Detailed Holder For Photosensitive Paper Patents (Class 355/72)
  • Patent number: 10851833
    Abstract: Disclosed is an LM guide assembling method using half division, and a computer readable recording medium having a program for executing the same. The method includes: disposing an LM rail on a base; fastening a first hole and a (2n+1)-th hole; installing an angle measuring device; fastening a (2n-1+1)-th hole at step S130; respectively disposing the LM blocks on the first hole and the (2n-1+1)-th hole; disposing the auxiliary shelf on the LM blocks; setting an angle of the auxiliary shelf to a zero angle; moving the two LM blocks to be on a (2n-1+1)-th hole and a (2n+1)-th hole, and measuring an angle of the auxiliary shelf; calculating a straightness correction amount; and moving a position of the (2n-1+1)-th hole by the straightness correction amount, and fastening the hole, wherein, the steps are repeated until n becomes 1.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: December 1, 2020
    Inventor: Gisu Kim
  • Patent number: 10845720
    Abstract: A mark detection apparatus is configured to detect a mark formed in a mark area of an object and has: a first optical system configured to emit a first measurement light to the mark area; a second optical system configured to irradiate the mark area with at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the first optical system; and a light receiver that configured to optically receive at least one part of a zeroth-order light and a diffracted light generated by an irradiation to the mark area from the second optical system.
    Type: Grant
    Filed: May 30, 2017
    Date of Patent: November 24, 2020
    Assignee: NIKON CORPORATION
    Inventors: Shigeki Egami, Yoshifumi Nakakoji
  • Patent number: 10842447
    Abstract: The present disclosure relates to a PET detector module suitable for using in a PET/MR hybrid system. The PET detector module comprises a scintillator, a set of frontend electronics and a positioning means configured to securing relative position between the scintillator and the frontend electronics. The PET detector module may further comprise a temperature control system, such as an air-cooling system or a heat exchange plate. The present disclosure also relates to a heat exchange plate, which comprises a fluidic passage for containing a flow of a heat exchange media. The heat exchange plate is suitable for use in the magnetic field environment of a MRI system.
    Type: Grant
    Filed: January 11, 2019
    Date of Patent: November 24, 2020
    Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Weiping Liu, Yixing Sun, Lingzhi Hu
  • Patent number: 10788760
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Grant
    Filed: June 24, 2019
    Date of Patent: September 29, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10788755
    Abstract: A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: September 29, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Helmar Van Santen
  • Patent number: 10775702
    Abstract: Disclosed is a lithography process on a sample with at least one emitter, the process including: putting at least one layer of resist above the sample; exciting one selected emitter with light through the at least one layer of resist; detecting light emitted by the excited selected emitter and determining a position of the selected emitter; and curing with a light beam a part of the at least one layer of resist above the position of the selected emitter, the light beam being a shaped light beam having a cross-section, this cross-section having a central part, an intermediate part surrounding the central part and a border part surrounding the intermediate part, the intensity of the shaped light beam on the at least one layer of resist reaching a maximum at the intermediate part.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: September 15, 2020
    Assignees: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE, SORBONNE UNIVERSITE, UNIVERSITE DE PARIS
    Inventors: Agnès Maitre, Amit Raj Dhawan, Pascale Senellart, Cherif Belacel
  • Patent number: 10770330
    Abstract: An electrostatic chuck with a generally non-arcuate top surface shaped protrusions that has edge surfaces similar to a portion of a ellipse. The structure of the protrusions leads to the reduction of particulate material generated by interaction between the supported substrate and chuck. Reduced levels of scratching, abrasion, wear and particulate generation are achieved by improved smoothing and flattening of the protrusion surface.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: September 8, 2020
    Assignee: ENTEGRIS, INC.
    Inventors: John Michael Glasko, I-Kuan Lin, Carlo Waldfried
  • Patent number: 10771750
    Abstract: A projector including a projection section that projects image light, a power supply section that supplies the projection section with electric power, a first enclosure that accommodates the projection section, and a second enclosure that accommodates the power supply section, wherein the second enclosure is fixed to a ceiling joist receiver that serves as a support member that supports a ceiling plate that partitions a space into a living room space and a space behind a ceiling, and the first enclosure and the second enclosure are configured to be separate from each other.
