With Temperature Or Foreign Particle Control Patents (Class 355/30)
  • Patent number: 10732509
    Abstract: A shutter blade assembly for a photolithography machine, a large-field of view (FoV) photolithography machine and an exposure method are disclosed. A scanning-directional shutter blade subassembly is moved once during each illuminance test and then moved above alignment marks after the test. During exposure, the scanning-directional shutter blade subassembly moves with a mask stage in the same direction and at the same speed so that it stays stationary relative to the alignment marks on a photomask (4). In case of full-FoV exposure, it is not necessary for a non-scanning-directional shutter blade subassembly to be moved, while in case of partial-FoV exposure, it is moved into the partial exposure FoV and defines there a window for obtaining a light spot with a desired shape by modulating illumination light.
    Type: Grant
    Filed: May 27, 2017
    Date of Patent: August 4, 2020
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Bin Wang, Xiaofeng Yang, Hongfa Xia
  • Patent number: 10725277
    Abstract: An objective lens unit for a liquid immersion microscope includes: a first liquid passage in a pipe shape including an opening disposed at a lens surface end as a lens surface of a lens at a closest side to an observing object, the first liquid passage being coupled to an outside of the objective lens unit, and a second liquid passage in a pipe shape disposed independently from the first liquid passage, the second liquid passage including an opening disposed at a position adjacent to the opening of the first liquid passage on the lens surface end, the second liquid passage being coupled to the outside of the objective lens unit.
    Type: Grant
    Filed: April 21, 2017
    Date of Patent: July 28, 2020
    Assignee: Yokogawa Electric Corporation
    Inventor: Tsuyoshi Nakamura
  • Patent number: 10712676
    Abstract: A radiation source apparatus is provided. The radiation source apparatus includes a chamber, a target droplet generator, an exhaust module, a measuring device, and a controller. The target droplet generator is configured to provide a plurality of target droplets to the chamber. The exhaust module is configured to extract debris corresponding to the target droplets out of the chamber according to a first gas flow rate. The measuring device is configured to measure concentration of the debris in the chamber. The controller is configured to adjust the first gas flow rate according to the measured concentration of the debris.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: July 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10712675
    Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
  • Patent number: 10710358
    Abstract: Embodiments described herein generally relate to an apparatus and methods for removing a glue residue from a photomask. The glue residue may be exposed when a pellicle is removed from the photomask. Before a new pellicle can be adhered to the photomask, the glue residue may be removed. To remove the glue residue, a laser beam may be projected through a lens and focused on a surface of the glue residue. The glue residue may be ablated from the photomask by the laser beam.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: July 14, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Banqiu Wu, Eli Dagan
  • Patent number: 10705426
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: July 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
  • Patent number: 10684551
    Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.
    Type: Grant
    Filed: April 23, 2019
    Date of Patent: June 16, 2020
    Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.
    Inventors: Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer, Peter Kuerz, Guido Limbach, Stefan Hembacher, Holger Walter, Yim-Bun-Patrick Kwan, Markus Hauf, Franz-Josef Stickel, Jan Van Schoot
  • Patent number: 10684559
    Abstract: An apparatus for cleaning an electrostatic reticle holder used in a lithography system includes a chamber for providing a low pressure environment for the electrostatic reticle holder and an ultrasound transducer configured to apply ultrasound waves to the electrostatic reticle holder. The apparatus further includes a controller configured to control the ultrasound transducer and a gas flow controller. The gas flow controller is configured to enable pressurizing or depressurizing the chamber.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: June 16, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Fu Lin, Tung-Jung Chang, Chia-Chen Chen
  • Patent number: 10678141
    Abstract: An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the driving apparatus. The controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in the same row, the third and fourth shot regions being arranged in different rows.
    Type: Grant
    Filed: October 11, 2019
    Date of Patent: June 9, 2020
    Assignee: NIKON CORPORATION
    Inventor: Shinji Sato
  • Patent number: 10656538
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: May 19, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Patent number: 10658183
    Abstract: An impurity-doping apparatus is provided with: a supporting plate which supports a semiconductor substrate; a wall-like block disposed above the supporting plate floating away from the semiconductor substrate, the wall-like block implements a recess inside so as to establish a space for a solution region containing impurity elements, the solution region is localized on an upper surface of the semiconductor substrate, the upper surface being opposite to an bottom surface facing to the supporting plate; and a laser optical system, configured to irradiate a laser beam onto the upper surface of the semiconductor substrate, through the solution region surrounded by the wall-like block, wherein the impurity elements are doped into a part of the semiconductor substrate by irradiation of the laser beam.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: May 19, 2020
    Assignee: FUJI ELECTRIC CO., LTD.
