Deforming The Surface Only Patents (Class 264/293)
  • Patent number: 10427851
    Abstract: The present invention addresses certain problems facing flexible packages and the packaging industry. Embodiments of the present invention are directed to a method of heat scoring the film or material of the package in various shapes and locations to facilitate the consumer opening the package. Embodiments are also directed to a heat scoring device for delivering the heat score to the package material during the manufacturing process. Other embodiments are directed to a package having one or more heat scores for permitting a user to easily access the contents of a package while maintaining the integrity of the package.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: October 1, 2019
    Inventors: Mark Steele, Greg Melchoir
  • Patent number: 10427366
    Abstract: A progressive indent system is used to manufacture a mold for a microlens array. The system includes a die, an actuator, and a controller. The die comprises a plurality of protrusions, wherein each of the protrusions is configured to create an impression in a substrate. Each protrusion has a different priority and is arranged in order of increasing priority on the die. The actuator is coupled to the die and receives actuation instructions from the controller. The actuation instructions cause the actuator to stamp a specific location on the substrate with the plurality of protrusions in order of increasing priority, wherein successive impressions at the specific location progressively form the final shape of a microlens mold. The actuator may move the die repeatedly across the substrate to form a plurality of individual microlens molds at several locations on the substrate, forming a mold for a microlens array.
    Type: Grant
    Filed: November 8, 2016
    Date of Patent: October 1, 2019
    Assignee: Facebook Technologies, LLC
    Inventor: Alexander Sohn
  • Patent number: 10426038
    Abstract: A manufacturing method of a circuit board and a stamp are provided. The method includes: forming a circuit pattern and a dielectric layer on a dielectric substrate; forming a conductive via in the dielectric layer; forming a thermal-sensitive adhesive layer on the dielectric layer; forming a photoresist material layer on the thermal-sensitive adhesive layer; imprinting the photoresist material layer using a stamp, wherein a first conductive layer is disposed on the surface of the pressing side of the stamp, a second conductive layer is disposed on the surface of the other portions; applying a current to the stamp; removing the stamp and the photoresist material layer and the thermal-sensitive adhesive layer below the pressing side to form a patterned photoresist layer and thermal-sensitive adhesive layer; forming a patterned metal layer on the region exposed by the patterned photoresist layer; removing the patterned photoresist layer and thermal-sensitive adhesive layer.
    Type: Grant
    Filed: September 6, 2016
    Date of Patent: September 24, 2019
    Assignee: Unimicron Technology Corp.
    Inventor: Shih-Lian Cheng
  • Patent number: 10414087
    Abstract: A structure stamp has a flexible stamp which has a microstructured or nanostructured stamp surface for embossing of an embossing structure which corresponds to the stamp surface on an embossing surface, and a frame for clamping the stamp. Moreover, the invention relates to a device for embossing an embossing pattern on an embossing surface with the following features: a stamp receiver for accommodating and moving a structure stamp, an embossing material receiver for accommodating and placing an embossing material opposite the structure stamp, and an embossing element drive for moving an embossing element along the structure stamp.
    Type: Grant
    Filed: May 15, 2018
    Date of Patent: September 17, 2019
    Assignee: EV GROUP E. THALLNER GMBH
    Inventors: Peter Fischer, Gerald Kreindl, Jakob Harming, Christine Thanner, Christian Schon
  • Patent number: 10406730
    Abstract: An imprint apparatus includes a mold stage that holds a mold, a substrate stage that holds a substrate, a dispensing device that dispenses resin on the substrate, and a controller configured to obtain a result of a foreign substance inspection conducted on the substrate. In a case that the obtained result indicates existence of a foreign substance, the controller controls the dispensing device to dispense the resin onto the foreign substance, cures the dispensed resin without bringing the resin into contact with the mold, controls the dispensing device to dispense the resin again on a first chip region of the substrate where the foreign substance and the cured resin thereon exists, and performs imprint processing to the first chip region.
    Type: Grant
    Filed: August 5, 2015
    Date of Patent: September 10, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Kurosawa
  • Patent number: 10372033
    Abstract: The present invention provides an imprint apparatus comprising a plurality of processing devices configured to perform imprint processes for a plurality of substrates in parallel, and a controller configured to control the plurality of processing devices, wherein the controller is configured to control the plurality of processing devices so that each of the plurality of processing devices performs imprint processes for a plurality of regions whose positions correspond to each other over the plurality of substrates, and so that the plurality of processing devices respectively perform imprint processes for a plurality of regions whose positions are different from each other and which have shapes corresponding to each other in a single substrate.
    Type: Grant
    Filed: July 10, 2015
    Date of Patent: August 6, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kenji Yamamoto, Noburu Takakura
  • Patent number: 10353286
    Abstract: An imprint method includes: before contacting a mold with an imprint material on a target shot region, obtaining relative position of the target shot region with respect to the mold, and performing first alignment between the target shot region and the mold by driving a correction unit configured to correct the relative position of the target shot region; after contacting the mold with the imprint material on the target shot region, performing second alignment between the target shot region and the mold by driving the correction unit; and performing the imprint process on the target shot region after the second alignment. The first alignment includes alignment performed based on a driving amount of the correction unit in the second alignment for another shot region where the imprint process has been performed earlier than in the target shot region.
    Type: Grant
    Filed: September 21, 2015
    Date of Patent: July 16, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yoshiyuki Usui
  • Patent number: 10343209
    Abstract: A rotary press device (33) includes a restriction section (36) configured to restrict a motion of a roll (30) around a central axis of a roll (30) against movement of the roll (30) around a central axis of a hub main body (8) during rotary forging. In an example, the restriction section (36) has guide teeth (44) meshed with teeth formed on a processing surface of the roll (30).
    Type: Grant
    Filed: February 29, 2016
    Date of Patent: July 9, 2019
    Assignee: NSK LTD.
    Inventors: Nobuyuki Hagiwara, Toshio Nakamura, Hiroshi Koyama, Isao Shintou, Kazuto Kobayashi
  • Patent number: 10343312
    Abstract: An imprint device and an imprint method which form mold patterns on both surfaces of a molding target. An imprint device transfers mold patterns on both surfaces of a molding target using flexible first and second dies and includes first and second casings which each apply pressure of first and second pressurizing rooms respectively, to the first and second dies respectively and the molding target, a pressurizer that adjusts the pressures of the pressurizing rooms, first and second moving units that move the first and second dies respectively and the molding target in a direction coming close to or distant from each other, a depressurizer that depressurizes a depressurizing room formed between the first and second casings, and eliminates fluids present between the dies and the molding target, and a pressure adjuster that adjusts pressures to reduce pressure differences between the depressurizing room and the pressurizing rooms.
    Type: Grant
    Filed: August 23, 2013
    Date of Patent: July 9, 2019
    Assignee: SCIVAX CORPORATION
    Inventors: Hirosuke Kawaguchi, Tatsuya Hagino, Satoru Tanaka
  • Patent number: 10312126
    Abstract: A semiconductor tool and methods of forming semiconductor device assemblies. The semiconductor tool is a bond tip having a vacuum port and a plurality of purge ports with channels coupling the vacuum port with the purge ports. Air may be withdrawn through the vacuum to create a vacuum on the bottom of the bond tip to selectively couple a semiconductor device with the bond tip. The bond tip positions the semiconductor device on top of a stack of semiconductor devices to form a semiconductor device assembly. The assembly may be heated to reflow interconnects between the semiconductor device and the top device of the stack of semiconductor devices. Fluid provided through the purge ports may help to counter warpage of the semiconductor device to help form adequate interconnects between the devices. Fluid may also be provided through the vacuum port to counter the warpage.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: June 4, 2019
    Assignee: MICRON TECHNOLOGY, INC.
    Inventor: Yet Hong Tan
  • Patent number: 10280263
    Abstract: The present the invention is directed to a process and the new materials that are biodegradable for medical use, particularly for drug delivery, therapeutic devices and gene therapy/delivery. The invention illustrates a method of producing a degradable material using polymers made from thiol compounds and alkene/alkyene compounds, wherein one of these compounds contains one or more anhydride groups; and using a thiol-ene step-growth polymerization process, initiated by a free radical initiator. The polymerization process is initiated through photochemical, redox or thermal means, or any combination thereof.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: May 7, 2019
    Assignee: CLARKSON UNIVERSITY
    Inventor: Devon A. Shipp
  • Patent number: 10273192
    Abstract: A ceramic article includes a flexible backing selected from paper, woven fabric, non-woven fabric, polymeric films, metal foils, and combinations thereof. A green ceramic layer is on a first side of the flexible backing, wherein the green ceramic layer includes a ceramic material and a polymeric binder. A major surface of the green ceramic layer includes a pattern of features.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: April 30, 2019
    Assignee: Rolls-Royce Corporation
    Inventors: Benjamin John Bowin Lai, Kang N. Lee, David J. Thomas
  • Patent number: 10207470
    Abstract: Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.
    Type: Grant
    Filed: December 4, 2014
    Date of Patent: February 19, 2019
    Assignee: DEXERIALS CORPORATION
    Inventors: Yutaka Muramoto, Masanao Kikuchi, Shunichi Kajiya, Takaaki Otowa, Yasuhiro Takahashi
  • Patent number: 10189243
    Abstract: In a method of printing a transferable component, a stamp including an elastomeric post having three-dimensional relief features protruding from a surface thereof is pressed against a component on a donor substrate with a first pressure that is sufficient to mechanically deform the relief features and a region of the post between the relief features to contact the component over a first contact area. The stamp is retracted from the donor substrate such that the component is adhered to the stamp. The stamp including the component adhered thereto is pressed against a receiving substrate with a second pressure that is less than the first pressure to contact the component over a second contact area that is smaller than the first contact area. The stamp is then retracted from the receiving substrate to delaminate the component from the stamp and print the component onto the receiving substrate. Related apparatus and stamps are also discussed.
    Type: Grant
    Filed: June 28, 2016
    Date of Patent: January 29, 2019
    Inventors: Etienne Menard, John A. Rogers, Seok Kim, Andrew Carlson
  • Patent number: 10182500
    Abstract: In an imprint process in a gaseous atmosphere containing a condensable gas, the curable composition for photoimprint is difficult to cure, the pattern is not fully formed to cause defects. The present invention relates to a curable composition for photoimprint in a gaseous atmosphere containing a condensable gas. The curable composition for photoimprint at least comprises the following component (A) and component (B): (A) polymerizable compound, and (B) photopolymerization initiator. Component (B) has a saturated solubility of less than 1% by weight in the condensable gas in a liquid state at 5° C. and 1 atm or has a Hansen distance (Ra) of larger than 7.6 to the condensable gas.
    Type: Grant
    Filed: February 10, 2015
    Date of Patent: January 15, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Takeshi Honma, Toshiki Ito, Shiori Yonezawa, Youji Kawasaki, Akiko Iimura
  • Patent number: 10166802
    Abstract: A stamp-face platemaking device transports a medium holder inserted into a plate insertion portion to a printing unit. The medium holder holds a stamp face material in a plate-like member, and has a predetermined pattern in a side end portion thereof. An optical sensor detects the top end portion of the medium holder on a sensor scanning line in the inserting direction, and the pattern start point and the pattern end point of the predetermined pattern. At least one of the horizontal and vertical sizes of the stamp face material is set based on the positions of two of the detected end portions. When the pattern end point is detected, platemaking with the stamp face material is started.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: January 1, 2019
    Assignee: CASIO COMPUTER CO., LTD.
    Inventors: Hirotaka Yuno, Takayuki Hirotani, Yasushi Murai, Shigeru Futawatari, Takanori Suzuki, Yoshimasa Yokoyama
  • Patent number: 10131087
    Abstract: Aimed at providing a method for molding a thermoplastic resin product and a molding apparatus therefor that enable productivity, transfer quality or the like to be improved. Provided is a method for molding a thermoplastic resin product that includes a heating step, a transfer step, a cooling step and a mold-releasing step, and wherein, in the heating step, a stamper is irradiated with infrared rays in a state where a cooling member is not irradiated with infrared rays, and at least in the final stage of the transfer step, the stamper and the cooling member are brought into contact.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: November 20, 2018
    Assignee: TOYO SEIKAN GROUP HOLDINGS, LTD.
    Inventors: Satoo Kimura, Masaki Aoya, Tsutomu Iwasaki
  • Patent number: 10105874
    Abstract: An imprinting method includes a resin application process of applying a light curing resin so that the resin covers a surface of the substrate and protrudes from an outer periphery of the substrate to contact an adhesive sheet in a state where a reverse surface of the substrate is adhered to the adhesive sheet, an advance curing process of curing the light curing resin contacting the adhesive sheet by irradiating the substrate with light from the reverse surface side, a pressurizing process of pressing a fine pattern formed in a mold onto the light curing resin on the surface of the substrate, a curing process of curing the light curing resin on the surface of the substrate by irradiating the substrate with light from the surface side and a mold releasing process of releasing the mold from the light curing resin by performing peeling from a portion cured on the adhesive sheet.
    Type: Grant
    Filed: January 17, 2016
    Date of Patent: October 23, 2018
    Assignee: Panasonic Intellectial Property Management Co., Ltd.
    Inventors: Teppei Iwase, Akihiro Ishikawa, Toshihiko Wada
  • Patent number: 10109865
    Abstract: A lamellar structure graphite foil is used as a material for a separator for a fuel cell, and a hydrophobic layer is formed by impregnation on flow-field channels of the graphite foil. Such a separator is manufactured by forming the flow field channel by etching the graphite foil formed with the mask pattern thereon and forming a hydrophobic layer by impregnation. According to such a separator, performance of a fuel cell stack is enhanced and the manufacturing process of a separator is simplified.
    Type: Grant
    Filed: September 16, 2014
    Date of Patent: October 23, 2018
    Assignee: Doosan Corporation
    Inventors: Ho-Suk Kim, Byung-Sun Hong, Mee-Nam Shinn
  • Patent number: 10105883
    Abstract: A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.
    Type: Grant
    Filed: March 16, 2014
    Date of Patent: October 23, 2018
    Assignee: NANONEX CORPORATION
    Inventors: Hua Tan, Lin Hu, Wei Zhang, Stephen Y. Chou
  • Patent number: 10095117
    Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: October 9, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Zenichi Hamaya, Noriyasu Hasegawa, Setsuo Yoshida, Yoshihiro Shiode
  • Patent number: 10059045
    Abstract: The present invention provides an imprint apparatus that forms an imprint material supplied on a shot region of a substrate by using a mold, comprising a detection unit configured to detect each mark provided to the shot region and each mark provided to the mold, and a control unit configured to perform alignment between the mold and the substrate based on a detection result by the detection unit, wherein the control unit obtains a predicted value of a position of a mark provided to the shot region by using information about deformation of the shot region, determines, as an abnormal mark, a mark for which a difference between the detection result and the predicted value does not fall within an allowable range and performs the alignment without using the detection result for the abnormal mark.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: August 28, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Morohoshi
  • Patent number: 10042250
    Abstract: An imprint apparatus for forming a pattern on a substrate by contacting an imprint material on the substrate with a mold includes a mold holding member configured to hold the mold and a mold deforming mechanism for applying a force to a side surface of the mold in a direction along a pattern face of the mold in which the pattern is formed in order to deform the pattern formed in the mold held by the mold holding member. The mold deforming mechanism includes a contact portion to contact with the side surface of the mold to press against the side surface. The contact portion is shaped such that a dimension of part of the contact portion to contact with the side surface of the mold is less than a dimension of part of the contact portion away from the side surface of the mold.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: August 7, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yusuke Tanaka, Hirotoshi Torii
  • Patent number: 10032859
    Abstract: A structure, such as an integrated circuit device, is described that includes a line of material with critical dimensions which vary within a distribution substantially less than that of a mask element, such as a patterned resist element, used in etching the line. Techniques are described for processing a line of crystalline phase material which has already been etched using the mask element, in a manner which straightens an etched sidewall surface of the line. The straightened sidewall surface does not carry the sidewall surface variations introduced by photolithographic processes, or other patterning processes, involved in forming the mask element and etching the line.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: July 24, 2018
    Assignee: Synopsys, Inc.
    Inventors: Victor Moroz, Lars Bomholt
  • Patent number: 10023673
    Abstract: To provide a curable composition for nanoimprinting that can form a cured product that has a sufficiently cured surface and is less prone to a pattern collapse defect even when the curable composition is cured by a photo-nanoimprint method at a low exposure dose. To provide a nanoimprint method for forming such a cured product. To provide a cured product that is less prone to a pattern collapse defect even when cured at a low exposure dose, a method for producing such a cured product, a method for manufacturing an optical component, a method for manufacturing a circuit board, and a method for manufacturing an electronic component. A curable composition that satisfies the formula (1) in a cured state: Er1/Er2?1.10??(1) wherein Er1 denotes the surface reduced modulus (GPa) of a cured product of the curable composition, and Er2 denotes the internal reduced modulus (GPa) of the cured product.
