Abstract: An imprint apparatus, which is configured to transfer a pattern to an imprint material supplied on a substrate by using a mold having the pattern formed thereon, includes a light-receiving element, a detection system configured to illuminate a mark formed on the substrate and a mark formed on the mold, and guide light reflected from the mark formed on the substrate and the mark formed on the mold to the light-receiving element, and a relay optical system. The relay optical system is configured to form images of the light reflected from the mark formed on the substrate and the mark formed on the mold between the relay optical system and the detection system. The detection system is configured to guide the light image-formed by the relay optical system to the light-receiving element.

Abstract: The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation.

Abstract: A color image forming apparatus and a control method thereof, in which a transfer start position of a transfer belt is determined based on electric signals that correspond to a width of a position indicator provided on a transfer belt and are detectable during one rotation of the transfer belt even when noise occurs in output, thereby reducing the overall printing time.

Abstract: An illumination optical apparatus and projection exposure apparatus capable of reducing a light quantity loss when a mask is illuminated with a polarized illumination light. An illumination optical system for illuminating a reticle with an illumination light and a projection optical system for projecting the pattern image of the reticle onto a wafer are provided. An illumination light emitted from an exposure light source in a linearly polarized state in the illumination optical system passes through first and second birefringent members having different fast axis directions and is converted into a polarized state that is substantially linearly polarized in a circumferential direction with the optical axis as the center in an almost specific annular area, and them illuminates the reticle under an annular illuminating condition after passing through a fly-eye lens.

Abstract: Print arrangement, comprising a first roll, a transport surface, a nip between the first roll and the transport surface through which, at least during printing, a substrate is threaded, a drive system arranged to change a width of the nip, and a lateral stretch member arranged to engage a side of the substrate. The first roll comprises a two coaxially aligned roll segments of similar diameters for rolling over the substrate, with a distance in between.

Abstract: A method for performing light-based calibration of optics with caustic surfaces. The method includes mapping a light detecting device to a programmable light source. Then, the method includes operating a calibration light source to direct light onto one or more caustic surfaces of an optical assembly, e.g., an assembly of one or more lenses, facets, lenticules, and lenslets. The method may then involve, with the light detecting device, capturing an image of a projection surface of the optical assembly, which is opposite the one or more caustic surfaces in the optical assembly, as the projection surface is illuminated by the light from the light source. Further, the method includes processing the captured image, along with the mapping of the light detecting device to the programmable light source, to generate a calibration map of the optical assembly including the caustic surfaces.

Abstract: A measuring system for determining scatter parameters of an electrical measurement object on a substrate, having a measuring machine having at least one measuring channel and at least one measuring probe electrically connected to at least one measuring channel and designed for non-contacting or contacting connection to an electrical signal line of the electrical measurement in the electronic circuit. A first positioning device is provided for at least one measuring probe, wherein at least one sensor detects a position of at least one measuring probe and outputs a position signal.

Abstract: A chemical pattern layer including an orientation control material and a prepattern material is formed over a substrate. The chemical pattern layer includes alignment-conferring features and additional masking features. A self-assembling material is applied and self-aligned over the chemical pattern layer. The polymeric block components align to the alignment-conferring features, while the alignment is not altered by the additional masking features. A first polymeric block component is removed selective to a second polymeric block component by an etch to form second polymeric block component portions having a pattern. A composite pattern of the pattern of an etch-resistant material within the chemical pattern layer and the pattern of the second polymeric block component portions can be transferred into underlying material layers employing at least another etch.

Abstract: A device for producing individually coded read patterns, especially resonators for use in RFID chips. The device includes a structuring apparatus for producing a basic pattern with at least one group of individual patterns on a carrier substrate, and a processing apparatus for forming at least one individually coded read pattern flat a time with read elements from a subset of a total set of the individual patterns of each group. The invention also relates to a corresponding method and a read structure, produced according to the described method and/or the described device.

Abstract: Techniques, devices and systems are disclosed for characterizing particles in a fluid sample by optical space-time coding. In one aspect, a microfluidic device for optical detection of particles includes a substrate, a microfluidic channel formed on the substrate and structured to carry a fluid sample containing particles, in which the microfluidic channel is structured to transmit a probe light, and a mask formed on one side of the microfluidic channel and structured to include a pattern of openings along the microfluidic channel, in which at least two of the openings have varying dimensions across the microfluidic channel, and in which the pattern of openings encodes a waveform on the probe light that transmits through the microfluidic channel to allow optical detection of a position of a particle in the microfluidic channel.