    Inventors: Kenichi Iguchi, Haruo Nakazawa, Masaaki Ogino
  • Patent number: 10649194
    Abstract: An arrangement and method for supplying immersion media and a method for setting optical parameters of a medium, includes a media supply unit for the controlled supply of a medium or of a mixture into a contact region between an optical lens and a specimen slide, on which a specimen may be arranged. An image capture unit is provided for capturing image data on the basis of detection radiation from the object space along a detection beam path extending through the contact region. An evaluation unit is provided to establish current image parameters on the basis of captured image data, to compare said current image parameters to intended image parameters and to establish a desired mixing ratio of at least two components of the medium depending on the comparison.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: May 12, 2020
    Assignee: Carl Zeiss Microscopy GmbH
    Inventors: Thomas Kalkbrenner, Sebastian Borck, Jörg Siebenmorgen
  • Patent number: 10620553
    Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
    Type: Grant
    Filed: February 25, 2019
    Date of Patent: April 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Jan Steven Christiaan Westerlaken, Gerardus Arnoldus Hendricus Franciscus Janssen, Peter Paul Steijaert, Engelbertus Antonius Fransiscus Van Der Pasch, Franciscus Van De Mast
  • Patent number: 10613432
    Abstract: Disclosed are a mask treating apparatus and a mask treating method. The mask treating apparatus comprises a process chamber that receives a blank mask package inclusive of a blank mask and performs a process on the blank mask, an unpacking unit that is disposed in the process chamber and unpacks the blank mask package, and a laser marking unit that is disposed in the process chamber and irradiates a laser onto the blank mask to form a fiducial mark.
    Type: Grant
    Filed: December 11, 2017
    Date of Patent: April 7, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yunsong Jeong, Hyunseok Uhm, SunPyo Lee
  • Patent number: 10591406
    Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: March 17, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
  • Patent number: 10573546
    Abstract: A substrate treating apparatus includes a front heat-treating block, a front relay block and a solution treating block. The front heat-treating block has heat-treating units and main transport mechanisms. The front relay block has receivers and transport mechanisms. The solution treating block has solution treating units and transport mechanisms for solution treatment. The front heat-treating block and front relay block are connected to be able to transport substrates reciprocally. The front relay block and solution treating block are connected to be able to transport the substrates reciprocally. The front relay block is disposed between the solution treating block and front heat-treating block.
    Type: Grant
    Filed: March 27, 2018
    Date of Patent: February 25, 2020
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Yukihiko Inagaki
  • Patent number: 10571814
    Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: February 25, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Andre Bernardus Jeunink, Laurentius Johannes Adrianus Van Bokhoven, Stan Henricus Van Der Meulen, Yang-Shan Huang, Federico La Torre, Bearrach Moest, Stefan Carolus Jacobus Antonius Keij, Enno Van Den Brink, Christine Henriette Schouten, Hoite Pieter Theodoor Tolsma
  • Patent number: 10551748
    Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: February 4, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Cornelius Maria Rops, Walter Theodorus Matheus Stals, David Bessems, Giovanni Luca Gattobigio, Victor Manuel Blanco Carballo, Erik Henricus Egidius Catharina Eummelen, Ronald Van Der Ham, Frederik Antonius Van Der Zanden, Wilhelmus Antonius Wernaart
  • Patent number: 10539987
    Abstract: Provided is a document reading apparatus capable of preventing erasure of print information printed with erasable ink. If the document reading apparatus accepts a document reading instruction in a state where a plurality of documents are stacked in the document stacking tray, this apparatus causes a document feeding section to successively feed the documents one by one. This apparatus further includes a temperature sensor detecting the temperature of a document feeding path along which the document is fed by the document feeding section as a monitoring temperature and a document reading control section which interrupts the document reading operation until the monitoring temperature falls below a restart temperature threshold set to be equal to or lower than the interruption temperature threshold value when the temperature threshold value is exceeded.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: January 21, 2020
    Assignee: KYOCERA Document Solutions Inc.
    Inventor: Atsushi Nishida
  • Patent number: 10534271
    Abstract: A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.
    Type: Grant
    Filed: December 4, 2017
    Date of Patent: January 14, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pieter Jeroen Johan Emanuel Hoefnagels, Ronald Frank Kox, John Maria Bombeeck, Johannes Cornelis Paulus Melman, Ruud Hendrikus Martinus Johannes Bloks, Patricius Jacobus Neefs
  • Patent number: 10534270
    Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.
    Type: Grant
    Filed: February 7, 2019
    Date of Patent: January 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Josephus Martinus Van den Nieuwelaar, Victor Manuel Blanco Carballo, Casper Roderik De Groot, Rolf Hendrikus Jacobus Custers, David Merritt Phillips, Frederik Antonius Van der Zanden, Pieter Lein Joseph Gunter, Erik Henricus Egidius Catharina Eummelen, Yuri Johannes Gabriël Van de Vijver, Bert Dirk Scholten, Marijn Wouters, Ronald Frank Kox, Jorge Alberto Vieyra Salas
  • Patent number: 10534279
    Abstract: Embodiments described herein provide a method for cleaning contamination from sensors in a lithography tool without requiring recalibrating the lithography tool. More particularly, embodiments described herein teach cleaning the sensors using hydrogen radicals for a short period while the performance drifting is still above the drift tolerance. After a cleaning process described herein, the lithography tool can resume production without recalibration.
    Type: Grant
    Filed: October 16, 2019
    Date of Patent: January 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen, Shih-Chang Shih
  • Patent number: 10520837
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Grant
    Filed: February 16, 2018
    Date of Patent: December 31, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
  • Patent number: 10520828
    Abstract: A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space under an emitting surface of an optical member. The liquid immersion member includes a first member disposed in a periphery of the optical member, and a second member which is movable relative to the first member and includes a liquid recovery port that recovers at least a portion of liquid in the liquid immersion space. The second member is moved in a direction perpendicular to an optical axis of the optical member so that a relative speed between the second member and an object below the liquid immersion member is smaller than a relative speed between the first member and the object. The second member has an outer surface facing radially outward relative to the optical axis of the optical member, the outer surface does not face toward any surface of the first member.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: December 31, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10509334
    Abstract: Embodiments described herein provide a method for cleaning contamination from sensors in a lithography tool without requiring recalibrating the lithography tool. More particularly, embodiments described herein teach cleaning the sensors using hydrogen radicals for a short period while the performance drifting is still above the drift tolerance. After a cleaning process described herein, the lithography tool can resume production without recalibration.
    Type: Grant
    Filed: February 19, 2018
    Date of Patent: December 17, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Zi-Wen Chen, Po-Chung Cheng, Chih-Tsung Shih, Li-Jui Chen, Shih-Chang Shih
  • Patent number: 10509331
    Abstract: An immersion lithography apparatus having a controller configured to control a positioner to move a support table relative to an immersion space between the support table and a projection system to follow a route having a series of motions, the controller adapted to: predict a speed of an edge of the immersion space relative to an edge of an object on the support table when the edge of the immersion space passes over the edge of the object during at least one motion of the series of motions of the route; compare the speed to a predetermined parameter and to predict liquid loss from the immersion space during the at least one motion if the speed is greater than the predetermined parameter; and if liquid loss from the immersion space is predicted, modify one or more parameters of the route during the at least one motion accordingly.
    Type: Grant
    Filed: August 30, 2017
    Date of Patent: December 17, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Jorge Alberto Vieyra Salas, Auke Juriaan Been, Victor Manuel Blanco Carballo
  • Patent number: 10503085
    Abstract: A lithography apparatus is provided. The lithography apparatus includes an exposure system and a fluid handling system. The exposure system is configured to expose an exposure area on a substrate with an energy flow. The fluid handling system is configured to provide a heat transfer fluid flowing through a non-exposure area other than the exposure area on the substrate, to take heat away from the substrate.
    Type: Grant
    Filed: June 13, 2018
    Date of Patent: December 10, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: Shih-Ming Chang
  • Patent number: 10493504
    Abstract: Apparatus for and method of cleaning an electrically conductive surface of an optical element in a system for generating extreme ultraviolet radiation in which electrically conductive surface is used as an electrode for generating a plasma which cleans the surface.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: December 3, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Alexander I. Ershov
  • Patent number: 10495984
    Abstract: A barrier member configured to at least partly confine a liquid in a space between a projection system and a substrate table of an immersion lithographic system, the barrier member including: a liquid inlet configured to provide liquid to the space, a liquid outlet configured to remove liquid from the space, the liquid outlet having a porous member located in a surface configured toward face the substrate, a first gas inlet configured to provide gas to the space, the first gas inlet arranged to face toward the substrate and the first gas inlet located outward, relative to a central portion of the barrier member, of the porous member, and a second gas inlet configured to provide gas to the space, the second gas inlet arranged to face toward the substrate and the second gas inlet located outward, relative to the central portion, of the first gas inlet.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: December 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
  • Patent number: 10495986
    Abstract: A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: December 3, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Hakki Ergün Cekli, Güneş Nakibo{hacek over (g)}lu, Frank Johannes Jacobus Van Boxtel, Jean-Philippe Xavier Van Damme, Richard Johannes Franciscus Van Haren
  • Patent number: 10488759
    Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: November 26, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
  • Patent number: 10481502
    Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.
    Type: Grant
    Filed: March 12, 2018
    Date of Patent: November 19, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
  • Patent number: 10481509
    Abstract: The present invention provides a vibration damping apparatus that performs vibration damping of a first optical element among a plurality of optical elements arranged in a barrel, comprising: a holding member connected to the barrel and configured to hold the first optical element; and a mass body supported by the holding member via a damper element, wherein the mass body includes a second optical element different from the first optical element among the plurality of optical elements.
    Type: Grant
    Filed: March 4, 2019
    Date of Patent: November 19, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Yoshihiro Morimoto, Hiromichi Hara, Masahiko Ogawa, Ryo Takai
  • Patent number: 10475716
    Abstract: The sensor semiconductor device comprises a substrate (1) with a main surface (2), a sensor region (3) on or above the main surface, a coating layer (4) above the main surface, and a trench (5) formed in the coating layer around the sensor region. The trench provides drainage of a liquid from the coating layer.
    Type: Grant
    Filed: October 14, 2016
    Date of Patent: November 12, 2019
    Assignee: ams AG
    Inventors: Nebojsa Nenadovic, Agata Sakic, Micha In't Zandt, Frederik Willem Maurits Vanhelmont, Hilco Suy, Roel Daamen
  • Patent number: 10459350
    Abstract: A linear motor with high heat recovery efficiency that inhibits the rise in surface temperature is offered. The linear motor is disposed in a surrounding member (142) and facing a flow passage (142a) of a liquid for regulating temperature, and is provided with a coil unit (141) having at least a part thereof in contact with the liquid. The coil unit (141) is provided with a coil body (144), a mold layer (143) that covers the coil body and holds it in specific form, and a liquid protection layer (150) that covers the mold layer (143) and has liquid protection properties.
    Type: Grant
    Filed: October 19, 2017
    Date of Patent: October 29, 2019
    Assignee: Nikon Corporation
    Inventors: Shigeru Morimoto, Tadahiro Kominami
  • Patent number: 10461490
    Abstract: A supercontinuum radiation source comprises: a radiation source, an optical amplifier and a non-linear optical medium. The radiation source is operable to produce a pulsed radiation beam. The optical amplifier is configured to receive the pulsed radiation beam and increase an intensity of the pulsed radiation beam. The non-linear optical medium is configured to receive the amplified pulsed radiation beam and to broaden its spectrum so as to generate a supercontinuum radiation beam. The optical amplifier may supply a pump radiation beam to a gain medium, an intensity of the pump radiation beam being periodic and having a pump frequency that is an integer multiple of the frequency of the pulsed radiation beam. The optical amplifier may supply pump energy to a gain medium only when the pulses of the pulsed radiation beam propagate through the gain medium.
    Type: Grant
    Filed: September 26, 2018
    Date of Patent: October 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Yongfeng Ni
  • Patent number: 10451973
    Abstract: An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
    Type: Grant
    Filed: September 30, 2015
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Hans Jansen, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Jeroen Johannes Sophia Maria Mertens, Jan-Gerard Cornelis Van Der Toorn, Michel Riepen
  • Patent number: 10444643
    Abstract: Lithographic exposure tool and method for operating thereof that includes modification of the tool (assessed based on the measurements of geometrical distortions caused, in the tool, by the exposure process and used to train the exposure tool) to ensure that such geometrical distortions are reduced for any chosen exposure process. The method includes processing first data (representing distortions caused by initial exposure run(s)) to estimate second data representing distortions that would occur for another exposure run); and forming a modified exposure tool by changing at least one of a) a geometrical path is a path along which the workpiece stage is repositioned during the operation of the exposure tool; b) one or more of a presence, position, orientation, size and shape of an optical component of an optical projection sub-system of the optical system of the exposure tool; and c) a parameter of scanning synchronization of the exposure tool.
