Abstract: A stage control apparatus which constitutes at least part of a control system for controlling a stage in alignment operation, including a compensator which generates a signal for controlling to drive the stage to a target position, a resonance elimination unit which has variable cutoff characteristics and eliminates a resonance frequency component contained in an output signal from the compensator to output the signal as a control signal for controlling the stage, and an adjustment unit which sets the cutoff characteristics of the resonance elimination unit, wherein the adjustment unit adjusts the cutoff characteristics of the resonance elimination unit on the basis of a signal generated in the control system.

Abstract: A method and apparatus for essentially eliminating cyclic disturbances in a motor control system, the method including identifying frequencies of undesirable components in a feedback signal that exceed a threshold level and generating a combined signal including sine wave components corresponding to each of the identified frequencies, delaying the combined signal to generate a plurality of identical but phase shifted combined signals, weighting each one of the delayed signals as a function of the magnitude of an instantaneous corrected signal which is the difference between a velocity error signal and a compensation signal and adding each of the weighted signals to generate the compensation signal.

Abstract: A robot operation teaching method and apparatus includes a three-dimensional measuring system that can measure spatial coordinates corresponding to points designated on camera images, a display able to show a space image from a camera or cameras overlaid by an image of a geometric model corresponding to the space image. A pointing device having at least two degrees of freedom is used to define work trajectories by preparing, in a model space, simple geometric elements corresponding to the actual space image. By using parametric modelling to supply definitions of geometric elements in advance, the geometric elements can be adapted for other tasks by modifying some of the geometric element assignments and parameters associated with the definitions.

Abstract: A method and an apparatus for controlling aircraft rudder movement are disclosed. The system including a yaw damping control portion integrated with a directional compensation rudder control portion, such that the system may simultaneously provide yaw damping control and directional compensation.

Abstract: Stage apparatus are disclosed for holding an object (e.g., substrate or reticle, for example) in a microlithography system, especially a system for performing microlithography in a vacuum environment. The stage apparatus provides movement of a stage (intended to hold the object) in X and Y directions of a guide plane. The stage is mounted to an arm member having at least first and second ends situated symmetrically relative to the stage. The ends include linear-motor movers that interact with corresponding stators, and include gas bearings on surfaces that slide relative to other surfaces as the stage is moved within the guide plane. The linear-motor movers can be one- or two-dimensional movers and desirably allow &thgr;-direction motion of the stage. Other configurations include guide members and sliders that undergo sliding motion relative to the guide members via non-contacting gas bearings.

Abstract: A stage assembly (10) for moving and positioning a device (26) includes a device table (20), a device holder (24) that retains the device (26), and a stage mover assembly (14). The stage assembly (10) includes one or more features that can isolate the device holder 24 and the device (26) from deformation. In some embodiments, the stage assembly (10) allows precise rotation of the device (26) between a first position (42) and a second position (44) without influencing the flatness of the device (26) and without deflecting and distorting the device (26). For example, the stage assembly (10) can include a carrier (60) and a holder connector assembly (62). The carrier (60) is supported above the device table (20) and rotates relative to the device table (20). The holder connector assembly (62) connects the device holder (24) to the carrier (60). Further, the stage assembly (10) can include a holder mover (120) that rotates the device holder (24) relative to the device table (20).

Abstract: A balanced positioning apparatus comprises a balance mass which is supported so as to be moveable in the three degrees of freedom, such as X and Y translations and rotation about the Z-axis. Drive forces in these degrees of freedom act directly between the positioning body and the balance mass. Reaction forces arising from positioning movements result in corresponding movement of the balance mass and all reaction forces are kept within the balanced positioning system. The balance mass may be a rectangular balance frame having the stators of two linear motors forming the uprights of an H-drive mounted on opposite sides. The cross-piece of the H-drive spans the frame and the positioned object is positioned within the central opening of the frame.

Abstract: A stage assembly for an exposure apparatus is disclosed. The stage assembly comprises a guide assembly. The guide assembly includes a guide bar, a stage, a first actuator component, and a second actuator component. The guide bar is movable in a first direction and has a center of gravity and a guiding portion. The stage is movable along the guiding portion of the guide bar in a second direction substantially perpendicular to the first direction and exerts a reaction force on the guide bar. The stage has a center of gravity spaced apart from the center of gravity of the guide bar in the first direction. The first actuator component is positioned on the guide bar. The first actuator component is aligned with the center of gravity of the stage in the second direction to apply a compensating force on the guide bar to cancel the reaction force exerted by the stage. The second actuator component is positioned on the guide bar.