Abstract: Provided are an apparatus and method for supplying a light-emitting diode (LED) wafer that may quickly and accurately transfer LED wafers by acquiring position information of pockets in a carrier in which the LED wafers are to be seated. The apparatus may include a cassette in which a plurality of LED wafers are loaded, a carrier including a plurality of pockets in which the LED wafers are seated, an aligning unit to align the LED wafers that are to be seated in the carrier, a transfer robot to transfer the LED wafers from the cassette to the aligning unit, a picker to hold, in an adsorbed state, the LED wafers transferred to the aligning unit, or to release the adsorbed state, a capturing unit to fix the picker, and to acquire position information of the pockets, and an LED wafer loading robot to transfer the picker and the capturing unit from the aligning unit to the carrier.

Abstract: A solar tracking sensor and methods of tracking the sun. In one embodiment, the solar tracking sensor includes a housing, an inclinometer to output a signal indicative of the angle of the housing relative to the gravitational pull of the Earth, and first and second photosensors located on a first plane located within the housing. An opening on one side of the housing allows solar radiation to pass through the housing and reach the first and second photosensors. A difference calculating module is coupled to the first photosensor and the second photosensor. The difference calculating module determines a photosensor difference value using signals from the photosensors and outputs a photosensor difference value. The photosensor difference value can be used by a controller. The controller is coupled to the inclinometer determines whether the opening is aligned with the Sun based on the photosensor difference value and information or signal from the inclinometer.

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract: The present invention provides a panel alignment apparatus and a panel alignment method. The panel alignment apparatus comprises an image detection device and a first clamp. The method comprises the following steps: utilizing the image detection device to detect a position of a display panel, and to calculate a position adjustment value; and utilizing the first clamp to hold the standing display panel, and to rotate the display panel according to the position adjustment value for adjusting a position of the display panel. The present invention can utilize the clamps to precisely align the standing display panel.

Abstract: Approaches for enhancing web position determination involve phase locking a web movement encoder signal to a sensed web fiducial signal. Fiducials disposed along a longitudinal axis of a substrate are sensed and corresponding sensor signals are generated. An estimated web position is provided by one or more encoder signals. The phase difference between the sensor signals and the encoder signals is calculated and the web position error is determined based on the phase difference. The web position error signal can be fed back to adjust the encoder signals which improves the accuracy of the web position determination.

Abstract: An inspecting system for inspecting a lens module includes an inspection device; and a transmitting and loading device. The transmitting and loading device includes a grasping assembly, a supporting assembly, a sliding assembly loaded on the supporting assembly, and a control unit for controlling the grasping assembly and the sliding assembly. The grasping assembly is configured to clamp the lens module and to load the lens module on the sliding assembly, and the sliding assembly is adapted to transfer the lens module to a testing position of the inspection device.

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract: Web supports (30, 32, 34, 36, 38, 330, 332, 334, 336, 338, 340) form a first web path (46, 48, 346, 348) in which a web is presented opposite to a camera (26, 326) and an alternative second web path (46, 48, 346, 348) in which the web (230) is overturned prior to being presented opposite to the camera (26, 326).

Abstract: A parallel transceiver includes a constructed array of dice. The constructed array comprises an integer number of dies that each have an integer number of optoelectronic devices arranged on the die. Each die forming the constructed array is attached to a respective tab of a shim that is fixed to a first lead frame. Each tab includes a bridge region and a mounting region. Each die is attached to a respective mounting region of a corresponding tab. When necessary, a laser hammering technique is performed whereby laser generated energy is applied along an axis in the bridge region of the shim to adjust the position of the optoelectronic devices on the die attached to the tab in one or more directions relative to the axis.

Abstract: An apparatus for detecting a position of a mark from a mark signal obtained by capturing an image of the mark includes a signal processor. The signal processor is configured to set a processing window with respect to each of a plurality of positions relative to the mark signal, to calculate an even function intensity of the mark signal in the processing window with respect to each of the plurality of positions, and to detect the positions of the marks based on the even function intensity calculated with respect to each of the plurality of positions.

Abstract: A plurality of wafer marks on a wafer is detected while a wafer stage moves from a loading position where a wafer is delivered onto the wafer stage to an exposure starting position where exposure of a wafer begins, with a part of an alignment system also moving, using the alignment system. Accordingly, the time required for mark detection can be reduced, therefore, it becomes possible to increase the throughput of the entire exposure process.

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract: An exposure apparatus includes a controller configured to calculate a position of an alignment mark detected by a detector, to approximate a deformation of a substrate by using an approximation equation, to calculate a correction amount of each of the plurality of shots, and to control driving of a stage in exposing each shot based on a correction amount that is calculated. The approximation equation is defined as a sum of a first term representative of a deformation of the entire substrate, and at least one of a second term representative of a distortion of a shot arrangement and a third term representative of a shot shape.

Abstract: Imprint lithography benefits from precise alignment between a template and a substrate during imprinting. A moiré signal resulting from indicia on the template and the substrate are acquired by a system comprising a line-scan camera and a digital micromirror device (DMD) which provides a high bandwidth, low-latency signal. Once acquired, the moiré signal may be used directly to align the template and the substrate without need for discrete position/angle encoders.

