Abstract: A method for scanning a media sheet with a scanning apparatus includes feeding the media sheet through the first set of rollers into a scanning area, such that a first portion of the media sheet is available for scanning. A first partial media sheet image of the first portion is scanned. The media sheet is fed into the second set of rollers, then out of the first set of rollers, such that a second portion of the media sheet is available for scanning. A second partial media sheet image of the second portion of the media sheet is scanned. At least the first partial media sheet image is combined with the second partial media sheet image to generate a full image of the media sheet. In a further embodiment, the number of partial scans may be increased as necessary to provide a complete image of the scanned object, e.g., the media sheet. For example, one or more intermediate scans may be performed in accordance with the present invention in addition to the scans occurring at the ends of media sheet.

Abstract: An off-axis light source is described, including an X-dipole illumination pattern, a Y-dipole illumination pattern and a quadrupole illumination pattern at the illumination surface thereof, wherein the illumination area of the quadrupole illumination pattern is smaller than that of the X- or Y-dipole illumination pattern. A light screen plate is also described, having corresponding openings therein and can be used to form the above off-axis light source. A method of defining different types of patterns with a single exposure is also described, which utilizes the above off-axis light source.

Abstract: An exposure apparatus includes a plurality modules and a controller, each module exposes a pattern of an original onto a substrate by using light from a light source, wherein each module includes a position detector configured to detect a position of the original or the substrate that has an alignment mark used for an alignment between the original and each shot on the substrate, wherein the controller has information relating to an alignment error of a detection result by the position detector which is set to each module, and wherein the exposure apparatus further includes a reducing unit configured to reduce a difference of the alignment error among modules.

Abstract: Methods and apparatus of manufacturing a semiconductor device are provided. Embodiments regard producing a first pattern in a first layer of a semiconductor substrate, producing a second pattern in a second layer of the semiconductor substrate, and matching the first pattern and the second pattern. The matching includes determining a mismatch between the first pattern and the second pattern that would occur without the matching and precorrecting the mismatch in the first layer.

Abstract: An exposure process using photomasks, the process includes the steps of: providing a plurality of glass photomasks for optical lithography with respect to a target substrate to be processed, the photomasks having identical exposure patterns, and exposing the target substrate a plurality of times using the plurality of glass photomasks.

Abstract: The present application is directed a method for determining the position of photomask patterns in a mask making process. The method comprises providing one or more mask rules defining the minimum spacing between photomask patterns. The method further comprises determining the position of a first photomask pattern relative to an adjacent second photomask pattern, the first photomask pattern having a critical edge for defining a critical dimension of a first device structure and a non-critical edge for defining a non-critical dimension. The non-critical edge is attached to the critical edge so that the positioning of the non-critical edge will affect the length of the critical edge. The non-critical edge of the first photomask pattern is positioned a distance X from an edge of the second photomask pattern, wherein the distance X is chosen to be substantially the minimum spacing allowed by the mask rules.

Abstract: Methods and systems are disclosed that provide multiple lithography exposures on a wafer, for example, using interference lithography and optical photolithography. Various embodiments may balance the dosage and exposure rates between the multiple lithography exposures to provide the needed exposure on the wafer. Other embodiments provide for assist features and/or may apply resolution enhancement to various exposures. In a specific embodiment, a wafer is first exposed using optical photolithography and then exposed using interference lithography.

Abstract: A composite exposure image is formed on a photoresist layer by applying a light beam through a reticle to form a first exposure image thereon, and thereafter, while maintaining the position of the reticle with respect to the photoresist layer, again applying a light beam through the reticle to form a second exposure image thereon. By adjusting the light beam differently in focus and intensity for each exposure, the combination of first and second exposure images form a pattern on the photoresist of lesser pitch than can be produced from a single exposure. The formation of a single pattern in the single resist layer from the two exposures avoids misalignment problems and eliminates the need for double exposure of a plurality of resist layers.

