Abstract: A detection apparatus for detecting a mark formed on a substrate uses a detection optical system that irradiates light on the mark on the substrate held by a stage and detects an image of the mark, and a processor that performs a detection process of the mark based on the image of the mark. The processor finds a detection value indicating a position of the mark in an observation field of the detection optical system based on the image of the mark, finds a subregion in which the mark is located among a plurality of subregions in the observation field, and corrects the detection value based on a correction value corresponding to the found subregion among correction values predetermined for the plurality of subregions, respectively.

Abstract: A wafer holder includes a holding base having a circular holding surface, including, on a side of the holding surface, an annular first groove and an annular second groove that is surrounded by the first groove, and internally including a plurality of first suction holes opening in a region located between the first groove and the second groove on the holding surface, a plurality of second suction holes opening in a region surrounded by the second groove on the holding surface, and a suction channel communicating to the first suction holes and the second suction holes and opening in a back surface on a side opposite to the holding surface. The first suction holes and the second section holes are configured in such a manner that the first suction holes each have a pressure loss greater than that at each of the second suction holes.

Abstract: A stage apparatus includes a surface plate as well as a guide shaft fixedly secured to the surface plate, a drive member moving along the guide shaft, and a hydrostatic fluid bearing that forms fluid films in the gap portion between the guide shaft and the drive member. The apparatus further includes: a positional deviation detection section—for detecting a relative positional deviation which occurs between the guide shaft and the drive member and which affects the thickness dimensions of the fluid films; and a state decision section for making a decision on the condition of the apparatus itself based on the positional deviation detected by the detection section and outputting information responsive to the decision.

Abstract: A laser processing apparatus includes a stage configured to transfer a target substrate and including an opening, an electrostatic chuck disposed on the stage and including a plurality of holes, and a laser irradiation unit disposed above the stage and spaced apart from the stage and configured to irradiate a laser beam on the target substrate. A surface of the electrostatic chuck is in contact with the target substrate, the target substrate includes a plurality of etching regions to be etched by the laser beam and a non-etching region surrounding the plurality of etching regions of the target substrate, and the plurality of holes of the electrostatic chuck overlap the opening of the stage and the plurality of etching regions of the target substrate.

Abstract: A method includes transferring multiple discrete components from a first substrate to a second substrate, including illuminating multiple regions on a top surface of a dynamic release layer, the dynamic release layer adhering the multiple discrete components to the first substrate, each of the irradiated regions being aligned with a corresponding one of the discrete components. The illuminating induces a plastic deformation in each of the irradiated regions of the dynamic release layer. The plastic deformation causes at least some of the discrete components to be concurrently released from the first substrate.

Abstract: A printing device includes a recording portion performing recording on a medium; a discharge tray loading the medium recorded; a first detector configured to detect the medium of a first load capacity loaded on the discharge tray; a second detector configured to detect the medium of a second load capacity smaller than the first load capacity loaded on the discharge tray; a mounting portion on which an optional device is mounted; and a controller controlling the recording by the recording portion, in which the optional device mounted on the mounting portion is positioned above the discharge tray, the first detector and the second detector are positioned below the optional device mounted on the mounting portion, and when the first detector detects the medium of the first load capacity in a non-mounted case in which the optional device is not mounted, the controller executes full load processing.

Abstract: An alignment device includes a base table, a plurality of electric actuators attached to the base table, an alignment table supported by the plurality of electric actuators. Each of the plurality of electric actuators includes a linear motion device that drives the alignment table in a direction approaching or separating from the base table.

Abstract: A positioning device, including: a first positioning module arranged to support and position a first substrate, a second positioning module arranged to support and position a second substrate, a first positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a first processing sequence, a second positioning field in which the first and second positioning modules can be alternatingly positioned to carry out a second processing sequence, wherein when one of the first and second positioning modules is carrying out or finishing the first processing sequence, the other of the first and second positioning modules has finished the second processing sequence and is positioned closer to the one of the first and second positioning modules.

