Including Vacuum Or Fluid Pressure Patents (Class 355/73)
  • Patent number: 11249405
    Abstract: A system and method of imprinting a formable material on a substrate includes a feature with a template. The substrate is initially held with a first back pressure. After which the template is brought into contact with the formable material. A template strain tensor above the feature may be greater than a strain threshold. The substrate is then held with a second back pressure less than the first back pressure, after which the substrate strain below the feature increases. After which the formable material is solidified.
    Type: Grant
    Filed: April 30, 2018
    Date of Patent: February 15, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-Jin Choi, Se-Hyuk Im
  • Patent number: 11139196
    Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: October 5, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Niek Jacobus Johannes Roset, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Mark Constant Johannes Baggen, Gijs Kramer, Roger Anton Marie Timmermans, Frank Pieter Albert Van Den Berkmortel
  • Patent number: 11131937
    Abstract: A positioning device configured to displace an object is disclosed. The positioning device comprises a stage to support the object, an actuator to move the stage with respect to a reference in a direction of movement, a balance mass arranged between the actuator and the reference to reduce transfer of reaction forces from the actuator to the reference, a support device arranged between the reference and the balance mass to support the balance mass, and a gravity compensator acting between the reference and the balance mass to exert a lifting force on the balance mass to reduce a gravitational support force to be provided by the support device to support the balance mass.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: September 28, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Michaël Johannes Christiaan Ronde, Johannes Hubertus Antonius Van De Rijdt, Maarten Frans Janus Kremers, Erik Maria Rekkers
  • Patent number: 11104057
    Abstract: In an embodiment, an imprint apparatus can include a substrate holder having a chucking region and a recessed support section; and a template holder, wherein the chucking region has more area as compared to a template region. In another embodiment, an imprint apparatus can include gas zones; and a gas controller that can be configured to adjust pressures within the gas zones to induce a convex curvature of a partial field of a workpiece used with the imprint apparatus. A method can include providing a workpiece within an imprint apparatus, wherein the workpiece includes a substrate and a formable material; and initially contacting a template with the formable material at a location spaced apart from the periphery of a partial field. In a particular embodiment, the method can further include modulating the substrate to form a convex shape contacting the template with the formable material.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: August 31, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Mario Johannes Meissl, Wei Zhang, Byung-Jin Choi, Zhengmao Ye
  • Patent number: 11098759
    Abstract: A support table for a lithographic apparatus, a method of loading a substrate, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. In one arrangement, a support table is configured to support a substrate. The support table has a base surface. The base surface faces a surface of the substrate when the substrate is supported by the support table. One or more gas cushion members are provided above the base surface. Each of the gas cushion members includes a recess. The recess is shaped and configured such that a lowering of the substrate into a position on the support table at which the substrate is supported by the support table causes a localised build-up of pressure within the recess. The localized build-up of pressure provides a localised gas cushioning effect during the lowering of the substrate.
    Type: Grant
    Filed: January 6, 2020
    Date of Patent: August 24, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Siegfried Alexander Tromp, Antonie Hendrik Verweij, Abraham Alexander Soethoudt, Jan Pieter Van De Poel, Mark Constant Johannes Baggen
  • Patent number: 11079690
    Abstract: An apparatus for processing the substrate includes a substrate stage and a source. The substrate stage is configured to support a substrate thereon. The substrate stage includes a substrate support formed with a first opening therein. The first opening is an annular opening. The source is coupled to the first opening and is configured to supply first gas/air to a bottom surface of the substrate through the first opening.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: August 3, 2021
    Assignee: XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.
