Abstract: Embodiments include a dither system comprising a support member to support a sensor housing having a common line-of-sight (LOS). A first metal bellows is coupled to the support member and being concentric to the sensor housing to constrain rotational motion of the sensor housing and allow angular motion. An eccentric cam comprising: an outer circumference having an axis coaxial with an axis of the first bellows and an inner circumference including an axis laterally offset from the axis of the first bellow. The eccentric cam drives tilt motion of the sensor housing and LOS. A second metal bellows is coaxial to the inner circumference of the eccentric cam and being concentric to the sensor housing. A position measurement system coupled to the sensor housing tracks the tilt motion of the sensor housing with respect to the angular motion of the eccentric cam. A system and method are also provided.

Abstract: Method and apparatus for storing archive images to a substrate, such as a rotatable optical disc. In some embodiments, an optical medium has a substrate which stores a plurality of archived images in a human detectable form on a surface of the substrate and control data associated with the archived images to facilitate optical recovery of said human detectable images from the surface. The archived images are arranged as a sequence of tiles on a recording layer of the optical medium each tile having an associated length and width. The control data are arranged as machine readable information that identifies an overall content of the plurality of archived images.

Abstract: A portable magnifying assembly includes an external electronic device that may display an image. A bellows has a top end, a bottom end and a peripheral wall extending therebetween. The top end is open and the bellows are substantially hollow. The bottom end may be positioned on a support surface and the bellows may be positioned in an extended position. A magnifying plate is removably positioned on the bellows thereby facilitating the magnifying plate to magnify the image displayed on the external electronic device when the bellows is positioned in the extended position.

Abstract: An exposure method includes a step of moving a photomask by a predetermined distance and switching a first mask pattern group to a second mask pattern group when an exposure to a first exposure area on an object to be exposed by the first mask pattern group of the photomask formed by arranging the first and the second mask pattern groups corresponding to an exposure patterns at predetermined intervals in a conveying direction of the object to be exposed is completed, and a step of performing an exposure on the second exposure area on the object to be exposed by the second mask pattern group, in which a moving speed of the photomask is controlled so that a moving distance of the object to be exposed is longer than a moving distance of the photomask in a period of time when switching the first and the second mask pattern groups.

Abstract: A lithographic apparatus, includes an illumination system configured to condition a radiation beam, a first support constructed to support a first patterning device and a second support to support a second patterning device, the first and second patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The first support and second support are movable in a scanning direction and in a second direction substantially perpendicular to the scanning direction. By movement of the first support and second support in the second direction the first support and second support can selectively be aligned with the projection system.

Abstract: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays; receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel, controlling movement of the plurality of SLM imaging units to cover the different areas of the substrate, and controlling movement of the substrate to be in synchronization with continuous writing of the plurality of partitioned mask data patterns.

Abstract: An exposure apparatus of the present invention is an exposure apparatus for, while moving a first object M and a second object P along a scanning direction, performing projection exposure on the second object, which has a first projection optical system PL10 for forming an enlargement image of a portion on the first object in a first region being a partial region on the second object, and a second projection optical system PL11 for forming an enlargement image of a different portion from the portion on the first object in a second region different from the partial region on the second object, and which also has a first stage MST holding the first object and making at least one of the portion and the different portion of the first object movable along the non-scanning direction, wherein the first region and the second region are arranged at a predetermined interval along the non-scanning direction intersecting with the scanning direction.

Abstract: A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an overlapping part is formed. A plurality of marks different from the circuit pattern are exposed in a vicinity of the overlapping part. The plurality of marks are a set of marks at least including two marks disposed on one side of the overlapping part and two marks disposed on another side of the overlapping part. Deviations between the pair of the scanning regions, an inclination of exposing light, and a yawing angle of a stage are analyzed by measuring deviations of distances among the plurality of marks. Calibration data are obtained from a result of the analyzing.

