Abstract: A display panel in which a resistance structure is provided on a test pattern to prevent a circuit of the display panel from being damaged by static electricity introduced into the test pattern, and a display apparatus having the same are provided.

Abstract: A circuit test structure includes a chip including a conductive line which traces a perimeter of the chip. The circuit test structure further includes an interposer electrically connected to the chip, wherein the conductive line is over both the chip and the interposer. The circuit test structure further includes a test structure connected to the conductive line. The circuit test structure further includes a testing site, wherein the test structure is configured to electrically connect the testing site to the conductive line.

Abstract: A semiconductor package structure and a method of manufacturing the same are provided. The semiconductor package structure includes an electronic component having a first surface, a second surface opposite to the first surface and a circuit structure closer to the first surface than to the second surface. The semiconductor package structure also includes a passive component connected to the second surface of the electronic component. The semiconductor package structure further includes a conductive element extending into the electronic component and configured to electrically connect the circuit structure with the passive component.

Abstract: A wafer test system includes a chuck for supporting a wafer including a plurality of dies, a probe head for inputting a test signal for an electrical test to the probe card and receiving an electrical test result corresponding to the test signal, a probe card for inputting test signals to the dies through a plurality of pins and receiving test result, a sensing device mounted on the surface of the probe card, for sensing an active state occurring in the wafer when the electrical test is performed, and a determination unit for receiving the electrical test result and the active state information for the dies and determining whether each of the dies has failed using the result of the electrical test on the wafer and active state information.

Abstract: A display apparatus includes a first pad at one side of a substrate; a first semiconductor layer on the substrate; a first crack detection electrode interposed between the substrate and the first semiconductor layer, and including a first end portion at the one side and a second end portion at another side; a second crack detection electrode disposed on the first semiconductor layer, and including a first end portion located at the one side and a second end portion connected to the second end portion of the first crack detection electrode; and a first auxiliary electrode disposed on the second conductive layer, and including a first end portion connected to the second end portion of the first crack detection electrode and a second end portion electrically connected to the first pad.

Abstract: Provided is a die stack structure including a first die and a second die. The first die and the second die are bonded together through a hybrid bonding structure. A bonding insulating layer of the hybrid bonding structure extends to contact with one interconnect structure of the first die or the second die.

Abstract: An electronic apparatus includes: an electronic panel comprising a display unit comprising a plurality of pixels and a sensing unit comprising a plurality of sensing electrodes; and an electronic module overlapping with the electronic panel when viewed in a plan view, the sensing unit comprising: a base substrate comprising a hole area overlapping with the electronic module, an active area overlapping with the sensing electrodes, and a peripheral area adjacent to the active area; a connection line in the hole area and connected to a portion of the sensing electrodes; and a conductive light blocking pattern in the hole area and spaced apart from the connection line and the sensing electrodes.

Abstract: A semiconductor device includes a first wafer and a second wafer. The semiconductor device includes a seal ring structure comprising a first metal structure in a body of the first wafer, a second metal structure in the body of the first wafer, a third metal structure in a body of the second wafer, and a metal bonding structure including a first set of metal elements coupling the first metal structure and the third metal structure through an interface between the first wafer and the second wafer, and a second set of metal elements coupling the second metal structure and the third metal structure through the interface between the first wafer and the second wafer.

Abstract: The array substrate is provided and includes a substrate, a test unit area, first and second flat layers and a terminal area including an input and output terminal areas, the input terminal area includes input terminals for connecting input pins of a driving chip, and the output terminal area includes output terminals for connecting output pins of the driving chip, and each of the input and output terminals includes a second metal layer and a third metal layer disposed on a side of the second metal layer away from the substrate; the second flat layer on a side of the third metal layer away from the substrate and covering edges of the third metal layer; a surface of the first flat layer away from the substrate is not higher than a surface of the second flat layer away from the substrate, in a thickness direction of the substrate.

Abstract: An apparatus has a semiconductor wafer hosting rows and columns of chips, where the rows and columns of chips are separated by scribe lines. Vertical and horizontal routing lines are in the scribe lines interconnecting the rows and columns of chips. Test circuit sites are in the scribe lines, each test circuit site including contact pads for simultaneous connection to probe card needles, sensor circuit select and control circuitry, and a sensor circuit bank.

