Arc Discharge Type Patents (Class 313/231.41)
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Patent number: 8097828Abstract: Apparatus and methods for thermally processing a workpiece include directing a plasma arc to the workpiece and using a dielectric shield or dielectric coating to protect a forward portion (e.g., a torch head) of a plasma arc torch. The dielectric shield or dielectric coating covers a nozzle disposed within the torch head and protects the nozzle from the effects of slag and double arcing. The shield also improves operator visibility due to the spatial relationship between the dielectric shield and the nozzle.Type: GrantFiled: December 22, 2006Date of Patent: January 17, 2012Assignee: Hypertherm, Inc.Inventors: Jesse A. Roberts, Michael F. Kornprobst, David Jonathan Cook
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Patent number: 8040030Abstract: The present invention relates to a method of increasing the conversion efficiency of an EUV and/or soft X-ray lamp, in which a discharge plasma (8) emitting EUV radiation or soft X-rays is generated in a gaseous medium formed by an evaporated liquid material in a discharge space, said liquid material being provided on a surface in the discharge space and being at least partially evaporated by an energy beam (9). The invention also refers to a corresponding apparatus for producing EUV radiation and/or soft X-rays. In the method, a gas (11) composed of chemical elements having a lower mass number than chemical elements of the liquid material is supplied through at least one nozzle (10) in a directed manner to the discharge space and/or to the liquid material on a supply path to the discharge space in order to reduce the density of the evaporated liquid material in the discharge space. With the present method and corresponding apparatus the conversion efficiency of the lamp is increased.Type: GrantFiled: May 8, 2007Date of Patent: October 18, 2011Assignee: Koninklijke Philips Electronics N.V.Inventors: Jeroen Jonkers, Dominik Marcel Vaudrevange
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Patent number: 8007641Abstract: An arc discharge detection device is used for detecting arc discharges in a plasma process. The arc discharge detection device includes a comparator to which an instantaneous signal and a reference value are supplied. The reference value is formed by a setting means from an extreme value of the signal. The extreme value is determined by an extreme value detection device within a predetermined time period, and the comparator changes the state of an arc discharge detection signal when the comparison between the reference value and an instantaneous value of the signal shows that an arc discharge has occurred.Type: GrantFiled: September 22, 2006Date of Patent: August 30, 2011Assignee: HUETTINGER Elektronik GmbH + Co. KGInventors: Markus Winterhalter, Peter Wiedemuth
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Patent number: 7977599Abstract: An erosion resistant torch for use in a solid free form fabrication system for manufacturing a component from successive layers of metal feedstock material. The erosion resistant torch includes a torch structure defining a torch nozzle formed of a highly conductive bulk material. The erosion resistant torch further includes a gas flow channel and an orifice defined therein. An arc electrode is disposed within the gas flow channel. An erosion resistant material is disposed between the torch nozzle and the arc electrode in the form of a coating layer or an erosion resistant insert. The erosion resistant material is formed of one of a refractory material or a ceramic material.Type: GrantFiled: November 29, 2007Date of Patent: July 12, 2011Assignee: Honeywell International Inc.Inventor: Robbie J. Adams
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Patent number: 7935909Abstract: Methods and devices for controlling the flow of gases through a plasma arc torch are provided. A flow of plasma gas is directed to a plasma chamber, a first flow of auxiliary gas is directed around a plasma stream that exits a tip in one of a swirling manner and a radial manner, and a second flow of auxiliary gas is directed around the first flow of auxiliary gas and the plasma stream in one of a coaxial manner, an angled manner, and a radial manner. The first flow of auxiliary gas functions to constrict and shape the plasma stream to improve cut quality and cut speed, and the second flow of auxiliary gas functions to protect the plasma arc torch during piercing and cutting and to cool components of the plasma arc torch such that thicker workpieces may be processed with a highly shaped plasma stream.Type: GrantFiled: September 4, 2007Date of Patent: May 3, 2011Assignee: Thermal Dynamics CorporationInventors: Nakhleh A. Hussary, Christopher J. Conway, Thierry R. Renault, Darrin H. MacKenzie