Abstract: A method of optimizing lithographic processing to achieve substrate uniformity, is presented herein. In one embodiment, The method includes deriving hyper-sampled correlation information indicative of photoresist behavior for a plurality of wafer substrates processed at pre-specified target processing conditions. The derivation includes micro-exposing subfields of the substrates with a pattern, processing the substrates at the various target conditions, determining photoresist-related characteristics of the subfields (e.g., Bossung curvatures), and extracting correlation information regarding the subfield characteristics and the different target processing conditions to relate the target conditions as a function of subfield characteristics. The method then detects non-uniformities in a micro-exposed subsequent substrate processed under production-level processing conditions and exploits the correlation information to adjust the production-level conditions and achieve uniformity across the substrate.

Abstract: A direct exposure system comprises: a data mask that is a data object including drawing data; and a control mask that is a data object including at least one logical layer in which information about exposure conditions applied according to regions on a substrate is specified, and performs a direct exposure process using integrated data generated by combining the data mask with the control mask.

Abstract: A hologram fabricating apparatus includes a coherent light generator, two micro-display devices and a telecentric system. The coherent light generator provides a first coherent light and a second coherent light. Each micro-display device has a plurality of pixel elements laid thereon. The first coherent light and the second coherent light project respectively to the two micro-display devices. The telecentric system is located between the micro-display devices and a photoresist sheet to converge the projecting light on the photoresist sheet to generate interference stripes. Each pixel element may be adjusted independently to determine whether the first coherent light and the second coherent light projected to the pixel element to be projected to the telecentric system.

Abstract: A photolithographic machine is described for transferring fine patterns from a photomask to a flexible roll-to-roll format. It is capable of printing multiple layers in exact registry onto a distorted format. It contains 1 to 1 reflective optics, dynamic distortion and magnification correction. The optical transfer assembly scans reciprocally across the format and back and the photomask/platen assembly moves incrementally forward between scans to complete a raster pattern. Both the object and image fields are autofocussed. The optical transfer assembly is retained into a straight-line scanning path by opposed air bearings retained on a straight guide. The photomask/platen assembly is retained into an orthogonal path by air/vacuum bearings operating on a vertical stone face. Together this arrangement substantially prevents yaw scanning errors. The web is fed through the machine from roll to roll without twisting. It remains stationary during each recording pass.

Abstract: A printing system includes a support arrangement. A print cartridge receiving arrangement is mounted on the support arrangement to engage a print cartridge. A drive mechanism delivers print media from the print cartridge. A print engine is mounted on the support arrangement downstream of the print cartridge and has a pair of opposed printhead assemblies that are configured to perform double-sided printing on print media fed from the print cartridge between the printhead assemblies. A slitter is mounted on the support arrangement downstream of the print engine and is configured to separate the print media into sheets.

Abstract: A method for extending a print area provides a printer with the capability of printing a larger image by extending the print area during the printing of an image. The method extends the print area by means of a window driver which transmits an image to be printed to a printer according to a print command input. The method includes a first print step of the window driver for transmitting a first portion of the image to be printed on a piece of paper, the first portion being bounded by a lower end margin of the piece of paper, and a second print step of the window driver for transmitting a second portion of the image to be printed on a portion of the piece of paper below the lower end margin of the paper. Accordingly, since the printable area becomes larger by reducing the lower end margin of the printer to the level of the upper end margin, documents created by a user (such as CAD drawings, graphics and charts) are printed without being cut.

Abstract: A photofinishing system comprising: a) a digital processor, a printer and means for feeding print media to the printer; the digital processor being arranged to receive digitised data that is representative of a photographic image and to process the data in a manner to generate a printer drive signal that is representative of the photographic image, and the printer being coupled to the digital processor and being arranged to process the drive signal and effect printing of the photographic image on the print media, and provided as an integrated portion of the photofinishing system, b) means for effecting controlled chemical development and subsequent printing of exposed photographic film.

Abstract: An apparatus for manufacturing a liquid crystal display device includes a unitary vacuum processing chamber, upper and lower stages confronting each other at upper and lower spaces inside the vacuum processing chamber to bond a first and second substrates, and a first substrate lifting system formed in the lower stage for lifting the second substrate.

