With Diffusing Or Masking (e.g., Vignetting) Patents (Class 355/125)
  • Patent number: 10252551
    Abstract: A system includes a carrier frame having a void, a rigid substrate sized slightly smaller than the void, the rigid substrate is connected to the carrier frame within the void, and a tape connected to edges of the rigid substrate and the carrier frame along the edges of the rigid substrate. The system is for printing with a standard printer to provide a full bleed print on the rigid substrate.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: April 9, 2019
    Inventor: Albert Marco
  • Patent number: 10182195
    Abstract: Various embodiments of the present disclosure may include a focal plane array configured to capture thermal image data from a scene. The embodiments may further include a sensor window displaced a first distance from the focal plane array. The embodiments may also include a protective window displaced a second distance greater than the first distance from the focal plane array, wherein the second distance causes damage or debris incident on the protective window to be out of focus in the thermal image data.
    Type: Grant
    Filed: September 11, 2015
    Date of Patent: January 15, 2019
    Assignee: FLIR Systems, Inc.
    Inventors: Joseph Kostrzewa, Bruce Covington, Chris Posch
  • Patent number: 10159335
    Abstract: The present invention provides a composite suction plastic panel, which comprises a substantially planar and single-layered surface plate and a bottom plate formed by plastic suction mold method, the bottom plate is disposed with a plurality of raisings to support the panel and is adhesively connected to the bottom surface of the surface plate, the top surface of the surface plate is disposed with grooves, the grooves are arranged corresponding to the positions of the vents in the plastic suction mould. The plastic suction mark of the vents is left in the grooves at the time of formation, so that the surface of the plastic surface plate is flat and smooth without a mark of vents.
    Type: Grant
    Filed: September 24, 2013
    Date of Patent: December 25, 2018
    Assignee: New-Tec Integration (Xiamen) Co., Ltd.
    Inventor: Luhao Leng
  • Patent number: 9601436
    Abstract: A semiconductor wafer is provided. The semiconductor wafer includes a base layer having an active region and an edge region. A number of semiconductor devices is formed on the active region. The semiconductor wafer also includes a wafer identification. The wafer identification is formed on the edge region and used for identifying the semiconductor wafer. The semiconductor wafer further includes an alignment mark. The alignment mark is formed on the edge region and is used for performing an alignment process of the semiconductor wafer.
    Type: Grant
    Filed: June 6, 2014
    Date of Patent: March 21, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Shing-Kuei Lai, Wei-Yueh Tseng, Hsiao-Yi Wang, De-Fang Huang
  • Patent number: 9417367
    Abstract: The present invention relates to a pressure sensitive adhesive film for an orientating treatment of a photo-orientable layer, a laminated film, a method for preparing an optical filter or a stereoscopic image display device. In the present invention, the pressure sensitive adhesive film for an orientating treatment in a photo-orientable layer which can minimize the generation of the un-orientated regions, and can form the orientated pattern having high degrees of accuracy, and the preparation method for an optical filter using the pressure sensitive adhesive film are provided. Further, the present invention can provide the optical filter and the stereoscopic image display device having excellent performance.
    Type: Grant
    Filed: June 8, 2011
    Date of Patent: August 16, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Sin Young Kim, Hyuk Yoon, Jong Sung Park, Kyung Ki Hong, Eung Jin Jang, Moon Soo Park, Doo Young Huh
  • Patent number: 6636294
    Abstract: A device having a substrate and a pattern structure formed on the substrate in accordance with plural processes including a multiple exposure process having (i) a step for photoprinting a fine stripe pattern on the substrate and (ii) a step for photoprinting a predetermined mask pattern on the substrate, such that the fine stripe pattern and the mask pattern are printed superposedly, wherein, in the pattern structure, a particular structural portion of the device is disposed in a portion where the fine stripe pattern and the mask pattern are printed superposedly.
    Type: Grant
    Filed: August 26, 1999
    Date of Patent: October 21, 2003
    Assignee: Canon Kabushiki Kaisha
    Inventor: Tetsunobu Kochi
  • Patent number: 6433854
    Abstract: In one example embodiment, a method of forming a pattern in a photoresist material includes illuminating a portion of the photoresist material according to the pattern and positioning a filter in a path of the light. The filter includes a number of regions upon which a filtering material has been. The filtering material has a variable characteristic that is independently adjustable for each region to enhance the uniformity of the intensity of the light. Such characteristics include the thickness of the filtering material, the size of the portion of the region that is covered by the filtering material, or a voltage, current, electric field, or magnetic field applied to the filtering material of each region.