    Type: Grant
    Filed: March 7, 2017
    Date of Patent: September 8, 2020
    Assignee: SEIKO EPSON CORPORATION
    Inventor: Tadashi Kinebuchi
  • Patent number: 10747126
    Abstract: A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate.
    Type: Grant
    Filed: June 11, 2019
    Date of Patent: August 18, 2020
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis Kunnen, Martijn Houben, Thibault Simon Mathieu Laurent, Hendrikus Johannes Marinus Van Abeelen, Armand Rosa Jozef Dassen, Sander Catharina Reinier Derks
  • Patent number: 10725389
    Abstract: In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: July 28, 2020
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10725309
    Abstract: A microscope system includes a microscope body, an XY stage mounted on the microscope body and including a stage configured to place a slide as an observation target and move in an X-axis direction and a Y-axis direction perpendicular to each other, and an XY two-dimensional scale plate fixed to the stage. The XY two-dimensional scale plate is provided with a first mark that provides axis information in the X-axis direction throughout a movable range of the stage in the Y-axis direction and a second mark that provides axis information in the Y-axis direction throughout a movable range of the stage in the X-axis direction, which are used to recognize X- and Y-coordinates of the stage.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: July 28, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Michiie Sakamoto, Akinori Hashiguchi, Shinobu Masuda, Tsuguhide Sakata, Masahide Hasegawa, Masahiro Ando, Osamu Nagatsuka
  • Patent number: 10670976
    Abstract: An EUV reticle pod is provided. The pod includes an inner and an outer box assembly. The inner box assembly contained in the outer box assembly includes a base and a cover. The base has an upper surface and a surrounding wall. The upper surface includes a carry surface, at least one trench, and a first contacting surface. The EUV reticle is carried above the carry surface. The trench has a circular loop structure and its bottom is lower than the carry surface. The carry surface, the trench, and the first contacting surface are sequentially distributed from the center of the upper surface towards the surrounding wall. The cover has a concave for accommodating the EUV reticle and a second contacting surface for cooperating with the first contacting surface to form an air-tight seal. The trench captures and traps particles to reduce the particle contamination on the reticle.
    Type: Grant
    Filed: January 25, 2018
    Date of Patent: June 2, 2020
    Assignee: GUDENG PRECISION INDUSTRIAL CO., LTD
    Inventors: Hsin-Min Hsueh, Chia-Ho Chuang, Cheng-Ju Lee, Jeng-Jie Huang
  • Patent number: 10636693
    Abstract: Throughput is improved in a substrate transfer device including a substrate transport robot having a substrate holding hand, and an aligner. A method of controlling a substrate transfer device includes moving a substrate holding hand holding a substrate to a predetermined ready position defined around an aligner, moving the substrate holding hand to a predetermined placement position defined by the aligner to transfer the substrate to a turntable of the aligner, causing the aligner to align the substrate while causing the substrate holding hand to wait at a predetermined waiting position defined at a position closer to the placement position than the ready position is, moving the substrate holding hand to the placement position to transfer the substrate from the aligner to the substrate holding hand, and moving the substrate holding hand holding the substrate to the ready position.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: April 28, 2020
    Assignees: KAWASAKI JUKOGYO KABUSHIKI KAISHA, KAWASAKI ROBOTICS (USA), INC.
    Inventors: Tetsuya Yoshida, Avish Ashok Bharwani, Ming Zeng
  • Patent number: 10599054
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Grant
    Filed: June 12, 2019
    Date of Patent: March 24, 2020
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Patent number: 10586728
    Abstract: In a carrier system, a chuck unit is used to hold a placed wafer from above, and vertical-motion pins use suction to hold the wafer from below. Then, the chuck unit and the vertical-motion pins are subsequently lowered until a bottom surface of the wafer comes into contact with a wafer table. During the lowering, the holding force exerted by the chuck unit and the arrangement of chuck members are optimally adjusted such that, as a result of the restraint of the wafer by the chuck unit and the vertical-motion pins, localized surplus-restraint is imparted to the wafer, and warping does not occur.