    Inventors: Hyun-Suk Yang, Soo-Hyoung Kim, Sung-Uk Kim, Byung-In Kwon
  • Patent number: 10048598
    Abstract: A supporting member on which a wafer table is mounted is substantially kinematically supported, via six rod members placed on a slider. Further, coupling members are placed facing in a non-contact manner via a predetermined gap, thin plate-shaped edges provided at both ends in the Y-axis direction of the supporting member. By this arrangement, vibration-damping is performed by the coupling members (squeeze dampers) facing the edges, on vibration of the supporting member mounted on the wafer table. Further, because the supporting member is kinematically supported via the plurality of rod members, it becomes possible to reduce deformation of the wafer table that accompanies deformation of the slider.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: August 14, 2018
    Assignee: NIKON CORPORATION
    Inventor: Yuichi Shibazaki
  • Patent number: 9740109
    Abstract: A holding device includes a holding member having holes for evacuating air in a space between a substrate and the holding member and an annular seal member on a lower surface of a stepped portion of the holding member for defining the space. A first region is the area of a figure having the same center as that of a plane figure of a surface of the holding member and obtained by reducing the plane figure's size by ? or more and ? or less. A second region is between the first region and the seal member. The holes are formed to satisfy a relationship of (total hole area in second region/area of second region)>(total hole area in sum region of first and second regions/area of sum region of first and second regions) and communicate with a pipe at a position corresponding to the first region of the holding member.
    Type: Grant
    Filed: November 20, 2015
    Date of Patent: August 22, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventor: Naoki Funabashi
  • Patent number: 9589766
    Abstract: A charged particle beam drawing apparatus has a drawing unit that directs a charged particle beam and draws a pattern on a target and also has a control calculator that controls the drawing unit. The control calculator has a speed calculating unit configured to calculate a first drawing speed in a first area in a drawing area on the target according to a run-up start coordinate, a drawing start coordinate, and a predetermined first acceleration, and calculate the range of the first area according to the run-up start coordinate, the first acceleration, and a second drawing speed, and also has a drawing control unit configured to control the drawing unit so that, in the first area, drawing is performed at the first drawing speed and, in a second area that follows the first area, drawing is performed at the second drawing speed.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: March 7, 2017
    Assignee: NuFlare Technology, Inc.
    Inventor: Hideyuki Tsurumaki
  • Patent number: 9446608
    Abstract: A system for generating a response curve for adjusting the positions of a pair of adjustable edge seals to the width of a print medium in a printing system is disclosed. The system comprises a vacuum chamber connected to a vacuum source, which provides vacuum to the vacuum chamber. Spaced sealing rollers and edge seals define an opening in the vacuum chamber. A sensor measures a vacuum level in the vacuum chamber. A controller is used to produce signals indicative of an activation level or a vacuum level. Means for adjusting the position of the edge seals are used to reposition the edge seals to at least one new position. The controller produces signals indicative of an activation level or a vacuum level at the new positions. A response curve is produced using the signals produced at the first and new positions.
    Type: Grant
    Filed: May 30, 2014
    Date of Patent: September 20, 2016
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Timothy John Young, Gregory R. Kulzer
  • Patent number: 9409732
    Abstract: A sheet-like object transporting device disclosed herein includes a transport plate having suction holes made penetrating therethrough, a fan that sucks in air through the suction holes, a belt that moves along an upper surface of the transport plate, and a controller. Width of the belt corresponds to width of the transport plate. The belt has an open zone whose form corresponds to a sheet-like object. A sheet-like object is loaded on the transport belt so as to close up the open zone. The belt is moved with the sheet-like object attracted onto it by suction. The sheet-like object is stably held onto the transport belt, contacting the peripheries of the open zone without misalignment, and is stably transported without moving out of position or upward. It is possible to transport a sheet-like object attracted onto the belt, while suppressing suction force wasting.
    Type: Grant
    Filed: August 17, 2015
    Date of Patent: August 9, 2016
    Assignee: RISO KAGAKU CORPORATION
    Inventors: Takahito Tojima, Masami Kanehira, Kenji Kudo
  • Patent number: 9400426
    Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: July 26, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Zenichi Hamaya, Noriyasu Hasegawa, Setsuo Yoshida, Yoshihiro Shiode
  • Patent number: 9285675
    Abstract: An imprint apparatus includes a deforming unit configured to deform the mold held by the mold holding unit into a convex shape toward the substrate; a driving unit configured to change an attitude of the mold or the substrate during a pressing in which the mold deformed is pressed against the uncured resin to thereby make a position of a contact region at which the mold is brought into contact with the uncured resin movable; a control unit configured to calculate a plane coordinates of a centroid of the contact region based on an image information of the contact region acquired by a measuring unit and to control an operation of the driving unit such that the plane coordinates position of the centroid is directed toward the plane coordinates position of the centroid of a pattern-forming region on the substrate, which has been calculated or has been acquired in advance.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: March 15, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Zenichi Hamaya, Noriyasu Hasegawa, Setsuo Yoshida, Yoshihiro Shiode
  • Publication number: 20150131072
    Abstract: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.