    Type: Grant
    Filed: June 5, 2001
    Date of Patent: August 13, 2002
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Daniel C. Baker, Kouros Ghandehari, Satyendra S. Sethi
  • Patent number: 6262795
    Abstract: An apparatus for forming a pattern in a photoresist material includes a light source to provide light for illuminating a portion of the photoresist material according to the pattern and a filter positioned in a path of the light. The filter includes a number of regions upon which a filtering material has been. The filtering material has a variable characteristic that is independently adjustable for each region to enhance the uniformity of the intensity of the light. Such characteristics include the thickness of the filtering material, the size of the portion of the region that is covered by the filtering material, or a voltage, current, electric field, or magnetic field applied to the filtering material of each region.
    Type: Grant
    Filed: August 28, 1998
    Date of Patent: July 17, 2001
    Assignee: Philip Semiconductors, Inc.
    Inventors: Daniel C. Baker, Kouros Ghandehari, Satyendra S. Sethi
  • Patent number: 6146817
    Abstract: A negative to be printed is masked. The mask, or an image of the mask in the plane of the negative, or both the mask and the image, have a low resolution of 0.1 to 2 line pairs per millimeter.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: November 14, 2000
    Assignee: AGFA-Gevaert Aktiengesellschaft
    Inventors: Wolfgang Zahn, Friedrich Jacob, Gunter Findeis
  • Patent number: 5936707
    Abstract: A method is providing for making a multi-level reticle which transmits a plurality of incident light intensities, which in turn, are used to form a plurality of thicknesses in a photoresist profile. A partially transmitting film, used as one of the layers of the reticle, is able to provide an intermediate intensity light. The intermediate intensity light has an intensity approximately midway between the intensity of the unattenuated light passing through the reticle substrate layer, and the totally attenuated light blocked by an opaque layer of the reticle. The exposed photoresist receives light at two intensities to form a via hole in the resist in response to the higher intensity light, and a connecting line to the via at an intermediate level of the photoresist in response to the intermediate light intensity. A method for forming the multi-level resist profile from the multi-level reticle is provided as well as a multi-level reticle apparatus.
    Type: Grant
    Filed: January 16, 1998
    Date of Patent: August 10, 1999
    Assignees: Sharp Laboratories of America, Inc., Sharp Kabushiki Kaisha
    Inventors: Tue Nguyen, Bruce Dale Ulrich, David Russell Evans
  • Patent number: 5856864
    Abstract: A method of improving uneven illumination in a photographic printer having an original image position and a light source to illuminate the original image position, which light source may illuminate the original image position non-uniformly, the method comprising: first forming a mask by exposing a photographic element to the light source and processing the element to form a negative image of the light source at a filtering position between the light source and the original image position; and positioning the mask at the filtering position. A second aspect of the method uses an electronic processor and gathered illumination data, to generate a mask.
    Type: Grant
    Filed: September 20, 1996
    Date of Patent: January 5, 1999
    Assignee: Eastman Kodak Company
    Inventors: Stephen Gulick, Jr., Frederick Conrad Enrich, Roger Roy Adams Morton
  • Patent number: 5760882
    Abstract: A method of improving uneven illumination in a contact printer having an original image position and a light source to illuminate the original image position, which light source may illuminate the original image position non-uniformly, the method comprising: first forming a mask by exposing a photographic element to the light source and processing the element to form a negative image of the light source at a filtering position between the light source and the original image position; and positioning the mask at the filtering position. A second aspect of the method uses an electronic processor and gathered illumination data, to generate a mask.
    Type: Grant
    Filed: June 20, 1996
    Date of Patent: June 2, 1998
    Assignee: Eastman Kodak Company
    Inventors: Stephen Gulick, Jr., Frederick Conrad Enrich, Roger Roy Adams Morton
  • Patent number: 5467165
    Abstract: The frames of a film are scanned and exposure data, as well as masking data, are calculated for each frame from the resulting measurements. Following scanning, the frames are successively transported to a printing station. As a frame approaches the printing station, a mask is generated for the frame based on the respective masking data. The mask is produced by selectively roughening the surface of a transparent endless band or selectively applying a dye or pigment to the surface of the band. The band travels along an endless path which passes through the printing station, and movement of a mask and its corresponding frame are coordinated so that the frame is properly masked in the printing station. The masked frame is printed, and mask and frame are then withdrawn from the printing station while a succeeding frame and mask enter the printing station. If a dye or pigment is used for mask formation, the band can be conducted through a cleaning station where masks are removed after printing.
