Detailed Holder For Photosensitive Paper Patents (Class 355/72)
  • Patent number: 11339008
    Abstract: A transport system includes a transport vehicle that transports an article, and a transport controller that controls the transport vehicle based on a host transport instruction received from a host controller.
    Type: Grant
    Filed: February 4, 2019
    Date of Patent: May 24, 2022
    Assignee: MURATA MACHINERY, LTD.
    Inventor: Masayuki Takahara
  • Patent number: 11333986
    Abstract: A detection apparatus detects an orientation reference of an object to be detected which includes an edge including the orientation reference. The apparatus includes a first detection system configured to detect the edge such that the orientation reference is detected, and a second detection system configured to detect, by projecting a pattern to a surface of the object and detecting an image formed by reflected light from the surface, a position of the surface in a direction perpendicular to the surface. After a focusing operation of the first detection system is performed based on the position of the surface detected by the second detection system, the first detection system detects the orientation reference.
    Type: Grant
    Filed: March 8, 2021
    Date of Patent: May 17, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Kazuki Ota, Hironori Maeda
  • Patent number: 11322358
    Abstract: Disclosed is a method of laser irradiation of a patterned semiconductor device including a periodic array of sub-wavelength fin-like structures, all fin-like structures upstanding from a base face of the semiconductor device and defining an upper face of the periodic array opposite the base face, each fin-like structure having: a width along a first direction parallel to the base face of the order of magnitude or smaller than the laser wavelength; a length along a second direction parallel to the base face and perpendicular to the first direction at least 3 times greater than the width; and a height along a third direction perpendicular to the base face. The method includes: generating a UV pulsed laser beam using a laser module; and irradiating at least a portion of the upper face with the laser beam.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: May 3, 2022
    Assignee: LASER SYSTEMS & SOLUTIONS OF EUROPE
    Inventors: Karim Huet, Fulvio Mazzamuto, Cyril Dutems
  • Patent number: 11302551
    Abstract: A conveyance apparatus comprises a first movable device to move while holding an object, a second movable device to move while holding the object and transfer the object to the first movable device, and a controller to control the first and second movable devices. The second movable device includes a guide member and a hand arranged so as to be capable of reciprocally moving along the guide member while holding the object. The controller estimates, based on a driving history of the second movable device, a thermal deformation amount of the guide member corresponding to the reciprocal movement of the hand along the guide member, and corrects, based on the estimated thermal deformation amount, a drive command value used to move the first movable device to a position to receive the object from the second movable device.
    Type: Grant
    Filed: December 12, 2019
    Date of Patent: April 12, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Yuichiro Morikuni
  • Patent number: 11275312
    Abstract: The present application relates to contact immersion lithography systems and methods of their use. An example immersion lithography system includes a photomask substrate and at least one sensor disposed along a surface of the photomask substrate. The immersion lithography system also includes a controller having at least one processor and a memory. The at least one processor is configured to execute program instructions stored in the memory so as to carry out operations. The operations include receiving, from the at least one sensor, information indicative of an electric field proximate to the at least one sensor. The operations also include determining, based on the received information, at least one of: a thickness of a liquid layer adjacent to the photomask substrate or a distance to a further substrate adjacent to the photomask substrate.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: March 15, 2022
    Assignee: Waymo LLC
    Inventors: James Dunphy, Hongqin Shi, David Hutchison, Yeh-Jiun Tung, Eric Copenhaver, Nao Chuei
  • Patent number: 11231655
    Abstract: To provide a control apparatus, with which driving of a driving unit can be controlled with high accuracy with a simple configuration, the control apparatus (100) according to the present invention include: a plurality of current sources (20) each being configured to supply current based on a PWM method; a first detection unit configured to detect a driving state of a driving unit (14); and a control unit (50) configured to change values of a plurality of currents (Ixf, Ixb, Iyl, and Iyr) which are supplied from the plurality of current sources (20) based on a result of the detection by the first detection unit, and which are required to drive the driving unit (14), when a value of at least one of the plurality of currents (Ixf, Ixb, Iyl, and Iyr) is a predetermined value.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: January 25, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Takeshi Motegi
  • Patent number: 11232964
    Abstract: A pod opener includes an elevating mechanism elevating the cassette in a vertical direction, a first hook member engaging with an engagement means of the cassette and supporting the cassette, a second hook member supported by the first hook member, a forward and backward movement mechanism moving the first hook member and the second hook member forward and backward with respect to the cassette, an urging member urging the second hook member upward, and an atmosphere maintaining device maintaining an internal space having the cassette disposed therein in a predetermined atmosphere and the second hook member is displaceable with respect to the first hook member.