Abstract: A photolithographic machine is described for transferring fine patterns from a photomask to a flexible roll-to-roll format. It is capable of printing multiple layers in exact registry onto a distorted format. It contains 1 to 1 reflective optics, dynamic distortion and magnification correction. The optical transfer assembly scans reciprocally across the format and back and the photomask/platen assembly moves incrementally forward between scans to complete a raster pattern. Both the object and image fields are autofocussed. The optical transfer assembly is retained into a straight-line scanning path by opposed air bearings retained on a straight guide. The photomask/platen assembly is retained into an orthogonal path by air/vacuum bearings operating on a vertical stone face. Together this arrangement substantially prevents yaw scanning errors. The web is fed through the machine from roll to roll without twisting. It remains stationary during each recording pass.

Abstract: In a scanning exposure apparatus and method, first and second interferometers of an interferometer system monitor first and second stages of a stage system, one of which holds a mask and the other of which holds a substrate. The first stage is moved at a first scanning speed during scanning exposure, and the second stage is moved at a second scanning speed during the scanning exposure, the speeds differing in accordance with a projecting magnification of a projection unit. The first stage is moved in accordance with a deviation, obtained by using the interferometer system, between the first stage and the second stage in a direction other than the scanning direction during the scanning exposure.

Abstract: For dividing an image and recording divided images on a photosensitive film with a plurality of laser beams, an auxiliary scanning speed is reduced in the vicinity of junctions between adjacent ones of the divided images to adjust the intervals between main scanning lines, and each of the main scanning lines is divided into divided main scanning lines in a main scanning direction, and the divided main scanning lines are formed separately in an auxiliary scanning direction. With such a correcting process, a high-quality image free of striped artifacts and inclination differences of main scanning lines can be recorded on the photosensitive film.

Abstract: A multi-image reticle used to form integrated circuitry comprises a two dimensional array of spaced images arranged in a matrix of controllably spaced rows and columns of images on a single reticle. No rotation of the reticle is required to expose various levels of circuitry on a semiconductor wafer. The wafer is held in a stepper device, which controllably positions the wafer under the desired image of the mask for exposure of a resist on the wafer. A movable aperture controls exposure through a selected image or mask pattern on the reticle. By controlling which image is used, and accurately positioning the wafer via the stepper, multiple images are accurately registered, leading to improvement in dimensions of circuitry and other structures formed on the wafer.

Abstract: A method for inspecting features on a reticle is provided. The method includes providing a layout design of a test feature and transferring the layout design of the test feature onto the reticle. After the test feature is transferred onto the reticle, an image of the transferred layout design is captured to determine whether or not the transfer is acceptable. This determination is made by comparing the captured image of the transferred layout design against the layout design of the test feature. The comparison ascertains deviations between the captured image and the layout design and determines if the deviations fall within a user specified range.

Abstract: High resolution gray scale graphical images are formed in a semiconductor substrate by the use of two or more levels of indicia having a plurality of image segments and having a continuous conductive line formed in the surface of the substrate, each image segment includes a portion of said continuous conductive line and a contrasting material providing pixels in which the width of the line within a segment varies in relationship to gray scale levels in the graphic image to be formed. Providing a graphic image to be converted; converting the graphic image to a gray level, two dimensional bit mapped converting the bit mapped image into a set of parallel lines of varying width; each line comprising a single continuous segment in which the width varies based on the density of the gray level required to form the gray level image; and transferring the set of lines to a pattern of conductor/insulator lines on a substrate.

Abstract: The invention consists in a process which contemplates:

Abstract: A control system adjusts the exposure of a wafer according to the transfer error of a pattern line width caused when a certain integrated exposure over the whole shot areas is made a desired value when a pattern is transferred to a wafer and according to information corresponding to the desired value of the integrated exposure stored in a storage device, then performing scanning exposure. As a result, influences such as of fog exposure due to flare are mitigated, and the uniformity of line width distribution with high precision is ensure over the shot regions on the wafer, achieving pattern transfer to each shot region.