    Type: Grant
    Filed: October 20, 1993
    Date of Patent: November 14, 1995
    Assignee: Agfa-Gevaert Aktiengesellchaft
    Inventors: Friedrich Jacob, Wolfgang Zahn
  • Patent number: 5446521
    Abstract: An attenuated phase-shifted reticle is disclosed. The reticle comprises a device region and a scribeline region. The scribeline region further comprises metrology cells, which contain features to be patterned for the purpose of measurement, etc. Other portions of the scribeline region comprise a sub-resolution pattern of, for example, lines and spaces 180.degree. out of phase. Since the pattern is sub-resolution, it will not print. Since the pattern comprises features 180.degree. out of phase, the intensity of radiation underneath the pattern is significantly reduced. Therefore, in a lithography method incorporating multiple exposures of the scribeline region, the metrology cells are not overexposed by the overlapping exposures in the stepping system.
    Type: Grant
    Filed: October 7, 1994
    Date of Patent: August 29, 1995
    Assignee: Intel Corporation
    Inventors: Robert F. Hainsey, Giang T. Dao
  • Patent number: 5436097
    Abstract: A mask for evaluation of an aligner includes, on a transparent substrate, a plurality of resistance measurement pattern blocks each including a plurality of resistance measurement patterns which have shapes identical to each other. Resistance values of respective measurement patterns of conductive film portions on a substrate exposed and formed by using a mask having a plurality of the same measurement patterns vary in dependency upon the accuracy of a lens, etc. of the aligner. Accordingly, this evaluation mask is used to carry out exposure process to etch a conductive film to measure resistance values of the conductive film portions to compare them to each other, thereby making it possible to carry evaluation of an aligner including evaluation of a lens therefor.
    Type: Grant
    Filed: March 12, 1993
    Date of Patent: July 25, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masayuki Norishima, Yoshiaki Toyoshima, Takeshi Matsunaga
  • Patent number: 5396312
    Abstract: An apparatus for optically forming a pattern on an object using a reticle having an original pattern to be optically projected. The apparatus is equipped with a storage circuit for storing information indicative of an exposure condition for the reticle, the storage circuit being attached to the reticle. An exposure apparatus reads out the information from the storage circuit so as to project the original pattern of the reticle on the object in accordance with the read information so that a pattern corresponding to the original pattern is formed on the object. This arrangement can automatically and accurately set the exposure condition in the exposure apparatus.
    Type: Grant
    Filed: October 26, 1992
    Date of Patent: March 7, 1995
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazuhiro Kobushi, Hironao Iwai
  • Patent number: 5373373
    Abstract: The invention relates to scanning apparatus including a transparency support (12) and scanning means (3,4,5) for scanning a transparency (1) on the support to generate an electronic representation of an image defined by the transparency (1). The surface (24) of the support (12) which carries a transparency (1) in use has a surface profile with irregular undulations (25) such that any Newton's rings formed between the transparency (1) and the surface (24) of the support (12) cannot be resolved by the scanning means in use. Methods of producing the irregular undulations are also described.
    Type: Grant
    Filed: August 19, 1993
    Date of Patent: December 13, 1994
    Assignee: Crosfield Electronics Limited
    Inventor: Martin P. Gouch
  • Patent number: 5331369
    Abstract: A method of forming patterns and an apparatus for carrying out the same whereby semiconductor integrated circuits and the like are manufactured using reduction projection alignment. The invention primarily involves projecting patterns of a first substrate onto the surface of a second substrate via an optical projector to form a projection image of the patterns on the second substrate surface. A phase difference pattern is furnished on the plane or its equivalent where the patterns of the first substrate are located. The phase difference pattern affords a predetermined phase difference to the light passing therethrough. Light is irradiated at the phase difference pattern via the optical projector to project the phase difference pattern onto a detecting plane in the position equivalent to the surface of the second substrate. This forms a projection image of the phase difference pattern on the detecting plane.
    Type: Grant
    Filed: May 18, 1993
    Date of Patent: July 19, 1994
    Assignee: Hitachi, Ltd.
    Inventors: Tsuneo Terasawa, Katsunobu Hama, Soichi Katagiri
  • Patent number: 5329332
    Abstract: Disclosed is tilt-sensing means that employs a point source of alternate 1st or 2nd divergent light beams which, after passing through collimating lenses of the Half-Field Dyson projection optics of the stepper, are separately incident on and reflected from a reflective pattern disposed on the surface of a reticle and from a reflective surface of a wafer, together with two-dimensional position detection means responsive to the position of each of the reflected alternate 1st or 2nd divergent light beams, for independently sensing the angular position of the surface of the reticle and the angular position of the surface of the wafer to determine thereby whether or not the surface of the reticle and the surface of the wafer are substantially parallel to one another.
    Type: Grant
    Filed: December 21, 1992
    Date of Patent: July 12, 1994
    Assignee: Ultratech Stepper, Inc.
    Inventors: David A. Markle, Gerald J. Alonzo, Hwan J. Jeong
  • Patent number: 5315349
    Abstract: A projection aligner includes a light source for emitting light, a mask including a focusing pattern and a condensing lens for condensing the light on the mask. Light-intercepting members and light-transmitting portions are alternatingly arranged in the focusing pattern. The projecting aligner includes a projecting lens for condensing the light on a surface of a wafer and a sensor for measuring the amount of the light transmitted through the focusing pattern after the light has passed through the focusing pattern on the mask and been reflected from the surface of the wafer.
    Type: Grant
    Filed: November 10, 1992
    Date of Patent: May 24, 1994
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Kazuya Kamon
  • Patent number: 5311252
    Abstract: A method of proximity imaging photolithographic structures for the fabrication of high resolution ink jet orifice plates is used in ink jet printers. The method comprises the step of providing a positive-acting photoresist coating onto an electrically conducting plating substrate. A clear glass photomask is brought into planar proximity and a planar gap is established by means of screen shims permanently bonded to the glass photomask. It is desirable to ensure that the shims are uniformly distributed about the mask with at least one shim in the center. An atmospheric pressure sufficient to ensure that the shims are settled against the resist-coated substrate is then applied, before exposing the surface with an ultraviolet light source and developing to produce a non-conductive peg pattern corresponding to the desired orifice pattern.
    Type: Grant
    Filed: May 29, 1992
    Date of Patent: May 10, 1994
    Assignee: Eastman Kodak Company
    Inventors: Richard W. Sexton, James E. Harrison, Jr.
  • Patent number: 5296893
    Abstract: A reticle box characterized by a generally rectangular base member having a base portion and four contiguous wall portions, a generally rectangular cover member which can be engaged with the base member to fully enclose a reticle, and a closing mechanism which causes resilient stand-offs attached to the base member and the cover member to firmly grip the reticle within the box. Mating peripheral seals are provided around portions of the base member and the cover member to prevent the influx of contaminants. The cover member is of unitary design with an integral frame portion, central cover portion, and hinge. The reticle box is preferably made from a non-static plastic material.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: March 22, 1994
    Assignee: VLSI Technology, Inc.
    Inventors: Charles G. Shaw, Edward R. Vokoun, III
  • Patent number: 5250983
    Abstract: An original layout pattern for reticle includes a tip pattern region, a scribe region formed around the tip pattern region, and alignment marks formed in the scribe region. Each end of the alignment marks is not reached to a edge of the original layout pattern. Therefore, when the original layout pattern is formed on the reticle side by side in predetermined times, the alignment marks positioned at an inner portion between two adjacent patterns are separated from each other.
    Type: Grant
    Filed: July 10, 1992
    Date of Patent: October 5, 1993
    Assignee: NEC Corporation
    Inventor: Ryuji Yamamura
  • Patent number: 5077154
    Abstract: A soft edge mask comprises a panel having an opaque area forming a mask portion and defined by a clearly focussed edge of a predetermined shape, a transparent area forming a clear portion defined by a clearly focussed edge of the same said predetermined shape, and a margin portion extending between the opaque portion and the clear portion, the margin portion having a light transmissability varying progressively from the edge of the mask portion to the edge of the clear portion, and, at each position between the mask portion and the clear portion, being clearly focussed and having the same said predetermined shape.
    Type: Grant
    Filed: November 7, 1988
    Date of Patent: December 31, 1991
    Inventor: Ferrand D. E. Corley
  • Patent number: 5057865
    Abstract: A burnout frame for printing of a transparent original film (4) to a collecting film or printing plate (1) and a simultaneous burning out of non-image-carrying areas by means of a light of short wavelength, comprising a transparent printing glass (6,7,15), which is larger than the largest original film considered to be printed and which has a clear, central part (15) of an optical glass and of a type, which absorbs a part of the light within the ultraviolet wavelength range, particularly a bronze glass and designed to send light through the original film (4), and a diffused part (6-7) of a plastic material, located outside said part, the printing glass on its underside having one or two arrays of vacuum grooves (8, 9), designed to hold by suction an original film (4) and possibly also a masking film (5), and the glass part (15) of the printing glass being inserted into the plastic part (6-7), located on the outside, and being joined to it by means of a glue (16), which forms a light barrier between the glass
    Type: Grant
    Filed: October 30, 1990
    Date of Patent: October 15, 1991
    Assignees: Misomex Aktiebolag, Misomex Aktiebolag
    Inventors: Lars-.ANG.ke Rosen, Dan J. Lundberg
  • Patent number: 4935768
    Abstract: An apparatus for transporting a photosensitive sheet in which the photosensitive sheet is drawn out by a predetermined length, with the foremost portion of its image-forming area being illuminated by a lamp, and is transported backward by the same length before an image-forming process, and accordingly pressure-rupturable capsules on the said foremost portion of the image-forming area of the photosensitive sheet are hardened, thereby no colored image being formed on the corresponding portion of an image-receiving sheet in the image-forming process, so that the foremost portion of the image-receiving sheet does not stick to an upper heat roller and can thus be readily separated from heat rollers.