    Type: Grant
    Filed: April 8, 2020
    Date of Patent: January 25, 2022
    Assignee: RORZE CORPORATION
    Inventor: Katsunori Sakata
  • Patent number: 11231653
    Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.
    Type: Grant
    Filed: February 26, 2021
    Date of Patent: January 25, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Henricus Egidius Catharina Eummelen, Giovanni Luca Gattobigio, Johannes Cornelis Paulus Melman, Han Henricus Aldegonda Lempens, Miao Yu, Cornelius Maria Rops, Ruud Olieslagers, Artunç Ulucan, Theodorus Wilhelmus Polet, Patrick Johannes Wilhelmus Spruytenburg
  • Patent number: 11194119
    Abstract: An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W m?1 K?1. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm m?1 K?1.
    Type: Grant
    Filed: December 3, 2019
    Date of Patent: December 7, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Julian Kaller, Franz Sorg, Ralf Winter, Karl-Stefan Weissenrieder
  • Patent number: 11187991
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: November 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie Cloin, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaël Christiaan Van Der Wekken
  • Patent number: 11181832
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Grant
    Filed: September 3, 2020
    Date of Patent: November 23, 2021
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 11169450
    Abstract: The invention provides a pneumatic support device for a lithographic apparatus and a lithographic apparatus with such support device. The support device comprises a gas spring. The gas spring comprises a suspending part, a suspended part, and a pressure chamber configured for supporting the suspended part relative to the suspending part. The support device further comprises an actuator configured for positioning the suspended part relative to the suspending part, an acceleration sensor configured for generating a first sensor signal representative for the acceleration of the suspending part, a pressure sensor configured for generating a second sensor signal representative for the pressure in the pressure chamber, and a control unit.
    Type: Grant
    Filed: March 18, 2019
    Date of Patent: November 9, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Joep Sander De Beer, Cornelius Adrianus Lambertus De Hoon, Jeroen Pieter Starreveld, Martinus Van Duijnhoven, Maurice Willem Jozef Etiënne Wijckmans
  • Patent number: 11112705
    Abstract: The invention relates to a motor (LD) comprising: a stationary part (STP), comprising: a row of coil assemblies (UCA,LCA), the coil assemblies having multiple phases, a movable part (MP), comprising: a row of permanent magnets (UPM,LPM), wherein the row of coil assemblies has a first length and the row of permanent magnets has a second length, wherein the second length is smaller than the first length, wherein the coil assemblies are arranged to interact with permanent magnets aligned with the coil assemblies to generate a driving force, a comparator to compare a position measurement signal representative for an actual position of the movable part with a set-point signal representative for a desired position of the movable part to provide an error signal; a motion feedback controller configured to provide a control signal on the basis of the error signal; at least one current amplifier configured to provide an actuation signal to the coil assemblies on the basis of the control signal, wherein the motor compri
    Type: Grant
    Filed: September 5, 2018
    Date of Patent: September 7, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Joost Johan Bolder, Peter Michel Silvester Maria Heijmans, Jeroen Van Duivenbode, Ruud Hubertus Silvester Vrenken
  • Patent number: 11086234
    Abstract: A substrate holder, a method of manufacturing of the substrate holder and a lithographic apparatus having the substrate holder. In one arrangement, a substrate holder is for use in a lithographic apparatus. The substrate holder is configured to support a lower surface of a substrate. The substrate holder has a main body, a plurality of burls and a coating. The main body has a substrate-facing face. The plurality of burls protrudes from the substrate-facing face. Each burl has a distal end configured to engage with the substrate. The distal ends are configured for supporting the substrate. The coating is on the substrate-facing face between the burls. Between the burls the substrate-facing face has an arrangement of areas. Adjacent areas are separated by a step-change in distance below the support plane. Each step-change is greater than a thickness of the coating.