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Abstract: An exposure apparatus includes a controller configured to calculate a position of an alignment mark detected by a detector, to approximate a deformation of a substrate by using an approximation equation, to calculate a correction amount of each of the plurality of shots, and to control driving of a stage in exposing each shot based on a correction amount that is calculated. The approximation equation is defined as a sum of a first term representative of a deformation of the entire substrate, and at least one of a second term representative of a distortion of a shot arrangement and a third term representative of a shot shape.

Abstract: A computer-implemented method for performing color registration on template media having template markings thereon.

Abstract: A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns. The method comprises: providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.

Abstract: An alignment system for optical lithography uses cameras fixed to a movable stage and to a lithography unit to view unique microscopic non-uniformities that are inherent to the surface of a work piece, e.g., metal or ceramic microcrystalline grains, for position referencing. Stage cameras image two sites on the work piece through windows in the stage to establish original position templates. After the work piece has been repositioned, e.g., reversed topside-down, the same two sites are again viewed and template matching establishes the transformed coordinates of the work piece, e.g. by a lithography unit camera under which the stage moves to approximate site locations. Two corner cameras can serve as a coarse positioning mechanism. The alignment system is particular useful for backside alignment in printed circuit board lithography.

Abstract: A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.

Abstract: A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.

Abstract: The invention relates to methods to improve SLMs, in particular to reflecting micromechanical SLMs, for applications with simple system architecture, high precision, high power handling capability, high throughput, and/or high optical processing capability. Applications include optical data processing, image projection, lithography, image enhancement, holography, optical metrology, coherence and wavefront control, and adaptive optics. A particular aspect of the invention is the achromatization of diffractive SLMs so they can be used with multiple wavelengths sequentially, simultaneously or as a result of spectral broadening in very short pulses.

Abstract: This installation includes: a light source; means for storing film photoresist for exposure and exposed photoresist; a film carrier for positioning said film photoresist at an exposure plane; a projection lens capable of projecting the digital images at the exposure plane; a liquid crystal matrix where the various digital images to be exposed are displayed; a retractable mirror oriented at 45° to an optical axis of the projection lens; and an image analysis device positioned symmetrically to said exposure plane with regard to the plane containing said mirror when the latter is in place on the optical axis. When said mirror is positioned on the optical axis, the image analysis device is suitable for receiving the image transmitted by the liquid crystal matrix issuing from the projection lens. The signals thereby detected are processed using an associated software, for setting the characteristics of the optical members of the installation.

Abstract: A rear projection display includes a projector for projecting light from a light source as an optical image, an exterior cabinet for enclosing the projector, a projection screen provided for the exterior cabinet on which the optical image is projected, and two or more optical sensors provided in a region where the optical image is projected from the projector other than an image display region.

Abstract: A method and system for controlling an overlay shift on an integrated circuit is disclosed. The method and system comprises utilizing a scanning electron microscope (SEM) to measure the overlay shift between a first mask and a second mask of the circuit after a second mask and comparing the overlay shift to information about the integrated circuit in a database. The method and system includes providing a control mechanism to analyze the overlay shift and feed forward to the fabrication process before a third mask for error correction. A system and method in accordance with the present invention advantageously utilizes a scanning electron microscope (SEM) image overlay measurement after the fabrication process such as etching and chemical mechanical polishing (CMP).

Abstract: A method of helping to prevent liquid reaching under a substrate is disclosed that includes introducing a gas at a bottom edge of the substrate so that a buffer is created at the edge of the substrate, helping to keep immersion liquid that is present at the top and edge of the substrate away from the bottom surface of the substrate.

Abstract: Disclosed are, inter alia, optical components that include an optical element (e.g., mirror) and at least three active-isolation mounts mounting the optical element to a frame (e.g., optical barrel or optical frame). An active-isolation mount has a non-contacting actuator connecting a respective location on the optical element to the frame and provides movability of the respective location relative to the frame in at least one direction. At least one displacement sensor is associated with each respective location on the optical element. The displacement sensors are sensitive to displacements of the respective locations in at least one respective direction and reference the displacements to an absolute reference. The actuators and sensors are connected to a servo control loop to provide feedback control.

Abstract: A pattern transfer apparatus transfers an imprint pattern formed on a mold, provided with an alignment mark, to a resin material on a substrate, provided with an alignment mark. A first image pickup device obtains an image of an object positioned at a first object position. A second image pickup device obtains an image of an object positioned at a second object position. The second object position is more distant from the alignment mark of the mold than the first object position. An optical system forms an image of an object positioned at the first object position and an image of an object positioned at the second object position. Alignment is performed based on first and second information obtained about positions of images of an alignment mark of a reference substrate and an alignment mark of the substrate, to transfer the imprinting pattern to the resin material.

