inventor: Anton J. Devilliers
  • Patent number: 11640119
    Abstract: An exposure method of performing an exposure operation of exposing a substrate via a projection optical system is provided. The method includes executing, in an exposure period in which the exposure operation is performed, aberration correction of the projection optical system to correct an aberration generated by performing the exposure operation, measuring, in a non-exposure period succeeding the exposure period, in which the exposure operation is not performed, an aberration of the projection optical system, and correcting the aberration of the projection optical system using a correction amount adjusted based on a result of the measurement so as to reduce a correction residual in the aberration correction of the projection optical system.
    Type: Grant
    Filed: September 11, 2020
    Date of Patent: May 2, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tetsuya Yamamoto
  • Patent number: 11549801
    Abstract: A three-dimensional target capable of serving as a positioning reference, including, on a useful face, a first structure and a second structure. The first structure defines a planar reference face divided up between at least a first portion whose surface is reflective according to a diffuse reflection, and a second portion whose surface is reflective according to a specular reflection, the second portion being divided up according to a series of localized zones positioned in the first portion. The second structure has an inclined face relative to the planar reference face. Applicable to three-dimensional optical measurement of the relative position between a first object and a second object.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: January 10, 2023
    Assignee: LDI FINANCES
    Inventors: Philippe Jacot, Sebastien Laporte, Frederic Perret
  • Patent number: 11538714
    Abstract: An apparatus may include a clamp to clamp a substrate wherein the clamp is arranged opposing a back side of the substrate; and an illumination system, disposed to direct radiation to the substrate, when the substrate is disposed on the clamp, wherein the radiation comprises a radiation energy, equal to or above a threshold energy to generate mobile charge in the substrate, where the illumination system is disposed to direct radiation to the back side of the substrate.
    Type: Grant
    Filed: May 21, 2020
    Date of Patent: December 27, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Qin Chen, Julian G. Blake, Michael W. Osborne, Steven M. Anella, Jonathan D. Fischer
  • Patent number: 11538786
    Abstract: A transfer printing method and a transfer printing apparatus. The transfer method includes: transferring a plurality of devices formed on an original substrate to a transfer substrate; obtaining first position information of positions of the plurality of devices on the transfer substrate; obtaining second position information of corresponding positions, on a target substrate, of devices to be transferred; comparing the first position information with the second position information to obtain first target position information recording a first transfer position; and aligning the transfer substrate with the target substrate and performing a site-designated laser irradiation on at least part of devices on the transfer substrate corresponding to the first transfer position, simultaneously, according to the first target position information, so as to transfer the at least part of the devices from the transfer substrate to the target substrate.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: December 27, 2022
    Assignees: ORDOS YUANSHENG OPTOELECTRONICS CO., LTD., BEIJING BOE TECHNOLOGY DEVELOPMENT CO., LTD.
    Inventors: Xinglong Luan, Jing Feng, Fuqiang Li, Zhichong Wang, Peng Liu, Wusheng Li, Chunjing Liu
  • Patent number: 11531276
    Abstract: The control unit controls the relative position in an optical axis direction of the projection system and the relative position in a direction perpendicular to an optical axis direction at a third timing after a second timing based on a first distribution of illumination light detected by the detection system at a first timing and a second distribution of illumination light detected by the detection system at the second timing after the first timing, the illumination light detected at the first and second timings having passed through the first and second marks.
    Type: Grant
    Filed: October 20, 2021
    Date of Patent: December 20, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Akio Akamatsu
  • Patent number: 11521826
    Abstract: An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.
    Type: Grant
    Filed: September 21, 2018
    Date of Patent: December 6, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Jian Zhang, Zhiwen Kang, Yixiang Wang
  • Patent number: 11513082
    Abstract: Apparatus inspects the presence/absence of foreign substance on object having inspection region and non-inspection region arranged outside the inspection region. The apparatus includes sensor for illuminating the object and output, as image, result acquired by detecting light from region including the inspection region, and processor for detecting foreign substance based on inspection region image acquired by excluding non-inspection region image, which is image of the non-inspection region, from the image output from the sensor. The non-inspection region image includes first part generated by light from predetermined part of the non-inspection region of the inspected object and second part whose pixel value is continuous from pixel value of the first part and the processor specifies the second part based on fact that the pixel value of the second part is continuous from that of the first part.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: November 29, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Masayoshi Iino, Hiroki Nakano, Yasuhiro Yazawa, Kohei Maeda, Daisuke Nakajima
  • Patent number: 11467418
    Abstract: There is provided an optical system, including a light source, a control unit, and at least one juxtaposed double grating element, including a first grating and a second grating having grating functions, the gratings being spaced apart at a constant distance from each other, each of the two gratings having a center and at least one edge and comprising at least one sequence of a plurality of lines, wherein the spacing between the lines gradually changes from the center of the grating to the edges, the sequence of the plurality of lines of at least one of the gratings has a radial symmetry, and wherein the first grating diffracts a light wave from the light source towards the second grating and is further diffracted by the second grating as an output light wave in a given direction.
    Type: Grant
    Filed: April 3, 2020
    Date of Patent: October 11, 2022
    Assignee: OORYM OPTICS LTD.
    Inventors: Yaakov Amitai, Mori Amitai, Menachem Amitai
  • Patent number: 11460391
    Abstract: A particle collection cartridge includes a first side having a particle intake region, a second side having a particle inspection region, supply and uptake reels, a tape guide, tape, a first pin, and a second pin. The tape is wound about the supply reel, extends to the first pin, across the tape guide, to the second pin, and terminates at the uptake reel. The tape includes an adhesive surface to collect particles entering the particle intake region. The first and second pins are fixed to not rotate.
    Type: Grant
    Filed: April 30, 2020
    Date of Patent: October 4, 2022
    Assignee: SCANIT TECHNOLOGIES, INC.
    Inventors: Pedro Manautou, Felix Wynn, Keith Nordman, Dave Graham
  • Patent number: 11412650
    Abstract: A pick and place machine includes a feeder system configured to feed components to a picking location, a dispensing head configured to pick fed components from the picking location, a vision system configured to detect features of components picked by the dispensing head. The vision system includes an image capture device pointed in a direction. The pick and place machine further includes an illumination device that includes a plurality of light sources each configured to produce light having a controlled thickness and at a controlled angle relative to the direction. The controlled angle is configured to be non-normal with respect to the direction at which the image capture device is pointed.
    Type: Grant
    Filed: September 27, 2018
    Date of Patent: August 9, 2022
    Assignee: UNIVERSAL INSTRUMENTS CORPORATION
    Inventor: George D. Eck
  • Patent number: 11409205
    Abstract: A target for use in the measurement of misregistration between layers formed on a wafer in the manufacture of semiconductor devices, the target including a first pair of periodic structures (FPPS) and a second pair of periodic structures (SPPS), each of the FPPS and the SPPS including a first edge, a second edge, a plurality of first periodic structures formed in a first area as part of a first layer and having a first pitch along a first pitch axis, the first pitch axis not being parallel to either of the first edge or second edge, and a plurality of second periodic structures formed in a second area as part of a second layer and having the first pitch along a second pitch axis, the second pitch axis being generally parallel to the first pitch axis.
    Type: Grant
    Filed: June 25, 2020
    Date of Patent: August 9, 2022
    Assignee: KLA CORPORATION
    Inventors: Itay Gdor, Yuval Lubashevsky, Yuri Paskover, Yoram Uziel, Nadav Gutman
  • Patent number: 11397175
    Abstract: An apparatus adapted to examine a paper web includes a rotatable first bobbin, a rotatable second bobbin, and a first testing device. The first bobbin has a paper we wound thereabout that has transverse bands spaced apart along a length thereof. The second bobbin is arranged to receive the paper web from the first bobbin with a paper web path defined between the first and second bobbins. The first testing device is disposed along the paper web path and is arranged to nondestructively measure a diffusivity of one of the transverse bands of the paper web.
