Abstract: In an imprint method of an embodiment, in the imprinting of an imprint shot including an outermost peripheral region of a substrate where resist is not desired to be entered at the time of imprinting, light curing the resist is applied to a light irradiation region with a predetermined width including a boundary between the outermost peripheral region and a pattern formation region more inside than the outermost peripheral region, whereby the resist which is to enter inside the outermost peripheral region is cured. Then, light curing the resist filled in a template pattern is applied onto a template.

Abstract: Disclosed are a heat transfer medium and a heat transfer method that uses the heat transfer medium. The heat transfer medium comprises a light-transparent substrate coated with a plurality of nano particles. The nano particles absorb light incident thereon to thereby produce heat, which is transferred to a target object to be heated. Nano particles can be applied onto a target object. After heating, the particles are removed by etching. Nano particles can be selectively applied to the light-transparent substrate or directly to a target object to be heat so as to localize heat-production and thus heat selective portions of the target object.

Abstract: In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.

Abstract: The described invention provides a method of patterning a thin film deposited on a substrate comprising applying a moving focused field of thermal energy to the thin film deposited on the substrate; and dewetting the thin film from the substrate. Dewetting the thin film from the substrate is characterized by a negative space of a desired design; and displacement of the thin film into adjacent structures, thereby accumulating thin film in the adjacent structures.

Abstract: To provide a process for producing an article having a fine pattern on its surface, by which peeling of a cured resin layer having a fine pattern is suppressed, and a defect of the cured resin layer by repelling when a photocurable resin composition is applied is suppressed.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: The present invention provides an imprint apparatus which forms a pattern on an imprint material on a substrate by using a mold, including a first optical member interposed between an illumination optical system and a detection optical system, and a mold, and configured to guide a first light from the illumination optical system and a second light from the detection optical system to the mold, and a second optical member interposed between the first optical member and the detection optical system, and configured to transmit the second light which is reflected by a mark formed on the mold or a mark formed on the substrate and travels toward the detection optical system through the first optical member, and block the first light which travels toward the detection optical system through the first optical member.

Abstract: To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cm3 or larger; Crosslink density={?(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.

Abstract: The invention relates to multilayer structures made of at least one thermoplastic material and having at least one metal layer. The invention further relates to multilayer products encompassing at least three layers comprising a substrate layer made of a substrate comprising specific copolycarbonates and at least one inorganic filler, a metal layer and one or more further layers. The invention further relates to the process for producing the said multilayer structures.

Abstract: A photo-curable composition having a high polymerization rate and a high polymerization conversion is provided. A patterning method having a high throughput is also provided. A photo-curable composition contains a radical-polymerizable monomer (A), a photopolymerization initiator (B), and a compound (C) serving as a sensitizer and having the following general formula (1). X1 and X2 are selected from the group consisting of a hydrogen atom, alkyl groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. X1 and X2 may be the same or different. R1 to R10 are independently selected from the group consisting of a hydrogen atom, halogen atoms, alkyl groups, alkoxy groups, a phenyl group, a naphthyl group, and alkyl groups in which part or all of the hydrogen atoms are substituted with fluorine. R1 to R10 may be the same or different.

Abstract: The present invention relates to an interior film comprising a UV curable resin layer, a metal layer, and an adhesive layer, wherein a three-dimensional pattern is formed on the UV curable resin layer. More specifically, various forms of high quality metal texture can be expressed by forming a three-dimensional pattern on the UV curable resin layer, and the three-dimensional pattern can be clearly and sophisticatedly implemented without collapsing by further comprising a top coating layer.

Abstract: A method of printing and embossing a receiver having first and second sides and having a thickness is disclosed. The method includes depositing a pattern of image toner on a first side of a receiver, the image toner including toner particles; fixing the pattern of image toner onto the receiver; depositing an embossing pattern of embossing particles on a side of the receiver, the embossing pattern having an embossing-pattern thickness corresponding to a fixed stack height of at least 30% of the thickness of the receiver, wherein the embossing particles have average diameters greater than the average diameters of the toner particles of the image toner; and pressing the receiver between a hard nip roller and a compliant nip roller, the pressure being selected so that the embossing pattern permanently deforms the receiver.

Abstract: The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.

Abstract: A method of making a multi-layer micro-wire structure includes providing a substrate with a plurality of micro-channels. First and second material compositions are provided. The first material composition is coated over the substrate and micro-channels and then removed from the substrate surface but not the micro-channels. The second material composition is coated over the substrate, in the micro-channels, and over the first materials, and then removed from the substrate surface but not the micro-channels. The first and second material compositions are cured in the micro-channels in a common step to form a cured first material layer and a cured second material layer in the micro-channels. The cured first material layer and the cured second material layer form an electrically conductive multi-layer micro-wire in each micro-channel.

Abstract: Techniques for component protective overmolding include selectively applying a securing coating substantially over one or more elements coupled to a framework, molding a first protective layer over the framework, the one or more elements, and the securing coating, after the securing coating has been selectively applied, and molding a second protective layer over the first protective layer. In one embodiment, the second protective layer is configured to provide a surface configured to receive a pattern and is removable if a defect is yielded during inspection. Further, the securing coating may be a curable material, such as an ultra violet curable material.

Abstract: A nozzle for producing a liquid jet a fluid, methods using the nozzle, and an injector comprising the nozzle of the invention for providing the liquid jet of a fluid to a vacuum system are described.

Abstract: A co-extruded plastic film structure that has increased rigidity. The film is extruded on a three layer extrusion line with the core layer based on a foamed polymer. The outer layers comprise a polyolefin combined with non-plastic particulate. The film may be coated onto a substrate, such as paper.

Abstract: An imprinting method forms a predetermined pattern in a resist surface of a substrate coated with a photo-curing type resist by using a mold having a pattern of projections and recesses formed in a transfer surface. The method includes an alignment step, a press step, a UV irradiation step, and a release step. The steps are performed in plural units selected from independent units, composite units, and combinations of independent units and composite units. The mold and the substrate are paired with each other and conveyed between the units. An imprinting apparatus includes plural units which perform the steps in the imprinting method and which are selected from independent units in each of which one step is executed, composite units in each of which plural of steps are executed, and combinations of independent units and composite units; and conveying devices which convey the mold and the substrate.

Abstract: The invention pertains to a printing form and a process for preparing the printing form from a curable composition that includes an epoxy resin, less than a stoichiometric amount of at least one amine curing agent, and optionally a catalytic curing agent and/or a latent curing agent. The process includes applying the curable composition to a supporting substrate to form a layer, partially curing the layer at a first temperature, engraving the partially cured layer, and then completing the curing by heating at a second temperature greater than the first temperature. The less than stoichiometric amount of the amine curing agent guarantees that after the first curing step, epoxy functionalities in the curable composition will be available for second curing step. The optional catalytic curing agent or latent curing agent promotes completion of the cure at higher temperature.

Abstract: A nano-imprint mold includes a mold base; mold body having a first surface and a second surface opposite the first surface; and an elastic body disposed between a surface of the mold base and the first surface of the mold body, the elastic body being composed of resin. The second surface of the mold body is provided with a nano-imprint pattern. In addition, the elastic body has a bulk modulus lower than a bulk modulus of the mold body.

Abstract: A method of forming a resist pattern of high aspect ratio excelling in etching resistance by the use of nanoimprint lithography. The method of forming a resist pattern by nanoimprint lithography comprises the steps of disposing organic layer (4) on support (1); providing resist layer (2) on the organic layer (4) with the use of chemical amplification type negative resist composition containing silsesquioxane resin (A); pressing light transmission allowing mold (3) with partial light shielding portion (5) against the resist layer (2) and thereafter carrying out exposure from the upside of the mold (3); and detaching the mold (3).

Abstract: A method for formation of a polymer film in-situ according to the invention comprises steps of: providing a polymerizable composition in one or multiple parts; prior to completion of polymerization of the polymerizable composition, forming a film therefrom; and initiating polymerization of the polymerizable composition using a radiation source to form the polymer film.

Abstract: A flexible substrate includes a flexible mother substrate and a planarization layer on the flexible mother substrate. Here, the flexible mother substrate includes a transparent textile and a resin layer. The transparent textile includes a plurality of first transparent fibers and a plurality of second transparent fibers crossing the plurality of first transparent fibers, and the resin layer coats the transparent textile to fill a space between the first and second transparent fibers. The planarization layer includes an organic material having a curable contraction rate of no greater than about 20%.

Abstract: Provided are a gas barrier film which has excellent transparency, surface smoothness, gas barrier property and adhesivity and a manufacturing method thereof, and a substrate for an electronic element using the same. The gas barrier film of the present invention has a sheet substrate which contains a surface-modified cellulose nanofiber in which at least a part of hydrogen atoms in a hydroxyl group in a cellulose nanofiber are substituted with acyl groups each having 1 to 8 carbon atoms and has a content of a matrix resin of 10% by mass or less with respect to the total amount of the cellulose nanofiber and the matrix resin, and a gas barrier layer which is formed on at least one surface of the sheet substrate.

Abstract: Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.

Abstract: Disclosed is a method of fabricating a flexible device, which includes surface-treating one or both sides of a carrier plate so that regions with different surface-treatments are formed on the same side of the carrier plate, forming a glass-filler reinforced plastic substrate film on the surface-treated carrier plate, forming thin film patterns on the glass-filler reinforced plastic substrate film, and separating the glass-filler reinforced plastic substrate film having the thin film patterns formed thereon from the carrier plate, and in which the surface-treating of the carrier plate enables the glass-filler reinforced plastic substrate film to be easily separated from the carrier plate without an additional process such as using a solvent or a laser release technique.

Abstract: An imprint material which is in a transparent and homogeneous varnish form, is not peeled off in cross-cut tests, in which the adhesion of coating films is evaluated, and forms films that can have a mold release force of 0.5 g/cm or less. An imprint material including: a component (A): a compound containing at least one alkylene oxide unit having carbon atom number of 2, 3 or 4 and at least two polymerizable groups; a component (B): a photopolymerization initiator; a component (C): a solvent that swells or dissolves a surface portion of a film base material to which the imprint material is applied; and a component (D): a silicone compound.

Abstract: A nanoimprinting method employs a resist composition including polymerizable compounds and a polymerization initiating agent, each having absorption spectrum properties with absorption regions within a range from 250 nm to 500 nm. The polymerization initiating agent has an absorption region with a longer wavelength end wavelength longer than the longer wavelength end wavelength of the absorption region of the polymerizable compounds. Further, exposure of the resist composition is executed by light having spectral intensity properties that satisfy a predetermined relational formula. The present invention enables contamination of molds by adhered matter to be suppressed, and enables formation of resist patterns having sufficient etching resistance by nanoimprinting.

Abstract: Aspects of the present disclosure describe cylindrical molds that may be used to produce cylindrical masks for use in lithography. A structured porous layer may be deposited on an interior surface of a cylinder. A radiation-sensitive material may be deposited over the porous layer in order to fill pores formed in the layer. The radiation-sensitive material in the pores may be cured by exposing the cylinder with a light source. The uncured resist and porous layer may be removed, leaving behind posts on the cylinder's interior surface. It is emphasized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

Abstract: The present invention relates to photocurable elastomer compositions and methods of preparation and use of such compositions for cure-in-place applications such as gaskets. The curable compositions generally include an elastomer component, a monofunctional and/or multifunctional reactant and a photoinitiator that in various aspects may be a visible and/or UV curing initiator. The various components may be present in different amounts, depending on the combination of components and composition desired.

Abstract: A method of making patterned structured solid surfaces is disclosed that includes filling a structured template with backfill material to produce a structured transfer film and laminating the structured transfer film to a receptor substrate. The receptor substrate comprises a patterned adhesion promotion layer. The template layer is capable of being removed from the backfill layer while leaving at least a portion of the structured surface of the backfill layer substantially intact. The backfill layer can include at least two different materials, one of which can be an adhesion promotion layer. In some embodiments the backfill layer includes a silsesquioxane such as polyvinyl silsesquioxane. The structured transfer film is a stable intermediate that can be covered temporarily with a release liner for storage and handling.

Abstract: According to one embodiment, an imprint mask includes a quartz plate. The quartz plate has a plurality of concave sections formed in part of an upper surface on the quartz plate, and impurities are contained in a portion between the concave sections in the quartz plate.

Abstract: An additive building method for building a plurality of layers to form a build stack is provided. The method includes creating a variable potential difference between a conducting element at a first voltage potential and an ion source at a second voltage potential, and creating an electric field between the conducting element and the ion source. The electric field passes through the build stack to a nearest surface of the build stack which is nearest a transfer medium. The method further includes accumulating electric charge from the ion source on the nearest surface of the build stack, and transferring deposition material from a transfer medium onto the nearest surface. The strength of the field at the nearest surface of the build stack is controlled in order to cause a homogenous transfer of the deposition material on to the nearest surface.

Abstract: A substrate having a transparent electrode for a flexible display which has flexibility and transparency and is resistant to stress of bending, and a method of fabricating the same are provided. By forming a transparent electrode of nanowires resistant to stress of bending on a substrate formed of a shape memory polymer (SMP) material, an increase in resistance due to bending can be prevented and the original form can be recovered. The method for fabricating a substrate having a transparent electrode for a flexible display includes: applying a nanowire dispersion solution of methanol to a glass substrate to form a nanowire electrode; coating the glass substrate with the nanowire electrode formed thereon, with an acrylic shape memory polymer (SMP) to form an SMP thin film; curing the SMP thin film through UV irradiation to form an SMP substrate; and removing the glass substrate from the SMP substrate.

Abstract: A pattern transferring apparatus is disclosed which can prevent damage to a transferred pattern and realize fast mold release regardless of the type of resist. The pattern transferring apparatus transfers a pattern formed on a mold to an object by bringing the mold into contact with the apparatus has a deformer which causes deformation in the mold for releasing the mold from the object. The apparatus transfers a pattern formed on a mold to a photo-curing resin by bringing the mold into contact with the photo-curing resin and applying light thereto to cure the photo-curing resin. The apparatus has an optical system which applies light at an irradiation light intensity to a non-transfer area other than a transfer area where the pattern is to be transferred in the photo-curing resin, the intensity being different from an irradiation light intensity of light applied to the transfer area.

Abstract: An electronic device contains circuitry such as radio-frequency transceiver circuitry and antenna structures that are coupled using transmission line paths such as coaxial cable paths. A coaxial cable is mounted within an electronic device housing cable mounting structures. The coaxial cable has a meandering portion that forms a service loop. The cable mounting structures includes grooves that receive the meandering portion of the cable. The grooves may be formed within a molded plastic body. Patterned metal may be formed on the surface of the molded plastic body using laser-based processing techniques. The cable in the meandering portion may have a segment in which an outer cable conductor is exposed. The patterned metal on the molded plastic body may short the exposed outer conductor to the electronic device housing or other ground structure.

Abstract: An imprint apparatus for coating a substrate with a resin by a coating mechanism, and curing the resin while pressing at least one of the substrate and a mold against the other, includes a measurement device configured to detect a position of the coating mechanism, a substrate stage configured to hold a substrate, a positioning system configured to position the substrate stage, and a controller configured to control positioning of the substrate stage by the positioning system, based on the measurement result.

Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.

Abstract: The present disclosure relates to mold components and imprint lithography techniques applied on the basis of organic mold materials in order to form polymer microstructure elements. It has been recognized that adapting surface characteristics of at least one mold component may significantly enhance performance of the lithography process, in particular with respect to suppressing residual polymer material, which in conventional strategies may have to be removed on the basis of an additional etch process.

Abstract: A method for preparing an article having an uneven microstructure on a surface thereof, including coating a surface of a mold having an uneven microstructure formed from an anodized alumina oxide on a surface with a release treatment solution including a mold release agent that includes one or more kinds of phosphoric ester compound and the pH of the aqueous solution when extracted with 50 mL of water with respect to 1 g of the mold release agent is 3.0 or more; and interposing an active energy ray curable resin composition including a polymerizable compound, a polymerization initiator, and an internal release agent between the mold and the substrate, and curing the active energy ray curable resin composition by the irradiation with active energy rays to form a cured resin layer having the uneven microstructure transferred on a surface of the substrate.

Abstract: A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.

Abstract: Positive-working lithographic printing plate precursors comprise a substrate surface having an average oxide pore diameter of 15 to 80 nm. On this, a crosslinked hydrophilic inner layer is formed using a formulation comprising: (1) a hydrophilic polymer having recurring —CH2—CH(OH)— units, (2) a crosslinking agent for these units having at least two aldehyde groups, and (3) an acidic compound. An oleophilic outer layer formulation comprises: (a) an infrared radiation absorber, and (b) an oleophilic polymer having at least 10 mol % randomly recurring —CH2—CH(OH)— units, within an organic solvent solution, and dried to form a composite structure. The composite structure is heated so its surface exhibits less than 10% optical density change within a first rectangular area (width W1 and length L1) centered inside a second rectangular area (width W2 and length L2), where the surface is subjected to 1000 rubs according to ASTM D3181 using the organic solvent solution.

Abstract: A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.

Abstract: A structure (100) comprises a transparent substrate (110) having a surface (104), and the surface (104) has a three dimensional pattern (310) resulting from a combination of at least two surface waves (312, 314, 316). The at least two surface waves (312, 314, 316) differ in wavelength by in maximum 50% based on the wavelength of the wave of the at least two surface waves (312, 314, 316) having the bigger wavelength. Each wavelength of the at least two waves (312, 314, 316) is selected from the range of 200 to 900 nm. The structure (100) may be integrated into plastic films or sheets or glazings, especially for the purpose of light management.

Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below.

Abstract: A system and method for controlling curl in multi-layer webs. The method can include providing a coated web, curing the coating to form a multi-layer web, and stretching the web during curing of the coating. Some coatings shrink at least partially when cured such that curing the coating induces a strain in the multi-layer web. Stretching the web occurs during curing to induce an opposing strain that at least partially counteracts the strain induced by curing to form a multi-layer web having a desired curvature. The system can include a curing section configured to cure the coating, and can further include a web stretching section, which can be located proximate the curing section and can be substantially coincident with the curing section, such that the web is stretched while the coating is cured.

Abstract: An imprint apparatus performs includes an irradiation unit which irradiates a resin on a substrate with light, and a control unit which controls the irradiation unit. The imprinting is performed in an edge shot region, including an edge of the substrate, of a plurality of shot regions on the substrate. The edge shot region includes a pattern forming region where a pattern is to be formed, and a near-edge region closer to a side of the edge than the pattern forming region, and the control unit controls the irradiation unit to irradiate the resin which spreads from a position on the pattern forming region to a position on the near-edge region as the pattern surface comes into contact with the resin in the pattern forming region.

Abstract: In one aspect, build materials operable for use in 3D printing systems are described herein. In some embodiments, a build material comprises about 10 to 30 percent by weight of an oligomeric curable material; about 50 to 75 percent by weight of at least one diluent; and about 3 to 15 percent by weight of a reactive component. Moreover, in some cases, the build material is free or substantially free of a non-reactive wax component.

Abstract: A nanoimprint lithography method, including: pressing a mold in a photosensitive resin to form at least one imprint pattern defined by a stamped area and an adjacent area, the adjacent area being less stamped or not stamped at all, and being thicker than the stamped area; and exposure to a certain amount of sunlight. Respective thicknesses of the two areas are defined such that the two areas absorb a different amount of the sunlight and the amount of sunlight provided by the exposure is predetermined so as to be great enough to activate the resin in whichever of the two areas has the greater absorption, and so as not to be great enough to activate the other of the two areas.

Abstract: A micro-conformal nanoimprint lithography template includes a backing layer and a nanopatterned layer adhered to the backing layer. The elastic modulus of the backing layer exceeds the elastic modulus of the nanopatterned layer. The micro-conformal nanoimprint lithography template can be used to form a patterned layer from an imprint resist on a substrate, the substrate having a micron-scale defect, such that an excluded distance from an exterior surface of the micron-scale defect to the patterned layer formed by the nanoimprint lithography template is less than a height of the defect. The nanoimprint lithography template can be used to form multiple imprints with no reduction in feature fidelity.