Abstract: A standard color image and at least one processed image are printed on a single sheet of photosensitive material. The standard color image is obtained by carrying out standard image processing on a single original color image. The processed image is obtained by carrying out image processing under different processing conditions on the original color image. The different processing conditions may be the processing conditions for altering an image tone, image sharpness, image gradation, image trimming, an image size enlargement scale factor, or a combination of at least two of them. Various prints, which are obtained from image processings carried out by setting the processing conditions to various different processing conditions, can thus be seen easily.

Abstract: Lens distortion correction is characterized by obtaining a correction parameter by using the difference between the latest QC data used when exposing a overlaying layer and the latest QC data used when exposing a overlaid layer.

Abstract: An image processing apparatus which outputs an index print of information representing a plurality of pictures having picture size of different aspect ratios, with each of the plurality of pictures being respectively assigned a number in numerical order. The image processing apparatus detects size information for each of the plurality of pictures based on the respective aspect ratios, and a picture output order different from the numerical order is determined based on the detected size information for each of the plurality of pictures.

Abstract: An exposure apparatus is arranged to project one unit of a circuit pattern onto the surface of a resist on a substrate to be manufactured and to expose it over the surface of this resist. The exposure apparatus includes a processing unit that enables forming a high-resolution circuit pattern image on the substrate by the use of an image display which is able to ensure a wide display region without deteriorating the resolution, and that when dividing the one unit of circuit pattern into a plurality of regions in order to ensure an inexpensive, reliable exposure operation, divides it so that adjacent ones of the divided regions may partly overlap each other. An exposure device includes a plurality of optical systems each of that projects one of a plurality of the divided regions onto the surface of the resist on the substrate.

Abstract: An illumination optical apparatus and method forms a plurality of illumination regions on a first object, and positional relationships between the plurality of illumination regions can be adjusted. An exposure apparatus that includes the illumination optical apparatus can, while moving the first object and a second object in a certain moving direction, effect projection exposure of an image of the first object onto the second object. The plurality of illumination regions can have polygon shapes. A field stop used in the illumination optical apparatus can have an aperture portion with first and second regions, the second region corresponding to an overlap region on the first object, wherein a transmittancy of the second region is smaller than a transmittancy of the first region.

Abstract: A multi-image reticle used to form integrated circuitry comprises a two dimensional array of spaced images arranged in a matrix of controllably spaced rows and columns of images on a single reticle. No rotation of the reticle is required to expose various levels of circuitry on a semiconductor wafer. The wafer is held in a stepper device, which controllably positions the wafer under the desired image of the mask for exposure of a resist on the wafer. A movable aperture controls exposure through a selected image or mask pattern on the reticle. By controlling which image is used, and accurately positioning the wafer via the stepper, multiple images are accurately registered, leading to improvement in dimensions of circuitry and other structures formed on the wafer.

Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).

Abstract: A method and apparatus for forming an image that is larger than the photoprinting plate by on-the-go formation of web alignment holes in a resist covered web and using the on-the-go web alignment holes to position the photoprinting plates so that a sequence of images can be formed from a single photoprinting plate with the sequence of images laterally positioned so that the images are in lateral registration so that the sequential formed images can appear as a single continuous image.

Abstract: A thermal printer includes a thermal head, which records an image to a recording material. Feeder rollers feed the recording material relative to the thermal head. An EEPROM stores first distance data adapted to image recording to a predetermined first type of the recording material. A keyboard inputs second distance data representing a second type of the recording material at a time of image recording to the second type. A personal computer causes the feeder rollers to set the first and second types to the thermal head according to respectively the first and second distance data, and drives the thermal head and feeder rollers in synchronism. The image is recorded in first and second printing regions suitable to respectively the first and second types.

Abstract: A film scanner for scanning an image formed on a film, is provided with a line sensor unit that scans the image in a main scanning direction, and a table supporting the film. The table is slidable in an auxiliary scanning direction. A geared transmission is provided to receives the driving force of a driving source and outputs, to a table driving mechanism, one of a first and a second driving force. The first driving force is a force with which the table driving mechanism drives the table in a forward direction at a first speed, and the second driving force is a force with which the table driving mechanism drives the table in a reverse direction at a second speed that is different from the first speed.

