Treatment Of Coated Surface Patents (Class 264/447)
  • Patent number: 11833719
    Abstract: An imprint apparatus that performs an imprint process for bringing a protruding portion of a mold into contact with a composition on a substrate is provided. The apparatus comprises a first illuminator configured to emit light for curing the composition, a second illuminator including a scanner configured to scan beam-like light for curing the composition, and a controller configured to control exposure such that in a state where the composition and the protruding portion are in contact with each other, the light from the first illuminator is emitted to the composition at a position corresponding to a first region of the protruding portion, and control the scanner such that the light from the second illuminator is emitted to the composition at a position corresponding to a second region different from the first region of the protruding portion.
    Type: Grant
    Filed: October 20, 2020
    Date of Patent: December 5, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kenji Yoshida
  • Patent number: 11774851
    Abstract: Embodiments of the present disclosure generally relate to imprint lithography, and more particularly to methods and apparatus for creating a large area imprint without a seam. Methods disclosed herein generally include separating the curing time of the features in a stamp or product from the curing time of the seam and the periphery. The seam and periphery can be cured first or the seam and periphery can be cured last. Additionally, the seam curing operations can be performed on the master, on the stamp, or on the final product.
    Type: Grant
    Filed: March 1, 2021
    Date of Patent: October 3, 2023
    Assignee: Applied Materials, Inc.
    Inventors: Kevin Laughton Cunningham, Manivannan Thothadri
  • Patent number: 11673328
    Abstract: Methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.
    Type: Grant
    Filed: November 2, 2021
    Date of Patent: June 13, 2023
    Assignee: IO TECH GROUP LTD.
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Patent number: 11633878
    Abstract: Systems and methods are provided for making aggregate from comingled waste plastics. For example, there is provided a method of making a preconditioned absorptive resin aggregate, the method including: obtaining a supply of granulated mixed plastic waste treated with a preconditioning agent that comprises at least one of calcium oxide and calcium hydroxide; mixing the supply of granulated mixed plastic waste treated with the calcium oxide preconditioning agent with one or more additives to form a plastic waste mixture, the one or more additives comprising pozzolans; hot extruding the plastic waste mixture to form an extruded product comprising waste plastic material; cooling the extruded product; and processing the extruded product to form an aggregate. Products incorporating such aggregates, such as, for example, lightweight construction blocks, are also provided. Also provided are methods of forming a waste plastics feedstock.
    Type: Grant
    Filed: October 22, 2019
    Date of Patent: April 25, 2023
    Assignee: CRDC Global Limited
    Inventor: Donald William Thomson
  • Patent number: 11629259
    Abstract: An active energy ray curable composition contains an allophanate-bond-containing compound having an activatable group at exposure to active energy rays and a polyester resin having a polymerizable unsaturated bond.
    Type: Grant
    Filed: December 18, 2020
    Date of Patent: April 18, 2023
    Assignee: Ricoh Company, Ltd.
    Inventors: Tatsuki Yamaguchi, Soh Noguchi, Mitsunobu Morita, Takashi Okada
  • Patent number: 11624867
    Abstract: The present disclosure provides a keycap, including: a light-guiding microstructure layer made of a first material, the light-guiding microstructure layer including a base layer and a plurality of microstructures disposed on a lower surface of the base layer; and a light-transmitting layer disposed over the light-guiding microstructure layer and in contact with the base layer, the light-transmitting layer being made of a second material different from the first material. The present disclosure further provides a method of manufacturing the above-mentioned keycap and a key structure including the above-mentioned keycap.
    Type: Grant
    Filed: September 29, 2022
    Date of Patent: April 11, 2023
    Assignee: PRIMAX ELECTRONICS LTD.
    Inventors: Che-An Li, Lei-Lung Tsai
  • Patent number: 11561468
    Abstract: A pattern forming method comprises dispensing a curable composition onto an underlayer of a substrate; bringing the curable composition into contact with a mold; irradiating the curable composition with light to form a cured film; and separating the cured film from the mold. The proportion of the number of carbon atoms relative to the total number of atoms in the underlayer is 80% or more. The dispensing step comprises a first dispensing step of dispensing a curable composition (A1) substantially free of a fluorosurfactant onto the underlayer, and a second dispensing step of dripping a droplet of a curable composition (A2) having a fluorosurfactant concentration in components excluding a solvent of 1.1% by mass or less onto the curable composition (A1) discretely.