    Type: Grant
    Filed: January 27, 2020
    Date of Patent: July 26, 2022
    Assignee: RJ. Reynolds Tobacco Company
    Inventor: Balager Ademe
  • Patent number: 11385549
    Abstract: A management method of managing a processing apparatus that performs processing of a member, includes setting, in a case where adjustment of the processing apparatus is performed, an offset value to control the processing apparatus such that variance between results of processing by the processing apparatus before and after the adjustment is reduced.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: July 12, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tetsuya Taguchi
  • Patent number: 11366397
    Abstract: A method for simulation of lithography overlay is disclosed which comprises storing alignment parameters used to align a semiconductor wafer prior to a lithography step; storing process control parameters used during the lithography step on the semiconductor wafer, storing overlay parameters measured after the lithography step, calculating alternative alignment parameters and alternative process control parameters. The alternative alignment parameters and the alternative process control parameters are added to cleansed overlay parameters to obtain simulated lithography overlay data.
    Type: Grant
    Filed: August 8, 2019
    Date of Patent: June 21, 2022
    Assignee: Qoniac GmbH
    Inventors: Boris Habets, Stefan Buhl
  • Patent number: 11353796
    Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing a relative movement of the diffraction structure relative to the radiation beam from a first position, wherein the radiation beam does not irradiate the diffraction structure to a second position, wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from a diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining an intensity profile of the radiation beam based on the measured diffracted radiation signals.
    Type: Grant
    Filed: August 30, 2019
    Date of Patent: June 7, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Teis Johan Coenen, Han-Kwang Nienhuys, Sandy Claudia Scholz, Sander Bas Roobol
  • Patent number: 11308635
    Abstract: A method for aligning a wafer image with a reference image, comprising: searching for a targeted reference position on the wafer image for aligning the wafer image with the reference image; and in response to a determination that the targeted reference position does not exist: defining a current lock position and an area that encloses the current lock position on the wafer image; computing an alignment score of the current lock position; comparing the alignment score of the current lock position with stored alignment scores of positions previously selected in relation to aligning the wafer image with the reference image; and aligning the wafer image with the reference image based on the comparison.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: April 19, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Wei Fang, Lingling Pu
  • Patent number: 11275319
    Abstract: Provided is a lithography apparatus capable of detecting the abnormal holding of an original in a shorter period of time. The lithography apparatus is configured to form a pattern on a substrate through use of the original, and includes: a holding unit configured to hold the original on which a first mark is formed; a measuring unit configured to pick up an image of the first mark; and a control unit configured to: cause the measuring unit to obtain the image of the first mark on the original held by the holding unit with a focus position of the measuring unit being adjusted to a reference position; and determine that the original is being abnormally held by the holding unit when a change in a first contrast, which is a contrast of the image of the first mark with respect to a reference contrast, falls out of an allowable range.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: March 15, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Koshiro Arahara, Kazumasa Tanaka
  • Patent number: 11246218
    Abstract: Embodiments may include inductors with embedded magnetic cores and methods of making such inductors. In an embodiment, an integrated circuit package may include an integrated circuit die with a multi-phase voltage regulator electrically coupled to the integrated circuit die. In such embodiments, the multi-phase voltage regulator may include a substrate core and a plurality of inductors. The inductors may include a conductive through-hole disposed through the substrate core and a plugging layer comprising a dielectric material surrounding the conductive through-hole. In an embodiment, a magnetic sheath is formed around the plugging layer. In an embodiment, the magnetic sheath is separated from the plated through hole by the plugging layer. Additionally, a first layer comprising a dielectric material may be disposed over a first surface of the magnetic sheath, and a second layer comprising a dielectric material may be disposed over a second surface of the magnetic sheath.
    Type: Grant
    Filed: March 2, 2018
    Date of Patent: February 8, 2022
    Assignee: Intel Corporation
    Inventors: Chong Zhang, Ying Wang, Junnan Zhao, Cheng Xu, Yikang Deng
  • Patent number: 11221562
    Abstract: In some embodiments, a reticle structure is provided. The reticle structure includes a reticle stage and a reticle mounted on the reticle stage. The reticle stage includes plural first burls and plural second burls, in which the second burls are disposed on a center of the reticle stage and the first burls disposed on an edge of the reticle stage such that the first burls surround the second burls. The reticle includes a base material and a pattern layer overlying the base material. The base material is secured on the first and second burls of the reticle stage. The pattern layer includes plural first gratings, and each of the first burls is vertically aligned with one of the first gratings.
    Type: Grant
    Filed: March 14, 2019
    Date of Patent: January 11, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Yu Lee, Tao-Hsin Chen, Ching-Juinn Huang, Po-Chung Cheng
  • Patent number: 11215931
    Abstract: According to one embodiment, there is provided a semiconductor device manufacturing system, including a storage unit, a specifying unit, a determination unit and an adjustment unit. The storage unit stores device information indicating a relationship between image formation performance of an exposure device used for manufacturing a semiconductor device and mechanical operation accuracy. The specifying unit specifies a constraint of the mechanical operation accuracy according to the device information and the required image formation performance. The determination unit determines whether or not a correction parameter of an exposure condition satisfies the constraint. The adjustment unit adjusts the correction parameter according to a determination result of the determination unit.
    Type: Grant
    Filed: September 9, 2020
    Date of Patent: January 4, 2022
    Assignee: Kioxia Corporation
    Inventor: Masakazu Hamasaki
  • Patent number: 11168977
    Abstract: A thickness measuring apparatus for measuring the thickness of a workpiece held on a chuck table includes the followings: a light source configured to emit white light; an optical branching unit configured to branch, to a second optical path, reflected light applied from the light source to the workpiece held on the chuck table via a first optical path and reflected from the workpiece; a diffraction grating disposed in the second optical path; an image sensor configured to detect an optical intensity signal of light separated into each wavelength by the diffraction grating; and a thickness output unit configured to generate a spectral interference waveform on the basis of the optical intensity signal detected by the image sensor, determine the thickness on the basis of the spectral interference waveform, and output the thickness.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: November 9, 2021
    Assignee: DISCO CORPORATION
    Inventors: Nobuyuki Kimura, Keiji Nomaru
  • Patent number: 11156929
    Abstract: A detection apparatus includes an image pickup unit and a processor which detects a position of a mark using a two-dimensional image of the mark. The processor generates a one-dimensional signal having a plurality of peaks by accumulating images included in a detection region, detects peaks in which differences between values of the peaks and a reference value are equal to or larger than a threshold value and peaks in which differences between values of the peaks and the reference value are smaller than the threshold value from among the plurality of generated peaks and obtains a failure region in the mark, resets the detection region such that the differences between the values of the detected peaks and the reference value become smaller than the threshold value, generates a one-dimensional signal by accumulating images included in the reset detection region, and detects a position of the mark.
    Type: Grant
    Filed: December 14, 2018
    Date of Patent: October 26, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tadaki Miyazaki
  • Patent number: 11146715
    Abstract: A camera system includes an image sensor, a wavelength filter, and an imaging optical system. The image sensor has an image capturing plane. The imaging optical system is configured to have light coming from a subject passed through the wavelength filter and imaged on the image capturing plane. The wavelength filter has a perpendicularly incident region and an obliquely incident region. On the perpendicularly incident region, a principal ray, which has passed through the imaging optical system, is incident perpendicularly. On the obliquely incident region, a principal ray, which has passed through the imaging optical system, is incident obliquely. The image sensor has sensitivity to a light ray having a predetermined wavelength. The light ray having the predetermined wavelength is transmitted at a higher transmittance through at least a part of the obliquely incident region than through the perpendicularly incident region.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: October 12, 2021
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Michihiro Yamagata, Norihiro Imamura, Keiichi Matsuzaki
  • Patent number: 11137696
    Abstract: The present invention provides a lithography apparatus for performing a process of transferring a pattern of an original to each of shot regions two-dimensionally arrayed on a substrate, including a stage that moves while holding one of the substrate and the original, a measurement unit configured to measure, when performing the process, a positional shift amount between a mark provided on the original and a mark provided in each of the shot regions, and a control unit configured to control the process for the shot region so that after the process is performed successively for a plurality of first shot regions included in a first row, the process is performed successively for a plurality of second shot regions included in a second row adjacent to the first row.
    Type: Grant
    Filed: May 19, 2020
    Date of Patent: October 5, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Naosuke Nishimura
  • Patent number: 11087451
    Abstract: A method comprises obtaining a wafer comprising a plurality of components, wherein each of the plurality of components exposes a first surface of the component present in a first focal plane and a second surface of the component present in a second focal plane. The method comprises generating, by an optical tool, a first image of the first surface and a second image of the second surface of one of the plurality of components. The method comprises comparing, by a processor, the first image with a first reference image to produce a first value and the second image with a second reference image to produce a second value. The method comprises generating, by the processor, a wafer map indicating a quality state of the one of the plurality of components based on the first and second values.
    Type: Grant
    Filed: December 19, 2017
    Date of Patent: August 10, 2021
    Assignee: TEXAS INSTRUMENTS INCORPORATED
    Inventors: Elizabeth C. Stewart, Young Sawk Oh, Zhiyi Yu, Jeffrey A. West, Thomas D. Bonifield
  • Patent number: 11073483
    Abstract: A display device and a detection method are provided. The display device includes a display panel including an effective area and a peripheral area located around the effective area; and a cover plate attached to the display panel, the cover plate including a visible region, and the boundary of the visible region of the cover plate is located outside the boundary of the effective region of the display panel in a direction parallel to the display panel; at least one pair of light sensitive luminescent marks disposed on the display panel and located near mutually opposite edges of the display panel. Each of the at least one pair of light sensitive luminescent marks is disposed inside or outside an effective area of the display panel in a direction parallel to the display panel.
    Type: Grant
    Filed: May 22, 2019
    Date of Patent: July 27, 2021
    Assignees: CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Binfeng Feng, Xiaoxia Liu
  • Patent number: 11027657
    Abstract: A system for variable transmittance mirrors is disclosed wherein the variable transmittance mirrors may be controlled in response to images captured from a camera. The system may comprise a first imager, a first variable transmittance mirror, and a controller. The first imager comprises a pixel array. Further, the first imager is configured to capture image data. The first variable transmittance mirror has a first level of transmittance. Finally, the controller is configured to assign a first light intensity value to one or more pixels and change the first level of transmittance to a second level of transmittance based at least in part on the detected first light intensity. Such as system has the advantage of eliminating the need for a dedicated glare sensor, therefore reducing the number of devices, the costs, obstructions in a user's field of view, and a more aesthetically appealing appearance.
    Type: Grant
    Filed: November 15, 2019
    Date of Patent: June 8, 2021
    Assignee: GENTEX CORPORATION
    Inventors: Benjamin B. Hilldore, Barry K. Nelson
  • Patent number: 11029254
    Abstract: There are provided a welding monitoring system which can multidimensionally monitor a welding portion with high accuracy and a monitoring method thereof, by using a relatively simple configuration.
    Type: Grant
    Filed: July 11, 2018
    Date of Patent: June 8, 2021
    Assignee: HITACHI, LTD.
    Inventors: Ryoji Nakagawa, Hisashi Endou, Hiroshi Yoshikawa, Toshihiro Yamada, Nobuhiro Kakeno
  • Patent number: 11031277
    Abstract: A processing apparatus includes a holding table. The holding table includes a frustoconical portion and a wafer holding portion formed on the upper surface of the frustoconical portion for holding the wafer. Light is applied from a light emitting member to the side surface of the frustoconical portion and next reflected on the side surface of the frustoconical portion. The light reflected is applied to the outer circumference of the wafer held on the wafer holding portion of the holding table to thereby image the outer circumference of the wafer by an imaging unit.
    Type: Grant
    Filed: August 29, 2019
    Date of Patent: June 8, 2021
    Assignee: DISCO CORPORATION
    Inventors: Mayumi Kusakawa, Yukiyasu Masuda
  • Patent number: 11003904
    Abstract: Apparatus for the detection of print marks with a sensor arrangement which has at least one contrast sensor, which for generation of a cyclical sensor signal is disposed above the area of printed material containing the print mark which is passed below the contrast sensor, said apparatus also having a signal conditioning unit. The signal conditioning unit has at least one filter unit with a first filter for determination of the first derivation of the sensor signal, and on the basis of an evaluation of at least the first derivation of the sensor signal the filter unit generates at least one output value which is representative of print marks.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: May 11, 2021
    Assignee: B&R INDUSTRIAL AUTOMATION GMBH
    Inventor: Thomas Enzinger
  • Patent number: 10983361
    Abstract: A method of aligning a diffractive optical system, to be operated with an operating beam, comprises: aligning (558) the diffractive optical system using an alignment beam having a different wavelength range from the operating beam and using a diffractive optical element optimized (552) to diffract the alignment beam and the operating beam in the same (or a predetermined) direction. In an example, the alignment beam comprises infra-red (IR) radiation and the operating beam comprises soft X-ray (SXR) radiation. The diffractive optical element is optimized by providing it with a first periodic structure with a first pitch (pIR) and a second periodic structure with a second pitch (pSXR). After alignment, the vacuum system is pumped down (562) and in operation the SXR operating beam is generated (564) by a high harmonic generation (HHG) optical source pumped by the IR alignment beam’ optical source.
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: April 20, 2021
    Assignee: ASML Netherlands B.V
    Inventors: Sander Bas Roobol, Simon Gijsbert Josephus Mathijssen, Stefan Michael Bruno Bäumer
  • Patent number: 10971386
    Abstract: A method for positioning a mobile device relative to a stationary device in a semiconductor manufacturing environment is disclosed. The method includes detecting a target affixed to the stationary device at a target location, wherein the target location corresponds to a location of the target relative to a reference point on the stationary device, determining a first position coordinate offset value based upon detecting the target, and moving the mobile device, using the first position coordinate offset value, relative to train the mobile device to move relative to the stationary device for the stationary device to performing a semiconductor manufacturing operation.
    Type: Grant
    Filed: September 17, 2019
    Date of Patent: April 6, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED
    Inventors: Yan-Han Chen, Cheng-Kang Hu, Ren-Hau Wu, Cheng-Hung Chen, Feng-Kuang Wu, Hsu-Shui Liu, Jiun-Rong Pai, Shou-Wen Kuo
  • Patent number: 10935500
    Abstract: There are provided a welding monitoring system which can multidimensionally monitor a welding portion with high accuracy and a monitoring method thereof, by using a relatively simple configuration.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: March 2, 2021
    Assignee: HITACHI, LTD.
    Inventors: Ryoji Nakagawa, Hisashi Endou, Hiroshi Yoshikawa, Toshihiro Yamada, Nobuhiro Kakeno
  • Patent number: 10915033
    Abstract: Combination of a stage and a level sensor configured to sense a height level at a target location on an object is described, the stage comprising an object table configured to hold the object and a positioning device for displacing the object table relative to the level sensor in a first direction, the level sensor comprising a projection system configured to project a measurement beam onto a measurement area of the object, the measurement area having a measurement area length in the first direction, a detector system configured to receive different portions of the measurement beam after being reflected off different sub-areas within the measurement area, the different sub-areas being arranged in the first direction, and to supply output signals representative of the different portions received, a signal processing system configured to process the output signals from the detector system.
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: February 9, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Bram Van Hoof, Jeroen Cottaar