Plural Patents (Class 355/46)
  • Patent number: 11106145
    Abstract: An exposure system is equipped with: chambers in a first row that are disposed on the +X side with respect to a C/D installed on a floor surface; chambers in a second row that are disposed on the +Y side of the chambers in the first row, facing the chambers in the first row; and a measurement chamber and a control rack that are disposed adjacently on the ?X side with respect to the chambers in the first row and the second row and besides on the +X side of the C/D. Inside at least some of the chambers, an exposure room where exposure is performed is formed, and the control rack distributes utility supplied from below the floor surface to each of the chambers in the first row and the second row.
    Type: Grant
    Filed: October 12, 2017
    Date of Patent: August 31, 2021
    Assignee: NIKON CORPORATION
    Inventor: Kenichiro Murata
  • Patent number: 10594919
    Abstract: This disclosure relates to a camera device and a method for capturing images by using the same. The camera device includes a liquid crystal lens array composed of a plurality of liquid crystal sub-lenses, an image sensor and a drive module. A preset distance is provided between the liquid crystal lens array and the image sensor, and the drive module is electrically connected with the liquid crystal lens array. The drive module is configured to adjust a focus of each liquid crystal sub-lens during capturing based on a distance between an object to be captured and a corresponding liquid crystal sub-lens, such that light rays from each object are focused respectively in a plane where the image sensor is located after passing through the corresponding liquid crystal sub-lens.
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: March 17, 2020
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., ORDOS YUANSHENG OPTOELECTRONICS CO., LTD.
    Inventors: Huijuan Wang, Xue Dong, Dan Wang, Yun Qiu, Xiao Sun, Zhaokun Yang, Ruiyong Wang
  • Patent number: 10429567
    Abstract: A multi-view pixel directional backlight module and a naked-eye 3D display device are provided. The multi-view pixel directional backlight module includes at least two rectangular light guide plates closely stacked together. A light-emerging surface of the rectangular light guide plate is provided with multiple pixel arrays. Light emitted by pixels in a same pixel array is pointed to a same viewing angle, and different pixel arrays have different viewing angles. At least one side of each rectangular light guide plate is provided with a light source group. Light emitted by the light source group enters the corresponding light guide plate, then emerges from pixels of respective pixel arrays on the light-emerging surface of the light guide plate, and is totally reflected at positions other than positions of the pixels within the light guide plate. Each of the pixels is a nano-diffraction grating.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: October 1, 2019
    Assignees: SUZHOU UNIVERSITY, SUZHOU SVG OPTRONICS TECHNOLOGY CO., LTD
    Inventors: Wenqiang Wan, Linsen Chen, Yimin Lou, Donglin Pu, Ming Zhu, Pengfei Zhu, Su Shen, Yan Ye
  • Patent number: 9958787
    Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: May 1, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Christiaan Louis Valentin, Antonius Johannes Josephus Van Dijsseldonk
  • Patent number: 9947289
    Abstract: A user interface apparatus and a method of improving user interface are provided. The user interface apparatus may detect a change in an incident light and may control a display to represent the detected change in the light to be overlaid on image content. Provided is a user interface apparatus including: a display configured to display image content; a detector configured to detect a change in an incident light; and a controller configured to control the display to overlay the detected change in the light on the image content.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: April 17, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jun Haeng Lee, Eric Hyunsurk Ryu, Chang Woo Shin, Joo Yeon Woo
  • Patent number: 9835929
    Abstract: Provided are a multilayered-coating system and a method of manufacturing the same. The multi-layered coating system includes: a layer 1 including a plurality of spherical voids with a radius a1 that are randomly distributed and separated from one another and a filler material with a refractive index n1 that is disposed in a space between the spherical voids; and subsequent layers expressed as the following word-equation, “a layer i located above a layer i?1 and including a plurality of spherical voids with a radius ai that are randomly distributed and separated from one another, and a filler material with a refractive index ni, the filler material disposed in a space between the spherical voids where i is an integer greater than 1”.
    Type: Grant
    Filed: November 3, 2014
    Date of Patent: December 5, 2017
    Assignee: MATERIALS VISION CO., LTD.
    Inventor: Sung Nae Cho
  • Patent number: 9644951
    Abstract: The invention belongs to the field of measuring tools, particularly relates to a pointer-type angle measuring device with wireless power supply for lighting for measuring angle state of an object. The invention includes a housing, a dial, a pointer and an electronic circuit. Wherein, the electronic circuit includes a wireless power supply circuit and a wireless power receiving and lighting circuit, and the wireless power receiving and lighting circuit is set on the pointer. The invention is characterized in that the pointer can illuminate, and the invention is convenient for people to use in a low light environment, to measure angle of the object.
    Type: Grant
    Filed: December 1, 2014
    Date of Patent: May 9, 2017
    Assignee: ZHEJIANG RONGSHENG TOOL CO., LTD
    Inventor: Chengrong Zhuang
  • Patent number: 9610743
    Abstract: A device comprises at least one optics member (O) comprising at least one transparent portion (t) and at least one blocking portion (b). The at least one transparent portion (t) is made of one or more materials substantially transparent for light of at least a specific spectral range, referred to as transparent materials, and the at least one blocking portion (b) is made of one or more materials substantially non-transparent for light of the specific spectral range, referred to as non-transparent materials. The transparent portion (t) comprises at least one passive optical component (L). The at least one passive optical component (L) comprises a transparent element (6) having two opposing approximately flat surfaces substantially perpendicular to a vertical direction in a distance approximately equal to a thickness of the at least one blocking portion (b) measured along the vertical direction, and, attached to the transparent element (6), at least one optical structure (5).
    Type: Grant
    Filed: October 14, 2015
    Date of Patent: April 4, 2017
    Assignee: Heptagon Micro Optics Pte. Ltd.
    Inventors: Hartmut Rudmann, Susanne Westenhöfer, Bojan Tesanovic
  • Patent number: 9081297
    Abstract: A lithography apparatus includes at least two reticle edge masking assemblies (REMAs). The lithography apparatus further includes a light source configured to emit a light beam having a wavelength and a beam separating element configured to divide the light beam into more than one collimated light beam. Each REMA is positioned to receive one of the more than one collimating light beams and each REMA comprises a movable slit for passing the one collimated light beam therethrough. The lithography apparatus further includes at least one mask having a pattern, where the at least one mask is configured to receive light from at least one of the REMA and a projection lens configured to receive light from the at least one mask. A method of using a lithography apparatus is also discussed.
    Type: Grant
    Filed: May 1, 2012
    Date of Patent: July 14, 2015
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tung-Li Wu, Chin-Hsiang Lin, Heng-Hsin Liu, Jui-Chun Peng
  • Patent number: 9025136
    Abstract: System and method for manufacturing three-dimensional integrated circuits are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving mask data to be written to one or more layers of the three-dimensional integrated circuit, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the one or more layers of the three-dimensional integrated circuit, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the one or more layers of the three-dimensional integrated circuits in parallel. The method of assigning performs at least one of scaling, alignment, inter-ocular displacement, rotational factor, or substrate deformation correction.
    Type: Grant
    Filed: September 2, 2011
    Date of Patent: May 5, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Jang Fung Chen, Thomas Laidig
  • Patent number: 9025137
    Abstract: A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material. The method also includes illuminating a second object structure and projecting a pattern of the second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material. The respective patterns are projected in the same projection direction.
    Type: Grant
    Filed: December 18, 2012
    Date of Patent: May 5, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Aksel Goehnermeier
  • Patent number: 9019468
    Abstract: An exemplary embodiment of the present invention provides an interference projection exposure system comprising a beam-providing subsystem and an objective lens subsystem that can provide a plurality of light beams which intersect and interfere at an image plane to produce a high spatial frequency periodic optical-intensity distribution. The interference projection system can further comprise a pattern mask that can alter the periodic optical-intensity distribution so as to incorporate functional elements within the periodic optical-intensity distribution. The beam providing subsystem can comprise a beam generating subsystem, a beam conditioning subsystem and a beam directing subsystem. Another exemplary embodiment of the present invention provides for a method of producing a high spatial frequency periodic optical-intensity distribution using a interference projection exposure system.
    Type: Grant
    Filed: September 30, 2011
    Date of Patent: April 28, 2015
    Assignee: Georgia Tech Research Corporation
    Inventors: Guy Matthew Burrow, Thomas K. Gaylord
  • Patent number: 9013674
    Abstract: According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of the first set of exposure heads by moving the stage to coincide a first beam measurement device of the plurality of beam measurement devices with the first exposure head, setting the measured position of the first exposure head as a reference position, and measuring positions of the second set of exposure heads with respect to the reference position.
    Type: Grant
    Filed: July 19, 2011
    Date of Patent: April 21, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang Hyun Park, Sang Don Jang, Hi Kuk Lee
  • Patent number: 8994922
    Abstract: Provided is a barrel support device for supporting a lens barrel. The barrel support device may include a guide frame configured to laterally support the lens barrel and tilt with the lens barrel, a rotation guide on a first end of the guide frame, the rotation guide being ring shaped and configured attach the lens barrel to the guide frame, and a ring-shaped tilting frame configured to support a second end of the guide frame and tilt the guide frame, wherein the guide frame, the rotation guide, and the tilting frame are configured to allow the lens barrel to pass therethrough.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: March 31, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang Hyun Park, Sang Joon Hong, Sang Don Jang, Oui Serg Kim, Dong Seok Baek
  • Publication number: 20150077731
    Abstract: The present disclosure provides a lithography system comprising a radiation source and an exposure tool including a plurality of exposure columns densely packed in a first direction. Each exposure column includes an exposure area configured to pass the radiation source. The system also includes a wafer carrier configured to secure and move one or more wafers along a second direction that is perpendicular to the first direction, so that the one or more wafers are exposed by the exposure tool to form patterns along the second direction. The one or more wafers are covered with resist layer and aligned in the second direction on the wafer carrier.
    Type: Application
    Filed: September 18, 2013
    Publication date: March 19, 2015
    Inventors: Burn Jeng Lin, Shy-Jay Lin, Jaw-Jung Shin, Wen-Chuan Wang
  • Patent number: 8982323
    Abstract: A light beam generating apparatus and method of controlling the same is provided. The light beam generating apparatus may include a light source, a beam expander collimating a light beam emitted from the light source, an optical shutter selectively transmitting a light beam transmitted through the beam expander, and a focusing lens focusing a light beam transmitted the optical shutter. The optical shutter in the light generating apparatus can selectively transmit a light beam based on on/off control of the optical shutter on a pixel-by-pixel basis. This may permit one-dimensional, two-dimensional and three-dimensional nano patterns having various periods and directions to be manufactured.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: March 17, 2015
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Yoonsun Choi, Jinhwan Kim, Hongseok Lee
  • Patent number: 8982322
    Abstract: An exposure apparatus provided with an optical system that has one optical element to which at least two of three or more exposure lights are guided, and that is capable of irradiating three or more exposure lights onto exposure fields that respectively correspond to the exposure lights, with the exposure apparatus multiply exposing a predetermined field on a substrate with images of a plurality of patterns that are formed based on the three or more exposure lights that are respectively irradiated onto the three or more exposure fields.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: March 17, 2015
    Assignee: Nikon Corporation
    Inventor: Hiroyuki Nagasaka
  • Patent number: 8896815
    Abstract: A apparatus having a projection system to project a plurality of radiation beams onto a substrate, wherein the plurality of radiation beams includes a first group of one or more radiation beams formed from radiation within a first wavelength range and a second group of one or more radiation beams formed from radiation within a second wavelength range, different from the first wavelength range. The apparatus also has a dispersion element configured such that one or more radiation beams of the first group are incident on the dispersion element at a different angle from the one or more radiation beams of the second group and such that the one or more radiation beams of the first and second group output from the dispersion element are substantially parallel.
    Type: Grant
    Filed: October 30, 2012
    Date of Patent: November 25, 2014
    Assignee: ASML Netherlands B.V.
    Inventor: Heine Melle Mulder
  • Publication number: 20140192334
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system, where the parallel imaging writer system includes a plurality of multiple charged-particle beam (MCB) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying one or more objects in an area of the substrate to be imaged by corresponding MCB imaging units, and performing multiple exposures to image the one or more objects in the area of the substrate by controlling the plurality of MCB imaging units to write the plurality of partitioned mask data patterns in parallel.
    Type: Application
    Filed: March 10, 2014
    Publication date: July 10, 2014
    Applicant: PineBrook Imaging, Inc.
    Inventors: Jang Fung CHEN, Thomas Laidig
  • Patent number: 8670106
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.
    Type: Grant
    Filed: May 29, 2009
    Date of Patent: March 11, 2014
    Assignee: PineBrook Imaging, Inc.
    Inventors: Jang Fung Chen, Thomas Laidig
  • Patent number: 8654307
    Abstract: It is disclosed a mask on which a pattern for transfer is formed. The mask comprising a first row pattern part and a second row pattern part which are arranged along a first direction on the mask. The whole region of the first row pattern part and the whole region of the second row pattern part region are arranged to deviate from each other by a predetermined amount in a second direction perpendicular to the first direction.
    Type: Grant
    Filed: March 16, 2007
    Date of Patent: February 18, 2014
    Assignee: Nikon Corporation
    Inventor: Masaki Kato
  • Patent number: 8619233
    Abstract: Disclosed herein is a method of compensating for distortion of an exposure pattern due to stage yawing in a maskless exposure apparatus using digital micromirror devices (DMDs). Requirements as to control performance of the stage yawing through the adjustment of sync signals (PEGs) to switch frames of the DMDs are eliminated, thereby reducing manufacturing costs of a large-sized stage. Also, distortion of an exposure pattern, which may occur due to uncompensated yawing, is digitally compensated by controlling the stage yawing, thereby achieving high-quality exposure.
    Type: Grant
    Filed: November 23, 2010
    Date of Patent: December 31, 2013
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jeong Hyoun Sung
  • Patent number: 8619235
    Abstract: A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.
    Type: Grant
    Filed: March 10, 2011
    Date of Patent: December 31, 2013
    Assignee: ASML Netherlands B.V.
    Inventor: William Peter Van Drent
  • Patent number: 8582079
    Abstract: Interference lithography (IL) system and methods are disclosed according to embodiments of the invention. Two beams of coherent light with a first phase difference expose a first interference pattern on a nonlinear photoresist. A second interference pattern may be exposed on the nonlinear photoresist using the same coherent light beams with a second phase difference. The difference between the first and second phase differences is between 70° and 270°. The ensuing pattern is a composite of the first and second interference patterns. The IL may employ a third and fourth light beam.
    Type: Grant
    Filed: August 14, 2007
    Date of Patent: November 12, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Kuo-Shih Liu, Rudolf Hendel
  • Publication number: 20130293857
    Abstract: A lithography apparatus includes at least two reticle edge masking assemblies (REMAs). The lithography apparatus further includes a light source configured to emit a light beam having a wavelength and a beam separating element configured to divide the light beam into more than one collimated light beam. Each REMA is positioned to receive one of the more than one collimating light beams and each REMA comprises a movable slit for passing the one collimated light beam therethrough. The lithography apparatus further includes at least one mask having a pattern, where the at least one mask is configured to receive light from at least one of the REMA and a projection lens configured to receive light from the at least one mask. A method of using a lithography apparatus is also discussed.
    Type: Application
    Filed: May 1, 2012
    Publication date: November 7, 2013
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Tung-Li WU, Chin-Hsiang LIN, Heng-Hsin LIU, Jui-Chun PENG
  • Patent number: 8558991
    Abstract: An imaging optical system can image two object fields, each in the same object plane, into two corresponding image fields, each in the same image plane. The two object fields are spatially separated from each another, and the two image fields are spatially separated from each other. The imaging optical system can exhibit increased flexibility of use.
    Type: Grant
    Filed: April 12, 2010
    Date of Patent: October 15, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Hans-Juergen Mann
  • Publication number: 20130120724
    Abstract: The invention relates to a method for splitting a pattern for use in a multi-beamlet lithography apparatus. The method comprises providing an input pattern to be exposed onto a target surface by means of a plurality of beamlets of the multi-beamlet lithography apparatus. Within the input pattern first and second regions are identified. A first region is a region that is exclusively exposable by a single beamlet of the plurality of beamlets. A second region is a region that is exposable by more than one beamlet of the plurality of beamlets. On the basis of an assessment of the first and second regions it is determined what portion of the pattern is to be exposed by each beamlet.
    Type: Application
    Filed: May 18, 2012
    Publication date: May 16, 2013
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventors: Marco Jan-Jaco WIELAND, Joris Anne Henri VAN NIEUWSTADT, Teunis VAN DE PEUT
  • Patent number: 8421999
    Abstract: Exposure areas are wholly overlapped by moving a gradient refractive index lens array in a direction perpendicular to a scanning direction, or by providing a plurality of gradient refractive index lens arrays, an optical filter having a density distribution of lightness and darkness to compensate light transmission nonuniformity of the gradient refractive index lens array is arranged, or an opening control plate for limitedly using only of a uniform portion is provided. Two or more means may be simultaneously provided among the aforementioned mean. Moreover, any one of a microscopic transmission shutter array, a microscopic reflection shutter array, and a microscopic light emitter array is used instead of a mask, or an illuminating device and the mask.
    Type: Grant
    Filed: January 17, 2008
    Date of Patent: April 16, 2013
    Assignee: Tokyo Denki University
    Inventors: Toshiyuki Horiuchi, Hiroshi Kobayashi
  • Patent number: 8384875
    Abstract: An exposure apparatus includes a mask-moving section movable in a first direction while holding a mask formed with a pattern; an illumination system which forms first and second illumination areas separated each other by a spacing distance in the first direction; a substrate-moving section movable in a second direction while holding a photosensitive substrate; a projection optical system which forms first and second projected images of the patterns of the first and second illumination areas; and a restricting section which restricts the first and second projected images to be within first and second projection areas respectively. A spacing distance between a first conjugate area with the first projection area and a second conjugate area with the second projection area is set to be such a spacing distance that scanning exposures are successively performed for first and second transfer areas provided adjacently in the second direction.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: February 26, 2013
    Assignee: Nikon Corporation
    Inventors: Yasuhiro Hidaka, Tadashi Nagayama, Tohru Kiuchi
  • Patent number: 8358402
    Abstract: A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material. The method also includes illuminating a second object structure and projecting a pattern of the second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material. The respective patterns are projected in the same projection direction.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: January 22, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Aksel Goehnermeier
  • Patent number: 8345225
    Abstract: A lithographic arrangement allows for controlling radiation characteristics. An illumination system provides a beam of radiation from radiation provided by a radiation source. The radiation source includes an array of individually controllable elements, each individually controllable element being capable of emitting radiation. A support structure supports a patterning device. The patterning device imparts the radiation beam with a pattern. A projection system projects the patterned radiation beam onto a target portion of a substrate held by a substrate table. A radiation peak intensity detection apparatus detects a peak in the intensity of an emission spectrum of one or more of the individually controllable elements of the radiation source.
    Type: Grant
    Filed: August 12, 2009
    Date of Patent: January 1, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Onvlee, Marcel Mathijs Theodore Marie Dierichs
  • Patent number: 8294874
    Abstract: A scanning exposure apparatus has plural projection optical systems having plural mirrors configured to form an optical-axis shift vector. Its component in a direction orthogonal to a scanning direction is set so that adjacent areas in plural areas on the original can adjoin each other when viewed from the direction orthogonal to the scanning direction and adjacent areas in plural areas on the substrate can adjoin each other when viewed from the direction. A size of its component in the scanning direction is set so that a product between the imaging magnification of each projection optical system and a distance between centers of two areas on the original in the scanning direction corresponding to two projection optical systems in the plurality of projection optical systems can be equal to a distance between centers of two areas on the substrate corresponding to the two projection optical systems in the scanning direction.
    Type: Grant
    Filed: February 13, 2009
    Date of Patent: October 23, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventor: Michio Kono
  • Publication number: 20120224155
    Abstract: The invention pertains to a direct write lithography system comprising: A converter comprising an array of light controllable electron sources, each field emitter being arranged for converting light into an electron beam, the field emitters having an element distance between each two adjacent field emitters, each field emitter having an activation area; A plurality of individually controllable light sources, each light source arranged for activating one field emitter; Controller means for controlling each light source individually; Focusing means for focusing each electron beam from the field emitters with a diameter smaller than the diameter of a light source on an object plane.
    Type: Application
    Filed: February 22, 2012
    Publication date: September 6, 2012
    Applicant: MAPPER LITHOGRAPHY IP B.V.
    Inventor: Pieter KRUIT
  • Patent number: 8253927
    Abstract: The disclosure relates to an illumination system, such as an illumination system for use in microlithography. The illumination system can include an optical element with multiple primary light sources. The illumination system can illuminate a field in a field plane having a field contour. The illumination system can be configured so that each primary light source illuminates an area in the field plane that is smaller than a size of an area encircled by the field contour.
    Type: Grant
    Filed: May 21, 2009
    Date of Patent: August 28, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Udo Dinger
  • Patent number: 8174679
    Abstract: The present invention provides an illumination optical system which illuminates a surface to be illuminated with light from a light source, the illumination optical system including a plurality of illumination systems configured to form predetermined illumination regions with the light from the light source, an optical system having reflecting surfaces, which are configured to reflect the light beams from the illumination systems, respectively for the plurality of illumination systems, and a light-shielding unit configured to shield a certain light component in a composite illumination region formed by the light from the optical system to shape a shape of the composite illumination region, wherein one continuous composite illumination region is formed on the surface to be illuminated by connecting the respective illumination regions by reflecting the light beams from the plurality of illumination systems by the reflecting surfaces.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: May 8, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventor: Michio Kono
  • Patent number: 8111380
    Abstract: A method for generating a write pattern to be used in a maskless-lithography process is described. During the method, a computer system determines a one-to-one correspondence between pixels in the write pattern and at least a subset of elements in a spatial-light modulator used in the maskless-lithography process. Furthermore, the computer system generates the write pattern. Note that the write pattern includes features corresponding to at least the subset of elements in the spatial-light modulator, and the generating is in accordance with a characteristic dimension of an element in the spatial-light modulator and a target pattern that is to be printed on a semiconductor wafer during the maskless-lithography process.
    Type: Grant
    Filed: September 8, 2008
    Date of Patent: February 7, 2012
    Assignee: Luminescent Technologies, Inc.
    Inventors: Daniel S. Abrams, Timothy Lin
  • Patent number: 8009454
    Abstract: Provided is a resistance random access memory (RRAM) device and a method of manufacturing the same. A resistance random access memory (RRAM) device may include a lower electrode, a first oxide layer on the lower electrode and storing information using two resistance states, a current control layer made of a second oxide on the first oxide layer and an upper electrode on the current control layer.
    Type: Grant
    Filed: January 17, 2007
    Date of Patent: August 30, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Myoung-jae Lee, Yoon-dong Park, Hyun-sang Hwang, Dong-soo Lee
  • Patent number: 7956983
    Abstract: Example embodiments of the present invention may provide exposure equipment having an auxiliary photo mask. The exposure equipment may include a light source and a first photo mask spaced apart from the light source by a desired distance. A second photo mask may include a third region and a fourth region. An exposure method using the exposure equipment also may be provided.
    Type: Grant
    Filed: December 7, 2006
    Date of Patent: June 7, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Dong-Seok Nam
  • Patent number: 7916270
    Abstract: An exposure apparatus includes a projection optical system that has a first object field area and a second object field area different from the first object field area and that projects an image of a pattern onto a first image field and a second image field. The image of the pattern is formed in the first image field by exposure light via the first object field area, and the image of the pattern is formed in the second image field by exposure light via the second object field area. A first substrate is exposed with the image of the pattern formed in the first image field, and a second substrate is exposed with the image of the pattern formed in the second image field.
    Type: Grant
    Filed: March 2, 2007
    Date of Patent: March 29, 2011
    Assignee: Nikon Corporation
    Inventor: Hiroyuki Nagasaka
  • Patent number: 7907250
    Abstract: An immersion lithography method includes forming a resist layer on a substrate to be processed, performing immersion lithography in a state where liquid is locally interposed between the resist layer on the substrate and an optical system of an exposure apparatus, while the substrate and the optical system are relatively moved. In the immersion lithography, multiple exposures are performed for exposure regions in a portion of a surface of the substrate close to a rim of the substrate, and exposures of number of times smaller than the number of exposures of the multiple exposures are performed for exposure regions located inside the exposure regions.
    Type: Grant
    Filed: September 26, 2007
    Date of Patent: March 15, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Shinichi Ito
  • Patent number: 7884921
    Abstract: An illumination optical apparatus, used in a projection exposure apparatus for projecting and exposing a pattern arranged in a first plane to a second plane, for supplying the first surface with illumination light from a light source comprises an optical path combiner arranged in an optical path between the light source and the first surface, for combining a plurality of light beams different from each other from the light source such that the first and second light beams illuminate the first surface closely to each other. The optical path combiner includes a discrete point positioned on or near a third surface optically conjugate with the first surface. The plurality of light beams travel by way of a plurality of regions sectioned by the discrete point, respectively.
    Type: Grant
    Filed: April 10, 2007
    Date of Patent: February 8, 2011
    Assignee: Nikon Corporation
    Inventors: Michio Noboru, Naomasa Shiraishi
  • Patent number: 7787102
    Abstract: Methods, systems, and media to define a portion of a circuit pattern with a source of real-time configurable imaging are disclosed. Embodiments include hardware and/or software for directing a beam through a mask onto a wafer surface to outline a circuit pattern having an undefined area, directing a second beam to the semiconductor wafer surface to define a circuit structure in the undefined area to complete the circuit pattern on the semiconductor wafer surface, and directing the second beam onto a source of real-time configurable imaging. Embodiments may also include a mask to include an undefined area incorporated into the circuit pattern to leave a critical structure of the circuit pattern undefined. Several embodiments include a photolithography system including an exposure tool, a mask, a source of real-time configurable imaging, and addressing circuitry.
    Type: Grant
    Filed: November 7, 2007
    Date of Patent: August 31, 2010
    Assignee: International Business Machines Corporation
    Inventors: William Bornstein, Anthony Cappa Spielberg
  • Patent number: 7782442
    Abstract: An exposure apparatus includes an optical unit which defines a first exposure area and a second exposure area at different positions in a first direction and which radiates exposure light beams onto the first and second exposure areas respectively; and a first movement system which moves the first exposure area and the second exposure area relative to a substrate in the first direction. The exposure light beams are radiated by the optical unit onto the first and second exposure areas respectively while moving the first and second exposure areas relative to a predetermined area on the substrate. Accordingly, the predetermined area on the substrate is subjected to multiple exposure with an image of a first pattern formed by the exposure light beam radiated onto the first exposure area and an image of a second pattern formed by the exposure light beam radiated onto the second exposure area.
    Type: Grant
    Filed: December 5, 2006
    Date of Patent: August 24, 2010
    Assignee: Nikon Corporation
    Inventor: Hiroyuki Nagasaka
  • Patent number: 7733539
    Abstract: A method for scanning a media sheet with a scanning apparatus includes feeding the media sheet through the first set of rollers into a scanning area, such that a first portion of the media sheet is available for scanning. A first partial media sheet image of the first portion is scanned. The media sheet is fed into the second set of rollers, then out of the first set of rollers, such that a second portion of the media sheet is available for scanning. A second partial media sheet image of the second portion of the media sheet is scanned. At least the first partial media sheet image is combined with the second partial media sheet image to generate a full image of the media sheet. In a further embodiment, the number of partial scans may be increased as necessary to provide a complete image of the scanned object, e.g., the media sheet. For example, one or more intermediate scans may be performed in accordance with the present invention in addition to the scans occurring at the ends of media sheet.
    Type: Grant
    Filed: March 16, 2005
    Date of Patent: June 8, 2010
    Assignee: Lexmark International, Inc.
    Inventors: Mark J. Edwards, Robert A. Pemberton, Robert W. Rumford, Gregory P. Washnock, Michael R. Wedding
  • Publication number: 20100060871
    Abstract: An off-axis light source is described, including an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern at the illumination surface thereof, wherein the illumination area of the quadrupole illumination pattern is smaller than that of the X- or Y-dipole illumination pattern. A light screen plate is also described, having corresponding openings therein and can be used to form the above off-axis light source. A method of defining different types of patterns with a single exposure is also described, which utilizes the above off-axis light source.
    Type: Application
    Filed: September 11, 2008
    Publication date: March 11, 2010
    Applicant: Powership Semiconductor Corp.
    Inventor: Yi-Shiang Chang
  • Publication number: 20090214962
    Abstract: An exposure apparatus includes a plurality modules and a controller, each module exposes a pattern of an original onto a substrate by using light from a light source, wherein each module includes a position detector configured to detect a position of the original or the substrate that has an alignment mark used for an alignment between the original and each shot on the substrate, wherein the controller has information relating to an alignment error of a detection result by the position detector which is set to each module, and wherein the exposure apparatus further includes a reducing unit configured to reduce a difference of the alignment error among modules.
    Type: Application
    Filed: February 10, 2009
    Publication date: August 27, 2009
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Kazuhiko Mishima
  • Publication number: 20090168034
    Abstract: Methods and apparatus of manufacturing a semiconductor device are provided. Embodiments regard producing a first pattern in a first layer of a semiconductor substrate, producing a second pattern in a second layer of the semiconductor substrate, and matching the first pattern and the second pattern. The matching includes determining a mismatch between the first pattern and the second pattern that would occur without the matching and precorrecting the mismatch in the first layer.
    Type: Application
    Filed: December 28, 2007
    Publication date: July 2, 2009
    Inventors: Jens Staecker, Patrick Lomtscher
  • Patent number: 7538853
    Abstract: An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and exposing the target substrate a plurality of times using the plurality of glass photomasks.
    Type: Grant
    Filed: March 21, 2006
    Date of Patent: May 26, 2009
    Assignee: Fujitsu Hitachi Plasma Display Limited
    Inventors: Masashi Nishiki, Hisashi Okada
  • Publication number: 20090128788
    Abstract: The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises determining the position of a first photomask pattern relative to an adjacent second photomask pattern, the first photomask pattern having a critical edge for defining a critical dimension of a first device structure and a non-critical edge for defining a non-critical dimension. The non-critical edge is attached to the critical edge so that the positioning of the non-critical edge will affect the length of the critical edge. The non-critical edge of the first photomask pattern is positioned a distance X from an edge of the second photomask pattern, wherein the distance X is chosen to be substantially the minimum spacing allowed by the mask rules.
    Type: Application
    Filed: November 15, 2007
    Publication date: May 21, 2009
    Inventor: Thomas J. Aton
  • Publication number: 20090111056
    Abstract: Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance the dosage and exposure rates between the multiple lithography exposures to provide the needed exposure on the wafer. Other embodiments provide for assist features and/or may apply resolution enhancement to various exposures. In a specific embodiment, a wafer is first exposed using optical photolithography and then exposed using interference lithography.
    Type: Application
    Filed: August 27, 2008
    Publication date: April 30, 2009
    Applicant: Applied Materials, Inc.
    Inventors: Rudolf Hendel, Zhilong Rao, Kuo-Shih Liu, Chris A. Mack, John S. Petersen, Shane Palmer