Abstract: A display device includes a substrate, a display area disposed on the substrate and including a plurality of pixels and data lines, a peripheral area disposed outside the display area of the substrate, a pad portion disposed in the peripheral area, an encapsulation layer disposed in the peripheral area and the display area, and disposed on the plurality of pixels of the display area, a crack detection circuit disposed in the peripheral area, and a first crack detection line connected with the pad portion and the crack detection circuit. The first crack detection line is disposed on the encapsulation layer.

Abstract: Disclosed herein is a method that includes epitaxially growing SiGe layer on a silicon substrate, etching the SiGe layer and the silicon substrate to form an active region covered with the SiGe layer, first etching the SiGe layer formed on a first region of the active region without etching the SiGe layer formed on a second region of the active region to form a first trench, and second etching the SiGe layer remaining on an inner wall of the first trench.

Abstract: Various embodiments of the present application are directed to a method for forming an integrated circuit (IC) comprising forming a multilayer film to form a plurality of memory cell structures disposed over a substrate and a plurality of memory test structures next to the memory cell structures. A memory test structure comprises a dummy control gate separated from the substrate by a dummy floating gate. The method further comprises forming a conductive floating gate test contact via along sidewalls of the dummy control gate and the dummy floating gate.

Abstract: A semiconductor package structure includes a first die, a second die disposed on the first die, and a bonding pad structure. The first die includes a semiconductor substrate, an interconnect structure disposed on the first semiconductor substrate, a passivation layer disposed on the interconnect structure, and a test pad disposed on the passivation layer. The test pad includes a contact region that extends through the passivation layer and electrically contacts the interconnect structure, and a bonding recess that overlaps with the contact region in a vertical direction perpendicular to a plane of the first semiconductor substrate. The bonding pad structure electrically connects the first die and the second die and directly contacts at least a portion of the bonding recess.

Abstract: A method is provided. A bottom tier package structure is bonded to a support substrate through a first bonding structure, wherein the bottom tier package structure includes a first semiconductor die encapsulated by a first insulating encapsulation, and the first bonding structure includes stacked first dielectric layers and at least one stacked first conductive features penetrating through the stacked first dielectric layers. The support substrate is placed on a grounded stage such that the first semiconductor die is grounded through the at least one first stacked conductive features, the support substrate and the grounded stage. A second semiconductor die is bonded to the bottom tier package structure through a second bonding structure, wherein the second bonding structure includes stacked second dielectric layers and at least one stacked second conductive features penetrating through the stacked second dielectric layers. The second semiconductor die is encapsulated with a second insulating encapsulation.

Abstract: A method is provided. A bottom tier package structure is bonded to a support substrate through a first bonding structure, wherein the bottom tier package structure includes a first semiconductor die encapsulated by a first insulating encapsulation, and the first bonding structure includes stacked first dielectric layers and at least one stacked first conductive features penetrating through the stacked first dielectric layers. The support substrate is placed on a grounded stage such that the first semiconductor die is grounded through the at least one first stacked conductive features, the support substrate and the grounded stage. A second semiconductor die is bonded to the bottom tier package structure through a second bonding structure, wherein the second bonding structure includes stacked second dielectric layers and at least one stacked second conductive features penetrating through the stacked second dielectric layers. The second semiconductor die is encapsulated with a second insulating encapsulation.

Abstract: A display device includes a substrate including a conductive pad, a driving chip facing the substrate and including a conductive bump electrically connected to the conductive pad and an inspection bump which is insulated from the conductive pad, and an adhesive member which is between the conductive pad and the driving chip and connects the conductive pad to the driving chip. The adhesive member includes a first adhesive layer including a conductive ball, and a second adhesive layer facing the first adhesive layer, the second adhesive layer including a first area including a color-changing material, and a second area adjacent to the first area and excluding the color-changing material.

Abstract: A semiconductor testing structure forming method includes: a semiconductor substrate is provided, and the semiconductor substrate includes a plurality of active areas arranged separately; a first conductive wire is formed at a preset distance from the plurality of active areas in the semiconductor substrate, and the first conductive wire is connected with a substrate of a respective active device formed in each of the plurality of active areas; a plurality of first contact holes is formed on the first conductive wire; and a first metal layer is formed on top of each of the plurality of first contact holes to obtain the semiconductor testing structure, where the first metal layer is electrically connected with a first common pad and the first common pad is configured to perform an electric performance test on the semiconductor testing structure.