    Type: Grant
    Filed: January 30, 2020
    Date of Patent: January 24, 2023
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Tomohiro Saito, Toshiki Ito, Tomonori Otani
  • Patent number: 11520229
    Abstract: An imprint apparatus that performs a supply step of supplying an imprint material onto each of shot regions adjacent to each other on a substrate and, after the supply step, execute an imprint process including a contact step, a curing step, and a mold releasing step for each of the shot regions. The apparatus comprises an irradiator that irradiates the imprint material on the shot region with light in the curing step, and a light-shielding member that defines an irradiation region of the light from the irradiator, wherein the light-shielding member defines the irradiation region such that the imprint material in an end portion of a first shot region on a side of a second shot region adjacent to the first shot region is complementarily cured by light irradiation in the curing step performed on the second shot region.
    Type: Grant
    Filed: December 7, 2020
    Date of Patent: December 6, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Shinichi Shudo
  • Patent number: 11484028
    Abstract: In various embodiments, disclosed herein is a device comprising a non-planar surface, wherein nanostructures are fabricated on the non-planar surface. Also provided herein are methods of making and using a device comprising a non-planar surface, wherein nanostructures are fabricated on the non-planar surface. Further provided herein are methods of using a device comprising one or more non-planar surfaces, wherein the non-planar surfaces comprise one or more microstructures or nanostructures, comprising the steps: (a) using the device for its ordinary purpose; and (b) wherein the microstructures or nanostructures present in the device prevent proliferation of bacteria.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: November 1, 2022
    Assignee: The Regents of The University of California
    Inventors: Albert Yee, Susan Christine Wu, Mary Nora Dickson, Elena Liang
  • Patent number: 11474429
    Abstract: A method of producing a substrate with a fine uneven pattern is a method of producing a substrate having a fine uneven pattern on a surface thereof, the method including a step (a) of preparing a laminate provided with a substrate and a first resin layer provided on the substrate and having a first fine uneven pattern formed on a surface thereof; and a step (b) of forming a second fine uneven pattern corresponding to the first fine uneven pattern on the surface of the substrate by etching the surface of the first fine uneven pattern using the first resin layer as a mask, in which the first resin layer is formed of a resin composition (P) including a fluorine-containing cyclic olefin polymer (A) or a cured product of the resin composition (P).
    Type: Grant
    Filed: June 5, 2018
    Date of Patent: October 18, 2022
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Takashi Oda, Hisanori Ohkita, Yasuhisa Kayaba
  • Patent number: 11454896
    Abstract: An imprint apparatus using a mold having a pattern region includes an irradiation unit that irradiates a substrate with irradiation light. The irradiation light has an intensity distribution over a region along a periphery of a shot area of the substrate and being capable of increasing viscosity of an imprint material or of solidifying the imprint material. The imprint apparatus also includes a control unit that sets an imprint condition for forming a pattern of the imprint material so as to reduce at least one of an extrusion of the imprint material from the shot area and an unfilling of the imprint material occurring in the shot area on the basis of results of detecting at least one of the extrusion and the unfilling of the imprint material obtained by detecting the pattern of the imprint material formed on the substrate.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: September 27, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Hiroyuki Koide
  • Patent number: 11415882
    Abstract: A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein an outer edge of light-shielding member defines four sides having a shape in which a center of each side bulges outward with respect to a rectangle surrounding the outer edge of the pattern surface in the plan view, and wherein the shape of each side bulges outwardly in a stepwise manner from the ends of each side to the center of each side.
    Type: Grant
    Filed: December 2, 2020
    Date of Patent: August 16, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshio Suzaki, Tomomi Funayoshi, Toshihiko Nishida
  • Patent number: 11353789
    Abstract: An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: June 7, 2022
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Takaharu Nagai, Yuichi Inazuki, Katsutoshi Suzuki, Ryugo Hikichi, Koji Ichimura, Saburou Harada
  • Patent number: 11059204
    Abstract: According to the present disclosure, a plurality of aluminum oxide nanoparticles and a polymerizable monomer are dissolved in a polyimide solution to obtain a polyimide mixed solution. Next, the polyimide mixed solution is coated onto a glass substrate. Then, the surface of the glass substrate is irradiated with UV light to form a network polymer on the surface of the glass substrate, the network polymer enclosing the aluminum oxide nanoparticles. Finally, the glass substrate is heated to form the flexible material having the surface protecting layer. Abrasion resistance of the flexible material manufactured according to the present disclosure is excellent.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: July 13, 2021
    Assignee: Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd.
    Inventor: Song Lan
  • Patent number: 10998190
    Abstract: The present invention provides an imprint apparatus that performs an imprint process of forming a pattern of an imprint material on a processing target region on a substrate by using a mold, including a digital mirror device including two-dimensionally arrayed mirror elements and configured to irradiate the substrate with light reflected by the mirror elements, a measurement unit configured to measure, for each of a plurality of segments obtained by dividing a region in which the mirror elements are arrayed so as to include a plurality of the mirror elements, a light amount of light emitted from each segment, and a control unit configured to control the mirror elements included in each segment based on a measurement result of the measurement unit.
    Type: Grant
    Filed: April 4, 2018
    Date of Patent: May 4, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Kenji Yoshida
  • Patent number: 10800868
    Abstract: An antifouling film includes: a substrate; and a polymer layer disposed on a surface of the substrate and including on a surface thereof an uneven structure provided with projections at a pitch not longer than a wavelength of visible light. The polymer layer is a cured product of a polymerizable composition. The polymerizable composition contains, in terms of active components, 75 to 95 wt % of a polymerizable monomer, 2.5 to 12.5 wt % of a urethane acrylate containing fluorine and an ester, and 2.5 to 9 wt % of a perfluoroalkyl-based monomer containing one (meth)acryloyl group for each molecule. The polymerizable monomer contains a bifunctional acrylate that contains an ethylene oxide group and a multifunctional acrylate that contains no ethylene oxide group. The perfluoroalkyl-based monomer has a fluorine atom concentration of 50 to 60 wt %. The polymerizable composition has an ethylene oxide group concentration of 20 to 50 wt %.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: October 13, 2020
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Yasuhiro Shibai, Tokio Taguchi, Kenichiro Nakamatsu
  • Patent number: 10747107
    Abstract: An imprint lithography method of configuring an optical layer includes imprinting first features of a first order of magnitude in size on a side of a substrate with a patterning template, while imprinting second features of a second order of magnitude in size on the side of the substrate with the patterning template, the second features being sized and arranged to define a gap between the substrate and an adjacent surface.
    Type: Grant
    Filed: September 14, 2017
    Date of Patent: August 18, 2020
    Assignee: Molecular Imprints, Inc.
    Inventors: Vikramjit Singh, Michael Nevin Miller, Frank Y. Xu
  • Patent number: 10649119
    Abstract: Techniques for fabricating slanted surface-relief structures are disclosed. In some embodiments, a method for of fabricating a target slanted surface-relief structure, such as a nanoimprint lithography (NIL) mold or a slanted surface-relief grating, includes manufacturing a preliminary surface-relief structure that includes a plurality of ridges and modifying a parameter of the preliminary surface-relief structure to make the target slanted surface-relief structure. The parameter includes a width of each of the plurality of ridges, a height of each of the plurality of ridges, a surface energy of the preliminary surface-relief structure, or a slant angle of an edge of the plurality of ridges. Modifying the parameter includes depositing a material layer on the preliminary surface-relief structure and etching or surface-treating the material layer.
    Type: Grant
    Filed: July 16, 2018
    Date of Patent: May 12, 2020
    Assignee: Facebook Technologies, LLC
    Inventors: Nihar Ranjan Mohanty, Matthieu Charles Raoul Leibovici
  • Patent number: 10435590
    Abstract: The present disclosure relates to segmented transfer tapes useful in the transfer of only a portion of the segments of the transfer tapes and methods of making thereof. The segmented transfer tapes include a removable template layer having a structured surface; a transfer layer comprising a backfill layer, wherein the backfill layer has a structured first major surface, and an adhesive layer; at least one transferable segment formed in the transfer layer; at least one non-transferable segment formed in the transfer layer, the at least one non-transferable segment includes an adhesive surface, wherein a passivating layer is disposed on at least a portion of the adhesive surface of the at least one non-transferrable segment; and at least one kerf extending from the first major surface of the adhesive layer and into at least a portion of the removable template layer. The present disclosure also provides micro-optical assemblies and methods of making micro-optical assemblies from the segmented transfer tapes.
    Type: Grant
    Filed: June 13, 2016
    Date of Patent: October 8, 2019
    Assignee: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: Martin B. Wolk, Thomas J. Metzler, Samuel J. Carpenter, Denis Terzic, Mitchell T. Nommensen, Suman K. Patel, Mikhail L. Pekurovsky, Donald G. Peterson
  • Patent number: 10429732
    Abstract: An imprint method using a mold and/or a transfer substrate having a mesa structure includes a resin supply step, a contact step, a curing step, and a mold release step. In the resin supply step, a balance layer is formed by supplying a molded resin also to an area outside of a pattern formation area of the transfer substrate in which a pattern structure is to be formed.
    Type: Grant
    Filed: March 11, 2015
    Date of Patent: October 1, 2019
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Takaharu Nagai, Yuichi Inazuki, Katsutoshi Suzuki, Ryugo Hikichi, Koji Ichimura, Saburou Harada
  • Patent number: 10377873
    Abstract: Provided are an expanded acrylic resin beads molded article that produces little soot during burning, and has good castabilities and high strength, and an expandable acrylic resin bead and an expanded acrylic resin bead for producing the expanded acrylic resin beads molded article. The expandable acrylic resin bead includes a physical blowing agent and a copolymer. The copolymer is composed of a methyl methacrylate component, an acrylic acid ester component, and a styrene component in a predetermined proportion. The copolymer constitutes a base resin of the expandable acrylic resin beads. The water content of the expandable acrylic resin bead is a 0.5 mass % or less. The expanded acrylic resin bead includes the copolymer and has a bulk density and cell diameters within predetermined ranges, and the expanded acrylic resin beads molded article is produced by in-mold molding of plural expanded beads.
    Type: Grant
    Filed: March 1, 2016
    Date of Patent: August 13, 2019
    Assignee: JSP CORPORATION
    Inventors: Yohta Kuwada, Mitsushi Murata
  • Patent number: 10373863
    Abstract: Provided are a method of manufacturing a porous body capable of easily manufacturing a porous body, a porous body, a method of manufacturing a device, a device, a method of manufacturing a wiring structure, and a wiring structure. A photocurable composition including a condensing gas and a polymerizable compound is applied to a substrate or a mold, the photocurable composition is sandwiched between the substrate and the mold and then the photocurable composition is irradiated with light to cure the photocurable composition, and the mold is released from a surface of the cured photocurable composition.
    Type: Grant
    Filed: March 24, 2017
    Date of Patent: August 6, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Yuichiro Goto, Tadashi Oomatsu
  • Patent number: 10345594
    Abstract: Wearable augmented reality display systems are provided. One or a plurality of emissive display elements are embedded in the bridge area of an eyeglass frame. The lenses are provided with a set of transmissive diffractive optical elements and partially reflective diffractive optical elements. The display outputs are directed toward the lens elements whereby the diffractive elements in turn direct the outputs toward the eye-boxes of the viewer.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: July 9, 2019
    Assignee: Ostendo Technologies, Inc.
    Inventors: Jingbo Cai, Hussein S. El-Ghoroury, Reginald Jonker, Marty Maiers, Chih-Li Chuang
  • Patent number: 10340251
    Abstract: In making electronic component packages, a method includes forming a sacrificial material over a first temporary substrate, applying a second temporary substrate to the sacrificial material, and then curing the sacrificial material. After curing, the second temporary substrate is removed. The top surface of the sacrificial layer is defined by the second temporary substrate. After removal, a redistribution structure is formed on the top surface. After the formation of the redistribution structure, electronic components are applied to the redistribution structure. The electronic components are encapsulated to form an encapsulated panel. The first temporary substrate and the sacrificial material are removed. The panel is singulated into multiple electronic component packages.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: July 2, 2019
    Assignee: NXP USA, Inc.
    Inventors: Alan J. Magnus, Jeffrey Lynn Weibrecht, Jason R. Wright, Colby Greg Rampley
  • Patent number: 10189928
    Abstract: Provided are a curable composition having excellent releasability and ink jet discharge accuracy, a pattern forming method, a pattern, and a method for manufacturing a device. The curable composition includes a polymerizable compound and a photopolymerization initiator, in which neopentyl glycol diacrylate accounts for 10% by mass or more of the polymerizable compound, and the total content of a compound represented by the following Formula (I) and a compound represented by the following Formula (II) is 5% by mass or less with respect to the content of neopentyl glycol diacrylate.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: January 29, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Hirotaka Kitagawa, Yuichiro Goto
  • Patent number: 10105722
    Abstract: A photoresist coating apparatus is provided. The photoresist coating apparatus includes a base; and a position platform moving back and forth along a scanning direction on the base. The photoresist coating apparatus also includes an imprinter having a trench configured to hold photoresist and fixed on the position platform; and a photoresist spray nozzle disposed above the imprinter and configured to spray the photoresist into the trench. Further, the photoresist coating apparatus includes a reticle frame configured to install a cylindrical reticle and enable the cylindrical reticle to rotate around a center axis and contact with the imprinter so as to coat the photoresist in the trench on a surface of the cylindrical reticle.
    Type: Grant
    Filed: May 27, 2014
    Date of Patent: October 23, 2018
    Assignee: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION
    Inventors: Yang Liu, Qiang Wu, Huayong Hu
  • Patent number: 10040945
    Abstract: An active energy ray curable resin composition comprising: urethane poly(meth)acrylate (A) synthesized from a raw material including a polyisocyanate and a hydroxy group-containing (meth)acrylate; (meth)acrylate (B) having five or more functional groups; a photopolymerization initiator (C1) having an absorption coefficient per unit weight of 50000 ml/g·cm or more when measured in methanol at 254 nm; a photopolymerization initiator (C2) other than the (C1) having an absorption coefficient per unit weight of 50000 ml/g·cm or more when measured in methanol at 302 nm; a photopolymerization initiator (C3) other than the (C1) and the (C2) having an absorption coefficient per unit weight of 100 ml/g·cm or more when measured in methanol at 405 nm; and an ultraviolet absorbing agent (D).
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: August 7, 2018
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Yoichi Hamano, Hiroyuki Sato
  • Patent number: 9993950
    Abstract: An imprint template includes a first region and a second region located in the periphery of the first region. The first region is provided with a first imprint structure configured to imprint a first film layer pattern into a base material in a product region of a target substrate. The second region is provided with a second imprint structure configured to imprint a second film layer pattern into the base material in the periphery of the product region of the target substrate. And the second film layer pattern is used for assessing imprint quality of the first film layer pattern.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: June 12, 2018
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Feng Guan, Jikai Yao, Yingtao Wang, Xiaolong He, Tingting Zhou
  • Patent number: 9986980
    Abstract: The present invention relates to a biological sample preservation tube with an identification code, wherein an information element which records the sample information is fused integrally with the bottom wall and/or side walls during molding the preservation tube, the preservation tube is suitable for the preservation of a biological sample at low temperature and can ensure the effectiveness and stability at low temperature; and at the same time also relates to a method for manufacturing the biological sample preservation tube, wherein the preservation tube is molded by a one-step process, without an additional secondary processes for manufacturing the identification code, the method improves the production efficiency, reduces the production cost, employs multi-point symmetrical feeding, and has good quality and stability of the product, so that the method is of great significance as it opens up a new idea for developing and producing the similar product in the industry, especially the small-sized preservatio
    Type: Grant
    Filed: April 18, 2016
    Date of Patent: June 5, 2018
    Assignee: HANGZHOU BIOBANK BIOTECH INC.
    Inventor: Yang Zhang
  • Patent number: 9970411
    Abstract: A UV-IR combination curing system and method for manufacture and repair of composite parts, such as for use in wind blade manufacture and repair. The system and method utilize UV and IR dual radiation sources to cure glass fiber reinforced laminates containing a photo initiator. The UV and IR dual radiation sources can be configured as discrete stand-alone UV and IR lamps used in a side by side configuration, a plurality of UV lamps with thermal IR radiation, a combined UV/IR lamp, or other forms of light sources providing both UV and IR radiation. To achieve high glass transition and complete curing of thick laminates, the IR radiation source is initially turned on to heat the laminate to close to 40° C.-100° C. before the UV radiation source is turned on. The IR radiation source can be turned off after UV radiation source is activated.
    Type: Grant
    Filed: February 19, 2013
    Date of Patent: May 15, 2018
    Assignee: GENERAL ELECTRIC COMPANY
    Inventors: Xiaomei Fang, Thomas Miebach, David Simon, Jordan Philip Seeger
  • Patent number: 9855703
    Abstract: A method of forming a pattern by using an imprint process includes: forming an adhesion promoting layer only in a pattern formation region on a substrate; coating a resin to cover the substrate and the adhesion promoting layer; transferring a pattern of a stamp mold to the resin covering the substrate and the adhesion promoting layer, by pressing the stamp mold onto the resin; irradiating ultraviolet light onto the resin covering the substrate and the adhesion promoting layer, to cure the resin and form a pattern of the cured resin to correspond to the pattern of the stamp mold, on the substrate; and detaching the stamp mold from the substrate, to leave a portion of the cured resin pattern only on the adhesion promoting layer on the substrate and to remove a remaining portion of the cured resin pattern from the substrate.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: January 2, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Sunghoon Lee, Dongouk Kim, Joonyong Park, Jihyun Bae, Bongsu Shin, Jaeseung Chung, Sukgyu Hahm, Jong G. Ok, Ilsun Yoon
  • Patent number: 9744732
    Abstract: A high-quality electrophotographic endless belt and a method capable of efficiently producing the belt are provided. A method for producing an electrophotographic endless belt comprising a base layer including a thermoplastic resin composition and an inner-surface layer, which includes: (1) forming an energy curable film having a glass transition temperature on an inner surface of a test tube-shaped preform including a thermoplastic resin and then subjecting the preform to blow molding to obtain a blow-molded bottle; (2) irradiating the blow-molded bottle with energy rays to cure the film to form an inner-surface layer; and (3) cutting out an endless belt from the blow-molded bottle having the inner-surface layer obtained in (2).
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: August 29, 2017
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Kouichi Uchida
  • Patent number: 9469763
    Abstract: The present invention relates to a photo-curable organic-inorganic hybrid composition, more particularly to a photo-curable organic-inorganic hybrid resin composition having superior physical properties such as UV resistance, chemical resistance, light transmittance, adhesive property, insulating property, heat resistance, flatness and water resistance and in particular, having excellent heat resistance and adhesive property enabling the composition to endure a thermal deformation caused by a processing temperature change during post-process after a film is cured. Thus, the composition of the invention is suitable for use as an insulating material and an encapsulating material for a protective film of optical devices including display devices and semiconductors.
    Type: Grant
    Filed: January 23, 2014
    Date of Patent: October 18, 2016
    Assignee: DONGJIN SEMICHEM CO., LTD.
    Inventors: Jae-Won Yoo, Dong-Jin Nam, Doo-shick Kim, Kyung-Min Park
  • Patent number: 9303173
    Abstract: An active energy ray-curable ink which contains: polymerizable compounds containing a monofunctional polymerizable monomer a homopolymer of which has Tg of 90° C. or higher, wherein a cured product obtained by forming a coating film having an average thickness of 10 ?m on a polycarbonate substrate using the ink, and 15 seconds later, and applying active energy rays having a light quantity of 1,500 mJ/cm2 to the coating film to cure satisfies the following (1) and (2): (1) a stretchability of the cured product represented by the following equation is 2 or greater, when the cured product is stretched by a tensile tester at a tensile speed of 20 mm/min, and temperature of 180° C., and Stretchability=(length after tensile test)/(length before tensile test) (2) adhesion between the substrate and the cured product as measured by a cross-cut test in accordance with JIS K5400 is 70 or greater.
    Type: Grant
    Filed: May 5, 2015
    Date of Patent: April 5, 2016
    Assignee: Ricoh Company, Ltd.
    Inventors: Mie Yoshino, Takao Hiraoka, Shizuka Kohzuki
  • Patent number: 9260300
    Abstract: According one embodiment, a pattern formation method forming a resist layer on a pattern formation surface by pressing a template provided with a concave-convex from above the resist layer to form a resist pattern on the pattern formation surface, includes: forming a resist layer in a first region having an area smaller than an area of the pattern formation surface and in a second region other than the first region of the pattern formation surface; pressing a template against the resist layer; irradiating the resist layer with light via the template to form a first resist layer in the first region, curing of the first resist layer being suppressed, and form the resist pattern including a second resist layer, curing of the second resist layer proceeds in the second region; and removing the first resist layer from the first region, the curing of the first resist layer being suppressed.
    Type: Grant
    Filed: July 30, 2013
    Date of Patent: February 16, 2016
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Matsunaga, Nobuhiro Komine, Eiji Yoneda
  • Patent number: 9149965
    Abstract: A method for detecting an insert object in an injection-molded part pertains to an insert object that is fixedly connected to the injection-molded part during the injection molding by the insert object being placed in a cavity, which is surrounded by a mold wall of a mold, before the beginning of the injection-molding cycle. The mold wall includes at least one temperature or pressure sensor, which records and analyzes at least one measured value at at least one point in time during an injection-molding cycle. On the basis of the analysis, it is established whether an insert object was present at a specific location in the cavity during the injection-molding cycle. Finally, after it is ejected, the injection-molded part is sorted as an accepted part or a rejected part on the basis of the analysis of the measured value.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: October 6, 2015
    Assignee: KISTLER HOLDING AG
    Inventor: Erik Nielsen
  • Patent number: 9056371
    Abstract: A method for recontouring a blade of a gas turbine includes systematically melting a portion of a leading edge of the blade using an energy beam so as to form a new contour of hardened material substantially without incorporating additional material.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: June 16, 2015
    Assignee: LUFTHANSA TECHNIK AG
    Inventor: Stefan Czerner
  • Publication number: 20150129138
    Abstract: Transfer of nanoscale elements from a substrate on which they were manufactured or transferred to a flexible sheet may be performed by local and progressive deformation of the flexible sheet over the surface of the substrate to attach and lift the nanoscale elements from the substrate with controlled inter-element registration.
    Type: Application
    Filed: June 22, 2012
    Publication date: May 14, 2015
    Inventors: Kevin Thomas Turner, David Scott Grierson
  • Patent number: 9017591
    Abstract: A method capable of efficiently manufacturing a high-quality seamless belt for electrophotography is provided. The method is a method for manufacturing a seamless belt for electrophotography including a base layer having a thermoplastic resin composition, and a surface layer, wherein the method includes: (1) forming an energy curable coated film having a glass transition temperature on an outer surface of a test tube-shaped preform including a thermoplastic resin; then blow molding the preform to obtain a blow bottle; (2) irradiating the blow bottle with an energy ray to cure the coated film to thereby form the surface layer; and (3) cutting out a seamless belt from the blow bottle obtained in (2) and having a surface layer.
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: April 28, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kouichi Uchida
  • Publication number: 20150111005
    Abstract: A first mask layer (13) and a second mask layer (12) are transferred and imparted to a target object (20) using a fine-pattern-forming film (I) provided with a cover film (10) having a nanoscale concavo-convex structure (11) formed on one surface thereof, a second mask layer (12) provided in a recess of the concavo-convex structure (11), and a first mask layer (13) provided so as to cover the concavo-convex structure (11) and the second mask layer (12). A surface of a fine-pattern-forming film (II) to which the first mask layer (13) is provided is pressed toward a surface of the target object (20), energy rays are irradiated to the first mask layer (13), and the cover film (10) is then separated from the second mask layer (12) and the first mask layer (13). Pressing and energy ray irradiation are each performed independently. The target object is etched using the second mask layer (12) and the first mask layer (13).
    Type: Application
    Filed: April 30, 2013
    Publication date: April 23, 2015
    Applicant: ASAHI KASEI E-MATERIALS CORPORATION
    Inventors: Naoki Hosomi, Jun Koike, Fujito Yamaguchi
  • Publication number: 20150091217
    Abstract: A molding process that comprises, in order, a preparation step of preparing a sheet having a textured pattern due to projections formed by curing an ink composition above one face of a substrate, a placement step of placing the face of the sheet having the textured pattern so that it faces a mold, and a molding step of carrying out molding with the sheet and the mold in contact with each other.
    Type: Application
    Filed: September 29, 2014
    Publication date: April 2, 2015
    Applicant: FUJIFILM CORPORATION
    Inventor: Kenjiro ARAKI
  • Publication number: 20150086755
    Abstract: To provide a photocured product having small mold releasing force. A photocured product obtained by curing with light and containing a surface active agent, wherein a peak area of the ether bond derived peak is 3.0 times or more as large as a peak area of the ester bond derived peak, wherein the peak areas are obtained by peak separation processing by curve fitting of an X-ray photoelectron spectroscopy spectrum obtained as an analytical result on a chemical state of carbon at topmost surface of the photocured product, the analytical result being among analytical results on the topmost surface of the photocured product obtained by surface analysis of the photocured product with angle resolved X-ray photoelectron spectroscopy.
    Type: Application
    Filed: May 21, 2013
    Publication date: March 26, 2015
    Inventors: Chieko Mihara, Toshiki Ito, Yohei Murayama, Motoki Okinaka
  • Publication number: 20150075855
    Abstract: Provided is a method for manufacturing a photo cured material, by which transferring precision can be improved and a small surface roughness can be obtained. The method includes the steps of: placing a photo-curable composition on a substrate; brining a mold into contact with the photo-curable composition; irradiating the photo-curable composition with light; and releasing the mold from the photo-curable composition. The contact is performed in a condensable gas atmosphere, the condensable gas condensing under a temperature condition at the contact and under a pressure condition that the condensable gas receives when the photo-curable composition intrudes gaps between the substrate and the mold or concavities provided on the mold, and the photo-curable composition includes a gas dissolution inhibitor having a rate of weight change with reference to the condensable gas that is ?1.0% to 3.0%.
    Type: Application
    Filed: April 23, 2013
    Publication date: March 19, 2015
    Inventors: Toshiki Ito, Akiko Iimura
  • Publication number: 20150076106
    Abstract: A method comprising: providing a transparent electrically conductive film comprising: a transparent substrate (14); a composite layer (18) comprising: an electrically conductive layer disposed on at least a portion of a major surface of the transparent substrate (14) and comprising a plurality of interconnecting metallic nanowires (12); and a polymeric overcoat layer disposed on a portion of the electrically conductive layer, to provide a coated area of the electrically conductive layer; and patternwise exposing the coated area of the electrically conductive layer to a corona discharge to provide a patternwise exposed electrically conductive film comprising (1) an un exposed region (122) of the coated region having a first electrical resistivity, and (2) an exposed region (121) having a second electrical resistivity; wherein the exposed region is less electrically conductive than the unexposed region, and wherein there is a ratio of the second electrical resistivity over the first electrical resistivity of at
    Type: Application
    Filed: May 2, 2013
    Publication date: March 19, 2015
    Inventors: Mark J. Pellerite, Seth M. Kirk, Hyacinth L. Lechuga
  • Publication number: 20150048557
    Abstract: An apparatus for thermally processing a relief image printing element and a method of using the same are described. The printing element comprises at least one photopolymer layer and is selectively exposed to actinic radiation to crosslink portions of the at least one photopolymer layer. The apparatus comprises: (a) means for supporting the printing element; (b) heating means for melting or softening non-crosslinked portions of the at least one photopolymer layer; (c) at least one rotatable roll that is capable of bringing a blotting material into contact with the at least one photopolymer layer to remove the melted or softened non-crosslinked portions of the at least one photopolymer layer; and (d) an element arranged adjacent to the at least one rotatable roll for removing non-crosslinked photopolymer remaining on a surface of the at least one rotatable roll after step c). The apparatus may alternatively be operated without a blotting material.
    Type: Application
    Filed: August 13, 2013
    Publication date: February 19, 2015
    Applicant: MacDermid Printing Solutions, LLC
    Inventor: Timothy Gotsick
  • Publication number: 20150051123
    Abstract: There is provided a resin composition for a machinable liner of a sliding member. An ultraviolet curable resin composition for a self-lubricating liner contains a (meth)acrylate compound having an isocyanuric acid ring represented by the following formula and PTFE as a solid lubricant. In the formula (1), X is a group which contains an acryloyl group and is composed only of C, H, and O. Y and Z are groups each composed only of C, H, and O. PTFE is contained in an amount of 10 to 50% by weight with respect to a total amount of the ultraviolet curable resin composition. The ultraviolet curable resin composition is suitable for a self-lubricating liner 24 of a spherical bearing 20 having an outer race 22 and an inner race 26.
    Type: Application
    Filed: October 24, 2014
    Publication date: February 19, 2015
    Inventors: Tadahiko KARAKI, Kunihiro MATSUMOTO, Koichiro SAGIYAMA
  • Patent number: 8956690
    Abstract: A laminated body which forms a resin mold by compression molding using a master mold, the laminated body having: a pair of mutually facing base materials, a layer of a liquid or gel-like curable resin material sandwiched between the pair of base materials, and one or more flow suppression bodies, which are composed of a cured product of the curable resin material and are sandwiched between the pair of base materials, wherein the layer of the curable resin material is sealed by the pair of base materials and the flow suppression bodies. Also, a method for manufacturing a resin mold using the laminated body.
    Type: Grant
    Filed: May 22, 2009
    Date of Patent: February 17, 2015
    Assignee: Showa Denko K.K.
    Inventors: Hiroshi Uchida, Tomokazu Umezawa, Masato Fukushima, Shunsuke Takeyama, Takanori Sakuragi
  • Publication number: 20150044417
    Abstract: A resist layered product (30) is provided with an inorganic substrate (21), first resist layer (22) provided on one main surface of the inorganic substrate (21), and second resist layer (23), provided on the first resist layer (22), provided with a concavo-convex structure (23a) on its surface. In the concavo-convex structure (23a), a thickness of a residual film after transfer is 50 nm or less, the ratio (lcv/lcc) of a top width of convex-portion (lcv) to an opening width of concave-portion (lcc) of a fine pattern of a mold is in a predetermined range, and the ratio (Vr2/Vcm) between a concave-portion volume (Vcm) of the fine pattern of the mold and a volume (Vr2) of the second resist layer (23) is in a predetermined range. It is possible to easily form a resist mask (25) having a thin and uniform residual film on the inorganic substrate (21).
    Type: Application
    Filed: March 11, 2013
    Publication date: February 12, 2015
    Applicant: ASAHI KASEI E-MATERIALS CORPORATION
    Inventor: Jun Koike
  • Publication number: 20150042013
    Abstract: An imprinting device having a stage and a cover that depress the die and the molding target, a frame formed with a hole into which the stage is fitted and surrounding an outer circumference thereof, a first moving means for relatively moving the stage and the cover in a direction coming close to or becoming apart from each other, a second moving means for relatively moving the cover and the frame in a direction coming close to or becoming apart from each other, a first depressurizing means for depressurizing a depressurizing room formed any one of the cover, the die or the molding target, and the stage, and further the frame, and eliminating a fluid between the die and the molding target, and a second depressurizing means for eliminating a fluid in a space between the cover and the die or the molding target. The imprinting device can be thus downsized and costs can be reduced.
    Type: Application
    Filed: February 13, 2013
    Publication date: February 12, 2015
    Inventors: Hirosuke Kawaguchi, Satoru Tanaka
  • Patent number: 8946093
    Abstract: In an imprint method of an embodiment, in the imprinting of an imprint shot including an outermost peripheral region of a substrate where resist is not desired to be entered at the time of imprinting, light curing the resist is applied to a light irradiation region with a predetermined width including a boundary between the outermost peripheral region and a pattern formation region more inside than the outermost peripheral region, whereby the resist which is to enter inside the outermost peripheral region is cured. Then, light curing the resist filled in a template pattern is applied onto a template.
    Type: Grant
    Filed: March 15, 2012
    Date of Patent: February 3, 2015
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Shinji Mikami