Abstract: A projection exposure apparatus exposes a substrate by projecting images of patterns formed on a plurality of masks onto the substrate through a projection system sequentially. At least one part of a first mask-driving system is disposed on one side of the projection system, and moves a first mask in a predetermined plane. A second mask-driving system moves a second mask independently from the first mask, in a plane which is the same as or parallel to that for the first mask. At least one part of the second mask-driving system is disposed on the one side of the projection system. A control system is associated with the first and second mask-driving systems, and controls the first and second mask-driving systems respectively in order to project an image of a pattern formed on the first mask and an image of a pattern formed on the second mask onto the substrate sequentially.

Abstract: In one example embodiment, a method of forming a pattern in a photoresist material includes illuminating a portion of the photoresist material according to the pattern and positioning a filter in a path of the light. The filter includes a number of regions upon which a filtering material has been. The filtering material has a variable characteristic that is independently adjustable for each region to enhance the uniformity of the intensity of the light. Such characteristics include the thickness of the filtering material, the size of the portion of the region that is covered by the filtering material, or a voltage, current, electric field, or magnetic field applied to the filtering material of each region.

Abstract: Conventional optical lithography has a lower limit of about 180 nm because the projection system is opaque to radiation of wavelength shorter than this. This limitation has been overcome by using, in a standard photoreduction system, light in the form of a train of short duration high intensity pulses. Because of two-photon interactions, light having half the wavelength of the illuminating radiation is then generated in the focal plane. There are thus two aerial images present while the photoresist is being exposed. One is the conventional long wavelength image and its associated CD while the other is the short wavelength image with its smaller CD. Since the resist is sensitive to only the shorter wavelength, only the lower CD image remains after development.

Abstract: In an exposure method, using a first exposure apparatus including a reticle having an exposure pattern, a first pattern is formed on a resist film on a semiconductor substrate. Using a second exposure apparatus including a reticle having an exposure pattern identical with the aforementioned reticle, a second pattern is formed on the resist film having the first pattern. Based on error information between patterns obtained from the first and second patterns, non-linear error of the first exposure apparatus with respect to the non-linear error of the second exposure apparatus is calculated. Based on the information obtained by the correction data calculating step, the non-linear error of the second exposure apparatus is made equal to the non-linear error of the first exposure apparatus.

Abstract: For the manufacture of large format photographic prints, the original image (V) is divided into a matrix arrangement of partial image originals (A.sub.1 -D.sub.4) consisting of lines (1-4) and columns (A-D) with lateral edges (R) which are parallel to the columns of the matrix arrangement. A linear arrangement of sequential latent partial pictures is produced from the individual partial image originals by way of a printer and by sequential projection, whereby the projection is carried out in such a way that the lateral edges (R) of the latent partial pictures which correspond to the lateral edges of the latent partial image originals extend parallel to the longitudinal direction (L) of the linear arrangement of the latent partial pictures. The exposed copy material (P) is developed in a pass-through developing arrangement, whereby a partial image copy is produced from each partial image original and the partial image copies are assembled to a complete compound picture (K).

Abstract: For the production of a photographic print of an original present in electronic format, optical representations (D) are produced from sequentially changing strip-shaped portions of the original by way of an electro optical, pixel wise operating converter device (3) and these optical representations (D) are projected onto a strip-shaped exposure region (E) on the copy material (P), whereby the strip-shaped exposure region (E) and the copy material (P) are moved relative to one another and at an essentially constant speed in a direction transverse to the longitudinal extent of the strip-shaped exposure regions (E), so that successively the image information of the whole original is exposed onto the total available surface of the copy material (P).

Abstract: An illumination optical apparatus (8) includes a light source (10) and light conducting system (L) that conducts a light beam (14) from the light source to an object (M) such as a mask having a pattern, to be irradiated. A light-attenuating member (18) or other light-intensity controlling member, such as filter, for controlling the intensity of the light beam is arranged in the optical path between the light source and light conducting system. Also disclosed is a method for manufacturing semiconductor devices using the abovementioned illumination optical apparatus.

