Treatment Of Coated Surface Patents (Class 264/447)
  • Publication number: 20120080826
    Abstract: A resin composition for nanoimprint includes a cationically polymerizable compound that has crystalline characteristics and is solid at ordinary temperature, and a photo cationic polymerization initiator.
    Type: Application
    Filed: May 13, 2010
    Publication date: April 5, 2012
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Yoshikazu Saito
  • Publication number: 20120061881
    Abstract: Disclosed is a method of fabricating a flexible device, which includes surface-treating one or both sides of a carrier plate so that regions with different surface-treatments are formed on the same side of the carrier plate, forming a glass-filler reinforced plastic substrate film on the surface-treated carrier plate, forming thin film patterns on the glass-filler reinforced plastic substrate film, and separating the glass-filler reinforced plastic substrate film having the thin film patterns formed thereon from the carrier plate, and in which the surface-treating of the carrier plate enables the glass-filler reinforced plastic substrate film to be easily separated from the carrier plate without an additional process such as using a solvent or a laser release technique.
    Type: Application
    Filed: June 14, 2011
    Publication date: March 15, 2012
    Applicant: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Byeong-Soo Bae, JungHo Jin
  • Publication number: 20120043702
    Abstract: A processing method for in-mold coating integrative system is used in cooperation with an injection molding machine. The injection molding machine comprises a rotatable work platform and a combination of at least one male mold and at least two female molds. The rotatable work platform is divided averagely into several work areas, and the processing proceeds sequentially in each work area by the rotation of the rotatable work platform.
    Type: Application
    Filed: March 26, 2010
    Publication date: February 23, 2012
    Inventor: Yu-Syuan Jin
  • Publication number: 20120013045
    Abstract: A matte laminate film comprising a transparent resin film substrate and a matte layer formed on at least one surface of the transparent resin film substrate, in which the transparent resin film substrate is a laminate film comprising a layer (A) formed of a polycarbonate resin and a layer (B) formed of a methacrylic resin which is laminated on at least one surface of the layer (A). The matte laminate film is preferably used as a decorative film having good resistance to whitening and high mechanical properties and surface hardness.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 19, 2012
    Inventors: Norio SUGIMURA, Koji Koyama, Shinsuke Ochiai
  • Publication number: 20110308720
    Abstract: A method for forming a structure includes: a step of forming on a substrate a resin layer composed of a resin which is cured by irradiation with active energy rays; a step of pressing a first mold on the resin layer, the first mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; a first irradiation step of irradiating the resin layer; a step of pressing a second mold on the resin layer within a region where the resin layer is not exposed to the rays, the second mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; and a second irradiation step of irradiating a portion of the unexposed region of the resin layer.
    Type: Application
    Filed: December 16, 2009
    Publication date: December 22, 2011
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Hirono Yoneyama
  • Publication number: 20110298159
    Abstract: Disclosed is an imprinting apparatus and imprinting method using the same that prevent a process of forming a pattern on a substrate from being affected by flatness of a stage. The imprinting apparatus comprises a chamber unit in which a process of forming a pattern on a substrate is carried out; a stage for supporting the substrate on which a resin layer is formed; an installing member positioned above the stage and having a mold member attached to transform the resin layer so as to form the pattern on the substrate; and a first spraying unit for spraying fluid to separate the substrate supported by the stage from the stage, wherein the installing member moves the mold member in the direction getting near to the substrate separated from the stage so that the mold member and the resin layer are brought into contact with each other.
    Type: Application
    Filed: May 13, 2011
    Publication date: December 8, 2011
    Inventors: Doo Hee JANG, Tae Joon Song, Dhang Kwon, Hang Sup Cho, Seong Pil Cho, Ho Su Kim, Jin Hee Jang
  • Publication number: 20110301313
    Abstract: Provided is an imprint product, which is for transcribing a fine pattern of a mold surface and which contains a fluorine-containing cyclic olefin polymer containing repeating unit represented by formula (1) and having a fluorine atom content rate of 40% to 75% by mass.
    Type: Application
    Filed: February 25, 2010
    Publication date: December 8, 2011
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Tadahiro Sunaga, Takashi Oda, Hitoshi Onishi
  • Publication number: 20110291330
    Abstract: A lamination or replication method for making an article having a structured solid layer, including: dispensing a curable liquid onto a first member; contacting the curable liquid on the first member with a complimentary second member having a curvature aspect, to form an assembly having the curable liquid disposed between the first and second members; and curing the curable liquid to form the article, the structure being imparted by at least one of the first and second members. A display system that incorporates the article, as defined herein, is also disclosed.
    Type: Application
    Filed: March 30, 2011
    Publication date: December 1, 2011
    Inventors: Mircea Despa, Jennifer Lynn Lyon, Paul John Shustack, Kevin Andrew Vasilakos
  • Patent number: 8040785
    Abstract: An optical disc includes a reflective film formed on concave and convex marks after the concave and convex marks are synchronized with the integral multiple of a channel bit length and formed in accordance with modulated main information. Thereafter, continuous or intermittent laser light synchronized with the integral multiple of the channel bit length is irradiated at intervals longer than the longest one of the concave and convex marks in accordance with a spiral track formed in a circumferential direction of the concave and convex marks, whereby an optical characteristic of the reflective film is changed to form a recordable mark and sub-information necessary to reproduce the main information is recorded in a superimposition manner.
    Type: Grant
    Filed: May 28, 2007
    Date of Patent: October 18, 2011
    Assignee: Panasonic Corporation
    Inventors: Masaru Yamaoka, Mamoru Shoji, Keiji Nishikiori, Makoto Usui, Mitsuro Moriya
  • Patent number: 8039061
    Abstract: In a method for producing a hose with a sealing layer, a hose body having a resin innermost layer is prepared, a rod-like core member is disposed through a center portion of a hollow interior of a connecting portion of the hose body so as to occupy the center portion, and the plasma gas is fed and distributed in an interior of an innermost layer of the connecting portion to modify an inner surface of the innermost layer. Then, the sealing layer is formed on the inner surface by coating an elastic material for the sealing layer on the inner surface of the connecting portion.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: October 18, 2011
    Assignee: Tokai Rubber Industries, Inc.
    Inventor: Yorihiro Takimoto
  • Publication number: 20110241261
    Abstract: A method for formation of a polymer film in-situ according to the invention comprises steps of: providing a polymerizable composition in one or multiple parts; prior to completion of polymerization of the polymerizable composition, forming a film therefrom; and initiating polymerization of the polymerizable composition using a radiation source to form the polymer film.
    Type: Application
    Filed: March 18, 2011
    Publication date: October 6, 2011
    Applicant: entrotech, inc.
    Inventors: James E. McGuire, JR., Michael Lee Owens, Andrew C. Strange
  • Patent number: 8025830
    Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.
    Type: Grant
    Filed: November 27, 2009
    Date of Patent: September 27, 2011
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Jun-Ho Jeong, HyonKee Sohn, Young-Suk Sim, Young-Jae Shin, Eung-Sug Lee, Kyung-Hyun Whang
  • Publication number: 20110210480
    Abstract: Embodiments of the invention relate to methods of anti-counterfeiting for nanostructures and nanostructured devices. Specifically we describe a method of embedding a coded micro- or nanopatterns in nanostructures fabricated using Near-field rolling mask lithography, where areas of such features can be embedded into a transparent cylindrical or conic frame, or fabricated on the surface of flexible film laminated on the surface of the frame. Alternatively, specific coded nanofeatures distribution can be created using modulation of intensity or wavelength of the light source along the width or length of such cylinder or cone, or modulation of flexible film thickness or contact pressure between the rotatable mask and a substrate.
    Type: Application
    Filed: April 14, 2011
    Publication date: September 1, 2011
    Applicant: ROLITH, INC
    Inventor: Boris Kobrin
  • Publication number: 20110187028
    Abstract: The present disclosure relates to flexible, three-dimensional injection blow molded or injection stretch blow molded liners for use in overpacks, bottles, containers, etc. and methods for manufacturing the same. A method for manufacturing a liner may include injecting a polymeric material into a preform mold die to form a preform, blow molding the preform to form the liner, collapsing the liner and positioning the liner in an overpack, and inflating the liner. A fluoropolymer may be used for the preform. A liner may comprise a flexible body that substantially conforms to the interior of an overpack and a fitment port integral with the flexible body. The flexible body may be adapted to be removably inserted into the overpack by collapsing the flexible body, inserting the flexible body into the overpack, and re-inflating the flexible body inside the overpack. The flexible body may comprise a fluoropolymer and may comprise multiple layers.
    Type: Application
    Filed: December 2, 2008
    Publication date: August 4, 2011
    Inventors: Joseph Menning, Kirk Mikkelsen
  • Patent number: 7989144
    Abstract: The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: August 2, 2011
    Assignee: AZ Electronic Materials USA Corp
    Inventors: M. Dalil Rahman, David Abdallah, Rhuzi Zhang, Douglas McKenzie
  • Publication number: 20110171365
    Abstract: A method for modifying a transparent electrode film contained in a transparent electrode film-attached substrate having a substrate and the transparent electrode film formed on the substrate includes annealing the transparent electrode film by applying flash light having an optical pulse duration time of 0.1 msec to 10 msec to the transparent electrode film using a flash lamp, thereby heating the transparent electrode film.
    Type: Application
    Filed: September 11, 2009
    Publication date: July 14, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Toshiya Kuroda
  • Publication number: 20110169027
    Abstract: Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern.
    Type: Application
    Filed: February 2, 2010
    Publication date: July 14, 2011
    Applicant: Korea Institute of Machinery & Materials
    Inventors: Hyeong-Ho Park, Jun-Ho Jeong, Ki-Don Kim, Dae-Geun Choi, Jun-Hyuk Choi, Ji-Hye Lee, Soon-Won Lee
  • Publication number: 20110171430
    Abstract: The present invention is directed to adhesive systems and methods of making and using such systems. Exemplary adhesive systems comprise protrusions and/or grooves that can interleave to form a reversible adhesive interaction.
    Type: Application
    Filed: January 26, 2011
    Publication date: July 14, 2011
    Applicant: Nano Terra Inc.
    Inventors: Brian MAYERS, Sandip Agarwal, Jeffrey Carbeck, David Ledoux, Kevin Randall Stewart, George M. Whitesides, Adam Winkleman
  • Publication number: 20110132867
    Abstract: A method and apparatus of imprint lithography wherein the method includes depositing a material on a patterned surface of a conductive substrate, and pressing a transparent substrate and the conductive substrate together, wherein the pressing causes the material to conform to the patterned surface. Energy is applied to the material to form patterned material from the material. The transparent substrate and the conductive substrate are separated, wherein the patterned material adheres to the transparent substrate.
    Type: Application
    Filed: October 29, 2010
    Publication date: June 9, 2011
    Applicant: SEAGATE TECHNOLOGY LLC
    Inventors: Henry Hung Yang, Kim Yang Lee, Yautzong Hsu, Shuaigang Xiao, Xiaomin Yang, HongYing Wang, Zhaoning Yu
  • Publication number: 20110084579
    Abstract: A housing includes a metal cover defining an opening and a patched member adhered to the cover to patch the opening. The patched member is formed by injecting resin into the opening of the cover in an injection mold for in-mold-decoration. A film is attached to an outer surface of the patched member.
    Type: Application
    Filed: May 17, 2010
    Publication date: April 14, 2011
    Applicant: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventor: CHUN-YUAN CHANG
  • Publication number: 20110079939
    Abstract: An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.
    Type: Application
    Filed: October 5, 2010
    Publication date: April 7, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Jeroen Herman LAMMERS, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Roelof Koole
  • Publication number: 20110076353
    Abstract: Provided are processes such as a photo-imprinting process having high productivity without causing defacement of an expensive mold. In the photo-imprinting process of the invention, a pattern is transferred to a resin layer 2 by forming the resin layer 2 by applying a rework type photocrosslinking/curing resin to a substrate 1, pressing a mold 3 to the resin layer 2, irradiating the resin layer 2 with light having a first wavelength, and detaching the mold 3 from the resin layer 2. The rework type photocrosslinking/curing resin crosslinks/cures by irradiation with light having the first wavelength and is solubilized in a solvent by irradiation with light having a second wavelength shorter than the first wavelength or by heating. Therefore, even if grooves of the mold 3 are obstructed with the crosslinked/cured resin, the crosslinked/cured resin can be easily removed by resolubilizing it by, for example, irradiating the mold 3 with light having the second wavelength.
    Type: Application
    Filed: February 13, 2009
    Publication date: March 31, 2011
    Inventors: Masamitsu Shirai, Yoshihiko Hirai
  • Publication number: 20110068494
    Abstract: The present disclosure is directed to a process for making a tooling that may subsequently be used to make a microstructured article. The process detailed herein describes the formation of microstructured tooling structures in patterns to form microstructured arrays on a substrate to create the master tool. The process comprises providing a partially transparent substrate coated with a photo-polymerizable liquid on a first surface of the substrate. The master tool created can subsequently be used to fashion replication tools which in turn can be used to make light guides.
    Type: Application
    Filed: May 7, 2009
    Publication date: March 24, 2011
    Inventors: Robert W. Wilson, Levent Biyikli, Yi Lu
  • Publication number: 20110068081
    Abstract: According to one embodiment, a pattern forming method is disclosed. The method includes contacting a template with light curable resin on a substrate. The template comprises a concave-convex pattern including concave portions and convex portions, and a metal layer provided on a convex portion of the concave-convex pattern. The concave-convex pattern is to be contacted with the light curable resin. The pattern forming method further includes irradiating the light curable resin with light of a predetermined wavelength under a condition ?1=?2?2. Where ?1 is a complex relative permittivity of the metal layer corresponding to the predetermined wavelength, ?2 is a complex relative permittivity of the light curable resin corresponding to the predetermined wavelength.
    Type: Application
    Filed: September 17, 2010
    Publication date: March 24, 2011
    Inventors: Hiroyuki KASHIWAGI, Kazuya FUKUHARA
  • Publication number: 20110068510
    Abstract: An imprint lithography method is disclosed that includes bringing an imprint template into contact with imprintable medium provided on a substrate, and directing actinic radiation at the imprintable medium, the actinic radiation being oriented such that it is not perpendicularly incident upon a patterned surface of the imprint template.
    Type: Application
    Filed: September 20, 2010
    Publication date: March 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sander Frederik Wuister, Arie Jeffrey Den Boef
  • Publication number: 20110062635
    Abstract: Biomimetic stimuli-responsive surfaces and articles of manufacture, together with methods of fabrication and related methods of use.
    Type: Application
    Filed: February 5, 2008
    Publication date: March 17, 2011
    Inventors: Alfred J. Crosby, Douglas P. Holmes, Edwin P. Chan, Charles Rand, Kyriaki Kalaitzidou
  • Publication number: 20110049096
    Abstract: Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.
    Type: Application
    Filed: August 11, 2010
    Publication date: March 3, 2011
    Applicants: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM, MOLECULAR IMPRINTS, INC.
    Inventors: Sidlgata V. Sreenivasan, Shuqiang Yang, Frank Y. Xu, Vikramjit Singh
  • Publication number: 20110042862
    Abstract: Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.
    Type: Application
    Filed: August 21, 2009
    Publication date: February 24, 2011
    Applicant: INTERNATIONAL BUSINESS CORPORATION
    Inventors: Frances A. Houle, Sally A. Swanson, Taiichi Furukawa
  • Publication number: 20110037201
    Abstract: An imprint lithography method is disclosed for forming a patterned layer from a UV-curable, imprintable liquid medium on a substrate by means of an imprint template with a patterned surface. The method involves bringing together the patterned surface and the UV-curable medium for a filling period, illuminating the UV-curable medium with UV-radiation for an illumination period, holding the patterned surface and the UV-curable imprintable liquid medium together for a holding period such that the UV-curable medium has formed a self-supporting patterned layer, and separating the patterned surface and the patterned layer at the end of the holding period. The start time of the illumination period is earlier than the end time of the filling period by a pre-cure period. Also, a method is disclosed where the end time of the illumination period is earlier than the end time of the holding period.
    Type: Application
    Filed: August 12, 2010
    Publication date: February 17, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Roelof KOOLE, Sander Frederik Wuister
  • Publication number: 20110014499
    Abstract: A UV nanoimprint method comprising performing compression molding by pressing a mold having a pattern formed on the surface thereof against a work prepared by forming a thin film composed of an ultraviolet-curable resin on a substrate, and irradiating with ultraviolet light, either concurrently with the compression molding or after the compression molding, thereby transferring the pattern to the thin film, wherein the ultraviolet light is irradiated using an ultraviolet light irradiation apparatus equipped with temperature rise suppression means, and a light source that does not continuously emit heat rays together with ultraviolet light is used as a light source of the ultraviolet light irradiation apparatus.
    Type: Application
    Filed: March 6, 2009
    Publication date: January 20, 2011
    Inventors: Hiroshi Uchida, Masato Fukushima, Yuko Sakata
  • Publication number: 20110003093
    Abstract: An anti-glare film which can prevent reflected glare in a display and a whitening in a displayed black image and provide a contrasty image display in which black color appears more sharply is provided. The anti-glare film is produced by applying a liquid composition containing a nonreactive (meth)acrylic resin having a weight-average molecular weight of 30,000 to 1,000,000, a (meth)acrylic resin having a weight-average molecular weight of 1,000 to 100,000 and a polymerizable group, a polyfunctional (meth)acrylate, and a solvent having a boiling point of not lower than 100° C., and producing convection along with volatilization of the solvent, wherein the anti-glare film has a ridge formed dispersively and in a random direction on a surface thereof, and the total area of the ridges is not more than 50% of a whole surface area of the anti-glare film. The ridge may have an average height of 0.05 to 10 ?m and an average width of 0.1 to 30 ?m.
    Type: Application
    Filed: March 25, 2008
    Publication date: January 6, 2011
    Inventor: Masaki Hayashi
  • Publication number: 20100310843
    Abstract: A two layer material, and method for its manufacture, are disclosed, including an inner and an outer layer, the inner layer formed from an aliphatic urethane elastomeric composition as the layer exposed to view and to the environment and an aromatic urethane elastomer as the inner or backing layer. The layered material may be used to form a skin layer in an automotive air bag door. The layer material may be double cast from microspheres. The inner layer may be formulated to have good heat stability and flexibility, yet not include additives such as UV stabilizer as it may be positioned behind the outer protective layer.
    Type: Application
    Filed: December 20, 2007
    Publication date: December 9, 2010
    Inventors: William M. Humphrey, Paul Drago, Daniel Durand
  • Publication number: 20100289187
    Abstract: Disclosed herein are a film for insert injection molding and an insert injection molding method using the same. The film has a symmetrical structure about a thin metallic base film. Such a structure realizes superior appearance and reliability.
    Type: Application
    Filed: March 31, 2010
    Publication date: November 18, 2010
    Inventors: Ah Hyun BAE, Yong Seung SHIN, Ki Yul LIM, Young Min KIM, Geun Ho LEE
  • Publication number: 20100276845
    Abstract: The invention relates to a method for producing extruded profiled elements (3) from an elastomer material. In said method, the extruded profiled element (3) is formed from the elastomer material in a first step, the extruded profiled element (3) is entirely or partly surrounded by a thermoplastic material, the elastomer material that is surrounded by the thermoplastic material is cured, and the thermoplastic material is finally removed again once the elastomer material has been cured.
    Type: Application
    Filed: January 13, 2009
    Publication date: November 4, 2010
    Applicant: ROBERT BOSCH GMBH
    Inventors: Reiner Lay, Paul Wynen
  • Publication number: 20100264567
    Abstract: There are provided an apparatus for fixing a plastic sheet which fixes a plastic sheet to fabricate a nano pattern and a method of fabricating a nano pattern on a plastic sheet using the same. The apparatus for fixing a plastic sheet includes: a pair of planar metal guide rings interposingly fixing a plastic sheet from above and below, respectively; and a sheet fixing chuck including: a ring fixer sucking the pair of planar metal guide rings through a vacuum groove to be fixed thereto; and a sheet fixer having a plurality of vacuum pin holes formed therein, the vacuum pin holes sucking a bottom of the plastic sheet fixed by the planar metal guide rings. The apparatus allows fabrication of the nano pattern on the plastic sheet having less roughness than that of a semiconductor substrate or a glass substrate.
    Type: Application
    Filed: May 21, 2008
    Publication date: October 21, 2010
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Kyung Hyun Kim, Chul Huh, Hyun Sung Ko, Jong Cheol Hong, Wan Joong Kim, Gun Yong Sung, Seon Hee Park
  • Publication number: 20100252960
    Abstract: An imprint lithography apparatus is disclosed that includes a first imprint template provided with pattern recesses and a second imprint template provided with pattern recesses, wherein the pattern recesses of the first imprint template are configured to form features on a substrate which interconnect laterally with features formed by the pattern recesses of the second imprint template, and wherein the pattern recesses of the second imprint template have a critical dimension which is three or more times greater than the critical dimension of the pattern recesses of the first imprint template.
    Type: Application
    Filed: March 30, 2010
    Publication date: October 7, 2010
    Applicant: ASML Netherland B.V.
    Inventors: Nikolay Iosad, Pascale Anne Maury
  • Publication number: 20100244328
    Abstract: A curable composition for photoimprints comprising a photopolymerizable monomer, a polymerization initiator and a compound of the following formula (1), wherein the content of compounds having a molecular weight of at least 1000 is at most 10% by mass of all the solid content therein, and the content of the compound of the formula (1) is from 0.3 to 10.0% by mass of all the solid content therein: wherein Z represents an aliphatic hydrocarbon group; R1 and R2 represent a hydrogen atom or a substituent; R3 and R4 represent a methyl group, an ethyl group, a methoxy group or an ethoxy group; and R5 represents a methoxy group or an ethoxy group.
    Type: Application
    Filed: March 23, 2010
    Publication date: September 30, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Hiroyuki YONEZAWA, Akinori Fujita, Takashi Takayanagi
  • Publication number: 20100230864
    Abstract: Nanoimprint lithography templates and methods of fabricating semiconductor devices using the nanoimprint lithography templates are provided. The nanoimprint lithography template includes a transparent substrate having a first refractive index, a stamp pattern on a surface on the transparent substrate and having inclined sidewalls, and a coating layer formed on the inclined sidewalls of the stamp pattern, the coating layer having a second refractive index higher than the first refractive index.
    Type: Application
    Filed: March 8, 2010
    Publication date: September 16, 2010
    Inventors: Chang-min Park, Doo-Hoon Goo, Jeong-Ho Yeo, Joo-On Park, In-Sung Kim, Jeong-Hoon Lee
  • Patent number: 7785504
    Abstract: A fabricating method of a color filter array substrate includes the steps of forming a black matrix on a substrate, forming red, green, blue color filters on the substrate on which the black matrix is formed, forming an overcoat layer including a white color filter on the substrate on which the red, green, and blue color filters are formed, aligning a flat panel soft mold to the overcoat layer; and smoothing the overcoat layer using the flat panel soft mold.
    Type: Grant
    Filed: June 24, 2005
    Date of Patent: August 31, 2010
    Assignee: LG Display Co., Ltd.
    Inventors: Gee Sung Chae, Gyoo Chul Jo, Yong Sup Hwang, Jin Wuk Kim, Change Hee Lee
  • Publication number: 20100213642
    Abstract: According to one embodiment, the present invention provides a resin stamper injection molding die including a fixed side template having a metal stamper mounting surface mirror-ground in a random direction, a metal stamper having a front surface with recesses and protrusions and a back surface mirror-ground in a random direction, and a moving side template. The metal stamper has a surface roughness of 0 to 50 nm. The metal stamper mounting surface has a surface roughness of 0 to 1.0 nm, and has a coefficient of static friction of at most 0.20 with respect to the second main surface of the metal stamper.
    Type: Application
    Filed: February 19, 2010
    Publication date: August 26, 2010
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Yasuaki Ootera, Shinobu Sugimura, Seiji Morita, Masatoshi Sakurai
  • Publication number: 20100207301
    Abstract: A method of forming micro/nano channels and a method of forming micro/nano structures are provided which can easily form micro- and nano-sized channels and structures through simple processes. UV curable polymer patterns are formed on a first substrate, and the UV curable polymer patterns and a second substrate are sealed together by an electrostatic attraction. Then, a channel is formed by irradiating UV light. Also, after reversibly sealing the polymer patterns and a third substrate, prepolymer patterns are formed on the third substrate by flowing prepolymer. Then, the third is removed to form a fine structure. The nano-sized channels as well as the micro-sized channels can be formed through the substantially equal processes. Also, the reversible sealing or the irreversible sealing can be freely selected according to the coating of the curable polymer and UV irradiation time.
    Type: Application
    Filed: February 17, 2009
    Publication date: August 19, 2010
    Inventors: Kahp Yang SUH, Pil Nam KIM
  • Patent number: 7763202
    Abstract: The present disclosure relates to a method of surface treating particulate materials with electromagnetic radiation, in particular a method of cross-linking superabsorbent polymer particles using UV irradiation. The method is carried out with a so-called roll reactor, which comprises a rotating roll and an irradiation source. Radical former molecules can be applied on the surface of superabsorbent polymer particles. The particulate material is fed onto the surface of the roll and is irradiated while moved with the rotating roll. The irradiation source is provided such that the radiation emitted by the irradiation source is able to reach at least part of the particulate material that has been fed onto the surface of the roll. The irradiation source for use in the method of the present disclosure is able to emit UV radiation of a wavelength between 201 nm and 400 nm. The present disclosure also relates to absorbent articles comprising surface treated superabsorbent particles made by said method.
    Type: Grant
    Filed: February 22, 2008
    Date of Patent: July 27, 2010
    Assignee: The Procter & Gamble Company
    Inventors: Torsten Lindner, Aleksey Mikhailovich Pinyayev, Andrew Julian Wnuk
  • Publication number: 20100167045
    Abstract: The present invention relates to a reactive mixture for coating mouldings by means of reaction injection moulding, comprising at least 40% by weight of (meth)acrylates having at least two double bonds, the reactive mixture comprising at least one photoinitiator and at least one thermal initiator.
    Type: Application
    Filed: April 17, 2008
    Publication date: July 1, 2010
    Applicant: Evonik Roehm GmbH
    Inventors: Klaus Schultes, Thorsten Goldacker, Klaus Koralewski, Werner Hoess, Ghirmay Seyoum, Elevtherios Gross, Erwin Felger
  • Publication number: 20100159616
    Abstract: A bio-chip has a base plate, and a fluid resin layer positioned on the base plate and having a plurality of convexo-concave structures that are uniformly arranged in line. Side walls of the structures form reflecting films to form a Fabry-Perot interferometer structure. The bio-chip is used to detect an analyte provided to the bio-chip, so that it is possible to rapidly analyze the small amount of samples and to realize the detection sensitivity relatively higher than the conventional method.
    Type: Application
    Filed: April 16, 2007
    Publication date: June 24, 2010
    Applicant: KOREA TECHNOLOGY INDUSTRY CO., LTD.
    Inventors: Kwan Han Park, Kang Hoon Lee, Byong Chon Jon, Moon Hi Han, Yoon Suk Lee
  • Publication number: 20100156006
    Abstract: Disclosed herein is a method for transferring a pattern of minute dents and projections to an energy ray-setting resin layer coated on a substrate plate by pressing a master pattern on a transfer mold, followed by irradiation of energy rays. The pattern transfer method comprises the steps of pressing a master pattern on a transfer mold against the resin layer under a predetermined imprinting pressure, irradiating the resin layer under the imprinting pressure with energy rays, interrupting the irradiation of energy rays and at the same time cancelling application of the imprinting pressure and holding the resin layer and the transfer mold in a non-pressed state to relieve the resin layer of internal stresses, and recommencing irradiation of the resin layer with energy rays to complete hardening of the resin layer which is held in contact with the transfer mold in a non-pressed state.
    Type: Application
    Filed: March 9, 2010
    Publication date: June 24, 2010
    Inventors: Hideaki Kataho, Hiroshi Okada, Kenya Wada, Hisayoshi Ichikawa
  • Publication number: 20100140851
    Abstract: An in-mould coating method and a coating device for the same, wherein the inserts in the mould of the coating device are made of transparent material and are each coated with reflective material. In each insert are installed light generators, light sensors, cameras, etc. The coating method comprises the steps of: closing the mould after placing a semi-finished product formed by injection molding or other processes in the mould; injecting liquid lacquer or other liquid coating material, and using the cameras to monitor filling; and after finishing filling, starting the light generators and utilizing the light sensors to monitor the amount of light irradiated on the injected liquid lacquer or other liquid coating materials in such a manner that the injected liquid lacquer or other liquid coating materials is hardened to form a coating film on the surface of the semi-finished product.
    Type: Application
    Filed: February 12, 2010
    Publication date: June 10, 2010
    Inventor: Yu-Syuan Jin
  • Publication number: 20100129611
    Abstract: This invention relates to a molding technology. More particularly, the invention relates to a flexible mold, its production method and a production method of a fine structure. The invention can be utilized for the production of various fine structures such as barrier ribs of a back plate of a plasma display panel.
    Type: Application
    Filed: January 22, 2010
    Publication date: May 27, 2010
    Inventor: Takaki Sugimoto
  • Patent number: 7722793
    Abstract: The invention concerns a method of recuperating a turbine element constituted of a substrate, forming the body of the element, and a protective coating adhering to the substrate. The method comprises the control of the turbine element in order to pinpoint the zones having a bonding defect between the protective coating and the substrate, and the elimination of the bonding defects between the protective coating and the substrate. The bonding defects are eliminated by means of a laser beam directed onto each zone having a bonding defect in order to induce a localized melting of the protective coating and the underlying substrate and enable a sound bond, at the level of said zone, between the protective coating and the substrate after stopping the laser beam.
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: May 25, 2010
    Assignee: SNECMA
    Inventors: Mathieu Gueguen, Marc Jacky Vassault
  • Publication number: 20100117268
    Abstract: A fine mold comprises a regeneration target film forming a convex part of a formation surface, and a light shielding unit that is configured deeper than a bottom of the formation surface and that regenerates the regeneration target film. A manufacturing cost of a product having a three-dimensional structure can be reduced.
    Type: Application
    Filed: January 21, 2010
    Publication date: May 13, 2010
    Applicant: Yamaha Corporation
    Inventor: ATSUO HATTORI
  • Publication number: 20100121013
    Abstract: A curable composition for photoimprints, comprising a (meth)acrylate compound represented by the following formula (1): wherein R1 and R2 represent a hydrogen atom or a methyl group; X represents a single bond or an aliphatic group; n and m indicate an integer of 1 or more, has a low viscosity and a high transfer patterning accuracy and gives a cured film excellent in scratch resistance and adhesiveness.
    Type: Application
    Filed: November 5, 2009
    Publication date: May 13, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Kyouhei SAKITA, Hiroyuki Yonezawa