Abstract: A bridge surface preparation, maintenance and painting system has a truck-mounted man lift with an extensible platform on which robot arms and cameras are mounted. Inflatable bags isolate the area of the bridge being worked on, and an apron catches debris such as from sand blasting. An operator sits at a remote control console on a truck, directs the man lift platform into position, controls the inflating of the barriers and operates and guides the robot arms through master-slave controls while watching video displays. The machine is used for surface preparation, undercoating, finish coat painting and bridge inspections.

Abstract: An XY-axes table having a base, a plurality of linear guiding apparatuses, a stage, an X-axis drive linear motor and a Y-axis drive linear motor. The linear motor include an armature and a movable element relatively movable with respect to the armature. The linear motor further includes first magnetic pole teeth rows which are magnetically connected to a first magnetic pole of the armature and are arranged so as to be separated into a first stage and a second stage in a substantially vertical direction to a moving direction of the movable element. Second magnetic pole teeth rows which are magnetically connected to a second magnetic pole of the movable element are arranged so as to be separated into a first stage and a second stage in a substantially vertical direction to the moving direction of the movable element.

Abstract: A connection assembly is provided to connect a part positioned inside a chamber assembly to a stationary surface. The chamber assembly provides a controlled atmospheric condition therein to isolate semiconductor substrates, a wafer stage device, and the process of making semiconductor substrates from the atmospheric condition so that the resulted substrates have an improved quality and meet certain wafer manufacturing specifications. The connection assembly includes a vibration isolation connection assembly and a bellows assembly. The vibration isolation connection assembly is removably connected to a part positioned in the chamber assembly via a link. The bellows assembly encases the vibration isolation connection assembly to maintain a controlled condition of the chamber assembly. The bellows assembly has a first end removably connected to a panel of the chamber assembly, and a second end connected to a stationary surface.

Abstract: A method for controlling and positioning a two-dimensional electric motor is disclosed. The electric motor has a coil array and a magnet array. The method controls the motor in two directions in the plane of the magnet array and about a third direction generally orthogonal to the plane. The method includes: determining currents for generating the desired forces, determining a resultant torque that would be generated from applying the determined currents, determining current adjustments to compensate for the resultant torque, and applying a current equal to the sum of the determined currents and the current adjustments to the coils to interact with the magnetic fields of the magnet array. The currents are applied to the portion of the coil array within the magnetic field of the magnet array, including those coils which are only partially within the magnetic field of the magnet array. Alternatively, the currents could be applied to all of the coils.

Abstract: When a drive unit which drives a reticle stage accelerates or decelerates it, the reaction experienced by this drive unit is discharged to a floor FD via an actuator, an attached member, and a reaction frame. Vibration generated in the reaction frame at this time is detected by an acceleration sensor. A vibration cancellation control section determines a direction and thrust for driving a movable section to which a weight is fixed in order to quell vibration of the reaction frame detected by the acceleration sensor, and emits a control signal to a driver.

Abstract: The control system comprises a microphone (7) linked to a receiver block (9) and delivering audio signals to a discriminating block (11) comparing the voice profile of the speaker with a particular authorized speaker profile recorded in a personal chip card (20) of the speaker. The authorized audio signals are then processed in a voice recognition device and an electronic control unit so as to selectively activate one of the actuators (3) of the operating table in response to a specific voice command uttered into the microphone and effected by an effector (16) actuated by the speaker.

Abstract: A XYZ-axes table including a base, a plurality of linear guiding apparatuses, a stage, an X-axis drive linear motor, a Y-axis drive linear motor, and a Z-axis drive linear motor. The linear motor is constituted by an armature and a movable element being capable of relatively moving with respect to the armature. The linear motor further has magnetic poles and magnetic pole teeth arranged in a predetermined manner.

Abstract: A platform stabilization coupler for transmitting acceleration forces to an elevator platform disposed on an elevator car frame is presented. The coupler includes a vibration member having a first surface disposed in fixed relation to either one of the elevator car frame and the platform. The coupler additionally includes a linear bearing disposed in fixed relation to a second surface of the vibration member. The bearing is disposed in moveable relation with the other of the elevator car frame and the platform to allow substantially vertical movement of the platform relative to the elevator car frame. The vibration member and linear bearing provide a transmission path for the lateral acceleration forces from the elevator car frame to the platform.

Abstract: A platform stabilization coupler for transmitting acceleration forces to an elevator platform disposed on an elevator car frame is presented. The coupler includes a vibration member having a first surface disposed in fixed relation to either one of the elevator car frame and the platform. The coupler additionally includes a linear bearing disposed in fixed relation to a second surface of the vibration member. The bearing is disposed in moveable relation with the other of the elevator car frame and the platform to allow substantially vertical movement of the platform relative to the elevator car frame. The vibration member and linear bearing provide a transmission path for the lateral acceleration forces from the elevator car frame to the platform.

Abstract: A two axis (azimuth and elevation) stabilized common gimbal (SGC) for use on a wide variety of commercial vehicles and military vehicles which are employed in combat situations capable of stabilizing a payload of primary sensors and of mounting a secondary sensor payload that is independent of the moving axes. The SCG employs three gyroscopes, inertial angular rate feedback for providing gimbal control of two axes during slewing and stabilization. In addition the third (roll) gyroscope is used for performing automatic calibration and decoupling procedures. In this regard, the SCG provides an interface for the primary suite of sensors comprising one or more sensors having a common line-of-sight (LOS) and which are stabilized by electronics, actuators, and inertial sensors against vehicle motion in both azimuth and elevation.

Abstract: The invention provides an XYZ-axes table with a linear motor. The XYZ-axes table has a base, a plurality of linear guiding apparatuses, a stage, an X-axis drive linear motor, a Y-axis drive linear motor, and a Z-axis drive linear motor. The linear motor is constituted by an armature and a movable element being capable of relatively moving with respect to the armature.

Abstract: A calculation system for calculating the control signals which are designed to perform a frequency-dependent weighting of the angular velocity signals and the angular position signals. The angular velocity indicators are preferably used for stabilization in a high frequency band while the angular position indicators are suitable for stabilization in a low frequency band. A further calculation system which is designed to perform the frequency-dependent weighting such that the control signals for frequencies below a certain frequency are substantially determined by the angular position signals and the control signals for higher frequencies are substantially determined by the angular velocity signals.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: A stage assembly (10) for moving and positioning one or more objects (24) for an exposure apparatus (28) is provided herein. The stage assembly (10) includes a fine stage (14) and a coarse stage (18). The fine stage (14) includes a holder (15) that retains the object (24). The stage assembly (10) also includes a fine Y mover (32) and a fine X mover (34) that precisely move the fine stage (14) relative to the coarse stage (18). Uniquely, the fine movers (32), (34) are positioned on only one side of the holder (15). With this design, the resulting stage assembly (10) has a relatively low mass and a relatively high servo bandwidth. Further, with this design, the stage assembly (10) is readily accessible for service and a measurement system (16) can be easily positioned near the fine stage (14). The stage assembly (10) can also include an anti-gravity mechanism (40) that minimizes distortion of a stage base (12) that supports the fine stage (14) as the fine stage (14) moves above the stage base (12).

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: For each control period, a position of each elevator of a plurality of elevating devices is calculated, the farthest elevator from a designated movement destination position is determined as a reference elevator based on the position of each elevator thus calculated, position deviations of other elevators are calculated with respect to a position of the reference elevator, actuators of the elevators other than the reference elevator which have the position deviations outside a predetermined range are off controlled, and actuators of the elevator having the position deviation within the predetermined range and the reference elevator are on controlled.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A sensor chip is provided that includes a sensing element and a sigma-delta circuit that cooperate to generate sensor samples at a sensor data rate and a buffer that stores sensor samples at the sensor data rate. Although the buffer stores the samples at the sensor data rate, it is capable of providing the samples to an external circuit at a higher data rate. In one embodiment, the sensor chip is able to provide the stored sensor samples to an off-chip component at a rate set by the off-chip component.

Abstract: A stage apparatus for moving a table, on which a work is carried, of a semiconductor producing equipment or the like on a base by way of a driving shaft and positioning the table at a predetermined position. The stage apparatus comprises a guide mechanism for guiding and supporting the table on the base; a linear motor provided between the base and the table along a direction in which the table is fed; and controlling means for controlling, for a predetermined period before the table is stopped, stopping operations of the driving shaft and the linear motor in a mutually associated relationship in accordance with predetermined controlling conditions.

Abstract: A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween.

Abstract: A stage assembly (10) for moving and positioning one or more objects (24) for an exposure apparatus (28) is provided herein. The stage assembly (10) includes a fine stage (14) and a coarse stage (18). The fine stage (14) includes a holder (15) that retains the object (24). The stage assembly (10) also includes a fine Y mover (32) and a fine X mover (34) that precisely move the fine stage (14) relative to the coarse stage (18). Uniquely, the fine movers (32), (34) are positioned on only one side of the holder (15). With this design, the resulting stage assembly (10) has a relatively low mass and a relatively high servo bandwidth. Further, with this design, the stage assembly (10) is readily accessible for service and a measurement system (16) can be easily positioned near the fine stage (14). The stage assembly (10) can also include an anti-gravity mechanism (40) that minimizes distortion of a stage base (12) that supports the fine stage (14) as the fine stage (14) moves above the stage base (12).

Abstract: A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween.

Abstract: The invention described here concerns the use of GPS (Global Positioning System) interferometry, or any similar satellite constellation, to estimate the attitude of a vehicle, and is particularly suited for LEO (Low Earth Orbit) satellites. The invention is based on a system of gyroscopic and interferometric sensors and a piece of software to process the data received by such sensors. The invention can be applied to any type of vehicle (terrestrial, naval, aircraft or spacecraft) to determine the attitude of the vehicle with respect to an inertial reference system.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: Systems and methods are described for direct skew control and interlock of a gantry. An apparatus includes a gantry that includes a first member defining a gantry primary axis Z, a cross member defining a secondary axis X that is coupled to the first member via a trunnion, and a second member defining a gantry primary axis Z′ coupled to the cross member via an elastic hinge. A method for controlling skew on a cross member moved by a first and second driver includes moving the first and second drivers to a first position, measuring a resulting skew value, and correcting the skew on the cross member by moving the first driver and/or the second driver.

Abstract: An apparatus capable of high accuracy position and motion control utilizes one or more linear commutated motors to move a guideless stage in one long linear direction and small yaw rotation in a plane. A carrier/follower holding a single voice coil motor (VCM) is controlled to approximately follow the stage in the direction of the long linear motion. The VCM provides an electromagnetic force to move the stage for small displacements in the plane in a linear direction perpendicular to the direction of the long linear motion to ensure proper alignment. One element of the linear commutated motors is mounted on a freely suspended drive assembly frame which is moved by a reaction force to maintain the center of gravity of the apparatus. Where one linear motor is utilized, yaw correction can be achieved utilizing two VCMs.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A plurality of electrostrictive elements 30 are located about the perimeter section of a table 2. The table is fixed to a table fixing member 3. The table fixing member 3 is prohibited from rotating by guide pins 19. When a servo motor 4′ constituting a rotational drive mechanism 4 is driven by passing a current through a stator 6 therein, the rotor 7 rotates. Thereby, the table fixing member 3, which has a female screw thread 10 that engages with a male screw thread 9 formed in the rotor 7, moves in a vertical direction. The table 2 also moves in a vertical direction and can be registered in a desired position. Inclination of the table 2 caused by processing errors in the male screw 9 and female screw 10 is adjusted to a horizontal position or a desired angle, by driving the electrostrictive elements 30.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A stage system includes a stage movable along a path, a first driving mechanism for accelerating or decelerating the stage on the basis of a resilience force of a resilient member, a first holding mechanism for holding a resilience force being accumulated through compression of the resilient member of the first driving mechanism, and a second holding mechanism for holding a resilience force being accumulated through extension of the resilient member of the first driving mechanism, wherein resilience energy of the resilient member is used for stage acceleration, which is very effective to prevent large heat generation, and wherein resilient energy accumulated in the resilient member during deceleration is used for subsequent stage acceleration, which is very effective for energy efficiency and for heat generation suppression.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: Provided is a rectangular coordinate type robot, in which spaced-apart first tables are provided with respective first moving units that are guided along the first tables, and a second table has its one end connected to the first moving unit provided for one of the first tables and the other end connected to the first moving unit provided for the other first table. The end portions of the second table and the first moving units are connected with each other via connecting members that have a rigidity in the movement direction of the first moving unit and a resiliency in the direction extending along the second table.

Abstract: A control system stabilizes the flexible body bending modes of a space, airborne, or ground-based system, while providing angular position control of an oscillating mass connected to a counter-oscillating counterbalance. The actuating mechanism uses two drive motors to exert torques on the mass and counterbalance, respectively, under the control of a feedback controller. The controller has a first control channel generating a first torque command signal for the first drive based on the angular position of the mass, and a second control channel generating a second torque command signal for the second drive based on the angular position of the counterbalance and a torque cross-feed signal from the first control channel. The second control channel includes a notch filter for removing input frequencies in a predetermined bandwidth about the frequency of the first torque command signal.

Abstract: A guided stage mechanism suitable for supporting a reticle in a photolithography machine includes a stage movable in the X-Y directions on a base. Laterally surrounding the stage is a rectangular window frame guide which is driven in the X-axis direction on two fixed guides by means of motor coils on the window frame guide co-operating with magnetic tracks fixed on the base. The stage is driven inside the window frame guide in the Y-axis direction by motor coils located on the stage co-operating with magnetic tracks located on the window frame guide. Forces from the drive motors of both the window frame guide and the stage are transmitted through the center of gravity of the stage, thereby eliminating unwanted moments of inertia. Additionally, reaction forces caused by the drive motors are isolated from the projection lens and the alignment portions of the photolithography machine.

Abstract: A guideless stage for aligning a wafer in a microlithography system is disclosed, and a reaction frame is disclosed which isolates both external vibrations as well as vibrations caused by reaction forces from an object stage. In the guideless stage an object stage is disclosed for movement in at least two directions and two separate and independently movable followers move and follow the object stage and cooperating linear force actuators are mounted on the object stage and the followers for positioning the object stage in the first and second directions. The reaction frame is mounted on a base structure independent of the base for the object stage so that the object stage is supported in space independent of the reaction frame. At least one follower is disclosed having a pair of arms which are respectively movable in a pair of parallel planes with the center of gravity of the object stage therebetween.

Abstract: A control apparatus for controlling movement of a table supporting an object under inspection in a medical diagnosis system includes a driving power unit for moving the table, a position detector for outputting a signal indicating a position of the table, a positioning servo-control unit for controlling the driving power unit so that the detected position signal coincides with a given desired value, a manipulating force detector for outputting a force signal corresponding to a manipulating force applied by an operator, a force-to-position conversion unit for converting the force signal into a position change quantity for the table, a force control unit for controlling the driving power unit in accordance with the position change quantity so long as the manipulating force is being detected, and a change-over unit for selecting either the positioning servo-control unit or the force control unit in response to operation of the operator.

Abstract: A supporting apparatus for supporting a table having N degrees of freedom, where N is an integer greater than one. The apparatus includes a stage and a leaf spring mounted on the stage. The spring initially contacts the table at a contact point and has a coefficient of elasticity greater in the horizontal direction and smaller in the vertical direction. The spring also has a characteristic of positive rigidity. A pair of permanent magnets are mounted in an area between the stage and table in a vertical direction for counterbalancing the characteristic of positive rigidity of the leaf spring.

Abstract: An apparatus for moving a stage, supported by a base, to a target position. The apparatus includes a motor for driving the stage in X and Y directions, a laser interferometer for measuring a current position of the stage in the X and Y directions and a controller for generating a control signal for controlling the motor to move the stage to the target position in the X and Y directions on the basis of the target position and for dynamically setting a transfer function associated with generation of the control signal in correspondence with the current measured position. The controller sets the transfer function so that a gain decreases as the stage moves toward a peripheral portion of the base.

Abstract: Force feedback in large, immersive environments is provided by device which a gyro-stabilization to generate a fixed point of leverage for the requisite forces and/or torques. In one embodiment, one or more orthogonally oriented rotating gyroscopes are used to provide a stable platform to which a force-reflecting device can be mounted, thereby coupling reaction forces to a user without the need for connection to a fixed frame. In one physical realization, a rigid handle or joystick is directly connected to the three-axis stabilized platform and using an inventive control scheme to modulate motor torques so that only the desired forces are felt. In an alternative embodiment, a reaction sphere is used to produce the requisite inertial stabilization. Since the sphere is capable of providing controlled torques about three arbitrary, linearly independent axes, it can be used in place of three reaction wheels to provide three-axis stabilization for a variety of space-based and terrestrial applications.