Abstract: In a method of processing a substrate in accordance with an embodiment, a trench may be formed in the substrate, imprint material may be deposited at least into the trench, the imprint material in the trench may be embossed using a stamp device, and the stamp device may be removed from the trench.

Abstract: A method of manufacturing a nanopatterned biophotonic structure includes forming a customized nanopattern mask on a substrate using E-beam lithography, providing a biopolymer matrix solution, depositing the biopolymer matrix solution on the substrate, and drying the biopolymer matrix solution to form a solidified biopolymer film. A surface of the film is formed with the nanopattern mask, or a nanopattern is machined directly on a surface of the film using E-beam lithograpy such that the biopolymer film exhibits a spectral signature corresponding to the E-beam lithograpy nanopattern. The resulting bio-compatible nanopatterned biophotonic structures may be made from silk, may be biodegradable, and may be bio-sensing devices. The biophotonic structures may employ nanopatterned masks based on non-periodic photonic lattices, and the biophotonic structures may be designed with specific spectral signatures for use in probing biological substances, including displaying optical activity in the form of opalescence.

Abstract: A silsesquioxane resin is applied on top of the patterned photo-resist and cured to produce a cured silsesquioxane resin on top of the pattern surface. Subsequently, an aqueous base stripper or a reactive ion etch recipe containing CF4 is used to “etch back” the silicon resin to the top of the photoresist material, exposing the entire top surface of the photoresist. Then, a second reactive ion etch recipe containing O2 to etch away the photoresist. The result is a silicon resin film with via holes with the size and shape of the post that were patterned into the photoresist. Optionally, the new pattern can be transferred into the underlying layer(s).

Abstract: A pattern transfer method for filling a surface on a template having a concave-convex pattern with a resist material has contacting the template with the resist material applied on a substrate, curing the resist material while contacting the template with the resist, electrically charging the template and the resist with an identical polarity, and removing the template from the resist material while eclectically charging the template and the resist with an identical polarity.

Abstract: A process for coating a metallic surface of a metallic substrate comprising applying, an organic, anionically, cationically or radically curable anticorrosive composition, to the metallic surface, wherein said anticorrosive composition is a dispersion or solution containing at least two components that are at least partially anionically, cationically or radically curable, wherein at least one monofunctional monomer or monofunctional oliger is present, a photoinitiator, and an first organic corrosion inhibition.

Abstract: Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.

Abstract: The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.

Abstract: According to one embodiment, an imprint lithography apparatus includes an arithmetic unit calculating a mixing ratio of a demolding agent and a resist to be contained in a pattern forming agent on a basis of a pattern size formed on a template, a mixer mixing the resist and the demolding agent, a nozzle dropping the pattern forming agent on a substrate from the mixer, and an irradiation apparatus irradiating the pattern forming agent dropped on the substrate with light after pressing the template onto the pattern forming agent.

Abstract: Compositions for golf balls that include thermoset polyurethane and/or thermoset polyurea In particular, the compositions of the invention, which are based on a polyurethane and/or polyurea, have improved crosslink density and hardness from crosslinking after the curative step.

Abstract: A resin composition for nanoimprint includes a cationically polymerizable compound that has crystalline characteristics and is solid at ordinary temperature, and a photo cationic polymerization initiator.

Abstract: Disclosed is a method of fabricating a flexible device, which includes surface-treating one or both sides of a carrier plate so that regions with different surface-treatments are formed on the same side of the carrier plate, forming a glass-filler reinforced plastic substrate film on the surface-treated carrier plate, forming thin film patterns on the glass-filler reinforced plastic substrate film, and separating the glass-filler reinforced plastic substrate film having the thin film patterns formed thereon from the carrier plate, and in which the surface-treating of the carrier plate enables the glass-filler reinforced plastic substrate film to be easily separated from the carrier plate without an additional process such as using a solvent or a laser release technique.

Abstract: A processing method for in-mold coating integrative system is used in cooperation with an injection molding machine. The injection molding machine comprises a rotatable work platform and a combination of at least one male mold and at least two female molds. The rotatable work platform is divided averagely into several work areas, and the processing proceeds sequentially in each work area by the rotation of the rotatable work platform.