Abstract: A workpiece transfer apparatus includes a loader for loading a tray with uninspected workpieces placed thereon, a first-transferer for guiding the workpieces toward a first-inspection region by transferring the loaded tray in a first direction, a second-transferer for guiding the workpieces toward a second-inspection region by transferring the tray in a second-direction perpendicular to the first-direction, a third-transferer for transferring the tray with the inspected workpieces placed thereon in a third direction perpendicular to the second-direction, and an unloader for unloading the tray.

Abstract: The present invention provides a control method of a driving apparatus that repeatedly performs a process of driving a target object in a predetermined range by a linear motor, wherein the linear motor includes a stator in which a plurality of coils are arrayed, and a mover provided with the target object, the control method comprising: changing a position of the stator with respect to the predetermined range at an arbitrary timing; and determining, in accordance with the changed position of the stator, output ratios of the plurality of coils in the process.

Abstract: The present disclosure relates to a wafer processing apparatus and a wafer transfer method. The wafer processing apparatus includes: a first machine; a second machine, including a manipulator, the manipulator transfers a wafer to the machine through a connection port; the connection port is provided between the first machine and the second machine; door panels, provided on the first machine and used to close the connection port; a detector, for detecting a current position of the door panel; a driver, connected to the door panel, for driving the door panel to move to open or close the connection port; and a controller, connected to the detector, the driver and the manipulator, for controlling the door panel to move according to the current position of the door panel to open or close the connection port, and control the manipulator to transfer the wafer.

Abstract: Disclosed is an actuator unit for positioning an optical element, comprising a first reluctance actuator comprising a first stator part and a first mover part separated by a gap in a first direction. The first mover part is constructed and arranged to be connected to the optical element and for moving the optical element. The first stator part is constructed and arranged to exert a magnetic force on the first mover part along a first line of actuation. The first mover part is movable relative to the first stator part in the first direction. The first stator part and the first mover part are constructed and arranged such that the first line of actuation is, in operational use, moving along with the first mover part in a second direction perpendicular to the first direction, for at least a predetermined movement range of the first mover part in the second direction.

Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

Abstract: A method for evaluating stacking or sorting integrity at an output device of a high-speed apparatus that processes media includes: acquiring an audio data substantially in real-time from the output device of the high-speed apparatus while the high-speed apparatus is in operation, by use of an audio sensor located at the output device; transforming by a processor, the audio data to into a stacking or sorting integrity value; and if the stacking or sorting integrity value exceeds a predetermined threshold, stopping by the processor a document transport of the high-speed apparatus. An apparatus for evaluating stacking or sorting integrity at an output device, and a system for evaluating stacking or sorting integrity at an output device of a high-speed apparatus are also described.

Abstract: The present invention provides an imprint apparatus that forms a pattern in an imprint material on a substrate using a mold including a pattern region, the apparatus comprising: a stage configured to be movable while holding the substrate; and a dispenser configured to discharge the imprint material, wherein a sensor, a receptor, and a mark are provided around a holding region where the substrate is held, in an upper surface of the stage, and the upper surface of the stage includes a first region that passes below the pattern region during movement of the stage between a position below the dispenser and a position below the mold, and a second region that does not pass below the pattern region during the movement, and the sensor, the receptor, and the mark are arranged in the second region.

Abstract: A transport system includes a robot, sensors (an aligner sensor, a protrusion detecting sensor) and a controller. The robot having a hand which supports a wafer and transports the wafer to an aligner apparatus. The sensor detects the position of the wafer before the robot delivers the wafer to the aligner apparatus while supporting the wafer on the hand. The controller determines the positional deviation of the wafer based on a detection value of the sensor.

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

Abstract: A stud attachment device for attaching a plurality of studs to a photomask constituting a reticle. The stud attachment device including a body; a plurality of holders extending from the body, the holders allowing the studs to be laid thereon, respectively; and a pressure regulator for independently controlling pressures of the holders when the studs are attached to the photomask.