    Type: Grant
    Filed: July 11, 1989
    Date of Patent: June 19, 1990
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Yoshiaki Ibuchi
  • Patent number: 4902899
    Abstract: A lithographic process having improved image quality by employing a mask that includes a plurality of opaque elements or transparent elements that are smaller than the resolution of the lighography to be employed in order to control the transmittance of the actinic light exposure area.
    Type: Grant
    Filed: June 1, 1987
    Date of Patent: February 20, 1990
    Assignee: International Business Machines Corporation
    Inventors: Burn J. Lin, Anne M. Moruzzi, Alan E. Rosenbluth
  • Patent number: 4879573
    Abstract: A clamping frame for contact printers of working masks in the semiconductor industry enables the application of packings made of easily obtainable raw materials and limits tangential forces acting on masks of the original and copy. A first packing and a second packing with a supporting frame between both packings is provided. The supporting frame prevents transmission of tangential forces to packings which come in contact with masks of the original and of the copy.
    Type: Grant
    Filed: April 22, 1988
    Date of Patent: November 7, 1989
    Assignee: TESLA, koncernovy podnik
    Inventor: Bohumil Slavata
  • Patent number: 4825251
    Abstract: The present invention provides an imaging process wherein the pressure application developer means is not contaminated during pressure development. The process involves an imaging web including a support having a layer on the surface thereof of photosensitive microcapsules including an internal phase of a photohardenable photosensitive composition and a color former. The imaging web is image-wise exposed to a first source of actinic radiation to form an image area; this exposure defines a border area in the web comprising the areas of the imaging web surrounding the image area. The image area of the imaging web is contacted with an opaque receiver sheet. The border area is then uniformly exposed to a second source of actinic radiation to harden the microcapsules in the border area.
    Type: Grant
    Filed: July 14, 1988
    Date of Patent: April 25, 1989
    Assignee: The Mead Corporation
    Inventors: Erik K. Nelson, Michael E. Demarchi, David A. Boyer
  • Patent number: 4766492
    Abstract: A paper mask assembly having a frame which holds a paper mask disposed very near a photographic paper. When changing the size of the opening of the paper mask or replacing a paper mask with another one having an opening of different size, the paper mask is liable to damage the photographic paper. To avoid this, the frame can be pivoted by means of a working arm driven by a reversible motor. The working arm has one end pivotally mounted on the frame and the other end fixedly mounted on the drive shaft of the motor.
    Type: Grant
    Filed: August 31, 1987
    Date of Patent: August 23, 1988
    Assignee: Noritsu Kenkyu Center Co., Ltd.
    Inventor: Hiroshi Miyawaki
  • Patent number: 4764795
    Abstract: The invention sets forth an exceedingly accurate, however simple system or process for preparation of an Offset Printing-plate for consistant aligned matrices, while eliminating costly time consuming procedures and expensive apparatus of alignment; whereby: (a) the 2-dimensional graphic-art article is affixed to a standard Photo-table adjacent to a simple reference-line, as a preliminary registration-reference means; (b) the resulting repro-film is then provided with a special `anti-stretch`/backing-strip at one end (if it is of the inexpensive paper type place), and then placed upon a special zero-registration platen equipped with a special `floating Sight-wire` is to be visually aligned in superimposition over the said Ref.
    Type: Grant
    Filed: April 27, 1987
    Date of Patent: August 16, 1988
    Inventor: Mark J. Burbey
  • Patent number: 4668083
    Abstract: An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.
    Type: Grant
    Filed: November 18, 1985
    Date of Patent: May 26, 1987
    Assignee: The Perkin-Elmer Corporation
    Inventors: Prasad R. Akkapeddi, Robert E. Hufnagel
  • Patent number: 4666292
    Abstract: A projection optical apparatus used for projecting a pattern in the photolithographic operation for semiconductor device fabrication and a photographic mask used with the apparatus. In the projection optical apparatus, the reflected light from the pattern of a mask is utilized in place of the transmitted light through the pattern of the mask for the purpose of projecting the pattern. For this purpose, the projection optical apparatus includes illuminating optical means for projecting an illuminating light to the pattern of the mask and light guide means for directing the illuminating light reflected by the pattern of the mask to a projection optical system. A mask adapted for use with the apparatus contains a pattern composed of two opaque areas which are different in reflectance from each other.
    Type: Grant
    Filed: August 23, 1985
    Date of Patent: May 19, 1987
    Assignee: Nippon Kogaku K.K.
    Inventors: Kazunori Imamura, Yoshio Mori
  • Patent number: 4645336
    Abstract: Method and apparatus for determining the trimmed image of originals for reproduction with opto-electrical original scanning wherein a mask is produced before the actual original scanning and the mask includes clearance for receiving the original therein. The mask and original are adjusted with respect to the desired trimmed image and the angular position by placing it in a projection head of an apparatus for scale identification wherein the holder of the original can be removed from the projection head of the apparatus and hinged downwardly for performing these functions.
    Type: Grant
    Filed: June 11, 1986
    Date of Patent: February 24, 1987
    Assignee: Dr. Ing. Rudolf Hell GmbH
    Inventor: Dieter Muehlenbruch
  • Patent number: 4637713
    Abstract: A pellicle mounting apparatus characterized by a pair of pellicle holder assemblies positioned on either side of a photomask holder assembly. A drive mechanism is coupled between the two pellicle holder assemblies to exert a simultaneous force on the two assemblies to drive them towards or away from the photomask holder assembly. An alignment assembly including a pair of telescopes are first aligned with pellicle holder assemblies, and then the photomask is adjusted to align it with the telescopes. Once the pellicle holder assemblies and photomask holder assembly are properly aligned, pellicles can be repeatedly and accurately attached to opposing sides of a series of photomasks.
    Type: Grant
    Filed: September 27, 1985
    Date of Patent: January 20, 1987
    Assignee: SCSS Instruments, Inc.
    Inventors: Arthur M. Shulenberger, John A. Piatt
  • Patent number: 4634270
    Abstract: A protective cover for photoprinting system comprises a cover portion made of a transparent thin plate of inorganic material, an antireflection multiple coating provided on at least one of the inner and outer surfaces of the cover plate, and a spacer arranged on the peripheral portion of the cover plate for keeping the inner surface of the cover plate away from the surface to be protected, e.g., pattern surface of photomask and sealing the space between them.Since the cover plate is made of inorganic material, the mechanical strength thereof is large. Since the cover plate is thin and the antireflection multiple coating is provided on the cover plate, absorption of light therein is little and confusion of the pattern image due to rays reflected by the boundaries of the cover plate is ignorable.
    Type: Grant
    Filed: October 18, 1985
    Date of Patent: January 6, 1987
    Assignees: Nippon Sheet Glass Co., Ltd., Hitachi Ltd., Hitachi Microcomputer Engineering Ltd.
    Inventors: Sadao Yokoo, Tadashi Shimomura, Soichi Torisawa, Masahiro Dan, Tsuyoshi Kaneda
  • Patent number: 4624557
    Abstract: An injection-molded photomask carrier includes a base with a round opening of sufficient size and shape to permit light to pass through during a photolithographic process; at least three wall members joined to, upstanding from and framing the periphery of the base to support the edges of a photomask or a photomask/pellicle array resting on the base; a flange projecting inwardly from one of the walls, and a clip on the side of the base opposite the flange for movable engagement with the portions of the photomask or photomask/pellicle combination at its edges. A container for the carrier is complementary in size and shape to the carrier, injection-molded, and includes an injection-molded cover for the container.
    Type: Grant
    Filed: February 13, 1985
    Date of Patent: November 25, 1986
    Inventor: Ray Winn
  • Patent number: 4600666
    Abstract: The photoscreen for making a halftone reproduction from a photograph is used in a process where the photograph is placed in a reproducing position relative to a reproducing apparatus and the screen is interposed between the photograph and the reproducing means of the reproducing apparatus so that upon operation of the reproducing apparatus, a halftone reproduction is created. The photoscreen comprises a sheet of transparent material having on the bottom surface thereof an array of light modulating, varying density, light gray, vignetting dots mixed with an array of light modulating white dots preferably printed on the top surface thereof.
    Type: Grant
    Filed: January 5, 1984
    Date of Patent: July 15, 1986
    Inventor: Edmund S. Zink
  • Patent number: 4548493
    Abstract: A film mask handling device is disclosed herein having a base supporting a positive image slide in a mount or frame and a film mask carrying a negative image thereof in close fixed spaced apart relationship. Adhesive strips are carried on a pivotal and laterally movable yoke that initially aligns with and picks up the film mask for subsequent indexing with and attachment to the mount or frame via the adhesive strips so that the negative image on the mask is in registry with the positive image on the slide. A vacuum system is operably provided in the base for releasably holding the film mask and adhesive strips in relative positions during alignment and registry procedures. Controls are provided for sequentially releasing and picking up of the mask and strips respectively during the aforementioned procedures.
    Type: Grant
    Filed: April 10, 1984
    Date of Patent: October 22, 1985
    Inventor: William C. Mayfield
  • Patent number: 4533240
    Abstract: A device for maintaining films and panels in close tolerance registration. The device includes an upper leaf and a lower leaf which are selectively joined together by zero-tolerance snap connectors. The upper leaf and lower leaf are adapted to improve device wear characteristics and, as well, to improve the operation of the system which uses the registration device of the instant invention.
    Type: Grant
    Filed: July 30, 1982
    Date of Patent: August 6, 1985
    Assignees: Lowell A. Rodgers, Vernon C. Rodgers
    Inventor: Carl R. Jasperson
  • Patent number: 4525060
    Abstract: An exposure apparatus for projecting a certain pattern predrawn on a printed board, an integrated circuit or the like on a sheet of film to print the pattern on the sheet. A mask body on which a certain pattern is drawn is held so that it can rotate relative to a film-like body, and when the mask body and the film-like body are held in a certain positional relation during exposure, no gap is formed between these bodies.
    Type: Grant
    Filed: April 28, 1983
    Date of Patent: June 25, 1985
    Assignee: Orc Manufacturing Co., Ltd.
    Inventor: Hiroshi Miyamoto
  • Patent number: 4497574
    Abstract: In a color-slide duplicator having a housing containing a light source which illuminates an opening in a housing wall, and a support for a camera above the housing for photographic reproduction of a slide to be duplicated; an assembly for supporting the slide comprises a carrier plate releasably and adjustably secured by magnets to the housing wall so as to span the illuminated opening which registers, at least in part, with an aperture in the carrier plate, and first and second parallel guide bars having undercut, beveled edges facing toward each other and being arranged on the carrier plate at opposite sides of the aperture in the latter, with one of the guide bars being movable laterally and resiliently urged in the direction toward the other guide bar, such guide bars being included in a quick-release mechanism by which the slide to be duplicated is positioned and held against the carrier plate over the aperture therein.
    Type: Grant
    Filed: June 13, 1983
    Date of Patent: February 5, 1985
    Assignee: Kenro Corporation
    Inventors: Joseph Tarsia, Alexander S. Ross, Marina Gertsek
  • Patent number: 4474465
    Abstract: This invention concerns method and apparatus for making a mask conforming to a cured MLC substrate. The mask when made may be used to add layers of metallization to the cured substrate by conventional photolithographic techniques. The method and apparatus feature use of the cured substrate itself to pattern the mask. Particularly, the substrate is aligned with the unpatterned mask and the image of the substrate transferred to the mask such that once patterned, the mask may subsequently be realigned with the substrate. In preferred form, a system of notches and grooves are used to align the substrate and mask and a lens system used to transfer the substrate image to the mask. The invention also includes method and apparatus for making an improved MLC substrate. The improvement is characterized by the use of photolithographic techniques to add successive layers of metallization to the cured substrate.
    Type: Grant
    Filed: September 7, 1982
    Date of Patent: October 2, 1984
    Assignee: International Business Machines Corporation
    Inventors: Albert Amendola, Richard G. Christensen, John G. Yereance, Jr.
  • Patent number: 4461567
    Abstract: In the photoexposure of semiconductor wafers for the production of circuit elements, the wafers are placed in a prealignment position before being transferred to the exposure stage. A chuck acting as a prepositioning stage is rotatable by one servomotor to set the wafer in its appropriate angular position (.phi. adjustment) and is shiftable by respective servomotors in the X and Y directions. Servomotor control is effected by optical means detecting a noncircular edge portion of the wafer as well as alignment marks on the wafer inwardly of the edge thereof.
    Type: Grant
    Filed: September 28, 1982
    Date of Patent: July 24, 1984
    Assignee: Censor Patent- und Versuchs-Anstalt
    Inventor: Herbert E. Mayer
  • Patent number: 4456371
    Abstract: Semiconductor fabrication using optical projection apparatus is enhanced in an arrangement having means for producing exposures tailored to the patterns on the conventional photo-mask. A predetermined correction photo-mask capable of producing different exposure levels according to the original mask pattern is superimposed with the original mask on the semiconductor wafer by sequential double exposure using an additional mask change and alignment.A better arrangement provides two beams simultaneously illuminating the two masks; the two beams are recombined with a high quality beam splitter arrangement before reaching the imaging lens. The two masks only have to be aligned to each other once. Afterwards, the wafer is exposed regularly. Therefore, an uncorrected image has the lowest threshold for an isolated opening, medium threshold for equal lines and spaces, high threshold for an isolated opaque line. After the correction scheme, all thresholds are made equal.
    Type: Grant
    Filed: June 30, 1982
    Date of Patent: June 26, 1984
    Assignee: International Business Machines Corporation
    Inventor: Burn J. Lin
  • Patent number: 4455082
    Abstract: Apparatus for cropping and marking the mount of mounted transparencies, the apparatus including a supporting base having a rectangularly-shaped aperture forming a pathway extending from top and bottom through the base, a set of opposite sides having a slideway extending therethrough communicating with the rectangular aperture, a further set of opposite sides having a further slideway extending therethrough communicating with the rectangular aperture, an elongated masking member with a plurality of variously sized openings spaced along its length and being adapted to be received in sliding engagement within the slideway, a transparency holder having at least one transparency holding aperture and adapted to be received in sliding engagement within the further slideway. The apparatus provides use of an adjusting or slidable masking member that eliminates extraneous images from interferring with the selection process and what comes through the cutout is the selected portion thereof.
    Type: Grant
    Filed: September 2, 1982
    Date of Patent: June 19, 1984
    Inventor: Enn Lepist
  • Patent number: 4448520
    Abstract: A device for making both photographic proof sheets and enlargements includes a flat base plate with a low rectangular fence defining an area for accommodating a sheet of photographic paper, template carriers hingedly connected to the base plate and a variety of glassless templates which are slidable into and out of the carriers for making photographic proof sheets without the use of a pressure plate, masking a variety of areas of photographic paper while providing a light-tight seal when closed upon the base plate and holding photographic paper flat for the printing of enlargements.
    Type: Grant
    Filed: March 22, 1982
    Date of Patent: May 15, 1984
    Inventors: Myron B. Achtman, Malcolm S. Achtman
  • Patent number: 4433911
    Abstract: A method for evaluating the measure precision of patterns such as photoresist and etched ones, and a photomask therefor. The photomask according to the present invention has a mask pattern corresponding to a pattern desired to be formed in a substrate, and also has a measure precision evaluating pattern formed at an area different from where the mask pattern is present. The measure precision evaluating pattern comprises a first measure precision evaluating pattern which has a plurality of pairs of pattern elements opposite to each other with a predetermined distance interposed therebetween, and a second measure precision evaluating pattern which has a plurality of pairs of pattern elements overlapped each other in a predetermined measure and arranged opposite to each other to form a constricted portion. The distance or the measure of overlapped area between paired pattern elements is varied with every pair of pattern elements.
    Type: Grant
    Filed: June 23, 1982
    Date of Patent: February 28, 1984
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Shizuo Sawada, Mitsugi Ogura, Norio Endo
  • Patent number: 4415262
    Abstract: A photomask is disclosed which is suitable for use in the one-mask method capable of forming a plurality of patterns with one exposure, and in which an opaque pattern having a predetermined form and a semi-transparent pattern having another predetermined form are formed on a transparent substrate, and the semi-transparent pattern is formed of an opaque film having a large number of fine through holes.
    Type: Grant
    Filed: January 18, 1982
    Date of Patent: November 15, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Naoki Koyama, Youji Maruyama, Hiroshi Umezaki, Norikazu Tsumita, Yutaka Sugita
  • Patent number: 4405229
    Abstract: In the projection-copying of a mask on a workpiece including a light-reflecting semiconductor substrate, the alignment of mask and workpiece is effected by illuminating marks on the substrate which appear dark relative to a surrounding area. To provide each mark with a contrasting background of sufficient brightness, a partly reflecting surface layer overlying the substrate in that area has a nonuniform optical thickness whereby cancellation of reflections due to interference is limited to isolated regions.
    Type: Grant
    Filed: May 20, 1981
    Date of Patent: September 20, 1983
    Assignee: Censor Patent- und Versuchs-Anstalt
    Inventor: Herbert E. Mayer