Abstract: A matte laminate film comprising a transparent resin film substrate and a matte layer formed on at least one surface of the transparent resin film substrate, in which the transparent resin film substrate is a laminate film comprising a layer (A) formed of a polycarbonate resin and a layer (B) formed of a methacrylic resin which is laminated on at least one surface of the layer (A). The matte laminate film is preferably used as a decorative film having good resistance to whitening and high mechanical properties and surface hardness.

Abstract: A method for forming a structure includes: a step of forming on a substrate a resin layer composed of a resin which is cured by irradiation with active energy rays; a step of pressing a first mold on the resin layer, the first mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; a first irradiation step of irradiating the resin layer; a step of pressing a second mold on the resin layer within a region where the resin layer is not exposed to the rays, the second mold being composed of an active energy ray-transmitting material and having projections each having an active energy ray-shielding film at the end thereof; and a second irradiation step of irradiating a portion of the unexposed region of the resin layer.

Abstract: Disclosed is an imprinting apparatus and imprinting method using the same that prevent a process of forming a pattern on a substrate from being affected by flatness of a stage. The imprinting apparatus comprises a chamber unit in which a process of forming a pattern on a substrate is carried out; a stage for supporting the substrate on which a resin layer is formed; an installing member positioned above the stage and having a mold member attached to transform the resin layer so as to form the pattern on the substrate; and a first spraying unit for spraying fluid to separate the substrate supported by the stage from the stage, wherein the installing member moves the mold member in the direction getting near to the substrate separated from the stage so that the mold member and the resin layer are brought into contact with each other.

Abstract: Provided is an imprint product, which is for transcribing a fine pattern of a mold surface and which contains a fluorine-containing cyclic olefin polymer containing repeating unit represented by formula (1) and having a fluorine atom content rate of 40% to 75% by mass.

Abstract: A lamination or replication method for making an article having a structured solid layer, including: dispensing a curable liquid onto a first member; contacting the curable liquid on the first member with a complimentary second member having a curvature aspect, to form an assembly having the curable liquid disposed between the first and second members; and curing the curable liquid to form the article, the structure being imparted by at least one of the first and second members. A display system that incorporates the article, as defined herein, is also disclosed.

Abstract: In a method for producing a hose with a sealing layer, a hose body having a resin innermost layer is prepared, a rod-like core member is disposed through a center portion of a hollow interior of a connecting portion of the hose body so as to occupy the center portion, and the plasma gas is fed and distributed in an interior of an innermost layer of the connecting portion to modify an inner surface of the innermost layer. Then, the sealing layer is formed on the inner surface by coating an elastic material for the sealing layer on the inner surface of the connecting portion.

Abstract: An optical disc includes a reflective film formed on concave and convex marks after the concave and convex marks are synchronized with the integral multiple of a channel bit length and formed in accordance with modulated main information. Thereafter, continuous or intermittent laser light synchronized with the integral multiple of the channel bit length is irradiated at intervals longer than the longest one of the concave and convex marks in accordance with a spiral track formed in a circumferential direction of the concave and convex marks, whereby an optical characteristic of the reflective film is changed to form a recordable mark and sub-information necessary to reproduce the main information is recorded in a superimposition manner.

Abstract: A method for formation of a polymer film in-situ according to the invention comprises steps of: providing a polymerizable composition in one or multiple parts; prior to completion of polymerization of the polymerizable composition, forming a film therefrom; and initiating polymerization of the polymerizable composition using a radiation source to form the polymer film.

Abstract: A UV nanoimprint lithography process and its apparatus that are able to repeatedly fabricates nanostructures on a substrate (wafer, UV-transparent plate) by using a stamp that is as large as or smaller than the substrate in size are provided. The apparatus includes a substrate chuck for mounting the substrate; a stamp made of UV-transparent materials and having more than two element stamps, wherein nanostructures are formed on the surface of each element stamp; a stamp chuck for mounting the stamp; a UV lamp unit for providing UV light to cure resist applied between the element stamps and the substrate; a moving unit for moving the substrate chuck or the stamp chuck to press the resist with the element stamps and substrate; and a pressure supply unit for applying pressurized gas to some selected regions of the substrate to help complete some incompletely filled element stamps.