    Type: Application
    Filed: November 7, 2014
    Publication date: May 14, 2015
    Applicants: TOSHIBA CORPORATION, CANON NANOTECHNOLOGIES, INC.
    Inventors: Mario Johannes Meissl, Anshuman Cherala, Byung-Jin Choi, Seth J. Bamesberger
  • Patent number: 9019467
    Abstract: An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
    Type: Grant
    Filed: January 30, 2013
    Date of Patent: April 28, 2015
    Assignee: Nikon Corporation
    Inventors: Soichi Owa, Nobutaka Magome, Shigeru Hirukawa, Yoshihiko Kudo, Jiro Inoue, Hirotaka Kohno, Masahiro Nei, Motokatsu Imai, Hiroyuki Nagasaka, Kenichi Shiraishi, Yasufumi Nishii, Hiroaki Takaiwa
  • Publication number: 20150109599
    Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.
    Type: Application
    Filed: May 17, 2013
    Publication date: April 23, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Menno Fien, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Martijn Houben, Raymond Wilhelmus Louis Laffarre, Jan Steven Christiaan Westerlaken, Jim Vincent Overkamp, Maarten Van Beijnum, Robert De Jong
  • Publication number: 20150109600
    Abstract: The present invention provides a lithography apparatus which forms a pattern on a substrate, including a stage configured to hold the substrate, a substrate transport system configured to transfer the substrate to the stage, an obtaining unit configured to obtain information about a holding state of the substrate on the stage, and a processor configured to perform processing of determining a transport position on the stage when the substrate transport system transfers the substrate to the stage, wherein based on information obtained by the obtaining unit when the stage holds the substrate at each of a plurality of positions on the stage, the processor determines the transport position at which the substrate transport system transfers the substrate to the stage.
    Type: Application
    Filed: October 10, 2014
    Publication date: April 23, 2015
    Inventor: Kazushi Mizumoto
  • Patent number: 9013682
    Abstract: The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: April 21, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Rene Theodorus Petrus Compen, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Joost Jeroen Ottens, Martin Frans Pierre Smeets
  • Patent number: 8953142
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: February 10, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • Patent number: 8913230
    Abstract: In an imprint lithography system, a recessed support on a template chuck may alter a shape of a template positioned thereon providing minimization and/or elimination of premature downward deflection of outer edges of the template in a nano imprint lithography process.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: December 16, 2014
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Mahadevan GanapathiSubramanian, Mario Johannes Meissl, Avinash Panga, Byung-Jin Choi
  • Publication number: 20140320841
    Abstract: The present invention provides a holding apparatus for holding a substrate by an electrostatic force, the apparatus including a base including an electrode for generating the electrostatic force, a plurality of pins provided on the base, and a seal provided on the base and configured to seal a first space surrounding the plurality of pins, wherein a cavity and a first hole connecting the cavity and the first space is formed in the base, wherein a gas is sealed in the first space, the first hole and the cavity in a vacuum by holding the substrate on the pins and the seal by the electrostatic force.
    Type: Application
    Filed: April 3, 2014
    Publication date: October 30, 2014
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Masato MURAKI, Hiroshi KII
  • Publication number: 20140293257
    Abstract: Provided are a substrate holding apparatus and a method of using the substrate holding apparatus. According to an aspect of the present invention, there is provided a substrate holding apparatus comprising a stage on which a substrate is placed, and at least one lift bar which separates the substrate from the stage by raising the substrate or placing the substrate on the stage by lowering the substrate. The lift bar comprises a body and a head. The head is connected to an end of the body, contacts the substrate, and is formed of a porous material.