    Type: Grant
    Filed: October 11, 2018
    Date of Patent: August 10, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Thomas Poiesz, Satish Achanta, Jeroen Bouwknegt, Abraham Alexander Soethoudt
  • Patent number: 11048176
    Abstract: The present invention provides a substrate processing apparatus that processes a substrate, the apparatus including a stage configured to hold and move the substrate, a conveying unit configured to hold and convey the substrate between conveying unit and the stage, an accumulation unit configured to accumulate control information concerning the stage and the conveying unit which is generated by processing the substrate, and a determination unit configured to determine a conveying procedure when conveying the substrate between the stage and the conveying unit by selecting one of a plurality of conveying procedures which can be set for the stage and the conveying unit based on control information accumulated in the accumulation unit.
    Type: Grant
    Filed: March 9, 2020
    Date of Patent: June 29, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Mitsuhide Nishimura, Kenichi Kamino, Kashu Matsumoto
  • Patent number: 11022903
    Abstract: A method for temperature control of a component that is transferable between a first system and a second system includes: ascertaining a temperature drift of a temperature of the component that is to be expected after transfer of the component from the first system into the second system; and modifying a temperature prevailing in the first system and/or a temperature prevailing in the second system such that the temperature drift that is actually occurring after transfer of the component from the first system into the second system is reduced with respect to the expected temperature drift.
    Type: Grant
    Filed: April 6, 2020
    Date of Patent: June 1, 2021
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Joeri Lof, Harmen Krediet, Timo Laufer
  • Patent number: 10962891
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: December 9, 2019
    Date of Patent: March 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
  • Patent number: 10947070
    Abstract: A sheet feeding adapter includes a base plate which is placed on an upper surface of a sheet bundle set in a sheet feeding cassette and having a predetermined size and movable in a sheet feeding direction through guidance of a pair of first regulating plates, a sheet bundle having a small width size being set on an upper surface of the base plate, and a pair of second regulating plates that are upright from the upper surface of the base plate and regulate a position in a width direction of a sheet bundle set on the upper surface of the base plate and having a small width size, wherein the base plate is movable between a sheet feeding position, at which the sheet bundle having the small width size can be fed, and a withdrawing position positioned at a rear side from the sheet feeding position.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: March 16, 2021
    Assignee: KYOCERA Document Solutions Inc.
    Inventor: Masami Mashiki
  • Patent number: 10941011
    Abstract: An exposure machine includes a base portion, a port portion, and a conveying structure. The base portion includes a work table and a bearing frame. The bearing frame is disposed on the work table and is configured to carry a tray. The port portion is configured to serve as a feed port and a discharge port of the exposure machine. The conveying structure includes at least one upper arm, at least one lower arm, and a movable tray guide. The movable tray guide is connected to the base portion and the port portion. The at least one lower arm is provided with a hook configured to hook the tray and move the tray to the port portion.