Abstract: An array substrate and a fabrication method thereof, an array substrate motherboard, and a display device are disclosed. The array substrate includes a display region and a bonding region outside the display region. The array substrate further includes: a bonding electrode, located in the bonding region and spaced apart from an outer edge of the bonding region; and an electrostatic barrier line, the electrostatic barrier line has one end electrically connected with the bonding electrode, and the other end extends to the outer edge of the bonding region, and resistivity of the electrostatic barrier line is greater than resistivity of the bonding electrode.

Abstract: In certain aspects, a three-dimensional (3D) memory device includes a first semiconductor structure, a second semiconductor structure, and a bonding interface between the first semiconductor structure and the second semiconductor structure. The first semiconductor structure includes an array of memory cells, a first peripheral circuit of the array of memory cells, and a polysilicon layer between the array of memory cells and the first peripheral circuit. The first peripheral circuit includes a first transistor. The second semiconductor structure includes a second peripheral circuit of the array of memory cells. The second peripheral circuit includes a second transistor.

Abstract: A display device includes a substrate including a display area and a test area adjacent to the display area, a lower electrode disposed in the display area on the substrate, a common layer disposed on the lower electrode, an upper electrode disposed on the common layer; and a test element group. The test element group includes a plurality of electrode patterns disposed in a same layer as the lower electrode and in the test area on the substrate, a test common layer disposed in a same layer as the common layer and on the electrode patterns, where a plurality of openings is defined through the test common layer to expose a part of each of the electrode patterns, and an electrode layer disposed in a same layer as the upper electrode, on the test common layer, and in contact with the electrode patterns through the openings.

Abstract: An object is to provide a technique capable of suppressing the rise in the sense voltage during the Miller plateau. A semiconductor device includes a semiconductor substrate of first conductivity type, a first IGBT portion and a second IGBT portion selectively disposed on a first main surface of the semiconductor substrate, and an impurity region of second conductivity type selectively disposed on a second main surface of the semiconductor substrate. The second IGBT portion is used to detect the current passing through the first IGBT portion. An area ratio of the impurity region within a second range to an area of the second range is lower than an area ratio of the impurity region within a first range to an area of the first range, the second range corresponding to the second IGBT portion, the first range corresponding to the first IGBT portion.

Abstract: Present disclosure provides a semiconductor stress monitoring structure, including a substrate, first conductive segments over the substrate, second conductive segments and a sensing structure proximate to the substrate. The first conductive segments are arranged parallel to each other. The second conductive segments are arranged below the first conductive segments and parallel to each other. The first conductive segments and the second conductive segments extend in the same direction. The sensing structure is configured to respond to a stress caused by the first conductive segments and the second conductive segments and generate a monitoring signal.

Abstract: A display device includes a substrate, a display area disposed on the substrate and including a plurality of pixels and data lines, a peripheral area disposed outside the display area of the substrate, a pad portion disposed in the peripheral area, an encapsulation layer disposed in the peripheral area and the display area, and disposed on the plurality of pixels of the display area, a crack detection circuit disposed in the peripheral area, and a first crack detection line connected with the pad portion and the crack detection circuit. The first crack detection line is disposed on the encapsulation layer.

Abstract: A semiconductor device includes a semiconductor layer having a first surface in which a plurality of trenches each extending along a first direction are arranged along a second direction perpendicular to the first direction, a first electrode on a second surface of the semiconductor layer, a second electrode on the first surface of the semiconductor layer, and a control electrode inside at least one of the trenches. The plurality of trenches includes first, second, and third trenches. The first and second trenches are connected to each other via a first connector at an end in the first direction of each of the first and second trenches. The third trench extends beyond the end of each of the first and second trenches along the first direction.

Abstract: A semiconductor device package and a method for manufacturing a semiconductor device package are provided. The semiconductor device package includes a carrier, a sensor module, a connector, and a stress buffer structure. The sensor module is disposed on the carrier. The connector is connected to the carrier. The stress buffer structure connects the connector to the sensor module.