    Type: Grant
    Filed: April 28, 2015
    Date of Patent: July 17, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Jun Kato, Youji Kawasaki, Shiori Yonezawa, Toshiki Ito
  • Patent number: 9989845
    Abstract: An exemplary embodiment discloses an imprint lithography method including: forming a first imprint pattern on a base substrate in a first area; forming a first resist pattern on the base substrate in a second area, the second area partially overlapping the first area; etching a third area using the first imprint pattern and the first resist pattern as an etch barrier, wherein the third area is a portion of the first area that is not overlapped with the second area; removing the first imprint pattern and the first resist pattern; forming a second imprint pattern on the base substrate in a fourth area which overlaps the second area and partially overlaps the third area; forming a second resist pattern on the base substrate in the third area; and etching the second area using the second imprint pattern and the second resist pattern as an etch barrier.
    Type: Grant
    Filed: January 8, 2016
    Date of Patent: June 5, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Seung-Won Park, Dae-Hwan Jang, Min-Uk Kim, Jung-Gun Nam, Dae-Young Lee, Gug-Rae Jo
  • Patent number: 9975517
    Abstract: Some embodiments are directed to an assembly for housing and covering a vehicle airbag in an un-deployed state. The assembly can include a hollow housing that defines an interior that is configured to house the airbag in the un-deployed state. The housing can include a door having a linearly extending primary weakened portion spanning longitudinally opposing ends of the housing. The housing door can also include a pair of angled seams that each extend proximate the primary weakened portion to a location adjacent opposing corners of the door. The assembly can also include an intermediate layer disposed over and joined to the housing door, and an exterior layer disposed over and joined to the intermediate layer.
    Type: Grant
    Filed: April 22, 2016
    Date of Patent: May 22, 2018
    Assignees: HONDA MOTOR CO., LTD., GRUPO ANTOLIN INGENIERIA, S.A.
    Inventors: Kenneth Alan Shick, Randy A. Staib, James J. Yang, Tadashi Sato, Dwayne William Malone, Tetsuji Fukushima, Cory J. Perriton, Timothy D. Boxell, Todd S. Przybylo, Michael J. Aittama
  • Patent number: 9961776
    Abstract: The present invention provides a photo-curable composition that requires a small mold-releasing force in a method of producing a cured product and also provides a method of producing a cured product with a small mold-releasing force. The method of producing a cured product includes applying a photo-curable composition onto a base material; pressing a mold to the photo-curable composition to form a pattern in the photo-curable composition; irradiating the photo-curable composition provided with the pattern with first light to generate a cured product having the pattern; and releasing the mold from the cured product, wherein a gas-generating region is formed from a gas-generating agent between the cured product and the mold; the gas-generating region is irradiated with second light to generate a gas in the gas-generating region; and the mold is released from the cured product after the generation of the gas or simultaneously with the generation of the gas.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: May 1, 2018
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuya Suzuki, Toshiki Ito, Chieko Mihara
  • Patent number: 9958773
    Abstract: The present invention provides an imprint apparatus which forms an imprint material on a substrate using a mold, comprising a driving unit driving at least one of the mold and the substrate, a measurement unit measuring a position deviation amount between the mold and the substrate, and a control unit controlling alignment between the mold and the substrate based on the position deviation amount, wherein in a first period from a start of contact between the mold and the imprint material until a distance between the mold and the substrate falls within a target range, and a second period in which the distance is maintained, the control unit obtains a command value for controlling the driving unit and controls the driving unit such that a amplification factor of the command value in the second period is larger than that in the first period.
    Type: Grant
    Filed: April 10, 2015
    Date of Patent: May 1, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tetsuji Okada, Noriyasu Hasegawa
  • Patent number: 9946156
    Abstract: The present invention provides an imprint apparatus comprising at least one first detector configured to detect a first number of first marks among a plurality of marks formed in the plurality of shot regions, a second detector having a field of view wider than that of the first detector, and configured to detect a second number of second marks different from the first marks among the plurality of marks, the second number being larger than the first number, and a controller configured to align the plurality of shot regions and the mold by using a detection result from the second detector.
    Type: Grant
    Filed: April 1, 2014
    Date of Patent: April 17, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroshi Sato
  • Patent number: 9921470
    Abstract: The present invention provides an imprint apparatus which transfers a pattern onto a substrate by using a mold including a first surface with a pattern region where an unevenness pattern is formed, and a second surface opposite to the first surface, the mold including a first pattern group formed between the second surface and a surface of a convex portion in the unevenness pattern, or on the second surface, the apparatus comprising a second pattern group, a detection unit configured to detect a mark group formed by light having passed through the first pattern group and the second pattern group, and a calculation unit configured to calculate a position deviation between the first pattern group and the second pattern group from the mark group detected by the detection unit.
    Type: Grant
    Filed: February 13, 2013
    Date of Patent: March 20, 2018
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yoshihiro Shiode
  • Patent number: 9865294
    Abstract: Provided herein is a method including forming a data zone guiding pattern and forming a servo zone guiding pattern. A servo pattern and a data pattern are simultaneously formed. Directed self-assembly of block copolymers is guided by the data zone guiding pattern and the servo zone guiding pattern.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: January 9, 2018
    Assignee: Seagate Technology LLC
    Inventors: ShuaiGang Xiao, XiaoMin Yang, David S. Kuo, Kim Yang Lee, Yautzong Hsu
  • Patent number: 9823562
    Abstract: The present invention provides an imprint apparatus for forming a pattern in a plurality of shot regions on a substrate, comprising a heating unit configured to deform each of the shot regions by heating the substrate, and a control unit configured to control the heating unit, wherein when performing imprint processing for a target shot region as a shot region to undergo imprint processing based on heating control information used to heat, by the heating unit, a shot region which has undergone imprint processing prior to the target shot region, the control unit controls heating of the substrate by the heating unit so that a shape of the target shot region which has been deformed by heating of the substrate according to the control information becomes close to a target shape.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: November 21, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tomofumi Nishikawara, Kazuki Nakagawa
  • Patent number: 9821507
    Abstract: The pattern complexity and functional value of wrinkled structures can be substantially increased by fabricating the wrinkles on pre-patterned quasi-planar substrates instead of flat substrates. This disclosure presents the methods for fabricating pre-patterned polymeric surfaces that can be subsequently used as the substrates during manufacture of complex wrinkled structures. Pre-patterned substrates are generated by imprinting the pre-patterns onto the substrates during the curing process. Suitability for post-curing use in fabrication of wrinkles is ensured by (i) delayed imprinting that occurs close to but before the gelation point and (ii) gradual alignment of pre-patterns to the direction of stretch that is applied later during manufacture of wrinkled structures.
    Type: Grant
    Filed: October 24, 2015
    Date of Patent: November 21, 2017
    Inventors: Sourabh Kumar Saha, Martin Luther Culpepper
  • Patent number: 9810979
    Abstract: An imprint apparatus includes: a first driving mechanism configured to move at least one of a mold holder and a substrate holder such that a mold and an imprint material are contact with each other; a second driving mechanism configured to move at least one of the holders such that the substrate is aligned with the mold; a measurement device configured to measure relative positions between a mold mark and a substrate mark in a state in which the mold and the imprint material are not in contact with each other; and a controller configured to control the second driving mechanism based on information of a relationship between a moving amount of at least one of the holders, and change in relative positions between the marks, information of the moving amount, and information of the measured relative positions.
    Type: Grant
    Filed: July 5, 2012
    Date of Patent: November 7, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Tadashi Hattori
  • Patent number: 9696318
    Abstract: The present invention provides a hydrophilic film that causes a liquid to diffuse rapidly in a single direction. The hydrophilic film comprises a substrate having a texture of parallel sunken and raised patterns, and a hydrophilic coat comprising a coat of silicon dioxide particles. The present invention also provides a method for preparing the hydrophilic film. The method comprises: preparing an aqueous dispersion of silicon dioxide particles, wherein the average size of the silicon dioxide particles is 1 to 60 nm, and the concentration of the silicon dioxide particles is 0.05% to 15% by weight; coating the aqueous dispersion of silicon dioxide particles on a substrate, wherein the substrate has a texture of parallel sunken and raised patterns; and drying the substrate coated with the aqueous dispersion of silicon dioxide particles.
    Type: Grant
    Filed: September 12, 2013
    Date of Patent: July 4, 2017
    Assignee: 3M Innovative Properties Company
    Inventors: Te-Wei Chen, Huang Chin Hung, Naiyong Jing
  • Patent number: 9643235
    Abstract: A device for winding a filament around a structure disposed concentrically around a distal end of a balloon catheter includes a rotatable holder for retaining a distal end of the balloon catheter, a translatable winding carriage for helically winding the tensioned filament around the balloon catheter distal end, a heater for applying a predetermined amount of heat to a section of the balloon catheter having the filament wound therearound, and a controller for controlling at least the rate of rotation of the holder, the tensioning force applied to the filament, the amount of heat applied by the heater, and the rate of travel of the translatable winding carriage along the longitudinal dimension of the balloon catheter. By use of the device, the balloon is heat set and a predetermined checkering pattern of surface indentations are provided in the structure exterior surface in a single pass.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: May 9, 2017
    Assignee: C.R. BARD, INC.
    Inventors: David M. Graves, William E. Parmentier, Robert G. Lerdahl, Phillip E. Carr, Jo Ann Kelly
  • Patent number: 9597839
    Abstract: A printer compensates for printing errors occurring during production of the layers for the formation of an object in a three-dimensional printer. The printer includes an optical sensor that generates data corresponding to edges of each layer of the object after each layer is printed. Differences between the raster data used to eject the material to form a layer and the data received from the optical sensor are used to modify the raster data that operates a printhead to form a next layer in the object.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: March 21, 2017
    Assignee: Xerox Corporation
    Inventors: Dara N. Lubin, John T. Buzzelli, Ron E. Dufort, Kevin St. Martin, David B. Montfort
  • Patent number: 9561626
    Abstract: A build chamber of a three-dimensional printer uses directed heat to preheat a region within the chamber where a build will be initiated, and then uses circulating, heated air to maintain a target temperature for the entire build volume after the build is initiated. A fixed heating element and blower may advantageously be used for both heating steps, and preheating may be accomplished more quickly by initially directing heat at the locus of build initiation rather than diffusing heat throughout an entire build volume.
    Type: Grant
    Filed: January 5, 2014
    Date of Patent: February 7, 2017
    Assignee: MakerBot Industries, LLC
    Inventors: James Griszbacher, Samuel Holland
  • Patent number: 9561603
    Abstract: A mold may include a plurality of nanostructures configured to form a lithographic pattern when imprinted into a material. Imprinting may include imprinting the mold a first predetermined distance, modifying a temperature of the material, and altering a position of the mold based on the temperature modification. One or more thermal elements may alter a temperature of a first section of the material and/or one or more nanostructures for a predetermined pulse time less than an equilibrium time required for the mold and/or material to reach a stable temperature state. A first thermal element may selectively alter the temperature of a first section of the material and/or a first nanostructure and a second thermal element may selectively alter the temperature of a second section of the material and/or a second nanostructure. The one or more thermal elements may include one or more thermoelectric elements.
    Type: Grant
    Filed: January 3, 2013
    Date of Patent: February 7, 2017
    Assignee: ELWHA, LLC
    Inventors: Roderick A. Hyde, Jordin T. Kare, Thomas A. Weaver
  • Patent number: 9511550
    Abstract: According to a molding method for a fiber reinforced composite material, a cavity forming surface 13 of a second mold 12 with a recessed portion 14 for molding a thick portion is brought into contact with a fiber reinforced composite material 15. The fiber reinforced composite material 15 is heated in a state in which the temperature of the cavity forming surface 13 is higher than that of a cavity forming surface 11 of a first mold 10. After that, the first mold 10 and the second mold 12 are closed with a pressure to the fiber reinforced composite material 15 so as to pass the fiber reinforced composite material 15 into the recessed portion 14. This can integrally mold the thick portion with the main body of a molded component.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: December 6, 2016
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Hideo Mine, Takeshi Kiritoshi, Kazuyuki Harada
  • Patent number: 9494857
    Abstract: A method for producing a product having an uneven microstructure on a surface thereof includes: a step (I) which treats a surface of a roll mold (20) having an uneven microstructure thereon with an external release agent containing a fluorine and not containing a functional group (B) which reacts with a functional group (A) existing on the surface of the product; and a step (II) which obtains the product having the uneven microstructure on the surface thereof (40) by inserting an active energy ray curable resin composition (38) including an internal release agent between the roll mold (20) and a film (substrate) (42) after the step (I). Then, the composition is hardened by being irradiated with an active energy ray and a cured resin layer (44) having a surface, onto which the uneven microstructure is transferred, is formed on the surface of the film (42).
    Type: Grant
    Filed: June 7, 2011
    Date of Patent: November 15, 2016
    Assignee: MITSUBISHI RAYON CO., LTD.
    Inventors: Yusuke Nakai, Tetsuya Jigami, Tadashi Nakamura
  • Patent number: 9418907
    Abstract: A sample semiconductor device is manufactured and the curvature of the sample is measured. An area is set to be removed from an encapsulation resin layer on the basis of the measurement value. After forming the encapsulation resin layer during the process of manufacturing the semiconductor device, the removal area is removed.
    Type: Grant
    Filed: January 17, 2014
    Date of Patent: August 16, 2016
    Assignee: PS5 LUXCO S.A.R.L.
    Inventor: Sensho Usami
  • Patent number: 9346229
    Abstract: A mold element for vulcanizing all or part of a tire tread intended to accept studs for driving on ice. The mold element comprises a molding surface able to mold all or part of the tread surface of this tread. The mold element comprises an insert added into the mold element. The insert comprises an insert body intended to be fixed into the mold element, a rod intended for molding into the tread a cavity that is capable of accepting a stud, this rod being fixed removably to the insert body, marking means able to mold a pattern on the tread near the stud. The marking means are fixed removably to the insert body by fixing means.
    Type: Grant
    Filed: July 8, 2013
    Date of Patent: May 24, 2016
    Assignees: COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN, MICHELIN RECHERCHE ET TECHNIQUE, S.A.
    Inventors: Jean-Louis Cocural, Christian Gomet
  • Patent number: 9339970
    Abstract: An imprint apparatus forms a resin pattern on a substrate by curing resin in a state where the resin on the substrate is in contact with a patterned portion of a mold. It includes: a gas supply unit which supplies gas to a space between the mold and the substrate; a measuring unit which is configured so that measuring light transits the space or a space that communicates with the space, and which measures a prescribed distance between two objects using the measuring light; and a controller which obtains information concerning the prescribed distance, and which outputs a signal representing a state of concentration of the gas in the space based on the information and a measurement result of the measuring unit in a state where the gas is supplied from the gas supply unit.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: May 17, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shinichi Shudo, Shintarou Narioka, Yukio Takabayashi
  • Patent number: 9321214
    Abstract: A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined pattern to form a nanoimprint lithography template in the mass transport layer.
    Type: Grant
    Filed: July 13, 2012
    Date of Patent: April 26, 2016
    Assignee: University of Utah Research Foundation
    Inventors: Rajesh Menon, Nicole Brimhall
  • Patent number: 9318348
    Abstract: One or more graphene layers may be formed on a diamond substrate by reforming sp3 hybrid orbitals of C—C bonds in a portion of the diamond substrate into sp2 hybrid orbitals. Forming sp2 hybrid orbitals may be achieved by ion bombardment to damage the sp3 hybrid orbitals of the C—C bonds in the diamond substrate and subsequent heating of the diamond substrate to allow annealing to take place. If more than ten graphene layers are formed on the diamond substrate, the graphene layers may be reduced to ten or less graphene layers. Removal of the graphene layers may be performed by peeling a desired number of layers using an adhesive material.
    Type: Grant
    Filed: March 20, 2014
    Date of Patent: April 19, 2016
    Assignee: KING ABDULAZIZ UNIVERSITY
    Inventor: Hussain A. Albarakaty
  • Patent number: 9302520
    Abstract: A stamp face forming device, including: a stamp face forming unit that forms a stamp face on a stamp material while pressing the stamp material held on a stamp material holder; a conveying unit that causes the stamp material holder to move relative to the stamp face forming unit; and a support unit that supports the stamp material holder in order to prevent tilting of the stamp material holder with respect to a conveyance path for the stamp material holder of the stamp face forming unit, at least when the stamp face is being formed.
    Type: Grant
    Filed: October 7, 2014
    Date of Patent: April 5, 2016
    Assignee: CASIO COMPUTER CO., LTD.
    Inventor: Kouji Oshima
  • Patent number: 9278466
    Abstract: In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate.
    Type: Grant
    Filed: January 26, 2015
    Date of Patent: March 8, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Roelof Koole
  • Patent number: 9280048
    Abstract: An imprint apparatus which cures a resin dispensed on a substrate while the resin and a pattern surface of a mold are in contact with each other, comprises a supply portion configured to supply a gas, used to accelerate filling of a concave portion of the pattern surface of the mold with the resin, to a space which the pattern surface of the mold faces, and a controller configured to control the supply portion to supply the gas to the space before the resin and the pattern surface of the mold are brought into contact with each other, wherein the supply portion is configured to supply the gas to the space via a porous portion formed in at least part of the mold.
    Type: Grant
    Filed: April 25, 2014
    Date of Patent: March 8, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hiroshi Sato, Hideki Ina