Abstract: A susceptor including a generally circular body having a face with a radially inward section and a radially outward section proximate a circumference of the body, the radially outward section having at least one ring extending upward for contacting a bottom surface of a substrate, and wherein the radially inward section lacks a ring extending upward from the face.

Abstract: A method for providing a wear-resistant material on a body. A composite body that may be obtained by the method. The composite body may be a substrate holder or a reticle clamp for use in a lithographic apparatus. The method includes providing a body made of glass, ceramic or glass-ceramic; providing a wear-resistant material having a hardness of more than 20 GPa; and brazing or laser welding the wear-resistant material to the body.

Abstract: A process kit ring adaptor includes one or more upper surfaces and one or more lower surfaces. The one or more upper surfaces are configured to support a process kit ring. The one or more lower surfaces are configured to interface with an end effector. The process kit ring adaptor supporting the process kit ring is configured to be transported on the end effector within a processing system.

Abstract: An electromagnetic motor is described, the electromagnetic motor comprising: a magnet assembly configured to generate a two-dimensional alternating magnetic field having a pitch Pm1 in a first direction and a pitch Pm2 in a second direction; a coil assembly configured to co-operate with the magnet assembly to generate a first force in the first direction and a second force in the second direction, wherein the coil assembly comprises a first coil set comprising a plurality of first coils for generating the first force and a second coil set comprising a plurality of second coils for generating the second force, wherein a ratio R1 of a coil pitch Pc1 in the first coil set in the first direction over Pm1 is different from a ratio R2 of a coil pitch Pc2 in the second coil set in the second direction over Pm2.

Abstract: A substrate treating apparatus includes a process module including a plurality of process units that perform a plurality of steps included in a substrate treating process and that perform the substrate treating process on substrates sequentially placed in the process units based on process recipes for the substrates, a scheduler that controls operations of the process module and the process units included in the process module, a storage that stores transfer paths information of the substrates, and a selection module that selects a process unit to proceed, by a result of feeding back the transfer paths information stored in the storage to the scheduler. The substrate treating apparatus may further include a measuring instrument that measures defect values of the transfer paths information along which the substrates are transferred. The storage may store the defect values measured by the measuring instrument according to the transfer paths information of the substrates.

Abstract: The present application discloses a 3D printing device and a release method and a liquid containing mechanism therefor, and relates to the field of 3D printing. The liquid containing mechanism comprises a material box foundation, a material box and a plurality of motion guide components. The material box foundation is a rigid annular plate with a mounting groove and is detachably mounted on a base of the 3D printing device, the mounting groove of the material box foundation is covered by a light-transmitting glass plate, and the glass plate is fixed on an upper surface of the material box foundation. The plurality of motion guide components are fixed to a peripheral edge of the material box and then detachably fixed on the material box foundation. Each of the motion guide components is a following component with an upper limit structure and a lower limit structure, and the following component is fixed to the peripheral edge of the material box.

Abstract: The present disclosure provides a display motherboard, a method for fabricating the same, and a method for aligning the same. The display motherboard includes an array substrate on which an alignment mark and a color film layer are provided. A portion of a black matrix of the color film layer in an alignment mark area includes a first light-shielding portion and a second light-shielding portion. The first light-shielding portion covers the alignment mark, and the second light-shielding portion covers an area outside the alignment mark, where upper surfaces of the first light-shielding portion and the second light-shielding portion are not in the same plane. When the display motherboard is aligned in the subsequent processes, since the black matrix forms the same pattern as the alignment mark due to a height step, when the exposure machine exposures, the pattern can be directly captured for alignment.