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Publication number: 20110018423Abstract: A proposed indirect heated cathode has an inner tubular shell inserted into an arc chamber for creating plasma by a filament, which is disposed in the inner tubular shell and then covered by an end cap. There are at least two outstanding talons disposed on the end surface of the inner tubular shell, and a step gap is configured on between the end surface of the inner tubular shell and the outstanding talons. The end cap can be lodged into the step gap, and fixed. Therefore, the end cap can be easily uncovered from the end of the inner tubular shell, as a result to simplify the replacement of the filament.Type: ApplicationFiled: July 27, 2009Publication date: January 27, 2011Inventors: Terry SHENG, Linnan CHEN, Jason HONG
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Patent number: 7872207Abstract: A cascade source includes a cathode housing, a number of cascade plates insulated from each other and stacked on top of each other which together bound at least one plasma channel, and an anode plate provided with an outflow opening connecting to the plasma channel. One cathode is provided per plasma channel, which cathode includes an electrode which is adjustable relative to the cathode housing in the direction of the plasma channel. The clamp may be of the collet chuck type. At least a part of the housing of the source may be substantially transparent. A method for controlling the cascade source in use includes monitoring the electromagnetic radiation of the plasma through the substantially transparent housing part, and, dependent on the monitored radiation, controlling the plasma forming process in the source by variation of the gas supply, or variation of the potential difference between the cathode and the anode or a combination thereof.Type: GrantFiled: May 19, 2004Date of Patent: January 18, 2011Assignee: OTB Solar B.V.Inventors: Martin D. Bijker, Leonardus P. M. Clijsen, Franciscus C. Dings, Remco L. J. R. Pennings
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Publication number: 20100300335Abstract: An AC plasma ejection gun, the method for supplying power to the gun and a pulverized coal burner are provided.Type: ApplicationFiled: June 28, 2010Publication date: December 2, 2010Applicant: Beijing GuangYao Electricity Equipment Co. LtdInventors: Hujun ZHAO, Bin LI, Di JIANG, Guangrong CHEN, Zhaojun ZHANG, Dezhe NAN
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Patent number: 7786455Abstract: An apparatus for producing light includes a chamber and an ignition source that ionizes a gas within the chamber. The apparatus also includes at least one laser that provides energy to the ionized gas within the chamber to produce a high brightness light. The laser can provide a substantially continuous amount of energy to the ionized gas to generate a substantially continuous high brightness light.Type: GrantFiled: April 2, 2007Date of Patent: August 31, 2010Assignee: Energetiq Technology, Inc.Inventor: Donald K. Smith
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Publication number: 20100102174Abstract: Embodiments of the subject invention relate to a Wingless Hovering Micro Air Vehicle (WHOMAV) and its Power Source Unit (PSU). Embodiments can operate at reasonable power levels for hovering and withstanding expected wind gusts. Embodiments of the subject invention can have a diameter less than 15 cm. Embodiments can have one or more smooth (continuous curvature) surface and can be operated using electromagnetic and electrohydrodynamic principles. The wingless design of specific embodiments can allow operation with no rotating or moving components. Additional embodiments can allow active response to the surrounding flow conditions. The issue of low lift to drag ratio and degradation of airfoil efficiency due to the inability of laminar boundary layers attachment can also be significantly reduced, or eliminated.Type: ApplicationFiled: December 23, 2008Publication date: April 29, 2010Applicant: University of Florida Research Foundation, Inc.Inventor: Subrata Roy