    Type: Application
    Filed: August 1, 2013
    Publication date: October 2, 2014
    Inventor: Sung Hune Yoo
  • Patent number: 8810770
    Abstract: An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.
    Type: Grant
    Filed: June 10, 2011
    Date of Patent: August 19, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yuji Maehara, Nobushige Korenaga
  • Patent number: 8749753
    Abstract: The upper end of a static gas bearing member of a wafer side seal unit is connected to an edge section on the outgoing side of an exposure beam of a chamber in an air tight state via bellows, and the lower end surface is in a state forming a predetermined clearance with a wafer and a wafer holder. By this arrangement, the inside of the chamber is isolated from the outside. Accordingly, it becomes possible to maintain a vacuum environment in the periphery of the optical path of the exposure beam without arranging a vacuum chamber to house a wafer, a wafer holder, and a wafer stage, which allows the size of the entire exposure apparatus to be reduced, and also makes it easy to have access to the vicinity of the wafer stage.
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: June 10, 2014
    Assignee: Nikon Corporation
    Inventors: Keiichi Tanaka, Yukio Kakizaki
  • Publication number: 20140146301
    Abstract: Disclosed is exposure machine, comprising: a loading frame, for placing an object to be exposed; a light source device, located at one side of a plane where the loading frame is positioned, wherein the light emitting direction of the light source device is perpendicular to a plane where the object to be exposed is positioned. During exposure, the loading frame will not reflect the light transmitting through the object to be exposed, and thus the stage spots are avoided. Further, when the exposure machine is operated in a vertical manner, a bidirectional exposure may be achieved only by adding a single prism into the light source device in the prior art, and thus the exposure efficiency is greatly improved.
    Type: Application
    Filed: November 22, 2013
    Publication date: May 29, 2014
    Inventors: Zhong LU, ByungChun LEE, Lijuan HUANG, Fujiang JIN
  • Patent number: 8717543
    Abstract: An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part that surrounds a suction space, and a first support part that is provided in the suction space and that supports a substrate. Furthermore, the invention is equipped with a second support part that extends from the circumferential edge part to the first support part and that supports the substrate.
    Type: Grant
    Filed: January 14, 2010
    Date of Patent: May 6, 2014
    Assignee: Nikon Corporation
    Inventor: Yuichi Shibazaki
  • Patent number: 8705010
    Abstract: The invention relates to a lithography system, for example for projecting an image or an image pattern on to a target (1) such as a wafer, said target being included in said system by means of a target table (2), clamping means being present for clamping said target on said table. Said clamping means comprises a layer of stationary liquid (3), included at such thickness between target and target table that, provided the material of the liquid (C) and of the respective contacting faces (A, B) of the target (1) and target table (2), a pressure drop (PCap) arises.
    Type: Grant
    Filed: July 11, 2008
    Date of Patent: April 22, 2014
    Assignee: Mapper Lithography IP B.V.
    Inventors: Guido De Boer, Michel Pieter Dansberg, Pieter Kruit
  • Patent number: 8706289
    Abstract: Methods and systems, in one embodiment, for receiving a warped flexible wafer to be transferred between a first mechanism and a second mechanism are described. The method and system senses a first vacuum suction between the warped flexible wafer and the first mechanism. The warped flexible wafer is positioned to define a gap between the warped flexible wafer and the second mechanism. Methods and systems for closing the gap incrementally between the warped flexible wafer and the second mechanism are described. At each increment, the methods and systems detect whether a second vacuum suction is created between the warped flexible wafer and the second mechanism. When a second vacuum suction is detected between the warped flexible wafer and the second mechanism, the first vacuum suction between the warped flexible wafer and the first mechanism is released.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: April 22, 2014
    Assignee: FormFactor, Inc.
    Inventors: Bjorn Monteen, Gustaaf Ponder
  • Patent number: 8614786
    Abstract: A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular to the translational axis, and a second component rotates the shaft about the axis of symmetry and moves the shaft in a direction parallel to the axis of symmetry. The second component includes a gas bearing configured to introduce gas along a circumferential surface of the shaft and a scavenging seal configured to evacuate the gas introduced by the second component gas bearing. The robot substantially reduces, or eliminates the out-gassing of hydrocarbon molecules in a range from about 0 to 200 a.m.u., thus rendering the robot suitable for use in extreme ultra-violet (EUV) photolithography applications.