    Type: Grant
    Filed: April 15, 2019
    Date of Patent: March 9, 2021
    Inventor: Wei Wang
  • Patent number: 10928743
    Abstract: Embodiments herein beneficially enable simultaneous processing of a plurality of substrates in a digital direct write lithography processing system. In one embodiment a method of processing a plurality of substrate includes positioning a plurality of substrates on a substrate carrier of a processing system, positioning the substrate carrier under the plurality of optical modules, independently leveling each of the plurality of substrates, determining offset information for each of the plurality of substrates, generating patterning instructions based on the offset information for each of the plurality of substrates, and patterning each of the plurality of substrates using the plurality of optical modules. The processing system comprises a base, a motion stage disposed on the base, the substrate carrier disposed on the motion stage, a bridge disposed above a surface of the base and separated therefrom, and a plurality of optical modules disposed on the bridge.
    Type: Grant
    Filed: March 19, 2019
    Date of Patent: February 23, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Chien-Hua Lai, Chia-Hung Kao, Hsiu-Jen Wang, Shih-Hao Kuo, Yi-Sheng Liu, Shih-Hsien Lee, Ching-Chang Chen, Tsu-Hui Yang
  • Patent number: 10908510
    Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: February 2, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
  • Patent number: 10895808
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: January 19, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Günes Nakiboglu, Coen Hubertus Matheus Baltis, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver, Bert Dirk Scholten, Daan Daniel Johannes Antonius Van Sommeren, Mark Johannes Hermanus Frencken
  • Patent number: 10859919
    Abstract: A fluid handling structure for a lithographic apparatus configured to contain immersion fluid to a region, the fluid handling structure having, at a boundary of a space: at least one gas knife opening in a radially outward direction of the space; and at least one gas supply opening in the radially outward direction of the at least gas knife opening relative to the space. The gas knife opening and the gas supply opening both provide substantially pure CO2 gas so as to provide a substantially pure CO2 gas environment adjacent to, and radially outward of, the space.
    Type: Grant
    Filed: January 31, 2020
    Date of Patent: December 8, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Cornelius Maria Rops, Walter Theodorus Matheus Stals, David Bessems, Giovanni Luca Gattobigio, Victor Manuel Blanco Carballo, Erik Henricus Egidius Catharina Eummelen, Ronald Van Der Ham, Frederik Antonius Van Der Zanden, Wilhelmus Antonius Wernaart
  • Patent number: 10851833
    Abstract: Disclosed is an LM guide assembling method using half division, and a computer readable recording medium having a program for executing the same. The method includes: disposing an LM rail on a base; fastening a first hole and a (2n+1)-th hole; installing an angle measuring device; fastening a (2n-1+1)-th hole at step S130; respectively disposing the LM blocks on the first hole and the (2n-1+1)-th hole; disposing the auxiliary shelf on the LM blocks; setting an angle of the auxiliary shelf to a zero angle; moving the two LM blocks to be on a (2n-1+1)-th hole and a (2n+1)-th hole, and measuring an angle of the auxiliary shelf; calculating a straightness correction amount; and moving a position of the (2n-1+1)-th hole by the straightness correction amount, and fastening the hole, wherein, the steps are repeated until n becomes 1.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: December 1, 2020
    Inventor: Gisu Kim
  • Patent number: 10845720
    Abstract: A mark detection apparatus is configured to detect a mark formed in a mark area of an object and has: a first optical system configured to emit a first measurement light to the mark area; a second optical system configured to irradiate the mark area with at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the first optical system; and a light receiver that configured to optically receive at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the second optical system.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: November 24, 2020
    Assignee: NIKON CORPORATION
    Inventors: Shigeki Egami, Yoshifumi Nakakoji
  • Patent number: 10842447
    Abstract: The present disclosure relates to a PET detector module suitable for using in a PET/MR hybrid system. The PET detector module comprises a scintillator, a set of frontend electronics and a positioning means configured to securing relative position between the scintillator and the frontend electronics. The PET detector module may further comprise a temperature control system, such as an air-cooling system or a heat exchange plate. The present disclosure also relates to a heat exchange plate, which comprises a fluidic passage for containing a flow of a heat exchange media. The heat exchange plate is suitable for use in the magnetic field environment of a MRI system.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: November 24, 2020
    Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Weiping Liu, Yixing Sun, Lingzhi Hu
  • Patent number: 10788755
    Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: September 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
  • Patent number: 10788760
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: September 29, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10775702
    Abstract: Disclosed is a lithography process on a sample with at least one emitter, the process including: putting at least one layer of resist above the sample; exciting one selected emitter with light through the at least one layer of resist; detecting light emitted by the excited selected emitter and determining a position of the selected emitter; and curing with a light beam a part of the at least one layer of resist above the position of the selected emitter, the light beam being a shaped light beam having a cross-section, this cross-section having a central part, an intermediate part surrounding the central part and a border part surrounding the intermediate part, the intensity of the shaped light beam on the at least one layer of resist reaching a maximum at the intermediate part.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: September 15, 2020
    Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, SORBONNE UNIVERSITE, UNIVERSITE DE PARIS
    Inventors: Agnès Maitre, Amit Raj Dhawan, Pascale Senellart, Cherif Belacel
  • Patent number: 10770330
    Abstract: An electrostatic chuck with a generally non-arcuate top surface shaped protrusions that has edge surfaces similar to a portion of a ellipse. The structure of the protrusions leads to the reduction of particulate material generated by interaction between the supported substrate and chuck. Reduced levels of scratching, abrasion, wear and particulate generation are achieved by improved smoothing and flattening of the protrusion surface.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: September 8, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: John Michael Glasko, I-Kuan Lin, Carlo Waldfried
  • Patent number: 10771750
    Abstract: A projector including a projection section that projects image light, a power supply section that supplies the projection section with electric power, a first enclosure that accommodates the projection section, and a second enclosure that accommodates the power supply section, wherein the second enclosure is fixed to a ceiling joist receiver that serves as a support member that supports a ceiling plate that partitions a space into a living room space and a space behind a ceiling, and the first enclosure and the second enclosure are configured to be separate from each other.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: September 8, 2020
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Tadashi Kinebuchi
  • Patent number: 10747126
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: August 18, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • Patent number: 10725309
    Abstract: A microscope system includes a microscope body, an XY stage mounted on the microscope body and including a stage configured to place a slide as an observation target and move in an X-axis direction and a Y-axis direction perpendicular to each other, and an XY two-dimensional scale plate fixed to the stage. The XY two-dimensional scale plate is provided with a first mark that provides axis information in the X-axis direction throughout a movable range of the stage in the Y-axis direction and a second mark that provides axis information in the Y-axis direction throughout a movable range of the stage in the X-axis direction, which are used to recognize X- and Y-coordinates of the stage.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: July 28, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Michiie Sakamoto, Akinori Hashiguchi, Shinobu Masuda, Tsuguhide Sakata, Masahide Hasegawa, Masahiro Ando, Osamu Nagatsuka
  • Patent number: 10725389
    Abstract: In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: July 28, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10670976
    Abstract: An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.
    Type: Grant
    Filed: January 25, 2018
    Date of Patent: June 2, 2020
    Assignee: GUDENG PRECISION INDUSTRIAL CO., LTD
    Inventors: Hsin-Min Hsueh, Chia-Ho Chuang, Cheng-Ju Lee, Jeng-Jie Huang
  • Patent number: 10636693
    Abstract: Throughput is improved in a substrate transfer device including a substrate transport robot having a substrate holding hand, and an aligner. A method of controlling a substrate transfer device includes moving a substrate holding hand holding a substrate to a predetermined ready position defined around an aligner, moving the substrate holding hand to a predetermined placement position defined by the aligner to transfer the substrate to a turntable of the aligner, causing the aligner to align the substrate while causing the substrate holding hand to wait at a predetermined waiting position defined at a position closer to the placement position than the ready position is, moving the substrate holding hand to the placement position to transfer the substrate from the aligner to the substrate holding hand, and moving the substrate holding hand holding the substrate to the ready position.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: April 28, 2020
    Assignees: KAWASAKI JUKOGYO KABUSHIKI KAISHA, KAWASAKI ROBOTICS (USA), INC.