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Publication number: 20100089742Abstract: A device and a method for generating a truly pulsed plasma flow are disclosed. The device includes a cathode assembly comprising a cathode and a cathode holder, an anode, and two or more intermediate electrodes, the anode and the intermediate electrodes forming a plasma channel expanding toward the anode. The intermediate electrode closest to the cathode may form a plasma chamber around the cathode tip. An extension nozzle forming an extension channel having a tubular insulator along at least a portion of its interior surface is affixed to the anode end of the device. During operation, a voltage is applied between the cathode and the anode and a current is passed through the cathode, the plasma, and the anode. The voltage and current profiles are selected to cause the rapid development of a plasma flow with required characteristics. A substantially uniform temperature and power density distribution of the plasma pulse is achieved in the extension nozzle.Type: ApplicationFiled: September 11, 2009Publication date: April 15, 2010Inventor: Nikolay Suslov
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Patent number: 7679025Abstract: An apparatus for the formation of a dense plasma focus (DPF) has a center electrode formed about an axis, where the center electrode includes a cylindrical part and a tapered part. An outer electrode is formed about the center electrode, and may be either cylindrical, tapered, or formed from a plurality of individual conductors including a helical conductor arrangement surrounding the tapered region of the center conductor. The taper of the center electrode results in an enhanced azimuthal B field in the final region of the device, resulting in increased plasma velocity prior to the dense plasma focus. Using the outer electrode helical structure an auxiliary axial B field is generated during the final acceleration region of the plasma, which reduces axial modal tearing of the plasma in the final acceleration region.Type: GrantFiled: February 4, 2005Date of Patent: March 16, 2010Inventors: Mahadevan Krishnan, John R. Thompson
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Patent number: 7569837Abstract: It is a technical challenge to provide a small-sized ion source excellent in operability.Type: GrantFiled: July 20, 2007Date of Patent: August 4, 2009Assignee: Kyoto Institute of TechnologyInventors: Nishino Shigehiro, Ono Ryoichi
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Patent number: 7557324Abstract: A thermal spraying method and device that includes a device (1,2) which generates a flame and a device (3) which injects a powder into the flame. The flame-generating device (1,2) includes an end piece (1) out of which the flame is directed towards a substrate subjected to spraying. The powder-injection device (3) includes a frame element (6) that is adapted to be attached to the end piece (1) and to project in the flame ejection direction from the end piece (1). The frame element (6) has a plurality of through-holes (9) extending through it and distributed circumferentially about the frame element (6) as well as at least two powder injection ports distributed about the frame element (6).Type: GrantFiled: September 18, 2003Date of Patent: July 7, 2009Assignee: Volvo Aero CorporationInventors: Per Nylen, Alice Boussagol, Roger Svensson, Gabriel Mora, Mats-Olov Hansson, Jan Wigren, Jimmy Johansson
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Patent number: 7459838Abstract: A plasma display device includes a plasma display panel, a chassis base coupled to the plasma display panel, a drive circuit coupled to the chassis base, a flexible printed circuit (FPC) couples the drive circuit to electrodes of the plasma display panel. An integrated circuit (IC) is mounted on a film structured in the form of a tape carrier package (TCP), and coupled to the FPC. An epoxy resin deposited in a connecting region where the driver IC is connected to wiring of the FPC is formed with an uneven area that includes indentations and protrusions formed substantially uniformly.Type: GrantFiled: November 22, 2004Date of Patent: December 2, 2008Assignee: Samsung SDI Co., Ltd.Inventors: Ki-Jung Kim, Eun-Gon Kim
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Publication number: 20080251017Abstract: A fastening unit for fastening ignition units as part of a device for carbon deposition is provided, the fastening unit of the device having a first and a second holder, the ignition unit being situated between the two holders, and the holders being held together by at least one fastening device. The first holder has a first plane that has a first angle between 0° and 45° in relation to the longitudinal axis of the first holder. The ignition unit is situated such that the end surface of the ignition unit forms a right angle to the first plane.Type: ApplicationFiled: April 26, 2005Publication date: October 16, 2008Inventors: Gunter Schneider, Alexander Schattke, Rainer Feuerfeil
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Patent number: 7429818Abstract: A dielectric waveguide integrated plasma lamp (DWIPL) with a body comprising at least one dielectric material having a dielectric constant greater than approximately 2, and having a shape and dimensions such that the body resonates in at least one resonant mode when microwave energy of an appropriate frequency is coupled into the body. A dielectric bulb within a lamp chamber in the body contains a fill which when receiving energy from the resonating body forms a light-emitting plasma. The bulb is transparent to visible light and infrared radiation emitted by the plasma. Radiative energy lost from the plasma is recycled by reflecting the radiation from thin-film, multi-layer coatings on bulb exterior surfaces and/or lamp chamber surfaces back into the bulb.Type: GrantFiled: September 23, 2004Date of Patent: September 30, 2008Assignee: Luxim CorporationInventors: Yian Chang, Frederick M. Espiau
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Publication number: 20080185949Abstract: The invention relates to a plasma torch generator employed in a device or system that can be used to protect aircraft or vehicles from IR and UV seeking or tracking mechanisms. In one embodiment, the invention comprises a deployable broad spectrum, IR and UV emitting device containing the plasma torch, which can function as a countermeasure flare.Type: ApplicationFiled: March 15, 2006Publication date: August 7, 2008Inventors: Jan Henrik Jebsen, Gerard Aknine
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Patent number: 7372059Abstract: Various mechanisms are provided relating to plasma-based light source that may be used for lithography as well as other applications. For example, a device is disclosed for producing extreme ultraviolet (EUV) light based on a sheared plasma flow. The device can produce a plasma pinch that can last several orders of magnitude longer than what is typically sustained in a Z-pinch, thus enabling the device to provide more power output than what has been hitherto predicted in theory or attained in practice. Such power output may be used in a lithography system for manufacturing integrated circuits, enabling the use of EUV wavelengths on the order of about 13.5 nm. Lastly, the process of manufacturing such a plasma pinch is discussed, where the process includes providing a sheared flow of plasma in order to stabilize it for long periods of time.Type: GrantFiled: October 17, 2005Date of Patent: May 13, 2008Assignee: The University of WashingtonInventors: Uri Shumlak, Raymond Golingo, Brian A. Nelson
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Patent number: 7335850Abstract: A plasma jet electrode device includes an orientation base, a ceramic pipe, a round plate having a plurality of tilted through holes thereon and a high-voltage metal electrode. A dielectric discharging plasma area is formed between the high-voltage metal electrode and the ceramic pipe. The plasma jet electrode device further has a rotating base, a bottom plate, and a grounding electrode. A low-temperature non-equilibrium plasma area is formed between the grounding electrode and the high-voltage metal electrode. The round plate has a spray head praying low-temperature non-equilibrium plasma. The plasma treatment area is increased, and the uniformity is improved. The present plasma jet electrode system has a frame for fixing at least one plasma jet electrode device. It evidently increases the effective plasma treatment area. The system can also provide additional functions of cooling, guiding, plating and etching, etc.Type: GrantFiled: April 3, 2007Date of Patent: February 26, 2008Inventor: Yueh-Yun Kuo
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Patent number: 7005782Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.Type: GrantFiled: May 27, 2004Date of Patent: February 28, 2006Assignee: VEECO Instruments, Inc.Inventors: Viktor Kanarov, Alan V. Hayes, Rustam Yevtukhov, Daniel Yakovlevitch
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Patent number: 6987364Abstract: A cold-cathode closed-drift ion source includes an anode, a cathode and a power supply. In certain example embodiments, neither the positive nor negative terminals of the power supply are connected to ground, and the anode and cathode are also not connected to ground. Thus, the ion source operates in a floating mode. As a result, the likelihood of formation of a problematic secondary circuit from the source to the power supply through the walls can be reduced and/or eliminated (or suppressed). Therefore, the chance of drawing a net positive charge from the ion source which induces a positive charge on dielectric or other surfaces proximate the wall(s) can be suppressed and/or reduced.Type: GrantFiled: September 3, 2004Date of Patent: January 17, 2006Assignee: Guardian Industries Corp.Inventor: Rudolph Hugo Petrmichl
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Patent number: 6969851Abstract: A sensor and detection methods are provided for detecting nitric oxides (NOx) in an exhaust gas based upon ion mobility spectrometry (IMS) technique. An ionization chamber having an interior electrically conductive shell receives exhaust gas. A spark electrode having a needle tip extends into the ionization chamber. A shutter grid is coupled between the ionization chamber and an ion drift tube. A substantially continuous spark discharge is established between the electrically conductive shell and the needle tip of the spark electrode for ionization of the exhaust gas. Negative NO2 ions are kept inside the chamber by biasing the electrically conductive shell and the shutter grid at a negative voltage. Then a positive pulse is applied to the shutter grid to cause the shutter to open for negative NO2 ions to exit into the ion drift tube. The IMS sensor is small-sized, low-cost, robust, and reliable.Type: GrantFiled: August 18, 2004Date of Patent: November 29, 2005Assignee: The University of ChicagoInventors: Shuh-Haw Sheen, Apostolos C. Raptis, Hual-Te Chien
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Patent number: 6919672Abstract: A closed drift ion source which includes a channel having an open end, a closed end, and an input port for an ionizable gas. A first magnetic pole is disposed on the open end of the channel and extends therefrom in a first direction. A second magnetic pole disposed on the open end of the channel and extends therefrom in a second direction, where the first direction is opposite to the second direction. The distal ends of the first magnetic pole and the second magnetic pole define a gap comprising the opening in the first end. An anode is disposed within the channel. A primary magnetic field line is disposed between the first magnetic pole and the second magnetic pole, where that primary magnetic field line has a mirror field greater than 2.Type: GrantFiled: April 10, 2003Date of Patent: July 19, 2005Assignee: Applied Process Technologies, Inc.Inventor: John Madocks
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Patent number: 6894298Abstract: The invention is directed to a method and an arrangement for generating extreme ultraviolet (EUV) radiation, i.e., radiation of high-energy photons in the wavelength range from 11 to 14 nm, based on a gas discharge. The object of the invention, to find a novel possibility for generating EUV radiation in which an extended life of the system is achieved with stable generation of a dense, hot plasma column, is met according to the invention in that a preionization discharge is ignited between two parallel disk-shaped flat electrodes prior to the main discharge by a surface discharge along the superficies surface of a cylindrical insulator with a plasma column generated through the gas discharge with pulsed direct voltage, which preionization discharge carries out an ionization of the working gas in the discharge chamber by means of fast charged particles.Type: GrantFiled: October 9, 2002Date of Patent: May 17, 2005Assignee: Xtreme technologies GmbHInventors: Imtiaz Ahmad, Guido Schriever, Juergen Kleinschmidt
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Patent number: 6659110Abstract: A method of removing organic impurities from a surface of a substrate that is used for feeding or processing web material, wherein a jet of an atmospheric plasma is directed onto the surface of the substrate.Type: GrantFiled: June 20, 2001Date of Patent: December 9, 2003Assignee: PlasmaTreat GmbHInventors: Peter Förnsel, Christian Buske
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Patent number: 6621199Abstract: A method and apparatus for producing high intensity electromagnetic radiation are disclosed. The apparatus includes a high intensity arc lamp having an inner envelope cooled by a first flow of liquid along an inside surface of the inner envelope. The arc lamp includes first and second electrodes for generating a high power plasma arc within the inner envelope, the arc emitting the radiation. The apparatus further includes a cooling device for producing a second flow of liquid in contact with an outside surface of the inner envelope. In order to approximate a desired electromagnetic radiation spectrum, the apparatus may further include an energy redistributor for redistributing energy within a first radiation spectrum generated by the arc to produce a second radiation spectrum.Type: GrantFiled: January 21, 2000Date of Patent: September 16, 2003Assignees: Vortek Industries Ltd., Vortex Industries Ltd.Inventors: Dean Allister Parfeniuk, David Malcolm Camm, Johan George Fourie, Roger Housden, Arne Kjørvel, Steven McCoy, Sujay Prasad, Tilman Jochen Thrum
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Patent number: 6608432Abstract: An apparatus for cathodic arc coating. The apparatus includes: a vacuum chamber which includes an anode; a power supply; and a cathode target assembly connected to the power supply. The cathode target assembly includes a cathode target and a target holder. In the preferred embodiment, a conductive interlayer is located between the cathode target and the target holder, and a cooling block is in contact with the cathode target.Type: GrantFiled: April 3, 2001Date of Patent: August 19, 2003Assignee: General Electric CompanyInventors: Scott Andrew Weaver, Don Mark Lipkin, Reed Roeder Corderman, Terry Clifford Cooper
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Patent number: 6566813Abstract: An overvoltage protection device (1) with a first electrode (2) which has a first arcing horn (3), with a second electrode (4) which has a second arcing horn (5), with an air-breakdown spark gap (6) which is active between the arcing horns (3, 5), and with a housing (7) which accommodates the electrodes (2, 4), has the two arcing horns (3, 5) shaped and arranged relative to one another such that they diverge from a lower ignition area (8) to their outer ends (9, 10), so that the air-breakdown spark gap (6) widens outwardly, proceeding from the ignition area (8). The overvoltage protection device (1) has a current carrying capacity which is as high as possible and a high network follow current extinction capacity with an overall height which is as small as possible by the first arcing horn (3) being made in the shape of a truncated cone and the second arcing horn (5) being located concentrically around the first arcing horn (3).Type: GrantFiled: March 6, 2000Date of Patent: May 20, 2003Assignee: Phoenix Contact GmbH & Co.Inventors: Eberhard Lehmann, Klaus Scheibe, Joachim Schimanski, Jörg Tews, Martin Wetter
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Publication number: 20030048054Abstract: A gas flow from a gas reservoir is accelerated up to supersonic velocity beyond the throat of a Laval nozzle. The accelerated supersonic gas flow is introduced into a plasma generating preaccelerating system, and thereby converted into the plasma flow of the velocity close to the thermal's. Then, the primary plasma flow is introduced into an arcjet discharger, to be accelerated to super thermal velocity by the viscosity force, similar to a sonic wind.Type: ApplicationFiled: April 17, 2002Publication date: March 13, 2003Applicant: NATIONAL INSTITUTE FOR FUSION SCIENCEInventor: Kei-Ichi Hirano
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Patent number: 6515252Abstract: The invention concerns a plasma torch comprising an interchangeable cartridge (100) consisting of six components only: an electroplating copper anode nozzle (1); an electroplating cathode support (2); a doped tungsten cathode (3); a plastic cathode diffusing-centring device (4); a plastic assembling device (5); a ceramic insert (6). Said components are assembled by pressing and the assembly of the components form volumes (71, 72, 73) constituting the anode cooling circuit and the plasma forming gas intake conduits (127, 44). The intake and discharge of fluid are provided by a connecting and maintaining structure designed for the easy mounting of the cartridge (100).Type: GrantFiled: October 12, 2001Date of Patent: February 4, 2003Assignee: Commissariat a l'Energie AtomiqueInventor: Christophe Girold
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Publication number: 20020140334Abstract: An apparatus for cathodic arc coating. The apparatus includes: a vacuum chamber which includes an anode; a power supply; and a cathode target assembly connected to the power supply. The cathode target assembly includes a cathode target and a target holder. In the preferred embodiment, a conductive interlayer is located between the cathode target and the target holder, and a cooling block is in contact with the cathode target.Type: ApplicationFiled: April 3, 2001Publication date: October 3, 2002Applicant: General Electric CompanyInventors: Scott Andrew Weaver, Don Mark Lipkin, Reed Roeder Corderman, Terry Clifford Cooper