Abstract: A scanning exposure apparatus of the present invention is one for transferring a pattern of a first object onto a second object while projecting an image of the first object placed on a first plane, onto the second object placed on a second plane and changing a positional relation between the image of the first object and the second object in a scanning direction. The scanning exposure apparatus has a first projection optical system having a first field of view on the first plane and adapted to project an enlargement image of a portion of the first object in a first projection region on the second plane, based on light from the first field of view, and a second projection optical system having a second field of view on the first plane and adapted to project an enlargement image of a portion of the first object in a second projection region on the second plane, based on light from the second field of view.

Abstract: An exposure apparatus has a first illumination system which illuminates a first mask, a second illumination system which illuminates a second mask located apart from the first mask along a first direction, and a projection optical system which forms a pattern image of the first mask and a pattern image of the second mask in parallel on a photosensitive substrate. An optical axis of an exit-side partial optical system of the first illumination system and an optical axis of an exit-side partial optical system of the second illumination system each are set along a plane parallel to a direction perpendicular to the first direction.

Abstract: An exposure apparatus performs a multiple exposure of a substrate and comprises: a first station that exposes the substrate; a second station that exposes the substrate that was exposed at the first station; movable members each of that holds the substrate and is capable of moving between the first station and the second station; and a first detection system that is disposed in the first station and acquires alignment information about the substrate.

Abstract: By the combination of adjusting optical properties of an optical system by an irradiation unit irradiating non-exposure light on an optical element, which is movable, and adjusting the optical properties of the optical system with an optical properties adjustment unit by moving the optical element, for example, the change in the optical properties of the optical system caused by the temperature distribution of the optical elements whose center is at a position eccentric from the optical axis is corrected. Further, under a dipole illumination condition, in order to make optical properties of an optical system caused by non-rotational symmetry temperature distribution of optical elements in the vicinity of pupils into optical properties that can be corrected more easily by an optical properties adjustment unit, an irradiation unit irradiates non-exposure light on an optical element, which makes the optical element have a rotational symmetry temperature distribution.

Abstract: Contrast enhancing exposure apparatus and method for use in semiconductor fabrication are described. In one embodiment, a method for forming a pattern on a substrate, wherein the substrate includes a photoresist layer comprising photoacid generators (“PAGs”) and photobase generators (“PBGs”), is described.

Abstract: An exposure apparatus includes an illumination optical system for illuminating a predetermined mask, a projection optical system for projecting light from the mask to a predetermined exposure region, a first exposure device for illuminating the mask with a first sigma and for projecting light from the mask to the exposure region at a first spatial frequency passage spectrum of the projection system, so that the exposure region is exposed with a first pattern, and a second exposure device for illuminating the mask with a second sigma, different from the first sigma, and for projecting light from the mask to the exposure region at a second spatial frequency passage spectrum of the projection system, different from the first spatial frequency passage spectrum, so that the exposure region is exposed with a second pattern. A first exposure by the first exposure device and a second exposure by the second exposure device are carried out prior to a development process.

Abstract: An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.

Abstract: A method (and resultant structure) of forming a plurality of masks, includes creating a reference template, using imprint lithography to print at least one reference template alignment mark on all of a plurality of mask blanks for a given chip set, and printing sub-patterns on each of the plurality of mask blanks, and aligning the sub-patterns to the at least one reference template alignment mark.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: A method is provided for performing photolithography on a substrate which has a first region on a lower level and a second region on an upper level, wherein a first pattern area exists within said first region, a second pattern area exists within said second region, and at least said first and second regions are coated with a photoresist, the method comprising: a) exposing the photoresist through a first mask so as to expose said first region including said first pattern area, and thus create a first pattern in said first pattern area, but not expose said second pattern area; and b) exposing the photoresist through a second mask so as to expose said second pattern area, and thus create a second pattern in said second pattern area, but not expose said first pattern area, and also to expose an area of said first region which lies adjacent said second region.