Abstract: An imaging device and a method for aligning an image sensor within the imaging device are disclosed. The imaging device comprises a housing and an image sensor assembly including a header and an image sensor mounted to the header. The header of the image sensor assembly is coupled to the housing. Means for aligning the image sensor with respect to the header are provided. Means for aligning the header with respect to the housing of the imaging device are also provided. A distance separating the image sensor alignment means and the header alignment means is pre-determined such that a distance between the image sensor and the housing of the imaging device is pre-determined.

Abstract: An inspection system includes: a facility that uses wide-band illumination light having different wavelengths and single-wavelength light to perform dark-field illumination on an object of inspection, which has the surface thereof coated with a transparent film, in a plurality of illuminating directions at a plurality of illuminating angles; a facility that detects light reflected or scattered from repetitive patterns and light reflected or scattered from non-repetitive patterns with the wavelengths thereof separated from each other; a facility that efficiently detects light reflected or scattered from a foreign matter or defect in the repetitive patterns or non-repetitive patterns or a foreign matter or defect on the surface of the transparent film; and a facility that removes light, which is diffracted by the repetitive patterns, from a diffracted light image of actual patterns or design data representing patterns. Consequently, a more microscopic defect can be detected stably.

Abstract: An optical property measuring apparatus and an optical property measuring method of the invention determine a specified optical property of a sample by using a distribution function indicating a distribution of the amounts of reflected light incident on an optical sensor along a coordinate axis defined on a light-sensing surface of the optical sensor. Therefore, even when the optical sensor is a light-sensing device provided with a relatively small number of photosensitive elements, it is possible to measure the specified optical property regardless of a position error of the sample, if any, and reduce errors in measurement values caused by such a sample position error.

Abstract: The present disclosure provides a lithography apparatus with improved lithography throughput. The lithography apparatus includes a first lens system; a first substrate stage configured to receive a first radiation energy from the first lens system, and designed operable to move a substrate during an exposing process; a second lens system, having a higher resolution than that of the first lens system; and a second substrate stage approximate to the first substrate stage and configured to receive a second radiation energy from the second lens system, and designed operable to receive the substrate from the first substrate stage and move the substrate.

Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.

Abstract: An apparatus (1) serves for linear illumination of a moving product web (6), the apparatus (1) having at least one light source (4) emitting light. In order to achieve high luminance in a linear subregion of the product web (6), at least a portion of the light emitted by the light source (4) is reflected towards the product web (6) by at least one tubular reflector (5). The tubular reflector (5) in this case has at least one light exit slit (7) which is assigned to the product web (6). Moreover, the tubular reflector has at least one observation slit (8) which lies opposite the light exit slit (7). The illuminated product web (6) can be observed through this observation slit (8) by means of a line camera (2).

Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.

Abstract: A system and method for prealigning a substrate. One embodiment provides a rotor configured to rotate a carrier around a rotation axis in response to a rotation signal. The carrier includes a main surface substantially perpendicular to the rotation axis. The substrate is disposable on the carrier. The substrate includes a main surface and a mark such that an orientation of the substrate with respect to the rotation axis is detectable. An electromagnetic radiation source is configured to illuminate the main surface of the substrate with electromagnetic radiation. An optical/electrical converter is responsive to the electromagnetic radiation reflected back from the main surface, detecting the mark of the substrate and providing a sensing signal. A controller is configured to receive the sensing signal and providing the rotation signal.

Abstract: A method of generating masks for printing a pattern including a plurality of features having varying critical dimensions. The method includes the steps of: (1) obtaining data representing the pattern; (2) defining a plurality of distinct zones based on the critical dimensions of the plurality of features; (3) categorizing each of the features into one of the plurality of distinct zones; and (4) modifying the mask pattern for each feature categorized into a predefined distinct zone of the plurality of distinct zones.

Abstract: A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.

Abstract: When a light emission element emits no light, a detected signal from a photodetection element is captured as an intensity of external light. Then, a threshold value is offset by the intensity of the external light. The offset threshold is then compared to a detected signal from the photodetection element when the light emission element emits light, thereby determining the presence of a through hole between the light emission element and the photodetection element through which hole light passes without being influenced by external light.

Abstract: Provided is a method and system for auto focusing a workpiece in the Z-axis using a position sensitive focus detector. A focus detection beam is measured using a focus detector, the focus detector having an array of sensors, each sensor of the array of sensors having a sensor identification, the focus detector measuring the focus detection beam projected on a plurality of sensors in the array of sensors, generating a corresponding focus signal for each sensor in the array of sensors. The plurality of focus signals and associated sensor data is used to generate a best focus instruction which is used to move the workpiece to the best focus position on the Z-axis.