Abstract: A printing system for printing an image of a photographic film having an identification code onto a photosensitive material comprises a first reading device for reading the identification code; a second reading device for reading image information on the photographic film; a first inputting device for inputting a first correction data for the image information read by the second reading device; a second inputting device for inputting a second correction data for the image information read by the second reading device; a third reading device for reading the identification code from the photographic film; a printing device for printing the image of the photographic film onto the photosensitive material; and a control device for controlling the printing device on the basis of the correction data corresponding to the identification code read by the third reading device.

Abstract: A film drive mechanism for varying the size and configuration of an aperture in a riser block of a photographic printer. The aperture is defined by a plurality of plates positioned in surrounding relation to the aperture and having tongue and groove edges slidably abutting tongue and groove edges of adjacent plates. A stepper motor is provided in association with each plate to individually power the plate in an X or Y direction with the plate being free to move in its unpowered direction. The size and configuration of the aperture is adjusted by individual adjustment of the plates utilizing the individual stepper motors with the individual movement of each plate constituting powered movement in a first direction accompanied by unpowered yielding movement of an adjacent plate against which the powered plate pushes.

Abstract: An image frame selecting device for a photographic printer comprises an image processing device for reading an image frame of a negative film and for multiple image frames in a multi-frame illustrative pattern on a monitor; an illustrative pattern switching device for changing the multi-frame illustrative patterns; a plurality of selection keys disposed corresponding to the arrangement of each image frame in the multi-frame illustrative pattern; and a selection key control device for assigning the selecting function of the image frames displayed on the monitor to only the keys whose positions correspond respectively to those of image frames in the multi-frame illustrative pattern selected by the illustrative pattern switching device.

Abstract: A system for creating an index print, generated from a negative strip having one or more frame images, independent of sequentially scanning each frame on the negative strip, the system includes a scanner for substantially simultaneously creating a composite digital image of the negative strip from the negative placed on the scanner independent of the position or orientation of the negative on the scanner. An image locator operatively connected to the scanner for locating each digital representation in the composite digital image of the individual frame images on the negative strip. A printer operatively connected to the locator for printing the index print from a signal from the locator.

Abstract: A photosensitive material processing method in which a sheet-formed photosensitive material, which has been cut to predetermined sizes, is conveyed to an exposure stage and processed, wherein: the exposure stage has a function of exposing simultaneously a plurality of sheet-formed photosensitive materials, and at the upstream of the exposure stage, the photosensitive materials are sorted and conveyed so as to be able to be exposed simultaneously. Therefore, in a case in which there is a plurality of exposure stages, the photosensitive materials are not prepared in advance on the conveying paths along the exposure stages, and the sheet-formed photosensitive materials, which are selectively conveyed from one direction, are sorted, if necessary.

Abstract: A unit image area is specified, and unit image data representing a unit image in the unit image area is prepared. A plurality of the unit image areas are laid out on an image plane in a multi-composing manner, whereby layout information representing the multi-composing layout of the unit image areas is created. Mask data representing a plurality of multi-composed unit image areas are then prepared, based on the unit image area data and the layout information. Generated subsequently is an image recording signal representing unit images to be respectively drawn in the plurality of unit image areas, which are expressed by the mask data, on the image plane. Multi-duplicated images are eventually recorded on a photosensitive material according to the image recording signal without using a photocomposer.

Abstract: A photographic print processing apparatus, comprises (a) a first exposing section to expose an image of a photographic film onto an unexposed photographic paper; (b) a development processing section to develop the exposed photographic paper; (c) a first conveying passage to convey the exposed photographic paper from the first exposing section to the development processing section; (d) a second conveying passage branched from the first conveying passage and joined with the first conveying passage; (e) a second exposing section, provided on the second conveying passage, to expose an image onto a photographic paper; and (f) a control section to control the first passage and the second passage so as to convey the photographic paper.

Abstract: The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction.