With Temperature Or Foreign Particle Control Patents (Class 355/30)
  • Patent number: 11385547
    Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.
    Type: Grant
    Filed: May 21, 2020
    Date of Patent: July 12, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
  • Patent number: 11380515
    Abstract: An object of the present disclosure is to provide a charged particle beam device that can suppress an influence to a device generated according to the preliminary exhaust. In order to achieve the object, suggested is a charged particle beam device including a vacuum sample chamber that maintains an atmosphere around a sample to be irradiated with a charged particle beam in a vacuum state; and a preliminary exhaust chamber to which a vacuum pump for vacuuming an atmosphere of the sample introduced into the vacuum sample chamber is connected, in which the vacuum sample chamber is a box-shaped body including a top plate, and a portion between the top plate and a side wall of the box-shaped body positioned below the top plate includes a portion in which the top plate and the side wall are not in contact with each other.
    Type: Grant
    Filed: July 7, 2020
    Date of Patent: July 5, 2022
    Assignee: Hitachi High-Tech Corporation
    Inventors: Keiichiro Hosobuchi, Masaki Mizuochi, Shuichi Nakagawa, Tomotaka Shibazaki, Takaaki Kikuchi
  • Patent number: 11378894
    Abstract: The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: July 5, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Shang-Chieh Chien, Jeng-Horng Chen, Jui-Ching Wu, Chia-Chen Chen, Hung-Chang Hsieh, Chi-Lun Lu, Chia-Hao Yu, Shih-Ming Chang, Anthony Yen
  • Patent number: 11378889
    Abstract: An immersion lithography system includes an immersion hood, wherein the immersion hood includes a lens system. The immersion lithography system further includes a wafer stage, wherein the wafer stage is moveable relative to the immersion hood, and the wafer stage includes an area for receiving a wafer. The immersion lithography system further includes a first particle capture area on the wafer stage outside of the area for receiving the wafer, wherein the first particle capture area includes silicon, silicon nitride oxide or a photoresist material.
    Type: Grant
    Filed: October 29, 2020
    Date of Patent: July 5, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Yung-Yao Lee, Wei Chih Lin, Chih Chien Lin
  • Patent number: 11372339
    Abstract: A device manufacturing method using a lithographic apparatus having a localized immersion system for confining an immersion liquid to a space between a projection system and a substrate to be exposed by the projection system, the method including: predicting a set of first locations on the substrate having a risk of residual liquid from the immersion system when exposed using an initial route for a substrate to expose a plurality of fields thereon; determining a set of modifications to the initial route to reduce the risk of residual loss; test exposing at least one test substrate using the initial route; obtaining a set of second locations of defects in the exposed test substrate; selecting a subset of the set of modifications by comparing the first locations and the second locations; and exposing a plurality of production substrates using the initial route modified by the selected subset of modifications.
    Type: Grant
    Filed: February 27, 2020
    Date of Patent: June 28, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Giovanni Luca Gattobigio, Pieter Jeroen Johan Emanuel Hoefnagels, Ronald Frank Kox, Marcus Johannes Van Der Zanden, Maarten Marinus Van Oene, Jorge Alberto Vieyra Salas
  • Patent number: 11337292
    Abstract: A tin trap device may include a housing including a gas inlet port into which gas containing tin flows from a chamber device, an internal space which communicates with the gas inlet port, and a gas exhaust port which exhausts the gas while communicating with the internal space; a multiple tube including a plurality of tube members, arranged on a flow path of the gas traveling to the gas exhaust port from the gas inlet port through the internal space, and having a temperature at which the tin deposited from the gas adheres to the tube member; and a gas travel direction changing member configured to change a travel direction of at least fastest gas of the gas traveling from the gas inlet port to the multiple tube.
    Type: Grant
    Filed: August 26, 2021
    Date of Patent: May 17, 2022
    Assignee: Gigaphoton Inc.
    Inventors: Gouta Niimi, Georg Soumagne
  • Patent number: 11300890
    Abstract: A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: April 12, 2022
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Johannes Henricus Wilhelmus Jacobs, Coen Cornelis Wilhelmus Verspaget, Ronald Van Der Ham, Ivo Adam Johannes Thomas, Martijn Houben, Thibault Simon Mathieu Laurent, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Pieter Lein Joseph Gunter, Marinus Jan Remie, Sander Catharina Reinier Derks
  • Patent number: 11300493
    Abstract: Embodiments of a continuous dust accumulation monitoring system comprise an enclosure adapted for use in electrical hazardous locations, a sample area for collecting ambient dust, a dust accumulation sensor assembly installed in the enclosure configured to generate a signal based on the amount of ambient dust collected on the sample area and a circuit board within the enclosure configured to receive the signal from the dust accumulation sensor assembly. The continuous dust accumulation monitoring system may be connected to system control hardware.
    Type: Grant
    Filed: December 29, 2020
    Date of Patent: April 12, 2022
    Assignee: Industrial Intelligence, Inc.
    Inventors: George T. Armbruster, Jr., Bruce Ferris, Shane Diller, Slava Orlov
  • Patent number: 11287755
    Abstract: A lithography system and a cleaning method thereof are provided. The lithography system includes a light source generator. The light source generator includes a collector, a droplet generator and a droplet catcher. The droplet generator and the droplet catcher are facing each other, and disposed at a region surrounding the collector. The cleaning method includes: shifting the droplet generator out of the light source generator via a port of the light source generator; inserting a shove assembly into the light source generator via the port; using a borescope attached to the shovel assembly to identify a location of a deposit formed by droplets generated by the droplet generator; using the shovel assembly to remove and collect the deposit; and withdrawing the shovel assembly along with the borescope from the light source generator via the port.
    Type: Grant
    Filed: March 8, 2021
    Date of Patent: March 29, 2022
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Sheng-Ta Lin, Li-Jui Chen, Shang-Chieh Chien
  • Patent number: 11269261
    Abstract: A system includes a frame, a projection lens, a wafer table, and a cleaner. The frame has an opening vertically extending through the frame. The projection lens is disposed on the frame. The wafer table is below the frame, in which the wafer table is movable along a horizontal direction. The cleaner is over the frame, in which the cleaner comprises a sticky structure movable along a vertical direction and through the opening of the frame.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: March 8, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Min-Cheng Wu, Chi-Hung Liao
  • Patent number: 11243463
    Abstract: Provided is a supporting frame in which a vent hole detachably arranging a filter and to which a pellicle film for extreme ultraviolet lithography can be attached. A support frame according to an embodiment of the present invention is a support frame for arranging a pellicle film, the support frame has a through hole being made from a hole extending along a first direction, the first direction being almost parallel to a surface direction of the pellicle film, and a hole extending along a second direction, the second direction not being parallel to the first direction; and the support frame includes a filter, the filter arranged at an inside of the through hole or at an end of the through hole, and the filter is arranged apart from the pellicle film.
    Type: Grant
    Filed: September 25, 2020
    Date of Patent: February 8, 2022
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Akira Ishikawa, Atsushi Okubo, Yosuke Ono, Kazuo Kohmura
  • Patent number: 11231658
    Abstract: An arrangement for an EUV lithography apparatus includes a reflective optical element (60) having an optically effective surface (62) configured to reflect incident EUV radiation, and a filament arrangement (65) configured to produce a reagent that cleans the optically effective surface (62). The filament arrangement (65) has at least one filament (66) configured as a glow or heating element. The at least one filament (66) is arranged along the optically effective surface (62) of the reflective optical element (60) wherein a thickness and/or positioning of the at least one filament (66) are/is chosen so as to minimize an optical influence of the at least one filament (66) in the far field of the EUV radiation reflected by the optically effective surface (62).
    Type: Grant
    Filed: May 24, 2020
    Date of Patent: January 25, 2022
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Holger Kierey, Wolfgang Merkel
  • Patent number: 11221563
    Abstract: Embodiments described herein relate to a dynamically controlled lens used in lithography tools. Multiple regions of the dynamic lens can be used to transmit a radiation beam for lithography process. By allowing multiple regions to transmit the radiation beam, the dynamically controlled lens can have an extended life cycle compared to conventional fixed lens. The dynamically controlled lens can be replaced or exchanged at a lower frequency, thus, improving efficiency of the lithography tools and reducing production cost.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: January 11, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yueh Lin Yang, Chi-Hung Liao
  • Patent number: 11204556
    Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.
    Type: Grant
    Filed: August 17, 2020
    Date of Patent: December 21, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Chih Huang, Chi Yang, Che-Chang Hsu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 11187976
    Abstract: A method of detecting defects of a photoresist pattern includes generating a scanning electron microscope (SEM) image of a surface of a photoresist pattern and signal intensity data relative to pixel position of the surface of the photoresist pattern. The method also includes setting a lower reference intensity threshold value and an upper reference intensity threshold value used as reference values for detecting defects. The method further includes classifying a pixel position of the signal intensity data having a signal intensity value which is less than the lower reference intensity threshold value or greater than the upper reference intensity threshold value as a defect position.
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: November 30, 2021
    Assignee: SK hynix Inc.
    Inventor: Jun Taek Park
  • Patent number: 11181573
    Abstract: An inspection apparatus configured to inspect a target object includes an inspector configured to perform an inspection of an electrical characteristic upon the target object; a gas flow source provided within the inspector and configured to generate a gas flow which cools an inside of the inspector; a position adjuster configured to place the target object thereon and perform a position adjustment between the placed target object and the inspector; a housing which accommodates the inspector and the position adjuster in a same space; and a circulation device configured to circulate a gas by the gas flow source between the inside of the inspector and a region where the position adjuster is located within the space, the circulation device including a cooler configured to cool the gas being circulated and a foreign substance remover configured to remove a foreign substance from the gas being circulated.
    Type: Grant
    Filed: July 10, 2019
    Date of Patent: November 23, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Tomoya Endo, Kentaro Konishi
  • Patent number: 11169355
    Abstract: A lens unit capable of checking the airtightness of a seal member between an object side lens and an inner circumferential surface of a lens barrel. A part of an end portion of an air hole on the object side is opened radially inward from the inner circumferential surface of the lens barrel, and at least part of the end portion of the air hole on the image side is opened. When the image side lens is in close contact with the lens installation surface of the flange portion, the air fills the lens barrel through the air hole. The seal member provided between the object side lens and the inner circumferential surface of the lens barrel is damaged or it's not attached to a predetermined position from the beginning, it's still possible to measure air leakages, thus rendering it possible to exactly check the airtightness of the seal member.
    Type: Grant
    Filed: May 11, 2018
    Date of Patent: November 9, 2021
    Assignee: MAXELL, LTD.
    Inventor: Hiroyuki Hirata
  • Patent number: 11156849
    Abstract: An illumination unit of the present disclosure includes an excitation light source, a phosphor section, an excitation-light intensity distribution generation section, and an illumination optical system. The excitation light source emits excitation light. The phosphor section includes a fluorescent light-emission surface that performs fluorescent light emission in response to receiving of the excitation light. The excitation-light intensity distribution generation section is provided between the excitation light source and the phosphor section, and varies an intensity distribution of the excitation light to bring the intensity distribution of the excitation light closer to a desired excitation-light intensity distribution on the fluorescent light-emission surface. The illumination optical system generates, on the basis of light derived from the fluorescent light emission from the phosphor section, illumination light with which an image display device is to be irradiated.
    Type: Grant
    Filed: November 8, 2018
    Date of Patent: October 26, 2021
    Assignee: SONY CORPORATION
    Inventors: Izushi Kobayashi, Yoshihisa Sato
  • Patent number: 11156921
    Abstract: A fluid handling structure configured to confine immersion fluid to a region of a lithographic apparatus, the fluid handling structure having an aperture formed therein for the passage therethrough of a radiation beam through the immersion fluid, the aperture defining an immersion space to be filled with the immersion fluid, and having an inner part and an outer part, wherein the inner part and the outer part are arranged so as to form therebetween a variable space and a connecting space that connects the variable space to the immersion space, wherein the outer part is movable relative to the inner part in a first plane so as to change in shape the variable space but not the connecting space, and wherein the fluid handling structure is configured to contain the immersion fluid in the variable space.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: October 26, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raphael Nico Johan Stegen, Giovanni Luca Gattobigio, Theodorus Wilhelmus Polet
  • Patent number: 11148229
    Abstract: A laser processing apparatus may include: a laser generator configured to generate a laser beam; a stage configured to support a target object; at least one supply nozzle on the stage to eject an air toward the stage; a suction unit configured to inhale external air; and a suction structure on the stage and adjacent to the at least one supply nozzle. The suction structure may include a suction hole connected to the suction unit to inhale the external air. The suction structure may include an inclined surface in which the suction hole is defined. The suction structure may include a first surface adjacent to the supply nozzle, and an opening may be defined in a region of the first surface adjacent to a bottom surface. A distance between the inclined surface and the target object may be less than or equal to a height of the opening.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: October 19, 2021
    Assignee: Samsung Display Co., Ltd.
    Inventors: Do-sun Kim, Taekkyo Kang, Seungho Myoung, Minkyu Choi, Gyoowan Han
  • Patent number: 11152241
    Abstract: A substrate processing apparatus disclosed herein is capable of communicating with an external control apparatus. The substrate processing apparatus includes: a container placing portion configured to place thereon a transport container accommodating a product substrate therein; a dummy substrate accommodating unit configured to accommodate dummy substrates therein; a transport chamber provided with a transport mechanism configured to transport the product substrate and the dummy substrates; a processing chamber configured to process the product substrate and the dummy substrates transported thereto by the transport mechanism; and a controller configured to determine whether or not a number of unusable dummy substrates among the dummy substrates accommodated in the dummy substrate accommodating unit is equal to or greater than a set value, and notify the external control device of a warning when it is determined that the number of dummy substrates is equal to or greater than the set value.
    Type: Grant
    Filed: November 1, 2018
    Date of Patent: October 19, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Rintaro Takao, Hiromichi Fujii, Yoshihide Kagihara
  • Patent number: 11143968
    Abstract: A fluid handling structure for a lithographic apparatus is disclosed. The fluid handling structure has a plurality of openings arranged in plan, in a line. The fluid handling structure is configured such that the openings are directed, in use, towards a facing surface, the facing surface being a substrate and/or a substrate table. The substrate table is configured to support the substrate. Outward of the line of openings is a damper. The damper may have a width that varies along the line of openings. The damper width is defined between the line of openings and an opposing damper edge.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: October 12, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Sjoerd Nicolaas Lambertus Donders, Nicolaas Rudolf Kemper, Danny Maria Hubertus Philips, Michel Riepen, Clemens Johannes Gerardus Van Den Dungen, Adrianes Johannes Baeten, Fabrizio Evangelista
  • Patent number: 11143862
    Abstract: An exposure device that draws a pattern on a substrate by shining a beam from a light source device on substrate and scanning the beam in a main scanning direction while varying the intensity of beam according to pattern information, including: a scanning unit having a beam scanning unit that includes a polygonal mirror whereby the beam is oriented to scan the beam, and light detector for photoelectric detection of reflected light generated when beam is shined on substrate; an electro-optical element for controlling the beam's intensity modulation according to pattern information such that at least part of second pattern to be newly drawn is drawn on top of at least part of first pattern formed on substrate; and a measurement unit measuring relative positional relationship between the first and second pattern on the basis of a detection signal output by the detector while second pattern is drawn on substrate.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: October 12, 2021
    Assignee: NIKON CORPORATION
    Inventors: Yoshiaki Kito, Masakazu Hori, Yosuke Hayashida, Masaki Kato
  • Patent number: 11121018
    Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: September 14, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Chueh-Chi Kuo, Tsung-Yen Lee, Chia-Hsin Chou, Tzung-Chi Fu, Li-Jui Chen, Po-Chung Cheng, Che-Chang Hsu
  • Patent number: 11112598
    Abstract: An exposure device that draws a pattern on a substrate by shining a beam from a light source device on substrate and scanning the beam in a main scanning direction while varying the intensity of beam according to pattern information, including: a scanning unit having a beam scanning unit that includes a polygonal mirror whereby the beam is oriented to scan the beam, and light detector for photoelectric detection of reflected light generated when beam is shined on substrate; an electro-optical element for controlling the beam's intensity modulation according to pattern information such that at least part of second pattern to be newly drawn is drawn on top of at least part of first pattern formed on substrate; and a measurement unit measuring relative positional relationship between the first and second pattern on the basis of a detection signal output by the detector while second pattern is drawn on substrate.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: September 7, 2021
    Assignee: NIKON CORPORATION
    Inventors: Yoshiaki Kito, Masakazu Hori, Yosuke Hayashida, Masaki Kato
  • Patent number: 11106146
    Abstract: A system is disclosed. The system includes a cleaning device and a scanner device. The cleaning device is configured to clean a mask. The scanner device is coupled to the cleaning device and is configured to receive the mask, a reference image and a real-time image that is captured at the mask. The reference image includes at least one first mark image having a plurality of mapping marks on the mask. The real-time image includes at least one second mark image having the plurality of mapping marks on the mask. The scanner device is configured to map the at least one second mark image in the real-time image with the at least one first image in the reference image, when a lithography exposing process is performed. A method is also disclosed herein.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: August 31, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Hao-Yu Lan, Po-Chung Cheng, Ching-Juinn Huang, Tzung-Chi Fu, Tsung-Yen Lee
  • Patent number: 11102381
    Abstract: Disclosed herein are technological solutions that are configured to limit sub-optimal visualization of the surgical field during robotic and manual laparoscopic surgery. Such technological solutions are configured to systematically assess cleanliness of an imaging element of a laparoscope (or other type of similar imaging apparatus) and take action for enabling or causing the imaging element to be cleaned. In preferred embodiments, assessment of the cleanliness of the imaging element provides information that can be used for enabling or causing cleaning of the imaging element to be performed in-vivo in either a manual, semi-autonomous or autonomous manner. In this manner such technological solutions advantageously enable the surgical field during surgery to be more efficiently and consistently maintained in an optimal condition.
    Type: Grant
    Filed: January 5, 2021
    Date of Patent: August 24, 2021
    Assignee: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM CLEARCAM INC.
    Inventors: Farshid Alambeigi, Alexander Cohen, Christopher R. Idelson, Christopher Rylander
  • Patent number: 11101613
    Abstract: A laser device includes a condensing assembly for condensing laser light output from a laser oscillator and a cover for accommodating the condensing assembly, the cover including protection windows permeable to the laser light on an optical path of the laser light. The protection windows include at least one first protection window having a positive refractive index temperature coefficient and at least one second protection window having a negative refractive index temperature coefficient, the at least one first protection window and the at least one second protection window being arranged along the optical path of the laser light.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: August 24, 2021
    Assignee: MITSUBISHI HEAVY INDUSTRIES, LTD.
    Inventors: Takahiro Tachibana, Takehisa Okuda, Yasuyuki Fujiya, Shuho Tsubota
  • Patent number: 11094426
    Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.
    Type: Grant
    Filed: February 20, 2020
    Date of Patent: August 17, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Alexander Hendrik Vincent Van Veen, Willem Henk Urbanus, Marco Jan-Jaco Wieland
  • Patent number: 11090619
    Abstract: An exhaust system capable of diluting a hydrogen gas to a concentration below the lower explosive limit without requiring a large amount of dilution gas while preventing an increase in a pressure of an exhaust gas in a buffer tank is disclosed. The exhaust system performs, when a main valve disposed in an exhaust line is closed, an initial exhaust operation in which a gas heavier than the hydrogen gas is discharged from a lower part of a buffer tank while an inlet valve disposed in an inlet line and a first outlet valve disposed in an outlet line are opened to introduce the exhaust gas from an equipment in a tangential direction of a buffer tank.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: August 17, 2021
    Assignee: EBARA CORPORATION
    Inventors: Keisuke Matsushima, Kazutomo Miyazaki
  • Patent number: 11048178
    Abstract: A plate to be positioned between a movable stage and a projection system of a lithographic apparatus, the plate having a surface to face the movable stage; an opening through the plate for passage of patterned radiation beam; one or more gas outlets in a side of the opening and in the surface of the plate, wherein the one or more gas outlets are configured to supply gas to a region between the movable stage and the projection system, wherein all of the one or more gas outlets in the surface of the plate are positioned such that, for each of such one or more gas outlets, a line that is both orthogonal to the surface and intersects the gas outlet does not intersect the patterning device at any point during the entire range of movement of the patterning device.
    Type: Grant
    Filed: November 22, 2018
    Date of Patent: June 29, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Federico La Torre, Laurentius Johannes Adrianus Van Bokhoven, José Nilton Fonseca, Jr., Gerben Pieterse, Erik Henricus Egidius Catharina Eummelen, Frank Johannes Jacobus Van Boxtel
  • Patent number: 11034500
    Abstract: A packing container for a display device includes: a main tray; a first panel support portion configured to protrude from a base portion disposed inside the main tray; a first base protruding portion configured to protrude from the base portion, and to be opposite to a first side surface of the first panel support portion; and a first sub-tray located on the first panel support portion of the main tray, wherein the first sub-tray includes: a second panel support portion located on the main tray, wherein the second panel support portion is opposite to a panel support surface of the first panel support portion; and a first lower protruding portion configured to protrude from a first edge of the second panel support portion toward the base portion, and to have an end portion between the first side surface of the first panel support portion and the first base protruding portion.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: June 15, 2021
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Hongju Kim, Jahuem Koo, Euiyoung Kim, Kyungjae Lee, Sungjin Joo
  • Patent number: 11029607
    Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
    Type: Grant
    Filed: August 28, 2017
    Date of Patent: June 8, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
  • Patent number: 11022901
    Abstract: A positioning device configured to position an object, the positioning device including: an object table configured to hold the object; an electromagnetic motor configured to displace the object table, the electromagnetic motor including: a coil assembly mounted to the object table, a superconductor assembly configured to co-operate with the coil assembly to generate a driving force on the object table, and a cryogenic enclosure configured to enclose the superconductor assembly and maintain the superconductor assembly in a superconductive state; a support for supporting the electromagnetic motor; and an electromagnetic support configured to suspend the cryogenic enclosure relative to the support, thereby maintaining a gap between the cryogenic enclosure and the support.
    Type: Grant
    Filed: September 24, 2018
    Date of Patent: June 1, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Hessel Bart Koolmees, Johannes Petrus Martinus Bernardus Vermeulen
  • Patent number: 11016401
    Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: May 25, 2021
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Matthew Lipson, Christopher John Mason, Damoon Sohrabibabaheidary, Jimmy Matheus Wilhelmus Van De Winkel, Bert Dirk Scholten
  • Patent number: 11018074
    Abstract: Apparatus for providing electrical energy, in particular for providing electrical energy from a heat flow originating from an electric motor, including a first component part, a second component part, wherein a Peltier element is arranged between the first component part and the second component part, said Peltier element being at least partially surrounded by a layer of insulation provided between the first component part and the second component part, with the result that the Peltier element forms a thermal bridge between the first and the second component parts, and wherein the first and the second component parts are selected from the following group: gear mechanism, motor and adapter plate.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: May 25, 2021
    Assignee: Wittenstein SE
    Inventors: Jürgen Schuster, Rolf Hoffmann
  • Patent number: 11016394
    Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: May 25, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Michel Riepen
  • Patent number: 11009801
    Abstract: Embodiments described herein provide a system, a software application, and methods of a lithography process that provide at least one of the ability to decrease the stabilization time and write an exposure pattern into a photoresist on a substrate compensating for the change in the total pitch over a stabilization time. One embodiment of the system includes a slab, a stage disposed over the slab, a pair of supports disposed on the slab, a processing apparatus, and a chiller system. The pair of supports support a pair of tracks and the stage is configured to move along the pair of tracks. The processing apparatus has an apparatus support coupled to the slab and a processing unit supported by the apparatus support. The processing unit has a plurality of image projection systems. The chiller system has at least one fluid channel disposed in each track of the pair of tracks.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: May 18, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Benjamin M. Johnston, David Michael Corriveau, Cheuk Ming Lee, Jae Myung Yoo, WeiMin Tao, Antoine P. Manens
  • Patent number: 10996567
    Abstract: A method for quantifying the effect of pupil function variations on a lithographic effect within a lithographic apparatus is disclosed. The method comprises: determining a discrete, two-dimensional sensitivity map in a pupil plane of the lithographic apparatus, wherein the lithographic effect is given by the inner product of said sensitivity map with a discrete, two-dimensional pupil function variation map of a radiation beam in the pupil plane. The pupil plane of a lithographic apparatus generally refers to the exit pupil of a projection system of the lithographic apparatus. Pupil function variations may comprise: relative phase variations within the pupil plane and/or relative intensity variations within the pupil plane.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: May 4, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Jacobus Matheus Baselmans, Bart Smeets, Cristina Ioana Toma
  • Patent number: 10990026
    Abstract: A method for cleaning a lithography apparatus is provided. The method includes flowing a major cleaning agent in volume over a reflective surface of a collector of the lithography apparatus; and flowing a minor cleaning agent in volume intermittently over the reflective surface of the collector, so as to clean the reflective surface of the collector.
    Type: Grant
    Filed: November 5, 2018
    Date of Patent: April 27, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chi Yang, Sheng-Ta Lin, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10985047
    Abstract: A semiconductor manufacturing apparatus includes a temperature stabilizer, a chuck, an actuator, and a controller. The temperature stabilizer is on a plane defined by a first direction and a second direction crossing the first direction. The chuck supports and rotates a wafer and passes through a center of the temperature stabilizer. The actuator is connected to the temperature stabilizer and moves the temperature stabilizer in a third direction crossing to the first and second directions. The controller controls driving of the actuator.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: April 20, 2021
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung-Sik Oh, Jun-Taek Seo, Tae-Hwa Lee
  • Patent number: 10969699
    Abstract: A projection exposure apparatus for semiconductor lithography has a connecting element for connecting a component of the apparatus to a supporting cooling structure of the apparatus. The connecting element has a receiving region for receiving the component, and the connecting element has a foot region for connecting the connecting element to the supporting cooling structure. At least one joint is arranged between the receiving and foot regions, and at least one heat conducting element is arranged between the receiving and foot regions. The heat conducting element is soft in the actuation direction of the joint and has a stiffness perpendicularly to the actuation direction of the joint that is at least twice as large as in the actuation direction of the joint.
    Type: Grant
    Filed: August 15, 2019
    Date of Patent: April 6, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Ulrich Weber, Willi Anderl
  • Patent number: 10969695
    Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
    Type: Grant
    Filed: September 13, 2019
    Date of Patent: April 6, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Han Henricus Aldegonda Lempens, Miao Yu, Cornelius Maria Rops, Ruud Olieslagers, Artunç Ulucan, Theodorus Wilhelmus Polet, Patrick Johannes Wilhelmus Spruytenburg
  • Patent number: 10955762
    Abstract: A radiation source apparatus is provided. The radiation source apparatus includes a chamber, an exhaust module, a measuring device, a gas supply module and a controller. The exhaust module is configured to extract debris caused by unstable target droplets out of the chamber according to a first gas flow rate. The measuring device is configured to measure concentration of the debris in the chamber. The gas supply module is configured to provide a gas into the chamber according to a second gas flow rate. The controller is configured to adjust the first gas flow rate and the second gas flow according to the measured concentration of the debris.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: March 23, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Chi Yang, Ssu-Yu Chen, Shang-Chieh Chien, Chieh Hsieh, Tzung-Chi Fu, Bo-Tsun Liu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10946419
    Abstract: An apparatus for removing at least one foreign substance includes a detection unit detecting the at least one foreign substance adhered to a holding surface of a suction holding unit configured to suck and hold a substrate, a removal unit removing the at least one foreign substance adhered to the holding surface using fluid, and a movement mechanism configured to move the detection unit and the removal unit.
    Type: Grant
    Filed: December 5, 2018
    Date of Patent: March 16, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Osamu Hirakawa, Yoshitaka Otsuka
  • Patent number: 10935897
    Abstract: A microlithographic optical system, wherein the optical system is designed for operation with electromagnetic radiation that passes through the optical system along a used beam path, and includes at least one component (105) having a region outside the used beam path, wherein this region has a catalytic or chemically active layer (110), and wherein the catalytic or chemically active layer (110) and/or a carrier (230, 240) bearing this layer (110) is porous.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: March 2, 2021
    Assignee: CARL ZEISS SMT GMBH
    Inventor: Jan Grossmann
  • Patent number: 10935895
    Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.
    Type: Grant
    Filed: August 13, 2019
    Date of Patent: March 2, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Erik Johan Arlemark, Sander Catharina Reinier Derks, Sjoerd Nicolaas Lambertus Donders, Wilfred Edward Endendijk, Franciscus Johannes Joseph Janssen, Raymond Wilhelmus Louis Lafarre, Leon Martin Levasier, Jim Vincent Overkamp, Nicolaas Ten Kate, Jacobus Cornelis Gerardus Van Der Sanden
  • Patent number: 10935885
    Abstract: Devices, systems, and methods position a template for imprinting a formable material over one or more gas-flow channels on a stage, wherein the template includes a patterning surface, a mesa, and at least one mesa sidewall; and direct a gas flow through the one or more gas-flow channels toward a portion of the at least one mesa sidewall.
    Type: Grant
    Filed: February 11, 2020
    Date of Patent: March 2, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventors: Mehul N. Patel, Edward Brian Fletcher
  • Patent number: 10884339
    Abstract: A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.
    Type: Grant
    Filed: June 10, 2019
    Date of Patent: January 5, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Wouter Joep Engelen, Otger Jan Luiten, Andrey Alexandrovich Nikipelov, Vadim Yevgenyevich Banine, Pieter Willem Herman De Jager, Erik Roelof Loopstra
  • Patent number: RE48668
    Abstract: A temperature sensing probe including a temperature sensor in an elongate housing wherein the elongate housing of the probe is elongate in a first direction and the elongate housing is comprised of a material which has a thermal conductivity of at least 500 W/mK at 20° C. in at least one direction.
    Type: Grant
    Filed: September 21, 2017
    Date of Patent: August 3, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Johan Gertrudis Cornelis Kunnen, Sander Catharina Reinier Derks