Abstract: A display apparatus includes a first pad at one side of a substrate; a first semiconductor layer on the substrate; a first crack detection electrode interposed between the substrate and the first semiconductor layer, and including a first end portion at the one side and a second end portion at another side; a second crack detection electrode disposed on the first semiconductor layer, and including a first end portion located at the one side and a second end portion connected to the second end portion of the first crack detection electrode; and a first auxiliary electrode disposed on the second conductive layer, and including a first end portion connected to the second end portion of the first crack detection electrode and a second end portion electrically connected to the first pad.

Abstract: A semiconductor device includes a semiconductor die, a defect detection structure and an input-output circuit. The semiconductor die includes a central region and a peripheral region surrounding the central region. The peripheral region includes a left-bottom corner region, a left-upper corner region, a right-upper corner region and a right-bottom corner region. The defect detection structure is formed in the peripheral region. The defect detection structure includes a first conduction loop passing through the left-bottom corner region, a second conduction loop passing through the right-bottom corner region, a third conduction loop passing through the left-bottom corner region and the left-upper corner region, a fourth conduction loop passing through the right-bottom corner region and the right-upper corner region, and a shielding loop to shield electrical interference between the first through fourth conduction loops.

Abstract: A semiconductor package includes a processor, a lower memory including a plurality of lower memory chips that are vertically stacked, an interposer mounted on the processor and the lower memory, and an upper memory mounted on the interposer, the upper memory including a plurality of upper memory chips that are vertically stacked. The interposer includes a first physical layer (PHY) transmitting and receiving a signal between the processor and the lower memory and transmitting and receiving a signal between the processor and the upper memory, and the processor includes a second PHY communicating with the first PHY and a first through silicon via (TSV) electrically connecting the first PHY to the second PHY.

Abstract: An integrated circuit (IC) is manufactured and is mounted in an IC package. A processor of a measurement system determines a reference value of a physical layer (PHY) parameter at a second test point on a test fixture based on one or more model values, specified by an Ethernet communication standard, corresponding to a first test point on the test fixture corresponding to a contact on the IC package and one or more measured test fixture parameters characterizing a channel connecting the first test point to the second test point on the test fixture. The processor then determines whether the PHY parameter at the first test point on the IC package complies with the Ethernet communication standard based on i) the reference value of the PHY parameter and ii) a measured value of the PHY parameter obtained from a measurement of the PHY parameter at the second test point.

Abstract: A semiconductor device includes a substrate including a first part and a second part, a memory cell disposed on the first part, an insulation layer disposed on the first part and the second part, the insulation layer covering the memory cell, a portion of the insulation layer on the second part including a stepped sidewall, and a first pattern group disposed on the second part and in the portion of the insulation layer and the substrate. A first sidewall of the semiconductor device corresponds to the stepped sidewall including an upper sidewall, a lower sidewall and a connecting surface connecting the upper sidewall to the lower sidewall. The lower sidewall disposed under the upper sidewall is closer to the substrate than the upper sidewall, and has surface roughness different from surface roughness of the upper sidewall.

Abstract: Various embodiments of the present application are directed to an integrated circuit (IC) comprising a floating gate test device, as well as a method for forming the IC. In some embodiments, the IC comprises a memory cell structure including a pair of control gates respectively separated from a substrate by a pair of floating gates and a pair of select gate electrodes disposed on opposite sides of the pair of control gates. A memory test structure includes a pair of dummy control gates respectively separated from the substrate by a pair of dummy floating gates and a pair of dummy select gate electrodes disposed on opposite sides of the pair of dummy control gates. The memory test structure further includes a pair of conductive floating gate test contact vias respectively extending through the pair of dummy control gates and reaching on the dummy floating gates.

Abstract: In a transparent display panel, a GIP region acts as a transmissive region, thereby increasing or maximizing a transmissive area in the GIP region. To this end, a line for VSS voltage application is disposed in a display region. Thus, a non-transparent thick line for applying the VSS voltage is not disposed in an upper portion of a GIP circuit region. Thus, a transparent bezel in which the GIP region acts as the transmissive region is implemented. Further, a GIP input signal line region and a GIP output signal line region constitute different layers, thereby to maximize a spacing between GIP input signal lines, resulting in increasing or maximizing a transmissive area in the GIP circuit region.

Abstract: In a step, acceptor ions are implanted from a back surface of a semiconductor substrate. In a step, a wet process of immersing the semiconductor substrate in a chemical solution including hydrofluoric acid is performed, to introduce hydrogen atoms into the semiconductor substrate. In a step, proton radiation is provided to the back surface of the semiconductor substrate, to introduce hydrogen atoms into the semiconductor substrate and form radiation-induced defects. In a step, an annealing process is performed on the semiconductor substrate, to form hydrogen-related donors by reaction of the hydrogen atoms and the radiation-induced defects and reduce the radiation-induced defects.

Abstract: Provided is a semiconductor device comprising a semiconductor substrate that includes a transistor region; an emitter electrode that is provided on the semiconductor substrate; a first dummy trench portion that is provided on the transistor region of the semiconductor substrate and includes a dummy conducting portion that is electrically connected to the emitter electrode; and a first contact portion that is a partial region of the transistor region, provided between an end portion of a long portion of the first dummy trench portion and an end portion of the semiconductor substrate, and electrically connects the emitter electrode and a semiconductor region with a first conductivity type provided in the transistor region.

Abstract: Disclosed are semiconductor packages and methods of fabricating the same. The method inluces forming a semiconductor chip, forming an electromagnetic shield that covers the semiconductor chip, and forming a molding that covers the electromagnetic shield. The electromagnetic shield is electrically connected to a conductor on a side of the semiconductor chip.

Abstract: A display device includes a substrate including a display area in which a display element is arranged and a non-display area having a pad area outside the display area, a first thin-film transistor arranged in the display area of the substrate and including a first semiconductor layer and a first gate electrode insulated from the first semiconductor layer, a first voltage line which extends in a first direction on the first gate electrode, a data line apart from the first voltage line and which extends in the first direction, connection lines which connects the data line to a pad in the pad area in the display area, and a conductive layer arranged in a layer between the first voltage line and the data line.

Abstract: In an example, a multiplexer is provided. The multiplexer may include one or more first strings controlling access to source-lines of the memory, wherein a first string of the one or more first strings includes a first set of two high voltage transistors and a first plurality of low voltage transistors. The multiplexer may include one or more second strings controlling access to bit-lines of the memory, wherein a second string of the one or more second strings includes a second set of two high voltage transistors and a second plurality of low voltage transistors. A method for operating such multiplexer is provided.

Abstract: A method is provided. A bottom tier package structure is bonded to a support substrate through a first bonding structure, wherein the bottom tier package structure includes a first semiconductor die encapsulated by a first insulating encapsulation, and the first bonding structure includes stacked first dielectric layers and at least one stacked first conductive features penetrating through the stacked first dielectric layers. The support substrate is placed on a grounded stage such that the first semiconductor die is grounded through the at least one first stacked conductive features, the support substrate and the grounded stage. A second semiconductor die is bonded to the bottom tier package structure through a second bonding structure, wherein the second bonding structure includes stacked second dielectric layers and at least one stacked second conductive features penetrating through the stacked second dielectric layers. The second semiconductor die is encapsulated with a second insulating encapsulation.

Abstract: A testing probe system includes probes configured to contact shared probe pads of multi-channel die of a wafer; and a controller configured to generate testing patterns and receive signals from the multi-channel die of the wafer. The controller is configured to contact a probe of the probes with a shared probe pad of the multi-channel die, select a first channel of the multi-channel die to test, select at least one test mode for testing the first channel, stimulate at least the first channel during a single contact period, acquiring a first output of the first channel during the single contact period, select a second channel of the multi-channel die to test, select at least one test mode for testing the second channel, stimulate at least the second channel during the single contact period, and acquire a second output of the first channel during the single contact period.

Abstract: A first metal layer, an inorganic insulating film, and a second metal layer are provided. A first wiring line led to a peripheral edge of a cutout portion is provided in the first metal layer. A second wiring line led to the peripheral edge of the cutout portion is provided in the second metal layer. The first lead wiring line and the second lead wiring line overlap each other through intermediation of the inorganic insulating film.

Abstract: An AI-based rule generation system generates an ontology from user-provided information and further enables generating rules that govern processes via drag-and-drop operations by automatically generating code in the backend. The rule generation system after generating the ontology, provides access to the entities of the ontology via a drag-and-drop GUI which also includes operators required to generate the rules. The user can drag-and-drop the entity elements and the operator elements as needed onto a whitespace in addition to providing the requisite values in order to generate a rule flow. The rule flow is validated and published to an execution server for use by downstream processes. The rule generation system further includes custom functions in addition to enabling distributed knowledge base processes for generating the rules.

Abstract: A display device includes a substrate; and a driving pad disposed on the substrate, wherein the driving pad includes a first pad portion and a second pad portion alternately arranged along a direction, wherein each of the first pad portion and the second pad portion includes first data pads and signal pads, wherein the first data pads of the first and second pad portions include a first side and a second side different from the first side, wherein the signal pads of the first pad portion are disposed on the first side of the first data pads of the first pad portion, and the signal pads of the second pad portion are disposed on the second side of the first data pads of the second pad portion, and wherein the first data pads provide a data signal to pixels, and the signal pads provide a driving voltage to the pixels.

Abstract: A semiconductor device may include function circuits and a test line structure beside the function circuits. The test line structure includes standard cell circuit blocks including a first components and environment circuit regions between the standard cell circuit blocks. The environment circuit regions include second components. The first components are different from the second components in structure, arrangement or a combination thereof.

Abstract: Detecting voltage-based attacks on an integrated circuit (IC) is difficult in the presence of clock jitter. Propagating signals can exhibit a total delay that is due to a delay component resulting from a voltage-based attack and a delay characteristic resulting from clock fluctuation. Voltage-variation detection circuitry includes first and second voltage-dependent circuits and a voltage analysis circuit. The voltage-dependent circuits produce first and second signals that are indicative of a voltage level responsive to a clock signal and based on different first and second voltage sensitivities. The voltage analysis circuit generates a voltage alert signal based on the first and second signals. A combined signal neutralizes the delay characteristic in the first and second signals, but the delay component due to the voltage variation can be at least partially maintained. Thus, a voltage-based attack is detectable in the presence of clock fluctuation by using two voltage-dependent circuits.

Abstract: Provided is a method of producing an electronic device, including a step of preparing a structure which includes an electronic component having a circuit forming surface, and an adhesive laminated film which includes a base material layer, an unevenness-absorptive resin layer, and an adhesive resin layer in this order and in which the adhesive resin layer is attached to the circuit forming surface of the electronic component such that the circuit forming surface is protected; and a step of forming an electromagnetic wave-shielding layer on the electronic component in a state of being attached to the adhesive laminated film.

Abstract: Present disclosure provides a semiconductor stress monitoring structure, including a substrate, first conductive segments, second conductive segments, and a sensing structure. The first conductive segments are over the substrate and arranged parallel to each other. The second conductive segments are arranged below the first conductive segments and parallel to each other. The sensing structure is proximate to the substrate. The sensing structure is configured to respond to a stress caused by the first conductive segments and the second conductive segments and generate a monitoring signal.

Abstract: Test pad structures and methods of forming a test pad are described herein. A method for forming a test pad includes forming a device element over a substrate, depositing a dielectric layer over the device element and the substrate, and etching openings in the dielectric layer to a first depth. Once the openings have been formed, a conductive material is deposited in the openings and followed by a chemical mechanical planarization to form a first grid feature and a panel region of the test pad, the first grid feature extending lengthwise from the panel region to a perimeter of the test pad. Once formed, a probe may be used to contact the panel region of the test pad during a wafer acceptance test (WAT) and/or a process control monitoring (PCM) test of the device element.

Abstract: A semiconductor device includes a first semiconductor chip and a second semiconductor chip stacked on the first semiconductor chip and electrically connected to the first semiconductor chip by a first through electrode and a second through electrode. The first semiconductor chip may electrically connect the first through electrode to a third test resistor during a second test operation. The first semiconductor chip may detect a voltage level of the first internal node, which is determined by resistance values of the third test resistor and the first and second through electrodes, to test a short failure between the first and second through electrodes during the second test operation.

Abstract: Provided is an integrated fan-out (InFO) package structure including a first die, a second die, a third die, a protective layer, and an interconnect structure. The first die has a first surface and a second surface opposite to each other. The first die has a plurality of through substrate vias (TSVs) protruding from the second surface. The second die and the third die are bonded on the first surface of the first die. The protective layer laterally surrounds protrusions of the plurality of TSVs that protrude from the second surface. The interconnect structure are disposed on the protective layer and electrically connected to the plurality of TSVs. The interconnect structure includes a polymer layer covering the protective layer.