Abstract: The mutually associated structure patterns, which are provided on one mask, or a plurality of masks for a double or multiple exposure can be received by the mask substrate holder. The mask substrate holder has two receiving stations one for each of the masks. Alternatively, both structure patterns for the double exposure are formed on one mask. The substrate holder has one receiving station. The substrate holder, is displaced from the section including first structure pattern to the second, between the two exposure operations, without the masks having to be loaded or unloaded, and realigned.

Abstract: Comprising a data reader 31 for reading digital camera image data, a means 32 for setting, for example, the number of prints, a plurality of printers 33, a printer selector 34 for selecting which of the plurality of printers to use, and a controller 35 for sending a specific control signal to the printer selector 34 and image data to a specific printer 33 based on the information set by the setting means 32, each printer 33 is provided with an image processing circuit 36 for processing the read image data.

Abstract: An exposure apparatus includes a plurality of projection optical systems and a substrate stage. Each of the plurality of projection optical systems forms an exposure field on the substrate. The substrate stage holds the substrate and moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction. The plurality of projection optical systems and the substrate relatively move during an exposure field forming operation along the scanning direction.

Abstract: A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

Abstract: A dual exposure source lithography system forms a first and a second portion of a pattern on a wafer. An optical lithography module forms the first portion of the pattern. A non-optical lithography module forms the second portion of the pattern using a non-optical lithography exposure source. The non-optical exposure source is an electron beam lithography source, an EUV source, an x-ray source, or another next generation lithography system exposure source. A mask design file is decomposed into separate design files reflecting critical and non-critical components of the pattern to be formed on the wafer.

Abstract: A two level image writer (10) forms an image from digital data onto a photosensitive medium. A first level illumination system has a first source (20) for emitting a first polarized light beam having a first color; a second source (22) for emitting a second polarized light beam having a second color; and a third source (26) for emitting a third polarized light beam having a third color. A fold mirrors directs each beam to a second level. Three polarizing beamsplitters (73, 75, 77) on the second level receive the polarized beams from the fold mirrors and isolate polarization states of each of the first, second, and third polarized light beam. Three spatial light modulators (90, 95, 97) on the second level modulate the first, second, and third polarized light beam from the polarizing beamsplitter prisms to form an array of image pixels according to said digital data. A diechroic combiner (86) combines the three modulated light beams.

Abstract: A dual exposure source lithography system forms a first and a second portion of a pattern on a wafer. An optical lithography module forms the first portion of the pattern. A non-optical lithography module forms the second portion of the pattern using a non-optical lithography exposure source. The non-optical exposure source is an electron beam lithography source, an EUV source, an x-ray source, or another next generation lithography system exposure source. A mask design file is decomposed into separate design files reflecting critical and non-critical components of the pattern to be formed on the wafer.

Abstract: An imaging apparatus includes a laser to generate a single-mode laser beam of energy, a multichannel spatial light modulator (SLM) accepting a plurality of modulating signals, and a beam multiplier between the radiation source and the SLM. The multiplier accepts the beam and generates from that beam a plurality of beams directed onto the SLM. The beams from the beam multiplier illuminate the active region of the SLM such that the SLM generates a plurality of modulated beams modulated according to the modulating signals. An optical subsystem is located between the SLM and an imaging plane including at least one optical element focusing the modulated beams onto the plane on which recording medium is placed to permanently mark the recording medium in response to incidence of such imaging radiation. Each beam from the SLM is substantially single-mode such that the optical subsystem can be designed using diffraction-limited optics.

Abstract: An image forming apparatus which includes: an image forming apparatus main body provided with an image forming portion for forming an image on a sheet; an upstream-side sheet feed unit which is juxtaposed to the image forming apparatus main body and feeds a sheet contained therein to the image forming portion; a sheet treatment portion for treating a sheet fed thereto; and a downstream-side sheet feed unit which is juxtaposed between the image forming apparatus main body and the sheet treatment portion and feeds a sheet contained therein to the sheet treatment portion, in which each of the upstream-side sheet feed unit and the downstream-side sheet feed unit is selectively attachable to the image forming apparatus main body, and the upstream-side sheet feed unit and the downstream-side sheet feed unit have the same construction.

Abstract: An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.

Abstract: An image forming apparatus for suppressing deviations in the application position of light emitted from an optical box, thus preventing an image from being deteriorated, has an image bearing body, a light source, a deflecting device for deflecting a light emitted from the light source, a lens for imaging a light deflected in this manner onto the image bearing body, and an optical box for containing at least the light source, the deflecting device, and the lens, wherein the optical box is provided plurally and the plurality of optical boxes are stacked to be integrated.

Abstract: A photo film cassette contains IX240 type of photo film in a manner movable out through a photo film passageway. A photo film carrier has a feeding path with an entrance, toward which the photo film is advanced. The photo film carrier includes a carrier base plate disposed to extend upstream from the entrance. A holder plate is secured to the carrier base plate in a shiftable manner between first and second positions, and has a first face and a second face. The first face is loaded with the photo film cassette, and when the holder plate is in the first position, is positioned close to the entrance, for opposing the photo film passageway of the photo film cassette to the entrance. The second face, when the holder plate is in the second position, is positioned close to the entrance, for guiding entry of photo film of IX240 type in a cassetteless form to the entrance.

Abstract: An image recording device which cuts an elongated photosensitive material, and disposes plural rows of photosensitive material sheets in parallel, and simultaneously conveys the photosensitive material sheets. The elongated photosensitive material pulled-out from a magazine is cut by a cutter into a plurality of sheet-shaped photographic printing papers of predetermined widths. The photographic printing papers are conveyed by first conveying roller pairs to predetermined positions on a conveying path. Due to nipping of the first conveying roller pairs being released, the photographic printing papers, which have been conveyed to conveying positions of respective rows, abut a stopper such that trailing ends of the photographic printing papers are aligned. Further, due to the plurality of photographic printing papers being nipped by second roller pairs, the plurality of photographic printing papers are conveyed toward an exposure position simultaneously in plural rows on the conveying path.

Abstract: A reticle includes multiple different layer patterns selected from a group comprising same circuit layer patterns and different circuit layer patterns. The layer patterns are positioned on the reticle within borders and within a portion of a defined x by y array on the reticle. The reticle is used to produce an integrated circuit of a single design or integrated circuits of multiple designs.

Abstract: The method for positioning two stages during semiconductor wafer processing facilitates the use of two stages to improve system throughput by decreasing the rest-time of certain system components. While a typical single-stage apparatus requires that each step in the process be performed serially, this invention allows an amount of parallel processing with each stage at different steps of the process, and thus improves system throughput.

Abstract: High resolution gray scale graphical images are formed in a semiconductor substrate by the use of two or more levels of indicia having a plurality of image segments and having a continuous conductive line formed in the surface of the substrate, each image segment includes a portion of said continuous conductive line and a contrasting material providing pixels in which the width of the line within a segment varies in relationship to gray scale levels in the graphic image to be formed. Providing a graphic image to be converted; converting the graphic image to a gray level, two dimensional bit mapped converting the bit mapped image into a set of parallel lines of varying width; each line comprising a single continuous segment in which the width varies based on the density of the gray level required to form the gray level image; and transferring the set of lines to a pattern of conductor/insulator lines on a substrate.

Abstract: The present invention provides a method and system for simultaneously imaging at least two reticles onto a substrate. According to the present invention, the wafer is passed through the exposure sequence once with images from the reticles being exposed simultaneously onto the wafer. The throughput of the system is effectively maintained at the standard single pass throughput level or twice that of conventional systems. In one embodiment, the present invention produces two reticle images side-by-side in the exit pupil of the optics of a step and scan wafer exposure system. The scanning action of the exposure tool then effectively superimposes the two images during the exposure of the wafer. Each image exposes the photoresist as the wafer is scanned through the image field synchronously with the scanning of the reticles. According to one embodiment, the image scanning is synchronized so that two required images are superimposed.

Abstract: The invention relates to a system for projecting or displaying images comprising a valve exhibiting a plurality of image-forming elements having a light transmission coefficient which can be controlled so as to present the image, and a means of illuminating the valve comprising a light source and an integrator having two lens arrays associated in such a way that each lens of the second array distributes over the valve the light received from a corresponding lens of the first array. This system comprises a means for focusing the illuminating beam onto the integrator. The dimensions of the integrator are thus minimized. The focusing means comprises, for example, a reflector which reflects the light produced by the source, the integrator being arranged substantially in the focal plane of the reflector.

Abstract: An illumination optical apparatus and method forms a plurality of illumination regions on a first object, and positional relationships between the plurality of illumination regions can be adjusted. An exposure apparatus that includes the illumination optical apparatus can, while moving the first object and a second object in a certain moving direction, effect projection exposure of an image of the first object onto the second object. The plurality of illumination regions can have polygon shapes. A field stop used in the illumination optical apparatus can have an aperture portion with first and second regions, the second region corresponding to an overlap region on the first object, wherein a transmittancy of the second region is smaller than a transmittancy of the first region.

Abstract: If an optional paper feeding deck or furnisher, or paper stacker, is connected to an image forming apparatus (such as a printer), such optional devices are to be controlled by connecting the paper conveyance control apparatus to control those options. Such an image forming apparatus has a video controller to convert the printer language sent from a high-order device such as a host computer, into bit map data and a printer engine to print the bit map data. Such a paper conveyance control apparatus, being electrically connected to the video controller, has a memory to be shared with the video controller. The video controller writes the job schedule in the shared memory. The paper conveyance control apparatus controls the optional device according to the written job schedule.

Abstract: Apparatus for imaging photographic negatives onto light-sensitive photoprint material includes a platform (3) for the print material; a digital image projection system (2) with an electronic image generation unit; and an integrated analog image projection system (1) with an light source and a negative holder. The image generator of the digital image projection system is disposed outside the light ray path of the analog image projection system. The projection systems are so constructed and arranged that the photoprint material on the platform (3) can receive images from both projection systems simultaneously or consecutively. When a change is made for the projection of images by one projection system to the other, the two light ray paths remain unchanged.

Abstract: An optical reduction system with polarization dose sensitive output for use in the photolithographic manufacture of semiconductor devices having variable compensation for reticle retardation before the long conjugate end. The variable compensation component(s) before the reticle provides accurate adjustment of the polarization state at or near the reticle. The variable compensation components can be variable wave plates, layered wave plates, opposing mirrors, a Berek's compensator and/or a Soleil-Babinet compensator. The catadioptric optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

Abstract: A system for performing digital lithography onto a subject is provided. The system utilizes pixel panels to generate pixel patterns. Mirrors are utilized to divert and align the pixel elements forming the patterns onto a subject. A gradient lens system positioned between the panels and the subject simultaneously directs the pixel elements to the subject. The pixel elements may overlapping, adjacent, or spaced as desired. The pixel elements may be directed to multiple surfaces simultaneously. One or more point array units may be utilized in the system to achieve higher resolution.

Abstract: A thermal printer includes a thermal head, which records an image to a recording material. Feeder rollers feed the recording material relative to the thermal head. An EEPROM stores first distance data adapted to image recording to a predetermined first type of the recording material. A keyboard inputs second distance data representing a second type of the recording material at a time of image recording to the second type. A personal computer causes the feeder rollers to set the first and second types to the thermal head according to respectively the first and second distance data, and drives the thermal head and feeder rollers in synchronism. The image is recorded in first and second printing regions suitable to respectively the first and second types.

Abstract: An object of the present invention is to provide an image forming apparatus for suppressing deviations in the application position of a light emitted from an optical box, thus preventing an image from being deteriorated. Another object of the present invention is to provide an image forming apparatus that has an image bearing body, a light source, a polarizing device for polarizing a light emitted from the light source, a lens for imaging a light polarized by the polarizing device onto the image bearing body, and an optical box for containing at least the light source, the polarizing device, and the lens, wherein the optical box is provided plurally and the plurality of optical boxes are stacked to be integrated.

Abstract: Disclosed is a photographic capturing device for the capturing of photographic image information from photographic media with a light source, with a stage for the photographic medium to preset a reference position for the projection of the photographic medium by way of a projection optics onto a detection element which detects the light originating from the light source and modulated by the photographic medium according to the image information, whereby a sample carrier with a sample is provided for the control of the focus of the projected image, and a positioning mechanism which removably places the sample carrier a the reference position for projecting the sample onto the detection element by way of the projection optics.

Abstract: The present invention is to provide a method and apparatus for manufacturing a postcard-affixed photographic print and a photographic print, which can improve productivity while using a conventional digital image recording device, and which improve the efficiency of processing a roll of photographic printing paper without greatly altering a conventional manufacturing line by that images are printed such that a plurality of image rows, each having a plurality of images which are formed along the transverse direction of an elongated photographic printing paper on the photographic printing paper.

Abstract: There is provided an image recording apparatus comprising a light-sensitive material supply section, a light-sensitive material transport mechanism, an image recording section, a cutter, a distributor, a scan/transport section and an exposing unit, wherein a light-sensitive material supplied as cut sheets is distributed in a plurality of rows and digitally exposed at a time for a plurality of images and the cut sheets of the exposed light-sensitive material are delivered to a subsequent developing apparatus by the light-sensitive material transport mechanism. The productivity of the digital photoprinter is improved when a multiplicity of the cut sheets of the light-sensitive material are exposed.

Abstract: A method for manufacturing ink-jet printheads having nozzles with re-entrant profiles has the following steps. A source of electromagnetic energy is created which is then used with an optical system to produce a source of energy having a constant illumination angle on an process plane. A substrate is then exposed with the electromagnetic source to define the nozzles having the re-entrant profile. Also, apparatus for creating the constant illumination angle include an optical deflecting mask and an afocal optical system.

Abstract: A maskless lithography system that provides large-area, seamless patterning using a reflective spatial light modulator such as a Deformable Micromirror Device (DMD) directly addressed by a control system so as to provide a first pattern, via a first projection subsystem, on a first photoresist-coated substrate panel, while simultaneously providing a duplicate pattern, which is a negative of the pattern on the first substrate panel, via a second projection subsystem, onto a second photosensitive substrate panel, thus using the normally-rejected non-pattern “off” pixel radiation reflected by the “off” pixel micromirrors of the DMD, to pattern a second substrate panel. Since the “off” pixel reflections create a pattern which is complementary to the “on” pixel pattern, using a complementary photoresist coating on the second substrate panel provides for a duplicate pattern, as is usually desired.

Abstract: A method of providing information on the back side of a developed photographic medium having an image carrying layer on the front side. The method comprises machine reading code on the developed imaging carrying layer on the front side of the photographic medium. In the method, information is printed on the back side of the developed photographic medium with a printer, based on the machine read code. An apparatus, which can execute a method of the invention, for providing information on a back side of a developed photographic medium having an image carrying layer on the front side, has a reader to read machine readable code in the developed imaging carrying layer on the front side of the photographic medium. The apparatus further has a printer communicating with the reader so as to print information on the back side of the developed photographic medium based on the machine read code. The method may include printing and developing the photographic medium.

Abstract: A closet storage arrangement for increasing closet storage capacity includes a shoe case having two vertical side walls with a plurality of vertically spaced tiers for shoe storage provided in the case. Each tier has three horizontal shoe support members on which a shoe is rested. A clothes hang bar for supporting clothing may also be provided with the hang bar secured on each end in a vertical support member. Each vertical support member is stabilized against the back wall of the closet by a stabilizing arrangement. A shelf may be supported by the vertical support members. A peg bar, having selectively removable pegs, for hanging articles may also be provided in the closet.