    Type: Grant
    Filed: March 26, 2018
    Date of Patent: October 15, 2019
    Assignee: Nikon Research Corporation of America
    Inventors: Travis Bow, Fardad Hashemi, Henry Kin Heng Pang
  • Patent number: 10444634
    Abstract: An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the driving apparatus. The controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in the same row, the third and fourth shot regions being arranged in different rows.
    Type: Grant
    Filed: October 16, 2017
    Date of Patent: October 15, 2019
    Assignee: NIKON CORPORATION
    Inventor: Shinji Sato
  • Patent number: 10444646
    Abstract: A lithography apparatus that forms a pattern on a substrate, and the lithography apparatus includes: a holding unit that holds the substrate; and a cleaning member that brings a polishing unit into contact with the holding unit to clean the holding unit, in which the cleaning member includes a supply port which is arranged in the polishing unit and through which gas is supplied, and a suction port which is arranged in a periphery of the polishing unit and through which gas is sucked.
    Type: Grant
    Filed: August 21, 2018
    Date of Patent: October 15, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventor: Masami Yonekawa
  • Patent number: 10437156
    Abstract: An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: October 8, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Takeshi Kaneko, Kornelis Tijmen Hoekerd
  • Patent number: 10416571
    Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: September 17, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Han Henricus Aldegonda Lempens, Miao Yu, Cornelius Maria Rops, Ruud Olieslagers, Artunç Ulucan, Theodorus Wilhelmus Polet, Patrick Johannes Wilhelmus Spruytenburg
  • Patent number: 10410831
    Abstract: To irradiate a target with a beam of energetic electrically charged particles, the beam is formed and imaged onto a target, where it generates a pattern image composed of pixels. The pattern image is moved along a path on the target over a region of exposure, and this movement defines a number of stripes covering said region in sequential exposures and having respective widths. The number of stripes are written parallel to each other along a general direction, which is at a small angle to a principal pattern direction of structures to be written within the region of exposure.
    Type: Grant
    Filed: May 11, 2016
    Date of Patent: September 10, 2019
    Assignee: IMS Nanofabrication GmbH
    Inventor: Elmar Platzgummer
  • Patent number: 10394141
    Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten
  • Patent number: 10386725
    Abstract: An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality.
    Type: Grant
    Filed: April 23, 2018
    Date of Patent: August 20, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk, Martinus Hendrikus Antonius Leenders
  • Patent number: 10372044
    Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.
    Type: Grant
    Filed: December 28, 2017
    Date of Patent: August 6, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Ten Kate, Raymond Wilhelmus Louis Lafarre
  • Patent number: 10373846
    Abstract: A substrate processing method includes a first process of supplying a first gas to a substrate; and a second process of supplying a second gas to the substrate after the first process. When a distance from an edge of the substrate to a boundary between a processing space and a gas exhaust space is L, a cross sectional area of a space orthogonal to a flow of the second gas is S(x), a supply flow rate of the second gas is Q, a pressure within the processing space is P and a diffusion coefficient of the first gas to the second gas is D, at least one of the distance L, the cross sectional area S(x) and the supply flow rate Q in the second process is adjusted such that a Peclet number Pe calculated by expression (3) becomes larger than 1.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: August 6, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Takahiko Kato, Weiting Chen
  • Patent number: 10345717
    Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: July 9, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Günes Nakiboglu, Suzanne Johanna Antonetta Geertruda Cosijns, Anne Willemijn Bertine Quist, Lukasz Sosniak, Frank Johannes Jacobus Van Boxtel, Engelbertus Antonius Fransiscus Van Der Pasch
  • Patent number: 10345710
    Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
    Type: Grant
    Filed: August 29, 2016
    Date of Patent: July 9, 2019
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
  • Patent number: 10345719
    Abstract: Mask cooling apparatus and mask cooling methods are provided. An exemplary mask cooling apparatus includes a cooler, having a cooling region, a coolant inlet region and a coolant outlet region; cooling channels, disposed in the cooling region of the cooler and used to contact with the mask; coolant inlet channels, disposed in the coolant inlet region and used to introduce a coolant in the cooling channels; and coolant outlet channels, disposed in the coolant outlet region and used to drain the coolant out from the cooling channels.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: July 9, 2019
    Assignees: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION, SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
    Inventor: Xuan Liu