Abstract: In a method for transcripting fine patterns and an apparatus for transcripting fine patterns, the ingress of bubbles is prevented and patterns are transcripted with a high throughput by a relatively compact apparatus. For this purpose, a back surface of a stamper is vacuum sucked and the stamper is brought into close contact with a target of transcription with its surfaces coated with resist and pressure is applied thereto. At this time, the stamper is deformed into a spherical shape or bent to expand the close contact face from a central area to a peripheral area to prevent the ingress of air bubbles into between the target of transcription and the stamper.

Abstract: The invention relates to a solid support suitable for supporting endothelial cell growth which has one or more regions of microstructure incorporated onto the growing surface thereof as well as to such supports having endothelial cells attached thereto. The invention further relates to methods of culturing endothelial cells and directing tubule formation using these supports.

Abstract: A method of making patterned structured solid surfaces is disclosed that includes filling a structured template with backfill material to produce a structured transfer film and laminating the structured transfer film to a receptor substrate. The receptor substrate comprises a patterned adhesion promotion layer. The template layer is capable of being removed from the backfill layer while leaving at least a portion of the structured surface of the backfill layer substantially intact. The backfill layer can include at least two different materials, one of which can be an adhesion promotion layer. In some embodiments the backfill layer includes a silsesquioxane such as polyvinyl silsesquioxane. The structured transfer film is a stable intermediate that can be covered temporarily with a release liner for storage and handling.

Abstract: A method of forming a chemical mechanical polishing pad. The method includes polymerizing one or more polymer precursors and forming a chemical-mechanical planarization pad including a surface, forming grooves in the surface defining lands between the grooves, wherein the grooves have a first width, and shrinking the lands from a first land length (L1) at the surface to a second land length (L2) at the surface, wherein the second land length (L2) is less than the first land length (L1) and the grooves have a second width (W2) wherein (W1)?(X)(W2), wherein (X) has a value in the range of 0.01 to 0.75.

Abstract: Methods are generally disclosed for forming and using a release sheet. To form the release sheet, a release coating is applied over a first surface of a base sheet. Generally, the release coating includes a fatty alcohol ester of acrylic acid and a curable monomer, and can also include a curable polymeric resin. Then, the release coating can be cured. In one particular embodiment, the release coating can be substantially free from siloxanes. The release sheet formed according to this method is also generally provided, along with methods of forming a casting sheet using the release sheet are also generally provided.

Abstract: In a flexible substrate for roll-to-roll processing having improved thermal, mechanical, and chemical stabilities, a method of manufacturing the same, and an organic light emitting display apparatus including the same, the flexible substrate for roll-to-roll processing includes a base film formed of an organic material and an inorganic mesh pattern formed of inorganic material. The base film includes a first surface and a second surface opposite to the first surface, the first surface comprising first trenches extending in a first direction and second trenches extending in a second direction. The inorganic mesh pattern buries the first trenches and the second trenches.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere.

Abstract: Disclosed, among others, are a multilayer film that permits thermal printing or printing by application of pressure from pressure-applying devices. The structure includes an extruded, outer skin layer and an extruded internal pigment layer. Further, the structure includes an extruded image-rendering layer intermediate to the outer skin layer and the pigment layer, the image-rendering layer including a collapsible layer structure, sensitive to the application of temperature and/or pressure, having dispersed therein a plurality of voids, the collapsible layer structure in uncollapsed condition being substantially opaque to obscure from view the pigment layer there beneath.

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

Abstract: The present application relates to a full wafer nanoimprint lithography device comprises a wafer stage, a full wafer coated with a liquid resist, a demolding nozzle, a composite mold, an imprint head, a pressure passageway, a vacuum passageway and a UV light source. The present application also relates to an imprinting method using the full wafer nanoimprint lithography device comprises the following steps: 1) a pretreatment process; 2) an imprinting process; 3) a curing process; and 4) a demolding process. The device and the method can be used for high volume manufacturing photonic crystal LEDs, nano patterned sapphire substrates and the like in large scale patterning on the non-planar surface or substrate.

Abstract: The invention relates to a device for hot embossing of a magnetic nanoparticle (N)-containing polymer layer and a method for hot embossing of a magnetic nanoparticle-containing polymer layer.

Abstract: The present disclosure provides a slipsheet and/or divider sheet and method for making the same, and method for moving and storing containers with use of the slipsheets or divider sheets. The sheets have an imprint or an embossing that provides a raised planar surface. The raised planar surface preferably comprises a plurality of ridges, crowns or crests, which are preferably arranged in a pattern throughout an upper surface of the sheet. To make the sheet, a die can be etched to have protuberances or bumps, and the die is preferably pressed into a sheet of pliable thermoplastic material. The sheet thus made has a plurality of indentation formed by the protuberances or bumps on the die, and the sheet has a planar outer surface comprising a plurality of ridges, crowns and crests between the indentations.

Abstract: An optical disc having a region with pre-recorded data and a recordable region, a method of fabricating the disc, a stamper for forming a disc master, and a recording device for use with the disc are disclosed. Data recorded in the recordable region may be used for activation of the disc, providing unique identification or enhancing program content on the disc.

Abstract: An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other.

Abstract: An imprint apparatus, which performs an imprint process for forming a pattern of a mold on a resin coated on a substrate, includes an imaging unit configured to image the resin on which the pattern is formed, and a controller configured to control the imprint process. When the pattern is continuously formed on the substrate, the controller compares an image of at least a partial area imaged by the imaging unit and an image of a reference state, which is obtained in advance, and when patterns each having a difference, which falls outside an allowable range, between the images are continuously formed, it determines a transfer error.

Abstract: An imprint apparatus molds and cures an imprint material on a substrate using a mold to thereby form a pattern on the substrate. The apparatus includes a first drive mechanism configured to apply a force in a planar direction of the mold and change the planar shape of the pattern portion formed in the mold, and a second drive mechanism configured to deform the mold about an axis (for example, the Y axis) that is orthogonal to the pressing direction of the mold and the uncured resin (for example, the Z axis) and a direction of the force applied by the first drive mechanism (for example, the X axis).

Abstract: Nonwoven sanitary tissue products having a woven surface pattern that provides the nonwoven sanitary tissue product with a woven appearance and a method for making such sanitary tissue products are provided.

Abstract: A lithographic method for forming a pattern within a surface on a substrate includes providing a substrate with a degradable material, molding the material to imprint a pattern thereon, depositing a layer of a second material over the imprinted pattern, removing portions of the layer of the second material to expose portions of the imprinted pattern of degradable material and removing portions of the exposed degradable material to leave an open pattern in the layer of second material.

Abstract: A production method of three-dimensional pattern is disclosed. First, an adhesive layer is applied on a three-dimensional workpiece. Next, a film is vacuum adsorbed on the adhesive layer so that the film is impressed onto the adhesive layer to form the three-dimensional pattern on the adhesive layer. Finally, the adhesive layer is cured by implementing a plurality of heat treatments thereon. A workpiece of three-dimensional pattern and a production device of three-dimensional pattern are also disclosed.

Abstract: A method (and apparatus) for nano lithography, includes applying a pneumatic pressure to at least one of a surface of a semi-rigid mask or template and a portion of a surface of a resist-coated workpiece, and, by the applying of the pneumatic pressure, transferring a pattern from the mask to the workpiece.

Abstract: An apparatus for etching a pattern in an etching zone laid out on a substrate includes a pen that can be freely moved manually relative to the etching zone, the pen being equipped with an etching head able to etch the substrate at an etching point when etching is triggered, a measuring unit for measuring position and orientation of the etching head relative to the substrate, a control unit configured to calculate coordinates of the etching point as a function of the measured position and orientation of the etching head relative to the substrate, to trigger etching at the etching point if the calculated coordinates of the etching point correspond to coordinates of a point to be etched, the coordinates of the point to be etched being encoded in a prerecorded drawing of the pattern, and to automatically prevent etching otherwise.

Abstract: A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.

Abstract: A transfer molding method includes an insertion step of inserting a resin sheet between a first die and a second die, which are disposed opposite each other, a sandwiching step of sandwiching the resin sheet between the first and second dies while a transfer surface of a transfer member is brought into contact with at least one of surfaces of the resin sheet, and a transfer molding step of heating at least one of the first and second dies to melt at least a surface portion of the resin sheet with which the transfer surface of the transfer member is brought into contact, and exhausting residual air remaining in a recess through a groove portion connected to the recess when a thick portion is formed by the recess formed in the transfer surface.

Abstract: An imprint apparatus includes: a mold that forms a pattern in a resin on a base plate; a press unit that presses the mold against the resin; a flow channel that is formed by a wall of the mold and a surface of the resin, air flowing along the wall and the surface; a supply unit that supplies air to the flow channel; wherein the supply unit supplies air with a first pressure to the flow channel when the mold makes contact with the resin.

Abstract: To provide a photocurable composition whereby it is possible to obtain a cured product having both a release property and flexibility, and a process whereby it is possible to produce a flexible molded product having on its surface a fine pattern having a reverse pattern of a mold precisely transferred. A photocurable composition comprising a compound (A) having at least two urethane bonds and at least two (meth)acryloyloxy groups and having a mass average molecular weight of less than 2,000, a compound (B) having a fluorine atom and at least one carbon-carbon unsaturated double bond, a compound (C) having one (meth)acryloyloxy group, a photopolymerization initiator (D), and a fluorinated surfactant (E), wherein in the total (100 mass %) of (A) to (E), (A) is from 10 to 50 mass %, (B) is from 5 to 35 mass %, (C) is from 15 to 75 mass %, (D) is from 1 to 12 mass %, and (E) is from 0.1 to 5 mass %, is used.

Abstract: An imprint apparatus includes a detector and an adjusting device. A second mark formed on a substrate includes a grating pattern having grating pitches in first and second directions which are respectively parallel to first and second axes which are parallel to a pattern surface of a mold and orthogonal to each other. A first mark formed on the mold includes a grating pattern having a grating pitch in the first direction. The first and second marks have different grating pitches in the first direction. The detector includes an image sensor, and an optical system which forms a moire fringe on an image sensing surface of the image sensor. The adjusting device adjusts, in a plane including the second axis and a third axis that is perpendicular to the first and second axes, an angle between the optical axis of the detector and the third axis.

Abstract: An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.

Abstract: A tire mold is provided with a groove-like saw cut in an area of a tire molding surface which comes into contact with a side surface of a tire. The saw cut comprises a pair of circumferential saw cuts arranged to be spaced in a tire diametrical direction, a grid-like saw cut which is expanded between the pair of circumferential saw cuts, and a plurality of frame-like saw cuts which are dotted between the pair of circumferential saw cuts. The frame-like saw cuts fringe a closed area which is wider than a smooth area defined by the grid-like saw cut. The grid-like saw cut surrounds the frame-like saw cuts to prevent the frame-like saw cuts from coming into contact with each other. The frame-like saw cuts are coupled to each other via the grid-like saw cut.

Abstract: The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.

Abstract: A method of controlling wetting characteristics is described. Such method includes forming and configuring nanostructures on a surface where controlling of the wetting characteristics is desired. Surfaces and methods of fabricating such surfaces are also described.

Abstract: A method of nanopatterning includes the steps of providing the resist film (12) and forming the pattern in the resist film (12). The resist film (12) includes an organosilicone compound having at least two vinyl groups, an organosilicone crosslinker different from the organosilicone compound, a catalyst, and a catalyst inhibitor. The cured resist film (12) includes the reaction product of the organosilicone compound having at least two vinyl groups and the organosilicone crosslinker different from the organosilicone compound, in the presence of the catalyst and the catalyst inhibitor. The article (10) includes a substrate (14), and the cured resist film (12) is disposed on the substrate (14). Due to the presence of the catalyst inhibitor in the resist film (12), the resist film (12) may be manipulated for hours at room temperature without curing. At the same time, the resist film (12) cures in a sufficiently short period of time to be commercially valuable.

Abstract: An imprint lithography alignment apparatus is disclosed that includes at least two detectors which are configured to detect an imprint template alignment mark, wherein the alignment apparatus further comprises alignment radiation adjustment optics which are configured to provide adjustment of locations from which the at least two alignment detectors receive alignment radiation.

Abstract: Droplets of polymerizable material may be patterned on a film sheet using a roll-to-roll system. The droplets of polymerizable material may be dispensed on the film sheet such that a substantially continuous patterned layer may be formed on the film sheet. A contact system provides for smooth fluid front progression the polymerizable material during imprinting. A gas purging system may be positioned during imprinting. Gas purging systems may provide for purging in parallel as fluid front of polymerizable material moves through roll-to-roll system.

Abstract: An imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

Abstract: A molding apparatus for patterning a workpiece includes a first support member for supporting the mold, a second support member arranged opposite to the first support member, and a pressing mechanism for pressing the mold and the work together using the support members to pattern the workpiece. In this structure, either the surface of the first support member for supporting the mold or the surface of the second support member for supporting the workpiece is smaller in area than both surfaces of the mold and the workpiece.

Abstract: A molded article integrates molded features that simulate an appearance of brush strokes. A die plate for forming the molded features simulating the brush strokes and a method of molding an article utilizing the die plate are also provided.

Abstract: A tire vulcanization forming mold and a tire manufacturing method using the same. In the forming mold, a plurality of segment blocks divided in a circumferential direction are equal in circumferential length and are formed with tread forming patterns of plural kinds on which blades for forming tread patterns on a tire are arranged in different arrays. The segment blocks formed with the tread forming patterns of the plural kinds are arranged randomly in the circumferential direction to constitute the mold of a ring shape covering a whole circumference of the tire.

Abstract: Improved methods and apparatus are disclosed for correcting one or more uniformity characteristics in a tire and particularly to correction in a low profile tire or a tire having a projection along the sidewall. The uniformity characteristic may be a radial force variation, conicity, or both. Correction is accomplished by stretching portions of the tire architecture to create permanent deformation.

Abstract: A process using the nanoimprint technique to form the diffraction grating for the DFB-LD is disclosed. The process includes (a) coating a resist for the EB exposure on a dummy substrate, (b) irradiating the resist as varying the acceleration voltage, (c) forming a resist pattern by developing the irradiated resist, (d) coating the SOG film on the patterned resist, (e) attaching the silica substrate on the cured SOG film, and (f) removing the dummy substrate with the resist from the SOG film and the silica substrate. Using the mold thus formed, the diffraction grating for the DFB-LD is formed by the nanoimprint technique.

Abstract: The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.

Abstract: An imprint apparatus that includes a holding unit, and performs an imprint process, including molding of an imprint material on a substrate held by the holding unit using a mold, curing of the molded imprint material, and releasing of the cured imprint material from the mold, to form a pattern on the substrate. The apparatus includes a first cure device configured to perform a first cure process for the imprint material molded by the mold prior to the releasing; and a second cure device configured to perform a second cure process for the imprint material on the substrate conveyed out from the holding unit after the releasing.

Abstract: An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other.

Abstract: A device for winding a filament around a structure disposed concentrically around a distal end of a balloon catheter includes a rotatable holder for retaining a distal end of the balloon catheter, a translatable winding carriage for helically winding the tensioned filament around the balloon catheter distal end, a heater for applying a predetermined amount of heat to a section of the balloon catheter having the filament wound therearound, and a controller for controlling at least the rate of rotation of the holder, the tensioning force applied to the filament, the amount of heat applied by the heater, and the rate of travel of the translatable winding carriage along the longitudinal dimension of the balloon catheter. By use of the device, the balloon is heat set and a predetermined checkering pattern of surface indentations are provided in the structure exterior surface in a single pass.

Abstract: A surface of a mold for an imprint apparatus on a side of a substrate includes a central region having the pattern, and a pair of first peripheral regions. The central region includes a pair of boundaries parallel to a first direction. The pair of first peripheral regions are located outside the pair of boundaries parallel to the first direction. The pair of first peripheral regions include first regions in which mold-side marks are formed and second regions in which no mold-side marks are formed. A gap between the first regions and the substrate is not filled with a resin upon an imprint process. A gap between the second regions and the substrate is filled with the resin upon an imprint process. The first regions and the second regions are opposed to each other on opposite sides of the central region.

Abstract: The present invention provides a nanoimprint curable composition to be used in “nanoimprint lithography” in which a nanoimprint mold is pressed to transfer a fine concave-convex pattern, the nanoimprint curable composition containing a composite resin which has a polysiloxane segment and a polymer segment other than the polysiloxane segment, the polysiloxane segment containing a silanol group and/or hydrolyzable silyl group and having a polymerizable double bond. In addition, the present invention provides a nanoimprint-lithographic molded product, resist film, resin mold, and method for forming a pattern, which each involves use of the nanoimprint composition.

Abstract: According to one embodiment, a patterning method includes releasing the template from the cured imprint resist, aligning an alignment mark formed in the non-imprint portion of the template with the transfer pattern of the alignment pattern without causing the alignment mark to contact the imprint resist, and causing the main pattern and the alignment pattern of the template to contact an imprint resist that is supplied to a shot region adjacent to the cured imprint resist and uncured. The method includes curing the imprint resist of the adjacent shot region in the state of the template being in contact to form the transfer pattern of the main pattern and the transfer pattern of the alignment pattern in the imprint resist.

Abstract: The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate.

Abstract: Using a broadband light source and a photomask, surface energy gradients can be directly transferred into polymer films. The Marangoni effect causes high surface energy regions to rise upon heating the film. This leads to the formation of three-dimensional topography that can be locked in by quenching the polymer by cooling.

Abstract: A method of forming a template for use in imprint lithography. The method comprises providing an ultraviolet (“UV”) wavelength radiation transparent layer and forming a pattern in the UV transparent layer by photolithography. The pattern may be formed by anisotropically etching the UV transparent layer and may have feature dimensions of less than approximately 100 nm, such as dimensions of less than approximately 45 nm. An additional embodiment of the method comprises providing a UV opaque layer comprising a first pattern therein, forming a first UV transparent layer in contact with the first pattern of the UV opaque layer, forming a second UV transparent layer in contact with the first UV transparent layer, and removing the UV opaque layer to form the template. An intermediate template structure for use in imprint lithography is also disclosed. In other embodiments, a template that is opaque to UV wavelength radiation and a method of forming the same are disclosed.