Abstract: A positioning apparatus includes an X stage, a linear motor (X-axis) which drives the X stage along the X-axis, a linear motor (Y-axis) which drives a Y stage along the Y-axis, a laser interferometer which detects position information of the stages along the X and Y directions, and a controller which controls the linear motor (X-axis) and linear motor (Y-axis) based on a detection result of the laser interferometer. The controller controls the linear motor (Y-axis) based on the position information of the stages along the X direction detected by the laser interferometer, so as to cancel a force generated along the Y-axis by the linear motor (X-axis) when the linear motor (X-axis) is to drive the stage in the X direction.

Abstract: A prober includes a frame having a frame ground terminal, a chuck stage, servo motors for driving the chuck stage, servo amplifiers connected to the servo motors, first floating mounts on which the servo amplifiers are provided, a second floating mount on which the servo motor is provided. The first floating mounts are electrically insulated from the frame and have first ground terminals connected to the ground terminals of the servo amplifiers. The second floating mount is electrically insulated from the frame and has a second ground terminal connected to the ground terminal of the servo motor. The prober further includes shielded cables connecting the servo amplifiers and the servo motors, a first wire connecting the first ground terminal and the frame ground terminal and also connecting the first ground terminal and the second floating mount, and second wires connecting the shielded cables and the frame ground terminal.

Abstract: A high-speed and extremely large range positioning apparatus capable of producing motions in multiple dimensions with high precision and very high reliability. An ultra fast absolute position sensor providing instantaneous position readings with sub nanometer precision on full range of relative positions. A set of optical encoding schemas providing high encoding density and extremely fast decoding regardless of their planar positions.

Abstract: A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translation and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction force are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.

Abstract: A scanning exposure method moves a mask stage in a scanning direction by a driver having a first portion coupled to the mask stage, which includes a reflective portion positioned along the scanning direction. A counter weight having at least one beam extending along the scanning direction, moves in a direction opposite to the mask stage in response to a reaction force generated by movement of the mask stage by the driver. The at least one beam of the counter weight is coupled to a second portion of the driver. The counter weight is movably supported via a first bearing by a base member. The movement of the counter weight is guided in the scanning direction via a second bearing by a guide mounted on the base member and extending along the scanning direction. A length of the guide is longer than a length of the reflective portion.

Abstract: A counter balance apparatus for stabilizing a scanning system during lithographic processing comprises a baseframe, at least one counter balance (reaction mass) movably coupled to the baseframe by at least three first bearings and coupled to a stage by at least two second bearings and at least one drive, and a plurality of bellows. Each bellows surrounds a corresponding first bearing and has a first end coupled to a counter balance. The apparatus can comprise an enclosure containing a controlled environment and enclosing the stage, the second bearings, the drive, and the counter balance(s), such that each bellows separates a corresponding first bearing from the controlled environment. The apparatus provides a simplified, cost-effective way of using any type of bearing to support and guide a counter balance located in a controlled environment while preventing contamination of the environment.

Abstract: A foam core chuck for use in a scanning stage of a lithography system is disclosed. In accordance with an embodiment of the present invention, the lithography stage includes a frame and a chuck supported by the frame. The chuck has a foam core structure that is covered by a shell layer. An electromagnetic device for supporting and positioning the chuck is coupled to the stage. The electromagnetic device, for example an electromagnetic motor, is coupled to the stage such that at least one coil is coupled to the frame and at least one magnet is coupled to the foam core structure of the chuck. The foam core structure acts as a distributed flexure for the magnet.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide cooperating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage cooperating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A pre-compensator is provided based on a definition of abase vibration model having a motor transfer function 1 for generating motor displacement 12 from an input that is the sum of input torque and a table propelling force 10 multiplied with a reducer and Cartesian-to-polar coordinate transformation constant 14, a table transfer function 14 for multiplying a deviation 11 between an output that is the motor displacement multiplied with a reducer and polar-to-Cartesian coordinate transformation constant 2 and table displacement with a table-displacement-to-force conversion spring constant 3 to generate the table propelling force 10 and to output table displacement 7, and a base driving transfer function 5 for generating base displacement by multiplying base displacement 9 with a base-displacement-to-force conversion spring coefficient 6 and inputting the same with the table propelling force, table displacement 8 being generated from a difference between the table displacement and the base displacement.

Abstract: Embodiments of the invention are ideally suited for use filming movies, sporting events, or any other activity that requires fluid movement of a camera or other object to any position within a defined volume of space. To accomplish such positioning embodiments of the invention are configured to move an object throughout three-dimensional space by relocating one or more lines that are feed through a plurality of opposing sides of the object. These line(s) (e.g., a cable, rope, string, cord, wire, or any other flexible connective element) which support the object from above or below the object within a volume of space are arranged in way that allows the object to be rapidly moved to and from any location within the defined volume of space. For instance, the system may be arranged to perform dimensional movement using one line configured as an endless loop, one line configured as a half loop, two lines configured as endless loops or two lines configured as half loops.

Abstract: In a scanning exposure method, a mask stage that holds a mask is moved in a scanning direction by a first electromagnetic driver having a first portion coupled to the mask stage, and a second portion. A position of the mask stage is detected by a position detector that cooperates with a reflective portion of the mask stage that is positioned along the scanning direction. A counter weight having a bearing and at least one beam extending along the scanning direction moves in a direction opposite to a movement direction of the mask stage in response to a reaction force generated by movement of the mask stage by the first electromagnetic driver. The counter weight preferably is heavier than the mask stage, and a length of the at least one beam along the scanning direction preferably is longer than a length of the reflective portion along the scanning direction.

Abstract: Disclosed is a positioning system effective to cancel a moment reaction force, and it includes a movable portion and a reaction force absorbing mechanism for absorbing a propulsion reaction force to be produced by motion of the movable portion. A first distance between a reference plane and a gravity center position of the movable portion, being supported for movement along the reference plane, and a second distance between the reference plane and a gravity center position of the reaction force absorbing mechanism are made substantially equal to each other, and/or the second distance and a third distance between the reference plane and a motor movable element for propelling the movable portion along the reference plane are made substantially equal to each other.

Abstract: An accelerometer includes an inertial platform maintaining an attitude in response to a platform stabilizing controller signal and defining a spin axis and a reference plane. An accelerometer, coupled to the inertial platform a distance from the spin axis, defines a flex axis. The accelerometer generates an accelerometer signal in response to acceleration of the accelerometer. A second accelerometer defines a second flex axis, and is also coupled to the inertial platform a distance from the spin axis. The second accelerometer generates a second accelerometer signal in response to acceleration of the second accelerometer. A controller receives the first accelerometer signal and the second accelerometer signal and generates a linear acceleration signal in response to a sum of the first accelerometer signal and the second accelerometer signal and generates an angular acceleration signal from the difference.

Abstract: A reaction mass apparatus for stabilizing a scanning system during lithographic processing comprises a baseframe; at least one reaction mass movably coupled to the baseframe by at least three first bearings and coupled to a stage by at least two second bearings and at least one drive; and a plurality of bellows, each bellows surrounding a corresponding first bearing, the bellows each having a first end coupled to a reaction mass and a second end coupled to the baseframe. The apparatus can comprise an enclosure, containing a controlled environment and enclosing the stage, the second bearings, the drive, and the reaction mass, wherein each bellows separates a corresponding first bearing from the controlled environment and wherein each bellows second end is coupled to the enclosure.

Abstract: A mask having a mask pattern is provided on a mask table. A substrate is provided on a substrate table. The mask is irradiated to project an image of at least a portion of the mask pattern onto a radiation-sensitive layer of the substrate using a projection system. At least one of the mask and substrate tables is positioned using a drive unit having a stationary part coupled to a reaction frame. A position of at least one of the mask and substrate tables is measured using a measuring system having a plurality of measurement sensors that have a stationary part and a movable part. The movable part of one of the sensors is coupled to the one of the mask table and the substrate table whose position is measured, and the stationary parts of the sensors are coupled to a support frame mechanically isolated from the reaction frame.

Abstract: A stage assembly (10) for independently moving and positioning a first device (26A) and a second device (26A) in an operation area (25) is provided herein. The stage assembly (10) includes a stage base (12), a first stage (14), a first mover assembly (15), a second stage (16), and a second mover assembly (18). The first mover assembly (15) moves the first stage (14) and the first device (26A) into the operational area (25) and the second mover assembly (18) moves the second stage (16) and the second device (26B) into the operational area (25). The present stage assembly (10) reduces and minimizes the amount of reaction forces and disturbances that are transferred between the stages (14), (16). This improves the positioning performance of the stage assembly (10). Further, for an exposure apparatus (30), this allows for more accurate positioning of two semiconductor wafers (28) relative to a reticle (32) or some other reference.

Abstract: An accelerometer includes an inertial platform maintaining an attitude in response to a platform stabilizing controller signal and defining a spin axis and a reference plane. An accelerometer, coupled to the inertial platform a distance from the spin axis, defines a flex axis, which is perpendicular to the stability axis. The accelerometer generates an accelerometer signal in response to acceleration of the accelerometer. A second accelerometer defines a second flex axis also perpendicular to the stability axis, and is also coupled to the inertial platform a distance from the spin axis. The second accelerometer generates a second accelerometer signal in response to acceleration of the second accelerometer. A controller, including an angular acceleration signal generator, receives the first accelerometer signal and the second accelerometer signal and generates an angular acceleration signal from a difference in amplitudes between the first accelerometer signal and the second accelerometer signal.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: An apparatus for providing support between a first structure and a second structure is described. The apparatus includes a first section and a second section. The first section has a first group of at least one magnetic frame member, and is coupled to the first structure. The second section has a second group of at least one magnetic frame member, and is coupled to the second structure. The first and second sections present magnetic force therebetween.

Abstract: A stage assembly for an exposure apparatus is disclosed. The stage assembly comprises a guide assembly. The guide assembly includes a guide bar, a stage, a first actuator component, and a second actuator component. The guide bar is movable in a first direction and has a center of gravity and a guiding portion. The stage is movable along the guiding portion of the guide bar in a second direction substantially perpendicular to the first direction and exerts a reaction force on the guide bar. The stage has a center of gravity spaced apart from the center of gravity of the guide bar in the first direction. The first actuator component is positioned on the guide bar. The first actuator component is aligned with the center of gravity of the stage in the second direction to apply a compensating force on the guide bar to cancel the reaction force exerted by the stage. The second actuator component is positioned on the guide bar.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween.

Abstract: There are provided an exposure method and an exposure apparatus in which the influence of vibration is not mutually transmitted so much when two movable stages are used. X axis sliders (19A, 20A) are arranged movably in the X direction on both sides in the Y direction of a wafer base (13). A first Y axis slider (16A) is arranged movably in the Y direction for the X axis sliders (19A, 20A). A first wafer stage (WST1) is arranged movably in the Y direction (scanning direction) along the Y axis slider (16A). X axis sliders (19B, 20B) are arranged in parallel to the X axis sliders (19A, 20A). A second Y axis slider (16B) is arranged for the X axis sliders (19B, 20B). A second wafer stage (WST2) is arranged movably along the Y axis slider (16B). When exposure is performed on the side of the first wafer stage (WST1), wafer exchange or wafer alignment is performed on the side of the second wafer stage (WST2).

Abstract: The invention relates to a rotary indexing table comprising a stationary base unit and a plate rotatably supported thereon and drivable relative to the base unit by means of a drive, in which the drive is formed by a plurality of individual drive elements arranged in the circumferential region of the plate.

Abstract: A vibration isolator includes a vibration isolation platform, a vibration sensor installed on the vibration isolation platform, and an angle sensor for sensing an inclination angle of the vibration isolation platform. A detection signal from the vibration sensor is corrected based upon an output from the angle sensor, and the corrected detection signal is used in order to suppress vibration of the vibration isolation platform.

Abstract: In relation to a vibration isolation system, which comprises at least one vibration isolation device that can be assigned to an isolation element, the fact that a method of recording the system with the aid of a closed-loop and/or open-loop control device is provided, in which a closed-loop and/or open-loop control structure can be predefined and in which signals and/or variables related to the isolation system are picked up, processed and/or provided, and in which, on the basis of the definable structures and variables, at least one isolation system characteristic data set for assessing the vibration isolation system is formed, means that for the first time the indicative fundamentals for an open system for evaluation, closed-loop and open-loop control are provided.

Abstract: Embodiments of the invention move objects throughout three-dimensional by using two supporting ropes each of which connects to both opposing sides of the payload. If one rope breaks, the payload gently travels to the middle of the coverage area in a safe manner, maintaining the given displacement in the other unbroken axis. One rope controls the X-axis motion of the platform and is designated the X movement rope. The other rope controls the Y-axis motion of the platform and is designated the Y movement rope. Displacing equal lengths of the X and Y movement ropes allows the Z-axis of the platform to be traversed. There is no need for a complex computer control system since the Z-axis displacement is substantially independent of X and Y axis movement over a coverage area serviced by the platform. In addition, since the ropes are commanded from one point, distantly located motors and electrical cables are not required.

Abstract: Disclosed are a magnetic bearing device with a vibration restraining function, a magnetic bearing device with a vibration estimating function, and a pump device with the magnetic bearing devices mounted thereto, in which it is possible to realize a reduction in vibration in the apparatus system as a whole inclusive of the equipment associated with the vacuum pump without newly providing a vibration sensor. In a vibration detector, a multiplication result obtained by multiplying the Laplace transformation of a displacement of a rotor by a predetermined transfer function is added to a multiplication result obtained by multiplying the Laplace transformation of a variation in an unbalance force acting on the rotor by the reciprocal of the mass of the rotor. The result of this calculation is reversed in polarity and is added to the output of a compensator by an adder.

Abstract: A stage apparatus including a center slider movable in XY directions and a substrate stage mounted on the center slider. The center slider and the substrate stage are connected by plural electromagnet units to generate a moving force in a predetermined direction to the substrate stage by application of electric current to exciting coils. A moving force to be applied to the substrate stage and its direction are determined in correspondence with movement of the slider, and an electric current is selectively applied to the exciting coils of said plural electromagnet units. Upon application of electric current to the respective exciting coils, the directions of the electric current applied to the respective exciting coils are selected so as to reduce a leak magnetic field around a wafer on the substrate stage.

Abstract: A uniaxial drive unit is provided with a tiltable pulse generating device having a joystick, which generates a continuous pulse of a frequency corresponding to the tilt angle of the joystick, and a rotary encoder having a knob, which generates a pulse of a frequency corresponding to the turning speed of the knob and generates pulses of the number corresponding to the turning angle of the knob to drive a linear motor. High-speed and medium-speed operations are carried out by using the tiltable pulse generating device, and low-speed fine feed is carried out by using the rotary encoder.

Abstract: A high exposure accuracy is obtained while mitigating the influence of vibration by using an exposure method and an exposure apparatus. Columns (59A, 59B) are installed on a base plate (12), a reticle base (62) is supported at the inside of the columns (59A, 59B) by the aid of variable mount sections (61A, 61B) having high rigidity, a finely movable stage (63) is movably placed on the reticle base.. (62) by the aid of air bearings, and a reticle (R1) as an exposure objective is placed on the finely movable stage (63). A coarsely movable stage (64) is hung on a bottom surface of a support plate (66) arranged over the reticle base (62) in a state capable of being driven in a scanning direction. The finely movable stage (63) is driven by the coarsely movable stage (64) in the scanning direction in a non-contact state with respect to the reticle base (62).

Abstract: A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.

Abstract: Embodiments of the invention move objects throughout three-dimensional by using two supporting ropes each of which connects to both opposing sides of the payload. If one rope breaks, the payload gently travels to the middle of the coverage area in a safe manner, maintaining the given displacement in the other unbroken axis. One rope controls the X-axis motion of the platform and is designated the X movement rope. The other rope controls the Y-axis motion of the platform and is designated the Y movement rope. Displacing equal lengths of the X and Y movement ropes allows the Z-axis of the platform to be traversed. There is no need for a complex computer control system since the Z-axis displacement is substantially independent of X and Y axis movement over a coverage area serviced by the platform. In addition, since the ropes are commanded from one point, distantly located motors and electrical cables are not required.

Abstract: A countermass stroke reduction assembly is provided. The assembly generally includes a base supporting one or more stages and first and second countermasses. Alternatively, first and second countermasses could be mounted separately from the base. The first and second stages move in one or more degrees of freedom. The countermasses move in at least one degree of freedom. In order to minimize the stroke of the countermasses, a drift velocity and y-intercept are determined off-line from an average position line for the countermass. An initial velocity equal in magnitude but opposite in sense to the drift velocity is then imparted to the countermass at the start of operation. Alternatively or additionally, an initial position offset equal and opposite to the y-intercept may be provided at the start of operation.

Abstract: A high accuracy stage supported in six degrees of freedom by electromagnetic bearings. Movements in the horizontal plane of the stage are controlled by variable reluctance actuators which are mounted between the high accuracy stage and a coarse stage so as not to distort the high accuracy stage during movements thereof. The high accuracy stage is supported in three vertical degrees of freedom by electromagnetic actuators disposed between the coarse stage and the high accuracy stage and aided by a supplemental vertical support disposed adjacent to the actuators. Preferably, the high accuracy stage is suspended from a bar supported by the supplemental vertical support, which is preferably air bellows.

Abstract: A stage is driven along guide surfaces of a supporting member with a stator that is provided independent from the support member vibration-wise and a mover connected to the stage. In addition, when a drive amount of the supporting member exceeds a predetermined amount in, for example, the vertical direction, a connection between the stage and the mover by a connection mechanism is released. That is, the connection between the stage and the mover is released before the mover connected to the stage on the supporting member comes into contact with the stator and both parts are put under a large stress, which can prevent the mover and stator from being damaged. Furthermore, since the stator is provided independent from the support member vibration-wise, position control of the stage can be preformed with high precision. Accordingly, the stage can be driven stably, for over a long period of time.

Abstract: A reaction frame having a first reaction frame portion and a second reaction frame portion receives reaction forces from a stage. First reaction frame portion is coupled to ground by a ground rod aligned along the longitudinal side of the first reaction frame portion; second reaction frame portion of the reaction frame is coupled to an interconnect rod passing parallel to the plane defined by the first reaction frame portion and second reaction frame portion. Ends of interconnect rod have a damper therebetween. One end is coupled to the first reaction frame portion while the other end is coupled to the second reaction frame portion. Reaction forces in received by the second reaction frame portion are transferred to ground through the interconnect rod and the first reaction frame portion. Alternately, the interconnect rod does not use the damper when alligned with the ground rod.

Abstract: An XY-axes table having a base, a plurality of linear guiding apparatuses, a stage, an X-axis drive linear motor and a Y-axis drive linear motor. The linear motor include an armature and a movable element relatively movable with respect to the armature. The linear motor further includes first magnetic pole teeth rows which are magnetically connected to a first magnetic pole of the armature and are arranged so as to be separated into a first stage and a second stage in a substantially vertical direction to a moving direction of the movable element. Second magnetic pole teeth rows which are magnetically connected to a second magnetic pole of the movable element are arranged so as to be separated into a first stage and a second stage in a substantially vertical direction to the moving direction of the movable element.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: A precision positioning tilt device includes an inner tilt frame directly actuated by a first motor so as to enable the tilt frame to pivot about a frame axis and a platform removably mounted on the inner tilt frame and directly actuated by a second motor so as to pivot about a platform axis extending perpendicular to and coaxial with the frame axis.

Abstract: A robot-arm telemanipulating system that presents an operator auditory information converted from a part of information on operating status of the robot arm (hereinafter referred to as “telemetry data”) transmitted from a distant position from the operator, so that a burden imposed on the operator can be alleviated. The telemanipulating system includes a sound source for simulatively generating an operating sound of the robot arm under telemanipulation, capable of variably controlling at least one of key, volume and tone of the operating sound by sound source control data input from outside; a telemetry data analyzing unit for analyzing telemetry data transmitted from the robot arm, and controlling the sound source by generating sound source controlling data corresponding to a load amount applied to the robot arm; and an audio output unit for presenting the operator the operating sound generated by the sound source in a form of auditory information.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: Disclosed is a supporting system having a carrying member for carrying a workpiece thereon and a supporting mechanism for supporting the carrying member from a workpiece transfer position to a workpiece processing position, wherein, adjacent the transfer position, the weight of the carrying member and a force to be applied to the carrying member are substantially balanced, and wherein, adjacent the workpiece processing position, the weight of the carrying member and a force to be applied to the carrying member are substantially balanced.

Abstract: A method for controlling and positioning a two-dimensional electric motor is disclosed. The electric motor has a coil array and a magnet array. The method controls the motor in two directions in the plane of the magnet array and about a third direction generally orthogonal to the plane. The method includes: determining currents for generating the desired forces, determining a resultant torque that would be generated from applying the determined currents, determining current adjustments to compensate for the resultant torque, and applying a current equal to the sum of the determined currents and the current adjustments to the coils to interact with the magnetic fields of the magnet array. The currents are applied to the portion of the coil array within the magnetic field of the magnet array, including those coils which are only partially within the magnetic field of the magnet array. Alternatively, the currents could be applied to all of the coils.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: A calculation system for calculating the control signals which are designed to perform a frequency-dependent weighting of the angular velocity signals and the angular position signals. The angular velocity indicators are preferably used for stabilization in a high frequency band while the angular position indicators are suitable for stabilization in a low frequency band. A further calculation system which is designed to perform the frequency-dependent weighting such that the control signals for frequencies below a certain frequency are substantially determined by the angular position signals and the control signals for higher frequencies are substantially determined by the angular velocity signals.

Abstract: Methods and apparatus for isolating vibrations associated induced by reaction forces and ground vibration are disclosed. According to one aspect of the present invention, a scanning stage apparatus includes a stage base, a stage, a driver, and a reaction frame. The stage moves over the stage base in a first translational direction, a second translational direction, and a first rotational direction. The driver causes the stage to move, and also causes at least one reaction force to be created when the stage moves. The reaction frame at least partially supports the driver, and along with the driver, is substantially decoupled from the stage base. The reaction force is arranged to be transmitted to the reaction frame. The electromagnetic coupling electromagnetically couples the reaction frame to a ground, and provides a stiffness and a damping between the reaction frame and the ground.

Abstract: An apparatus for providing support between a first structure and a second structure is described. The apparatus includes a supporting member, and first and second sections. The supporting member is mounted to the first structure and second structure, and has positive stiffness with respect to a lateral direction. The first section has at least one magnetic member, and is coupled to the first structure. The second section has at least one magnetic member, and is coupled to the second structure. The first and second sections present negative stiffness caused by magnetic attractive force at a neutral position, thereby canceling at least a part of the positive stiffness of the supporting member.