Abstract: In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum.

Abstract: A device is described herein which may comprise a chamber, a fluid line, a pressurized source material in the fluid line, a component restricting flow of the source material into the chamber, a sensor measuring flow of a fluid in the fluid line and providing a signal indicative thereof, and a pressure relief valve responsive to a signal to reduce a leak of source material into the chamber in the event of a failure of the component.

Abstract: A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.

Abstract: Preferred embodiments of the present invention include microplasma jet devices and arrays in various materials, and low temperature microplasma jet devices and arrays. These include preferred embodiment single microplasma jet devices and arrays of devices formed in monolithic polymer blocks with elongated microcavities. The arrays can be densely packed, for example having 100 jets in an area of a few square centimeters. Additional embodiments include metal/metal oxide microplasma jet devices that have micronozzles defined in the metal oxide itself. Methods of fabrication of microplasma jet devices are also provided by the invention, and the methods have been demonstrated as being capable of producing tailored micronozzle contours that are unitary with the material insulating electrodes.

Abstract: Embodiments of the present invention relate to hollow cathode plasma sources with improved uniformity. One embodiment of the present invention provides a hollow cathode assembly having a conductive rod disposed in an inner volume along a central axis of a hollow cathode. The conductive rod being closest to the ground electrode and having the sharpest features of the hollow cathode becomes the point of plasma ignition. Since the conductive rod is positioned along the central axis, the plasma is ignited at symmetrically about the central axis thus improving plasma uniformity and reducing skews.

Abstract: A photon source includes a plasma source for generating plasma and a photon guide through which the plasma travels. The photon guide includes an inner surface configured for reflecting photons emitted from the plasma. As the plasma travels through the photon guide, plasma electrons and ions recombine at the inner surface, whereby the predominant species emitted from an outlet of the photon guide are the photons and neutral particles, with few or no plasma electrons and ions being emitted.

Abstract: A plasma actuator (1) includes four electrodes (11) and three dielectrics (10) and is disposed on the side of an object surface (B). When a high voltage is applied to the electrodes (11), a plasma (15) is generated at an end (10a) of each dielectric (10) exposed so as to be accessible to a gas. In the plasma actuator (1), the electrodes (11) and dielectrics (10) are alternately stacked one on another. The plasma actuator (1) includes a stepped exposed portion (X). The plasma actuator (1) in which the electrodes (11) and dielectrics (10) are arranged such that the ends (10a) of the dielectrics (10) are exposed in the normal line direction of the object surface (B) in the stacked order in the stepped exposed portion (X) can suppress the flow of the generated plasma even when the plasma actuator is exposed to a high-speed airflow under high pressure. This stabilizes the plasma.

Abstract: In an ignition circuit for igniting a plasma fed with alternating power in a gas discharge chamber, having two line sections for connection to an alternating power source and at least one line section for connection to a housing earth of the gas discharge chamber, at least one series connection of a non-linear element and an energy store is connected between the line sections for connection to an alternating power source, and the line section for connection to a housing earth of the gas discharge chamber is connected to a connection node between an energy store and a non-linear element.

Abstract: A laser-sustained plasma illuminator system includes at least one laser light source to provide light. At least one reflector focuses the light from the laser light source at a focal point of the reflector. An enclosure substantially filled with a gas is positioned at or near the focal point of the reflector. The light from the laser light source at least partially sustains a plasma contained in the enclosure. The enclosure has at least one wall with a thickness that is varied to compensate for optical aberrations in the system.

Abstract: A device and method to produce a hot, dense, long-lived plasma. In one embodiment, a large electric current is passed through an outer tube enclosing in part a piston, a notched conducting rod and central electrode. Electromagnetic forces accelerate the piston to a point high enough to mechanically separate the conducting rod at the location of the notch before the conducting rod is melted. On separation, a plasma is generated by the passage of electric current though a gas produced by vaporization of the conducting rod and nearby materials. An insulator enclosed within the tube prevents the plasma from shorting to the outer tube until the current flow has produced a sufficient magnetic field to contain the plasma. The piston is then accelerated by a combination of electromagnetic forces and mechanical pressure from the hot gas through which the electric current is passing.

Abstract: A plasma system is disclosed. The system includes a plasma device including an inner electrode and an outer electrode coaxially disposed around the inner electrode, wherein at least one of the inner electrode and the outer electrode is temperature controlled; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the inner and outer electrodes and configured to ignite the ionizable media at the plasma device to form a plasma effluent.

Abstract: A plasma device is disclosed. The plasma device includes: at least one electrode including a nanoporous dielectric layer disposed on at least a portion thereof, the nanoporous dielectric layer including a plurality of pores, wherein at least a portion of the plurality of pores include a catalyst embedded therein.

Abstract: A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode on the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts.

Abstract: A wafer inspection system includes a laser sustained plasma (LSP) light source that generates light with sufficient radiance to enable bright field inspection. Reliability of the LSP light source is improved by introducing an amount of water into the bulb containing the gas mixture that generates the plasma. Radiation generated by the plasma includes substantial radiance in a wavelength range below approximately 190 nanometers that causes damage to the materials used to construct the bulb. The water vapor acts as an absorber of radiation generated by the plasma in the wavelength range that causes damage. In some examples, a predetermined amount of water is introduced into the bulb to provide sufficient absorption. In some other examples, the temperature of a portion of the bulb containing an amount of condensed water is regulate to produce the desired partial pressure of water in the bulb.

Abstract: Disclosed is a plasma processing apparatus including a mounting table within a processing container. The mounting table includes a lower electrode. A shower head constituting an upper electrode is provided above the mounting table. A gas inlet tube is provided above the shower head. The shower head includes a plurality of downwardly opened gas ejection holes, and first and second separate gas diffusion chambers on the gas ejection holes. The first gas diffusion chamber extends along a central axis that passes through a center of the mounting table. The second gas diffusion chamber extends circumferentially around the first gas diffusion chamber. The gas inlet tube includes a cylindrical first tube wall and a cylindrical second tube wall provided outside the first tube wall, and defines a first gas inlet path inside the first tube wall, and a second gas inlet path between the first and second tube walls.

Abstract: A plasma generator having a housing surrounding an ionization chamber, at least one working-fluid supply line leading into the ionization chamber, the ionization chamber having at least one outlet opening, at least one electric coil arrangement which surrounds at least one area of the ionization chamber, the coil arrangement being electrically connected with a high-frequency alternating-current source (AC) which is constructed such that it applies a high-frequency electric alternating current to at least one coil of the coil arrangement, is wherein a further current source (DC) is provided which is constructed such that it applies a direct voltage or an alternating voltage of a frequency lower than that of the voltage supplied by the high-frequency alternating current source (AC) to at least one coil of the coil arrangement.

Abstract: In one embodiment an ion source includes an arc chamber and an emitter having a surface disposed in the arc chamber, where the emitter is configured to generate a plasma in the arc chamber. The ion source further includes a repeller having a repeller surface positioned opposite the emitter surface, and a hollow cathode coupled to the repeller and configured to provide a feed material into the arc chamber.

Abstract: A plasma gun with two gap electrodes on opposite ends of a chamber of ablative material such as an ablative polymer. The gun ejects an ablative plasma at supersonic speed. A divergent nozzle spreads the plasma jet to fill a gap between electrodes of a main arc device, such as an arc crowbar or a high voltage power switch. The plasma triggers the main arc device by lowering the impedance of the main arc gap via the ablative plasma to provide a conductive path between the main electrodes. This provides faster triggering and requires less trigger energy than previous arc triggers. It also provides a more conductive initial main arc than previously possible. The initial properties of the main arc are controllable by the plasma properties, which are in turn controllable by design parameters of the ablative plasma gun.

Abstract: A microwave resonant cavity is provided. The microwave resonant cavity includes: a sidewall having a generally cylindrical hollow shape; a gas flow tube disposed inside the sidewall and having a longitudinal axis substantially parallel to a longitudinal axis of the sidewall; a plurality of microwave waveguides, each microwave waveguide having a longitudinal axis substantially perpendicular to the longitudinal axis of the sidewall and having a distal end secured to the sidewall and aligned with a corresponding one of a plurality of holes formed on the sidewall; a top plate secured to one end of the sidewall; and a sliding short circuit having: a disk slidably mounted between the sidewall and the gas flow tube; and at least one bar disposed inside the sidewall and arranged parallel to the longitudinal axis of the sidewall.

Abstract: The plasma generator has the dielectric having the inner circumferential surface, and a pair of electrodes which are arranged separated from each other in the direction along the inner circumferential surface and are isolated from each other by the dielectric and which are capable of generating plasma on the inner circumferential surface by application of voltage. In the inner circumferential surface, at the positions between the pair of electrodes in a plan view, recessed portions causing electric field concentration are formed.

Abstract: A plasma source for providing dissociated gas to semiconductor process chamber is provided. The plasma chamber can have at least one gas inlet and at least one chamber wall for containing the gas, a plurality of magnetic cores disposed relative to the plasma chamber such that the plasma chamber passes through each of the plurality of magnetic cores. A primary winding can be coupled to the plurality of magnetic cores. The plasma chamber can generate a toroidal plasma along a plane extending through the plasma chamber and which is at least substantially parallel to a top surface of a sample holder disposed within the semiconductor process chamber.

Abstract: A plasma source for generating nonlinear, wide-band, periodic, directed, elastic oscillations in a fluid medium. The plasma source includes a plasma emitter having two electrodes defining a gap, a delivery device for introducing a metal conductor into the gap, and a high voltage transformer for powering the plasma emitter. A system and method for stimulating wells, deposits, and boreholes through controlled periodic oscillations generated using the plasma source. The system includes the plasma source, a ground control unit, and a support cable. In the method, the plasma source is submerged in the fluid medium of a well, deposit, or borehole and is used to create a metallic plasma in the gap. The metallic plasma emits a pressure pulse and shockwaves, which are directed into the fluid medium. Nonlinear, wide-band, periodic and elastic oscillations are generated in the fluid medium, including resonant oscillations by passage of the shockwaves.

Abstract: A plasma generator includes: a liquid containing part containing water; a gas containing part; and a partition wall part that separates the liquid containing part and the gas containing part and is provided with a gas passage through which the gas in the gas containing part is led to the liquid containing part. The plasma generator is also provided with a first electrode arranged in the gas containing part and a second electrode arranged to be in contact with the liquid in the liquid containing part. The plasma generator is further provided with: a gas supply unit which supplies the gas to the gas containing part; a plasma power supply unit; and a projected part which serves as a drainage promotion part that prevents the liquid from remaining in the gas passage after the liquid in the liquid containing part is drained.

Abstract: An apparatus for generating plasma, comprises: a microwave generator configured to generate a microwave; a wave guide which is connected to the microwave generator, wherein the wave guide is elongated in a traveling direction of the microwave and has a hollow shape having a rectangular section in a direction perpendicular to the traveling direction; a gas feeder which is connected to the wave guide and feeds process gas into the wave guide; and an antenna unit which is a part of the wave guide and discharges plasma generated by the microwave to the outside, wherein the antenna unit has one or more slots formed on a wall constituting a short side in a section of the antenna unit, plasmarizes the process gas fed into the wave guide under an atmospheric pressure in the slots by the microwave, and discharges the plasma out of the slots.

Abstract: In one embodiment, a method for generating an ion beam having gallium ions includes providing at least a portion of a gallium compound target in a plasma chamber, the gallium compound target comprising gallium and at least one additional element. The method also includes initiating a plasma in the plasma chamber using at least one gaseous species and providing a source of gaseous etchant species to react with the gallium compound target to form a volatile gallium species.

Abstract: Apparatus for the production of a charged particle beam, comprising: an ion source plasma chamber (104), having a door (106), and an accelerator (102) mounted on the face of the door remote from the ion source plasma chamber.

Abstract: Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode.

Abstract: A threaded connection for an electrode holder and an electrode in a plasma arc torch is provided. The threaded connection has relatively low height, and the engaged portion of a male threaded portion of the electrode and a female threaded portion of the electrode holder are positioned at least partially within a nozzle chamber. In one inventive aspect, the nominal pitch diameter of the electrode is less than the minor diameter of the electrode. In another, the width of the root area of the electrode thread is wider than the width of the root area of the electrode holder thread by at least about 35%. The width of the root area of the electrode is at least about 15% wider than the width of the crest portion of the electrode. As such, the less consumable of the two parts, the electrode holder, is provided with a thread that is less likely to be worn and damaged. In one particular embodiment, the crest profile of the electrode is that of a Stub Acme thread separated by a larger root profile.

Abstract: A glow discharge spectrometer discharge lamp includes: a lamp body having a vacuum enclosure connected to pump elements and to injector elements for injecting an inert gas into the enclosure; a hollow cylindrical first electrode of longitudinal axis X-X?; a second electrode for receiving a sample for analysis and for holding the sample facing one end of the cylindrical electrode; electric field generator including an applicator for applying to the terminals of the electrodes an electric field that is continuous, pulsed, radiofrequency, or hybrid, and suitable for generating a glow discharge plasma in the presence of the gas; coupler elements for coupling the discharge lamp to a spectrometer suitable for measuring at least one component of the plasma; and magnetic field generator elements for generating a magnetic field having field lines oriented along the axis X-X?, the magnetic field being uniform in orientation and in intensity over an area of the sample that is not less than the inside area of the hollow

Abstract: A method for generating radiation includes supplying a fuel to a discharge space, creating a discharge in the fuel to form a plasma, and reducing a volume defined by the plasma by controlling radiation emission by the plasma. The reducing includes supplying a substance including at least one of Ga, In, Bi, Pb or Al to the plasma to control the radiation emission.

Abstract: The present invention provides a glow discharge cell comprising an electrically conductive cylindrical vessel having a first end and a second end, and at least one inlet and one outlet; a hollow electrode aligned with a longitudinal axis of the cylindrical vessel and extending at least from the first end to the second end of the cylindrical vessel, wherein the hollow electrode has an inlet and an outlet; a first insulator that seals the first end of the cylindrical vessel around the hollow electrode and maintains a substantially equidistant gap between the cylindrical vessel and the hollow electrode; a second insulator that seals the second end of the cylindrical vessel around the hollow electrode and maintains the substantially equidistant gap between the cylindrical vessel and the hollow electrode; a non-conductive granular material disposed within the gap, wherein the non-conductive granular material (a) allows an electrically conductive fluid to flow between the cylindrical vessel and the hollow electrode

Abstract: An ionization device comprises: a plasma source configured to generate a plasma. The plasma comprises light, plasma ions and plasma electrons. The plasma source comprises an aperture disposed such that at least part of the light passes through the aperture and is incident on a gas sample. The ionization device further comprises an ionization region; and a plasma deflection device comprising a plurality of electrodes configured to establish an electric field, wherein the electric field substantially prevents the plasma ions from entering the ionization region.

Abstract: A plasma generating apparatus includes a linear electrode for generating a high voltage by resonance caused when the linear electrode is supplied with an AC signal current, an grounded electrode for defining an internal space spaced from the linear electrode around the linear electrode, and a control device for controlling the power feed to the linear electrode. The control device has a field probe for measuring the electric field in the internal space, and a bandpass filter for filtering the measurement signal into a predetermined frequency band to output an AC signal, a variable phase shifter for shifting the phase of the AC signal so that the AC signal is synchronized with the resonance signal in the internal space when the AC signal is supplied to the linear electrode as a current, and an amplifier for amplifying the AC signal of which the phase is shifted.

Abstract: A system and a method of generating radiation and/or particle emissions are disclosed. In at least some embodiments, the system includes at least one laser source that generates a first pulse and a second pulse in temporal succession, and a target, where the target (or at least a portion the target) becomes a plasma upon being exposed to the first pulse. The plasma expand after the exposure to the first pulse, the expanded plasma is then exposed to the second pulse, and at least one of a radiation emission and a particle emission occurs after the exposure to the second pulse. In at least some embodiments, the target is a solid piece of material, and/or a time period between the first and second pulses is less than 1 microsecond (e.g., 840 ns).

Abstract: The plasma shield device (13) comprises a hollow structure (40) made of monocrystal body of silicon carbide and having an inside space (40a) and a first and second openings (40b,40c) which are opposed to each other across the inside space. During operation of the plasma generation apparatus, the internal space of the hollow structure forms a discharge zone in which the plasma is generated. Discharge gas is supplied to the internal space of the hollow structure through the first opening and the EUV radiation is mainly emitted through the second opening.

Abstract: A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.

Abstract: A plasma treatment equipment includes: a plasma starting and stabilizing unit (A) having an insulating material such as a dielectric material having an elongated hole connecting to a plasma ejection portion, a triggering and discharge-stabilizing electrode, and an intense electric field electrode mounted thereon; and a plasma generating unit (B) including the insulating material having the elongated hole and a plasma generating electrode configured to perform main plasma generation at the time of operation, wherein the triggering and discharge-stabilizing electrode, the intense electric field electrode, and the plasma generating electrode are provided in such a manner that all the electrodes are not exposed and covered with the dielectric material for the entire space of one or more of the elongated hole which allows passage of gas from the upstream, starting of the plasma and generation of the plasma, and ejection of the plasma jet.

Abstract: An embodiment of the invention is a microcavity plasma device that can be controlled by a low voltage electron emitter. The microcavity plasma device includes driving electrodes disposed proximate to a microcavity and arranged to contribute to generation of plasma in the microcavity upon application of a driving voltage. An electron emitter is arranged to emit electrons into the microcavity upon application of a control voltage. The electron emitter is an electron source having an insulator layer defining a tunneling region. The microplasma itself can serve as a second electrode necessary to energize the electron emitter. While a voltage comparable to previous microcavity plasma devices is still imposed across the microcavity plasma devices, control of the devices can be accomplished at high speeds and with a small voltage, e.g., about 5V to 30V in preferred embodiments.

Abstract: A top plate assembly is positioned above and spaced apart from the substrate support, such that a processing region exists between the top plate assembly and the substrate support. The top plate assembly includes a central plasma generation microchamber and a plurality of annular-shaped plasma generation microchambers positioned in a concentric manner about the central plasma generation microchamber. Adjacently positioned ones of the central and annular-shaped plasma generation microchambers are spaced apart from each other so as to form a number of axial exhaust vents therebetween. Each of the central and annular-shaped plasma generation microchambers is defined to generate a corresponding plasma therein and supply reactive constituents of its plasma to the processing region between the top plate assembly and the substrate support.

Abstract: A device for forming at an ambient atmospheric pressure a gaseous plasma comprising active species for treatment of a treatment region. The device comprises a plasma cell for forming the gaseous plasma for treating the treatment region. The plasma cell comprises an inlet for receiving gas from a source and an outlet for discharging active species generated in the cell. A dielectric substrate made of a polyimide encloses the flow path for gas conveyed from the inlet to the outlet and an electrode is formed on the dielectric substrate for energising gas along the flow path to form the active species. A protective coating or lining is located on an inner surface of the dielectric substrate for resisting reaction of the active species generated in the plasma cell with the material of the dielectric substrate.

Abstract: A radio frequency (RF) power coupling system is provided. The system has an RF electrode configured to couple RF power to plasma in a plasma processing system, multiple power coupling elements configured to electrically couple RF power at multiple power coupling locations on the RF electrode, and an RF power system coupled to the multiple power coupling elements, and configured to couple an RF power signal to each of the multiple power coupling elements. The multiple power coupling elements include a center element located at the center of the RF electrode and peripheral elements located off-center from the center of the RF electrode. A first peripheral RF power signal differs from a second peripheral RF power signal in phase.

Abstract: A plasmon generator configured to excite a surface plasmon based on light includes a first portion formed of a first metal material and a second portion formed of a second metal material different from the first metal material. The plasmon generator has a front end face. The front end face includes a near-field light generating part that generates near-field light based on the surface plasmon. The second portion includes an end face located in the front end face. The second metal material satisfies at least one of the following requirements: a lower ionization tendency than that of the first metal material; a lower electrical conductivity than that of the first metal material; and a higher Vickers hardness than that of the first metal material.

Abstract: A RF electrode for generating, plasma in a plasma chamber comprising an optical feedthrough. A plasma chamber comprising an RF electrode and a counter-electrode with a substrate support for holding a substrate, wherein a high-frequency alternating field for generating the plasma can be formed between the RF electrode and the counter-electrode. The chamber comprising an RF electrode with an optical feedthrough. A method, for in situ analysis or in situ processing of a layer or plasma in a plasma chamber, wherein the layer is disposed on counter-electrode and an RF electrode is: disposed on the side lacing the layer. Selection of an RF electrode having an optical feedthrough, and at least one step in which electromagnetic radiation is supplied through the optical feedthrough for purposes of analysis or processing of the layer or the plasma, and by at least one other step in which the scattered or emitted or reflected radiation is supplied to an analysis unit.

Abstract: An RF electrodeless plasma lamp with improved efficiency in higher lumens per watt includes a waveguide body, in which an RF signal drives the entire structure at the resonant frequency of the structure. The resonant frequency of the structure is lowered by increasing the overall capacitance of the waveguide body by adding at least two layers of dielectric material between the input feed and the bulb of the lamp. The layered structure can include an air cavity disposed between a dielectric layer and the input feed. In lowering the resonant frequency of the lamp, the device is capable of using RF amplifiers that have higher efficiency, and thus has a higher lumens per watt ratio.

Abstract: A microplasma device includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel. At least one of the electrodes is encapsulated within the thick metal oxide layer. A method of fabricating a microcavity or microchannel plasma device includes anodizing a flat or gently curved or gently sloped metal substrate to form a thick layer of metal oxide consisting essentially of nanopores that are perpendicular to the surface of the metal substrate. Material removal is conducted to remove metal oxide material to form a microcavity or microchannel in the thick layer of metal oxide.

Abstract: Some embodiments relate to an electrical contact assembly for a plasma torch tip, and may include an electrical contact portion, a compressible portion in mechanical communication with the contact, and a mounting portion in mechanical communication with the compressible portion. Some embodiments may be adapted to maintain contact with an uneven substrate during translation of the torch tip.

Abstract: A device is provided having a flow passage with at least one surface and at least one electrode pair positioned thereon for effecting fluid flow through the flow passage. When at least one electrode of an electrode pair of the at least one electrode pair is powered, a sheath region is generated in the flow passage, wherein the sheath region has a high electric field relative to the remainder of the flow passage. In an embodiment, one electrode of the electrode pair is separated from the other electrode of the electrode pair by a horizontal, vertical, depth, and/or total distance of about 1 microns.

Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.

Abstract: The invention relates to a device and a method for generating a pulsed (intermittent), cold, atmospheric pressure plasma, preferably a thread, for precise antimicrobial plasma treatment (antisepsis, disinfection, sterilization, decontamination) of very small surfaces and cavities, including on living human and animal bodies, preferably in the field of medicine, by means of a negative direct-current corona discharge, the device comprising at least one electrode for generating high field strengths, through or around which electrode the gas to be ionized flows in a gas channel, wherein the electrically conductive structure (surface, cavity) to be treated is used as the counter-electrode. Said plasma can also be used in general for cleaning, coating, activating, and etching surfaces.

Abstract: A plasma processing system with a multi-grid arrangement is provided. The system includes a plurality of grids, which includes at least a beam grid, a ground grid and a suppressor grid. The beam grid is positioned facing a plasma producing area, wherein the beam grid having similar electrical potential as a plasma. The ground grid is positioned to face a substrate during substrate processing and is configured to be electrically grounded. The suppressor grid is positioned between the beam grid and the ground grid and is configured to be negatively charged. The plurality of grids further includes a set of grid mounting posts configured for at least one of stabilizing said multi-grid arrangement, spatially separating adjacent grids, and fastening the plurality of grids into the multi-grid arrangement.