    Type: Grant
    Filed: February 5, 2019
    Date of Patent: March 10, 2020
    Assignee: NIKON CORPORATION
    Inventors: Go Ichinose, Taisuke Ibe
  • Patent number: 10580680
    Abstract: A method for selectively coating the tops of pins of a pin chuck with a high thermal stability material, such as diamond-like carbon (DLC). Non-pin areas (“valleys”) of the pin chuck support surface are temporarily covered with glass frit or glass beads during the DLC coating operation. After coating, the glass frit/beads masking material may be removed, leaving the DLC material selectively coating the pin tops. The selective DLC coating avoids the cracking or warping problems due to CTE mismatch when DLC is coated over the entire pin chuck support surface, as the pin chuck material typically is very different from DLC.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: March 3, 2020
    Inventors: Edward Gratrix, William Spitzmacher, David Casale, Derek Rollins, Robert E. Klinger
  • Patent number: 10548566
    Abstract: The system includes a stand surrounding a working area, a signal detector receiving a signal generated by the wire, and a positioning module disposed on the stand. The positioning module is configured to drive the signal detector moving forward and backward on a two-dimensional plane in the working area. The system also includes a computer system electrically connected to the signal detector and the positioning module. The compute system receives the signal from the signal detector, generates position information according to the signal, and transmits the position information to the positioning module, such that the positioning module moves the signal detector to a position corresponding to a position of the wire in the blood vessel according to the position information.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: February 4, 2020
    Assignee: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE
    Inventors: Ming-Hui Chen, Ming-Hui Cheng, Tzyy-Ker Sue
  • Patent number: 10551753
    Abstract: An imprint device that forms a pattern by having the imprint material on a substrate and a mold come in contact with each other, the imprint device including a substrate holding unit that holds the substrate with a suction unit including partial areas, a moving unit including the substrate holding unit, a mold release being performed while a suction force of a partial area corresponding to an area in which the pattern is formed is set weaker than a suction force of other partial areas, an acquisition unit acquiring measurement data indicating a positional relationship between the substrate and the substrate holding unit, a target of the measurement data including an end portion of the substrate and the substrate holding unit, and a processor unit obtaining a correction amount to correct a positional deviation of the substrate with respect to the substrate holding unit using the acquired measurement data.
    Type: Grant
    Filed: April 25, 2016
    Date of Patent: February 4, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventor: Takashi Hosaka
  • Patent number: 10535548
    Abstract: A substrate holding apparatus that holds a substrate is provided. The apparatus comprises a rotary shaft which rotates about a vertical axis and includes a suction path leading from an upper end of the rotary shaft, and a holding unit which includes a suction hole formed in a rotation center, is fixed at the upper end of the rotary shaft such that the suction hole communicates with the suction path, and holds the substrate by sucking the substrate, wherein a plurality of vent holes for introducing an external gas into a space between the holding unit and the substrate are formed at positions rotationally symmetric with respect to the rotation center of the holding unit with an angle to face a back surface of the substrate placed on the holding unit.
    Type: Grant
    Filed: March 13, 2019
    Date of Patent: January 14, 2020
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Osamu Yasunobe
  • Patent number: 10514609
    Abstract: A lithographic apparatus (10) and method for preventing exposure of a peripheral portion (P) of a substrate (S). An edge mask (M) has a radial concave edge (E) that extends over less than half a circle arch. The edge mask (M) is connected to a mask carrier (4) that circumnavigates the projection system (2) to adjust a tangential coordinate (?) and a radial coordinate (R) of the edge mask (M) with respect to the optical axis (A) of the projection system (2) for inserting the edge mask (M) at a variable distance into the beam of radiation (B). The tangential and radial positions (?,R) of the edge mask (M) are coordinated with a changing position (X,Y) of the substrate (S) to prevent exposure of the peripheral portion (P) of the substrate (S) during exposure of the target region (T).
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: December 24, 2019
    Assignee: KULICKE & SOFFA LITEQ B.V.
    Inventor: Adrianus Johannes Petrus Maria Vermeer
  • Patent number: 10509335
    Abstract: A conveying apparatus for conveying a holding portion that includes a holding surface where the holding portion holds a substrate, the conveying apparatus including a conveying portion configured to convey the holding portion, and a cover member that covers a first surface on an opposite side of the holding surface of the holding portion, and an attaching and detaching portion configured to attach and detach the holding portion to and from the cover member, wherein the cover member comprises a first removing member configured to remove a foreign substance attached to the first surface, wherein the cover member is configured to be fixed to the holding portion while the first surface and the first removing member are in contact with each other, wherein the conveying portion conveys the holding portion and the cover member to a movable moving unit configured to hold the holding portion while having the first surface and the first removing member of the cover member be in contact with each other, wherein the conv
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: December 17, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kazunori Nakajima, Shigeo Koya
  • Patent number: 10503084
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated. A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: December 10, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Antonius Theodorus Anna Maria Derksen, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay
  • Patent number: 10481507
    Abstract: A method, including printing an apparatus mark onto a structure while the structure is at least partly within a lithographic apparatus. The structure may be part of, or is located on, a substrate table, but is separate from a substrate to be held by the apparatus. The method further includes measuring the apparatus mark using a sensor system within the apparatus.
    Type: Grant
    Filed: August 18, 2017
    Date of Patent: November 19, 2019
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Kevin J. Violette, Igor Matheus Petronella Aarts, Haico Victor Kok, Eric Brian Catey
  • Patent number: 10459393
    Abstract: Disclosed herein is an image forming apparatus having a structure improved such that a user easily opens and closes a printing media cassette. The image forming apparatus includes an apparatus body, a printing media cassette to receive printing media, the printing media cassette being movably coupled to the apparatus body, a first lever provided at the printing media cassette, a second lever provided in the apparatus body, the second lever being coupled to the first lever, turning, and being separated from the first lever when the printing media cassette is closed.
    Type: Grant
    Filed: January 15, 2015
    Date of Patent: October 29, 2019
    Assignee: HP PRINTING KOREA CO., LTD.
    Inventors: Myung Sik Kwon, Yury Telegin, Young Goo Kang, Jung Hyeon Kim, Leonid Chechurin
  • Patent number: 10451981
    Abstract: A method of measuring wear of a substrate holder that is configured to hold a production substrate, the method includes: clamping a measurement substrate to the substrate holder; and measuring strain in the measurement substrate to generate a measurement result. The measurement substrate may have a body having dimensions similar to that of the production substrate; and a strain sensor in the body configured to measure strain in a peripheral portion of the measurement substrate.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Tiannan Guan, Jingshi Li, Miao Yu
  • Patent number: 10451980
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Grant
    Filed: April 18, 2017
    Date of Patent: October 22, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • Patent number: 10438830
    Abstract: A semiconductor manufacturing apparatus includes an electrostatic chuck stage for configured to hold a wafer and supplying gas from a gas supply source to the wafer. The electrostatic chuck stage includes a first opening that supplies the gas to a first portion located at a first distance from the center of the wafer, and a second opening that supplies the gas to a second portion located at a second distance from the center of the wafer. The second distance being greater than the first distance. A first measurement instrument configured to measure a physical quantity of the gas between the gas supply source and the first opening, and a second measurement instrument configured to measure a physical quantity of the gas between the gas supply source and the second opening. An output device outputs information on the wafer based on the physical quantities measured by the first and second measurement instruments.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: October 8, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Mitsuyoshi Meguro, Takafumi Ochiai
  • Patent number: 10409175
    Abstract: A lithographic apparatus includes a base frame, an illumination system configured to condition a radiation beam and supported by the base frame, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a positioning device configured to position the substrate table, the positioning device being supported by the base frame, a sensor configured to sense a vibration caused by a torque exerted on the base frame, and an actuator configured to exert a force on the illumination system or the base frame, in response to the sensed vibration, in order to at least partly dampen the vibration.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: September 10, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Cornelius Adrianus Lambertus De Hoon, Marc Wilhelmus Maria Van Der Wijst, Thijs Verhees, Sander Kerssemakers
  • Patent number: 10409176
    Abstract: In a substrate stage, when a Y coarse movement stage moves in the Y-axis direction, an X coarse movement stage, a weight cancellation device, and an X guide move integrally in the Y-axis direction with the Y coarse movement stage, and when the X coarse movement stage moves in the X-axis direction on the Y coarse movement stage, the weight cancellation device move on the X guide in the X-axis direction integrally with the X coarse movement stage. Because the X guide is provided extending in the X-axis direction while covering the movement range of the weight cancellation device in the X-axis direction, the weight cancellation device is constantly supported by the X guide, regardless of its position. Accordingly, a substrate can be guided along the XY plane with good accuracy.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: September 10, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki
  • Patent number: 10395968
    Abstract: During a detection position calibrating operation and a substrate transport operation, a detection coordinate calculator calculates detection coordinates of an outer periphery of a reference substrate or a substrate placed at a reference position on a hand. During the detection position calibrating operation, an offset calculator calculates offsets of a plurality of detectors based on detection coordinates and design coordinates. During the substrate transport operation, a detection coordinate corrector corrects the detection coordinates based on the offsets of the plurality of detectors, and a coordinate information corrector corrects coordinate information based on the corrected detection coordinates.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: August 27, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventor: Joji Kuwahara
  • Patent number: 10379450
    Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for performing photolithography processes. In one embodiment, a system including multiple interferometers for accurately measuring the location of a substrate during operation is provided. The system may include two chucks, and the two chucks are aligned in a first direction. The interferometers are placed along the first direction to measure the location of the substrate with respect to the first direction. The reduced distance between the interferometers and the chuck improves the accuracy of the measurement of the location of the substrate. In another embodiment, mask pattern data is provided to the system, and the mask pattern data is modified based on location and position information of the substrate. By controlling the mask pattern data with the location and position information of the substrate, less positional errors of the pattern formed on the substrate can be achieved.
    Type: Grant
    Filed: January 10, 2018
    Date of Patent: August 13, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Benjamin M. Johnston, Thomas L. Laidig, Jang Fung Chen, John White
  • Patent number: 10366912
    Abstract: An object of the invention is to provide a stage apparatus that realizes compatibility between long stroke driving and reduction of a burden on a drive mechanism. In order to achieve the above object, there is suggested a stage apparatus including a first table that moves a sample in a first direction, a second table that moves the first table in a second direction different from the first direction, moving mechanisms that move the tables, respectively, a movable body that supports a moving mechanism, and a third moving mechanism that moves the movable body so as to follow the second table.
    Type: Grant
    Filed: February 22, 2018
    Date of Patent: July 30, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Motohiro Takahashi, Masaki Mizuochi, Shuichi Nakagawa, Naruo Watanabe, Hironori Ogawa, Takanori Kato, Akira Nishioka
  • Patent number: 10359707
    Abstract: A substrate holding device is equipped with a substrate holder that adsorbs and holds a substrate, and a plurality of vertical movement pin units that each have, at one end, an adsorption section to adsorb a rear surface of the substrate, and are movable relative to the substrate holder in a state of adsorbing the rear surface of the substrate with the adsorption section. The plurality of vertical movement pin units each have at least part including the adsorption section that is displaced in at least one direction, by an action of a force received from the adsorbed substrate.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: July 23, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10353297
    Abstract: A motion stage device, an exposure device and a lithography machine are disclosed. The motion stage device includes: Y-direction motors (203), a mover of each Y-direction motor (203) movable in a horizontal Y-direction; X-direction motors provided on X-direction guide rails (105), the X-direction guide rails (105) is in connection with the movers of the Y-direction motors (203) and movable in the horizontal Y-direction under actuation of the Y-direction motors (203), the X-direction motors having movers (107b) movable in a horizontal X-direction; an inner frame (102), supporting the X-direction guide rails (105); and a motion stage (108, 106), disposed on the movers (107b) of the X-direction motor. This motion stage device possesses improved modal and vibration characteristics because of a reduced load on the Y-direction motors (203).
    Type: Grant
    Filed: December 28, 2016
    Date of Patent: July 16, 2019
    Assignee: Shanghai Micro Electronics Equipment (Group) Co., Ltd.
    Inventors: Lili Ge, Yuebin Zhu
  • Patent number: 10354896
    Abstract: There is provided a position detection system for use in a processing apparatus including a mounting table configured to mount thereon a disc-shaped target object and a focus ring surrounding a periphery of the mounting table. The system includes a light source configured to generate measurement light, three or more optical elements configured to emit the measurement light as emission light and receive reflected light, a driving unit configured to move each of the optical elements such that a scanning range from the focus ring to the target object is scanned, and a control unit configured to obtain positional relation between the focus ring and the target object based on the reflected light in the scanning range of each of the optical elements.
    Type: Grant
    Filed: September 28, 2017
    Date of Patent: July 16, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kippei Sugita, Kenji Nagai
  • Patent number: 10353303
    Abstract: A lithographic apparatus includes a support table and a gas extraction system. The gas extraction system is configured to extract gas from a gap between a base surface of the support table and a substrate through at least one gas extraction opening when the substrate is being lowered onto the support table. The lithographic apparatus is configured such that gas is extracted from the gap at a first loading flow rate when the distance between the substrate and the support plane is greater than a threshold distance and gas is extracted from the gap at a second loading flow rate when the distance between the substrate and the support plane is less than the threshold distance, wherein the second loading flow rate is lower than the first loading flow rate.
    Type: Grant
    Filed: May 23, 2016
    Date of Patent: July 16, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Abraham Alexander Soethoudt, Thomas Poiesz
  • Patent number: 10353300
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Grant
    Filed: July 11, 2018
    Date of Patent: July 16, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10345720
    Abstract: A photolithography tool and a method for compensating for surface deformation in a carrier of the photolithography tool are disclosed. In the photolithography tool, carrier surface deformation compensation elements are provided at the bottom of the carrier, which are capable of compensating for the surface deformation in the carrier. In the method, the surface deformation is detected by carrier surface deformation detection modules, and an automated closed-loop controller controls compensating forces exerted by the carrier surface deformation compensation elements based on the detected deformation. This allows more accurate compensation for the carrier surface deformation.
    Type: Grant
    Filed: February 28, 2018
    Date of Patent: July 9, 2019
    Assignee: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) CO., LTD.
    Inventors: Yinlei Wei, Feihong Liao, Fuqiang Yang
  • Patent number: 10317807
    Abstract: A substrate holding device is equipped with a substrate holder that adsorbs and holds a substrate, and a plurality of vertical movement pin units that each have, at one end, an adsorption section to adsorb a rear surface of the substrate, and are movable relative to the substrate holder in a state of adsorbing the rear surface of the substrate with the adsorption section. The plurality of vertical movement pin units each have at least part including the adsorption section that is displaced in at least one direction, by an action of a force received from the adsorbed substrate.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: June 11, 2019
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 10310393
    Abstract: The present invention relates to a substrate support (1), comprising: a support body (2) forming a support surface configured to support a substrate, wherein said support surface comprises a support surface part configured to support a substrate area of the substrate, at least one actuator (6) arranged on the support body at a location aligned with the support surface part and configured to contract or extend in a direction substantially parallel to a main plane of the support surface.
    Type: Grant
    Filed: April 28, 2016
    Date of Patent: June 4, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Thomas Poiesz
  • Patent number: 10234774
    Abstract: A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: March 19, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Hans Butler
  • Patent number: 10209622
    Abstract: An exposure method sequentially exposes a plurality of shot areas of a substrate. The method includes: (i) holding the substrate on a substrate holder such that a gap is formed along an edge of the substrate; (ii) exposing one of the shot areas, located near a center of the substrate, through a liquid of a liquid immersion area which covers only a portion of a surface of the substrate, while moving the substrate at a first scanning speed; and (iii) exposing an other one of the shot areas through the liquid of the liquid immersion area, while moving the substrate at a second scanning speed lower than the first scanning speed. The other one of the shot areas is located near the edge of the substrate and the gap is included in the liquid immersion area during the exposure of the other one of the shot areas.
    Type: Grant
    Filed: May 4, 2011
    Date of Patent: February 19, 2019
    Assignee: NIKON CORPORATION
    Inventor: Hiroyuki Nagasaka
  • Patent number: 10197927
    Abstract: A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor.
    Type: Grant
    Filed: December 1, 2009
    Date of Patent: February 5, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Nicolaas Ten Kate
  • Patent number: 10185226
    Abstract: The present invention provides a stage apparatus including a plate, wherein the plate includes a first plate member, a second plate member, and a third plate member, at least one surface out of a first surface of the first plate member on a side of the second plate member and a second surface of the second plate member on a side of the first plate member includes a first concave portion configured to form a first channel extending in a direction along the surface, at least one surface out of a third surface of the second plate member on a side of the third plate member and a fourth surface of the third plate member on the side of the second plate member includes a second concave portion configured to form a second channel extending in a direction along the surface.
    Type: Grant
    Filed: July 6, 2017
    Date of Patent: January 22, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Satoshi Iwatani
  • Patent number: 10178976
    Abstract: The present disclosure relates to a PET detector module suitable for using in a PET/MR hybrid system. The PET detector module comprises a scintillator, a set of frontend electronics and a positioning means configured to securing relative position between the scintillator and the frontend electronics. The PET detector module may further comprise a temperature control system, such as an air-cooling system or a heat exchange plate. The present disclosure also relates to a heat exchange plate, which comprises a fluidic passage for containing a flow of a heat exchange media. The heat exchange plate is suitable for use in the magnetic field environment of a MRI system.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: January 15, 2019
    Assignee: SHANGHAI UNITED IMAGING HEALTHCARE CO., LTD.
    Inventors: Weiping Liu, Yixing Sun, Lingzhi Hu
  • Patent number: 10009119
    Abstract: A system is provided that includes a gateway node and terminal node. The gateway node includes an actuator configured to produce a light beam for propagation through a fluid, and a sensor configured to detect a reflection of the light beam. The terminal node is disposed within the fluid and includes an energy source and a photovoltaic layer adjacent to a reflective layer. The photovoltaic layer is switchably controlled between two modes, to convey a data stream associated with the reflected light beam to the sensor of the gateway node, the two modes including: a transmission mode wherein the light beam is transmitted through the photovoltaic layer and reflected by the adjacent reflective layer to the sensor of the gateway node, and a recharging mode wherein the photovoltaic layer is configured to capture photonic energy from the light beam for storage in the energy source.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: June 26, 2018
    Assignee: THE BOEING COMPANY
    Inventor: Nathan D. Hiller
  • Patent number: 9996009
    Abstract: An extreme ultraviolet (EUV) exposure system capable of improving the yield of an EUV exposure process by improving EUV exposure performance, and furthermore, capable of increasing throughput or productivity of the EUV exposure process, the EUV exposure system including an EUV exposure apparatus configured to perform EUV exposure on a wafer disposed on a chuck table, a load-lock chamber combined with the EUV exposure apparatus and configured to supply and discharge the wafer to/from the EUV exposure apparatus, and an ultraviolet (UV) exposure apparatus configured to perform UV exposure by irradiating an entire upper surface of the wafer with a UV light without using a mask.
    Type: Grant
    Filed: March 21, 2017
    Date of Patent: June 12, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Chang-min Park, Myung-soo Hwang, Ji-sun Lee
  • Patent number: 9977341
    Abstract: A position control system includes a position measurement system including a first position measurement configuration arranged to determine a position of an object in a first operating area and a second position measurement configuration to determine a position of the object in a second operating area; and a control unit configured to control a position of the object, the control unit including a first and a second controller, the first and second controllers being arranged to convert an input signal representing a position of the object to a respectively first and second control signal, the control unit being arranged to determine a combined control signal for controlling the position of the object in an overlapping area of the first and second operating area, wherein the combined control signal is obtained by applying a continuous weight function to the first and second control signal.
    Type: Grant
    Filed: February 6, 2014
    Date of Patent: May 22, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventor: Henrikus Herman Marie Cox
  • Patent number: 9977348
    Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: May 22, 2018
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Günes Nakiboglu, Suzanne Johanna Antonetta Geertruda Cosijns, Anne Willemijn Bertine Quist, Lukasz Sosniak, Frank Johannes Jacobus Van Boxtel, Engelbertus Antonius Fransiscus Van Der Pasch
  • Patent number: 9977345
    Abstract: An exposure apparatus has a substrate holding member, a first supporting member, a second supporting member, and a driving system. The first supporting member supports the substrate holding member from below. The second supporting member supports the first supporting member from below such that the first supporting member and the second supporting member are capable of moving relative to each other. The driving system moves the substrate holding member, the first supporting member and the second supporting member. The driving system includes a first driving device and a second driving device, the first driving device moving the substrate holding member and the first supporting member in a direction along a predetermined axis, and the second driving device moving the second supporting member in the direction along the predetermined axis.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: May 22, 2018
    Assignee: NIKON CORPORATION
    Inventor: Yasuo Aoki