    Inventors: Tetsuya Yoshida, Avish Ashok Bharwani, Ming Zeng
  • Patent number: 10599054
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: March 24, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Patent number: 10586728
    Abstract: In a carrier system, a chuck unit is used to hold a placed wafer from above, and vertical-motion pins use suction to hold the wafer from below. Then, the chuck unit and the vertical-motion pins are subsequently lowered until a bottom surface of the wafer comes into contact with a wafer table. During the lowering, the holding force exerted by the chuck unit and the arrangement of chuck members are optimally adjusted such that, as a result of the restraint of the wafer by the chuck unit and the vertical-motion pins, localized surplus-restraint is imparted to the wafer, and warping does not occur.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: March 10, 2020
    Assignee: NIKON CORPORATION
    Inventors: Go Ichinose, Taisuke Ibe
  • Patent number: 10580680
    Abstract: A method for selectively coating the tops of pins of a pin chuck with a high thermal stability material, such as diamond-like carbon (DLC). Non-pin areas (“valleys”) of the pin chuck support surface are temporarily covered with glass frit or glass beads during the DLC coating operation. After coating, the glass frit/beads masking material may be removed, leaving the DLC material selectively coating the pin tops. The selective DLC coating avoids the cracking or warping problems due to CTE mismatch when DLC is coated over the entire pin chuck support surface, as the pin chuck material typically is very different from DLC.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: March 3, 2020
    Inventors: Edward Gratrix, William Spitzmacher, David Casale, Derek Rollins, Robert E. Klinger
  • Patent number: 10548566
    Abstract: The system includes a stand surrounding a working area, a signal detector receiving a signal generated by the wire, and a positioning module disposed on the stand. The positioning module is configured to drive the signal detector moving forward and backward on a two-dimensional plane in the working area. The system also includes a computer system electrically connected to the signal detector and the positioning module. The compute system receives the signal from the signal detector, generates position information according to the signal, and transmits the position information to the positioning module, such that the positioning module moves the signal detector to a position corresponding to a position of the wire in the blood vessel according to the position information.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: February 4, 2020
    Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE
    Inventors: Ming-Hui Chen, Ming-Hui Cheng, Tzyy-Ker Sue
  • Patent number: 10551753
    Abstract: An imprint device that forms a pattern by having the imprint material on a substrate and a mold come in contact with each other, the imprint device including a substrate holding unit that holds the substrate with a suction unit including partial areas, a moving unit including the substrate holding unit, a mold release being performed while a suction force of a partial area corresponding to an area in which the pattern is formed is set weaker than a suction force of other partial areas, an acquisition unit acquiring measurement data indicating a positional relationship between the substrate and the substrate holding unit, a target of the measurement data including an end portion of the substrate and the substrate holding unit, and a processor unit obtaining a correction amount to correct a positional deviation of the substrate with respect to the substrate holding unit using the acquired measurement data.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: February 4, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventor: Takashi Hosaka
  • Patent number: 10535548
    Abstract: A substrate holding apparatus that holds a substrate is provided. The apparatus comprises a rotary shaft which rotates about a vertical axis and includes a suction path leading from an upper end of the rotary shaft, and a holding unit which includes a suction hole formed in a rotation center, is fixed at the upper end of the rotary shaft such that the suction hole communicates with the suction path, and holds the substrate by sucking the substrate, wherein a plurality of vent holes for introducing an external gas into a space between the holding unit and the substrate are formed at positions rotationally symmetric with respect to the rotation center of the holding unit with an angle to face a back surface of the substrate placed on the holding unit.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: January 14, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Osamu Yasunobe
  • Patent number: 10514609
    Abstract: A lithographic apparatus (10) and method for preventing exposure of a peripheral portion (P) of a substrate (S). An edge mask (M) has a radial concave edge (E) that extends over less than half a circle arch. The edge mask (M) is connected to a mask carrier (4) that circumnavigates the projection system (2) to adjust a tangential coordinate (?) and a radial coordinate (R) of the edge mask (M) with respect to the optical axis (A) of the projection system (2) for inserting the edge mask (M) at a variable distance into the beam of radiation (B). The tangential and radial positions (?,R) of the edge mask (M) are coordinated with a changing position (X,Y) of the substrate (S) to prevent exposure of the peripheral portion (P) of the substrate (S) during exposure of the target region (T).
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: December 24, 2019
    Assignee: KULICKE & SOFFA LITEQ B.V.
    Inventor: Adrianus Johannes Petrus Maria Vermeer
  • Patent number: 10509335
    Abstract: A conveying apparatus for conveying a holding portion that includes a holding surface where the holding portion holds a substrate, the conveying apparatus including a conveying portion configured to convey the holding portion, and a cover member that covers a first surface on an opposite side of the holding surface of the holding portion, and an attaching and detaching portion configured to attach and detach the holding portion to and from the cover member, wherein the cover member comprises a first removing member configured to remove a foreign substance attached to the first surface, wherein the cover member is configured to be fixed to the holding portion while the first surface and the first removing member are in contact with each other, wherein the conveying portion conveys the holding portion and the cover member to a movable moving unit configured to hold the holding portion while having the first surface and the first removing member of the cover member be in contact with each other, wherein the conv
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: December 17, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazunori Nakajima, Shigeo Koya
  • Patent number: 10503084
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: December 10, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
  • Patent number: 10481507
    Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: November 19, 2019
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kevin J. Violette, Igor Matheus Petronella Aarts, Haico Victor Kok, Eric Brian Catey
  • Patent number: 10459393
    Abstract: Disclosed herein is an image forming apparatus having a structure improved such that a user easily opens and closes a printing media cassette. The image forming apparatus includes an apparatus body, a printing media cassette to receive printing media, the printing media cassette being movably coupled to the apparatus body, a first lever provided at the printing media cassette, a second lever provided in the apparatus body, the second lever being coupled to the first lever, turning, and being separated from the first lever when the printing media cassette is closed.
    Type: Grant
    Filed: January 15, 2015
    Date of Patent: October 29, 2019
    Assignee: HP PRINTING KOREA CO., LTD.
    Inventors: Myung Sik Kwon, Yury Telegin, Young Goo Kang, Jung Hyeon Kim, Leonid Chechurin
  • Patent number: 10451981
    Abstract: A method of measuring wear of a substrate holder that is configured to hold a production substrate, the method includes: clamping a measurement substrate to the substrate holder; and measuring strain in the measurement substrate to generate a measurement result. The measurement substrate may have a body having dimensions similar to that of the production substrate; and a strain sensor in the body configured to measure strain in a peripheral portion of the measurement substrate.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Tiannan Guan, Jingshi Li, Miao Yu
  • Patent number: 10451980
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: April 18, 2017
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Patent number: 10438830
    Abstract: A semiconductor manufacturing apparatus includes an electrostatic chuck stage for configured to hold a wafer and supplying gas from a gas supply source to the wafer. The electrostatic chuck stage includes a first opening that supplies the gas to a first portion located at a first distance from the center of the wafer, and a second opening that supplies the gas to a second portion located at a second distance from the center of the wafer. The second distance being greater than the first distance. A first measurement instrument configured to measure a physical quantity of the gas between the gas supply source and the first opening, and a second measurement instrument configured to measure a physical quantity of the gas between the gas supply source and the second opening. An output device outputs information on the wafer based on the physical quantities measured by the first and second measurement instruments.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: October 8, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Mitsuyoshi Meguro, Takafumi Ochiai