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Publication number: 20020135283Abstract: An output structure for material processing apparatus facilitates field replacement of consumable components, while maintaining important alignments. Contoured surfaces within the output structure mate with corresponding contoured surfaces on the consumable components, thereby facilitating alignment of the consumable components with an axis of the output structure. Material processing apparatus employing such surfaces include lasers and plasma arc torches and, with proper alignment, apparatus performance is improved. Typical consumable components include electrodes, swirl rings, nozzles, and shields. The consumable components can be axially translatable with respect to each other, thereby promoting contact starting of a plasma arc torch. An installation tool for consumable components also serves to align the components with an axis of the output structure.Type: ApplicationFiled: May 21, 2002Publication date: September 26, 2002Applicant: HYPERTHERM, INC.Inventors: Charles M. Hackett, Yutaka Nakano, Zhipeng Lu, Aaron D. Brandt, Brian J. Currier, Kenneth J. Woods
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Patent number: 6424082Abstract: An output structure for material processing apparatus facilitates field replacement of consumable components, while maintaining important alignments. Contoured surfaces within the output structure mate with corresponding contoured surfaces on the consumable components, thereby facilitating alignment of the consumable components with an axis of the output structure. Material processing apparatus employing such surfaces include lasers and plasma arc torches and, with proper alignment, apparatus performance is improved. Typical consumable components include electrodes, swirl rings, nozzles, and shields. The consumable components can be axially translatable with respect to each other, thereby promoting contact starting of a plasma arc torch. An installation tool for consumable components also serves to align the components with an axis of the output structure.Type: GrantFiled: August 3, 2000Date of Patent: July 23, 2002Assignee: Hypertherm, Inc.Inventors: Charles M. Hackett, Yutaka Nakano, Zhipeng Lu, Aaron D. Brandt, Brian J. Currier, Kenneth J. Woods
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Publication number: 20020070647Abstract: An arc source macroparticle filter comprising a cathode for emitting particles, an anode for accelerating said emitted particles, means for generating a magnetic field to form magnetic walls to deflect and guide curved plasma stream for directing ions toward a substrate and separate therefrom undesirable macroparticles.Type: ApplicationFiled: December 11, 2001Publication date: June 13, 2002Inventors: Andrey Ginovker, Darek Molenda, Vladimir Cherepanov
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Patent number: 6384374Abstract: A spark gap assembly for a welding power supply includes at least one pair of spark gap points and a housing base including at least one base groove for axially aligning the spark gap points. Point stops are disposed to retain some of the spark gap points in the spark gap assembly. Insulating walls and insulating channels are disposed to reduce the possibility of shorts occurring between various spark gap assembly components or between spark gap assembly components and other power supply components.Type: GrantFiled: August 25, 2000Date of Patent: May 7, 2002Assignee: Illinois Tool Works Inc.Inventors: Ronald W. Colling, Richard A. Duba
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Patent number: 6376978Abstract: A radio frequency (RF) antenna for plasma ion sources is formed of a hollow metal conductor tube disposed within a glass tube. The hollow metal tubular conductor has an internal flow channel so that there will be no coolant leakage if the outer glass tube of the antenna breaks. A portion of the RF antenna is formed into a coil; the antenna is used for inductively coupling RF power to a plasma in an ion source chamber. The antenna is made by first inserting the metal tube inside the glass tube, and then forming the glass/metal composite tube into the desired coil shape.Type: GrantFiled: March 6, 2000Date of Patent: April 23, 2002Assignee: The Regents of the University of CaliforniaInventors: Ka-Ngo Leung, Elie Benabou
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Patent number: 6369493Abstract: A plasma applicator having a tube that is surrounded by a cooling jacket such that a volume is defined proximate the tube. The volume is filled with a thermal transfer medium to couple heat from the tube to the cooling jacket. The cooling jacket contains an aperture through which energy is transmitted to a process gas contained in the tube. As such, the process gas is infused with energy and a plasma is formed in the tube.Type: GrantFiled: April 27, 1999Date of Patent: April 9, 2002Assignee: Applied Materials, Inc.Inventors: Dmitry Lubomirsky, Harald Herchen, Simon Yavelberg, David Palagashvili, Donald J. Olgado
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Patent number: 6348670Abstract: An energy storage system for use in a magnetic pulse welding and forming apparatus includes a bank of capacitors and a very-low inductance conductive bus system interconnecting the capacitors. The energy storage system further includes an energy source connected to the capacitors, a discharge device, a charging control device, and a discharge control device for selectively initiating discharge of energy stored in the capacitors. The discharge device includes a central electrode placed coaxially inside a ring electrode with an adjustable concentric gap, and an ignition electrode designed as a coaxial ring surrounding the central electrode. The central electrode can be movable, i.e. either rotatable or slidable relative to the bus system. To control the direction of movement of the plasma jet, the central electrode is provided with a central air path and tangential jets opening adjacent to the ignition electrode for organizing air flow through the discharge gap.Type: GrantFiled: January 23, 2001Date of Patent: February 19, 2002Assignee: Inli, LLCInventors: Ludmilla Kistersky, Danylo Dudko, Viacheslav Shevchenko
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Patent number: 6326739Abstract: A high frequency inductively coupled electrodeless lamp includes an excitation coil with an effective electrical length which is less than one half wavelength of a driving frequency applied thereto, preferably much less. The driving frequency may be greater than 100 MHz and is preferably as high as 915 MHz. Preferably, the excitation coil is configured as a non-helical, semi-cylindrical conductive surface having less than one turn, in the general shape of a wedding ring. At high frequencies, the current in the coil forms two loops which are spaced apart and parallel to each other. Configured appropriately, the coil approximates a Helmholtz configuration. The lamp preferably utilizes an bulb encased in a reflective ceramic cup with a pre-formed aperture defined therethrough. The ceramic cup may include structural features to aid in alignment and/or a flanged face to aid in thermal management.Type: GrantFiled: July 14, 2000Date of Patent: December 4, 2001Assignee: Fusion Lighting, Inc.Inventors: Donald A. MacLennan, Peter Tsai
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Patent number: 6307308Abstract: At least main electrodes for a low pressure gas discharge arranged at a distance from each other are present in such switches, the main electrodes forming a cathode and an anode of a discharge path in an interrupter chamber for the gas discharge which is fired by increasing electron density in a cathode cavity. For this purpose, at least the cathodes have at least one opening, preferably the cathode and anode, having opposite aligned openings for triggering the discharge. In such an arrangement, an arrangement for the generation of a magnetic field superimposed on the discharge may be present. At least one slot is present in at least one of the main planar electrodes for generating a radial magnetic field. A single slot maybe provided which runs in the form of a spiral from the area of the electrode center to the area of the electrode edge.Type: GrantFiled: August 13, 1999Date of Patent: October 23, 2001Assignee: Siemens AktiengesellschaftInventors: Jörg Teichmann, Michael Römheld
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Patent number: 6294862Abstract: An ion source (26) includes a plasma confinement chamber and a plasma electrode (70) forming a generally planar wall section of the plasma confinement chamber. The plasma electrode (70) has at least one opening (84, 86) for allowing an ion beam (88) to exit the confinement chamber and has a set of magnets (78, 80, 82) that generate a magnetic field extending across the openings (84, 86) in the plasma electrode (70). The openings (84, 86) in the plasma electrode (70) can be fashioned as elongated slots or circular openings aligned along the axis. The ion source (26) can further include a power supply (72) for negatively biasing the plasma electrode relative to the plasma confinement chamber and an insulator (74) for electrically insulating the plasma electrode (70). Cooling tubes can also be provided to transfer heat away from the magnets in the plasma electrode (70).Type: GrantFiled: May 19, 1998Date of Patent: September 25, 2001Assignee: Eaton CorporationInventors: Adam A. Brailove, Matthew Charles Gwinn