Abstract: A sheet sorting apparatus comprising a first tray, a second tray, a conveyance unit, a tray detection unit, a stacking amount detection unit, and a control unit configured to control the conveyance unit to not convey the sheet to the second tray, in a case where the stacking amount detection unit detects that the amount of sheets reaches the predetermined amount, wherein the control unit is configured to permit the conveyance unit to convey the sheet to the second tray, in a case where the tray detection unit detects that the first tray is detached from the apparatus main body in a state where the stacking amount detection unit detects that the amount of sheets reaches the predetermined amount and conveyance of the sheet to the second tray by the conveyance unit is stopped.

Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.

Abstract: Disclosed is a display apparatus, capable of adjusting an image based on a location and a type of ambient light source. The display apparatus includes: a display; a housing supporting the display; a sensor disposed in the housing and configured to detect a quantity of entering light; and a processor configured to: based on an arrangement angle of the sensor and the detected quantity of the entering light, identify a location of a light source; and in response to the identified location of the light source, adjust a quality of an image displayed on the display.

Abstract: An optical displacement sensor includes: a splitting unit that splits the light radiated from the light source into a first light ray and a second light ray; a reflection unit including a first reflection part and a second reflection part provided at a predetermined angle with respect to the first reflection part; and a fold-back reflection unit that folds-back and reflects the light that has gone through the reflection unit to the reflection unit. The optical displacement sensor is characterized in that the reflection unit reflects the first light ray and the second light ray that are split by the splitting unit and have gone through the diffraction unit from the first reflection part to the second reflection part, and reflects the first light ray and the second light ray that are reflected by the fold-back reflection unit from the second reflection part to the first reflection part.

Abstract: A reaction compensation device includes a drive mechanism driving a first movable part with respect to a base, a reaction mass drive mechanism driving a second movable part with respect to the base; and a first relative position sensor measuring a relative position between the first movable part and the base. There is also a second relative position sensor measuring a relative position between the second movable part and the base, a first control system controlling the drive mechanism by taking in a signal outputted from the first relative position sensor as a feedback signal in response to a command value, and a second control system correcting the command value using a correction parameter for adjusting a difference between mass properties of the drive mechanism and reaction mass drive mechanism and for controlling the reaction mass drive mechanism.

Abstract: The invention provides a stage apparatus, comprising an object support comprising a ring shaped protrusion having an outer radius in a first plane, and configured to support an object with a radius in the first plane larger than the outer radius of the ring shaped protrusion. The stage apparatus further comprises a sensor module configured to detect the object support, and the object when it is arranged on the object support. The stage apparatus further comprises a processing unit configured to receive one or more signals from the sensor module, and to determine, based on said one or more signals, a position of the object relative to the ring shaped protrusion when the object is arranged on the object support. The processing unit is further configured to determine, based on said position of the object, an offset value representing the position of the object relative to the ring shaped protrusion.

Abstract: The present disclosure discloses a method for manufacturing an electronic device, including: setting a basic working area; providing a supporting platform having a plurality of vacuum valves; disposing a substrate on the supporting platform; applying vacuum attraction to a portion of the substrate through a portion of the plurality of vacuum valves, wherein the portion of the substrate corresponding to the vacuum attraction is defined as an attracted region; and performing an exposure on a portion of the attracted region, wherein an area of the attracted region is larger than the basic working area and smaller than an area of the supporting platform.

Abstract: Methods and systems are described for reducing adhesion and controlling friction between a wafer and a wafer table during semiconductor photolithography wherein the tops of burls on the wafer table have a layer with a nanoscale topography.

Abstract: Embodiments disclosed herein include a lithographic patterning system and methods of using such a system to form a microelectronic device. The lithographic patterning system includes an actinic radiation source, a stage having a surface for supporting a substrate with a resist layer, and a prism with a first surface over the stage, where the first surface has a masked layer and is substantially parallel to the surface of the stage. The prism may have a second surface that is substantially parallel to the first surface. The first and second surfaces are flat surfaces. The prism is a monolithic prism-mask, where an optical path passes through the system and exits the first surface of the prism through the mask layer. The system may include a layer disposed between the mask and resist layers. The mask layer of the prism may pattern the resist layer without an isolated mask layer.

Abstract: An apparatus for and method of cleaning a surface of a support structure in a lithographic system in which a cleaning substrate has at least one motor which causes the cleaning substrate to move laterally across the surface. The cleaning substrate may be provided with a power supply mounted on the cleaning substrate and selectably electrically connectable to the motor.

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

Abstract: According to an embodiment, a charged particle beam apparatus includes a stage; a chamber; an emission source of the charged particle beam; an electronic optical system configured to emit the charged particle beam; an optical column including the emission source and the electronic optical system; a charged particle detector configured to detect a position of the charged particle beam; a first actuator configured to provide a frequency vibration to the stage based on a first excitation signal; a second actuator configured to provide a frequency vibration to the optical column based on a second excitation signal; a third actuator configured to provide a frequency vibration to the chamber based on a third excitation signal; and a controller configured to generate the first to third excitation signals.

Abstract: A substrate holder, for a lithographic apparatus, having a main body, a plurality of support elements to support a substrate and a seal unit. The seal unit may include a first seal positioned outward of and surrounding the plurality of support elements. A position of a substrate contact region of an upper surface of the first seal may be arranged at a distance from the plurality of support elements sufficient enough such that during the loading/unloading of the substrate, a force applied to the first seal by the substrate is greater than a force applied to the plurality of support elements by the substrate. A profile of the contact region, in a cross section through the seal, may have a shape which is configured such that during the loading/unloading of the substrate, the substrate contacts the seal via at least two different points of the profile.

Abstract: Imprint apparatus forms pattern in shot regions of substrate by bringing pattern region of mold into contact with imprint material and curing the imprint material. The apparatus includes deformation mechanism which is for deforming the pattern region and includes actuator for applying force to the mold. For each shot region, after first processing of applying first deformation amount to the mold by the actuator is executed, second processing of curing the imprint material is executed in state in which the imprint material and the pattern region are in contact with each other and second deformation amount is applied to the mold by the actuator to reduce overlay error between the shot region and the pattern region. Magnitude relationship between the first deformation amount and the second deformation amount is same in the shot regions.

Abstract: An imprint apparatus for performing an imprint process of forming a pattern of an imprint material on a substrate using a mold is disclosed. The imprint apparatus includes an adjustment unit configured to adjust a shape of the mold and a control unit configured to control the imprint process. The control unit obtains information indicating a tendency concerning a change of the shape of the mold corresponding to a use count of the mold used for the imprint process and controls the adjustment unit to correct the shape of the mold in accordance with the obtained information and a present use count of the mold. The control unit also controls the imprint apparatus to perform the imprint process after the shape of the mold has been corrected by the adjustment unit.

Abstract: A liquid crystal exposure apparatus that irradiates a substrate held by a substrate holder which moves along an XY plane with an illumination light via an optical system while the substrate holder moves in the X-axis direction, has; a scale measured based on movement of the substrate holder in the X-axis direction, heads that measure the scale while relatively moving in the X-axis direction with respect to the scale, a plurality of scales arranged at mutually different positions in the X-axis direction measured based on movement of the substrate holder in the Y-axis direction, and a plurality of heads provided for each scale that measures the scales while relatively moving in the Y-axis direction with respect to the scales based on movement of the substrate in the Y-axis direction.

Abstract: A system and method for adjusting the alignment and location of a magnet. A first actuator exerts a first applied force to urge the magnet in a first axial direction and a first biasing device exerts a first opposing force. The first applied force and opposing forces are modulated relative to each other to position the magnet at a lateral location. A second actuator exerts a second applied force to urge the magnet in a first angular direction about a pivot axis and a second biasing device exerts a second opposing force. The second applied and opposing forces are modulated relative to each other to position the magnet at a select angular orientation relative to the magnet holder. The magnet is secured to the magnet holder after positioning. The magnet can also be rotated about its geometric centerline to position its magnetic axis.

Abstract: A transport system includes a transport vehicle that transports an article, and a transport controller that controls the transport vehicle based on a host transport instruction received from a host controller.

Abstract: A detection apparatus detects an orientation reference of an object to be detected which includes an edge including the orientation reference. The apparatus includes a first detection system configured to detect the edge such that the orientation reference is detected, and a second detection system configured to detect, by projecting a pattern to a surface of the object and detecting an image formed by reflected light from the surface, a position of the surface in a direction perpendicular to the surface. After a focusing operation of the first detection system is performed based on the position of the surface detected by the second detection system, the first detection system detects the orientation reference.

Abstract: Disclosed is a method of laser irradiation of a patterned semiconductor device including a periodic array of sub-wavelength fin-like structures, all fin-like structures upstanding from a base face of the semiconductor device and defining an upper face of the periodic array opposite the base face, each fin-like structure having: a width along a first direction parallel to the base face of the order of magnitude or smaller than the laser wavelength; a length along a second direction parallel to the base face and perpendicular to the first direction at least 3 times greater than the width; and a height along a third direction perpendicular to the base face. The method includes: generating a UV pulsed laser beam using a laser module; and irradiating at least a portion of the upper face with the laser beam.

Abstract: A conveyance apparatus comprises a first movable device to move while holding an object, a second movable device to move while holding the object and transfer the object to the first movable device, and a controller to control the first and second movable devices. The second movable device includes a guide member and a hand arranged so as to be capable of reciprocally moving along the guide member while holding the object. The controller estimates, based on a driving history of the second movable device, a thermal deformation amount of the guide member corresponding to the reciprocal movement of the hand along the guide member, and corrects, based on the estimated thermal deformation amount, a drive command value used to move the first movable device to a position to receive the object from the second movable device.

Abstract: The present application relates to contact immersion lithography systems and methods of their use. An example immersion lithography system includes a photomask substrate and at least one sensor disposed along a surface of the photomask substrate. The immersion lithography system also includes a controller having at least one processor and a memory. The at least one processor is configured to execute program instructions stored in the memory so as to carry out operations. The operations include receiving, from the at least one sensor, information indicative of an electric field proximate to the at least one sensor. The operations also include determining, based on the received information, at least one of: a thickness of a liquid layer adjacent to the photomask substrate or a distance to a further substrate adjacent to the photomask substrate.

Abstract: An immersion lithographic apparatus having a fluid handling structure, the fluid handling structure configured to confine immersion fluid to a region and including: a meniscus controlling feature having an extractor exit on a surface of the fluid handling structure; and a gas knife system outwards of the extractor exit and including passages each having an exit, the passages having a plurality of first passages having a plurality of corresponding first exits on the surface, and a plurality of second passages having a plurality of corresponding second exits outwards of the first exits on the surface, wherein the surface faces and is substantially parallel to a top surface of a substrate during exposure, and the first exits and the second exits are arranged at a greater distance from the substrate than the extractor exit.

Abstract: To provide a control apparatus, with which driving of a driving unit can be controlled with high accuracy with a simple configuration, the control apparatus (100) according to the present invention include: a plurality of current sources (20) each being configured to supply current based on a PWM method; a first detection unit configured to detect a driving state of a driving unit (14); and a control unit (50) configured to change values of a plurality of currents (Ixf, Ixb, Iyl, and Iyr) which are supplied from the plurality of current sources (20) based on a result of the detection by the first detection unit, and which are required to drive the driving unit (14), when a value of at least one of the plurality of currents (Ixf, Ixb, Iyl, and Iyr) is a predetermined value.

Abstract: An immersion lithographic apparatus is provided having a substrate table including a drain configured to receive immersion fluid which leaks into a gap between an edge of a substrate on the substrate table and an edge of a recess in which the substrate is located. A thermal conditioning system is provided to thermally condition at least the portion of the recess supporting the substrate by directing one or more jets of fluid onto a reverse side of the section supporting the substrate.