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: December 24, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Gabriël Maria Lansbergen, George Hilary Harrold, Matthew James Van Doren
  • Patent number: 8605250
    Abstract: In an immersion lithography tool, the status of the immersion hood surface may be estimated on the basis of an inline detection system that generates optical measurement data. For example, a digital imaging system may be implemented in order to obtain optical measurement data without requiring exposure of the interior of the lithography tool to ambient air. In other cases, other optical measurement techniques, such as FTIR and the like, may be applied.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: December 10, 2013
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Rolf Seltmann, Rene Wirtz
  • Publication number: 20130265575
    Abstract: A detection apparatus includes an optical system including a polarization beam splitter and a quarter-wave plate. The optical system illuminates a mark via the polarization beam splitter and the quarter-wave plate in sequence, and directs light reflected from the mark via the quarter-wave plate and the polarization beam splitter in sequence towards a light-receiving element An airtight container configured to enclose therein at least part of the optical system includes, as a partition wall thereof, a light transmitting member arranged in an optical path between the polarization beam splitter and the quarter-wave plate.
    Type: Application
    Filed: March 29, 2013
    Publication date: October 10, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventors: Wataru Yamaguchi, Hideki Ina
  • Publication number: 20130258309
    Abstract: The substrate holding device of the present invention includes a holding unit that adsorbs and holds the substrate, a measuring section that measures a physical quantity relating to a adsorption force of the holding unit with the substrate mounted on the holding unit; and a control section that carries out a first determination based on a first condition and a measurement result obtained by the measuring section and a second determination based on a second condition that is different from the first condition and a measurement result obtained by the measuring section to select one of at least three preset operations based on the result of first and second determinations to thereby execute processing depending on the selected operation.
    Type: Application
    Filed: May 23, 2013
    Publication date: October 3, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Masatoshi Endo
  • Patent number: 8547518
    Abstract: A stage base includes a plate which supports a stage. The plate has a first structure and a second structure, and the first and second structures are coupled. The stage base further includes a component which is arranged on the plate and has a cooling unit, a coolant channel arranged to extend through the plate into the component, and a seal member arranged between the first structure and the second structure so as to surround the coolant channel, an interior and an exterior of the seal member being fastened with a fastener.
    Type: Grant
    Filed: October 5, 2006
    Date of Patent: October 1, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kazuyuki Ono
  • Publication number: 20130250271
    Abstract: A stage assembly (10) that moves a device (22) includes a device holder (20) that selectively retains the device (22). The device holder (20) includes a pivot (330) that engages the device (22), and a pressure source (326) that creates (i) a pressure controlled, distal zone (336A) that is at a distal pressure, and (ii) a pressure controlled, proximal zone (338A) that is at a proximal pressure. The distal zone (336A) generates a distal moment (344A) and the proximal zone (336B) generates a proximal moment (346A) that can be used to control the shape of the device (22).
    Type: Application
    Filed: February 15, 2013
    Publication date: September 26, 2013
    Applicant: NIKON CORPORATION
    Inventors: Alton H. Phillips, Fardad Hashemi, Takeshi Matsuda
  • Patent number: 8530857
    Abstract: A stage device to be used in a vacuum includes: a gas supply unit for generating a gas; a base member having upper, lower, right, and left surfaces; a slider formed in a frame shape surrounding the base member and having surfaces facing the respective surfaces of the base member, and disposed to be movable; and an air bearing configured to float the slider by supplying the gas to a space between the base member and the slider. The slider includes: an air chamber provided on the surface facing the base member for accumulating air, and the base member includes thereinside a slider-moving air flow passage configured to guide the gas from an inlet port to an outlet port for supplying the gas to the air chamber of the slider.
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: September 10, 2013
    Assignee: Advantest Corp.
    Inventors: Yoshihisa Ooae, Youichi Shimizu
  • Patent number: 8514365
    Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: August 20, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
  • Patent number: 8502959
    Abstract: The present invention provides an exposure apparatus which transfers a pattern of a reticle onto a substrate, the apparatus including a convey unit configured to convey the substrate while chucking and holding a lower surface of the substrate, and a control unit configured to control a conveyance condition of the convey unit so that a conveyance acceleration is lower when the convey unit conveys the substrate in a vertical direction with downward acceleration than when the convey unit conveys the substrate in the vertical direction with upward acceleration.
    Type: Grant
    Filed: July 8, 2010
    Date of Patent: August 6, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventor: Shinichi Hirano
  • Patent number: 8497974
    Abstract: An exhaust apparatus includes a structural member; a vacuum pump configured to exhaust a gas via the structural member; and a regulator configured to regulate a temperature of the structural member. The structural member has first and second end faces and a columnar through hole connecting the first and second end faces to each other. The apparatus is configured such that the vacuum pump exhausts a gas via the through hole.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: July 30, 2013
    Assignee: Canon Kabushiki Kaisha
    Inventor: Atsushi Umemura
  • Publication number: 20130120732
    Abstract: The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time.
    Type: Application
    Filed: October 28, 2010
    Publication date: May 16, 2013
    Applicant: Korea Electrotechnology Research Institute
    Inventors: Jeong Woo Jeon, Hyeon Seok Oh, Mitica Caraiani, Sung Il Chung, Hyeon Taeg Kim, Chang Rin Lee, Jong Moon Kim
  • Publication number: 20130107241
    Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus including a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged to clamp the substrate at a top side thereof. The vacuum clamp may be arranged to clamp at least part of a circumferential outer zone of the substrate top surface. There is also provided a substrate handling method including positioning the substrate using a gripper on a substrate table of a lithographic apparatus, the method including clamping the substrate at a top side thereof using a vacuum clamp of the gripper.
    Type: Application
    Filed: October 24, 2012
    Publication date: May 2, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis LAFARRE, Hubert Marie Segers, Theodorus Petrus Maria Cadee, Yang-Shan Huang, Christiaan Louis Valentin
  • Patent number: 8416383
    Abstract: A lithographic apparatus is disclosed that includes a seal provided in a substrate table, the seal being actuatable from an open configuration to a closed configuration, the closed configuration being such that when a substrate is located on the substrate table, the seal closes a gap between the substrate and the substrate table.
    Type: Grant
    Filed: November 26, 2007
    Date of Patent: April 9, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Eva Mondt, Alexander Nikolov Zdravkov
  • Publication number: 20130038854
    Abstract: A substrate table assembly, an immersion lithographic apparatus and a device manufacturing method are disclosed. The substrate table assembly includes a substrate table to support a substrate; and a gas handling system to provide a gas to a region between the substrate table and a substrate mounted on the substrate table, wherein the gas provided by the gas handling system has a thermal conductivity greater than or equal to 100 mW/(m.K) at 298 K.
    Type: Application
    Filed: August 8, 2012
    Publication date: February 14, 2013
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Gertrudis Cornelis KUNNEN, Sjoerd Nicolaas Lambertus Donders, Johannes Henricus Wilhelmus Jacobs, Martijn Houben, Thibault Simon Mathieu Laurent, Frank Johannes Jacobus Van Boxtel, Sander Catharina Reinier Derks
  • Patent number: 8368868
    Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: February 5, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Petrus Martinus Bernardus Vermeulen, Marcel Koenraad Marie Baggen, Hans Butler, Henrikus Herman Marie Cox, Jan Van Eijk, Andre Bernardus Jeunink, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Theodorus Petrus Maria Cadee, Fransiscus Mathijs Jacobs, Christiaan Louis Valentin
  • Publication number: 20120300188
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate; a positioner constructed to position the substrate table; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a substrate surface actuator arranged to engage a part of a surface of the substrate facing the projection system, and a position controller configured to control a position of the substrate table, the position controller being arranged to drive the positioner and the substrate surface actuator.