Abstract: Embodiments of the invention relate to methods of anti-counterfeiting for nanostructures and nanostructured devices. Specifically we describe a method of embedding a coded micro- or nanopatterns in nanostructures fabricated using Near-field rolling mask lithography, where areas of such features can be embedded into a transparent cylindrical or conic frame, or fabricated on the surface of flexible film laminated on the surface of the frame. Alternatively, specific coded nanofeatures distribution can be created using modulation of intensity or wavelength of the light source along the width or length of such cylinder or cone, or modulation of flexible film thickness or contact pressure between the rotatable mask and a substrate.

Abstract: The present disclosure relates to flexible, three-dimensional injection blow molded or injection stretch blow molded liners for use in overpacks, bottles, containers, etc. and methods for manufacturing the same. A method for manufacturing a liner may include injecting a polymeric material into a preform mold die to form a preform, blow molding the preform to form the liner, collapsing the liner and positioning the liner in an overpack, and inflating the liner. A fluoropolymer may be used for the preform. A liner may comprise a flexible body that substantially conforms to the interior of an overpack and a fitment port integral with the flexible body. The flexible body may be adapted to be removably inserted into the overpack by collapsing the flexible body, inserting the flexible body into the overpack, and re-inflating the flexible body inside the overpack. The flexible body may comprise a fluoropolymer and may comprise multiple layers.

Abstract: The present invention relates to an antireflective composition comprising a thermal acid generator and an epoxy polymer comprising at least one unit of structure 1, at least one unit of structure 2, where, R1 to R12 are independently selected from hydrogen and C1-C4 alkyl, structure 1 has a configuration selected from cis, trans or mixture thereof, and x and y are the mole % of the monomeric units in the polymer. The invention also relates to a process for manufacturing a microelectronic device.

Abstract: A method for modifying a transparent electrode film contained in a transparent electrode film-attached substrate having a substrate and the transparent electrode film formed on the substrate includes annealing the transparent electrode film by applying flash light having an optical pulse duration time of 0.1 msec to 10 msec to the transparent electrode film using a flash lamp, thereby heating the transparent electrode film.

Abstract: The present invention is directed to adhesive systems and methods of making and using such systems. Exemplary adhesive systems comprise protrusions and/or grooves that can interleave to form a reversible adhesive interaction.

Abstract: Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern.

Abstract: A method and apparatus of imprint lithography wherein the method includes depositing a material on a patterned surface of a conductive substrate, and pressing a transparent substrate and the conductive substrate together, wherein the pressing causes the material to conform to the patterned surface. Energy is applied to the material to form patterned material from the material. The transparent substrate and the conductive substrate are separated, wherein the patterned material adheres to the transparent substrate.

Abstract: A housing includes a metal cover defining an opening and a patched member adhered to the cover to patch the opening. The patched member is formed by injecting resin into the opening of the cover in an injection mold for in-mold-decoration. A film is attached to an outer surface of the patched member.

Abstract: An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.

Abstract: Provided are processes such as a photo-imprinting process having high productivity without causing defacement of an expensive mold. In the photo-imprinting process of the invention, a pattern is transferred to a resin layer 2 by forming the resin layer 2 by applying a rework type photocrosslinking/curing resin to a substrate 1, pressing a mold 3 to the resin layer 2, irradiating the resin layer 2 with light having a first wavelength, and detaching the mold 3 from the resin layer 2. The rework type photocrosslinking/curing resin crosslinks/cures by irradiation with light having the first wavelength and is solubilized in a solvent by irradiation with light having a second wavelength shorter than the first wavelength or by heating. Therefore, even if grooves of the mold 3 are obstructed with the crosslinked/cured resin, the crosslinked/cured resin can be easily removed by resolubilizing it by, for example, irradiating the mold 3 with light having the second wavelength.

Abstract: An imprint lithography method is disclosed that includes bringing an imprint template into contact with imprintable medium provided on a substrate, and directing actinic radiation at the imprintable medium, the actinic radiation being oriented such that it is not perpendicularly incident upon a patterned surface of the imprint template.

Abstract: According to one embodiment, a pattern forming method is disclosed. The method includes contacting a template with light curable resin on a substrate. The template comprises a concave-convex pattern including concave portions and convex portions, and a metal layer provided on a convex portion of the concave-convex pattern. The concave-convex pattern is to be contacted with the light curable resin. The pattern forming method further includes irradiating the light curable resin with light of a predetermined wavelength under a condition ?1=?2?2. Where ?1 is a complex relative permittivity of the metal layer corresponding to the predetermined wavelength, ?2 is a complex relative permittivity of the light curable resin corresponding to the predetermined wavelength.

Abstract: The present disclosure is directed to a process for making a tooling that may subsequently be used to make a microstructured article. The process detailed herein describes the formation of microstructured tooling structures in patterns to form microstructured arrays on a substrate to create the master tool. The process comprises providing a partially transparent substrate coated with a photo-polymerizable liquid on a first surface of the substrate. The master tool created can subsequently be used to fashion replication tools which in turn can be used to make light guides.

Abstract: Biomimetic stimuli-responsive surfaces and articles of manufacture, together with methods of fabrication and related methods of use.

Abstract: Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.

Abstract: Coating compositions suitable for UV imprint lithographic applications include at least one vinyl ether crosslinker having at least two vinyl ether groups; at least one diluent comprising a monofunctional vinyl ether compound; at least one photoacid generator soluble in a selected one or both of the at least one monofunctional vinyl ether compound and the at least one vinyl ether crosslinker having the at least two vinyl ether groups; and at least one stabilizer comprising an ester compound selectively substituted with a substituent at an ester position or an alpha and the ester positions. Also disclosed are imprint processes.

Abstract: An imprint lithography method is disclosed for forming a patterned layer from a UV-curable, imprintable liquid medium on a substrate by means of an imprint template with a patterned surface. The method involves bringing together the patterned surface and the UV-curable medium for a filling period, illuminating the UV-curable medium with UV-radiation for an illumination period, holding the patterned surface and the UV-curable imprintable liquid medium together for a holding period such that the UV-curable medium has formed a self-supporting patterned layer, and separating the patterned surface and the patterned layer at the end of the holding period. The start time of the illumination period is earlier than the end time of the filling period by a pre-cure period. Also, a method is disclosed where the end time of the illumination period is earlier than the end time of the holding period.

Abstract: A UV nanoimprint method comprising performing compression molding by pressing a mold having a pattern formed on the surface thereof against a work prepared by forming a thin film composed of an ultraviolet-curable resin on a substrate, and irradiating with ultraviolet light, either concurrently with the compression molding or after the compression molding, thereby transferring the pattern to the thin film, wherein the ultraviolet light is irradiated using an ultraviolet light irradiation apparatus equipped with temperature rise suppression means, and a light source that does not continuously emit heat rays together with ultraviolet light is used as a light source of the ultraviolet light irradiation apparatus.

Abstract: An anti-glare film which can prevent reflected glare in a display and a whitening in a displayed black image and provide a contrasty image display in which black color appears more sharply is provided. The anti-glare film is produced by applying a liquid composition containing a nonreactive (meth)acrylic resin having a weight-average molecular weight of 30,000 to 1,000,000, a (meth)acrylic resin having a weight-average molecular weight of 1,000 to 100,000 and a polymerizable group, a polyfunctional (meth)acrylate, and a solvent having a boiling point of not lower than 100° C., and producing convection along with volatilization of the solvent, wherein the anti-glare film has a ridge formed dispersively and in a random direction on a surface thereof, and the total area of the ridges is not more than 50% of a whole surface area of the anti-glare film. The ridge may have an average height of 0.05 to 10 ?m and an average width of 0.1 to 30 ?m.

Abstract: A two layer material, and method for its manufacture, are disclosed, including an inner and an outer layer, the inner layer formed from an aliphatic urethane elastomeric composition as the layer exposed to view and to the environment and an aromatic urethane elastomer as the inner or backing layer. The layered material may be used to form a skin layer in an automotive air bag door. The layer material may be double cast from microspheres. The inner layer may be formulated to have good heat stability and flexibility, yet not include additives such as UV stabilizer as it may be positioned behind the outer protective layer.

Abstract: Disclosed herein are a film for insert injection molding and an insert injection molding method using the same. The film has a symmetrical structure about a thin metallic base film. Such a structure realizes superior appearance and reliability.

Abstract: The invention relates to a method for producing extruded profiled elements (3) from an elastomer material. In said method, the extruded profiled element (3) is formed from the elastomer material in a first step, the extruded profiled element (3) is entirely or partly surrounded by a thermoplastic material, the elastomer material that is surrounded by the thermoplastic material is cured, and the thermoplastic material is finally removed again once the elastomer material has been cured.

Abstract: There are provided an apparatus for fixing a plastic sheet which fixes a plastic sheet to fabricate a nano pattern and a method of fabricating a nano pattern on a plastic sheet using the same. The apparatus for fixing a plastic sheet includes: a pair of planar metal guide rings interposingly fixing a plastic sheet from above and below, respectively; and a sheet fixing chuck including: a ring fixer sucking the pair of planar metal guide rings through a vacuum groove to be fixed thereto; and a sheet fixer having a plurality of vacuum pin holes formed therein, the vacuum pin holes sucking a bottom of the plastic sheet fixed by the planar metal guide rings. The apparatus allows fabrication of the nano pattern on the plastic sheet having less roughness than that of a semiconductor substrate or a glass substrate.

Abstract: An imprint lithography apparatus is disclosed that includes a first imprint template provided with pattern recesses and a second imprint template provided with pattern recesses, wherein the pattern recesses of the first imprint template are configured to form features on a substrate which interconnect laterally with features formed by the pattern recesses of the second imprint template, and wherein the pattern recesses of the second imprint template have a critical dimension which is three or more times greater than the critical dimension of the pattern recesses of the first imprint template.

Abstract: A curable composition for photoimprints comprising a photopolymerizable monomer, a polymerization initiator and a compound of the following formula (1), wherein the content of compounds having a molecular weight of at least 1000 is at most 10% by mass of all the solid content therein, and the content of the compound of the formula (1) is from 0.3 to 10.0% by mass of all the solid content therein: wherein Z represents an aliphatic hydrocarbon group; R1 and R2 represent a hydrogen atom or a substituent; R3 and R4 represent a methyl group, an ethyl group, a methoxy group or an ethoxy group; and R5 represents a methoxy group or an ethoxy group.

Abstract: Nanoimprint lithography templates and methods of fabricating semiconductor devices using the nanoimprint lithography templates are provided. The nanoimprint lithography template includes a transparent substrate having a first refractive index, a stamp pattern on a surface on the transparent substrate and having inclined sidewalls, and a coating layer formed on the inclined sidewalls of the stamp pattern, the coating layer having a second refractive index higher than the first refractive index.

Abstract: A fabricating method of a color filter array substrate includes the steps of forming a black matrix on a substrate, forming red, green, blue color filters on the substrate on which the black matrix is formed, forming an overcoat layer including a white color filter on the substrate on which the red, green, and blue color filters are formed, aligning a flat panel soft mold to the overcoat layer; and smoothing the overcoat layer using the flat panel soft mold.

Abstract: According to one embodiment, the present invention provides a resin stamper injection molding die including a fixed side template having a metal stamper mounting surface mirror-ground in a random direction, a metal stamper having a front surface with recesses and protrusions and a back surface mirror-ground in a random direction, and a moving side template. The metal stamper has a surface roughness of 0 to 50 nm. The metal stamper mounting surface has a surface roughness of 0 to 1.0 nm, and has a coefficient of static friction of at most 0.20 with respect to the second main surface of the metal stamper.

Abstract: A method of forming micro/nano channels and a method of forming micro/nano structures are provided which can easily form micro- and nano-sized channels and structures through simple processes. UV curable polymer patterns are formed on a first substrate, and the UV curable polymer patterns and a second substrate are sealed together by an electrostatic attraction. Then, a channel is formed by irradiating UV light. Also, after reversibly sealing the polymer patterns and a third substrate, prepolymer patterns are formed on the third substrate by flowing prepolymer. Then, the third is removed to form a fine structure. The nano-sized channels as well as the micro-sized channels can be formed through the substantially equal processes. Also, the reversible sealing or the irreversible sealing can be freely selected according to the coating of the curable polymer and UV irradiation time.