Utilizing Surface To Be Reproduced As An Impression Pattern Patents (Class 264/220)
  • Patent number: 11961760
    Abstract: A method for forming a staircase structure of 3D memory, including: forming an alternating layer stack comprising a plurality of dielectric layer pairs disposed over a substrate; forming a first mask stack over the alternating layer stack; patterning the first mask stack to define a staircase region comprising a number of N sub-staircase regions over the alternating layer stack using a lithography process and N is greater than 1; forming a first staircase structure over the staircase region, the first staircase structure has a number of M steps at each of the staircase regions and M is greater than 1; and forming a second staircase structure on the first staircase structure, the second staircase structure has a number of 2*N*M steps at the staircase region.
    Type: Grant
    Filed: December 5, 2022
    Date of Patent: April 16, 2024
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventor: Yu Ting Zhou
  • Patent number: 11801372
    Abstract: A microneedle array to be used instead of a syringe has, at a tip side of each microneedle, two or four puncture portions disposed facing each other. The puncture portions each have a part of a side surface of each microneedle as outer surfaces, respectively, and one of the puncture portions is shorter than the other(s). A housing section capable of holding a drug is formed by inner surfaces of the puncture portions of each microneedle. The housing section opens toward the tip side and lateral directions orthogonal to an axis core of each microneedle, and has a central bottom surface at a bottom end. The inner surfaces facing each other and forming the housing section of each microneedle each have a downward slope, with a width between the inner surfaces getting narrower as it goes down from tips of the respective puncture portions toward the central bottom surface.
    Type: Grant
    Filed: August 6, 2018
    Date of Patent: October 31, 2023
    Assignees: MISHIMA KOSAN CO., LTD., KYUSHU INSTITUTE OF TECHNOLOGY
    Inventors: Toshiaki Atari, Masaaki Matsuo, Yasunori Tashiro, Masaya Hara, Junji Kuroki, Takahiro Ito, Tomohiro Hikima
  • Patent number: 11692982
    Abstract: Presented herein is a new concept of uniformly spin coating a flat surface with a stationary phase and creating a gas chromatography column by pressing a grooved lid, with micro-stamped ridges, down onto the coated substrate. The lids are molded out of commercially available rigid materials including epoxies so that when pressed onto a flat surface it will create an air tight seal. The epoxy material is rendered inert by a thin layer of gold.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: July 4, 2023
    Assignee: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Robert Furstenberg, Christopher Breshike, Todd H. Stievater, Dmitry Kozak, R. Andrew McGill
  • Patent number: 11642817
    Abstract: This disclosure concerns a master model for the production of a mold, comprising: (a) a first part, a second part comprising a textured surface; wherein the first part and the second part are connected.
    Type: Grant
    Filed: October 21, 2021
    Date of Patent: May 9, 2023
    Assignee: adidas AG
    Inventors: Joerg Knappworst, Tay Tsyr Chun
  • Patent number: 11460767
    Abstract: A composition for film formation includes a polymer and a solvent. The polymer includes a first repeating unit, a second repeating unit, a third repeating unit, and a structural unit on at least one end of a main chain of the polymer. The first repeating unit includes a crosslinkable group. The second repeating unit differs from the first repeating unit. The third repeating unit differs from the first repeating unit and has higher polarity than polarity of the second repeating unit. The structural unit includes an interacting group capable of interacting with Si—OH, Si—H or Si—N.
    Type: Grant
    Filed: January 4, 2019
    Date of Patent: October 4, 2022
    Assignee: JSR CORPORATION
    Inventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
  • Patent number: 11261085
    Abstract: A method to remove selected parts of a thin-film material otherwise uniformly deposited over a template is disclosed. The methods rely on a suitable potting material to encapsulate and snatch the deposited material on apexes of the template. The process may yield one and/or two devices during a single process step: (i) thin-film material(s) with micro- and/or nano-perforations defined by the shape of template apexes, and (ii) micro- and/or nano-particles shaped and positioned in the potting material by the design of the template apexes. The devices made from this method may find applications in fabrication of mechanical, chemical, electrical and optical devices.
    Type: Grant
    Filed: May 2, 2018
    Date of Patent: March 1, 2022
    Assignee: Nanotech Security Corp.
    Inventors: Mohsen Keshavarz Akhlaghi, Clinton K. Landrock
  • Patent number: 11008466
    Abstract: A curable composition including a compound having a perfluoropolyether group and a curable moiety, and a curable resin and/or a curable monomer, wherein an organic solvent having no radical reactive group is not substantially contained. The curable composition is capable of forming a surface-treating layer that is in a lower clouded state.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: May 18, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tsuneo Yamashita, Eiji Sakamoto, Saya Nii, Makoto Hanazawa
  • Patent number: 11005092
    Abstract: A 3-dimensional (3D) pattern puncher for punching a lithium metal electrode to provide one or more unit electrodes is provided. The 3D pattern puncher includes a mold punch configured to move up and down, the mold punch corresponding to a size of the unit electrode; a die corresponding to the mold punch; a mold blade disposed at an edge of the mold punch and configured to punch the lithium metal electrode to provide the one or more unit electrodes; and a 3D pattern positioned at an inner portion of the mold punch where the mold blade is not disposed.
    Type: Grant
    Filed: June 29, 2018
    Date of Patent: May 11, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Jong Keon Yoon, Hoe Jin Hah, Kyung Hwa Woo
  • Patent number: 10928725
    Abstract: A method for the directed self-assembly of a block copolymer by graphoepitaxy, includes forming a guide pattern, the guide pattern having a cavity with a bottom and side walls; forming a functionalisation layer on the guide pattern that has a first portion and a second portion disposed, respectively, on the bottom and side walls of the cavity; forming a protective layer on the first and second portions of the functionalisation layer; etching the protective layer and the second portion of the functionalisation layer such that a portion of the protective layer is retained and the side walls of the cavity are exposed, the retained portion of the protective layer having a thickness of less than 15 nm; selectively etching the portion of the protective layer relative to the first portion of the functionalisation layer and to the guide pattern; and depositing a block copolymer in the cavity.
    Type: Grant
    Filed: May 23, 2017
    Date of Patent: February 23, 2021
    Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
    Inventors: Raluca Tiron, Nicolas Posseme, Xavier Chevalier, Christophe Navarro
  • Patent number: 10899609
    Abstract: A method for forming a microscale device may include growing, by a chemical vapor deposition, a patterned forest of vertically aligned carbon nanotubes, wherein the patterned forest defines a component of the microscale device, and applying a conformal non-metal coating to the vertically aligned carbon nanotubes throughout the patterned forest, wherein the conformal non-metal coating comprises a substantially uniform thickness along a length of the vertically aligned carbon nanotubes.
    Type: Grant
    Filed: May 5, 2020
    Date of Patent: January 26, 2021
    Assignee: CNT Holdings, LLC
    Inventors: Robert C. Davis, Richard Vanfleet
  • Patent number: 10882229
    Abstract: An apparatus for forming a flowable material against a prosthetic implant can comprise a mold body having an outer surface and an inner surface. The inner surface can define a mold cavity that is selectively configured to at least partially accept the prosthetic implant in a forming position. An inlet port can be configured on the mold cavity that extends between the inner and outer surfaces. The mold cavity can substantially conform to a profile of a bone opposing surface of the prosthetic implant such that a void is created between the inner surface of the mold body and the bone opposing surface of the prosthetic implant. The inlet port can be configured to permit introduction of the flowable material into the void and against the bone opposing surface of the prosthetic implant.
    Type: Grant
    Filed: April 2, 2018
    Date of Patent: January 5, 2021
    Assignee: Biomet Manufacturing, LLC
    Inventors: Daniel B. Smith, Timothy G Vendrely, Tayler Kreider, Imad K. Merkhan
  • Patent number: 10753092
    Abstract: A fiber reinforced surface covering for application to a structure, comprising at least one structural body comprising a resilient construction material with a top side and a bottom side, a flexible base coupled to the bottom side of the structural body, a spaced gap disposed between the at least one structural body and an adjacent second body, and wherein the spaced gap has a portion of the base that is substantially overlaid with the resilient construction material and configured to receive a filler material.
    Type: Grant
    Filed: August 30, 2018
    Date of Patent: August 25, 2020
    Assignee: SAFETYSTEPTD
    Inventor: Mike Menendez
  • Patent number: 10059820
    Abstract: Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self-assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern.
    Type: Grant
    Filed: July 25, 2017
    Date of Patent: August 28, 2018
    Assignee: International Business Machines Corporation
    Inventors: Markus Brink, Joy Cheng, Alexander M. Friz, Michael A. Guillorn, Chi-Chun Liu, Daniel P. Sanders, Gurpreet Singh, Melia Tjio, HsinYu Tsai
  • Patent number: 10058890
    Abstract: The present disclosure includes methods of forming air bearing surfaces having multi-tier structures using nanoimprint technology and/or 3D printing technology. In some embodiments, a single stage of milling can be used to transfer a multi-tier photoresist pattern into a substrate (e.g., an AlTiC substrate).
    Type: Grant
    Filed: November 17, 2016
    Date of Patent: August 28, 2018
    Assignee: Seagate Technology LLC
    Inventors: Daniel Richard Buettner, Andrew David Habermas, Daniel Sullivan, Joseph M. Stephan
  • Patent number: 9977339
    Abstract: Techniques herein include systems and methods that provide a spatially-controlled projection of electromagnetic radiation, such as light, onto a substrate as a mechanism of controlling or modulating critical dimensions of various features and structures being micro-fabricated on a substrate. Combining such spatial light projection with photolithographic exposure can achieve significant improvements in critical dimension uniformity across a surface of a substrate. In general, methods herein include patterning processes that identify or receive a critical dimension signature that spatially characterizes critical dimension values that correspond to the substrate. A pattern of electromagnetic radiation is projected onto a patterning film coated on substrate using a digital pixel-based projection system. A conventional photolithographic exposure process is executed subsequent to, or prior to, the pixel-based projection.
    Type: Grant
    Filed: January 23, 2015
    Date of Patent: May 22, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Anton J. deVilliers, Daniel Fulford
  • Patent number: 9750914
    Abstract: Systems and methods in accordance with embodiments of the invention fabricate objects using investment molding techniques. In one embodiment, a method of fabricating an object includes: fabricating a subassembly including a plurality of volumes; where each volume is defined by the homogenous presence or absence of a material; where fabricating the subassembly includes using an additive manufacturing process; where at least one of the plurality of volumes defines a shape that is to exist in the object to be fabricated; where at least a first of the plurality of volumes includes a first dissolvable material; dissolving the first dissolvable material; where the dissolution of the first dissolvable material does not dissolve at least one other material within the subassembly; forming at least one cavity within the subassembly; and introducing an additive material into the at least one cavity.
    Type: Grant
    Filed: February 5, 2014
    Date of Patent: September 5, 2017
    Assignee: MetaMason, Inc.
    Inventors: Leslie Oliver Karpas, Aaron M. Ryan
  • Patent number: 9700451
    Abstract: The magnetorheological (MAR) medical brace includes a flexible outer shell that fits around the anatomical area to be braced and a plurality of adjustable straps for securing the shell onto the anatomical area. The shell encases a MAR pack filled with magnetorheological fluid or gel. A plurality of magnets is attached to or encased in the shell to provide magnetic field acting on the MAR pack. The interaction of the magnetic field with the MAR pack adjustably increases or decreases the stiffness of the shell depending on the strength of the magnetic field. A control mechanism is provided for selective adjustment of the magnetic field and other functions.
    Type: Grant
    Filed: March 10, 2016
    Date of Patent: July 11, 2017
    Inventors: Clifford T. Solomon, Theodore C. Solomon
  • Patent number: 9676123
    Abstract: The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of polymer elastomer. The two distinct layers are preferably integrated via chemically bonding. The top layer of the mold enables a sub-15 nm resolution of pattern fabrication and the bottom layer affords a conformal contact to planar or curved surface of substrates. The methods for fabricating the same are disclosed.
    Type: Grant
    Filed: April 5, 2016
    Date of Patent: June 13, 2017
    Assignee: NANJING UNIVERSITY
    Inventors: Yanfeng Chen, Haixiong Ge, Zhiwei Li, Changsheng Yuan, Minghui Lu
  • Patent number: 9182673
    Abstract: Methods are disclosed for depositing a template for directed self-assembly of a self-assemblable block polymer on a surface of a substrate. The method involves providing a chemical epitaxy pattern of alternating first and second regions having differing chemical affinities for first and second blocks of the polymer on the surface by photolithography, and providing spaced graphoepitaxy features on the surface by photolithography. The chemical epitaxy pattern is aligned with and located between pairs of spaced graphoepitaxy features. The spaced graphoepitaxy features and chemical epitaxy pattern are arranged to act together to direct self-assembly of the self-assemblable block copolymer. The resulting template may be used to direct self-assembly of a suitable self-assemblable polymer and the resulting aligned and oriented self-assembled polymer may itself be used as a resist for lithography of the substrate.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: November 10, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Sander Frederik Wuister
  • Patent number: 9145203
    Abstract: An aircraft wing tip device may include a unitized, monolithic leading edge torque box that may be formed of polymer matrix fiber-reinforced material. The leading edge torque box may include a skin that may define a continuous, uninterrupted outer mold line surface extending aftwardly from a winglet leading edge by a distance of at least approximately 60 percent of a local chord length. The leading edge torque box may further include at least one internal component extending between opposing inner surfaces of the skin and being integrally formed therewith.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: September 29, 2015
    Assignee: The Boeing Company
    Inventors: Darrell D. Campbell, Jr., Brett I. Lyons
  • Patent number: 9005502
    Abstract: The object of the invention is to provide a mold that is capable of high-precision, stable patterning, and improved in terms of handleability as well, and a manufacturing method thereof. The mold of the invention has a pattern-formation surface defined by one surface, wherein the pattern-formation layer has a projection-and-depression structure area for patterning, and a base surface defined by another surface. At least the pattern-formation layer and the base surface each comprise a polydimethylsiloxane layer. Given a low-molecular-weight siloxane of a cyclic structure represented by [—Si(CH3)2O—]k where k is an integer of 3 to 20 inclusive, the polydimethylsiloxane layer positioned on the pattern-formation layer comprises a high-content polydimethylsiloxane layer containing the low-molecular-weight siloxane in a larger amount, and the polydimethylsiloxane layer positioned on the base surface comprises a low-content polydimethylsiloxane layer containing the low-molecular-weight siloxane in a smaller amount.
    Type: Grant
    Filed: February 27, 2012
    Date of Patent: April 14, 2015
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Tsuyoshi Chiba, Hiroshi Fujita, Yuki Aritsuka
  • Publication number: 20150091205
    Abstract: A method of producing a mold includes obtaining a master mold, the master mold including surface details; exposing a curable material to the surface details; and curing the curable material with the surface details. A mold includes a surface for molding a composite part, the surface including surface details, wherein the mold is made of phenolic material.
    Type: Application
    Filed: August 26, 2014
    Publication date: April 2, 2015
    Inventors: Mark Vincent Greaney, Bing-Ling Chao, Herbert Stanley Heffernan, III
  • Patent number: 8961855
    Abstract: A method of forming a high aspect ratio adhesive structure, the method comprising fabricating a porous template comprising at least a first tier and a second tier; introducing a softened polymer into the template; and separating the polymer from the template.
    Type: Grant
    Filed: February 12, 2010
    Date of Patent: February 24, 2015
    Assignee: Agency for Science, Technology and Research
    Inventors: Yoke Yee Audrey Ho, Isabel Rodriguez Fernandez
  • Publication number: 20150045498
    Abstract: A method for producing a surface-functionalised object involves: (i) providing negative mould (2) with a surface topography complementary to that desired on the object; (ii) applying a functional entity (20) to the mould surface, in an exciting medium; (iii) forming the object (21) in or on the mould (2), the object being in direct contact, as it forms, with the functional entity (20); and (iv) releasing the object (21) from the mould, wherein during steps (iii) and/or (iv), at least some (22) of the functional entity (20) is transferred from the mould to the object, whilst a proportion remains on the mould (2) surface. The method can be used to functionalise the surface of an object as it is cast, and the mould can be re-used to form multiple replicate objects. The invention also provides an object produced using the method, and a surface-functionalised negative mould for use in the method.
    Type: Application
    Filed: July 18, 2012
    Publication date: February 12, 2015
    Inventors: Jas Pal S. Badyal, Hayley G. Andrews
  • Patent number: 8945455
    Abstract: A support apparatus and method for providing structural support to a shape memory polymer (SMP) apparatus during fabrication of composite parts. The support apparatus may comprise an adjustable, rigid structural member and a plurality of SMP support components transitionable between a rigid and malleable state and fixed to an outer surface of the rigid structural member. The rigid structural member may extend in at least one cross-sectional dimension toward the SMP apparatus, pressing the SMP support components, in their malleable state, against the SMP apparatus. The SMP support components may thereby conform to a first surface of the SMP apparatus, then return to their rigid state while pressed against the SMP apparatus, thus providing a rigid load path between the SMP apparatus and the rigid structural member. Then composite material may be applied to a second surface of the SMP apparatus, opposite of the first surface.
    Type: Grant
    Filed: November 3, 2011
    Date of Patent: February 3, 2015
    Assignee: Spirit AeroSystems, Inc.
    Inventors: Joel James Everhart, Thomas Wood Margraf, David E. Havens
  • Patent number: 8932502
    Abstract: Methods and apparatuses disclosed herein relate to a recyclable thermoplastic unit that includes a casing body composed of a first thermoplastic having a first melting point. The casing body also includes a first locking mechanism that is configured to mate with a second locking mechanism of a sacrifice layer. The sacrifice layer is composed of a second thermoplastic and includes the second locking mechanism. The sacrifice layer has a melting point that is greater than the melting point of the casing body.
    Type: Grant
    Filed: February 16, 2011
    Date of Patent: January 13, 2015
    Assignee: Empire Technology Development LLC
    Inventor: Aya Seike
  • Patent number: 8916073
    Abstract: Disclosed is a method for making a membrane for use as a vacuum bag, a natural rubber vacuum bag made using such methods, and methods for using such a natural rubber bag to form a composite article. One method can include providing a substantially non-porous working surface having a desired shape for forming a vacuum bag, spraying at least one layer of a natural rubber liquid over at least a portion of working surface, and solidifying the natural rubber liquid to form a membrane having a shape substantially corresponding to that of the working surface. The membrane formed being elastically deformable and substantially impermeable for functioning as a vacuum bag in Vacuum Assisted Resin Transfer Molding, debulking, compaction, or similar processes.
    Type: Grant
    Filed: February 25, 2008
    Date of Patent: December 23, 2014
    Inventors: Richard W. Rydin, Robert J. Scrima, Jr.
  • Patent number: 8894902
    Abstract: A method for forming a maintenance hole base for the bottom surface of a maintenance shaft using a configurable modular mold and thermoforming or rotational molding. The modular mold is formed of individual members of groups of central core components engageable to surrounding periphery components to yield a mold which will form the appropriate engagement and communication pathways for the base when installed. Polymeric material is employed with the mold to yield a finished component configured for use in the base of the maintenance shaft.
    Type: Grant
    Filed: January 17, 2012
    Date of Patent: November 25, 2014
    Assignee: JMJ Management, LLC
    Inventors: Joseph McRoskey, John W. McRoskey, Gerry Taylor
  • Publication number: 20140326483
    Abstract: Methods for fabricating printed circuit boards, devices for use in the fabrication of printed circuit boards, and structures for a printed circuit board. A mold may be formed as a device that includes a plurality of features, such as recesses, corresponding to a layout of a plurality of conductors for the printed circuit board. A sheet comprised of an electrically-conductive material may be deformed to match the features of the mold. A substrate may then be added to support the sheet, and the sheet may be selectively removed with a mechanical process to define the conductors of the printed circuit board.
    Type: Application
    Filed: May 6, 2013
    Publication date: November 6, 2014
    Applicant: International Business Machines Corporation
    Inventor: Craig N. DeVarney
  • Patent number: 8877108
    Abstract: A system and method for making a golf ball having a patterned surface is disclosed. The pattern may be made by a method including machining a pattern of feed marks on the surface of a golf ball mold and using the golf ball mold to mold a golf ball cover layer. The pattern may be configured to create capillary action to substantially counteract gravity and/or other forces acting on a substantially liquid coating material applied to the cover layer of the golf ball.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: November 4, 2014
    Assignee: Nike, Inc.
    Inventor: Bradley C. Tutmark
  • Publication number: 20140265013
    Abstract: Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.
    Type: Application
    Filed: March 17, 2014
    Publication date: September 18, 2014
    Inventors: Stephen Y. Chou, Fei Ding
  • Publication number: 20140262015
    Abstract: A soft lithography template or stamp is made by casting a polydimethysiloxane (PDMS) or other suitable elastomeric precursor onto a master pattern. The master pattern may be formed utilizing known micro-fabrication techniques. The PDMS template includes an inverse copy of the micro-structures on the master pattern, and can be placed into a mold used to prepare a carbon-fiber reinforced polymer composite part or other polymer molding systems where a matrix material passes through a fluid state during the cure process. The liquid resin material flows into the structures on the surface of the PDMS template and hardens during the curing cycle. After the part is released from the mold, the PDMS template can be peeled from the surface of the part to reveal the free standing micro structures which are a replica of the master pattern.
    Type: Application
    Filed: March 12, 2014
    Publication date: September 18, 2014
    Applicant: U.S.A. as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: Frank L. Palmieri, Vincent B. Cruz, Christopher J. Wohl, JR.
  • Publication number: 20140239538
    Abstract: A method which allows creation of an ornamental urn from an object such as horns, antlers, rocks, or the like. The method generally includes steps which form an ornamental urn adapted to resemble an object. The ornamental urn may include an access port having a funnel portion leading to an inner cavity adapted to store particulate materials, such as cremated remains. A plug, which may include a burr edge, is also provided to close the access port. The urn is fabricated by coating the object in a first coating to create an object mold, forming a second coating around the object mold to create an outer casing, and uniformly distributing a casting material along the inner walls of the object mold. After the casting material has cured, the ornamental urn may be removed from the object mold and finished to closely resemble the original object.
    Type: Application
    Filed: February 21, 2014
    Publication date: August 28, 2014
    Inventor: Brandon C. Johns
  • Patent number: 8808598
    Abstract: The present invention relates to a MIFA (Molding Impression Fabrication Apparatus) providing the practitioner a quick and accurate means to create an orthotic impression of a patients foot, leg, arm, and torso. Both traditional and intrinsic biomechanical correction modifications, may be incorporated as well. The patient can be placed back into the MIFA impression for immediate feedback of the modifications and changes. MIFA may also be utilized for direct forming to fabricate an orthosis directly to the patient. CAD/CAM scanning can be utilized with MIFA, to both compliment and refine the negative and positive impressions obtained from MIFA.
    Type: Grant
    Filed: October 18, 2008
    Date of Patent: August 19, 2014
    Inventor: Grant C. Meyer
  • Publication number: 20140217639
    Abstract: A system and method for obtaining an impression of an object in a remote environment. An impression block is affixed to a running string and disposed into the remote environment and used to form an impression. The impression block includes an impression section formed of a shape memory material that can be transformed between an original shape and a temporary shape.
    Type: Application
    Filed: April 1, 2014
    Publication date: August 7, 2014
    Applicant: Baker Hughes Incorporated
    Inventors: Christopher W. Guidry, Edward O'Malley, Erik Nordenstam
  • Patent number: 8784713
    Abstract: Super-hydrophobic and self-cleaning articles produced by imprinting exposed surfaces with suitable fine-grained and/or amorphous metallic embossing dies to transfer a dual surface structure, including ultra-fine features less than or equal to 100 nm embedded in and overlaying a surface topography with macro-surface structures greater than or equal to 1 micron are disclosed.
    Type: Grant
    Filed: May 31, 2013
    Date of Patent: July 22, 2014
    Assignee: Integran Technologies Inc.
    Inventors: Jared J. Victor, Uwe Erb, Klaus Tomantschger, Nandakumar Nagarajan, Diana Facchini, Mioara Neacsu
  • Publication number: 20140183783
    Abstract: A mold may include a plurality of nanostructures configured to form a lithographic pattern when imprinted into a material. Imprinting may include imprinting the mold a first predetermined distance, modifying a temperature of the material, and altering a position of the mold based on the temperature modification. One or more thermal elements may alter a temperature of a first section of the material and/or one or more nanostructures for a predetermined pulse time less than an equilibrium time required for the mold and/or material to reach a stable temperature state. A first thermal element may selectively alter the temperature of a first section of the material and/or a first nanostructure and a second thermal element may selectively alter the temperature of a second section of the material and/or a second nanostructure. The one or more thermal elements may include one or more thermoelectric elements.
    Type: Application
    Filed: January 3, 2013
    Publication date: July 3, 2014
    Inventors: Roderick A. Hyde, Jordin T. Kare, Thomas A. Weaver
  • Publication number: 20140183795
    Abstract: A mold may include a plurality of nanostructures configured to form a lithographic pattern when imprinted into a material. Imprinting may include imprinting the mold a first predetermined distance, modifying a temperature of the material, and altering a position of the mold based on the temperature modification. One or more thermal elements may alter a temperature of a first section of the material and/or one or more nanostructures for a predetermined pulse time less than an equilibrium time required for the mold and/or material to reach a stable temperature state. A first thermal element may selectively alter the temperature of a first section of the material and/or a first nanostructure and a second thermal element may selectively alter the temperature of a second section of the material and/or a second nanostructure. The one or more thermal elements may include one or more thermoelectric elements.
    Type: Application
    Filed: January 3, 2013
    Publication date: July 3, 2014
    Applicant: ELWHA LLC
    Inventors: Roderick A. Hyde, Jordin T. Kare, Thomas A. Weaver
  • Publication number: 20140175171
    Abstract: A method for creating a highly accurate nanostructure is provided, the method includes: (i) creating a highly accurate nanostructure prototype, wherein the highly accurate nanostructure prototype, when illuminated with a predefined illumination, provides a unique optical pattern; (ii) creating at least one highly accurate nanostructure mold from the highly accurate nanostructure prototype, wherein each highly accurate nanostructure mold enables a creation of a highly accurate nanostructure that is substantially similar to the highly accurate nano structure prototype and which, when illuminated with the predefined illumination, provides the unique optical pattern; and (iii) molding the highly accurate nano structure using the highly accurate nano structure mold, wherein the highly accurate nanostructure, when illuminated with the predefined illumination, provides the unique optical pattern.
    Type: Application
    Filed: February 25, 2014
    Publication date: June 26, 2014
    Applicant: Ramot at Tel-Aviv University Ltd.
    Inventor: Jacob Scheuer
  • Patent number: 8734697
    Abstract: A method for use in producing a patch having a number of projections thereon. The method includes providing a distribution member and filling material on a mold surface, the mold including a number of cavities extending from the mold surface for defining the patch projections, filling the cavities with filling material, at least in part by urging filling material from the distribution member into the cavities, causing the filling material to solidify and separating the solidified filling material and the mold to thereby form the patch.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: May 27, 2014
    Assignee: The University of Queensland
    Inventors: Xianfeng Chen, Mark Anthony Fernance Kendall, Tarl Prow, Anthony Paul Raphael
  • Patent number: 8734704
    Abstract: The present invention relates to a method of fabricating a mold core (5) for making hollow parts (11) based on a composite material including fibers, fabrics, or textiles together with a resin, the method consisting in mixing a filler material (1) and a binder material (2) in order to obtain a uniform mixture of materials, and in solidifying, compacting, and shaping the resulting mixture in order to constitute said core, the method being characterized in that it further consists in introducing into the mixture at least one complementary material (3) that is expandable under the effect of heat or by applying another physical or chemical principle, and in mixing said materials (1, 2, 3) in order to obtain a uniform distribution of the complementary material (3) in the mixture.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: May 27, 2014
    Assignee: Airbus Helicopters Deutschland GmbH
    Inventor: Steffen Kunze
  • Patent number: 8728262
    Abstract: A method of fabricating a composite part including reinforcing fibers comprises fabricating a masterless layup mandrel tool at a fabrication site. The tool includes a composite face sheet that provides a layup surface. The method further comprises using the masterless tool at that site to form a layup of the reinforcing fibers.
    Type: Grant
    Filed: November 7, 2011
    Date of Patent: May 20, 2014
    Assignee: The Boeing Company
    Inventors: Jeffrey L. Miller, Stephen J. Dostert, Michael J. Louderback
  • Patent number: 8708033
    Abstract: The disclosure relates generally to mold compositions comprising calcium aluminate and calcium titanate. The disclosure also relates to methods of molding and the articles so molded using the mold compositions. More specifically, the disclosure relates to calcium aluminate/calcium titanate mold compositions and methods for casting titanium-containing articles, and the titanium-containing articles so molded.
    Type: Grant
    Filed: August 29, 2012
    Date of Patent: April 29, 2014
    Assignee: General Electric Company
    Inventors: Bernard Patrick Bewlay, Joan McKiever, Brian Michael Ellis, Nicholas Vincent McLasky
  • Patent number: 8690559
    Abstract: The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.
    Type: Grant
    Filed: July 29, 2011
    Date of Patent: April 8, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Satoshi Ishii, Masahiko Ogino, Noritake Shizawa, Kyoichi Mori, Akihiro Miyauchi
  • Publication number: 20140084519
    Abstract: The present disclosure relates to mold components and imprint lithography techniques applied on the basis of organic mold materials in order to form polymer microstructure elements. It has been recognized that adapting surface characteristics of at least one mold component may significantly enhance performance of the lithography process, in particular with respect to suppressing residual polymer material, which in conventional strategies may have to be removed on the basis of an additional etch process.
    Type: Application
    Filed: September 18, 2013
    Publication date: March 27, 2014
    Applicants: Fondazione Istituto Italiano di Tecnologia, STMicroelectronics S.r.l.
    Inventors: Fabrizio Porro, Antonio Scognamiglio, Raffaele Vecchione, Valeria Casuscelli, Andrea Di Matteo, Luigi Giuseppe Occhipinti, Paolo Netti
  • Patent number: 8671544
    Abstract: A microneedle mold and a method of manufacturing a microneedle mold are provided for use in fabricating microneedles. The method includes providing a microneedle mold base with recesses therein, the recesses corresponding to the microneedles to be fabricated and extending from a first surface of the microneedle mold base; and forming side-port forming holes in the microneedle mold base, the side-port forming holes extend in side surfaces of the recesses within the microneedle mold base at side-port forming positions of the recesses.
    Type: Grant
    Filed: March 12, 2004
    Date of Patent: March 18, 2014
    Assignee: Agency for Science, Technology and Research
    Inventors: Meí Ma Chen, Zhongli Li, Chee Yen Lim, Pei Ying Joyce Tan, Minghua Wang
  • Patent number: 8663532
    Abstract: A reticle comprising isolated pillars is configured for use in imprint lithography. In some embodiments, on a first substrate a pattern of pillars pitch-multiplied in two dimensions is formed in an imprint reticle. The imprint reticle is brought in contact with a transfer layer overlying a series of mask layers, which in turn overlie a second substrate. The pattern in the reticle is transferred to the transfer layer, forming an imprinted pattern. The imprinted pattern is transferred to the second substrate to form densely-spaced holes in the substrate. In other embodiments, a reticle is patterned by e-beam lithography and spacer formations. The resultant pattern of closely-spaced pillars is used to form containers in an active integrated circuit substrate.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: March 4, 2014
    Assignee: Micron Technology, Inc.
    Inventor: Gurtej S. Sandhu
  • Patent number: 8647552
    Abstract: The present invention discloses a method for enhancing hardness of a nanoimprint mold comprising following steps of: providing a male mold, composed of a first material, for imprinting a female mold and producing a nano structural pattern on the female mold, and the female mold composed of a second material, wherein the hardness of the first material is higher than the hardness of the second material; applying a nano-indentation technique to the female mold onto the female mold by a nano-indentation apparatus having a diamond array probe so as to enhance the surface hardness of the female mold; and impressing a substrate by the female mold with the nano structural pattern having the enhanced surface.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: February 11, 2014
    Assignee: National Chung Cheng University
    Inventors: Yeau-Ren Jeng, Chung-Ming Tan
  • Patent number: 8641954
    Abstract: A method for forming a soft mold includes providing a master mold having at least one pattern thereon, forming pre-polymer layer on the master mold, applying water on the pre-polymer layer, hardening the pre-polymer layer to form a soft mold, removing water, and separating the soft mold from the master mold. A method for forming a pattern comprises forming a resist on an etching subject layer, providing a soft mold, disposing the soft mold on the resist, separating the soft mold from the resist to form the resist pattern, and etching the etching subject layer by using the resist pattern, wherein providing the soft mold comprises providing a master mold having at least one pattern thereon, forming pre-polymer layer on the master mold, applying water on the pre-polymer layer, hardening the pre-polymer layer to form a soft mold, removing water, and separating the soft mold from the master mold.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: February 4, 2014
    Assignee: LG Display Co., Ltd.
    Inventor: Jin-Wuk Kim
  • Patent number: 8609014
    Abstract: According to one embodiment, a template manufacturing method is a method for manufacturing a template for use in an imprint processing in which a pattern having irregularities are formed on a principal surface, and the pattern is brought into contact with a resist member formed on a substrate to be processed, to transfer the pattern to the resist member, the method including implanting charged particles at least into the bottoms of concave portions of the template.
    Type: Grant
    Filed: June 1, 2011
    Date of Patent: December 17, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Tsukasa Azuma, Tatsuhiko Higashiki, Kyoichi Suguro