    Type: Application
    Filed: May 22, 2012
    Publication date: November 29, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Johannes Petrus Martinus Bernardus Vermeulen, Yang-Shan Huang
  • Publication number: 20120300323
    Abstract: An exposure method is provided. In (a) of FIG. 8, exposure is performed while a substrate 20 is being transported in the Y direction, to simultaneously form first layers 81 and layers 91 in first non-display regions 51 and the display region, respectively, on the substrate 20. Next, in (b) of FIG. 8, the substrate 20 is rotated by 90 degrees, and exposure is performed while the substrate 20 is being transported in the X direction, to form second layers 82 in second non-display regions 52. Subsequently, in (c) of FIG. 8, proximity exposure is performed once on the substrate 20 to simultaneously form third layers 83 on the first layers 81 in the first non-display regions 51, fourth layers 84 on the second layers 82 in the second non-display regions 52, and layers 92 in the display region 40.
    Type: Application
    Filed: January 11, 2011
    Publication date: November 29, 2012
    Applicants: SHARP KABUSHIKI KAISHA, TOPPAN PRINTING CO., LTD.
    Inventors: Kohei Matsui, Ryosuke Yasui, Keiichi Tanaka, Takenori Yoshizawa
  • Patent number: 8319947
    Abstract: An operating valve of the present invention is a differential pressure operating valve 100 for performing a vacuum suction of a substrate, the operating valve comprises a body 4 having an opening which is provided at an exhaust side for exhausting an air from an inside to an outside and is opposed to a suction side for sucking the air from the outside to the inside, a valve 8, and a spring 9 whose one end is connected with one of the suction side and the exhaust side of the body 4 and the other end is connected with the valve 8. The spring 9 is configured to stretch or compress in accordance with a differential pressure between the suction side and the exhaust side, and the valve 8 is provided with at least one hole.
    Type: Grant
    Filed: October 6, 2009
    Date of Patent: November 27, 2012
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hiroyuki Eki, Shiro Sakai
  • Patent number: 8319946
    Abstract: The present invention relates to a transfer device that can feed a work in a stable condition without applying it any excess loads. The transfer device for feeding a tape-shaped work to a process stage standing in an upright position, which is placed on one side of the process stage and which includes a supply reel, a take-up reel and a work feeding mechanism. Specifically, the supply reel, around which the work and a protective sheet are wound, is adapted to feed the work and the protective sheet therefrom. The take-up reel is adapted to wind the work and the protective sheet that have been fed from the supply reel, and it is located below the supply reel. The work feeding mechanism is adapted to forward the work from the supply reel to the take-up reel through the process stage.
    Type: Grant
    Filed: May 6, 2011
    Date of Patent: November 27, 2012
    Assignee: ORC Manufacturing Co., Ltd.
    Inventors: Jin Sato, Akira Nakazawa
  • Patent number: 8289497
    Abstract: An immersion lithography apparatus includes a projection system having a final optical element, a movable stage that is movable below the projection system such that a gap exists between the final optical element and a surface of the stage, an immersion liquid being filled in the gap, a liquid confinement member and a liquid diverter. The liquid confinement member maintains the immersion liquid in the gap, and includes a liquid recovery portion that faces the stage surface and recovers liquid from the gap. The liquid recovery portion includes a first porous portion through which a first suction force is applied and a second porous portion through which a second suction force less than the first suction force is applied, the second portion being located outward of the first portion. The liquid diverter is positioned between the stage and at least the first porous portion.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: October 16, 2012
    Assignee: Nikon Corporation
    Inventors: Alex Ka Tim Poon, Leonard Wai Fung Kho, Derek Coon, Gaurav Keswani
  • Patent number: 8288064
    Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.
    Type: Grant
    Filed: June 6, 2011
    Date of Patent: October 16, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Andreas Dorsel, Stefan Schmidt
  • Patent number: 8274641
    Abstract: A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table.
    Type: Grant
    Filed: June 1, 2009
    Date of Patent: September 25, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Eva Mondt, Noud Jan Gilissen, Hernes Jacobs, Nicolaas Ten Kate, Erik Roelof Loopstra, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen